JP2009134263A - Photosensitive resin composition, partition for ink jet and its forming method, color filter and its manufacturing method, and display device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To maintain a high flatness of the wall surface in the case of contact with a colored liquid composition containing an organic solvent after forming (curing) a partition. <P>SOLUTION: The photosensitive resin composition used for formation of a partition for ink jet for forming a colored area by applying a colored liquid composition containing an organic solvent by an ink jet process contains at least a color material, a binder polymer, a monomer and a polymerization initiator. The I/O value of the binder polymer is 0.58 or more, and it satisfies formula (1): I/O value (b)×(M/B)≥0.49, wherein I/O value (b) is the I/O value of the binder polymer, M is the mass of the monomer in the photosensitive resin layer, and B is the mass of the binder polymer in the photosensitive resin layer. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a photosensitive resin composition, an inkjet partition and a method for forming the same, a color filter and a method for manufacturing the same, and a display device.

  In recent years, with the development of personal computers and large-screen liquid crystal televisions, the demand for liquid crystal displays, particularly color liquid crystal displays, has been increasing. However, since a color liquid crystal display is expensive, there is a high demand for cost reduction for a color filter having a high specific gravity in particular.

  Such a color filter usually includes coloring patterns of three primary colors of red (R), green (G), and blue (B), and the electrodes corresponding to the respective pixels of R, G, and B are turned on, By turning it off, the liquid crystal operates as a shutter, and light passes through each pixel of R, G, and B, and color display is performed.

As a conventional method for producing a color filter, for example, a dyeing method, an electrodeposition method, a method in which a pigment is dispersed in a thermosetting resin, R, G, and B are printed three times, and then the resin is thermoset. It has been known.
For example, in the dyeing method, first, a water-soluble polymer material, which is a dyeing material, is formed on a glass substrate, patterned into a desired shape by a photolithography process, and then the obtained pattern is immersed in a dyeing bath. To get a colored pattern. By repeating this three times, R, G, and B colored pixels (color filters) can be formed.

  Another method other than the above is a pigment dispersion method. In the pigment dispersion method, a photosensitive resin layer in which a pigment is dispersed is first formed on a substrate, and a monochromatic pattern is obtained by patterning the photosensitive resin layer. Further, by repeating this process three times, R, G, and B colored pixels (color filters) can be formed.

  When producing a color filter by the method such as the pigment dispersion method, it is necessary to repeat the same process a plurality of times in accordance with the number of hues such as R, G, and B. Therefore, there is a problem in that the yield is reduced due to the cost and the repetition of the same process. As one of the methods for solving these problems, a method of forming colored pixels by spraying colored ink using an ink jet method has been proposed (for example, see Patent Documents 1 and 2). When forming colored pixels using an inkjet method, a wall (for example, a wall material having a light shielding function such as a so-called black matrix) that partitions an area where pixels of each color are to be formed is formed in advance. Pixels can be formed by discharging colored ink into a concave region surrounded by a black matrix.

On the other hand, a pattern forming material containing a binder having both an I / O value and an acid value in a predetermined range is disclosed (for example, see Patent Document 3). Here, it is said that the resolution, tent property, developability, and peelability are improved when both the I / O value and the acid value are within a certain numerical range.
JP 59-75205 A Japanese Patent Application Laid-Open No. 2004-339332 JP 2006-154556 A

  However, for example, by providing a black matrix, the substrate is partitioned into a plurality of concave regions, and for example, red (R), green (G), and blue (B) ink is colored in each partitioned region. When applying the ink-jet method to form a colored portion, the solvent in the deposited ink is easily sucked into the black matrix, and the monomer, binder component, and the like in the ink may be sucked together with the solvent. As a result, there is a problem that the surface of the black matrix swells and the surface becomes rough.

  For this surface roughness, it is not sufficient to select a predetermined binder as in the case of the pattern forming material, and it is necessary to consider the relationship with the contacting ink.

  The present invention has been made in view of the above, and is used for the formation of partition walls, and can be used to form a partition wall (after curing), and can maintain high flatness of the wall surface when contacted with a colored liquid composition containing an organic solvent. Ink-jet partition that can maintain high flatness of the wall surface when contacted with a colored liquid composition containing an organic resin composition and an organic solvent, and a method for forming the same, color mixing is prevented, color characteristics are good, and display characteristics are excellent It aims at providing a color filter, its manufacturing method, and a display apparatus, and makes it a subject to achieve this objective.

Specific means for achieving the above object are as follows.
<1> A photosensitive resin composition used for forming an inkjet partition for forming a colored region by applying a colored liquid composition containing an organic solvent by an inkjet method, and at least a coloring material and a binder polymer , A monomer, and a polymerization initiator, and at least one of the binder polymers is a photosensitive resin composition having an I / O value of 0.58 or more and satisfying the following formula (1).
I / O value (b) × (M / B) ≧ 0.49 (1)
[I / O value (b): I / O value of binder polymer, M: mass of monomer in photosensitive resin layer, B: mass of binder polymer in photosensitive resin layer]

  <2> A method for forming a partition for an inkjet for forming a colored region by applying a colored liquid composition containing an organic solvent by an inkjet method, wherein the photosensitive resin composition according to <1> is used. Forming a photosensitive resin layer, exposing the formed photosensitive resin layer in a pattern, and developing to form a partition wall.

  <3> An inkjet partition for forming a colored region by applying a colored liquid composition containing an organic solvent by an inkjet method, and formed using the photosensitive resin composition according to <1>. Inkjet partition walls.

  <4> A partition wall forming step of forming a photosensitive resin layer using the photosensitive resin composition according to <1>, exposing the formed photosensitive resin layer in a pattern, and developing to form a partition wall. And a colored region forming step of forming a colored region by applying a colored liquid composition containing an organic solvent between the formed partition walls by an inkjet method.

  <5> The method for producing a color filter according to <4>, wherein at least one of the organic solvents in the colored liquid composition has an I / O value of 0.40 to 0.80. .

  <6> A color filter produced by the method for producing a color filter according to <4> or <5>.

  <7> A display device comprising the color filter according to <6>.

According to the present invention, there is provided a photosensitive resin composition that can be used for forming partition walls and can maintain high planarity of a wall surface when contacted with a colored liquid composition containing an organic solvent after partition wall formation (after curing). be able to. Also,
According to the present invention, an inkjet partition that can maintain high flatness of the wall surface when in contact with a colored liquid composition containing an organic solvent, a method for forming the partition, and color mixing is prevented, color characteristics are good, and display characteristics are achieved. A color filter excellent in the above, a manufacturing method thereof, and a display device can be provided.

  Hereinafter, the photosensitive resin composition of the present invention, the inkjet partition using the same, the forming method thereof, the color filter, the manufacturing method thereof, and the display device will be described in detail.

<Photosensitive resin composition>
The photosensitive resin composition of the present invention is a colored liquid composition (so-called “so-called colored liquid composition”) containing an organic solvent in a region formed in a concave shape on the permanent support, which is partitioned by a partition wall previously provided on the permanent support. Ink; hereinafter simply referred to as “ink” is applied by ejecting droplets by an inkjet method to form the colored region (hereinafter referred to as “ink-jet partition wall” or simply “partition wall”). .) Is a photocurable composition.

  The photosensitive resin composition of the present invention includes at least a colorant, a binder polymer having an I / O value of 0.58 or more, a monomer, and a polymerization initiator, and further satisfies the following formula (1). It is composed. Moreover, the photosensitive resin composition of this invention may contain the other component as needed.

In the photosensitive resin composition of this invention, the binder polymer and monomer which are structural components satisfy | fill following numerical formula (1). In the present invention, the ratio of the contained monomer to the binder polymer is increased to increase the crosslink density, and at the same time, the film properties are improved by increasing the crosslink density by imparting oleophobicity to the binder polymer itself. Since the ink resistance of the partition wall is further increased, the effect of suppressing the surface roughness of the partition wall when ink droplets are applied by the ink jet method can be improved.
I / O value (b) × (M / B) ≧ 0.49 (1)
In Formula (1), the I / O value (b) represents the I / O value of the binder polymer. M represents the mass of the monomer in the photosensitive resin layer, B represents the mass of the binder polymer in the photosensitive resin layer, and M / B represents the mass of the monomer and binder polymer in the photosensitive resin layer. Represents the ratio.
By satisfying the above formula (1), a surface-smooth color filter is formed particularly when a colored region is formed by applying ink to a concave region formed by providing a partition having a light blocking function such as a black matrix. Obtainable.

When the left side [I / O value (b) × (M / B)] of the formula (1) is less than 0.49, the crosslinking effect is small, or the effect that the binder can be obtained by crosslinking even if the crosslinking density is high. When the partition walls provided in advance come into contact with the ink, for example, by reducing the organic solvent, for example, a monomer, a binder component, or the like in the ink soaks into the partition walls, it is impossible to prevent the wall surfaces of the partition walls from being roughened.
The left side of the formula (1) [I / O value (b) × (M / B)] is preferably 0.52 or more and more preferably 0.55 or more in terms of ink resistance.

  In the present invention, the above formula (1) is satisfied when the I / O value of the binder polymer in the photosensitive resin composition is 0.58 or more, but preferably a colored liquid composition containing an organic solvent. From the viewpoint of enhancing the effect of preventing the occurrence of surface roughness of the partition walls when in contact with an object, the binder polymer has an I / O value of 0.58 or more, and the mass of the monomer in the photosensitive resin layer is the total solid content ( The mass of the binder polymer in the photosensitive resin layer is within the range of 20 to 40 [mass%] (preferably within the range of 25 to 35 [mass%]) and / or the total solid content (mass). ) In the range of 10 to 40 [mass%] (preferably in the range of 20 to 35 [mass%]).

Here, the mass of the monomer in the photosensitive resin layer represented by M and the mass of the binder polymer in the photosensitive resin layer represented by B represent solid masses, respectively.
In addition, the I / O value (b) is a value that treats the polarity of various organic compounds, also called inorganic values / organic values, in an organic concept, and contributes functional groups that set parameters to each functional group. One of the laws.

Regarding the I / O value, an organic conceptual diagram (Yoshio Koda, Sankyo Publishing (1984)); KUMAMOTO PHARMACEUTICAL BULLETIN, No. 1, No. 1-16 (1954); 10, 719-725 (1957); Fragrance Journal, 34, 97-111 (1979); Fragrance Journal, 50, 79-82 (1981); There is a detailed explanation.
The concept of the I / O value is that the properties of a compound are divided into an organic group that represents covalent bonding and an inorganic group that represents ionic bonding, and all organic compounds are orthogonal coordinates named organic axes and inorganic axes. Each of the above points is shown.

The inorganic value is obtained by quantifying the magnitude of the influence on the boiling point of various substituents and bonds of an organic compound, based on the hydroxyl group. Specifically, when the distance between the boiling point curve of a straight chain alcohol and the boiling point curve of a straight chain paraffin is about 100 ° C., the influence of one hydroxyl group is set to 100 as a numerical value. A value obtained by quantifying the influence of various substituents or various bonds on the boiling point based on this numerical value is the inorganic value of the substituent that the organic compound has. For example, the inorganic value of the —COOH group is 150, and the inorganic value of the double bond is 2. Therefore, the inorganic value of a certain kind of organic compound means the sum of inorganic values such as various substituents and bonds of the compound.
The organic value is determined based on the influence of the methylene group in the molecule as a unit and the boiling point of the carbon atom representing the methylene group. That is, since the average value of the boiling point increase due to the addition of one carbon in the vicinity of 5 to 10 carbon atoms of the linear saturated hydrocarbon compound is 20 ° C., the organic value of one carbon atom is set to 20 on the basis of this. A value obtained by quantifying the influence on the boiling point of various substituents and bonds based on this is the organic value. For example, the organic value of a nitro group (—NO ₂ ) is 70.
An I / O value closer to 0 indicates a non-polar (hydrophobic or organic) organic compound, and a larger value indicates a polar (hydrophilic or inorganic) organic compound. Indicates.

Hereinafter, an example of a method for calculating the I / O value will be described.
The I / O value of a methacrylic acid / methyl methacrylate / styrene copolymer (copolymerization ratio (molar ratio): 2/5/3) is determined by the following method according to the inorganic and organic values of the copolymer. Can be calculated from the following formula.
I / O value = (inorganic value of copolymer) / (organic value of copolymer)

  The inorganic value of the copolymer is (inorganic value of methacrylic acid) × (molar ratio of methacrylic acid), (inorganic value of methyl methacrylate) × (molar ratio of methyl methacrylate), and (styrene) (Inorganic value) × (molar ratio of styrene).

Since methacrylic acid has one carboxyl group, methyl methacrylate has one ester group, and styrene has one aromatic ring, the inorganic value of methacrylic acid is 150 (inorganic value of carboxyl group). ) × 1 (number of carboxyl groups) = 150, the inorganic value of the methyl methacrylate is 60 (inorganic value of the ester group) × 1 (number of ester groups) = 60, and the inorganic value of the styrene is 15 (inorganic value of aromatic ring) × 1 (number of aromatic rings) = 15.
Therefore, the inorganic value of the copolymer is 645 from 150 × 2 (molar ratio of methacrylic acid) + 60 × 5 (molar ratio of methyl methacrylate) + 15 × 3 (molar ratio of styrene).

  The organic value of the copolymer is (organic value of methacrylic acid) × (molar ratio of methacrylic acid), (organic value of methyl methacrylate) × (molar ratio of methyl methacrylate), and (styrene) Of the organic value) x (molar ratio of styrene).

Since methacrylic acid has 4 carbon atoms, methyl methacrylate has 5 carbon atoms and styrene has 8 carbon atoms, the organic value of methacrylic acid is 20 (organic value of carbon atoms) ) × 4 (number of carbon atoms) = 80, the organic value of methyl methacrylate is 20 (organic value of carbon atom) × 5 (number of carbon atoms) = 100, and the organic value of styrene is 20 ( Organic value of carbon atoms) × 8 (number of carbon atoms) = 160.
Therefore, the organic value of the copolymer is 1140 from 80 × 2 (molar ratio of methacrylic acid) + 100 × 5 (molar ratio of methyl methacrylate) + 160 × 3 (molar ratio of styrene).

  From the above, the I / O value of the methacrylic acid / methyl methacrylate / styrene copolymer is 645 (inorganic value of the copolymer) / 1140 (organic value of the copolymer) = 0.566. is there.

  When the photosensitive resin composition contains two or more binder polymers, the I / O value (b) indicates the I / O value of the binder polymer having the highest I / O value among the contained binder polymers. . The content of the binder polymer having the highest I / O value is preferably 30% by mass or more, more preferably 50% by mass or more, based on the total polymer.

Hereinafter, each component which comprises the photosensitive resin composition of this invention is demonstrated in detail.
-Color material-
As the color material, a known colorant (dye, pigment, etc.) having a hue according to the purpose such as red, blue, green, and black can be appropriately selected and used. Specifically, pigments and dyes described in JP-A-2005-17716 [0038] to [0054], pigments described in JP-A-2004-361447 [0068] to [0072], JP-A-2005 The colorants described in JP-A-17521 [0080] to [0088] can be preferably used.

  The photosensitive resin composition preferably has a light shielding function, and in this case, a black color material is suitably used as the color material. Among these, a pigment is preferable in terms of heat resistance and light resistance, and a black pigment is preferable when providing a light shielding function.

Examples of black pigments include carbonaceous black (carbon black, graphite, etc.), metal compounds (titanium black, etc.) and the like. As an example of carbon black, Pigment Black 7 (carbon black CI No. 77266) is preferable. Examples of titanium black include TiO ₂ , TiO, TiN, and mixtures thereof. Among these black pigments, carbon black is preferable in terms of excellent light shielding properties.

As content of the coloring material (preferably pigment) in the photosensitive resin composition, 10-50 mass% is preferable with respect to the total solid of the photosensitive resin composition. When the amount of the color material is within the above range, the strength of the partition when the partition (black matrix or the like) is formed can be sufficiently maintained.
The colorant is preferably a pigment content of 10 to 50% by mass, and more preferably 20 to 40% by mass in terms of light shielding properties and film strength.

  There are photosensitive resin compositions that can be developed with an alkaline aqueous solution and those that can be developed with an organic solvent. In view of safety and the cost of the developer, those capable of developing with an aqueous alkali solution are preferred. Further, the photosensitive resin composition is more preferably photosensitive and developable with an aqueous alkaline solution.

  The photosensitive resin composition of the present invention is preferably a resin composition that has photosensitivity and can be developed with an aqueous alkaline solution. For example, photopolymerizability including an alkali-soluble binder polymer having an acid group such as a carboxylic acid group as a main component other than a colorant, a polymerizable or crosslinkable compound such as a polyfunctional acrylic monomer, and a photopolymerization initiator. The composition is preferably exemplified, and when exposed to light, an initiator such as a radical is generated from the photopolymerization initiator, causing polymerization or crosslinking of the polymerizable or crosslinkable compound, causing the crosslinking reaction to proceed, and curing the exposed area. Have.

Hereinafter, the binder polymer, the monomer, and the polymerization initiator will be described.
-Binder polymer-
The photosensitive resin composition of the present invention contains at least one binder polymer having an I / O value of 0.58 or more. Details of the I / O value are as described above. When the I / O value of the binder polymer is less than 0.58, the inorganicity becomes low, the compatibility with the ink becomes high, and the occurrence of roughness on the partition wall surface when coming into contact with the colored liquid composition (ink) is suppressed. The effect is impaired. The upper limit of the I / O value of the binder polymer is desirably 0.8, and the I / O value is preferably 0.57 to 0.70, more preferably 0.58 to 0.69.

  Specific examples of the binder polymer having an I / O value of 0.58 or more include, for example, (meth) acrylic acid / benzyl methacrylate / methyl (meth) acrylate copolymer, (meth) acrylic acid / benzyl methacrylate / methyl (meta ) Acrylate / ethyl (meth) acrylate copolymer, (meth) acrylic acid / benzyl methacrylate / methyl (meth) acrylate / butyl (meth) acrylate copolymer, (meth) acrylic acid / benzyl methacrylate / methyl (meth) acrylate / Syrohexyl (meth) acrylate copolymer, (meth) acrylic acid / benzyl methacrylate / methyl (meth) acrylate / isobonyl (meth) acrylate copolymer, (meth) acrylic acid / benzyl methacrylate / methyl (meth) acrylate / s Ren copolymer, and the like.

  In addition, the binder polymer is preferably a water-soluble or alkali-soluble polymer from the viewpoint of pattern formation by exposure and development, and the alkali-soluble binder polymer having the acid group (such as a carboxylic acid group) is preferable. As the binder polymer having an acid group, for example, a copolymer of an unsaturated organic acid compound such as acrylic acid or methacrylic acid and an unsaturated organic acid ester compound such as methyl acrylate, ethyl acrylate or benzyl methacrylate is suitable. .

  Among the above, binder polymers more suitable for constituting the photosensitive resin layer are (meth) acrylic acid / benzyl methacrylate / methyl (meth) acrylate copolymer, (meth) acrylic acid / benzyl methacrylate / methyl (meth). Acrylate / ethyl (meth) acrylate copolymer, and the like.

  About the weight average molecular weight (Mw) of a binder polymer, the range of 10000-50000 is preferable, More preferably, it is the range of 15000-40000. When the Mw is within the above range, ink resistance and developability are good.

  The content of the binder polymer in the photosensitive resin composition is preferably 10 to 40% by mass, preferably 20 to 35% by mass, based on the total solid content of the photosensitive resin composition in terms of ink resistance and developability. Is more preferable.

-Monomer-
The monomer constituting the photosensitive resin composition in the present invention can be selected from compounds that undergo polymerization or cross-linking curing under the action of an active species from the polymerization initiator described later. Compounds are preferred.
A polyfunctional acrylic monomer is suitable as the polymerizable or crosslinkable compound. Examples of the polyfunctional acrylic monomer include ethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, 1,3-butanediol di (meth) acrylate, tetramethylene glycol di (meth) acrylate, and propylene glycol di (Meth) acrylates such as (meth) acrylate, trimethylolpropane tri (meth) acrylate, 1,4-hexanediol di (meth) acrylate, pentaerythritol tetra (meth) acrylate and dipentaerythritol hexa (meth) acrylate Preferably mentioned.

  The content of the monomer in the photosensitive resin composition is 20 to 40% by mass with respect to the amount (mass) of the binder polymer in that ink resistance and chip defects after development can be prevented as much as possible. The range of 25 to 35% by mass is more preferable.

-Polymerization initiator-
As a polymerization initiator which comprises the photosensitive resin composition in this invention, it can select suitably from well-known polymerization initiators. Among these, a photopolymerization initiator is preferable, and for example, a halomethyl oxadiazole compound, a halomethyl-s-triazine compound, and the like can be preferably exemplified.

As content of the polymerization initiator in the photosensitive resin composition, 1-20 mass% is preferable with respect to the total solid of the photosensitive resin composition. When the amount of the polymerization initiator is within the above range, good curability can be obtained.
As for content of a polymerization initiator, 0.5-5.0 mass% is more preferable with respect to the total solid of the photosensitive resin composition.

<Ink-jet partition and method for forming the same>
The inkjet partition of the present invention forms a photosensitive resin layer using the photosensitive resin composition of the present invention (layer forming step), and exposes and develops the formed photosensitive resin layer in a pattern ( Hereinafter, it is also referred to as a “patterning step”). In the inkjet partition of the present invention and the method for producing the same, since the above-described photosensitive resin composition of the present invention is used, even when it comes into contact with a colored liquid composition containing an organic solvent, the occurrence of roughening of the wall surface is caused. The partition which can suppress and maintain high planarity is obtained.
Further, after the exposure and development in the patterning step, other steps such as a post-exposure step and a post-bake step may be provided as necessary.

  The partition wall of the present invention and the method for forming the partition wall are an inkjet partition wall and a method for forming the partition wall used when a colored liquid composition (so-called ink) containing an organic solvent is applied by an inkjet method to form a colored region. When using a colored liquid composition (ink) containing an organic solvent, which will be described later, it is possible to suppress the occurrence of roughness of the partition walls.

  As a method for forming a photosensitive resin layer on a permanent support, (a) a coating method for applying a photosensitive resin composition, and (b) a photosensitive transfer material having a photosensitive resin layer, heating and / or Alternatively, a transfer method in which the photosensitive resin layer is laminated and transferred by pressurization is preferable.

(A) Application method The photosensitive resin composition is applied by a known application method such as spin coating, curtain coating, slit coating, dip coating, air knife coating, roller coating, or wire bar coating. , Gravure coating, or extrusion coating using a popper described in US Pat. No. 2,681,294. Among them, JP 2004-89851 A, JP 2004-17043 A, JP 2003-170098 A, JP 2003-164787 A, JP 2003-10767 A, JP 2002-79163 A, A method using a slit nozzle or a slit coater described in JP 2001-310147 A is suitable.

(B) Transfer method The transfer is performed by using a photosensitive transfer material, for example, a roller or flat plate in which a photosensitive resin layer formed in a film shape on a temporary support is heated and / or pressurized on a desired permanent support surface. Then, the photosensitive resin layer is transferred onto the permanent support by peeling off the temporary support. Specific examples include laminators and laminating methods described in JP-A-7-110575, JP-A-11-77942, JP-A-2000-334836, and JP-A-2002-148794. From the viewpoint, it is preferable to use the method described in JP-A-7-110575.

When the photosensitive resin layer is formed by a transfer method, a photosensitive transfer material having a photosensitive resin layer formed using the photosensitive resin composition of the present invention is used, and this photosensitive transfer material is used as the photosensitive resin layer. Can be carried out by providing a step (hereinafter also referred to as “transfer step”) of pressure-bonding to the permanent support so as to be in contact with the permanent support.
Preferably, the photosensitive transfer material is pressure-bonded to the permanent support so that the photosensitive resin layer is in contact with the permanent support, and at least the photosensitive resin layer after pressure bonding is exposed in a pattern and developed. It can be performed by providing a process (patterning process).

-Photosensitive transfer material-
The photosensitive transfer material can be constituted by providing at least a thermoplastic resin layer and a photosensitive resin layer in order from the temporary support side on the temporary support, and an intermediate layer or a protective film can be provided as necessary. You may have. Hereinafter, each layer such as a thermoplastic resin layer, a photosensitive resin layer, and an intermediate layer constituting the photosensitive transfer material will be described in detail.

-Thermoplastic resin layer-
The thermoplastic resin layer is preferably alkali-soluble from the viewpoint of enabling alkali development and preventing the transfer target from being contaminated by the thermoplastic resin layer protruding during transfer.
In addition, when transferring a photosensitive resin layer to be described later onto the transfer target, it has a function as a cushioning material that effectively prevents transfer defects caused by unevenness present on the transfer target, The layer is a deformable layer corresponding to the unevenness on the transferred material when the photosensitive transfer material is heated and adhered onto the transferred material.

  The thickness of the thermoplastic resin layer is preferably 2 to 50 μm from the viewpoint of transferability. When the layer thickness is within the above range, peeling from the temporary support during transfer can be carried out satisfactorily without damaging the peeled surface, and a fine pattern can be formed with exposure failure due to thickness variation. The layer thickness is more preferably 5 to 40 μm, particularly preferably 10 to 30 μm.

  The thermoplastic resin layer can be configured using at least a thermoplastic resin, and can be configured using other components as needed.

  The thermoplastic resin is not particularly limited and can be appropriately selected. For example, a saponified product of ethylene and an acrylic ester copolymer, a saponified product of styrene and a (meth) acrylic ester copolymer, vinyl toluene, Saponified products such as (meth) acrylic acid ester copolymers, saponified products such as poly (meth) acrylic acid esters, and (meth) acrylic acid ester copolymers of butyl (meth) acrylate and vinyl acetate, etc. It is preferable that it is at least one selected from more.

In addition to the above, organic polymers that are soluble in an alkaline aqueous solution according to the "Plastic Performance Handbook" (edited by the Japan Plastics Industry Federation, edited by the All Japan Plastics Molding Industry Association, published by the Industrial Research Council, published on October 25, 1968) Can also be used.
As the thermoplastic resin contained in the thermoplastic resin layer, those in which the substantial softening point of the thermoplastic resin layer is 80 ° C. or less are preferable.

These thermoplastic resins may be used individually by 1 type, and may use 2 or more types together. In view of sufficient cushioning properties and ease of removal after transfer, it is preferable to use a mixture of resins having two different characteristics (preferably polymer P ^H and polymer P ^L described later).
In the present invention, “(meth) acrylic acid” is a generic term for acrylic acid and methacrylic acid, and the same applies to derivatives thereof.

Among the thermoplastic resins contained in the thermoplastic resin layer, a resin having a weight average molecular weight in the range of 50,000 to 500,000 (Tg = 0 to 140 ° C.) is preferable, and a weight average molecular weight is more preferably 60,000. It is resin which is the range of -200,000 (Tg = 30-110 degreeC). Specific examples of these resins include JP-B-54-34327, JP-B-55-38961, JP-B-58-12777, JP-B-54-25957, JP-A-61-134756, JP-B-59-1444615. JP, 54-92723, JP 54-99418, JP 54-137085, JP 57-20732, JP 58-93046, JP 59-97135, JP 60-159743, JP 60-247638, JP 60-208748, JP 60-214354, JP 60-230135, JP 60-258539, JP JP 61-1669829, JP 61-213213, JP 63-147159, JP 63-213837, JP 63-266448, JP 64- No. 5551, JP-A-64-15550, JP-A-2-191955, JP-A-2-199403, JP-A-2-199404, JP-A-2-208602, JP-A-5-241340 Examples of the resin soluble in an alkaline aqueous solution.
Particularly preferred is a methacrylic acid / 2-ethylhexyl acrylate / benzyl methacrylate / methyl methacrylate copolymer described in JP-A-63-147159.

  Moreover, on the low molecular side among various thermoplastic resins, a resin having a weight average molecular weight of preferably 3,000 to 30,000 (Tg = 30 to 170 ° C.), more preferably a weight average molecular weight of 4,000. It is resin which is the range of -20,000 (Tg = 60-140 degreeC). Specific examples of these can be selected from those described in the above-mentioned publications. Particularly preferred are styrene / polyethylene compounds described in JP-B-55-38961 and JP-A-5-241340. It is a (meth) acrylic acid copolymer.

Furthermore, a resin having two characteristics that are different as described above, specifically, it is preferable to use a mixture of a high molecular weight polymer P ^H and a low molecular weight polymer P ^L. Here, the low molecular weight polymer is a polymer having a weight average molecular weight of 3,000 or more and less than 12,000, and the high molecular weight polymer is a polymer having a weight average molecular weight of 12,000 or more.
The preferred form in terms of the ease of removal after transfer with sufficient cushioning property, the weight-average molecular weight of ^{P L} and weight average molecular weight of less than 5000 or 10000 is used in combination with ^{P H} of less than 50,000 120000 As a preferred example, a mixture of methacrylic acid / 2-ethylhexyl acrylate / benzyl methacrylate / methyl methacrylate copolymer (P ^H ) and styrene / (meth) acrylic acid copolymer (P ^L ) is used. Is mentioned.

  In addition to the thermoplastic resin, the thermoplastic resin layer includes various polymers and supercooling within the range where the softening point does not substantially exceed 80 ° C. for the purpose of adjusting the adhesive force with the temporary support as an additional component. Substances, adhesion improvers, surfactants, release agents and the like can be added. Adjustment of Tg by these is also possible. In addition, an organic polymer compound having a softening point of 80 ° C. or higher can be made to have a substantial softening point of 80 ° C. or lower by adding various plasticizers compatible with the polymer substance to the organic polymer compound. It can also be lowered.

  Specific examples of preferred plasticizers include polypropylene glycol, polyethylene glycol, dioctyl phthalate, diheptyl phthalate, dibutyl phthalate, tricresyl phosphate, cresyl diphenyl phosphate, biphenyl diphenyl phosphate, polyethylene glycol mono (meth) acrylate, Polyethylene glycol di (meth) acrylate, polypropylene glycol mono (meth) acrylate, polypropylene glycol di (meth) acrylate, addition reaction product of epoxy resin and polyethylene glycol mono (meth) acrylate, organic diisocyanate and polyethylene glycol mono (meth) Addition reaction product with acrylate, organic diisocyanate and polypropylene glycol mono (meth) acrylate Addition reaction products of rate, phthalic acid diesters, may be mentioned condensation products of bisphenol A and polyethylene glycol mono (meth) acrylate.

  The combination of the thermoplastic resin and the plasticizer is preferably 1) methacrylic acid / 2-ethylhexyl acrylate / benzyl methacrylate / methyl methacrylate copolymer, styrene / (meth) acrylic acid copolymer, bisphenol A and Combination of condensation reaction products of polyethylene glycol mono (meth) acrylate, 2) Condensation reaction of methacrylic acid / benzyl methacrylate copolymer, styrene / (meth) acrylic acid copolymer, bisphenol A and polyethylene glycol mono (meth) acrylate Combination of products, 3) Combination of methacrylic acid / 2-ethylhexyl acrylate / benzyl methacrylate / methyl methacrylate copolymer, styrene / (meth) acrylic acid copolymer, phthalic acid diesters, 4) Meta Acrylic acid / benzyl methacrylate copolymer, a styrene / (meth) acrylic acid copolymer, a combination of phthalic acid diesters, and the like.

  The amount of the plasticizer in the thermoplastic resin layer is generally 200% by mass or less with respect to the thermoplastic resin, and the range of 20 to 100% by mass in that the softening of the thermoplastic resin layer can be easily controlled. Is preferred.

As the surfactant, any surfactant that can be mixed with a thermoplastic resin can be used.
As preferable surfactants, paragraphs [0015] to [0024] of JP-A No. 2003-337424, paragraphs [0012] to [0017] of JP-A No. 2003-177522, paragraph of JP-A No. 2003-177523, are disclosed. [0012] to [0015], paragraphs [0010] to [0013] of JP 2003-177521 A, paragraphs [0010] to [0013] of JP 2003-177519 A, and JP 2003-177520 A. The surfactants described in paragraphs [0012] to [0015], paragraphs [0034] to [0035] of JP-A No. 11-133600, and JP-A No. 6-16684 are preferable.

  In order to further improve the adhesion to the temporary support, a fluorosurfactant and / or a silicone surfactant (a fluorosurfactant or a silicone surfactant, both fluorine atoms and silicon atoms are added). It is preferable to contain any one of these, or two or more of these, and a fluorosurfactant is most preferable.

  Moreover, the following commercially available surfactant can also be used as it is. Examples of commercially available surfactants that can be used include F-top EF301 and EF303 (manufactured by Shin-Akita Kasei Co., Ltd.), Florard FC430 and 431 (manufactured by Sumitomo 3M Co., Ltd.), MegaFuck F-780-F, F171, Fluorosurfactants such as F173, F176, F189, R08 (Dainippon Ink Chemical Co., Ltd.), Surflon S-382, SC101, 102, 103, 104, 105, 106 (Asahi Glass Co., Ltd.), Or a silicone type surfactant can be mentioned. Polysiloxane polymers KP-341 (manufactured by Shin-Etsu Chemical Co., Ltd.) and Troisol S-366 (manufactured by Troy Chemical Co., Ltd.) can also be used as the silicone surfactant.

The melt viscosity (η _Cu ) at 100 ° C. of the thermoplastic resin layer is preferably 200 Pa · s to 3000 Pa · s, more preferably 200 Pa · s to 2000 Pa · s, and most preferably 500 Pa · s to 2000 Pa · s. is there.
When η _Cu is within the above range, it is effective in preventing the occurrence of chipping defects in the partition formed by the laminate, and also prevents the thermoplastic resin layer from protruding during transfer and the contamination of the laminate heat roll. Transfer can be carried out satisfactorily, ensuring followability with respect to irregularities on the permanent support, and good adhesion to the permanent support.

As a means for adjusting the melt viscosity η _Cu of the thermoplastic resin layer to the above range, there is a method of adjusting the content of the low molecular weight polymer and the content of the plasticizer in the polymer constituting the thermoplastic resin layer. is there. When the thermoplastic resin layer is softened and softened, it can be adjusted by methods such as (1) increasing the amount of plasticizer added, (2) increasing the content of low molecular weight polymers and decreasing the proportion of high molecular weight components. .

The content ratio of the high molecular weight polymer ^{P H} and a low molecular weight polymer ^{P L} in the polymer constituting the thermoplastic resin layer ^(P H / ^{P L),} is preferably less than 10/90 or 70/30, 12/88 The ratio is more preferably less than 60/40, and most preferably 15/85 or more and less than 50/50. When the content ratio is within the above range, it is effective for preventing the occurrence of chipping defects in the partition formed by the laminate, and it is possible to ensure the peelability and cushioning properties.

  As the addition amount in the case of adding a plasticizer, it is preferably 28 to 43 mass%, more preferably 30 to 40 mass%, based on the solid content of the resin component and the plasticizer contained in the thermoplastic resin layer, 32-38 mass% is particularly preferable. When the content of the plasticizer is within the above range, it is effective in reducing the viscosity of the thermoplastic resin layer to such an extent that it can prevent the occurrence of chipping defects in the partition walls formed by lamination and cushioning. It is possible to prevent the thermoplastic resin layer from protruding during transfer and contamination of the heat roll of the laminate due to this.

-Photosensitive resin layer-
The photosensitive resin layer is a curable layer for forming partition walls such as a black matrix, and may be formed using a composition for forming partition walls having a shielding function such as a black matrix constituting a color filter. it can.

  The photosensitive resin layer of the photosensitive transfer material includes a color material, a binder polymer, a monomer, and a polymerization initiator, and is configured to obtain a light shielding function when a partition wall is formed. Moreover, the photosensitive resin layer can be further comprised using a polymerization inhibitor, surfactant, etc. as needed. Specifically, the photosensitive resin layer in the present invention is configured using the above-described photosensitive resin composition of the present invention.

-Others-
Details of the temporary support, the intermediate layer, the protective film, and the production method of the transfer material constituting the photosensitive transfer material are described in paragraphs [0023] to [0066] of JP-A-2005-3861. Can be applied as suitable.

  It is preferable that the photosensitive transfer material is configured as an integral film, such as a photosensitive resin transfer material described in JP-A-5-72724. As an example of the structure of the integral film, a structure in which a temporary support / thermoplastic resin layer / intermediate layer / photosensitive resin layer / protective film are laminated in this order can be given.

  In the transfer process in the case of the transfer method, at least a photosensitive resin layer forming a partition wall is adhered to a permanent support under pressure (applied by a laminator or the like) to form a transfer. That is, the photosensitive transfer material is pressure-bonded to the permanent support so that the photosensitive resin layer is in contact with the permanent support, and the temporary support is peeled off if necessary, and then the photosensitive resin layer on the permanent support is formed in a desired pattern shape. The film can be suitably produced by exposing to light and further developing. The temporary support may be removed before exposure to a pattern after transfer, or may be removed after exposure to a pattern.

  As the transfer step, the method described in paragraph [0037] of JP-A-2006-23696 and the method of transferring using a laminator described in WO 2006-4225 are also suitable in the present invention.

  In the patterning step, the photosensitive resin layer is exposed in a pattern and developed. For the exposure and development performed in a pattern-like manner, the methods described in paragraph numbers [0038] to [0051] of JP-A-2006-23696 can be applied. Specifically, it is as follows.

The exposure can be performed using, for example, a proximity type exposure machine having an ultra-high pressure mercury lamp (for example, manufactured by Hitachi High-Tech Electronics Engineering Co., Ltd.), and the exposure amount may be appropriately selected (for example, 300 mJ / cm ² ). Examples of the light source used for exposure include medium to ultra high pressure mercury lamps, xenon lamps, metal halide lamps, and the like.
In the exposure step, for example, the removal surface after removal of the temporary support (for example, the surface of the thermoplastic resin layer in the case of a temporary support / thermoplastic resin layer / intermediate layer / photosensitive resin layer layer structure) and a desired surface An exposure mask (also referred to as a photomask; for example, a quartz exposure mask) is disposed so as to face each other, and the distance between the photomask surface and the photosensitive resin layer in a state where the permanent support and the photomask are vertically set up. Can be appropriately set (for example, 200 μm) and exposed.

After the exposure, a development process is performed, and the exposed photosensitive resin layer is developed using a predetermined developer. Subsequently, washing is performed as necessary to obtain a pattern image. Prior to development, pure water is preferably sprayed with a shower nozzle or the like to uniformly wet the surface of the photosensitive resin layer or the oxygen blocking layer.
As the developer used in the development process, a dilute aqueous solution of an alkaline substance is used. However, a solution obtained by adding a small amount of water and a miscible organic solvent may be used.

Examples of the alkaline substance include alkali metal hydroxides (for example, sodium hydroxide, potassium hydroxide), alkali metal carbonates (for example, sodium carbonate, potassium carbonate), alkali metal bicarbonates (for example, sodium bicarbonate, Potassium bicarbonate), alkali metal silicates (for example, sodium silicate, potassium silicate), alkali metal metasilicates (for example, sodium metasilicate, potassium metasilicate), triethanolamine, diethanolamine, monoethanolamine, morpholine Tetraalkylammonium hydroxides (for example, tetramethylammonium hydroxide), trisodium phosphate, and the like. The dilute aqueous solution of the alkaline substance preferably has an alkaline substance concentration of 0.01 to 30% by mass, and preferably has a pH of 8 to 14.
Examples of the “water-miscible organic solvent” include, for example, methanol, ethanol, 2-propanol, 1-propanol, butanol, diacetone alcohol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono n-butyl ether. Benzyl alcohol, acetone, methyl ethyl ketone, cyclohexanone, ε-caprolactone, γ-butyrolactone, dimethylformamide, dimethylacetamide, hexamethylphosphoramide, ethyl lactate, methyl lactate, ε-caprolactam, N-methylpyrrolidone and the like are preferable. . The concentration of the organic solvent miscible with water is preferably 0.1 to 30% by mass.
Furthermore, a known surfactant can be added, and the concentration of the surfactant is preferably 0.01 to 10% by mass.

After exposure and development, a post-exposure step and a post-bake step may be provided. For the steps such as post-exposure and post-bake, the methods described in paragraph numbers [0038] to [0051] of JP-A-2006-23696 can be applied.
Specifically, it is as follows.

As the light source used for the post-exposure, any light source capable of irradiating light in a wavelength region capable of curing the photosensitive resin layer (for example, 365 nm, 405 nm) can be appropriately selected and used. Specifically, an ultrahigh pressure mercury lamp, a high pressure mercury lamp, a metal halide lamp, etc. are mentioned. The exposure may be an exposure to compensate for the exposure, is usually in the 50 to 5000 mJ / cm ^2, preferably not 200~4000mJ / cm ^2, more preferably a 500~2000mJ / cm ^2.
The temperature at the time of post-baking is 150-280 degreeC normally, Preferably it is 180-250 degreeC. The heating time can be appropriately selected depending on the baking temperature. For example, when the baking temperature is 240 ° C., 10 to 120 minutes is preferable, and 30 to 90 minutes is more preferable.

  Since the partition for inkjet of this invention is formed using the photosensitive resin composition of this invention as stated above, it is the surface (permanent support body) which faces the wall surface of a partition pattern, especially a contact surface with the permanent support body of a partition. The occurrence of surface roughness is prevented, ink color mixing is effectively prevented when ink is applied by the ink jet method, and a color filter with good color characteristics, and thus a display device with excellent display characteristics. can get.

  The partition is not limited as long as it is obtained using the photosensitive resin composition of the present invention, but when a color filter is produced, a form having a light shielding function such as a black matrix is preferable.

  In addition, the partition walls may be subjected to ink repellent treatment in order to prevent color mixing of the applied inkjet ink. With respect to the ink repellent treatment, for example, (1) a method of kneading an ink repellent substance into the partition wall (for example, see JP-A-2005-36160), and (2) a method of newly providing an ink-repellent layer (for example, No. 5-241011), (3) a method of imparting ink repellency by plasma treatment (for example, see JP-A-2002-62420), and (4) a method of applying an ink-repellent material to the upper surface of the partition wall (see FIG. For example, see JP-A-10-123500), and in particular, (3) a method of imparting ink repellency to a partition formed on a permanent support by plasma treatment to make the partition repellent. preferable.

  The height of the partition walls is preferably 0.5 to 10 μm and more preferably 1.0 to 5.0 μm from the viewpoint of preventing color mixing.

The optical density of the partition walls is preferably 3 to 5 in that a partition wall having high light shielding properties (for example, a black matrix) can be formed.
The optical density of the partition walls is determined by using a spectrophotometer UV-2100 (manufactured by Shimadzu Corporation) to determine the transmission optical density (OD ¹ ) of the permanent support with partition walls on which the partition walls (for example, black matrix) are formed at a wavelength of 555 nm. in addition to measuring the transmission optical density (OD ⁰⁾ was measured in the same manner of the substrate (e.g., glass substrate) used for permanent support with the partition wall, transparent minus OD ⁰ from OD ¹ concentration OD ( = ^OD 1 -OD ⁰⁾ can be measured as an optical density.

<Color filter and manufacturing method thereof>
The method for producing a color filter of the present invention includes a partition formation step for forming the inkjet partition according to the present invention described above, and a colored liquid composition containing an organic solvent is applied between the formed partition by an inkjet method. And a colored region forming step for forming the region. The partition forming step is to form the partition by the above-described method for forming a partition for an ink jet of the present invention, and preferably includes a layer forming step and a patterning step.

  In the method for producing a color filter of the present invention, after forming the inkjet partition of the present invention as described above, between the partitions sandwiched by the partition formed on the permanent support, specifically, for example, in the form of a matrix In the case of forming a color filter, a colored liquid composition (hereinafter also referred to as ink) is applied to a concave region formed by partitioning with a partition wall in a grid shape to form a colored region (coloring). Region forming step). The colored region forms individual colored pixels such as red (R), green (G), and blue (B) when the color filter is formed.

  In addition to the partition wall forming step and the colored region forming step, the color filter manufacturing method of the present invention preferably further includes a curing step in which the formed colored region of at least one color is cured by irradiation with active energy rays, and a desired method. And a curing step of curing by heat after forming at least one or all of the colored regions of the hue.

-Colored area formation process-
In the colored region forming step, a colored liquid composition containing an organic solvent is applied between the formed partition walls by an inkjet method to form a colored region. In this case, two colors can be obtained by ejecting and injecting ink jet ink for forming colored pixels (for example, RGB three-color pixel pattern) into concave portions partitioned by the partition formed on the permanent support. A color filter composed of the plurality of colored pixels can be manufactured.

  The pattern shape of the color filter is not particularly limited, and may be a general stripe shape as a black matrix shape, a lattice shape, or a delta arrangement.

  As an inkjet method, a method in which charged inkjet ink is continuously ejected and controlled by an electric field, a method in which ink is intermittently ejected using a piezoelectric element, and an ink is heated and intermittently ejected using its foam. Various methods such as a method can be adopted. Specifically, a method of ejecting ink using an inkjet head is suitable.

As the ink jet head (hereinafter also simply referred to as a head), a known one can be applied, and a continuous type or a dot on demand type can be used.
Among the dot-on-demand types, the thermal type head preferably has a working valve as described in JP-A-9-323420 for ejection. In the piezo-type head, for example, heads described in European Patent A277,703, European Patent A278,590 and the like can be used. Among these, the piezo head is more preferable because the influence of heat on the ink-jet ink can be reduced and the choice of usable solvents is wide.

  The head preferably has a temperature control function so that the temperature of the ink can be controlled. It is preferable to set the injection temperature so that the viscosity at the time of ejection is 5 to 30 mPa · s, and to control the ink temperature so that the fluctuation range of the viscosity is within ± 5%. Moreover, as a drive frequency, it is preferable to operate | move at 1-500 kHz.

  The shape of the nozzle of the head is not necessarily circular, and there is no limitation on the shape such as an ellipse or a rectangle. The nozzle diameter is preferably in the range of 10 to 100 μm. Although the nozzle opening itself is not necessarily a perfect circle, in this case, the nozzle diameter is assumed to be a circle equivalent to the area of the opening.

  There is no restriction | limiting in particular as ejection conditions of an inkjet ink, You may carry out at room temperature. It is preferable from the viewpoint of injection stability that the inkjet ink is heated to 30 to 60 ° C., and the ink viscosity is lowered for injection. Organic ink-jet inks generally have a higher viscosity than water-based inks, and thus have a large viscosity fluctuation range due to temperature fluctuations. Viscosity fluctuations greatly affect the droplet size and droplet ejection speed as they are, and are liable to cause image quality deterioration. Therefore, it is important to keep the inkjet ink temperature as constant as possible.

  When the colored liquid composition (ink) is applied by an ink jet method, a permanent support having partition walls may be fixedly arranged, and the ink jet head may be translated in a one-dimensional direction, or conversely, the ink jet head may be fixedly arranged. The permanent support may be translated in the one-dimensional direction, or the inkjet head may be translated in the one-dimensional direction and the permanent support having the partition wall in the one-dimensional direction substantially orthogonal to this direction. Also good.

  The color filter in the present invention is preferably in the form of a group (pixel group) composed of at least three colors of colored regions (that is, colored pixels) by spraying at least three colors of ink including RGB.

The colored liquid composition (ink) in the present invention contains an organic solvent, and can contain an organic solvent, a colorant, and a monomer, and may contain other components as necessary.
Regarding the physical properties of the ink, the viscosity at 25 ° C. is preferably 10 to 100 mPa · s, and the surface tension at 25 ° C. is preferably 10 to 50 mN / m.

As an organic solvent constituting the colored liquid composition, an I / O value of 0 is used from the viewpoint of not impairing the flatness of the wall surface of the partition among the organic solvents used for the ink used for ejection by the ink jet method. It is preferable to select an organic solvent in the range of .40 to 0.80.
Examples of organic solvents having an I / O value in the range of 0.40 to 0.80 include, for example, Chemical Handbook Application Revised 3rd Edition, Maruzen Co., Ltd., issued on August 15, 1985. Company Ohm Co., Ltd., issued on June 20, 1989 "," Solvent Handbook, Kodansha Co., Ltd., issued on August 10, 1982 ", and paragraph number [0066] of JP-A-2004-220036. ] And [0092] to [0096], paragraph numbers [0082] to [0089] of JP-A-2006-284752, paragraph numbers [0024] to [0029] of JP-A-2006-299090, JP-A-2006. No. 345449, paragraph number [0019], WO 04-7626, JP 2006-83362 paragraph No. [0024], JP 2005-23. Paragraph Nos. [0063] to [0067] of Japanese Patent No. 4045, Paragraph Nos. [0014] to [0026] of Japanese Patent No. 3692365, Paragraph No. [0053] of Japanese Patent Laid-Open No. 2006-163306, No. 2000-310706 Examples include the solvents described in Paragraph Nos. [0031] to [0037] and the like, and from the viewpoint of more effectively achieving the effects of the present invention, the I / O value is 0.55 to 0.75. The boiling point of the solvent is preferably 100 ° C. or more and 300 ° C. or less, more preferably 150 to 280 ° C. under normal pressure (1.01 × 10 ⁵ Pa (760 mmHg)). Especially preferably, it is 200-280 degreeC.
By setting the boiling point of the solvent to 100 ° C. or more and 300 ° C. or less, it is preferable in that the evaporation of the other solvent of the coloring composition can be suppressed and the residual solvent in the pixel after the baking treatment can be sufficiently evaporated. .
As the organic solvent, ethyl 3-ethoxypropionate, 1,3-butanediol acetate, 1,6-hexanediol diacetate, 1,8-octanediol diacetate, and diethylene glycol monobutyl ether acetate are particularly preferable.

  As the colorant constituting the colored liquid composition, both dyes and pigments can be used, and the use of pigments is preferred from the viewpoint of durability.

  Examples of the colored liquid composition include a coating-type colored ink used for producing a known color filter (for example, paragraphs [0034] to [0063] and paragraphs [0076] to [0078] of JP-A-2005-3861. And the like, and paragraphs [0009] to [0026] of JP-A-10-195358, JP-A-2004-339332, and JP-A-2002-372615. It is possible to select from compositions and the like. Among these, a composition containing an organic solvent having an I / O value in the above range is preferably selected.

In consideration of the process after forming the colored region, a component that is cured by heating or cured by energy rays such as ultraviolet rays can be added to the colored liquid composition (ink).
Various thermosetting resins are widely used as components that are cured by heating, and examples of components that are cured by energy rays include those obtained by adding a photoinitiator to an acrylate derivative or a methacrylate derivative. Particularly considering heat resistance, those having a plurality of acryloyl groups and methacryloyl groups in the molecule are more preferable. These acrylate derivatives and methacrylate derivatives are preferably water-soluble, and even those that are sparingly soluble in water can be used after being emulsified.

In the present invention, after the ink is ejected between the partition walls, the organic solvent contained in the droplets is removed to form the remaining ink, and then the remaining ink is heated (so-called baking treatment) to cure and color the remaining ink. Layers can be formed. The heating here can be performed in one stage or in multiple stages.
The heating in one stage means heating at a predetermined temperature that completely cures the ink from the beginning after removing the solvent to make the ink remaining, and the heating in the multi-stage is a relatively low temperature at the beginning. In this case, the heating is started, and then the heating temperature is sequentially increased to finally heat at a predetermined temperature at which the ink is completely cured.

Examples of the heating method include, but are not limited to, heating with a hot plate, an electric furnace, a drier, etc., or a method of irradiating with infrared rays.
Before the heating, a step of curing the remaining ink with active energy rays may be provided.

  The heating temperature and heating time during heating depend on the composition of the colored liquid composition (ink) and the thickness of the colored region, but are generally about 120 from the viewpoint of ensuring sufficient pixel strength, solvent resistance, alkali resistance, and the like. It is preferred to heat at about -250 ° C for about 10 minutes to about 120 minutes.

  In the present invention, the process from the colored region forming step to the heating step for heating is preferably performed within 24 hours, more preferably within 12 hours, and even more preferably within 6 hours. By starting heating within the above-mentioned time range without leaving it for a long time after forming the colored region, it is possible to prevent the aggregation of pigments in the ink and the precipitation of various binders. Pixel).

  As described above, after forming the color filters by forming the partition walls and the colored regions (colored pixels), an overcoat layer can be formed so as to cover the entire surfaces of the colored regions and the partition walls for the purpose of improving the durability. .

  The overcoat layer can protect the colored regions such as R, G, and B and the partition walls, and can flatten the surface of the color filter. However, it is preferable not to provide it from the point which the number of processes increases.

  An overcoat layer can be comprised using resin (OC agent). Examples of the resin (OC agent) include an acrylic resin composition, an epoxy resin composition, and a polyimide resin composition. Among them, the acrylic resin composition is desirable because it is excellent in transparency in the visible light region and the resin component of the colored liquid composition (ink) is usually mainly composed of an acrylic resin and has excellent adhesion. . Examples of the overcoat layer include those described in paragraphs [0018] to [0028] of JP-A No. 2003-287618, and commercially available overcoat agents such as Optomer SS6699G manufactured by JSR.

  The color filter of the present invention is produced by the above-described method for producing the color filter of the present invention, and includes, for example, a portable terminal such as a television, a personal computer, a liquid crystal projector, a game machine, and a mobile phone, a digital camera, and a car navigation system. It can be suitably applied to applications such as without particular limitation. In the color filter of the present invention, partition walls (for example, partition walls functioning as a black matrix) may be composed of the above-described photosensitive resin composition of the present invention, and red (R), green (G), blue ( B), white (W), purple (V), and other arbitrary color pixels can be formed and configured.

<Display device>
The display device of the present invention is not particularly limited as long as it includes the color filter of the present invention described above. The display device of the present invention includes display devices such as a liquid crystal display device, a plasma display display device, an EL display device, and a CRT display device.

  For the definition of display devices and explanation of each display device, refer to, for example, “Electronic Display Device (Akio Sasaki, published by Industrial Research Institute 1990)”, “Display Device (written by Junaki Ibuki, Industrial Book Co., Ltd.) Issue year)).

The display device of the present invention is particularly preferably a liquid crystal display device. The liquid crystal display device is described in, for example, “Next-generation liquid crystal display technology (edited by Tatsuo Uchida, published by Investigative Research Institute, Inc., 1994)”. The liquid crystal display device is not particularly limited, and various types of liquid crystal display devices described in, for example, the “next generation liquid crystal display technology” can be applied.
The display device of the present invention is particularly effective when constructed as a color TFT liquid crystal display device. The color TFT liquid crystal display device is described in, for example, “Color TFT liquid crystal display (issued in 1996 by Kyoritsu Publishing Co., Ltd.)”. Furthermore, the display device of the present invention can also be applied to a liquid crystal display device with a wide viewing angle, such as a lateral electric field drive method such as IPS, or a pixel division method such as MVA. These methods are described, for example, on page 43 of "EL, PDP, LCD display-latest technology and market trends-(issued in 2001 by Toray Research Center Research Division)".

In addition to the color filter, the liquid crystal display device is configured using various members such as an electrode substrate, a polarizing film, a retardation film, a backlight, a spacer, and a viewing angle compensation film. Regarding these materials, for example, “'94 Liquid Crystal Display Peripheral Materials and Chemicals Market (Kentaro Shima, CMC Co., Ltd., published in 1994)”, “Current Status and Future Prospects of the 2003 Liquid Crystal Related Market (Volume 2) (Table Yoshiyoshi, Fuji Chimera Research Institute, Inc., published in 2003) ”.

  The display device of the present invention includes ECB (Electrically Controlled Birefringence), TN (Twisted Nematic), IPS (In-Plane Switching), FLC (Ferroelectric Liquid Crystal), and OCB (OpticBandNyStic). Various display modes such as (Vertical Aligned), HAN (Hybrid Aligned Nematic), and GH (Guest Host) can be adopted.

  As described above, the display device of the present invention includes a color filter having good color purity and hue while suppressing the occurrence of roughening due to ink by using the photosensitive resin composition of the present invention. Thus, there is no display unevenness such as color unevenness, and an image having a wide color reproduction range and a high contrast ratio can be displayed. It is also suitable for large screen display devices such as notebook personal computer displays and television monitors.

  EXAMPLES Hereinafter, the present invention will be described more specifically with reference to examples. However, the present invention is not limited to the following examples unless it exceeds the gist thereof. Unless otherwise specified, “part” and “%” are based on mass.

Example 1
[Synthesis of Binder 1]
In a nitrogen stream, 250 g of propylene glycol monomethyl ether acetate [MMPG-Ac, manufactured by Daicel Chemical Industries, Ltd.] is placed in a 1000 ml three-necked flask equipped with a condenser, and the internal temperature is 80 ° C. in a water bath containing paraffin. Until heated. To this, 80 g of MMPG-Ac, 23.1 g of methacrylic acid [MAA, manufactured by Mitsubishi Rayon Co., Ltd.] and 6.72 g of benzyl methacrylate [BzMA, manufactured by Kyoeisha Chemical Co., Ltd.] and methyl methacrylate [MMA, Kyoeisha Chemical Co., Ltd.] Made by dissolving 238.9 g and MMPG-Ac 20 g, 2,2′-azobis (methyl isobutyrate) [V601, manufactured by Wako Pure Chemical Industries, Ltd.] 3.14 g It dripped over 3 hours with the plunger pump. After completion of dropping, the mixture was stirred for 5 hours, and disappearance of the residual monomer was confirmed by ¹ H-NMR. Dilution with MMPG-Ac was performed so that the solid concentration was 27%.
As described above, MAA / BzMA / MMA = 8.6 / 2.5 / 88.9 (mass ratio) binder 1 was synthesized. The binder 1 had an I / O value of 0.690 and a weight average molecular weight of 30,000.
The monomer disappeared and the synthesis of the resin was confirmed from the generation of the high molecular weight component.

In addition, the I / O value of the binder 1 was calculated in the same manner as described above for the inorganic value and the organic value of the binder, and was obtained from the following formula.
I / O value (b) = (inorganic value of binder 1) / (organic value of binder 1)

[Preparation of K pigment dispersion 1]
Components of the following composition were mixed to prepare K pigment dispersion 1.
・ Carbon black (Nexex 35 manufactured by Degussa) ... 13.1%
・ Dispersant (Compound 1 below) 0.65%
・ Random copolymer of polymer (benzyl methacrylate / methacrylic acid (= 72/28 [molar ratio]), Tg = 76 ° C., weight average molecular weight = 30,000) ・ ・ ・ 6.72%
・ Propylene glycol monomethyl ether acetate: 79.53%

[Preparation of photosensitive resin composition K1]
K pigment dispersion 1 and propylene glycol monomethyl ether acetate in the amounts shown in the following composition are weighed out, mixed at a temperature of 24 ° C. (± 2 ° C.), stirred at 150 rpm for 10 minutes, and further stirred. Methyl ethyl ketone, cyclohexanone, binder 1, phenothiazine, DPHA solution, 2,4-bis (trichloromethyl) -6- [4 '-(N, N-bisdiethoxycarbonylmethyl) amino-3' -Bromophenyl] -s-triazine and Surfactant 1 are weighed and added in this order at a temperature of 25 ° C. (± 2 ° C.), and stirred at 150 rpm for 30 minutes to produce a photosensitive resin Composition K1 was prepared.
The “I / O value (b) × (M / B)” of the photosensitive resin composition K1 was calculated to be 0.656.

<Composition of photosensitive resin composition K1>
-K pigment dispersion 1 ... 30.33%
・ Propylene glycol monomethyl ether acetate: 8.60%
・ Methyl ethyl ketone 34.16%
・ Cyclohexanone: 8.55%
・ 2,4-Bis (trichloromethyl) -6- [4 ′-(N, Ndiethoxycarbonylmethyl) amino-3′-bromophenyl] -s-triazine 0.24%
・ Binder 1 ... 11.59%
・ The following DPHA solution: 6.46%
・ Phenothiazine: 0.01%
・ Surfactant 1 below: 0.06%

The details of each component are as follows.
~ DPHA solution ~
-Dipentaerythritol hexaacrylate (containing 500 ppm of polymerization inhibitor MEHQ, manufactured by Nippon Kayaku Co., Ltd., trade name: KAYARAD DPHA) 76%
・ Propylene glycol monomethyl ether acetate 24%

~ Surfactant 1 ~
・ The following structure 1 ・ ・ ・ 30%
・ Methyl ethyl ketone 70%

[Formation of black matrix]
(Preparation of photosensitive transfer material K1)
Using a slit-like nozzle on a 75 μm thick polyethylene terephthalate film temporary support (PET temporary support), a thermoplastic resin layer coating solution having the following formulation H1 is applied and dried to form a thermoplastic resin layer. Formed. Next, an intermediate layer coating liquid having the following formulation P1 was further applied on the thermoplastic resin layer and dried to form an intermediate layer (oxygen barrier film). On the intermediate layer, the photosensitive resin composition K1 was further applied and dried to form the photosensitive resin layer K1.
Thus, a thermoplastic resin layer having a dry film thickness of 14.6 μm, an intermediate layer having a dry film thickness of 1.6 μm, and a photosensitive resin having a dry film thickness of 2.3 μm on the PET temporary support. The layer K1 was laminated, and a protective film (12 μm thick polypropylene film) was pressure-bonded to the surface of the photosensitive resin layer K1.
As described above, the photosensitive transfer material K1 in which the temporary support, the thermoplastic resin layer, the intermediate layer, and the photosensitive resin layer K1 were integrated was produced.

<Coating solution for thermoplastic resin layer: Formulation H1>
Methanol: 11.1 parts Propylene glycol monomethyl ether acetate: 6.36 parts Methyl ethyl ketone: 52.4 parts Methyl methacrylate / 2-ethylhexyl acrylate / benzyl methacrylate / methacrylic acid copolymer (co-polymer) Polymerization composition ratio (molar ratio) = 55 / 11.7 / 4.5 / 28.8, molecular weight = 100,000, Tg≈70 ° C.) 6.80 parts ・ Styrene / acrylic acid copolymer (copolymerization) Composition ratio (molar ratio) = 63/37, average molecular weight = 10,000, Tg≈100 ° C.) 10.2 parts 2,2-bis [4- (methacryloxypolyethoxy) phenyl] propane (Shin Nakamura) Chemical Industries, Ltd.) 9.1 parts ・ Surfactant 1 ・ ・ ・ 0.54 parts

<Interlayer coating solution: Formulation P1>
-PVA205 ... 32.2 parts (polyvinyl alcohol, manufactured by Kuraray Co., Ltd., saponification degree = 88%, polymerization degree 550)
・ Polyvinylpyrrolidone (APS Japan, K-30) ・ ・ ・ 14.9 parts ・ Distilled water ・ ・ ・ 524 parts ・ Methanol ・ ・ ・ 429 parts

  Next, an alkali-free glass substrate (hereinafter also simply referred to as “glass substrate”) was washed with a rotating brush having nylon hair while spraying a glass detergent solution adjusted to 25 ° C. for 20 seconds with a shower. The shower was washed with water. Then, a silane coupling solution (N-β (aminoethyl) γ-aminopropyltrimethoxysilane 0.3% aqueous solution, trade name: KBM603, manufactured by Shin-Etsu Chemical Co., Ltd.) was sprayed for 20 seconds with a shower, pure water shower Washed. This substrate was heated at 100 ° C. for 2 minutes by a substrate preheating device.

  The protective film is removed from the photosensitive transfer material K1 obtained as described above on the obtained silane coupling treated glass substrate, and the exposed photosensitive resin layer K1 is removed from the surface of the silane coupling treated glass substrate. In contact with each other, FIG. Lamination was performed using a large two-clad laminator described in No. 24. At this time, the details of the laminator are as follows.

Subsequently, the PET temporary support was peeled off at the interface with the thermoplastic resin layer, and the temporary support was removed. After peeling off the temporary support, the photosensitive resin layer was subjected to pattern exposure at an exposure amount of 100 mJ / cm ^{2 using} a mirror projection type exposure machine (MPA-8800CF, manufactured by Canon Inc.).

  Next, a triethanolamine developer (containing 30% triethanolamine, trade name: T-PD2 (manufactured by FUJIFILM Corporation) 12 times with pure water (1 part of T-PD2 and 11 parts of pure water). The mixture was diluted with a ratio at a flat nozzle pressure of 0.04 MPa for 30 seconds at 30 ° C. to remove the thermoplastic resin layer and the intermediate layer. Subsequently, after air was blown off on the upper surface of the glass substrate, pure water was sprayed for 10 seconds by a shower, pure water shower cleaning was performed, and air was blown to reduce a liquid pool on the substrate.

  Subsequently, a sodium carbonate developer (0.38 mol / liter sodium bicarbonate, 0.47 mol / liter sodium carbonate, 5% sodium dibutylnaphthalenesulfonate, anionic surfactant, antifoaming agent, and stabilizer Containing; Trade name: T-CD1 (manufactured by Fuji Film Co., Ltd.) diluted 5 times with pure water) at 29 ° C. for 30 seconds, jet pressure on the surface of the photosensitive resin layer with a cone type nozzle is 0. Shower development was performed at 15 MPa, and the photosensitive resin layer K1 was developed to obtain a pattern image.

  Subsequently, a solution obtained by diluting a cleaning agent (containing phosphate, silicate, nonionic surfactant, antifoaming agent, stabilizer; trade name: T-SD1 (manufactured by Fuji Film Co., Ltd.)) 10 times with pure water Using a cone-shaped nozzle for 20 seconds at a spray pressure of 0.02 MPa on the surface of the photosensitive resin layer while spraying in a shower shape, rubbing the pattern image formed with a rotating brush having nylon bristles to remove residues The desired black matrix pattern was obtained.

Thereafter, the glass substrate on which the black matrix pattern was formed with an exposure amount of 3000 mJ / cm ² was subjected to post-exposure from both sides with an exposure machine manufactured by USHIO INC. Having a metal halide lamp. Heat treatment was performed for a minute to obtain a striped black matrix (partition) having an optical density of 4.0, a thickness of 2.0 μm, and an opening having a width of 100 μm.

[Ink repellent plasma treatment]
The glass substrate on which the black matrix was formed was subjected to ink repellent plasma treatment under the following conditions using a cathode coupling parallel plate type plasma treatment apparatus.
(conditions)
・ Gas used: CF ₄
・ Gas flow rate: 80sccm
・ Pressure: 40 Pa
・ RF power: 50W
・ Processing time: 30 sec

[Preparation of colored liquid composition]
Among the following components, first, a pigment, a polymer dispersant, and a solvent were mixed, and a pigment dispersion was obtained using a three roll and bead mill. While sufficiently stirring the pigment dispersion with a dissolver or the like, other materials were added little by little to prepare a colored liquid composition (ink R) for red (R) pixels.

<Composition of colored liquid composition for red pixel>
Pigment (CI Pigment Red 254) 5 parts Polymer dispersing agent (Solsperse 24000 manufactured by AVECIA) 1 part Binder 3 parts (benzyl methacrylate / methacrylic acid (= 72 / 28 [molar ratio]) random copolymer, weight average molecular weight 37,000)
First epoxy resin: 2 parts (Novolac type epoxy resin, Epicoat 154 manufactured by Yuka Shell)
・ Second epoxy resin (neopentyl glycol diglycidyl ether) 5 parts ・ Curing agent (trimellitic acid) 4 parts ・ Solvent: Ethyl 3-ethoxypropionate 80 parts

Further, C.I. I. Pigment Red 254 with the same amount of C.I. I. A colored liquid composition (ink G) for green (G) pixels was prepared in the same manner as the colored liquid composition for red pixels except that the pigment green 36 was used.
Still further, C.I. I. Pigment Red 254 with the same amount of C.I. I. A colored liquid composition (ink B) for blue (B) pixels was prepared in the same manner as the colored liquid composition for red pixels except that the pigment blue 15: 6 was used.

[Formation of pixels by inkjet method]
Ink was ejected in the following form using SE-128 made by Dimatix as an inkjet head and Apollo II made by Dimatix as an ejection control device.
An ink jet head is mounted on an automatic two-dimensional moving stage (KS211-200 manufactured by Suruga Seiki Co., Ltd.) so that a predetermined amount of ink is ejected into a concave portion surrounded by a black matrix of a glass substrate on which a black matrix (partition wall) is formed. The ejection from the head by the ejection control device was synchronized while moving the stage. Here, inks of three colors, ink R, ink G, and ink B, are filled in different heads, and each head is fixed on the XY stage so that each ink lands on a predetermined position. In addition, the three heads were independently controlled by the discharge control device.
The droplet ejection ejects ink of each color until the desired density is reached, and after the ejection is completed, the ink is dried by heating at 100 ° C. for 2 minutes on a hot plate and then baked in an oven at 230 ° C. for 30 minutes. A color filter in which both the black matrix and the colored pixels (R pixel, G pixel, and B pixel) were cured well was produced (hereinafter referred to as “color filter substrate”).

-Black matrix evaluation-
The black matrix (BM) in the obtained color filter substrate was observed at a magnification of 20 times, and the degree of surface roughness due to the ink on the upper surface of the black matrix (the surface facing the contact surface with the substrate) was evaluated based on the following evaluation criteria. Therefore, it was evaluated. ○ Only the rank is acceptable. The evaluation results are shown in Table 3 below.
<Evaluation criteria>
○ Rank: No roughness was observed on the BM surface.
Δ Rank: 1 to 2 roughnesses were observed on the BM surface.
X Rank: 3 or more rough spots were observed on the BM surface.

[Production of display device]
An ITO (Indium Tin Oxide) transparent electrode was further formed by sputtering on the R pixel, G pixel, B pixel, and black matrix of the color filter substrate obtained above. Separately, a glass substrate was prepared as a counter substrate, and an ITO transparent electrode was similarly formed by sputtering. Then, a photo spacer was provided in a portion corresponding to the upper part of the black matrix on the ITO transparent electrode, and an alignment film made of polyimide was further provided thereon.

-Formation of liquid crystal alignment split projections-
A coating liquid for photosensitive resin layer for protrusions having the following formulation A was applied onto the ITO transparent electrode on the color filter by the same slit coater as described above and dried to form a photosensitive resin layer for protrusions.
Next, a protective layer having a dry film thickness of 1.6 μm was provided on the protrusion photosensitive resin layer using the intermediate layer coating liquid composed of the formulation P1.

<Coating liquid for photosensitive resin layer for protrusions: Formulation A>
-Positive resist solution 53.3 parts (FH-2413F, manufactured by FUJIFILM Electronics Materials Co., Ltd.)
-Methyl ethyl ketone-46.7 parts-Surfactant 1-0.04 parts

Next, a proximity exposure machine is arranged so that the position of the photomask is at a distance of 100 μm from the surface of the photosensitive resin layer for protrusions, and the irradiation energy is 150 mJ / cm ² with an ultrahigh pressure mercury lamp through the photomask. Proximity exposure. Thereafter, a 2.38% tetramethylammonium hydroxide aqueous solution was developed by spraying on the photosensitive resin layer for protrusions at 33 ° C. for 30 seconds in a shower type developing device, and an unnecessary portion (exposure) of the photosensitive resin layer for protrusions was exposed. Part) was developed and removed. As a result, protrusions patterned in a desired shape were formed on portions above the ITO transparent electrode of the color filter and above the R, G, and B pixels. Next, the color filter substrate on which the protrusions are formed is baked at 240 ° C. for 50 minutes, so that a height of 1.5 μm and a longitudinal sectional shape (surface parallel to the normal direction of the glass substrate surface) are formed on the color filter substrate. Can be formed.

  After that, a UV curable resin sealant is applied by a dispenser method to a position corresponding to the outer frame of the black matrix provided so as to surround the pixel group of the color filter, and the MVA mode liquid crystal is dropped and attached to the counter substrate. The bonded and bonded substrates were irradiated with UV, and then heat treated to cure the sealant. A liquid crystal cell was thus obtained. A polarizing plate HLC2-2518 (manufactured by Sanritz Co., Ltd.) was pasted on both sides of this liquid crystal cell, and then placed on the back surface side of the liquid crystal cell provided with the polarizing plate by constituting a backlight of a cold cathode tube, A liquid crystal display device was obtained.

-Evaluation of display devices-
The liquid crystal display device obtained above was energized, and the display image was visually observed. As a result, the displayed image was good with no display unevenness.

(Examples 2-7, Comparative Examples 1-5)
In Example 1, the type of binder was changed as shown in Table 2 below, and photosensitive resin compositions K2 to K12 were prepared according to the formulation shown in Table 2 below, and each of these photosensitive resin compositions was photosensitized. A black filter was formed and a color filter was prepared and evaluated in the same manner as in Example 1 except that it was used instead of the conductive resin composition K1. Further, a liquid crystal display device was manufactured and evaluated. The evaluation results are shown in Table 3 below.
In addition, the binder was synthesize | combined by the method similar to the synthesis | combination of the binder 1 of Example 1 so that it might become a copolymerization component and copolymerization ratio which are shown in following Table 3. FIG. The I / O values (b) obtained in the same manner as in Example 1 for the synthesized binders 2 to 4 and binders 5 to 8 are as shown in Table 3 below.

As shown in Table 3, in the example, the black matrix constituting the color filter was suppressed from occurrence of roughness, and the image when the image was displayed was good with no display unevenness.
On the other hand, in the comparative example, it was not possible to prevent the black matrix from being roughened, and display unevenness occurred in the liquid crystal display device using the color filter whose evaluation of the color filter was Δ rank and × rank.

(Examples 8 to 12)
In Example 1, photosensitive resin compositions K13 to K17 were respectively prepared in the same manner as the photosensitive resin composition K1 except that the formulation was changed as shown in Table 4 below.
Next, instead of applying and drying the photosensitive resin composition K1, the photosensitive resin compositions K13 to K17 obtained above were applied and dried to the dry film thickness shown in Table 5 below. Except that, the photosensitive transfer materials of Examples 8 to 12 were produced in the same manner as Example 1.
Next, in place of the photosensitive transfer material K1, the black matrices of Examples 8 to 12 were respectively obtained in the same manner as in Example 1 except that the photosensitive transfer materials of Examples 8 to 12 obtained above were used. Formed. At this time, development using a sodium carbonate-based developer was performed at 29 ° C. for 20 seconds to 60 seconds at a time suitable for Examples 8 to 12 instead of 29 ° C. for 30 seconds. The film thicknesses after heat treatment of the black matrices of Examples 8 to 12 were as shown in Table 5.
Next, using the substrate on which the black matrix of Examples 8 to 12 was formed, a color filter substrate was prepared and evaluated in the same manner as in Example 1, and further, liquid crystal was obtained using the obtained color filter substrate. Each display device was produced and evaluated. The evaluation results are shown in Table 5 below.

  As shown in Table 5, in the embodiment, the film thickness after heat treatment is in the range of 1.5 μm to 2.7 μm, and the black matrix constituting the color filter can suppress the occurrence of roughness, and the image when the image is displayed is also shown. There was no display unevenness and it was good.

(Examples 13 to 14)
In Example 1, the photosensitive transfer materials of Examples 13 to 14 were produced in the same manner as the production of the photosensitive transfer material K1 except that the configuration of the photosensitive transfer material was changed as shown in Table 6 below. The formulation for the intermediate layer coating solution (P1) and the formulation for the photosensitive resin composition (K1) are the same as in Example 1.

Next, using the photosensitive transfer materials of Examples 13 to 14 obtained above, Examples 13 to 14 according to paragraphs [0139] to [0152] (excluding paragraph number [0143]) in Example 1 were used. A black matrix was formed to prepare a color filter substrate. Further, according to [0153] to [0157], a liquid crystal display device was obtained.
The black matrix constituting the color filters of Examples 13 to 14 was not roughened on the surface, and the liquid crystal display devices of Examples 13 to 14 were satisfactory. That is, the images displayed on the liquid crystal display devices of Examples 13 to 14 were good with no display unevenness.

(Examples 15 to 16)
[Preparation of K pigment dispersion 2]
In Example 1, K pigment dispersion 2 was prepared using the binder 1 of the present invention instead of the polymer used for the preparation of K pigment dispersion 1.
Using this, the photosensitive resin compositions of Examples 15 to 16 having the formulations shown in Table 7 below were prepared, and the obtained photosensitive resin compositions of Examples 15 to 16 were processed according to the method of paragraph [0139]. On the glass substrate, it apply | coated and dried so that it might become a dry film thickness of the following Table 8, and the photosensitive resin layer was formed on the glass substrate.
Next, the formed photosensitive resin layer was subjected to pattern exposure with a mirror projection type exposure machine (MPA-8800CF, manufactured by Canon Inc.) at an exposure amount of 100 mJ / cm ² .
Next, according to paragraphs [0144] to [0152] in Example 1, the black matrixes of Examples 15 to 16 were formed to produce a color filter substrate. Furthermore, according to paragraph numbers [0153] to [0157], a liquid crystal display device was obtained.

  The black matrix constituting the color filters of Examples 15 to 16 was not roughened on the surface, and the liquid crystal display devices of Examples 15 to 16 were satisfactory. That is, the images displayed on the liquid crystal display devices of Examples 15 to 16 were good with no display unevenness.

Claims (7)

A photosensitive resin composition used for forming an inkjet partition for forming a colored region by applying a colored liquid composition containing an organic solvent by an inkjet method,
A photosensitive resin composition containing at least a coloring material, a binder polymer, a monomer, and a polymerization initiator, wherein at least one of the binder polymers has an I / O value of 0.58 or more and satisfies the following formula (1).
I / O value (b) × (M / B) ≧ 0.49 (1)
[I / O value (b): I / O value of binder polymer, M: mass of monomer in photosensitive resin layer, B: mass of binder polymer in photosensitive resin layer] A method for forming an inkjet partition for forming a colored region by applying a colored liquid composition containing an organic solvent by an inkjet method,
An inkjet partition having a step of forming a photosensitive resin layer using the photosensitive resin composition according to claim 1, exposing the formed photosensitive resin layer in a pattern, and developing to form a partition. Forming method.   An inkjet partition for forming a colored region by applying a colored liquid composition containing an organic solvent by an inkjet method, wherein the inkjet partition is formed using the photosensitive resin composition according to claim 1. . A partition forming step of forming a photosensitive resin layer using the photosensitive resin composition according to claim 1, exposing the formed photosensitive resin layer in a pattern, and developing to form a partition;
A colored region forming step of forming a colored region by applying a colored liquid composition containing an organic solvent by an inkjet method between the formed partition walls;
The manufacturing method of the color filter which has.   The method for producing a color filter according to claim 4, wherein at least one of the organic solvents in the colored liquid composition has an I / O value of 0.40 to 0.80.   The color filter produced by the manufacturing method of the color filter of Claim 4 or Claim 5.   A display device comprising the color filter according to claim 6.