JP2016007709A - Non-adhesive film structure and method for producing the same - Google Patents
Non-adhesive film structure and method for producing the same Download PDFInfo
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- JP2016007709A JP2016007709A JP2014127567A JP2014127567A JP2016007709A JP 2016007709 A JP2016007709 A JP 2016007709A JP 2014127567 A JP2014127567 A JP 2014127567A JP 2014127567 A JP2014127567 A JP 2014127567A JP 2016007709 A JP2016007709 A JP 2016007709A
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- fluororesin
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- adhesive film
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- 239000002313 adhesive film Substances 0.000 title claims abstract description 24
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 20
- 239000002245 particle Substances 0.000 claims abstract description 109
- 239000010410 layer Substances 0.000 claims abstract description 84
- 238000000576 coating method Methods 0.000 claims abstract description 57
- 239000011248 coating agent Substances 0.000 claims abstract description 56
- 229910052751 metal Inorganic materials 0.000 claims abstract description 43
- 239000002184 metal Substances 0.000 claims abstract description 43
- 239000000758 substrate Substances 0.000 claims abstract description 30
- 239000011230 binding agent Substances 0.000 claims abstract description 27
- 239000002344 surface layer Substances 0.000 claims abstract description 17
- 239000003973 paint Substances 0.000 claims description 43
- 239000006185 dispersion Substances 0.000 claims description 35
- 239000000463 material Substances 0.000 claims description 23
- 150000001875 compounds Chemical class 0.000 claims description 13
- 239000011347 resin Substances 0.000 claims description 13
- 229920005989 resin Polymers 0.000 claims description 13
- 238000010304 firing Methods 0.000 claims description 11
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims description 11
- 239000004810 polytetrafluoroethylene Substances 0.000 claims description 11
- 229910052731 fluorine Inorganic materials 0.000 claims description 9
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 8
- 239000011737 fluorine Substances 0.000 claims description 8
- 239000007788 liquid Substances 0.000 claims description 8
- 238000002844 melting Methods 0.000 claims description 7
- 230000008018 melting Effects 0.000 claims description 7
- 239000000919 ceramic Substances 0.000 description 32
- 239000000203 mixture Substances 0.000 description 17
- 238000012360 testing method Methods 0.000 description 16
- 239000012790 adhesive layer Substances 0.000 description 14
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- 239000010936 titanium Substances 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
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- 238000010411 cooking Methods 0.000 description 4
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- 238000001035 drying Methods 0.000 description 4
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- 229910052710 silicon Inorganic materials 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
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- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
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- 238000005422 blasting Methods 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
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- 239000012528 membrane Substances 0.000 description 3
- 239000007769 metal material Substances 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 229910052726 zirconium Inorganic materials 0.000 description 3
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- 239000002033 PVDF binder Substances 0.000 description 2
- 229920006361 Polyflon Polymers 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 230000003712 anti-aging effect Effects 0.000 description 2
- 230000002421 anti-septic effect Effects 0.000 description 2
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- 239000002270 dispersing agent Substances 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
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- 239000012760 heat stabilizer Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 229910052809 inorganic oxide Inorganic materials 0.000 description 2
- 239000004611 light stabiliser Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 229920002493 poly(chlorotrifluoroethylene) Polymers 0.000 description 2
- 239000005023 polychlorotrifluoroethylene (PCTFE) polymer Substances 0.000 description 2
- 229920002620 polyvinyl fluoride Polymers 0.000 description 2
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000010998 test method Methods 0.000 description 2
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 2
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 2
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 2
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 241001609030 Brosme brosme Species 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- 241000467686 Eschscholzia lobbii Species 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- 229910001128 Sn alloy Inorganic materials 0.000 description 1
- 239000004902 Softening Agent Substances 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 229910001297 Zn alloy Inorganic materials 0.000 description 1
- 229910001093 Zr alloy Inorganic materials 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- SMZOGRDCAXLAAR-UHFFFAOYSA-N aluminium isopropoxide Chemical compound [Al+3].CC(C)[O-].CC(C)[O-].CC(C)[O-] SMZOGRDCAXLAAR-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- UUAGAQFQZIEFAH-UHFFFAOYSA-N chlorotrifluoroethylene Chemical compound FC(F)=C(F)Cl UUAGAQFQZIEFAH-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 150000004292 cyclic ethers Chemical class 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 229940028356 diethylene glycol monobutyl ether Drugs 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 229920001038 ethylene copolymer Polymers 0.000 description 1
- 229920000840 ethylene tetrafluoroethylene copolymer Polymers 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000001023 inorganic pigment Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000011344 liquid material Substances 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 description 1
- 238000007750 plasma spraying Methods 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920003257 polycarbosilane Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000007761 roller coating Methods 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 235000013555 soy sauce Nutrition 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000005211 surface analysis Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
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- 239000008096 xylene Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Landscapes
- Application Of Or Painting With Fluid Materials (AREA)
- Laminated Bodies (AREA)
Abstract
Description
本発明は、非粘着性皮膜構造およびその製造方法の技術に関し、より詳細には、金属基材上に形成される非粘着性を有する皮膜構造およびその製造方法に関する。 The present invention relates to a technique of a non-adhesive film structure and a manufacturing method thereof, and more particularly to a non-adhesive film structure formed on a metal substrate and a manufacturing method thereof.
従来、フライパンやオーブンレンジなどの高温調理機器では、焦げ付きを少なくして洗浄性能などを向上させるために、調理面(金属基材)にフッ素樹脂塗料を塗布(トップコーティング)して形成した非粘着層を有してなる非粘着性皮膜の構成が公知である。この種の非粘着層は、非粘着性だけでなく、低摩擦性、耐薬品性、絶縁性などの特性を有しており、上述した高温調理機器の他にも、接着剤を使用する部品、ゴム・樹脂などの成型用金型、及び生産ラインを構成する搬送ローラやガイドなどに採用されている。 Conventionally, in high-temperature cooking equipment such as frying pans and microwave ovens, non-adhesive formed by applying fluororesin paint (top coating) to the cooking surface (metal substrate) to reduce scorching and improve cleaning performance etc. The structure of the non-adhesive film which has a layer is known. This type of non-adhesive layer has not only non-adhesive properties, but also low friction, chemical resistance, insulation, and other characteristics. It is used for molding dies such as rubber and resin, and conveyance rollers and guides constituting a production line.
ところで、上述した皮膜構造においては、フッ素樹脂塗料により形成される非粘着層の硬度が低く傷等が付き易いことから、例えば、金属基材上にセラミック溶射等の表面処理を行った後にフッ素樹脂塗を塗布して非粘着層を形成したり、セラミック粉末を添加したフッ素樹脂塗を塗布して非粘着層を形成したりするなどして、耐摩耗性を向上させた皮膜構成が提案されている。しかし、かかる構成では、下塗層(セラミック溶射層を含む)と非粘着層との密着性が低く、非粘着層の剥離等により下塗層が露出して非粘着性及び耐摩耗性が早期に低下してしまうなど、耐久性に劣るという問題があった。 By the way, in the above-mentioned film structure, since the hardness of the non-adhesive layer formed by the fluororesin coating is low and easily damaged, for example, the surface of the metal substrate is subjected to surface treatment such as ceramic spraying, and then the fluororesin A coating structure with improved wear resistance has been proposed, such as applying a coating to form a non-adhesive layer, or applying a fluororesin coating containing ceramic powder to form a non-adhesive layer. Yes. However, in such a configuration, the adhesion between the undercoat layer (including the ceramic sprayed layer) and the non-adhesive layer is low, and the non-adhesive layer is exposed due to peeling of the non-adhesive layer and the non-adhesiveness and wear resistance are early. There is a problem that the durability is inferior.
かかる観点から、例えば、特許文献1及び特許文献2に開示されるように、金属基材上にフッ素樹脂を含むポリカルボシランを主成分とする塗料を塗布してセラミック化させたセラミック層と、セラミック層の上にフッ素樹脂塗料を塗布して形成された非粘着層とを有してなる皮膜構造が提案されている。また、特許文献3に開示されるように、無機酸化微粒子を含むゾルゲル塗料を塗布してセラミック化させたセラミック層と、セラミック層の上にフッ素樹脂塗料を塗布して形成された非粘着層とを有してなる皮膜構造が提案されている。 From this point of view, for example, as disclosed in Patent Document 1 and Patent Document 2, a ceramic layer obtained by applying a paint mainly composed of polycarbosilane containing a fluororesin on a metal substrate to be ceramicized; There has been proposed a coating structure having a non-adhesive layer formed by applying a fluororesin coating on a ceramic layer. Further, as disclosed in Patent Document 3, a ceramic layer obtained by applying a sol-gel coating containing inorganic oxide fine particles to be ceramicized, a non-adhesive layer formed by applying a fluororesin coating on the ceramic layer, and There has been proposed a coating structure comprising:
上述した特許文献1及び特許文献2に開示される従来の皮膜構造では、確かに、セラミック層中にフッ素樹脂成分が含有されることで、かかるフッ素樹脂成分と非粘着層中のフッ素樹脂成分とが混合溶融して両層間の密着性が向上され、また、特許文献3に開示される従来の皮膜構造では、セラミック層中に無機酸化微粒子が含有されることで、セラミック層表面に露出した無機酸化微粒子にて表面積が増大されて非粘着層との密着性が向上されるため、セラミック層と非粘着層との層間剥離を防止して、耐久性の向上が期待されるところである。 In the conventional film structure disclosed in Patent Document 1 and Patent Document 2 described above, the fluorine resin component is certainly contained in the ceramic layer, so that the fluorine resin component and the fluorine resin component in the non-adhesive layer are included. Is mixed and melted to improve the adhesion between the two layers, and in the conventional film structure disclosed in Patent Document 3, inorganic oxide fine particles are contained in the ceramic layer, so that the inorganic exposed on the surface of the ceramic layer. Since the surface area is increased by the oxide fine particles and the adhesion to the non-adhesive layer is improved, delamination between the ceramic layer and the non-adhesive layer is prevented, and an improvement in durability is expected.
しかしながら、上述した特許文献1乃至特許文献3に開示される従来の皮膜構造では、いずれも非粘着層がフッ素樹脂層より形成されるものであるため、硬度が低く傷等が付き易いという非粘着層自体の耐摩耗性の問題は依然として解消されていない。そのため、かかる皮膜構造を有する高温調理機器では、使用回数や使用状況などによって非粘着性及び耐摩耗性が低下する時期が異なってくるため、使用者の利便性が損なわれており、非粘着性を発揮しつつ、耐摩耗性に優れた皮膜構造が希求されているところである。 However, in the conventional film structures disclosed in Patent Document 1 to Patent Document 3 described above, since the non-adhesive layer is formed from a fluororesin layer, the non-adhesive that the hardness is low and scratches or the like easily occur. The problem of wear resistance of the layer itself is still not solved. For this reason, in high-temperature cooking equipment having such a coating structure, the non-adhesiveness and wear resistance are reduced depending on the number of times of use and usage conditions. A film structure excellent in wear resistance is desired.
そこで、本発明では、非粘着性皮膜構造およびその製造方法に関し、前記従来の課題を解決するもので、非粘着性を発揮しつつ、耐摩耗性に優れた非粘着性皮膜構造およびその製造方法を提供することを目的とする。 Accordingly, the present invention relates to a non-adhesive film structure and a method for producing the same, and solves the above-described conventional problems. The non-adhesive film structure having excellent wear resistance while exhibiting non-adhesiveness and a method for producing the same The purpose is to provide.
本発明の解決しようとする課題は以上の如くであり、次にこの課題を解決するための手段を説明する。
本発明者らは、上記課題に鑑み鋭意検討を重ねた結果、無機結合剤を含む無機塗料と、フッ素樹脂粒子を含むフッ素樹脂粒子分散液とをそれぞれ塗布して形成することで、表層部にフッ素樹脂粒子が分散された状態で含有されるセラミック層を形成でき、非粘着性を発揮しつつ、耐摩耗性に優れた従来にない非粘着性皮膜構造およびその製造方法が得られることを見出し、本発明の完成に至ったのである。
The problem to be solved by the present invention is as described above. Next, means for solving the problem will be described.
As a result of intensive studies in view of the above problems, the present inventors applied and formed an inorganic paint containing an inorganic binder and a fluororesin particle dispersion containing fluororesin particles, respectively, on the surface layer portion. It has been found that a ceramic layer containing fluororesin particles in a dispersed state can be formed, and a non-adhesive film structure and a method for producing the same that are excellent in wear resistance while exhibiting non-adhesiveness can be obtained. The present invention has been completed.
すなわち、請求項1においては、金属基材上に形成される非粘着性を有する皮膜構造において、金属基材の表面を覆うようにして少なくとも無機結合剤を含む無機塗料を塗布して形成される無機質層からなり、前記無機質層の表層部にフッ素樹脂粒子が不均一に分散された状態で含有されるものである。 That is, in claim 1, in the non-adhesive film structure formed on the metal base material, it is formed by applying an inorganic paint containing at least an inorganic binder so as to cover the surface of the metal base material. It consists of an inorganic layer, and the fluororesin particles are contained in a non-uniformly dispersed state in the surface layer portion of the inorganic layer.
請求項2においては、前記フッ素樹脂粒子が前記無機質層の表面に沿って分散されるものである。 In the present invention, the fluororesin particles are dispersed along the surface of the inorganic layer.
請求項3においては、前記フッ素樹脂粒子が前記無機質層の表面の凹部に偏在分布されるものである。 According to a third aspect of the present invention, the fluororesin particles are unevenly distributed in the recesses on the surface of the inorganic layer.
請求項4においては、前記無機質層は、金属基材の表面を覆うようにして塗布された無機結合剤を含む無機塗料の上に、フッ素樹脂粒子を含むフッ素樹脂粒子分散液を塗布して形成されるものである。 5. The inorganic layer according to claim 4, wherein the inorganic layer is formed by applying a fluororesin particle dispersion liquid containing fluororesin particles on an inorganic paint containing an inorganic binder applied so as to cover the surface of the metal substrate. It is what is done.
請求項5においては、前記フッ素樹脂粒子が、PTFE粒子であるものである。 In the present invention, the fluororesin particles are PTFE particles.
請求項6においては、前記無機塗料が、無機結合剤としてアルコキシシラン化合物を含むものである。 In the present invention, the inorganic paint contains an alkoxysilane compound as an inorganic binder.
請求項7においては、金属基材上に形成される非粘着性を有する皮膜構造の製造方法において、金属基材の表面を覆うようにして無機質結合剤を含む無機塗料を塗布する工程と、金属基材上に塗布された無機塗料の上にフッ素樹脂粒子を含むフッ素樹脂粒子分散液を塗布する工程と、前記無機塗料及びフッ素樹脂粒子分散液よりなる塗膜を焼成して表層部にて前記フッ素樹脂粒子が不均一に分散された無機質層を形成する工程と、を有してなるものである。 The method of manufacturing a non-adhesive film structure formed on a metal base material according to claim 7, wherein a step of applying an inorganic paint containing an inorganic binder so as to cover the surface of the metal base material, A step of applying a fluororesin particle dispersion containing fluororesin particles on an inorganic coating applied on a substrate; and firing a coating film comprising the inorganic coating and the fluororesin particle dispersion at the surface layer portion. And a step of forming an inorganic layer in which the fluororesin particles are dispersed non-uniformly.
請求項8においては、焼成温度が前記フッ素樹脂粒子の融点よりも低い温度又はその近傍の温度であるものである。 In claim 8, the firing temperature is a temperature lower than or near the melting point of the fluororesin particles.
本発明の効果として、非粘着性を発揮しつつ、耐摩耗性に優れた非粘着性皮膜構造とすることができる。 As an effect of the present invention, a non-adhesive film structure excellent in abrasion resistance can be obtained while exhibiting non-adhesiveness.
次に、発明を実施するための形態を説明する。 Next, modes for carrying out the invention will be described.
図1に示すように、本実施例の皮膜構造1は、金属基材10の表面を覆うようにして少なくとも無機結合剤を含む無機塗料20を塗布して形成される無機質層2からなり、無機質層2の表層部3にてフッ素樹脂粒子31が不均一に分散された状態で含有されるものである。具体的には、本実施例の皮膜構造1は、金属機材10の表面に、無機結合剤を含む無機塗料20と、フッ素樹脂粒子31を含むフッ素樹脂粒子分散液30とを塗布し焼成することで、表層部3にフッ素樹脂粒子31が不均一に分散された状態で含有される一層の無機質層2が得られる。このように表層部3にフッ素樹脂粒子31が不均一に分散された状態で含有される無機質層2からなる皮膜構造1は、表層部3のフッ素樹脂粒子31により非粘着性を発揮するとともに、セラミック化されたセラミック部21により硬度が高く、耐摩擦性に優れるものである。 As shown in FIG. 1, the film structure 1 of the present embodiment is composed of an inorganic layer 2 formed by applying an inorganic paint 20 containing at least an inorganic binder so as to cover the surface of the metal substrate 10, and the inorganic structure 2 In the surface layer portion 3 of the layer 2, the fluororesin particles 31 are contained in a non-uniformly dispersed state. Specifically, in the film structure 1 of the present embodiment, the surface of the metal material 10 is coated with an inorganic coating 20 containing an inorganic binder and a fluororesin particle dispersion 30 containing fluororesin particles 31 and fired. Thus, one layer of the inorganic layer 2 is obtained in which the fluororesin particles 31 are dispersed in the surface layer portion 3 in a non-uniform manner. Thus, the film structure 1 composed of the inorganic layer 2 contained in a state in which the fluororesin particles 31 are dispersed in the surface layer portion 3 in a non-uniform manner exhibits non-adhesiveness due to the fluororesin particles 31 of the surface layer portion 3. The ceramic part 21 made of ceramic has high hardness and excellent friction resistance.
<金属基材>
金属基材10は、アルミニウム、アルミニウム合金、亜鉛、亜鉛合金、錫、錫合金等のダイキャスト、ステンレス鋼、チタン、チタン合金、ジルコニウム、ジルコニウム合金等の種々の金属材料若しくはその合金材料、又はケイ素等の半金属材料などを用いることができる。
<Metal base material>
The metal substrate 10 is made of various metal materials such as aluminum, aluminum alloy, zinc, zinc alloy, tin, tin alloy, etc., stainless steel, titanium, titanium alloy, zirconium, zirconium alloy, or the like, or silicon. A semi-metal material such as can be used.
<無機塗料>
無機塗料20は、無機質層2としてセラミック層(セラミック部21)を形成するものであれば、特に限定されないが、ゾルゲル塗料が好ましく用いられる。ゾルゲル塗料とは、無機結合剤として金属アルコキシド化合物などを含む溶液を加水分解・重縮合反応させてゾルから固体のゲルへと変化させ、さらに加熱することで金属酸化物を主成分とした三次元架橋マトリックス構造の皮膜を形成する塗料のことである。
<Inorganic paint>
Although the inorganic coating material 20 will not be specifically limited if a ceramic layer (ceramic part 21) is formed as the inorganic layer 2, A sol-gel coating material is used preferably. A sol-gel coating is a three-dimensional solution that contains a metal oxide as the main component by hydrolyzing and polycondensing a solution containing a metal alkoxide compound as an inorganic binder to change it from a sol to a solid gel. It is a paint that forms a film having a crosslinked matrix structure.
無機結合剤としては、ケイ素(Si)系、アルミニウム(Al)系、チタン(Ti)系、及びジルコニウム(Zr)系の各種金属アルコキシド化合物を含むものや、水ガラスを含むものなどが挙げられる。中でも、本実施例の無機塗料20としては、無機結合剤として金属アルコキシド化合物が好ましく用いられ、その中でも、アルコキシシラン化合物がより好ましく用いられる。アルコキシシラン化合物は、水分解・脱水縮合反応の反応速度が遅く、容易に安定して均一な皮膜を形成できるからである。 Examples of the inorganic binder include those containing various metal alkoxide compounds of silicon (Si), aluminum (Al), titanium (Ti), and zirconium (Zr), and those containing water glass. Especially, as the inorganic coating material 20 of a present Example, a metal alkoxide compound is preferably used as an inorganic binder, and an alkoxysilane compound is more preferably used among them. This is because the alkoxysilane compound has a slow reaction rate of water decomposition / dehydration condensation reaction, and can easily form a stable uniform film.
アルコキシシラン化合物としては、一般式Si(OR)4(式中、Rは炭素数1〜5のアルキル基)で表されるテトラアルコキシシラン、又は一般式R1Si(OR2)3(式中R1は炭素数1〜8の有機基、R2は炭素数1〜4のアルキル基)で表されるオルガノトリアルコキシシランなどが挙げられる。アルコキシシラン化合物は、オルガノトリアルコキシシラン又はテトラアルコキシシランを単独で用いてもよく、また、オルガノトリアルコキシシランとテトラアルコキシシランとの混合物として用いてもよい。 As the alkoxysilane compound, a tetraalkoxysilane represented by a general formula Si (OR) 4 (wherein R is an alkyl group having 1 to 5 carbon atoms), or a general formula R 1 Si (OR 2 ) 3 (wherein R 1 is an organic group having 1 to 8 carbon atoms, R 2 is like organotrialkoxysilane represented by an alkyl group) having 1 to 4 carbon atoms. As the alkoxysilane compound, organotrialkoxysilane or tetraalkoxysilane may be used alone, or a mixture of organotrialkoxysilane and tetraalkoxysilane may be used.
テトラアルコキシシランとしては、テトラメトキシシラン[Si(OCH3)4]、又はテトラエトキシシラン[Si(OC2H5)4]を用いることができる。オルガノトリアルコキシシランとしては、メチルトリメトキシシラン[CH3Si(OCH3)3]、又はメチルトリエトキシシラン[CH3Si(OC2H5)3]を用いることができる。 As the tetraalkoxysilane, tetramethoxysilane [Si (OCH 3 ) 4 ] or tetraethoxysilane [Si (OC 2 H 5 ) 4 ] can be used. As the organotrialkoxysilane, methyltrimethoxysilane [CH 3 Si (OCH 3 ) 3 ] or methyltriethoxysilane [CH 3 Si (OC 2 H 5 ) 3 ] can be used.
他の金属アルコキシド化合物としては、アルミニウム系金属アルコキシド化合物では、例えば、アルミニウムイソプロポキシド[Al(OCH(CH3)2)3]など、チタン系金属アルコキシド化合物では、例えば、チタンテトライソプロポキシド[Ti(OC3H7)4]など、及びジルコニウム系金属アルコキシド化合物では、例えば、ジルコニウムイソプロポキシドのβ−ジケトン誘導体などを用いることができる。 Examples of other metal alkoxide compounds include aluminum metal alkoxide compounds such as aluminum isopropoxide [Al (OCH (CH 3 ) 2 ) 3 ], and titanium metal alkoxide compounds such as titanium tetraisopropoxide [ For example, a β-diketone derivative of zirconium isopropoxide can be used for Ti (OC 3 H 7 ) 4 ] and the like and zirconium-based metal alkoxide compounds.
無機塗料20には、上述した無機結合剤の他に、充填剤、無機顔料、水、老化防止剤、防腐剤、防軟剤、紫外線吸収剤、酸化防止剤、光安定剤、熱安定剤、帯電防止剤などの公知の配合成分が含有される。特に、無機結合剤としてアルコキシシラン化合物(オルガノトリアルコキシシランなど)を用いる場合には、充填剤としてコロイダルシリカが好ましく含有される。コロイダルシリカを配合することで、無機質層2の気孔や亀裂の発生を防止し、目的とする膜厚(10〜40μm)の調製が容易となる。 In addition to the inorganic binder described above, the inorganic paint 20 includes a filler, an inorganic pigment, water, an anti-aging agent, an antiseptic, a softening agent, an ultraviolet absorber, an antioxidant, a light stabilizer, a heat stabilizer, Contains known ingredients such as antistatic agents. In particular, when an alkoxysilane compound (such as organotrialkoxysilane) is used as the inorganic binder, colloidal silica is preferably contained as the filler. By mix | blending colloidal silica, the generation | occurrence | production of the porosity and the crack of the inorganic layer 2 is prevented, and preparation of the target film thickness (10-40 micrometers) becomes easy.
無機塗料20の組成割合としては、例えば、無機結合剤としてアルコキシシラン化合物(オルガノトリアルコキシシランなど)を用いる場合には、無機塗料100重量部に対して、アルコキシシラン化合物が20〜40重量部、及びコロイダルシリカが20〜40重量部配合される。アルコキシシラン化合物が20重量部以下だと無機質層2の硬度が低下し、40重量部以上だと無機塗料が常温でゲル化して貯蔵安定性が低下するからである。また、コロイダルシリカが10重量部だと無機質層2の可撓性が低下し、40重量部以上だと無機質層2と金属基材10の密着性が低下するからである。 As a composition ratio of the inorganic coating material 20, for example, when an alkoxysilane compound (such as organotrialkoxysilane) is used as the inorganic binder, the alkoxysilane compound is 20 to 40 parts by weight with respect to 100 parts by weight of the inorganic coating material, And 20-40 weight part of colloidal silica is mix | blended. This is because if the amount of the alkoxysilane compound is 20 parts by weight or less, the hardness of the inorganic layer 2 decreases, and if it is 40 parts by weight or more, the inorganic coating gels at room temperature and storage stability decreases. Moreover, if the colloidal silica is 10 parts by weight, the flexibility of the inorganic layer 2 is lowered, and if it is 40 parts by weight or more, the adhesion between the inorganic layer 2 and the metal substrate 10 is lowered.
このように本実施例の皮膜構造1では、無機塗料20としてゾルゲル塗料を用いて無機質層2が形成されることで、無機質層2を金属基材10の表面に密着して固定させることができる。また、無機質層2が、従来のプラズマ溶射等により形成されるプラズマ溶射層に比べ、気孔が少なく緻密であるため、皮膜の深さ方向に焦げ等が侵入しにくく、焦げ付きやしみ汚染などを抑制できる。 As described above, in the film structure 1 of the present embodiment, the inorganic layer 2 is formed using the sol-gel paint as the inorganic paint 20, so that the inorganic layer 2 can be adhered and fixed to the surface of the metal substrate 10. . In addition, since the inorganic layer 2 is denser and has less pores than a plasma sprayed layer formed by conventional plasma spraying or the like, it is difficult for scorch or the like to penetrate in the depth direction of the coating, thereby suppressing scorching and stain contamination. it can.
なお、本実施例では、後述するように表層部3にフッ素樹脂粒子31が不均一に分散された状態で含有される無機質層2を得るために、主に、無機塗料20の上にフッ素樹脂粒子31を含むフッ素樹脂粒子分散液30を塗布して無機質層2を形成する方法について説明するものであるが、無機塗料20としては、無機質層2としてセラミック層(セラミック部21)を形成するものであればよく、例えば、無機塗料20中にフッ素樹脂粒子31を混合させることで、後述するフッ素樹脂分散液30を不要としてもよい。 In this embodiment, as will be described later, in order to obtain the inorganic layer 2 containing the fluororesin particles 31 in the surface layer portion 3 in a non-uniformly dispersed state, the fluororesin is mainly formed on the inorganic paint 20. The method for forming the inorganic layer 2 by applying the fluororesin particle dispersion 30 containing the particles 31 will be described. As the inorganic coating material 20, a ceramic layer (ceramic part 21) is formed as the inorganic layer 2. For example, the fluororesin dispersion liquid 30 described later may be made unnecessary by mixing the fluororesin particles 31 in the inorganic paint 20.
<フッ素樹脂粒子分散液>
フッ素樹脂粒子分散液30は、従来のフッ素樹脂塗料とは異なりバインダー樹脂が配合されず、分散媒体にフッ素樹脂粒子31が分散状態(ディスパージョン)で含有された液状体が用いられる。
<Fluorine resin particle dispersion>
Unlike the conventional fluororesin paint, the fluororesin particle dispersion 30 is not mixed with a binder resin, and a liquid material in which the fluororesin particles 31 are contained in a dispersed state (dispersion) in a dispersion medium is used.
フッ素樹脂粒子31としては、完全フッ素化樹脂粒子;ポリテトラフルオロエチレン(PTFE)、部分フッ素化樹脂粒子;ポリクロロトリフルオロエチレン(PCTFE、CTFE)、ポリフッ化ビニリデン(PVDF)、ポリフッ化ビニル(PVF)、フッ素化樹脂共重合体;テトラフルオロエチレン/フルオロ(アルキルビニルエーテル)共重合体(PFA)、テトラフルオロエチレン/ヘキサフルオロプロピレン共重合体(FEP)、テトラフルオロエチレン/エチレン共重合体(ETFE)、エチレン/クロロトリフルオロエチレン共重合体(ECTFE)からなる群から選択される1種類、又は2種類以上の混合物が挙げられる。 As the fluororesin particles 31, fully fluorinated resin particles; polytetrafluoroethylene (PTFE), partially fluorinated resin particles; polychlorotrifluoroethylene (PCTFE, CTFE), polyvinylidene fluoride (PVDF), polyvinyl fluoride (PVF) ), Fluorinated resin copolymer; tetrafluoroethylene / fluoro (alkyl vinyl ether) copolymer (PFA), tetrafluoroethylene / hexafluoropropylene copolymer (FEP), tetrafluoroethylene / ethylene copolymer (ETFE) One type selected from the group consisting of ethylene / chlorotrifluoroethylene copolymer (ECTFE), or a mixture of two or more types.
フッ素樹脂粒子31としては、PTFE粒子、PFA粒子、FEP粒子、及びこれらの混合物が好ましく用いられ、特に、PTFE粒子を主体とするものがより好ましく用いられる。PTFEは、フッ素樹脂の中でも耐薬品性、耐熱性等が特に優れているからである。なお、主体とするとは、少なくとも50体積%以上含まれることを意味し、全てPTFEからなる樹脂も含まれる。 As the fluororesin particles 31, PTFE particles, PFA particles, FEP particles, and mixtures thereof are preferably used, and in particular, those mainly composed of PTFE particles are more preferably used. This is because PTFE is particularly excellent in chemical resistance and heat resistance among fluororesins. Note that “mainly” means that it is contained at least 50% by volume or more, and resin including all PTFE is also included.
分散媒体としては、水や各種有機溶剤などを用いることができる。有機溶剤としては、例えば、エタノール、イソプロピルアルコール、n−ブタノール等のアルコール類、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン類、酢酸メチル、酢酸エチル、酢酸ブチル等のエステル類、ジメチルホルムアミド、ジメチルスルホキシド等の極性溶剤、エチレングリコールモノブチルエーテル、ジエチレングリコールモノブチルエーテル等のエーテル類、1,1,1−トリクロルエタン、クロロホルム等のハロゲン系溶剤、テトラヒドロフラン、ジオキサン等の環状エーテル類、ベンゼン、トルエン、キシレン等の芳香族類などからなる群から選択される1種類、又は2種類以上の混合物が挙げられる。 As the dispersion medium, water, various organic solvents, or the like can be used. Examples of the organic solvent include alcohols such as ethanol, isopropyl alcohol and n-butanol, ketones such as acetone, methyl ethyl ketone and methyl isobutyl ketone, esters such as methyl acetate, ethyl acetate and butyl acetate, dimethylformamide and dimethyl sulfoxide. Polar solvents such as ethylene glycol monobutyl ether and diethylene glycol monobutyl ether, halogen solvents such as 1,1,1-trichloroethane and chloroform, cyclic ethers such as tetrahydrofuran and dioxane, benzene, toluene, xylene and the like One type selected from the group consisting of aromatics, etc., or a mixture of two or more types.
フッ素樹脂粒子分散液30には、上述したフッ素樹脂粒子31や分散媒体の他に、分散剤、着色剤、無機充填剤、老化防止剤、防腐剤、防軟剤、紫外線吸収剤、酸化防止剤、光安定剤、熱安定剤、帯電防止剤などの公知の配合剤が含有されてもよい。少なくとも分散剤が含有されることで、フッ素樹脂粒子31の沈降を抑制して分散性を向上させることができる。 In addition to the fluororesin particles 31 and the dispersion medium described above, the fluororesin particle dispersion 30 includes a dispersant, a colorant, an inorganic filler, an anti-aging agent, an antiseptic, a softener, an ultraviolet absorber, and an antioxidant. In addition, known compounding agents such as a light stabilizer, a heat stabilizer, and an antistatic agent may be contained. By containing at least a dispersant, sedimentation of the fluororesin particles 31 can be suppressed and dispersibility can be improved.
<皮膜の製造方法>
図2及び図3に示すように、皮膜構造1の製造方法としては、金属基材10の表面に所定の下地処理を行う工程S100と、金属基材10の表面を覆うようにして無機質結合剤を含む無機塗料20を塗布する工程S110と、金属基材10上に塗布された無機塗料20の上にフッ素樹脂粒子31を含むフッ素樹脂粒子分散液30を塗布する工程S120と、無機塗料20及びフッ素樹脂粒子分散液30よりなる塗膜を乾燥させる工程S130と、無機塗料20及びフッ素樹脂粒子分散液30よりなる塗膜を焼成して無機質層2を形成する工程S140等と、を有してなる。
<Method for producing film>
As shown in FIGS. 2 and 3, the manufacturing method of the coating structure 1 includes a step S <b> 100 for performing a predetermined base treatment on the surface of the metal substrate 10, and an inorganic binder so as to cover the surface of the metal substrate 10. A step S110 of applying an inorganic paint 20 containing, a step S120 of applying a fluororesin particle dispersion 30 containing fluororesin particles 31 on the inorganic paint 20 applied on the metal substrate 10, an inorganic paint 20 and Step S130 for drying the coating film made of the fluororesin particle dispersion 30 and Step S140 for firing the coating film made of the inorganic coating 20 and the fluororesin particle dispersion 30 to form the inorganic layer 2 are included. Become.
まず、工程S100では、金属基材10の表面に所定の下地処理が施される(図2(a)参照)。金属ブラシによる研摩やアルコールで拭き取るなどして金属基材10の表面の脱脂・表面清掃が行われる。次いで、サンドブラストやショットブラストなどによるブラスト処理が行われ、脱脂・表面清掃された金属基材10の表面に存在する錆や劣化塗膜を除去し、微小な凹凸部を有する粗面加工が施される。なお、ブラスト処理が施せない箇所については、パワーブラシなどによる機械ケレンが行われてもよい。 First, in step S100, a predetermined base treatment is performed on the surface of the metal substrate 10 (see FIG. 2A). The surface of the metal substrate 10 is degreased and cleaned by polishing with a metal brush or wiping with alcohol. Next, a blasting process such as sand blasting or shot blasting is performed to remove rust and deteriorated coating film present on the surface of the metal substrate 10 that has been degreased and cleaned, and rough surface processing having minute uneven portions is performed. The In addition, about the location which cannot perform blasting, mechanical cleansing with a power brush etc. may be performed.
工程S110、S120では、下地処理された金属基材10の表面に上述した無機塗料20及びフッ素樹脂粒子分散液30が積層状に塗布される(図2(b)、(c)参照)。塗料の塗布方法としては、刷毛塗りやローラ塗りなどの公知の方法を採用することができるが、本実施例の皮膜構造1の製造方法では、スプレー噴射が好ましく用いられる。スプレー噴射により、圧力が付与された塗料が噴射されるので、噴射物がミスト状になって広く拡散するのを防止し、金属基材10の表面に塗料をむらなく均等に塗布することができる。 In steps S110 and S120, the inorganic coating 20 and the fluororesin particle dispersion 30 described above are applied in a layered manner on the surface of the metal substrate 10 subjected to the ground treatment (see FIGS. 2B and 2C). As a method for applying the paint, a known method such as brush coating or roller coating can be employed. In the manufacturing method of the film structure 1 of this embodiment, spray injection is preferably used. Since the sprayed sprayed paint is applied with pressure, it is possible to prevent the sprayed material from spreading in the form of a mist and to spread the paint uniformly on the surface of the metal base 10. .
スプレー噴射により塗布を行う場合には、無機塗料20及びフッ素樹脂粒子分散液30の粘度が調整され、特に、無機塗料20及びフッ素樹脂粒子分散液30が良好に噴射されるように焼成膜厚などの塗布条件が設定される。例えば、工程S110では、焼成膜厚が5〜40μm、好ましくは5〜20μmとなるように無機塗料20が塗布され(図2(b)参照)、工程S120では、焼成膜厚が5〜20μm、好ましくは5〜15μmとなるようにフッ素樹脂粒子分散液30が塗布される(図2(c)参照)。 When the application is performed by spraying, the viscosity of the inorganic coating material 20 and the fluororesin particle dispersion 30 is adjusted, and in particular, the fired film thickness so that the inorganic coating material 20 and the fluororesin particle dispersion 30 are jetted well. Application conditions are set. For example, in step S110, the inorganic coating 20 is applied so that the fired film thickness is 5 to 40 μm, preferably 5 to 20 μm (see FIG. 2B). In step S120, the fired film thickness is 5 to 20 μm, The fluororesin particle dispersion liquid 30 is preferably applied so as to have a thickness of 5 to 15 μm (see FIG. 2C).
工程S130では、無機塗料20及びフッ素樹脂粒子分散液30よりなる塗膜が予備乾燥され、例えば、90〜150℃の温度条件下で5〜20分間程度乾燥させるのが好ましい。 In step S130, the coating film composed of the inorganic coating material 20 and the fluororesin particle dispersion 30 is preliminarily dried, and is preferably dried, for example, at a temperature of 90 to 150 ° C. for about 5 to 20 minutes.
工程S140では、無機塗料20及びフッ素樹脂粒子分散液30よりなる塗膜が焼成さされ、かかる焼成により無機塗料20がセラミック化されるとともに、フッ素樹脂粒子分散液30中の分散媒体が除去され、フッ素樹脂粒子31が一部粒子融着するなどして、表層部3にフッ素樹脂粒子31が不均一に分散された状態で含有される一層の無機質層2が形成される(図2(d)参照)。 In step S140, the coating film made of the inorganic paint 20 and the fluororesin particle dispersion 30 is baked, and the inorganic paint 20 is converted into a ceramic by the firing, and the dispersion medium in the fluororesin particle dispersion 30 is removed. One layer of the inorganic layer 2 containing the fluororesin particles 31 in an unevenly dispersed state is formed in the surface layer portion 3 by, for example, partly fusing the fluororesin particles 31 (FIG. 2D). reference).
焼成温度としては、例えば、フッ素樹脂粒子31の融点よりも低い温度又はその近傍の温度である250〜330℃の温度条件下で10〜30分間程加熱されるのが好ましい。すなわち、例えば、フッ素樹脂粒子31としてPTFE粒子が用いられる場合には、PFTEの融点が約330℃であることから、焼成温度としてはかかる融点よりも低い温度又はその近傍の温度である320〜330℃となるように調整される。焼成温度としてフッ素樹脂粒子31の融点よりも低い温度又はその近傍の温度とすることで、フッ素樹脂粒子31が溶融してフッ素樹脂膜を形成することなく、一部のフッ素樹脂粒子31が粒子融着された凝集体(塊)を形成するなどして無機質層2のセラミック部21に不均一に分散される。 As the firing temperature, for example, it is preferable to heat for about 10 to 30 minutes under a temperature condition of 250 to 330 ° C. which is a temperature lower than or near the melting point of the fluororesin particles 31. That is, for example, when PTFE particles are used as the fluororesin particles 31, since the melting point of PFTE is about 330 ° C., the firing temperature is 320 to 330 which is a temperature lower than or equal to the melting point. It adjusts so that it may become ° C. By setting the firing temperature to a temperature lower than or near the melting point of the fluororesin particles 31, some of the fluororesin particles 31 may be melted without melting the fluororesin particles 31 to form a fluororesin film. It is non-uniformly dispersed in the ceramic portion 21 of the inorganic layer 2 by forming a worn aggregate (lump).
なお、本実施例の皮膜の製造方法においては、表層部3にフッ素樹脂粒子31が不均一に分散された状態で含有される無機質層2を得るために、主に、無機塗料20の上にフッ素樹脂粒子31を含むフッ素樹脂粒子分散液30を塗布して無機質層2を形成する方法について説明したが、皮膜の製造方法はこれに限定されず、無機質層2が少なくとも無機結合剤を含む無機塗料20を塗布して形成されるものであればよく、例えば、無機塗料20中にフッ素樹脂粒子31を混合させた塗料を用いて、同様の無機質層2を得るようにしてもよい。 In addition, in the manufacturing method of the membrane | film | coat of a present Example, in order to obtain the inorganic layer 2 contained in the surface layer part 3 in the state by which the fluororesin particle 31 was disperse | distributed nonuniformly, mainly on the inorganic coating material 20 Although the method for forming the inorganic layer 2 by applying the fluororesin particle dispersion 30 containing the fluororesin particles 31 has been described, the method for producing the film is not limited to this, and the inorganic layer 2 is an inorganic material containing at least an inorganic binder. Any material can be used as long as it is formed by applying the paint 20. For example, a similar inorganic layer 2 may be obtained using a paint in which the fluororesin particles 31 are mixed in the inorganic paint 20.
<皮膜構造>
図1に示したように、本実施例の皮膜構造1において、無機塗料20及びフッ素樹脂粒子分散液30よりなる塗膜が焼成されて形成された無機質層2は、無機塗料20の無機結合剤がセラミック化して、金属酸化物の三次元架橋マトリックス構造のセラミック部21が形成される。このとき同時に、無機塗料20の上に塗布されたフッ素樹脂粒子分散液30のフッ素樹脂粒子31は、一部が相互に融着して凝集体(塊)を形成するなどして、セラミック部21中に不均一に分散される。特に、無機質層2の上層部3において、フッ素樹脂粒子31がセラミック部21との比重差のために浮上して、上層につれてフッ素樹脂粒子31の密度が高くなり、表面2aに沿ってセラミック部21にフッ素樹脂粒子31が分散される。
<Coating structure>
As shown in FIG. 1, in the coating structure 1 of this example, the inorganic layer 2 formed by baking a coating film made of the inorganic coating 20 and the fluororesin particle dispersion 30 is an inorganic binder of the inorganic coating 20. As a result, the ceramic part 21 having a three-dimensional cross-linked matrix structure of metal oxide is formed. At the same time, part of the fluororesin particles 31 of the fluororesin particle dispersion 30 applied on the inorganic coating 20 are fused together to form an aggregate (lumb), etc. Dispersed unevenly inside. In particular, in the upper layer portion 3 of the inorganic layer 2, the fluororesin particles 31 rise due to the difference in specific gravity from the ceramic portion 21, and the density of the fluororesin particles 31 increases with the upper layer, and the ceramic portion 21 extends along the surface 2 a. The fluororesin particles 31 are dispersed in the glass.
図4に示すように、本実施例の皮膜構造1では、無機質層2の表面2aには複数の凹部4・4・・・が形成され、フッ素樹脂粒子31はかかる凹部4に偏在分布される。凹部4は、略フラットな表面2aに発現する略半円形の口径が〜20数μmの微小な窪みである(後述する図8等参照)。無機質層2の表面2aに凹部4をもたらす理由については、詳細は不明であるが、無機塗料20の表面にフッ素樹脂粒子分散液30を塗布したことにより、無機塗料20及びフッ素樹脂粒子分散液30の焼成工程で、無機結合剤がセラミック化する際に表面に存在するフッ素樹脂粒子31の存在が影響を及ぼす結果、凹部4が形成されるとともに、かかる焼成過程中に凹部4にフッ素樹脂粒子31が偏在するようにして分散されるものと推察される。 As shown in FIG. 4, in the coating structure 1 of the present embodiment, a plurality of recesses 4, 4... Are formed on the surface 2 a of the inorganic layer 2, and the fluororesin particles 31 are unevenly distributed in the recesses 4. . The concave portion 4 is a small depression having a substantially semicircular diameter of ˜20 μm that appears on the substantially flat surface 2a (see FIG. 8 and the like described later). The reason why the concave portion 4 is provided on the surface 2a of the inorganic layer 2 is not clear in detail, but by applying the fluororesin particle dispersion 30 to the surface of the inorganic paint 20, the inorganic paint 20 and the fluororesin particle dispersion 30 are applied. As a result of the influence of the presence of the fluororesin particles 31 present on the surface when the inorganic binder is ceramicized in the firing step, the recesses 4 are formed, and the fluororesin particles 31 are formed in the recesses 4 during the firing process. Is presumed to be distributed in an uneven distribution.
このように、本実施例の皮膜構造1は、金属基材10上に形成される非粘着性を有する皮膜構造1において、金属基材10の表面を覆うようにして少なくとも無機結合剤を含む無機塗料20を塗布して形成される無機質層2からなり、無機質層2の表層部3にてフッ素樹脂粒子31が不均一に分散された状態で含有されるため、無機質層2の表面2aにセラミック部21とともにフッ素樹脂粒子31が分散されるため、表層部3においてフッ素樹脂粒子31により非粘着性を発揮するとともに、セラミック部21により耐摩擦性を有することができるものである。 Thus, the film structure 1 of this example is an inorganic film containing at least an inorganic binder so as to cover the surface of the metal substrate 10 in the non-adhesive film structure 1 formed on the metal substrate 10. It consists of the inorganic layer 2 formed by applying the paint 20, and the fluororesin particles 31 are contained in the surface layer portion 3 of the inorganic layer 2 in a non-uniformly dispersed state, so that the ceramic is formed on the surface 2 a of the inorganic layer 2. Since the fluororesin particles 31 are dispersed together with the portion 21, non-adhesiveness is exhibited by the fluororesin particles 31 in the surface layer portion 3, and the ceramic portion 21 can have friction resistance.
特に、本実施例の皮膜構造1では、フッ素樹脂粒子31が無機質層2の表面2aの凹部4に偏在分布されることで、皮膜構造1を有する高温調理機器の使用によって表面2aが金属へら等で擦られても、フッ素樹脂粒子31が凹部4に存在するため、フッ素樹脂粒子31の損耗を防止でき、非粘着性の低下を抑制して耐久性を飛躍的に向上させることができる。 In particular, in the film structure 1 of this example, the fluororesin particles 31 are unevenly distributed in the recesses 4 on the surface 2a of the inorganic layer 2, so that the surface 2a is made of a metal spatula or the like by using a high-temperature cooking appliance having the film structure 1. Even when rubbed, the fluororesin particles 31 are present in the recesses 4, so that the wear of the fluororesin particles 31 can be prevented, and the non-adhesiveness can be suppressed and the durability can be dramatically improved.
以下、本発明の実施例および比較例について説明する。なお、本発明は、以下に示す実施例により制限されるものではない。 Examples of the present invention and comparative examples will be described below. In addition, this invention is not restrict | limited by the Example shown below.
<皮膜構造の調製>
表1に示す組成割合(重量%)にて無機結合剤としてアルコキシシラン化合物等を含有してなる無機塗料と、表2に示す組成割合(重量%)にてフッ素樹脂粒子としてPTFE等を含有してなるフッ素樹脂粒子分散液とを用いて、金属基材上に無機塗料を焼成膜厚20μm、フッ素樹脂粒子分散液を焼成膜厚10μmとなるようにそれぞれ塗布し、120℃で10分間予備乾燥した後に、320℃で20分間焼成して、表層部にフッ素樹脂が分散された無機質層からなる皮膜構造を得た(実施例1)。
<Preparation of film structure>
An inorganic paint containing an alkoxysilane compound or the like as an inorganic binder at a composition ratio (% by weight) shown in Table 1, and PTFE or the like as a fluororesin particle at a composition ratio (% by weight) shown in Table 2. Using the fluororesin particle dispersion liquid, an inorganic paint is applied on a metal substrate to a fired film thickness of 20 μm, and a fluororesin particle dispersion liquid is applied to a fired film thickness of 10 μm, and pre-dried at 120 ° C. for 10 minutes. Then, baking was performed at 320 ° C. for 20 minutes to obtain a film structure composed of an inorganic layer in which a fluororesin was dispersed in the surface layer portion (Example 1).
また、比較例として、従来のフッ素樹脂塗料を用いた非粘着層を有する皮膜構造(比較例1)、及び従来の無機塗料を用いたセラミック層を有する皮膜構造(比較例2)をそれぞれ調製した。具体的には、比較例1については、フッ素樹脂塗料(ダイキン工業社製:ポリフロンEK−1909S201(プライマー)、及びポリフロンEK−3798M201(上塗り))を用いて、金属基材上に焼成膜厚30μmとなるようにそれぞれ塗布し、100℃で20分間予備乾燥した後に、330℃で20分間焼成して所定の皮膜構造を得た。また、比較例2については、表1に示した組成割合(重量%)にて無機結合剤としてアルコキシシラン化合物等を含有してなる無機塗料を用いて、基材上に無機塗料を焼成膜厚25μmとなるようにそれぞれ塗布し、90℃で20分間予備乾燥した後に、300℃で20分間焼成して所定の皮膜構造を得た。 Moreover, as a comparative example, a film structure having a non-adhesive layer using a conventional fluororesin paint (Comparative Example 1) and a film structure having a ceramic layer using a conventional inorganic paint (Comparative Example 2) were prepared. . Specifically, for Comparative Example 1, a fired film thickness of 30 μm is formed on a metal substrate using a fluororesin paint (Daikin Industries, Ltd .: Polyflon EK-1909S201 (primer) and Polyflon EK-3798M201 (overcoat)). Each of the coatings was applied and pre-dried at 100 ° C. for 20 minutes, and then fired at 330 ° C. for 20 minutes to obtain a predetermined film structure. Moreover, about the comparative example 2, the inorganic coating material which contains an alkoxysilane compound etc. as an inorganic binder in the composition ratio (weight%) shown in Table 1 is used, and an inorganic coating material is baked on a base material. Each was coated to 25 μm, pre-dried at 90 ° C. for 20 minutes, and then fired at 300 ° C. for 20 minutes to obtain a predetermined film structure.
<皮膜構造の各種評価試験>
本実施例の皮膜構造(実施例1)、及び比較例の皮膜構造(比較例1、2)に対して、以下の評価試験を行った。
<Various film structure evaluation tests>
The following evaluation tests were performed on the film structure of this example (Example 1) and the film structure of Comparative Examples (Comparative Examples 1 and 2).
(A)密着性試験
JIS K5400における碁盤目試験の方法に準じて行った。
(A) Adhesion test It performed according to the method of the cross cut test in JIS K5400.
(B)硬度試験
JIS K5400における鉛筆引っかき試験の方法に準じて行った。
(B) Hardness test The hardness test was performed according to the method of the pencil scratch test in JIS K5400.
(C)離型性試験
混合物(醤油:砂糖:卵=1:1:1)を滴下してから250℃で30分間加熱し、水洗・乾燥させた後、各皮膜構造の状態を目視にて評価した。なお、評価において、「◎」は混合物が容易に取れ、かつ焦げ付いたシミなしの場合、「○」は混合物が容易に取れ、かつ焦げ付いたシミがやや残る場合、「△」は混合物が容易に取れ、かつ焦げ付いたシミが多く残る場合、「×」は混合物が取れない場合の4点評価方式を採用した。
(C) Releasability test After dropping the mixture (soy sauce: sugar: egg = 1: 1: 1), heating at 250 ° C. for 30 minutes, washing with water and drying, the state of each film structure was visually observed. evaluated. In the evaluation, “◎” indicates that the mixture can be easily removed and there is no burnt stain, “○” indicates that the mixture can be easily removed, and if the burnt stain remains slightly, “△” indicates that the mixture is easily removed. When there were many spots that could be removed and burnt, “×” adopted a four-point evaluation method when the mixture could not be removed.
(D)耐熱性試験
250℃で10時間加熱した後にJIS K5400における碁盤目試験の方法に準じて密着性を確認した。なお、評価において、異常が見られない場合を「◎」とした。
(D) Heat resistance test After heating at 250 ° C for 10 hours, the adhesion was confirmed according to the cross-cut test method in JIS K5400. In the evaluation, a case where no abnormality was observed was indicated as “◎”.
(E)耐衝撃性試験
JIS K5600における耐おもり落下性(落球式)試験の方法に準じて、300.0±0.5gのおもりを50cmの高さから落下させた後、各皮膜構造の状態を目視にて評価した。なお、評価において、異常が見られない場合を「◎」とした。
(E) Impact resistance test According to the weight drop resistance (falling ball type) test method in JIS K5600, a 300.0 ± 0.5 g weight was dropped from a height of 50 cm, and then the state of each coating structure Was visually evaluated. In the evaluation, a case where no abnormality was observed was indicated as “◎”.
(F)耐沸騰水性試験
98℃以上の沸騰水に100時間浸漬し、水冷・乾燥させた後、各皮膜構造の状態を目視にて評価した。なお、評価において、異常が見られない場合を「◎」とした。
(F) Boiling water resistance test After immersing in boiling water of 98 ° C or higher for 100 hours, water cooling and drying, the state of each film structure was visually evaluated. In the evaluation, a case where no abnormality was observed was indicated as “◎”.
(G)耐酸性試験
JIS K5600における耐液体性(浸漬法)試験の方法に準じて、5w/v%硫酸水溶液に常温で16時間浸漬させ、水洗・乾燥させた後、各皮膜構造の状態を目視にて評価した。なお、評価において、異常が見られない場合を「◎」とした。
(G) Acid resistance test According to the method of liquid resistance (immersion method) test in JIS K5600, after being immersed in a 5 w / v% sulfuric acid aqueous solution at room temperature for 16 hours, washed with water and dried, the state of each film structure was determined. Visual evaluation was performed. In the evaluation, a case where no abnormality was observed was indicated as “◎”.
(H)耐アルカリ性試験
JIS K5600における耐液体性(浸漬法)試験の方法に準じて、5w/v%水酸化ナトリウム水溶液に常温で16時間浸漬させ、水洗・乾燥させた後、各皮膜構造の状態を目視にて評価した。なお、評価において、異常が見られない場合を「◎」とした
(H) Alkali resistance test According to the method of the liquid resistance (immersion method) test in JIS K5600, the film structure was immersed in a 5 w / v% sodium hydroxide aqueous solution for 16 hours at room temperature, washed with water and dried. The state was evaluated visually. In the evaluation, the case where no abnormality was found was marked as “◎”.
表3に示す各種評価試験の結果より、本実施例の皮膜構造(実施例1)は、従来の皮膜構造(比較例1、2)と比較して、従来のフッ素樹脂塗料を用いた非粘着層を有する皮膜構造よりも優れた離型性(非粘着性)を発揮するとともに、従来の無機塗料を用いたセラミック層を有する皮膜構造と同程度の硬度(耐磨耗性)を有することが認められた。このことから、本実施例の皮膜構造は、非粘着性を発揮しつつ、優れた耐摩擦性を併せ持つ非粘着性皮膜として高温調理機器などに有効に使用できることが確認された。 From the results of various evaluation tests shown in Table 3, the film structure of this example (Example 1) is non-adhesive using a conventional fluororesin paint compared to the conventional film structure (Comparative Examples 1 and 2). Exhibits releasability (non-adhesiveness) superior to a film structure having a layer, and has the same degree of hardness (abrasion resistance) as a film structure having a ceramic layer using a conventional inorganic paint Admitted. From this, it was confirmed that the film structure of the present example can be effectively used as a non-adhesive film having excellent friction resistance while exhibiting non-adhesiveness.
<皮膜構造の表面分析>
まず、表1に示す組成割合(重量%)にて無機結合剤としてアルコキシシラン化合物等を含有してなる無機塗料と、表2に示す組成割合(重量%)にてフッ素樹脂粒子としてPTFE等を含有してなるフッ素樹脂粒子分散液とを用いて、ガラス基材上に無機塗料を焼成膜厚10μm、フッ素樹脂粒子分散液を焼成膜厚10μmとなるようにそれぞれ塗布し、120℃で10分間予備乾燥した後に、320℃で20分間焼成して所定の皮膜構造を得た。そして、走査電子顕微鏡(SEM)(日立ハイテクノロジーズ社製:S−4800)を用いてかかる皮膜構造の垂直断面及び表面をSEM観察するとともに、EDX(エダックス・ジャパン社製:GenesisXM2)を用いてSEM観察下で垂直断面及び表面の元素分析を行った。
<Surface analysis of film structure>
First, an inorganic paint containing an alkoxysilane compound or the like as an inorganic binder at a composition ratio (% by weight) shown in Table 1, and PTFE or the like as a fluororesin particle at a composition ratio (% by weight) shown in Table 2. Using the fluororesin particle dispersion contained, an inorganic paint is applied onto a glass substrate so as to have a fired film thickness of 10 μm, and a fluororesin particle dispersion is applied to a fired film thickness of 10 μm, and at 120 ° C. for 10 minutes. After preliminary drying, the film was baked at 320 ° C. for 20 minutes to obtain a predetermined film structure. Then, the vertical cross section and the surface of the coating structure are observed by SEM using a scanning electron microscope (SEM) (manufactured by Hitachi High-Technologies: S-4800), and SEM is used using EDX (manufactured by Edax Japan: GenesisXM2). Under observation, vertical section and surface elemental analysis were performed.
図5乃至図7に示すように、皮膜構造の垂直断面において、SEM画像により無数の粒子状の凹凸が観察され、EDXの測定プロファイルによりSi(ケイ素)の他にF(フッ素)が検出されたことから(図5参照)、セラミック部にフッ素樹脂粒子が分散された状態で含有されていることが確認された。特に、上層部断面(図6参照)及び下部断面(図7参照)のEDXの測定プロファイルを対比したこところ、上層部断面ではSiの他にFが検出される一方、下部断面ではFはほぼ検出されなかった。この結果より、上層につれてフッ素樹脂粒子の密度が高くなり、無機質層の上層部ではセラミック部にフッ素樹脂粒子が分散されるとともに、下部断面ではフッ素樹脂粒子がほぼ存在せずセラミック部が占めることが確認された。 As shown in FIGS. 5 to 7, in the vertical cross section of the coating structure, innumerable particulate irregularities were observed from the SEM image, and F (fluorine) was detected in addition to Si (silicon) by the EDX measurement profile. Therefore (see FIG. 5), it was confirmed that the fluororesin particles were contained in the ceramic portion in a dispersed state. In particular, comparing the EDX measurement profiles of the upper layer section (see FIG. 6) and the lower section (see FIG. 7), F is detected in addition to Si in the upper layer section, while F is almost equal in the lower section. Not detected. As a result, the density of the fluororesin particles increases with the upper layer, and the fluororesin particles are dispersed in the ceramic part in the upper part of the inorganic layer, and the ceramic part occupies almost no fluororesin particles in the lower section. confirmed.
また、図8及び図9に示すように、皮膜構造(無機質層)の表面において、SEM画像により無機質層の表面に口径が〜20数μmの複数の凹部が存在することが確認された。また、EDXの測定プロファイルによりSiの他にFが検出され、皮膜構造の表面に沿ってセラミック部にフッ素樹脂粒子が分散された状態で含有されていることが確認された。また、無機質層の表面において、凹部周辺のEDXの測定プロファイル(図9(a))と凹部以外のEDXの測定プロファイル(図9(b))を対比したところ、凹部周辺ではSiの他にFが検出されるが、凹部以外ではFがほぼ検出されなかった。この結果より、無機質層の表面において凹部にフッ素樹脂粒子が偏在するようにして不均一に分散されていることが確認された。 Moreover, as shown in FIG.8 and FIG.9, in the surface of a film | membrane structure (inorganic layer), it was confirmed by the SEM image that the several recessed part with a caliber of -20-micrometer exists in the surface of an inorganic layer. In addition to Si, F was detected from the EDX measurement profile, and it was confirmed that the fluororesin particles were contained in a dispersed state in the ceramic portion along the surface of the coating structure. In addition, when the measurement profile of EDX around the concave portion (FIG. 9A) and the measurement profile of EDX other than the concave portion (FIG. 9B) are compared on the surface of the inorganic layer, F in addition to Si is formed around the concave portion. Although F was detected, F was hardly detected except for the concave portion. From this result, it was confirmed that the fluororesin particles were unevenly dispersed in the concave portions on the surface of the inorganic layer.
1 皮膜構造
2 無機質層
2a 表面
3 表層部
4 凹部
10 金属基材
20 無機塗料
21 セラミック部
30 フッ素樹脂粒子分散液
31 フッ素樹脂粒子
DESCRIPTION OF SYMBOLS 1 Film structure 2 Inorganic layer 2a Surface 3 Surface layer part 4 Recessed part 10 Metal base material 20 Inorganic coating material 21 Ceramic part 30 Fluorine resin particle dispersion 31 Fluorine resin particle
Claims (8)
金属基材の表面を覆うようにして少なくとも無機結合剤を含む無機塗料を塗布して形成される無機質層からなり、
前記無機質層の表層部にフッ素樹脂粒子が不均一に分散された状態で含有されることを特徴とする非粘着性皮膜構造。 In the non-adhesive film structure formed on the metal substrate,
It consists of an inorganic layer formed by applying an inorganic paint containing at least an inorganic binder so as to cover the surface of the metal substrate,
A non-adhesive film structure comprising fluorine resin particles dispersed in a surface layer portion of the inorganic layer in a non-uniform manner.
金属基材の表面を覆うようにして無機質結合剤を含む無機塗料を塗布する工程と、
金属基材上に塗布された無機塗料の上にフッ素樹脂粒子を含むフッ素樹脂粒子分散液を塗布する工程と、
前記無機塗料及びフッ素樹脂粒子分散液よりなる塗膜を焼成して表層部にて前記フッ素樹脂粒子が不均一に分散された無機質層を形成する工程と、
を有してなることを特徴とする非粘着性皮膜構造の製造方法。 In the method for producing a non-adhesive film structure formed on a metal substrate,
Applying an inorganic paint containing an inorganic binder so as to cover the surface of the metal substrate;
Applying a fluororesin particle dispersion containing fluororesin particles on the inorganic coating applied on the metal substrate;
Firing a coating film composed of the inorganic coating material and the fluororesin particle dispersion to form an inorganic layer in which the fluororesin particles are dispersed non-uniformly in a surface layer portion;
The manufacturing method of the non-adhesive film structure characterized by having.
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JPH0332618A (en) * | 1989-06-30 | 1991-02-13 | Sharp Corp | Structure of film for high-temperature cooking apparatus and formation thereof |
JPH03268716A (en) * | 1990-03-20 | 1991-11-29 | Matsushita Electric Ind Co Ltd | Electric water heater |
JPH06145946A (en) * | 1992-11-13 | 1994-05-27 | Sharp Corp | Structure of cooking surface of cooking apparatus for high-temperature heating and its production |
JP2009543656A (en) * | 2006-07-18 | 2009-12-10 | サーモロン コリア カンパニー,リミテッド | Coating layer structure of cooking container |
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JPS633818A (en) * | 1986-06-23 | 1988-01-08 | 市川 好男 | Production of heating cooker |
JPH0332618A (en) * | 1989-06-30 | 1991-02-13 | Sharp Corp | Structure of film for high-temperature cooking apparatus and formation thereof |
JPH03268716A (en) * | 1990-03-20 | 1991-11-29 | Matsushita Electric Ind Co Ltd | Electric water heater |
JPH06145946A (en) * | 1992-11-13 | 1994-05-27 | Sharp Corp | Structure of cooking surface of cooking apparatus for high-temperature heating and its production |
JP2009543656A (en) * | 2006-07-18 | 2009-12-10 | サーモロン コリア カンパニー,リミテッド | Coating layer structure of cooking container |
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