JP2012046752A - Epoxy resin composition - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a technology for improving the heat resistance and transparency of an epoxy resin-acid anhydride curing system sealing agent used for resin sealing of an LED or the like.SOLUTION: This epoxy resin composition includes a first component which is at least one compound selected from specific silsesquioxane derivatives of imperfect cage type and a second component which is a cation polymerization initiator or an acid anhydride as essential components. This epoxy resin composition includes a third component which is at least one selected from a non-silicon-based epoxy resin and a curing promoter as a component to be used, if necessary.

Description

  The present invention relates to an epoxy resin composition useful as a coating material, an optical material obtained by molding or cast molding, an electrical insulating material, and the like.

  In recent years, light-emitting devices such as light-emitting diodes (LEDs) that have been put to practical use in various display boards, light sources for image reading, traffic signals, large display units, and backlights for mobile phones are hardened with aromatic epoxy resins. In general, the resin is sealed with a resin using an alicyclic acid anhydride. However, it is known that in this resin system, an acid anhydride is easily discolored by an acid, and a long time is required for curing. Further, when the cured sealing resin is left outdoors or exposed to a light source that generates ultraviolet rays, there is a problem that the sealing resin turns yellow.

  In order to eliminate such problems, attempts have been made to use a cyclic aliphatic epoxy resin or an acrylic resin to seal a resin such as an LED with a cationic polymerization initiator (see Patent Documents 1 and 2). . However, the cation-polymerized cured resin is very brittle, so that it is liable to be cracked by a thermal cycle, and the sealing resin after curing is significantly colored compared to the conventional aromatic epoxy resin-acid anhydride curing system. It has a serious drawback. Therefore, this curable resin is not suitable for applications requiring colorless transparency, particularly for LED sealing applications requiring heat resistance and transparency.

  Then, generation | occurrence | production of the crack by a cold-heat cycle is improved, and the resin composition for LED sealing materials excellent in light resistance is disclosed by patent document 3. FIG. Although the resin composition shown here uses a hydrogenated epoxy resin or an alicyclic epoxy resin as a matrix component, the coloration after curing is still large, and an improvement for further discoloration has been desired.

  On the other hand, Patent Document 4 describes an embedded resin composition for filling a gap between an electronic component of a wiring board and a board using an aliphatic cyclic epoxy resin or oxetane resin as a viscosity reducing agent. However, this resin composition contains a large amount of an inorganic filler and cannot be applied to fields that require transparency. Patent Document 5 discloses a resin composition that is soluble in an alkaline aqueous solution using a modified oxetane resin as an active energy ray-curable resin, and the one shown here should be an alkali-soluble resin. Moreover, since the modified oxetane resin and the polyfunctional oxetane resin have an unsaturated bond, discoloration due to heat history is inevitable. Patent Documents 6 to 10 disclose a cage silicon compound and a polymer thereof, but do not disclose the epoxy resin composition of the present invention.

JP-A-61-112334, Japanese Patent Laid-Open No. 02-289611 JP 2003-277473 A JP 2004-27186 A International Publication WO01 / 072857 Pamphlet JP 2006-070049 A International Publication WO2004 / 081084 Pamphlet JP 2004-331647 A International Publication WO2003 / 24870 Pamphlet International Publication WO2004 / 24741 Pamphlet

  An object of this invention is to provide the technique which can eliminate the fault which such a prior art has.

ここに、Ｙ^１は式（２−ａ）で示される基であり；Ｒは炭素数１〜４５のアルキル、炭素数４〜８のシクロアルキル、アリールおよびアリールアルキルから独立して選択される基であり；炭素数１〜４５のアルキルにおいて、任意の水素はフッ素で置き換えられてもよく、そして隣接しない任意の−ＣＨ_２−は、−Ｏ−または−ＣＨ＝ＣＨ−で置き換えられてもよく；アリールおよびアリールアルキル中のベンゼン環において、任意の水素はハロゲンまたは炭素数１〜１０のアルキルで置き換えられてもよく；この炭素数１〜１０のアルキルにおいて、任意の水素はフッ素で置き換えられてもよく、そして隣接しない任意の−ＣＨ_２−は−Ｏ−または−ＣＨ＝ＣＨ−で置き換えられてもよく；アリールアルキル中のアルキレンにおいて、炭素原子の数は１〜１０であり、そして隣接しない任意の−ＣＨ_２−は−Ｏ−で置き換えられてもよく；Ｒ^１およびＲ^２は炭素数１〜４のアルキル、シクロペンチル、シクロヘキシルおよびフェニルから独立して選択される基であり；Ｒ^３は炭素数１〜４のアルキル、シクロペンチル、シクロヘキシルまたはフェニルであり；そして、Ｘ¹はオキシラニル、オキシラニレン、３，４−エポキシシクロヘキシル、オキセタニルまたはオキセタニレンを有する基である。 The present inventor has intensively studied to solve the above problems. As a result, the inventors have found an epoxy resin composition that can be fired at a low temperature and has excellent insulating properties, transparency, light resistance, heat resistance, toughness, and the like, and has completed the present invention. That is, the present invention relates to an epoxy resin composition shown in the following item [1].
[1] A first component that is at least one compound selected from silsesquioxane derivatives represented by each of formula (1) and formula (2), and a second component that is a cationic polymerization initiator or an acid anhydride; A third component which is at least one selected from a compound containing oxiranyl, oxiranylene, 3,4-epoxycyclohexyl, oxetanyl or oxetanylene and not containing silicon in the molecule and a curing accelerator. Epoxy resin composition contained as a component used as necessary:

Wherein Y ¹ is a group represented by the formula (2-a); R is a group independently selected from alkyl having 1 to 45 carbons, cycloalkyl having 4 to 8 carbons, aryl and arylalkyl. In alkyl having 1 to 45 carbon atoms, any hydrogen may be replaced by fluorine, and any non-adjacent —CH ₂ — may be replaced by —O— or —CH═CH—. In the benzene ring in aryl and arylalkyl, any hydrogen may be replaced by halogen or alkyl having 1 to 10 carbons; in this alkyl having 1 to 10 carbons, any hydrogen is replaced by fluorine at best, and arbitrary -CH ₂ nonadjacent - is -O- or -CH = CH- may be replaced by; in the alkylene in the aryl alkyl, The number of atom is 1 to 10, and arbitrary -CH ₂ nonadjacent - may be replaced by -O-; ^{R 1} and ^{R 2} are alkyl of 1 to 4 carbon atoms, cyclopentyl, cyclohexyl and phenyl R ³ is alkyl having 1 to 4 carbon atoms, cyclopentyl, cyclohexyl or phenyl; and X ¹ is oxiranyl, oxiranylene, 3,4-epoxycyclohexyl, oxetanyl or oxetanylene. It is group which has.

  The cured product of the epoxy resin composition of the present invention can be fired at a low temperature, for example, and is excellent in insulation, transparency, light resistance, heat resistance, toughness and the like. Therefore, it can be used for optical semiconductor sealing, insulating films, sealing agents, and the like.

Terms used in the present invention will be described. A compound represented by the formula (1) may be referred to as a compound (1). Similarly, compounds represented by other formulas may be referred to in a simplified manner. In the present invention, “epoxy resin” is used as a general term for compounds containing oxiranyl, oxiranylene, 3,4-epoxycyclohexyl, oxetanyl or oxetanylene. “Arbitrary” means that not only the position but also the number is arbitrary. And the expression “any A may be replaced by B or C” means that at least one A is replaced by B and at least one A is replaced by C, at least one This means that the case where A is replaced by B and at least one of the other A is replaced by C is also included. Note that the setting that any —CH ₂ — in alkyl or alkylene may be replaced by —O— does not include the replacement of all of a plurality of consecutive —CH ₂ — with —O—. In the examples, the display data of the electronic balance is shown using g (gram) which is a mass unit. Weight% and weight ratio are data based on such numerical values.

The present invention includes the above item [1] and the following items [2] to [12].
[2] R is cyclopentyl, cyclohexyl, the number of carbon atoms is 1 to 10, any hydrogen may be replaced with fluorine, and any non-adjacent any —CH ₂ — may be replaced with —O— Good alkyl, and any hydrogen independently selected from halogen or phenyl optionally substituted with 1 to 10 carbon atoms; in phenyl having 1 to 10 carbon atoms as a substituent of phenyl, The epoxy resin composition according to item [1], wherein any hydrogen may be replaced with fluorine, and any non-adjacent —CH ₂ — may be replaced with —O—.

[3] The epoxy resin composition according to the item [1], wherein R is cyclopentyl, cyclohexyl, or any hydrogen is phenyl optionally substituted with chlorine, fluorine, methyl, methoxy, or trifluoromethyl.

[4] The epoxy resin composition according to item [1], wherein R is cyclohexyl or phenyl.

[5] The epoxy resin composition according to item [1], wherein R is phenyl.

[6] The epoxy resin composition according to any one of [1] to [5], wherein X ¹ is a group represented by any ^one of formula (3), formula (4), and formula (5). object:

[7] The epoxy resin composition according to any one of [1] to [6], wherein the second component is a cationic polymerization initiator.

[8] The epoxy resin composition according to any one of [1] to [6], wherein the second component is an acid anhydride.

[9] The epoxy resin composition according to item [8], wherein the acid anhydride is at least one of hexahydrophthalic acid anhydride, methylcyclohexane-1,2-dicarboxylic acid anhydride, and hydrogenated methylnadic acid anhydride. object.

[10] A resin composition for encapsulating an optical semiconductor comprising the epoxy resin composition according to any one of [1] to [9].
[11] A resin composition for an insulating film comprising the epoxy resin composition according to any one of [1] to [9].
[12] A resin composition for a sealant comprising the epoxy resin composition according to any one of [1] to [9].

The first component, which is an essential component of the epoxy resin composition of the present invention, is at least one compound selected from silsesquioxane derivatives represented by each of the formulas (1) and (2). In the following description, the shape of the silsesquioxane skeleton in the formulas (1) and (2) may be expressed as a double-decker type.

In the formula (1), R is a group independently selected from alkyl having 1 to 45 carbon atoms, cycloalkyl having 4 to 8 carbon atoms, aryl and arylalkyl. In the alkyl having 1 to 45 carbon atoms, any hydrogen may be replaced by fluorine, and any non-adjacent —CH ₂ — may be replaced by —O— or —CH═CH—. In the benzene ring in aryl and arylalkyl, any hydrogen may be replaced by halogen or alkyl having 1 to 10 carbons. In the alkyl having 1 to 10 carbon atoms, any hydrogen may be replaced with fluorine, and any non-adjacent —CH ₂ — may be replaced with —O— or —CH═CH—. In alkylene in arylalkyl, the number of carbon atoms is 1-10, and any non-adjacent —CH ₂ — may be replaced by —O—.

Preferred R is cyclopentyl, cyclohexyl, alkyl having 1 to 10 carbon atoms, any hydrogen may be replaced by fluorine, and any non-adjacent any —CH ₂ — may be replaced by —O— , And any hydrogen independently selected from halogen or phenyl optionally substituted with alkyl having 1 to 10 carbons. In the alkyl having 1 to 10 carbon atoms which is a phenyl substituent, any hydrogen may be replaced with fluorine, and any non-adjacent —CH ₂ — may be replaced with —O—.
More preferred R is cyclopentyl, cyclohexyl, or phenyl where any hydrogen may be replaced by chlorine, fluorine, methyl, methoxy, or trifluoromethyl, even more preferred R is cyclohexyl or phenyl, and most preferred R Is phenyl.

R ¹ and R ² are groups independently selected from alkyl having 1 to 4 carbon atoms, cyclopentyl, cyclohexyl and phenyl. Examples of alkyl having 1 to 4 carbon atoms are methyl, ethyl, propyl, 2-methylethyl, butyl and t-butyl. Preferred examples of R ¹ or R ² are methyl and phenyl. R ¹ and R ² are preferably the same group.

これらの式において、Ｒ^４、Ｒ^６、Ｒ^７およびＲ^９は炭素数１〜６のアルキレンである。このアルキレンにおける１つの−ＣＨ_２−は−Ｏ−または１，４−フェニレンで置き換えられてもよい。そして、Ｒ^５およびＲ^８は水素または炭素数１〜６のアルキルである。 X ¹ is a group having any one of oxiranyl, oxiranylene, 3,4-epoxycyclohexyl, oxetanyl and oxetanylene. Preferred examples of such X ¹ are as follows.

In these formulas, R ⁴ , R ⁶ , R ⁷ and R ⁹ are alkylene having 1 to 6 carbon atoms. One —CH ₂ — in the alkylene may be replaced by —O— or 1,4-phenylene. R ⁵ and R ⁸ are hydrogen or alkyl having 1 to 6 carbon atoms.

  Among these, a group having any one of oxiranyl, 3,4-epoxycyclohexyl and oxetanyl is more preferable, and a group having oxiranyl and a group having 3,4-epoxycyclohexyl are more preferable.

Particularly preferred examples of X ¹ are groups represented by each of formula (3), formula (4) and formula (5).

  Compound (1) can be produced by referring to the method described in International Publication WO2004 / 024741 Pamphlet.

In the formula (2), R has the same meaning as R in the formula (1), and Y ¹ is a group represented by the formula (2-a). In formula (2-a), R ³ has the same meaning as R ¹ in formula (1), and X ¹ has the same meaning as X ¹ in formula (1). Compound (2) can be produced by the method described in International Publication WO2003 / 024870 Pamphlet.

  The second component which is an essential component is a cationic polymerization initiator or an acid anhydride. Examples of the cationic polymerization initiator are an active energy ray cationic polymerization initiator that generates a cationic species or a Lewis acid by active energy rays, and a thermal cationic polymerization initiator that generates a cationic species or a Lewis acid by heat.

Examples of active energy ray cationic polymerization initiators include metal fluoroboron complex salts and boron trifluoride complex compounds (US Pat. No. 3,379,653), bis (perfluoroalkylsulfonyl) methane metal salts (US Pat. No. 3,586,616), aryldiazonium Compounds (US Pat. No. 3,708,296), aromatic onium salts of group VIa elements (US Pat. No. 4,058,400), aromatic onium salts of group Va elements (US Pat. No. 4069055), dicarbonyl chelates of group IIIa to Va elements (US Pat. No. 4068091), thiopyrylium salts (US Pat. No. 4,139,655), group VIb elements in the form of MF ₆ -anions (US Pat. No. 4,161,478; M is selected from phosphorus, antimony and arsenic). Arylsulfonium complex salts (US Pat. No. 4,231,951), aromatic iodine Donium and aromatic sulfonium complexes (US Pat. No. 4,256,828) and bis [4- (diphenylsulfonio) phenyl] sulfide-bis-hexafluorometal salts (Journal of Polymer Science, Polymer Chemistry, Vol. 2, 1789) (1984)). In addition, mixed ligand metal salts of iron compounds and silanol-aluminum complexes can also be used.

  Examples of preferred active energy ray cationic polymerization initiators are arylsulfonium complex salts, aromatic sulfonium or iodonium salts of halogen-containing complex ions, and aromatic onium salts of Group II, Group V and Group VI elements. Some of these salts are commercially available.

  As the thermal cationic polymerization initiator, a cationic or protonic acid catalyst such as a triflic acid salt or boron trifluoride is used. Examples of preferred thermal cationic polymerization initiators are triflate salts, examples of which are diethylammonium triflate, diisopropylammonium triflate, and ethyldiisopropylammonium triflate. On the other hand, among aromatic onium salts that are also used as active energy ray cationic polymerization initiators, there are those that generate cationic species by heat, and these can also be used as thermal cationic polymerization initiators.

  Among these cationic polymerization initiators, aromatic onium salts are preferable because they are easy to handle and have a good balance between latency and curability. Among them, diazonium salts, iodonium salts, sulfonium salts, and phosphonium salts are handled. It is preferable in that it has an excellent balance between property and potential. A cationic polymerization initiator can be used individually or in combination of 2 or more types.

  A preferred use ratio of the cationic polymerization initiator is 0.0001 to 0.15, more preferably 0.0005 to 0.05, as a weight ratio with respect to the total amount of the epoxy resin to be used. 0.0001 is the lower limit for the curing reaction to proceed sufficiently to obtain the desired cured product. 0.15 is the upper limit for not causing the physical properties of the cured product to deteriorate and not causing the cured product to be colored.

  Examples of acid anhydrides include phthalic anhydride, maleic anhydride, trimellitic anhydride, pyromellitic anhydride, hexahydrophthalic anhydride, 3-methyl-cyclohexanedicarboxylic anhydride, 4-methyl-cyclohexanedicarboxylic anhydride, Mixtures of 3-methyl-cyclohexanedicarboxylic anhydride and 4-methyl-cyclohexanedicarboxylic anhydride, tetrahydrophthalic anhydride, nadic anhydride, methylnadic anhydride, norbornane-2,3-dicarboxylic anhydride, and methylnorbornane -2,3-dicarboxylic anhydride.

  The preferable usage rate of such an acid anhydride is 0.7-1.2 in the equivalent of an acid anhydride with respect to 1 equivalent of epoxy groups contained in the epoxy resin to be used. In order to obtain a cured product that is completely cured, it is preferable to use an acid anhydride within this range.

  In the following description, a compound having oxiranyl, oxiranylene, 3,4-epoxycyclohexyl, oxetanyl or oxetanylene and not containing silicon in the molecule may be referred to as a non-silicon epoxy resin. The 3rd component of the thermosetting resin composition of this invention is a component used as needed. The third component is at least one selected from a non-silicon epoxy resin and a curing accelerator. Examples of non-silicon epoxy resins are bisphenol type epoxy resins (bisphenol A type epoxy resins, bisphenol F type epoxy resins, bisphenol S type epoxy resins, etc.), epoxy resins having two oxiranyl (biphenyl type epoxy resins, hydrogenated) Bisphenol A type epoxy resin), polyfunctional heterocyclic epoxy resin (phenol novolak type epoxy resin, cresol novolak type epoxy resin, alkyl-modified triphenolmethane type epoxy resin, triglycidyl isocyanurate, etc.), and three or more oxiranyls Epoxy resin having poly (polyfunctional alicyclic epoxy resin such as poly (epoxidized cyclohexene oxide)) Among these, from the viewpoint of transparency, it is more preferable to use a bisphenol type epoxy resin or a heterocyclic epoxy resin that is less colored, and among the heterocyclic epoxy resins, triglycidyl isocyanurate is preferable. Two or more of these epoxy resins may be used in combination.

  When such a non-silicon epoxy resin is used, the preferable blending ratio is 5 to 95% by weight based on the total amount of the first component and the non-silicon epoxy resin. A more preferable range of this ratio is 20 to 70% by weight, and a further preferable range is 30 to 60% by weight.

  In the present invention, a curing accelerator may be used together with the acid anhydride. Examples of the curing accelerator include quaternary phosphonium salts such as tetraphenylphosphonium bromide, tetrabutylphosphonium bromide, methyltriphenylphosphonium bromide, ethyltriphenylphosphonium bromide, n-butyltriphenylphosphonium bromide; imidazoles, 3 Secondary amines such as secondary amines, quaternary ammonium salts, 1,8-diazabicyclo (5,4,0) undecene-7 and derivatives thereof, imidazoles such as 2-methylimidazole and 2-phenyl-4-methylimidazole And the like. However, it is not limited to these as long as it has good curability and is not colored. These curing accelerators may be used alone or in combination of two or more. Bicyclic amidines such as 1,8-diazabicyclo (5,4,0) undecene-7 and imidazoles exhibit high activity against epoxy resins even with a small addition amount, and are short even at relatively low curing temperatures. It is more preferable because it can be cured in about 90 seconds even at about 150 ° C. in time. Tetraphenylphosphonium bromide is also preferred.

  When such a curing accelerator is used, the preferred use ratio is 0.003 to 0.04, more preferably 0.004 to 0, in a weight ratio with respect to the total amount of the first component and the non-silicon epoxy resin. .02. 0.003 is a lower limit for the hardening accelerating effect to be recognized. 0.4 is the upper limit for not causing the physical properties of the cured product to deteriorate and not causing the cured product to be colored.

  An antioxidant may be added to the composition of the present invention. By adding an antioxidant, it is possible to prevent oxidative deterioration during heating and to obtain a cured product with little coloring. Examples of antioxidants are phenolic, sulfur and phosphorus antioxidants. A preferable blending ratio when using the antioxidant is 0.0001 to 0.1 by weight ratio based on the total amount of the epoxy resin composition.

  Specific examples of the antioxidant include monophenols (2,6-di-t-butyl-p-cresol, butylated hydroxyanisole, 2,6-di-t-butyl-p-ethylphenol, stearyl-β- (3,5-di-t-butyl-4-hydroxyphenyl) propionate), bisphenols (2,2′-methylenebis (4-methyl-6-tert-butylphenol), 2,2′-methylenebis (4- Ethyl-6-tert-butylphenol), 4,4′-thiobis (3-methyl-6-tert-butylphenol), 4,4′-butylidenebis (3-methyl-6-tert-butylphenol), 3,9-bis [1,1-dimethyl-2- {β- (3-tert-butyl-4-hydroxy-5-methylphenyl) propionyloxy} ethyl] 2,4,8,10-tetraoxy Saspiro [5,5] undecane, etc.), polymer type phenols (1,1,3-tris (2-methyl-4-hydroxy-5-tert-butylphenyl) butane, 1,3,5-trimethyl-2) , 4,6-tris (3,5-di-t-butyl-4-hydroxybenzyl) benzene, tetrakis- [methylene-3- (3 ′, 5′-di-t-butyl-4′-hydroxyphenyl) Propionate] methane, bis [3,3′-bis- (4′-hydroxy-3′-t-butylphenyl) butyric acid] glycol ester, 1,3,5-tris (3 ′, 5′-di-) t-butyl-4′-hydroxybenzyl) -S-triazine-2,4,6- (1H, 3H, 5H) trione, tocophenol, etc.), sulfur-based antioxidants (dilauryl-3,3′-thiodipropio) , Dimyristyl-3,3'-thiodipropionate, distearyl-3,3'-thiodipropionate), phosphites (riphenyl phosphite, diphenylisodecyl phosphite, phenyl diisodecyl phosphite, tris (Nonylphenyl) phosphite, diisodecylpentaerythritol phosphite, tris (2,4-di-t-butylphenyl) phosphite, cyclic neopentanetetrayl bis (octadecyl) phosphite, cyclic neopentanetetraylbi (2 , 4-di-t-butylphenyl) phosphite, cyclic neopentanetetraylbi (2,4-di-t-butyl-4-methylphenyl) phosphite, bis [2-t-butyl-6-methyl- 4- {2- (octadecyloxy Rubonyl) ethyl} phenyl] hydrogen phosphite), and oxaphosphaphenanthrene oxides (, 10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide, 10- (3,5-di-t) -Butyl-4-hydroxybenzyl) -9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide, 10-decyloxy-9,10-dihydro-9-oxa-10-phosphaphenanthrene-10 -Oxides). These antioxidants can be used alone, but it is particularly preferable to use them in combination with phenolic / sulfuric or phenolic / phosphorous.

  In order to improve light resistance, the composition of the present invention may contain an ultraviolet absorber. As an ultraviolet absorber, a general ultraviolet absorber for plastics can be used, and a preferable blending ratio thereof is 0.0001 to 0.1 in terms of a weight ratio based on the total amount of the epoxy resin composition.

  Specific examples of the ultraviolet absorber include salicylic acids such as phenyl salicylate, pt-butylphenyl salicylate, p-octylphenyl salicylate, 2,4-dihydroxybenzophenone, 2-hydroxy-4-methoxybenzophenone, 2-hydroxy-4 -Octoxybenzophenone, 2-hydroxy-4-dodecyloxybenzophenone, 2,2'-dihydroxy-4-methoxybenzophenone, 2,2'-dihydroxy-4,4'-dimethoxybenzophenone, 2-hydroxy-4-methoxy- Benzophenones such as 5-sulfobenzophenone, 2- (2′-hydroxy-5′-methylphenyl) benzotriazole, 2- (2′-hydroxy-5′-tert-butylphenyl) benzotriazole, 2- (2 ′ -Hydroxy-3 ' 5′-ditert-butylphenyl) benzotriazole, 2- (2′-hydroxy-3′-tert-butyl-5′-methylphenyl) -5-chlorobenzotriazole, 2- (2′-hydroxy-3 ′) , 5′-ditert-butylphenyl) -5-chlorobenzotriazole, 2- (2′-hydroxy-3 ′, 5′-ditert-amylphenyl) benzotriazole, 2-{(2′-hydroxy-3) Benzotriazoles such as', 3 '', 4 '', 5 '', 6 ''-tetrahydrophthalimidomethyl) -5'-methylphenyl} benzotriazole, and bis (2,2,6,6-tetramethyl -4-piperidyl) sebacate, bis (1,2,2,6,6-pentamethyl-4-piperidyl) sebacate, bis (1,2,2,6,6- Ntamechiru 4-piperidyl) is [{3,5-bis (1,1-dimethylethyl) -4-hydrido hydroxyphenyl} methyl] hindered amines such as butyl malonate.

The composition of the present invention may further contain the following components.
(1) Powdery reinforcing agents and fillers such as metal oxides such as aluminum oxide and magnesium oxide, silicon compounds such as fine powder silica, fused silica and crystalline silica, transparent fillers such as glass beads, and aluminum hydroxide Metal hydroxide, others, kaolin, mica, quartz powder, graphite, molybdenum disulfide, etc. These are mix | blended in the range which does not impair the transparency of the epoxy composition of this invention. A desirable ratio when blending these is a weight ratio with respect to the total amount of the composition of the present invention, and is in the range of 0.10 to 1.0.

(2) Colorants or pigments such as titanium dioxide, molybdenum red, bitumen, ultramarine blue, cadmium yellow, cadmium red and organic dyes.
(3) Flame retardants such as antimony trioxide, bromine compounds and phosphorus compounds.
(4) Ion adsorbent.
(5) Coupling agent A preferred ratio when blending these components is 0.0001 to 0.30 in a weight ratio with respect to the total amount of the epoxy resin composition.

  Since the cured product obtained from the epoxy resin composition of the present invention is excellent in light resistance, it is suitable for sealing an element that emits light having a relatively short wavelength with a peak wavelength of 350 to 550 nm. Examples of such a light emitting device include a group III nitride compound semiconductor formed by metal organic chemical vapor deposition (MOCVD), molecular beam crystal growth (MBE), or halide vapor deposition (HVPE). It is done. Examples of the semiconductor structure include a homostructure having a MIS junction, a PIN junction, and a pn junction, a heterostructure, or a double heterostructure. Various emission wavelengths can be selected depending on the material of the semiconductor layer and the degree of mixed crystal. In addition, a single quantum well structure or a multiple quantum well structure in which the semiconductor active layer is formed in a thin film in which a quantum effect is generated can be used.

The present invention will be described in more detail based on examples. The present invention is not limited to the following examples.
[Synthesis Example 1]
<Production of Compound (1-1)>
Compound (1-1) was produced by the following route.

Compound (a) (2.0 g), allyl glycidyl ether (1.4 g), and toluene (3.4 g) were charged into a reaction vessel having an internal volume of 50 ml equipped with a thermometer, a dropping funnel, and a reflux condenser. Sealed with dry nitrogen. While stirring with a magnetic stirrer, the reaction solution was heated to 70 ° C. And after adding a Calsted catalyst (2.0 microliters) with the micro syringe, stirring was continued for 1 hour. As a result of sampling the reaction solution and performing IR analysis, it was confirmed that absorption at 2138 cm ⁻¹ suggesting Si—H groups had disappeared. Subsequently, the reaction liquid was concentrated under reduced pressure to obtain 2.5 g of a viscous liquid. The resulting viscous liquid was subjected to ²⁹ Si-NMR analysis, and as a result, a 11.42 ppm signal corresponding to the glycidoxypropyldimethylsilyl group was confirmed. As a result of GPC analysis, the number average molecular weight was 1100, and the weight average molecular weight was 1170. The above data suggests that the viscous liquid is a compound having a chemical structure represented by the formula (1-1).

[Synthesis Example 2]
<Production of Compound (2-1)>
Compound (2-1) was produced by the following route.

Under a nitrogen atmosphere, toluene (50 ml) was added and suspended in compound (b) (5.0 g, 4.33 mmol), platinum-divinylsiloxane complex (3 wt% toluene solution, 30 μl) was added, and the mixture was heated to 90 ° C. To this, allyl glycidyl ether (1.04 g, 9.1 mmol) was added dropwise and heated at reflux for 3 hours. After allowing to cool, toluene (50 ml) and water (100 ml) were added for extraction. The organic layer was washed with water and then dried over anhydrous magnesium sulfate. Toluene was distilled off under reduced pressure, and the resulting residue was purified by silica gel column chromatography (elution solvent: toluene / ethyl acetate). After distilling off the solvent under reduced pressure, recrystallization from ethanol / ethyl acetate gave 1.6 g of compound (2-1).
¹ H-NMR (solvent: CDCl ₃ ): δ (ppm); 0.30 (s, 6H), 0.73-0.76 (t, 4H), 1.66-1.72 (m, 4H) 2.42-2.44 (m, 2H), 2.64-2.66 (m, 2H), 2.95-2.98 (m, 2H), 3.15-3.19 (m, 2H) 2H), 3.28-3.39 (m, 4H), 3.44-3.48 (m, 2H), 7.18-7.53 (m, 40H).
²⁹ Si-NMR (solvent: CDCl ₃ ): δ (ppm); −17.4 (s, 2 Si), −78.6 (s, 4 Si), (−79.5)-(− 79.6) ( t, 4Si).

[Example 1]
<Preparation 1 of epoxy resin composition>
Sun Aid SI-100 (manufactured by Sanshin Chemical Industry Co., Ltd .: aromatic sulfonium type cationic polymerization initiator) 0.0840 g, compound (c) (manufactured by Daicel Chemical Industries, Celoxide 2021P) 7.7164 g (28.58 mmol) in a screw tube The solution was stirred and dissolved with a stir bar. Thereafter, compound (1-1) (6.3163 g: 3.59 mmol) was added, and the mixture was sufficiently stirred to obtain a uniform solution. This solution was filtered through a 5 μm membrane filter to obtain an epoxy resin composition. This is named Varnish 1.

[Example 2]
<Preparation 2 of epoxy resin composition>
Sun-Aid SI-100 (0.0840 g) and compound (c) (6.3226 g: 23.42 mmol) were placed in a screw tube and dissolved by stirring with a stirrer. Thereafter, compound (1-1) (10.2916 g: 5.85 mmol) was added, and the mixture was sufficiently stirred to obtain a uniform solution. This solution was filtered through a 5 μm membrane filter to obtain an epoxy resin composition. This is named Varnish 2.

[Example 3]
<Preparation 3 of epoxy resin composition>
U-CAT5003 (0.1008 g manufactured by Sun Apro: quaternary phosphonium bromide curing accelerator), compound (d) (HN-5500 manufactured by Hitachi Chemical Co., Ltd .: 3-methyl-cyclohexanedicarboxylic anhydride and 4-methyl-cyclohexane 3.883 g (23.09 mmol) of a mixture of dicarboxylic acid anhydrides) was placed in a screw tube and dissolved by stirring with a stirrer. Thereafter, 10.4422 g (5.77 mmol) of the compound (1-1) was added and sufficiently stirred to obtain a uniform solution. Next, this solution was filtered through a 5 μm membrane filter to obtain an epoxy resin composition. This is named Varnish 3.

[Comparative Example 1]
<Preparation 4 of epoxy resin composition>
Sun Aid SI-100 (manufactured by Sanshin Chemical Industry Co., Ltd .: aromatic sulfonium-type cationic polymerization initiator) 0.0840 g and compound (c) 14.0000 g (51.85 mmol) were put in a screw tube and stirred with a stirrer. Dissolved. This solution was filtered through a 5 μm membrane filter to obtain an epoxy resin composition. This is called varnish 4.

[Comparative Example 2]
<Preparation 5 of epoxy resin composition>
U-CAT5003 (0.06 g) and compound (d) (4.697 g: 27.93 mmol) were placed in a screw tube and dissolved by stirring with a stirrer. Thereafter, compound (e) (bisphenol A diglycidyl ether hydrogenated product (Sakamoto Yakuhin Kogyo Co., Ltd., SB-HBA), 6.0000 g: 13.95 mmol) was added and sufficiently stirred to obtain a uniform solution. This solution was filtered through a 5 μm membrane filter to obtain an epoxy resin composition. This is named Varnish 5.

[Example 4]
<Physical property measurement 1>
The varnish 1 obtained in Example 1, the varnish 2 obtained in Example 2, the varnish 3 obtained in Example 3, and the varnish 4 obtained in Comparative Example 1 were each converted into a silicon wafer (low resistance silicon wafer). , High resistance silicon wafer) A sample for measuring physical properties was applied on a substrate by a spinner and fired under the conditions shown in Table 1.
<Table 1>

ダブルデッカータイプのシルセスキオキサン骨格を有するエポキシ樹脂と非ケイ素系エポキシ樹脂との組み合わせで得られた硬化膜およびダブルデッカータイプのシルセスキオキサン骨格を有するエポキシ樹脂から得られた硬化膜は、どちらも、分子中にケイ素を含有しないエポキシ樹脂だけから得られた硬化膜に比べて、表面抵抗率、体積抵抗率および誘電率のすべてにおいて良い値を示した。 About the said sample, the surface resistivity, the volume resistivity, and the dielectric constant were measured. The results are shown in Table 2.
<Table 2>

A cured film obtained from a combination of an epoxy resin having a double-decker type silsesquioxane skeleton and a non-silicon-based epoxy resin, and a cured film obtained from an epoxy resin having a double-decker type silsesquioxane skeleton, Both showed good values in all of the surface resistivity, volume resistivity, and dielectric constant as compared with the cured film obtained only from the epoxy resin containing no silicon in the molecule.

[Example 5]
<Physical property measurement 2 (heat resistance test)>
Varnish 1 obtained in Example 1, Varnish 2 obtained in Example 2, Varnish 3 obtained in Example 3, Varnish 4 obtained in Comparative Example 1, and Varnish 5 obtained in Comparative Example 2 Each was coated on a glass substrate with a spinner. Then, it baked on the conditions shown in Table 3, and formed the sample for heat resistance tests. The formed film had a thickness of 24 μm on the glass substrate.
<Table 3>

About the said sample, the heat resistance test was done at 150 degreeC using the ventilation constant temperature dryer (made by Advantech, DRM420DA). As a result, the obtained glass substrate was measured for light transmittance at 400 nm and 350 nm using a spectrophotometer (JASCO V-560 UV / VIS), and the evaluation results are shown in Table 4 and Table 5.
<Table 4> (400 nm)

ダブルデッカータイプのシルセスキオキサン骨格を有するエポキシ樹脂と非ケイ素系エポキシ樹脂との組み合わせで得られた硬化膜は、非ケイ素系エポキシ樹脂だけから得られた硬化膜に比べて耐熱性が良いことが分かった。 <Table 5> (350 nm)

A cured film obtained by combining a double-decker type epoxy resin having a silsesquioxane skeleton and a non-silicon epoxy resin has better heat resistance than a cured film obtained only from a non-silicon epoxy resin. I understood.

  The cured product of the epoxy resin composition of the present invention can be fired at a low temperature, for example, and is excellent in insulation, transparency, light resistance, heat resistance, toughness and the like. Therefore, it can be used for optical semiconductor sealing, insulating films, sealing agents, and the like.

Claims (12)

A first component that is at least one compound selected from silsesquioxane derivatives represented by each of the formulas (1) and (2) and a second component that is a cationic polymerization initiator or an acid anhydride are essential components. A third component which is at least one selected from a compound and a curing accelerator containing oxiranyl, oxiranylene, 3,4-epoxycyclohexyl, oxetanyl or oxetanylene and not containing silicon in the molecule Epoxy resin composition contained as a component used for:

Wherein Y ¹ is a group represented by the formula (2-a); R is a group independently selected from alkyl having 1 to 45 carbons, cycloalkyl having 4 to 8 carbons, aryl and arylalkyl. In alkyl having 1 to 45 carbon atoms, any hydrogen may be replaced by fluorine, and any non-adjacent —CH ₂ — may be replaced by —O— or —CH═CH—. In the benzene ring in aryl and arylalkyl, any hydrogen may be replaced by halogen or alkyl having 1 to 10 carbons; in this alkyl having 1 to 10 carbons, any hydrogen is replaced by fluorine at best, and arbitrary -CH ₂ nonadjacent - is -O- or -CH = CH- may be replaced by; in the alkylene in the aryl alkyl, The number of atom is 1 to 10, and arbitrary -CH ₂ nonadjacent - may be replaced by -O-; ^{R 1} and ^{R 2} are alkyl of 1 to 4 carbon atoms, cyclopentyl, cyclohexyl and R ³ is a group independently selected from phenyl; R ³ is alkyl having 1 to 4 carbons, cyclopentyl, cyclohexyl or phenyl; and X ¹ is oxiranyl, oxiranylene, 3,4-epoxycyclohexyl, oxetanyl and oxetanylene. It is group which has any one of these. R is cyclopentyl, cyclohexyl, alkyl having 1 to 10 carbon atoms, any hydrogen may be replaced by fluorine, and any non-adjacent any —CH ₂ — may be replaced by —O— , And any hydrogen is a group independently selected from halogen or phenyl optionally substituted with alkyl having 1 to 10 carbons; in alkyl having 1 to 10 carbons which is a substituent of phenyl, The epoxy resin composition according to claim 1, wherein hydrogen may be replaced with fluorine, and any non-adjacent —CH ₂ — may be replaced with —O—.   The epoxy resin composition of claim 1, wherein R is cyclopentyl, cyclohexyl, or phenyl where any hydrogen may be replaced by chlorine, fluorine, methyl, methoxy, or trifluoromethyl.   The epoxy resin composition according to claim 1, wherein R is cyclohexyl or phenyl.   The epoxy resin composition according to claim 1, wherein R is phenyl. The epoxy resin composition according to any one of claims 1 to 5, wherein X1 is a group represented by any ^one of formula (3), formula (4) and formula (5):

  The epoxy resin composition according to any one of claims 1 to 6, wherein the second component is a cationic polymerization initiator.   The epoxy resin composition according to any one of claims 1 to 6, wherein the second component is an acid anhydride.   The epoxy resin composition according to claim 8, wherein the acid anhydride is at least one of hexahydrophthalic acid anhydride, methylcyclohexane-1,2-dicarboxylic acid anhydride, and hydrogenated methyl nadic acid anhydride.   The resin composition for optical semiconductor sealing which consists of an epoxy resin composition of any one of Claims 1-9.   The resin composition for insulating films which consists of an epoxy resin composition of any one of Claims 1-9.   The resin composition for sealing agents which consists of an epoxy resin composition of any one of Claims 1-9.