JP2011082226A - Catalytic chemical vapor deposition device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a catalytic chemical vapor deposition device that can form a film with desired precision while suppressing twisting of a catalyst line suspended in a chamber to be folded back in a vertical direction, especially, a catalytic chemical vapor deposition device which is effective for forming the film in a film formation region of large area. <P>SOLUTION: When the catalyst line 6 is twisted clockwise on a Z axis, a folded-back part 63 leaves columnar parts 30b and 30c and rotates around the Z axis in a direction as shown by an arrow in the figure so as to approach the columnar parts 30a and 30b. An end of the folded-back part 63, having rotated, on the side of a droop part 61 abuts against the columnar part 30a, and an end on the side of a droop part 62 abuts against the columnar part 30d to restrict the twisting of the catalyst line 6 in a Y-axial direction. At this time, the droop pat 62 leaves a flat plate part 20 and the droop part 61 shifts in position to approach the flat plate part 20. The droop part 61 of the catalyst line 6 which has shifted in position abuts against an end 21c of the flat plate part 20 to restrict the position shift of the catalyst line 6 in an X-axial direction. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to a catalytic chemical vapor deposition apparatus for forming a film by supplying a source gas to a heated catalyst wire installed in a chamber and depositing the generated decomposition species on a film formation substrate in the chamber. .

  Catalytic chemical vapor is a film forming method in which a source gas is supplied to a catalyst wire in a chamber, and decomposition species (deposition species) generated by using a catalytic reaction or thermal decomposition reaction of the source gas are deposited on a deposition target substrate. A film forming apparatus using a phase growth method (CAT-CVD: catalytic-Chemical Vapor Deposition) is known (for example, see Patent Document 1).

  In the catalytic chemical vapor deposition apparatus described in Patent Document 1, a substrate wire is held in a vertical position by a substrate holder in a processing chamber, and a catalyst wire capable of decomposing a source gas when energized to generate heat opposes the substrate. Are arranged to be. The catalyst wire is formed in a U shape, both ends of the catalyst wire are located on the upper side, and the folded U-shaped portion is located on the lower side.

Japanese Unexamined Patent Publication No. 2000-303182 (paragraph [0024], FIG. 2)

  In such a catalytic chemical vapor deposition apparatus, the catalyst wire generates heat to about 2000 ° C. when energized. At this time, since a large current is supplied to the catalyst wire, a strong magnetic field is generated around the catalyst wire, and an electromagnetic force is generated by the interaction between the magnetic field and the current. A long catalyst wire that receives electromagnetic force and is suspended with a free end underneath may twist around a vertical axis. If the catalyst wire is twisted, the distance between the catalyst wire and the substrate will be non-uniform, the probability that the decomposition species will reach the substrate and the temperature rise of the substrate due to radiant heat will become non-uniform, and the film thickness distribution will vary. There is a possibility that the film formation cannot be performed with a desired accuracy. Problems such as fluctuations in the film thickness distribution due to twisting of the catalyst wire are particularly noticeable when a film is formed in a large-area film formation region.

  In view of the circumstances as described above, an object of the present invention is to provide a catalyst chemistry capable of suppressing the twist of the catalyst wire suspended in the chamber so as to be folded in the vertical direction and performing film formation with a desired accuracy. An object of the present invention is to provide a vapor phase growth apparatus, particularly a catalytic beam chemical vapor deposition apparatus that is effective when a film is formed in a large area film formation region.

In order to achieve the above object, a catalytic chemical vapor deposition apparatus according to an embodiment of the present invention includes a chamber, a holding mechanism, a first catalyst line, and a first regulating unit.
The holding mechanism holds the substrate upright in the chamber.
The first catalyst wire has both ends connected to a power source, and is suspended inside the chamber so as to be folded in a vertical direction so as to face the substrate held by the holding mechanism, and the both ends Heat can be generated at the decomposition temperature of the raw material gas introduced into the chamber by applying electric power between the parts.
The first restricting portion is disposed so as to be in contact with the first catalyst wire, and restricts twisting of the first catalyst wire around a vertical axis.

1 is a front view showing a schematic configuration of a catalytic chemical vapor deposition apparatus according to an embodiment of the present invention. It is a side view which shows schematic structure of the catalytic chemical vapor deposition apparatus of FIG. It is a perspective view which shows a control part and a catalyst wire. It is a schematic block diagram which shows the control part and catalyst wire of FIG. 3 from a Y-axis direction. It is a schematic block diagram which shows the control part and catalyst wire of FIG. 3 from a Z-axis direction. It is a fragmentary sectional view of a control part. It is the schematic which shows a control part and catalyst wire from the Z-axis direction when a catalyst wire twists around a Z-axis. It is the schematic which shows the control part and catalyst wire of FIG. 7 from a Y-axis direction. It is a figure which shows the fluctuation | variation of the film thickness distribution of the film-forming when a control part is provided, and the fluctuation | variation of the film thickness distribution of the film-forming when a control part is not provided. It is a fragmentary sectional view which shows a mode that the decomposition | disassembly seed | species of source gas deposited on the control part. It is a perspective view which shows the control part and catalyst wire which concern on another embodiment of this invention. It is the schematic which shows the control part and catalyst wire of FIG. 11 when a catalyst wire twists around a Z-axis from a Z-axis direction. It is a perspective view which shows the control part and catalyst wire which concern on another embodiment of this invention. It is a perspective view which shows the control part and catalyst wire which concern on another embodiment of this invention. It is a perspective view which shows the control part and catalyst wire which concern on another embodiment of this invention. It is a perspective view which shows the control part and catalyst wire which concern on another embodiment of this invention. It is a front view which shows schematic structure of the catalytic chemical vapor deposition apparatus which concerns on another embodiment of this invention.

A catalytic chemical vapor deposition apparatus according to an embodiment of the present invention includes a chamber, a holding mechanism, a first catalyst wire, and a first regulating unit.
The holding mechanism holds the substrate upright in the chamber.
The first catalyst wire has both ends connected to a power source, and is suspended inside the chamber so as to be folded in a vertical direction so as to face the substrate held by the holding mechanism, and the both ends Heat can be generated at the decomposition temperature of the raw material gas introduced into the chamber by applying electric power between the parts.
The first restricting portion restricts torsion around the vertical axis of the first catalyst wire by contacting the first catalyst wire.
According to this catalytic chemical vapor deposition apparatus, the first restricting portion can restrict the torsion around the vertical axis of the first catalyst wire in a direction perpendicular to the substrate, so that the substrate and the first catalyst wire can be controlled. It is possible to suppress the fluctuation of the distance from As a result, fluctuations in the arrival probability of the source gas decomposition species to the substrate and local temperature rise of the substrate due to radiant heat from the catalyst wire can be prevented, and uneven film thickness distribution can be suppressed. Can do.

The first restricting unit may restrict the twist of the first catalyst line by contacting the first catalyst line when the first catalyst line is twisted more than a predetermined amount.
According to this catalytic chemical vapor deposition apparatus, for example, the first restriction portion contacts the first catalyst line only when a voltage is applied and the first catalyst line is twisted more than a predetermined amount. It is possible to suppress a temperature drop of the first catalyst wire due to contact of the parts.

The chamber includes a first region facing the substrate held by the holding mechanism, a second region above the first region and having both ends positioned therein, and the first region. And a third region where the folded region of the first catalyst line is located.
The first restriction portion may be provided in the third region.
According to this catalytic chemical vapor deposition apparatus, the first restricting portion is provided in the third region below the first region facing the substrate, so that the first restricting portion is formed at the time of film formation. It is possible to prevent an obstacle to the substrate. Furthermore, since the free end of the catalyst wire having a high degree of freedom of movement is restrained by the first restricting portion, the twist of the catalyst wire can be more effectively regulated.

The first restricting portion may include first and second members that face each other with the first catalyst wire interposed therebetween.
According to this catalytic chemical vapor deposition apparatus, the twist of the first catalyst wire can be regulated in the direction perpendicular to the substrate surface by the first and second members facing each other with the folded portion interposed therebetween. Therefore, the twist of the catalyst wire can be regulated with a simple configuration.

The first and second members may be shaft-like members extending in the vertical direction or the horizontal direction.
According to this catalytic chemical vapor deposition apparatus, when the first and second members are axial members extending in the vertical direction, the folded portions of the twisted first catalyst wire are the first and second members. The twist of the first catalyst wire can be regulated by abutting against. Further, when the first and second members are axial members extending in the horizontal direction, the portion suspended in the vertical direction of the twisted first catalyst wire is in contact with the first and second members, The twist of the first catalyst wire can be regulated.

The catalytic chemical vapor deposition apparatus has both ends connected to the power source, and is suspended inside the chamber so as to be folded in a vertical direction so as to face the substrate held by the holding mechanism. You may further have a 2nd catalyst wire.
The first and second members may be shaft-like members extending in the horizontal direction so as to cross the first and second catalyst wires.
According to this catalytic chemical vapor deposition apparatus, since a plurality of catalyst wires are provided, it is possible to deal with a film formation region having a large area. Moreover, the twist of the first and second catalyst wires can be commonly controlled by the first and second members.

The catalytic chemical vapor deposition apparatus is disposed so as to be in contact with the first catalyst line, and the displacement of the first catalyst line with the both ends as fulcrums is applied to the substrate held by the holding mechanism. You may further have the 2nd control part which controls in a parallel direction.
According to this catalytic chemical vapor deposition apparatus, the second restricting portion can restrict misalignment due to twisting around the vertical axis of the catalyst wire in a direction parallel to the substrate.

The second restricting portion may be fixed to a part of the chamber.
The first and second members may be supported by the second restricting portion.
According to this catalytic chemical vapor deposition apparatus, the first and second restricting portions can be configured integrally, so that workability during assembly is improved.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings.

[Configuration of catalytic chemical vapor deposition system]
FIG. 1 is a front view showing a schematic configuration of a catalytic chemical vapor deposition apparatus 10 according to an embodiment of the present invention, and FIG. 2 is a side view showing a schematic configuration of the catalytic chemical vapor deposition apparatus 10 of FIG. It is.
As shown in these drawings, the catalytic chemical vapor deposition apparatus 10 has a vacuum chamber 3. The vacuum chamber 3 has a reaction chamber 2 defined by an adhesion prevention plate 5 inside, and a vacuum pump 4 capable of evacuating the reaction chamber 2 to a predetermined degree of vacuum is connected to the vacuum chamber 3.

The vacuum chamber 3 is provided with a plurality of catalyst wires 6a, 6b, 6c made of a refractory metal such as tantalum, tungsten, molybdenum, iridium or the like. Each of the plurality of catalyst wires 6a, 6b, 6c passes through a through hole (not shown) formed on the top surface of the deposition preventing plate 5 and vertically passes through the reaction chamber 2 (in this embodiment, the direction of gravity). And hung so as to be folded in the vertical direction in the lower region in the reaction chamber 2. Each catalyst wire 6a, 6b, 6c has a hanging portion 61, 62 that hangs down in the vertical direction, and a folded portion 63 between the hanging portions 61, 62. The folded shape may be a U shape, a crank shape, or the like. The wire diameter of the catalyst wire 6 is not specifically limited, For example, it is 0.5 mm.
The length of the catalyst wire 6 is not particularly limited, but the present invention is particularly effective when a film is formed in a large-area film formation region in which the length of one catalyst wire 6 is 2 m or more. This is because when the length of the catalyst wire 6 is 2 m or more, the twist and vibration of the catalyst wire 6 generated when a current is applied are particularly increased. The length of the catalyst wire 6 can be set to 2 m to 5 m. In the present embodiment, the catalyst wire 6 having a length of 2 m is used. In addition, in one catalyst wire 6, the lengths of the hanging portions 61 and 62 are arranged to be equal to each other.

  The number of installed catalyst wires 6 (number of units) is not particularly limited, but FIG. 1 shows a state in which three units of catalyst wires 6a, 6b, and 6c are arranged in a row for easy understanding of the explanation. The number of catalyst wires 6 can be set as appropriate according to the size of the substrate. For example, when a film is formed on a substrate having a wide film formation area of 1290 mm × 880 mm, about 8 units of catalyst wires 6 may be provided.

  The vacuum chamber 3 is further provided with restricting portions 100a, 100b, and 100c for restricting twisting of the catalyst wires 6a, 6b, and 6c, respectively, corresponding to the plurality of catalyst wires 6a, 6b, and 6c. The configuration and the like of the regulation units 100a, 100b, and 100c will be described in detail later.

  In the following description, the arrangement direction of the plurality of catalyst wires 6a, 6b, and 6c is referred to as "X-axis direction", the vertical direction is referred to as "Z-axis direction", and the direction orthogonal thereto is referred to as "Y-axis direction". And Further, the catalyst wires 6a, 6b, and 6c have the same configuration, and the regulation portions 100a, 100b, and 100c also have the same configuration. Accordingly, in the following description, when any one of the catalyst wires 6a, 6b, and 6c is described, it is collectively referred to as “catalyst wire 6”, and any one of the regulation portions 100a, 100b, and 100c. Will be collectively referred to as “regulator 100”. In addition, members described later may have the same general name for the same purpose.

  Both end portions 64, 64 of the catalyst wire 6 are connected to a power supply 8 installed outside the vacuum chamber 3. The power supply 8 may include a current supply source and a control unit (not shown) that can adjust the supply current. The power source 8 can generate heat at the decomposition temperature of a raw material gas (described later) introduced into the reaction chamber 2 by applying electric power between both ends 64 and 64 of the catalyst wire 6. is there. The power source 8 is a DC power source, but may be an AC power source.

  A plurality of gas introduction pipes 7 are installed on the deposition preventing plate 5. The gas introduction pipe 7 is provided with a plurality of source gas ejection holes (not shown) through which the source gas can be ejected, and the source gas can be introduced into the reaction chamber 2. The gas introduction pipe 7 is connected to a source gas supply unit 9 installed outside the vacuum chamber 3 through a gas supply line.

  Inside the reaction chamber 2, for example, a frame-shaped holder 1 capable of holding a glass substrate S having a wide film formation area of 1290 mm × 880 mm is provided. Two holders 1 are provided so as to face each other in the Y-axis direction with the catalyst wire 6 interposed therebetween. The holder 1 can hold the substrate S in a standing state on a plane formed by the X axis and the Z axis. The source gas ejected from the gas introduction pipe 7 is introduced into the space between the substrates S thus held.

  The holder 1 may incorporate a heater for adjusting the temperature of the substrate S, and is not limited thereto, and a heater may be provided in the vicinity of the holder 1. The substrate held by the holder 1 is movable in a direction (X-axis direction) parallel to the arrangement direction of the plurality of catalyst wires 6. The conveyance mechanism of the holder 1 is not particularly limited. For example, the holder 1 may be transported along a rail (not shown) laid on the bottom of the vacuum chamber 3. Alternatively, the holder 1 may be supported by a carrier (not shown) that can move directly above the reaction chamber 2.

  In the vacuum chamber 3, the substrate S held by the holder 1, the catalyst wire 6, and the regulating unit 100 have the following positional relationship. That is, the hanging portions 61 and 62 of the catalyst wire 6 are located in the first region where the substrate S held by the holder 1 is located. Both end portions 64 and 64 of the catalyst wire 6 are located in a second region above the first region where the substrate S is arranged in the Z-axis direction. The folded portion 63 and the regulating portion 100 of the catalyst wire 6 are located in a third region that is lower in the Z-axis direction than the first region where the substrate S is disposed.

  Using the catalytic chemical vapor deposition apparatus 10 configured as described above, catalytic chemical vapor deposition is performed as follows.

  First, the vacuum pump 4 is operated to evacuate the inside of the vacuum chamber 3, and the reaction chamber 2 is depressurized to a predetermined degree of vacuum (for example, 1 Pa). Next, direct current or alternating current power is applied between the both ends 64 and 64 by the power source 8 to supply current to the catalyst wire 6, and the catalyst wire 6 is heated to a predetermined temperature (for example, 2000 ° C.) or more. The heat generation temperature of the catalyst wire 6 is selected to such a temperature that the raw material gas can be thermally decomposed. Further, the substrate S is heated to a predetermined temperature (for example, about 300 ° C.) by the heater. Next, the source gas is introduced from the source gas supply unit 9 into the space between the two substrates S arranged opposite to each other in the reaction chamber 2 through the gas introduction pipe 7. This raw material gas contacts the exothermic catalyst wire 6. Thereby, the decomposition species of the source gas generated by the catalytic reaction or the thermal decomposition reaction are deposited on the substrate S to form a film.

As the source gas, for example, a silicon (Si) film is formed on the surface of the substrate S using a mixed gas of silane (SiH ₄ ) gas and hydrogen (H ₂ ). Note that a film formed on the surface of the substrate S includes a silicon nitride film (SiN), trisilylamine ((SiH ₃ ) ₃ N), ammonia, and hydrogen formed using silane, hydrogen, and ammonia (NH ₃ ). A silicon nitride film formed using hexamethyldisilazane ((CH ₃ ) ₃ SiNHSi (CH ₃ ) ₃ , abbreviated HMDS), silane, hydrogen and oxygen (O ₂ ) or Silicon oxide film (SiO) formed using dinitrogen monoxide (N ₂ O), silicon oxide formed using silane and tetraethyl orthosilicate (Si (OC ₂ H ₅ ) ₄ , TEOS for short) membrane, silane, hydrogen and phosphine (PH ₃₎ or phosphorus-doped silicon film formed using diborane (n-type) or boron-doped silicon (p-type), silane, hydrogen and acetylene or meta A silicon carbide film formed using silane, hydrogen, a germanium film formed using germane, a polytetrafluoroethylene film formed using silane, hexafluoropropylene oxide (abbreviated HFPO), etc. May be. When hydrogen treatment using hydrogen gas is performed, the purpose of terminating defects in the silicon film and removing the natural oxide film can be achieved. In addition, when nitriding using ammonia gas is performed, silicon can be nitrided.

  Here, when the catalyst wire 6 suspended so as to be folded in the vertical direction is energized and heated, a magnetic field is generated around the catalyst wire 6 due to the current flowing through the catalyst wire 6. This magnetic field is a combined magnetic field of the magnetic field generated by the current flowing through the hanging part 61 and the magnetic field generated by the current flowing through the hanging part 62, and the magnitude of the magnetic field is proportional to the magnitude of the current flowing through the hanging parts 61, 62. To do. Due to this magnetic field, the catalyst wire 6 may twist around the Z axis. The cause of the twist is not necessarily unambiguous, but besides the magnetic field generated by the current, the geomagnetic field, the electrostatic force generated between the plurality of catalyst wires 6, and the Lorentz force received by the electrons flowing in the catalyst wire 6 by these magnetic fields. This is considered to be due to electromagnetic force such as. The direction of twist is not uniform and can be clockwise or counterclockwise.

  When the catalyst wire 6 is twisted around the Z axis, the distance between the catalyst wire 6 and the substrate S becomes non-uniform, and the arrival probability of the decomposed species to the substrate S varies, or the substrate S is locally affected by radiant heat from the catalyst wire 6. The temperature rises, and there is a possibility that the film cannot be formed with a desired accuracy. Next, the regulation part 100 provided in each of the plurality of catalyst wires 6 in order to regulate the twist of the catalyst wire 6 around the Z axis will be described.

[Configuration of the Regulatory Department]
Hereinafter, the configuration of the restriction unit 100 and the positional relationship between the restriction unit 100 and the catalyst wire 6 will be described.

FIG. 3 is a perspective view showing the regulating part 100 and the catalyst wire 6. FIG. 4 is a schematic configuration diagram when the regulation unit 100 and the catalyst wire 6 are viewed from the Y-axis direction, and FIG. 5 is a schematic configuration diagram when they are viewed from the Z-axis direction.
As shown in these drawings, the restricting portion 100 includes a flat plate portion 20 (second restricting portion) and four cylindrical portions 30a, 30b, 30c, and 30d (hereinafter referred to as "cylindrical portion 30") having the same shape. (They may be collectively called.) (First restriction part). The flat plate portion 20 and the cylindrical portion 30 are each made of an insulating material such as ceramics. Examples of the ceramic material include alumina and quartz.

  The flat plate portion 20 is a plate-like member having a rectangular surface composed of sides parallel to the X axis and the Y axis, for example. The length of the side in the X-axis direction of the flat plate portion 20 is smaller than the distance between the hanging portions 61 and 62 of the catalyst wire 6. The flat plate portion 20 is disposed between the hanging portions 61 and 62. Specifically, the flat plate portion 20 is not in contact with any of the hanging portions 61 and 62 in a state where no voltage is applied, but the hanging portions 61 and 62 have both ends 64 and 64 as fulcrums as X-axis directions. Are arranged at a distance that contacts the side surface of the flat plate portion 20 when the position is displaced by a predetermined distance.

  The flat plate portion 20 has end portions 21 a and 21 b corresponding to the sides in the X-axis direction supported by a support member 90 (FIG. 1 and FIG. 2) installed at the bottom of the vacuum chamber 3, and horizontally in the reaction chamber 2. Supported and fixed. For example, the support member 90 may be configured as a part of a base such as the rail. Here, the end portions 21c and 21d corresponding to the sides in the Y-axis direction of the flat plate portion 20 face the hanging portions 61 and 62, respectively, while being spaced substantially evenly, and the lower surface portion 22 of the flat plate portion 20 is the folded portion 63. Are arranged so as to face each other while being separated from each other.

  The flat plate portion 20 may be collectively referred to as four circular through holes 23a, 23b, 23c, and 23d (hereinafter referred to as “through holes 23”) into which the four cylindrical portions 30a, 30b, 30c, and 30d can be respectively inserted. ) Is formed. The through holes 23a and 23b are provided in the end 21c close to each other. The through holes 23 a and 23 b are separated from the side in the Y-axis direction of the flat plate portion 20 by an equal distance. The through holes 23a and 23b are also separated from the side in the X-axis direction of the flat plate portion 20 by an equal distance.

  The through holes 23c and 23d are provided in the end portion 21d of the flat plate portion 20 with the same positional relationship as the through holes 23a and 23b. These through holes 23a, 23b, 23c, and 23d have the same shape, which will be described later with reference to the drawings.

  The cylindrical portion 30 includes a rod 31 (first and second members) that is a long shaft-shaped member, and a head portion 32.

  The rod 31 extends in the Z-axis direction so as to cross the folded portion 63. The length of the rod 31 may be appropriately selected in consideration of the deformation of the catalyst wire 6 caused by the effects of thermal expansion and creep. The rod 31 can be inserted into the through hole 23.

  The head 32 is provided at one end of the rod 31. The head 32 regulates the dropout of the cylindrical portion 30 from the through hole 23. The cylindrical portion 30 is attached to the flat plate portion 20 by being inserted into the through hole 23 so that the head portion 32 is positioned on the upper surface portion 24 side.

  Thus, when the cylindrical part 30 is supported with respect to the flat plate part 20, cylindrical part 30a, 30b opposes on both sides of the folding | turning part 63 located under the lower surface part 22 of the flat plate part 20. As shown in FIG. The cylindrical portions 30c and 30d also face each other with the folded portion 63 interposed therebetween.

  At this time, the folded-back portion 63 is located at the approximate center between the cylindrical portions 30a and 30b and at the approximate center between the cylindrical portions 30c and 30d. The folded portion 63 is not in contact with any of the cylindrical portions 30a, 30b, 30c, and 30d, but can come into contact with the cylindrical portions 30a, 30b, 30c, and 30d when the folded portion 63 is displaced. It is arranged at such a distance.

  In addition, the dimension of each said member, distance, etc. can be suitably selected in the range which does not deviate from the said meaning. For example, when the width of the flat plate portion 20 in the X-axis direction is about 50 mm, the distance between the hanging portions 61 and 62 of the catalyst wire 6 may be about 60 mm. The lower surface portion 22 and the folded portion 63 of the flat plate portion 20 may be disposed so as to be separated from each other by about 50 cm in the Z-axis direction, for example. At this time, the distance from the folded portion 63 to the lower end of the rod 31 may be about 200 mm. The distance between the hole centers of the through holes 23a, 23b and the through holes 23c, 23d may be about 10 mm. The through holes 23 a, 23 b, 23 c, and 23 d may be provided at positions where the hole centers are separated from the side in the Y axis direction of the flat plate portion 20 by about 7 mm.

  Next, the shape of the flat plate part 20 and the cylindrical part 30 in the restricting part 100, the relationship of engagement, and the like will be described in more detail.

FIG. 6 is a partial cross-sectional view of the restricting portion 100.
As shown in the figure, the circular through hole 23 provided in the flat plate portion 20 has a large diameter hole portion 25 on the upper surface portion 24 side and a small diameter hole portion 26 on the lower surface portion 22 side. The large-diameter hole portion 25 and the small-diameter hole portion 26 are formed concentrically, and a step surface 27 parallel to the flat plate portion 20 is provided therebetween.

  The head portion 32 of the cylindrical portion 30 is continuous from the small diameter head portion 34 formed continuously from the rod 31, the medium diameter head portion 36 formed continuously from the small diameter head portion 34, and the medium diameter head portion 36. And a large-diameter head 33 formed in the above manner. The large-diameter head 33, the medium-diameter head 36, and the small-diameter head 34 are formed in a concentric columnar shape. A first step surface 35 that is orthogonal to the axial direction of the rod 31 is provided between the small-diameter head 34 and the medium-diameter head 36. A second step surface 37 parallel to the first step surface 35 is provided between the medium diameter head portion 36 and the large diameter head portion 33.

  The cylindrical portion 30 is formed to have the following dimensions with respect to the through hole 23. The diameter of the rod 31 is smaller than the diameter of the small diameter hole portion 26. The diameter of the small diameter head 34 is formed approximately equal to the diameter of the small diameter hole 26. More specifically, the small-diameter head portion 34 can be inserted into the small-diameter hole portion 26, and when the small-diameter head portion 34 is inserted into the small-diameter hole portion 26, the outer peripheral surface of the small-diameter head portion 34 is the inner periphery of the small-diameter hole portion 26. The diameters of the small-diameter head portion 34 and the small-diameter hole portion 26 are selected so that they can come into contact with the surface. The height of the small-diameter head 34 is formed smaller than the height of the small-diameter hole 26. The diameter of the medium-diameter head 36 is larger than the diameter of the small-diameter hole 26 and smaller than the diameter of the large-diameter hole 25, and the height of the medium-diameter head 36 is formed larger than the height of the large-diameter hole 25. The diameter of the large-diameter head 33 is formed larger than the diameter of the large-diameter hole 25.

  The cylindrical portion 30 is inserted into the through hole 23 and attached to the flat plate portion 20. Specifically, when the small-diameter head portion 34 is inserted into the small-diameter hole portion 26, they come into surface contact with each other, so that the movement of the small-diameter head portion 34 in the X-axis direction and the Y-axis direction is restricted. Thereby, the cylindrical portion 30 is positioned in the X-axis and Y-axis directions. The diameters of the rod 31 and the small-diameter hole 26 that are continuous with the lower portion of the small-diameter head 34 are selected so as to be separated by a predetermined distance when positioned.

  Since the diameter of the medium-diameter head portion 36 is larger than the diameter of the small-diameter hole portion 26 and smaller than the diameter of the large-diameter hole portion 25, when the small-diameter head portion 34 is inserted into the small-diameter hole portion 26 as described above, The head 36 is accommodated in the large diameter hole 25. At this time, the first step surface 35, which is the bottom surface of the medium diameter head portion 36, abuts on the step surface 27 as the bottom portion of the large diameter hole portion 25. Thereby, the movement in the Z-axis direction of the medium-diameter head 36 is restricted, and the dropout of the cylindrical part 30 in the Z-axis direction is restricted. Thereby, the cylindrical portion 30 is supported in the triaxial direction with respect to the flat plate portion 20. The diameters of the medium-diameter head 36 and the large-diameter hole 25 are selected so as to be separated from each other by a predetermined distance when engaged.

  Since the height of the medium diameter head portion 36 is larger than the height of the large diameter hole portion 25, when the medium diameter head portion 36 is accommodated in the large diameter hole portion 25, the upper portion of the medium diameter head portion 36 is the large diameter hole portion. It projects from the upper end of 25, that is, the upper surface portion 24 of the flat plate portion 20. Since the diameter of the large-diameter head 33 that is continuous with the upper portion of the medium-diameter head 36 is larger than the diameter of the large-diameter hole 25, the large-diameter head 36 has a large diameter when accommodated in the large-diameter hole 25. A second step surface 37 that is a bottom portion of the head portion 33 is opposed to the upper surface portion 24 of the flat plate portion 20 with a predetermined distance.

  According to the restricting portion 100, the cylindrical portion 30 is supported by the flat plate portion 20 by inserting the cylindrical portion 30 into the through hole 23 of the flat plate portion 20. Thereby, since the cylindrical part 30 and the flat plate part 20 are comprised integrally, workability | operativity at the time of an assembly, a maintenance, etc. improves.

[Regulation of torsion by regulation part]
Next, regulation of the twist of the catalyst wire 6 by the regulation unit 100 will be described.

FIG. 7 is a schematic plan view showing a state when the catalyst wire 6 is twisted clockwise around the Z axis.
Focusing on the folded portion 63 of the catalyst wire 6, as shown in the figure, when the catalyst wire 6 is twisted in the clockwise direction indicated by the arrow about the Z axis, the folded portion 63 is separated from the cylindrical portions 30b and 30c. Rotate to approach the cylindrical portions 30a and 30d. The end portion of the rotated folded portion 63 on the hanging portion 61 side contacts the cylindrical portion 30a, the end portion on the hanging portion 62 side contacts the cylindrical portion 30d, and the twist of the catalyst wire 6 is restricted in the Y-axis direction.

Next, attention is paid to the hanging portions 61 and 62 of the catalyst wire 6.
FIG. 8 is a schematic view showing the restriction portion 100 and the catalyst wire 6 of FIG. 7 from the Y-axis direction.
As shown in the figure, when the catalyst wire 6 is twisted clockwise about the Z axis, the catalyst wire 6 is moved so that the drooping portion 62 is separated from the flat plate portion 20 and the drooping portion 61 is close to the flat plate portion 20. There may be a positional shift in the X-axis direction. The suspended portion 61 of the displaced catalyst wire 6 contacts the end portion 21c of the flat plate portion 20, and the displacement of the catalyst wire 6 is restricted in the X-axis direction.

  According to the present embodiment, the torsion around the Z-axis of the catalyst wire 6 is restricted in the Y-axis direction by the cylindrical portion 30 of the restriction portion 100, so that the substrate S and each part of the catalyst wire 6 in the Y-axis direction are restricted. It is possible to prevent the distance from fluctuating greatly. Further, since the displacement of the catalyst wire 6 is restricted in the X-axis direction by the flat plate portion 20 of the restricting portion 100, it is possible to restrict the catalyst wire 6 from greatly moving from a predetermined position in the X-axis direction. As a result, fluctuations in the arrival probability of the decomposition species to the substrate S and local temperature rise of the substrate S due to radiant heat from the catalyst wire 6 are prevented, and the film thickness distribution of the film formation is suppressed from becoming non-uniform. Can do.

  Further, since the restricting portion 100 is provided in the third region below the substrate S, it does not become an obstacle to the substrate S during film formation. Thereby, the fluctuation | variation of the arrival probability of the decomposition | disassembly seed | species to the board | substrate S, the local temperature rise of the board | substrate S by the radiant heat from the catalyst wire 6, etc. can be suppressed further more reliably.

  Further, the restricting portion 100 prevents the twisted catalyst wire 6 from contacting each member or the like in the vacuum chamber 3. When the catalyst wire 6 comes into contact with each member or the like, the heat is removed from the catalyst wire 6 and the temperature is lowered to the reaction temperature with silicon, and an alloying reaction (silicidation) between the catalyst wire 6 and silicon occurs. There is a risk of cracks occurring on the surface of the wire 6. According to the present embodiment, the contact of the catalyst wire 6 with each member in the vacuum chamber 3 is prevented, so that it is possible to prevent the mechanical strength of the catalyst wire 6 from being lowered and the life from being shortened.

  In addition, when applying alternating current power and supplying an electric current to the catalyst wire 6, the twist direction of the catalyst wire 6 may change periodically. Also in this case, the end of the folded portion 63 on the hanging portion 61 side is in contact with the cylindrical portion 30a or 30b, the end on the hanging portion 62 side is in contact with the cylindrical portion 30d or 30c, and the twist of the catalyst wire 6 is Regulated by direction. Further, the hanging portion 62 abuts against the end portion 21c or 21d of the flat plate portion 20, and the displacement of the catalyst wire 6 is restricted in the X-axis direction.

  In addition, the regulating unit 100 can regulate not only the twisting due to the electromagnetic force or the like of the catalyst wire 6 described above, but also the oscillation and other positional deviations caused by some external force.

FIG. 9 is a diagram illustrating fluctuations in the film thickness distribution of the film formation when the restriction unit 100 is provided and fluctuations in the film thickness distribution of the film formation when the restriction unit 100 is not provided.
This figure illustrates the case where the horizontal width of the film formation region of the substrate is about 1400 mm and seven units of catalyst wires 6 are arranged in a row.

When the restriction portion 100 is not provided, the catalyst wire 6 is twisted to increase the difference in distance between each portion of the catalyst wire 6 and the substrate S in the Y-axis direction, and the catalyst wire 6 has a predetermined length in the X-axis direction. Moves greatly from the position. As a result, the film thickness distribution of the film is non-uniform (> 40A).

  On the other hand, when the restricting portion 100 of the present embodiment is provided, the restricting portion 100 restricts the twist of the catalyst wire 6 in the X-axis direction and the Y-axis direction. (<20A).

  On the other hand, in the catalytic chemical vapor deposition apparatus 10 of the present embodiment, the raw material gas introduced into the space between the substrates S comes into contact with the heated catalyst wire 6 and decomposes the raw material gas by catalytic reaction or thermal decomposition reaction. A seed is generated. This decomposed species is deposited not only on the substrate S but also on each member such as the regulating portion 100 in the reaction chamber 2. As described above, when the twist of the catalyst wire 6 is restricted by the restriction part 100, the folded part 63 comes into contact with the cylindrical part 30. Therefore, when the decomposition species of the source gas are deposited on the regulation unit 100, the catalyst wire 6 may be short-circuited through the accumulated decomposition species.

FIG. 10 is a partial cross-sectional view showing a state in which the source gas decomposition species M is deposited on the regulation unit 100.
According to this embodiment, the outer peripheral surface of the rod 31 and the inner peripheral surface of the small diameter hole portion 26 are separated from each other. For this reason, when decomposed species are deposited on the restriction portion 100, the decomposed species M1 deposited on the outer peripheral surface of the rod 31 and the decomposed species M2 deposited on the lower surface portion 22 of the flat plate portion 20 are indicated by a region A in the figure. In addition, the gaps between the outer peripheral surface of the rod 31 and the inner peripheral surface of the small diameter hole portion 26 are separated from each other. Thereby, the insulation with the rod 31 and the flat plate part 20 is maintained.

  Further, the outer peripheral surface of the medium-diameter head portion 36 and the inner peripheral surface of the large-diameter hole portion 25 are separated from the second step surface 37 and the upper surface portion 24 of the flat plate portion 20. Therefore, the decomposed species M3 deposited on the outer peripheral surface of the large-diameter head 33 and the decomposed species M4 deposited on the upper surface portion 24 of the flat plate portion 20 are, as shown by the region B in the figure, the second step surface 37. And the upper surface portion 24 and the clearance between the medium diameter head portion 36 and the large diameter hole portion 25 are separated from each other. Thereby, the insulation with the head 32 and the flat plate part 20 is maintained.

  As a result, even when decomposed species are deposited on the regulating portion 100, the insulating state is maintained without conduction between the cylindrical portion 30 and the flat plate portion 20.

  Therefore, according to this embodiment, even if the hanging portion 61 of the catalyst wire 6 and the flat plate portion 20 are electrically connected, and the folded portion 63 and the cylindrical portion 30 are electrically connected, the insulation between the cylindrical portion 30 and the flat plate portion 20 is achieved. By maintaining the state, occurrence of a short circuit of the catalyst wire 6 can be prevented.

  Moreover, since the outer peripheral surface of the cylindrical part 30 is a curved surface, the contact area when the folding | returning part 63 contacts the cylindrical part 30 can be made small, Thereby, the insulation state of the folding | returning part 63 and the cylindrical part 30 can be made. Furthermore, it can maintain reliably. For the same purpose, the side surfaces corresponding to the end portions 21c and 21d of the flat plate portion 20 may be curved surfaces, whereby the insulation state between the hanging portions 61 and 62 and the flat plate portion 20 can be more reliably maintained. it can.

[Another embodiment]
The embodiment according to the present invention is not limited to the above-described embodiment, and various other embodiments are conceivable. For example, in the above embodiment, the restriction portions 100a, 100b, and 100c are provided on the plurality of catalyst wires 6a, 6b, and 6c, respectively. However, the restricting portion for restricting the twist of the catalyst wire 6 is not limited to this.

FIG. 11 is a perspective view showing a restricting portion 200 and a catalyst wire 6 according to another embodiment of the present invention.
As shown in the figure, a restricting portion 200 (first restricting portion) according to another embodiment of the present invention includes two cylindrical portions 40a and 40b (hereinafter referred to as “cylindrical portions”) that are long shaft-like members. 40 ”(first and second members). The cylindrical portion 40 has an equal shape and is made of an insulating material such as ceramics.

  In the following description, the same components and functions of the catalytic chemical vapor deposition apparatus 10 according to the above embodiment are denoted by the same reference numerals, and the description will be simplified or omitted, and the description will focus on the different points. To do.

  The cylindrical portion 40 is provided in a third region on the lower side in the Z-axis direction than the first region where the substrate S is disposed. The cylindrical portions 40 are respectively disposed in the X-axis direction and face each other with the hanging portions 61 and 62 of the catalyst wire 6 interposed therebetween. The cylindrical portion 40 may be provided at the same height, for example, but is not limited thereto. The catalyst wire 6 is located approximately at the center of the cylindrical portions 40a and 40b.

Next, regulation of twisting of the catalyst wire 6 by the regulation unit 200 will be described.
FIG. 12 is a schematic view showing the restriction portion 200 and the catalyst wire 6 from the Z-axis direction when the catalyst wire 6 is twisted around the Z-axis.
As shown in the figure, the catalyst wire 6 has an arrow in the figure so that the hanging portion 61 is separated from the cylindrical portion 40a and approaches the cylindrical portion 40b, and the hanging portion 62 is separated from the cylindrical portion 40b and approaches the cylindrical portion 40a. Twist around the Z axis in the direction shown (clockwise). When the catalyst wire 6 is further twisted, the drooping portion 61 comes into contact with the cylindrical portion 40b, the drooping portion 62 comes into contact with the cylindrical portion 40a, and the twisting of the catalyst wire 6 is restricted in the Y-axis direction.

  Also in this embodiment, since the torsion around the Z axis of the catalyst wire 6 is restricted in the Y axis direction by the restricting portion 200 as in the above embodiment, the Y axis direction between the substrate S and each portion of the catalyst wire 6 It is possible to suppress a large fluctuation in the distance at. Thereby, it can suppress that the film thickness distribution of film-forming becomes non-uniform | heterogenous. Further, since the twisted catalyst wire 6 is prevented from coming into contact with each member or the like in the vacuum chamber 3 by the restricting portion 200, it is possible to prevent the mechanical strength of the catalyst wire 6 from being lowered and the life from being shortened. Further, also when the direction of twisting of the catalyst wire 6 is counterclockwise, the drooping portion 61 comes into contact with the cylindrical portion 40a, the drooping portion 62 comes into contact with the cylindrical portion 40b, and the restriction portion 200 twists the catalyst wire 6. Can be regulated in the Y-axis direction.

  Also in this embodiment, a second restricting portion that restricts the displacement of the catalyst wire 6 in the X-axis direction may be provided as in the flat plate portion 20 according to the above embodiment. For example, a member corresponding to the flat plate portion 20 may be provided between the cylindrical portions 40a and 40b. In this case, as in the above embodiment, a member corresponding to the flat plate portion 20 may be provided between the hanging portions 61 and 62 of one catalyst wire 6. Alternatively, a member corresponding to the flat plate portion 20 may be provided between the hanging portion 61 of the catalyst wire 6 and the hanging portion 62 of another adjacent catalyst wire 6.

FIG. 13 is a perspective view showing a regulating portion 300 and a catalyst wire 6 according to another embodiment of the present invention.
As shown in the figure, a restricting portion 300 according to another embodiment of the present invention includes a flat plate portion 320 and, for example, four cylindrical portions 330 (first restricting portions) having the same shape.

  The flat plate portion 320 is disposed below the folded portion 63 of the catalyst wire 6 so as to face the folded portion 63 while being spaced apart. The cylindrical portion 330 is provided substantially perpendicularly to the upper surface of the flat plate portion 320 and extends in the Z-axis direction so as to cross the folded portion 63. The distance between the flat plate portion 320 and the folded portion 63 and the length of the cylindrical portion 330 may be appropriately selected in consideration of deformation of the catalyst wire 6 caused by the effects of thermal expansion, creep, and the like.

  Also in this embodiment, since the torsion around the Z axis of the catalyst wire 6 is restricted in the Y axis direction by the restricting portion 300 as in the above embodiment, the Y axis direction of the substrate S and each part of the catalyst wire 6 is restricted. It is possible to suppress a large fluctuation in the distance at. Also in this embodiment, a second restricting portion that restricts the displacement of the catalyst wire 6 in the X-axis direction may be provided.

FIG. 14 is a perspective view showing a regulating portion 400 and a catalyst wire 6 according to another embodiment of the present invention.
As shown in the figure, a restricting portion 400 according to another embodiment of the present invention includes a first flat plate portion 420 and two second flat plate portions 430 (first restricting portions) having the same shape. Have.

  The first flat plate portion 420 is disposed below the folded portion 63 of the catalyst wire 6 so as to face the folded portion 63 while being spaced apart. The second flat plate portion 430 is provided substantially perpendicularly to the upper surface of the first flat plate portion 420 and extends in the Z-axis direction so as to cross the folded portion 63. The distance between the first flat plate portion 420 and the folded portion 63 and the length of the second flat plate portion 430 may be appropriately selected in consideration of the deformation of the catalyst wire 6 caused by the effects of thermal expansion, creep, and the like. .

  Also in this embodiment, since the torsion around the Z axis of the catalyst wire 6 is restricted in the Y axis direction by the restricting portion 400 as in the above embodiment, the Y axis direction between the substrate S and each portion of the catalyst wire 6 is restricted. It is possible to suppress a large fluctuation in the distance at. Also in this embodiment, a second restricting portion that restricts the displacement of the catalyst wire 6 in the X-axis direction may be provided.

FIG. 15 is a perspective view showing a regulating portion 500 and a catalyst wire 6 according to another embodiment of the present invention.
As shown in the figure, a restricting portion 500 according to another embodiment of the present invention has a flat plate portion 520 (a first restricting portion, a second restricting portion) provided with two through holes 523.

  The flat plate portion 520 is a plate-like member having a rectangular surface composed of sides parallel to the X axis and the Y axis, for example. The length of the side of the flat plate portion 520 in the X-axis direction is larger than the distance between the hanging portions 61 and 62 of the catalyst wire 6. The flat plate portion 520 is disposed above the folded portion 63 of the catalyst wire 6 so as to face the folded portion 63 while being separated. The distance between the flat plate portion 520 and the folded portion 63 may be appropriately selected in consideration of deformation of the catalyst wire 6 caused by the effects of thermal expansion, creep, and the like.

  The flat plate portion 520 is formed with, for example, two circular through holes 523 into which the hanging portions 61 and 62 of the catalyst wire 6 can be inserted. As for the position and size of the through hole 523, the inner peripheral surface is not in contact with any of the hanging parts 61 and 62, but the hanging parts 61 and 62 are displaced by a predetermined distance in the X axis direction and the Y axis direction. Sometimes, the hanging portions 61 and 62 are selected so as to be able to contact the inner peripheral surface of the through hole 23. In addition, although the through-hole 523 is circular in this figure, it is not limited to this, A rectangle etc. may be sufficient.

  Also in this embodiment, the torsion around the Z-axis of the catalyst wire 6 is restricted in the X-axis direction and the Y-axis direction by the restricting portion 500 as in the above-described embodiment. It is possible to prevent the distance in the X-axis direction and the Y-axis direction from greatly fluctuating.

FIG. 16 is a perspective view showing a regulating portion 600 and a catalyst wire 6 according to another embodiment of the present invention.
As shown in the figure, a restriction part 600 according to another embodiment of the present invention has a flat plate part 620 (first restriction part, second restriction part) provided with two notches 623.

  The flat plate portion 620 is a plate-like member having a rectangular surface composed of sides parallel to the X axis and the Y axis, for example. The length of the side of the flat plate portion 620 in the X-axis direction is larger than the distance between the hanging portions 61 and 62 of the catalyst wire 6. The flat plate portion 620 is disposed above the folded portion 63 of the catalyst wire 6 so as to face the folded portion 63 while being spaced apart. The distance between the flat plate portion 620 and the folded portion 63 may be appropriately selected in consideration of deformation of the catalyst wire 6 caused by the effects of thermal expansion, creep, and the like.

  The flat plate portion 620 is formed with, for example, two U-shaped notches 623 into which the hanging portions 61 and 62 of the catalyst wire 6 can be inserted. The position and size of the notch 623 are such that the inner peripheral surface is not in contact with any of the hanging parts 61 and 62, but the hanging parts 61 and 62 are displaced by a predetermined distance in the X-axis direction and the Y-axis direction. The hanging portions 61 and 62 are selected so as to be able to contact the inner peripheral surface of the cutout portion 623. In addition, although the notch part 623 is made into U shape in this figure, it is not limited to this, A rectangle etc. may be sufficient.

  Also in this embodiment, the torsion around the Z-axis of the catalyst wire 6 is restricted in the X-axis direction and the Y-axis direction by the restricting portion 600 as in the above-described embodiment. It is possible to prevent the distance in the X-axis direction and the Y-axis direction from greatly fluctuating.

FIG. 17 is a front view showing a schematic configuration of a catalytic chemical vapor deposition apparatus 10 according to another embodiment of the present invention.
In the catalytic chemical vapor deposition apparatus 10 shown in FIG. 1, three units of the catalyst wire 6 have both end portions 64 and 64, respectively, and both end portions 64 and 64 are connected to the power source 8, respectively. Not. As shown in FIG. 17, three units of the catalyst wire 6 may be configured by bending a plurality of one catalyst wire 6 having both end portions 64 and 64 connected to the power supply 8. In this case, the catalyst wire 6 may be supported by a support member (not shown) at the folded portion on the upper side. In this case, the temperature drop of the catalyst wire 6 at the support point can be suppressed by configuring the support member with a heat insulating material.

DESCRIPTION OF SYMBOLS 1 ... Holder 2 ... Reaction chamber 3 ... Vacuum chamber 4 ... Vacuum pump 5 ... Deposition plate 6, 6a, 6b, 6c ... Catalyst wire 7 ... Gas introduction piping 8 ... Power supply 9 ... Raw material gas supply part 10 ... Catalyst chemical vapor phase Growth device 20, 320, 520, 620 ... flat plate portion 23, 23a, 23b, 23c, 23d, 523 ... through hole 25 ... large diameter hole portion 26 ... small diameter hole portion 27 ... step surface 30, 30a, 30b, 30c, 30d , 330 ... cylindrical part 31 ... rod 32 ... head 33 ... large diameter head 34 ... small diameter head 35 ... first step surface 36 ... medium diameter head 37 ... second step surface 40, 40a, 40b ... cylinder Part (first and second members)
61, 62 ... hanging part 63 ... folded part 64 ... both ends 100, 100a, 100b, 100c, 200, 300, 400, 500, 600 ... regulating part

Claims (8)

A chamber;
A holding mechanism for holding the substrate upright in the chamber;
Both ends connected to a power source are opposed to the main surface of the substrate held by the holding mechanism and are suspended in the chamber so as to be folded in the vertical direction, and power is supplied between the both ends. A first catalyst wire capable of generating heat at a decomposition temperature of the raw material gas introduced into the chamber by applying;
A catalytic chemical vapor deposition apparatus comprising: a first restricting unit that restricts twisting of the first catalyst line around a vertical axis by contacting the first catalyst line. The catalytic chemical vapor deposition apparatus according to claim 1,
The first restricting unit contacts the first catalyst line when the first catalyst line is twisted more than a predetermined amount, and restricts the twist of the first catalyst line. The catalytic chemical vapor deposition apparatus according to claim 2,
The chamber is
A first region facing the main surface of the substrate held by the holding mechanism;
A second region above the first region and where the both ends are located;
A third region that is below the first region and in which the folded region of the first catalyst wire is located,
The first restricting portion is provided in the third region. A catalytic chemical vapor deposition apparatus. The catalytic chemical vapor deposition apparatus according to claim 3,
The first regulating unit includes first and second members facing each other with the first catalyst wire interposed therebetween. Catalytic chemical vapor deposition apparatus. The catalytic chemical vapor deposition apparatus according to claim 4,
The first and second members are axial members extending in a vertical direction or a horizontal direction. The catalytic chemical vapor deposition apparatus according to claim 5,
A second catalyst wire that has both ends connected to the power supply and is suspended in the chamber so as to be folded in a vertical direction so as to face the main surface of the substrate held by the holding mechanism. Further comprising
The said 1st and 2nd member is a shaft-shaped member extended so that the said 1st and 2nd catalyst line may be crossed. Catalytic chemical vapor deposition apparatus. The catalytic chemical vapor deposition apparatus according to claim 4,
Positional displacement of the first catalyst wire, which is disposed so as to be in contact with the first catalyst wire and has both ends as fulcrums, is regulated in a direction parallel to the main surface of the substrate held by the holding mechanism. A catalytic chemical vapor deposition apparatus further comprising a second regulating unit. The catalytic chemical vapor deposition apparatus according to claim 7,
The second restricting portion is fixed to a part of the chamber;
The first and second members are supported by the second restricting portion. Catalytic chemical vapor deposition apparatus.

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