JP2009038328A - Supercritical fluid cleaning apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To clean objects to be cleaned as many as possible per a unit of time using a single cleaning chamber having a simple structure. <P>SOLUTION: A supercritical fluid cleaning apparatus has a cleaning chamber, a cleaning fluid supplying means supplying cleaning fluid into the cleaning chamber, and a fluid discharging means discharging unnecessary matters in the cleaning chamber, and cleans the objects in the cleaning chamber by sustaining supercritical state in the cleaning chamber. The supercritical fluid cleaning apparatus has conveyance and carrying-in means conveying and carrying the objects before cleaning into the cleaning chamber, and carrying-out and conveyance means taking the objects cleaned by the cleaning outside the cleaning chamber, and a plurality of objects can be stored and set on a plurality of positions in the cleaning chamber at the same time to sequentially perform the cleaning. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a supercritical fluid cleaning apparatus using a supercritical fluid.

  In the semiconductor manufacturing field such as the recent IC chip manufacturing process, circuit patterns have become extremely fine, and the influence of contamination by impurities such as trace amounts of metals and organic substances has become a problem. As a solution, a cleaning technique using a supercritical fluid is about to be put into practical use.

  For example, a cleaning process chamber, a cleaning fluid supply means for supplying a cleaning fluid into the cleaning process chamber, and a fluid discharge means for discharging unnecessary substances in the cleaning process chamber are provided, and the cleaning process chamber is brought into a supercritical state. By maintaining the object to be cleaned in the cleaning process chamber, the object to be cleaned such as a plurality of semiconductor wafers is stored in the cleaning process chamber flatly by the transfer device one by one. It is arranged and washed, and after the completion of the process, it is similarly taken out one by one by the transport device and stored in the object to be cleaned storage section (see Patent Document 1, Patent Document 2, etc.) .

  According to such a supercritical fluid cleaning apparatus, a fine structure such as conventional RCA cleaning, cleaning by various high frequency and ultrasonic waves, other cleaning methods, and drying methods by spin dryer, laser irradiation, heating, etc. You can solve the problem of destroying.

  However, if only the cleaning process can be performed for each sheet as described above, the processing efficiency is low, and it takes a considerably long time to clean a large number of objects to be cleaned.

  Conventionally, as a method for increasing the number of cleaning processes in such a case, for example, a first system in which a plurality of semiconductor wafers are placed in the same cleaning processing chamber, and a second system in which a plurality of cleaning processing chambers are provided. For example, if the object to be cleaned is a large-diameter wafer of 300 mm or 450 mm, the conventional batch type cleaning method that performs batch processing by stacking the wafer in multiple stages as it is on the work holding cassette Then, the front surface and the back surface of the wafer itself are alternately close to each other.

  Therefore, miniaturization of the circuit pattern as described above has progressed, and even the adhesion of particles on the back surface of the wafer has become a situation that is disliked, and in this batch type method, the front and back surfaces of the wafer are alternately approaching, Actually, it is difficult to adopt due to the fact that particle adhesion and other trouble factors are likely to occur, the generation of particles from the work holding cassette itself, chemical contamination, and the like.

  Therefore, it is inevitably necessary to place a plurality of wafers one by one in a thin large-diameter cleaning chamber in consideration of the wafer diameter, or a plurality of cleaning processing chambers (multi-chambers) for storing only one wafer. There is no choice but to be one of two methods of being built in one system.

JP 2003-173997 A JP 2006-135106 A

  However, in the latter case, the multi-chamber system requires a large number of open / close valves in the supercritical fluid piping to each chamber, and the control mechanism of the valves becomes complicated. In addition, not only valves but also pipe joints such as corner joints require a large number, and there is a difference in pipe length, so there is a difference for each chamber in the resistance value when fluid flows through the pipe flow path. Arise.

  Due to this, pressure fluctuations, pressure increase / decrease time, fluid flow rate, processing time, etc. are likely to vary (variation), and it is necessary to add various sensors to achieve uniform processing conditions. Becomes complicated.

  Furthermore, in the multi-chamber, the wafers are arranged in a plane and the wafers are transferred between the chambers by a robot. Therefore, the installation area becomes large, the transfer distance becomes long, and the apparatus itself becomes large accordingly. .

  The present invention has been made based on such circumstances, and transporting and carrying means for transporting and transporting the object to be cleaned into the cleaning process chamber, and carrying out the object to be cleaned after the cleaning process from the cleaning process chamber. Provided is a supercritical fluid cleaning processing apparatus that solves the above-mentioned conventional problems by providing a conveying means and storing and setting a plurality of objects to be cleaned in a cleaning processing chamber so that they can be sequentially cleaned. It is for the purpose.

  In order to achieve the above object, the present invention is configured with the following problem solving means.

(1) The invention of claim 1 The supercritical fluid cleaning apparatus of the present invention includes a cleaning process chamber, cleaning fluid supply means for supplying a cleaning fluid into the cleaning process chamber, and unnecessary materials in the cleaning process chamber. A supercritical fluid cleaning apparatus comprising: a fluid discharging means for discharging, and maintaining the cleaning processing chamber in a supercritical state so as to perform cleaning processing of an object to be cleaned in the cleaning processing chamber. In addition, a carrying-in means for carrying the object to be cleaned before cleaning into the cleaning process chamber and a carrying-out means for taking out the object to be cleaned after the cleaning process from the cleaning process chamber are provided at the same time at a plurality of positions in the cleaning process chamber. It is characterized in that a plurality of objects to be cleaned can be stored and set and sequentially cleaned.

  According to such a configuration, it becomes possible to simultaneously clean many objects to be cleaned, and the cleaning efficiency is greatly improved.

  In addition, there is no problem like the multi-type described above.

(2) Invention of Claim 2 The supercritical fluid cleaning treatment apparatus of the present invention is characterized in that, in the structure of the invention of Claim 1, the carrying-in means and the carrying-out means are configured as independent devices. Yes.

  According to such a configuration, after the cleaning process is completed, the cleaning object transporting / carrying means performs cleaning in response to the cleaning object carrying / conveying means taking out one cleaning target in the cleaning processing chamber. The previous object to be cleaned can be carried in and stored and set, and the efficiency of loading and unloading the object to be cleaned increases, and the cleaning processing efficiency of the apparatus itself is improved.

(3) Invention of Claim 3 In the supercritical fluid cleaning apparatus of the present invention, in the configuration of the invention of Claim 1 or 2, a turntable for placing an object to be cleaned is provided in the cleaning processing chamber. The set position of each of the plurality of objects to be cleaned is sequentially rotated so as to correspond to the approach position of the carry-in means or the carry-out means.

  According to such a configuration, it becomes easy and accurate to carry in the object to be cleaned by the object carrying and carrying means and to set the turntable to the set position and to carry out the object to be washed by the object carrying and conveying means. .

(4) Invention of Claim 4 The supercritical fluid cleaning apparatus of the present invention is the structure of the invention of claim 1, 2, or 3, wherein the objects to be cleaned stored and set at a plurality of positions in the cleaning processing chamber are: A plurality of sheets are laminated and held in a predetermined jig case in a washable state, and are cleaned in the same state.

  According to such a configuration, a larger number of objects to be cleaned can be cleaned in a single cleaning process.

  As a result, according to the present invention, it is possible to provide a supercritical fluid cleaning apparatus that can clean a considerable number of objects to be cleaned at a time and has a higher cleaning efficiency than a conventional apparatus.

(Best Embodiment 1)
First, in FIGS. 1 to 4, for example, carbon dioxide (CO ₂ ) is used as a cleaning fluid, and cleaning is performed in combination with a predetermined liquid solvent such as alcohol. 1 shows the overall system of a critical fluid cleaning apparatus and the configuration of the main part.

(Features of the device)
In the supercritical fluid cleaning apparatus of the best embodiment 1, gas → supercritical fluid → carbon dioxide (CO ₂ ), which is a cleaning fluid, does not pass through a liquid phase at all in a predetermined cleaning process chamber. A predetermined object to be cleaned (such as a micromachine) such as a silicon wafer can be cleaned and dried with a gas phase change. From the opening and closing of the cleaning process chamber to the pressurization / decompression and filling of the solvent for replacement into the cleaning process chamber, automatic operation is possible without human intervention, and the mass production process of the cleaning process system using supercritical carbon dioxide fluid is possible. By making it possible to introduce it, it is possible to improve the degree of freedom of structure and pattern design, which was impossible to cause sticking by the conventional drying method.

(Overall system configuration)
First, in FIG. 1 showing the overall system configuration of the apparatus, reference numeral 10 denotes a cleaning processing chamber which is the center of the present invention, and the cleaning processing chamber 10 is open at the top as shown in FIGS. 2 and 3, for example. A bottomed cylindrical pressure-resistant container body 10a and a lower side opening corresponding to the opening of the container body 10a, covering the upper part of the container body 10a, and an electric heater (not shown) for heating and keeping warm. The cleaning body 10 is formed by fitting and integrating the container body 10a and the lid body 10b as shown in FIG. Then, the outer periphery of the container body 10a and the lid 10b forming the cleaning processing chamber 10 are sealed together to seal the inside of the cleaning processing space A in the cleaning processing chamber 10 when the cleaning processing chamber 10 is formed. A seal portion is provided, and both are integrally fitted and fixed through the seal portion as described above.

  That is, at the center of the peripheral wall portion of the container main body 10a, a protruding strip portion 21a having a predetermined height higher than the opening surface of the container main body 10a is provided over the entire circumference, and on the outer peripheral surface side thereof, An alignment ring (guide ring) G having a predetermined width made of, for example, a high-strength synthetic resin material, and a C-shaped cross section made of synthetic rubber having a large impact resilience, for example, on the inner peripheral surface side of the convex portion 21a. The internal pressure type O-rings (seal rings) S are respectively fitted.

  The upper end portion (shoulder portion) on the outer peripheral surface side of the alignment ring G is preferably formed in a rounded surface having a predetermined curvature from the upper surface side to the side surface side, and the peripheral wall portion (outer peripheral wall portion) of the groove portion 21b for fitting on the lid 10b side. ) The inner peripheral surface portion of 21d is guided by the rounded surface to be smoothly fitted. Further, the upper portion of the O-ring S has a predetermined height higher than that of the upper end surface of the protruding strip portion 21a, which is an abutting surface with the lid portion 10b side groove portion 21b, as shown in the figure, when not fitted to the lid body 10b. Although it protrudes high, when fitted, it is engaged with the inner peripheral surface side step portion 21c of the lid portion 10b side groove portion 21b with good sealing performance as shown in FIG.

  In the case of this embodiment, a cylindrical turntable 10c is provided between the bottom surface a and the side surface c in the opening of the container body 10a, such as ball bearings B, B..., B, B. It is supported so that it can rotate freely in the horizontal direction via a rotation support member, and is arranged at each vertex position of an equilateral triangle on the upper surface (on the work set surface) at intervals of 120 ° in the circumferential direction. Further, position restriction pins P, P, P, P, P, P, P, P, and P each having three workpiece support functions are provided upright.

  At the time of cleaning, the workpieces W, W, W are first regulated by three sets of position regulation pins P, P, P, P, P, P, P, P, P on the turntable 10c. Each sheet is carried into the third setting position one by one, and both the front and back surfaces with a predetermined gap between the upper surface of the turntable 10c are set in a washable state.

  As shown in FIG. 4, when the lid 10b is opened, the turntable 10c has a rotation driving roller 19d of the turntable rotation driving means 19 from the outside as shown in the figure with respect to the outer peripheral surface. The first, second, and third workpieces whose positions are regulated by the three set position regulating pins P, P, P. The set position is positioned so as to correspond to the approach position (front side) of the first manipulator of the transfer robot 11 to be described later, and each of the three workpieces W, W, W to be cleaned at one time is stored and set. It has become so.

  Then, on the upper surface of the turntable 10 c in the cleaning processing chamber 10, the silicon wafer or the like to be cleaned, for example, a sensor wire having a nano-level thickness, which is taken out from the storage cassette 12 via the transfer robot 11 and transferred, is transferred. When the workpieces W, W, W made of an object (micromachine, etc.) are delivered, the lid body 10b is closed as shown in FIGS. 2 to 3, and is then clamped and fixed by the lid opening / closing mechanism 13 for high-precision sealing. (Details will be described later).

On the other hand, reference numeral 1 is a carbon dioxide cylinder storing a desired amount of liquefied carbon dioxide (CO ₂ ) as a cleaning fluid, and 2 is a switch for opening and closing the supply state of carbon dioxide (CO ₂ ) from the carbon dioxide cylinder 1. The fluid on-off valve 3 is a pressurizing pump that pressurizes the carbon dioxide (CO ₂ ) fluid supplied in the open state of the fluid on-off valve 2 to a predetermined pressure, and 4 is the carbon dioxide pressurized by the pressurizing pump 3. Fluid temperature adjusting means including an electric heater for adjusting the temperature of the carbon (CO ₂ ) fluid to a predetermined temperature sufficient to change from a liquid phase state to a gas phase state. The fluid temperature adjusting means 4 is provided on the cleaning fluid supply pipe L ₁ from the carbon dioxide cylinder 1 to the cleaning processing space in the cleaning processing chamber 10. Then, the carbon dioxide cylinder 1, the fluid on-off valve 2, the pressure pump 3, the fluid temperature adjusting means 4, the cleaning fluid supply line L _1, the cleaning fluid supply means is formed.

Reference numeral 5 denotes an inert gas tank that stores a desired amount of an inert gas such as nitrogen N ₂ , and 6 denotes an inert gas opening / closing valve that controls opening and closing of the supply state of the inert gas. The on-off valve 6 is provided on the inert gas supply pipe L ₂ from the inert gas tank 5 to the inlet side of the fluid temperature adjusting means 4 of the cleaning fluid supply pipe L ₁ .

And those inert gas tank 5, the inert gas on-off valve 6, the inert gas supply pipe L _2, the inert gas supply means is formed.

Reference numeral 7 denotes a liquid solvent such as alcohol having a high affinity with the carbon dioxide (CO ₂ ) fluid and a liquid density corresponding to an adjustable density range of the carbon dioxide (CO ₂ ) fluid. A solvent tank for storing a desired amount, 8 is a solvent opening / closing valve for opening / closing the supply state of the liquid solvent, and the solvent opening / closing valve 8 is a fluid temperature adjusting means for the cleaning fluid supply pipe L ₁ from the solvent tank 7. It is provided on the solvent supply pipe L ₃ up to 4 outlets. The solvent tank 7, the solvent opening / closing valve 8, and the solvent supply pipe L ₃ form solvent supply means. The solvent supplied by the solvent supply means is mixed into the carbon dioxide (CO ₂ ) fluid on the outlet side of the fluid temperature adjusting means 4 on the cleaning fluid supply pipe L ₁ described above, and the cleaning is performed via the opening / closing valve 9. A predetermined amount is stored at the bottom of the cleaning processing space in the processing chamber 10, and the object to be cleaned is held in an immersed state.

Further, reference numeral L ₄ denotes a drain pipe for discharging a solvent or other waste liquid taken out by cleaning in the cleaning processing space in the cleaning processing chamber 10, and 17 detects a pressure in the cleaning processing space in the cleaning processing chamber 10. A pressure sensor 18 is a pressure adjustment valve that adjusts the pressure in the cleaning treatment space by varying the flow rate of the discharged fluid, 19 is a safety valve, and the pressure adjustment valve 18 is placed on the drain pipe L ₄ and pressure. The sensor 17 and the safety valve 19 are provided on the bypass pipe L _{5 in} parallel with the drain pipe L ₄ . The drain pipe L ₄ , the bypass pipe L ₅ , the pressure control valve 18, the pressure sensor 17, and the safety valve 19 form a fluid discharge means.

  The pressure detection value of the pressure sensor 17 is input to the controller 20, and the controller 20 adjusts the opening of the pressure control valve 18 based on the input value, thereby adjusting the pressure in the cleaning processing chamber 10. Adjust to the desired pressure.

(Cleaning method)
In the above configuration, the object to be cleaned is cleaned as follows, for example.

  (1) First, the inert gas opening / closing valve 6 and the solvent opening / closing valve 8 are opened, and the inert gas in the inert gas tank 5 and the solvent in the solvent tank 7 are placed at the bottom of the cleaning processing space A in the cleaning processing chamber 10. Quantitative storage. When a predetermined amount of the inert gas and the solvent enters, the inert gas on-off valve 6 and the solvent on-off valve 8 are closed.

  (2) Next, the object to be cleaned is placed in the bottom of the cleaning processing chamber 10 and immersed in the stored solvent, and the lid 10b is closed.

(3) Next, the temperature of the carbon dioxide fluid (CO ₂ fluid) supplied into the cleaning processing chamber 10 and the cleaning processing space of the cleaning processing chamber 10 are adjusted by adjusting the fluid temperature adjusting means 4 and the chamber temperature adjusting means. The temperature in A is adjusted and set to a predetermined temperature suitable for forming a supercritical state.

  At the same time, the pressure detection value of the pressure sensor 17 is inputted into the controller 20 for electrically adjusting and controlling the opening degree of the pressure control valve 18, and the detection value is suitable for forming a supercritical state. The opening degree of the pressure control valve 18 is appropriately adjusted and controlled so that the desired pressure value is obtained.

(4) Next, the cleaning fluid opening / closing valve 2 on the carbon dioxide cylinder 1 side is opened, and the carbon dioxide fluid as the cleaning fluid is supplied to the cleaning processing space A of the cleaning processing chamber 10 via the cleaning fluid supply pipe L _1. Supply in.

In this case, the fluid temperature adjusting means 4 is provided between the pressurizing pump 3 and the cleaning fluid inlet of the cleaning processing chamber 10 in the downstream region of the cleaning fluid supply pipe L ₁ as described above. Therefore, before entering the pre-cleaning treatment chamber 10, the liquid phase carbon dioxide fluid is heated and pressurized to a temperature suitable for becoming a gas or a supercritical state. Then, it is introduced into the cleaning processing space of the cleaning processing chamber 10.

  (5) As a result, the object to be cleaned is cleaned with a phase change of gas → supercritical fluid → gas without the carbon dioxide fluid as the cleaning fluid passing through the liquid phase at all.

  That is, in the case of this configuration, the carbon dioxide fluid that is the cleaning fluid supplied into the cleaning processing space A of the cleaning processing chamber 10 is gas or supercritical from the beginning by the pressure adjusting valve 18 and the fluid temperature adjusting means 4. Therefore, the inside of the cleaning processing space A of the cleaning processing chamber 10 can be quickly brought into a supercritical state, and air can be surely supplied at the initial stage of cleaning by the high-pressure cleaning fluid in the same gas or supercritical state. Discharged.

  As a result, the problem of the object to be cleaned due to the action of the cleaning fluid in the liquid phase is also solved. Therefore, even the micromachine as described above can be cleaned and dried with a sense of security.

(6) The carbon dioxide fluid containing unnecessary substances such as dirt and solvent from the object to be cleaned after being cleaned as described above is separated from the pressure regulating valve 18 and the safety valve 19 by a CO ₂ separation (not shown). The liquid is supplied to a waste liquid recovery apparatus having a recovery function, and the carbon dioxide fluid, the solvent, and unnecessary substances are separated from each other and recovered individually.

As shown in FIGS. 1 to 3, an inlet 31 and an outlet 32 for the cleaning fluid (CO ₂ ) are provided on the bottom wall portion of the container body 10 a.

(Configuration of lid opening / closing mechanism and chamber support)
As described above, the lid body opening / closing mechanism for fitting the lid body 10b to the container body 10a in a corresponding manner and removing the lid body 10b from the container body 10a to open the cleaning processing space A in the container body 10a. For example, as shown in FIG. 4, the entire process is configured as an open / close mechanism that is automated in synchronization with the work loading / unloading operation of the transfer robot 11.

  That is, as shown in FIG. 4, the lid opening / closing mechanism 13 stands on the floor and rises up to a predetermined height via the hydraulic cylinder 13c and the vertical telescopic rod 13b, and the horizontal lid supporting arm 13a. And a lifting / lowering means for supporting the lid body 10b, and a container body support base 14 which is on the floor surface and which supports and fixes the container body 10a facing upward on its upper surface. .

  Therefore, in this configuration, by operating the hydraulic cylinder 13c of the lifting / lowering means, the operating rod 13b and the lid support arm 13a can be moved up and down at a predetermined stroke distance. Then, the lid body 10b can be removed above the container body 10a, and can be lowered to fit into the container body 10a.

  These raising / lowering operations are of course appropriately performed using a predetermined automation control unit and appropriately combined with the work W loading and unloading operations by the transfer robot 11 described below, and once a predetermined number of workpieces W, W... After the cleaning / drying process is completed, after the lid 10b is released from the clamping state of the lid 10b by the lid opening / closing mechanism 13, the lid 10b is raised, the workpieces W, W. , W.

(Configuration of transfer robot)
The transfer robot 11 is located between the cleaning chamber 10, the workpiece supply hopper 12 a, and the installation table 12 c on which the workpiece storage cassette 12 b is placed, and the space between them is installed as an operation area. For example, by a so-called scalar robot provided with first and second sets of work transport manipulators (corresponding to work transport loading / unloading means and work unloading / transporting means) supported so as to be movable up and down on the cylinder 11a and the cylinder rod 11b. It is configured.

  The first manipulator for transporting and carrying a workpiece pivots on the upper end surface of the cylinder rod 11b so that the first arm 11c is pivotally supported so as to be horizontally rotatable and on the proximal end side with respect to the distal end of the first arm 11c. A second arm 11d that is pivotally supported, a third arm 11e that is bent and attached in a hook shape so that the tip side is upward with respect to the tip of the second arm 11d, and the third arm 11e The tip end side pivotally attached to the tip end so as to be rotatable is composed of a fourth arm 11f formed on the Y-type work holding portion 11g, and is placed in a stacked state on the above-described work hopper 12a portion. A large number of workpieces W, W... Are taken out one by one and regulated by three position regulating pins P, P, P on the turntable 10 c in the container body 10 a of the workpiece cleaning chamber 10. First Third three places (three sets) are one each by one carrying a set position of, go is set in a state in which at a predetermined gap between the upper surface of the turntable 10c.

  In this case, as described above, the turntable 10c is supported by the desired ball bearings B, B..., B, B. In this state, the rotation driving roller 19d of the turntable rotation driving means 19 comes into contact with the outer peripheral surface from the outside as shown in the figure and is driven to rotate at 120 ° intervals by frictional force. The first, second, and third work set positions at 120 ° intervals in the circumferential direction restricted by the three set position restricting pins P, P, P are sequentially approached by the first manipulator ( The three workpieces W, W, and W are stored and set, and are carried out.

  The rotation driving roller 19d of the turntable rotation driving means 19 is rotated in the direction of the arrow by the outer casing 19e itself extending in the horizontal direction as a pressing lever, and the rotation driving roller 19d is pressed against the outer peripheral surface of the turntable 10c. In addition, a rotation transmission mechanism such as a chain or a belt is provided inside, and the rotational driving force is transmitted through the motor 19a and the motor output shaft 19b.

  As described above, when the storage set of one workpiece W, W, W is completed at each of the first to third workpiece storage set positions on the turntable 10c in the container body 10a, the above-described first of the transfer robot 11 is completed. One manipulator is contracted to the cylinder rod 11b side, while the lid opening / closing mechanism 13 is operated to lower the lid 10b, and is fitted onto the container body 10a as shown in FIG. A cleaning processing space A hermetically sealed is formed, and the above-described cleaning processing is performed.

  By the way, the rotation drive roller 19d of the turntable rotation drive means 19 rotates the outer case 19 part outward during the cleaning process in which the lid 10b of the cleaning process chamber 10 is closed as described above. It is supposed to be escaped.

  Then, when the predetermined processing time has elapsed and the cleaning / drying processing of the workpieces W, W, W has been completed, the lid 10b is opened upward again, and the upper part of the turntable 10c of the container body 10a is opened.

  Then, in response to this, the second manipulator for unloading and transporting the work of the transport robot 11 is actuated, and the work W, W, W on the first to third work storage set positions on the turntable 10c. Is taken out and stored in the work storage case 12b.

  The second manipulator has a first arm 11h that is pivotally supported on the upper end surface of the cylinder rod 11b so as to be horizontally rotatable, and a proximal end side of the distal end of the first arm 11h can be rotationally driven. The second arm 11i that is pivotally supported, the third arm 11j that is bent and attached in a hook shape so that the tip side is upward with respect to the tip of the second arm 11i, and the tip of the third arm 11j Thus, the distal end side pivotally attached to the base end side includes a fourth arm 11k formed on the Y-shaped work holding portion 11g, and the first to first on the turntable 10c in the container body 10a described above. Each of the three workpieces W, W, W placed at the three workpiece storage set positions is taken out one by one and stacked in a storage position in the workpiece storage case 12b.

  Thereafter, the above operations are repeated, and the required number of workpieces W, W, W are cleaned / dried and stored.

  According to such a configuration, the workpieces W, W... In the container body 10a are laid flat on the turntable 10c to the last, so that a conventional method of putting a plurality of pieces into the same chamber or a batch method is used. The front and back surfaces of the workpiece are not close to each other and can be set with an appropriate space.

  Therefore, the adhesion of particles due to the close proximity of the front and back surfaces of the workpiece and other trouble factors are less likely to occur, and the generation of particles from the cassette itself and chemical contamination are less likely to occur.

  In addition, it is possible to solve the problem of inefficiency in cleaning processing, such as when placing workpieces one by one in a thin large-diameter chamber, as in the case where a plurality of chambers (multi-chambers) containing only one workpiece are integrated into one system. Therefore, the apparatus configuration is complicated and expensive, and there is no difference in processing quality. The entire apparatus is made compact and the work transfer distance is shortened.

  The height of the turntable 10c described above is such that the workpiece is unloaded by the first and second manipulators of the transfer robot 11 in the workpiece set state or workpiece unloading state with the lid 10b opened as shown in FIG. In the cleaning state where the container body 10a and the lid body 10b are fitted, the workpieces W, W, W and the lid body 10b that have been set are in a protruding height that is slightly higher than the opening surface of the container body 10a that can be easily transported. The height is set such that an appropriate gap is formed between the upper surface b in the opening.

(Best Mode 2)
FIGS. 5 and 6 also illustrate supercriticality according to the second preferred embodiment of the present invention in which carbon dioxide (CO ₂ ) is also used as a cleaning fluid and cleaning is performed in combination with a predetermined liquid solvent such as alcohol. The structure of the fluid washing | cleaning apparatus is shown.

  In this embodiment, the first and second manipulators of the transfer robot 11 of the first embodiment are reduced in cost as a one-hand type with a long arm structure capable of extending and contracting as shown in FIG. Correspondingly, the cleaning chamber 10 is also characterized by having a simple structure that does not require a turntable as shown in FIG. 6, and the configuration of the other parts is that of the first embodiment described above. Are basically the same and have the same effect.

  That is, in the case of this configuration, the cleaning chamber 10 has an opening for forming the cleaning chamber A only on the lid 10b side, and a work set surface similar to the upper surface of the turntable 10c described above is formed in the central portion on the container body 10a side. a 'is formed in a plateau shape. The above-mentioned O-ring (seal ring) S is fitted and fixed to the outer peripheral stepped surface of the elevated work setting surface a ′, and the peripheral wall on the lid 10b side through the O-ring S. The portion 21f is fitted to form a cleaning treatment chamber A in a sealed state having a predetermined height.

On the other hand, on the upper end face of the cylinder rod 11b of the transfer robot 11, the arm supporting member 11 _l having a slide groove 11m of the predetermined length are pivotally supported horizontally rotate with respect to the slide groove 11m A slide arm (expandable arm) 11n having a predetermined length is fitted in a cylinder or rack and pinion system so as to be able to extend and contract.

  A pair of left and right chuck pieces 11p, 11p that can be clamped and operated in the direction of the arrow are provided on the left and right sides of the distal end portion 11o of the slide arm 11n.

  Therefore, in the case of such a configuration, in the state where the lid body 10b is opened, the tip portion 11o is approached into the work hopper 12a while the slide arm 11n is expanded and contracted in the contraction direction. The work W on the side is chucked and taken out, and then rotated by 180 °, and then the required length extension operation is performed on the container body 10a side, so that the first work set surface a ′ similar to the turntable surface described above is obtained. -Set to the third work storage set position. By repeating this three times, at least three workpieces W, W, W are set on the workpiece setting surface a ′, the lid 10b is closed, and the same cleaning process as in the first embodiment is performed.

  Thereafter, the lid body 10b is opened again, and the slide arm 11n is operated in the reverse operation to take out the workpieces W, W, W on the workpiece setting surface a 'in sequence, and the workpiece storage case 12b Go on to laminate.

  In the case of such a configuration, the extension amount of the slide arm 11n is large, and the tip side chuck pieces 11p, 11p can be freely moved to the work storage set position on the work set surface a ′ of the container body 10a in combination with the raising / lowering and rotating movement. Therefore, the turntable 10c and its rotation driving means 19 and the like as in the case of the best embodiment 1 described above are not necessary. Therefore, the configuration is simple and the cost is low.

(Best Mode 3)
FIGS. 7 and 8 also illustrate supercriticality according to the third preferred embodiment of the present invention in which carbon dioxide (CO ₂ ) is also used as a cleaning fluid and cleaning is performed in combination with a predetermined liquid solvent such as alcohol. The structure of the fluid washing | cleaning apparatus is shown.

  This embodiment can perform more cleaning processing of the workpieces W, W..., W, W..., W, W. As described above, the container body 10a side opening of the cleaning processing chamber 10 of the type shown in FIG. 3 is formed deeply, the opening on the lid 10b side is eliminated, and a plurality of works W, W. .. Are housed in a plurality of sets (four sets) of process cassettes 16, 16... Which can be stacked and held at intervals, and the plurality of sets of process cassettes 16, 16. Are stored in the first to fourth work storage set positions provided at predetermined intervals, and the cleaning process is performed. After the cleaning process is completed, the process cassettes 16, 16. Take it out and temporarily set it as a relay point Placed on the Seth cassette table 17.

  In the same state, the workpieces W, W... Are taken out from the process cassettes 16, 16,.

  Extracting the workpieces W, W... From these workpiece hoppers 12a, and subsequently transferring the workpieces W, W... Into the process cassettes 16, 16,. Each of the workpieces W, W... And the subsequent storage in the workpiece storage case 12b is performed by the transfer robot 11 including the first and second manipulators. It is like that.

  According to such a configuration, a process of storing and taking out the workpieces W, W... Into the process cassettes 16, 16... Is added, and this is a cleaning process using a dedicated manipulator. If the extra time is used, work efficiency and tact time will not be affected.

It is a figure which shows the whole system configuration | structure of the supercritical fluid washing | cleaning processing apparatus which concerns on best Embodiment 1 of this invention. It is sectional drawing which shows the structure at the time of the non-fitting of the container main body and cover body of the chamber part of the washing | cleaning processing apparatus. It is sectional drawing which shows the structure at the time of the fitting of the container main body and cover body of the chamber part of the washing | cleaning processing apparatus. It is a perspective view which shows the structure of the conveyance mechanism part of the washing | cleaning processing apparatus. It is a figure which shows the structure of the supercritical fluid washing | cleaning processing apparatus which concerns on best Embodiment 2 of this invention. It is sectional drawing which shows the structure at the time of the non-fitting of the container main body and cover body of the chamber part of the washing | cleaning processing apparatus. It is a figure which shows the structure of the supercritical fluid washing | cleaning processing apparatus which concerns on best Embodiment 3 of this invention. It is sectional drawing which shows the structure at the time of the non-fitting of the container main body and cover body of the chamber part of the washing | cleaning processing apparatus.

Explanation of symbols

  1 is a carbon dioxide cylinder, 2 is a fluid opening / closing valve, 3 is a pressure pump, 5 is an inert gas tank, 7 is a solvent tank, 10 is a cleaning treatment chamber, 10a is a container body, 10b is a lid, 11 is a transfer robot, Reference numeral 13 denotes a lid opening / closing mechanism.

Claims (4)

A cleaning process chamber; cleaning fluid supply means for supplying a cleaning fluid into the cleaning process chamber; and fluid discharge means for discharging unnecessary substances in the cleaning process chamber. The cleaning process chamber is brought into a supercritical state. A supercritical fluid cleaning apparatus configured to perform cleaning processing on an object to be cleaned in the cleaning processing chamber by maintaining the transporting / carrying means for transporting and transporting the object to be cleaned before cleaning into the cleaning processing chamber In addition, an unloading / conveying means for taking out the object to be cleaned after the cleaning process from the cleaning process chamber is provided so that a plurality of objects to be cleaned can be stored and set simultaneously at a plurality of positions in the cleaning process chamber to sequentially perform the cleaning process. A supercritical fluid cleaning treatment apparatus characterized by the above. 2. The supercritical fluid cleaning apparatus according to claim 1, wherein the carrying-in means and the carrying-out means are configured as independent devices. A turntable for placing an object to be cleaned is provided in the cleaning processing chamber, and the set position of each of the objects to be cleaned is sequentially rotated so as to correspond to the approach position of the transfer / conveying means or the unloading / conveying means. The supercritical fluid cleaning treatment apparatus according to claim 2 or 3, wherein the supercritical fluid cleaning treatment apparatus is configured as described above. A plurality of objects to be cleaned that are stored and set at a plurality of positions in the cleaning chamber are stacked and held in a predetermined jig case in a washable state, and cleaned in the same state. The supercritical fluid cleaning apparatus according to claim 1, 2, or 3.

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