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JP2016034039A - Ceramic circuit board assembly and ceramic circuit board manufacturing method - Google Patents

Ceramic circuit board assembly and ceramic circuit board manufacturing method Download PDF

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JP2016034039A
JP2016034039A JP2015221074A JP2015221074A JP2016034039A JP 2016034039 A JP2016034039 A JP 2016034039A JP 2015221074 A JP2015221074 A JP 2015221074A JP 2015221074 A JP2015221074 A JP 2015221074A JP 2016034039 A JP2016034039 A JP 2016034039A
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circuit board
dummy
ceramic
metal
ceramic circuit
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JP6160937B2 (en
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渡辺 純一
Junichi Watanabe
渡辺  純一
加賀 洋一郎
Yoichiro Kaga
洋一郎 加賀
今村 寿之
Toshiyuki Imamura
寿之 今村
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Proterial Ltd
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Hitachi Metals Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide a ceramic circuit board assembly.SOLUTION: A ceramic circuit board assembly comprises: a ceramic circuit board including a metal circuit board bonded to one principal surface of a ceramic mother board via bonding layer and a metal heat sink bonded to the other principal surface via a bonding layer; a dummy part including a dummy metal plate which is made of the same material and has the same thickness with the metal circuit board bonded to an outer peripheral part of the one principal surface via the bonding layer, and a dummy metal plate which is made of the same material and has the same thickness with the metal heat sink bonded to an outer peripheral part of the other principal surface via the bonding layer; and division grooves for dividing the ceramic circuit board and the dummy part, respectively, in which the dummy part is used for measurement of thermal conductivity.SELECTED DRAWING: Figure 1

Description

本発明は、セラミックス基板の一方の主面に金属回路板と、他方の主面に金属放熱板とを、接合層を介して接合するセラミックス回路基板の検査方法に関する。   The present invention relates to an inspection method for a ceramic circuit board in which a metal circuit board is bonded to one main surface of a ceramic substrate and a metal heat sink is bonded to the other main surface via a bonding layer.

一般に半導体モジュールでは、セラミックス基板の一方の面に、銅合金、アルミニウム合金等の、比較的電気伝導率の高い金属で回路パターンが形成され、他方の面にも同様の金属で放熱板が形成される。この回路パターンおよび放熱板(以下、両方を合わせて金属板ということがある)と、セラミックス基板との接合は、活性金属ろう付け法、DBC(Direct Bonding Copper)、DBA(Direct Bonding Aluminium)等様々な方法で行なわれる。   In general, in a semiconductor module, a circuit pattern is formed on one surface of a ceramic substrate with a metal having a relatively high electrical conductivity, such as a copper alloy or an aluminum alloy, and a heat sink is formed on the other surface with the same metal. The The circuit pattern and heat dissipation plate (hereinafter, both may be referred to as a metal plate) and the ceramic substrate may be joined by various methods such as active metal brazing, DBC (Direct Bonding Copper), and DBA (Direct Bonding Aluminum). It is done in a simple way.

前記回路パターンや放熱板の表面には、はんだ濡れ性向上、防食の観点からニッケル(Ni)−リン(P)等を含む無電解めっき層が形成される。これによりセラミックス基板を用いたセラミックス回路基板が得られ、この回路パターンの表面に形成された無電解めっき層の表面に半導体チップなどが搭載されてパワー半導体モジュールとなる。   An electroless plating layer containing nickel (Ni) -phosphorus (P) or the like is formed on the surface of the circuit pattern or the heat sink from the viewpoint of improving solder wettability and preventing corrosion. As a result, a ceramic circuit board using the ceramic substrate is obtained, and a semiconductor chip or the like is mounted on the surface of the electroless plating layer formed on the surface of the circuit pattern to form a power semiconductor module.

近年では、例えば電動車両用のインバーター等として高電圧、大電流動作が可能なパワー半導体モジュール(IGBTモジュール等)が広く利用されている。このような半導体モジュールでは、半導体チップが動作中は高温となるので、セラミックス回路基板の放熱効率を高める必要がある。そこで上記半導体チップを搭載する回路基板として、機械強度が高く、絶縁信頼性の高いことに加えて放熱性の高いセラミックス回路基板が必要とされるようになり、窒化アルミニウムや窒化珪素からなる高熱伝導、高強度セラミックスの適用が検討されている。   In recent years, for example, power semiconductor modules (IGBT modules and the like) capable of high voltage and large current operation are widely used as inverters for electric vehicles. In such a semiconductor module, since the semiconductor chip becomes high temperature during operation, it is necessary to increase the heat dissipation efficiency of the ceramic circuit board. Therefore, as a circuit board on which the semiconductor chip is mounted, a ceramic circuit board having high mechanical strength and high insulation reliability as well as high heat dissipation is required, and high thermal conductivity made of aluminum nitride or silicon nitride is required. Application of high-strength ceramics has been studied.

このような高熱伝導、高強度セラミックスを用いた回路基板としては、熱伝導率が90W/mK以上、常温における3点曲げ強度が600MPa以上である、窒化ケイ素質焼結体製基板の表面銅製回路板を設け、裏面に銅板をろう材により接合して構成したセラミックス回路基板が開示されている(たとえば、特許文献1参照)。   As a circuit board using such high thermal conductivity and high strength ceramics, a surface copper circuit of a silicon nitride based sintered body substrate having a thermal conductivity of 90 W / mK or more and a three-point bending strength at room temperature of 600 MPa or more. A ceramic circuit board is disclosed in which a plate is provided and a copper plate is joined to the back surface by a brazing material (see, for example, Patent Document 1).

通常、製品であるセラミックス回路基板が所望の放熱性になるよう、セラミックス材料の選定がなされ、そのセラミックス材料の放熱性は、熱伝導率の抜き取り検査がレーザフラッシュ法により主に行われてきた。特許文献1に記載されている高熱伝導窒化ケイ素質焼結体を用いた回路基板では、得られた窒化ケイ素質焼結体から、直径10mm×厚さ3mmの試験片を採取して、窒化ケイ素焼結体自体の熱伝導率をレーザフラッシュ法で測定することが開示されている。この熱伝導率の測定は、セラミックス基板を製造する際のドクターブレード成形法とは異なる成形法を採用して行われることが開示されている。   In general, a ceramic material is selected so that a ceramic circuit board as a product has a desired heat dissipation property, and the heat dissipation property of the ceramic material has been mainly examined by a laser flash method. In the circuit board using the high thermal conductivity silicon nitride sintered body described in Patent Document 1, a test piece having a diameter of 10 mm and a thickness of 3 mm is collected from the obtained silicon nitride sintered body, and silicon nitride is obtained. It is disclosed that the thermal conductivity of the sintered body itself is measured by a laser flash method. It is disclosed that the measurement of the thermal conductivity is performed by adopting a forming method different from the doctor blade forming method when manufacturing a ceramic substrate.

特開2002−293642号公報JP 2002-293642 A

パワー半導体モジュールの高密度化により、パワー半導体モジュールから発生する熱対策のため、放熱性向上の要求が高く、これに使われるセラミックス回路基板に関しても放熱性の向上が求められている。このため、セラミックス回路基板の放熱性を正確に、かつ効率良く評価する必要がある。   Due to the high density of power semiconductor modules, there is a high demand for improvement in heat dissipation for countermeasures against heat generated from the power semiconductor modules, and improvement in heat dissipation is also demanded for ceramic circuit boards used therefor. For this reason, it is necessary to accurately and efficiently evaluate the heat dissipation of the ceramic circuit board.

パワー半導体モジュールに使用されるセラミックス回路基板では、放熱性を律速する要因として、セラミックス基板自体の熱伝導率に加え、セラミックス基板と金属回路板や金属放熱板間の接合層の熱伝導率、接合層の厚み、接合層とセラミックス基板界面に形成される反応層の熱伝導率や反応層の厚み、金属板表面に形成されるめっき層の熱伝導率やめっき層の厚さなど、多くの要因が存在することから、従来技術のように、セラミックス基板を構成するセラミックス自体の熱伝導率を測定しただけでは、セラミックス回路基板の放熱特性を判定することは困難であった。   In ceramic circuit boards used in power semiconductor modules, the thermal conductivity of the bonding layer between the ceramic substrate and the metal circuit board or metal heat sink, in addition to the thermal conductivity of the ceramic board itself, is a factor that determines the heat dissipation. Many factors, such as layer thickness, thermal conductivity of the reaction layer formed at the interface between the bonding layer and the ceramic substrate, the thickness of the reaction layer, the thermal conductivity of the plating layer formed on the metal plate surface, and the thickness of the plating layer Therefore, it was difficult to determine the heat dissipation characteristics of the ceramic circuit board only by measuring the thermal conductivity of the ceramic itself constituting the ceramic board as in the prior art.

すなわち、セラミックス基板の一方の面に金属回路板、他方の面に金属放熱板を、活性金属ろう付け法、DBC、DBA等の方法で接合して、金属回路板および金属放熱板の表面にめっき層を施した後、金属回路板表面のめっき層上にパワー半導体素子を半田で接合して、パワー半導体モジュールに実装して使用した場合、パワー半導体素子の放熱がうまく行われず、パワー半導体素子と金属回路板とを接合している半田が溶融したり、パワー半導体素子の電極端子と金属回路板とを電気的に接続するボンディングの断線等の不具合が生じることがあった。この原因は、主にセラミックス基板と金属回路板または金属放熱板との接合層に起因して放熱性が阻害されたためであり、中でも接合層中の微小ボイドによる影響が大きい。特に、セラミックス基板と金属板を接合する際に、接合条件が微妙に変化した場合(たとえば接合炉の運転状態に起因する)、不具合の発生する割合が非常に高くなってしまうという問題点があった。   That is, a metal circuit board is bonded to one surface of a ceramic substrate, and a metal heat sink is bonded to the other surface by a method such as active metal brazing, DBC, DBA, etc., and the surfaces of the metal circuit board and the metal heat sink are plated. After applying the layer, when the power semiconductor element is joined to the plating layer on the surface of the metal circuit board with solder and mounted on the power semiconductor module, the power semiconductor element does not dissipate well. In some cases, the solder joining the metal circuit board is melted, or a defect such as a disconnection in bonding for electrically connecting the electrode terminal of the power semiconductor element and the metal circuit board occurs. This is because heat dissipation is hindered mainly due to the bonding layer between the ceramic substrate and the metal circuit board or the metal heat sink, and the influence of the microvoids in the bonding layer is particularly great. In particular, when the ceramic substrate and the metal plate are joined, if the joining conditions change slightly (for example, due to the operating state of the joining furnace), there is a problem in that the rate of occurrence of defects becomes very high. It was.

本発明は、上記実情に鑑みなされたもので、セラミックス回路基板にパワー半導体素子を接合して使用した際に発生する半田の溶融やボンディングの断線等の不具合を防ぐことのできるセラミックス回路基板の検査方法を提供することにある。   The present invention has been made in view of the above circumstances, and inspects a ceramic circuit board capable of preventing problems such as melting of solder and disconnection of bonding that occur when a power semiconductor element is joined to a ceramic circuit board. It is to provide a method.

本発明のセラミックス回路基板の検査方法は、セラミックス基板の一方の主面に金属回路板と、他方の主面に金属放熱板とを接合層を介して接合するセラミックス回路基板を複数個有し、両主面の外周辺部に前記金属回路板および前記金属放熱板とそれぞれ同材質、同一厚さのダミー金属板とを前記セラミックス基板に対して対向するように接合層を介して接合するダミー部を複数個有し、前記セラミックス回路基板および前記ダミー部を分割するための分割溝が設けられるセラミックス回路基板集合体の前記セラミックス基板および前記ダミー部を、前記分割溝を用いて分割した後、少なくとも一つのダミー部の一方の主面のダミー金属板表面にレーザパルスを照射し、他方の主面のダミー金属板表面の温度を計測することにより熱伝導率を測定して前記セラミックス回路基板の検査を行うことを特徴とする。   The inspection method for a ceramic circuit board of the present invention has a plurality of ceramic circuit boards for joining a metal circuit board to one main surface of the ceramic substrate and a metal heat sink to the other main surface via a joining layer, A dummy part that joins a dummy metal plate of the same material and the same thickness as the metal circuit board and the metal heat radiating plate to the outer peripheral part of both main surfaces through a bonding layer so as to face the ceramic substrate. After dividing the ceramic substrate and the dummy part of the ceramic circuit board assembly provided with a dividing groove for dividing the ceramic circuit board and the dummy part using the dividing groove, at least Thermal conductivity is measured by irradiating the surface of the dummy metal plate on one main surface of one dummy with a laser pulse and measuring the temperature on the surface of the dummy metal plate on the other main surface. Measurements to and performs inspection of the ceramic circuit board.

本発明のセラミックス回路基板の検査方法において、前記ダミー部を分割する前に、前記セラミックス回路基板集合体をめっき液に浸漬して、前記金属回路板、金属放熱板、およびダミー金属板の表面にニッケルめっきを施すことが好ましい。   In the method for inspecting a ceramic circuit board according to the present invention, before dividing the dummy portion, the ceramic circuit board assembly is immersed in a plating solution, and is applied to the surfaces of the metal circuit board, the metal heat sink, and the dummy metal board. It is preferable to apply nickel plating.

本発明のセラミックス回路基板の検査方法において、前記ダミー部の両主面における前記セラミックス基板と前記ダミー金属板との接合面積が同一であり、前記ダミー部おけるセラミックス基板の主面の面積の60%以上であることが好ましい。   In the inspection method for a ceramic circuit board according to the present invention, the bonding area of the ceramic substrate and the dummy metal plate on both main surfaces of the dummy part is the same, and 60% of the area of the main surface of the ceramic substrate in the dummy part. The above is preferable.

本発明のセラミックス回路基板の検査方法において、前記ダミー部におけるセラミックス基板と前記ダミー金属板と間の接合層中のボイド率と熱伝導率の関係を予め測定し、前記ボイド率に基き前記熱伝導率の規格値を設定した後、前記熱伝導率の規格値に基き前記セラミックス回路基板の放熱性の判定を行うことが好ましい。   In the inspection method for a ceramic circuit board according to the present invention, a relationship between a void ratio and a thermal conductivity in a bonding layer between the ceramic substrate and the dummy metal plate in the dummy portion is measured in advance, and the thermal conductivity is determined based on the void ratio. After setting the standard value of the rate, it is preferable to determine the heat dissipation of the ceramic circuit board based on the standard value of the thermal conductivity.

本発明のセラミック回路基板の検査方法は、上記従来技術の課題を解消し、セラミックス回路基板にパワー素子接合して使用した際に発生する不具合を防ぐことができる。   The method for inspecting a ceramic circuit board of the present invention solves the above-mentioned problems of the prior art and can prevent problems that occur when the ceramic circuit board is used while being joined with a power element.

本発明の一実施形態に係るセラミックス回路基板の検査方法に用いられるセラミックス回路基板集合体を示す平面図である。It is a top view which shows the ceramic circuit board aggregate | assembly used for the inspection method of the ceramic circuit board which concerns on one Embodiment of this invention. 本発明の一実施形態に係るセラミックス回路基板の検査方法に用いられるセラミックス回路基板集合体を示す下面図である。It is a bottom view which shows the ceramic circuit board aggregate | assembly used for the inspection method of the ceramic circuit board which concerns on one Embodiment of this invention. 図1のセラミックス回路基板集合体のA矢視図である。It is an A arrow view of the ceramic circuit board aggregate | assembly of FIG. 本発明の一実施形態にかかるセラミックス回路基板の検査方法において、熱伝導率の測定の際に、得られる温度履歴曲線例の図面である。In the inspection method of the ceramic circuit board concerning one Embodiment of this invention, it is drawing of the example of a temperature history curve obtained in the case of a measurement of thermal conductivity. 本発明の一実施形態に係るセラミックス回路基板の検査方法において、ダミー部におけるセラミックス基板と金属板との接合層中のボイド率とダミー部の熱伝導率との関係を示した図面である。In the inspection method of the ceramic circuit board concerning one embodiment of the present invention, it is a figure showing the relation between the void rate in the joining layer of the ceramic substrate and metal plate in the dummy part, and the thermal conductivity of the dummy part.

以下、本発明の実施形態を具体的に説明するが、本発明は以下の実施形態に限定されるものではなく、本発明の趣旨を逸脱しない範囲で、当業者の通常の知識に基づいて、以下の実施の形態に対し、適宜変更、改良等が加えられたものも本発明の範囲に入ることが理解されるべきである。   Hereinafter, embodiments of the present invention will be specifically described, but the present invention is not limited to the following embodiments, and is based on ordinary knowledge of a person skilled in the art without departing from the spirit of the present invention. It should be understood that modifications and improvements as appropriate to the following embodiments also fall within the scope of the present invention.

本発明の一実施形態であるセラミックス回路基板の検査方法について、使用されるセラミックス回路基板集合体1の正面図である図1、その下面図である図2、図1のA矢視図である図3、ダミー部31の熱伝導率を測定する際に得られる温度履歴曲線例である図4を参照して説明する。図1に示すセラミックス回路基板集合体1は、1枚のセラミックス母基板10と、セラミックス母基板10の一方の主面101に接合された金属回路板121、122、ダミー金属板141、142、143、144、145、他方の主面102に接合した金属放熱板13、ダミー金属板151、152、153、154、155とからなり、セラミックス回路基板2とダミー部31、32、33、34、35とで構成され、セラミックス回路基板2とダミー部31〜35を分割するための分割溝5が形成されている。ダミー金属板141、142、143、144、145は、金属回路板121、122と同材質であり、同一厚さを有し、ダミー金属板151、152、153、154、155は、金属放熱板13と同材質であり、同一厚さを有し、ダミー金属板141〜145は、セラミックス基板1と接合層141a〜145aを介して接合され、ダミー金属板151〜155は、セラミックス基板1と接合層151a〜155aを介してダミー金属板141〜145とそれぞれ対向するように接合されている。これらの金属回路板121、122、金属ダミー板141〜145、金属放熱板13、金属ダミー板151〜155は、公知の方法で形成される。すなわち、セラミックス母基板10の両主面に対し、同一面積の金属板(図示せず)を、活性金属ろう付け法、DBC、DBAなどの方法で接合した後、金属板の表面にマスキングを施し、エッチングにより不要な部分を除去することにより、セラミックス母基板10上に、金属回路板121、122、金属ダミー板141〜145、金属放熱板13、金属ダミー板151〜155が形成され、図1に示すようなセラミックス回路基板集合体1が得られる。   FIG. 1 is a front view of a ceramic circuit board assembly 1 to be used, FIG. 2 is a bottom view of the ceramic circuit board assembly 1, and FIG. 3 and FIG. 4, which is an example of a temperature history curve obtained when measuring the thermal conductivity of the dummy part 31, will be described. A ceramic circuit board assembly 1 shown in FIG. 1 includes one ceramic mother board 10, metal circuit boards 121 and 122 bonded to one main surface 101 of the ceramic mother board 10, and dummy metal boards 141, 142, and 143. 144, 145, the metal heat sink 13 joined to the other main surface 102, and the dummy metal plates 151, 152, 153, 154, 155, and the ceramic circuit board 2 and the dummy portions 31, 32, 33, 34, 35. The dividing groove 5 for dividing the ceramic circuit board 2 and the dummy parts 31 to 35 is formed. The dummy metal plates 141, 142, 143, 144, and 145 are made of the same material as the metal circuit plates 121 and 122, have the same thickness, and the dummy metal plates 151, 152, 153, 154, and 155 are metal heat dissipation plates. 13 and the same thickness, the dummy metal plates 141 to 145 are bonded to the ceramic substrate 1 via the bonding layers 141a to 145a, and the dummy metal plates 151 to 155 are bonded to the ceramic substrate 1. The dummy metal plates 141 to 145 are bonded to each other through the layers 151a to 155a. These metal circuit boards 121 and 122, the metal dummy boards 141-145, the metal heat sink 13, and the metal dummy boards 151-155 are formed by a well-known method. That is, a metal plate (not shown) of the same area is bonded to both main surfaces of the ceramic mother substrate 10 by a method such as active metal brazing, DBC, DBA, etc., and then the surface of the metal plate is masked. By removing unnecessary portions by etching, metal circuit boards 121 and 122, metal dummy plates 141 to 145, metal heat dissipation plate 13, and metal dummy plates 151 to 155 are formed on the ceramic mother substrate 10, as shown in FIG. A ceramic circuit board assembly 1 as shown in FIG.

前記セラミックス回路基板集合体1を、分割溝5を用いて分割することにより、セラミックス回路基板2およびダミー部31〜35を得ることができ、このダミー部31〜35のうちの少なくとも1個のダミー部の一方の主面に接合されたダミー金属板の表面にレーザパルスを照射し、他方の主面に接合されたダミー金属板の表面の温度を計測する。この他方の面に接合されたダミー金属板の表面温度変化とレーザパルス照射開始からの経過時間との関係から図4に示す温度履歴曲線を求め、以下の計算式で熱伝導率を算出する。
λ = α・Cp・ρ (1)
Cp =Q/(M・θm) (2)
α = 0.1388d/t1/2 (3)
λ:熱伝導率(W/mK)
Cp:比熱(J/(kg・K))
α:熱拡散率(m/s)
ρ:密度(kg/m
Q:熱入量(レーザパルスエネルギー)(J)
θm:温度上昇量 (K)
M:質量(kg)
t1/2:温度上昇量の1/2だけ温度が上昇するのに要する時間(s)
d:ダミー部の厚さ(m)
By dividing the ceramic circuit board assembly 1 using the dividing groove 5, the ceramic circuit board 2 and the dummy parts 31 to 35 can be obtained, and at least one dummy of the dummy parts 31 to 35 is obtained. The surface of the dummy metal plate bonded to one main surface of the part is irradiated with a laser pulse, and the temperature of the surface of the dummy metal plate bonded to the other main surface is measured. The temperature history curve shown in FIG. 4 is obtained from the relationship between the surface temperature change of the dummy metal plate bonded to the other surface and the elapsed time from the start of laser pulse irradiation, and the thermal conductivity is calculated by the following formula.
λ = α ・ Cp ・ ρ (1)
Cp = Q / (M · θm) (2)
α = 0.1388 d / t1 / 2 (3)
λ: thermal conductivity (W / mK)
Cp: Specific heat (J / (kg · K))
α: Thermal diffusivity (m 2 / s)
ρ: Density (kg / m 3 )
Q: Heat input (laser pulse energy) (J)
θm: Temperature rise (K)
M: Mass (kg)
t1 / 2: Time required for the temperature to rise by 1/2 of the temperature rise (s)
d: Dummy part thickness (m)

前述したような方法で、セラミックス回路基板集合体1を構成するセラミックス回路基板2と同一の製造工程を経て形成されたダミー部31〜35を分割した後、このダミー部31〜35のうちの少なくとも1個のダミー部31の一方の主面に接合された金属板表面にレーザパルスを照射し、他方の主面のダミー金属板表面の温度を計測することにより、ダミー部31の一方のダミー金属板141の表面から、他方のダミー金属板151の表面までの、ダミー部の厚さ方向の熱伝導率を測定しているため、ダミー部31と同一の製造工程を経て形成されたセラミックス回路基板2の金属回路板121、122の表面から、金属放熱板13の表面にセラミックス回路基板2の厚さ方向の熱伝導率と同等の熱伝導率が得られることになる。このため、従来技術のようにセラミックス母基板10を構成するセラミックス材料のみの熱伝導率を測定して検査を行う場合に比較して、セラミックス回路基板2の金属回路板121,122や金属放熱板13とセラミックス母基板10間の接合層に伴う不具合も含めた検査が可能となるため、所望の熱伝導率の規格値からはずれたセラミックス回路基板2を排除することが可能となって、セラミックス回路基板の所望の放熱性が確保でき、パワー半導体素子をセラミックス回路基板2の金属回路板121、122の表面に半田で接合して使用した際に、半田が溶融したり、ボンディング断線などの不具合の発生を効率よく防ぐことが可能となる。   After dividing the dummy parts 31 to 35 formed through the same manufacturing process as the ceramic circuit board 2 constituting the ceramic circuit board assembly 1 by the method described above, at least one of the dummy parts 31 to 35 is formed. One dummy metal of the dummy part 31 is obtained by irradiating the surface of the metal plate joined to one main surface of one dummy part 31 with a laser pulse and measuring the temperature of the dummy metal plate surface of the other main surface. Since the thermal conductivity in the thickness direction of the dummy portion from the surface of the plate 141 to the surface of the other dummy metal plate 151 is measured, the ceramic circuit board formed through the same manufacturing process as the dummy portion 31 The thermal conductivity equivalent to the thermal conductivity in the thickness direction of the ceramic circuit board 2 is obtained from the surface of the second metal circuit board 121, 122 to the surface of the metal heat radiating plate 13. For this reason, compared with the case where the thermal conductivity of only the ceramic material constituting the ceramic mother board 10 is measured and inspected as in the prior art, the metal circuit boards 121 and 122 of the ceramic circuit board 2 and the metal heat sink Therefore, it is possible to eliminate the ceramic circuit board 2 that deviates from the standard value of the desired thermal conductivity, so that the ceramic circuit can be eliminated. The desired heat dissipation of the substrate can be ensured, and when the power semiconductor element is used by being joined to the surface of the metal circuit boards 121 and 122 of the ceramic circuit board 2 with solder, the solder melts or a defect such as bonding disconnection occurs. Occurrence can be efficiently prevented.

なお、熱伝導率を測定するダミー部31は、10mm×10mm以下の略正方形状であると、特別の加工を施すことなく、ダミー部を分割線に沿って容易に分割することができ、市販のレーザフラッシュ法による熱伝導率測定装置を用いて、ダミー部31の一方の主面のダミー金属板141の表面にレーザパルスを照射することにより、他方の主面のダミー金属板151の表面の温度を計測することによりダミー部21の熱伝導率を測定できるため、好ましい。また、セラミックス回路基板集合体1から1個のダミー部を作製して熱伝導率を測定する例を示したが、同一条件で連続的に製造した複数のセラミックス回路基板集合体1から、所定の頻度で抜き取って測定しても差し支えない。熱伝導率を測定するダミー部31は、4〜6mm×4〜6mmの略正方形状であると更に好ましい。   In addition, the dummy part 31 which measures thermal conductivity can divide | dummy a dummy part easily along a dividing line, without giving special processing as it is substantially square shape of 10 mm x 10 mm or less, and is commercially available. The surface of the dummy metal plate 151 on the other main surface is irradiated by irradiating the surface of the dummy metal plate 141 on one main surface of the dummy portion 31 with a laser pulse using the laser flash method thermal conductivity measuring apparatus of FIG. It is preferable because the thermal conductivity of the dummy portion 21 can be measured by measuring the temperature. Moreover, although the example which produces one dummy part from the ceramic circuit board assembly 1 and measures thermal conductivity was shown, predetermined | prescribed from the several ceramic circuit board assembly 1 manufactured continuously on the same conditions is predetermined. It does not matter if it is extracted at a frequency and measured. It is more preferable that the dummy part 31 for measuring the thermal conductivity has a substantially square shape of 4 to 6 mm × 4 to 6 mm.

また、ダミー部31〜35は、セラミックス回路基板集合体1の外周辺部に配置されていることから、セラミックス母基板10の金属回路板121、122および金属放熱板13との接合に伴い発生する、反りをコントロールすることが可能となるという効果も有し、反りが小さくなるよう、適宜その形状を調整することが可能である。   Further, since the dummy portions 31 to 35 are disposed in the outer peripheral portion of the ceramic circuit board assembly 1, the dummy portions 31 to 35 are generated when the ceramic circuit board 10 is joined to the metal circuit boards 121 and 122 and the metal heat radiating plate 13. In addition, there is an effect that the warp can be controlled, and the shape can be appropriately adjusted so that the warp is reduced.

以下、本発明のセラミックス回路基板の検査方法に用いられるセラミックス回路基板集合体1、セラミックス回路基板2、ダミー部31〜35について、さらに詳しく説明する。セラミックス母基板10は、パワー半導体の熱を放熱する観点から、その熱伝導率70W/mK以上が得られる窒化珪素や窒化アルミニウムが好適であり、公知のドクターブレード法、押出成形法、プレス成形法などを用いることができるが、セラミックス母基板10の厚さ0.2〜1.0mmを得る観点からは、ドクターブレード法が好ましく、成形体を窒素雰囲気中、1600℃以上の温度で焼結することにより得ることができる。熱伝導率と強度を両立させる観点からは窒化珪素が特に好ましい。   Hereinafter, the ceramic circuit board assembly 1, the ceramic circuit board 2, and the dummy parts 31 to 35 used in the ceramic circuit board inspection method of the present invention will be described in more detail. From the viewpoint of dissipating heat from the power semiconductor, the ceramic mother substrate 10 is preferably silicon nitride or aluminum nitride that can obtain a thermal conductivity of 70 W / mK or more. The known doctor blade method, extrusion molding method, and press molding method. From the viewpoint of obtaining a thickness of the ceramic mother substrate 10 of 0.2 to 1.0 mm, the doctor blade method is preferable, and the compact is sintered at a temperature of 1600 ° C. or higher in a nitrogen atmosphere. Can be obtained. Silicon nitride is particularly preferable from the viewpoint of achieving both thermal conductivity and strength.

得られたセラミックス母基板10上に公知のレーザスクライブ法で分割線5を形成する。分割線5はセラミックス回路基板2、ダミー部31〜35の形状にあわせて分割するためのものである。次にセラミックス母基板10表面にブラスト処理やバレル研磨を施し、基板の表面粗さRmaxを調整する。   A dividing line 5 is formed on the obtained ceramic mother substrate 10 by a known laser scribing method. The dividing line 5 is for dividing according to the shape of the ceramic circuit board 2 and the dummy parts 31 to 35. Next, the surface of the ceramic mother substrate 10 is subjected to blasting or barrel polishing to adjust the surface roughness Rmax of the substrate.

次に、表面処理後のセラミックス母基板10の両主面にセラミックス基板と略同面積を有する銅、銅合金、アルミニウムなどの金属板(図示せず)とを、活性金属ろう材法、DBC、DBA等の方法で接合する。中でも、銀(Ag)−銅(Cu)−チタン(Ti)系などの活性金属を含むろう材を用いる、活性金属ろう材法が接合強度を確保する観点から好ましい。まず、セラミックス母基板10の所定箇所に上記ろう材のペーストを印刷する。印刷厚みは用いるろう材粉末の粒度に依存するが、厚さ10〜50μm程度塗布する。次に、上記ろう材の表面に厚さ0.2mm以上の金属板を設置し、例えば、600〜900℃で加圧しながら接合することにより、セラミックス母基板10と金属板とは、ろう材からなる接合層を介して接合される。   Next, a metal plate (not shown) such as copper, copper alloy, or aluminum having substantially the same area as the ceramic substrate is formed on both main surfaces of the ceramic base substrate 10 after the surface treatment using the active metal brazing method, DBC, It joins by methods, such as DBA. Among these, an active metal brazing method using a brazing material containing an active metal such as silver (Ag) -copper (Cu) -titanium (Ti) is preferable from the viewpoint of securing bonding strength. First, the paste of the brazing material is printed on a predetermined portion of the ceramic mother substrate 10. Although the printing thickness depends on the particle size of the brazing filler metal powder to be used, the coating thickness is about 10 to 50 μm. Next, a metal plate having a thickness of 0.2 mm or more is placed on the surface of the brazing material, and the ceramic mother substrate 10 and the metal plate are separated from the brazing material by, for example, joining while pressing at 600 to 900 ° C. It joins via the joining layer which becomes.

次に、金属板が接合されたセラミックス基板の上記金属板および接合層の不要な領域を除去するため、フォトレジストパターンを形成した後、ウェットエッチング技術を使用して所望の箇所の金属板および接合層を除去して、所望の金属回路板121、122、金属放熱板13、ダミー金属板31〜35が接合層を介して接合されたセラミック回路板集合体1を作製する。従って、金属回路板121、122とダミー金属板141〜145、金属放熱板13とダミー金属板151〜155とは、同一の金属板から同一の条件で形成されているため、金属回路板121、122とダミー金属板141〜145は、その材質および厚さが実質的に同一の構造を有しており、金属放熱板13とダミー金属板151〜155とは、その材質および厚さが実質的に同一の構造を有している。   Next, in order to remove unnecessary regions of the metal plate and the bonding layer of the ceramic substrate to which the metal plate is bonded, after forming a photoresist pattern, the metal plate and bonding at a desired location using a wet etching technique. The layer is removed to produce the ceramic circuit board assembly 1 in which the desired metal circuit boards 121 and 122, the metal heat sink 13 and the dummy metal boards 31 to 35 are bonded via the bonding layer. Accordingly, since the metal circuit plates 121 and 122 and the dummy metal plates 141 to 145 and the metal heat dissipation plate 13 and the dummy metal plates 151 to 155 are formed from the same metal plate under the same conditions, the metal circuit plate 121, 122 and the dummy metal plates 141 to 145 have substantially the same material and thickness, and the metal heat dissipation plate 13 and the dummy metal plates 151 to 155 have substantially the same material and thickness. Have the same structure.

本発明のセラミックス回路基板2の検査方法において、ダミー部31〜35を分割する前に、セラミックス回路基板集合体1をめっき液に浸漬して、金属回路板121、122、金属放熱板13、ダミー金属板表面にニッケルめっきを施すことが好ましいのは、以下の理由による。ニッケルめっきは、金属回路板121.122および金属放熱板13の表面の半田濡れ性向上、防食の観点から施されるが、ニッケルめっきの形成工程で、熱伝導を阻害するめっき層が形成されるような不具合が発生した場合であっても、所望の熱伝導率の規格値からはずれたセラミックス回路基板2を排除することが可能となって、セラミックス回路基板の所望の放熱性が確保でき、パワー半導体素子をセラミックス回路基板2の金属回路板121、122の表面に半田で接合して使用した際に、半田が溶融したり、ボンディング断線などの不具合の発生を防ぐことが可能となるからである。   In the inspection method for the ceramic circuit board 2 according to the present invention, before the dummy parts 31 to 35 are divided, the ceramic circuit board assembly 1 is immersed in a plating solution, and the metal circuit boards 121 and 122, the metal heat sink 13 and the dummy. The reason why nickel plating is preferably performed on the surface of the metal plate is as follows. Nickel plating is performed from the viewpoint of improving the solder wettability of the surfaces of the metal circuit board 121.122 and the metal heat radiating plate 13 and preventing corrosion. In the nickel plating forming process, a plating layer that inhibits heat conduction is formed. Even when such a problem occurs, it is possible to exclude the ceramic circuit board 2 that deviates from the standard value of the desired thermal conductivity, so that the desired heat dissipation of the ceramic circuit board can be secured, and the power This is because, when the semiconductor element is used by being joined to the surface of the metal circuit boards 121 and 122 of the ceramic circuit board 2 with solder, it is possible to prevent the solder from melting or the occurrence of defects such as bonding disconnection. .

本発明のセラミックス回路基板の検査方法において、ダミー部31におけるセラミックス母基板10とダミー金属板141、151との接合面積が実質的に同一であり、ダミー部のセラミックス母基板101の主面の面積の60%以上であることが好ましいのは、以下の理由による。ダミー部31の前記両主面におけるセラミックス母基板101とダミー金属板141、151との接合面積が異なる場合は、レーザパルスの熱量が、一方のダミー金属板141の表面から他方のダミー金属板151の表面に一様に伝わらないため、熱伝導率の測定精度が悪くなるからである。また、ダミー部31の両主面におけるセラミックス母基板101とダミー金属板141、145との接合面積が、ダミー部におけるセラミックス母基板101の主面の面積の60%未満であると、レーザーパルスを加える面積が不足してしまい、熱伝導率の測定精度が悪くなるためである。   In the method for inspecting a ceramic circuit board of the present invention, the bonding area of the ceramic mother board 10 and the dummy metal plates 141 and 151 in the dummy part 31 is substantially the same, and the area of the main surface of the ceramic mother board 101 in the dummy part The reason why it is preferable to be 60% or more is as follows. When the bonding areas of the ceramic mother substrate 101 and the dummy metal plates 141 and 151 on the two main surfaces of the dummy portion 31 are different, the amount of heat of the laser pulse is changed from the surface of one dummy metal plate 141 to the other dummy metal plate 151. This is because the measurement accuracy of the thermal conductivity is deteriorated because it is not uniformly transmitted to the surface of the film. When the bonding area between the ceramic mother substrate 101 and the dummy metal plates 141 and 145 on both main surfaces of the dummy portion 31 is less than 60% of the area of the main surface of the ceramic mother substrate 101 in the dummy portion, the laser pulse is emitted. This is because the area to be added is insufficient and the measurement accuracy of the thermal conductivity is deteriorated.

なお、レーザーパルスを加える面積はダミー部31のダミー金属板141の表面の面積より小さいと、熱伝導率の測定精度が向上するため、好ましい。   In addition, it is preferable that the area to which the laser pulse is applied is smaller than the area of the surface of the dummy metal plate 141 of the dummy portion 31 because the measurement accuracy of the thermal conductivity is improved.

本発明のセラミックス回路基板の検査方法において、ダミー部31におけるセラミックス母基板101とダミー金属板141、151との間の接合層中のボイド率と、ダミー部31の熱伝導率の関係を予め測定し、前記ボイド率に基き熱伝導率の規格値を設定した後、この熱伝導率の規格値に基き、セラミックス回路基板2の放熱性の判定を行うことが好ましいのは、以下の理由による。セラミックス回路基板2の放熱性は、セラミックス母基板10を構成するセラミックスの熱伝導率とともに、セラミックス母基板10と金属回路板121、122および金属放熱板13との間の接合層中のボイドの影響を受ける。図5は、ダミー部のセラミックス母基板101と金属板141、151と間の接合層中のボイド率とダミー部31の一方の主面のダミー金属板141の表面にレーザパルスを照射し、他方の主面のダミー金属板151の表面の温度を計測することにより求めた熱伝導率との関係を示したものである。なお、接合層中のボイド率は、熱伝導率の測定を行った後、このダミー部の板厚と直角方向の平面を研磨して、接合層を出現させ、SEMによる観察を行い、画像解析で求めたもので、セラミックス母基板101の両主面のふたつの接合層のボイド率を平均して算出したものである。ボイド率の上昇と共に、セラミックス回路基板の熱伝導が阻害されるため、熱伝導率は低下する傾向にある。   In the ceramic circuit board inspection method of the present invention, the relationship between the void ratio in the bonding layer between the ceramic mother board 101 and the dummy metal plates 141 and 151 in the dummy portion 31 and the thermal conductivity of the dummy portion 31 is measured in advance. And after setting the standard value of thermal conductivity based on the said void rate, it is preferable to determine the heat dissipation of the ceramic circuit board 2 based on the standard value of this thermal conductivity for the following reasons. The heat dissipation of the ceramic circuit board 2 is influenced by the voids in the bonding layer between the ceramic mother board 10 and the metal circuit boards 121 and 122 and the metal heat sink 13 as well as the thermal conductivity of the ceramics constituting the ceramic mother board 10. Receive. FIG. 5 shows the void ratio in the bonding layer between the ceramic base substrate 101 of the dummy part and the metal plates 141 and 151, the surface of the dummy metal plate 141 on one main surface of the dummy part 31 being irradiated with a laser pulse, The relationship with the thermal conductivity calculated | required by measuring the temperature of the surface of the dummy metal plate 151 of the main surface is shown. The void ratio in the bonding layer was measured by measuring the thermal conductivity, and then polishing the plane perpendicular to the thickness of the dummy portion to cause the bonding layer to appear, observing with SEM, and image analysis And calculated by averaging the void ratios of the two bonding layers on both main surfaces of the ceramic mother substrate 101. As the void ratio increases, the thermal conductivity of the ceramic circuit board is hindered, so the thermal conductivity tends to decrease.

セラミックス回路基板2に載置するパワー半導体に応じて、例えばボイド率10%未満となる熱伝導率の規格値182W/m・Kを定めておき、この規格値に基き、ダミー部31の熱伝導率の測定結果に基づき、ダミー部31と同一のセラミックス回路基板集合体1から得られるセラミックス回路基板2の合否判定を行い、規格値未満の熱伝導率が得られた場合は、セラミックス回路基板2を不良として排除することにより、金属回路板121,122の表面にパワー半導体を接合して、半導体パワーモジュールに実装して使用した場合に、パワー半導体素子と金属回路板とを接合している半田が溶融したり、ボンディングの断線などの不具合が生じることを確実に抑えることが可能となる。   In accordance with the power semiconductor placed on the ceramic circuit board 2, for example, a standard value 182 W / m · K of the thermal conductivity that gives a void ratio of less than 10% is determined, and based on this standard value, the thermal conductivity of the dummy part 31 The ceramic circuit board 2 obtained from the same ceramic circuit board assembly 1 as that of the dummy portion 31 is determined to pass or fail based on the measurement result of the rate, and when the thermal conductivity less than the standard value is obtained, the ceramic circuit board 2 When the power semiconductor is joined to the surfaces of the metal circuit boards 121 and 122 and mounted on the semiconductor power module, the solder that joins the power semiconductor element and the metal circuit board is used. It is possible to reliably suppress the occurrence of problems such as melting of the metal and disconnection of bonding.

上記では、セラミックス回路基板集合体1から1個のダミー部を作製して熱伝導率を測定し、同一セラミックス回路基板集合体1のセラミックス回路基板2を判定する例を示したが、同一条件で連続的に製造した複数のセラミックス回路基板集合体1から、所定の頻度で抜き取って測定しても差し支えない。   In the above, an example is shown in which one dummy part is produced from the ceramic circuit board assembly 1 and the thermal conductivity is measured to determine the ceramic circuit board 2 of the same ceramic circuit board assembly 1. The measurement may be performed by extracting from a plurality of continuously produced ceramic circuit board assemblies 1 at a predetermined frequency.

これにより本発明では、事前にダミー部31の熱伝導率を測定した後、ダミー部31を研磨してボイド率を測定し、図5に示すボイド率と熱伝導率の関係を求めておけば、同一条件で製造するセラミックス回路基板2のボイド率をセラミックス回路基板2を研磨して測定する必要もなく、手間を大幅に軽減してセラミックス回路基板の放熱性の評価をレーザフラッシュ法を用いて簡便にできるため、不具合品を適切に除外することが可能となる。   Thus, in the present invention, after measuring the thermal conductivity of the dummy part 31 in advance, the dummy part 31 is polished and the void ratio is measured, and the relationship between the void ratio and the thermal conductivity shown in FIG. 5 is obtained. The void ratio of the ceramic circuit board 2 manufactured under the same conditions does not need to be measured by polishing the ceramic circuit board 2, and the laser flash method is used to evaluate the heat dissipation of the ceramic circuit board by greatly reducing labor. Since it can be simplified, defective products can be appropriately excluded.

(実施例1)
以下、本発明の実施例について説明する。ただし、これら実施例により本発明が限定されるものではない。
Example 1
Examples of the present invention will be described below. However, the present invention is not limited to these examples.

40×23mmのセラミックス回路基板2を9個取りできる、130×85×0.4mmのセラミックス回路基板集合体1を100枚作製した。
[セラミックス母基板10の作成]
窒化珪素原料粉末に、焼結助剤として酸化マグネシウム粉末3重量%、及び酸化イットリウム粉末3重量%を添加し、有機溶剤中で粉砕媒体として窒化珪素製ボールを用いたボールミルにより湿式混合した。この混合物に有機バインダー、可塑剤等を混入しボールミルで均一に混合して原料スラリーとした。原料スラリーを脱泡・増粘した後、ドクターブレード法で所定板厚にシート成形して成形体を得た。このシート成形体を所定形状に切断後、脱脂し、更に、窒素加圧雰囲気中で1800℃の温度で焼結した。
100 ceramic circuit board assemblies 1 of 130 × 85 × 0.4 mm capable of taking nine 40 × 23 mm ceramic circuit boards 2 were produced.
[Creation of Ceramic Mother Board 10]
To the silicon nitride raw material powder, 3% by weight of magnesium oxide powder and 3% by weight of yttrium oxide powder were added as sintering aids, and wet mixed in an organic solvent by a ball mill using silicon nitride balls as a grinding medium. An organic binder, a plasticizer, and the like were mixed into this mixture and uniformly mixed with a ball mill to obtain a raw material slurry. The raw material slurry was defoamed and thickened, and then formed into a predetermined plate thickness by a doctor blade method to obtain a molded body. The sheet molded body was cut into a predetermined shape, degreased, and further sintered at a temperature of 1800 ° C. in a nitrogen pressure atmosphere.

[分割線の形成]
図1に示すようにセラミックス母基板10をセラミックス回路基板2の9個(3×3個)とその周囲のダミー部31〜35の15個とに区分けできるようにレーザーで分割線5を形成した。
[Formation of dividing lines]
As shown in FIG. 1, the dividing line 5 is formed by a laser so that the ceramic mother board 10 can be divided into nine (3 × 3) ceramic circuit boards 2 and fifteen dummy parts 31 to 35 around them. .

[ブラスト処理]
セラミックス母基板10表面を適度な粗さ(Ra0.4〜0.8μm)にして金属板との接合性をよくするために研磨材を表裏面全面に均一に吹き付ける乾式ブラスト処理を行った。
[Blasting]
In order to make the surface of the ceramic mother substrate 10 moderately rough (Ra 0.4 to 0.8 μm) and improve the bondability with the metal plate, a dry blasting process was performed in which an abrasive was sprayed uniformly over the entire front and back surfaces.

[接合]
ブラスト処理した100枚のセラミックス母基板10の両面に銅板を活性金属ろう材法で接合した。まず、窒化珪素セラミックス基板の両主面の所定箇所にAg−Cu−Ti系ろう材ペーストを印刷法により塗布した。上記ろう材の表面にセラミックス母基板10とほぼ同じ長方形状で厚さ0.6mmの銅板を設置した。これを1セットとし、カーボン薄板を介して25セットを重ねて1山とした。合計4山を2行2列に並べて接合炉に装入し、加熱・加圧しながら接合し、セラミックス母基板と銅板の間に接合層を形成した。
[Join]
A copper plate was joined to both surfaces of 100 blasted ceramic mother substrates 10 by an active metal brazing method. First, an Ag—Cu—Ti brazing paste was applied to a predetermined portion of both main surfaces of the silicon nitride ceramic substrate by a printing method. A copper plate having the same rectangular shape as the ceramic base substrate 10 and a thickness of 0.6 mm was placed on the surface of the brazing material. This was made into 1 set, and 25 sets were piled up through the carbon thin plate, and it was set as 1 pile. A total of 4 ridges were arranged in 2 rows and 2 columns and charged into a joining furnace, and joined while heating and pressing to form a joining layer between the ceramic mother board and the copper plate.

[エッチング]
接合した金属板の全面にフォトレジストを塗布しフォトリソグラフィ技術を使ってフォトレジストパターンを形成した。次に、ウェットエッチング技術を使用して塩化第二鉄溶液で金属板のうち不要な部分を除去した後、フォトレジストを除去して、所定の形状の金属回路板121、122、金属放熱板13、ダミー金属板31〜35が接合されたセラミックス回路基板集合体1を得た。次いで金属回路板121、122、金属放熱板13、ダミー金属板31〜35からはみ出している接合層(ろう材)を除去した。
[etching]
Photoresist was applied to the entire surface of the bonded metal plates, and a photoresist pattern was formed using photolithography technology. Next, after removing unnecessary portions of the metal plate with a ferric chloride solution using a wet etching technique, the photoresist is removed, and the metal circuit plates 121 and 122 having a predetermined shape and the metal heat radiating plate 13 are removed. The ceramic circuit board assembly 1 to which the dummy metal plates 31 to 35 were bonded was obtained. Next, the bonding layer (brazing material) protruding from the metal circuit plates 121 and 122, the metal heat sink 13, and the dummy metal plates 31 to 35 was removed.

[活性化]
金属回路板121、122、金属放熱板13、ダミー金属板31〜35を接合したセラミックス回路基板集合体1を硫酸パラジウム溶液に浸漬し、金属回路板121、122、金属放熱板13、ダミー金属板31〜35の表面にパラジウムを析出させた。次いで硫酸に浸漬することによりセラミックス母基板10の表面に析出したパラジウムを除去した。
[activation]
The ceramic circuit board assembly 1 to which the metal circuit boards 121 and 122, the metal heat sink 13, and the dummy metal boards 31 to 35 are joined is immersed in a palladium sulfate solution, and the metal circuit boards 121 and 122, the metal heat sink 13 and the dummy metal board are immersed. Palladium was deposited on the surfaces 31-35. Next, palladium deposited on the surface of the ceramic mother substrate 10 was removed by dipping in sulfuric acid.

[めっき]
次に、パラジウム付与した金属回路板121、122、金属放熱板13、ダミー金属板31〜35の表面にニッケル−リンめっき膜を形成してセラミックス回路基板集合体1を100枚得た。
[Plating]
Next, nickel-phosphorous plating films were formed on the surfaces of the metal circuit plates 121 and 122 to which palladium was applied, the metal heat dissipation plate 13, and the dummy metal plates 31 to 35 to obtain 100 ceramic circuit board assemblies 1.

[分割]
セラミックス回路基板集合体1に形成した分割線に沿って分割して1枚のセラミックス回路基板集合体1からセラミックス回路基板2を9枚とダミー部31〜35を15個得た。ダミー部31におけるセラミックス基板の寸法は5mm×5mm一定とし、厚さは0.4mmである。セラミックス基板の表裏に接合された一対のダミー金属板141、151は、同形状かつ同面積であってセラミックス基板を挟んで対向配置し、さらにその面積はセラミックス基板の80%の4.47×4.47mmである。
[Split]
Nine ceramic circuit boards 2 and 15 dummy parts 31 to 35 were obtained from one ceramic circuit board aggregate 1 by dividing along the dividing line formed on the ceramic circuit board aggregate 1. The size of the ceramic substrate in the dummy part 31 is constant 5 mm × 5 mm, and the thickness is 0.4 mm. The pair of dummy metal plates 141 and 151 bonded to the front and back of the ceramic substrate have the same shape and the same area and are opposed to each other with the ceramic substrate interposed therebetween, and the area is 4.47 × 4 which is 80% of the ceramic substrate. .47 mm 2 .

得られた100枚のセラミックス回路基板集合体から、各1個のダミー部の熱伝導率を測定した。ダミー部31の熱伝導率測定には京都電子製レーザフラッシュ法熱物性測定措置LFA−502を用い、一方のダミー金属板141表面にレーザパルスを照射し、他方のダミー金属板151表面の温度を計測することにより測定した。測定時のリファレンスにはNi板を用い、また、レーザ光は4mm角の遮光板開口部を通してダミー金属板141の表面に照射した。ダミー部31の熱伝導率は、図4に示すようなダミー金属板151表面の温度履歴曲線、および式(1)、(2)、(3)を用いて算出した。   From the obtained 100 ceramic circuit board aggregates, the thermal conductivity of each one dummy part was measured. For measuring the thermal conductivity of the dummy part 31, a laser flash method thermophysical property measuring measure LFA-502 manufactured by Kyoto Electronics was used. Measured by measuring. A Ni plate was used as a reference at the time of measurement, and laser light was applied to the surface of the dummy metal plate 141 through a 4 mm square light shielding plate opening. The thermal conductivity of the dummy part 31 was calculated using the temperature history curve on the surface of the dummy metal plate 151 as shown in FIG. 4 and the equations (1), (2), and (3).

得られた、100個のダミー部31の熱伝導率の値は、185〜198W/m・Kであった。一方、100枚のセラミックス回路基板集合体1から得られた900個のセラミックス回路基板2の金属回路板121の表面に出力200Wワットのパワー素子を厚さ0.15mmのはんだ層で接合しワイヤボンディングを施し、放熱板には55mm×86mm×3mm厚の放熱ベースを厚さ0.15mmのはんだ層で接合した。このパワー素子に電力を5秒間供給し、次いで電力を30秒間停止する昇温・降温サイクルを1サイクルとし、これを繰り返し付与した。1000サイクル経過後においても、はんだ層の溶融やボンディングワイヤの断線等の不具合が生じることはなく、セラミックス回路基板は設計通りの放熱性を有することが確認された。   The value of the thermal conductivity of the 100 dummy parts 31 obtained was 185 to 198 W / m · K. On the other hand, a power element with an output of 200 watts is bonded to the surface of the metal circuit board 121 of 900 ceramic circuit boards 2 obtained from 100 ceramic circuit board assemblies 1 by a solder layer having a thickness of 0.15 mm, and wire bonding is performed. Then, a heat dissipation base having a thickness of 55 mm × 86 mm × 3 mm was joined to the heat dissipation plate with a solder layer having a thickness of 0.15 mm. Electric power was supplied to this power element for 5 seconds, and then the temperature increase / decrease cycle in which the electric power was stopped for 30 seconds was defined as 1 cycle, and this was repeatedly applied. Even after 1000 cycles, there were no problems such as melting of the solder layer and disconnection of the bonding wire, and it was confirmed that the ceramic circuit board had the heat dissipation as designed.

(比較例1)
実施例1に対して、セラミックス母基板10を構成する窒化珪素セラミックスの熱伝導率測定を、湿式混合して得られた混合物をCIP成形で成形して、φ10mm×3mmの焼結体試験片を10個作製し、金属板を接合せずに、JIS R1611に規定されているレーザフラッシュ法による熱伝導率試験方法により測定した以外は、実施例1と同様にして、セラミックス回路基板集合体1を100枚作製し、セラミックス回路基板2を900個作製した。φ10mm×3mmの焼結体試験片の熱伝導率の測定値は72〜81W/m・Kであり、所望の値が得られていることを確認した。
(Comparative Example 1)
Compared to Example 1, the thermal conductivity measurement of silicon nitride ceramics constituting the ceramic mother substrate 10 was performed by CIP molding of a mixture obtained by wet mixing, and a sintered specimen of φ10 mm × 3 mm was obtained. The ceramic circuit board assembly 1 was manufactured in the same manner as in Example 1 except that 10 pieces were manufactured and measured by the thermal conductivity test method by the laser flash method specified in JIS R1611 without joining the metal plates. 100 pieces were produced, and 900 ceramic circuit boards 2 were produced. The measured value of the thermal conductivity of the sintered body test piece of φ10 mm × 3 mm was 72 to 81 W / m · K, and it was confirmed that a desired value was obtained.

前記900個のセラミックス回路基板2に対して、実施例1と同様にしてパワー素子を接合後に、昇温・降温サイクル試験を実施した。その結果、45個のセラミックス回路基板2で半田層の溶融が発生した。一部のセラミックス回路基板集合体1においてセラミックス基板と金属板を接合する際の接合条件が実施例1と微妙に変化し、接合層中に微小ボイドが生じて空隙率が10%以上になっていた。   After the power elements were bonded to the 900 ceramic circuit boards 2 in the same manner as in Example 1, a temperature increase / decrease cycle test was performed. As a result, melting of the solder layer occurred in 45 ceramic circuit boards 2. In some ceramic circuit board assemblies 1, the bonding conditions when bonding the ceramic substrate and the metal plate are slightly different from those in Example 1, microvoids are generated in the bonding layer, and the porosity is 10% or more. It was.

(比較例2)
焼結体試験片の寸法をφ10mm×0.4mmとしたことを除いて比較例1と同様に焼結体試験片の熱伝導率を測定した。測定値は74〜84W/m・Kであり、所望の値が得られていることを確認した。実施例1と同様にして、セラミックス回路基板集合体1を100枚作製し、セラミックス回路基板2を900個作製した。
(Comparative Example 2)
The thermal conductivity of the sintered body test piece was measured in the same manner as in Comparative Example 1 except that the size of the sintered body test piece was φ10 mm × 0.4 mm. The measured value was 74 to 84 W / m · K, and it was confirmed that a desired value was obtained. In the same manner as in Example 1, 100 ceramic circuit board assemblies 1 and 900 ceramic circuit boards 2 were produced.

前記900個のセラミックス回路基板2に対して、実施例1と同様にしてパワー素子を接合後に、昇温・降温サイクル試験を実施した。その結果、41個のセラミックス回路基板2で半田層の溶融が発生した。一部のセラミックス回路基板集合体1においてセラミックス基板と金属板を接合する際の接合条件が実施例1と微妙に変化し、接合層中に微小ボイドが生じて空隙率が10%以上になっていた。   After the power elements were bonded to the 900 ceramic circuit boards 2 in the same manner as in Example 1, a temperature increase / decrease cycle test was performed. As a result, melting of the solder layer occurred in 41 ceramic circuit boards 2. In some ceramic circuit board assemblies 1, the bonding conditions when bonding the ceramic substrate and the metal plate are slightly different from those in Example 1, microvoids are generated in the bonding layer, and the porosity is 10% or more. It was.

(実施例2)
実施例1に対して、金属回路板121、122およびダミー金属板141の厚さを0.4mm、金属放熱板13およびダミー放熱板の厚さを0.6mmとした以外は、実施例1と同様にしてセラミックス回路基板集合体1を100枚作製し、セラミックス回路基板900枚とダミー部31〜35を得た。
(Example 2)
Compared to the first embodiment, the thickness of the metal circuit boards 121 and 122 and the dummy metal plate 141 is 0.4 mm, and the thickness of the metal heat sink 13 and the dummy heat sink is 0.6 mm. Similarly, 100 ceramic circuit board assemblies 1 were produced, and 900 ceramic circuit boards and dummy parts 31 to 35 were obtained.

一方、実施例2で得たセラミックス回路基板集合体1に対してそれぞれの接合条件を変更した以外は同様にしてセラミックス回路基板集合体を18枚作製した。このセラミックス回路基板集合体1から各1個のダミー部の接合層中のボイド率と、一方のダミー銅板表面にレーザパルスを照射して、他方のダミー銅板表面の温度を計測することによりレーザフラッシュ法で測定した熱伝導率の関係を図5に示す。接合層中のボイド率は、熱伝導率の測定を行った後、このダミー部の板厚と直角方向の平面を研磨して、接合層を出現させ、SEMによる観察を行い、画像解析で求めたもので、セラミックス板の両主面のふたつの接合層のボイド率を平均して算出したものである。ボイド率が10%以下であれば、パワー素子モジュールの設計上、必要な昇温・降温サイクル性能が得られることから、熱伝導率の規格値を図5に基き。182W/m・K以上と定めた。   On the other hand, 18 ceramic circuit board assemblies were produced in the same manner except that the respective joining conditions were changed for the ceramic circuit board assembly 1 obtained in Example 2. Laser flashing is performed by measuring the void ratio in the bonding layer of each one dummy part from this ceramic circuit board assembly 1 and the surface of one dummy copper plate, and measuring the temperature of the other dummy copper plate surface. The relationship of the thermal conductivity measured by the method is shown in FIG. The void ratio in the bonding layer is obtained by measuring the thermal conductivity, then polishing the plane perpendicular to the plate thickness of this dummy part, causing the bonding layer to appear, observing with SEM, and image analysis. It is calculated by averaging the void ratios of the two bonding layers on both main surfaces of the ceramic plate. If the void ratio is 10% or less, the required temperature increase / decrease cycle performance can be obtained in the design of the power element module. Therefore, the standard value of thermal conductivity is based on FIG. It was determined to be 182 W / m · K or more.

次に、100枚のセラミックス回路基板集合体1から分割した各1個のダミー部31の熱伝導率の測定を実施例1と同様に行い、熱伝導率が182W/m・K未満のダミー部があった場合は、そのダミー部のあったセラミックス回路基板集合体1中のセラミックス回路基板9個を除いた後、セラミックス回路基板2に対して、パワー素子を接合後に、昇温・降温サイクル試験を実施した。その結果、はんだ層の溶融やボンディングワイヤの断線等の不具合が生じることはなく、セラミックス回路基板は設計通りの放熱性を有することが確認された。   Next, the thermal conductivity of each dummy part 31 divided from 100 ceramic circuit board assemblies 1 is measured in the same manner as in Example 1, and the dummy part having a thermal conductivity of less than 182 W / m · K. If there is, the ceramic circuit board assembly 1 in the ceramic circuit board assembly 1 having the dummy portion was removed, the power element was joined to the ceramic circuit board 2, and the temperature increase / decrease cycle test Carried out. As a result, problems such as melting of the solder layer and disconnection of the bonding wire did not occur, and it was confirmed that the ceramic circuit board had heat dissipation as designed.

(実施例3)
実施例1と同様にしてセラミックス回路基板集合体1を100枚作製し、セラミックス回路基板900枚とダミー部31〜35を得た。
(Example 3)
In the same manner as in Example 1, 100 ceramic circuit board assemblies 1 were produced, and 900 ceramic circuit boards and dummy parts 31 to 35 were obtained.

次に、セラミックス母基板と銅板との接合時にセラミックス母基板と銅板を重ねた各山において上から1,5,9,13,17,21,25セット目から得られた各セラミックス回路基板集合体1から分割した各1個のダミー部31の熱伝導率を実施例1と同様に行った。   Next, each ceramic circuit board assembly obtained from the first, fifth, ninth, thirteenth, seventeenth, twenty-first and twenty-fifth sets from the top in each pile where the ceramic mother board and the copper plate are overlapped when the ceramic mother board and the copper plate are joined. The thermal conductivity of each one dummy portion 31 divided from 1 was performed in the same manner as in Example 1.

熱伝導率が182W/m・K未満のダミー部があった場合は、そのダミー部のあったセラミックス回路基板集合体およびその前後各3枚のセラミックス回路基板集合体、合計7枚のセラミックス回路基板集合体から得られたセラミックス回路基板63個を除いた。   When there is a dummy part having a thermal conductivity of less than 182 W / m · K, the ceramic circuit board assembly having the dummy part and three ceramic circuit board assemblies before and after the dummy part, a total of seven ceramic circuit boards The 63 ceramic circuit boards obtained from the assembly were removed.

その後、セラミックス回路基板2に対して、パワー素子を接合後に、昇温・降温サイクル試験を実施した。その結果、はんだ層の溶融やボンディングワイヤの断線等の不具合が生じることはなく、セラミックス回路基板は設計通りの放熱性を有することが確認された。   Thereafter, after the power element was bonded to the ceramic circuit board 2, a temperature increase / decrease cycle test was performed. As a result, problems such as melting of the solder layer and disconnection of the bonding wire did not occur, and it was confirmed that the ceramic circuit board had heat dissipation as designed.

本発明のセラミックス回路基板の検査方法は、パワー素子を実装した際に発生する不具合を確実に防ぐことが可能となる。従って、セラミックス基板に金属回路板や金属放熱板を接合した構造のセラミックス回路基板の放熱性の検査方法として有用に用いることができる。   The inspection method for a ceramic circuit board according to the present invention can surely prevent problems that occur when a power element is mounted. Therefore, it can be usefully used as a method for inspecting the heat dissipation of a ceramic circuit board having a structure in which a metal circuit board or a metal heat sink is bonded to the ceramic board.

1・・・セラミックス回路基板集合体
10・・・セラミックス母基板
2・・・セラミックス回路基板
121,122・・・金属回路板
13・・・金属放熱板
101・・・ダミー部のセラミックス基板
141,142,143,144,145・・・ダミー金属板
151,152,153,154,155・・・ダミー金属板
31,32,33,34,35・・・ダミー部
5・・・分割溝


DESCRIPTION OF SYMBOLS 1 ... Ceramic circuit board assembly 10 ... Ceramic mother board 2 ... Ceramic circuit boards 121, 122 ... Metal circuit board 13 ... Metal heat sink 101 ... Dummy ceramic board 141, 142, 143, 144, 145 ... dummy metal plates 151, 152, 153, 154, 155 ... dummy metal plates 31, 32, 33, 34, 35 ... dummy portion 5 ... dividing groove


Claims (7)

セラミックス母基板の一方の主面に接合層を介して接合した金属回路板と、他方の主面に接合層を介して接合した金属放熱板とを備えるセラミックス回路基板を有し、
さらに、前記一方主面の外周辺部に接合層を介して接合した前記金属回路板と同材質且つ同一厚さのダミー金属板と、前記他方の主面の外周辺部に接合層を介して接合した前記金属放熱板と同材質且つ同一厚さのダミー金属板とを備えるダミー部を有し、
前記セラミックス回路基板および前記ダミー部をそれぞれ分割するための分割溝が設けられており、前記ダミー部が熱伝導率測定に用いられることを特徴とするセラミックス回路基板集合体。
A ceramic circuit board comprising a metal circuit board bonded to one main surface of the ceramic mother board via a bonding layer and a metal heat sink bonded to the other main surface via a bonding layer;
Furthermore, a dummy metal plate of the same material and thickness as the metal circuit board joined to the outer peripheral part of the one main surface via a bonding layer, and a bonding layer to the outer peripheral part of the other main surface Having a dummy portion comprising a dummy metal plate of the same material and the same thickness as the joined metal heat sink;
A ceramic circuit board assembly, wherein a division groove for dividing the ceramic circuit board and the dummy part is provided, and the dummy part is used for thermal conductivity measurement.
前記両主面において、前記セラミックス基板と前記ダミー金属板との接合面積は同一であり、前記ダミー部におけるセラミックス基板の主面の面積の60%以上であることを特徴とする請求項1に記載のセラミックス回路基板集合体。   2. The bonding surface of the ceramic substrate and the dummy metal plate is the same on both the main surfaces, and is 60% or more of the area of the main surface of the ceramic substrate in the dummy portion. Ceramic circuit board assembly. 前記ダミー部において、前記両主面のダミー金属板は対向配置しており、反り制御用にも用いられることを特徴とする請求項1または2に記載のセラミックス回路基板集合体。   3. The ceramic circuit board assembly according to claim 1, wherein in the dummy portion, the dummy metal plates on both main surfaces are arranged to face each other and are also used for warpage control. 4. セラミックス母基板を用意する工程と、
前記セラミックス母基板に分割溝を形成する工程と、
前記セラミックス母基板の一方の主面に接合層を介して金属回路板を接合する工程と、
前記セラミックス母基板の他方の主面に接合層を介して金属放熱板を接合する工程と、
前記金属回路板と金属放熱板及び接合層の不要な領域を除去することにより、金属回路板と金属放熱板とを備えるセラミックス回路基板を形成すると共に、前記一方の主面の外周辺部に前記金属回路板と同材質且つ同一厚さのダミー金属板を形成し、且つ前記他方の主面の外周辺部には前記金属放熱板と同材質且つ同一厚さのダミー金属板を形成して熱伝導率測定に用いられるダミー部とする工程と、
前記セラミックス回路基板および前記ダミー部を、前記分割溝を用いて分割する工程と、
を有することを特徴とするセラミックス回路基板の製造方法。
Preparing a ceramic mother substrate;
Forming a dividing groove in the ceramic mother substrate;
Bonding a metal circuit board to one main surface of the ceramic mother board via a bonding layer;
Bonding a metal heat sink to the other main surface of the ceramic mother substrate through a bonding layer;
By removing unnecessary areas of the metal circuit board, the metal heat sink and the bonding layer, a ceramic circuit board including the metal circuit board and the metal heat sink is formed, and the outer peripheral portion of the one main surface is formed with the ceramic circuit board. A dummy metal plate having the same material and the same thickness as the metal circuit board is formed, and a dummy metal plate having the same material and the same thickness as the metal heat radiating plate is formed on the outer peripheral portion of the other main surface. A dummy part used for conductivity measurement;
Dividing the ceramic circuit board and the dummy portion using the dividing grooves;
A method for producing a ceramic circuit board, comprising:
分割した後、少なくとも一つのダミー部の一方の主面のダミー金属板表面にレーザパルスを照射し、他方の主面のダミー金属板表面の温度を計測することにより熱伝導率を測定して前記セラミックス回路基板の放熱性の判定を行う工程と、
前記判定により所望の熱伝導率の規格値からはずれたセラミックス回路基板を排除する工程と、
を有することを特徴とする請求項4に記載のセラミックス回路基板の製造方法。
After the division, the thermal conductivity is measured by irradiating the surface of the dummy metal plate on one main surface of the at least one dummy part with a laser pulse, and measuring the temperature of the surface of the dummy metal plate on the other main surface. A step of determining the heat dissipation of the ceramic circuit board;
Removing the ceramic circuit board deviated from the standard value of the desired thermal conductivity by the determination;
The method for producing a ceramic circuit board according to claim 4, wherein:
前記ダミー部におけるセラミックス基板とダミー金属板との間の接合層中のボイド率と熱伝導率の関係を予め測定し、前記ボイド率に基き熱伝導率の規格値を設定した後、前記熱伝導率の規格値に基き前記セラミックス回路基板の放熱性の判定を行うことを特徴とする請求項4または5に記載のセラミックス回路基板の製造方法。   The relationship between the void ratio and the thermal conductivity in the bonding layer between the ceramic substrate and the dummy metal plate in the dummy portion is measured in advance, and after setting the standard value of the thermal conductivity based on the void ratio, the thermal conductivity 6. The method of manufacturing a ceramic circuit board according to claim 4, wherein the heat dissipation of the ceramic circuit board is determined based on a standard value of the rate. 前記ダミー部は10mm×10mm以下に形成されることを特徴とする請求項4乃至6のいずれかに記載のセラミックス回路基板の製造方法。


The method for manufacturing a ceramic circuit board according to claim 4, wherein the dummy portion is formed to be 10 mm × 10 mm or less.


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