JP2010116504A - Highly transparent photocatalytic membrane and article including the same - Google Patents
Highly transparent photocatalytic membrane and article including the same Download PDFInfo
- Publication number
- JP2010116504A JP2010116504A JP2008291441A JP2008291441A JP2010116504A JP 2010116504 A JP2010116504 A JP 2010116504A JP 2008291441 A JP2008291441 A JP 2008291441A JP 2008291441 A JP2008291441 A JP 2008291441A JP 2010116504 A JP2010116504 A JP 2010116504A
- Authority
- JP
- Japan
- Prior art keywords
- film
- photocatalyst
- group
- highly transparent
- metal oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000001699 photocatalysis Effects 0.000 title claims abstract description 39
- 239000012528 membrane Substances 0.000 title claims abstract description 22
- 239000002245 particle Substances 0.000 claims abstract description 106
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 80
- -1 titanium alkoxide Chemical class 0.000 claims abstract description 68
- 239000010936 titanium Substances 0.000 claims abstract description 58
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 58
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims abstract description 51
- 239000011248 coating agent Substances 0.000 claims abstract description 43
- 229920000620 organic polymer Polymers 0.000 claims abstract description 43
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 40
- 239000000463 material Substances 0.000 claims abstract description 39
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 39
- 150000007530 organic bases Chemical class 0.000 claims abstract description 28
- 238000009833 condensation Methods 0.000 claims abstract description 7
- 230000005494 condensation Effects 0.000 claims abstract description 7
- 239000011941 photocatalyst Substances 0.000 claims description 125
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 112
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 19
- 230000007062 hydrolysis Effects 0.000 claims description 12
- 238000006460 hydrolysis reaction Methods 0.000 claims description 12
- 150000001875 compounds Chemical class 0.000 claims description 11
- 239000000377 silicon dioxide Substances 0.000 claims description 11
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 10
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 8
- 230000014509 gene expression Effects 0.000 claims description 8
- 238000002156 mixing Methods 0.000 claims description 6
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 5
- 239000000395 magnesium oxide Substances 0.000 claims description 4
- 238000000576 coating method Methods 0.000 abstract description 39
- 230000000694 effects Effects 0.000 abstract description 17
- 238000000354 decomposition reaction Methods 0.000 abstract description 13
- 230000003301 hydrolyzing effect Effects 0.000 abstract description 12
- 238000010438 heat treatment Methods 0.000 abstract description 7
- 230000015556 catabolic process Effects 0.000 abstract description 2
- 239000002131 composite material Substances 0.000 abstract description 2
- 238000006731 degradation reaction Methods 0.000 abstract description 2
- 241001572615 Amorphus Species 0.000 abstract 2
- 239000000243 solution Substances 0.000 description 76
- 239000008119 colloidal silica Substances 0.000 description 61
- 239000000126 substance Substances 0.000 description 51
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 37
- 230000015572 biosynthetic process Effects 0.000 description 31
- 230000000052 comparative effect Effects 0.000 description 29
- 238000000034 method Methods 0.000 description 29
- 229910052751 metal Inorganic materials 0.000 description 26
- 239000002184 metal Substances 0.000 description 26
- 238000003786 synthesis reaction Methods 0.000 description 25
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 21
- 239000007788 liquid Substances 0.000 description 21
- 239000013078 crystal Substances 0.000 description 20
- 239000000178 monomer Substances 0.000 description 20
- BNGXYYYYKUGPPF-UHFFFAOYSA-M (3-methylphenyl)methyl-triphenylphosphanium;chloride Chemical compound [Cl-].CC1=CC=CC(C[P+](C=2C=CC=CC=2)(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 BNGXYYYYKUGPPF-UHFFFAOYSA-M 0.000 description 19
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 18
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 18
- 125000004432 carbon atom Chemical group C* 0.000 description 17
- XNDZQQSKSQTQQD-UHFFFAOYSA-N 3-methylcyclohex-2-en-1-ol Chemical compound CC1=CC(O)CCC1 XNDZQQSKSQTQQD-UHFFFAOYSA-N 0.000 description 16
- 239000007787 solid Substances 0.000 description 16
- 239000000758 substrate Substances 0.000 description 16
- 239000007888 film coating Substances 0.000 description 15
- 238000009501 film coating Methods 0.000 description 15
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 14
- 239000002904 solvent Substances 0.000 description 8
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- 150000003839 salts Chemical class 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 5
- 125000004429 atom Chemical group 0.000 description 5
- 230000006866 deterioration Effects 0.000 description 5
- 239000010419 fine particle Substances 0.000 description 5
- 150000002430 hydrocarbons Chemical group 0.000 description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 5
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 238000006482 condensation reaction Methods 0.000 description 4
- 125000005843 halogen group Chemical group 0.000 description 4
- 230000003993 interaction Effects 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 229920003023 plastic Polymers 0.000 description 4
- 239000004033 plastic Substances 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 238000004381 surface treatment Methods 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- XQAXGZLFSSPBMK-UHFFFAOYSA-M [7-(dimethylamino)phenothiazin-3-ylidene]-dimethylazanium;chloride;trihydrate Chemical compound O.O.O.[Cl-].C1=CC(=[N+](C)C)C=C2SC3=CC(N(C)C)=CC=C3N=C21 XQAXGZLFSSPBMK-UHFFFAOYSA-M 0.000 description 3
- 230000002378 acidificating effect Effects 0.000 description 3
- 150000004703 alkoxides Chemical class 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 230000003373 anti-fouling effect Effects 0.000 description 3
- 125000003710 aryl alkyl group Chemical group 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 125000000753 cycloalkyl group Chemical group 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229960000907 methylthioninium chloride Drugs 0.000 description 3
- 239000011259 mixed solution Substances 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 239000004926 polymethyl methacrylate Substances 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 150000003609 titanium compounds Chemical class 0.000 description 3
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- FUGYGGDSWSUORM-UHFFFAOYSA-N 4-hydroxystyrene Chemical compound OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 description 2
- 229920006353 Acrylite® Polymers 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- 239000004677 Nylon Substances 0.000 description 2
- 229920000297 Rayon Polymers 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 125000002947 alkylene group Chemical group 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 239000004566 building material Substances 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 125000001309 chloro group Chemical group Cl* 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 239000005357 flat glass Substances 0.000 description 2
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 150000004677 hydrates Chemical class 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 239000011147 inorganic material Substances 0.000 description 2
- 150000002736 metal compounds Chemical class 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 239000013081 microcrystal Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 229920001778 nylon Polymers 0.000 description 2
- 239000005416 organic matter Substances 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- OERNJTNJEZOPIA-UHFFFAOYSA-N zirconium nitrate Chemical compound [Zr+4].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O OERNJTNJEZOPIA-UHFFFAOYSA-N 0.000 description 2
- SSZOCHFYWWVSAI-UHFFFAOYSA-N 1-bromo-2-ethenylbenzene Chemical compound BrC1=CC=CC=C1C=C SSZOCHFYWWVSAI-UHFFFAOYSA-N 0.000 description 1
- KQJQPCJDKBKSLV-UHFFFAOYSA-N 1-bromo-3-ethenylbenzene Chemical compound BrC1=CC=CC(C=C)=C1 KQJQPCJDKBKSLV-UHFFFAOYSA-N 0.000 description 1
- WGGLDBIZIQMEGH-UHFFFAOYSA-N 1-bromo-4-ethenylbenzene Chemical compound BrC1=CC=C(C=C)C=C1 WGGLDBIZIQMEGH-UHFFFAOYSA-N 0.000 description 1
- RWNUSVWFHDHRCJ-UHFFFAOYSA-N 1-butoxypropan-2-ol Chemical compound CCCCOCC(C)O RWNUSVWFHDHRCJ-UHFFFAOYSA-N 0.000 description 1
- KTZVZZJJVJQZHV-UHFFFAOYSA-N 1-chloro-4-ethenylbenzene Chemical compound ClC1=CC=C(C=C)C=C1 KTZVZZJJVJQZHV-UHFFFAOYSA-N 0.000 description 1
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- HWCUCNKPBMGSSC-UHFFFAOYSA-N 1-phenylethenyl acetate Chemical compound CC(=O)OC(=C)C1=CC=CC=C1 HWCUCNKPBMGSSC-UHFFFAOYSA-N 0.000 description 1
- IGGDKDTUCAWDAN-UHFFFAOYSA-N 1-vinylnaphthalene Chemical compound C1=CC=C2C(C=C)=CC=CC2=C1 IGGDKDTUCAWDAN-UHFFFAOYSA-N 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- DJCYDDALXPHSHR-UHFFFAOYSA-N 2-(2-propoxyethoxy)ethanol Chemical compound CCCOCCOCCO DJCYDDALXPHSHR-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- BDLXTDLGTWNUFM-UHFFFAOYSA-N 2-[(2-methylpropan-2-yl)oxy]ethanol Chemical compound CC(C)(C)OCCO BDLXTDLGTWNUFM-UHFFFAOYSA-N 0.000 description 1
- 125000005999 2-bromoethyl group Chemical group 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- 125000001340 2-chloroethyl group Chemical group [H]C([H])(Cl)C([H])([H])* 0.000 description 1
- JESXATFQYMPTNL-UHFFFAOYSA-N 2-ethenylphenol Chemical compound OC1=CC=CC=C1C=C JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 description 1
- SNOJPWLNAMAYSX-UHFFFAOYSA-N 2-methylpropan-1-ol;titanium Chemical compound [Ti].CC(C)CO.CC(C)CO.CC(C)CO.CC(C)CO SNOJPWLNAMAYSX-UHFFFAOYSA-N 0.000 description 1
- RDSLEAUQWCVEIL-UHFFFAOYSA-N 2-methylpropan-2-olate titanium(3+) Chemical group CC(C)(C)O[Ti](OC(C)(C)C)OC(C)(C)C RDSLEAUQWCVEIL-UHFFFAOYSA-N 0.000 description 1
- GRWPYGBKJYICOO-UHFFFAOYSA-N 2-methylpropan-2-olate;titanium(4+) Chemical group [Ti+4].CC(C)(C)[O-].CC(C)(C)[O-].CC(C)(C)[O-].CC(C)(C)[O-] GRWPYGBKJYICOO-UHFFFAOYSA-N 0.000 description 1
- YEYKMVJDLWJFOA-UHFFFAOYSA-N 2-propoxyethanol Chemical compound CCCOCCO YEYKMVJDLWJFOA-UHFFFAOYSA-N 0.000 description 1
- KXYAVSFOJVUIHT-UHFFFAOYSA-N 2-vinylnaphthalene Chemical compound C1=CC=CC2=CC(C=C)=CC=C21 KXYAVSFOJVUIHT-UHFFFAOYSA-N 0.000 description 1
- YNGIFMKMDRDNBQ-UHFFFAOYSA-N 3-ethenylphenol Chemical compound OC1=CC=CC(C=C)=C1 YNGIFMKMDRDNBQ-UHFFFAOYSA-N 0.000 description 1
- LDMRLRNXHLPZJN-UHFFFAOYSA-N 3-propoxypropan-1-ol Chemical compound CCCOCCCO LDMRLRNXHLPZJN-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- DUFCMRCMPHIFTR-UHFFFAOYSA-N 5-(dimethylsulfamoyl)-2-methylfuran-3-carboxylic acid Chemical compound CN(C)S(=O)(=O)C1=CC(C(O)=O)=C(C)O1 DUFCMRCMPHIFTR-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- PRITYMRQBPHKEZ-UHFFFAOYSA-N C(CC)O[AlH]OCCC Chemical group C(CC)O[AlH]OCCC PRITYMRQBPHKEZ-UHFFFAOYSA-N 0.000 description 1
- DDRLLIXCLOMEDF-UHFFFAOYSA-N CC(C)(C)O[Zr](OC(C)(C)C)OC(C)(C)C Chemical group CC(C)(C)O[Zr](OC(C)(C)C)OC(C)(C)C DDRLLIXCLOMEDF-UHFFFAOYSA-N 0.000 description 1
- VHQMSJOKQWPUSE-UHFFFAOYSA-N CCC(C)O[Zr](OC(C)CC)OC(C)CC Chemical group CCC(C)O[Zr](OC(C)CC)OC(C)CC VHQMSJOKQWPUSE-UHFFFAOYSA-N 0.000 description 1
- KFDGIFZCOIOUIL-UHFFFAOYSA-N CCCCO[Zr](OCCCC)OCCCC Chemical group CCCCO[Zr](OCCCC)OCCCC KFDGIFZCOIOUIL-UHFFFAOYSA-N 0.000 description 1
- TYXCJKRJSAWBMB-UHFFFAOYSA-N CCCO[Zr](OCCC)OCCC Chemical group CCCO[Zr](OCCC)OCCC TYXCJKRJSAWBMB-UHFFFAOYSA-N 0.000 description 1
- JGWLCFLLGBJLTF-UHFFFAOYSA-N CCO[Zr](OCC)OCC Chemical group CCO[Zr](OCC)OCC JGWLCFLLGBJLTF-UHFFFAOYSA-N 0.000 description 1
- SAIHNRAAWMQBOH-UHFFFAOYSA-N CO[Zr](OC)OC Chemical group CO[Zr](OC)OC SAIHNRAAWMQBOH-UHFFFAOYSA-N 0.000 description 1
- 241000219112 Cucumis Species 0.000 description 1
- 235000015510 Cucumis melo subsp melo Nutrition 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- FJJCIZWZNKZHII-UHFFFAOYSA-N [4,6-bis(cyanoamino)-1,3,5-triazin-2-yl]cyanamide Chemical compound N#CNC1=NC(NC#N)=NC(NC#N)=N1 FJJCIZWZNKZHII-UHFFFAOYSA-N 0.000 description 1
- 238000002835 absorbance Methods 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 125000005595 acetylacetonate group Chemical group 0.000 description 1
- HDYRYUINDGQKMC-UHFFFAOYSA-M acetyloxyaluminum;dihydrate Chemical compound O.O.CC(=O)O[Al] HDYRYUINDGQKMC-UHFFFAOYSA-M 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical compound [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 description 1
- 229940009827 aluminum acetate Drugs 0.000 description 1
- 230000000844 anti-bacterial effect Effects 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000007611 bar coating method Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- BYTFJWNSICJFCB-UHFFFAOYSA-N bis[(2-methylpropan-2-yl)oxy]alumane Chemical group CC(C)(C)O[AlH]OC(C)(C)C BYTFJWNSICJFCB-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- NUFATYMMMZQQCQ-UHFFFAOYSA-N butan-1-olate;titanium(3+) Chemical group [Ti+3].CCCC[O-].CCCC[O-].CCCC[O-] NUFATYMMMZQQCQ-UHFFFAOYSA-N 0.000 description 1
- YHWCPXVTRSHPNY-UHFFFAOYSA-N butan-1-olate;titanium(4+) Chemical compound [Ti+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] YHWCPXVTRSHPNY-UHFFFAOYSA-N 0.000 description 1
- HWCXFDGMZPRMRX-UHFFFAOYSA-N butan-2-olate;titanium(4+) Chemical compound CCC(C)O[Ti](OC(C)CC)(OC(C)CC)OC(C)CC HWCXFDGMZPRMRX-UHFFFAOYSA-N 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 239000012461 cellulose resin Substances 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- SOGXWMAAMKKQCB-UHFFFAOYSA-M chloroalumane Chemical group Cl[AlH2] SOGXWMAAMKKQCB-UHFFFAOYSA-M 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 238000003851 corona treatment Methods 0.000 description 1
- 125000000640 cyclooctyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000004332 deodorization Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- DYHSMQWCZLNWGO-UHFFFAOYSA-N di(propan-2-yloxy)alumane Chemical group CC(C)O[AlH]OC(C)C DYHSMQWCZLNWGO-UHFFFAOYSA-N 0.000 description 1
- RGHVMFZEKLHZBU-UHFFFAOYSA-N dibutoxyalumane Chemical group C(CCC)O[AlH]OCCCC RGHVMFZEKLHZBU-UHFFFAOYSA-N 0.000 description 1
- 238000007607 die coating method Methods 0.000 description 1
- WCNOPGVIIPWIRJ-UHFFFAOYSA-N diethoxyalumane Chemical group C(C)O[AlH]OCC WCNOPGVIIPWIRJ-UHFFFAOYSA-N 0.000 description 1
- 229940028356 diethylene glycol monobutyl ether Drugs 0.000 description 1
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 1
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 1
- 238000002050 diffraction method Methods 0.000 description 1
- DMHKHAWLXIYNLV-UHFFFAOYSA-N dimethoxyalumane Chemical group CO[AlH]OC DMHKHAWLXIYNLV-UHFFFAOYSA-N 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000000295 emission spectrum Methods 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- NNRZFZBJEDXBPK-UHFFFAOYSA-N ethanolate;titanium(3+) Chemical group [Ti+3].CC[O-].CC[O-].CC[O-] NNRZFZBJEDXBPK-UHFFFAOYSA-N 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 108010025899 gelatin film Proteins 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910000000 metal hydroxide Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- JDQLUYWHCUWSJE-UHFFFAOYSA-N methanolate;titanium(3+) Chemical group [Ti+3].[O-]C.[O-]C.[O-]C JDQLUYWHCUWSJE-UHFFFAOYSA-N 0.000 description 1
- ITNVWQNWHXEMNS-UHFFFAOYSA-N methanolate;titanium(4+) Chemical compound [Ti+4].[O-]C.[O-]C.[O-]C.[O-]C ITNVWQNWHXEMNS-UHFFFAOYSA-N 0.000 description 1
- 125000006178 methyl benzyl group Chemical group 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000004923 naphthylmethyl group Chemical group C1(=CC=CC2=CC=CC=C12)C* 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 238000006864 oxidative decomposition reaction Methods 0.000 description 1
- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 description 1
- SOQBVABWOPYFQZ-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical class [O-2].[O-2].[Ti+4] SOQBVABWOPYFQZ-UHFFFAOYSA-N 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 238000007146 photocatalysis Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920001955 polyphenylene ether Polymers 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- BDDFDYYYZGKVEP-UHFFFAOYSA-N propan-1-olate;titanium(3+) Chemical group [Ti+3].CCC[O-].CCC[O-].CCC[O-] BDDFDYYYZGKVEP-UHFFFAOYSA-N 0.000 description 1
- XPGAWFIWCWKDDL-UHFFFAOYSA-N propan-1-olate;zirconium(4+) Chemical compound [Zr+4].CCC[O-].CCC[O-].CCC[O-].CCC[O-] XPGAWFIWCWKDDL-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000007870 radical polymerization initiator Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000002964 rayon Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 230000001954 sterilising effect Effects 0.000 description 1
- 238000004659 sterilization and disinfection Methods 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 238000003887 surface segregation Methods 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 150000003608 titanium Chemical class 0.000 description 1
- JMXKSZRRTHPKDL-UHFFFAOYSA-N titanium ethoxide Chemical compound [Ti+4].CC[O-].CC[O-].CC[O-].CC[O-] JMXKSZRRTHPKDL-UHFFFAOYSA-N 0.000 description 1
- 229910000349 titanium oxysulfate Inorganic materials 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- YONPGGFAJWQGJC-UHFFFAOYSA-K titanium(iii) chloride Chemical group Cl[Ti](Cl)Cl YONPGGFAJWQGJC-UHFFFAOYSA-K 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 239000002912 waste gas Substances 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
- 230000003313 weakening effect Effects 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- DUNKXUFBGCUVQW-UHFFFAOYSA-J zirconium tetrachloride Chemical compound Cl[Zr](Cl)(Cl)Cl DUNKXUFBGCUVQW-UHFFFAOYSA-J 0.000 description 1
- ZXAUZSQITFJWPS-UHFFFAOYSA-J zirconium(4+);disulfate Chemical compound [Zr+4].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O ZXAUZSQITFJWPS-UHFFFAOYSA-J 0.000 description 1
- PFXYQVJESZAMSV-UHFFFAOYSA-K zirconium(iii) chloride Chemical group Cl[Zr](Cl)Cl PFXYQVJESZAMSV-UHFFFAOYSA-K 0.000 description 1
Landscapes
- Silicon Compounds (AREA)
- Catalysts (AREA)
- Paints Or Removers (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
Abstract
Description
本発明は、高透明性光触媒膜およびそれを有する物品に関する。さらに詳しくは、本発明は、基材上に1コート法で形成されてなる、優れた親水性能を有するが、分解活性はほとんど示さず、しかも高い透明性を有する光触媒膜、および有機系基材上に該光触媒膜を有する物品に関するものである。 The present invention relates to a highly transparent photocatalytic film and an article having the same. More specifically, the present invention is a photocatalytic film formed on a substrate by a one-coating method, having excellent hydrophilic performance but showing almost no decomposition activity, and having high transparency, and an organic substrate. The present invention relates to an article having the photocatalytic film thereon.
光触媒は、一般にそのバンドギャップ以上のエネルギーの光を照射すると、伝導帯に電子が励起され、価電子帯に正孔が生じる。そして、励起されて生じた電子は表面酸素を還元してスーパーオキサイドアニオン(・O2−)を生成すると共に、正孔は表面水酸基を酸化して水酸ラジカル(・OH)を生成し、これらの反応性活性酸素種が強い酸化分解機能を発揮し、光触媒からなる膜の表面に付着している有機物質を高効率で分解することが知られている。 In general, when a photocatalyst is irradiated with light having energy greater than its band gap, electrons are excited in the conduction band and holes are generated in the valence band. The excited electrons reduce the surface oxygen to generate superoxide anions (· O 2− ), and the holes oxidize the surface hydroxyl groups to generate hydroxyl radicals (· OH). It is known that the reactive active oxygen species exhibit a strong oxidative decomposition function and decompose organic substances adhering to the surface of the photocatalyst film with high efficiency.
このような光触媒の機能を応用して、例えば脱臭、防汚、抗菌、殺菌、さらには廃水中や廃ガス中の環境汚染上の問題となっている各種物質の分解・除去などが検討されている。 By applying such photocatalytic functions, for example, deodorization, antifouling, antibacterial, sterilization, and decomposition / removal of various substances that cause environmental pollution in wastewater and waste gas are being studied. Yes.
また、光触媒のもう1つの機能として、該光触媒が光励起されると、例えば特許文献1に開示されているように、光触媒膜表面は、水と接触角が10度以下となる超親水化を発現することも知られている。このような光触媒の超親水化機能を応用して、例えば、防曇性、防滴性、防汚性、防霜性、滑雪性付与を目的として、高速道路の防音壁、道路反射鏡、各種反射体、街路灯、自動車をはじめとする車両のボディーコートやサイドミラーあるいはウインド用フィルム、窓ガラスを含む建材、道路標識、ロードサイド看板、冷凍・冷蔵用ショーケース、各種レンズ類やセンサー類などに光触媒膜を用いることが検討されている。 Further, as another function of the photocatalyst, when the photocatalyst is photoexcited, for example, as disclosed in Patent Document 1, the surface of the photocatalyst film exhibits superhydrophilicity with a contact angle of 10 degrees or less with water. It is also known to do. Applying such a superhydrophilic function of photocatalysts, for example, for the purpose of imparting antifogging properties, dripproofing properties, antifouling properties, frostproofing properties, and snow sliding properties, highway soundproof walls, road reflectors, various types For reflectors, street lights, automobile body coats, side mirrors or window films, building materials including window glass, road signs, roadside signs, freezer / refrigerated showcases, various lenses and sensors, etc. The use of a photocatalytic film has been studied.
このような光触媒については、これまで数多く知られており、中でも酸化チタンは代表的なものの一つに挙げられる。酸化チタンには無定形のアモルファス型のほか、アナターゼ型、ルチル型、ブルッカイト型の3つの代表的な結晶系が存在し、これら3つの結晶系で光触媒活性を示し、有機物の分解能のほか、超親水性を発現することで有名である。特にアナターゼ型が最も高い活性を示すことが一般に知られている。 Many photocatalysts have been known so far, and titanium oxide is one of the typical examples. In addition to amorphous amorphous type, there are three typical crystal systems of anatase type, rutile type, and brookite type. Titanium oxide exhibits photocatalytic activity in these three crystal systems. It is famous for expressing hydrophilicity. In particular, it is generally known that the anatase type exhibits the highest activity.
当該アナターゼ型酸化チタンは、通常、チタンアルコキシドなどの有機チタン化合物を出発原料としゾルゲル法により得た加水分解縮合物や、四塩化チタンや硫酸チタニルなどの無機チタン化合物塩の水和酸化物などから得た無定形酸化チタンから熱処理を経ることによって得ることができる。しかしながら、これらは通常、400℃以上の高温下での熱処理が必要であるため、コスト高となることを避けられず、耐熱性の乏しい基板に成膜することが困難であるなど多くの問題を伴うものである。 The anatase-type titanium oxide is usually a hydrolysis condensate obtained by a sol-gel method using an organic titanium compound such as titanium alkoxide as a starting material, or a hydrated oxide of an inorganic titanium compound salt such as titanium tetrachloride or titanyl sulfate. It can be obtained by heat treatment from the obtained amorphous titanium oxide. However, since these usually require heat treatment at a high temperature of 400 ° C. or higher, it is inevitable that the cost is high, and it is difficult to form a film on a substrate having poor heat resistance. It is accompanied.
したがって、従来、特に活性の高いアナターゼ型酸化チタンを比較的低温で得る方法が種々試みられており、また開示されている。 Therefore, various methods for obtaining a highly active anatase-type titanium oxide at a relatively low temperature have been tried and disclosed.
例えば、スパッタリングや真空蒸着などの物理的成膜手法によって基板上に酸化チタン膜を生成させる際に、水蒸気を導入させ無定形酸化チタン内に水酸基を多く含有させることによって、酸化チタン骨格中の原子の移動度を上昇せしめ、その後の熱処理よる結晶化を容易にする方法が提案されている(例えば、特許文献2参照)。これによれば、結晶化温度を200℃程度にまで下げることが可能である。 For example, when a titanium oxide film is formed on a substrate by a physical film-forming method such as sputtering or vacuum deposition, by introducing a lot of hydroxyl groups into amorphous titanium oxide by introducing water vapor, atoms in the titanium oxide skeleton There has been proposed a method of increasing the mobility of the metal and facilitating the subsequent crystallization by heat treatment (see, for example, Patent Document 2). According to this, it is possible to lower the crystallization temperature to about 200 ° C.
また、シリコンアルコキシドと加水分解性を有するチタン化合物を含む溶液から、チタン化合物とシリコンアルコキシドが所定のモル比で配合されている複合金属酸化物あるいは水酸化物を含むゲル膜を形成し、次いで、100℃以下の温水を接触させることによって、結晶径が数10〜100nm程度のアナターゼに帰属されるチタニア微結晶を析出させる方法が開示されている(例えば、特許文献3参照)。 Further, from a solution containing silicon alkoxide and a hydrolyzable titanium compound, a gel film containing a composite metal oxide or hydroxide in which a titanium compound and silicon alkoxide are blended at a predetermined molar ratio is formed, A method for precipitating titania microcrystals belonging to anatase having a crystal diameter of about several tens to 100 nm by contacting with hot water of 100 ° C. or lower is disclosed (for example, see Patent Document 3).
確かに上記の方法によれば、プラスチック基板など耐熱性の低い材料にも直接無定形酸化チタンを成膜し、その後、低温の熱処理工程を経てアナターゼ型酸化チタンを形成することができると考えられる。しかしながら、これらの方法で得られるアナターゼ型酸化チタンは、その公報中でも明示されているように、一般的なアナターゼ型酸化チタンと同様に光励起超親水性の発現のほか高い有機物分解活性も示すため、プラスチック基材などに直接形成させた場合には、その高い有機物分解活性により基材が短期間のうちに侵食され、基材物性が低下したり光触媒膜の脱落により光触媒機能が低下したりすることなどが容易に推察される。このため、上記各方法は、アナターゼ型酸化チタン膜とともに、別途活性遮断層を設けることを必要とし、例えば、アナターゼ型酸化チタン微粒子を無機系のバインダーに分散させて作られる常温で硬化が可能な光触媒コーティング剤を塗布する方法と比べて、明確な優位性が見出せないものであった。 Certainly, according to the above-described method, it is considered that an amorphous titanium oxide can be directly formed on a material having low heat resistance such as a plastic substrate, and then an anatase-type titanium oxide can be formed through a low-temperature heat treatment step. . However, the anatase-type titanium oxide obtained by these methods, as clearly shown in that publication, exhibits high organic matter decomposition activity in addition to the expression of photoexcited superhydrophilicity as well as general anatase-type titanium oxide, When directly formed on a plastic substrate, the substrate is eroded in a short period of time due to its high organic matter decomposition activity, and the physical properties of the substrate deteriorate or the photocatalytic function deteriorates due to the removal of the photocatalyst film. Etc. are easily guessed. For this reason, each of the above methods requires a separate active blocking layer together with the anatase-type titanium oxide film, and can be cured at room temperature, for example, made by dispersing anatase-type titanium oxide fine particles in an inorganic binder. Compared with the method of applying the photocatalyst coating agent, no clear superiority was found.
一方、アナターゼ型酸化チタンをプラスチックなどの有機基材上に直接付与させる方法として、例えば、フッ素系のシランカップリング剤でアナターゼ型酸化チタン表面を修飾し、アナターゼ型酸化チタン微粒子の表面エネルギーを低下させバインダー成分との相互作用を弱めることによって、塗膜表面に浮上(偏析)させた自己傾斜型光触媒コーティング剤が知られている(特許文献4参照)。また、酸化チタン表面を光触媒として不活性な無機材料で覆い、かつ無数に細孔を設ける処方によってマスクメロン型形状を有する光触媒材料などが提案されている(特許文献5参照)。 On the other hand, as a method for directly applying anatase-type titanium oxide onto an organic substrate such as plastic, for example, the surface energy of anatase-type titanium oxide fine particles is reduced by modifying the anatase-type titanium oxide surface with a fluorine-based silane coupling agent. A self-gradient photocatalytic coating agent that floats (segregates) on the surface of the coating film by weakening the interaction with the binder component is known (see Patent Document 4). In addition, a photocatalyst material having a mask melon shape has been proposed by coating the surface of titanium oxide with an inert inorganic material as a photocatalyst and providing numerous pores (see Patent Document 5).
これらはアナターゼ型酸化チタンが有機基材と直接接触することを回避できることから、有機基材に直接塗布可能と考えられる。しかし、これらは全てアナターゼ型酸化チタンの高い酸化力の影響が基材に及ぶことを防ぐ為に、複雑な表面処理をする必要があり、さらに、これらは酸化チタンの表面偏析の為に厚みがミクロンオーダー必要であることや、酸化チタン粒子そのものが数ミクロン径のものでしか作製できないなど、多くの制約を伴うものである。 Since these can avoid that anatase type titanium oxide contacts a organic base material directly, it is thought that it can apply | coat to an organic base material directly. However, all of these require complex surface treatment to prevent the influence of the high oxidizing power of anatase-type titanium oxide on the substrate, and moreover, they are thick due to surface segregation of titanium oxide. There are many restrictions, such as the necessity of micron order and the fact that titanium oxide particles themselves can only be produced with a diameter of several microns.
ところで、プラスチック基材に代表される有機系基材に高い親水性能をもたせ、防汚性を発現させる方法としては、該基材上に光触媒層を設ける方法があるが、この場合、一般に光触媒層から発生する反応性活性種のもつ酸化分解能から、該有機系基材を保護する層を設けなければならず、したがって2層コート法となり、これがコスト高の要因となっていた。 By the way, there is a method of providing a photocatalyst layer on the base material as a method for giving an organic base material typified by a plastic base material high hydrophilic performance and developing antifouling property. Therefore, a layer for protecting the organic base material has to be provided from the oxidative degradability of the reactive active species generated from the above, and thus a two-layer coating method is required, which has been a factor of high cost.
本発明者らは、このような問題に対処するために鋭意研究を重ね、先に、有機系基材上に1コート法で、優れた親水性能を発揮するが、該基材の劣化を抑制し得る光触媒層を形成する技術を見出し、特許を出願した(特願2008−024479号明細書)。 The inventors of the present invention have made extensive studies in order to deal with such problems. First, the present invention exhibits excellent hydrophilic performance with a one-coat method on an organic base material, but suppresses deterioration of the base material. A technology for forming a photocatalyst layer that can be used was found and a patent was filed (Japanese Patent Application No. 2008-024479).
この技術は、太陽光源照射下で充分な光励起超親水性を示すが、この超親水性がもたらす防汚性・防滴性・防曇性は、光励起型であるがゆえに機能発現までの時間が太陽光のあたり方によって大きく変化することが指摘されている。特に防曇性においては、場合によっては優れた超親水性を短期間で発現せしめたい場合もあり、初期接触角の低下や親水化速度の向上が今まで以上に求められることもある。また、窓材、自動車のサイドミラー、カーブミラー、反射板などに用いられる光触媒膜には、前記親水性能と共に、高い透明性も要求される。 This technology shows sufficient photoexcited superhydrophilicity under solar light source irradiation, but the antihydrophobic, dripproof, and antifogging properties brought about by this superhydrophilic property are the photoexcited type, so the time until functional development is achieved. It has been pointed out that it varies greatly depending on how sunlight hits. In particular, in anti-fogging properties, in some cases, it may be desired to develop excellent superhydrophilic properties in a short period of time, and lowering of the initial contact angle and improvement of the hydrophilization rate may be required more than ever. In addition, the photocatalytic film used for window materials, automobile side mirrors, curve mirrors, reflectors, and the like is required to have high transparency in addition to the hydrophilic performance.
本発明は、このような事情のもとで、高い親水性能と透明性が要求される分野に好適な、基材上に1コート法で形成されてなる、優れた親水性能を有するが、分解活性はほとんど示さないため、有機系基材の劣化を抑制し得ると共に、高い透明性を有する光触媒膜、及び基材上に該光触媒膜を有する物品を提供することを目的とするものである。 Under such circumstances, the present invention has an excellent hydrophilic performance formed by a one-coating method on a substrate, which is suitable for a field where high hydrophilic performance and transparency are required. Since the activity is hardly exhibited, it is an object to provide a photocatalyst film having high transparency and an article having the photocatalyst film on the base material, which can suppress deterioration of the organic base material.
本発明者らは、前記目的を達成するために鋭意研究を重ねた結果、以下に示す知見を得た。
有機系基材上に、特定のコーティング剤を1コート法で塗布して、成分傾斜構造を有する非晶質酸化チタン膜を形成し、この非晶質酸化チタン膜の表面を特定の条件で、光触媒化されることにより、あるいは光触媒化処理することにより、超親水性を発揮するが、有機物に対する分解活性をほとんど示さず、有機系基材の劣化を効果的に抑制し得る光触媒膜が得られることを見出した。
As a result of intensive studies to achieve the above object, the present inventors have obtained the following knowledge.
On the organic base material, a specific coating agent is applied by a one-coat method to form an amorphous titanium oxide film having a component gradient structure, and the surface of the amorphous titanium oxide film is subjected to specific conditions. By photocatalyzing or by photocatalytic treatment, a supercatalytic property is exhibited, but a photocatalytic film capable of effectively suppressing deterioration of the organic base material can be obtained while exhibiting almost no decomposition activity on organic substances. I found out.
そして、上記光触媒膜が、光触媒粒子以外に、特定の粒径範囲の金属酸化物小粒子と、特定の粒径範囲の金属酸化物大粒子とを所定の割合で含むことにより、その表面に凹凸が付与され、親水性能が向上すると共に、透明性が高くなることを見出した。
本発明は、かかる知見に基づいて完成したものである。
In addition to the photocatalyst particles, the photocatalyst film includes irregularities on the surface thereof by containing metal oxide small particles having a specific particle size range and metal oxide large particles having a specific particle size range at a predetermined ratio. Was found to improve the hydrophilic performance and increase the transparency.
The present invention has been completed based on such findings.
すなわち、本発明は、
(1) 有機系基材上に、チタンアルコキシドと有機高分子化合物とが加水分解縮合してなる複合体を含むコーティング剤を1回のみ塗布することによって設けられた、チタンアルコキシドの加水分解縮合物の含有率が表面から深さ方向に向かって連続的に変化する非晶質酸化チタン膜の表面が、水蒸気の存在下で100℃以下の温度に曝されることにより得られた光触媒膜であって、光触媒粒子以外に、(a)平均粒径40nm未満の金属酸化物粒子Aと、(b)平均粒径40nm以上90nm未満の金属酸化物粒子Bまたは平均粒径90nm以上150nm未満の金属酸化物粒子Cまたは平均粒径150nm以上200nm未満の金属酸化物粒子Dとを含み、かつその混合割合が、質量基準で下記関係式(1)〜(3)
80/20≦A/B≦45/55 (1)
97/3 ≦A/C≦70/30 (2)
97/3 ≦A/D≦88/12 (3)
を満たし、表面に凹凸を有することを特徴とする高透明性光触媒膜、
(2) 有機系基材上に塗布された非晶質酸化チタン膜の表面を、水分存在下で100℃以下の温度にて加熱処理することにより得られた光触媒膜である上記(1)項に記載の高透明性光触媒膜、
(3) JIS K 7361に準拠して測定した光触媒膜自身のヘイズ値が、0.6%未満である上記(1)または(2)項に記載の高透明性光触媒膜、
(4) 金属酸化物粒子A〜Dが、シリカ、チタニア、ジルコニア、アルミナおよびマグネシアの中から選ばれる少なくとも1種である上記(1)〜(3)項のいずれか1項に記載の高透明性光触媒膜、
(5) 金属酸化物粒子A〜Dが、シリカ系粒子である上記(4)項に記載の高透明性光触媒膜、
(6) 光触媒粒子以外に、金属酸化物粒子Aのみを含む光触媒膜と比較して、親水化速度が2倍以上向上してなる上記(1)〜(5)項のいずれか1項に記載の高透明性光触媒膜、
(7) 有機系基材の表面に、上記(1)〜(6)項のいずれか1項に記載の高透明性光触媒膜を有することを特徴とする物品、および
(8) 高透明性光触媒膜の表面に、さらに機能膜を有する上記(7)項に記載の物品、
を提供するものである。
That is, the present invention
(1) A hydrolysis condensate of titanium alkoxide provided by applying a coating agent containing a complex formed by hydrolysis and condensation of titanium alkoxide and an organic polymer compound only once on an organic base material. This is a photocatalytic film obtained by exposing the surface of an amorphous titanium oxide film in which the content ratio of the aqueous solution continuously changes from the surface to the depth direction to a temperature of 100 ° C. or lower in the presence of water vapor. In addition to the photocatalyst particles, (a) metal oxide particles A having an average particle size of less than 40 nm and (b) metal oxide particles B having an average particle size of 40 nm or more and less than 90 nm or metal oxide having an average particle size of 90 nm or more and less than 150 nm Product particles C or metal oxide particles D having an average particle size of 150 nm or more and less than 200 nm, and the mixing ratio thereof is expressed by the following relational expressions (1) to (3) on a mass basis:
80/20 ≦ A / B ≦ 45/55 (1)
97/3 ≦ A / C ≦ 70/30 (2)
97/3 ≦ A / D ≦ 88/12 (3)
And a highly transparent photocatalytic film characterized by having irregularities on the surface,
(2) Item (1) above, which is a photocatalytic film obtained by heat-treating the surface of an amorphous titanium oxide film coated on an organic base material at a temperature of 100 ° C. or less in the presence of moisture. A highly transparent photocatalytic film as described in
(3) The highly transparent photocatalyst film according to (1) or (2) above, wherein the haze value of the photocatalyst film itself measured in accordance with JIS K 7361 is less than 0.6%,
(4) The high transparency according to any one of (1) to (3) above, wherein the metal oxide particles A to D are at least one selected from silica, titania, zirconia, alumina, and magnesia. Photocatalytic membrane,
(5) The highly transparent photocatalyst film according to the above (4), wherein the metal oxide particles A to D are silica-based particles,
(6) In addition to the photocatalyst particles, as compared with a photocatalyst film containing only the metal oxide particles A, the hydrophilization rate is improved by 2 times or more, and any one of the above items (1) to (5) Highly transparent photocatalytic membrane,
(7) An article having the highly transparent photocatalyst film according to any one of (1) to (6) above on the surface of an organic base material, and (8) a highly transparent photocatalyst The article according to (7) above, further having a functional film on the surface of the film,
Is to provide.
本発明によれば、高い親水性能と透明性が要求される分野、例えば窓材、自動車のサイドミラー、カーブミラー、反射板などに好適な有機基材上に1コート法で形成されてなる、優れた親水性能を有するが、分解活性はほとんど示さないため、有機系基材の劣化を抑制し得ると共に、高い透明性を有する光触媒膜、及び有機系基材上に該光触媒膜を有する物品を提供することができる。 According to the present invention, it is formed by a one-coat method on an organic substrate suitable for fields requiring high hydrophilic performance and transparency, such as window materials, automobile side mirrors, curve mirrors, reflectors, and the like. Although it has excellent hydrophilic performance but exhibits almost no decomposition activity, it can suppress deterioration of the organic base material, and has a highly transparent photocatalytic film, and an article having the photocatalytic film on the organic base material Can be provided.
まず、本発明の高透明性光触媒膜について説明する。
本発明の高透明性光触媒膜は、有機系基材上に、チタンアルコキシドと有機高分子化合物とが加水分解縮合してなる複合体を含むコーティング剤を1回のみ塗布することによって設けられた、チタンアルコキシドの加水分解縮合物の含有率が表面から深さ方向に向かって連続的に変化する非晶質酸化チタン膜の表面が、水蒸気の存在下で100℃以下の温度に曝されることにより得られた光触媒膜である。
First, the highly transparent photocatalytic film of the present invention will be described.
The highly transparent photocatalytic film of the present invention was provided by applying a coating agent containing a complex formed by hydrolysis and condensation of a titanium alkoxide and an organic polymer compound only once on an organic base material. The surface of the amorphous titanium oxide film in which the content of the hydrolysis condensate of titanium alkoxide continuously changes from the surface in the depth direction is exposed to a temperature of 100 ° C. or less in the presence of water vapor. It is the obtained photocatalyst film.
[光触媒膜の性状]
本発明の光触媒膜は、有機系基材上に設けられたチタンアルコキシド加水分解縮合物の含有率が、表面から深さ方向に向って連続的に変化する成分傾斜構造を有する非晶質酸化チタン膜の表面が、水蒸気の存在下で100℃以下の温度に曝され、光触媒化されることにより、あるいは水分の存在下で100℃以下の温度にて加熱処理し、光触媒化することにより得られたものであって、超親水性を発揮するが、有機物に対する分解活性をほとんど示さない特徴を有している。
[Properties of photocatalyst film]
The photocatalytic film of the present invention is an amorphous titanium oxide having a component gradient structure in which the content of the titanium alkoxide hydrolysis condensate provided on the organic base material continuously changes from the surface in the depth direction. The film surface is exposed to a temperature of 100 ° C. or lower in the presence of water vapor and photocatalyzed, or is heat-treated at a temperature of 100 ° C. or lower in the presence of moisture to obtain a photocatalyst. It has a characteristic that it exhibits super hydrophilicity but exhibits almost no decomposition activity on organic substances.
このようにして得られた本発明の光触媒膜は、光半導体粒子を含有し、該光半導体粒子が結晶質酸化チタンを含んでいることが好ましい。 The photocatalyst film of the present invention thus obtained preferably contains photo semiconductor particles, and the photo semiconductor particles preferably contain crystalline titanium oxide.
結晶質酸化チタンとしては、アナターゼ型、ルチル型、ブルッカイト型の何れの結晶質酸化チタンであってもよく、あるいは、上記結晶質酸化チタンであって結晶欠陥や結晶歪みを内包するものでもよく、これ等の結晶質酸化チタンを2種以上組み合わせたものであってもよい。 The crystalline titanium oxide may be any of anatase type, rutile type, brookite type crystalline titanium oxide, or the above crystalline titanium oxide containing crystal defects and crystal distortion, A combination of two or more of these crystalline titanium oxides may be used.
また、本発明の光触媒膜に含まれる、全結晶質酸化チタンに占める結晶径が1〜10nmの範囲内にある結晶質酸化チタンの割合は、90%以上であることが好ましく、100%であることがより好ましい。 Further, the ratio of the crystalline titanium oxide having a crystal diameter in the range of 1 to 10 nm in the total crystalline titanium oxide contained in the photocatalytic film of the present invention is preferably 90% or more, and 100%. It is more preferable.
なお、本発明において、結晶径とは、透過型電子顕微鏡で結晶質酸化チタンの断面を観察したときの結晶粒の格子縞の最大長さを意味し、また、結晶径が1〜10nmの範囲にある結晶質酸化チタンの含有割合は、光触媒膜の断面を透過型電子顕微鏡で観察したときの、全結晶数に対する結晶径が1〜10nmの範囲にある結晶数の割合を算出することによって求められる。 In the present invention, the crystal diameter means the maximum length of lattice fringes of crystal grains when a cross section of crystalline titanium oxide is observed with a transmission electron microscope, and the crystal diameter is in the range of 1 to 10 nm. The content ratio of a certain crystalline titanium oxide can be obtained by calculating the ratio of the number of crystals having a crystal diameter in the range of 1 to 10 nm with respect to the total number of crystals when the cross section of the photocatalyst film is observed with a transmission electron microscope. .
本発明の光触媒膜は、透過型電子顕微鏡による光触媒膜の50nm×50nmの範囲における断面観察によって、少なくとも結晶粒が5個以上存在するものであることが好ましく、10個以上存在するものであることがより好ましい。上記観察範囲における結晶粒数が5個以上であることにより、超親水性付与機能を有するが、分解活性が抑制された光触媒膜を得ることができる。本発明の光触媒膜は、結晶質酸化チタンが非晶質酸化チタン中に分散してなるものであることが好ましい。この場合、例えば、透過型電子顕微鏡で観察したときに、非晶質酸化チタンの海の中に結晶化チタン粒子が島状に点在してなるものが好ましい。 The photocatalyst film of the present invention preferably has at least 5 crystal grains, preferably 10 or more, by observing a cross section of the photocatalyst film in a 50 nm × 50 nm range with a transmission electron microscope. Is more preferable. When the number of crystal grains in the observation range is 5 or more, it is possible to obtain a photocatalyst film having a superhydrophilicity imparting function but having suppressed decomposition activity. The photocatalyst film of the present invention is preferably formed by dispersing crystalline titanium oxide in amorphous titanium oxide. In this case, for example, it is preferable that the crystallized titanium particles are scattered in islands in the amorphous titanium oxide sea when observed with a transmission electron microscope.
本発明の光触媒膜は、太陽光照射時における水に対する限界接触角が20度未満であるものが好ましく、10度以下であるものがさらに好ましい。 The photocatalyst film of the present invention preferably has a limit contact angle with water of less than 20 degrees at the time of sunlight irradiation, more preferably 10 degrees or less.
また、本発明の光触媒膜は、3mW/cm2の人工太陽光照射時におけるメチレンブルーの分解速度が、塗布したメチレンブルーの最大吸収波長における吸光度の低下速度(分解活性)ΔABS/minで0.1以下であるものが好ましく、0.05以下であるものがより好ましく、0.01以下であるものがさらに好ましく、0.0015以下であるものがさらに好ましい。 In the photocatalyst film of the present invention, the degradation rate of methylene blue when irradiated with artificial sunlight of 3 mW / cm 2 is 0.1 or less in terms of the rate of decrease in absorbance (decomposition activity) ΔABS / min at the maximum absorption wavelength of the applied methylene blue. Is preferably 0.05 or less, more preferably 0.01 or less, and even more preferably 0.0015 or less.
上記水に対する接触角、メチレンブルーの分解速度は、例えば、結晶質酸化チタンの結晶径や含有割合を調整することにより制御することができる。 The contact angle with water and the decomposition rate of methylene blue can be controlled, for example, by adjusting the crystal diameter and content ratio of crystalline titanium oxide.
さらに、本発明の光触媒膜は、表面に凹凸を有し、優れた親水性能を発揮すると共に、反射率が低く、高い透明性を有している。 Furthermore, the photocatalyst film of the present invention has irregularities on the surface, exhibits excellent hydrophilic performance, has low reflectivity, and has high transparency.
ウエンツェルの法則によると、塗膜表面にある程度の凹凸を付与することにより、該塗膜の濡れ性が強調され、親水性能が向上することが知られている。本発明者らは、光触媒膜の親水性能を効果的に向上されると共に、反射率を低くして透明度を効果的に高める凹凸について、研究を重ね、本発明を完成するに至ったものである。 According to Wenzel's law, it is known that the wettability of the coating film is emphasized and the hydrophilic performance is improved by imparting a certain degree of unevenness to the coating film surface. The inventors of the present invention have improved the hydrophilic performance of the photocatalyst film effectively, and have conducted research on the unevenness that effectively lowers the reflectance and increases the transparency, thereby completing the present invention. .
すなわち、本発明の光触媒膜は、光触媒粒子以外に、(a)平均粒径40nm未満の金属酸化物粒子Aと、(b)平均粒径40nm以上90nm未満の金属酸化物粒子Bまたは平均粒径90nm以上150nm未満の金属酸化物粒子Cまたは平均粒径150nm以上200nm未満の金属酸化物粒子Dとを含み、かつその混合割合が、質量基準で下記関係式(1)〜(3)
80/20≦A/B≦45/55 (1)
97/3 ≦A/C≦70/30 (2)
97/3 ≦A/D≦88/12 (3)
を満たし、表面に凹凸を有している。
That is, the photocatalyst film of the present invention includes, in addition to the photocatalyst particles, (a) metal oxide particles A having an average particle size of less than 40 nm and (b) metal oxide particles B having an average particle size of 40 nm or more and less than 90 nm or an average particle size. Including metal oxide particles C of 90 nm or more and less than 150 nm or metal oxide particles D having an average particle diameter of 150 nm or more and less than 200 nm, and the mixing ratio thereof is represented by the following relational expressions (1) to (3) on a mass basis:
80/20 ≦ A / B ≦ 45/55 (1)
97/3 ≦ A / C ≦ 70/30 (2)
97/3 ≦ A / D ≦ 88/12 (3)
And the surface has irregularities.
なお、上記関係式(1)の「80/20≦A/B≦45/55」は、AとBとの質量比が、80:20〜45:55の範囲にあることを示す。他の関係式(2)、(3)も同様である。 Note that “80/20 ≦ A / B ≦ 45/55” in the relational expression (1) indicates that the mass ratio of A and B is in the range of 80:20 to 45:55. The same applies to the other relational expressions (2) and (3).
金属酸化物粒子Aと、金属酸化物粒子BまたはCまたはDとの質量基準の割合が、それぞれ上記関係式(1)、(2)、(3)を満たすことにより、形成される本発明の高透明性光触媒膜自身のJIS K 7361に準拠して測定したヘイズ値を0.6%未満にすることができると共に、光触媒粒子以外に、金属酸化物粒子Aのみを含む光触媒膜と比較して、親水化速度を2倍以上向上させることができる。
なお、上記の光触媒膜のヘイズ値および親水化速度は、下記の方法により測定した値である。
The ratio of the mass reference between the metal oxide particles A and the metal oxide particles B, C, or D satisfies the above relational expressions (1), (2), and (3), respectively. The haze value measured according to JIS K 7361 of the highly transparent photocatalyst film itself can be made less than 0.6%, and compared with the photocatalyst film containing only the metal oxide particles A in addition to the photocatalyst particles. The hydrophilization rate can be improved by 2 times or more.
The haze value and the hydrophilization rate of the photocatalyst film are values measured by the following method.
<光触媒膜の親水化速度>
2mm厚の無色透明アクリル板(三菱レーヨン社製、「アクリライトL」)上に、厚み100nmの光触媒膜を形成させ、暗所保持下で十分に疎水下させたサンプルについて、紫外・可視光領域の発光スペクトルが太陽光に類似した人工太陽光源(セリック社製「XC−100BSS」)を使用し、擬似太陽光を照射したのち、接触角計(エルマ販売(株)製「G−1−1000」)で純水に対する接触角の経時変化を追跡した。親水化速度は、光照射時間(min)に対して水接触角値の逆数をプロットし、その直線近似線の傾きを取ることによって求める。
<Hydrophilic speed of photocatalyst film>
UV / visible light region of a sample that was formed on a colorless transparent acrylic plate (Mitsubishi Rayon Co., Ltd., “Acrylite L”) with a thickness of 100 nm and made sufficiently hydrophobic in the dark. The artificial solar light source (“XC-100BSS” manufactured by Celic) whose emission spectrum is similar to that of sunlight is used to irradiate pseudo-sunlight, and then a contact angle meter (“G-1-1000 manufactured by Elma Sales Co., Ltd.). )), The change with time of the contact angle with pure water was followed. The hydrophilization speed is obtained by plotting the reciprocal of the water contact angle value against the light irradiation time (min) and taking the slope of the linear approximation line.
<光触媒膜のヘイズ値>
2mm厚の無色透明アクリル板(前出)上に、厚み100nmの光触媒膜を形成し、日本電色社製のヘイズメーター「NDH−2000」を用い、JIS K 7361に準拠してヘイズ値を求める。光触媒膜自身のヘイズ値は、光触媒膜を成膜した前出の無色透明アクリル板のヘイズ値から、同アクリル板単独のヘイズ値を差し引くことによって求めた。
<Haze value of photocatalyst film>
A photocatalyst film having a thickness of 100 nm is formed on a 2 mm-thick colorless transparent acrylic plate (described above), and a haze value is obtained according to JIS K 7361 using a Nippon Denshoku haze meter “NDH-2000”. . The haze value of the photocatalyst film itself was determined by subtracting the haze value of the acrylic plate alone from the haze value of the colorless and transparent acrylic plate described above on which the photocatalyst film was formed.
本発明で用いる前記金属酸化物粒子A〜Dとしては、シリカ、チタニア、ジルコニア、アルミナおよびマグネシアを挙げることができる。これらは1種を単独で用いてもよく、2種以上を組み合わせて用いてもよいが、これらの中で、シリカ系微粒子が、当該光触媒膜のヘイズ値低減および親水化速度の向上効果の観点から好適である。 Examples of the metal oxide particles A to D used in the present invention include silica, titania, zirconia, alumina, and magnesia. These may be used singly or in combination of two or more. Among them, the silica-based fine particles are used in view of the effect of reducing the haze value of the photocatalyst film and improving the hydrophilization rate. To preferred.
また、本発明の光触媒膜中に含まれる、前記金属酸化物粒子Aと、BまたはCまたはDとの合計量は、当該光触媒膜のヘイズ値低減および親水化速度の向上効果の観点から10〜80質量%であることが好ましく、25〜75質量%であることがより好ましい。
なお、前記の各金属酸化物粒子の平均粒径は、レーザー散乱回折法により、測定される値である。
Further, the total amount of the metal oxide particles A and B or C or D contained in the photocatalyst film of the present invention is 10 to 10 from the viewpoint of the haze value reduction effect and the hydrophilization speed improvement effect of the photocatalyst film. The content is preferably 80% by mass, and more preferably 25 to 75% by mass.
In addition, the average particle diameter of each said metal oxide particle is a value measured by a laser scattering diffraction method.
[光触媒膜の製造]
本発明の光触媒膜は、前述したように、光半導体粒子である結晶質酸化チタンを含むと共に、表面に凹凸を付与するために、光触媒粒子以外に、それぞれ特定の粒径範囲を有する、金属酸化物粒子Aと、金属酸化物粒子BまたはCまたはDとを含む。また、チタンアルコキシドが有機高分子化合物と加水分解縮合してその含有率が表面から深さ方向に向かって連続的に変化する複合体を形成している。
[Production of photocatalytic film]
As described above, the photocatalyst film of the present invention contains crystalline titanium oxide which is a photo semiconductor particle, and has a specific particle size range in addition to the photocatalyst particle, in order to give unevenness to the surface. Product particles A and metal oxide particles B, C, or D. Further, titanium alkoxide is hydrolyzed and condensed with the organic polymer compound to form a complex whose content continuously changes from the surface in the depth direction.
チタンアルコキシドの具体例としては、後述するチタンテトラアルコキシドを挙げることができ、また、有機化合物の具体例としては、後述する加水分解性金属含有基を有する有機高分子化合物を挙げることができる。 Specific examples of the titanium alkoxide include titanium tetraalkoxide described below, and specific examples of the organic compound include an organic polymer compound having a hydrolyzable metal-containing group described below.
また、本発明の光触媒膜は、無機金属塩、有機金属塩ならびにチタンおよび珪素以外の金属のアルコキシドの中から選ばれる少なくとも1種類の金属系化合物をさらに含んでなるものであることが好ましく、上記金属系化合物の具体例は、後述するとおりであるが、特に硝酸アルミニウムが好ましい。 The photocatalytic film of the present invention preferably further comprises at least one metal compound selected from inorganic metal salts, organic metal salts, and alkoxides of metals other than titanium and silicon. Specific examples of the metal compound are as described later, and aluminum nitrate is particularly preferable.
本発明の光触媒膜は、非晶質酸化チタン膜が、水蒸気の存在下で、100℃以下の温度に曝されることにより、あるいは水分の存在下で100℃以下の温度にて加熱処理することにより製造される。この場合、温度100℃以下、相対湿度5%以上の環境下で光触媒を製造することが好ましい。 The photocatalytic film of the present invention is obtained by subjecting an amorphous titanium oxide film to heat treatment at a temperature of 100 ° C. or lower in the presence of water vapor or by exposure to a temperature of 100 ° C. or lower in the presence of moisture. Manufactured by. In this case, it is preferable to produce the photocatalyst in an environment having a temperature of 100 ° C. or lower and a relative humidity of 5% or higher.
また、本発明においては、上記環境下において、さらに250〜1200nmの波長域から選ばれる任意領域の波長を有するとともに、紫外光を含む光の存在下で製造することが好ましく、その場合は、放射照度5〜400W/m2の条件で照射しつつ、上記温度が30〜60℃、相対湿度が50〜80%とすることが好適な製造条件の一つに挙げられる。 Further, in the present invention, in the above environment, it is preferable to produce in the presence of light including ultraviolet light while further having a wavelength in an arbitrary region selected from a wavelength region of 250 to 1200 nm. One suitable manufacturing condition is that the temperature is 30 to 60 ° C. and the relative humidity is 50 to 80% while irradiating under an illuminance of 5 to 400 W / m 2 .
250〜1200nmの波長域から選ばれる任意領域の波長を有するとともに、紫外光を含む光としては、少なくとも、波長250〜260nm、290〜315nm、350〜1200nmの波長域の光を含むものであることが好ましく、放射照度200〜400W/m2の条件下で照射することが、さらに好ましい。 The light having an arbitrary region selected from the wavelength region of 250 to 1200 nm and including the ultraviolet light preferably includes at least light having a wavelength of 250 to 260 nm, 290 to 315 nm, and 350 to 1200 nm. It is further preferable to irradiate under the condition of irradiance of 200 to 400 W / m 2 .
本発明においては、少なくとも1回以上、水を噴霧することが好ましい。本発明に用いられる設備や装置に関する制約は特にないが、代表的には、恒温恒湿環境が得られる各種設備のほか、カーボンアーク式サンシャインウエザーメーター、キセノンウエザーメーター、メタリングウエザーメーター、デューパネルウエザーメーターなどが例示できる。 In the present invention, it is preferable to spray water at least once. There are no particular restrictions on the equipment and equipment used in the present invention, but typically, various equipment that can provide a constant temperature and humidity environment, carbon arc type sunshine weather meter, xenon weather meter, metering weather meter, dew panel A weather meter can be exemplified.
なお、上記と同等の条件が得られる屋外環境下における暴露によっても同様に本発明の光触媒膜を製造することが可能である。 In addition, the photocatalyst film of the present invention can be similarly produced by exposure in an outdoor environment in which the same conditions as described above are obtained.
本発明の光触媒膜は、(A)チタンアルコキシドを加水分解縮合させて得られるチタニアゾルと、(B)分子中に加水分解により酸化チタンと結合し得る金属含有基(加水分解性金属含有基と称することがある。)を有する有機高分子化合物と、(C)凹凸形成用の金属酸化物粒子を含むコーティング剤を用いて形成させ、この膜が、前述の製造条件で光触媒化することにより製造される。 The photocatalyst film of the present invention comprises (A) a titania sol obtained by hydrolytic condensation of titanium alkoxide, and (B) a metal-containing group that can be bonded to titanium oxide by hydrolysis in the molecule (referred to as a hydrolyzable metal-containing group). And (C) a coating agent containing metal oxide particles for forming irregularities, and this film is produced by photocatalysis under the production conditions described above. The
(A)成分であるチタンテトラアルコキシドを加水分解縮合させて得られるチタニアゾルの調製において、原料となるチタンテトラアルコキシドとしては、アルコキシル基の炭素数が1〜4程度のチタンテトラアルコキシドが用いられる。このチタンテトラアルコキシドにおいては、4つのアルコキシル基は、たがいに同一でも異なっていてもよいが、入手の容易さなどの点から、同一のものが好ましく用いられる。上記チタンテトラアルコキシドとしては、チタンテトラメトキシド、チタンテトラエトキシド、チタンテトラ−n−プロポキシド、チタンテトライソプロポキシド、チタンテトラ−n−ブトキシド、チタンテトライソブトキシド、チタンテトラ−sec−ブトキシドおよびチタンテトラ−tert−ブトキシドが挙げられる。これらは1種を単独で用いてもよいし、2種以上を組み合わせて用いてもよい。 In the preparation of titania sol obtained by hydrolytic condensation of titanium tetraalkoxide as component (A), titanium tetraalkoxide having about 1 to 4 carbon atoms of the alkoxyl group is used as the raw material titanium tetraalkoxide. In this titanium tetraalkoxide, the four alkoxyl groups may be the same or different, but the same one is preferably used from the viewpoint of availability. Examples of the titanium tetraalkoxide include titanium tetramethoxide, titanium tetraethoxide, titanium tetra-n-propoxide, titanium tetraisopropoxide, titanium tetra-n-butoxide, titanium tetraisobutoxide, titanium tetra-sec-butoxide and An example is titanium tetra-tert-butoxide. These may be used individually by 1 type and may be used in combination of 2 or more type.
上記チタンテトラアルコキシドを加水分解−縮合させて、チタニアゾル溶液を調製する。このチタンテトラアルコキシドの加水分解−縮合反応は、好ましくは炭素数3以上のエーテル系酸素を有するアルコール類を溶媒として用い、酸性触媒の存在下でチタンテトラアルコキシドに水を作用させることにより行われる。 The titanium tetraalkoxide is hydrolyzed and condensed to prepare a titania sol solution. This hydrolysis-condensation reaction of the titanium tetraalkoxide is preferably carried out by using water having an alcohol having an ether-based oxygen having 3 or more carbon atoms as a solvent and allowing water to act on the titanium tetraalkoxide.
上記炭素数3以上のエーテル系酸素を有するアルコール類としては、チタンテトラアルコキシドに対して相互作用を有する溶剤、例えばエチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、エチレングリコールモノプロピルエーテル、エチレングリコールモノブチルエーテル、エチレングリコールモノt−ブチルエーテルなどのセロソルブ系溶剤、ジエチレングリコールモノメチルエーテル、ジエチレングリコールモノエチルエーテル、ジエチレングリコールモノプロピルエーテル、ジエチレングリコールモノブチルエーテル、プロピレングリコールモノメチルエーテル、プロピレングリコールモノエチルエーテル、プロピレングリコールモノプロピルエーテル、プロピレングリコールモノブチルエーテルなどを挙げることができる。これらの中で、特にチタンテトラアルコキシドに対する相互作用が強いセロソルブ系溶剤が好ましい。これらの溶剤は1種を単独で用いてもよいし、2種以上を組み合わせて用いてもよい。 Examples of the alcohols having ether oxygen having 3 or more carbon atoms include solvents having an interaction with titanium tetraalkoxide, such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether. Cellosolve solvents such as ethylene glycol mono-t-butyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monopropyl ether, diethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, propylene glycol Monobutyl ether, etc. It can be mentioned. Among these, a cellosolve solvent having a strong interaction with titanium tetraalkoxide is particularly preferable. These solvents may be used singly or in combination of two or more.
このようなチタンテトラアルコキシドに対して相互作用を有する溶剤を溶媒として用いることにより、チタンテトラアルコキシドの加水分解−縮合反応により得られたチタニアゾル溶液を安定化させることができ、縮合反応を進行させてもゲル化や粒子化が生じにくくなる。 By using a solvent having such an interaction with titanium tetraalkoxide as a solvent, the titania sol solution obtained by the hydrolysis-condensation reaction of titanium tetraalkoxide can be stabilized, and the condensation reaction can proceed. However, gelation and particle formation are less likely to occur.
チタンテトラアルコキシドの加水分解−縮合反応は、チタンテトラアルコキシドに対し、4〜20倍モル程度、好ましくは5〜12倍モルの上記アルコール類と、0.5倍モル以上4倍モル未満程度、好ましくは1〜3.0倍モルの水を用い、塩酸、硫酸、硝酸などの酸性触媒の存在下、通常0〜70℃、好ましくは20〜50℃の範囲の温度において行われる。酸性触媒は、チタンテトラアルコキシドに対し、通常0.1〜1.0倍モル、好ましくは0.2〜0.7倍モルの範囲で用いられる。 The hydrolysis-condensation reaction of titanium tetraalkoxide is about 4 to 20 times mol, preferably 5 to 12 times mol of the above alcohols and about 0.5 times mol to less than 4 times mol of titanium tetraalkoxide, preferably Is carried out at a temperature in the range of usually 0 to 70 ° C., preferably 20 to 50 ° C. in the presence of an acidic catalyst such as hydrochloric acid, sulfuric acid or nitric acid, using 1 to 3.0 moles of water. An acidic catalyst is 0.1-1.0 times mole normally with respect to titanium tetraalkoxide, Preferably it is used in 0.2-0.7 times mole.
上記(B)成分の加水分解性金属含有基を有する有機高分子化合物は、例えば(x)加水分解性金属含有基を有するエチレン性不飽和単量体と、(y)金属を含まないエチレン性不飽和単量体を共重合させることにより、得ることができる。 The organic polymer compound having a hydrolyzable metal-containing group as the component (B) includes, for example, (x) an ethylenically unsaturated monomer having a hydrolyzable metal-containing group, and (y) an ethylenic compound not containing a metal. It can be obtained by copolymerizing unsaturated monomers.
上記(B)(x)成分である加水分解性金属含有基を有するエチレン性不飽和単量体としては、一般式(4) Examples of the ethylenically unsaturated monomer having a hydrolyzable metal-containing group as the component (B) (x) include those represented by the general formula (4)
で表されるものを挙げることができる。
Can be mentioned.
上記一般式(4)において、R2のうちの加水分解により(A)成分と化学結合しうる加水分解性基としては、例えばアルコキシル基、イソシアネート基、塩素原子などのハロゲン原子、オキシハロゲン基、アセチルアセトネート基、水酸基などが挙げられ、一方、(A)成分と化学結合しない非加水分解性基としては、例えば低級アルキル基などが好ましく挙げられる。 In the general formula (4), examples of the hydrolyzable group that can chemically bond to the component (A) by hydrolysis of R 2 include halogen atoms such as alkoxyl groups, isocyanate groups, and chlorine atoms, oxyhalogen groups, An acetylacetonate group, a hydroxyl group, etc. are mentioned, On the other hand, as a non-hydrolyzable group which does not chemically bond with (A) component, a lower alkyl group etc. are mentioned preferably, for example.
一般式(4)における−M1R2 k−1で表される金属含有基としては、例えば、トリメトキシシリル基、トリエトキシシリル基、トリ−n−プロポキシシリル基、トリイソプロポキシシリル基、トリ−n−ブトキシシリル基、トリイソブトキシシリル基、トリ−sec−ブトキシシリル基、トリ−tert−ブトキシシリル基、トリクロロシリル基、ジメチルメトキシシリル基、メチルジメトキシシリル基、ジメチルクロロシリル基、メチルジクロロシリル基、トリイソシアナトシリル基、メチルジイソシアナトシリル基など、トリメトキシチタニウム基、トリエトキシチタニウム基、トリ−n−プロポキシチタニウム基、トリイソプロポキシチタニウム基、トリ−n−ブトキシチタニウム基、トリイソブトキシチタニウム基、トリ−sec−ブトキシチタニウム基、トリ−tert−ブトキシチタニウム基、トリクロロチタニウム基、さらには、トリメトキシジルコニウム基、トリエトキシジルコニウム基、トリ−n−プロポキシジルコニウム基、トリイソプロポキシジルコニウム基、トリ−n−ブトキシジルコニウム基、トリイソブトキシジルコニウム基、トリ−sec−ブトキシジルコニウム基、トリ−tert−ブトキシジルコニウム基、トリクロロジルコニウム基、またさらには、ジメトキシアルミニウム基、ジエトキシアルミニウム基、ジ−n−プロポキシアルミニウム基、ジイソプロポキシアルミニウム基、ジ−n−ブトキシアルミニウム基、ジイソブトキシアルミニウム基、ジ−sec−ブトキシアルミニウム基、ジ−tert−ブトキシアルミニウム基、トリクロロアルミニウム基などが挙げられる。 Examples of the metal-containing group represented by -M 1 R 2 k-1 in the general formula (4) include a trimethoxysilyl group, a triethoxysilyl group, a tri-n-propoxysilyl group, a triisopropoxysilyl group, Tri-n-butoxysilyl group, triisobutoxysilyl group, tri-sec-butoxysilyl group, tri-tert-butoxysilyl group, trichlorosilyl group, dimethylmethoxysilyl group, methyldimethoxysilyl group, dimethylchlorosilyl group, methyl Dichlorosilyl group, triisocyanatosilyl group, methyldiisocyanatosilyl group, trimethoxytitanium group, triethoxytitanium group, tri-n-propoxytitanium group, triisopropoxytitanium group, tri-n-butoxytitanium group, Triisobutoxy titanium group, tri-s ec-butoxytitanium group, tri-tert-butoxytitanium group, trichlorotitanium group, trimethoxyzirconium group, triethoxyzirconium group, tri-n-propoxyzirconium group, triisopropoxyzirconium group, tri-n-butoxy Zirconium group, triisobutoxyzirconium group, tri-sec-butoxyzirconium group, tri-tert-butoxyzirconium group, trichlorozirconium group, or even dimethoxyaluminum group, diethoxyaluminum group, di-n-propoxyaluminum group, Diisopropoxyaluminum group, di-n-butoxyaluminum group, diisobutoxyaluminum group, di-sec-butoxyaluminum group, di-tert-butoxyaluminum group, Such as chloro aluminum group.
この(x)成分のエチレン性不飽和単量体は1種用いてもよいし、2種以上を組み合わせて用いてもよい。 One type of the ethylenically unsaturated monomer of component (x) may be used, or two or more types may be used in combination.
一方、上記(y)成分である金属を含まないエチレン性不飽和単量体としては、例えば一般式(5) On the other hand, examples of the ethylenically unsaturated monomer not containing a metal as the component (y) include, for example, the general formula (5).
で表されるエチレン性不飽和単量体、好ましくは一般式(5−a)
An ethylenically unsaturated monomer represented by formula (5-a)
で表されるエチレン性不飽和単量体、あるいは上記一般式(5−a)で表されるエチレン性不飽和単量体と、必要に応じて添加される密着性向上剤としての一般式(5−b)
Or an ethylenically unsaturated monomer represented by the above general formula (5-a), and a general formula ( 5-b)
で表されるエチレン性不飽和単量体との混合物を挙げることができる。
And a mixture with an ethylenically unsaturated monomer represented by the formula:
上記一般式(5−a)で表されるエチレン性不飽和単量体において、R4で示される炭化水素基としては、炭素数1〜10の直鎖状若しくは分岐状のアルキル基、炭素数3〜10のシクロアルキル基、炭素数6〜10のアリール基、炭素数7〜10のアラルキル基を好ましく挙げることができる。炭素数1〜10のアルキル基の例としては、メチル基、エチル基、n−プロピル基、イソプロピル基、および各種のブチル基、ペンチル基、ヘキシル基、オクチル基、デシル基などが挙げられる。炭素数3〜10のシクロアルキル基の例としては、シクロペンチル基、シクロヘキシル基、メチルシクロヘキシル基、シクロオクチル基などが、炭素数6〜10のアリール基の例としては、フェニル基、トリル基、キシリル基、ナフチル基、メチルナフチル基などが、炭素数7〜10のアラルキル基の例としては、ベンジル基、メチルベンジル基、フェネチチル基、ナフチルメチル基などが挙げられる。 In the ethylenically unsaturated monomer represented by the general formula (5-a), the hydrocarbon group represented by R 4 includes a linear or branched alkyl group having 1 to 10 carbon atoms, carbon number Preferable examples include 3 to 10 cycloalkyl groups, aryl groups having 6 to 10 carbon atoms, and aralkyl groups having 7 to 10 carbon atoms. Examples of the alkyl group having 1 to 10 carbon atoms include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, and various butyl groups, pentyl groups, hexyl groups, octyl groups, and decyl groups. Examples of the cycloalkyl group having 3 to 10 carbon atoms include a cyclopentyl group, a cyclohexyl group, a methylcyclohexyl group, and a cyclooctyl group. Examples of the aryl group having 6 to 10 carbon atoms include a phenyl group, a tolyl group, and a xylyl group. Examples of the aralkyl group having 7 to 10 carbon atoms, such as a group, a naphthyl group, and a methylnaphthyl group, include a benzyl group, a methylbenzyl group, a phenethylyl group, and a naphthylmethyl group.
この一般式(5−a)で表されるエチレン性不飽和単量体の例としては、メチル(メタ)アクリレート、エチル(メタ)アクリレート、プロピル(メタ)アクリレート、ブチル(メタ)アクリレート、ヘキシル(メタ)アクリレート、2−エチルヘキシル(メタ)アクリレート、シクロヘキシル(メタ)アクリレート、フェニル(メタ)アクリレート、ベンジル(メタ)アクリレートなどが挙げられる。これらは単独で用いてもよいし、2種以上を組み合わせて用いてもよい。 Examples of the ethylenically unsaturated monomer represented by the general formula (5-a) include methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, butyl (meth) acrylate, hexyl ( Examples include meth) acrylate, 2-ethylhexyl (meth) acrylate, cyclohexyl (meth) acrylate, phenyl (meth) acrylate, and benzyl (meth) acrylate. These may be used alone or in combination of two or more.
上記一般式(5−b)で表されるエチレン性不飽和単量体において、R6で示されるエポキシ基、ハロゲン原子若しくはエーテル結合を有する炭化水素基としては、炭素数1〜10の直鎖状若しくは分岐状のアルキル基、炭素数3〜10のシクロアルキル基、炭素数6〜10のアリール基、炭素数7〜10のアラルキル基を好ましく挙げることができる。上記置換基のハロゲン原子としては、塩素原子および臭素原子がよい。上記炭化水素基の具体例としては、前述の一般式(5−a)におけるR4の説明において例示した基と同じものを挙げることができる。 In the ethylenically unsaturated monomer represented by the general formula (5-b), the epoxy group represented by R 6 , the halogen atom, or the hydrocarbon group having an ether bond is a linear chain having 1 to 10 carbon atoms. Preferred examples include a straight or branched alkyl group, a cycloalkyl group having 3 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, and an aralkyl group having 7 to 10 carbon atoms. The halogen atom for the substituent is preferably a chlorine atom or a bromine atom. Specific examples of the hydrocarbon group include the same groups as those exemplified in the description of R 4 in the general formula (5-a).
上記一般式(5−b)で表されるエチレン性不飽和単量体の例としては、グリシジル(メタ)アクリレート、3−グリシドキシプロピル(メタ)アクリレート、2−(3,4−エポキシシクロヘキシル)エチル(メタ)アクリレート、2−クロロエチル(メタ)アクリレート、2−ブロモエチル(メタ)アクリレートなどを好ましく挙げることができる。 Examples of the ethylenically unsaturated monomer represented by the general formula (5-b) include glycidyl (meth) acrylate, 3-glycidoxypropyl (meth) acrylate, and 2- (3,4-epoxycyclohexyl). ) Ethyl (meth) acrylate, 2-chloroethyl (meth) acrylate, 2-bromoethyl (meth) acrylate and the like can be preferably exemplified.
また、上記一般式(5)で表されるエチレン性不飽和単量体としては、これら以外にもスチレン、α−メチルスチレン、α−アセトキシスチレン、m−、o−またはp−ブロモスチレン、m−、o−またはp−クロロスチレン、m−、o−またはp−ビニルフェノール、1−または2−ビニルナフタレンなど、さらにはエチレン性不飽和基を有する重合性高分子用安定剤、例えばエチレン性不飽和基を有する、酸化防止剤、紫外線吸収剤および光安定剤なども用いることができる。これらは単独で用いてもよいし、2種以上を組み合わせて用いてもよい。 In addition to these, the ethylenically unsaturated monomer represented by the general formula (5) includes styrene, α-methylstyrene, α-acetoxystyrene, m-, o- or p-bromostyrene, m -, O- or p-chlorostyrene, m-, o- or p-vinylphenol, 1- or 2-vinylnaphthalene and the like, and stabilizers for polymerizable polymers having an ethylenically unsaturated group, for example, ethylenic Antioxidants, ultraviolet absorbers and light stabilizers having an unsaturated group can also be used. These may be used alone or in combination of two or more.
また、一般式(5−a)で表されるエチレン性不飽和単量体と一般式(5−b)で表されるエチレン性不飽和単量体とを併用する場合は、前者のエチレン性不飽和単量体に対し、後者のエチレン性不飽和単量体を1〜100モル%の割合で用いるのが好ましい。 When the ethylenically unsaturated monomer represented by the general formula (5-a) and the ethylenically unsaturated monomer represented by the general formula (5-b) are used in combination, the former ethylenic monomer It is preferable to use the latter ethylenically unsaturated monomer in a proportion of 1 to 100 mol% with respect to the unsaturated monomer.
上記(x)成分の加水分解性金属含有基を有するエチレン性不飽和単量体と(y)成分の金属を含まないエチレン性不飽和単量体とを、ラジカル重合開始剤の存在下、ラジカル共重合させることにより、(B)成分である加水分解性金属含有基を有する有機高分子化合物が得られる。 In the presence of a radical polymerization initiator, an ethylenically unsaturated monomer having a hydrolyzable metal-containing group as the component (x) and an ethylenically unsaturated monomer not containing a metal as the component (y) By copolymerization, an organic polymer compound having a hydrolyzable metal-containing group as component (B) is obtained.
一方、(C)成分である凹凸形成用の金属酸化物粒子としては、前述で説明したように、(a)平均粒径40nm未満の金属酸化物粒子Aと、(b)平均粒径40nm以上90nm未満の金属酸化物粒子Bまたは平均粒径90nm以上150nm未満の金属酸化物粒子Cまたは平均粒径150nm以上200nm未満の金属酸化物粒子Dとを用いる。 On the other hand, as described above, the metal oxide particles for forming irregularities as the component (C) are (a) metal oxide particles A having an average particle size of less than 40 nm, and (b) average particle size of 40 nm or more. The metal oxide particles B having an average particle diameter of 90 nm or more and less than 150 nm or the metal oxide particles D having an average particle diameter of 150 nm or more and less than 200 nm are used.
前記金属酸化物粒子Aと、金属酸化物粒子BまたはCまたはDとの使用割合は、前記関係式(1)〜(3)で示すとおりである。 The use ratio of the metal oxide particles A and the metal oxide particles B, C, or D is as shown by the relational expressions (1) to (3).
この金属酸化物粒子A〜Dとしては、シリカ、チタニア、ジルコニア、アルミナおよびマグネシアの中から選ばれる少なくとも1種が好ましく用いられるが、これらの中でシリカ系微粒子が好適である。このシリカ系微粒子としては、コロイダルシリカが好ましい。 As the metal oxide particles A to D, at least one selected from silica, titania, zirconia, alumina, and magnesia is preferably used, and among these, silica-based fine particles are preferable. As the silica-based fine particles, colloidal silica is preferable.
本発明においては、上記のようにして得られた(A)成分であるチタニアゾルの溶液と、(B)成分である加水分解性金属含有基を有する有機高分子化合物を適当な極性溶剤中に溶解させた溶液と、(C)成分である凹凸形成用の金属酸化物粒子との混合液を、塗布に適した粘度に調整することによって塗工液を得ることができる。この際、必要ならば、上記塗工液に水および/または酸性触媒を添加してもよい。 In the present invention, the titania sol solution (A) obtained as described above and the organic polymer compound having a hydrolyzable metal-containing group (B) component are dissolved in an appropriate polar solvent. A coating solution can be obtained by adjusting the mixed solution of the solution thus prepared and the metal oxide particles for forming irregularities as the component (C) to a viscosity suitable for coating. At this time, if necessary, water and / or an acidic catalyst may be added to the coating solution.
上記塗工液に(C)成分を含有させることにより、得られる光触媒膜の表面に凹凸が付与され、該光触媒膜の親水性能および透明性が向上する。 By including the component (C) in the coating liquid, irregularities are imparted to the surface of the resulting photocatalyst film, and the hydrophilic performance and transparency of the photocatalyst film are improved.
さらに、成分傾斜構造を有する非晶質酸化チタン膜の形成に用いられるコーティング剤には、アモルファス状酸化チタンの結晶生成を調整する物質として、無機金属塩、有機金属塩並びにチタンおよび珪素以外の金属のアルコキシドの中から選ばれる少なくとも1種の金属系化合物を含有させることができる。具体的には、硝酸アルミニウム、酢酸アルミニウム、硫酸アルミニウム、塩化アルミニウムや、硝酸ジルコニウム、酢酸ジルコニウム、硫酸ジルコニウム、塩化ジルコニウム等の各塩類、ならびに、これら無機塩類の水和物、アルミニウムトリアセチルアセトナートなどのアルミニウムキレート類、テトラ−n−プロポキシジルコニウム、テトラエトキシシラン、フェニルトリメトキシシランなどの金属アルコキシド類、ならびにこれら化合物の加水分解物、あるいは、その縮合物を挙げることができる。これらの中で、特に硝酸アルミニウムならびにその水和物が好適である。前記結晶生成調整物質は、1種を単独で用いてもよく、2種以上を組み合わせて用いてもよい。 Furthermore, the coating agent used for forming an amorphous titanium oxide film having a component gradient structure includes an inorganic metal salt, an organic metal salt, and a metal other than titanium and silicon as a substance that regulates crystal formation of amorphous titanium oxide. At least one metal-based compound selected from the alkoxides can be contained. Specifically, aluminum nitrate, aluminum acetate, aluminum sulfate, aluminum chloride, each salt such as zirconium nitrate, zirconium acetate, zirconium sulfate, zirconium chloride, and hydrates of these inorganic salts, aluminum triacetylacetonate, etc. And metal alkoxides such as tetra-n-propoxyzirconium, tetraethoxysilane, and phenyltrimethoxysilane, and hydrolysates or condensates of these compounds. Of these, aluminum nitrate and hydrates thereof are particularly preferred. The said crystal formation regulator may be used individually by 1 type, and may be used in combination of 2 or more type.
このように、コーティング剤中に結晶生成調整物質を含有させることにより、形成される光触媒膜中の酸化チタンの微結晶生成挙動(例えば、結晶生成速度や結晶成長速度など)を調節することができる。また、使用される環境や要求される性能に応じて、超親水性発現までの時間をコントロールすることなどが可能であり、さらに収縮に伴う亀裂発生抑制など膜の安定性の調節に寄与することもできる。 As described above, by including the crystal formation adjusting substance in the coating agent, it is possible to adjust the microcrystal formation behavior (for example, crystal formation rate, crystal growth rate, etc.) of titanium oxide in the formed photocatalytic film. . In addition, it is possible to control the time until the onset of super hydrophilicity according to the environment used and the required performance, and to contribute to the adjustment of the stability of the film, such as suppressing the occurrence of cracks due to shrinkage. You can also.
本発明においては、有機系基材上に、上述のようにして得られた塗工液を、乾燥塗膜の厚さが、通常0.01〜1μm、好ましくは0.03〜0.3μmの範囲になるように、ディップコート法、スピンコート法、スプレーコート法、バーコート法、ナイフコート法、ロールコート法、ブレードコート法、ダイコート法、グラビアコート法などの公知の手段により塗布し、溶媒を揮散させて塗膜を形成させることが好ましい。 In the present invention, the coating liquid obtained as described above on the organic base material has a dry coating thickness of usually 0.01 to 1 μm, preferably 0.03 to 0.3 μm. The coating is performed by a known means such as a dip coating method, a spin coating method, a spray coating method, a bar coating method, a knife coating method, a roll coating method, a blade coating method, a die coating method, a gravure coating method, and a solvent. It is preferable to volatilize and form a coating film.
上記有機系基材としては、例えばポリメチルメタクリレートなどのアクリル樹脂、ポリスチレンやABS樹脂などのスチレン系樹脂、ポリエチレンやポリプロピレンなどのオレフィン系樹脂、ポリエチレンテレフタレートやポリエチレンナフタレートなどのポリエステル系樹脂、6−ナイロンや6,6−ナイロンなどのポリアミド系樹脂、ポリ塩化ビニル系樹脂、ポリカーボネート系樹脂、ポリフェニレンサルファイド系樹脂、ポリフェニレンエーテル系樹脂、ポリイミド系樹脂、セルロースアセテートなどのセルロース系樹脂などからなる基材を挙げることができる。 Examples of the organic base material include acrylic resins such as polymethyl methacrylate, styrene resins such as polystyrene and ABS resins, olefin resins such as polyethylene and polypropylene, polyester resins such as polyethylene terephthalate and polyethylene naphthalate, 6- Substrates made of polyamide resins such as nylon and 6,6-nylon, polyvinyl chloride resins, polycarbonate resins, polyphenylene sulfide resins, polyphenylene ether resins, polyimide resins, cellulose resins such as cellulose acetate, etc. Can be mentioned.
これらの有機基材は、本発明に係る成分傾斜膜との密着性をさらに向上させるために、所望により、酸化法や凹凸化法などにより表面処理を施すことができる。上記酸化法としては、例えばコロナ放電処理、クロム酸処理(湿式)、火炎処理、熱風処理、オゾン・紫外線照射処理などが挙げられ、また、凹凸化法としては、例えばサンドブラスト法、溶剤処理法などが挙げられる。これらの表面処理法は基材の種類に応じて適宜選ばれる。 These organic base materials can be subjected to surface treatment by an oxidation method, an unevenness method, or the like, if desired, in order to further improve the adhesion to the component gradient film according to the present invention. Examples of the oxidation method include corona discharge treatment, chromic acid treatment (wet), flame treatment, hot air treatment, ozone / ultraviolet irradiation treatment and the like, and examples of the unevenness method include sand blast method and solvent treatment method. Is mentioned. These surface treatment methods are appropriately selected according to the type of substrate.
なお、本発明において、有機基材としては、有機系材料以外の材料、例えば金属系材料、ガラスやセラミックス系材料、その他各種無機系または金属系材料からなる基材の表面に、有機系塗膜を有するものも包含する。 In the present invention, as the organic substrate, an organic coating film is formed on the surface of a substrate made of a material other than an organic material, for example, a metal material, glass, a ceramic material, or other various inorganic or metal materials. The thing which has is included.
本発明においては、このようにして形成された塗膜に、通常0〜200℃、好ましくは15〜150℃の温度にて加熱処理を施すことにより、表面に凹凸が付与された成分傾斜構造を有する非晶質酸化チタン膜が形成される。 In the present invention, the coating film formed in this way is usually subjected to a heat treatment at a temperature of 0 to 200 ° C., preferably 15 to 150 ° C., thereby forming a component gradient structure with irregularities on the surface. An amorphous titanium oxide film is formed.
成分傾斜構造は、例えば得られた膜表面にスパッタリングを施して削っていき、経時的に膜表面の炭素原子とチタン原子の含有率を、X線光電子分光法などにより測定することによって、確認することができる。
次に、本発明の物品について説明する。
The component gradient structure is confirmed, for example, by performing sputtering on the obtained film surface and measuring the content of carbon atoms and titanium atoms on the film surface over time by X-ray photoelectron spectroscopy or the like. be able to.
Next, the article of the present invention will be described.
[物品]
本発明の物品は、有機系基材の表面に本発明の高透明性光触媒膜を有することを特徴とする。
さらに、本発明の物品は、本発明の光触媒膜の機能を害さない範囲で、前記光触媒膜の表面に、厚みが500nm以下である機能膜をさらに設けることができる。
[Goods]
The article of the present invention is characterized by having the highly transparent photocatalytic film of the present invention on the surface of an organic base material.
Furthermore, the article of the present invention can further be provided with a functional film having a thickness of 500 nm or less on the surface of the photocatalyst film as long as the function of the photocatalyst film of the present invention is not impaired.
上記機能膜の機能としては、暗所での親水保持性、導電性、帯電性、ハードコート性、反射特性制御、屈折率制御などが挙げられる。また、上記機能膜の具体的な構成成分としては、シリカ、アルミナ、ジルコニア、ITO、酸化亜鉛などの金属酸化物系化合物が挙げられる。特に、太陽光が当たらない夜間において、親水性を保持するためなどを目的として、シリカを含んでなるものであることが好ましい。 Examples of the function of the functional film include hydrophilicity retention in a dark place, conductivity, chargeability, hard coat property, reflection characteristic control, refractive index control, and the like. In addition, specific constituent components of the functional film include metal oxide compounds such as silica, alumina, zirconia, ITO, and zinc oxide. In particular, it is preferable to contain silica for the purpose of maintaining hydrophilicity at night when sunlight is not applied.
本発明の物品において、高透明性光触媒膜が形成される有機系基材としては、前記で例示した有機系基材と同じものを挙げることができ、また前記と同様に、その上に設けられる光触媒膜との密着性を向上させるために、酸化法や凹凸化法などにより表面処理を施すことができる。 In the article of the present invention, examples of the organic base material on which the highly transparent photocatalytic film is formed include the same organic base materials as exemplified above, and are provided on the same as described above. In order to improve the adhesion to the photocatalyst film, a surface treatment can be performed by an oxidation method, an unevenness method, or the like.
本発明の物品としては、高速道路の防音壁、道路反射鏡、各種反射体、街路灯、自動車をはじめとする車両のボディーコートやサイドミラーあるいはウインド用フィルム、窓ガラスを含む建材、道路標識、ロードサイド看板、冷凍・冷蔵用ショーケース、各種レンズ類やセンサー類などを挙げることができる。 As articles of the present invention, sound barriers for highways, road reflectors, various reflectors, street lamps, body coats and side mirrors for automobiles including automobiles, films for windows, building materials including window glass, road signs, There are roadside signs, freezer / refrigerated showcases, various lenses and sensors.
また、本発明の物品としては、農業用フィルムを挙げることもできる。農業用フィルムは、近年、ハウス栽培やトンネル栽培に盛んに用いられるようになってきたものであり、このような栽培においては、農業用フィルムを展張使用する際、水滴付着による生じる曇りを防止するために、展張後に、防滴剤(防曇剤)を内面にスプレーしていたが、この防滴剤(防曇剤)は、短期間で防滴効果が失われるものであった。これに対して、本発明の光触媒膜を表面に有する農業用フィルムは、長期間親水性を維持し得るものであるため、再塗布を必要とせずに農作業を継続することが可能となる。 Moreover, an agricultural film can also be mentioned as an article of the present invention. In recent years, agricultural films have been actively used for house cultivation and tunnel cultivation, and in such cultivation, when agricultural films are spread and used, they prevent fogging caused by water droplet adhesion. Therefore, after spreading, a drip-proof agent (anti-fogging agent) was sprayed on the inner surface, but this drip-proof agent (anti-fogging agent) lost the drip-proof effect in a short period of time. On the other hand, the agricultural film having the photocatalytic film of the present invention on the surface can maintain hydrophilicity for a long period of time, so that it is possible to continue the farm work without requiring recoating.
上述したように、本発明の物品は、超親水性付与機能を有するが、分解活性が抑制された光触媒膜を有するものであるため、有機系基材を侵食することなく、物品の表面を親水化することが可能になる。 As described above, the article of the present invention has a superhydrophilicity imparting function, but has a photocatalyst film with suppressed decomposition activity, so that the surface of the article can be made hydrophilic without eroding the organic base material. It becomes possible to become.
次に、本発明を実施例により、さらに詳細に説明するが、本発明は、これらの例によってなんら限定されるものではない。
なお、各例で形成された光触媒膜の性能は、以下に示す方法に従って測定した。
EXAMPLES Next, although an Example demonstrates this invention further in detail, this invention is not limited at all by these examples.
In addition, the performance of the photocatalyst film formed in each example was measured according to the following method.
(1)親水化速度
明細書本文記載の方法に従って、親水化速度を測定し、比較例1の光触媒膜の値を1として指数表示した。
(2)ヘイズ値
明細書本文記載の方法に従って、ヘイズ値を測定した。ヘイズ値が低いほど透明性に優れている。
(1) Hydrophilization speed The hydrophilization speed was measured according to the method described in the main text of the specification, and the value of the photocatalyst film of Comparative Example 1 was taken as 1 and indicated as an index.
(2) Haze value The haze value was measured according to the method described in the specification text. The lower the haze value, the better the transparency.
合成例1 チタンアルコキシドの加水分解縮合液の調製
エチルセロソルブ149gに、チタンテトライソプロポキシド(商品名:A−1、日本曹達(株)製)75.7gを攪拌しながら滴下し、溶液(A)を得た。この溶液(A)にエチルセロソルブ58.3g、蒸留水4.55g、60質量%濃硝酸12.6gの混合溶液を攪拌しながら滴下し溶液(B)を得た。溶液(B)をその後、30℃で4時間攪拌することによってチタンアルコキシドの加水分解縮合液(C)を得た。
Synthesis Example 1 Preparation of Titanium Alkoxide Hydrolysis Condensate To 149 g of ethyl cellosolve, 75.7 g of titanium tetraisopropoxide (trade name: A-1, manufactured by Nippon Soda Co., Ltd.) was added dropwise with stirring, and the solution (A ) To this solution (A), a mixed solution of 58.3 g of ethyl cellosolve, 4.55 g of distilled water and 12.6 g of 60 mass% concentrated nitric acid was added dropwise with stirring to obtain a solution (B). Thereafter, the solution (B) was stirred at 30 ° C. for 4 hours to obtain a hydrolytic condensation liquid (C) of titanium alkoxide.
合成例2 有機高分子成分溶液の調製
2Lセパラブルフラスコに窒素雰囲気下でメチルイソブチルケトン704g、メタクリル酸メチル332g、メタクリロキシプロピルトリメトキシシラン42.0gを添加し、60℃まで昇温した。この混合溶液にアゾビスイソブチロニトリル3.2gを溶かしたメチルイソブチルケトン103gを滴下して重合反応を開始し、30時間攪拌して有機高分子成分溶液(D)を得た。
Synthesis Example 2 Preparation of Organic Polymer Component Solution In a 2 L separable flask, 704 g of methyl isobutyl ketone, 332 g of methyl methacrylate and 42.0 g of methacryloxypropyltrimethoxysilane were added under a nitrogen atmosphere, and the temperature was raised to 60 ° C. To this mixed solution, 103 g of methyl isobutyl ketone in which 3.2 g of azobisisobutyronitrile was dissolved was dropped to start the polymerization reaction, and stirred for 30 hours to obtain an organic polymer component solution (D).
実施例1
エチルセロソルブ8.57gに硝酸アルミニウム・九水和物(和光純薬工業(株)製)1.22gを溶解させ、続いて合成例1で調製したチタンアルコキシドの加水分解縮合液(C)を11.03g加えてよく攪拌し溶液(G)を得た。続いて、合成例2で調製した有機高分子成分溶液(D)1.46g、メチルイソブチルケトン47.15g、エチルセロソルブ27.78g、上記記載の溶液(G)20.82g、およびコロイダルシリカA(商品名:IPA−ST(平均粒径20nm)、日産化学工業(株)製)2.09g、コロイダルシリカB(商品名:IPA−ST−L(平均粒径50nm)、日産化学工業(株)製)0.70gの順番で混合し、その後、33℃の温浴で24時間攪拌して、コロイダルシリカと硝酸アルミニウムを混合したチタンアルコキシドの加水分解物と有機高分子成分との傾斜膜コーティング液(H)を作成した。この時、コーティング液(H)固形分中の全コロイダルシリカ量は30質量%であった。
Example 1
1.22 g of aluminum nitrate nonahydrate (manufactured by Wako Pure Chemical Industries, Ltd.) was dissolved in 8.57 g of ethyl cellosolve, and then the hydrolytic condensate (C) of titanium alkoxide prepared in Synthesis Example 1 was dissolved in 11 0.03 g was added and stirred well to obtain a solution (G). Subsequently, 1.46 g of the organic polymer component solution (D) prepared in Synthesis Example 2, 47.15 g of methyl isobutyl ketone, 27.78 g of ethyl cellosolve, 20.82 g of the solution (G) described above, and colloidal silica A ( Product name: IPA-ST (average particle size 20 nm), manufactured by Nissan Chemical Industries, Ltd. 2.09 g, Colloidal silica B (Product name: IPA-ST-L (average particle size 50 nm), Nissan Chemical Industries, Ltd.) Made in order of 0.70 g, and then stirred in a warm bath at 33 ° C. for 24 hours, and a gradient film coating solution of a hydrolyzate of titanium alkoxide mixed with colloidal silica and aluminum nitrate and an organic polymer component ( H). At this time, the total amount of colloidal silica in the solid content of the coating liquid (H) was 30% by mass.
その後コーティング液(H)を、2mm厚の無色透明アクリル板(三菱レーヨン製、「アクリライトL」)にスピンコーターを使用して、約10μmのウエット厚みで塗布し、ドライ厚みが100nmになるように塗布した。次いで、この塗膜を、恒温恒湿チャンバーにて85℃95%RHの条件下で15時間光触媒化処理した。 After that, the coating liquid (H) is applied to a 2 mm-thick colorless and transparent acrylic plate (Mitsubishi Rayon, “Acrylite L”) with a wet thickness of about 10 μm using a spin coater so that the dry thickness becomes 100 nm. It was applied to. Next, this coating film was photocatalyzed for 15 hours in a constant temperature and humidity chamber at 85 ° C. and 95% RH.
この光触媒膜自身のヘイズ値は0.30%であり、親水化速度は、比較例1のものに対して2.19倍であった。また、XPS装置「PHI−5600」[アルバックファイ(株)製]を用い、アルゴンスパッタリング(4kV)を3分間隔で施し膜を削り、膜表面の炭素原子と金属原子の含有率をX線光電子分光法により測定し、傾斜性を調べたところ、表面から深さ方向に金属原子の含有率が連続的に減少する成分傾斜構造を有していることが確認された。 The haze value of this photocatalyst film itself was 0.30%, and the hydrophilization rate was 2.19 times that of Comparative Example 1. In addition, using an XPS apparatus “PHI-5600” [manufactured by ULVAC-PHI Co., Ltd.], argon sputtering (4 kV) was applied at intervals of 3 minutes to scrape the film, and the content of carbon atoms and metal atoms on the film surface was determined by X-ray photoelectron. As a result of measurement by spectroscopic method and investigation of the gradient, it was confirmed that it has a component gradient structure in which the content of metal atoms continuously decreases in the depth direction from the surface.
実施例2
エチルセロソルブ8.57gに硝酸アルミニウム・九水和物(和光純薬工業(株)製)1.22gを溶解させ、続いて合成例1で調製したチタンアルコキシドの加水分解縮合液(C)を11.03g加えてよく攪拌し溶液(G)を得た。続いて、合成例2で調製した有機高分子成分溶液(D)1.46g、メチルイソブチルケトン47.15g、エチルセロソルブ27.78g、上記記載の溶液(G)20.82g、およびコロイダルシリカA(商品名:IPA−ST(平均粒径20nm)、日産化学工業(株)製)1.39g、コロイダルシリカB(商品名:IPA−ST−L(平均粒径50nm)、日産化学工業(株)製)1.39gの順番で混合し、その後、33℃の温浴で24時間攪拌して、コロイダルシリカと硝酸アルミニウムを混合したチタンアルコキシドの加水分解物と有機高分子成分との傾斜膜コーティング液(H)を作製した。この時、コーティング液(H)固形分中の全コロイダルシリカ量は30質量%であった。
その後、実施例1と同様な操作を行い、傾斜膜表面に光触媒層を有する光触媒膜を作製した。この光触媒膜自身のヘイズ値は0.29%であり、親水化速度が比較例1のもの対して2.02倍であった。
Example 2
Dissolve 1.22 g of aluminum nitrate nonahydrate (manufactured by Wako Pure Chemical Industries, Ltd.) in 8.57 g of ethyl cellosolve. 0.03 g was added and stirred well to obtain a solution (G). Subsequently, 1.46 g of the organic polymer component solution (D) prepared in Synthesis Example 2, 47.15 g of methyl isobutyl ketone, 27.78 g of ethyl cellosolve, 20.82 g of the solution (G) described above, and colloidal silica A ( Product name: IPA-ST (average particle size 20 nm), manufactured by Nissan Chemical Industries, Ltd. 1.39 g, colloidal silica B (product name: IPA-ST-L (average particle size 50 nm), Nissan Chemical Industries, Ltd.) (Product made) In the order of 1.39 g, and then stirred for 24 hours in a hot bath at 33 ° C., a gradient film coating solution of a titanium alkoxide hydrolyzate mixed with colloidal silica and aluminum nitrate and an organic polymer component ( H) was produced. At this time, the total amount of colloidal silica in the solid content of the coating liquid (H) was 30% by mass.
Then, the same operation as Example 1 was performed and the photocatalyst film | membrane which has a photocatalyst layer on the inclined film surface was produced. The haze value of this photocatalyst film itself was 0.29%, and the hydrophilization rate was 2.02 times that of Comparative Example 1.
実施例3
エチルセロソルブ8.57gに硝酸アルミニウム・九水和物(和光純薬工業(株)製)1.22gを溶解させ、続いて合成例1で調製したチタンアルコキシドの加水分解縮合液(C)を11.03g加えてよく攪拌し溶液(G)を得た。続いて、合成例2で調製した有機高分子成分溶液(D)1.46g、メチルイソブチルケトン47.15g、エチルセロソルブ27.78g、上記記載の溶液(G)20.82g、およびコロイダルシリカA(商品名:IPA−ST(平均粒径20nm)、日産化学工業(株)製)2.64g、コロイダルシリカC(商品名:IPA−ST−ZL(平均粒径100nm)、日産化学工業(株)製)0.14gの順番で混合し、その後、33℃の温浴で24時間攪拌して、コロイダルシリカと硝酸アルミニウムを混合したチタンアルコキシドの加水分解物と有機高分子成分との傾斜膜コーティング液(H)を作製した。この時、コーティング液(H)固形分中の全コロイダルシリカ量は30質量%であった。
その後、実施例1と同様な操作を行い、傾斜膜表面に光触媒層を有する光触媒膜を作製した。この光触媒膜自身のヘイズ値は0.23%であり、親水化速度が比較例1のもの対して2.48倍であった。
Example 3
Dissolve 1.22 g of aluminum nitrate nonahydrate (manufactured by Wako Pure Chemical Industries, Ltd.) in 8.57 g of ethyl cellosolve. 0.03 g was added and stirred well to obtain a solution (G). Subsequently, 1.46 g of the organic polymer component solution (D) prepared in Synthesis Example 2, 47.15 g of methyl isobutyl ketone, 27.78 g of ethyl cellosolve, 20.82 g of the solution (G) described above, and colloidal silica A ( Trade name: IPA-ST (average particle size 20 nm), manufactured by Nissan Chemical Industries, Ltd. 2.64 g, colloidal silica C (trade name: IPA-ST-ZL (average particle size 100 nm), Nissan Chemical Industries, Ltd.) (Product made) 0.14 g in order, then stirred in a warm bath at 33 ° C. for 24 hours, and a gradient film coating solution of a hydrolyzate of titanium alkoxide mixed with colloidal silica and aluminum nitrate and an organic polymer component ( H) was produced. At this time, the total amount of colloidal silica in the solid content of the coating liquid (H) was 30% by mass.
Then, the same operation as Example 1 was performed and the photocatalyst film | membrane which has a photocatalyst layer on the inclined film surface was produced. The haze value of the photocatalyst film itself was 0.23%, and the hydrophilization rate was 2.48 times that of Comparative Example 1.
実施例4
エチルセロソルブ8.57gに硝酸アルミニウム・九水和物(和光純薬工業(株)製)1.22gを溶解させ、続いて合成例1で調製したチタンアルコキシドの加水分解縮合液(C)を11.03g加えてよく攪拌し溶液(G)を得た。続いて、合成例2で調製した有機高分子成分溶液(D)1.46g、メチルイソブチルケトン47.15g、エチルセロソルブ27.78g、上記記載の溶液(G)20.82g、およびコロイダルシリカA(商品名:IPA−ST(平均粒径20nm)、日産化学工業(株)製)2.09g、コロイダルシリカC(商品名:IPA−ST−ZL(平均粒径100nm)、日産化学工業(株)製)0.70gの順番で混合し、その後、33℃の温浴で24時間攪拌して、コロイダルシリカと硝酸アルミニウムを混合したチタンアルコキシドの加水分解物と有機高分子成分との傾斜膜コーティング液(H)を作製した。この時、コーティング液(H)固形分中の全コロイダルシリカ量は30質量%であった。
その後、実施例1と同様な操作を行い、傾斜膜表面に光触媒層を有する光触媒膜を作製した。この光触媒膜自身のヘイズ値は0.34%であり、親水化速度は比較例1のもの対して3.43倍であった。
Example 4
1.22 g of aluminum nitrate nonahydrate (manufactured by Wako Pure Chemical Industries, Ltd.) was dissolved in 8.57 g of ethyl cellosolve, and then the hydrolytic condensate (C) of titanium alkoxide prepared in Synthesis Example 1 was dissolved in 11 0.03 g was added and stirred well to obtain a solution (G). Subsequently, 1.46 g of the organic polymer component solution (D) prepared in Synthesis Example 2, 47.15 g of methyl isobutyl ketone, 27.78 g of ethyl cellosolve, 20.82 g of the solution (G) described above, and colloidal silica A ( Product name: IPA-ST (average particle size 20 nm), manufactured by Nissan Chemical Industries, Ltd. 2.09 g, Colloidal silica C (Product name: IPA-ST-ZL (average particle size 100 nm), Nissan Chemical Industries, Ltd.) Made in order of 0.70 g, and then stirred in a warm bath at 33 ° C. for 24 hours, and a gradient film coating solution of a hydrolyzate of titanium alkoxide mixed with colloidal silica and aluminum nitrate and an organic polymer component ( H) was produced. At this time, the total amount of colloidal silica in the solid content of the coating liquid (H) was 30% by mass.
Then, the same operation as Example 1 was performed and the photocatalyst film | membrane which has a photocatalyst layer on the inclined film surface was produced. The haze value of the photocatalyst film itself was 0.34%, and the hydrophilization rate was 3.43 times that of Comparative Example 1.
実施例5
エチルセロソルブ8.57gに硝酸アルミニウム・九水和物(和光純薬工業(株)製)1.22gを溶解させ、続いて合成例1で調製したチタンアルコキシドの加水分解縮合液(C)を11.03g加えてよく攪拌し溶液(G)を得た。続いて、合成例2で調製した有機高分子成分溶液(D)1.46g、メチルイソブチルケトン47.15g、エチルセロソルブ27.78g、上記記載の溶液(G)20.82g、およびコロイダルシリカA(商品名:IPA−ST(平均粒径20nm)、日産化学工業(株)製)2.64g、コロイダルシリカD(商品名:MP−2040(平均粒径190nm)、日産化学工業(株)製)0.10gの順番で混合し、その後、33℃の温浴で24時間攪拌して、コロイダルシリカと硝酸アルミニウムを混合したチタンアルコキシドの加水分解物と有機高分子成分との傾斜膜コーティング液(H)を作製した。この時、コーティング液(H)固形分中の全コロイダルシリカ量は30質量%であった。
その後、実施例1と同様な操作を行い、傾斜膜表面に光触媒層を有する光触媒膜を作製した。この光触媒膜自身のヘイズ値は0.32%であり、親水化速度は比較例1のもの対して2.02倍であった。
Example 5
Dissolve 1.22 g of aluminum nitrate nonahydrate (manufactured by Wako Pure Chemical Industries, Ltd.) in 8.57 g of ethyl cellosolve. 0.03 g was added and stirred well to obtain a solution (G). Subsequently, 1.46 g of the organic polymer component solution (D) prepared in Synthesis Example 2, 47.15 g of methyl isobutyl ketone, 27.78 g of ethyl cellosolve, 20.82 g of the solution (G) described above, and colloidal silica A ( Trade name: IPA-ST (average particle size 20 nm), manufactured by Nissan Chemical Industries, Ltd. 2.64 g, colloidal silica D (trade name: MP-2040 (average particle size 190 nm), manufactured by Nissan Chemical Industries, Ltd.) Mixing in order of 0.10 g, and then stirring in a warm bath at 33 ° C. for 24 hours, a gradient film coating solution (H) of a hydrolyzate of titanium alkoxide mixed with colloidal silica and aluminum nitrate and an organic polymer component Was made. At this time, the total amount of colloidal silica in the solid content of the coating liquid (H) was 30% by mass.
Then, the same operation as Example 1 was performed and the photocatalyst film | membrane which has a photocatalyst layer on the inclined film surface was produced. The haze value of this photocatalyst film itself was 0.32%, and the hydrophilization rate was 2.02 times that of Comparative Example 1.
実施例6
エチルセロソルブ8.57gに硝酸アルミニウム・九水和物(和光純薬工業(株)製)1.22gを溶解させ、続いて合成例1で調製したチタンアルコキシドの加水分解縮合液(C)を11.03g加えてよく攪拌し溶液(G)を得た。続いて、合成例2で調製した有機高分子成分溶液(D)1.46g、メチルイソブチルケトン47.15g、エチルセロソルブ27.78g、上記記載の溶液(G)20.82g、およびコロイダルシリカA(商品名:IPA−ST(平均粒径20nm)、日産化学工業(株)製)2.50g、コロイダルシリカD(商品名:MP−2040(平均粒径190nm)、日産化学工業(株)製)0.21gの順番で混合し、その後、33℃の温浴で24時間攪拌して、コロイダルシリカと硝酸アルミニウムを混合したチタンアルコキシドの加水分解物と有機高分子成分との傾斜膜コーティング液(H)を作製した。この時、コーティング液(H)固形分中の全コロイダルシリカ量は30質量%であった。
その後、実施例1と同様な操作を行い、傾斜膜表面に光触媒層を有する光触媒膜を作製した。この光触媒膜のヘイズ値は0.51%であり、親水化速度は比較例1のもの対して2.75倍であった。
Example 6
1.22 g of aluminum nitrate nonahydrate (manufactured by Wako Pure Chemical Industries, Ltd.) was dissolved in 8.57 g of ethyl cellosolve, and then the hydrolytic condensate (C) of titanium alkoxide prepared in Synthesis Example 1 was dissolved in 11 0.03 g was added and stirred well to obtain a solution (G). Subsequently, 1.46 g of the organic polymer component solution (D) prepared in Synthesis Example 2, 47.15 g of methyl isobutyl ketone, 27.78 g of ethyl cellosolve, 20.82 g of the solution (G) described above, and colloidal silica A ( Product name: IPA-ST (average particle size 20 nm), manufactured by Nissan Chemical Industries, Ltd. 2.50 g, colloidal silica D (Product name: MP-2040 (average particle size 190 nm), manufactured by Nissan Chemical Industries, Ltd.) Mixing in the order of 0.21 g, and then stirring in a warm bath at 33 ° C. for 24 hours, a gradient film coating solution (H) of a hydrolyzate of titanium alkoxide mixed with colloidal silica and aluminum nitrate and an organic polymer component Was made. At this time, the total amount of colloidal silica in the solid content of the coating liquid (H) was 30% by mass.
Then, the same operation as Example 1 was performed and the photocatalyst film | membrane which has a photocatalyst layer on the inclined film surface was produced. The haze value of this photocatalyst film was 0.51%, and the hydrophilization rate was 2.75 times that of Comparative Example 1.
比較例1
エチルセロソルブ8.57gに硝酸アルミニウム・九水和物(和光純薬工業(株)製)1.22gを溶解させ、続いて合成例1で調製したチタンアルコキシドの加水分解縮合液(C)を11.03g加えてよく攪拌し溶液(G)を得た。続いて、合成例2で調製した有機高分子成分溶液(D)1.46g、メチルイソブチルケトン47.15g、エチルセロソルブ27.78g、上記記載の溶液(G)20.82g、およびコロイダルシリカA(商品名:IPA−ST(平均粒径20nm)、日産化学工業(株)製)2.78gの順番で混合し、その後、33℃の温浴で24時間攪拌して、コロイダルシリカと硝酸アルミニウムを混合したチタンアルコキシドの加水分解物と有機高分子成分との傾斜膜コーティング液(H)を作製した。この時、コーティング液(H)固形分中のコロイダルシリカAの量は30質量%であった。
その後、実施例1と同様な操作を行い、傾斜膜表面に光触媒層を有する光触媒膜を作製した。この光触媒膜自身のヘイズ値は0.12%であった。
Comparative Example 1
Dissolve 1.22 g of aluminum nitrate nonahydrate (manufactured by Wako Pure Chemical Industries, Ltd.) in 8.57 g of ethyl cellosolve. 0.03 g was added and stirred well to obtain a solution (G). Subsequently, 1.46 g of the organic polymer component solution (D) prepared in Synthesis Example 2, 47.15 g of methyl isobutyl ketone, 27.78 g of ethyl cellosolve, 20.82 g of the solution (G) described above, and colloidal silica A ( Product name: IPA-ST (average particle size 20 nm), manufactured by Nissan Chemical Industries, Ltd. 2.78 g in this order, and then stirred in a 33 ° C. warm bath for 24 hours to mix colloidal silica and aluminum nitrate An inclined film coating solution (H) of the hydrolyzed titanium alkoxide and the organic polymer component was prepared. At this time, the amount of colloidal silica A in the coating liquid (H) solid content was 30% by mass.
Then, the same operation as Example 1 was performed and the photocatalyst film | membrane which has a photocatalyst layer on the inclined film surface was produced. The haze value of the photocatalyst film itself was 0.12%.
比較例2
エチルセロソルブ8.57gに硝酸アルミニウム・九水和物(和光純薬工業(株)製)1.22gを溶解させ、続いて合成例1で調製したチタンアルコキシドの加水分解縮合液(C)を11.03g加えてよく攪拌し溶液(G)を得た。続いて、合成例2で調製した有機高分子成分溶液(D)1.46g、メチルイソブチルケトン47.15g、エチルセロソルブ27.78g、上記記載の溶液(G)20.82g、およびコロイダルシリカB(商品名:IPA−ST−L(平均粒径50nm)、日産化学工業(株)製)2.78gの順番で混合し、その後、33℃の温浴で24時間攪拌して、コロイダルシリカと硝酸アルミニウムを混合したチタンアルコキシドの加水分解物と有機高分子成分との傾斜膜コーティング液(H)を作製した。この時、コーティング液(H)固形分中のコロイダルシリカBの量は30質量%であった。
その後、実施例1と同様な操作を行い、傾斜膜表面に光触媒層を有する光触媒膜を作製した。この光触媒膜自身のヘイズ値は0.35%であり、親水化速度は比較例1のもの対して0.34倍であった。
Comparative Example 2
1.22 g of aluminum nitrate nonahydrate (manufactured by Wako Pure Chemical Industries, Ltd.) was dissolved in 8.57 g of ethyl cellosolve, and then the hydrolytic condensate (C) of titanium alkoxide prepared in Synthesis Example 1 was dissolved in 11 0.03 g was added and stirred well to obtain a solution (G). Subsequently, 1.46 g of the organic polymer component solution (D) prepared in Synthesis Example 2, 47.15 g of methyl isobutyl ketone, 27.78 g of ethyl cellosolve, 20.82 g of the solution (G) described above, and colloidal silica B ( Product name: IPA-ST-L (average particle size 50 nm), manufactured by Nissan Chemical Industries, Ltd. 2.78 g in this order, then stirred in a 33 ° C. warm bath for 24 hours, colloidal silica and aluminum nitrate A gradient film coating solution (H) of a hydrolyzate of titanium alkoxide and an organic polymer component was prepared. At this time, the amount of colloidal silica B in the coating liquid (H) solid content was 30% by mass.
Then, the same operation as Example 1 was performed and the photocatalyst film | membrane which has a photocatalyst layer on the inclined film surface was produced. The haze value of the photocatalyst film itself was 0.35%, and the hydrophilization rate was 0.34 times that of Comparative Example 1.
比較例3
エチルセロソルブ8.57gに硝酸アルミニウム・九水和物(和光純薬工業(株)製)1.22gを溶解させ、続いて合成例1で調製したチタンアルコキシドの加水分解縮合液(C)を11.03g加えてよく攪拌し溶液(G)を得た。続いて、合成例2で調製した有機高分子成分溶液(D)1.46g、メチルイソブチルケトン47.15g、エチルセロソルブ27.78g、上記記載の溶液(G)20.82g、およびコロイダルシリカC(商品名:IPA−ST−ZL(平均粒径100nm)、日産化学工業(株)製)2.78gの順番で混合し、その後、33℃の温浴で24時間攪拌して、コロイダルシリカと硝酸アルミニウムを混合したチタンアルコキシドの加水分解物と有機高分子成分との傾斜膜コーティング液(H)を作製した。この時、コーティング液(H)固形分中のコロイダルシリカCの量は30質量%であった。
その後、実施例1と同様な操作を行い、傾斜膜表面に光触媒層を有する光触媒膜を作製した。この光触媒膜自身のヘイズ値は0.74%であり、親水化速度は比較例1のもの対して0.35倍であった。
Comparative Example 3
1.22 g of aluminum nitrate nonahydrate (manufactured by Wako Pure Chemical Industries, Ltd.) was dissolved in 8.57 g of ethyl cellosolve, and then the hydrolytic condensate (C) of titanium alkoxide prepared in Synthesis Example 1 was dissolved in 11 0.03 g was added and stirred well to obtain a solution (G). Subsequently, 1.46 g of the organic polymer component solution (D) prepared in Synthesis Example 2, 47.15 g of methyl isobutyl ketone, 27.78 g of ethyl cellosolve, 20.82 g of the solution (G) described above, and colloidal silica C ( Trade name: IPA-ST-ZL (average particle size 100 nm), manufactured by Nissan Chemical Industries, Ltd.) 2.78 g in order, then stirred in a hot bath at 33 ° C. for 24 hours, colloidal silica and aluminum nitrate A gradient film coating solution (H) of a hydrolyzate of titanium alkoxide and an organic polymer component was prepared. At this time, the amount of colloidal silica C in the coating liquid (H) solid content was 30% by mass.
Then, the same operation as Example 1 was performed and the photocatalyst film | membrane which has a photocatalyst layer on the inclined film surface was produced. The haze value of the photocatalyst film itself was 0.74%, and the hydrophilization rate was 0.35 times that of Comparative Example 1.
比較例4
エチルセロソルブ8.57gに硝酸アルミニウム・九水和物(和光純薬工業(株)製)1.22gを溶解させ、続いて合成例1で調製したチタンアルコキシドの加水分解縮合液(C)を11.03g加えてよく攪拌し溶液(G)を得た。続いて、合成例2で調製した有機高分子成分溶液(D)1.46g、メチルイソブチルケトン47.15g、エチルセロソルブ27.78g、上記記載の溶液(G)20.82g、およびコロイダルシリカD(商品名:MP−2040(平均粒径190nm)、日産化学工業(株)製)2.09gの順番で混合し、その後、33℃の温浴で24時間攪拌して、コロイダルシリカと硝酸アルミニウムを混合したチタンアルコキシドの加水分解物と有機高分子成分との傾斜膜コーティング液(H)を作製した。この時、コーティング液(H)固形分中のコロイダルシリカDの量は30質量%であった。
その後、実施例1と同様な操作を行い、傾斜膜表面に光触媒層を有する光触媒膜を作製した。この光触媒膜自身のヘイズ値は1.69%であり、親水化速度は比較例1のもの対して0.25倍であった。
Comparative Example 4
1.22 g of aluminum nitrate nonahydrate (manufactured by Wako Pure Chemical Industries, Ltd.) was dissolved in 8.57 g of ethyl cellosolve, and then the hydrolytic condensate (C) of titanium alkoxide prepared in Synthesis Example 1 was dissolved in 11 0.03 g was added and stirred well to obtain a solution (G). Subsequently, 1.46 g of the organic polymer component solution (D) prepared in Synthesis Example 2, 47.15 g of methyl isobutyl ketone, 27.78 g of ethyl cellosolve, 20.82 g of the solution (G) described above, and colloidal silica D ( Product name: MP-2040 (average particle diameter 190 nm), manufactured by Nissan Chemical Industries, Ltd. 2.09 g in order, then stirred in a 33 ° C. warm bath for 24 hours to mix colloidal silica and aluminum nitrate An inclined film coating solution (H) of the hydrolyzed titanium alkoxide and the organic polymer component was prepared. At this time, the amount of colloidal silica D in the solid content of the coating liquid (H) was 30% by mass.
Then, the same operation as Example 1 was performed and the photocatalyst film | membrane which has a photocatalyst layer on the inclined film surface was produced. The haze value of this photocatalyst film itself was 1.69%, and the hydrophilization rate was 0.25 times that of Comparative Example 1.
比較例5
エチルセロソルブ8.57gに硝酸アルミニウム・九水和物(和光純薬工業(株)製)1.22gを溶解させ、続いて合成例1で調製したチタンアルコキシドの加水分解縮合液(C)を11.03g加えてよく攪拌し溶液(G)を得た。続いて、合成例2で調製した有機高分子成分溶液(D)1.46g、メチルイソブチルケトン47.15g、エチルセロソルブ27.78g、上記記載の溶液(G)20.82g、およびコロイダルシリカA(商品名:IPA−ST(平均粒径20nm)、日産化学工業(株)製)2.64g、コロイダルシリカB(商品名:IPA−ST−L(平均粒径50nm)、日産化学工業(株)製)0.14gの順番で混合し、その後、33℃の温浴で24時間攪拌して、コロイダルシリカと硝酸アルミニウムを混合したチタンアルコキシドの加水分解物と有機高分子成分との傾斜膜コーティング液(H)を作製した。この時、コーティング液(H)固形分中の全コロイダルシリカ量は30質量%であった。
その後、実施例1と同様な操作を行い、傾斜膜表面に光触媒層を有する光触媒膜を作製した。この光触媒膜のヘイズ値は0.39%であり、親水化速度は比較例1のもの対して1.45倍であった。
Comparative Example 5
1.22 g of aluminum nitrate nonahydrate (manufactured by Wako Pure Chemical Industries, Ltd.) was dissolved in 8.57 g of ethyl cellosolve, and then the hydrolytic condensate (C) of titanium alkoxide prepared in Synthesis Example 1 was dissolved in 11 0.03 g was added and stirred well to obtain a solution (G). Subsequently, 1.46 g of the organic polymer component solution (D) prepared in Synthesis Example 2, 47.15 g of methyl isobutyl ketone, 27.78 g of ethyl cellosolve, 20.82 g of the solution (G) described above, and colloidal silica A ( Trade name: IPA-ST (average particle size 20 nm), manufactured by Nissan Chemical Industries, Ltd. 2.64 g, colloidal silica B (trade name: IPA-ST-L (average particle size 50 nm), Nissan Chemical Industries, Ltd.) (Product made) 0.14 g in order, then stirred in a warm bath at 33 ° C. for 24 hours, and a gradient film coating solution of a hydrolyzate of titanium alkoxide mixed with colloidal silica and aluminum nitrate and an organic polymer component ( H) was produced. At this time, the total amount of colloidal silica in the solid content of the coating liquid (H) was 30% by mass.
Then, the same operation as Example 1 was performed and the photocatalyst film | membrane which has a photocatalyst layer on the inclined film surface was produced. The haze value of this photocatalyst film was 0.39%, and the hydrophilization rate was 1.45 times that of Comparative Example 1.
比較例6
エチルセロソルブ8.57gに硝酸アルミニウム・九水和物(和光純薬工業(株)製)1.22gを溶解させ、続いて合成例1で調製したチタンアルコキシドの加水分解縮合液(C)を11.03g加えてよく攪拌し溶液(G)を得た。続いて、合成例2で調製した有機高分子成分溶液(D)1.46g、メチルイソブチルケトン47.15g、エチルセロソルブ27.78g、上記記載の溶液(G)20.82g、およびコロイダルシリカA(商品名:IPA−ST(平均粒径20nm)、日産化学工業(株)製)0.47g、コロイダルシリカB(商品名:IPA−ST−L(平均粒径50nm)、日産化学工業(株)製)2.31gの順番で混合し、その後、33℃の温浴で24時間攪拌して、コロイダルシリカと硝酸アルミニウムを混合したチタンアルコキシドの加水分解物と有機高分子成分との傾斜膜コーティング液(H)を作製した。この時、コーティング液(H)固形分中の全コロイダルシリカ量は30質量%であった。
その後、実施例1と同様な操作を行い、傾斜膜表面に光触媒層を有する光触媒膜を作製した。この光触媒膜自身のヘイズ値は0.19%であり、親水化速度は比較例1のもの対して0.74倍であった。
Comparative Example 6
Dissolve 1.22 g of aluminum nitrate nonahydrate (manufactured by Wako Pure Chemical Industries, Ltd.) in 8.57 g of ethyl cellosolve. 0.03 g was added and stirred well to obtain a solution (G). Subsequently, 1.46 g of the organic polymer component solution (D) prepared in Synthesis Example 2, 47.15 g of methyl isobutyl ketone, 27.78 g of ethyl cellosolve, 20.82 g of the solution (G) described above, and colloidal silica A ( Product name: IPA-ST (average particle size 20 nm), manufactured by Nissan Chemical Industries, Ltd. 0.47 g, colloidal silica B (product name: IPA-ST-L (average particle size 50 nm), Nissan Chemical Industries, Ltd.) (Product made) In order of 2.31 g, and then stirred in a warm bath at 33 ° C. for 24 hours, a gradient film coating liquid of a hydrolyzate of titanium alkoxide mixed with colloidal silica and aluminum nitrate and an organic polymer component ( H) was produced. At this time, the total amount of colloidal silica in the solid content of the coating liquid (H) was 30% by mass.
Then, the same operation as Example 1 was performed and the photocatalyst film | membrane which has a photocatalyst layer on the inclined film surface was produced. The haze value of the photocatalyst film itself was 0.19%, and the hydrophilization rate was 0.74 times that of Comparative Example 1.
比較例7
エチルセロソルブ8.57gに硝酸アルミニウム・九水和物(和光純薬工業(株)製)1.22gを溶解させ、続いて合成例1で調製したチタンアルコキシドの加水分解縮合液(C)を11.03g加えてよく攪拌し溶液(G)を得た。続いて、合成例2で調製した有機高分子成分溶液(D)1.46g、メチルイソブチルケトン47.15g、エチルセロソルブ27.78g、上記記載の溶液(G)20.82g、およびコロイダルシリカA(商品名:IPA−ST(平均粒径20nm)、日産化学工業(株)製)2.75g、コロイダルシリカC(商品名:IPA−ST−ZL(平均粒径100nm)、日産化学工業(株)製)0.03gの順番で混合し、その後、33℃の温浴で24時間攪拌して、コロイダルシリカと硝酸アルミニウムを混合したチタンアルコキシドの加水分解物と有機高分子成分との傾斜膜コーティング液(H)を作製した。この時、コーティング液(H)固形分中の全コロイダルシリカ量は30質量%であった。
その後、実施例1と同様な操作を行い、傾斜膜表面に光触媒層を有する光触媒膜を作製した。この光触媒膜自身のヘイズ値は0.21%であり、親水化速度は比較例1のもの対して1.58倍であった。
Comparative Example 7
Dissolve 1.22 g of aluminum nitrate nonahydrate (manufactured by Wako Pure Chemical Industries, Ltd.) in 8.57 g of ethyl cellosolve. 0.03 g was added and stirred well to obtain a solution (G). Subsequently, 1.46 g of the organic polymer component solution (D) prepared in Synthesis Example 2, 47.15 g of methyl isobutyl ketone, 27.78 g of ethyl cellosolve, 20.82 g of the solution (G) described above, and colloidal silica A ( Product name: IPA-ST (average particle size 20 nm), manufactured by Nissan Chemical Industries, Ltd. 2.75 g, colloidal silica C (product name: IPA-ST-ZL (average particle size 100 nm), Nissan Chemical Industries, Ltd.) Made in order of 0.03 g, then stirred in a warm bath at 33 ° C. for 24 hours, and a gradient membrane coating solution of a hydrolyzate of titanium alkoxide mixed with colloidal silica and aluminum nitrate and an organic polymer component ( H) was produced. At this time, the total amount of colloidal silica in the solid content of the coating liquid (H) was 30% by mass.
Then, the same operation as Example 1 was performed and the photocatalyst film | membrane which has a photocatalyst layer on the inclined film surface was produced. The haze value of this photocatalyst film itself was 0.21%, and the hydrophilization rate was 1.58 times that of Comparative Example 1.
比較例8
エチルセロソルブ8.57gに硝酸アルミニウム・九水和物(和光純薬工業(株)製)1.22gを溶解させ、続いて合成例1で調製したチタンアルコキシドの加水分解縮合液(C)を11.03g加えてよく攪拌し溶液(G)を得た。続いて、合成例2で調製した有機高分子成分溶液(D)1.46g、メチルイソブチルケトン47.15g、エチルセロソルブ27.78g、上記記載の溶液(G)20.82g、およびコロイダルシリカA(商品名:IPA−ST(平均粒径20nm)、日産化学工業(株)製)1.39g、コロイダルシリカC(商品名:IPA−ST−ZL(平均粒径100nm)、日産化学工業(株)製)1.39gの順番で混合し、その後、33℃の温浴で24時間攪拌して、コロイダルシリカと硝酸アルミニウムを混合したチタンアルコキシドの加水分解物と有機高分子成分との傾斜膜コーティング液(H)を作製した。この時、コーティング液(H)固形分中の全コロイダルシリカ量は30質量%であった。
その後、実施例1と同様な操作を行い、傾斜膜表面に光触媒層を有する光触媒膜を作製した。この光触媒膜自身のヘイズ値は0.25%であり、親水化速度は比較例1のもの対して0.72倍であった。
Comparative Example 8
Dissolve 1.22 g of aluminum nitrate nonahydrate (manufactured by Wako Pure Chemical Industries, Ltd.) in 8.57 g of ethyl cellosolve. 0.03 g was added and stirred well to obtain a solution (G). Subsequently, 1.46 g of the organic polymer component solution (D) prepared in Synthesis Example 2, 47.15 g of methyl isobutyl ketone, 27.78 g of ethyl cellosolve, 20.82 g of the solution (G) described above, and colloidal silica A ( Trade name: IPA-ST (average particle size 20 nm), manufactured by Nissan Chemical Industries, Ltd. 1.39 g, colloidal silica C (trade name: IPA-ST-ZL (average particle size 100 nm), Nissan Chemical Industries, Ltd.) (Product made) In the order of 1.39 g, and then stirred for 24 hours in a hot bath at 33 ° C., a gradient film coating solution of a titanium alkoxide hydrolyzate mixed with colloidal silica and aluminum nitrate and an organic polymer component ( H) was produced. At this time, the total amount of colloidal silica in the solid content of the coating liquid (H) was 30% by mass.
Then, the same operation as Example 1 was performed and the photocatalyst film | membrane which has a photocatalyst layer on the inclined film surface was produced. The haze value of this photocatalyst film itself was 0.25%, and the hydrophilization rate was 0.72 times that of Comparative Example 1.
比較例9
エチルセロソルブ8.57gに硝酸アルミニウム・九水和物(和光純薬工業(株)製)1.22gを溶解させ、続いて合成例1で調製したチタンアルコキシドの加水分解縮合液(C)を11.03g加えてよく攪拌し溶液(G)を得た。続いて、合成例2で調製した有機高分子成分溶液(D)1.46g、メチルイソブチルケトン47.15g、エチルセロソルブ27.78g、上記記載の溶液(G)20.82g、およびコロイダルシリカA(商品名:IPA−ST(平均粒径20nm)、日産化学工業(株)製)2.75g、コロイダルシリカD(商品名:MP−2040(平均粒径190nm)、日産化学工業(株)製)0.02gの順番で混合し、その後、33℃の温浴で24時間攪拌して、コロイダルシリカと硝酸アルミニウムを混合したチタンアルコキシドの加水分解物と有機高分子成分との傾斜膜コーティング液(H)を作製した。この時、コーティング液(H)固形分中の全コロイダルシリカ量は30質量%であった。
その後、実施例1と同様な操作を行い、傾斜膜表面に光触媒層を有する光触媒膜を作製した。この光触媒膜自身のヘイズ値は0.28%であり、親水化速度は比較例1のもの対して1.75倍であった。
Comparative Example 9
Dissolve 1.22 g of aluminum nitrate nonahydrate (manufactured by Wako Pure Chemical Industries, Ltd.) in 8.57 g of ethyl cellosolve. 0.03 g was added and stirred well to obtain a solution (G). Subsequently, 1.46 g of the organic polymer component solution (D) prepared in Synthesis Example 2, 47.15 g of methyl isobutyl ketone, 27.78 g of ethyl cellosolve, 20.82 g of the solution (G) described above, and colloidal silica A ( Product name: IPA-ST (average particle size 20 nm), manufactured by Nissan Chemical Industries, Ltd. 2.75 g, colloidal silica D (Product name: MP-2040 (average particle size 190 nm), manufactured by Nissan Chemical Industries, Ltd.) Mix in the order of 0.02 g, and then stir in a warm bath at 33 ° C. for 24 hours to prepare a gradient film coating solution (H) of a hydrolyzate of titanium alkoxide mixed with colloidal silica and aluminum nitrate and an organic polymer component. Was made. At this time, the total amount of colloidal silica in the solid content of the coating liquid (H) was 30% by mass.
Then, the same operation as Example 1 was performed and the photocatalyst film | membrane which has a photocatalyst layer on the inclined film surface was produced. The haze value of this photocatalyst film itself was 0.28%, and the hydrophilization rate was 1.75 times that of Comparative Example 1.
比較例10
エチルセロソルブ8.57gに硝酸アルミニウム・九水和物(和光純薬工業(株)製)1.22gを溶解させ、続いて合成例1で調製したチタンアルコキシドの加水分解縮合液(C)を11.03g加えてよく攪拌し溶液(G)を得た。続いて、合成例2で調製した有機高分子成分溶液(D)1.46g、メチルイソブチルケトン47.15g、エチルセロソルブ27.78g、上記記載の溶液(G)20.82g、およびコロイダルシリカA(商品名:IPA−ST(平均粒径20nm)、日産化学工業(株)製)2.36g、コロイダルシリカD(商品名:MP−2040(平均粒径190nm)、日産化学工業(株)製)0.31gの順番で混合し、その後、33℃の温浴で24時間攪拌して、コロイダルシリカと硝酸アルミニウムを混合したチタンアルコキシドの加水分解物と有機高分子成分との傾斜膜コーティング液(H)を作製した。この時、コーティング液(H)固形分中の全コロイダルシリカ量は30質量%であった。
その後、実施例1と同様な操作を行い、傾斜膜表面に光触媒層を有する光触媒膜を作製した。この光触媒膜自身のヘイズ値は0.65%であり、親水化速度は比較例1のもの対して2.75倍であった。
以上、実施例1〜6および比較例1〜10の結果を表1に示す。
Comparative Example 10
Dissolve 1.22 g of aluminum nitrate nonahydrate (manufactured by Wako Pure Chemical Industries, Ltd.) in 8.57 g of ethyl cellosolve. 0.03 g was added and stirred well to obtain a solution (G). Subsequently, 1.46 g of the organic polymer component solution (D) prepared in Synthesis Example 2, 47.15 g of methyl isobutyl ketone, 27.78 g of ethyl cellosolve, 20.82 g of the solution (G) described above, and colloidal silica A ( Trade name: IPA-ST (average particle size 20 nm), manufactured by Nissan Chemical Industries, Ltd. 2.36 g, colloidal silica D (trade name: MP-2040 (average particle size 190 nm), manufactured by Nissan Chemical Industries, Ltd.) Mixing in order of 0.31 g, and then stirring in a warm bath at 33 ° C. for 24 hours, a gradient film coating solution (H) of a hydrolyzate of titanium alkoxide mixed with colloidal silica and aluminum nitrate and an organic polymer component Was made. At this time, the total amount of colloidal silica in the solid content of the coating liquid (H) was 30% by mass.
Then, the same operation as Example 1 was performed and the photocatalyst film | membrane which has a photocatalyst layer on the inclined film surface was produced. The haze value of the photocatalyst film itself was 0.65%, and the hydrophilization rate was 2.75 times that of Comparative Example 1.
The results of Examples 1 to 6 and Comparative Examples 1 to 10 are shown in Table 1 above.
表1から分かるように、本発明の光触媒膜(実施例1〜6)は、いずれも親水化速度指数が2以上であり、かつ光触媒膜自身のヘイズ値はヘイズ値が0.6%未満である。
これに対し、比較例1〜9は、いずれも親水化速度が2未満である。比較例10は、親水化速度が2.75と高いが、光触媒膜自身のヘイズ値はヘイズ値が0.65%と大きい。
As can be seen from Table 1, each of the photocatalyst films of the present invention (Examples 1 to 6) has a hydrophilization rate index of 2 or more, and the haze value of the photocatalyst film itself is less than 0.6%. is there.
On the other hand, Comparative Examples 1 to 9 all have a hydrophilization rate of less than 2. In Comparative Example 10, the hydrophilization rate is as high as 2.75, but the haze value of the photocatalyst film itself is as high as 0.65%.
本発明の光触媒膜は、優れた親水性能を有するが、分解活性はほとんど示さず、有機系基材の劣化を抑制し得ると共に、高い透明性を有し、窓材、自動車のサイドミラー、カーブミラー、反射板などに好適に用いられる。 The photocatalyst film of the present invention has excellent hydrophilic performance, but exhibits almost no decomposition activity, can suppress the deterioration of the organic base material, has high transparency, has a window material, an automobile side mirror, and a curve. It is suitably used for mirrors, reflectors and the like.
Claims (8)
80/20≦A/B≦45/55 (1)
97/3 ≦A/C≦70/30 (2)
97/3 ≦A/D≦88/12 (3)
を満たし、表面に凹凸を有することを特徴とする高透明性光触媒膜。 Content of hydrolysis condensate of titanium alkoxide provided by applying a coating agent containing a complex formed by hydrolysis and condensation of titanium alkoxide and organic polymer compound only once on an organic base material Is a photocatalytic film obtained by exposing the surface of an amorphous titanium oxide film whose surface continuously changes in the depth direction from the surface to a temperature of 100 ° C. or less in the presence of water vapor, In addition to the particles, (a) metal oxide particles A having an average particle size of less than 40 nm and (b) metal oxide particles B having an average particle size of 40 nm or more and less than 90 nm or metal oxide particles C having an average particle size of 90 nm or more and less than 150 nm Or a metal oxide particle D having an average particle size of 150 nm or more and less than 200 nm, and the mixing ratio thereof is expressed by the following relational expressions (1) to (3) on a mass basis.
80/20 ≦ A / B ≦ 45/55 (1)
97/3 ≦ A / C ≦ 70/30 (2)
97/3 ≦ A / D ≦ 88/12 (3)
And a highly transparent photocatalyst film characterized by having irregularities on the surface.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008291441A JP2010116504A (en) | 2008-11-13 | 2008-11-13 | Highly transparent photocatalytic membrane and article including the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008291441A JP2010116504A (en) | 2008-11-13 | 2008-11-13 | Highly transparent photocatalytic membrane and article including the same |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2010116504A true JP2010116504A (en) | 2010-05-27 |
Family
ID=42304354
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008291441A Pending JP2010116504A (en) | 2008-11-13 | 2008-11-13 | Highly transparent photocatalytic membrane and article including the same |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2010116504A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010115874A (en) * | 2008-11-13 | 2010-05-27 | Ube Nitto Kasei Co Ltd | Window pane outer coating film |
CN116875088A (en) * | 2023-07-03 | 2023-10-13 | 武汉理工大学 | Silicon-titanium composite super-hydrophilic coating with photocatalytic activity induced at low temperature and preparation thereof |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1071337A (en) * | 1996-08-29 | 1998-03-17 | Bridgestone Corp | Photocatalyst and its production |
WO2000053689A1 (en) * | 1999-03-09 | 2000-09-14 | Toto Ltd. | Hydrophilic member, method for preparation thereof, and coating agent and apparatus for preparation thereof |
JP2005334714A (en) * | 2004-05-25 | 2005-12-08 | Ube Nitto Kasei Co Ltd | Compound gradient coating film, self-gradient coating liquid and application of the liquid |
-
2008
- 2008-11-13 JP JP2008291441A patent/JP2010116504A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1071337A (en) * | 1996-08-29 | 1998-03-17 | Bridgestone Corp | Photocatalyst and its production |
WO2000053689A1 (en) * | 1999-03-09 | 2000-09-14 | Toto Ltd. | Hydrophilic member, method for preparation thereof, and coating agent and apparatus for preparation thereof |
JP2005334714A (en) * | 2004-05-25 | 2005-12-08 | Ube Nitto Kasei Co Ltd | Compound gradient coating film, self-gradient coating liquid and application of the liquid |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010115874A (en) * | 2008-11-13 | 2010-05-27 | Ube Nitto Kasei Co Ltd | Window pane outer coating film |
CN116875088A (en) * | 2023-07-03 | 2023-10-13 | 武汉理工大学 | Silicon-titanium composite super-hydrophilic coating with photocatalytic activity induced at low temperature and preparation thereof |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5511159B2 (en) | Photocatalyst film, method for producing photocatalyst film, article and method for hydrophilization | |
JP3897938B2 (en) | Organic-inorganic composite gradient material, its production method and its use | |
JP3136612B2 (en) | Antifouling member and antifouling coating composition | |
JPWO2004096935A1 (en) | Photocatalyst coating liquid, photocatalyst film and photocatalyst member | |
US7449245B2 (en) | Substrates comprising a photocatalytic TiO2 layer | |
US7488524B2 (en) | High-durability photocatalyst film and structure having photocatalytic functions on surface | |
JP2002346393A (en) | Photocatalyst and method for manufacturing the same | |
JP4879839B2 (en) | Photocatalyst layer forming composition | |
JP4869578B2 (en) | Film forming coating composition for snow sliding, snow coating film and snow sliding member | |
Syafiq et al. | Development of self-cleaning polydimethylsiloxane/nano-calcium carbonate-titanium dioxide coating with fog-resistance response for building glass | |
JP2010116504A (en) | Highly transparent photocatalytic membrane and article including the same | |
JP4884646B2 (en) | Adhesive layer forming composition and photocatalyst carrying structure | |
JP5097682B2 (en) | Photocatalyst film and article having the same | |
JP2002361807A (en) | Antistaining polycarbonate sheet | |
JP2005131552A (en) | Transparent photocatalyst layer formation composition and use thereof | |
JP2010115608A (en) | Photocatalyst film and article having the same | |
JP2010115607A (en) | High-transparency photocatalytic film and article having the same | |
JP4108405B2 (en) | Photocatalyst laminate | |
JP2005336334A (en) | Coating composition for forming amorphous titanium oxide composite coating film, coating film produced by using the same and use thereof | |
JP4118060B2 (en) | Photocatalytic film | |
JP2003327782A (en) | Silicon resin composition and process for forming inorganic porous thin film | |
WO2005113142A1 (en) | Photocatalytically active thin film | |
JP2005336420A (en) | Coating film having durability in sliding, liquid coating material and laminate | |
JP2011068900A (en) | Coating composition for forming amorphous titanium oxide composite coating film, coating film produced by using the same and use thereof | |
WO2020129456A1 (en) | Photocatalyst composite material, signage display protection member, touch panel protection member, solar cell protection member, sensor cover protection member, signage display, touch panel, solar cell, and sensor cover |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20110802 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20130122 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20130917 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20131114 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20131203 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20140417 |