JP2016058591A - Illumination optical device, exposure device, and manufacturing method of device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an illumination optical device by which an image of a secondary light source is easily formed in a desired ring belt shape or a circular shape while suppressing a loss in the quantity of light.SOLUTION: An illumination optical device 12 includes: a convergence part 2 that converges a light flux from a light source 1; optical systems 4 and 5 for guiding the light flux that is converged by the convergence part 2; and an optical integrator 6 for emitting the light flux that is incident via the optical systems 4 and 5, towards an object to be irradiated. The light source 1 emits a light flux from an emission region 1a having a rotationally symmetrical emission intensity distribution. The convergence part 2 includes a plurality of reflectors for which a rotational symmetry axis of the emission region 1a is defined as an optical axis AX and which are installed in rotational symmetry with the optical axis AX and so as to surround the emission region 1a and include reflection planes for reflecting the light flux emitted from the emission region 1a. At least two of the plurality of reflectors are ellipsoidal reflectors 21, 23 and 25 of which the reflection planes are ellipsoid having a focal point in the emission region 1a and which are movable in a direction of the optical axis AX.SELECTED DRAWING: Figure 1

Description

  The present invention relates to an illumination optical apparatus, an exposure apparatus, and a device manufacturing method.

  In lithography processes included in the manufacturing process of semiconductor devices, etc., exposure that transfers the pattern formed on the original (reticle etc.) to the substrate (wafer etc. with a resist layer formed on the surface) via the projection optical system etc. A device is used. Here, the exposure apparatus includes an illumination optical device that illuminates the original with a light beam from a light source. In such an illumination optical device, it is desirable to suppress the loss of the light amount as much as possible, and it is more preferable that the image of the secondary light source can be appropriately changed to a desired shape. In view of this, Japanese Patent Application Laid-Open No. H10-228707 substantially reduces the amount of light loss by switching the conical prism on the light source side of the fly's eye lens with a substantially conjugate positional relationship between the opening of the elliptical mirror and the incident surface of the fly's eye lens. An exposure apparatus is disclosed that changes the image of a secondary light source having an annular shape without the need to do so. Further, Patent Document 2 discloses an exposure apparatus that inserts a conical prism at a pupil position on the light source side of a fly's eye lens with a lens interposed therebetween, and changes an image of a circular secondary light source into an annular shape. .

JP 2002-25898 A JP 2001-358071 A

  However, in the illumination optical device disclosed in Patent Document 1, the annular ratio (ratio between the inner diameter and the outer diameter) of the formed annular-shaped secondary light source image can be changed. The width (distance between the inner and outer diameters) cannot be changed. Also, with this illumination optical device, the diameter of the circular secondary light source cannot be made too small. On the other hand, in the illumination optical device in the exposure apparatus disclosed in Patent Document 2, the image of the secondary light source is changed by the optical element and is shaped by the stop on the exit side of the fly's eye lens. Loss occurs. Furthermore, when the shape of the image of the secondary light source is changed to a desired shape, it is desirable that the change can be easily performed.

  The present invention has been made in view of such a situation, and provides an illumination optical device that easily makes the shape of an image of a secondary light source a desired annular shape or a circular shape while suppressing loss of light amount. For the purpose.

  In order to solve the above-described problems, the present invention is an illumination optical device that illuminates an object to be irradiated using a light beam from a light source, and the light is collected on a light collecting unit and a light collecting unit. An optical system that guides the light beam and an optical integrator that emits the light beam incident through the optical system toward the irradiated object, and the light source emits the light beam from a light emitting region having a rotationally symmetric light intensity distribution The condensing unit is disposed so as to have a rotational symmetry axis of the light emitting region as an optical axis, to be rotationally symmetric with respect to the optical axis and to surround the light emitting region, and to reflect a light beam emitted from the light emitting region. An ellipsoidal reflecting mirror having a plurality of reflecting mirrors, wherein at least two of the plurality of reflecting mirrors are ellipsoidal surfaces whose reflecting surfaces have a focal point in the light emitting region, and are movable in the direction of the optical axis. It is characterized by being.

  ADVANTAGE OF THE INVENTION According to this invention, the illumination optical apparatus which makes the shape of the image of a secondary light source easily a desired ring zone shape or circular shape can be provided, suppressing the loss of light quantity.

It is a figure which shows the structure of the exposure apparatus in one Embodiment of this invention. It is a figure which shows the structure of the illumination system for demonstrating light intensity distribution. It is a figure which shows the structure of the illumination system for demonstrating light intensity distribution. It is a figure which shows the 1st example of the light intensity distribution of the light beam which a condensing mirror forms. It is a figure which shows the 2nd example of the light intensity distribution of the light beam which a condensing mirror forms. It is a figure which shows the 3rd example of the light intensity distribution of the light beam which a condensing mirror forms. It is a figure which shows the 4th example of the light intensity distribution of the light beam which a condensing mirror forms. It is a figure which shows the 5th example of the light intensity distribution of the light beam which a condensing mirror forms. It is a figure which shows the 6th example of the light intensity distribution of the light beam which a condensing mirror forms. It is a flowchart which shows the flow of the movement process of each elliptical mirror and each spherical mirror. It is a flowchart which shows the flow of the adjustment process of a secondary light source. It is a figure which shows the other structure of the illumination system for demonstrating light intensity distribution. It is a figure which shows the other structure of the illumination system for demonstrating light intensity distribution. It is a figure which shows the other structure of the illumination system for demonstrating light intensity distribution.

  Hereinafter, embodiments for carrying out the present invention will be described with reference to the drawings.

(First embodiment)
First, an illumination optical apparatus according to a first embodiment of the present invention and an exposure apparatus including the illumination optical apparatus will be described. FIG. 1 is a schematic diagram showing a configuration of an exposure apparatus 100 according to the present embodiment. The exposure apparatus 100 is used, for example, in a lithography process in a semiconductor device manufacturing process, and exposes an image of a pattern formed on a reticle R on a wafer W (on a substrate) by a scanning exposure method ( This is a projection type exposure apparatus that performs transfer. 1 and the following drawings, the Z axis is parallel to the optical axis of the projection optical system 14, and the wafer W is scanned in the same plane perpendicular to the Z axis during exposure (the reticle R and the wafer W). The Y axis is taken in the relative movement direction) and the X axis is taken in the non-scanning direction orthogonal to the Y axis. The exposure apparatus 100 includes an illumination system 12, a reticle stage 13, a projection optical system 14, a wafer stage 17, and a control unit 36.

  The illumination system 12 is an illumination optical apparatus according to the present embodiment, and illuminates the reticle R by adjusting the light flux from the light source 1. Details of the illumination system 12 will be described later. The reticle R is an original made of, for example, quartz glass on which a pattern (for example, a circuit pattern) to be transferred is formed on the wafer W. The reticle stage 13 holds the reticle R and is movable in the X and Y axial directions. The projection optical system 14 projects the light that has passed through the reticle R onto the wafer W at a predetermined magnification (for example, 1/2 times). The wafer W is a substrate made of, for example, single crystal silicon, on which a resist (photosensitive agent) is applied. The wafer stage 17 holds the wafer W via the wafer chuck 16 and is movable in each axial direction of X, Y, and Z (which may include ωx, ωy, and ωz that are the respective rotation directions).

  The control unit (exposure control unit) 36 is configured by a computer, for example, and is connected to each component of the exposure apparatus 100 via a line, and can control the operation and adjustment of each component according to a program or the like. Note that the control unit 36 may be configured integrally with other parts of the exposure apparatus 100 (in a common casing), or separate from the other parts of the exposure apparatus 100 (in a separate casing). It may be configured. Further, the illumination system 12 may have a control unit that uniquely executes control of operation of a drive system included in the illumination system 12 and transmission / reception with a calculation unit 37 (described later) that executes various calculations. Hereinafter, for the sake of simplicity, it is assumed that the control unit 36 executes all the control and the like related to the illumination system 12.

  Next, the configuration of the illumination system 12 will be specifically described. The illumination system 12 includes a light source 1, a condenser mirror 2, a cold mirror 3, a first incident optical system 4, a second incident optical system 5, an optical integrator 6, a collimator 10, and a bending mirror 11. including. Among these, the first incident optical system 4 and the second incident optical system 5 are selected according to the illumination conditions when performing exposure, and are appropriately installed in the optical path of the illumination system 12.

  The light source 1 is, for example, a high-intensity ultra-high pressure mercury lamp that emits ultraviolet rays or far ultraviolet rays. The light source 1 has two electrodes, a cathode and an anode, and emits a light beam from a light emitting point (light emitting region) 1a having a predetermined size formed between the electrodes. The light emitting unit 1a is positioned in the vicinity of the first focal points of the plurality of elliptical mirrors constituting the condenser mirror 2 and has a rotationally symmetric light emission intensity distribution. At this time, the optical axis AX of the illumination system 12 can be said to be a rotationally symmetric axis of the light emitting point 1a. Furthermore, the illumination system 12 includes a first drive unit (light source drive unit) 35 that displaces the light source 1 in the XYZ axial directions based on a command from the control unit 36.

  The condensing mirror (condensing part) 2 is a multistage condensing mirror having a plurality of reflecting mirrors in which elliptical mirrors and spherical mirrors having a rotationally symmetric shape with respect to the optical axis AX are alternately arranged. The condensing mirror 2 condenses the light beam emitted from the light source 1 and makes it incident on the cold mirror 3. Hereinafter, the condensing mirror 2 in the present embodiment includes, as an example, five reflecting mirrors of a first elliptical mirror 21, a first spherical mirror 22, a second elliptical mirror 23, a second spherical mirror 24, and a third elliptical mirror 25. . Here, the ellipsoidal mirror is an ellipsoidal reflecting mirror having a reflecting surface that reflects the light beam as an ellipsoid. On the other hand, the spherical mirror is a spherical reflecting mirror having a spherical reflecting surface that reflects the light beam. In particular, it is assumed that the three elliptical mirrors 21, 23, and 25 have the curvatures set so that the distances between the respective focal points are equal, and are arranged so that the respective focal positions are equal. Specifically, the light beam emitted from the light source 1 is collected by the elliptical mirrors 21, 23, and 25 and is incident on the cold mirror 3. Further, the illumination system 12 includes a second driving unit (reflecting mirror driving unit) 15 that allows each reflecting mirror to be individually moved based on a command from the control unit 36.

  The cold mirror 3 has a surface formed of a multilayer film such as a dielectric, and mainly transmits infrared light and reflects ultraviolet light used for exposure light. Specifically, the light beam reflected by the cold mirror 3 forms an image of the light emitting unit 1a at the first position 18 in the vicinity of the second focal point of each elliptical mirror 21, 23, 25. Further, as shown in FIG. 1, the cold mirror 3 bends the optical axis AX of the light beam emitted from the light source 1 from the Z-axis direction to the Y-axis direction.

  The first incident optical system (first optical system) 4 is an optical system that converts the light beam collected by the condenser mirror 2 into first incident light and guides it to the optical integrator 6. The first incident optical system 4 is configured such that the incident surface 19 of the optical integrator 6 is optically in a pupil relationship with the position where the condenser mirror 2 condenses the light beam from the light source 1. Specifically, the first incident optical system 4 includes an optical rod 41, a Fourier transform optical system 42, and an aperture stop (first stop) 43 disposed on the exit surface 20 of the optical integrator 6. The optical rod 41 is a cylindrical waveguide disposed so that the exit surface is located on the object plane of the Fourier transform optical system 42. The optical rod 41 is installed so as not to cause a shadow of the lead wire 1 b that supplies power to the light source 1 on the incident surface 19. Specifically, the optical rod 41 converts the incident light beam into a rotating light beam (Skew light beam) reflected from the side surface of the cylinder and blurs the shadow of the lead wire 1b included in the incident light beam to disappear. The Fourier transform optical system 42 receives the light beam from the exit surface of the optical rod 41, converts it into a substantially parallel light beam, and enters the incident surface 19 of the optical integrator 6. The optical integrator 6 includes a plurality of small lenses that extend in the direction of the optical axis AX (Y-axis direction) and are arranged in parallel in a plane direction (XZ plane) orthogonal to the direction of the optical axis AX. A secondary light source is formed at 20. The aperture stop 43 shapes the shape of the secondary light source formed on the exit surface 20 of the optical integrator 6. For example, when the optical integrator 6 is composed of about 100 fly eye lenses, the end of the secondary light source formed on the exit surface 20 is a continuous circle centered on the optical axis AX of the illumination system 12. In other words, it becomes an angular shape along the shape of the fly-eye lens. Therefore, the aperture stop 43 is shaped into a circular shape by shielding a part of this angular shape. However, for example, when the optical integrator 6 is configured by a minute optical element such as a microlens array, and the shape of the light beam formed on the incident surface 19 is substantially equal to the shape of the light beam obtained on the exit surface 20, The aperture stop 43 is not necessarily provided.

  The second incident optical system (second optical system) 5 converts the light beam collected by the condenser mirror 2 into second incident light different from the first incident light and guides it to the optical integrator 6. It is. The second incident optical system 5 is configured so that the incident surface 19 of the optical integrator 6 is optically conjugate with the position where the condenser mirror 2 condenses the light beam from the light source 1. For example, the second incident optical system 5 includes a first Fourier transform optical system 51 and a second Fourier transform optical system 52, and an aperture stop (second stop) 53 disposed on the exit surface 20 of the optical integrator 6. The light beam incident on the first Fourier transform optical system 51 disposed on the light source 1 side is converted into a substantially parallel light beam, and is incident on the second Fourier transform optical system 52 disposed on the optical integrator 6 side. The light beam incident on the second Fourier transform optical system 52 is converted into a condensed light beam, enters the incident surface 19, and forms a secondary light source on the exit surface 20. The aperture stop 53 shapes the shape of the secondary light source formed on the exit surface 20 similarly to the aperture stop 43 included in the first incident optical system 4. However, for example, in the case where the optical integrator 6 is configured by a minute optical element such as a microlens array and the shape of the light beam formed on the incident surface 19 is substantially equal to the shape of the light beam obtained on the exit surface 20, it is not always necessary. There is no need to provide the aperture stop 53.

  In addition, the first incident optical system 4 and the second incident optical system 5 are detachably disposed in the optical path of the illumination system 12 (detachable and attachable or switchable). Specifically, the illumination system 12 may include a mechanism for manually removing and attaching the first incident optical system 4 and the second incident optical system 5. Alternatively, the illumination system 12 includes a drive mechanism (optical system drive unit) that can automatically switch between the first incident optical system 4 and the second incident optical system 5 based on a command from the control unit 36. Also good.

  The collimator 10 includes, for example, two optical systems 10 a and 10 b arranged with the bending mirror 11 interposed therebetween, and illuminates the reticle R as an irradiation object placed on the reticle stage 13. When the collimator 10 is arranged in this way in the illumination system 12, the image of the secondary light source formed on the exit surface 20 of the optical integrator 6 is formed in the vicinity of the pupil plane 14 a of the projection optical system 14.

  Further, the illumination system 12 can include a half mirror 7, a detection optical system 8, a detector 9, and a calculation unit 37. The half mirror 7 is disposed between the optical integrator 6 and the collimator 10 (optical system 10 a), and reflects part of the light beam emitted from the optical integrator 6 toward the detection optical system 8. The detection optical system 8 includes, for example, two optical systems 8a and 8b, and projects (reduced projection) an image of the secondary light source formed on the exit surface of the optical integrator 6 onto the detector 9. The detector 9 is a photoelectric conversion element such as a quadrant sensor or a two-dimensional CCD, for example, and detects the image of the projected secondary light source. In addition, the calculation unit 37 calculates the total light amount of the image of the secondary light source and the symmetry of the light intensity distribution based on the output of the detector 9, and transmits the obtained information to the control unit 36.

  Next, the operation of the illumination system 12 (exposure apparatus 100 using the illumination system 12) will be described. The illumination system 12 changes the light intensity distribution of the light beam formed on the incident surface 19 of the optical integrator 6 in accordance with the resolution line width or isolation of the pattern formed on the reticle R. Thereby, the illumination system 12 can change the light intensity distribution of the secondary light source formed on the pupil plane 14 a of the projection optical system 14.

  First, a method for changing the light intensity distribution on the incident surface 19 of the optical integrator 6 will be described. 2 and 3 are schematic views showing optical systems for explaining the light intensity distribution formed by the light flux emitted from the light source 1, respectively. 2 and 3, the cold mirror 3 and the optical rod 41 are not shown for the sake of simplicity. Therefore, in FIGS. 2 and 3, it is assumed that the optical axis of the illumination system 12 extends in the Z-axis direction. Here, the first position 18 is the position of the incident surface of the optical rod 41 when the illumination system 12 applies the first incident optical system 4. On the other hand, when the illumination system 12 applies the second incident optical system 5, the first position 18 is a conjugate position with the incident surface 19. Accordingly, the second incident optical system 5 can re-form (image) the light intensity distribution of the light beam formed at the first position 18 on the incident surface 19. The second position 180 is the position of the pupil plane of the Fourier transform optical system 42 and the position of the incident plane 19 when the illumination system 12 employs the first incident optical system 4.

  First, FIG. 2A shows a reference state of the condenser mirror 2. Here, the reference state refers to a state that satisfies the following conditions. As a first condition, the first focal positions of the elliptical mirrors 21, 23, and 25 constituting the condenser mirror 2 are matched, and the second focal positions are also matched. As a second condition, each second focal position coincides with the first position 18. As a third condition, the centers of curvature (center points) of the spherical mirrors 22 and 24 constituting the condenser mirror 2 coincide with the first focal positions of the three elliptical mirrors. In this state, when the light emitting unit 1a is disposed at the first focal position of each of the elliptical mirrors 21, 23, 25, the light beams emitted from the light emitting unit 1a are reflected by the elliptical mirrors 21, 23, 25 to be respectively the light beams 210, 230 and 250, and the light is condensed at the first position 18 which is the second focal position. On the other hand, a part of the light beam emitted from the light emitting unit 1 a is reflected by the second spherical mirror 24 and condensed on the light emitting unit 1 a, and then reflected by the second elliptical mirror 23 facing the second spherical mirror 24 to be reflected by the light beam 230. And is condensed at the first position 18. Similarly, another part of the light beam emitted from the light emitting unit 1 a is reflected by the first spherical mirror 22 and condensed on the light emitting unit 1 a, and then reflected by the third elliptical mirror 25 facing the first spherical mirror 22. Thus, it becomes a part of the light beam 250 and is condensed at the first position 18. Each light beam 210, 230, 250 is condensed at the first position 18, then enters the Fourier transform optical system 42 and is converted into a substantially parallel light beam, and the second position 180 on the pupil plane of the Fourier transform optical system 42. A ring-shaped light intensity distribution is formed.

  FIG. 4 is a diagram showing a first example of the light intensity distribution of the light beam formed (condensed) by the condenser mirror 2 at the first position 18 corresponding to the state shown in FIG. Among these, FIG. 4A shows the light intensity distribution generated by the overlapping of the light beams 250, 230, and 210. 4 (b) to 4 (d) show light intensity distributions in which each of the light beams 250, 230, and 210 is generated in order. When the illumination system 12 applies the second incident optical system 5, the light intensity distribution shown in FIG. 4 formed at the first position 18 is formed on the incident surface 19 of the optical integrator 6. In this case, since the respective condensing points of the elliptical mirrors 21, 23, and 25 coincide with the first position 18, as shown in FIGS. 4B to 4D, the light beams 250, 230 are obtained. , 210 have the highest peak intensity. Therefore, the light intensity distribution generated by the overlapping of the light beams 250, 230, and 210 has the highest peak intensity as shown in FIG.

  FIG. 5 is a diagram showing a second example of the light intensity distribution of the light beam formed by the condenser mirror 2 at the second position 180, corresponding to the state shown in FIG. Among these, Fig.5 (a) has shown the light intensity distribution which each light flux 250,230,210 overlaps and produces. FIG. 5B to FIG. 5D show light intensity distributions in which each of the light beams 250, 230, and 210 is generated in order. In FIG. 5, the outer diameter of the light intensity distribution of the light beam 250 is denoted as W (250), and the inner diameter is denoted as W ′ (250). Similarly, the outer diameter of the light intensity distribution of the light beam 230 is W (230), the inner diameter is W ′ (230), the outer diameter of the light intensity distribution of the light beam 210 is W (210), and the inner diameter is W ′ (210). ). When the illumination system 12 applies the first incident optical system 4, the light intensity distribution shown in FIG. 5 formed at the second position 180 is formed on the incident surface 19 of the optical integrator 6. Here, the ellipticity (minor axis / major axis) of each of the elliptical mirrors 21, 23, 25 is (ellipticity of the elliptical mirror 21)> (elliptical rate of the elliptical mirror 23)> (elliptical rate of the elliptical mirror 23). There is a relationship. Further, the ellipticity (minor axis / major axis) of each of the elliptical mirrors 21, 23, 25 is the same in focal length (distance between the first focal position and the second focal position), and W ′ (250). = W (230), W ′ (230) = W (210). Accordingly, as shown in FIG. 5A, the light intensity distribution generated by the overlapping of the light beams 250, 230, and 210 is an annular shape having an outer diameter of W (250) and an inner diameter of W ′ (210). It becomes.

  Next, FIG. 2B moves the positions of the first elliptical mirror 21 and the third elliptical mirror 25 among the elliptical mirrors constituting the condenser mirror 2 from the reference state shown in FIG. Indicates the state. In particular, in the example shown in FIG. 2B, the first elliptical mirror 21 moves in the −Z direction, and the third elliptical mirror 25 moves in the + Z direction. In the present embodiment, the Z axis is parallel to the optical axis in the illumination system 12. Here, the light beam 210b is a light beam reflected by the first elliptical mirror 21 moved in the −Z direction. The light beam 210b is reflected by the first elliptical mirror 21, and then condensed on the minus side (condenser mirror 2 side) in the Z-axis direction from the first position 18, and enters the Fourier transform optical system 42 to be substantially parallel. It is converted into a light beam, and an annular light intensity distribution is formed at the second position 180 of the pupil plane of the Fourier transform optical system 42. At this time, since the light beam 210b is condensed at a position closer to the condenser mirror 2 than the first position 18, the light beam 210b enters the Fourier transform optical system 42 at an angle larger than that of the light beam 210 in FIG. On the other hand, the light beam 250b includes a light beam reflected by the third elliptical mirror 25 moved in the + Z direction and a light beam reflected by the third elliptical mirror 25 reflected by the first spherical mirror 22 and then moved in the + Z direction. After being reflected by the third elliptical mirror 25, the light beam 250b is condensed on the positive side in the Z-axis direction from the first position 18, enters the Fourier transform optical system 42, and is converted into a substantially parallel light beam. An annular light intensity distribution is formed at the second position 180 of the pupil plane of the optical system 42. At this time, since the light beam 250b is collected at a position farther from the condenser mirror 2 than the first position 18, it enters the Fourier transform optical system 42 at an angle smaller than that of the light beam 250 in FIG.

  FIG. 6 is a diagram showing a third example of the light intensity distribution of the light beam formed by the condenser mirror 2 at the first position 18 corresponding to the state shown in FIG. Among these, FIG. 6A shows the light intensity distribution generated by the overlapping of the light beams 250b, 230, and 210b. FIG. 6B to FIG. 6D show light intensity distributions in which each of the light beams 250b, 230, and 210b is generated in order. When the illumination system 12 applies the second incident optical system 5, the light intensity distribution shown in FIG. 6 formed at the first position 18 is formed on the incident surface 19 of the optical integrator 6. In this case, as shown in FIG. 6D, in the light intensity distribution formed by the light beam 210b, the peak intensity is lower than the light intensity distribution of the light beam 210 shown in FIG. Further, as shown in FIG. 6A, the light intensity distribution formed by the light beam 250b has a lower peak intensity, wider tail, and further peaks than the light intensity distribution of the light beam 250 shown in FIG. Is divided into two. This is because the respective condensing points of the light beam 210b and the light beam 250b are separated from the first position 18, and in particular, the light intensity distribution formed by the light beam 250b is divided into two, the condensing angle of the light beam 250b. This is because is larger than the condensing angle of the light beam 210b. Therefore, as shown in FIG. 6A, the light intensity distribution generated by the overlapping of the light beams 250b, 230, and 210b has a substantially flat peak and a tail as compared with the light intensity distribution shown in FIG. spread.

  FIG. 7 is a diagram showing a fourth example of the light intensity distribution of the light beam formed by the condenser mirror 2 at the second position 180, corresponding to the state shown in FIG. Among these, Fig.7 (a) has shown the light intensity distribution which each light flux 250b, 230, 210b produces. FIG. 7B to FIG. 7D show light intensity distributions in which each of the light beams 250b, 230, and 210b is generated in order. In FIG. 7, the outer diameter of the light intensity distribution of the light beam 250b is expressed as W (250b), and the inner diameter is expressed as W ′ (250b). Similarly, the outer diameter of the light intensity distribution of the light beam 230 is W (230), the inner diameter is W ′ (230), the outer diameter of the light intensity distribution of the light beam 210b is W (210b), and the inner diameter is W ′ (210b). ). When the illumination system 12 applies the first incident optical system 4, the light intensity distribution shown in FIG. 7 formed at the second position 180 is formed on the incident surface 19 of the optical integrator 6. Here, the light beam 210b shown in FIG. 2B has a larger incident angle on the Fourier transform optical system 42 than the light beam 210 shown in FIG. Therefore, the outer diameter W (210b) of the light intensity distribution of the light beam 210 and the inner diameter W ′ (230) of the light beam 230 satisfy the relationship W ′ (230) <W (210 b). Also, the light beam 250b shown in FIG. 2B has a smaller angle of incidence on the Fourier transform optical system 42 than the light beam 250 shown in FIG. Therefore, the inner diameter W ′ (250b) of the light intensity distribution of the light beam 250 and the outer diameter W (230) of the light beam 230 satisfy the relationship W ′ (250) <W (230). Therefore, the light intensity distribution generated by the overlapping of the light beams 250b, 230, and 210b has a narrower zone width as shown in FIG. 7A than the light intensity distribution shown in FIG. . The width {W (250b) −W ′ (210b)} of the annular portion of the light intensity distribution shown in FIG. 7A and the width {W (250) of the annular portion of the light intensity distribution shown in FIG. ) −W ′ (210)} satisfies the relationship {W (250b) −W ′ (210b)} <{W (250) −W ′ (210)}.

  Next, FIG. 3A shows a state in which the position of the second spherical mirror 24 among the spherical mirrors constituting the condenser mirror 2 is moved from the reference state shown in FIG. In particular, in the example shown in FIG. 3A, the second spherical mirror 24 is moved in the −Z direction. Here, the light beam reflected by the second spherical mirror 24 does not return to the light emitting unit 1 a and is blocked by the electrodes constituting the light source 1, and therefore does not reach the second elliptical mirror 23. Moreover, since the light beam 230c is formed by the light beam reflected only by the second elliptical mirror 23, the light intensity is lower than that of the light beam 230 shown in FIG. The states of the light beams 250 and 210 are the same as those of the light beams 250 and 210 shown in FIG.

  FIG. 8 is a diagram showing a fifth example of the light intensity distribution of the light beam formed by the condenser mirror 2 at the second position 180, corresponding to the state shown in FIG. Among these, Fig.8 (a) has shown the light intensity distribution which each light beam 250,230c, 210 overlaps and produces. FIG. 8B to FIG. 8D show light intensity distributions in which each of the light beams 250, 230c, and 210 is generated in order. When the illumination system 12 applies the first incident optical system 4, the light intensity distribution shown in FIG. 8 formed at the second position 180 is formed on the incident surface 19 of the optical integrator 6. In this case, the peak intensity of the annular light intensity distribution formed by the luminous flux 230c shown in FIG. 8C is different from that shown in FIG. 5C, and the annular zone shapes formed by the luminous fluxes 250 and 210, respectively. It is equal to the peak intensity of the light intensity distribution. Therefore, in the light intensity distribution generated by overlapping the light beams 250, 230c, and 210, the peak intensity is flatter than the light intensity distribution generated by overlapping the light beams 250, 230, and 210 shown in FIG.

  Next, FIG. 3B shows the state shown in FIG. 2B in which the first elliptical mirror 21 and the third elliptical mirror 25 among the elliptical mirrors constituting the condenser mirror 2 are moved. Furthermore, the state which moved the position of the 2nd elliptical mirror 23 is shown. In particular, in the example shown in FIG. 3B, the second elliptical mirror 23 moves in the −Z direction. Here, the light beam 230d is a light beam reflected by the second elliptical mirror 23 that has moved in the −Z direction, and after being reflected by the second elliptical mirror 23, is condensed on the minus side in the Z-axis direction from the first position 18. Then, the light enters the Fourier transform optical system 42. The light beam 230d incident on the Fourier transform optical system 42 is converted into a substantially parallel light beam, and an annular light intensity distribution is formed at the second position 180 of the pupil plane of the Fourier transform optical system 42. In this case, since the light beam 230d is condensed at a position closer to the condenser mirror 2 than the first position 18, it enters the Fourier transform optical system 42 at an angle larger than that of the light beam 210 shown in FIG.

  FIG. 9 is a diagram showing a sixth example of the light intensity distribution of the light beam formed by the condenser mirror 2 at the second position 180, corresponding to the state shown in FIG. Of these, FIG. 9A shows the light intensity distribution generated by the overlapping of the light beams 250b, 230d, and 210b. FIG. 9B to FIG. 9D show light intensity distributions in which the light beams 250b, 230d, and 210b are generated in order. When the illumination system 12 applies the first incident optical system 4, the light intensity distribution shown in FIG. 9 formed at the second position 180 is formed on the incident surface 19 of the optical integrator 6. In FIG. 9, the outer diameter of the light intensity distribution of the luminous flux 230d is denoted as W (230d), and the inner diameter is denoted as W '(230d). In FIG. 3B, the angle at which the light beam 230d is incident on the Fourier transform optical system 42 is such that the outer diameter W (230d) of the light intensity distribution of the light beam 230d and the outer diameter W of the light intensity distribution of the light beam 250b shown in FIG. (250b) is set so as to satisfy W (230d) = W (250b). Therefore, the position of the peak intensity of the light intensity distribution shown in FIG. 9A is closer to the outside of the annular zone than the position of the peak intensity of the light intensity distribution shown in FIG.

  Next, each moving method of each elliptical mirror and each spherical mirror constituting the condenser mirror 2 in the illumination system 12 will be described. FIG. 10 is a flowchart showing a moving process (moving method) of each elliptical mirror and each spherical mirror in the present embodiment. First, the control unit 36 determines whether or not switching to the incident optical system (the first incident optical system 4 or the second incident optical system 5) installed in the optical path is necessary based on the conditions of the incident optical system set in the job. Judgment is made (step S101). Here, when it is determined that the incident optical system needs to be switched (Yes), the control unit 36 switches the incident optical system by using a drive mechanism (not shown) (step S102). On the other hand, if the control unit 36 determines that the switching of the incident optical system is unnecessary (No), the control unit 36 proceeds to step S103. Next, the control unit 36 determines at least one of the elliptical mirrors 21, 23, and 25 based on the condition of the positions of the elliptical mirrors 21, 23, and 25 included in the condenser mirror 2 set in the job in the Z-axis direction. It is determined whether or not movement is necessary (step S103). If the control unit 36 determines that at least one of the elliptical mirrors 21, 23, and 25 needs to be moved (Yes), the control unit 36 drives the second driving unit 15 to use the elliptical mirror as a job. Is moved to the position set in step S104. On the other hand, if the control unit 36 determines that the movement of each elliptical mirror is unnecessary (No), the control unit 36 proceeds to step S105. Then, the control unit 36 determines whether at least one of the spherical mirrors 22 and 24 needs to be moved based on the condition of the positions of the spherical mirrors 22 and 24 included in the condenser mirror 2 set in the job in the Z-axis direction. Judgment is made (step S105). If the control unit 36 determines that at least one of the spherical mirrors 22 and 24 needs to be moved (Yes), the control unit 36 drives the second driving unit 15 to set the spherical mirror as a job. It moves to a position (step S106), and a moving process is complete | finished. On the other hand, when it is determined that the movement of each spherical mirror is unnecessary (No), the control unit 36 ends the movement process. However, in the above moving step, information on which incident optical system is used and how much the position of each elliptical mirror and each spherical mirror in the Z-axis direction is determined in advance for each illumination condition. It shall be. As a result, when the user first inputs a desired illumination condition in the job, the control unit 36 determines which incident optical system is used and how many positions of each elliptical mirror and each spherical mirror are in the Z-axis direction. Can be set automatically.

  Next, a method for adjusting the secondary light source in the exposure apparatus 100 will be described. In the above description, in order to obtain a desired light intensity distribution in the illumination system 12, the first incident optical system 4 and the second incident optical system 5 are appropriately switched. The light source 1 can be a lamp. Therefore, for example, if an error occurs in the switching operation of the incident optical system, the symmetry of the light intensity distribution of the image of the secondary light source may change. Further, the total amount of light of the image of the secondary light source may change due to the consumption of the lamp electrode accompanying the lighting of the light source 1. Therefore, the exposure apparatus 100 adjusts the secondary light source by appropriately changing the position of the light source 1 as follows, and maintains a good light intensity distribution of the image of the secondary light source.

  FIG. 11 is a flowchart showing a secondary light source adjustment process (adjustment method). First, the control unit 36 turns on the light source 1 (step S201). Next, the control unit 36 causes the calculation unit 37 to calculate the total light amount of the image of the secondary light source based on the output of the detector 9, and acquires information about the total light amount from the calculation unit 37 (step S202: two). First light quantity measurement of the next light source). Next, the control unit 36 causes the first driving unit 35 to move the position of the light source 1 in the X, Y, and Z axis directions so that the obtained total light amount value becomes the maximum value (step S203: No. 1). 1 position adjustment).

  Next, the control unit 36 determines the necessity of switching illumination conditions based on conditions set in advance in the job (step S204). Here, when the control unit 36 determines that the switching is necessary (Yes), the control unit 36 causes the drive mechanism (not shown) to drive the first incident optical system 4 or the second incident optical system 5, and The second driving unit 15 appropriately drives each reflecting mirror constituting the condenser mirror 2 (step S205). As a result, the light intensity distribution of the light beam incident on the optical integrator 6 is changed. Next, after step S205, the control unit 36 causes the calculation unit 37 to calculate the symmetry of the light intensity distribution of the image of the secondary light source based on the output of the detector 9, and the calculation unit 37 calculates the light intensity distribution. Information about symmetry is acquired (step S206: measurement of light quantity distribution of secondary light source). Next, the control unit 36 causes the first driving unit 35 to move the position of the light source 1 in the X and Y axis directions so that the obtained light intensity distribution has the most symmetry (step S207: first). 2 position adjustment). In addition, since the position of the light source 1 in the Z-axis direction does not affect the symmetry of the light intensity distribution, it is not necessary to move the position of the light source 1 in the Z-axis direction in step S207. On the other hand, if the control unit 36 determines in step S204 that switching is not required (No), the control unit 36 proceeds to the following step S208 as it is.

  Next, the control unit 36 determines whether or not a predetermined time has elapsed after the position adjustment of the light source 1 in the Z-axis direction in step S203 (step S208). The predetermined time may be, for example, a time when the illumination is reduced by 3% when the lighting is performed with the input to the light source 1 being constant and the lamp is replaced when the illumination is reduced by 30%. If the control unit 36 determines that the predetermined time has elapsed (Yes), the control unit 36 causes the calculation unit 37 to calculate the total light amount of the image of the secondary light source based on the output of the detector 9. Then, information about the total light amount is acquired from the calculation unit 37 (step S209: second light amount measurement of the secondary light source). Next, the control unit 36 causes the first drive unit 35 to move the position of the light source 1 in the Z-axis direction so that the obtained total light amount value becomes the maximum value (step S210: third position adjustment). . After the position of the light source 1 is moved in the Z-axis direction in step S210, the illumination system 12 is ready to illuminate the reticle R. For example, the illumination system 12 illuminates the reticle R by opening (turning on) an exposure shutter (not shown) provided in the illumination system 12. When the illumination of the reticle R starts, the exposure process (exposure sequence) of the exposure apparatus 100 starts. Such adjustment is possible because the change in the total light quantity of the light intensity distribution is caused by the light emitting point 1a changing in the Z-axis direction due to the consumption of the electrode of the light source 1 with lighting. That's why. On the other hand, when the control unit 36 determines in step S208 that the predetermined time has not elapsed (No), the illumination system 12 is in a state where it can illuminate the reticle R and illuminates the reticle R. The exposure process of the exposure apparatus 100 can be started.

  Next, when the exposure process of the exposure apparatus 100 is completed, the control unit 36 determines whether the lighting time of the light source 1 has reached the replacement time (life) (step S211). If the control unit 36 determines that the replacement time has been reached (Yes), the light source 1 is turned off (step S212), and the secondary light source adjustment process ends. On the other hand, when the control unit 36 determines in step S211 that the replacement time has not been reached (No), the control unit 36 returns to step S204. If it is not necessary to switch the illumination conditions and the predetermined time has not elapsed, the illumination system 12 can illuminate the reticle R, and the exposure process of the exposure apparatus 100 can be executed. When the control unit 36 constantly monitors the light intensity distribution of the image of the secondary light source, and the total light amount of the image of the secondary light source or the symmetry of the light intensity distribution changes more than a predetermined value (allowable value). In addition, the position of the light source 1 may be appropriately adjusted in the X, Y, and Z axis directions.

  In this way, the illumination system 12 does not use a conventional conical prism or diaphragm to change the shape of the image of the secondary light source, so that the loss of light quantity can be suppressed as much as possible. In addition, the illumination system 12 can easily change the image of the secondary light source into an annular shape by appropriately moving the reflecting mirror that constitutes the condensing mirror 2 based on the above configuration. You can also Furthermore, the illumination system 12 can change the image of the secondary light source into various shapes by properly using a plurality of different incident optical systems 4 and 5 in accordance with the movement of the reflecting mirror constituting the condenser mirror 2. it can.

  As described above, according to the present embodiment, it is possible to provide an illumination optical device that easily makes the shape of the image of the secondary light source a desired annular shape or a circular shape while suppressing loss of light amount. Moreover, according to the exposure apparatus provided with such an illumination optical apparatus, it is possible to achieve higher efficiency and power saving.

  In the above description, in the illumination system 12, the case where the condensing mirror 2 is formed of a reflecting mirror having a five-stage configuration is illustrated. However, the present invention does not limit the number of reflecting mirrors constituting the condenser mirror 2, and can be changed as appropriate. Hereinafter, other configurations of the condenser mirror 2 will be specifically illustrated with reference to FIGS. 12 to 14. 12 to 14 are schematic diagrams showing optical systems for explaining the light intensity distribution formed by the light beam emitted from the light source 1 in accordance with the method shown in FIGS. 2 and 3, respectively.

  FIG. 12 shows a reference state of the condensing mirror 2 ′ composed of a six-stage reflecting mirror. The condensing mirror 2 ′ has a configuration in which the outermost third elliptical mirror 25 on the second focal position side shown in FIG. 2A is replaced with a fourth elliptical mirror 25 ′ and a third spherical mirror 26. It has become. Here, the fourth elliptical mirror 25 ′ can be regarded as a part of the third elliptical mirror 25 shown in FIG. The light beam 2501 includes a light beam collected by only the fourth elliptical mirror 25 ′ and a light beam reflected by the first spherical mirror 22 and then condensed by the fourth elliptical mirror 25 ′. On the other hand, the center of curvature of the third spherical mirror 26 coincides with the center of curvature of the first spherical mirror 22 and the second spherical mirror 24, and the focal position thereof coincides with the first focal position of each of the elliptical mirrors 21, 23, 25 ′. Yes. The light beam 2101 includes a light beam that is collected by only the first elliptical mirror 21 and a light beam that is reflected by the third spherical mirror 26 and then collected by the first elliptical mirror 21. In this case, for each of the three elliptical mirrors 21, 23, 25 ′, three spherical mirrors 26, 24, 22 are individually paired, and the condensing mirror 2 ′ condenses the light flux from the light emitting point 1a. . Then, the luminous fluxes 2101, 230, 2501 collected by the elliptical mirrors 21, 23, 25 ′ change the positions of the spherical mirrors 26, 24, 22 in the Z-axis direction, respectively. The peak intensity of the light intensity distribution formed at the second position 180 can be changed. Therefore, the 6-stage condensing mirror 2 ′ shown in FIG. 12 is formed at the first position 18 or the second position 180, as compared with the 5-stage condensing mirror 2 shown in FIG. The light intensity distribution can be changed in a wider range.

  FIG. 13A shows a reference state of the condensing mirror 2 ″ composed of a two-stage reflecting mirror. The condensing mirror 2 "includes two elliptical mirrors, a first elliptical mirror 21" and a second elliptical mirror 23 ". Here, the first elliptical mirror 21 ″ and the second elliptical mirror 23 ″ are obtained by dividing one elliptical mirror into two, and the first elliptical mirror 21 ″ and the second elliptical mirror 23 ″. The first focal position and the second focal position coincide with each other. In this case, the light beam 2102 is collected after being reflected by the first elliptical mirror 21 ″. On the other hand, the light beam 2302 is condensed after being reflected by the second elliptical mirror 23 ″.

  FIG. 13B shows a state in which the positions of the elliptical mirrors 21 ″ and 23 ″ constituting the condenser mirror 2 ″ are moved from the reference state shown in FIG. In particular, in the example illustrated in FIG. 13B, the first elliptical mirror 21 ″ moves in the −Z direction. On the other hand, the second elliptical mirror 23 ″ moves in the + Z direction. In this case, the light beam 2103 is reflected by the first ellipsoidal mirror 21 ″, then condensed on the minus side in the Z-axis direction from the first position 18, and enters the Fourier transform optical system 42. The light beam 2103 incident on the Fourier transform optical system 42 is converted into a substantially parallel light beam, and an annular light intensity distribution is formed at the second position 180 of the pupil plane of the Fourier transform optical system 42. At this time, since the light beam 2103 is condensed at a position closer to the condenser mirror 2 ″ than the first position 18, it enters the Fourier transform optical system 42 at an angle larger than that of the light beam 2102 shown in FIG. . On the other hand, after being reflected by the second elliptical mirror 23 ″, the light beam 2303 is condensed on the positive side in the Z-axis direction from the first position 18 and enters the Fourier transform optical system 42. The light beam 2303 incident on the Fourier transform optical system 42 is converted into a substantially parallel light beam, and an annular light intensity distribution is formed at the second position 180 of the pupil plane of the Fourier transform optical system 42. At this time, since the light beam 2303 is condensed at a position farther from the first position 18 to the condenser mirror 2 ″, it enters the Fourier transform optical system 42 at an angle smaller than that of the light beam 2302 shown in FIG. .

  As shown in FIG. 13, in order to change the light intensity distribution of the annular zone formed at the second position 180, if there are at least two elliptical mirrors as the minimum configuration of the condenser mirror 2, the annular zone shape It is possible to independently change the inner diameter and the outer diameter of the light intensity distribution.

  Here, as shown in FIG. 13, in the condensing mirror 2 ″ composed of only the elliptical mirror as shown in FIG. 13, as shown in FIG. 13B, a part of the light beam emitted from the light source 1 is leaked light 2000. As a result, the first elliptical mirror 21 ″ and the second elliptical mirror 23 ″ leak outside through a gap in the optical axis direction. Such light leakage is a loss of light quantity, and is desirably avoided as much as possible. Therefore, in order to suppress the generation of the leakage light 2000, it is effective to make the configuration of the condenser mirror as shown in FIG.

  FIG. 14A shows a reference state of the condensing mirror 2 ″ ″ composed of a three-stage reflecting mirror. The condensing mirror 2 ′ ″ is obtained by adding a spherical mirror between the ellipsoidal mirrors as compared with the configuration shown in FIG. 13, and includes a first elliptical mirror 21 ′ ″ and a second elliptical mirror 23 ′ ″. And a spherical mirror 22 '' '. Here, the first focal positions of the first elliptical mirror 21 "" and the second elliptical mirror 23 "" coincide with each other, and the second focal positions also coincide with each other. Further, the second focal positions of the first elliptical mirror 21 ″ ″ and the second elliptical mirror 23 ″ ″ coincide with the first position 18, respectively. In addition, the center of curvature of the spherical mirror 22 "" coincides with the first focal position of the first elliptical mirror 21 "" and the second elliptical mirror 23 "". In this case, the light beam 2104 is collected after being reflected by the first elliptical mirror 21 ″ ″. On the other hand, the light beam 2304 is reflected by the spherical mirror 22 "" and then reflected by the second elliptical mirror 23 "" and then condensed.

  FIG. 14B shows a state in which the positions of the elliptical mirrors 21 ″ ″ and 23 ″ ″ constituting the condenser mirror 2 ″ ″ are moved from the reference state shown in FIG. In particular, in the example illustrated in FIG. 14B, the first elliptical mirror 21 ″ ″ moves in the −Z direction. On the other hand, the second elliptical mirror 23 "" moves in the + Z direction. In this case, the light beam 2105 is reflected by the first ellipsoidal mirror 21 ″ ″, and then condensed on the minus side in the Z-axis direction from the first position 18 and enters the Fourier transform optical system 42. The light beam 2104 incident on the Fourier transform optical system 42 is converted into a substantially parallel light beam, and an annular light intensity distribution is formed at the second position 180 of the pupil plane of the Fourier transform optical system 42. At this time, since the light beam 2104 is collected at a position closer to the condenser mirror 2 ′ ″ than the first position 18, it enters the Fourier transform optical system 42 at an angle larger than that of the light beam 2104 shown in FIG. To do. On the other hand, the light beam 2305 is reflected by the second elliptical mirror 23 ″ ″, then condensed on the plus side in the Z-axis direction from the first position 18, and enters the Fourier transform optical system 42. The light beam 2305 incident on the Fourier transform optical system 42 is converted into a substantially parallel light beam, and an annular light intensity distribution is formed at the second position 180 of the pupil plane of the Fourier transform optical system 42. At this time, since the light beam 2305 is collected at a position farther from the second position 180 to the condenser mirror 2 ′ ″, the light beam 2305 is incident on the Fourier transform optical system 42 at a smaller angle than the light beam 2304 shown in FIG. To do.

  According to the configuration shown in FIG. 14, even if each elliptical mirror is moved, the leakage light 2000 shown in FIG. 13B does not occur, and the first position 180 is the same as in the case shown in FIG. It is possible to change the light intensity distribution of the zonal shape formed on the surface.

  Based on the above illustration, if the condensing mirror includes at least two movable ellipsoidal mirrors and a fixed or movable spherical mirror of the same number or less (including zero) as these ellipsoidal mirrors, this embodiment The illumination optical device according to the embodiment has the above-described effects.

(Product manufacturing method)
The method for manufacturing an article according to an embodiment of the present invention is suitable, for example, for manufacturing an article such as a microdevice such as a semiconductor device or an element having a fine structure. In the method for manufacturing an article according to the present embodiment, a latent image pattern is formed on the photosensitive agent applied to the substrate using the above-described exposure apparatus (a step of exposing the substrate), and the latent image pattern is formed in this step. Developing the substrate. Further, the manufacturing method includes other well-known steps (oxidation, film formation, vapor deposition, doping, planarization, etching, resist stripping, dicing, bonding, packaging, and the like). The method for manufacturing an article according to the present embodiment is advantageous in at least one of the performance, quality, productivity, and production cost of the article as compared with the conventional method.

  As mentioned above, although preferable embodiment of this invention was described, this invention is not limited to these embodiment, A various deformation | transformation and change are possible within the range of the summary.

DESCRIPTION OF SYMBOLS 1 Light source 1a Light emission area 2 Condensing part 4 1st incident optical system 5 2nd incident optical system 6 Optical integrator 12 Illumination optical apparatus 21 1st elliptical mirror 23 2nd elliptical mirror 25 3rd elliptical mirror

Claims (13)

An illumination optical device that illuminates an irradiated object using a light beam from a light source,
A condensing part for condensing the luminous flux;
An optical system for guiding the light beam condensed on the light collecting unit;
An optical integrator that emits a light beam incident through the optical system toward the irradiated object, and
The light source emits the light flux from a light emitting region having a rotationally symmetric light emission intensity distribution,
The condensing unit is installed so as to be rotationally symmetric with respect to the optical axis with the rotational symmetry axis of the light emitting region as an optical axis, and to surround the light emitting region, and to reflect the light flux emitted from the light emitting region A plurality of reflecting mirrors having a reflecting surface,
At least two of the plurality of reflecting mirrors are ellipsoidal reflecting mirrors in which the reflecting surface is an ellipsoid having a focal point in the light emitting region and is movable in the direction of the optical axis.
An illumination optical device. At least one of the plurality of reflecting mirrors is a spherical reflecting mirror in which the reflecting surface is a spherical surface having a center point in the light emitting region,
The ellipsoidal reflecting mirror and the spherical reflecting mirror are alternately arranged in the direction of the optical axis, and the one ellipsoidal surface that opposes the light beam reflected by one spherical reflecting mirror across the light emitting region. The reflecting mirror further reflects and enters the optical system,
The illumination optical apparatus according to claim 1.   The illumination optical apparatus according to claim 2, wherein the spherical reflecting mirror is movable in the direction of the optical axis.   4. The elliptical reflecting mirror and the spherical reflecting mirror adjacent to the elliptical reflecting mirror are arranged so that no gap is generated in the direction of the optical axis. Illumination optical device. The optical system includes a first optical system and a second optical system that are detachable by switching in an optical path,
The first optical system is configured such that the incident surface of the optical integrator has an optically pupil relationship with a position where the condensing unit condenses the light beam from the light source,
The second optical system has an optically conjugate relationship between the incident surface of the optical integrator and a position where the light collecting unit collects the light beam from the light source.
5. The illumination optical apparatus according to claim 1, wherein The first optical system has a waveguide at a position where the condensing unit condenses the light beam from the light source,
The optical integrator entrance plane is optically pupil related to the waveguide exit plane,
The illumination optical apparatus according to claim 5.   A first diaphragm and a second diaphragm, which respectively correspond to the first optical system and the second optical system, are detachable by switching to the exit surface of the optical integrator in the optical path. Item 7. The illumination optical device according to Item 5 or 6. A reflector driving unit for moving the ellipsoidal reflector or the spherical reflector;
A control unit for controlling the operation of the reflector driving unit;
The illumination optical apparatus according to claim 1, comprising: An optical system drive unit for switching between the first optical system and the second optical system;
A control unit for controlling the operation of the optical system driving unit;
The illumination optical apparatus according to claim 5, comprising:   The said control part controls operation | movement of the said reflective mirror drive part or the said optical system drive part so that the light intensity distribution of the light beam which injects into the said optical integrator changes. Illumination optical device. An exposure apparatus for transferring an image of a pattern formed on an original to a substrate,
An illumination optical device according to any one of claims 1 to 10,
The illumination optical device illuminates the original plate which is an object to be irradiated.
An exposure apparatus characterized by that. The illumination optical device has a detector that detects an image of a secondary light source formed on the exit surface of the optical integrator,
The exposure apparatus includes:
A light source driving unit for displacing the light source;
A calculation unit for obtaining information on the light amount of the secondary light source based on the output of the detector;
An exposure control unit that controls the operation of the light source driving unit based on the information,
The exposure apparatus according to claim 11, wherein: A step of exposing the substrate using the exposure apparatus according to claim 11;
Developing the substrate exposed in the step;
A device manufacturing method comprising:

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