JP2015501591A - セラミック温度補償型共振器 - Google Patents
セラミック温度補償型共振器 Download PDFInfo
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- JP2015501591A JP2015501591A JP2014537552A JP2014537552A JP2015501591A JP 2015501591 A JP2015501591 A JP 2015501591A JP 2014537552 A JP2014537552 A JP 2014537552A JP 2014537552 A JP2014537552 A JP 2014537552A JP 2015501591 A JP2015501591 A JP 2015501591A
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- 239000000919 ceramic Substances 0.000 title claims abstract description 27
- 238000000576 coating method Methods 0.000 claims abstract description 33
- 239000011248 coating agent Substances 0.000 claims abstract description 28
- 239000011521 glass Substances 0.000 claims description 12
- 239000005300 metallic glass Substances 0.000 claims description 4
- 230000004888 barrier function Effects 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 10
- 239000002585 base Substances 0.000 description 10
- 239000000463 material Substances 0.000 description 7
- 229910010271 silicon carbide Inorganic materials 0.000 description 6
- 239000005350 fused silica glass Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 4
- 238000000151 deposition Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 210000000006 pectoral fin Anatomy 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 239000006094 Zerodur Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 238000012937 correction Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 1
- 229910001075 Nivarox Inorganic materials 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 1
- 229910000323 aluminium silicate Inorganic materials 0.000 description 1
- 238000009529 body temperature measurement Methods 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 239000002178 crystalline material Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- YBMRDBCBODYGJE-UHFFFAOYSA-N germanium dioxide Chemical compound O=[Ge]=O YBMRDBCBODYGJE-UHFFFAOYSA-N 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000005297 pyrex Substances 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
- H03H9/125—Driving means, e.g. electrodes, coils
- H03H9/13—Driving means, e.g. electrodes, coils for networks consisting of piezoelectric or electrostrictive materials
- H03H9/131—Driving means, e.g. electrodes, coils for networks consisting of piezoelectric or electrostrictive materials consisting of a multilayered structure
-
- G—PHYSICS
- G04—HOROLOGY
- G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
- G04B17/00—Mechanisms for stabilising frequency
- G04B17/20—Compensation of mechanisms for stabilising frequency
- G04B17/22—Compensation of mechanisms for stabilising frequency for the effect of variations of temperature
-
- G—PHYSICS
- G04—HOROLOGY
- G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
- G04B17/00—Mechanisms for stabilising frequency
- G04B17/20—Compensation of mechanisms for stabilising frequency
- G04B17/22—Compensation of mechanisms for stabilising frequency for the effect of variations of temperature
- G04B17/227—Compensation of mechanisms for stabilising frequency for the effect of variations of temperature composition and manufacture of the material used
-
- G—PHYSICS
- G04—HOROLOGY
- G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
- G04B17/00—Mechanisms for stabilising frequency
- G04B17/20—Compensation of mechanisms for stabilising frequency
- G04B17/24—Compensation of mechanisms for stabilising frequency for the effect of variations of atmospheric pressure
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/0072—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks of microelectro-mechanical resonators or networks
- H03H3/0075—Arrangements or methods specially adapted for testing microelecro-mechanical resonators or networks
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/0072—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks of microelectro-mechanical resonators or networks
- H03H3/0076—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks of microelectro-mechanical resonators or networks for obtaining desired frequency or temperature coefficients
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
- H03H3/04—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks for obtaining desired frequency or temperature coefficient
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
- H03H9/02244—Details of microelectro-mechanical resonators
- H03H9/02433—Means for compensation or elimination of undesired effects
- H03H9/02448—Means for compensation or elimination of undesired effects of temperature influence
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
- H03H9/21—Crystal tuning forks
- H03H9/215—Crystal tuning forks consisting of quartz
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/24—Constructional features of resonators of material which is not piezoelectric, electrostrictive, or magnetostrictive
- H03H9/2405—Constructional features of resonators of material which is not piezoelectric, electrostrictive, or magnetostrictive of microelectro-mechanical resonators
- H03H9/2468—Tuning fork resonators
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
- H03H2003/027—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks the resonators or networks being of the microelectro-mechanical [MEMS] type
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
- H03H3/04—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks for obtaining desired frequency or temperature coefficient
- H03H2003/0407—Temperature coefficient
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Acoustics & Sound (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Metallurgy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Micromachines (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Abstract
Description
−本体のコアはガラス、金属ガラス、工業用セラミック又はセラミックガラスを含み;
−本体は、面の対が同一である実質的に四辺形状の断面を含み;
−本体は、面が完全にコーティングされた実質的に四辺形状の断面を含み;
−上記少なくとも1つのコーティングは、湿気に対するバリアを形成し;
−上記少なくとも1つのコーティングは導電性であり;
−本体は、コアと上記少なくとも1つのコーティングとの間にプライマ層を含み;
−本体は、それ自体が螺旋状に巻かれてヒゲゼンマイを形成する棒体であり、慣性はずみ車に連結され;
−本体は、音叉を形成する、対称に設置される少なくとも2つの棒体を備え;
−本体はMEMS共振器である。
は、周波数の相対的変動(ppm又は10-6)であり;
−Aは、基準点に応じた定数(ppm)であり;
−T0は、基準温度(℃)であり;
−αは、1次温度係数(ppm・℃-1)であり;
−βは、2次温度係数(ppm・℃-2)であり;
−γは、3次温度係数(ppm・℃-3)である。
−αspiは材料の膨張係数(ppm・℃-1)であり;
−TECは熱弾性係数(ppm・℃-1)である。
Claims (11)
- 変形させて使用する本体(5、15)を備える温度補償型共振器(1、11)であって、
前記本体(5、15)のコア(8、18)がセラミックによって形成される、温度補償型共振器(1、11)において、
前記本体(5、15)の少なくとも一部分は、少なくとも1つのコーティング(2、4、6、12、14、16)を含み、
前記コーティング(2、4、6、12、14、16)の温度によるヤング率の変動(TEC)は、前記コア(8、18)に使用する前記セラミックの温度によるヤング率の変動(TEC)に対して反対符号であり、これによって前記共振器の温度による、少なくとも1次温度係数(α、β)の周波数変動が実質的にゼロとなることを特徴とする、温度補償型共振器(1、11)。 - 前記本体(5、15)の前記コア(8、18)は、ガラス、金属ガラス、工業用セラミック又はセラミックガラスを含むことを特徴とする、請求項1に記載の共振器(1、11)。
- 前記本体(5、15)は、面の対が同一である実質的に四辺形状の断面を含むことを特徴とする、請求項2に記載の共振器(1、11)。
- 前記本体(5、15)は、面が完全にコーティングされた実質的に四辺形状の断面を含むことを特徴とする、請求項1又は2に記載の共振器(1、11)。
- 前記少なくとも1つのコーティング(2、4、6、12、14、16)は、湿気に対するバリアを形成することを特徴とする、請求項1~4のいずれか1項に記載の共振器(1、11)。
- 前記少なくとも1つのコーティング(2、4、6、12、14、16)は、導電性であることを特徴とする、請求項1~5のいずれか1項に記載の共振器(1、11)。
- 前記本体(1、11)は、前記コア(8、18)と前記少なくとも1つのコーティング(2、4、6、12、14、16)との間にプライマ層を含むことを特徴とする、請求項1〜6のいずれか1項に記載の共振器(1、11)。
- 前記本体は、それ自体が螺旋状に巻かれてヒゲゼンマイを形成する棒体であり、慣性はずみ車に連結されることを特徴とする、請求項1〜7のいずれか1項に記載の共振器(1)。
- 前記本体(15)は、音叉を形成する、対称に設置される少なくとも2つの棒体(17、19)を含むことを特徴とする、請求項1〜7のいずれか1項に記載の共振器(11)。
- 前記本体は、MEMS共振器であることを特徴とする、請求項1〜7のいずれか1項に記載の共振器(1、11)。
- 請求項1〜10のいずれか1項に記載の少なくとも1つの共振器(1、11)を含むことを特徴とする、時計。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP11187854.2A EP2590325A1 (fr) | 2011-11-04 | 2011-11-04 | Résonateur thermocompensé en céramique |
EP11187854.2 | 2011-11-04 | ||
PCT/EP2012/070129 WO2013064351A1 (fr) | 2011-11-04 | 2012-10-11 | Résonateur thermocompensé en céramique |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016122394A Division JP2016191711A (ja) | 2011-11-04 | 2016-06-21 | セラミック温度補償型共振器 |
Publications (1)
Publication Number | Publication Date |
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JP2015501591A true JP2015501591A (ja) | 2015-01-15 |
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Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014537552A Pending JP2015501591A (ja) | 2011-11-04 | 2012-10-11 | セラミック温度補償型共振器 |
JP2016122394A Pending JP2016191711A (ja) | 2011-11-04 | 2016-06-21 | セラミック温度補償型共振器 |
JP2019057949A Active JP6893525B2 (ja) | 2011-11-04 | 2019-03-26 | セラミック温度補償型共振器 |
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JP2016122394A Pending JP2016191711A (ja) | 2011-11-04 | 2016-06-21 | セラミック温度補償型共振器 |
JP2019057949A Active JP6893525B2 (ja) | 2011-11-04 | 2019-03-26 | セラミック温度補償型共振器 |
Country Status (7)
Country | Link |
---|---|
US (1) | US10310451B2 (ja) |
EP (2) | EP2590325A1 (ja) |
JP (3) | JP2015501591A (ja) |
CN (3) | CN110474615A (ja) |
HK (2) | HK1201645A1 (ja) |
RU (1) | RU2573275C2 (ja) |
WO (1) | WO2013064351A1 (ja) |
Cited By (2)
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JP2020095027A (ja) * | 2018-12-12 | 2020-06-18 | ニヴァロックス−ファー ソシエテ アノニム | ヒゲゼンマイおよびヒゲゼンマイの製造方法 |
JP2021099325A (ja) * | 2019-12-20 | 2021-07-01 | ニヴァロックス−ファー ソシエテ アノニム | 特に発振機構のための可撓性測時器構成要素、及びそのような構成要素を含む測時器ムーブメント |
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Publication number | Priority date | Publication date | Assignee | Title |
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EP2781968A1 (fr) * | 2013-03-19 | 2014-09-24 | Nivarox-FAR S.A. | Résonateur moins sensible aux variations climatiques |
WO2015113973A1 (fr) | 2014-01-29 | 2015-08-06 | Cartier Création Studio Sa | Ressort spiral thermocompensé en céramique comprenant l' élément silicium dans sa composition et son procédé de réglage |
EP2985659B1 (fr) * | 2014-03-05 | 2020-04-29 | Nivarox-FAR S.A. | Spiral destiné à être serré par une rondelle élastique |
EP2952979B1 (fr) * | 2014-06-03 | 2017-03-01 | Nivarox-FAR S.A. | Composant horloger à base de verre photostructurable |
EP2952972B1 (fr) * | 2014-06-03 | 2017-01-25 | The Swatch Group Research and Development Ltd. | Procédé de fabrication d'un spiral compensateur composite |
EP3002638B1 (fr) | 2014-09-08 | 2021-08-18 | Richemont International S.A. | Procédé de fabrication d'un ressort spiral thermocompensé |
EP3202036B1 (en) * | 2014-10-03 | 2020-05-27 | Teknologian Tutkimuskeskus VTT OY | Temperature compensated beam resonator |
EP3202034B1 (en) * | 2014-10-03 | 2020-05-06 | Teknologian Tutkimuskeskus VTT OY | Temperature compensated compound resonator |
WO2016199039A1 (fr) | 2015-06-08 | 2016-12-15 | Richemont International Sa | Résonateur horloger thermocompensé et méthode pour réaliser un tel résonateur |
EP3106931A1 (fr) * | 2015-06-16 | 2016-12-21 | Nivarox-FAR S.A. | Pièce à surface de soudage découplée |
EP3181938B1 (fr) | 2015-12-18 | 2019-02-20 | CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement | Procede de fabrication d'un spiral d'une raideur predeterminee par retrait de matiere |
EP3181939B1 (fr) | 2015-12-18 | 2019-02-20 | CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement | Procede de fabrication d'un spiral d'une raideur predeterminee par ajout de matiere |
EP3181940B2 (fr) | 2015-12-18 | 2023-07-05 | CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement | Procede de fabrication d'un spiral d'une raideur predeterminee par retrait localise de matiere |
EP3190095B1 (fr) | 2016-01-08 | 2023-08-02 | Richemont International SA | Résonateur thermocompensé comprenant un verre |
JP7182616B2 (ja) * | 2018-04-19 | 2022-12-02 | シチズン時計株式会社 | ひげぜんまいおよび調速機 |
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KR102289778B1 (ko) * | 2018-12-12 | 2021-08-13 | 니바록스-파 에스.에이. | 밸런스 스프링 및 이의 제조 방법 |
JP2021099325A (ja) * | 2019-12-20 | 2021-07-01 | ニヴァロックス−ファー ソシエテ アノニム | 特に発振機構のための可撓性測時器構成要素、及びそのような構成要素を含む測時器ムーブメント |
KR20230095901A (ko) * | 2019-12-20 | 2023-06-29 | 니바록스-파 에스.에이. | 특히 오실레이터 메카니즘을 위한 가요성 시계 부품 및 그러한 부품을 포함하는 시계 무브먼트 |
JP7317792B2 (ja) | 2019-12-20 | 2023-07-31 | ニヴァロックス-ファー ソシエテ アノニム | 特に発振機構のための可撓性測時器構成要素、及びそのような構成要素を含む測時器ムーブメント |
KR102698064B1 (ko) * | 2019-12-20 | 2024-08-22 | 니바록스-파 에스.에이. | 특히 오실레이터 메카니즘을 위한 가요성 시계 부품 및 그러한 부품을 포함하는 시계 무브먼트 |
Also Published As
Publication number | Publication date |
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CN110474615A (zh) | 2019-11-19 |
HK1244359A1 (zh) | 2018-08-03 |
US20140313866A1 (en) | 2014-10-23 |
EP2774268B1 (fr) | 2019-01-23 |
JP2019124699A (ja) | 2019-07-25 |
JP6893525B2 (ja) | 2021-06-23 |
US10310451B2 (en) | 2019-06-04 |
WO2013064351A1 (fr) | 2013-05-10 |
EP2590325A1 (fr) | 2013-05-08 |
RU2014122532A (ru) | 2015-12-10 |
JP2016191711A (ja) | 2016-11-10 |
RU2573275C2 (ru) | 2016-01-20 |
CN104025453A (zh) | 2014-09-03 |
HK1201645A1 (en) | 2015-09-04 |
CN107276557A (zh) | 2017-10-20 |
EP2774268A1 (fr) | 2014-09-10 |
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