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JP2015088557A - Multilayer wiring board - Google Patents

Multilayer wiring board Download PDF

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Publication number
JP2015088557A
JP2015088557A JP2013224481A JP2013224481A JP2015088557A JP 2015088557 A JP2015088557 A JP 2015088557A JP 2013224481 A JP2013224481 A JP 2013224481A JP 2013224481 A JP2013224481 A JP 2013224481A JP 2015088557 A JP2015088557 A JP 2015088557A
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electrode
wiring board
multilayer wiring
electronic component
printed wiring
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JP5635171B1 (en
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敦 板橋
Atsushi Itabashi
敦 板橋
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Fujikura Ltd
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Fujikura Ltd
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  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a multilayer wiring board which inhibits addition of connection resistance and occurrence of connection failure.SOLUTION: A multilayer wiring board includes: an electronic component; electrodes provided at the electronic component; an adhesion layer with which the electronic component is overlapped; and vias which are formed at the adhesion layer, each of the vias having an end part connected with the electrode. At least a part of a side surface of each electrode of the electronic component contacts with the via. Thus, even if misalignment between the via and the electrode occurs, reduction of a contact area between the via and the electrode is inhibited.

Description

この発明は、ビアを介して層間接続される多層配線基板に関する。   The present invention relates to a multilayer wiring board that is interlayer-connected through vias.

近年、携帯機器の多機能化に伴い、半導体デバイスの更なる高機能化が求められている。そして、この要求を満たすため、半導体デバイスの配線技術は向上し、配線の微細化が進んでいる。高密度配線技術としては、多層配線基板が知られているが、例えば引用文献1に記載されているように、一般的には層間を接続するビアの径に対してビアの端部に接続されるランドの径は大きく設定されている。また、同様にビアの径に対してビアの端部に接続される電子部品の電極の径は大きく設定されている。   In recent years, with the increase in the number of functions of portable devices, further enhancement of functions of semiconductor devices has been demanded. In order to satisfy this requirement, the wiring technology of semiconductor devices has been improved and the miniaturization of wiring has been advanced. As a high-density wiring technique, a multilayer wiring board is known. For example, as described in the cited document 1, generally, the wiring is connected to the end of the via with respect to the diameter of the via connecting the layers. The diameter of the land is set large. Similarly, the diameter of the electrode of the electronic component connected to the end of the via is set larger than the diameter of the via.

特開2004−31531号公報JP 2004-31531 A

しかしながら、上記引用文献1のようにビアの径に対してランドの径が大きい構造や、ビアの径に対して電子部品の電極の径が大きな構造においては、ランドや電極間のスペースが狭くなるため、WLCSP等の狭ピッチ化された電極パッドを有する半導体デバイスを接続するような場合には、電極パッドと接続されたビアからの配線の引き回しが困難となる場合がある。そこで、ランドや電極の径を極力小さくしてランドや電極間のスペースを確保することも考えられるが、ランドや電極の径を小さくすると、ビアとランドや電極との接触面積が小さくなって接続抵抗が増加したり、ランドや電極とビアとの間の僅かな位置ずれによって接続不良が生じる。   However, in the structure in which the land diameter is larger than the via diameter as in the above cited reference 1, or in the structure in which the diameter of the electrode of the electronic component is larger than the via diameter, the space between the land and the electrode is narrowed. Therefore, when connecting a semiconductor device having an electrode pad with a narrow pitch, such as WLCSP, it may be difficult to route wiring from a via connected to the electrode pad. Therefore, it may be possible to secure the space between the lands and electrodes by minimizing the diameter of the lands and electrodes. However, if the diameter of the lands and electrodes is reduced, the contact area between the vias and the lands and electrodes is reduced. Connection failure occurs due to an increase in resistance or a slight misalignment between the land or electrode and the via.

この発明は、上述した従来技術による問題点を解消し、接続抵抗の増加や接続不良の発生を抑制できる多層配線基板を提供することを目的とする。   SUMMARY OF THE INVENTION An object of the present invention is to provide a multilayer wiring board that can solve the problems caused by the prior art described above and can suppress an increase in connection resistance and occurrence of connection failure.

本発明に係る一の多層配線基板は、電子部品と、前記電子部品に設けられた電極と、前記電子部品が重ねられる接着層と、前記接着層に形成され、端部が前記電極と接続されるビアとを備えた多層配線基板において、前記電極の側面の少なくとも一部が前記ビアと接していることを特徴とする。   One multilayer wiring board according to the present invention is formed on an electronic component, an electrode provided on the electronic component, an adhesive layer on which the electronic component is stacked, and the adhesive layer, and an end portion is connected to the electrode. In the multilayer wiring board including the via, at least a part of the side surface of the electrode is in contact with the via.

本発明に係る一の多層配線基板によれば、電極が形成された電子部品が重ねられる接着層にビアが形成され、電極の側面の少なくとも一部はビアと接している。従って、ビアと電極との合わせずれが生じても、ビアと電極との接触面積の低下を抑えることができる。このため、接続抵抗の増加や接続不良の発生を抑制することができる。   According to one multilayer wiring board of the present invention, a via is formed in an adhesive layer on which an electronic component on which an electrode is formed is stacked, and at least a part of the side surface of the electrode is in contact with the via. Therefore, even if misalignment between the via and the electrode occurs, it is possible to suppress a decrease in the contact area between the via and the electrode. For this reason, increase in connection resistance and occurrence of connection failure can be suppressed.

また、本発明に係る他の多層配線基板は、内蔵部品と、前記内蔵部品に設けられた電極と、前記内蔵部品が重ねられる接着層と、前記接着層に形成され、端部が前記電極と接続されるビアとを備えた多層配線基板において、前記電極の側面の少なくとも一部が前記ビアと接していることを特徴とする。   In addition, another multilayer wiring board according to the present invention includes a built-in component, an electrode provided in the built-in component, an adhesive layer on which the built-in component is overlapped, an adhesive layer, and an end portion formed on the electrode. In the multilayer wiring board including the vias to be connected, at least a part of the side surface of the electrode is in contact with the via.

本発明に係る他の多層配線基板によれば、上記一の多層配線基板と同様の作用効果を奏することができる。   According to another multilayer wiring board according to the present invention, it is possible to achieve the same effects as the one multilayer wiring board.

本発明の一実施形態においては、前記電極は前記ビアに埋め込まれている。これにより、ビアと電極との接触面積を増やすことができる。   In one embodiment of the invention, the electrode is embedded in the via. Thereby, the contact area between the via and the electrode can be increased.

また、本発明の他の実施形態においては、前記電極の径は、前記ビアの径よりも小さい。これにより、電極の占有面積を小さくできて電極間のピッチも小さくできる。従って、電極を高密度にレイアウトできる。   In another embodiment of the present invention, the diameter of the electrode is smaller than the diameter of the via. Thereby, the occupation area of an electrode can be made small and the pitch between electrodes can also be made small. Therefore, the electrodes can be laid out with high density.

また、本発明の更に他の実施形態においては、樹脂基材に設けられたランドを有する配線パターンを備え、前記ビアの前記電極と接続されていない端部は、前記ランドに接続されている。   In still another embodiment of the present invention, a wiring pattern having a land provided on a resin base material is provided, and an end of the via that is not connected to the electrode is connected to the land.

本発明によれば、多層配線基板の接続抵抗や接続不良を低減できる。   According to the present invention, connection resistance and connection failure of a multilayer wiring board can be reduced.

本発明の第1の実施形態に係る多層配線基板の構造を示す断面図である。It is sectional drawing which shows the structure of the multilayer wiring board which concerns on the 1st Embodiment of this invention. 第1の実施形態に係る電極とビアとの関係を示す上面図である。It is a top view which shows the relationship between the electrode and via | veer concerning 1st Embodiment. 本発明の第1の実施形態に係る多層配線基板の製造工程を示すフローチャートである。It is a flowchart which shows the manufacturing process of the multilayer wiring board which concerns on the 1st Embodiment of this invention. 同多層配線基板の製造工程の概略を示す断面図である。It is sectional drawing which shows the outline of the manufacturing process of the multilayer wiring board. 同多層配線基板の製造工程の概略を示す断面図である。It is sectional drawing which shows the outline of the manufacturing process of the multilayer wiring board. 同多層配線基板の製造工程の概略を示す断面図である。It is sectional drawing which shows the outline of the manufacturing process of the multilayer wiring board. 同多層配線基板の製造工程の概略を示す断面図である。It is sectional drawing which shows the outline of the manufacturing process of the multilayer wiring board. 同多層配線基板の製造工程の概略を示す断面図である。It is sectional drawing which shows the outline of the manufacturing process of the multilayer wiring board. 本発明の第2の実施形態に係る多層配線基板の構造を示す断面図である。It is sectional drawing which shows the structure of the multilayer wiring board which concerns on the 2nd Embodiment of this invention. 本発明の第2の実施形態に係る多層配線基板の製造工程を示すフローチャートである。It is a flowchart which shows the manufacturing process of the multilayer wiring board which concerns on the 2nd Embodiment of this invention. 同多層配線基板の製造工程の概略を示す断面図である。It is sectional drawing which shows the outline of the manufacturing process of the multilayer wiring board. 同多層配線基板の製造工程の概略を示す断面図である。It is sectional drawing which shows the outline of the manufacturing process of the multilayer wiring board. 同多層配線基板の製造工程の概略を示す断面図である。It is sectional drawing which shows the outline of the manufacturing process of the multilayer wiring board. 同多層配線基板の製造工程の概略を示す断面図である。It is sectional drawing which shows the outline of the manufacturing process of the multilayer wiring board. 本発明の他の実施形態に係る電極とビアとの関係を示す断面図である。It is sectional drawing which shows the relationship between the electrode and via | veer concerning other embodiment of this invention.

以下、添付の図面を参照して、この発明の実施形態に係る多層配線基板を詳細に説明する。   Hereinafter, a multilayer wiring board according to an embodiment of the present invention will be described in detail with reference to the accompanying drawings.

[第1の実施形態]
図1は、本発明の第1の実施形態に係る多層配線基板の構造を示す断面図である。第1の実施形態に係る多層配線基板は、図1に示すように、第1プリント配線基材10と、第2プリント配線基材20と、保護層40と、第3プリント配線基材30とを熱圧着(接着層51〜53)により積層し、電子部品90を実装した構造を備える。
[First Embodiment]
FIG. 1 is a sectional view showing the structure of a multilayer wiring board according to the first embodiment of the present invention. As shown in FIG. 1, the multilayer wiring board according to the first embodiment includes a first printed wiring substrate 10, a second printed wiring substrate 20, a protective layer 40, and a third printed wiring substrate 30. Are laminated by thermocompression bonding (adhesive layers 51 to 53), and the electronic component 90 is mounted.

接着層51は、第1プリント配線基材10と第2プリント配線基材20との間を接着する。接着層52は、第2プリント配線基材20と保護層40との間を接着する。接着層53は、保護層40と第3プリント配線基材30との間を接着する。保護層40は、加熱圧着時の層間短絡を防止するため、絶縁フィルム(PET,ポリイミド,液晶ポリマー(LCP)等)により構成される。接着層51〜53は、例えばエポキシ系やアクリル系の接着剤など、有機系接着剤などからなる。   The adhesive layer 51 adheres between the first printed wiring substrate 10 and the second printed wiring substrate 20. The adhesive layer 52 adheres between the second printed wiring board 20 and the protective layer 40. The adhesive layer 53 adheres between the protective layer 40 and the third printed wiring substrate 30. The protective layer 40 is made of an insulating film (PET, polyimide, liquid crystal polymer (LCP), etc.) in order to prevent an interlayer short circuit during thermocompression bonding. The adhesive layers 51 to 53 are made of, for example, an organic adhesive such as an epoxy adhesive or an acrylic adhesive.

更に、多層配線基板は、図1に示すように、電子部品90、及びビア70を有する。電子部品90は、第3プリント配線基材30に形成された開口部39内に、接着層53に直接取り付けられた状態で実装される。ビア70は、積層方向に延びて保護層40を貫通し、電子部品90と第2プリント配線基材20との間、すなわち接着層53、保護層40、及び接着層52に設けられる。   Further, the multilayer wiring board has an electronic component 90 and a via 70 as shown in FIG. The electronic component 90 is mounted in a state of being directly attached to the adhesive layer 53 in the opening 39 formed in the third printed wiring substrate 30. The via 70 extends in the stacking direction and penetrates the protective layer 40, and is provided between the electronic component 90 and the second printed wiring substrate 20, that is, in the adhesive layer 53, the protective layer 40, and the adhesive layer 52.

ビア70は、低融点の金属フィラーと高融点の金属フィラーを含む合金により構成され、その表面を熱硬化性樹脂により覆われている。ここで、金属フィラーは、例えばニッケル、金、銀、銅、アルミニウム、鉄、錫、ビスマス、インジウム、鉛などである。熱硬化性樹脂は、例えばエポキシ、アクリル、ウレタンなどを主成分とするペーストである。   The via 70 is made of an alloy including a low melting point metal filler and a high melting point metal filler, and the surface thereof is covered with a thermosetting resin. Here, the metal filler is, for example, nickel, gold, silver, copper, aluminum, iron, tin, bismuth, indium, lead or the like. The thermosetting resin is a paste mainly composed of epoxy, acrylic, urethane, or the like.

第1〜第3プリント配線基材10〜30は、各々、図1に示すように、第1〜第3樹脂基材11〜31、及び信号用配線12〜32を有する。信号用配線12は、第1樹脂基材11の下面(片面)に形成される。信号用配線22は、第2樹脂基材21の下面及び上面(両面)に形成される。信号用配線32は、第3樹脂基材31の下面及び上面(両面)に形成される。   As shown in FIG. 1, each of the first to third printed wiring base materials 10 to 30 includes first to third resin base materials 11 to 31 and signal wirings 12 to 32. The signal wiring 12 is formed on the lower surface (one surface) of the first resin base material 11. The signal wiring 22 is formed on the lower surface and the upper surface (both surfaces) of the second resin base material 21. The signal wiring 32 is formed on the lower surface and the upper surface (both surfaces) of the third resin base material 31.

第1〜第3樹脂基材11〜31は、樹脂フィルムにより構成される。ここで、樹脂フィルムは、例えばポリイミド、ポリオレフィン、液晶ポリマー(LCP)、熱硬化性のエポキシ樹脂等である。信号用配線12〜32は、パターン形成された銅箔などの導電材により構成される。   The 1st-3rd resin base materials 11-31 are comprised with the resin film. Here, the resin film is, for example, polyimide, polyolefin, liquid crystal polymer (LCP), thermosetting epoxy resin, or the like. The signal wirings 12 to 32 are made of a conductive material such as a patterned copper foil.

また、第3プリント配線基材30は、第3樹脂基材31を貫通するビアホールH内に充填された信号用ビア33を有する。信号用ビア33は、第3樹脂基材31の両面に形成された信号用配線32にそれぞれ接続される。信号用ビア33は、例えばめっきにより形成される。   The third printed wiring board 30 has signal vias 33 filled in via holes H penetrating the third resin base 31. The signal vias 33 are respectively connected to the signal wirings 32 formed on both surfaces of the third resin base material 31. The signal via 33 is formed by plating, for example.

電子部品90は、WLP(Wafer Level Package)により構成される。電子部品90の下面には、図1に示すように、パッド61aに接続された再配線電極等の電極61、樹脂62が設けられる。電極61は、ビア70の上端と電気的に接続される。樹脂62は、電極61を露出させるように電子部品90の下面を覆う。   The electronic component 90 is configured by WLP (Wafer Level Package). As shown in FIG. 1, an electrode 61 such as a rewiring electrode connected to the pad 61 a and a resin 62 are provided on the lower surface of the electronic component 90. The electrode 61 is electrically connected to the upper end of the via 70. The resin 62 covers the lower surface of the electronic component 90 so that the electrode 61 is exposed.

ここで、図2は、第1の実施形態に係る電極61とビア70との関係を示す上面図である。図2に示すように、電極61の径はビア70の径よりも小さく、電極61はビア70に埋め込まれている。従って、電極61はその下面だけではなく、側面でもビア70と接している。電極61はCu、Ni、Au、Alなどの導電材により構成され、ビア70と合金を形成している。   Here, FIG. 2 is a top view showing the relationship between the electrode 61 and the via 70 according to the first embodiment. As shown in FIG. 2, the diameter of the electrode 61 is smaller than the diameter of the via 70, and the electrode 61 is embedded in the via 70. Therefore, the electrode 61 is in contact with the via 70 not only on its lower surface but also on its side surface. The electrode 61 is made of a conductive material such as Cu, Ni, Au, or Al, and forms an alloy with the via 70.

仮に、ビア70が電極61の下面に接し、電極61の径がビア70の径よりも大きい場合は、電極61間の間隔が狭くなって、電子部品90における電極61の数が少なくなってしまう。これに対し、第1の実施形態に係る多層配線基板では、電子部品90の電極61を高密度にレイアウトすることができる。   If the via 70 is in contact with the lower surface of the electrode 61 and the diameter of the electrode 61 is larger than the diameter of the via 70, the interval between the electrodes 61 is narrowed, and the number of the electrodes 61 in the electronic component 90 is reduced. . On the other hand, in the multilayer wiring board according to the first embodiment, the electrodes 61 of the electronic component 90 can be laid out with high density.

なお、上記のように電極61の径がビア70の径よりも小さくなると、ビア70と電極61との接触面積が小さくなると共に、ビア70と電極61との位置合わせズレが生じた場合には、接続不良になる可能性が高くなる。しかしながら、この点、第1の実施形態に係る多層配線基板では、電極61がビア70の上端に埋め込まれており、電極61の下面のみならず、電極61の側面もビア70と接している。このため、接触面積を十分に大きくすることができ、且つビア70と電極61との位置合わせズレが生じたとしても、ビア70と電極61との接触面積の低下及び接続不良を抑えることができる。   When the diameter of the electrode 61 is smaller than the diameter of the via 70 as described above, the contact area between the via 70 and the electrode 61 is reduced, and when the misalignment between the via 70 and the electrode 61 occurs. The possibility of connection failure is increased. However, in this regard, in the multilayer wiring board according to the first embodiment, the electrode 61 is embedded in the upper end of the via 70, and not only the lower surface of the electrode 61 but also the side surface of the electrode 61 is in contact with the via 70. For this reason, the contact area can be sufficiently increased, and even if the misalignment between the via 70 and the electrode 61 occurs, the decrease in the contact area between the via 70 and the electrode 61 and the poor connection can be suppressed. .

次に、図3に沿って、図4〜図8を参照しながら第1の実施形態に係る多層配線基板の製造方法について説明する。図3は、第1の実施形態に係る多層配線基板の製造工程を示すフローチャートである。図4〜図8は、多層配線基板の製造工程の概略を示す断面図である。   Next, a manufacturing method of the multilayer wiring board according to the first embodiment will be described along FIG. 3 with reference to FIGS. FIG. 3 is a flowchart showing manufacturing steps of the multilayer wiring board according to the first embodiment. 4-8 is sectional drawing which shows the outline of the manufacturing process of a multilayer wiring board.

まず、図4に示すように、第1〜第3プリント配線基材10〜30を準備する(図3のステップS100)。ここで、第1〜第3プリント配線基材10〜30の信号用配線12〜32は、サブトラクティブ法又はセミアディティブ法により形成される。また、第3プリント配線基材30の開口部39は、レーザ加工、ドリル加工、金型加工により形成される。   First, as shown in FIG. 4, the 1st-3rd printed wiring base materials 10-30 are prepared (step S100 of FIG. 3). Here, the signal wirings 12 to 32 of the first to third printed wiring substrates 10 to 30 are formed by a subtractive method or a semi-additive method. Further, the opening 39 of the third printed wiring board 30 is formed by laser processing, drilling, or die processing.

次に、図5に示すように、第1プリント配線基材10の上面に接着層51を積層させ(図3のステップS102)、更に第2プリント配線基材20の上面に接着層52、保護層40、及び接着層53を積層させる(図3のステップS104)。   Next, as shown in FIG. 5, the adhesive layer 51 is laminated on the upper surface of the first printed wiring substrate 10 (step S <b> 102 in FIG. 3), and the adhesive layer 52 is further protected on the upper surface of the second printed wiring substrate 20. The layer 40 and the adhesive layer 53 are laminated (step S104 in FIG. 3).

続いて、図6に示すように、第3プリント配線基材30を接着層53の上面に積層させ、第1〜第3プリント配線基材10〜30を仮圧着させる(図3のステップS106)。その後、図7に示すように、例えばレーザ加工により、接着層53、保護層40、及び接着層52を貫通するホールH’を形成し、図8に示すように、ホールH’を導電ペーストで埋めることによってビア70を形成する(図3のステップS108)。   Then, as shown in FIG. 6, the 3rd printed wiring base material 30 is laminated | stacked on the upper surface of the contact bonding layer 53, and the 1st-3rd printed wiring base materials 10-30 are temporarily crimped | bonded (step S106 of FIG. 3). . After that, as shown in FIG. 7, a hole H ′ penetrating the adhesive layer 53, the protective layer 40, and the adhesive layer 52 is formed by laser processing, for example, and as shown in FIG. The via 70 is formed by filling (step S108 in FIG. 3).

最後に、電子部品90が第3プリント配線基材30の開口部39内に収容されるように位置合わせして、電子部品90を接着層53の上面に実装し(図3のステップS110)、第1〜第3プリント配線基材10〜30を加熱圧着させる。これにより、電極61がビア70の上端部に埋め込まれるように電子部品90が開口部39内に実装されると共に、第1〜第3プリント配線基材10〜30が圧着され、図1に示す多層配線基板が製造される。   Finally, the electronic component 90 is positioned so as to be accommodated in the opening 39 of the third printed wiring substrate 30, and the electronic component 90 is mounted on the upper surface of the adhesive layer 53 (step S110 in FIG. 3). The first to third printed wiring substrates 10 to 30 are thermocompression bonded. Thus, the electronic component 90 is mounted in the opening 39 so that the electrode 61 is embedded in the upper end portion of the via 70, and the first to third printed wiring substrates 10 to 30 are pressure-bonded, as shown in FIG. A multilayer wiring board is manufactured.

なお、ビア70の電極61と接続されていない下端は、第2プリント配線基材20の第2樹脂基材21の上面に形成された信号用配線22のランドと接続されている。この電極61とビア70とが圧着される際に、ビア70内の低融点の金属フィラー及び熱硬化性樹脂は融解する。融解した低融点の金属フィラーは、電極61の銅などと合金化する。   The lower end of the via 70 not connected to the electrode 61 is connected to a land of the signal wiring 22 formed on the upper surface of the second resin base 21 of the second printed wiring base 20. When the electrode 61 and the via 70 are pressure-bonded, the low melting point metal filler and the thermosetting resin in the via 70 are melted. The molten low melting point metal filler is alloyed with copper or the like of the electrode 61.

[第2の実施形態]
次に、図9を参照して、本発明の第2の実施形態に係る多層配線基板について説明する。第1の実施形態に係る多層配線基板は、電子部品90を実装した多層配線基板であったが、第2の実施形態に係る多層配線基板は、内蔵部品60を内蔵する部品内蔵基板として機能する。
[Second Embodiment]
Next, a multilayer wiring board according to the second embodiment of the present invention will be described with reference to FIG. Although the multilayer wiring board according to the first embodiment is a multilayer wiring board on which the electronic component 90 is mounted, the multilayer wiring board according to the second embodiment functions as a component built-in board in which the built-in component 60 is built. .

図9は、本発明の第2の実施形態に係る多層配線基板の構造を示す断面図である。第2の実施形態に係る多層配線基板は、図9に示すように、第1プリント配線基材10と、第2プリント配線基材20と、保護層40と、第3プリント配線基材30とを熱圧着(接着層51〜53)により積層し、内蔵部品60を内蔵した構造を備える。   FIG. 9 is a cross-sectional view showing the structure of the multilayer wiring board according to the second embodiment of the present invention. As shown in FIG. 9, the multilayer wiring board according to the second embodiment includes a first printed wiring substrate 10, a second printed wiring substrate 20, a protective layer 40, and a third printed wiring substrate 30. Are laminated by thermocompression bonding (adhesive layers 51 to 53), and a built-in component 60 is built in.

接着層51〜53、保護層40、第1〜第3プリント配線基材10〜30、内蔵部品60の基本的な構成は第1の実施形態において説明した接着層51〜53、保護層40、第1〜第3プリント配線基材10〜30、電子部品90と同様であるため、以降においては、基本的に第1の実施形態と相違する点について説明する。   The basic configurations of the adhesive layers 51 to 53, the protective layer 40, the first to third printed wiring substrates 10 to 30, and the built-in component 60 are the adhesive layers 51 to 53, the protective layer 40, and the protective layer 40 described in the first embodiment. Since it is the same as that of the 1st-3rd printed wiring base materials 10-30 and the electronic component 90, below, the point which is fundamentally different from 1st Embodiment is demonstrated.

第2の実施形態に係る多層配線基板は、図9に示すように、内蔵部品60、及びビア70を有する。内蔵部品60は、第2プリント配線基材20に形成された開口部29内に、第1及び第3プリント配線基材10,30に挟まれた状態で内蔵される。ビア70は、積層方向に延びて保護層40を貫通して、内蔵部品60と第3プリント配線基材30の上面の信号用配線32との間、すなわち接着層52、保護層40、接着層53、及び第3樹脂基材31に設けられる。   As shown in FIG. 9, the multilayer wiring board according to the second embodiment includes a built-in component 60 and a via 70. The built-in component 60 is built in the opening 29 formed in the second printed wiring substrate 20 in a state of being sandwiched between the first and third printed wiring substrates 10 and 30. The via 70 extends in the stacking direction and penetrates the protective layer 40, and between the built-in component 60 and the signal wiring 32 on the upper surface of the third printed wiring substrate 30, that is, the adhesive layer 52, the protective layer 40, and the adhesive layer. 53 and the third resin base material 31.

内蔵部品60は、電子部品90と同様にWLPにより構成され、その上面には、図9に示すように、パッド61aに接続された再配線電極等の電極61、樹脂62が設けられ、電極61はビア70の下端と電気的に接続される。樹脂62は、電極61を露出させるように内蔵部品60の上面を覆う。   The built-in component 60 is made of WLP like the electronic component 90, and an upper surface thereof is provided with an electrode 61 such as a rewiring electrode connected to the pad 61a and a resin 62, as shown in FIG. Is electrically connected to the lower end of the via 70. The resin 62 covers the upper surface of the built-in component 60 so that the electrode 61 is exposed.

内蔵部品60の電極61の径は、ビア70の径よりも小さく構成されている。ビア70の上端は、第3プリント配線基材30の第3樹脂基材31の上面に形成された信号用配線32のランドと第3樹脂基材31を貫通した状態で接続される。このように構成された第2の実施形態に係る多層配線基板においても、上記第1の実施形態に係る多層配線基板と同様の作用効果を奏することができる。   The diameter of the electrode 61 of the built-in component 60 is configured to be smaller than the diameter of the via 70. The upper end of the via 70 is connected to the land of the signal wiring 32 formed on the upper surface of the third resin base 31 of the third printed wiring base 30 so as to penetrate the third resin base 31. Also in the multilayer wiring board according to the second embodiment configured as described above, the same operational effects as those of the multilayer wiring board according to the first embodiment can be obtained.

次に、図10に沿って、図11〜図14を参照しながら第2の実施形態に係る多層配線基板の製造方法について説明する。図10は、第2の実施形態に係る多層配線基板の製造工程を示すフローチャートである。図11〜図14は、多層配線基板の製造工程の概略を示す断面図である。   Next, a method for manufacturing a multilayer wiring board according to the second embodiment will be described along FIG. 10 with reference to FIGS. FIG. 10 is a flowchart showing manufacturing steps of the multilayer wiring board according to the second embodiment. 11 to 14 are cross-sectional views illustrating an outline of the manufacturing process of the multilayer wiring board.

まず、図11に示すように、開口部29が形成された第2プリント配線基材20と共に第1及び第3プリント配線基材10,30を準備する(図10のステップS120)。次に、図12に示すように、第1プリント配線基材10の上面に接着層51を積層させ(図10のステップS122)、第3プリント配線基材30の下面に接着層53、保護層40、及び接着層52を積層させる(図10のステップS124)。   First, as shown in FIG. 11, the 1st and 3rd printed wiring base materials 10 and 30 are prepared with the 2nd printed wiring base material 20 in which the opening part 29 was formed (step S120 of FIG. 10). Next, as shown in FIG. 12, an adhesive layer 51 is laminated on the upper surface of the first printed wiring substrate 10 (step S122 in FIG. 10), and an adhesive layer 53 and a protective layer are formed on the lower surface of the third printed wiring substrate 30. 40 and the adhesive layer 52 are laminated (step S124 in FIG. 10).

続いて、図13に示すように、第2プリント配線基材20の上面に第3プリント配線基材30に積層された接着層52を積層し、レーザ加工により接着層52、保護層40、接着層53、及び第3樹脂基材31を貫通するホールH’を形成し、図14に示すように、ホールH’を導電ペーストで埋めることによってビア70を形成する(図10のステップS126)。   Subsequently, as shown in FIG. 13, the adhesive layer 52 laminated on the third printed wiring substrate 30 is laminated on the upper surface of the second printed wiring substrate 20, and the adhesive layer 52, the protective layer 40, the adhesion are bonded by laser processing. Holes H ′ penetrating the layer 53 and the third resin base material 31 are formed, and as shown in FIG. 14, the vias 70 are formed by filling the holes H ′ with a conductive paste (step S126 in FIG. 10).

そして、第1プリント配線基材10に積層された接着層51の上面に内蔵部品60を実装し(図10のステップS128)、内蔵部品60を開口部29内に収容するように接着層51の上面に第2プリント配線基材20を積層させた上で、第1〜第3プリント配線基材10〜30を加熱圧着させる(図10のステップS130)。   Then, the built-in component 60 is mounted on the upper surface of the adhesive layer 51 laminated on the first printed wiring substrate 10 (step S128 in FIG. 10), and the built-in component 60 is accommodated in the opening 29 so as to be accommodated in the opening 29. After the second printed wiring substrate 20 is laminated on the upper surface, the first to third printed wiring substrates 10 to 30 are heat-pressed (Step S130 in FIG. 10).

以上、本発明の実施形態を説明したが、本発明はこれらに限定されるものではなく、発明の趣旨を逸脱しない範囲内において、種々の変更、追加等が可能である。例えば、図15(a)〜(c)に示すように、電極61の側面の一部のみがビア70に接していてもよい。   As mentioned above, although embodiment of this invention was described, this invention is not limited to these, A various change, addition, etc. are possible in the range which does not deviate from the meaning of invention. For example, as shown in FIGS. 15A to 15C, only a part of the side surface of the electrode 61 may be in contact with the via 70.

図15(a)に示す例においては、電極61の側面の一部及び下面の一部のみがビア70に接する。図15(b)に示す例においては、電極61の側面の一部及び下面の全体のみがビア70に接する。図15(c)に示す例においては、電極61の下面全体及び側面の下部のみがビア70に接する。   In the example shown in FIG. 15A, only part of the side surface and part of the lower surface of the electrode 61 are in contact with the via 70. In the example shown in FIG. 15B, only a part of the side surface and the entire lower surface of the electrode 61 are in contact with the via 70. In the example shown in FIG. 15C, the entire lower surface of the electrode 61 and only the lower part of the side surface are in contact with the via 70.

10〜30 第1〜第3プリント配線基材
11〜31 第1〜第3樹脂基材
12〜32 信号用配線
29,39 開口部
33 信号用ビア
40 保護層
51〜53 接着層
60 内蔵部品
61 電極
61a パッド
62 樹脂
70 ビア
90 電子部品
DESCRIPTION OF SYMBOLS 10-30 1st-3rd printed wiring base material 11-31 1st-3rd resin base material 12-32 Signal wiring 29,39 Opening part 33 Signal via 40 Protective layer 51-53 Adhesive layer 60 Built-in component 61 Electrode 61a Pad 62 Resin 70 Via 90 Electronic component

Claims (5)

電子部品と、
前記電子部品に設けられた電極と、
前記電子部品が重ねられる接着層と、
前記接着層に形成され、端部が前記電極と接続されるビアと
を備えた多層配線基板において、
前記電極の側面の少なくとも一部が前記ビアと接している
ことを特徴とする多層配線基板。
Electronic components,
An electrode provided on the electronic component;
An adhesive layer on which the electronic components are stacked;
In a multilayer wiring board formed in the adhesive layer and having an end connected to the electrode,
A multilayer wiring board, wherein at least a part of a side surface of the electrode is in contact with the via.
内蔵部品と、
前記内蔵部品に設けられた電極と、
前記内蔵部品が重ねられる接着層と、
前記接着層に形成され、端部が前記電極と接続されるビアと
を備えた多層配線基板において、
前記電極の側面の少なくとも一部が前記ビアと接している
ことを特徴とする多層配線基板。
Built-in parts,
An electrode provided in the built-in component;
An adhesive layer on which the built-in components are stacked;
In a multilayer wiring board formed in the adhesive layer and having an end connected to the electrode,
A multilayer wiring board, wherein at least a part of a side surface of the electrode is in contact with the via.
前記電極は、前記ビアに埋め込まれている
ことを特徴とする請求項1又は2記載の多層配線基板。
The multilayer wiring board according to claim 1, wherein the electrode is embedded in the via.
前記電極の径は、前記ビアの径よりも小さい
ことを特徴とする請求項1〜3のいずれか1項記載の多層配線基板。
The multilayer wiring board according to claim 1, wherein a diameter of the electrode is smaller than a diameter of the via.
樹脂基材に設けられたランドを有する配線パターンを備え、
前記ビアの前記電極と接続されていない端部は、前記ランドに接続されている
ことを特徴とする請求項1〜4のいずれか1項記載の多層配線基板。
Provided with a wiring pattern having lands provided on a resin substrate,
The multilayer wiring board according to claim 1, wherein an end of the via that is not connected to the electrode is connected to the land.
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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004311786A (en) * 2003-04-08 2004-11-04 Shinko Electric Ind Co Ltd Wiring board, multilayer wiring board, process for producing wiring board, and process for producing multilayer wiring board
JP2006093439A (en) * 2004-09-24 2006-04-06 Denso Corp Multilayer substrate and its production method

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004311786A (en) * 2003-04-08 2004-11-04 Shinko Electric Ind Co Ltd Wiring board, multilayer wiring board, process for producing wiring board, and process for producing multilayer wiring board
JP2006093439A (en) * 2004-09-24 2006-04-06 Denso Corp Multilayer substrate and its production method

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