JP2013084751A - Defect repair method and defect repair device for photovoltaic element - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a defect repair method capable of improving a manufacturing yield and increasing a production efficiency by preliminarily insulating places that may be short-circuited resulting from defects caused by pinholes to prevent electrical short circuit independently of a size, the number, and distribution of the pinholes, in a manufacturing step of a thin-film solar battery.SOLUTION: A defect repair method includes: a defect detection step of detecting a pinhole 20 penetrating through two semiconductor layers 13 and 14 before laminating a second electrode layer 15, in a photovoltaic element 10 formed by sequentially laminating a first electrode layer 12 having light transmissivity, the two semiconductor layers 13 and 14 and the second electrode layer 15 on an insulation substrate 11 having light transmissivity; and a material application step of discharging an insulation material 41 by the use of an ink jet head 40 to a presence position of the pinhole 20 detected in the defect detection step.

Description

  The present invention relates to a photovoltaic device defect repairing method and a defect repairing device for repairing a defective portion generated in a semiconductor layer for photoelectric conversion in a photovoltaic device such as a thin film solar cell.

  In recent years, photovoltaic elements, that is, solar cells, are used in various places because of increasing interest in environmental problems. As solar cell types, a wide variety of solar cells such as crystalline solar cells, amorphous solar cells, and compound semiconductor solar cells have been developed. Among these, amorphous silicon solar cells that can make effective use of silicon materials have excellent properties such as large area, easy thinning, and high light absorption coefficient, although the conversion efficiency is not as good as that of crystalline solar cells. doing.

In general, a thin film solar cell has a structure in which a semiconductor layer is sandwiched between two electrode layers. A transparent conductive film is formed on the surface on the light incident side of both surfaces in the thickness direction of the semiconductor layer, and a back electrode film made of metal or the like is formed on the other surface. For example, Al or Ag is used for the back electrode, and SnO ₂ (tin oxide), ITO (indium tin oxide), ZnO (zinc oxide), or the like is used for the transparent electrode film. As the semiconductor layer, a tandem solar cell having a structure in which a microcrystalline silicon film having a pin structure or an amorphous silicon film is stacked has become the mainstream.

  In the manufacturing process of such a photovoltaic device, dust or dust adheres at the time of film formation of the semiconductor layer, and dust or dust attached at the manufacturing stage peels off later, or internal stress of the film in the semiconductor layer Due to poor adhesion to the transparent electrode, defects such as pinholes may occur in the semiconductor layer. It is known that when a back electrode film made of metal is formed at such a defective portion, an electrical short circuit occurs at the defective portion, and the photoelectric conversion efficiency of the manufactured photovoltaic device is reduced. Yes.

  For example, Patent Documents 1 to 4 disclose conventional techniques for removing such a defective portion that causes an electrical short circuit.

  In Patent Document 1, a reverse bias voltage is applied to the semiconductor layer within a withstand voltage range via two electrodes sandwiching the semiconductor layer, and a short circuit occurs locally in the semiconductor layer. There has been proposed a method of removing a short-circuit defect by causing a current to flow to cause the Joule heat to thermally oxidize or scatter the material of the short-circuit defect.

  Patent Document 2 proposes a method of closing a pinhole portion of a semiconductor layer that may cause a short-circuit defect with a photoresist before forming a back electrode. Specifically, after a semiconductor layer was formed on the transparent electrode formed on the transparent substrate, a photoresist was applied on the semiconductor layer, and light was applied from the transparent substrate side to flow into the pinhole portion. After curing only the photoresist, development, rinsing, and photoresist baking are performed, and only the pinhole portion is closed with the cured photoresist.

  In Patent Document 3, a photovoltaic device is immersed in an electrolyte solution, and an electric field is applied to oxidize a defective portion based on a polycrystalline grain boundary or lattice mismatch of a semiconductor layer to etch the defective portion. Then, overetching is performed larger than the diameter of the pinhole, a space is formed in the transparent electrode, and the occurrence of leakage can be prevented by removing the defect.

  In Patent Document 4, after the semiconductor is formed, the semiconductor layer is irradiated with light to charge the surface of the semiconductor layer, and fine particles charged to a charge opposite to that of the charged semiconductor layer are applied to the surface of the semiconductor layer. Charged fine particles are attached to the surface of a normal part other than the above, and an insulating film is formed on the surface of the defective part of the semiconductor layer where the charged fine particles are not attached using the attached charged fine particles as a mask.

JP-A-11-204816 JP 59-35485 A Japanese Patent No. 2966332 JP-A-6-275856

  Although the method disclosed in Patent Document 1 has the advantage of being inexpensive and easy to implement, depending on conditions such as reverse bias voltage application time, application method, voltage value, etc. There is a problem that the insulation state is not necessarily obtained in the vicinity.

  For example, when the insulation area of the short-circuit defect portion is large, the amount of Joule heat generated per unit area becomes small, and the material of the short-circuit defect portion may not be scattered. Also, in the process of applying the reverse bias voltage, by applying a voltage higher than the withstand voltage of the semiconductor layer, the photovoltaic element itself may be destroyed, or Joule heat may cause short circuit defects. The concentration may be excessively concentrated on the semiconductor layer, and the scattering may be biased only to the semiconductor, and the direct short circuit portion may be further expanded between the first electrode and the second electrode. Furthermore, when the short-circuit defect portions are densely distributed in the photovoltaic element, current flows in a distributed manner in each short-circuit defect portion, so that a sufficient current flows to scatter the material of the short-circuit defect portion. In some cases, the short circuit cannot be resolved.

  In addition, the method disclosed in Patent Document 2 includes a wet process such as a resist development process and a resist removal process before the back electrode layer is formed. Therefore, the organic substance contained in the resist material is a cause. There is a problem that it is difficult to form a good conduction state between the semiconductor layer and the back electrode layer. In addition, there is a problem that internal stress may be generated in the semiconductor layer and film peeling may occur in the wet process or the dry process.

  Further, the method disclosed in Patent Document 3 makes it difficult to enter the pinhole when the pinhole diameter is small, and further requires complicated processing steps, and the apparatus for that purpose is large. As a result, there is a problem that the photovoltaic element to be manufactured may be expensive.

  In addition, the method disclosed in Patent Document 4 requires a complicated processing step, and it is necessary to apply charged fine particles to the entire surface of the substrate, resulting in a problem that the photovoltaic device to be manufactured is expensive. . Furthermore, when removing charged fine particles adhering to the surface of normal parts other than defective parts, new pinholes may be generated due to internal stress of the semiconductor layer film and poor adhesion to the transparent electrode. There is also a problem that becomes high.

  The present invention has been made to solve the above problems, and in the manufacturing process of a thin film solar cell, a location that can be short-circuited due to defects due to pinholes, regardless of the size, number and distribution of pinholes. An object of the present invention is to provide a defect repair method and a defect repair apparatus capable of improving the manufacturing yield and increasing the production efficiency by insulating in advance and preventing an electrical short circuit.

The present invention provides a defect in the semiconductor layer of a photovoltaic element formed by sequentially laminating at least a first electrode layer having a light transmitting property, a semiconductor layer, and a second electrode layer on a substrate having a light transmitting property. A defect repair method for repairing
A defect detection step of detecting defects in the semiconductor layer before laminating the second electrode layer;
A defect repairing method comprising: a material application step of discharging an insulating material using an ink jet head to the presence position of the defect detected in the defect detection step.

  According to the present invention, in the defect detection step, a defect in the semiconductor layer is detected by applying light from a side opposite to the side on which the first electrode layer is laminated of the substrate and using light transmitted through the substrate. It is characterized by doing.

According to the present invention, the semiconductor layer has a plurality of different semiconductor layers,
In the defect detection step, a defect in the semiconductor layer is detected by comparing a detection value of light transmitted through the substrate with a predetermined threshold value.

  Further, the invention is characterized in that, in the material application step, the ink jet head is scanned to discharge the insulating material.

  In the invention, it is preferable that the insulating material discharged from the inkjet head is an ultraviolet curable resin.

  In addition, the present invention includes a step of performing a laser scribing process on the semiconductor layer after the material application step and before the second electrode layer is stacked.

The present invention further includes a transporting step of transporting the substrate to be processed before the second electrode layer is laminated by a predetermined feed amount,
The laser scribing process is performed after the transfer step and the defect detection step and the material application step for the region corresponding to the feed amount transferred in the transfer step on the substrate are repeated.

The present invention also provides a defect in the semiconductor layer of a photovoltaic element formed by sequentially laminating at least a first electrode layer having a light-transmitting property, a semiconductor layer, and a second electrode layer on a substrate having a light-transmitting property. A defect repair device for repairing
Transport means for transporting the substrate before the second electrode layer is laminated;
Detecting means for detecting defects in the semiconductor layer;
Discharging means for discharging the insulating material in a non-contact manner against defects in the semiconductor layer;
A defect repairing apparatus comprising: a control unit that controls the ejection unit so that an insulating material is ejected to a position where the defect detected by the detection unit exists.

In the present invention, the detecting means comprises:
A light emitting means provided on a side opposite to the side on which the first electrode layer of the substrate is laminated, and irradiating the substrate with light;
And a light receiving means provided on a side of the substrate on which the first electrode layer is laminated and receiving light from the light emitting means.

  The present invention is further characterized by further comprising a discriminating unit for discriminating the type of defect based on the luminance received by the light receiving unit.

  According to the present invention, before laminating the second electrode layer, a required amount of insulating material is discharged in a non-contact manner from the film surface of the semiconductor layer to a position where a defect such as a pinhole in the semiconductor layer exists. A defect can be repaired regardless of the size and number of defects. Thereby, the electrical short circuit in a defective part can be prevented and the fall of the conversion efficiency of the photovoltaic device manufactured can be suppressed. Moreover, the insulating material required for repairing a defect can be reduced compared with the past, and the material cost concerning manufacture can be suppressed.

  Further, according to the present invention, the light irradiated from the side opposite to the side on which the first electrode layer of the substrate is laminated passes through the pinhole serving as the short-circuit defect portion, and the first electrode layer of the substrate is laminated. Is detected on the other side. Thereby, the position of the defect can be easily detected.

  According to the present invention, in the case where the photovoltaic element has a tandem structure having semiconductor layers having different absorption wavelengths, by providing a predetermined threshold for the detected value of light transmitted through the pinhole portion, It can be easily determined whether the semiconductor layer is peeled off or whether all the semiconductor layers are peeled off.

  According to the present invention, defects can be repaired in substantially the same processing time regardless of the number of defects occurring in the semiconductor layer.

  Further, according to the present invention, since the insulating material can be cured with almost no heat applied to the photovoltaic element itself, it is possible to prevent the photovoltaic element from being damaged in the defect repair process.

  Further, according to the present invention, when the laser scribing process is performed on the semiconductor layer before the defect detection step, the scribe line when the semiconductor layer is laser scribed is detected in the defect detection step in the same manner as the pinhole. To solve the problem that it is necessary to control the inkjet head so that the insulating material is not discharged onto the scribe line in the coating process, and further, the problem that it is difficult to detect a pinhole near the scribe line in the defect detection process. Can do.

  In addition, according to the present invention, the defect detection process and the material application process are performed while the substrate is conveyed by a predetermined amount, so that the defect repair process can be performed using an inline type apparatus.

  Further, according to the present invention, defects such as pinholes in the semiconductor layer can be easily detected, and the insulating material can be discharged in a non-contact manner from the film surface of the semiconductor layer to the position where the defect exists.

  Further, according to the present invention, the position where a defect exists in a semiconductor layer can be easily identified from light transmitted through the semiconductor layer.

  According to the present invention, in the case where the photovoltaic element has a tandem structure having semiconductor layers having different absorption wavelengths, by providing a predetermined threshold for the detected value of light transmitted through the pinhole portion, It can be easily determined whether the semiconductor layer is peeled off or whether all the semiconductor layers are peeled off.

It is sectional drawing in the normal location of the photovoltaic element 10 of the process target by the defect repair apparatus 50 which concerns on one Embodiment of this invention. It is sectional drawing which shows the manufacturing process of the photovoltaic element 10, and has shown typically a mode that the pinhole 20 generate | occur | produces. It is sectional drawing which shows the manufacturing process of the photovoltaic element 10 including the defect repair method which concerns on this embodiment. 1 is a front view schematically showing a defect repair device 50 according to an embodiment of the present invention. It is a side view which shows schematically the defect repair apparatus 50 which concerns on one Embodiment of this invention. It is a top view which shows schematically the defect repair apparatus 50 which concerns on one Embodiment of this invention. 2 is a block diagram of a defect repair device 50. FIG. It is a flowchart which shows an example of the defect repair process by the defect repair apparatus 50 which concerns on this embodiment. It is a flowchart which shows the other example of the defect repair process by the defect repair apparatus 50 which concerns on this embodiment.

  FIG. 1 is a cross-sectional view of a normal portion of a photovoltaic element 10 to be processed by a defect repair apparatus 50 according to an embodiment of the present invention. Here, the normal location in the photovoltaic element 10 is a location where no defects such as pinholes have occurred.

  A photovoltaic element 10 shown in FIG. 1 is, for example, an amorphous silicon solar cell, and specifically, a first electrode having translucency on one surface in a thickness direction of an insulating substrate 11 having translucency. The layer 12, the first semiconductor layer 13, the second semiconductor layer 14, and the second electrode layer 15 are sequentially stacked, and finally sealed with an insulating resin 16.

As the insulating substrate 11, a glass substrate having heat resistance and translucency in the subsequent film formation process, a resin substrate such as polyimide, and the like can be used. The first electrode layer 12 is made of a light-transmitting conductive oxide layer, and preferably made of a conductive oxide layer made of a material containing ZnO or SnO ₂ . The material containing SnO ₂ may be SnO ₂ itself or a mixture of SnO ₂ and another oxide (for example, ITO which is a mixture of SnO ₂ and In ₂ O ₃ ). Such a conductive oxide layer is formed by sputtering, vapor deposition, CVD, or the like.

  Further, the surface of the first electrode layer 12 may have a fine texture structure in order to confine light incident from outside into the first and second semiconductor layers 13 and 14. Thereby, the photoelectric conversion efficiency of the photovoltaic element 10 can be improved.

  After the formation of the first electrode layer 12, as shown in FIG. 1, the first scribe line 17 is formed by laser scribing the first electrode layer 12 using a YAG laser or the like. The electrode layer 12 is divided in the surface direction of the insulating substrate 11.

  As shown in FIG. 1, the semiconductor layer in the photovoltaic element 10 is formed by sequentially laminating a first semiconductor layer 13 and a second semiconductor layer 14. That is, the photovoltaic element 10 has a tandem structure.

  The first and second semiconductor layers 13 and 14 are configured to have different light absorption wavelength regions. For example, the first semiconductor layer 13 absorbs a light component in a shorter wavelength region than the second semiconductor layer 14. It is configured to be easy to do.

  The first semiconductor layer 13 is formed by sequentially laminating p-type, i-type, and n-type amorphous silicon-based semiconductor layers, for example, sequentially from the first electrode layer 12 side, and the second semiconductor layer 14 is formed by, for example, the first electrode layer. P-type, i-type, and n-type microcrystalline silicon-based semiconductor layers are sequentially stacked from the 12th side.

  The p-type semiconductor layer is doped with p-type impurity atoms such as boron and aluminum, and the n-type semiconductor layer is doped with n-type impurity atoms such as phosphorus. The i-type semiconductor layer may be a completely non-doped semiconductor layer, or may be a weak p-type or weak n-type semiconductor layer having a small amount of impurities and sufficiently equipped with a photoelectric conversion function. The first and second semiconductor layers 13 and 14 can be formed by a plasma CVD method or the like.

  The photovoltaic element 10 shown in FIG. 1 is formed by laminating two semiconductor layers 13 and 14, but the photovoltaic element is realized by one or more semiconductor layers. Even so, the defect can be processed by the defect repairing apparatus 50 according to the present embodiment.

  When the first and second semiconductor layers 13 and 14 are formed on the first electrode layer 12, the second and second semiconductor layers 13 and 14 are subjected to laser scribing using a YAG laser or the like, so that the second A scribe line 18 is formed, whereby the first and second semiconductor layers 13 and 14 are divided in the plane direction of the insulating substrate 11.

The second electrode layer 15 is stacked on the second semiconductor layer 14 and has a stacked structure in which, for example, a transparent conductive film and a metal film are stacked. The transparent conductive film is made of, for example, ZnO, ITO, SnO ₂ or the like. The metal film is made of a metal such as silver and aluminum. After the formation of the second electrode layer 15, as shown in FIG. 1, a third scribe line 19 is formed using a YAG laser or the like.

  In the photovoltaic element 10, the first and second semiconductor layers 13 and 14 are intermittently or continuously formed by a CVD apparatus or the like. However, since these are formed very thinly, defects such as pinholes are formed. Is likely to occur. When such a defect occurs, an electrical short circuit is caused between the first electrode layer 12 and the second electrode layer 15 sandwiching the first and second semiconductor layers 13 and 14, and the photovoltaic device 10 As a whole cell, the power generation efficiency will be lowered.

  FIG. 2 is a cross-sectional view showing the manufacturing process of the photovoltaic element 10 and schematically shows how the pinhole 20 is generated.

  After the first electrode layer 12 is formed on the insulating substrate 11 (FIG. 2A), the first and second layers are subjected to a laser scribing process for forming the first scribe line 17 by a CVD apparatus or the like. The semiconductor layers 13 and 14 are sequentially stacked (FIG. 2B). At this time, when the foreign matter 21 is mixed, the first and second semiconductor layers 13 and 14 are not formed on the insulating substrate 11 or the first and second semiconductor layers 13 and 14 are on the foreign matter 21. After the film is formed, a portion where the first and second semiconductor layers 13 and 14 are peeled off with the separation of the foreign material 21 becomes apparent as the pinhole 20.

  The foreign material 21 that causes the pinhole 20 is dust originally attached to the insulating substrate 11, minute protrusions or scratches formed on the surface of the insulating substrate 11, or a manufacturing apparatus for manufacturing the photovoltaic element 10. Fine particles having a size of about several μm floating in the internal space.

  In particular, fine particles of several μm that float when the first semiconductor layer 13 is formed are separated after the second semiconductor layer 14 is formed, and thus penetrate the first and second semiconductor layers 13 and 14. The pinhole 20 is generated, and an electric short circuit is caused. On the other hand, when the foreign material 21 is detached after the first semiconductor layer 13 is formed and the second semiconductor layer 14 is formed at a pinhole penetrating the first semiconductor layer 13, Since the second semiconductor layer 14 is interposed between the electrode layer 12 and the second electrode layer 15, an electrical short circuit does not occur, and there is no problem.

  After the second semiconductor layer 14 is stacked, the second electrode layer 15 is stacked by a sputtering apparatus or the like through a laser scribing process for forming the second scribe line 18 (FIG. 2C), and the third scribe line is formed. The insulating resin 16 is sealed through a laser scribing process for forming the line 19 (FIG. 2D). As shown in FIG. 2C, the first electrode layer 12 and the second electrode layer 15 are short-circuited at the location where the pinhole 20 penetrating the first and second semiconductor layers 13 and 14 is formed. .

  If such a short-circuited portion 22 cannot be removed, the leakage current cannot be suppressed, and as the photovoltaic device 10, the shunt resistance (Rsh) fill factor (FF) becomes worse, and at the same time, Current flows into the short-circuited portion, and the open circuit voltage (Voc) decreases, so that the photoelectric conversion efficiency decreases. As the photovoltaic device 10 is manufactured in a larger area, the frequency of occurrence of the pinholes 20 is increased, which causes a decrease in manufacturing yield.

  Hereinafter, the defect repairing method according to the embodiment of the present invention, in which the semiconductor layer is repaired so as not to form the short-circuit portion 22 as described above, will be described.

  FIG. 3 is a cross-sectional view showing a manufacturing process of the photovoltaic device 10 including the defect repairing method according to this embodiment. FIGS. 3 (a) and 3 (b) are FIGS. As described above in b), the pinhole 20 is generated by the foreign material 21.

  In the defect repair method according to the present embodiment, after the first and second semiconductor layers 13 and 14 are stacked on the first electrode layer 12, the pinhole 20 penetrating the first and second semiconductor layers 13 and 14 is formed. A defect detection step for detection is performed using an illumination light source 30 provided in a defect repair device 50, which will be described later, used for defect repair processing and a light detection unit (not shown) (FIG. 3C).

  Specifically, the illumination light source 30 is provided on the opposite side of the insulating substrate 11 to the side on which the first electrode layer 12 is laminated, and the light detection unit is provided on the opposite side of the illumination light source 30 via the insulation substrate 11. . With this configuration, when the illumination light source 30 irradiates the insulating substrate 11 with light, the insulating substrate 11 and the first electrode layer 12 have translucency as described above. At the location where the pinhole 20 that penetrates the semiconductor layers 13 and 14 is present, the light emitted from the illumination light source 30 passes through the insulating substrate 11 and the first electrode layer 12, then passes through the pinhole 20, and defect detection light. 31 is emitted from the upper surface of the second semiconductor layer 14. By detecting the defect detection light 31 using the light detection unit, the location where the pinhole 20 is present can be specified.

  When the location of the pinhole 20 is specified, the second semiconductor layer is formed at the specified location by scanning the inkjet head 40 provided in the defect repairing device 50 described later in the surface direction of the insulating substrate 11. 14 is performed in a non-contact manner by discharging the insulating material 41 and applying the insulating material 41 to the pinhole 20 (FIG. 3D).

  As the insulating material 41 used in this material application process, if a thermosetting resin that needs to be heated to be cured is used, the semiconductor element in the photovoltaic element 10 will not function. Then, an ultraviolet curable resin that is cured by irradiating ultraviolet rays is used.

  After the material application step, when the insulating material 41 is cured by ultraviolet irradiation, the second electrode layer 15 is laminated by a sputtering apparatus or the like through a laser scribing process for forming the second scribe line 18 (FIG. 3 ( e)), the insulating resin 16 is sealed through a laser scribing process for forming the third scribe line 19 (FIG. 3F). As described above, since the pinhole 20 is closed by the insulating material 41 before the second electrode layer 15 is laminated, the occurrence of the short-circuited portion 22 as shown in FIG. 2 can be prevented.

  FIG. 4 is a front view schematically showing a defect repair apparatus 50 according to an embodiment of the present invention, and FIG. 5 is a side view schematically showing the defect repair apparatus 50 according to an embodiment of the present invention. FIG. 6 is a top view schematically showing the defect repairing apparatus 50 according to one embodiment of the present invention.

  The defect repair apparatus 50 is an apparatus used for executing the defect repair process described above. The defect repair apparatus 50 includes a detection camera 51 corresponding to the above-described light detection unit, an illumination light source 30, an inkjet head 40, an inkjet unit 52 that stably supplies the insulating material 41 to the inkjet head 40, and the inkjet head 40. A maintenance unit 53 for maintaining the discharge performance, a transport mechanism 54 for transporting the insulating substrate 11 to be processed along the transport direction D, and a motor shaft 55 for moving the inkjet unit 52 along the width direction W. And a control unit 56 that controls the entire defect repairing apparatus 50 and a UV irradiation unit 64 that emits ultraviolet rays for curing the insulating material 41.

  Here, the transport direction D and the width direction W are two directions orthogonal to each other on the transport surface of the insulating substrate 11 in the defect repairing apparatus 50. In the defect repairing apparatus 50, a direction orthogonal to both the transport direction D and the width direction W is referred to as a height direction.

  In this embodiment, the insulating substrate 11 in which the first and second semiconductor layers 13 and 14 are stacked is formed as a rectangular plate, and the second semiconductor layer 14 faces upward. It is placed on the transport mechanism 54 in such a posture.

  The detection camera 51 is installed at a position above the insulating substrate 11 placed on the transport mechanism 54, and is realized by, for example, a line sensor or an area camera. The number of detection cameras 51 to be installed in the defect repair device 50 and the mounting position in the height direction are determined based on the size of the insulating substrate 11 and the minimum defect size to be detected. In the present embodiment, one detection camera 51 is installed to reduce the cost of the defect repair device 50.

  The illumination light source 30 is installed at a position below the insulating substrate 11 placed on the transport mechanism 54, and it is preferable to select a light source that meets the specifications of the detection camera 51. For example, the detection camera 51 is selected by a line sensor. When implemented, line illumination is selected, and when the detection camera 51 is implemented by an area sensor, illumination that emits light is selected.

  Further, as the illumination light source 30, one that emits light that is almost absorbed by the first semiconductor layer 13 and the second semiconductor layer 14 is used. As described above, the first semiconductor layer 13 is an amorphous silicon-based semiconductor layer. When the second semiconductor layer 14 is a microcrystalline silicon-based semiconductor layer, the light emitted from the illumination light source 30 is almost absorbed by the semiconductor layers 13 and 14 on the short wavelength side of the visible light region, and is slightly In addition, only the light on the long wavelength side passes through the object to be processed.

  On the other hand, since the first semiconductor layer 13 and the second semiconductor layer 14 do not exist at locations where the pinholes 20 that penetrate the first and second semiconductor layers 13 and 14 exist, almost no light is emitted from the illumination light source 30. It passes through the workpiece without being absorbed.

  Further, as described above, only a part of the light emitted from the illumination light source 30 is present at the pinhole location where one of the first semiconductor layer 13 and the second semiconductor layer 14 exists. Is absorbed by the semiconductor layer present. Therefore, in such a location where the pinhole is present, the luminance of the light transmitted through the object to be processed is reduced as compared with the location where the pinhole 20 penetrating the first and second semiconductor layers 13 and 14 is present.

  Therefore, by utilizing such a phenomenon, by setting a threshold value that can determine the presence or absence of a semiconductor layer in the pinhole with respect to the luminance of light detected by the detection camera 51, by a test or the like in advance, Whether the pinhole 20 penetrates the first and second semiconductor layers 13 and 14 or the pinhole in which at least one semiconductor layer exists can be determined based on the detection result by the detection camera 51.

  The transport mechanism 54 includes a plurality of transport rollers and transports the object to be processed along the transport direction D. The transport mechanism 54 may be controlled by the control unit 56 so as to transport the object to be processed at a constant speed along the transport direction D, while repeating the step feed of the object to be processed by a certain distance along the transport direction D. It may be controlled by the control unit 56 so as to convey.

  In the former case, a detection image without a break can be easily taken by the detection camera 51 in the defect detection step. Further, in the latter case, it is suitable for an in-line method in which the loading / unloading direction of the insulating substrate 11 is different. Can be implemented one by one.

  The inkjet head 40 discharges the insulating material 41 downward at a position downstream of the illumination light source 30 and the detection camera 51 in the transport direction and above the insulating substrate 11 placed on the transport mechanism 54. It is installed in a possible posture and is supported so as to be movable along the width direction W.

  In the present embodiment, the inkjet head 40 employs a piezo method using a piezo element that deforms when a voltage is applied. This is because the range of materials that can be used is wider than the bubble jet (registered trademark) method in which ink is heated and ink is ejected by bubbles.

  In the present embodiment, in order to reduce the cost of the apparatus, the inkjet head 40 is arranged such that the center of the detection camera 51 on the conveyance surface of the insulating substrate 11 and the inkjet so as not to increase the apparatus accuracy such as pitching and yawing of the conveyance mechanism 54. It is preferable to install the head 40 so that the distance from the nozzle center is as short as possible.

  The defect repairing apparatus 50 according to the present embodiment is configured to include only one inkjet head 40, but may be configured to include a plurality of inkjet heads 40. If a plurality of ink jet heads 40 are provided, the range in which the insulating material 41 can be discharged by a single scanning operation in the width direction W is increased accordingly, so that the processing tact of the apparatus can be increased. However, if the number of inkjet heads 40 increases, the apparatus cost increases accordingly, and the number of inkjet heads 40 is determined depending on the balance between the processing tact and the apparatus cost.

  As the insulating material 41 to be applied, as described above, ultraviolet curable ink (UV ink) that cures when irradiated with ultraviolet rays is used. The main component of the UV ink consists of a photopolymerizable resin, a photopolymerization initiator, and an auxiliary agent, and is characterized by not containing an organic solvent.

  The UV irradiation unit 64 is disposed downstream of the inkjet head 40 in the transport direction and at a position above the insulating substrate 11 placed on the transport mechanism 54 so as to emit ultraviolet rays downward. ing.

  In the present embodiment, the UV irradiation unit 64 is configured to irradiate ultraviolet rays over the entire upper surface of the object to be processed. However, if the irradiation intensity of the emitted ultraviolet light is strong, the applied UV ink can be cured in a short time. Therefore, the line-shaped UV irradiation apparatus is used to irradiate the ultraviolet light while conveying the object to be processed. You may comprise as follows. Examples of the light source used for the UV irradiation unit 64 include a metal halide lamp, a high-pressure mercury lamp, a UV LED, and a black light.

  The ink jet unit 52 is configured to stably supply the insulating material 41 from a tank (not shown) to the ink jet head 40, and further, UV ink is cured even if the ink flow path in the ink jet unit 52 is irradiated with ultraviolet rays. It is covered with UV cut material so that it is difficult to do. Similarly, in the maintenance unit 53, a UV cut material is used for the piping passage through which the UV ink passes.

  However, when the defect repair apparatus 50 is operated, the nozzle surface of the inkjet head 40 is irradiated with ultraviolet rays to some extent. Therefore, it is preferable to periodically maintain the inkjet head 40 using the maintenance unit 53.

  As a maintenance method, for example, the ink in the nozzle is sucked and discharged, or the ink is periodically ejected from the nozzle irrespective of the defect repair processing. In the maintenance unit 53, when the ink jet head 40 is not used, capping can be performed so that external light can be completely blocked.

  In addition to the configuration described above, the defect repairing device 50 further includes a non-discharge inspection unit (not shown) that can check the discharge state and a nozzle surface inspection unit (not shown) that detects liquid dripping on the nozzle surface. .

  FIG. 7 is a block diagram of the defect repair apparatus 50. The detection image obtained from the detection camera 51 is stored in the ROM 58 and the image recording unit 57 of the control unit 56 and is processed by the CPU 60. Specifically, in the detection image obtained by the detection camera 51, transmitted light having the same brightness as that of the pinhole 20 is detected also at the peripheral portion of the object to be processed. Therefore, the CPU 60 trims the detection image. Delete the periphery. Further, by binarizing the trimmed detection image, the position coordinates of the defective portion in the object to be processed are acquired.

  In the defect discriminating unit 61, the defect portion to be coated with the insulating material 41 among the defect portions acquired by the CPU 60 based on the threshold value determined in advance with respect to the luminance of the light detected by the detection camera 51 is insulated. A defective portion that does not require application of the material 41 is determined. The defect drawing data generation unit 62 can apply the insulating material 41 to the defect portion due to the pinhole 20 penetrating the first and second semiconductor layers 13 and 14 based on the determination result by the defect determination unit 61. Whether drawing data is created and whether or not the repair process is performed is determined based on whether or not the pinhole 20 penetrating the first and second semiconductor layers 13 and 14 exists.

  When performing the repair process, the control unit 56 is based on the output value of the encoder 63 that outputs information related to the position of the inkjet head 40 in the width direction W with respect to the target object conveyed below the inkjet head 40. When the inkjet head 40 reaches above the defective portion, the insulating material 41 is discharged from the nozzle of the designated inkjet head 40. The workpiece to which the insulating material 41 is applied in this way is transported to the UV irradiation unit 64 by the transport mechanism 54 and irradiated with ultraviolet rays for a predetermined time.

  In order to repair a defect caused by the pinhole 20, the pinhole 20 is covered with the insulating material 41 and insulated so that the first electrode layer 12 and the second electrode layer 15 are electrically insulated. It is necessary to ensure the film thickness of the material 41. In addition, since the insulating characteristics vary depending on the insulating material 41 itself, the required film thickness also changes. Furthermore, since the film thickness changes depending on the wettability of the insulating material 41 with respect to the film surface in the semiconductor layer, the required discharge amount is also different. Furthermore, the required film thickness also depends on the accuracy of the defect repair device 50 itself (related to the landing accuracy of the insulating material 41, the detection accuracy of the defect, the axial accuracy, etc.).

  Therefore, the discharge area for the pinhole 20 is determined based on the accuracy of the defect repair device 50 itself, and the required film thickness for the pinhole 20 is determined based on the insulating characteristics and wettability of the insulating material 41. Thus, the discharge volume (discharge amount) of the UV ink is determined.

  FIG. 8 is a flowchart showing an example of defect repair processing by the defect repair device 50 according to the present embodiment. When the defect repair process is started and the object to be processed is carried into the defect repair apparatus 50 (step s1), the alignment process is performed so that the object to be processed is arranged on the transport mechanism 54 in a predetermined posture (step s1). s2).

  After the alignment process, when the process proceeds to the inspection flow, the conveyance of the object to be processed is started to detect the pinhole 20 (step s3). In the present embodiment, the transport mechanism 54 is controlled so as to transport the object to be processed in the transport direction D at a predetermined transport speed, and in the defect detection process, the illumination light source 30 is activated and the entire surface of the object is processed. A detection image of the entire surface of the object to be processed is acquired by scanning with the detection camera 51 over a period of time (step s4).

  Thereafter, the defect drawing data generation unit 62 generates defect drawing data based on the detected image (step s5), and determines whether or not the defective portion should be repaired (step s6). If there is a defect to be repaired, the process proceeds to step s7, and if not, the process proceeds to step s9.

  On the other hand, in the maintenance flow performed in parallel with the inspection flow, the inkjet head 40 is head-maintained by the maintenance unit 53 (step s11), and it is confirmed whether UV ink is normally ejected from the nozzle (undischarge inspection) ( In step s12), it is confirmed (nozzle surface inspection) whether ink is dripping on the nozzle surface (step s13).

  As a head maintenance method here, the ink in the nozzles of the inkjet head 40 is sucked and discharged, the nozzle surface is cleaned with a wipe blade or the like, or a discharge operation is performed.

  If there is a nozzle that cannot be ejected normally in the undischarge test, the recovery operation is performed by performing head maintenance again. In addition, if liquid dripping or the like is found in the nozzle inspection, it may cause contamination of the object to be processed. Therefore, by cleaning the nozzle surface again, the nozzle surface is restored to a good state.

  When the inspection flow and the maintenance flow are completed, the material application step is executed, that is, the inkjet head 40 discharges the insulating material 41 to the defective portion while performing the scanning operation in the width direction W above the object to be processed. Is closed by the insulating material 41 (step s7). Such processing is performed over the entire surface of the object to be processed while repeating the scanning operation of the inkjet head 40.

  When the material application process is completed, the inkjet head 40 returns to the standby position (on the maintenance unit 53), while the workpiece to which the insulating material 41 is applied is conveyed to the UV irradiation unit 64. Then, the UV irradiation unit 64 irradiates the object to be processed with ultraviolet rays for a predetermined time (step s8). Thereby, the insulating material 41 applied to the pinhole 20 is cured.

In addition, the ultraviolet irradiation time here can be calculated | required from the integrated light quantity (mJ / cm < ² >) required in order to harden the insulating material 41 with the ultraviolet-ray intensity of the light source with which the UV irradiation part 64 is equipped. When the curing of the insulating material 41 is completed, the object to be processed is carried out (step s9), and a series of defect repair processing is completed.

  After the defect repair process is completed, the first and second semiconductor layers 13 and 14 are subjected to laser scribing process before the second electrode layer 15 is formed on the second semiconductor layer 14, thereby forming the second scribe line 18. Is done.

  FIG. 9 is a flowchart showing another example of defect repair processing by the defect repairing apparatus 50 according to the present embodiment. The defect repairing process shown in FIG. 9 is substantially the same as the defect repairing process shown in FIG. 8, and in the inspection flow, whether the entire surface of the object to be processed is inspected at a time or the object to be processed is inspected for each predetermined region. It is different.

  Here, the predetermined region corresponds to a region where the insulating material 41 can be ejected by one scan of the inkjet head 40 (scan in one direction in the width direction W), and between the nozzles at both ends of the inkjet head 40. Determined based on distance. Therefore, if a plurality of inkjet heads 40 are provided, the area increases by the number of inkjet heads 40.

  When the defect repair process is started and the object to be processed is carried into the defect repair apparatus 50 (step s21), the alignment process is performed so that the object to be processed is arranged on the transport mechanism 54 in a predetermined posture (step s21). s22).

  After proceeding to the inspection flow after the alignment process, the control unit 56 drives the transport mechanism 54 so that the first region of the object to be processed is disposed below the detection camera 51 (step s23). Thereafter, in the defect detection step, the illumination light source 30 is operated, and the detection image of the first region is acquired by the detection camera 51 (step s24).

  Thereafter, the defect drawing data generation unit 62 generates defect drawing data based on the detected image of the first area (step s25), and determines whether or not the defect location in the first area should be repaired (step s26). . If there is a defective portion to be repaired, the process proceeds to step s27, and if not, the process returns to step s23. When returning to step s23, the control unit 56 drives the transport mechanism 54 so that the second region adjacent to the first region is disposed below the detection camera 51.

  On the other hand, in the maintenance flow performed in parallel with the inspection flow, the inkjet head 40 is head-maintained by the maintenance unit 53 (step s41), and UV ink is normally ejected from the nozzles, as in the defect repair process shown in FIG. Is confirmed (undischarge inspection) (step s42), and further, it is confirmed (nozzle surface inspection) whether ink is dripping on the nozzle surface (step s43).

  When the inspection flow and the maintenance flow are completed, the material application process is executed, that is, the inkjet head 40 discharges the insulating material 41 to the defective portion while performing the scanning operation from one side of the width direction W to the other side of the workpiece. As a result, the pinhole 20 is closed by the insulating material 41 (step s27).

  In this way, when the defect detection process and the material application process for the first region in the object to be processed are completed, the process proceeds to step s28, and the control unit 56 detects the second region adjacent to the first region as a detection camera. The transport mechanism 54 is driven so as to be disposed below the 51.

  Then, similarly to steps s24 to s26, the defect detection process is executed in steps s29 to s31. If there is a defect location to be repaired in step s31, the process proceeds to step s32. Return to s28.

  In step s32, a material application process is performed, that is, the inkjet head 40 discharges the insulating material 41 to the defective portion while performing a scanning operation from the other side in the width direction W to the upper side of the object to be processed. The hole 20 is blocked by the insulating material 41.

  In this way, when it is determined that the application of the insulating material 41 has been completed over the entire surface of the object to be processed by repeatedly performing the defect detection process and the material application process for each predetermined region (step s33). ), The inkjet head 40 returns to the standby position (on the maintenance unit 53), while the workpiece to which the insulating material 41 is applied is conveyed to the UV irradiation unit 64. Then, the UV irradiation unit 64 irradiates the object to be processed with ultraviolet rays for a predetermined time (step s34). Thereby, the insulating material 41 applied to the pinhole 20 is cured. When the curing of the insulating material 41 is completed, the object to be processed is carried out (step s35), and a series of defect repair processing is completed.

  As the photovoltaic element 10 applied in the present invention, there are solar cells such as single crystal, polycrystal, amorphous silicon, CIGS, and CdTe. In particular, a pin generated in a thin film solar cell having a relatively large area. In order to repair a defect such as the hole 20, it can be suitably performed.

  As described above, according to the defect repair method according to the present embodiment, before the second electrode layer 15 is stacked, the positions of defects such as the pinholes 20 penetrating the first and second semiconductor layers 13 and 14 exist. In addition, by discharging a necessary amount of the insulating material 41 in a non-contact manner with respect to the film surface of the second semiconductor layer 14, the defect can be repaired regardless of the size of the defect and the number of defects. Thereby, the electrical short circuit in a defective part can be prevented and the fall of the conversion efficiency of the photovoltaic device 10 manufactured can be suppressed. Moreover, the insulating material 41 required for repairing a defect can be reduced compared with the past, and the material cost concerning manufacture can be suppressed.

  In addition, the light irradiated from the side opposite to the side on which the first electrode layer 12 is laminated in the object to be processed passes through the pinhole 20 and is detected on the side where the first electrode layer 12 is laminated. Is detected. In this way, the position of the defect can be easily detected.

  Further, when the photovoltaic element 10 has a tandem structure having the first and second semiconductor layers 13 and 14 having different absorption wavelengths, a predetermined threshold is provided for the luminance of transmitted light that passes through the pinhole portion. Thus, it is possible to easily determine which semiconductor layer is peeled off or whether all semiconductor layers are peeled off.

  In addition, since the insulating material 41 is applied using the inkjet head 40, defects can be repaired in substantially the same processing time regardless of the number of defects occurring in the semiconductor layer.

  Further, since UV ink is used as the insulating material 41, the insulating material 41 can be cured with almost no heat applied to the photovoltaic device itself, and the photovoltaic device 10 is damaged in the defect repair process. This can be prevented.

  In addition, since the process of laser scribing the first and second semiconductor layers 13 and 14 is executed after the defect repair process, the problem that the second scribe line 18 is detected in the same manner as the pinhole 20 is prevented. In addition, it is possible to eliminate the necessity of controlling the inkjet head 40 so that the insulating material 41 is not discharged to the second scribe line 18 in the material application process. In addition, it is possible to prevent the problem that it is difficult to detect the pinhole 20 near the second scribe line 18 in the defect detection step.

  In addition, since the defect detection process and the material application process are performed while conveying the object to be processed by a predetermined amount, the defect repair process can be executed using an inline type apparatus.

DESCRIPTION OF SYMBOLS 10 Photovoltaic element 11 Insulating substrate 12 1st electrode layer 13 1st semiconductor layer 14 2nd semiconductor layer 15 2nd electrode layer 16 Insulating resin 17 1st scribe line 18 2nd scribe line 19 3rd scribe line 20 Pinhole 21 Foreign object 22 Short-circuit location 30 Illumination light source 31 Defect detection light 40 Inkjet head 41 Insulating material 50 Defect repair device 51 Detection camera 52 Inkjet unit 64 UV irradiation unit

Claims (10)

A defect for repairing a defect in the semiconductor layer of a photovoltaic element formed by sequentially laminating at least a first electrode layer having a light transmitting property, a semiconductor layer, and a second electrode layer on a substrate having a light transmitting property. A repair method,
A defect detection step of detecting defects in the semiconductor layer before laminating the second electrode layer;
A defect repairing method comprising: a material applying step of discharging an insulating material using an ink jet head to the position where the defect detected in the defect detecting step is present.   In the defect detection step, the substrate is irradiated with light from a side opposite to the side on which the first electrode layer is laminated, and a defect in the semiconductor layer is detected using light transmitted through the substrate. The defect repairing method according to claim 1. The semiconductor layer has a plurality of different semiconductor layers;
The defect repairing method according to claim 2, wherein in the defect detection step, a defect in the semiconductor layer is detected by comparing a detection value of light transmitted through the substrate with a predetermined threshold value.   The defect repairing method according to claim 1, wherein in the material application step, the inkjet head is scanned to discharge an insulating material.   The defect repair method according to claim 1, wherein the insulating material discharged from the inkjet head is an ultraviolet curable resin.   6. The defect repairing method according to claim 1, further comprising a step of performing a laser scribing process on the semiconductor layer after the material application step and before the second electrode layer is stacked. A transporting step of transporting the substrate to be processed before the second electrode layer is laminated by a predetermined feed amount;
The laser scribing process is performed after the transfer step and the defect detection step and the material application step for the region corresponding to the feed amount transferred in the transfer step on the substrate are repeated. Item 7. The defect repairing method according to Item 6. Defect repair for repairing defects in the semiconductor layer of a photovoltaic element formed by sequentially laminating at least a first electrode layer having a light transmitting property, a semiconductor layer, and a second electrode layer on a substrate having a light transmitting property A device,
Transport means for transporting the substrate before the second electrode layer is laminated;
Detecting means for detecting defects in the semiconductor layer;
Discharging means for discharging the insulating material in a non-contact manner against defects in the semiconductor layer;
A defect repairing apparatus comprising: a control unit that controls the ejection unit so that an insulating material is ejected to a position where the defect detected by the detection unit exists. The detection means includes
A light emitting means provided on a side opposite to the side on which the first electrode layer of the substrate is laminated, and irradiating the substrate with light;
The defect repairing apparatus according to claim 8, further comprising: a light receiving unit that is provided on a side of the substrate on which the first electrode layer is laminated and receives light from the light emitting unit.   The defect repairing apparatus according to claim 9, further comprising a determination unit that determines a type of defect based on luminance received by the light receiving unit.