JP2014192188A - Organic thin film solar cell, method for manufacturing the same, and electronic apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an organic thin film solar cell with a simple structure which reduces manufacturing steps and improve its design, and whose weight and thickness can be lighten and made thin respectively, a method for manufacturing the same and an electronic apparatus.SOLUTION: An organic thin film solar cell 1 comprises a substrate 10; a first electrode layer 11 arranged on the substrate; a hole transport layer 12 arranged on the first electrode layer; a bulk-hetero junction organic active layer 14 arranged on the hole transport layer; a second electrode layer 16 arranged on the bulk-hetero junction organic active layer; a passivation layer 26 arranged on the second electrode layer; a colorized barrier layer 28 arranged on the passivation layer; and a back sheet passivation layer 30 arranged on the colorized barrier layer. A method for manufacturing the same is provided. The organic thin film solar cell 1 is mounted in an electronic apparatus.

Description

  The present invention relates to an organic thin film solar cell, a manufacturing method thereof, and an electronic device, and more particularly to an organic thin film solar cell that is inexpensive, has improved durability, and can be reduced in weight and thickness, a manufacturing method thereof, and an electronic device.

  Organic thin-film solar cells featuring ultra-thin, light weight, and flexibility are manufactured by printing methods such as the ink-jet method at room temperature and atmospheric pressure, realizing a high degree of freedom in shape and excellent design. It is possible (for example, refer to Patent Document 1).

Special table 2007-534119 gazette

  Conventionally, when producing a solar cell having a design property in an amorphous silicon solar cell or the like, after a cell is produced in an arbitrary pattern, a back sheet or the like colored on the back surface is bonded.

  An object of the present invention is to provide an organic thin film solar cell that has a simple structure, reduces manufacturing steps, improves designability, and can be reduced in weight and thickness, a manufacturing method thereof, and an electronic device.

  According to one aspect of the present invention for achieving the above object, a substrate, a first electrode layer disposed on the substrate, a hole transport layer disposed on the first electrode layer, and the positive electrode A bulk heterojunction organic active layer disposed on the hole transport layer; a second electrode layer disposed on the bulk heterojunction organic active layer; and a passivation layer disposed on the second electrode layer; There is provided an organic thin-film solar cell comprising a colored barrier layer disposed on the passivation layer and a backsheet passivation layer disposed on the colored barrier layer.

  According to the other aspect of this invention, an electronic device provided with said organic thin film solar cell is provided.

  According to another aspect of the present invention, the display device includes an organic thin film solar cell formation region and a character formation region disposed in a peripheral portion of the display region, and the organic thin film solar cell formation region includes a substrate, A first electrode layer disposed on the substrate; a hole transport layer disposed on the first electrode layer; a bulk heterojunction organic active layer disposed on the hole transport layer; and the bulk heterojunction organic A second electrode layer disposed on the active layer, a passivation layer disposed on the second electrode layer, a colored barrier layer disposed on the passivation layer, and disposed on the colored barrier layer. A backsheet passivation layer, wherein the display region and the character forming region are the substrate, the first electrode layer disposed on the substrate, and the first electrode layer. The organic thin film solar cell formation region, comprising: the passivation layer disposed; the coloration barrier layer disposed on the passivation layer; and the backsheet passivation layer disposed on the coloration barrier layer. The corresponding colored barrier layer and the colored barrier layer corresponding to the character forming region are provided with a colored electronic device.

  According to another aspect of the present invention, a step of forming a first electrode on a substrate, a step of forming a hole transport layer on the first electrode layer, and a bulk heterojunction on the hole transport layer A step of forming an organic active layer, a step of forming a second electrode layer on the bulk heterojunction organic active layer, a step of forming a passivation layer on the second electrode layer, and a color on the passivation layer. There is provided a method for producing an organic thin-film solar cell comprising a step of forming a coloration barrier layer and a step of forming a backsheet passivation layer on the coloration barrier layer.

  According to the present invention, it is possible to provide an organic thin-film solar cell, a manufacturing method thereof, and an electronic device that have a simple structure, a reduced manufacturing process, improved designability, and can be reduced in weight and thickness.

(A) The typical cross-section figure of the organic thin-film solar cell which concerns on embodiment, (b) The typical cross-section figure of the organic thin-film solar cell concerning a comparative example. The schematic diagram explaining the fundamental structure and operation | movement of the organic thin-film solar cell which concern on embodiment. FIG. 3 is an energy band structure diagram of various materials of the organic thin film solar cell shown in FIG. 2. (A) Chemical structural formula of PEDOT and (b) Chemical structural formula of PSS applied in the organic thin-film solar cell which concerns on embodiment. (A) Chemical structural formula of P3HT as a p-type material and (b) Chemical structural formula of PCBM as an n-type material, which are applied to the organic thin film solar cell according to the embodiment. In the organic thin-film solar cell according to the embodiment, the chemical structural formula of the material used in vacuum deposition includes (a) Pc: example of phthalocyanine, (b) ZnPc: example of zinc phthalocyanine, (c) Me-Ptcdi (D) Example of C ₆₀ : fullerene. In the organic thin-film solar cell which concerns on embodiment, it is a chemical structural formula of the material used by a solution process, Comprising: (a) Example of MDMO-PPV, (b) Example of PFB, (c) CN-MDMO-PPV Examples: (d) PFO-DBT example, (e) F8BT example, (f) PCDTBT example, (g) PC ₆₀ BM example, (h) PC ₇₀ BM example. The typical cross-section figure of the laminated structure part of the organic thin film solar cell which concerns on embodiment. The typical cross-section figure of the laminated structure part of the organic thin-film solar cell which concerns on the modification of embodiment. It is one process of the manufacturing method of the organic thin-film solar cell which concerns on embodiment, Comprising: (a) Process drawing which prepares ITO board | substrate which formed the transparent electrode layer on the board | substrate, (b) After patterning a transparent electrode layer, it is transparent Process diagram for patterning hole transport layer on electrode layer, (c) Process diagram for patterning bulk heterojunction organic active layer on hole transport layer, (d) On bulk heterojunction organic active layer Process drawing which forms a 2nd electrode layer in a pattern. It is one process of the manufacturing method of the organic thin film solar cell which concerns on embodiment, Comprising: (a) Process drawing which forms a passive film (oxide film) in the 2nd electrode layer surface, (b) A passivation layer is formed in the device whole surface. Process drawing to form, (c) Process drawing of forming a colorization barrier layer on a passivation layer. It is one process of the manufacturing method of the organic thin-film solar cell which concerns on embodiment, Comprising: (a) Typical plane pattern block diagram which shows the state which formed the transparent electrode layer on the board | substrate, (b) of FIG. 12 (a) The typical cross-section figure along an II line. FIG. 13 is a schematic plan pattern configuration diagram showing one state of a method for manufacturing an organic thin-film solar cell according to an embodiment, wherein (a) a hole transport layer is formed on a transparent electrode layer; The typical sectional structure figure which meets the II-II line of (a). 1 is a schematic plan pattern configuration diagram showing a state where a bulk heterojunction organic active layer is formed on a hole transport layer, which is one step of a method for manufacturing an organic thin-film solar cell according to an embodiment; b) A schematic sectional view taken along line III-III in FIG. FIG. 4 is a schematic plan pattern configuration diagram showing a state in which the second electrode layer is formed on the bulk heterojunction organic active layer, which is one step of the method for manufacturing the organic thin film solar cell according to the embodiment; FIG. 15 is a schematic sectional view taken along the line IV-IV in FIG. It is one process of the manufacturing method of the organic thin-film solar cell which concerns on embodiment, Comprising: (a) While etching an excess organic layer by oxygen plasma processing, the state which formed the oxide film in the surface of the 2nd electrode layer The typical plane pattern block diagram shown, (b) The typical cross-section figure along the VV line of Fig.16 (a). It is a process of the manufacturing process of the organic thin-film solar cell which concerns on embodiment, Comprising: (a) Typical plane pattern block diagram which shows the state which formed the passivation layer in the device whole surface, (b) VI of FIG. 17 (a) -The typical cross-section figure along a VI line. FIG. 18A is a schematic plan pattern configuration diagram showing a state in which a colored barrier layer is formed on a passivation layer, which is one step of a manufacturing process of an organic thin-film solar cell according to an embodiment. ) Is a schematic sectional view taken along line VII-VII. FIG. 19 is a schematic plan pattern configuration diagram showing a state in which a backsheet passivation layer is formed on a colored barrier layer, which is one step of a manufacturing process of an organic thin-film solar cell according to an embodiment; The typical cross-section figure which follows the VIII-VIII line of (a). The flowchart which shows the preparation procedure of the organic thin film solar cell which concerns on embodiment. The typical bird's-eye view structure figure which is one process of the mass production manufacturing process of the organic thin-film solar cell which concerns on embodiment, and shows the state which formed the stripe pattern of the transparent electrode layer on the board | substrate. The typical bird's-eye view structure figure which is one process of the mass-production manufacturing process of the organic thin-film solar cell which concerns on embodiment, and shows the state which formed the positive hole transport layer by the spin coat on the stripe-shaped transparent electrode layer. The typical bird's-eye view structure figure which is one process of the mass production manufacturing process of the organic thin-film solar cell which concerns on embodiment, and shows the state which formed the bulk heterojunction organic active layer on the positive hole transport layer by spin coating. A process for mass production of organic thin-film solar cells according to an embodiment, wherein a stripe pattern of the second electrode layer is formed on the bulk heterojunction organic active layer so as to be orthogonal to the stripe-shaped transparent electrode layer The typical bird's-eye view block diagram which shows a state. In the organic thin-film solar cell which concerns on embodiment, the typical plane pattern block diagram which shows the example which has arrange | positioned several cell Cij in matrix form. In the method for manufacturing an organic thin-film solar cell according to the embodiment, (a) a schematic view showing a spin coating method when forming a hole transport layer and a bulk heterojunction organic active layer, (b) formed holes The typical bird's-eye view block diagram which shows the example of a transport layer and a bulk heterojunction organic active layer. The typical plane block diagram of the electronic device to which the organic thin-film solar cell which concerns on embodiment is applied. FIG. 28 is a schematic sectional view taken along line IX-IX in FIG. 27. FIG. 28 is a schematic sectional view taken along line XX in FIG. 27. FIG. 28 is a schematic sectional view taken along line XI-XI in FIG. 27. (A) Schematic cross-sectional structure diagram of an electronic device having a tandem structure to which the organic thin film solar cell according to the embodiment is applied, (b) Schematic of an electronic device having an in-cell structure to which the organic thin film solar cell according to the embodiment is applied. FIG.

  Next, embodiments will be described with reference to the drawings. In the following description of the drawings, the same or similar parts are denoted by the same or similar reference numerals. However, it should be noted that the drawings are schematic, and the relationship between the thickness and the planar dimensions, the ratio of the thickness of each layer, and the like are different from the actual ones. Therefore, specific thicknesses and dimensions should be determined in consideration of the following description. Moreover, it is a matter of course that portions having different dimensional relationships and ratios are included between the drawings.

  Further, the embodiments described below exemplify apparatuses and methods for embodying the technical idea of the present invention, and the embodiments of the present invention include the material, shape, structure, The layout is not specified as follows. Various modifications can be made to the embodiment of the present invention within the scope of the claims.

  In the organic thin film solar cell according to the following embodiments, “transparent” is defined as having a transmittance of about 50% or more. Further, “transparent” is also used to mean colorless and transparent with respect to visible light in the organic thin film solar cell according to the embodiment. Visible light corresponds to a wavelength of about 360 nm to 830 nm and an energy of about 3.45 eV to 1.49 eV, and is transparent if the transmittance is 50% or more in this region.

  As shown in FIG. 1A, the organic thin-film solar cell 1 according to the embodiment includes a substrate 10, a transparent electrode layer (first electrode layer) 11 disposed on the substrate 10, and a first electrode layer 11. The hole transport layer 12 disposed above, the bulk heterojunction organic active layer 14 disposed on the hole transport layer 12, and the cathode electrode layer (second electrode layer) disposed on the bulk heterojunction organic active layer 14 16, a passivation layer 26 disposed on the second electrode layer 16, a colored barrier layer 28 disposed on the passivation layer 26, and a backsheet passivation layer 30 disposed on the colored barrier layer 28. Prepare.

(Comparative example)
As shown in FIG. 1B, the organic thin-film solar cell 1 </ b> B according to the comparative example is on the substrate 10, the transparent electrode layer (first electrode layer) 11 disposed on the substrate 10, , A hole heterojunction organic active layer 14 disposed on the hole transport layer 12, and a cathode electrode layer (second electrode layer) 16 disposed on the bulk heterojunction organic active layer 14. A passivation layer 26 disposed on the second electrode layer 16, a barrier layer 29 disposed on the passivation layer 26, a passivation layer 31 disposed on the barrier layer 29, and a passivation layer 31. A backsheet layer 33. The barrier layer 29 is formed by laminating an inorganic passivation film such as SiN or SiON and a resin protective film in multiple layers by a chemical vapor deposition (CVD) method. The transparent resin material used as the resin protective film was transparent except for the cell portion. Therefore, when coloring the module according to the intended use, it is necessary to add extra materials such as attaching a color film as the backsheet layer 33. There is.

  Since the entire module needs to be colored in accordance with the color of the housing to be incorporated and the work environment, the solar cell is bonded with a white or black back sheet on the back of the module.

  However, the use of the backsheet layer 33 increases the thickness of the module and increases the cost.

  As shown in FIG. 1A, the organic thin-film solar cell 1 according to the embodiment is made thinner than the comparative example by using a protective film (colored barrier layer 28) to which a colorant is added. The element structure allows the module to be arbitrarily colored. That is, by using a color filter capable of arbitrary patterning by UV irradiation for the protective layer of the cell, the protective layer has a design property, and the manufacturing process can be reduced and the design property can be improved as compared with the comparative example. Yes.

  As shown in FIG. 1A, the organic thin-film solar cell 1 according to the embodiment has an organic layer (12, 14) having a thickness of about several hundreds of nanometers serving as a power generation layer on a glass substrate 10 with ITO. The second electrode layer 16 is formed by stacking and depositing a metal layer such as aluminum.

  Since pure aluminum formed as the second electrode layer 16 is easily oxidized, a passive film 24 may be formed as shown in FIG. 1A in order to provide durability.

  Since organic layers such as the hole transport layer 12 and the bulk heterojunction organic active layer 14 are disposed on the substrate 10, when the passivation layer 26 is formed by forming the passivation film 24, these organic layers are formed on the organic layer. It is possible to prevent damage.

  The colored barrier layer 28 disposed on the passivation layer 26 serves as a protective layer for the cells of the organic thin-film solar cell 1 according to the embodiment.

  The colored barrier layer 28 can be formed of a color filter that can be arbitrarily patterned by ultraviolet (UV) irradiation. By using such a patternable color filter as a protective layer, the organic thin-film solar cell 1 according to the embodiment can impart design properties to the protective layer, and a comparative example (FIG. 1B). Rather, it can reduce the number of manufacturing steps and improve the design.

  In the organic thin film solar cell 1 according to the embodiment, the passivation layer 26 and the colored barrier layer 28 can be formed by laminating an inorganic passivation film such as SiN or SiON by CVD and a resin protective film in multiple layers.

  In the organic thin film solar cell 1 according to the embodiment, in order to enable coloring without changing the module process, by adding a dye to the material of the resin protective film, any part other than the module cell can be arbitrarily selected. I was able to be colored in the color of. Since this resin material can leave a pattern only in a portion irradiated with UV after coating and forming, it is possible to perform a color scheme on the back with an arbitrary pattern.

  As the colorant, for example, black can be applied, for example, carbon black, blue can be applied, for example, a phthalocyanine-based paint, and red, for example, alizarin-based paint.

  An example of an organic thin film solar cell module in which an arbitrary pattern is colored and characters are embedded will be described later (see FIGS. 27 to 30).

(Operating principle)
A schematic diagram illustrating the operating principle of the organic thin-film solar cell 1A is expressed as shown in FIG. Moreover, the energy band structure of the various materials of the organic thin film solar cell 1A shown in FIG. 2 is expressed as shown in FIG. With reference to FIG. 2 and FIG. 3, the principle structure and operation | movement of the organic thin-film solar cell 1A which concern on embodiment are demonstrated.

  As shown in the left diagram of FIG. 2, the organic thin film solar cell 1 </ b> A includes a substrate 10, a transparent electrode layer 11 disposed on the substrate 10, a hole transport layer 12 disposed on the transparent electrode layer 11, A bulk heterojunction organic active layer 14 disposed on the hole transport layer 12 and a second electrode layer 16 disposed on the bulk heterojunction organic active layer 14 are provided. The second electrode layer 16 is made of, for example, aluminum (Al) and serves as a cathode electrode layer.

  Here, as shown in the right diagram of FIG. 2, the bulk heterojunction organic active layer 14 includes a p-type organic active layer region and an n-type organic active layer region, thereby forming a complex bulk hetero pn junction. ing. Here, the p-type organic active layer region is formed of, for example, P3HT (poly (3-hexylthiophene-2,5diyl)), and the n-type organic active layer region is, for example, PCBM (6,6-phenyl-C61-). butyric acid methyl ester).

(A) First, when light is absorbed, excitons are generated in the bulk heterojunction organic active layer 14.

(B) Next, excitons dissociate into free carriers of electrons (e−) and holes (h +) by spontaneous polarization at the pn junction interface in the bulk heterojunction organic active layer 14.

(C) Next, the dissociated holes (h +) travel toward the transparent electrode layer 11 serving as the anode electrode, and the dissociated electrons (e−) travel toward the cathode electrode layer 16.

(D) As a result, a reverse current is conducted between the cathode electrode layer 16 and the transparent electrode layer 11, and an open circuit voltage Voc is generated, whereby the organic thin film solar cell 1A is obtained.

  In the organic thin film solar cell 1A, the chemical structural formula of PEDOT among PEDOT: PSS applied to the hole transport layer 12 is represented as shown in FIG. 4A, and the chemical structural formula of PSS is shown in FIG. It is expressed as shown in b).

  In the organic thin film solar cell 1A, the chemical structural formula of P3HT applied to the bulk heterojunction organic active layer 14 is expressed as shown in FIG. 5A, and the chemical structure of PCBM applied to the bulk heterojunction organic active layer 14 The equation is expressed as shown in FIG.

In the organic thin film solar cell 1A, examples of chemical structural formulas of materials used in vacuum deposition are as follows. That is, an example of phthalocyanine (Pc) is represented as shown in FIG. 6 (a), and an example of zinc phthalocyanine (ZnPc: Zinc-phthalocyanine) is represented as shown in FIG. 6 (b). An example of -Ptcdi (N, N′-dimethyl perylene-3,4,9,10-dicarboximide) is represented as shown in FIG. 6C, and an example of fullerene (C ₆₀ : Buckminster fullerene) 6 (d).

  In the organic thin film solar cell 1A, examples of chemical structural formulas of materials used in the solution process are as follows. That is, an example of MDMO-PPV (poly [2-methoxy-5- (3,7-dimethyl octyloxy)]-1,4-phenylene vinylene) is expressed as shown in FIG. An example of PFB (poly (9,9'-dioctylfluorene-co-bis-N, N '-(4-butylphenyl) -bis-N, N'-phenyl-1,4-phenylenediamine) is shown in FIG. 7 (b). An example of CN-MDMO-PPV (poly- [2-methoxy-5- (2'-ethylhexyloxy) -1,4- (1-cyanovinylene) -phenylene]) is shown in FIG. c) PFO-DBT (poly [2,7- (9,9-dioctyl-fluorene) -alt-5,5- (4,7'-di-2-thienyl-2 ') , 1 ′, 3′-benzothiadiazole)]) is represented as shown in FIG.

  An example of F8BT (poly (9,9′-dioctyl fluoreneco-benzothiadiazole)) is represented as shown in FIG. An example of carbazole-alt-5,5- (4 ′, 7′-di-thienyl-2′1 ′, 3′-b3nzothiadizaole)]) is represented as shown in FIG.

An example of PC ₆₀ BM (6,6-phenyl-C61-butyric acid methyl ester) is represented as shown in FIG. 7 (g), and PC ₇₀ BM (6,6-phenyl-C71-butyric acid methyl ester). An example of ester) is represented as shown in FIG.

  As shown in FIG. 8, the laminated structure portion of the organic thin-film solar cell 1 according to the embodiment includes a substrate 10, a transparent electrode layer (first electrode layer) 11 disposed on the substrate 10, and a first electrode layer. 11, a hole heterojunction organic active layer 14 disposed on the hole transport layer 12, and a cathode electrode layer (second electrode layer) disposed on the bulk heterojunction organic active layer 14. 16).

  Moreover, the laminated structure part of the organic thin film solar cell 1 which concerns on the modification of embodiment is further provided with the passive film 24 arrange | positioned on the surface of the 2nd electrode layer 16, as shown in FIG. Here, the passive film 24 is composed of an oxide film of the second electrode layer 16. The oxide film of the second electrode layer 16 can be formed by performing oxygen plasma treatment on the surface of the second electrode layer 16. The thickness of the passivation film 24 is, for example, about 10 angstroms to about 100 angstroms. In addition, although illustration is abbreviate | omitted, you may provide the passivation film arrange | positioned on the passive film 24. FIG. This passivation film can be composed of, for example, a SiN film or a SiON film.

The second electrode layer 16 may be made of any one of Al, W, Mo, Mn, and Mg. When the second electrode layer 16 is formed of Al, the passive film 24 is an alumina (Al ₂ O ₃ ) film.

  As shown in FIG. 9, the organic thin-film solar cell 1 including the passive film 24 on the surface of the second electrode layer 16 has the second structure even when moisture or oxygen enters the bulk heterojunction organic active layer 14. It is possible to prevent the electrode layer 16 from being oxidized by the moisture and oxygen. Thereby, deterioration of an organic solar cell can be suppressed and durability can be improved.

(Production method)
One step of the method for manufacturing the organic thin film solar cell according to the embodiment, the step of preparing the ITO substrate in which the transparent electrode layer 11 is formed on the substrate 10 is represented as shown in FIG. The step of patterning the hole transport layer 12 on the transparent electrode layer 11 after patterning the transparent electrode layer 11 is expressed as shown in FIG. 10B, and a bulk heterojunction organic layer is formed on the hole transport layer 12. The step of patterning the active layer 14 is expressed as shown in FIG. 10C, and the step of patterning the second electrode layer 16 on the bulk heterojunction organic active layer 14 is shown in FIG. Represented as shown.

  Moreover, it is one process of the manufacturing method of the organic thin film solar cell which concerns on embodiment, Comprising: The process of forming the passive film (oxide film) 24 on the 2nd electrode layer 16 surface is as shown to Fig.11 (a). The step of forming the passivation layer 26 on the entire surface of the device is expressed as shown in FIG. 11B, and the step of forming the colored barrier layer 28 on the passivation layer 26 is shown in FIG. Represented as shown.

  As shown in FIGS. 10 to 11 and FIG. 1A, the method for manufacturing the organic thin-film solar cell 1 according to the embodiment includes the step of preparing the substrate 10 and the formation of the first electrode layer 11 on the substrate 10. A step of forming a hole transport layer 12 on the first electrode layer 11, a step of forming a bulk heterojunction organic active layer 14 on the hole transport layer 12, and a step on the bulk heterojunction organic active layer 14. A step of forming the two-electrode layer 16, a step of forming the passivation layer 26 on the second electrode layer 16, a step of forming the colored barrier layer 28 on the passivation layer 26, and a back surface on the colored barrier layer 28. Forming a sheet passivation layer 30.

  With reference to FIGS. 10-11 and FIG. 1A, the manufacturing method of the organic thin-film solar cell which concerns on embodiment is demonstrated.

(A) First, as shown in FIG. 10A, a transparent electrode layer 11 made of, for example, ITO is formed on a substrate 10.

(B) Next, as shown in FIG. 10B, after patterning the transparent electrode layer 11, the hole transport layer 12 is patterned on the transparent electrode layer 11. For the patterning of the transparent electrode layer 11, a wet etching technique, an oxygen plasma etching technique, a laser patterning technique, a nanoimprint technique, and the like can be applied. For the formation of the hole transport layer 12, a spin coating technique, a spray technique, a screen printing technique, or the like can be applied. Here, in the step of forming the hole transport layer 12, for example, PEDOT: PSS is formed by spin coating, and annealing is performed at 120 ° C. for about 10 minutes in order to remove moisture.

(C) Next, as shown in FIG. 10C, a bulk heterojunction organic active layer 14 to be a power generation layer is formed on the hole transport layer 12. In the step of forming the bulk heterojunction organic active layer 14, for example, P3HT is formed by spin coating. In forming the bulk heterojunction organic active layer 14, after forming into a film using an inkjet method, heating is performed at about 100 ° C. to 120 ° C. for about 10 minutes to 30 minutes in order to dry the organic solvent. .

(D) Next, as shown in FIG. 10D, the cathode electrode layer 16 is patterned on the bulk heterojunction organic active layer 14. For the formation of the cathode electrode layer 16, for example, a metal layer such as Al, W, Mo, Mn, and Mg can be formed by a vacuum heating vapor deposition method. Further, screen printing technology may be applied.

(E) Next, as shown in FIG. 11A, an oxide film (passive film) 24 is formed on the surface of the second electrode layer 16. The passive film 24 can be formed by subjecting the second electrode layer 16 to oxygen plasma treatment. The excess organic layer is removed by oxygen plasma, and an oxide film treatment is performed on the aluminum resurface.

(F) Next, as shown in FIG. 11B, a passivation layer 26 is formed on the second electrode layer 16. Here, as the passivation layer 26, a silicon nitride film or the like may be formed by a CVD method. The thickness of the silicon nitride film is, for example, about 0.5 μm to 1.5 μm. In order to suppress deterioration due to moisture and oxygen in the atmosphere, durability can be further improved by sealing with a SiN film formed by CVD.

(G) Next, as shown in FIG. 11C, a colored barrier layer 28 is formed on the passivation layer 26. Here, in order to eliminate defects such as spots on the passivation layer 26 formed of a SiN film and smooth the back surface of the module, a UV curable resin material is applied by a spin coat method or the like and cured by UV irradiation. Here, the colored barrier layer 28 uses a protective film to which a colorant is added, so that the module can be arbitrarily colored with a thinned element structure.

(H) Next, as shown in FIG. 1A, a backsheet passivation layer 30 is formed on the colored barrier layer 28. For the backsheet passivation layer 30, for example, a silicon nitride film or the like may be formed by a CVD method. The thickness of the silicon nitride film is, for example, about 0.5 μm to 1.5 μm. In order to suppress deterioration due to moisture and oxygen in the atmosphere, durability can be further improved by sealing with a SiN film formed by CVD.

  The organic thin-film solar cell 1 according to the embodiment can be completed through the above steps.

  Depending on the required module durability, a step of forming a passivation layer 26 such as a silicon nitride film (FIG. 11B), a step of forming a colored barrier layer 28 on the passivation layer 26 (FIG. 11C). )) May be repeated to form a multi-layered protective film.

  Moreover, the opening part of a cell is arbitrarily patterned by the inkjet method etc. In addition, the coloring barrier layer 28 (resin protective film) to which a dye is added can also be subjected to arbitrary patterning by using an inkjet method or the like. Here, the opening portion of the cell corresponds to, for example, the display region 2 or the character formation region 6 (see FIGS. 27 to 30).

(Production method)
A method for manufacturing an organic thin film solar cell according to an embodiment in which a plurality (three in the example in the figure) are arranged in series will be described.

  A schematic planar pattern configuration showing a state in which the transparent electrode layer 11 is formed on the substrate 10 in one step of the method for manufacturing the organic thin film solar cell according to the embodiment is shown in FIG. Then, a schematic cross-sectional structure along the line II in FIG. 12A is expressed as shown in FIG.

  Moreover, the schematic plane pattern structure which shows the state which formed the positive hole transport layer 12 on the transparent electrode layer 11 is represented as shown to Fig.13 (a), and shows to the II-II line of Fig.13 (a). The schematic cross-sectional structure along is represented as shown in FIG.

  Further, a schematic planar pattern configuration showing a state in which the bulk heterojunction organic active layer 14 is formed on the hole transport layer 12 is expressed as shown in FIG. A schematic cross-sectional structure along the line -III is expressed as shown in FIG.

  Further, a schematic planar pattern configuration showing a state in which the second electrode layer 16 is formed on the bulk heterojunction organic active layer 14 is expressed as shown in FIG. A schematic cross-sectional structure along the IV line is expressed as shown in FIG.

  In addition, by oxygen plasma treatment, an excess organic layer is etched on the pattern in the hole transport layer 12 and the bulk heterojunction organic active layer 14, and a passive film (oxidation film) is formed on the surface of the second electrode layer 16. A schematic planar pattern configuration showing a state in which the (film) 24 is formed is expressed as shown in FIG. 16A, and a schematic cross-sectional structure taken along the line VV in FIG. ).

  Further, a schematic plane pattern configuration showing a state in which the passivation layer 26 is formed on the entire surface of the device is represented as shown in FIG. 17A, and a schematic cross-sectional structure along the line VI-VI in FIG. This is expressed as shown in FIG.

  Further, a schematic planar pattern configuration showing a state in which the colored barrier layer 28 is formed on the passivation layer 26 is expressed as shown in FIG. 18A, and is a schematic diagram along the line VII-VII in FIG. A typical cross-sectional structure is represented as shown in FIG.

  Further, a schematic plane pattern configuration showing a state in which the backsheet passivation layer 30 is formed on the colorization barrier layer 28 is expressed as shown in FIG. 19A, and is taken along line VIII-VIII in FIG. A schematic cross-sectional structure along the line is expressed as shown in FIG.

  With reference to FIGS. 12-19, the manufacturing method of the organic thin-film solar cell based on Embodiment arrange | positioned in series (three in the example of a figure) is demonstrated.

(A) First, a glass substrate 10 (for example, length of about 50 mm × width of about 50 mm × thickness of about 10.4 mm) washed with pure water, acetone, and ethanol is placed in an ICP etcher, and the surface of the glass substrate 10 is washed with O ₂ plasma. Remove deposits (glass substrate surface treatment). In addition, in order to form the board | substrate 10 with a glass substrate and to guide | invade light to an organic active layer efficiently, you may implement an antireflection process on the glass surface.

(B) Next, as shown in FIG. 12, a transparent electrode layer 11 made of, for example, ITO is formed on the glass substrate 10. As shown in FIG. 12, a plurality of transparent electrode layers 11 are formed in a stripe pattern across the groove. An oxygen plasma etching technique, a laser patterning technique, a nanoimprint technique, or the like can be applied to the formation of the groove.

(C) Next, as shown in FIG. 13, the hole transport layer 12 is formed on each transparent electrode layer 11. For the formation of the hole transport layer 12, a spin coating technique, a spray technique, a screen printing technique, or the like can be applied. Here, in the step of forming the hole transport layer 12, for example, PEDOT: PSS is formed by spin coating, and annealing is performed at 120 ° C. for about 10 minutes to remove moisture. An oxygen plasma etching technique, a laser patterning technique, a nanoimprint technique, or the like can be applied to the formation of the groove.

(D) Next, as shown in FIG. 14, a bulk heterojunction organic active layer 14 is formed on each hole transport layer 12. In the formation process of the bulk heterojunction organic active layer 14, for example, P3HT is formed by spin coating.

(E) Next, as shown in FIG. 15, a cathode electrode layer 16 is formed on each bulk heterojunction organic active layer 14. The cathode electrode layer 16 is formed, for example, by depositing a metal layer such as Al, W, Mo, Mn, and Mg by a vacuum heating vapor deposition method. A screen printing technique may be applied instead of the vacuum heating deposition method.

(F) Next, as shown in FIG. 16, after the bulk heterojunction organic active layer 14 and the hole transport layer 12 are etched, an oxide film (passive film) 24 is formed on the surface of the cathode electrode layer 16. Each cell can be separated by etching the bulk heterojunction organic active layer 14 and the hole transport layer 12. The passive film 24 can be formed by subjecting the second electrode layer 16 to oxygen plasma treatment. The passive film 24 can be formed using, for example, a high-density plasma etching apparatus. In addition, it is also possible to etch the bulk heterojunction organic active layer 14 and the hole transport layer 12 at the same time as forming the passive film 24 by performing oxygen plasma treatment on the second electrode layer 16.

(G) Next, as shown in FIG. 17, a passivation layer 26 is formed on the entire surface of the device. Here, as the passivation layer 26, a silicon nitride film or the like may be formed by a CVD method. The thickness of the silicon nitride film is, for example, about 0.5 μm to 1.5 μm. In order to suppress deterioration due to moisture and oxygen in the atmosphere, durability can be further improved by sealing with a SiN film formed by CVD.

(H) Next, as shown in FIG. 18, a colored barrier layer 28 is formed on the passivation layer 26. Here, in order to eliminate defects such as spots on the passivation layer 26 formed of a SiN film and smooth the back surface of the module, a UV curable resin material is applied by a spin coat method or the like and cured by UV irradiation. Here, the colored barrier layer 28 uses a protective film to which a colorant is added, so that the module can be arbitrarily colored with a thinned element structure.

(I) Next, as shown in FIG. 19, a backsheet passivation layer 30 is formed on the colored barrier layer 28. For the backsheet passivation layer 30, for example, a silicon nitride film or the like may be formed by a CVD method. The thickness of the silicon nitride film is, for example, about 0.5 μm to 1.5 μm. In order to suppress deterioration due to moisture and oxygen in the atmosphere, durability can be further improved by sealing with a SiN film formed by CVD.

  Depending on the required module durability, the step of forming a passivation layer 26 such as a silicon nitride film (FIG. 17) and the step of forming a colored barrier layer 28 on the passivation layer 26 (FIG. 18) are repeated to obtain multiple layers. A laminated protective film may be formed.

  Moreover, the opening part of a cell is arbitrarily patterned by the inkjet method etc. In addition, the coloring barrier layer 28 (resin protective film) to which a dye is added can also be subjected to arbitrary patterning by using an inkjet method or the like.

  The organic thin-film solar cell 1 according to the embodiment can be completed through the above steps.

(Procedure for making organic thin-film solar cells)
Based on the flowchart shown in FIG. 20, the preparation procedure of the organic thin-film solar cell 1 which concerns on embodiment is demonstrated.

(A) In step S <b> 1, PEDOT: PSS is applied on the substrate 10. For example, the PEDOT: PSS aqueous solution is filtered with a 0.45 μm PTFE membrane filter to remove undissolved residues and impurities, and the PEDOT: PSS aqueous solution is applied onto the ITO substrate 10 and spin-coated (for example, 4000 rpm, 30 sec).

(B) In step S2, PEDOT: PSS is sintered. That is, after film formation, heat treatment is performed at 120 ° C. for 10 minutes to remove moisture. In addition, it is good to cover the petri dish previously warmed with the hot plate so that heat may be transmitted to the whole substrate 10.

(C) In step S3, P3HT: PCBM is applied. Specifically, for example, 16 mg of P3HT and 16 mg of PCBM are dissolved in dichlorobenzene (o-dichlorobenzen). The solution is stirred overnight at 50 ° C. in a nitrogen atmosphere and then sonicated at 50 ° C. for 1 minute. The solution is spin-coated on the ITO substrate 10 cleaned in a nitrogen-substituted glove box (<1 ppm O ₂ , H ₂ O). The number of rotations is, for example, 2000 rpm · 1 sec after 550 rpm · 60 sec.

(D) In step S4, pre-annealing is performed. That is, after the application in step S3, heating is performed at 120 ° C. for 10 minutes. In addition, it is good to cover the petri dish previously warmed with the hot plate so that heat may be transmitted to the whole substrate 10.

(E) In step S5, LiF vacuum deposition is performed. Specifically, LiF (purity: 99.98%) is subjected to vacuum heating vapor deposition at a degree of vacuum of 1.1 × 10 ⁻⁶ torr / deposition rate of 0.1 kg / sec.

(F) In step S6, the second electrode layer 16 is formed by performing Al vacuum deposition. Specifically, Al (purity: 99.999%) is subjected to vacuum heating deposition with a degree of vacuum: 1.1 × 10 ⁻⁶ torr and a deposition rate of ˜2Å / sec.

(G) In step S7, an electrode oxide film treatment is performed on the second electrode layer 16. Specifically, the oxide film 24 is formed by oxidizing the surface of the second electrode layer 16 with oxygen plasma using a high-density plasma etching apparatus.

(H) In step S8, sealing is performed. Specifically, a passivation layer 26, a colored barrier layer 28, and a backsheet passivation layer 30 are sequentially laminated on the entire device to seal the element.

(Mass production process)
As shown in FIGS. 21 to 25, the organic thin-film solar cell according to the embodiment can be manufactured by arranging a plurality of cells in a matrix and performing a mass production process.

  Hereinafter, a description will be given with reference to FIGS.

(A) First, a glass substrate 10 washed with pure water, acetone, and ethanol is placed in an ICP etcher, and surface deposits are removed by O ₂ plasma (glass substrate surface treatment). In order to efficiently guide light to the organic active layer, an antireflection treatment may be performed on the surface of the glass substrate 10.

(B) Next, as shown in FIG. 21, the transparent electrode layer 11 made of, for example, ITO is formed on the substrate 10. In the example shown in FIG. 21, the transparent electrode layer 11 is formed in two stripe patterns with a gap therebetween. For forming the gap, an oxygen plasma etching technique, a laser patterning technique, a nanoimprint technique, or the like can be applied.

(C) Next, as shown in FIG. 22, the hole transport layer 12 is formed on the substrate 10 and the transparent electrode layer 11. For the formation of the hole transport layer 12, a spin coating technique, a spray technique, a screen printing technique, or the like can be applied. Here, in the step of forming the hole transport layer 12, for example, PEDOT: PSS is formed by spin coating, and annealing is performed at 120 ° C. for about 10 minutes to remove moisture.

(D) Next, as shown in FIG. 23, a bulk heterojunction organic active layer 14 is formed on the hole transport layer 12. In the formation process of the bulk heterojunction organic active layer 14, for example, P3HT: PCBM is formed by spin coating. The thickness of the bulk heterojunction organic active layer 14 is, for example, about 100 nm to about 200 nm.

(E) Next, as shown in FIG. 24, two stripe-pattern cathode electrode layers 16 are formed on the bulk heterojunction organic active layer 14 so as to be orthogonal to the transparent electrode layer 11.

  The cathode electrode layer 16 is formed, for example, by depositing Al, W, Mo, Mn, Mg, or the like by a vacuum heating vapor deposition method. A screen printing technique may be applied instead of the vacuum heating deposition method.

(F) Next, although not shown, an oxide film (passive film) is formed on the surface of the cathode electrode layer 16. The passive film can be formed by exposing the cathode electrode layer 16 to oxygen plasma. Formation of the oxide film by oxygen plasma can be performed using, for example, a plasma etching apparatus.

(G) Next, although not shown, the passivation layer 26, the colored barrier layer 28, and the backsheet passivation layer 30 are sequentially laminated on the entire device and sealed.

  The organic thin-film solar cell 1 according to the embodiment can be mass-produced through the above steps.

In the organic thin-film solar cell according to the embodiment, a schematic plane pattern configuration example in which a plurality of cells C _ij are arranged in a matrix is expressed as shown in FIG. An anode electrode pattern formed by the anode electrode layer 11, A _j , A _{j + 1} ,..., And an anode electrode pattern..., A _j , A _{j + 1} ,. Cells... C _ij are arranged at the intersections of the cathode electrode patterns..., K _i−1 , K _i , K _{i + 1 ,.} By selecting the anode electrode pattern ..., A _j , A _{j + 1} , ... and the cathode electrode pattern ..., K _i-1 , K _i , K _{i + 1} , ..., cells arranged at the intersections ... C It is also possible to separately measure the characteristics of _ij .

(Spin coating method)
In the method for manufacturing an organic thin-film solar cell according to the embodiment, an outline showing a spin coating method when forming the hole transport layer 12 and the bulk heterojunction organic active layer 14 is shown in FIG. A schematic bird's-eye view showing an example of the hole transport layer 12 and the bulk heterojunction organic active layer 14 thus formed is expressed as shown in FIG.

  For example, in the case of creating a relatively small area element in the organic thin film solar cell 1 according to the embodiment, a spin coating method as shown in FIG. 26A can be applied.

  That is, as shown in FIG. 26A, a spin coater including a spindle 62 that can be rotated at a high speed and connected to a drive source such as a motor, and a table 63 that is fixed to the spindle 62 and places the substrate 10 thereon is used. It is done.

  Then, the substrate 10 is placed on the table 63, a driving source such as a motor is operated, and the table 63 is rotated at a high speed in the directions of arrows A and B, for example, at 2000 to 4000 rpm. Next, using a dropper 60, a solution droplet 64 that forms the hole transport layer 12 and the bulk heterojunction organic active layer 14 is dropped. Thereby, the droplet 64 can form the positive hole transport layer 12 and the bulk heterojunction organic active layer 14 (refer FIG.26 (b)) of uniform thickness on the board | substrate 10 with a centrifugal force.

(Electronics)
A schematic planar configuration of an electronic device 200 to which the organic thin-film solar cell 1 according to the embodiment is applied is expressed as shown in FIG. The electronic device 200 to which the organic thin-film solar cell 1 according to the embodiment is applied includes an organic thin-film solar cell formation region 4 and a character formation region 6 in the periphery of the display region 2 as shown in FIG.

  Moreover, the schematic cross-sectional structure along the IX-IX line of FIG. 27 is represented as shown in FIG. 28, and the schematic cross-sectional structure along the XX line of FIG. 27 is represented as shown in FIG. A schematic cross-sectional structure taken along line XI-XI in FIG. 27 is expressed as shown in FIG.

  In the electronic device 200 to which the organic thin film solar cell 1 according to the embodiment is applied, the organic thin film solar cell forming region 4 includes a substrate 10 and a transparent electrode disposed on the substrate 10 as shown in FIGS. Layer (first electrode layer) 11, hole transport layer 12 disposed on first electrode layer 11, bulk heterojunction organic active layer 14 disposed on hole transport layer 12, and bulk heterojunction organic active layer A cathode electrode layer (second electrode layer) 16 disposed on 14, a passivation layer 26 disposed on the second electrode layer 16, a colored barrier layer 28 disposed on the passivation layer 26, and colorization A backsheet passivation layer 30 disposed on the barrier layer 28. A passive film 24 may be formed on the surface of the cathode electrode layer (second electrode layer) 16 as shown in FIGS.

  On the other hand, as shown in FIGS. 28 to 30, the display area 2 and the character forming area 6 are the substrate 10, the transparent electrode layer (first electrode layer) 11 disposed on the substrate 10, and the first electrode layer 11. A passivation layer 26 disposed above, a colored barrier layer 28 disposed on the passivation layer 26, and a backsheet passivation layer 30 disposed on the colored barrier layer 28 are provided.

  The colored barrier layer 28 in the organic thin film solar cell forming region 4 is colored black by, for example, black Dye, and the colored barrier layer 28 in the character forming region 6 has a color different from black in order to arrange characters, For example, it is colored red.

  In addition, although illustration is abbreviate | omitted, the liquid crystal display (LCD: Liquid Crystal Display) or an organic EL (Electro Luminescence) display etc. can be formed in the board | substrate 10 corresponding to the display area | region 2, for example.

  An electronic device 300 having a tandem structure to which the organic thin-film solar cell according to the embodiment is applied includes a substrate 10 and an organic thin-film solar arranged on the substrate 10 via an adhesive layer 150 as shown in FIG. A battery forming region 4 is provided. The display area 2 is formed in the substrate 10. That is, in the electronic device 300 having a tandem structure to which the organic thin film solar cell according to the embodiment is applied, the substrate 10 and the organic thin film solar cell formation region 4 are separately formed, and these are formed in a tandem structure via the adhesive layer 150. It is arranged in the vertical type.

  Moreover, the in-cell structure electronic device 300 to which the organic thin film solar cell according to the embodiment is applied includes a substrate 10 and an organic thin film solar cell formation region 4 disposed on the substrate 10 as shown in FIG. With. That is, in the in-cell structure electronic device 300 to which the organic thin film solar cell according to the embodiment is applied, the organic thin film solar cell formation region 4 is formed in the in-cell structure on the substrate 10. An organic EL display or the like can be formed.

  The electronic device 200 to which the organic thin-film solar cell 1 according to the embodiment is applied corresponds to the electronic device 300 having an in-cell structure, as shown in FIGS. 27 to 30 and FIG.

  As described above, according to the present embodiment, an organic thin film solar cell that has a simple structure, reduces manufacturing steps, improves designability, and can be reduced in weight and thickness, a manufacturing method thereof, and an electronic device Equipment can be provided.

[Other embodiments]
As described above, the embodiments have been described. However, it should be understood that the descriptions and drawings constituting a part of this disclosure are illustrative and do not limit the present invention. From this disclosure, various alternative embodiments, examples and operational techniques will be apparent to those skilled in the art.

  As described above, the present invention includes various embodiments not described herein.

  The organic thin-film solar cell of the present invention has a simple structure, reduced production steps, improved design, and can be reduced in weight and thickness. Applicable to a wide range of fields such as energy systems.

DESCRIPTION OF SYMBOLS 1, 1A, 1B ... Organic thin film solar cell 2 ... Display area 4 ... Organic thin film solar cell formation area 6 ... Character formation area 10 ... Substrate (ITO substrate)
11 ... 1st electrode layer (anode electrode layer, transparent electrode layer)
12 ... hole transport layer 14 ... bulk heterojunction organic active layer 16 ... second electrode layer (cathode electrode layer)
24 ... Passive film (oxide film)
26, 31 ... Passivation layer 28 ... Colored barrier layer 29 ... Barrier layer 30 ... Back sheet passivation layer 33 ... Back sheet layer 60 ... Dropper 62 ... Spindle 63 ... Table 64 ... Droplet 150 ... Adhesive layer 200, 300 ... Electronic device

Claims (32)

A substrate,
A first electrode layer disposed on the substrate;
A hole transport layer disposed on the first electrode layer;
A bulk heterojunction organic active layer disposed on the hole transport layer;
A second electrode layer disposed on the bulk heterojunction organic active layer;
A passivation layer disposed on the second electrode layer;
A colored barrier layer disposed on the passivation layer;
An organic thin film solar cell comprising: a backsheet passivation layer disposed on the colored barrier layer.   2. The organic thin film solar cell according to claim 1, wherein the colored barrier layer is an ultraviolet curable resin.   The organic thin-film solar cell according to claim 2, wherein a coloring agent is added to the colored barrier layer.   The organic thin-film solar cell according to claim 1, wherein the passivation layer is a SiN film or a SiON film.   The organic thin-film solar cell according to claim 4, wherein the colored barrier layer is capable of covering spots formed on the passivation layer.   The organic thin-film solar cell according to claim 1, wherein the passivation layer and the colored barrier layer are repeatedly laminated to form a multi-layer protective film.   The organic thin-film solar cell according to claim 1, further comprising a passive film on a surface of the second electrode layer.   The organic thin film solar cell according to claim 7, wherein the passivation film is an oxide film of the second electrode layer.   9. The organic thin film solar cell according to claim 8, wherein the oxide film is formed by oxygen plasma treatment on a surface of the second electrode layer.   An organic thin-film solar cell, wherein a plurality of cells comprising the organic thin-film solar cell according to claim 1 are connected in series.   An electronic device provided with the organic thin-film solar cell of any one of Claims 1-9. A display area;
An organic thin-film solar cell formation region and a character formation region disposed in the periphery of the display region,
The organic thin film solar cell formation region is disposed on a substrate, a first electrode layer disposed on the substrate, a hole transport layer disposed on the first electrode layer, and the hole transport layer. A bulk heterojunction organic active layer, a second electrode layer disposed on the bulk heterojunction organic active layer, a passivation layer disposed on the second electrode layer, and a colorization barrier disposed on the passivation layer And a backsheet passivation layer disposed on the colored barrier layer,
The display area and the character forming area are disposed on the substrate, the first electrode layer disposed on the substrate, the passivation layer disposed on the first electrode layer, and the passivation layer. The colored barrier layer, and the backsheet passivation layer disposed on the colored barrier layer,
The electronic device, wherein the colored barrier layer corresponding to the organic thin film solar cell forming region and the colored barrier layer corresponding to the character forming region are colored.   The electronic device according to claim 12, wherein the colored barrier layer is an ultraviolet curable resin.   The electronic device according to claim 13, wherein a colorant is added to the colored barrier layer.   The electronic device according to claim 12, wherein the passivation layer is a SiN film or a SiON film.   The electronic device according to claim 15, wherein the colored barrier layer is capable of covering spots formed on the passivation layer.   The electronic device according to claim 12, wherein the passivation layer and the colored barrier layer are repeatedly laminated to form a multi-layer protective film.   The electronic apparatus according to claim 12, further comprising a passive film disposed on a surface of the second electrode layer.   19. The electronic device according to claim 12, wherein the colored barrier layer corresponding to the organic thin film solar cell formation region is colored black.   The electronic device according to claim 12, wherein the colored barrier layer corresponding to the character forming region is colored red.   21. The electronic apparatus according to claim 12, wherein a liquid crystal display or an organic electroluminescence display is disposed on the substrate corresponding to the display area.   The said electronic device is equipped with the said organic thin film solar cell formation area | region arrange | positioned through the contact bonding layer on the said board | substrate which has arrange | positioned the said display area | region, It has a tandem structure, The one of Claims 12-21 Item 1. An electronic device according to item 1.   The said electronic device is provided with the said organic thin-film solar cell formation area | region arrange | positioned on the said board | substrate which has arrange | positioned the said display area | region, It has an in-cell structure, The any one of Claims 12-21 characterized by the above-mentioned. Electronics. Forming a first electrode on a substrate;
Forming a hole transport layer on the first electrode layer;
Forming a bulk heterojunction organic active layer on the hole transport layer;
Forming a second electrode layer on the bulk heterojunction organic active layer;
Forming a passivation layer on the second electrode layer;
Forming a colored barrier layer on the passivation layer;
Forming a backsheet passivation layer on the colored barrier layer. A method for producing an organic thin-film solar cell, comprising:   The method of manufacturing an organic thin-film solar cell according to claim 24, wherein the colored barrier layer is an ultraviolet curable resin.   The method for producing an organic thin-film solar cell according to claim 24, wherein a coloring agent is added to the colored barrier layer.   The method for manufacturing an organic thin-film solar cell according to claim 24, wherein the passivation layer is a SiN film or a SiON film.   28. The method of manufacturing an organic thin film solar cell according to claim 27, wherein the colored barrier layer is capable of covering spots formed on the passivation layer.   The organic thin film according to any one of claims 24 to 28, further comprising a step of forming a multi-layered protective film by repeating the step of forming the passivation layer and the step of forming the colored barrier layer. A method for manufacturing a solar cell. The step of forming the second electrode layer includes:
30. The method of manufacturing an organic thin-film solar cell according to any one of claims 24 to 29, comprising a step of depositing a metal on the bulk heterojunction organic active layer.   The method for producing an organic thin-film solar cell according to any one of claims 24 to 30, further comprising a step of forming a passive film on the surface of the second electrode layer. The step of forming the passive film comprises
32. The method of manufacturing an organic thin-film solar cell according to claim 31, further comprising a step of performing oxygen plasma treatment on the second electrode layer.

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