JP2010227784A - Gas dissolving apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a gas dissolving apparatus which can generate the liquid sufficiently high in gas dissolving amount corresponding to a demanded effect or the like without additionally providing an oxygen enrichment unit or the like, and can be downsized. <P>SOLUTION: The gas dissolving apparatus includes an inflow part 12 for introducing a gas-liquid mixed fluid of a gas to be dissolved and fluid into a dissolving tank 2, an outflow part 13 disposed at the bottom part of the dissolving tank for taking out the liquid 5 generated by dissolving the gas in the fluid to the outside of the dissolving tank, and an exhaust part 15 for discharging the gas stored inside the dissolving tank to the outside of the dissolving tank. The exhaust amount of the gas by the exhaust part is set to be ≥20% of the supply amount of the gas introduced into the dissolving tank as the gas-liquid mixed fluid through the inflow part. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to a gas dissolving apparatus that can be used for producing hot water in which fine bubbles are generated.

  2. Description of the Related Art There is known a gas dissolving apparatus that generates a gas-liquid solution by dissolving a gas in a liquid.

  In Patent Document 1, an injection nozzle that injects a gas-liquid mixed fluid toward the inside of the liquid bubble dissolution tank is disposed at the bottom of the liquid bubble dissolution tank, and the treatment liquid discharge unit that discharges the processing liquid in the liquid bubble dissolution tank is also a liquid bubble. A gas dissolution amount adjuster disposed at the bottom of the dissolution tank is described.

  The gas dissolution amount adjuster described in Patent Document 1 also includes a gas recirculation unit that recirculates the undissolved gas around the uppermost part in the liquid bubble dissolution tank to the suction chamber of the ejector unit having the injection nozzle. A large amount of undissolved gas accumulated in the upper part of the liquid bubble dissolution tank can be sucked into the suction chamber by the gas recirculation part, and the undissolved gas is entrained in the gas-liquid mixed fluid injected from the injection nozzle and returned to the liquid bubble dissolution tank. Can be made. For this reason, the gas dissolution amount adjuster also has an advantage that the dissolved concentration of gas can be increased by making the maximum use of undissolved gas.

  However, assuming that the gas dissolution apparatus can be put into practical use and applied to a fine bubble generation bath or the like, it is sufficient to meet the required effects even with the gas dissolution amount adjuster described in Patent Document 1. It is not always easy to obtain a liquid in which a gas is dissolved at a high concentration. Therefore, for example, when oxygen-enriched water is generated, an oxygen-enriched unit with an oxygen-enriched membrane that increases the oxygen concentration in the air is installed, and the sucked air is passed through the oxygen-enriched unit to reduce the nitrogen concentration. Thus, oxygen-enriched air having a high oxygen partial pressure with an oxygen concentration increased to about 30% is generated, and this oxygen-enriched air is mixed with water (Patent Document 2). .

JP 2004-298840 A Japanese Patent Laying-Open No. 2005-288051

  On the other hand, in order to put the gas dissolving device into practical use, it is important to promote downsizing and realize a space-saving gas dissolving device. From the viewpoint of such downsizing, the installation of the oxygen enrichment unit is not preferable because it requires an installation space.

  The present invention has been made in view of the circumstances as described above, and can produce a liquid with a sufficiently high amount of dissolved gas corresponding to the required efficacy, etc., without providing an oxygen enrichment unit or the like. An object of the present invention is to provide a gas dissolving device that can be miniaturized.

  The present invention has the following features in order to solve the above problems.

  That is, the first invention includes a dissolution tank that generates a liquid in which a gas is dissolved, and the dissolution tank includes an inflow portion that introduces a gas-liquid mixed fluid of a dissolved gas and a fluid into the dissolution tank, and the gas An outflow part arranged at the bottom of the dissolution tank for taking out the liquid generated by dissolving in the fluid is provided outside the dissolution tank, and an exhaust part for discharging the gas stored in the dissolution tank to the outside of the dissolution tank. The gas and the liquid supplied by the gas-liquid mixed fluid flowing into the dissolution tank through the inflow part are mixed in the dissolution tank to generate a liquid in which the gas is dissolved, and the liquid passes through the outflow part to the outside of the dissolution tank. And the gas-liquid mixed fluid flowing in from the inflow part is a mixture of water and air, and the amount of gas exhausted by the exhaust part is dissolved as a gas-liquid mixed fluid through the inflow part. It is characterized in that it is set to more than 20% of the air charge of air to be introduced into the click.

  The second invention is characterized in that the fluid is hot water for bathing.

  According to the first aspect of the invention, the amount of oxygen dissolved in water, which is highly soluble in water, in the air supplied into the dissolution tank is larger than that of nitrogen, corresponding to the required efficacy, A liquid having a sufficiently high oxygen concentration can be generated. Therefore, an accessory unit such as an oxygen enrichment unit can be omitted, and the gas dissolving apparatus can be miniaturized.

  According to the said 2nd invention, the gas dissolving apparatus suitable for a fine bubble generation bathtub is provided.

It is the partially cutaway perspective view which showed the dissolution tank in one Embodiment of the gas dissolving apparatus of this invention. It is a front view of the dissolution tank shown in FIG. It is the longitudinal cross-sectional view seen from the back side of the dissolution tank shown in FIG. It is AA sectional drawing of the dissolution tank shown in FIG. It is BB sectional drawing of the dissolution tank shown in FIG. It is the perspective view which showed one Embodiment of the gas dissolving apparatus of this invention provided with the dissolution tank shown in FIG. It is the partially cutaway perspective view which looked at the dissolution tank shown in FIG. 1 from diagonally downward. FIG. 6 is an enlarged cross-sectional view showing an enlarged vicinity of a gas release valve of the dissolution tank shown in FIG. 5. It is the graph which showed the mode of a raise of dissolved oxygen concentration when changing an exhaust ratio. It is the graph which showed the relationship between exhaust ratio (air exhaust ratio) and dissolved oxygen concentration raise.

  As shown in FIGS. 1-5, the gas dissolution apparatus 1 includes a hollow dissolution tank 2 having a slightly vertically long box shape. Two partition walls, that is, a first partition wall 3 and a second partition wall 4 are provided inside the dissolution tank 2, and the gas-liquid mixing tank 6 is located upstream of the flow of the liquid 5, which will be described later. A partition is formed by one partition wall 3. In addition, a large bubble outflow prevention tank 7 is formed on the downstream side of the gas-liquid mixing tank 6 by the second partition wall 4 together with the first partition wall 3, and the large bubble outflow prevention tank 7 is adjacent to the gas-liquid mixing tank 6. Are arranged. On the most downstream side with respect to the flow of the liquid 5, the gas-liquid separation tank 8 is partitioned by the second partition wall 4 and is disposed adjacent to the large bubble outflow prevention tank 7.

  As shown in FIG. 3, the first partition wall 3 extends downwardly from the upper wall portion 2 a to the bottom wall portion 2 b of the dissolution tank 2. The first partition wall 3 is formed in a substantially flat plate shape. On the other hand, the lower end 3 a of the first partition wall 3 does not reach the bottom wall portion 2 b, and a gap is formed between the bottom wall portion 2 b and the gas-liquid mixing tank 6 and the large bubble are formed using this gap as a flow path for the liquid 5. The outflow prevention tanks 7 communicate with each other.

  The second partition wall 4 extends vertically upward from the bottom wall portion 2b of the dissolution tank 2 toward the upper wall portion 2a. The 2nd partition wall 4 is formed in a cylinder shape, and the cross section has an oval shape. The upper end 4 a of the second partition wall 4 is located below the upper wall portion 2 a of the dissolution tank 2, and the large bubble outflow prevention tank 7 and the gas-liquid separation tank 8 communicate with each other at the upper part of the dissolution tank 2.

  The second partition wall 4 is provided with a longitudinal rib 9 extending in the longitudinal direction of the dissolution tank 2 on the facing surface 4 b facing the first partition wall 3 so as to protrude toward the first partition wall 3. The vertical ribs 9 are formed in small pieces having a substantially rectangular shape, and are arranged in two rows at the lower end portion of the facing surface 4b with a space therebetween. The vertical rib 9 can also be provided on the surface 3 b of the first partition wall 3 that faces the second partition wall 4.

  Further, the second partition wall 4 is provided with a projecting portion 10 projecting upward at the center of the portion facing the first partition wall 3. The protrusion 10 is formed in a small piece having a substantially rectangular shape. The upper end 10a of the protruding portion 10 does not reach the upper wall portion 2a of the dissolution tank 2 and is disposed below the upper wall portion 2a.

  Such a dissolution tank 2 is provided with a lateral rib 11 at the upper end of the gas-liquid separation tank 8. The lateral ribs 11 are arranged in parallel with respect to the flow of the liquid 5 in the gas-liquid separation tank 8. The direction substantially coincides with the width direction of the vertical rib 9 protruding into the large bubble outflow prevention tank 7, and extends in a direction substantially orthogonal to the protruding portion 10 provided on the second partition wall 4. .

  In addition, the dissolution tank 2 is provided with an inflow pipe connection portion 12 that opens downward as an inflow portion on the bottom wall portion 2 b of the gas-liquid mixing tank 6. The other end of the inflow pipe having one end connected to the discharge side of the pump, which will be described later, is connected to the inflow pipe connecting portion 12. The gas-liquid separation tank 8 is provided with an outflow pipe connection portion 13 that opens to the front side at the lower end as an outflow portion. The outflow pipe connecting portion 13 is connected to one end portion of an outflow pipe that sends the liquid 5 in which the gas is dissolved generated in the dissolution tank 2 to a supply section such as a bathtub.

  Furthermore, the dissolution tank 2 is provided with a gas circulation path 14 that connects the upper end portion and the lower end portion of the dissolution tank 2 through the outside of the dissolution tank 2 and communicates with each other. As will be described later, the gas circulation path 14 is used for temporarily removing the gas stored in the dissolution tank 2 from the dissolution tank 2 and circulating it back into the dissolution tank 2 when the liquid 5 is generated. For this reason, as shown in FIG. 3, the one end part 14a of the gas circulation path 14 is connected to the gas outlet 32 formed in the upper wall part 2a of the dissolution tank 2 corresponding to the upper end part of the large bubble outflow prevention tank 7. It is connected. The other end 14 b of the gas circulation path 14 is connected to the lower end of the gas-liquid mixing tank 6.

  Furthermore, the dissolution tank 2 is provided with a gas release valve 15 at a portion corresponding to the upper end portion of the gas-liquid separation tank 8 in the upper wall portion 2a to form an exhaust portion. As shown in FIGS. 5 and 8, the gas release valve 15 floats and sinks following the height of the liquid surface 33 of the liquid 5 in the gas-liquid separation tank 8 when the liquid 5 is generated, and is movable in the vertical direction. A float 34 is provided, and the float 34 moves up and down as the liquid level changes, so that the gas stored in the dissolution tank 2 is released and stopped. The portion of the upper wall 2a of the dissolution tank 2 where the gas release valve 15 is provided corresponds to the upper end of the gas-liquid separation tank 8, and as shown in FIG. 2, the large bubble outflow prevention tank 7 and the gas-liquid separation tank 8 is an inclined surface portion 2c that is inclined obliquely downward from the boundary portion 16 to the edge portion of the upper wall portion 2a of the dissolution tank 2 facing the boundary portion 16.

  As shown in FIGS. 5 and 7, the gas release valve 15 has a gas vent 35 that is a cross section of the second partition wall 4 so that the gas in the dissolution tank 2 enters from the lateral direction with respect to the float 34. It is formed to open to the side that is the same direction as the longitudinal direction of the substantially oval, and is disposed on both the left and right sides of the gas release valve 15. The gas release valve 15 has a gas discharge port 37 formed at the top of the float chamber 36 that accommodates the float 34, and the float chamber 36 communicates with the outside through the gas discharge port 37. The lateral rib 11 is disposed at the upper end of the gas-liquid separation tank 8 almost directly below the gas release valve 15.

  The dissolution tank 2 as described above is also divided slightly below the center in the height direction, with the upper unit 17 being the upper side and the lower unit 18 being the lower side. The first partition wall 3 is integrally incorporated in the upper unit 17, and the second partition wall 4 is integrally incorporated in the lower unit 18 including the vertical ribs 9 and the protrusions 10 provided here. Further, flange portions 19 and 20 are provided on the lower end edge portion of the upper unit 17 and the upper end edge portion of the lower unit 18 so as to protrude outward. The melting tank 2 is configured to fasten the upper unit 17 and the lower unit 18 with bolts at predetermined portions of the overlapping flange portions 19 and 20 by using bolts and, if necessary, nuts, by overlapping the flange portions 19 and 20 with each other. Assemble and unite.

  As shown in FIG. 6, in the gas dissolving apparatus 1, the melting tank 2 has one end connected to the discharge side of a pump 21 arranged in a column below the dissolving tank 2 in the inflow pipe connecting portion 12. The other end of the inflow pipe 22 is connected. The gas circulation path 14 connected to the upper wall portion 2a of the dissolution tank 2 at one end portion 14a is connected to the gas circulation ejector 23 disposed at the connection portion between the inflow pipe 22 and the inflow pipe connection portion 12 at the other end portion 14b. It is connected to the. In addition, one end of an outflow pipe 24 for supplying a supply section for the liquid 5 in which a gas is dissolved, such as a bathtub, is connected to the outflow pipe connection section 13 of the dissolution tank 2.

  The suction side of the pump 21 is connected to the other end of the suction pipe 25 which is connected to a supply unit such as a bathtub and connected to one end. For example, in the case of a bathtub, one end of the suction pipe 25 communicates with a suction port 26 communicating with the inside of the bathtub to suck in hot water in the bathtub, and the other end of the outflow pipe 24 connected to the outflow pipe connecting portion 13. The end portion communicates with the inside of the bathtub, and communicates with the discharge port 27 for discharging hot water in which the air is dissolved in the bathtub. FIG. 6 illustrates a suction / discharge plug 28 having both the suction port 26 and the discharge port 27. The suction / discharge plug 28 is attached to, for example, a tank wall of a bathtub, and has a first flow path communicating from the suction port 26 to the suction pipe 25 and a second flow communicating from the discharge port 27 to the outflow pipe 24. And road. The first flow path and the second flow path are independent from each other in the suction / discharge plug 28 and do not communicate with each other.

  Further, in the gas dissolving device 1, the gas supply port 29 is provided on the upper wall 2 a of the dissolving tank 2 in order to mix the gas with the fluid introduced into the dissolving tank 2 through the inflow pipe 22 and generate a gas-liquid mixed fluid. A gas introduction ejector 30 is disposed near the connection between the suction side of the pump 21 and the suction pipe 25. The gas supply port 29 and the gas introduction ejector 30 are connected in communication via a gas introduction pipe 31.

  In such a gas dissolution apparatus 1, a gas that becomes a solute such as air in the liquid 5 in which the gas is dissolved is pressurized and stored in the dissolution tank 2 before operation. When the pump 21 is operated and the operation is started, a fluid that becomes a solvent in the liquid 5 such as hot water in the bathtub is sucked from the suction port 26. The sucked fluid is supplied from the lower part to the gas-liquid mixing tank 6 of the dissolution tank 2 through the suction pipe 25 and the inflow pipe 22 and is ejected to the gas-liquid mixing tank 6. This ejection of fluid is caused by being pressurized to a predetermined pressure by the pump 21. In addition, a gas that is dissolved in the fluid is sucked into the fluid from the gas supply port 29 by the gas introduction ejector 30, sent through the gas introduction pipe 31, and mixed to generate a gas-liquid mixed fluid. This gas-liquid mixed fluid is ejected to the gas-liquid mixing tank 6 as described above.

  The gas-liquid mixed fluid jets and flows into the gas-liquid mixing tank 6 shown in FIG. 1-5 toward the inner surface of the upper wall portion 2a of the dissolution tank 2. At this time, the gas-liquid mixed fluid collides with the upper wall portion 2 a and the first partition wall 3 of the dissolution tank 2, rebounds, and gradually accumulates at the bottom of the gas-liquid mixing tank 6. In addition, the gas-liquid mixed fluid that collides with the inner surface of the upper wall portion 2a and rebounds collides with the liquid surface of the fluid stored in the gas-liquid mixing tank 6 to stir the fluid.

  At this time, the gas stored in the dissolution tank 2 is mixed with the gas-liquid mixed fluid by mixing or the like, and the gas in the gas-liquid mixed fluid is also mixed with the fluid. A dissolved liquid 5 is produced. This is because the gas mixed as bubbles in the fluid is subdivided by shearing by agitation, and the surface area in contact with the fluid increases, and the dissolved concentration of the gas near the liquid surface is reduced by homogenization by agitation. This is due to an increase in the dissolution rate of the liquid into the fluid.

  The liquid 5 in which the gas is dissolved in this way flows into the large bubble outflow prevention tank 7 using the gap between the lower end 3a of the first partition wall 3 and the bottom wall portion 2b of the dissolution tank 2 as a flow path, and gradually increases. It accumulates in the bubble outflow prevention tank 7. Since the liquid 5 flows into the large bubble outflow prevention tank 7 at the bottom of the dissolution tank 2, mixing of large bubbles into the liquid 5 is suppressed.

  When the liquid level of the liquid 5 exceeds the upper end 4 a of the second partition wall 4 in the large bubble outflow prevention tank 7, the liquid 5 flows into the gas-liquid separation tank 8. Thus, in the gas-liquid separation tank 8, before the liquid 5 flows out from the dissolution tank 2 to the outside by the second partition wall 4, the flow of the liquid 5 is lifted to the vicinity of the liquid surface, which is the gas-liquid interface. Large bubbles rise by buoyancy and burst at the liquid level. As a result, gas-liquid separation is promoted. Moreover, since the flow of the liquid 5 is a flow that passes over the upper end 4a of the second partition wall 4, it is a flow that passes through the liquid surface, and gas-liquid separation is also promoted when the liquid 5 passes over the second partition wall 4. .

  In addition, since the gas-liquid separation tank 8 is provided with the outflow pipe connecting portion 13 on the bottom wall portion 2b of the dissolution tank 2, even if bubbles due to undissolved gas are mixed in the liquid 5, Outflow of large bubbles existing near the surface can be suppressed. Bubbles are present densely toward the upper side of the liquid 5 to be stored, and large bubbles near the liquid surface do not exist so much near the bottom wall 2b. Since the liquid 5 flows out from the bottom of the dissolution tank 2 to the outside of the dissolution tank 2 through the outflow pipe connecting portion 13 and is taken out, the outflow of large bubbles is suppressed.

  The liquid 5 flowing out of the dissolution tank 2 through the outflow pipe connecting portion 13 is sent out from the discharge port 27 to a supply section such as a bathtub through the outflow pipe 24 shown in FIG.

  Further, in the gas dissolving apparatus 1, during operation, a pressure difference is generated near both ends of the one end portion 14a and the other end portion 14b of the gas circulation path 14 in the dissolving tank 2. The pressure in the vicinity of one end portion 14 a facing the upper end portion of the dissolution tank 2 is higher than the pressure in the vicinity of the other end portion 14 b facing the lower end portion of the dissolution tank 2. In accordance with this pressure difference, the gas circulation ejector 23 sucks the undissolved gas stored in the upper part of the dissolution tank 2 and flows through the gas circulation path 14 from the one end portion 14a to the other end portion 14b. , And sent out to the gas-liquid mixing tank 6 of the dissolution tank 2.

  Thus, in the gas dissolving device 1, the gas stored in the dissolution tank 2 can be dissolved in the gas-liquid mixed fluid while circulating. The gas introduced into the gas-liquid mixed fluid via the gas circulation path 14 is taken into the fluid as bubbles, the contact area with the fluid is large, and the gas dissolution efficiency is increased. In addition, the volume flow rate of the gas-liquid mixed fluid increases and the flow rate increases because the undissolved gas is dissolved in the fluid, so that the gas-liquid stirring is further improved and the improvement of the gas dissolution efficiency is promoted. And is effective in eliminating large bubbles. Furthermore, since the other end portion 14b of the gas circulation path 14 faces the lower end portion of the dissolution tank 2, a contact distance between the fluid and the gas in the dissolution tank 2 can be secured to some extent, and the gas-liquid contact time is sufficient. It is ensured, and the improvement of the gas dissolution efficiency is further promoted. Since the gas dissolution efficiency is increased in this way, it is not necessary to lengthen the contact time between the gas and the gas-liquid mixed fluid, so that the fluid path can be shortened, and the gas dissolution apparatus 1 is downsized. Yes.

  In addition, in the gas dissolving device 1, a portion corresponding to the upper end portion of the gas-liquid separation tank 8 in the upper wall portion 2 a of the dissolution tank 2 is formed as an inclined surface portion 2 c, and the upper end portion of the large bubble outflow prevention tank 7 Since one end portion 14a of the gas circulation path 14 for circulating the gas stored in the dissolution tank 2 is connected to the gas outlet 32 formed in the upper wall portion 2a of the corresponding dissolution tank 2, the dissolution tank The gas stored in 2 is easy to escape to the gas circulation path 14. For this reason, in the gas-liquid separation tank 8, the undissolved gas stored in the upper corner portion of the dissolution tank 2 can be reliably taken out from the gas outlet 32, and the lower end of the gas-liquid mixing tank 6 is passed through the gas circulation path 14. The undissolved gas can be reliably circulated. The undissolved gas stored in the dissolution tank 2 can be fully utilized and dissolved in the fluid, and the amount of gas dissolved in the liquid 5 increases.

  Moreover, in the gas dissolving apparatus 1, since the gas release valve 15 is provided in the inclined surface part 2c of the dissolution tank 2, the space required for attachment of the gas release valve 15 is reduced, and the gas dissolving apparatus including the gas release valve 15 is included. The miniaturization of 1 is promoted.

  In addition, since the gas vent 35 is formed in the gas release valve 15 so that the gas enters the float 34 from the lateral direction, the bubbles in the liquid 5 directly pass from the gas release valve 15 to the outside of the dissolution tank 2. It is difficult to release. As shown in FIG. 8, when the liquid level 33 reaches the float chamber 36 during the gas-liquid separation, the bubbles in the liquid 5 hit the upper wall portion 2 a of the dissolution tank 2, and the gas reservoir 38 is moved to the gas release valve 15. Form around. The formation of the gas reservoir 38 is because the gas vent 35 is formed to open to the side of the gas release valve 15 so that the gas enters the float 34 from the lateral direction. For this reason, the gas separated from the liquid 5 is temporarily stored in the dissolution tank 2. The gas to be stored is returned to the lower end of the gas-liquid mixing tank 6 through the gas circulation path 14 and circulated. Thus, the gas dissolving apparatus 1 can also reliably circulate undissolved gas via the gas circulation path 14. A decrease in the gas-liquid ratio of the generated liquid 5 can be suppressed.

  When the liquid level 33 is lowered, it moves downward in the float chamber 36 so that the float 34 sinks, and the gas flows into the gas release valve 15 through the gas vent 35 and escapes from the gas outlet 37 to the outside of the dissolution tank 2. Released. Such gas release can be performed periodically in the gas dissolving device 1, and the gas flow rate to be supplied varies, so that even if an excessive amount of gas is introduced, the undissolved gas flows out of the liquid 5. At the same time, it is possible to suppress the outflow from the dissolution tank 2 to the outside.

  In the gas dissolving device 1, the amount of gas exhausted by the gas release valve 15 forming the exhaust part is the amount of air introduced into the dissolution tank 2 as a gas-liquid mixed fluid through the inflow pipe connecting part 12 provided as the inflow part. It is set to 20% or more of the air supply amount.

  The gas dissolution rate is expressed as the following equation as the product of the gas-liquid contact area and the gas concentration gradient.

C _v (t) = K _L · α · (C ^* −C) dt
C _v (t): dissolution rate
K _L: overall mass transfer coefficient
α: Contact area
C ^* : Saturated dissolved gas concentration
C: Dissolved gas concentration That is, the gas dissolution rate C _v (t) depends on the contact area α and the saturated dissolved gas concentration C ^* .

By the way, Boyle's law
Since pressure × volume = constant, as the pressure increases, the gas volume decreases. On the other hand, the law of mass action (law of chemical equilibrium)
Since the concentration of the gas / the concentration of the gas dissolved in the liquid = constant, the higher the concentration of the gas, the higher the concentration of the gas dissolved in the liquid. That is, as is known as Henry's Law, the saturated dissolved oxygen concentration of a gas in a liquid can be increased by increasing the partial pressure of the gas, that is, the concentration and pressure of the gas.

  Therefore, as a result of studying measures for increasing the oxygen concentration in the dissolution tank 2 when the gas-liquid mixed fluid flowing in from the inflow portion is a mixture of water and air, the dissolution tank 2 is actively exhausted, It was found effective to promote the replacement of

Considering the application of the gas dissolving apparatus 1 to the fine bubble generating bath, oxygen in the air was dissolved in water, and the dissolved oxygen concentration in the water was examined. As shown in Table 1, the degree of ease of exhaustion by the gas release valve 15 is changed, the amount of air taken in by the gas introduction ejector 30 is changed, and the amount of air introduced into the dissolution tank 2 and the gas release valve The ratio of the amount of gas exhausted from 15, that is, the amount of increase in dissolved oxygen concentration in water when the exhaust ratio was changed was measured. The results are shown in FIGS.

  As shown in FIGS. 9 and 10, when the gas release valve 15 is positively exhausted for 15 minutes or more, when the exhaust ratio is 20% or more, the dissolved oxygen concentration in the water becomes supersaturated, and in the dissolution tank 2 It is confirmed that the oxygen partial pressure increases and more oxygen is dissolved in water.

  Based on such experimental findings, in the gas dissolving device 1, the amount of gas discharged by the gas release valve 15 forming the exhaust portion is mixed with water and air through the inflow pipe connecting portion 12 provided as the inflow portion. This is set to 20% or more of the air supply amount of air introduced into the dissolution tank 2 as the gas-liquid mixed fluid. By setting the amount of gas exhausted to 20% or more of the supply air amount, the amount of dissolved oxygen in water that is more soluble in water than nitrogen in the air supplied to the dissolution tank 2 increases. As the amount of dissolved oxygen in 5 increases, it is possible to produce a liquid 5 having a sufficiently high dissolved oxygen concentration corresponding to the required efficacy. Therefore, an accessory unit such as an oxygen enrichment unit can be omitted, and the gas dissolving device 1 is further promoted to be miniaturized.

  Note that as a specific means and method for setting the amount of gas exhausted by the gas release valve 15 to 20% or more of the amount of air supplied into the dissolution tank 2, the amount of gas taken in by the gas introduction ejector 30 is increased. And adjusting the opening shape and area of the gas vent 35 in the gas release valve 15 are exemplified. By appropriately selecting and combining these, an exhaust ratio of 20% or more is realized and set.

  As is apparent from the above, by providing the fluid introduced into the dissolution tank 2 as hot water for a bath, for example, stored in the bathtub, a gas dissolution apparatus suitable for a microbubble generating bathtub is provided. Will be.

DESCRIPTION OF SYMBOLS 1 Gas dissolving apparatus 2 Dissolution tank 5 Liquid 12 Inflow pipe connection part 13 Outflow pipe connection part 15 Gas discharge valve

Claims (2)

  A dissolution tank that generates a liquid in which gas is dissolved is provided. The dissolution tank includes an inflow portion that introduces a gas-liquid mixed fluid of dissolved gas and fluid into the dissolution tank, and a liquid that is generated by dissolving the gas in the fluid. An outflow part disposed at the bottom of the dissolution tank and an exhaust part for discharging the gas stored in the dissolution tank to the outside of the dissolution tank are provided. The gas and liquid supplied by the gas-liquid mixed fluid flowing into the gas are mixed in the dissolution tank to generate a liquid in which the gas is dissolved, and the liquid flows out of the dissolution tank through the outflow part. In addition, the gas-liquid mixed fluid flowing in from the inflow portion is a mixture of water and air, and the amount of gas exhausted by the exhaust portion is the supply of gas to be introduced into the dissolution tank as the gas-liquid mixed fluid through the inflow portion. Gas dissolution device, characterized in that it is set to more than 20% of the amount.   The gas dissolving apparatus according to claim 1, wherein the fluid is hot water for bathing.

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