JP2017037189A - Pattern irradiation device, system, operation method, and program - Google Patents

Abstract

PROBLEM TO BE SOLVED: To allow switching of a projection image with a simpler configuration.SOLUTION: A pattern irradiation device comprises: a light source control unit 101 for controlling lighting of a light source; a switching unit 102 for switching between a first light path guiding light of the light source to a first pattern unit to generate pattern light and a second light path, which is different from the first light path, guiding light of the light source to a second pattern unit different from the first pattern unit to generate pattern light; and an irradiation control unit 103 for enlargedly irradiating a projection place with pattern light generated by the first pattern unit and the second pattern unit through a projection optical system at predetermined timing, respectively.SELECTED DRAWING: Figure 3

Description

  The present invention relates to a pattern irradiation apparatus, a system, an operation method, and a program.

  Conventionally, there is a system in which an object (work) loaded on a tray is operated using a robot (operation unit), and the object is transported to the next process apparatus or a product is assembled using the object. Are known. In such a system, the distance of the object on the tray is measured by a three-dimensional measuring device, and the position and orientation of the object are recognized and operated based on the measurement result. Moreover, in such a system, the pattern irradiation device irradiates the object on the tray with a predetermined pattern of light, thereby improving the accuracy of distance measurement by the three-dimensional measurement device. It is known that the pattern irradiation apparatus can be realized with the same configuration as a projection apparatus (projector) using, for example, a DMD (Digital Mirror Device) or a liquid crystal panel.

  For example, Patent Document 1 discloses a projection apparatus having a light source, a phosphor wheel, and a color wheel for the purpose of efficiently projecting light from the light source. In Patent Document 1, light is emitted from a light source to a phosphor to generate each color, and then transmitted through a color wheel, thereby converting ultraviolet light or infrared light contained in the light source into visible light to increase light use efficiency. In addition, a configuration capable of obtaining excellent color rendering properties is described.

  As described above, an optical system of a projector using a DMD or a liquid crystal panel includes a relay optical system and an optical system for synthesizing each color. For this reason, the number of parts is large and the control is complicated.

  The present invention has been made in view of the above, and an object of the present invention is to enable switching of projected images with a simpler configuration.

  In order to solve the above-described problems and achieve the object, the present invention includes a light source control unit that controls lighting of a light source, and a first light that guides light from the light source to a first pattern unit to generate pattern light. A switching unit that switches between an optical path and a second optical path different from the first optical path that guides light of the light source to a second pattern part different from the first pattern part to generate pattern light; and An irradiation control unit that irradiates and enlarges the pattern light generated by the first pattern unit and the second pattern unit to the projection surface via a projection optical system at predetermined timings, respectively.

  The present invention has an effect that a high light output can be obtained and a projection image can be switched with a simpler configuration.

FIG. 1 is an explanatory diagram of a configuration of a handling system according to the first embodiment. FIG. 2 is a block diagram illustrating a configuration example of the handling system according to the present embodiment. FIG. 3 is a block diagram illustrating a functional configuration example of the handling system according to the present embodiment. FIG. 4 is an explanatory diagram of a configuration example of the pattern irradiation apparatus according to the first embodiment. FIG. 5 is an explanatory diagram showing the configuration of the light guide in FIG. FIG. 6 is an explanatory diagram of a control example of the pattern irradiation apparatus according to the first embodiment. FIG. 7 is an explanatory diagram of a configuration example of the pattern irradiation apparatus according to the second embodiment. FIG. 8 is an explanatory diagram showing the configuration of the movable fluorescent part in FIG. FIG. 9 is an explanatory diagram of a configuration example of the pattern irradiation apparatus according to the third embodiment. FIG. 10 is an explanatory diagram of a control example of the pattern irradiation apparatus according to the third embodiment. FIG. 11 is an explanatory diagram of a configuration example of the pattern irradiation apparatus according to the fourth embodiment. FIG. 12 is an explanatory diagram of a control example of the pattern irradiation apparatus according to the fourth embodiment. FIG. 13 is an explanatory diagram of a configuration example of the pattern irradiation apparatus according to the fifth embodiment.

  The pattern irradiating apparatus according to the present embodiment guides light emitted from a light source to different optical paths by an optical path switching unit, irradiates light on different patterns in the respective optical paths, and performs enlarged projection. Hereinafter, each embodiment will be described with reference to the accompanying drawings.

(Embodiment 1)
FIG. 1 is an explanatory diagram of a configuration of a handling system 10 according to the first embodiment. The handling system 10 handles the object 11, transports the object 11 to the next process apparatus, and assembles a product using the object 11. The handling system 10 includes a tray 12, a robot (operation unit) 13, a pattern irradiation device 20, a three-dimensional measurement device 21, a recognition device 22, and a robot controller 23. The tray 12 is loaded with at least one object 11. Note that the object 11 is appropriately described as a workpiece or a projection surface.

  The robot 13 operates any of the objects 11 loaded on the tray 12 by moving the arm, and moves the operated object 11 to a designated position or holds it in a designated posture. The robot 13 may be operated by opening and closing the nail and sandwiching the object 11, may operate the object 11 by air adsorption, or may operate the object 11 with electromagnetic force.

  The pattern irradiation device 20 irradiates the tray 12 on which the object 11 is loaded with a predetermined monochrome image pattern or plain light. Thereby, a predetermined image pattern is irradiated to the exposed part in the surface of each target object 11 loaded on the tray 12. In the present embodiment, the pattern irradiating device 20 irradiates light of a blue or yellow image pattern. However, the pattern irradiating device 20 is not limited to blue / yellow, and may be any color or white. .

  The three-dimensional measuring device 21 measures the distance to each position on the exposed surface of each object 11 loaded on the tray 12 in a state where light of a predetermined image pattern is irradiated by the pattern irradiation device 20. As an example, the three-dimensional measuring device 21 measures the distance with a stereo camera or the like, and generates three-dimensional information representing the distance to each position in the image.

  The recognition device 22 recognizes the position and orientation of each object 11 based on the distance to each position on the surface of each object 11 measured by the three-dimensional measurement device 21. As an example, the recognition device 22 executes matching processing such as matching processing with a three-dimensional model or surface matching processing to recognize the position and orientation of each object 11. Furthermore, the recognition device 22 may complement the matching process by performing edge extraction or the like based on the luminance information.

  The robot controller 23 controls the operation of the robot 13 based on the position and orientation of each object 11 recognized by the recognition device 22 in accordance with a control flow registered in advance. Then, the robot controller 23 operates the designated object 11 on the tray 12.

  In such a handling system 10, the pattern irradiating device 20 includes an image pattern or plain light that improves the accuracy of the three-dimensional measurement by the three-dimensional measuring device 21 and each object 11 loaded on the tray 12. Irradiate. Thereby, according to the handling system 10, the position and attitude | position of each target object 11 loaded on the tray 12 can be recognized accurately, and the target object 11 can be operated accurately.

  FIG. 2 is a block diagram showing a configuration example of the handling system 10 according to the present embodiment. In the handling system 10, a pattern irradiation device 20, a three-dimensional measurement device 21, a recognition device 22, a robot controller 23, a control unit 25, and the like are connected on a bus. The three-dimensional measuring device 21 includes an imaging unit such as a stereo camera that images the object 11 irradiated by the pattern irradiation device 20.

  The control unit 25 includes a microcomputer system such as a CPU (Central Processing Unit) 26, a ROM (Read Only Memory) 27, and a RAM (Random Access Memory) 28. The CPU 26 controls the system using the RAM 28 as a working memory in accordance with a program stored in the ROM 27.

  In the present embodiment, the control unit 25 is included in the recognition device 22 (the recognition device 22 is realized by the control unit 25), but the control unit 25 is configured to use the pattern irradiation device 20 or the three-dimensional measurement device 21. It may be arranged in an independent manner, or may be arranged independently.

  FIG. 3 is a block diagram illustrating a functional configuration example of the handling system 10 according to the present embodiment. The handling system 10 includes a light source control unit 101, a switching unit 102, an irradiation control unit 103, an imaging processing unit 104, a recognition unit 105, and a robot control unit 106 (robot controller 23). Each of these functional blocks will be described in detail in FIG.

  The light source control unit 101 controls lighting of a light source to be described later. The switching unit 102 guides the light from the light source to the first pattern unit to generate the pattern light, and guides the light from the light source to the second pattern unit different from the first pattern unit. Is switched to a second optical path different from the first optical path for generating. The irradiation control unit 103 enlarges and irradiates the projection surface with the pattern light generated by the first pattern unit and the second pattern unit at a predetermined timing via the projection optical system.

  The imaging processing unit 104 performs imaging processing on the pattern projected under the control of the irradiation control unit 103. The recognition unit 105 detects and recognizes the distance to the object 11 and / or the edge detection of the object 11 based on the image of the pattern imaged by the imaging processing unit 104. Based on the result recognized by the recognition unit 105, the robot control b 106 performs an operation on the object 11.

  A part or all of the functions of the handling system 10 may be configured by software or hardware.

  FIG. 4 is an explanatory diagram of a configuration example of the pattern irradiation apparatus 20 according to the first embodiment. The pattern irradiation device 20 irradiates the projection surface with light of an image pattern that improves the accuracy of distance measurement by the three-dimensional measurement device 21. The projection surface corresponds to the tray 12 on which the object 11 in the handling system 10 is loaded.

  4 includes a light source 31, collimator lenses 32, 35, and 48, a condensing lens 33, a light guide unit 34, a transmission diffuser plate 36, a light tunnel 37, a pattern unit 38, a dichroic mirror 39, and a projection optical system. 40. The pattern irradiation apparatus 20 includes a fluorescent part 41, a condenser lens 42, a dichroic mirror 43, a transmission diffusion plate 44, a mirror 45, a light tunnel 46, and a pattern part 47. A pattern for generating a pattern by light irradiation is formed on the pattern portion 38 (first pattern portion). On the other hand, a pattern different from the pattern portion 38 is formed in the pattern portion 47 (second pattern portion), and a pattern is generated by light irradiation.

  The light source 31 is a laser diode and emits laser light that is coherent light. In the present embodiment, the laser diode is a blue laser diode that emits blue laser light having a wavelength of, for example, 440 nm to 500 nm. The laser diode is not limited to blue, but may be other colors. The light source 31 may emit laser light other than visible light as long as the light emitted by the three-dimensional measuring device 21 can be detected.

  The collimator lens 32 receives the laser beam emitted from the light source 31 (in this example, a laser diode) and emits it as a parallel light beam.

  The condensing lens 33 condenses the light emitted from the light source 31 on the light guide 34. The light guide unit 34 temporally switches between transmission and reflection of the light from the light source 31.

  The light guide unit 34 corresponds to the switching unit 102 in FIG. The configuration of the light guide 34 is shown in FIG. The light guide unit 34 is a member that rotates around a rotation shaft 60 and is a member in which one region divided by a radius is a transmission region 61 that transmits light, and the other region is a reflection region 62 that reflects light. / Transmission wheel (hereinafter, the light guide 34 is also referred to as a reflection / transmission wheel as appropriate). The reflection / transmission wheel is arranged at a predetermined angle, placed on the optical path of the light beam, and the optical path of the light beam can be selected by rotating the reflection / transmission wheel.

  In FIG. 5, the reflection region 62 is formed in an angle range of about 45 ° with respect to the rotation axis 60, but this is not limited to this example. Moreover, the light guide part 34 is not restricted to this. A plate having the transmission region 61 and the reflection region 62 may be vibrated in a linear direction, or the optical path may be switched by a galvanometer mirror.

  Next, specific examples and optical paths of the components in FIG. 4 will be described. The case where the reflection region 4c of the light guide 34 is on the optical axis of the light emitted from the light source 31 will be described. The light reflected by the light guide unit 34 is converted into a parallel light beam by the collimator lens 35 and passes through the transmission diffusion plate 36.

  The transmission diffusion plate 36 is a diffusion unit that diffuses incident light. The transmission diffuser plate 36 is entirely flat and has fine and random irregularities formed on at least one plane. The transmission diffusion plate 36 emits the incident light to the light tunnel 37 while transmitting and diffusing it. For example, the transmission diffusion plate 36 diffuses light at a diffusion angle of 5 ° to 10 ° of the full width at half maximum.

  Instead of placing the transmission diffuser plate 36, the reflection region 62 of the reflection / transmission wheel may be formed of a diffusion plate. In this case, when the laser light emitted from the light source 31 reflects the reflection region 62, an effect of suppressing speckle (a phenomenon of generating a fluctuation pattern such as a spotted pattern) due to the laser light is obtained.

  The light tunnel 37 is a homogenizing optical system that uniformizes the illuminance distribution on a surface perpendicular to the optical axis direction of light passing therethrough. The light tunnel 37 receives the light diffused by the transmission diffusion plate 36, passes the incident light, and emits the light with a uniform illuminance distribution. In addition, as long as it is a homogenizing optical system, other members may be provided instead of the light tunnel 37. For example, the pattern irradiation apparatus 20 may include a fly eye instead of the light tunnel 37.

  The transmission diffusion plate 36 is disposed immediately before the light tunnel 37 without using a relay optical system or the like. Thereby, the pattern irradiation apparatus 20 can shorten the optical distance between the transmission diffusion plate 36 and the light tunnel 37 and prevent the diffused light from leaking outside the light tunnel 37. . Therefore, the pattern irradiation device 20 can increase the efficiency of light transmission and increase the output energy. When the reflection area 62 of the reflection / transmission wheel is a diffusion plate, the same effect can be obtained by arranging the reflection / transmission wheel immediately before the light tunnel 37.

  Further, the laser beam has high straightness. Therefore, if the laser light emitted from the collimator lens 35 is directly incident, it is difficult for the light tunnel 37 to uniformly uniform the illuminance distribution. However, in the present embodiment, since the light tunnel 37 receives the laser light diffused by the transmission diffusion plate 36, the illuminance distribution can be made uniform efficiently. Therefore, the pattern irradiation apparatus 20 can reduce the length of the light tunnel 37 in the optical axis direction and reduce the size of the apparatus.

  Further, the pattern portion 38 is disposed immediately after the light tunnel 37 without using a relay optical system or the like. Thereby, the pattern irradiation apparatus 20 shortens the optical distance between the light tunnel 37 and the pattern portion 38 and prevents the diffused light emitted from the light tunnel 37 from leaking to the outside. Can do. Therefore, the pattern irradiation device 20 can increase the efficiency of light transmission and increase the output energy.

  The pattern unit 38 transmits and blocks (or reflects) the light emitted from the light tunnel 37 according to a predetermined image pattern, and forms an image of the predetermined image pattern on a surface perpendicular to the optical axis. The light transmitted through the pattern unit 38 enters the dichroic mirror 39. Here, the dichroic mirror 39 transmits light from the light source 31 and reflects fluorescence. If the light source 31 is a blue laser diode, and the fluorescent part 41 emits yellow fluorescence when irradiated with blue light, the dichroic mirror 39 transmits blue and reflects yellow. The light applied to the pattern unit 38 passes through the dichroic mirror 39 and enters the projection optical system 40. Since the dichroic mirror 39 has the same specifications as the dichroic mirror 43 described later, it can be expected to reduce the cost by sharing parts, but this is only an example, and a cross dichroic prism may be used.

  As an example, the pattern portion 38 is a rectangular plate-like photomask in which a predetermined pattern (image pattern) is drawn on a transparent plate such as glass. The predetermined image pattern may be a two-dimensional pattern that improves the accuracy of distance measurement when the object 11 is irradiated, a pattern that improves the accuracy of edge detection, or a plain pattern. May be. Even in the case of a plain, irradiating the work with light improves the edge detection accuracy especially for a work with low reflectivity. In the case of a solid color, the pattern portion 38 may not be provided. Moreover, you may put combining the glass plate and the light-shielding component which light-shields an outer periphery. By designing the light-shielding component so that light in a uniform region can pass through the light emitted from the light tunnel 37, highly uniform projection light can be obtained, and the amount of light decreases near the outer periphery of the projection light. Since it is hard to happen that the workpiece cannot be recognized, the irradiation device is easy to use.

  The projection optical system 40 irradiates the projection surface with the light transmitted through the pattern unit 38 enlarged to a designated magnification.

  Next, a case where the transmission region 61 of the light guide 34 is on the optical axis of the light emitted from the light source 31 will be described. Here, in the reflection / transmission wheel that is the light guide 34, the transmission region 61 can be an opening. Thereby, since it is not necessary to prepare a member for forming the transmission region 61, the apparatus cost can be suppressed. Of course, the reflection / transmission wheel may have a reflection region 62 formed on the transparent member.

  After passing through the light guide 34, the light becomes a parallel light beam by the collimator lens 48 and is diffused by the transmission diffusion plate 44. By being diffused by the transmissive diffusion plate 44, it is possible to suppress burning of the phosphor and a decrease in efficiency due to light being concentrated on one point of the phosphor. For example, the transmission diffusion plate 44 diffuses light at a diffusion angle of 1 ° to 5 ° of the full width at half maximum.

  Further, the transmissive diffusion plate 44 is disposed closer to the light source 31 than the dichroic mirror 43. Since fluorescence is incoherent light, diffusion by a diffusion plate is not always necessary. In this optical configuration, since fluorescence does not pass through the transmission diffusion plate 44, it is possible to suppress a decrease in light utilization efficiency due to light diffusion. The transmission region 61 of the reflection / transmission wheel may be a transmission diffusion plate. As a result, the transmission diffusion plate 44 is not required, and the cost can be reduced by reducing the number of components and the size of the apparatus can be reduced.

  The light diffused by the transmission diffusion plate 44 enters the dichroic mirror 43. Here, like the dichroic mirror 39, the dichroic mirror 43 transmits light from the light source 31 and reflects fluorescence. If the light source 31 is a blue laser diode and the fluorescent part 41 emits yellow fluorescence when irradiated with blue light, the dichroic mirror 43 transmits blue and reflects yellow. The phosphor is not limited to yellow, and may emit fluorescence of light of any wavelength (for example, red, green, blue, white, etc.). The dichroic mirror 43 may transmit light from the light source 31 and reflect fluorescence. Even if the light source 31 is blue and the light emitted from the phosphor is blue, separation by the dichroic mirror 43 is possible if the wavelengths of the light source 31 are different.

  The light emitted from the light source 31 passes through the dichroic mirror 43, is collected by the condenser lens 42, and is then applied to the fluorescent part 41. The fluorescent part 41 emits fluorescence using incident light as excitation light. As an example, the fluorescent part 41 includes a reflective substrate and a phosphor provided on the reflective substrate.

  Thereby, the fluorescence part 41 can reflect the emitted fluorescence to the light source 31 side. The reflective substrate reflects light in a band including the wavelength of the laser light and the wavelength of the light emitted from the phosphor. As an example, the reflective substrate may have a reflective coating film such as a dielectric multilayer film or a metal film formed on the surface thereof. Thereby, the reflective substrate can increase the reflectance.

  In addition, the excitation light (laser light) that has entered the fluorescent part 41 but has not been converted to fluorescent light is also reflected by the reflective substrate, and is again irradiated with fluorescent light and converted into fluorescent light. Therefore, the fluorescence part 41 can convert a laser beam into fluorescence efficiently.

  Moreover, the fluorescent part 41 may be phosphor ceramics as an example. The phosphor ceramic is a sintered body obtained by forming a phosphor into an arbitrary shape (for example, a thin plate shape) and heating it. In this case, in the fluorescent part 41, a reflective coating film is formed on the surface opposite to the surface on which light is incident (the surface opposite to the surface on the light source 31 side). Thereby, the fluorescence part 41 can reflect the emitted fluorescence to the light source 31 side. In addition, the fluorescent part 41 is not limited to this, and any fluorescent unit 41 may be used as long as it emits fluorescence using the light emitted from the light source 31 as excitation light and emits fluorescence toward the incident surface side of the excitation light. It may be.

  The fluorescence emitted by the fluorescent part 41 is converted into a parallel light beam by the condenser lens 42, reflected by the dichroic mirror 43, and then reflected by the mirror 45. The mirror 45 is a member that reflects light, and a reflective coating film such as a dielectric multilayer film or a metal film that reflects fluorescence is formed on the surface thereof. After the light is made uniform by the light tunnel 46, the pattern portion 47 is irradiated.

  The predetermined image pattern of the pattern unit 47 (second pattern unit) may be a two-dimensional pattern that improves the accuracy of distance measurement when the object 11 is irradiated, or improves the accuracy of edge detection. A pattern may be sufficient and a plain may be sufficient. Even in the case of a plain, irradiating the work with light improves the edge detection accuracy especially for a work with low reflectivity. In the case of a solid color, the pattern portion 47 may not be provided. Moreover, you may put combining the glass plate and the light-shielding component which light-shields an outer periphery. By designing the light-shielding component so that light in a uniform region can pass through the light emitted from the light tunnel 46, highly uniform projection light can be obtained, and the amount of light is reduced near the outer periphery of the projection light. Since it is hard to happen that the workpiece cannot be recognized, the irradiation device is easy to use.

  In the present embodiment, the laser diode emits blue laser light. Thereby, the pattern irradiation apparatus 20 can measure the distance more accurately and can provide a good working environment to the worker. The reason for this is as follows. For example, a light source P1W for a projector manufactured by OSRAM is known.

  The light source P1W emits light with brightness of 500 lm for blue, 1250 lm for red, and 4150 lm for green. lm is a unit of luminous flux and is brightness in consideration of visibility. The radiant flux (unit W) of light that does not consider the visibility is calculated by the luminous flux (lm) = 683 × radiant flux (W) × Y stimulus value. When the conversion factor lm / W is calculated from the representative spectrum of each color, blue is 40 lm / W, red is 200 lm / W, and green is 480 lm / W. Therefore, the radiant flux is 12.5 W for blue, 6.3 W for red, and 8.6 W for green based on the luminous flux and the conversion factor. That is, the radiant flux is the highest in blue.

  The pattern irradiation apparatus 20 that irradiates an image pattern for distance measurement includes a light source that has a high radiant flux, which is a pure light output, rather than a luminous flux considering human eye sensitivity, that is, visibility. preferable. The blue laser diode can obtain a high radiant flux among the light sources sold as described above. Therefore, since the laser diode emits blue laser light, the pattern irradiation device 20 can illuminate the object 11 with high energy, and can accurately measure the distance even if the object 11 is black or the like.

  Blue is visible light. Therefore, since the laser diode emits blue laser light, the pattern irradiating device 20 can allow the operator to visually observe the illumination area, and can provide an environment in which the operator can easily adjust the illumination area. In addition, since the fluorescence uses blue laser light having a high radiant flux as excitation light, a high radiant flux can be obtained. Moreover, since fluorescence is also visible light, a favorable working environment can be provided to the worker.

  In this example, a laser diode is used as the light source 31, but it goes without saying that another light source such as an LED may be used.

  As described above, according to the pattern irradiation apparatus 20 according to the present embodiment, a high light output can be obtained, the size and cost can be reduced, and a projection image can be obtained without requiring complicated control. Switching is possible. Furthermore, the pattern irradiation apparatus 20 can provide a favorable working environment for the worker. In this example, the number of light sources 31 is one. However, the present invention is not limited to this, and a plurality of light sources 31 may be arranged side by side. In this example, by arranging a plurality of light sources 31, it is possible to easily increase the radiant flux of both blue light and fluorescence.

  FIG. 6A and FIG. 6B show a control example of the pattern irradiation apparatus 20. FIG. 6A will be described. The light source 31 is always ON. For the sake of simplicity, the size of the reflection area 62 and the transmission area 61 of the reflection / transmission wheel is the same, that is, the segment angles are each 180 °, but are not limited thereto. As an example, the pattern by the pattern portion 38 (referred to as pattern 1 in FIG. 6) is a random pattern that improves distance recognition accuracy, and the pattern by the pattern portion 47 (referred to as pattern 2 in FIG. 6) irradiates the work with high brightness. Plain to do. One rotation of the reflection / transmission wheel of the light guide 34 is defined as one cycle. During the time when the reflection area 62 of the reflection / transmission wheel is on the optical axis, the light emitted from the light source 31 irradiates the pattern 1. Therefore, since a random pattern is projected onto the projection surface, distance information can be obtained with high accuracy by photographing with a stereo camera or the like in synchronization with this.

  Next, the light emitted from the light source 31 irradiates the pattern unit 47 during the time when the transmission region 61 of the reflection / transmission wheel of the light guide unit 34 is on the optical axis. Therefore, a solid color is projected on the projection surface. By synchronizing with this and photographing with a stereo camera or the like, edge detection can be performed with high accuracy. By controlling as shown in FIG. 6A, the system can improve both the accuracy of distance recognition and edge detection, and the robot picking performed based on these information also has high accuracy. Of course, different cameras may be used for distance recognition and edge detection. With this system, it is possible to irradiate a work with a high output for both a random pattern and a solid color, so that even a work with a low reflectance such as a black work can be accurately recognized.

  Next, FIG. 6B will be described. In FIG. 6B, the light source 31 is turned on only during the time when the reflection area of the reflection / transmission wheel of the light guide 34 is on the optical axis. In a scene where only distance recognition is required, only a random pattern can be projected by controlling in this way. Further, since the light source 31 is turned off during the time when the transmission region 61 of the reflection / transmission wheel is on the optical axis, the lighting time of the light source 31 is shortened as a result, and the life of the light source 31 can be extended.

  Further, in the present embodiment, only the color of light to be projected can be obtained by making the pattern by the pattern portion 38 (pattern 1 in FIG. 6) and the pattern by the pattern portion 47 (pattern 2 in FIG. 6) the same. It can also be changed. For example, in distance recognition, patterns 1 and 2 are both random patterns, and by irradiating light with a wavelength having a high reflectance according to the spectral reflectance of the workpiece, a stereo camera or the like can capture a large amount of workpiece reflected light. It is possible to obtain high recognition accuracy.

  In addition to the reflective region 62 and the transmissive region 61, the light guide unit 34 may include a half mirror region. The half mirror region is, for example, a region that reflects 50% of light from the light source 31 and transmits 50%. For example, if the pattern portions 38 and 47 are different random patterns, a third random pattern obtained by synthesizing the pattern portion 38 and the pattern portion 47 may be projected by simultaneously guiding light to the transmitted light path and the reflected light path in the half mirror region. Is possible. By projecting an optimal pattern according to the workpiece, the pattern irradiation device 20 with high versatility is obtained.

(Embodiment 2)
FIG. 7 is an explanatory diagram of a configuration of the pattern irradiation apparatus 20 according to the second embodiment. The pattern irradiation apparatus 20 of this example is different from that of the first embodiment in that a movable fluorescent part 50 is provided with respect to the fluorescent part 41 of FIG. Therefore, in FIG. 7, components having functions similar to those in FIG. 4 will be described with the same reference numerals as those in FIG.

  The movable fluorescent part 50 is a reflective fluorescent part capable of changing a portion irradiated with light. The movable fluorescent part 50 emits fluorescence using light from the light source 31 that has passed through the dichroic mirror 43 as excitation light. The fluorescent light emitted from the movable fluorescent part 50 is reflected by the dichroic mirror 43 and the mirror 45 as in the first embodiment, and is made uniform by the light tunnel 46 to irradiate the pattern part 47. The pattern of the pattern part 47 is enlarged on the projection surface. Projected. The drive unit 51 changes a portion irradiated with light in the movable fluorescent unit 50.

  FIG. 8 is an explanatory diagram illustrating an example of the movable fluorescent unit 50 and the driving unit 51. The movable fluorescent part 50 includes, as an example, a substrate 50a and a phosphor 50c. The substrate 50a is a member that reflects light. For example, a reflective coating film such as a dielectric multilayer film or a metal film is formed on the surface thereof, and the substrate 50a is rotatable about the central axis 50b.

  The phosphor 50c is provided in a ring shape around the periphery of the substrate 50a. The phosphor 50c partially enters the light condensed by the condenser lens 42 and emits fluorescence using the incident light as excitation light.

  The drive unit 51 rotationally drives the movable fluorescent unit 50 around the central axis 50b of the substrate 50a. Thereby, the drive part 51 can change the part irradiated with the laser beam condensed by the condensing lens 42 in a ring-shaped fluorescent substance.

  As described above, the pattern irradiation apparatus 20 according to the second embodiment can change the portion of the movable fluorescent unit 50 that is irradiated with light. Thereby, the pattern irradiation apparatus 20 according to the second embodiment can prevent deterioration due to the laser beam being concentrated and irradiated on the same portion of the movable fluorescent part 50 for a long time.

  The movable fluorescent part 50 may not have a configuration in which a ring-shaped phosphor is rotatably provided. For example, the movable fluorescent portion 50 may have a configuration in which a long phosphor is provided so as to be reciprocally movable along the longitudinal direction. Moreover, the structure provided with the polygonal fluorescent substance or the elliptical fluorescent substance may be sufficient as the movable fluorescent part 50. FIG. Further, the movable fluorescent part 50 may have a configuration using phosphor ceramics instead of the configuration including the substrate 50a and the phosphor 50c.

(Embodiment 3)
FIG. 9 is an explanatory diagram of a configuration of the pattern irradiation apparatus 20 according to the third embodiment. The pattern irradiation apparatus 20 of the present example is different from the other embodiments in that it includes a light source 31a and a light source 31b having two different characteristics. The light source 31a is, for example, a blue laser diode. The light source 31b is, for example, a green LED.

  The optical path of the light emitted from the light source 31a will be described with reference to FIG. The light emitted from the light source 31 a is converted into a parallel light flux by the collimator lens 32, diffused by the transmission diffusion plate 36, and enters the light tunnel 37. The light incident on the light tunnel 37 is made uniform and irradiates the pattern portion 38. The dichroic mirror 39 transmits blue and reflects green. The light irradiated on the pattern unit 38 passes through the dichroic mirror 39 and is enlarged and projected on the projection surface by the projection optical system 40.

  Next, the optical path of the light emitted from the light source 31b will be described with reference to FIG. The light emitted from the light source 31 b is converted into a parallel light flux by the collimator lens 49 and enters the light tunnel 46. The light incident on the light tunnel 46 is made uniform and irradiates the pattern portion 47. Thereafter, the light is reflected by the dichroic mirror 39 and enlarged and projected by the projection optical system 40.

  The light sources 31a and 31b are not limited to this example. For example, the light source 31b may be a laser diode. In that case, uniform illumination light can be obtained by disposing the transmission diffusion plate 36 in front of the light tunnel 46. Further, if the wavelengths are different, the light sources 31a and 31b can be combined by the dichroic mirror 39 even if they have the same color. Moreover, even if one or both of the light sources 31a and 31b are ultraviolet light and infrared light, it is sufficient that a recognition device such as a stereo camera can take a picture.

  FIG. 10 shows an example of light source control in the third embodiment. As an example, the pattern by the pattern portion 38 (referred to as pattern 1 in FIG. 10) is a random pattern that improves the distance recognition accuracy, and the pattern by the pattern portion 47 (referred to as pattern 2 in FIG. 10) irradiates the work with high brightness. To be plain.

  First, FIG. 10A will be described. When the light source 31a is on and the light source 31b is off, a random pattern of pattern 1 is projected on the projection surface, and distance can be recognized by photographing with a stereo camera or the like in synchronization with this.

  Further, during the time when the light source 31b is ON and the light source 31a is OFF, a solid pattern by the pattern 2 is projected onto the projection surface, and the edge of the object 11 is captured by photographing with a stereo camera or the like in synchronization with this. Can be detected. The light source 31a and the light source 31b are controlled to be turned on periodically with a combination of turning on the light source 31a, turning off the light source 31b, turning on the light source 31b and turning off the light source 31a as one cycle.

  By controlling as shown in FIG. 10A, it becomes a system that can improve both the accuracy of distance recognition and edge detection, and the robot picking performed based on these information also becomes highly accurate.

  FIG. 10B is an example of switching the projection mode with the configuration of the third embodiment. In mode 1, the light source 31a is always turned on and the light source 31b is turned off. Therefore, mode 1 is a mode in which a random pattern is always projected. In mode 2, the light source 31a is always OFF and the light source 31b is ON. Therefore, mode 2 is a mode that always projects plain. In mode 3, both the light sources 31a and 31b are always ON. Therefore, mode 3 is a mode in which a random pattern and plain color are combined and projected.

  In mode 3, by superimposing a plain pattern on a random pattern, higher brightness illumination is possible than in mode 1, and distance can be recognized with high accuracy even for low-reflectivity workpieces. In mode 3, both patterns 1 and 2 may be plain. As a result, plain illumination with higher brightness than that in mode 2 can be obtained, and edge detection can be performed with high accuracy even for low-reflectance workpieces. The patterns 1 and 2 may be the same random pattern. As a result, the high-intensity illumination is realized, and the pattern transmission part transmits both the light from the light sources 31a and 31b, and the light shielding part shields both the light from the light sources 31a and 31b. Can do. The patterns 1 and 2 may be different random patterns. Thereby, in the mode 3, the 3rd random pattern which overlap | superposed each random pattern of the patterns 1 and 2 can be produced | generated.

  Since the mode can be switched depending on the work, that is, an optimal random pattern can be selected, the pattern irradiation device 20 with high versatility is obtained. In addition, since there is a light source that is turned off by changing the optimum mode depending on the scene, the life of the light source can be extended. Note that the mode 3 control described in FIG. 10B may be mounted in FIG.

(Embodiment 4)
FIG. 11 is an explanatory diagram of a configuration of the pattern irradiation apparatus according to the fourth embodiment. The pattern irradiating device 20 of this example is different from the other embodiments in that the light converging means 34b is used as the confluence means in the previous stage of the projection optical system 40. In this example, the light guides 34a and 34b are both reflecting / transmitting wheels.

  The optical path of the time when the reflective area 62 of the light guide part 34a is located on the optical axis of the light emitted from the light source will be described. The light from the light source 31 is converted into a parallel light beam by the collimator lens 32, condensed by the condenser lens 33, and reflected from the light guide 34 a. Thereafter, the collimator lens 35 converts the light into a parallel light beam, diffuses the light through the transmission diffusion plate 36, and makes the light tunnel 37 uniform to irradiate the pattern portion 38.

  While the reflection region 62 of the light guide 34a is located on the optical axis, the transmission region 61 of the light guide 34b is located on the optical axis. Therefore, the light irradiated on the pattern unit 38 is transmitted through the light guide unit 34b and enlarged and projected onto the projection surface by the projection optical system 40. In this example, the reflection segment angle of the light guide 34a and the transmission segment angle of the light guide 34b are equal, and the transmission segment angle of the light guide 34a and the reflection segment angle of the light guide 34b are equal.

  The optical path of the time when the transmissive area | region 61 of the light guide part 34a is located in the optical axis of the light radiate | emitted from a light source is demonstrated. The light transmitted through the light guide 34 a is converted into a parallel light beam by the collimator lens 48, is reflected by the mirrors 43 and 45, and enters the transmission diffusion plate 44. Here, the mirrors 43 and 45 are provided with a reflective coating film such as a dielectric multilayer film or a metal film that reflects light from the light source 31 with high efficiency. The light diffused by the transmissive diffusion plate 44 is made uniform by the light tunnel 46 and irradiates the pattern portion 47. While the transmission region 61 of the light guide 34a is located on the optical axis, the reflection region 62 of the light guide 34b is located on the optical axis. The light that irradiates the pattern portion 47 is reflected by the light guide portion 34 b and enlarged and projected by the projection optical system 40.

  In the present embodiment, both the pattern part 38 and the pattern part 47 are enlarged and projected onto the projection surface with the light from the light source 31. Therefore, if the light source 31 is, for example, a blue laser diode having a high radiant flux, both the pattern portion 38 and the pattern portion 47 can be projected onto the projection surface with high output. Further, since the light source 31 is disposed only at one place, it is possible to easily increase the output by arranging a plurality of light sources 31.

  Thus, it has the light guide part 34b as an optical path confluence | merging part. Thereby, it becomes possible to switch a projection image with one projection optical system 40.

  In addition, light guide part 34a, 34b is not restricted to this. A plate having a transmission region and a reflection region may be vibrated in a linear direction, or the optical path may be switched by a galvano mirror. The projected image can be switched by switching the optical path using a galvanometer mirror.

  FIG. 12 shows an example of light source control in the fourth embodiment. As an example, the pattern by the pattern portion 38 (referred to as pattern 1 in FIG. 12) is a random pattern that improves distance recognition accuracy, and the pattern by the pattern portion 47 (referred to as pattern 2 in FIG. 12) irradiates the work with high brightness. To be plain. As described above, while the reflection region of the reflection / transmission wheel 1 (light guide 34a) is positioned on the optical axis, the transmission region of the reflection / transmission wheel 2 (light guide 34b) is positioned on the optical axis. Thus, while the transmission region of the reflection / transmission wheel 1 is located on the optical axis, the pattern 1 and the pattern 2 are switched and projected by performing synchronous control so that the reflection region of the reflection / transmission wheel 2 is located on the optical axis. be able to. Further, the life of the light source 31 can be extended by controlling the light source 31 to project only one of the pattern portions 38 and 47 as shown in FIG. 6B.

  Note that the method of combining light in the light guide unit 34b described in this embodiment may be applied to the third embodiment. Thereby, even if the light source 31a (referred to as the light source 1 in FIG. 10) and the light source 31b (referred to as the light source 2 in FIG. 10) are the same, the switching between the pattern 1 and the pattern 2 is possible.

(Embodiment 5)
FIG. 13 is a diagram illustrating a configuration of the pattern irradiation apparatus 20 according to the fifth embodiment. The pattern irradiation apparatus 20 of this example is different from the other embodiments in that it includes two projection optical systems 40a and 40b. In this example, the light guide 34 is a reflection / transmission wheel.

  An optical path when the reflection region 62 of the light guide 34 is located on the optical axis will be described. The light source 31 is, for example, a blue laser diode. The light emitted from the light source 31 is converted into a parallel light flux by the collimator lens 32, condensed by the condenser lens 33, and incident on the light guide unit 34. After being reflected by the light guide unit 34, it is converted into a parallel light beam by the collimator lens 35 and diffused by the transmission diffusion plate 36. The diffused light is made uniform by the light tunnel 37 and irradiates the pattern 38. The pattern 38 is enlarged and projected on the projection surface by the projection optical system 40a.

  Next, an optical path when the transmission region 61 of the light guide 34 is located on the optical axis will be described. The light transmitted through the light guide unit 34 is converted into a parallel light beam by the collimator lens 48 and reflected by the mirror 45. Here, a reflective coating film such as a dielectric multilayer film or a metal film that reflects light from the light source 31 with high efficiency is formed on the mirror 45. The light reflected from the mirror 45 is diffused by the transmission diffusion plate 44, is uniformed by the light tunnel 46, and irradiates the pattern portion 47. The pattern of the pattern unit 47 is enlarged and projected on the projection surface by the projection optical system 40b.

  Since the projection optical systems 40a and 40b are provided in the present embodiment, the magnification of the pattern portions 38 and 47 can be changed by using projection optical systems having different specifications. By performing this and the control shown in FIG. 6B, an optimal projection size can be selected depending on the environment to be used. Of course, by making the pattern portion 38 and the pattern portion 47 different from each other as described above, it is possible to perform high-precision robot picking by combining, for example, distance recognition and edge detection.

  It is also conceivable that the light guide unit 34 includes a half mirror region in addition to the reflective region and the transmissive region. The half mirror region is, for example, a region that reflects 50% of light from the light source 31 and transmits 50%. Thereby, it is also possible to simultaneously guide light to the projection optical systems 40a and 40b. It is also possible to project a third random pattern (composite pattern) in which the pattern portion 38 and the pattern portion 47 are combined by setting the pattern portion 38 and the pattern portion 47 to different random patterns. By projecting an optimal pattern according to the workpiece, the pattern irradiation device 20 with high versatility is obtained.

  As described above, in each of the above-described embodiments, the light emitted from the light source 31 is guided to different optical paths by the optical path switching mechanism, and enlarged and projected after the different pattern portions 38 and 47 are irradiated with the light in the respective optical paths. Therefore, the projection image can be switched without requiring complicated control as in the case of using a DMD (Digital Mirror Device) or a liquid crystal panel. That is, a high light output can be obtained, the size and cost can be reduced, and projection images can be switched without requiring complicated control.

  By using a laser diode that is a point light source for the light source 31, optical components such as a lens can be reduced, and a compact irradiation device can be obtained.

  Further, the light source 31 is a blue laser diode, and a light source having a relatively high radiant flux can be used to provide a high output irradiation device.

  The light guide unit 34 is a reflection / transmission wheel having a reflection region 62 and a transmission region 61, and the projection image can be switched by switching the optical path by rotating the wheel.

  Furthermore, it has the 2nd light source in the optical path different from the light source 31, and the light guide part 34 carries out lighting control of two light sources. Images to be projected can be switched by lighting control of the two light sources.

  The light guide unit 34 is a plate having a reflection region and a transmission region, and vibrates in a direction orthogonal to the boundary between the transmission region and the reflection region. The light path can be switched by vibrating the plate, and the projection image can be switched.

  The light guide 34 further has time to guide light to both the reflected light path and the transmitted light path. A third pattern can be generated by simultaneously irradiating a plurality of patterns.

  The light guide 34 is a galvanometer mirror. The optical path can be switched by the galvanometer mirror, and the projection image can be switched.

  Since each optical path switched by the light guide unit 34 has a projection optical system, the projected image can be switched. Furthermore, if the projection optical system has a different specification, the magnification can be changed in each optical path.

  A phosphor is provided on at least one of the optical paths switched by the light guide 34. Since the color of the projection light can be changed, a large amount of light can be captured by the recognition unit 105 by irradiating light with high reflectance according to the spectral reflectance of the workpiece, and high-accuracy recognition is possible. . Further, the merging can be easily performed by using a dichroic mirror at the optical path merging portion.

  The optical path merging section (see the light guide section 34b in FIG. 11) is a reflection / transmission wheel, and can project a plurality of images using the light of the light source synchronized with the light guide section 34a as it is, so that an efficient irradiation device It becomes.

  Further, the system includes the pattern irradiation device 20, the imaging processing unit 104, and the recognition unit 105 described above. The imaging processing unit 104 images the object 11 that is the projection surface irradiated with light by the pattern irradiation device 20, and performs predetermined image processing. The recognizing unit 105 measures the distance to the target object 11 from the captured image and detects the edge of the target object. This system makes it possible to accurately measure the distance to the object and / or the edge.

  Further, the system recognizes the robot (operation unit) 13 that operates the object 11 and the position and orientation of the object 11, and controls the operation of the robot 13 based on the position and orientation of the object 11. And a robot control unit 106 for operating the object. By this system, it becomes a highly accurate robot picking system based on the information which measured the distance to the target object 11, the edge, or both accurately.

  In addition, in order to make the pattern suitable for processing the image acquired by imaging the projected pattern with the imaging device, such as the pattern suitable for distance measurement and the pattern suitable for improving the accuracy of edge detection, the target to be recognized It may be switched depending on the size, material, color, etc. of the object 11.

  By the way, the program executed in the present embodiment is provided by being incorporated in advance in a ROM or the like. The above program is recorded in a computer-readable recording medium such as a CD-ROM, a flexible disk (FD), a CD-R, a DVD (Digital Versatile Disk), etc. in a file that can be installed or executed. May be provided.

  Furthermore, the program executed in the present embodiment may be configured to be provided by being stored on a computer connected to a network such as the Internet and downloaded via the network. In addition, the program executed in the present embodiment may be configured to be provided or distributed via a network such as the Internet.

  The program executed in the present embodiment has a module configuration including the above-described units. As actual hardware, a CPU (processor) reads out a program from the ROM and executes the program, so that each unit is loaded on the main storage device, and each unit is generated on the main storage device.

DESCRIPTION OF SYMBOLS 10 Handling system 11 Target object 13 Robot 20 Pattern irradiation apparatus 21 Three-dimensional measuring apparatus 22 Recognition apparatus 23 Robot controller 31, 31a, 31b Light source 34, 34a, 34b Light guide part 38, 47 Pattern part 39, 43 Dichroic mirror 40, 40a , 40b Projection optical system 41 Fluorescent unit 50 Movable fluorescent unit 51 Drive unit 61 Transmission region 62 Reflection region 101 Light source control unit 102 Switching unit 103 Irradiation control unit 104 Imaging processing unit 105 Recognition unit 106 Robot control unit

JP 2006-119440 A

Claims (16)

A light source control unit for controlling lighting of the light source;
A first optical path that guides light from the light source to a first pattern portion to generate pattern light, and a light pattern from the light source to a second pattern portion different from the first pattern portion to generate pattern light. A switching unit that switches between a second optical path different from the first optical path to
An irradiation control unit that irradiates and enlarges the pattern light generated by the first pattern unit and the second pattern unit to the projection surface via a projection optical system at a predetermined timing, and
A pattern irradiation apparatus comprising: The switching unit is a rotating body having a reflection region surface and a transmission region surface,
2. The switch unit according to claim 1, wherein the switching unit switches the first optical path and the second optical path by forming a reflected optical path and a transmitted optical path by rotating the rotating body. Pattern irradiation device. The switching unit is a plate-like body having a reflection region surface and a transmission region surface,
The switching unit vibrates the light of the light source in a direction perpendicular to the boundary between the transmission region surface and the reflection region surface of the plate-like body to form a reflection optical path and a transmission optical path, thereby forming the first optical path and the first optical path The pattern irradiation apparatus according to claim 1, wherein the pattern irradiation apparatus switches between two optical paths.   The pattern irradiation apparatus according to claim 1, wherein the light source is a laser diode.   The pattern irradiation apparatus according to claim 1, wherein the light source is a blue laser diode.   6. The pattern irradiation apparatus according to claim 1, wherein the light source is provided in each of the first optical path and the second optical path.   The switching unit simultaneously guides light to both the reflected optical path and the transmitted optical path, and simultaneously irradiates the first pattern unit and the second pattern unit, and is generated by the first pattern unit and the second pattern unit. The pattern irradiation apparatus according to claim 1, wherein a combined pattern is generated by combining the patterns to be processed.   The pattern irradiation apparatus according to claim 1, wherein the switching unit is a galvanometer mirror.   Furthermore, it has an optical path confluence | merging part which merges the light which passed through the said 1st optical path and the said 2nd optical path, and injects into the said projection optical system, It is any one of Claims 1-8 characterized by the above-mentioned. Pattern irradiation device.   The pattern irradiation apparatus according to claim 1, further comprising a projection optical system in each of the first optical path and the second optical path.   The pattern irradiation apparatus according to claim 9, wherein a phosphor is included in at least one of the first optical path and the second optical path.   The pattern irradiation apparatus according to claim 9, wherein the optical path merging unit is a reflection / transmission wheel that is rotationally driven in synchronization with an operation of the switching unit. The pattern irradiation apparatus according to any one of claims 1 to 12,
An imaging processing unit that images the object that is the projection surface irradiated with light by the pattern irradiation device and performs predetermined image processing;
A recognition unit that performs distance detection to the object or edge detection of the object or both from the image that has been subjected to the photographing process;
A system comprising: An operation unit for operating an object;
An operation control unit that recognizes the position and orientation of the object by the recognition unit, controls the operation of the operation unit based on the position and orientation of the object, and causes the operation unit to operate the object;
14. The system of claim 13, comprising: A light source control process for controlling lighting of the light source;
A first optical path that guides light from the light source to a first pattern portion to generate pattern light, and a light pattern from the light source to a second pattern portion different from the first pattern portion to generate pattern light. A switching step of switching between a second optical path different from the first optical path;
An irradiation control step of magnifying and irradiating pattern light generated by the first pattern unit and the second pattern unit to the projection surface via a projection optical system, respectively, at a predetermined timing;
An imaging process step of imaging the object that is the projection surface irradiated with the pattern light and performing predetermined image processing;
A recognition step of measuring a distance from the photographed image to the object or detecting an edge of the object or both;
An operation control step of recognizing the position and orientation of the object through the recognition step, controlling the operation of the operation unit based on the position and orientation of the object, and causing the operation unit to operate the object;
The operation method characterized by including. A light source control step for controlling lighting of the light source;
A first optical path that guides light from the light source to a first pattern portion to generate pattern light, and a light pattern from the light source to a second pattern portion different from the first pattern portion to generate pattern light. A switching step of switching between a second optical path different from the first optical path;
An irradiation control step of magnifying and irradiating the projection surface with the pattern light generated by the first pattern unit and the second pattern unit at a predetermined timing via the projection optical system, respectively,
An imaging process step of imaging the object that is the projection surface irradiated with the pattern light and performing predetermined image processing;
A recognition step for performing distance detection to the target object or edge detection of the target object or both from the photographed image;
An operation control step of recognizing the position and orientation of the object by the recognition step, controlling the operation of the operation unit based on the position and orientation of the object, and causing the operation unit to operate the object;
A program that causes a computer to execute.

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