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JP2010153933A5 - - Google Patents

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Publication number
JP2010153933A5
JP2010153933A5 JP2010087346A JP2010087346A JP2010153933A5 JP 2010153933 A5 JP2010153933 A5 JP 2010153933A5 JP 2010087346 A JP2010087346 A JP 2010087346A JP 2010087346 A JP2010087346 A JP 2010087346A JP 2010153933 A5 JP2010153933 A5 JP 2010153933A5
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Japan
Prior art keywords
optical system
projection optical
ultraviolet light
light
exposure apparatus
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JP2010087346A
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JP2010153933A (en
JP4985812B2 (en
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Priority to JP2010087346A priority Critical patent/JP4985812B2/en
Priority claimed from JP2010087346A external-priority patent/JP4985812B2/en
Publication of JP2010153933A publication Critical patent/JP2010153933A/en
Publication of JP2010153933A5 publication Critical patent/JP2010153933A5/ja
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Claims (17)

投影光学系の像面側に配置された基板に対して前記投影光学系と液体とを介して前記基板を露光する露光装置であって、
前記投影光学系下に液体を供給する液体供給部材と、
前記投影光学系の像面側に配置され、光が照射される計測部材と、
前記計測部材に対して紫外光を照射して前記計測部材を光洗浄する紫外光照射装置と、を備えることを特徴とする露光装置。 An exposure apparatus that exposes the substrate to the substrate disposed on the image plane side of the projection optical system via the projection optical system and the liquid,
A liquid supply member for supplying a liquid under the projection optical system;
A measuring member disposed on the image plane side of the projection optical system and irradiated with light; and
An exposure apparatus comprising: an ultraviolet light irradiation device that irradiates the measurement member with ultraviolet light to optically wash the measurement member. 前記計測部材は、照射された前記紫外光により前記液体に対して親液性となることを特徴とする請求項１に記載の露光装置。   The exposure apparatus according to claim 1, wherein the measurement member becomes lyophilic with respect to the liquid by the irradiated ultraviolet light. 前記計測部材は、光透過部を有する光学部材と、前記光学部材を介して前記投影光学系を通過した光を受光する受光器とを含み、
前記紫外光照射装置からの前記紫外光は、前記光学部材の液体接触面に照射されることを特徴とする請求項１又は２に記載の露光装置。 The measurement member includes an optical member having a light transmission part, and a light receiver that receives light that has passed through the projection optical system via the optical member,
3. The exposure apparatus according to claim 1, wherein the ultraviolet light from the ultraviolet light irradiation device is applied to a liquid contact surface of the optical member. 前記光透過部を含む領域が前記紫外光により親液化され、その周囲を囲む領域が撥液化されていることを特徴とする請求項３記載の露光装置。   4. The exposure apparatus according to claim 3, wherein the region including the light transmission part is made lyophilic by the ultraviolet light, and the region surrounding the region is made lyophobic. 前記投影光学系の液体接触面に前記紫外線照射装置からの前記紫外光が照射されることを特徴とする請求項１〜４のいずれか一項に記載の露光装置。   The exposure apparatus according to claim 1, wherein the ultraviolet light from the ultraviolet irradiation apparatus is irradiated on a liquid contact surface of the projection optical system. 前記紫外光照射装置は前記紫外光の照射を定期的に行うことを特徴とする請求項１〜５のいずれか一項に記載の露光装置。   The exposure apparatus according to claim 1, wherein the ultraviolet light irradiation apparatus periodically performs the irradiation with the ultraviolet light. 前記計測部材は、前記投影光学系の結像特性の計測を行なうことを特徴とする請求項１〜６のいずれか一項に記載の露光装置。   The exposure apparatus according to claim 1, wherein the measurement member measures an imaging characteristic of the projection optical system. 前記光を射出する露光用光源を有し、前記紫外光照射装置は前記露光用光源と兼用されていることを特徴とする請求項請求項１〜７のいずれか一項に記載の露光装置。   The exposure apparatus according to claim 1, further comprising an exposure light source that emits the light, wherein the ultraviolet light irradiation device is also used as the exposure light source. 前記投影光学系を介して、該投影光学系下に供給された液体中の気泡を検出する気泡検出装置をさらに備えたことを特徴とする請求項１〜８のいずれか一項記載の露光装置。   The exposure apparatus according to claim 1, further comprising: a bubble detection device that detects bubbles in the liquid supplied under the projection optical system via the projection optical system. . 投影光学系の像面側に配置された基板に対して前記投影光学系と液体とを介して前記基板を露光する露光方法であって、
前記投影光学系下に液体を供給し、
前記投影光学系の像面側に配置された計測部材に対して光を照射し、
前記計測部材による計測結果に基づいて前記基板を露光し、
前記計測部材に対して紫外線照射装置を用いて紫外光を照射して光洗浄することを含む露光方法。 An exposure method for exposing the substrate to the substrate disposed on the image plane side of the projection optical system via the projection optical system and the liquid,
Supplying liquid under the projection optical system;
Irradiating light to a measurement member arranged on the image plane side of the projection optical system,
Exposing the substrate based on the measurement result by the measurement member,
An exposure method comprising irradiating the measurement member with ultraviolet light using an ultraviolet irradiation device to perform optical cleaning. 前記計測部材は、照射された前記紫外光により前記液体に対して親液性となることを特徴とする請求項１０に記載の露光方法。   The exposure method according to claim 10, wherein the measurement member becomes lyophilic with respect to the liquid by the irradiated ultraviolet light. 前記計測部材は、光透過部を有する光学部材と、前記光学部材を介して前記投影光学系を通過した光を受光する受光器とを備え、
前記紫外光は、前記光学部材の液体接触面に照射されることを特徴とする請求項１０又は１１に記載の露光方法。 The measurement member includes an optical member having a light transmission part, and a light receiver that receives light that has passed through the projection optical system via the optical member,
The exposure method according to claim 10 or 11, wherein the ultraviolet light is applied to a liquid contact surface of the optical member. 前記光透過部を含む領域が前記紫外光により親液化され、その周囲を囲む領域が撥液化されていることを特徴とする請求項１２に記載の露光方法。   13. The exposure method according to claim 12, wherein a region including the light transmission part is made lyophilic by the ultraviolet light, and a region surrounding the periphery is made lyophobic. 前記投影光学系の液体接触面に前記紫外線照射装置からの前記紫外光が照射されることを特徴とする請求項１０〜１３のいずれか一項に記載の露光方法。   The exposure method according to any one of claims 10 to 13, wherein the liquid contact surface of the projection optical system is irradiated with the ultraviolet light from the ultraviolet irradiation device. 前記紫外光の照射を定期的に行うことを特徴とする請求項１０〜１４のいずれか一項に記載の露光方法。   The exposure method according to claim 10, wherein the irradiation with the ultraviolet light is periodically performed. 前記計測部材は、前記投影光学系の結像特性の計測を行なうことを特徴とする請求項１０〜１５のいずれか一項に記載の露光方法。   The exposure method according to claim 10, wherein the measurement member measures an imaging characteristic of the projection optical system. 請求項１〜請求項９のいずれか一項記載の露光装置を用いてデバイスを製造することを特徴とするデバイス製造方法。   A device manufacturing method using the exposure apparatus according to claim 1 to manufacture a device.
JP2010087346A 2010-04-05 2010-04-05 Exposure apparatus and device manufacturing method Expired - Fee Related JP4985812B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2010087346A JP4985812B2 (en) 2010-04-05 2010-04-05 Exposure apparatus and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010087346A JP4985812B2 (en) 2010-04-05 2010-04-05 Exposure apparatus and device manufacturing method

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2003344940A Division JP4513299B2 (en) 2003-10-02 2003-10-02 Exposure apparatus, exposure method, and device manufacturing method

Publications (3)

Publication Number Publication Date
JP2010153933A JP2010153933A (en) 2010-07-08
JP2010153933A5 true JP2010153933A5 (en) 2011-08-04
JP4985812B2 JP4985812B2 (en) 2012-07-25

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JP2010087346A Expired - Fee Related JP4985812B2 (en) 2010-04-05 2010-04-05 Exposure apparatus and device manufacturing method

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020162337A (en) * 2019-03-27 2020-10-01 株式会社カネカ Inspection device and inspection method

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06124873A (en) * 1992-10-09 1994-05-06 Canon Inc Liquid-soaking type projection exposure apparatus
JP2753930B2 (en) * 1992-11-27 1998-05-20 キヤノン株式会社 Immersion type projection exposure equipment
JP3747566B2 (en) * 1997-04-23 2006-02-22 株式会社ニコン Immersion exposure equipment
JPH11176727A (en) * 1997-12-11 1999-07-02 Nikon Corp Projection aligner

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