JP2014145919A - Display device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a display device for suppressing the deterioration of reliability by reducing the occurrence of a noise in a detection signal of a detection electrode.SOLUTION: A display device 1 includes: a first substrate 21 and a second substrate 22 arranged so as to face each other; a detection electrode 211 arranged on a first main surface of the first substrate 21; a liquid crystal layer 23 arranged between the first substrate 21 and the second substrate 22; a plurality of gate wiring and a plurality of source wiring 224 arranged so as to cross each other on a main surface 22a of the second substrate 22; a second flattening layer 225 arranged on the first main surface 22a of the second substrate so as to cover the plurality of gate wiring and the plurality of source wiring 224 ; and a signal electrode 227 and a common electrode 226 arranged on the second flattening layer 225 so as to correspond to pixels. A shield electrode S surrounding the pixels is arranged on a second main surface 21b of the first substrate 21 so as to be overlapped with the gate wiring and the source wiring 224 .

Description

  The present invention relates to a display device used for various applications such as a mobile phone, a digital camera, a portable game machine, or a portable information terminal.

  Among the display devices, for example, a liquid crystal display device includes a first substrate having a display region on an outer main surface, a second substrate disposed with the inner main surfaces facing each other with respect to the first substrate, and a first substrate A liquid crystal layer disposed between the substrate and the second substrate, a plurality of gate wirings arranged along a certain direction on the inner main surface of the second substrate, and a plurality of gates on the inner main surface of the second substrate A plurality of source lines arranged to intersect the lines, an insulating film disposed on the inner main surface of the second substrate so as to cover the plurality of gate lines and the plurality of source lines, and an insulating film corresponding to the pixel A signal electrode and a common electrode disposed on the top;

  In addition, in such a liquid crystal display device, an input function is provided that is disposed on the outer main surface of the first substrate and further includes a detection electrode that detects a change in capacitance with an input means such as a finger. A liquid crystal display device is known (for example, see Patent Document 1).

JP 2008-134522 A

  In such a display device with an input function, an electric field generated from a voltage applied to the gate wiring and the source wiring may reach the detection electrode. However, since the voltage applied to the gate wiring and the source wiring fluctuates, the electric field generated from this voltage fluctuates, so that the detection signal voltage of the detection electrode fluctuates due to the fluctuation of the voltage applied to the gate wiring and the source wiring. As a result, noise may occur in the detection signal. If noise occurs in the detection signal, there is a problem that the detection sensitivity may be lowered or malfunction may occur, and the reliability of the display device may be lowered.

  The present invention has been made in view of the above problems, and an object of the present invention is to provide a display device that reduces the occurrence of noise in the detection signal of the detection electrode and suppresses the decrease in reliability. is there.

  A display device according to the present invention includes a first substrate having a display region and an input region overlapping the display region on an outer main surface, and a first substrate disposed with the inner main surfaces facing each other with respect to the first substrate. A detection electrode configured to detect a change in capacitance between the two substrates and the input unit disposed in the input region on the outer main surface of the first substrate and adjacent to the input region; and the first substrate And a plurality of display layers arranged along a certain direction in a display layer disposed in a region overlapping the display region between the second substrates and a region overlapping the display region on the inner main surface of the second substrate. A plurality of source wirings arranged on the inner main surface of the second substrate so as to intersect the plurality of gate wirings; and a plurality of gate wirings on the inner main surface of the second substrate. And arranged so as to cover the plurality of source wirings. A first display electrode disposed on the insulating film so as to correspond to a pixel surrounded by the plurality of gate lines and the plurality of source lines; and on the inner main surface of the second substrate. And a second display electrode disposed corresponding to the pixel, and a shield electrode surrounding the pixel overlaps the gate line and the source line on the inner main surface of the first substrate. It is arranged.

  According to the display device of the present invention, it is possible to reduce the occurrence of noise in the detection signal of the detection electrode, and to suppress the decrease in reliability.

It is a top view showing the display apparatus in the 1st Embodiment of this invention. It is sectional drawing along the II line | wire of FIG. FIG. 2 is a plan view illustrating a detection electrode, a detection wiring, and a first circuit board arranged on a first main surface of a first substrate in the display device of FIG. 1. It is sectional drawing along the II-II line of FIG. It is the top view which showed the shield electrode in the display apparatus of FIG. It is a top view showing the relationship between the electrode arrange | positioned on the 1st main surface of a 2nd board | substrate, the wiring, and the thin-film transistor, and the shield electrode arrange | positioned on the 2nd main surface of a 1st board | substrate in a display area. It is sectional drawing of the display apparatus along the III-III line | wire of FIG. It is sectional drawing which shows the principal part of the display apparatus in the 2nd Embodiment of this invention. It is sectional drawing which shows the principal part of the display apparatus in the 3rd Embodiment of this invention. It is a top view which shows the principal part of the display apparatus in the 4th Embodiment of this invention.

[First Embodiment]
A display device 1 according to a first embodiment of the present invention will be described with reference to FIGS.

  The display device 1 includes a display panel 2, a light source device 3 that emits light toward the display panel 2, a first polarizing plate 4 disposed on the display panel 2, and between the display panel 2 and the light source device 3. And a first circuit board 6, a second circuit board 7, and a driver IC 8 connected to the display panel 2.

  In the display panel 2, a first substrate 21 and a second substrate 22 are arranged to face each other, a liquid crystal layer 23 is disposed between the first substrate 21 and the second substrate 22, and the liquid crystal layer 23 is surrounded. In addition, a sealing material 24 for joining the first substrate 21 and the second substrate 22 is disposed.

The display panel 2 in the present embodiment adopts the liquid crystal layer 23 as a display layer for displaying image information in the display area E _D, not limited thereto, organic EL (Electro-Luminescence) A layer or the like may be employed.

The first substrate 21, first a first main surface 21a having an input region E _I overlapping the display area E _D and the display area E _D composed of a plurality of pixels P, the first major surface 21a positioned on the opposite side 2 And a main surface 21b. Examples of the material of the first substrate 21 include a material having translucency, such as glass. Note that the pixel P is a region surrounded by a plurality of gate lines 221 and a plurality of source lines 224.

On the first main surface 21a of the first substrate 21, a plurality of detection electrodes 211 arranged along the X direction and the Y direction, a plurality of detection wires 212 connected to the detection electrodes 211, and a Y direction The first insulating film 213 arranged to cover the connecting portions 211b of the detection electrodes 211 arranged and the plurality of detection wirings 212, the detection portions 211a of the detection electrodes 211 arranged in the Y direction, and the detection electrodes arranged in the X direction A second insulating film 214 disposed on the first insulating film 213 is located so as to cover 211.

A plurality of detecting electrodes 211 has a function of detecting a change in capacitance between the input means such as a finger close to the input region E _I. Plural detection electrodes 211 are arranged so as to overlap the input region E _I. The detection electrode 211 has a plurality of diamond-shaped detection parts 211a and a connection part 211b for connecting adjacent detection parts 211a. The shapes and sizes of the detection unit 211a and the connection unit 211b are not particularly limited. A detection electrode 211 in which a plurality of detection units 211a are connected in the Y direction by a connection unit 211b is arranged in the X direction. A detection electrode 211 in which a plurality of detection units 211a are connected in the X direction by a connection unit 211b is arranged in the Y direction. In this embodiment, the connection part 211b of the detection electrode 211 arranged in the X direction and the connection part 211b of the detection electrode 211 arranged in the Y direction intersect.

As shown in FIGS. 4 and 5, in the detection electrodes 211 arranged in the X direction, the detection part 211 a and the connection part 211 b are arranged on the first insulating film 213. As shown in FIGS. 4 and 5, in the detection electrodes 211 arranged in the Y direction, the detection unit 211 a is disposed on the first insulating film 213, and the connection unit 211 b is the first main body of the first substrate 21. Arranged on the surface 21a. The connecting portion 211b located on the first main surface 21a of the first substrate 21 and the detecting portion 211a located on the first insulating film 213 are connected via a contact hole penetrating the first insulating film 213. . The detection electrode 211 arranged in the X direction and the detection electrode 211 arranged in the Y direction cross three-dimensionally through the first insulating film 213,
It is electrically insulated.

Examples of the material of the detection electrode 211 include those having translucency and conductivity.
It is formed of TO (Indium Tin Oxide), IZO (Indium Zinc Oxide), ATO (Antimony Tin Oxide), AZO (Al-Doped Zinc Oxide), tin oxide, zinc oxide or a conductive polymer.

The detection wiring 212 is disposed on the first main surface 21 a of the first substrate 21. One end of the detection wiring 212 is electrically connected to the detection electrode 211. The other end of the detection wiring 212 is electrically connected to the electrode terminal of the first circuit board 6. The detection wiring 212 includes a display area E _D and an input area E.
It is arranged in an outer region located outside _I. Examples of the material of the detection wiring 212 include a conductive material, such as ITO, tin oxide, aluminum, aluminum alloy, silver, or silver alloy.

The first insulating film 213 has a function of electrically insulating the intersecting detection electrodes 211 from each other. The first insulating film 213 is disposed so as to overlap the display area E _D , the input area E _I and the outer area.
The first insulating film 213 is disposed on the first main surface 21a of the first substrate 21 so as to cover the connection portions 211b of the detection electrodes 211 and the plurality of detection wirings 212 arranged in the Y direction. Examples of the material of the first insulating film 213 include materials having translucency and insulating properties, such as acrylic resin.

The second insulating film 214 is disposed on the first insulating film 213 so as to cover the detection portions 211a of the detection electrodes 211 arranged in the Y direction and the detection electrodes 211 arranged in the X direction. The second insulating film 214 is disposed so as to overlap the display area E _D , the input area E _I and the outer area.

  Next, the detection principle of the input position will be described.

In the input area E _I , a plurality of detection electrodes 211 are arranged in the X direction and the Y direction. For example, when a plurality of detection electrodes 211 arranged in the X direction are set to a constant potential such as a ground and a voltage is applied to the plurality of detection electrodes arranged in the Y direction, an electric field is generated between the adjacent detection electrodes 211. In this state, when the input means approaches the input region E _I, a change in the magnitude of the electric field between the plurality of detection electrodes 211 located in the region where the input means close. The voltage changes as the electric field changes,
This voltage change is read as a detection signal by a controller (not shown) as detection means. The controller recognizes a plurality of detection electrodes 211 having a voltage change exceeding a predetermined value, and an area where the recognized plurality of detection electrodes 211 are arranged is specified as an input position.

  On the second main surface 21b of the first substrate 21, a shield electrode S, a light shielding film 216, a color filter 217, and a first planarization film 218 are disposed.

The shield electrode S has a function of shielding an electric field generated from a voltage applied to the gate wiring 221 and the source wiring 224 located on the first main surface 22 a of the second substrate 22. As shown in FIG. 5, with the shield electrode S is disposed in a region overlapping the display region E _D and an input region E _I, a region that overlaps the outer region located outside the display region E _D and an input region E _I Has been placed. In the present embodiment, the shield electrode S that overlaps the display region E _D , the input region E _I, and the outer region is disposed on the second main surface 21 b of the first substrate 21.

In FIG. 5, the formation region of the shield electrode S that overlaps the display region E _D and the input region E _I is a region indicated by lattice lines. In FIG. 5, the formation region of the shield electrode S that overlaps the outer region is a region indicated by hatching.

As shown in FIG. 6, the shield electrode S that overlaps the display area E _D and the input area E _I is disposed so as to overlap the gate line 221 and the source line 224. The shield electrode S is disposed so as to surround the pixel P. That is, the shield electrode S is not disposed so as to overlap all the pixels P. The shield electrode S is formed in a lattice shape in plan view. Further, the shield electrode S overlaps the detection electrode 211 disposed on the first main surface 21a of the first substrate 21 in plan view. In FIG. 6, the formation region of the shield electrode S is a region indicated by oblique lines (broken lines).

A part of the shield electrode S overlapping the display area E _D and the input area E _I may be disposed in the pixel P. Further, the entire shield electrode S may be disposed in the formation region of the gate wiring 211 and the source wiring 224, whereby the shield electrode S is connected to the pixel P.
Since the shield electrode S is not disposed within the light source device 3, the shielding electrode S can be prevented from blocking light from the light source device 3, and a decrease in the transmittance of the pixel P can be suppressed.

The shield electrode S that overlaps the outer region overlaps the plurality of detection wires 212. That is,
The shield electrode S extends to a region that overlaps the outer region and overlaps the plurality of detection wirings 212. The shield electrode S also overlaps the electrode terminal of the first circuit board 6. Further, as shown in FIG. 5, in this embodiment, it is formed into an annular shape so as to shield electrode S overlaps the outer region surrounds the display region E _D and an input region E _I.

The shield electrode S of this embodiment is electrically connected to the common electrode 226. The shield electrode S may be connected to a constant potential such as a ground potential. The shield electrode S may be floating.

  The material of the shield electrode S is formed of a conductive material. The material of the shield electrode S is, for example, a light-transmitting material such as ITO, IZO, ATO, AZO, tin oxide, zinc oxide, or aluminum, molybdenum, titanium, neodymium, chromium, copper, or an alloy containing these. However, the material is not limited to these as long as the material has conductivity. When an opaque material is used as the material of the shield electrode S, the shield electrode S can be used as the light shielding film 216, so that the number of parts can be reduced.

The light shielding film 216 has a function of shielding light. The light shielding film 216 is disposed on the second main surface 21 b of the first substrate 21. Further, the light shielding film 216 of the present embodiment is disposed so as to cover the shield electrode S. That is, the light shielding film 216 overlaps the shield electrode S. The light shielding film 216 is disposed so as to overlap the gate wiring 221 and the source wiring 224 in plan view, that is, disposed so as to surround the pixel P. Further, the light shielding film 216 of the present embodiment also overlaps the auxiliary capacitance wiring 222. Note that the light shielding film 216 in the present embodiment is formed in a lattice shape so as to overlap the shield electrode S, but is not limited thereto.

In addition, the entire shield electrode S may be disposed in the formation region of the light shielding film 216, whereby the decrease in the transmittance of the pixel P due to the shield electrode S can be reduced. Further, the shield electrode S of the present embodiment is in contact with the light shielding film 216.

Examples of the material of the light shielding film 216 include a resin to which a dye or pigment having a high light shielding property (for example, black) is added, or a metal such as chromium.

The color filter 217 has a function of transmitting only a specific wavelength of visible light. The plurality of color filters 217 are located on the second main surface 21 b of the first substrate 21 and are provided for each pixel P. Each color filter 217 has one of red (R), green (G), and blue (B). In addition, the color filter 217 is not limited to the above color, and for example, yellow (
Y), white (W) and the like. Examples of the material of the color filter 217 include a resin to which a dye or a pigment is added.

The first planarizing film 218 is disposed on the second main surface 21b of the first substrate 21 so as to cover the shield electrode S, the light shielding film 216, and the color filter 217. The first planarization film 218 is disposed so as to overlap the display area E _D , the input area E _I and the outer area. The first planarization film 218 is formed of an organic material, and examples thereof include an acrylic resin, an epoxy resin, and a polyimide resin.

  The second substrate 22 has a first main surface 22a facing the second main surface 21b of the first substrate 21, and a second main surface 22b located on the opposite side of the first main surface 22a. The second substrate 22 can be formed of the same material as the first substrate 21.

On the first main surface 22 a of the second substrate 22, a plurality of gate wirings 221 and auxiliary capacitance wirings 222 are arranged, and the gate insulating film 223 covers the plurality of gate wirings 221 and auxiliary capacitance wirings 222.
Is arranged. A source wiring 224 is disposed on the gate insulating film 223, and a second planarization film 225 is disposed on the gate insulating film 223 so as to cover the source wiring 224. A common electrode 226 and a signal electrode 227 are disposed on the second planarizing film 225.

The gate wiring 221 has a function of applying a voltage supplied from the driver IC 8 to the thin film transistor TFT. As shown in FIG. 6, the gate wiring 221 is formed on the first main surface 22 a of the second substrate 22 with X.
Extends in the direction. The plurality of gate wirings 221 are arranged along the Y direction. The gate wiring 221 is formed of a conductive material, for example, aluminum, molybdenum, titanium, neodymium, chromium, copper, or an alloy containing these.

  The gate wiring 221 is formed by the following method, for example.

First, a metal material is formed as a metal film on the first main surface 22a of the second substrate 22 by sputtering, vapor deposition, or chemical vapor deposition. A photosensitive resin is applied to the surface of the metal film, and a pattern having a desired shape is formed on the photosensitive resin by performing exposure processing and development processing on the applied photosensitive resin. Next, the metal film is etched with a chemical solution to make the metal film into a desired shape, and then the applied photosensitive resin is peeled off. Thus, the gate wiring 221 can be formed by forming and patterning a metal material.

The auxiliary capacitance line 222 is disposed on the first main surface 22 a of the second substrate 22. Further, as shown in FIG. 6, the auxiliary capacitance line 222 extends in the X direction on the first main surface 22 a of the second substrate 22. Also,
In this embodiment, the auxiliary capacitance line 222 is electrically connected to the common electrode 226, that is, the auxiliary capacitance line 222 is set to a constant potential. The auxiliary capacitance line 222 is located on the same plane as the gate line 221. The auxiliary capacitance line 222 may be formed of the same material as the gate line 221. Note that the auxiliary capacitance line 222 may be arranged in a layer different from the gate line 221.

The gate insulating film 223 is disposed on the first main surface 22 a of the second substrate 22 so as to cover the gate wiring 221. The gate insulating film 223 is formed using an insulating material such as silicon nitride or silicon oxide. The gate insulating film 223 can be formed on the first main surface 22a of the second substrate 22 by the above-described sputtering method, vapor deposition method, chemical vapor deposition method, or the like.

  The source wiring 224 has a function of applying a signal voltage supplied from the driver IC 8 to the signal electrode 227 via the thin film transistor TFT. As shown in FIG. 6, the plurality of source lines 224 extend in the Y direction. The plurality of source lines 224 are arranged along the X direction on the gate insulating film 223. The source wiring 224 may be formed using the same material as the gate wiring 221. The source wiring 224 can be formed by a method similar to that for the gate wiring 221.

The thin film transistor TFT includes a semiconductor layer such as amorphous silicon, polysilicon, or an oxide semiconductor, a source electrode provided on the semiconductor layer, connected to the source wiring 224, and a drain electrode. In the thin film transistor TFT, the resistance of the semiconductor layer between the source electrode and the drain electrode changes according to the voltage applied to the semiconductor layer via the gate wiring 221, whereby writing or non-writing of the image signal to the signal electrode 227 is performed. Be controlled.

The second planarizing film 225 has a function of planarizing the first main surface 22a of the second substrate 22. First
A material similar to that of the planarization film 218 may be used. The film thickness of the second planarizing film 225 is set in the range of 1 μm to 5 μm, for example, but is preferably set to 2 μm or less.

The common electrode 226 has a function of generating an electric field with the signal electrode 227 by a voltage applied from the driver IC 8. The common electrode 226 is disposed on the second planarization film 225 and is disposed across the plurality of pixels P. In the present embodiment, the common electrode 226 is set to a constant potential. Similarly to the shield electrode S, the common electrode 226 is formed of a light-transmitting and conductive material, and is formed of, for example, ITO, IZO, ATO, AZO, tin oxide, zinc oxide, or a conductive polymer.

  The signal electrode 227 has a function of generating an electric field with the common electrode 226 by a voltage applied from the driver IC 8. The plurality of signal electrodes 227 are disposed on the second planarization film 225 and are located for each pixel P. Further, common electrodes 226 are located on both sides of the signal electrode 227 in the X direction. That is, the signal electrodes 227 and the common electrodes 226 are alternately positioned in the X direction. The width of the signal electrode 227 is set in the range of 2 μm to 5 μm, for example. The distance from the common electrode 226 is set in the range of 5 μm to 20 μm, for example. The signal electrode 227 may be formed of the same material as the common electrode 226.

  In the present embodiment, the signal electrode 227 and the common electrode 226 are located on the same plane, but the present invention is not limited to this. In other words, each of the signal electrode 227 and the common electrode 226 may be disposed on a different layer on the second substrate 22 by interposing an insulating film between the signal electrode 227 and the common electrode 226.

  The liquid crystal layer 23 is provided between the first substrate 21 and the second substrate 22. The liquid crystal layer 23 includes nematic liquid crystal or the like.

The sealing material 24 has a function of bonding the first substrate 21 and the second substrate 22 together. The sealing material 24 is disposed between the first substrate 21 and the second substrate 22. Sealing material 24 is provided so as to surround the region overlapping the display area E _D. The sealing material 24 is formed of an epoxy resin or the like.

In the display device 1, the shield electrode S is disposed on the second main surface 21 b of the first substrate 21 so as to overlap the gate wiring 221 and the source wiring 224. As a result, even if the voltage applied to the gate wiring 221 and the source wiring 224 fluctuates during image display, the electric field generated from this voltage is shielded by the shield electrode S. Reaching the detection electrode 211 arranged on the first main surface 21a can be reduced. Therefore, the generation of noise in the detection signal of the detection electrode 211 can be reduced, the detection sensitivity can be reduced and the occurrence of malfunction can be suppressed, and the deterioration of the reliability of the display device can be suppressed.

  In the display device 1, the shield electrode S surrounds the pixel P. That is, the pixel P has a region where the shield electrode S is not formed. As a result, it is possible to reduce the shielding of the light from the light source device 3 by the shield electrode S as compared with the case where the shield electrode S is disposed so as to overlap the entire pixel P, so that the transmittance of the pixel P is improved. , Display quality is improved.

Further, in the display device 1, the shield electrode S electrically connected to the common electrode 226 is the first.
Arranged on the second main surface 21 b of the substrate 21. Here, when the shield electrode S electrically connected to the common electrode 226 is disposed close to the signal electrode 227, an electric field is generated between the shield electrode S and the signal electrode 227, and this electric field is generated in the liquid crystal layer 23. It may affect the alignment of liquid crystal molecules. Therefore, by arranging the shield electrode S connected to the common electrode 226 on the second main surface 21b of the first substrate 21 and separating the shield electrode S from the signal electrode 227, the shield electrode S and the signal electrode 227 are separated. The influence of the electric field on the liquid crystal layer 23 can be reduced.

The first circuit board 6 is connected to a plurality of detection wirings 212 through a conductive bonding member.
A part of the first circuit board 6 faces the first board 21. The first circuit board 6 has a base, a wiring pattern, and electrode terminals. The electrode terminal is connected to the electrode terminal via a conductive bonding member. This electrode terminal overlaps the shield electrode S. The electrode terminal is made of a conductive material, such as copper.

  The second circuit board 7 is connected to the second board 22 via a conductive bonding member. A part of the second circuit board 7 faces the second board 22.

  The light source device 3 has a function of emitting light toward the display panel 2. The light source device 3 includes a light source 31 and a light guide plate 32. In the light source device 3 according to the present embodiment, a point light source such as an LED is employed as the light source 31, but a linear light source such as a cold cathode tube may be employed.

  The first polarizing plate 4 has a function of selectively transmitting light in a predetermined vibration direction. The first polarizing plate 4 is disposed so as to face the first main surface 21 a of the first substrate 21 of the display panel 2.

  The second polarizing plate 5 has a function of selectively transmitting light in a predetermined vibration direction. The second polarizing plate 5 is disposed so as to face the second main surface 22 b of the second substrate 22.

The driver IC 8 has a function of controlling driving of the gate wiring 221 and the source wiring 224. The driver IC 8 is provided on the first main surface 21 a of the second substrate 22.

[Second Embodiment]
FIG. 8 is a cross-sectional view illustrating a main part of the display device 1A according to the second embodiment.

The display device 1A differs from the display device 1 in that a light shielding film 216 is interposed between the second main surface 21b of the first substrate 21 and the shield electrode S.

In the display device 1A, since the shield electrode S is disposed on the light shielding film 216, the distance between the shield electrode S and the gate wiring 221 and the distance between the shield electrode S and the source wiring 224 are reduced. The electric field generated from the voltage applied to the wiring 224 is easily shielded by the shield electrode S. Therefore, generation of noise in the detection signal of the detection electrode 211 can be reduced.

  Note that the shield electrode S in the present embodiment is preferably floating. When the distance between the shield electrode S and the gate wiring 221 and the distance between the shield electrode S and the source wiring 224 are reduced, an electric field is generated between the shield electrode S and the signal electrode 227 when a constant potential is applied to the shield electrode S. This electric field may affect the liquid crystal layer 23. Therefore, by making the shield electrode S floating, it is possible to reduce the occurrence of an electric field between the shield electrode S and the signal electrode 227, and to reduce the influence on the liquid crystal layer 23.

[Third Embodiment]
FIG. 9 is a cross-sectional view illustrating a main part of the display device 1B according to the third embodiment.

The display device 1 </ b> B is different from the display device 1 in that the shield electrode S is disposed on the first planarization film 218.

In the display device 1B, since the shield electrode S is disposed on the first planarization film 218, the distance between the shield electrode S and the gate wiring 221 and the distance between the shield electrode S and the source wiring 224 are reduced. The electric field generated from the voltage applied to 221 and the source wiring 224 is easily shielded by the shield electrode S. Therefore, generation of noise in the detection signal of the detection electrode 211 can be reduced.

  Note that the shield electrode S in the present embodiment is preferably floating. When the distance between the shield electrode S and the gate wiring 221 and the distance between the shield electrode S and the source wiring 224 are reduced, an electric field is generated between the shield electrode S and the signal electrode 227 when a constant potential is applied to the shield electrode S. This electric field may affect the liquid crystal layer 23. Therefore, by making the shield electrode S floating, it is possible to reduce the occurrence of an electric field between the shield electrode S and the signal electrode 227, and to reduce the influence on the liquid crystal layer 23.

[Fourth Embodiment]
FIG. 10 is a cross-sectional view showing a main part of a display device 1C according to the fourth embodiment.

The display device 1 </ b> C is different from the display device 1 in that an AC potential is applied to the auxiliary capacitance line 222 and the shield electrode S overlaps the auxiliary capacitance line 222.

  In the present embodiment, since the AC potential is applied to the auxiliary capacitance wiring 222, the voltage applied to the auxiliary capacitance wiring 222 varies.

On the other hand, in the display device 1 </ b> C, the shield electrode S is disposed so as to overlap the auxiliary capacitance line 222. As a result, even when the voltage applied to the auxiliary capacitance line 222 fluctuates, the electric field generated from this voltage can be shielded by the shield electrode S, so that the electric field is arranged on the first main surface 21a of the first substrate 21. Reaching the detection electrode 211 can be reduced.

  The present invention is not particularly limited to the first to fourth embodiments, and various modifications and improvements can be made within the scope of the gist of the present invention.

1, 1A, 1B, 1C display device 2 display panel E _D display region P pixel E _I input region
21 First board
21a First main surface (outer main surface)
21b Second main surface (outer main surface)
211 Sensing electrode
211a detector
211b connection
212 Detection wiring
213 First insulating film
214 2nd insulating film S Shield electrode
216 Shading film
217 color filter
218 First planarization film
22 Second board
22a First main surface (inner main surface)
22b Second main surface (outer main surface)
221 Gate wiring
222 Auxiliary capacitance wiring
223 Gate insulation film
224 source wiring
225 Second planarization film (insulating film)
226 Common electrode (second display electrode)
227 Signal electrode (first display electrode)
TFT thin film transistor
23 Liquid crystal layer (display layer)
24 Sealing material 3 Light source device
31 Light source
32 Light guide plate 4 First polarizing plate 5 Second polarizing plate 6 First circuit board 7 Second circuit board 8 Driver IC

Claims (4)

A first substrate having a display region and an input region overlapping the display region on an outer main surface; a second substrate disposed with the inner main surfaces facing each other with respect to the first substrate; and the first substrate Between the first substrate and the second substrate, and a detection electrode that is disposed in the input region on the outer main surface of the first electrode and detects a change in capacitance between the input means adjacent to the input region A display layer disposed in a region overlapping the display region, a plurality of gate lines arranged along a certain direction in a region overlapping the display region on the inner main surface of the second substrate, and the second substrate A plurality of source wirings arranged on the inner main surface of the second substrate so as to intersect with the plurality of gate wirings, and a plurality of the gate wirings and the plurality of source wirings on the inner main surface of the second substrate. Insulating film arranged so that the insulation A first display electrode disposed corresponding to the pixel surrounded by the plurality of gate lines and the plurality of source lines; and disposed on the inner main surface of the second substrate corresponding to the pixel. A second display electrode,
A display device, wherein a shield electrode surrounding the pixel is arranged on the inner main surface of the first substrate so as to overlap the gate wiring and the source wiring. A wiring for detection connected to the detection electrode, disposed in the outer region located outside the display region and the input region on the outer main surface of the first substrate;
The display device according to claim 1, wherein the shield electrode extends to a region overlapping the outer region and overlaps with the detection wiring.   The display device according to claim 1, wherein a light shielding film is interposed between the inner main surface of the first substrate and the shield electrode so as to overlap the display region.   The display device according to claim 1, wherein a light shielding film is disposed on the shield electrode so as to overlap the display region.

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