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JP2016135504A - Patterning method and patterning workpiece - Google Patents

Patterning method and patterning workpiece Download PDF

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Publication number
JP2016135504A
JP2016135504A JP2015011778A JP2015011778A JP2016135504A JP 2016135504 A JP2016135504 A JP 2016135504A JP 2015011778 A JP2015011778 A JP 2015011778A JP 2015011778 A JP2015011778 A JP 2015011778A JP 2016135504 A JP2016135504 A JP 2016135504A
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film
translucent member
translucent
laser beam
patterning method
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JP2016135504A5 (en
JP6474623B2 (en
Inventor
良次 青山
Ryoji Aoyama
良次 青山
村松 健次
Kenji Muramatsu
健次 村松
哲也 森本
Tetsuya Morimoto
哲也 森本
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Nidec Instruments Corp
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Nidec Sankyo Corp
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Priority to JP2015011778A priority Critical patent/JP6474623B2/en
Priority to CN201610033573.3A priority patent/CN105817765B/en
Publication of JP2016135504A publication Critical patent/JP2016135504A/en
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/361Removing material for deburring or mechanical trimming

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Laser Beam Processing (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Laminated Bodies (AREA)
  • Surface Treatment Of Optical Elements (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a patterning method capable of making difficult generation of pinholes on a remaining film even when the film formed in a translucent member is patterned by a laser beam, and a patterning workpiece.SOLUTION: A film 3 formed on a first surface 21 of a translucent member 2 is patterned by a laser beam L1 to form a patterning workpiece 1. In this case, from the position of the removed film 3, the laser beam L1 enters from the first surface 21 of the translucent member 2 to move toward a second surface 22. An elastic member 50 is disposed on the second surface 22, and no air layer is provided between the second surface 22 of the translucent member 2 and one surface 51 of the elastic member 50. Thus, the elastic member 50 functions as a reflection suppressor 4 (reflection suppression layer 5) for suppressing reflection of the laser beam L1 on the second surface 22. Thus, even when the laser beam L1 reaches the second surface 22, the laser beam L1 is difficult to be reflected, and enters the elastic member 50.SELECTED DRAWING: Figure 1

Description

本発明は、レーザビームにより膜を除去するパターニング方法、および当該パターニング方法により製造されたパターニング加工物品に関するものである。   The present invention relates to a patterning method for removing a film with a laser beam, and a patterning article manufactured by the patterning method.

ベースに所定の膜パターンが形成された物品を製造する方法として、印刷や蒸着等の方法でベースに膜を形成した後、膜にレーザビームを照射して膜の一部を除去する方法が提案されている(特許文献1参照)。   As a method of manufacturing an article with a predetermined film pattern formed on the base, a method is proposed in which a film is formed on the base by a method such as printing or vapor deposition, and then a part of the film is removed by irradiating the film with a laser beam. (See Patent Document 1).

特開2000−296698号公報JP 2000-296698 A

しかしながら、図7(a)に示す物品のように、ベースが透光性部材2からなる場合、図7(b)に示す成膜工程で膜3を形成した後、図7(c)に示すレーザビーム照射工程で、透光性部材2の第1面21の側からレーザビームL1を照射すると、残った膜3にピンホールが発生しやすいという問題点がある。すなわち、レーザビームL1を照射した際に、図7(d)に示すように、レーザビームL1が透光性部材2に入射すると、レーザビームL1が透光性部材2の第2面22(裏面)で反射し、膜3を残すべき領域30にも強度が大きなレーザビームL1が到達して、ピンホール3aを発生させてしまう。特に、透光性部材2の第2面22に、側面251が傾斜面になっている凸部25が形成されている場合、レーザビームL1を垂直に照射した場合でも、透光性部材2に入射したレーザビームL1が凸部25の側面251で反射し、膜3を残すべき領域に到達してしまい、ピンホール3aが発生する。また、図8に示すように、透光性部材2の第2面22が平坦である場合でも、透光性部材2の姿勢を変えながらレーザビームL2を照射すると、斜めに入射したレーザビームL2が第2面22で反射し、膜3を残すべき領域30にピンホール3bを形成してしまう。   However, in the case where the base is made of the translucent member 2 as in the article shown in FIG. 7A, the film 3 is formed in the film forming process shown in FIG. When the laser beam L1 is irradiated from the first surface 21 side of the translucent member 2 in the laser beam irradiation step, there is a problem that pinholes are easily generated in the remaining film 3. That is, when the laser beam L1 is irradiated and the laser beam L1 is incident on the translucent member 2 as shown in FIG. 7D, the laser beam L1 is incident on the second surface 22 (rear surface) of the translucent member 2. ) And the laser beam L1 having a high intensity reaches the region 30 where the film 3 should be left, and the pinhole 3a is generated. In particular, in the case where the second surface 22 of the translucent member 2 is provided with a convex portion 25 whose side surface 251 is an inclined surface, even when the laser beam L1 is irradiated vertically, the translucent member 2 is exposed. The incident laser beam L1 is reflected by the side surface 251 of the convex portion 25, reaches the region where the film 3 should be left, and a pinhole 3a is generated. Further, as shown in FIG. 8, even when the second surface 22 of the translucent member 2 is flat, when the laser beam L2 is irradiated while changing the posture of the translucent member 2, the laser beam L2 incident obliquely is irradiated. Is reflected by the second surface 22 and forms the pinhole 3b in the region 30 where the film 3 should be left.

以上の問題点に鑑みて、本発明の課題は、透光性部材に形成した膜をレーザビームによってパターニングする場合でも、残った膜にピンホールが発生しにくいパターニング方法、および当該パターニング方法により製造されたパターニング加工物品を提供することにある。   In view of the above problems, an object of the present invention is to provide a patterning method in which pinholes hardly occur in the remaining film even when the film formed on the translucent member is patterned by a laser beam, and to be manufactured by the patterning method. An object of the present invention is to provide a patterned processed article.

上記課題を解決するために、本発明に係るパターニング方法は、透光性部材の第1面に膜を形成する成膜工程と、前記第1面の側から前記膜にレーザビームを照射して前記膜の一部を除去するレーザ照射工程と、を有し、前記レーザ照射工程では、前記透光性部材の前記第1面とは反対側の第2面に、当該第2面での前記レーザビームの反射を抑制する反射抑制体を設けておくことを特徴とする。   In order to solve the above-described problems, a patterning method according to the present invention includes a film forming process for forming a film on a first surface of a translucent member, and irradiating the film with a laser beam from the first surface side. A laser irradiation step of removing a part of the film, and in the laser irradiation step, the second surface opposite to the first surface of the translucent member has the second surface on the second surface. A reflection suppressor that suppresses reflection of the laser beam is provided.

本発明では、透光性部材の第1面に形成した膜をレーザビームによってパターニングする際、透光性部材の第1面とは反対側の第2面に、第2面でのレーザビームの反射を抑制する反射抑制体を設けておくため、レーザビームが透光性部材に入射して透光性部材の第2面に到達した場合でも第2面での反射が発生しにくい。このため、膜を残すべき領域に強度が大きなレーザビームが到達するという事態が発生しにくいので、ピンホールの発生
を抑制することができる。
In the present invention, when the film formed on the first surface of the translucent member is patterned by the laser beam, the laser beam on the second surface is formed on the second surface opposite to the first surface of the translucent member. Since the reflection suppressing body that suppresses reflection is provided, even when the laser beam is incident on the translucent member and reaches the second surface of the translucent member, reflection on the second surface hardly occurs. For this reason, it is difficult for a high-intensity laser beam to reach the region where the film should be left, so that the occurrence of pinholes can be suppressed.

本発明において、前記反射抑制体は、前記第2面に密着した状態で重ねられた反射抑制層である構成を採用することができる。かかる構成によれば、透光性部材の第2面が空気層と接している場合に比して、透光性部材の第2面側の界面での屈折率差が小さい。従って、透光性部材に入射したレーザビームは、透光性部材の第2面での反射が抑制され、反射抑制層に入射する。また、反射抑制層の透光性部材の反対側でレーザビームが反射した場合でも、透光性部材の第1面から遠い位置で反射する。また、反射抑制層の透光性部材の反対側では、レーザが反射するとしても、正反射せずに散乱となりやすい。従って、膜を残すべき領域に強度が大きなレーザビームが到達するという事態が発生しにくいので、ピンホールの発生を抑制することができる。   In the present invention, it is possible to adopt a configuration in which the reflection suppressing body is a reflection suppressing layer that is stacked in close contact with the second surface. According to such a configuration, the refractive index difference at the interface on the second surface side of the translucent member is small as compared with the case where the second surface of the translucent member is in contact with the air layer. Therefore, the laser beam that has entered the translucent member is suppressed from being reflected from the second surface of the translucent member and is incident on the antireflection layer. Further, even when the laser beam is reflected on the opposite side of the translucent member of the reflection suppressing layer, it is reflected at a position far from the first surface of the translucent member. Also, on the opposite side of the translucent member of the reflection suppressing layer, even if the laser reflects, it does not reflect regularly but tends to scatter. Accordingly, it is difficult for a high intensity laser beam to reach the region where the film should be left, so that the generation of pinholes can be suppressed.

この場合、前記反射抑制層は、例えば、前記第2面に密着した状態で重ねられた透光性の弾性部材である。   In this case, the reflection suppression layer is, for example, a translucent elastic member that is stacked in close contact with the second surface.

本発明において、前記弾性部材は、一方面に前記透光性部材に向けて突出した突出部を備え、前記弾性部材は、前記突出部が押し潰された状態で前記一方面が前記第2面に密着していることが好ましい。かかる構成によれば、透光性部材の第2面と弾性部材との間に空気層が介在しにくいので、第2面での反射が発生しにくい。   In the present invention, the elastic member includes a protruding portion that protrudes toward the translucent member on one surface, and the elastic member is configured such that the one surface is the second surface in a state where the protruding portion is crushed. It is preferable that it adheres closely. According to such a configuration, an air layer is unlikely to intervene between the second surface of the translucent member and the elastic member, so that reflection on the second surface is unlikely to occur.

本発明において、前記透光性部材に向けて突出した突出部を一方面に備えた支持部材を準備しておき、前記弾性部材は、前記支持部材の前記一方面と前記透光性部材との間で弾性変形している構成を採用してもよい。かかる構成によれば、透光性部材の第2面と弾性部材との間に空気層が介在しにくいので、第2面での反射が発生しにくい。   In the present invention, a support member provided on one surface with a protruding portion protruding toward the light transmissive member is prepared, and the elastic member is formed by the one surface of the support member and the light transmissive member. You may employ | adopt the structure elastically deformed between. According to such a configuration, an air layer is unlikely to intervene between the second surface of the translucent member and the elastic member, so that reflection on the second surface is unlikely to occur.

本発明において、前記透光性部材は、側面が傾斜面になっている凸部を前記第2面に備え、前記透光性部材は、前記弾性部材の前記透光性部材側の面が前記凸部に沿って密着するように前記弾性部材に向けて押圧されていることが好ましい。かかる構成によれば、透光性部材の第2面と弾性部材との間に空気層が介在しにくいので、第2面での反射が発生しにくい。   In the present invention, the translucent member includes a convex portion whose side surface is an inclined surface on the second surface, and the translucent member has a surface on the translucent member side of the elastic member. It is preferable that the elastic member is pressed toward the elastic member so as to be in close contact with the convex portion. According to such a configuration, an air layer is unlikely to intervene between the second surface of the translucent member and the elastic member, so that reflection on the second surface is unlikely to occur.

本発明において、前記透光性部材は、側面が傾斜面になっている凸部を前記第2面に備え、前記弾性部材は、前記透光性部材側の面に、前記凸部が嵌る凹部を備えていることが好ましい。かかる構成によれば、透光性部材の第2面と弾性部材との間に空気層が介在しにくいので、第2面での反射が発生しにくい。   In the present invention, the translucent member includes a convex portion whose side surface is an inclined surface on the second surface, and the elastic member is a concave portion in which the convex portion is fitted on the surface of the translucent member. It is preferable to provide. According to such a configuration, an air layer is unlikely to intervene between the second surface of the translucent member and the elastic member, so that reflection on the second surface is unlikely to occur.

本発明において、前記反射抑制体は、前記第2面に積層された透光膜である構成を採用してもよい。   In the present invention, the reflection suppressing body may be configured to be a translucent film laminated on the second surface.

本発明においては、例えば、前記反射抑制層の屈折率をnaとし、前記透光性部材の屈折率をnbとしたとき、屈折率na、nbは、以下の関係
nb−0.3 ≦ na ≦ nb+0.2
を満たしている。かかる構成によれば、透光性部材と反射抑制層との屈折率差が小さいので、透光性部材の第2面での反射を抑制することができる。
In the present invention, for example, when the refractive index of the reflection suppressing layer is na and the refractive index of the translucent member is nb, the refractive indexes na and nb have the following relationship:
nb−0.3 ≦ na ≦ nb + 0.2
Meet. According to this configuration, since the difference in refractive index between the translucent member and the reflection suppressing layer is small, reflection on the second surface of the translucent member can be suppressed.

本発明において、前記反射抑制体は、前記第2面に形成された散乱用凹凸であってもよい。かかる構成によれば、透光性部材の第2面での反射が発生しにくい。   In the present invention, the reflection suppressing body may be scattering irregularities formed on the second surface. According to such a configuration, reflection on the second surface of the translucent member is unlikely to occur.

本発明において、前記透光性部材は、例えば、透光性の樹脂製部材である。   In the present invention, the translucent member is, for example, a translucent resin member.

本発明において、前記膜は、例えば、蒸着膜を含む膜である。   In the present invention, the film is, for example, a film including a vapor deposition film.

本発明においては、前記反射抑制体を、パターニング加工後に除去する構成、およびパターニング加工後も除去せずに残した構成を採用することができる。   In the present invention, it is possible to adopt a configuration in which the reflection suppressing body is removed after patterning and a configuration in which the reflection suppressing body is left without being removed after patterning.

後者の場合、パターニング加工物品は、透光性部材と、該透光性部材の第1面でパターニングされた膜と、前記透光性部材の前記第1面とは反対側の第2面に形成され、前記第1面側から入射したレーザビームの前記第2面での反射を抑制する反射抑制体と、を有することを特徴とする。   In the latter case, the patterned article is formed on the translucent member, the film patterned on the first surface of the translucent member, and the second surface opposite to the first surface of the translucent member. And a reflection suppressing body that suppresses reflection of the laser beam incident from the first surface side on the second surface.

かかるパターニング加工物品において、前記反射抑制体は、例えば、前記第2面に積層された透光膜である。   In the patterned processed article, the reflection suppressing body is, for example, a light-transmitting film laminated on the second surface.

本発明に係るパターニング加工物品において、前記反射抑制体は、前記第2面に形成された散乱用凹凸であってもよい。   In the patterned article according to the present invention, the reflection suppressing body may be scattering irregularities formed on the second surface.

本発明では、透光性部材の第1面に形成した膜をレーザビームによってパターニングする際、透光性部材の第1面とは反対側の第2面に、第2面でのレーザビームの反射を抑制する反射抑制体を設けておくため、レーザビームが透光性部材に入射して透光性部材の第2面に到達した場合でも第2面での反射が発生しにくい。このため、膜を残すべき領域に強度が大きなレーザビームが到達するという事態が発生しにくいので、ピンホールの発生を抑制することができる。   In the present invention, when the film formed on the first surface of the translucent member is patterned by the laser beam, the laser beam on the second surface is formed on the second surface opposite to the first surface of the translucent member. Since the reflection suppressing body that suppresses reflection is provided, even when the laser beam is incident on the translucent member and reaches the second surface of the translucent member, reflection on the second surface hardly occurs. For this reason, it is difficult for a high-intensity laser beam to reach the region where the film should be left, so that the occurrence of pinholes can be suppressed.

本発明の実施の形態1に係るパターニング方法の説明図である。It is explanatory drawing of the patterning method which concerns on Embodiment 1 of this invention. 本発明の実施の形態1の変形例1に係るパターニング方法の説明図である。It is explanatory drawing of the patterning method which concerns on the modification 1 of Embodiment 1 of this invention. 本発明の実施の形態1の変形例2に係るパターニング方法の説明図である。It is explanatory drawing of the patterning method which concerns on the modification 2 of Embodiment 1 of this invention. 本発明の実施の形態1の変形例3に係るパターニング方法の説明図である。It is explanatory drawing of the patterning method which concerns on the modification 3 of Embodiment 1 of this invention. 本発明の実施の形態2に係るパターニング方法の説明図である。It is explanatory drawing of the patterning method which concerns on Embodiment 2 of this invention. 本発明の実施の形態3に係るパターニング方法の説明図である。It is explanatory drawing of the patterning method which concerns on Embodiment 3 of this invention. 本発明の参考例に係るパターニング方法の説明図である。It is explanatory drawing of the patterning method which concerns on the reference example of this invention. 本発明の別の参考例に係るパターニング方法の説明図である。It is explanatory drawing of the patterning method which concerns on another reference example of this invention.

図面を参照して、本発明の実施の形態について説明する。   Embodiments of the present invention will be described with reference to the drawings.

[実施の形態1]
図1は、本発明の実施の形態1に係るパターニング方法の説明図である。図1(a)は、パターニング加工物品の断面図であり、図1(b)〜(d)は、工程断面図である。
[Embodiment 1]
FIG. 1 is an explanatory diagram of a patterning method according to Embodiment 1 of the present invention. FIG. 1A is a cross-sectional view of a patterned article, and FIGS. 1B to 1D are process cross-sectional views.

図1(a)に示すパターニング加工物品1は、板状の透光性部材2と、透光性部材2の第1面21でパターニングされた膜3とを有している。透光性部材2は、第1面21に凹部210が形成されており、膜3は、凹部210の底部から除去されている。このため、膜3は、凹部210の周りを囲むように形成されている。また、透光性部材2は、第2面22に、側面251が傾斜面になっている複数の凸部25が形成されている。   The patterned processed article 1 shown in FIG. 1A has a plate-like translucent member 2 and a film 3 patterned on the first surface 21 of the translucent member 2. The translucent member 2 has a recess 210 formed on the first surface 21, and the film 3 is removed from the bottom of the recess 210. For this reason, the film 3 is formed so as to surround the recess 210. The translucent member 2 has a plurality of convex portions 25 on the second surface 22 whose side surfaces 251 are inclined surfaces.

透光性部材2は、ポリカーボネート、アクリル樹脂等の透光性樹脂や、ガラス等からなる。本形態において、透光性部材2は、ポリカーボネートからなる。膜3は、塗装膜や蒸着膜、または塗装膜と蒸着膜を組み合わせた膜からなる。本形態において、膜3は、アル
ミニウム等の金属の蒸着膜からなる。
The translucent member 2 is made of translucent resin such as polycarbonate or acrylic resin, glass or the like. In this embodiment, the translucent member 2 is made of polycarbonate. The film 3 is made of a coating film, a vapor deposition film, or a film obtained by combining a paint film and a vapor deposition film. In this embodiment, the film 3 is a vapor deposition film of a metal such as aluminum.

パターニング加工物品1は、表面(第1面21)が膜3によって装飾された装飾品からなり、第2面22側から入射する光は、凸部25で屈折して、第1面21のうち、膜3が除去された凹部210の底部から出射される。   The patterned article 1 is made of a decorative article whose surface (first surface 21) is decorated with the film 3, and light incident from the second surface 22 side is refracted by the convex portion 25, and is out of the first surface 21. The light is emitted from the bottom of the recess 210 from which the film 3 has been removed.

かかるパターニング加工物品1は、図1(b)〜(d)に示すパターニング方法によって製造される。具体的には、図1(b)に示す透光性部材2を金型成形により製造した後、成膜工程では、蒸着によって第1面21にアルミニウム膜からなる膜3を形成する。その際、マスク蒸着法を使用して、膜3を凹部210の周り、および凹部210の底部の縁に形成する。一方、シリコーン樹脂、シリコーンゴム、ウレタンゴム等からなる透光性の弾性部材50を準備しておく。   Such a patterned article 1 is manufactured by the patterning method shown in FIGS. Specifically, after the translucent member 2 shown in FIG. 1B is manufactured by molding, a film 3 made of an aluminum film is formed on the first surface 21 by vapor deposition in the film forming step. In that case, the film | membrane 3 is formed in the edge of the bottom part of the recessed part 210 around the recessed part 210 using a mask vapor deposition method. On the other hand, a translucent elastic member 50 made of silicone resin, silicone rubber, urethane rubber or the like is prepared.

次に、図1(c)に示すレーザ照射工程では、支持部材9によって弾性部材50を支持した後、弾性部材50の一方面51に透光性部材2を重ね、弾性部材50の透光性部材2側の一方面51を透光性部材2の第2面22に密着させる。その際、矢印Fで示すように、透光性部材2を弾性部材50に向けて押圧し、弾性部材50の透光性部材2側の一方面51を凸部25に沿って確実に密着させることが好ましい。かかる構成によれば、透光性部材2の第2面22と弾性部材50の一方面51との間には空気層が介在しにくい。この状態で、透光性部材2の第1面21の側から膜3にレーザビームL1を照射し、図1(d)に示すように、膜3の一部を除去する。本形態では、膜3のうち、凹部210の底部に形成されている部分にレーザビームL1を照射して、膜3を除去する。   Next, in the laser irradiation process shown in FIG. 1C, after the elastic member 50 is supported by the support member 9, the translucent member 2 is overlapped on the one surface 51 of the elastic member 50, and the translucent property of the elastic member 50 is reached. The one surface 51 on the member 2 side is brought into close contact with the second surface 22 of the translucent member 2. At that time, as indicated by an arrow F, the translucent member 2 is pressed toward the elastic member 50, and the one surface 51 on the translucent member 2 side of the elastic member 50 is securely adhered along the convex portion 25. It is preferable. According to this configuration, an air layer is unlikely to intervene between the second surface 22 of the translucent member 2 and the one surface 51 of the elastic member 50. In this state, the laser beam L1 is irradiated to the film 3 from the first surface 21 side of the translucent member 2, and a part of the film 3 is removed as shown in FIG. In this embodiment, the film 3 is removed by irradiating a portion of the film 3 formed at the bottom of the recess 210 with the laser beam L1.

ここで、弾性部材50の屈折率をnaとし、透光性部材2の屈折率をnbとしたとき、屈折率na、nbは、以下の関係
nb−0.3 ≦ na ≦ nb+0.2
を満たしている。本形態において、透光性部材2は、ポリカーボネートであり、透光性部材2の屈折率nbは、約1.59である。一方、弾性部材50は、シリコーン樹脂製であり、屈折率naは1.43である。従って、上記の条件式を満たしている。
Here, when the refractive index of the elastic member 50 is na and the refractive index of the translucent member 2 is nb, the refractive indexes na and nb have the following relationship:
nb−0.3 ≦ na ≦ nb + 0.2
Meet. In this embodiment, the translucent member 2 is polycarbonate, and the refractive index nb of the translucent member 2 is about 1.59. On the other hand, the elastic member 50 is made of silicone resin, and the refractive index na is 1.43. Therefore, the above conditional expression is satisfied.

このようなパターニング方法では、透光性部材2の第1面21に形成した膜3をレーザビームL1によってパターニングする際、図1(d)に示すように、膜3を除去した位置からレーザビームL1が透光性部材2の第1面21から入射し、第2面22に向かう。ここで、第2面22には、弾性部材50が配置されており、透光性部材2の第2面22と弾性部材50の一方面51との間には空気層が介在しにくい。このため、弾性部材50は、第2面22でのレーザビームL1の反射を抑制する反射抑制体4(反射抑制層5)として機能する。従って、レーザビームL1が第2面22に到達した場合でも、レーザビームL1は、第2面22で反射しにくく、弾性部材50に入射する。   In such a patterning method, when the film 3 formed on the first surface 21 of the translucent member 2 is patterned by the laser beam L1, the laser beam is removed from the position where the film 3 is removed as shown in FIG. L1 enters from the first surface 21 of the translucent member 2 and travels toward the second surface 22. Here, the elastic member 50 is disposed on the second surface 22, and an air layer is unlikely to intervene between the second surface 22 of the translucent member 2 and the one surface 51 of the elastic member 50. For this reason, the elastic member 50 functions as the reflection suppression body 4 (reflection suppression layer 5) that suppresses the reflection of the laser beam L1 on the second surface 22. Accordingly, even when the laser beam L 1 reaches the second surface 22, the laser beam L 1 is not easily reflected by the second surface 22 and enters the elastic member 50.

特に本形態では、弾性部材50の屈折率na、および透光性部材2の屈折率nbが上式を満たしており、弾性部材50と透光性部材2とは同等の屈折率を有している。このため、レーザビームL1が第2面22に到達した場合でも、レーザビームL1は、第2面22で反射しにくく、弾性部材50に入射する。   In particular, in this embodiment, the refractive index na of the elastic member 50 and the refractive index nb of the translucent member 2 satisfy the above equation, and the elastic member 50 and the translucent member 2 have the same refractive index. Yes. For this reason, even when the laser beam L 1 reaches the second surface 22, the laser beam L 1 is not easily reflected by the second surface 22 and enters the elastic member 50.

そして、弾性部材50に入射したレーザビームL1は、弾性部材50の他方面52に到達するが、弾性部材50の他方面52は、透光性部材2の第2面22から大きく離間している。また、レーザビームL1は、弾性部材50の他方面52を透過するか、反射しても散乱するだけである。このため、レーザビームL1が弾性部材50の他方面52に到達しても、膜3を残した領域30に向けて反射しにくい。それ故、膜3を残すべき領域30に強度が大きなレーザビームL1が到達するという事態が発生しにくいので、ピンホールの
発生を抑制することができる。
The laser beam L1 incident on the elastic member 50 reaches the other surface 52 of the elastic member 50, but the other surface 52 of the elastic member 50 is greatly separated from the second surface 22 of the translucent member 2. . Further, the laser beam L1 is only scattered even if it passes through the other surface 52 of the elastic member 50 or is reflected. For this reason, even if the laser beam L1 reaches the other surface 52 of the elastic member 50, it is difficult to reflect toward the region 30 where the film 3 is left. Therefore, it is difficult for the high-intensity laser beam L1 to reach the region 30 where the film 3 should be left, so that the generation of pinholes can be suppressed.

また、透光性部材2の姿勢を変えながらレーザビームL2を照射すると、一点鎖線で示すように、レーザビームL2が斜め方向から照射されるため、透光性部材2の第1面21から入射した第2レーザビームL2は、斜めに進行するが、かかるレーザビームL2も、レーザビームL1と同様、透光性部材2の第2面22で反射しにくいので、膜3を残すべき領域30に大きな強度をもって到達するという事態が発生しにくい。それ故、ピンホールの発生を抑制することができる。   Further, when the laser beam L2 is irradiated while changing the posture of the translucent member 2, the laser beam L2 is irradiated from an oblique direction, as indicated by a one-dot chain line, and therefore incident from the first surface 21 of the translucent member 2. Although the second laser beam L2 travels obliquely, the laser beam L2 is also difficult to be reflected by the second surface 22 of the translucent member 2 like the laser beam L1, and thus the film 3 is left in the region 30 where the film 3 should be left. The situation of reaching with high strength is unlikely to occur. Therefore, the generation of pinholes can be suppressed.

[実施の形態1の変形例1]
図2は、本発明の実施の形態1の変形例1に係るパターニング方法の説明図である。なお、本形態の基本的な構成は、実施の形態1と同様であるため、共通する部分には同一の符号を付してそれらの詳細な説明を省略する。
[Variation 1 of Embodiment 1]
FIG. 2 is an explanatory diagram of the patterning method according to the first modification of the first embodiment of the present invention. Since the basic configuration of this embodiment is the same as that of Embodiment 1, the same reference numerals are given to common portions, and detailed descriptions thereof are omitted.

図2(a)に示すように、本形態でも、実施の形態1と同様、透光性部材2は、第2面22に、側面251が傾斜面になっている複数の凸部25が形成されている。本形態では、弾性部材50の一方面51に、透光性部材2の凸部25が嵌る凹部55が形成されており、凹部55の側面551は、凸部25の側面251と同様、傾斜している。従って、図2(b)に示すレーザ照射工程において、支持部材9によって弾性部材50を支持した後、弾性部材50の一方面51に透光性部材2を重ねると、透光性部材2の凸部25が弾性部材50の凹部55に嵌った状態になる。従って、透光性部材2の第2面22に弾性部材50の一方面51が密着するので、透光性部材2の第2面22と弾性部材50の一方面51との間には空気層が介在しにくい。その際、矢印Fで示すように、透光性部材2を弾性部材50に向けて押圧し、弾性部材50の透光性部材2側の一方面51を凸部25に沿って確実に密着させることが好ましい。   As shown in FIG. 2A, also in this embodiment, as in Embodiment 1, the translucent member 2 is formed on the second surface 22 with a plurality of convex portions 25 whose side surfaces 251 are inclined surfaces. Has been. In this embodiment, the concave portion 55 into which the convex portion 25 of the translucent member 2 is fitted is formed on the one surface 51 of the elastic member 50, and the side surface 551 of the concave portion 55 is inclined similarly to the side surface 251 of the convex portion 25. ing. Therefore, in the laser irradiation step shown in FIG. 2B, after the elastic member 50 is supported by the support member 9 and then the translucent member 2 is superimposed on the one surface 51 of the elastic member 50, the convexity of the translucent member 2 is increased. The part 25 is in a state of being fitted in the recess 55 of the elastic member 50. Therefore, since the one surface 51 of the elastic member 50 is in close contact with the second surface 22 of the translucent member 2, an air layer is formed between the second surface 22 of the translucent member 2 and the one surface 51 of the elastic member 50. Is difficult to intervene. At that time, as indicated by an arrow F, the translucent member 2 is pressed toward the elastic member 50, and the one surface 51 on the translucent member 2 side of the elastic member 50 is securely adhered along the convex portion 25. It is preferable.

そして、透光性部材2の第1面21の側から膜3にレーザビームL1を照射し、膜3の一部を除去する。   Then, the film 3 is irradiated with the laser beam L1 from the first surface 21 side of the translucent member 2, and a part of the film 3 is removed.

本形態でも、実施の形態1と同様、透光性部材2の第2面22には、弾性部材50が配置されており、透光性部材2の第2面22と弾性部材50の一方面51との間には空気層が介在しにくい。このため、弾性部材50は、第2面22でのレーザビームL1の反射を抑制する反射抑制体4(反射抑制層5)として機能する。従って、レーザビームL1が第2面22に到達した場合でも、レーザビームL1は、第2面22で反射しにくい等、実施の形態1と同様な効果を奏する。また、透光性部材2は、側面251が傾斜面になっている凸部25を第2面22に備えているが、弾性部材50は、透光性部材2側の一方面51に、凸部25が嵌る凹部55を備えている。このため、弾性部材50は、透光性部材2側の一方面51に密着するので、透光性部材2の第2面22と弾性部材50の一方面51との間には空気層が介在しにくい。このため、レーザビームL1が第2面22に到達した場合でも、レーザビームL1は、第2面22で反射しにくい。   Also in this embodiment, the elastic member 50 is disposed on the second surface 22 of the translucent member 2, as in the first embodiment, and the second surface 22 of the translucent member 2 and one surface of the elastic member 50. It is difficult for an air layer to intervene with 51. For this reason, the elastic member 50 functions as the reflection suppression body 4 (reflection suppression layer 5) that suppresses the reflection of the laser beam L1 on the second surface 22. Therefore, even when the laser beam L1 reaches the second surface 22, the laser beam L1 has the same effect as that of the first embodiment, such as being hardly reflected by the second surface 22. Further, the translucent member 2 includes the convex portion 25 whose side surface 251 is an inclined surface on the second surface 22, but the elastic member 50 is convex on the one surface 51 on the translucent member 2 side. A recess 55 into which the portion 25 is fitted is provided. For this reason, since the elastic member 50 is in close contact with the one surface 51 on the translucent member 2 side, an air layer is interposed between the second surface 22 of the translucent member 2 and the one surface 51 of the elastic member 50. Hard to do. For this reason, even when the laser beam L 1 reaches the second surface 22, the laser beam L 1 is not easily reflected by the second surface 22.

[実施の形態1の変形例2]
図3は、本発明の実施の形態1の変形例2に係るパターニング方法の説明図である。なお、本形態の基本的な構成は、実施の形態1と同様であるため、共通する部分には同一の符号を付してそれらの詳細な説明を省略する。
[Modification 2 of Embodiment 1]
FIG. 3 is an explanatory diagram of the patterning method according to the second modification of the first embodiment of the present invention. Since the basic configuration of this embodiment is the same as that of Embodiment 1, the same reference numerals are given to common portions, and detailed descriptions thereof are omitted.

本形態では、図3(a)に示すように、弾性部材50の一方面51には、膜3を除去する領域(図3(b)に示すレーザビームL1が照射される領域)に透光性部材2に向けて突出した突出部54が形成されている。このため、図3(b)に示すように、支持部材9に対して弾性部材50および透光性部材2を重ねて配置したとき、突出部54が押し潰さ
れた状態で弾性部材50の一方面51が透光性部材2の第2面22に密着する。また、矢印Fで示すように、透光性部材2を弾性部材50に向けて押圧し、弾性部材50の透光性部材2側の一方面51を凸部25に沿って確実に密着させる。かかる構成によれば、透光性部材2の第2面22と弾性部材50との間に空気層が介在しにくいので、第2面22での反射が発生しにくい。かかる構成は、実施の形態1の変形例1のように、弾性部材50の一方面51に、透光性部材2の凸部25が嵌る凹部55が形成されている場合に適用してもよい。
In this embodiment, as shown in FIG. 3A, the one surface 51 of the elastic member 50 transmits light to a region from which the film 3 is removed (region irradiated with the laser beam L1 shown in FIG. 3B). A protruding portion 54 protruding toward the sex member 2 is formed. For this reason, as shown in FIG. 3B, when the elastic member 50 and the translucent member 2 are arranged so as to overlap the support member 9, one of the elastic members 50 is crushed. The direction 51 is in close contact with the second surface 22 of the translucent member 2. Further, as shown by an arrow F, the translucent member 2 is pressed toward the elastic member 50, and the one surface 51 on the translucent member 2 side of the elastic member 50 is securely adhered along the convex portion 25. According to such a configuration, an air layer is unlikely to be interposed between the second surface 22 of the translucent member 2 and the elastic member 50, so that reflection on the second surface 22 is unlikely to occur. Such a configuration may be applied when the concave portion 55 into which the convex portion 25 of the translucent member 2 is fitted is formed on the one surface 51 of the elastic member 50 as in the first modification of the first embodiment. .

[実施の形態1の変形例3]
図4は、本発明の実施の形態1の変形例3に係るパターニング方法の説明図である。なお、本形態の基本的な構成は、実施の形態1と同様であるため、共通する部分には同一の符号を付してそれらの詳細な説明を省略する。
[Modification 3 of Embodiment 1]
FIG. 4 is an explanatory diagram of a patterning method according to the third modification of the first embodiment of the present invention. Since the basic configuration of this embodiment is the same as that of Embodiment 1, the same reference numerals are given to common portions, and detailed descriptions thereof are omitted.

本形態では、図4(a)に示すように、支持部材9の一方面91には、膜3を除去する領域(図4(b)に示すレーザビームL1が照射される領域)に透光性部材2に向けて突出した突出部94が形成されている。このため、図4(b)に示すように、支持部材9に対して弾性部材50および透光性部材2を重ねて配置したとき、膜3を除去する領域では、突出部94によって弾性部材50の一方面51が透光性部材2の第2面22に強く密着する。また、矢印Fで示すように、透光性部材2を弾性部材50に向けて押圧し、弾性部材50の透光性部材2側の一方面51を凸部25に沿って確実に密着させる。かかる構成によれば、透光性部材2の第2面22と弾性部材50との間に空気層が介在しにくいので、第2面22での反射が発生しにくい。かかる構成は、実施の形態1の変形例1のように、弾性部材50の一方面51に、透光性部材2の凸部25が嵌る凹部55が形成されている場合に適用してもよい。   In this embodiment, as shown in FIG. 4A, the one surface 91 of the support member 9 transmits light to a region from which the film 3 is removed (region irradiated with the laser beam L1 shown in FIG. 4B). A projecting portion 94 projecting toward the sex member 2 is formed. For this reason, as shown in FIG. 4B, when the elastic member 50 and the translucent member 2 are arranged so as to overlap the support member 9, the elastic member 50 is formed by the protrusion 94 in the region where the film 3 is removed. The one surface 51 of the transparent member 2 is in close contact with the second surface 22 of the translucent member 2. Further, as shown by an arrow F, the translucent member 2 is pressed toward the elastic member 50, and the one surface 51 on the translucent member 2 side of the elastic member 50 is securely adhered along the convex portion 25. According to such a configuration, an air layer is unlikely to be interposed between the second surface 22 of the translucent member 2 and the elastic member 50, so that reflection on the second surface 22 is unlikely to occur. Such a configuration may be applied when the concave portion 55 into which the convex portion 25 of the translucent member 2 is fitted is formed on the one surface 51 of the elastic member 50 as in the first modification of the first embodiment. .

[実施の形態1の他の変形例]
上記実施の形態1では、支持部材9と弾性部材50とが別体であったが、支持部材9と弾性部材50とが一体化されていてもよい。
[Other Modifications of Embodiment 1]
In the first embodiment, the support member 9 and the elastic member 50 are separate, but the support member 9 and the elastic member 50 may be integrated.

[実施の形態2]
図5は、本発明の実施の形態2に係るパターニング方法の説明図である。図5(a)は、パターニング加工物品の断面図であり、図5(b)〜(d)は、工程断面図である。本形態の基本的な構成は、実施の形態1と同様であるため、共通する部分には同一の符号を付してそれらの詳細な説明を省略する。
[Embodiment 2]
FIG. 5 is an explanatory diagram of the patterning method according to the second embodiment of the present invention. Fig.5 (a) is sectional drawing of a patterning processed article, FIG.5 (b)-(d) is process sectional drawing. Since the basic configuration of the present embodiment is the same as that of the first embodiment, common portions are denoted by the same reference numerals and detailed description thereof is omitted.

図5(a)に示すパターニング加工物品1も、実施の形態1と同様、板状の透光性部材2と、透光性部材2の第1面21でパターニングされた膜3とを有している。透光性部材2は、透光性樹脂やガラス等からなる。本形態において、透光性部材2は、ポリカーボネート等の透光性樹脂からなる。膜3は、塗装膜や蒸着膜、または塗装膜と蒸着膜を組み合わせた膜からなる。本形態において、膜3は、アルミニウム等の金属の蒸着膜からなる。   Similar to the first embodiment, the patterned article 1 shown in FIG. 5A also has a plate-like light-transmitting member 2 and a film 3 patterned on the first surface 21 of the light-transmitting member 2. ing. The translucent member 2 is made of translucent resin, glass, or the like. In this embodiment, the translucent member 2 is made of a translucent resin such as polycarbonate. The film 3 is made of a coating film, a vapor deposition film, or a film obtained by combining a paint film and a vapor deposition film. In this embodiment, the film 3 is a vapor deposition film of a metal such as aluminum.

透光性部材2は、第2面22に、側面251が傾斜面になっている複数の凸部25が形成されている。さらに、パターニング加工物品1には、第2面22を覆うように透光膜58が形成されている。   In the translucent member 2, a plurality of convex portions 25 whose side surfaces 251 are inclined surfaces are formed on the second surface 22. Further, a light-transmitting film 58 is formed on the patterned article 1 so as to cover the second surface 22.

かかるパターニング加工物品1は、図5(b)〜(d)に示すパターニング方法によって製造される。具体的には、図5(b)に示す透光性部材2を製造した後、成膜工程では、蒸着によって第1面21にアルミニウム膜からなる膜3を形成する。その際、マスク蒸着法を使用して、膜3を凹部210の周り、および凹部210の底部の縁に形成する。一方、透光性部材2の第2面22に、塗布法等によってシリコーン樹脂やアクリル樹脂等か
らなる透光膜58を形成する。
Such a patterned article 1 is manufactured by the patterning method shown in FIGS. Specifically, after manufacturing the translucent member 2 shown in FIG. 5B, in the film forming process, the film 3 made of an aluminum film is formed on the first surface 21 by vapor deposition. In that case, the film | membrane 3 is formed in the edge of the bottom part of the recessed part 210 around the recessed part 210 using a mask vapor deposition method. On the other hand, a translucent film 58 made of silicone resin or acrylic resin is formed on the second surface 22 of the translucent member 2 by a coating method or the like.

次に、図5(c)に示すレーザ照射工程では、透光性部材2の第1面21の側から膜3にレーザビームL1を照射し、図3(d)に示すように、膜3の一部を除去する。本形態では、膜3のうち、凹部210の底部に形成されている部分にレーザビームL1を照射して、膜3を除去する。   Next, in the laser irradiation step shown in FIG. 5C, the film 3 is irradiated with the laser beam L1 from the first surface 21 side of the translucent member 2, and as shown in FIG. Remove some of the. In this embodiment, the film 3 is removed by irradiating a portion of the film 3 formed at the bottom of the recess 210 with the laser beam L1.

ここで、透光膜58の屈折率をnaとし、透光性部材2の屈折率をnbとしたとき、屈折率na、nbは、以下の関係
nb−0.3 ≦ na ≦ nb+0.2
を満たしている。本形態において、透光性部材2は、ポリカーボネートであり、透光性部材2の屈折率nbは、約1.59である。一方、透光膜58は、シリコーン樹脂製であり、屈折率naは1.43である。従って、上記の条件式を満たしている。
Here, when the refractive index of the translucent film 58 is na and the refractive index of the translucent member 2 is nb, the refractive indexes na and nb have the following relationship:
nb−0.3 ≦ na ≦ nb + 0.2
Meet. In this embodiment, the translucent member 2 is polycarbonate, and the refractive index nb of the translucent member 2 is about 1.59. On the other hand, the translucent film 58 is made of silicone resin, and the refractive index na is 1.43. Therefore, the above conditional expression is satisfied.

このようなパターニング方法では、透光性部材2の第1面21に形成した膜3をレーザビームL1によってパターニングする際、膜3を除去した位置からレーザビームL1が透光性部材2の第1面21から入射し、第2面22に向かう。ここで、第2面22には、透光膜58が形成されており、透光性部材2の第2面22と透光膜58の一方面581との間には空気層が介在しない。このため、透光膜58は、第2面22でのレーザビームL1の反射を抑制する反射抑制体4(反射抑制層5)として機能する。従って、レーザビームL1が第2面22に到達した場合でも、レーザビームL1は、第2面22で反射しにくく、透光膜58に入射する。   In such a patterning method, when the film 3 formed on the first surface 21 of the translucent member 2 is patterned by the laser beam L1, the laser beam L1 is transmitted from the position where the film 3 is removed to the first of the translucent member 2. The light enters from the surface 21 and travels toward the second surface 22. Here, a translucent film 58 is formed on the second surface 22, and no air layer is interposed between the second surface 22 of the translucent member 2 and one surface 581 of the translucent film 58. For this reason, the translucent film 58 functions as the reflection suppressing body 4 (reflection suppressing layer 5) that suppresses the reflection of the laser beam L1 on the second surface 22. Therefore, even when the laser beam L 1 reaches the second surface 22, the laser beam L 1 is not easily reflected by the second surface 22 and enters the light-transmitting film 58.

特に本形態では、透光膜58の屈折率na、および透光性部材2の屈折率nbが上式を満たしており、透光膜58と透光性部材2とは同等の屈折率を有している。このため、レーザビームL1が第2面22に到達した場合でも、レーザビームL1は、第2面22で反射しにくく、透光膜58に入射する。   In particular, in this embodiment, the refractive index na of the translucent film 58 and the refractive index nb of the translucent member 2 satisfy the above formula, and the translucent film 58 and the translucent member 2 have the same refractive index. doing. For this reason, even when the laser beam L 1 reaches the second surface 22, the laser beam L 1 is not easily reflected by the second surface 22 and is incident on the translucent film 58.

そして、透光膜58に入射したレーザビームL1は、透光膜58の他方面582に到達するが、レーザビームL1は、透光膜58の他方面582を透過するか、反射しても散乱するだけである。このため、レーザビームL1が透光膜58の他方面582に到達しても、膜3を残した領域30に向けて反射しにくい。それ故、膜3を残すべき領域30に強度が大きなレーザビームL1が到達するという事態が発生しにくいので、ピンホールの発生を抑制することができる。   The laser beam L1 incident on the translucent film 58 reaches the other surface 582 of the translucent film 58, but the laser beam L1 is transmitted through the other surface 582 of the translucent film 58 or scattered even if reflected. Just do it. For this reason, even if the laser beam L1 reaches the other surface 582 of the translucent film 58, it is difficult to reflect toward the region 30 where the film 3 remains. Therefore, it is difficult for the high-intensity laser beam L1 to reach the region 30 where the film 3 should be left, so that the generation of pinholes can be suppressed.

また、透光性部材2の姿勢を変えながらレーザビームL2を照射すると、一点鎖線で示すように、レーザビームL2が斜め方向から照射されるため、透光性部材2の第1面21から入射した第2レーザビームL2は、斜めに進行するが、かかるレーザビームL2も、レーザビームL1と同様、膜3を残すべき領域30に大きな強度をもって到達するという事態が発生しにくい。それ故、ピンホールの発生を抑制することができる。   Further, when the laser beam L2 is irradiated while changing the posture of the translucent member 2, the laser beam L2 is irradiated from an oblique direction, as indicated by a one-dot chain line, and therefore incident from the first surface 21 of the translucent member 2. Although the second laser beam L2 travels obliquely, it is difficult for the laser beam L2 to reach the region 30 where the film 3 is to be left with a high intensity, similarly to the laser beam L1. Therefore, the generation of pinholes can be suppressed.

[実施の形態2の変形例]
図5(a)に示すパターニング加工物品1では、透光性部材2の第2面22に、反射抑制体4(反射抑制層5)として機能した透光膜58が残っていたが、膜3に対するパターニング後、透光膜58を除去してもよい。
[Modification of Embodiment 2]
In the patterned processed article 1 shown in FIG. 5A, the translucent film 58 that functions as the reflection suppressing body 4 (reflection suppressing layer 5) remains on the second surface 22 of the translucent member 2. After the patterning, the light transmitting film 58 may be removed.

[実施の形態3]
図6は、本発明の実施の形態3に係るパターニング方法の説明図である。図6(a)は、パターニング加工物品の断面図であり、図6(b)〜(d)は、工程断面図である。本形態の基本的な構成は、実施の形態1と同様であるため、共通する部分には同一の符号を
付してそれらの詳細な説明を省略する。
[Embodiment 3]
FIG. 6 is an explanatory diagram of the patterning method according to the third embodiment of the present invention. FIG. 6A is a cross-sectional view of a patterned article, and FIGS. 6B to 6D are process cross-sectional views. Since the basic configuration of the present embodiment is the same as that of the first embodiment, common portions are denoted by the same reference numerals and detailed description thereof is omitted.

図6(a)に示すパターニング加工物品1も、実施の形態1と同様、板状の透光性部材2と、透光性部材2の第1面21でパターニングされた膜3とを有している。透光性部材2は、透光性樹脂やガラス等からなる。本形態において、透光性部材2は、ポリカーボネート等の透光性樹脂からなる。膜3は、塗装膜や蒸着膜、または塗装膜と蒸着膜を組み合わせた膜からなる。本形態において、膜3は、アルミニウム等の金属の蒸着膜からなる。透光性部材2は、第2面22に、側面251が傾斜面になっている複数の凸部25が形成されている。   Similar to the first embodiment, the patterned article 1 shown in FIG. 6A also has a plate-like translucent member 2 and a film 3 patterned on the first surface 21 of the translucent member 2. ing. The translucent member 2 is made of translucent resin, glass, or the like. In this embodiment, the translucent member 2 is made of a translucent resin such as polycarbonate. The film 3 is made of a coating film, a vapor deposition film, or a film obtained by combining a paint film and a vapor deposition film. In this embodiment, the film 3 is a vapor deposition film of a metal such as aluminum. In the translucent member 2, a plurality of convex portions 25 whose side surfaces 251 are inclined surfaces are formed on the second surface 22.

ここで、透光性部材2の第2面22のうち、膜3が残っている領域30と平面視で重なる領域には、複数の凹凸からなる散乱用凹凸40が形成されている。本形態において、散乱用凹凸40は、膜3が除去されている領域と平面視で重なる領域には形成されていない。   Here, in the second surface 22 of the translucent member 2, scattering irregularities 40 including a plurality of irregularities are formed in a region overlapping the region 30 where the film 3 remains in a plan view. In this embodiment, the scattering irregularities 40 are not formed in a region overlapping the region where the film 3 is removed in plan view.

かかるパターニング加工物品1は、図6(b)〜(d)に示すパターニング方法によって製造される。具体的には、図6(b)に示す透光性部材2を金型成形により製造する際、第2面22には、膜3を残す領域30と平面視で重なる領域に散乱用凹凸40を形成する。そして、成膜工程では、蒸着によって第1面21にアルミニウム膜からなる膜3を形成する。その際、マスク蒸着法を使用して、膜3を凹部210の周り、および凹部210の底部の縁に形成する。   Such a patterned article 1 is manufactured by the patterning method shown in FIGS. Specifically, when the translucent member 2 shown in FIG. 6B is manufactured by molding, the unevenness 40 for scattering is formed on the second surface 22 in a region overlapping the region 30 where the film 3 is left in plan view. Form. In the film forming step, the film 3 made of an aluminum film is formed on the first surface 21 by vapor deposition. In that case, the film | membrane 3 is formed in the edge of the bottom part of the recessed part 210 around the recessed part 210 using a mask vapor deposition method.

次に、図6(c)に示すレーザ照射工程では、透光性部材2の第1面21の側から膜3にレーザビームL2を照射し、図6(d)に示すように、膜3の一部を除去する。本形態では、膜3のうち、凹部210の底部に形成されている部分に対して斜め方向からレーザビームL2を照射して、膜3を除去する。   Next, in the laser irradiation step shown in FIG. 6C, the film 3 is irradiated with the laser beam L2 from the first surface 21 side of the translucent member 2, and as shown in FIG. Remove some of the. In this embodiment, the film 3 is removed by irradiating a portion of the film 3 formed at the bottom of the recess 210 with the laser beam L2 from an oblique direction.

このようなパターニング方法では、透光性部材2の第1面21に形成した膜3をレーザビームL2によってパターニングする際、膜3を除去した位置からレーザビームL2が透光性部材2の第1面21から入射し、第2面22に向かう。ここで、第2面22には、膜3を残す領域30と平面視で重なる領域に散乱用凹凸40が形成されており、散乱用凹凸40は、第2面22でのレーザビームL2の反射を抑制する反射抑制体4として機能する。従って、レーザビームL1が第2面22に到達した場合でも、レーザビームL2は、第2面22で反射しにくく、散乱するだけである。このため、レーザビームL2は、第2面22に到達しても、膜3を残した領域30に向けて反射しにくい。それ故、膜3を残すべき領域30に強度が大きなレーザビームL2が到達するという事態が発生しにくいので、ピンホールの発生を抑制することができる。   In such a patterning method, when the film 3 formed on the first surface 21 of the translucent member 2 is patterned by the laser beam L2, the laser beam L2 is transmitted from the position where the film 3 is removed to the first of the translucent member 2. The light enters from the surface 21 and travels toward the second surface 22. Here, the unevenness 40 for scattering is formed on the second surface 22 in a region overlapping the region 30 where the film 3 is left in plan view, and the unevenness 40 for scattering reflects the laser beam L2 on the second surface 22. It functions as a reflection suppressing body 4 that suppresses. Therefore, even when the laser beam L1 reaches the second surface 22, the laser beam L2 is not easily reflected by the second surface 22, and is only scattered. For this reason, even if the laser beam L2 reaches the second surface 22, it is difficult to reflect it toward the region 30 where the film 3 is left. Therefore, it is difficult for the high-intensity laser beam L2 to reach the region 30 where the film 3 should be left, so that pinholes can be prevented from occurring.

[他の実施の形態]
上記実施の形態1、2、3では、透光性部材2の第2面22に凸部25が形成されていたが、透光性部材2の第2面22が平坦面である場合に本発明を適用してもよい。
[Other embodiments]
In the first, second, and third embodiments, the convex portion 25 is formed on the second surface 22 of the translucent member 2. However, when the second surface 22 of the translucent member 2 is a flat surface, this is used. The invention may be applied.

上記実施の形態1、2、3では、透光性部材2は、ポリカーボネート等の透光性樹脂からなっていたが、ガラス等の無機材料であってもよい。また、膜3は、アルミニウム等の金属の蒸着膜であったが、印刷や転写によって形成された塗装膜であってもよいし、塗装膜と蒸着膜を組み合わせた膜であってもよい。   In the said Embodiment 1, 2, 3, although the translucent member 2 consisted of translucent resins, such as a polycarbonate, inorganic materials, such as glass, may be sufficient. Moreover, although the film | membrane 3 was a metal vapor deposition film, such as aluminum, the coating film formed by printing and transcription | transfer may be sufficient, and the film | membrane which combined the coating film and the vapor deposition film may be sufficient.

上記実施の形態1、2、3では、成膜工程において、膜3を凹部210の周り、および凹部210の底部の縁に形成し、凹部210の底部の中央部分には形成しなかったが、透光性部材2の第1面21の全面に膜3を形成してもよい。   In the first, second, and third embodiments, in the film forming process, the film 3 is formed around the concave portion 210 and at the edge of the bottom portion of the concave portion 210, but not formed in the central portion of the bottom portion of the concave portion 210. The film 3 may be formed on the entire first surface 21 of the translucent member 2.

本発明では、実施の形態1、2、3で説明した各構成を組み合わせてもよい。例えば、実施の形態1+実施の形態2、実施の形態1+実施の形態3、実施の形態2+実施の形態3、実施の形態1+実施の形態2+実施の形態3に相当する形態を採用してもよい。   In the present invention, the configurations described in the first, second, and third embodiments may be combined. For example, a form corresponding to Embodiment 1 + Embodiment 2, Embodiment 1 + Embodiment 3, Embodiment 2 + Embodiment 3, Embodiment 1 + Embodiment 2 + Embodiment 3 is adopted. Also good.

1・・パターニング加工物品、2・・透光性部材、3・・膜、4・・反射抑制体、5・・反射抑制層、9・・支持部材、21・・第1面、22・・第2面、25・・凸部、40・・散乱用凹凸(反射抑制体)、50・・弾性部材(反射抑制体、反射抑制層)、54・・突出部、55・・凹部、58・・透光膜(反射抑制体、反射抑制層)、94・・突出部、L1、L2・・レーザビーム 1 .. Patterned article, 2 .. Translucent member, 3 .. Film, 4 .. Antireflection body, 5 .. Antireflection layer, 9 .. Support member, 21 .. First surface, 22. 2nd surface, 25 ... convex part, 40 ... scattering unevenness (reflection suppressing body), 50 ... elastic member (reflection suppressing body, reflection suppressing layer), 54 ... projecting part, 55 ... concave part, 58 ...・ Translucent film (reflection suppression body, reflection suppression layer), 94.. Protrusion, L 1, L 2.

Claims (15)

透光性部材の第1面に膜を形成する成膜工程と、
前記第1面の側から前記膜にレーザビームを照射して前記膜の一部を除去するレーザ照射工程と、
を有し、
前記レーザ照射工程では、前記透光性部材の前記第1面とは反対側の第2面に、当該第2面での前記レーザビームの反射を抑制する反射抑制体を設けておくことを特徴とするパターニング方法。
A film forming step of forming a film on the first surface of the translucent member;
A laser irradiation step of removing a part of the film by irradiating the film with a laser beam from the first surface side;
Have
In the laser irradiation step, a reflection suppressing body that suppresses reflection of the laser beam on the second surface is provided on the second surface of the translucent member opposite to the first surface. A patterning method.
前記反射抑制体は、前記第2面に密着した状態で重ねられた反射抑制層であることを特徴とする請求項1に記載のパターニング方法。   The patterning method according to claim 1, wherein the reflection suppression body is a reflection suppression layer stacked in close contact with the second surface. 前記反射抑制層は、前記第2面に密着した状態で重ねられた透光性の弾性部材であることを特徴とする請求項2に記載のパターニング方法。   The patterning method according to claim 2, wherein the reflection suppression layer is a translucent elastic member that is stacked in close contact with the second surface. 前記弾性部材は、一方面に前記透光性部材に向けて突出した突出部を備え、
前記弾性部材は、前記突出部が押し潰された状態で前記一方面が前記第2面に密着していることを特徴とする請求項3に記載のパターニング方法。
The elastic member includes a protruding portion that protrudes toward the translucent member on one surface,
The patterning method according to claim 3, wherein the elastic member has the one surface in close contact with the second surface in a state where the protruding portion is crushed.
前記透光性部材に向けて突出した突出部を一方面に備えた支持部材を準備しておき、
前記弾性部材は、前記支持部材の前記一方面と前記透光性部材との間で弾性変形していることを特徴とする請求項3に記載のパターニング方法。
Preparing a support member provided on one surface with a protruding portion protruding toward the light transmissive member,
The patterning method according to claim 3, wherein the elastic member is elastically deformed between the one surface of the support member and the translucent member.
前記透光性部材は、側面が傾斜面になっている凸部を前記第2面に備え、
前記透光性部材は、前記弾性部材の前記透光性部材側の面が前記凸部に沿って密着するように前記弾性部材に向けて押圧されていることを特徴とする請求項3乃至5の何れか一項に記載のパターニング方法。
The translucent member is provided with a convex portion whose side surface is an inclined surface on the second surface,
The said translucent member is pressed toward the said elastic member so that the surface by the side of the said translucent member of the said elastic member closely_contact | adheres along the said convex part. The patterning method according to any one of the above.
前記透光性部材は、側面が傾斜面になっている凸部を前記第2面に備え、
前記弾性部材は、前記透光性部材側の面に、前記凸部が嵌る凹部を備えていることを特徴とする請求項3乃至5の何れか一項に記載のパターニング方法。
The translucent member is provided with a convex portion whose side surface is an inclined surface on the second surface,
The patterning method according to claim 3, wherein the elastic member includes a concave portion into which the convex portion is fitted on a surface on the light transmitting member side.
前記反射抑制体は、前記第2面に積層された透光膜であることを特徴とする請求項2に記載のパターニング方法。   The patterning method according to claim 2, wherein the reflection suppressing body is a translucent film laminated on the second surface. 前記反射抑制層の屈折率をnaとし、前記透光性部材の屈折率をnbとしたとき、
屈折率na、nbは、以下の関係
nb−0.3 ≦ na ≦ nb+0.2
を満たしていることを特徴とする請求項2乃至8の何れか一項に記載のパターニング方法。
When the refractive index of the reflection suppressing layer is na and the refractive index of the translucent member is nb,
Refractive indexes na and nb have the following relationship:
nb−0.3 ≦ na ≦ nb + 0.2
The patterning method according to claim 2, wherein the patterning method is satisfied.
前記反射抑制体は、前記第2面に形成された散乱用凹凸であることを特徴とする請求項1に記載のパターニング方法。   The patterning method according to claim 1, wherein the reflection suppressing body is scattering irregularities formed on the second surface. 前記透光性部材は、透光性の樹脂製部材であることを特徴とする請求項1乃至10の何れか一項に記載のパターニング方法。   The patterning method according to claim 1, wherein the translucent member is a translucent resin member. 前記膜は、蒸着膜を含むことを特徴とする請求項1乃至11の何れか一項に記載のパターニング方法。   The patterning method according to claim 1, wherein the film includes a vapor deposition film. 透光性部材と、
該透光性部材の第1面でパターニングされた膜と、
前記透光性部材の前記第1面とは反対側の第2面に形成され、前記第1面側から入射したレーザビームの前記第2面での反射を抑制する反射抑制体と、
を有することを特徴とするパターニング加工物品。
A translucent member;
A film patterned on the first surface of the translucent member;
A reflection suppressor that is formed on the second surface opposite to the first surface of the translucent member and suppresses reflection of the laser beam incident from the first surface side on the second surface;
A patterned article characterized by comprising:
前記反射抑制体は、前記第2面に積層された透光膜であることを特徴とする請求項13に記載のパターニング加工物品。   The patterned processing article according to claim 13, wherein the reflection suppressing body is a light-transmitting film laminated on the second surface. 前記反射抑制体は、前記第2面に形成された散乱用凹凸であることを特徴とする請求項13に記載のパターニング加工物品。   The patterned processing article according to claim 13, wherein the reflection suppressing body is scattering unevenness formed on the second surface.
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