JP2016079430A - Vacuum deposition apparatus and evaporator used in the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an evaporator that improves maintainability of a mask and does not impair deposition quality.SOLUTION: An evaporator 100 that is arranged in a vacuum tank with its longitudinal direction being horizontal and deposits a material to be evaporated on a continuously supplied belt-shaped film includes: an open crucible 101 that melts an evaporation source; a cylinder-based heating chamber 102 that lies in a laid position and houses the crucible; and a plurality of rod-shaped heaters 131 that are arranged outside the heating chamber and parallel to an axis of the heating chamber. The heating chamber is provided with a mounting port 121 which has a substantially rectangular shape long in one direction and whose side surface is formed to rise outward from a position notched parallel to the axis. The evaporator 100 further includes: a mask 141 that is long in one direction and detachably mounted to the mounting port, and has a slit 144 formed in the longitudinal direction to blow out an evaporated material; and a heater 132 for the mask that is disposed immediately below or in the mask to heat the mask to a re-evaporation temperature or more.SELECTED DRAWING: Figure 3

Description

  The present invention relates to a vacuum vapor deposition apparatus for producing a film capacitor or a vapor deposition film and an evaporation apparatus used therefor, and more particularly to a vacuum vapor deposition apparatus and an evaporation apparatus that do not cause clogging of a mask.

  When manufacturing a film capacitor, a metal vapor-deposited film is used, which is formed by vapor-depositing metal on a film by a vacuum vapor deposition apparatus. In the vacuum evaporation apparatus, the metal from the evaporation apparatus adheres to the belt-like film continuously supplied to the cooling roll, and vapor deposition is performed.

  In order to perform uniform vapor deposition, the evaporation apparatus is oriented in the width direction of the film and arranged at a constant interval from the film. A mask having slits is attached to the evaporator, and the evaporated metal that has passed through the slits is uniformly deposited on the film.

However, the conventional technique has the following problems.
The slit is usually narrow, and the evaporation metal solidifies in the slit part due to the environment of the evaporator, that is, the heating temperature of the heater, the distance from the heater to the mask, the heat capacity of the mask, the temperature outside the mask, etc. There was a problem that it could change and cause clogging. As a result, it is necessary to replace the mask before the end of its life, and there is a problem in that maintenance is required.

  Further, since the mask and the apparatus housing are both steel materials and are exposed to a thermal history, and the mask is a replacement part, it is difficult to permanently maintain a state where the mask and the apparatus housing are joined together in an airtight manner. In particular, conventionally, as shown in FIG. 5, the mask has a U-shape and is inserted as a leg, and it is difficult to make the contact area of the gasket large in structure, and the airtightness is not always sufficient. is there. That is, there is a problem that it is difficult to maintain the desired quality of the deposited film.

Japanese Patent Laid-Open No. 7-18442

  The present invention has been made in view of the above, and an object of the present invention is to provide an evaporation apparatus and a vacuum evaporation apparatus that improve the maintainability or life of the mask and maintain the desired evaporation quality.

  The evaporation apparatus according to claim 1 is an evaporation apparatus that is disposed in a vacuum chamber with a longitudinal length horizontally, and deposits an evaporation target on a continuously supplied strip-shaped film. An open crucible for melting the source, a cylindrical-tone heating chamber containing the crucible and lying down, and a plurality of heating chamber heating resistors arranged outside the heating chamber in parallel to the axis of the heating chamber, The heating chamber is provided with a substantially rectangular attachment port that is formed by cutting the side surface in parallel to the axis or rising outward from the notch position, and is detachably attached to the attachment port. A long mask having a slit in the longitudinal direction for blowing out the evaporant, and a heating resistor for the mask that is disposed directly under or in the mask and heats the mask at a temperature higher than the re-evaporation temperature of the evaporation source It is characterized by comprising.

  That is, the invention according to claim 1 provides an evaporation apparatus that effectively warms the mask and avoids metal adhesion, thereby improving the maintainability or life of the mask and maintaining the intended deposition quality. It becomes possible.

  The evaporation source or the substance to be evaporated means a metal-based raw material, and examples thereof include zinc and zinc alloys. The crucible is not particularly limited as long as the crucible is accommodated in the heating chamber. However, since the heating chamber is long, it is preferable that the crucible is also long from the viewpoint of fullness of steam in the heating chamber and uniform blowing from the slit. Since the heating chamber has a cylindrical tone, the radiant heat from the heater tends to stay in the chamber, and uniform heating is realized. Since the heat generating resistor is disposed outside the room, the heat transfer material may be used as it is if it is not short-circuited, or may be appropriately wrapped with a heater insulator. The heating resistor for the mask is not particularly limited in configuration, material, shape, etc. as long as the entire mask can be heated to the re-evaporation temperature or higher, but in a mode in which the mask is heated uniformly and temperature unevenness does not occur. Preferably there is. The slit is not limited to a single line extending in the longitudinal direction, and may be appropriately divided. Here, an aspect in which dots are scattered in the longitudinal direction is also included in the slit. That is, the slit is not particularly limited as long as it is a group of diffusion holes.

  The evaporation device according to claim 2 is the evaporation device according to claim 1, wherein the mask is wider than the inner width of the attachment port, and is inserted into and fitted into the longitudinal direction of the attachment port; And two long edge pieces that extend outward from the ends and cover the outer side of the attachment port.

  In other words, the invention according to claim 2 enhances the attachment property by the edge piece portion and the leg portion, and also improves the airtightness of the mask periphery rather than only the leg portion by providing the edge piece portion, thereby improving the vapor deposition quality. Can be improved. In addition, when a heating opening is formed and a heating chamber heating resistor is arranged along the mounting opening, heat conduction is also enjoyed by surface contact between the rising portion and the leg portion, and metal adhesion is avoided. The performance can be further improved.

  The leg portion may be formed as a plate-like leg along the length of two or two pieces, or may have a solid cross-sectional shape with a convex shape. In this case, the mask heating resistor may be embedded in the solid portion. Further, a gasket may be inserted into the joint portion between the edge piece portion and the attachment port to further improve the airtightness.

  The evaporation apparatus according to claim 3 is the evaporation apparatus according to claim 1 or 2, wherein the heating resistor for the heating chamber and the heating resistor for the mask are formed in a rod shape or a column shape, and all or several of them are folded at the end. As a series connection.

  That is, the invention according to claim 3 easily realizes uniform heating. In addition, the circuit configuration can be simplified. Since it becomes a set and is practically integrated, it is possible to improve detachability and, in turn, maintainability.

  Folding at the end means that two adjacent pieces are U-shaped. For example, an example in which several sets are used to supply power using the upper half of the heating chamber as the first system and the lower half as the second system can be given. In addition, only the mask heating resistor may be an independent system.

  According to a fourth aspect of the present invention, there is provided an evaporator according to the first, second, or third aspect, wherein the material to be evaporated is zinc or a zinc compound and is used for manufacturing a film capacitor.

  That is, the invention according to claim 4 can provide a high-quality film capacitor.

  A vacuum deposition apparatus according to a fifth aspect includes the evaporation apparatus according to any one of the first to fourth aspects.

  That is, the invention according to claim 5 can provide a vacuum deposition apparatus that improves the maintainability or life of the mask and maintains the intended deposition quality.

  According to the present invention, it is possible to provide an evaporation apparatus and a vacuum evaporation apparatus that improve the maintainability or life of the mask and maintain the desired evaporation quality.

It is a structural example (schematic diagram) of the vacuum evaporation apparatus provided with the evaporation apparatus of this invention. It is a perspective view of the evaporation apparatus of this invention. 2a is a perspective view showing the upper part, and FIG. 2b is a perspective view showing the lower part. It is sectional drawing of the evaporation apparatus of this invention. It is a schematic diagram of a heater built-in mask. 4a is a perspective view, and FIG. 4b is a schematic cross-sectional view. It is sectional drawing of the conventional evaporator.

  Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. Here, the vacuum evaporation apparatus which manufactures the zinc vapor deposition film for film capacitors is demonstrated. FIG. 1 is a configuration example of a vacuum deposition apparatus provided with the evaporation apparatus of the present invention. FIG. 2 is a perspective view of the evaporation apparatus of the present invention. FIG. 3 is a cross-sectional view of the evaporation apparatus of the present invention.

  The vacuum vapor deposition apparatus 1 mainly includes a vapor deposition chamber 10, an unwinding body 20, a cooling roll 30, a winding unit 40, an aluminum evaporation source 50, and an evaporation device 100. In addition, an unwinding body 20, a cooling roll 30, a winding unit 40, an aluminum evaporation source 50, and an evaporation device 100 are provided.

  The vapor deposition chamber 10 deaerates the chamber to a predetermined degree of vacuum using a deaeration device (not shown).

  The unwinding body 20 is wound with a wide film for a capacitor having a predetermined dielectric constant, and continuously feeds the film so as to have a constant supply speed.

  The winding unit 40 sequentially winds the film on which zinc is deposited. The winding speed is the same as the film supply speed, so that no deflection occurs in the deposited film. In addition, after completion | finish of vapor deposition, a vapor deposition film is processed into a capacitor | condenser suitably at a post process.

  The cooling roll 30 is a cylinder having a predetermined diameter, and winds the film fed from the unwinding body 20 by a predetermined center angle such that the film width direction is the axial direction. Zinc vapor blows to the wound contact portion, and the film is cooled by the back of the cooling roll 30 to condense the metal. That is, zinc is deposited on the film.

  The aluminum evaporation source 50 is disposed immediately upstream of the evaporation apparatus 100 as a pretreatment for improving zinc deposition. As a result, aluminum is deposited on the film as zinc deposition nuclei.

  The evaporator 100 is disposed directly below the cooling roll 30 so that its longitudinal direction coincides with the axial direction. That is, the evaporator 100 is disposed directly below the cooling roll 30 with a certain distance.

The evaporation apparatus 100 has a crucible 101, a heating chamber 102, and a heater 103 as main components.
The crucible 101 has a bowl shape or bowl shape that is long in one direction, and melts zinc as an evaporation source by radiation heating. The melting point of zinc at 1 atm is 419 ° C. and the boiling point is 907 ° C. The crucible 101 is accommodated in a cylindrical-tone heating chamber 102 that is horizontally laid down with the opening portion facing up.

  The heating chamber 102 is provided with a rectangular tube-like attachment port 121 formed upward from a position where the upper side surface is cut out parallel to the axis. And the upper surface of the attachment port 121 is formed with horizontally extending barbs 122 on the left and right sides.

  The mask 141 is a rectangular steel plate having the same width as the barb 122 and closing the attachment port 121. However, the lower surface is provided with two long legs 142 that are inserted into and fitted into the attachment port 121. Here, the outer side of the leg 142 is in surface contact with the inner side of the attachment port 121, and the leg 142 also enjoys heating from the outer side of the attachment port 121, as will be described later. Further, a sheet-like gasket G made of carbon fiber is sandwiched between the left and right longitudinal pieces of the mask 141, that is, the edge piece 145 corresponding to the turn 122, and the edge piece 145 and the turn 122 are bolted. Conventionally, there has been a case where a gasket is interposed inside the mounting port 121, and the mounting property is not necessarily excellent and the airtightness is not sufficient. In the evaporator 100, the leg 142 and the edge piece 145 are L-shaped. In addition, since the gasket G is disposed horizontally and makes surface contact, good airtightness is maintained. In addition, the mounting workability is excellent.

  In the center of the mask 141, holes 143 are arranged in a line at a predetermined interval in the longitudinal direction to form a slit 144. Zinc vapor is dissipated from the slit 144 and deposited on the upper film. Since the crucible 101, the heating chamber 102, and the slit 144 are long in one direction, uniform vapor dissipation can be realized regardless of the location of the hole 143, and unevenness is not generated in the produced vapor deposition film. .

  A heater 103 is provided around the outside of the heating chamber 102 to heat the heating chamber 102. Specifically, twelve rod heaters 131 arranged in parallel to the longitudinal direction (axial direction) of the heating chamber 102 are arranged. As shown in the figure, the rod-shaped heater 131 is a heating resistor and is bent in a U shape at the end, and is connected in the same circuit as the adjacent rod-shaped heater 131, that is, in series. In the present embodiment, the lower four lines include the first system and the four lines arranged in the vicinity of the attachment port 121, and the upper eight lines are the second system, which is another set (separate circuit).

  Since the rod heaters 131 are arranged on the left and right objects along the axis of the heating chamber 102, heating unevenness does not occur, and since the heating chamber 102 has a cylindrical tone, heat efficiency is good and suitable radiant heating is realized.

  The evaporation apparatus 100 also includes a rod-shaped mask heater 132 in parallel with the mask 141 immediately below the mask 141. The mask heater 132 is covered with an insulator so as not to cause a short circuit. The mask 141 is located at a certain distance from the crucible 101 due to its structure, and is a boundary with the outside of the vacuum, so that the temperature tends to decrease. Further, since the zinc vapor passes through the narrow slit 144, the velocity of the vapor is increased.

  For this reason, normally, zinc easily adheres to the slit 144 portion. In the present evaporation apparatus 100, the mask heater 132 sufficiently heats the mask 141 so that adhesion and solidification do not occur. That is, it heats more than the re-evaporation temperature of zinc. Further, the four rod heaters 131 on the left and right of the attachment port 121 also heat the leg 142 through the attachment port 121 and assist the heating of the mask 141. Note that the distance between the mask 141 and the mask heater 132 is set as appropriate. For example, an example of 1 cm can be given. Note that the mask heater 132 may be incorporated into a part of the second system described above, but here is an independent system.

  The rod heater 131 and the mask heater 132 are detachably attached to the heating chamber 102 while ensuring insulation so that maintenance or replacement is easy.

  As mentioned above, according to this invention, the clogging of a mask does not arise, but a vapor deposition film with a uniform and uniform vapor deposition film thickness can be manufactured.

  The present invention is not limited to the above example. As shown in FIG. 4, a heater may be built in the mask. The heater is a mode in which a heating resistor (heat transfer rod) is covered with an insulator (insulator), and is provided on the left and right sides of the slit. In the case of this mask with a heater, since the heater and the mask are exchanged at the same time, the workability is excellent. FIG. 4 shows an example in which flat cross-shaped holes are continuous in the longitudinal direction to form slits.

  The zinc vapor-deposited film produced by the vacuum vapor deposition apparatus of the present invention can be cut into a predetermined width and wound, and can be used, for example, for a smoothing circuit during DC-AC conversion.

DESCRIPTION OF SYMBOLS 1 Vacuum evaporation apparatus 10 Deposition chamber 20 Unwinding body 30 Cooling roll 40 Winding part 50 Aluminum evaporation source 100 Evaporating apparatus 101 Crucible 102 Heating chamber 103 Heater 121 Mounting port 122 Return 131 Rod heater 132 Mask heater 141 Mask 142 Leg 143 Hole 144 Slit 145 Edge piece G Gasket

Claims (5)

An evaporation device for horizontally depositing a longitudinal length in a vacuum chamber and depositing an evaporation target on a continuously supplied strip-shaped film,
An open crucible to melt the evaporation source;
A cylindrical heating chamber that houses the crucible and lies on its side,
A plurality of heating chamber heating resistors arranged outside the heating chamber in parallel to the axis of the heating chamber;
Have
The heating chamber is provided with a substantially rectangular attachment port that is formed by cutting the side surface in parallel to the axis or rising from the notch position and extending in the axial direction.
Furthermore,
A mask that is long in one direction and is detachably attached to the attachment port, and a mask that is provided with a slit in the longitudinal direction to blow off the evaporated material,
A heating resistor for the mask that is placed directly under or in the mask and heats the mask above the re-evaporation temperature of the evaporation source,
An evaporation apparatus comprising: The mask is wider than the inner width of the mounting opening,
A leg that plugs into and fits into the length of the mounting opening;
Two longitudinal edge pieces that extend outward from the base end of the leg and cover the outside of the mounting opening,
The evaporation apparatus according to claim 1, comprising:   3. The evaporator according to claim 1, wherein the heating resistor for the heating chamber and the heating resistor for the mask are formed in a rod shape or a column shape, and all or several of the folded portions are connected in series at the end.   The evaporation apparatus according to claim 1, 2 or 3, wherein the substance to be evaporated is zinc or a zinc compound and is used for manufacturing a film capacitor.   A vacuum evaporation apparatus comprising the evaporation apparatus according to claim 1.

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