JP2009037800A - Light-emitting element and its manufacturing method - Google Patents
Light-emitting element and its manufacturing method Download PDFInfo
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- JP2009037800A JP2009037800A JP2007199908A JP2007199908A JP2009037800A JP 2009037800 A JP2009037800 A JP 2009037800A JP 2007199908 A JP2007199908 A JP 2007199908A JP 2007199908 A JP2007199908 A JP 2007199908A JP 2009037800 A JP2009037800 A JP 2009037800A
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- layer
- light emitting
- film
- light
- refractive index
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- SNAAJJQQZSMGQD-UHFFFAOYSA-N aluminum magnesium Chemical compound [Mg].[Al] SNAAJJQQZSMGQD-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910003481 amorphous carbon Inorganic materials 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
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- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- OYLGJCQECKOTOL-UHFFFAOYSA-L barium fluoride Chemical compound [F-].[F-].[Ba+2] OYLGJCQECKOTOL-UHFFFAOYSA-L 0.000 description 1
- 229910001632 barium fluoride Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000000872 buffer Substances 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
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- XZCJVWCMJYNSQO-UHFFFAOYSA-N butyl pbd Chemical compound C1=CC(C(C)(C)C)=CC=C1C1=NN=C(C=2C=CC(=CC=2)C=2C=CC=CC=2)O1 XZCJVWCMJYNSQO-UHFFFAOYSA-N 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
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- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 description 1
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- CUIWZLHUNCCYBL-UHFFFAOYSA-N decacyclene Chemical compound C12=C([C]34)C=CC=C4C=CC=C3C2=C2C(=C34)C=C[CH]C4=CC=CC3=C2C2=C1C1=CC=CC3=CC=CC2=C31 CUIWZLHUNCCYBL-UHFFFAOYSA-N 0.000 description 1
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- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
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- 125000000524 functional group Chemical group 0.000 description 1
- JVZRCNQLWOELDU-UHFFFAOYSA-N gamma-Phenylpyridine Natural products C1=CC=CC=C1C1=CC=NC=C1 JVZRCNQLWOELDU-UHFFFAOYSA-N 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 229940083761 high-ceiling diuretics pyrazolone derivative Drugs 0.000 description 1
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- YZASAXHKAQYPEH-UHFFFAOYSA-N indium silver Chemical compound [Ag].[In] YZASAXHKAQYPEH-UHFFFAOYSA-N 0.000 description 1
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- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
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- 229910010272 inorganic material Inorganic materials 0.000 description 1
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- 238000009830 intercalation Methods 0.000 description 1
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- 150000002503 iridium Chemical class 0.000 description 1
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- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 229930192419 itoside Natural products 0.000 description 1
- 150000003951 lactams Chemical group 0.000 description 1
- 125000000686 lactone group Chemical group 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 239000003446 ligand Substances 0.000 description 1
- XGZVUEUWXADBQD-UHFFFAOYSA-L lithium carbonate Chemical compound [Li+].[Li+].[O-]C([O-])=O XGZVUEUWXADBQD-UHFFFAOYSA-L 0.000 description 1
- 229910052808 lithium carbonate Inorganic materials 0.000 description 1
- GCICAPWZNUIIDV-UHFFFAOYSA-N lithium magnesium Chemical compound [Li].[Mg] GCICAPWZNUIIDV-UHFFFAOYSA-N 0.000 description 1
- FUJCRWPEOMXPAD-UHFFFAOYSA-N lithium oxide Chemical compound [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 description 1
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- 238000004020 luminiscence type Methods 0.000 description 1
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- 239000011777 magnesium Substances 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
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- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
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- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- SJCKRGFTWFGHGZ-UHFFFAOYSA-N magnesium silver Chemical compound [Mg].[Ag] SJCKRGFTWFGHGZ-UHFFFAOYSA-N 0.000 description 1
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- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
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- 125000005641 methacryl group Chemical group 0.000 description 1
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- CERQOIWHTDAKMF-UHFFFAOYSA-M methacrylate group Chemical group C(C(=C)C)(=O)[O-] CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
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- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
- 229910000476 molybdenum oxide Inorganic materials 0.000 description 1
- DCZNSJVFOQPSRV-UHFFFAOYSA-N n,n-diphenyl-4-[4-(n-phenylanilino)phenyl]aniline Chemical compound C1=CC=CC=C1N(C=1C=CC(=CC=1)C=1C=CC(=CC=1)N(C=1C=CC=CC=1)C=1C=CC=CC=1)C1=CC=CC=C1 DCZNSJVFOQPSRV-UHFFFAOYSA-N 0.000 description 1
- 150000002791 naphthoquinones Chemical class 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000011146 organic particle Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000011242 organic-inorganic particle Substances 0.000 description 1
- WCPAKWJPBJAGKN-UHFFFAOYSA-N oxadiazole Chemical compound C1=CON=N1 WCPAKWJPBJAGKN-UHFFFAOYSA-N 0.000 description 1
- 125000003566 oxetanyl group Chemical group 0.000 description 1
- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical compound [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- DGBWPZSGHAXYGK-UHFFFAOYSA-N perinone Chemical class C12=NC3=CC=CC=C3N2C(=O)C2=CC=C3C4=C2C1=CC=C4C(=O)N1C2=CC=CC=C2N=C13 DGBWPZSGHAXYGK-UHFFFAOYSA-N 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- FIZIRKROSLGMPL-UHFFFAOYSA-N phenoxazin-1-one Chemical compound C1=CC=C2N=C3C(=O)C=CC=C3OC2=C1 FIZIRKROSLGMPL-UHFFFAOYSA-N 0.000 description 1
- UOMHBFAJZRZNQD-UHFFFAOYSA-N phenoxazone Natural products C1=CC=C2OC3=CC(=O)C=CC3=NC2=C1 UOMHBFAJZRZNQD-UHFFFAOYSA-N 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 150000003057 platinum Chemical class 0.000 description 1
- 229920001197 polyacetylene Polymers 0.000 description 1
- 229920005596 polymer binder Polymers 0.000 description 1
- 239000002491 polymer binding agent Substances 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920000128 polypyrrole Polymers 0.000 description 1
- 150000004033 porphyrin derivatives Chemical class 0.000 description 1
- 150000004032 porphyrins Chemical class 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- JEXVQSWXXUJEMA-UHFFFAOYSA-N pyrazol-3-one Chemical class O=C1C=CN=N1 JEXVQSWXXUJEMA-UHFFFAOYSA-N 0.000 description 1
- 150000003233 pyrroles Chemical class 0.000 description 1
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
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- 230000002940 repellent Effects 0.000 description 1
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- 229920005989 resin Polymers 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 1
- YYMBJDOZVAITBP-UHFFFAOYSA-N rubrene Chemical class C1=CC=CC=C1C(C1=C(C=2C=CC=CC=2)C2=CC=CC=C2C(C=2C=CC=CC=2)=C11)=C(C=CC=C2)C2=C1C1=CC=CC=C1 YYMBJDOZVAITBP-UHFFFAOYSA-N 0.000 description 1
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 1
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 1
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N sodium oxide Chemical compound [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
- 229910001948 sodium oxide Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical class C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- GZCRRIHWUXGPOV-UHFFFAOYSA-N terbium atom Chemical compound [Tb] GZCRRIHWUXGPOV-UHFFFAOYSA-N 0.000 description 1
- 150000003518 tetracenes Chemical class 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- VLLMWSRANPNYQX-UHFFFAOYSA-N thiadiazole Chemical compound C1=CSN=N1.C1=CSN=N1 VLLMWSRANPNYQX-UHFFFAOYSA-N 0.000 description 1
- 150000003553 thiiranes Chemical group 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 150000003609 titanium compounds Chemical class 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
- 150000001651 triphenylamine derivatives Chemical class 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- 229910001935 vanadium oxide Inorganic materials 0.000 description 1
- 239000006200 vaporizer Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/85—Arrangements for extracting light from the devices
- H10K50/854—Arrangements for extracting light from the devices comprising scattering means
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
Description
本発明は、有機EL素子(有機エレクトロルミネッセンス素子)を代表とする発光素子およびその製造方法に関するものであり、さらに詳しくは、発光層を封止する多層封止膜の屈折率を調整可能とすることにより光の取り出し効率の向上を図った発光素子およびその製造方法に関するものである。 The present invention relates to a light emitting device typified by an organic EL device (organic electroluminescence device) and a method for producing the same, and more specifically, the refractive index of a multilayer sealing film for sealing a light emitting layer can be adjusted. The present invention relates to a light-emitting element that improves light extraction efficiency and a method for manufacturing the same.
有機EL素子、発光ダイオード表示素子などの発光素子においては、基板上に、陽極と陰極により挟持された発光層が積層され、この発光層を覆うように多層封止膜が積層されている。従来の発光素子では、基板にガラス基板が用いられていたが、素子の軽量化、耐衝撃性の向上、素子の大面積化、製造の効率化等の要請に対応するために、プラスチック基板が使用され始めている(例えば、特許文献1)。 In light emitting elements such as organic EL elements and light emitting diode display elements, a light emitting layer sandwiched between an anode and a cathode is laminated on a substrate, and a multilayer sealing film is laminated so as to cover the light emitting layer. In a conventional light emitting device, a glass substrate is used as a substrate. However, in order to meet the demands of lightening the device, improving impact resistance, increasing the area of the device, and increasing the efficiency of manufacturing, a plastic substrate is used. It has begun to be used (for example, Patent Document 1).
プラスチック基板はフレキシブルであり、大面積なものを容易に入手でき、また、発光層を積層した後にユニットに分割するための切断作業も容易となる。しかし、プラスチック基板は、ガラス基板に比べて、ガスおよび液体の透過性が高い。基板および上部多層封止膜により被包される有機EL発光層などの表示物質は、酸化されやすく、水と接触することにより劣化されやすい。そのため、プラスチック基板を用いる場合には、基板上にガスおよび液体に対するバリア性の高い下部封止膜を積層し、その後、この下部多層封止膜の上に発光層を積層し、積層した発光層を覆うようにして上部多層封止膜を積層する。 The plastic substrate is flexible and can be easily obtained in a large area, and the cutting work for dividing the light emitting layer into units after the lamination is facilitated. However, the plastic substrate has higher gas and liquid permeability than the glass substrate. Display materials such as the organic EL light-emitting layer encapsulated by the substrate and the upper multilayer sealing film are easily oxidized and easily deteriorated by contact with water. Therefore, when using a plastic substrate, a lower sealing film having a high barrier property against gas and liquid is laminated on the substrate, and then a light emitting layer is laminated on the lower multilayer sealing film, and the laminated light emitting layer An upper multilayer sealing film is laminated so as to cover the surface.
上記下部封止膜は、通常、上記上部多層封止膜と同様の構成、同様の材料にて形成される。これら下部多層封止膜および上部多層封止膜は、通常、少なくとも一つの無機層と少なくとも一つの有機層を有する。積層数は、必要に応じて決定され、基本的には、無機層と有機層は交互に積層される。 The lower sealing film is usually formed with the same configuration and the same material as the upper multilayer sealing film. These lower multilayer sealing film and upper multilayer sealing film usually have at least one inorganic layer and at least one organic layer. The number of stacked layers is determined as necessary. Basically, inorganic layers and organic layers are alternately stacked.
発光素子の光取り出しは、基板側から行う場合と、上部多層封止膜側から行う場合と、基板側と上部多層封止膜側の両方から行う場合がある。基板側から光を取り出す型式の発光素子はボトムエミッション型発光素子と呼称され、上部多層封止膜側から光と取り出す型式の発光素子はトップエミッション型発光素子と呼称され、両方から光を取り出す型式の発光素子は、デュアルエミッション型発光素子と呼称されている。これら型式の発光素子において、共通して言えることは、光取り出し側の多層封止膜は、透明もしくは半透明である必要があり、その物理的特性によって、光の取り出し効率が影響されるということである。そのため、従来の発光素子では、光取り出し側の多層封止膜は、できるだけ透明で、平坦な層から構成されている。 Light extraction from the light emitting element may be performed from the substrate side, from the upper multilayer sealing film side, or from both the substrate side and the upper multilayer sealing film side. The type of light emitting element that extracts light from the substrate side is called a bottom emission type light emitting element, and the type of light emitting element that extracts light from the upper multilayer sealing film side is called a top emission type light emitting element. This light emitting element is called a dual emission type light emitting element. In these types of light emitting elements, the common thing to say is that the multilayer sealing film on the light extraction side needs to be transparent or translucent, and the light extraction efficiency is affected by its physical characteristics. It is. Therefore, in the conventional light emitting device, the multilayer sealing film on the light extraction side is made of a flat layer that is as transparent as possible.
上記従来の発光素子では、その実装先の各種照明装置、各種表示装置、および各種電子機器の用途に応じて、光の取り出し強度の方向依存性を制御する必要に迫られる場合がある。そのような場合には、発光素子の光取り出し面の全面に散乱性シートなどの各種光学素子を設けることで対応している。しかし、これら追加的に設ける各種光学素子の設置によって、発光素子の実装先の各種装置にそのための占有スペースが必要となり、装置の小型化のネックとなる傾向となるため、その改善が求められている。 In the conventional light emitting element, it may be necessary to control the direction dependency of the light extraction intensity depending on the application of the various lighting devices, various display devices, and various electronic devices. In such a case, various optical elements such as a scattering sheet are provided on the entire light extraction surface of the light emitting element. However, the installation of these additional optical elements necessitates an occupied space for the various devices on which the light emitting elements are mounted, and this tends to become a bottleneck in downsizing the devices, so improvement is required. Yes.
本発明は、上記従来の事情に鑑みてなされたものであって、その課題は、その光取り出し強度の方向依存性を制御する機能を内蔵した発光素子を、素子の占有スペースの増大を伴うことなく、提供することにある。ここで、発光素子における光取り出し強度の方向依存性の制御とは、発光素子の発光面における視野角の制御、あるいは発光素子正面の光取り出し効率を向上を意味する。 The present invention has been made in view of the above-described conventional circumstances, and the problem is that a light-emitting element incorporating a function for controlling the direction dependency of the light extraction intensity is accompanied by an increase in the occupied space of the element. There is no provision. Here, the control of the direction dependency of the light extraction intensity in the light emitting element means the control of the viewing angle on the light emitting surface of the light emitting element or the improvement of the light extraction efficiency in front of the light emitting element.
上述した課題を解決するために、本発明にかかる発光素子は、少なくとも一つの有機層を有する多層封止膜によって発光部の光取り出し側が封止されてなる発光素子において、前記多層封止膜の積層中に該多層封止膜の屈折率を調整する少なくとも一つの屈折率調整層を含むことを特徴とする。 In order to solve the above-described problems, a light emitting device according to the present invention is a light emitting device in which a light extraction side of a light emitting unit is sealed with a multilayer sealing film having at least one organic layer. It is characterized by including at least one refractive index adjusting layer for adjusting the refractive index of the multilayer sealing film in the lamination.
また、本発明にかかる発光素子の製造方法は、少なくとも一つの有機層を有する多層封止膜によって発光部の光取り出し側が封止されてなる発光素子の製造方法であって、前記多層封止膜の積層中に該多層封止膜の屈折率を調整する少なくとも一つの屈折率調整層を形成することを特徴とする。 The method for manufacturing a light emitting device according to the present invention is a method for manufacturing a light emitting device in which a light extraction side of a light emitting part is sealed with a multilayer sealing film having at least one organic layer, the multilayer sealing film At least one refractive index adjusting layer for adjusting the refractive index of the multilayer sealing film is formed during the lamination of the multilayer sealing film.
前記構成において、前記屈折率調整層をその母材と異なる屈折率を有する粒子状化合物を含有させることにより形成することが、好ましい。 The said structure WHEREIN: It is preferable to form the said refractive index adjustment layer by containing the particulate compound which has a refractive index different from the base material.
前記構成において、前記多層封止膜を少なくとも一つの第1の膜と少なくとも一つの第2の膜とから形成し、前記屈折率調整層を前記少なくとも一つの第1の膜と少なくとも一つの第2の膜との間に形成してもよい。 In the above configuration, the multilayer sealing film is formed of at least one first film and at least one second film, and the refractive index adjusting layer is formed from the at least one first film and at least one second film. You may form between these films.
また、前記構成において、前記多層封止膜を少なくとも一つの第1の膜と少なくとも一つの第2の膜とから形成し、前記屈折率調整層を前記少なくとも一つの第1の膜に前記粒子状化合物を含有させることにより形成してもよい。 Further, in the above configuration, the multilayer sealing film is formed of at least one first film and at least one second film, and the refractive index adjusting layer is formed on the at least one first film in the particulate form. You may form by making a compound contain.
また、前記構成において、前記屈折率調整層の母材として、アクリル重合体を用いることが、好ましい。 Moreover, in the said structure, it is preferable to use an acrylic polymer as a base material of the said refractive index adjustment layer.
また、前記構成において、前記第1の膜を有機層とし、第2の膜を無機層とすることが好ましく、前記有機膜をアクリル重合体から形成することが、好ましい。 In the above structure, the first film is preferably an organic layer, the second film is preferably an inorganic layer, and the organic film is preferably formed from an acrylic polymer.
前記構成において、前記粒子状化合物として中空構造体を使用してもよい。また、この粒状化合物として、シリカ、ポリスチレン、フッ素置換ポリスチレンからなる群から選ばれる少なくとも1種を用いてもよい。 In the above configuration, a hollow structure may be used as the particulate compound. Moreover, you may use at least 1 sort (s) chosen from the group which consists of a silica, a polystyrene, and a fluorine substituted polystyrene as this granular compound.
本発明は、対象とする発光素子が、有機EL発光素子である場合に、特に有用である。 The present invention is particularly useful when the target light-emitting element is an organic EL light-emitting element.
本発明にかかる発光素子は、正面からは透明だが、斜めから見ると、不透明になって、発光素子の正面輝度が向上する。このような作用効果は、光取り出し側の多層封止膜中に少なくとも一つの屈折率調整層を形成することにより可能となる。この屈折率調整層は、その母材と異なる屈折率を有する粒子状化合物を含有させることにより形成するので、多層封止膜中の一つの層として容易に形成できる。この屈折率調整層の母材として、多層封止膜を形成している有機層をそのまま使用してもよいし、新たに層形成する有機化合物を使用してもよく、屈折率調整層の形成は容易である。また、従来の手段である光学フィルムを用いる場合では、高度な貼り付け工程と光学フィルム部材が必要となるが、本発明の製造方法では、屈折率調整層の形成は、通常の封止膜形成工程中に行うことができるので、プロセスが簡便であり、光取り出し効率に優れた発光素子を容易に製造することができる。 The light emitting device according to the present invention is transparent from the front, but becomes opaque when viewed from an oblique direction, and the front luminance of the light emitting device is improved. Such an effect can be achieved by forming at least one refractive index adjusting layer in the multilayer sealing film on the light extraction side. Since this refractive index adjusting layer is formed by containing a particulate compound having a refractive index different from that of the base material, it can be easily formed as one layer in the multilayer sealing film. As the base material of the refractive index adjustment layer, the organic layer forming the multilayer sealing film may be used as it is, or an organic compound that forms a new layer may be used. Is easy. In addition, in the case of using an optical film which is a conventional means, an advanced attaching step and an optical film member are required. In the manufacturing method of the present invention, the refractive index adjustment layer is formed by a normal sealing film formation. Since the process can be performed during the process, a light-emitting element with a simple process and excellent light extraction efficiency can be easily manufactured.
したがって、本発明に係る発光素子およびその製造方法によれば、発光素子の占有スペースを増大させずに、かつ安価に、光取り出し効率を向上させた発光素子を提供することができる。 Therefore, according to the light emitting element and the manufacturing method thereof according to the present invention, it is possible to provide a light emitting element with improved light extraction efficiency without increasing the space occupied by the light emitting element.
以下に、本発明にかかる発光素子およびその製造方法をさらに詳しく説明する。
前述のように、本発明に係る発光素子は、本発明にかかる発光素子は、少なくとも一つの有機層を有する多層封止膜によって発光部の光取り出し側が封止されてなる発光素子において、前記多層封止膜の積層中に該多層封止膜の屈折率を調整する少なくとも一つの屈折率調整層を含むことを特徴とする。
Below, the light emitting element concerning this invention and its manufacturing method are demonstrated in more detail.
As described above, the light emitting device according to the present invention is the light emitting device according to the present invention, wherein the light extraction side of the light emitting part is sealed by the multilayer sealing film having at least one organic layer. It is characterized by including at least one refractive index adjusting layer for adjusting the refractive index of the multilayer sealing film in the lamination of the sealing films.
また、本発明にかかる発光素子の製造方法は、少なくとも一つの有機層を有する多層封止膜によって発光部の光取り出し側が封止されてなる発光素子の製造方法であって、前記多層封止膜の積層中に該多層封止膜の屈折率を調整する少なくとも一つの屈折率調整層を形成することを特徴とする。 The method for manufacturing a light emitting device according to the present invention is a method for manufacturing a light emitting device in which a light extraction side of a light emitting part is sealed with a multilayer sealing film having at least one organic layer, the multilayer sealing film At least one refractive index adjusting layer for adjusting the refractive index of the multilayer sealing film is formed during the lamination of the multilayer sealing film.
前記屈折率調整層は、その母材と異なる屈折率を有する粒子状化合物を含有させることにより形成するので、多層封止膜中の一つの層として容易に形成できる。この屈折率調整層の母材として、多層封止膜を形成している有機層をそのまま使用してもよいし、新たに層形成する有機化合物を使用してもよい。 Since the refractive index adjusting layer is formed by containing a particulate compound having a refractive index different from that of the base material, it can be easily formed as one layer in the multilayer sealing film. As the base material of the refractive index adjusting layer, the organic layer forming the multilayer sealing film may be used as it is, or an organic compound for newly forming a layer may be used.
前記屈折率調整層は、その母材中に該母材と異なる屈折率を有する粒子状化合物を含有する。この粒子状化合物は、好ましくは均一に分散され、発光部から外部に向かう光を各透明粒子によって散乱させるので、取り出し光強度の方向依存性を制御することが可能となる。この屈折率調整層の母材は、多層封止膜を形成している有機層の構成材料と同様の材料あるいは類似の材料を用いて構成される。 The refractive index adjusting layer contains a particulate compound having a refractive index different from that of the base material in the base material. This particulate compound is preferably uniformly dispersed and scatters the light traveling outward from the light emitting part by each transparent particle, so that the direction dependency of the extracted light intensity can be controlled. The base material of the refractive index adjusting layer is configured using a material similar to or similar to the constituent material of the organic layer forming the multilayer sealing film.
前記屈折率調整層に使用する粒子状化合物の粒径を調製することによって、屈折率値の制御が可能となる。また、使用する粒子状化合物の添加量によっても、屈折率の制御が可能となる。この粒子状化合物の添加量は、屈折率調整層の全量に対して0.01〜50質量%の範囲内で調整することが好ましい。0.01質量%未満であると、目的の屈折率制御が行われなくなり、50質量%を超えると、屈折率調整層の膜強度を劣化させる場合が生じるので、好ましくない。また、粒子状化合物の平均粒径は、目的とする屈折率制御の程度と、前記添加量とにより、一義的に決められないが、0.05μm〜1μmの範囲で調整されることが好ましい。 By adjusting the particle size of the particulate compound used in the refractive index adjusting layer, the refractive index value can be controlled. Also, the refractive index can be controlled by the amount of the particulate compound used. The amount of the particulate compound added is preferably adjusted within a range of 0.01 to 50% by mass with respect to the total amount of the refractive index adjusting layer. If it is less than 0.01% by mass, the desired refractive index control is not performed, and if it exceeds 50% by mass, the film strength of the refractive index adjusting layer may be deteriorated. Further, the average particle diameter of the particulate compound is not uniquely determined by the target degree of refractive index control and the amount added, but is preferably adjusted in the range of 0.05 μm to 1 μm.
また、屈折率調整層の母材である有機層に混入される粒子状化合物は層内に均一に分散することが好ましい。また、有機層内に混入される粒子状化合物は、有機層の界面を乱さないように層内にのみ分散させてもよいし、界面から層外はみ出して界面に凹凸ができるように分散させてもよい。有機層の界面に凹凸が生じることによって、さらに屈折率の調整がなされるので、総合的な屈折率の制御性が向上できるという観点から、好ましい。 Moreover, it is preferable that the particulate compound mixed in the organic layer which is a base material of the refractive index adjusting layer is uniformly dispersed in the layer. In addition, the particulate compound mixed in the organic layer may be dispersed only in the layer so as not to disturb the interface of the organic layer, or it is dispersed so as to protrude from the interface to the outside of the layer and to form irregularities in the interface. Also good. Since the refractive index is further adjusted by forming irregularities at the interface of the organic layer, it is preferable from the viewpoint that the controllability of the total refractive index can be improved.
なお、本発明において、屈折率調整層は、多層封止層中に形成されるので、下層多層封止層中に形成することもでき、上部多層封止膜中に形成することもできる。したがって、本発明の対象とする発光素子は、トップエミッション型発光素子にも、ボトムエミッション型発光素子にも、さらにデュアルエミッション型発光素子にも、適用することができる。 In the present invention, since the refractive index adjusting layer is formed in the multilayer sealing layer, it can be formed in the lower multilayer sealing layer or can be formed in the upper multilayer sealing film. Therefore, the light-emitting element which is the subject of the present invention can be applied to a top emission type light emitting element, a bottom emission type light emitting element, and a dual emission type light emitting element.
以下、本発明の発光素子を構成する多層封止膜の構造とそれらの構成材料、屈折率調整層の構成材料について、詳述する。 Hereinafter, the structure of the multilayer sealing film constituting the light emitting device of the present invention, the constituent materials thereof, and the constituent materials of the refractive index adjusting layer will be described in detail.
本発明において、基板上に形成される下層多層封止膜は、基板に直接積層されてもよいし、何らかの中間層を介して積層されてもよい。かかる中間層としては、例えば、基板表面を親液化する親液化層などが考えられる。このような直接または間接の積層関係は、本発明の発光素子における下部多層封止膜−発光層−上部多層封止膜の積層関係においても、同様である。すなわち、下部多層封止膜上に発光部を直接積層してもよく、間接的に積層してもよい。同様に、発光層上に形成される上部多層封止膜は、発光層上に直接積層してもよいし、間接的に積層してもよい。例えば、有機EL素子での積層構造の一例を挙げると、フレキシブル基板/(有機/無機)下部多層封止膜/陽極(例えば、ITO)/ホール注入層(例えば、MoO3膜/ポリ(3,4)エチレンジオキシチオフェン/ポリスチレンスルフォン酸膜)/高分子有機発光材料層/電子注入層(例えば、Ba膜)/陰極層(例えば、Al膜)/(有機/無機)上部多層封止膜))のような多層構成を有する。 In the present invention, the lower multilayer sealing film formed on the substrate may be directly laminated on the substrate, or may be laminated via some intermediate layer. As such an intermediate layer, for example, a lyophilic layer for making the substrate surface lyophilic can be considered. Such a direct or indirect stacking relationship is the same in the stacking relationship of the lower multilayer sealing film-the light emitting layer-the upper multilayer sealing film in the light emitting device of the present invention. That is, the light emitting part may be directly laminated on the lower multilayer sealing film, or indirectly laminated. Similarly, the upper multilayer sealing film formed on the light emitting layer may be directly laminated on the light emitting layer or indirectly laminated. For example, when an example of a laminated structure in an organic EL element is given, flexible substrate / (organic / inorganic) lower multilayer sealing film / anode (for example, ITO) / hole injection layer (for example, MoO 3 film / poly (3, 4) Ethylenedioxythiophene / polystyrene sulfonic acid film) / polymer organic light emitting material layer / electron injection layer (for example, Ba film) / cathode layer (for example, Al film) / (organic / inorganic) upper multilayer sealing film) ).
上記下層および上部多層封止膜を構成する有機層および無機層の厚みは、50Å〜10μmの範囲とすることが好ましい。50Å未満となると、膜の機械的特性を良好に維持することが難しくなり、10μmを超えると、全体の膜厚が厚くなり、有機EL素子などでは、発光層からの光の取り出し効率に影響する場合もでてくる。 The thickness of the organic layer and the inorganic layer constituting the lower and upper multilayer sealing films is preferably in the range of 50 to 10 μm. When the thickness is less than 50 mm, it is difficult to maintain the mechanical properties of the film well. When the thickness exceeds 10 μm, the entire film thickness is increased. In an organic EL element or the like, the light extraction efficiency from the light emitting layer is affected. In some cases.
(下部および上部多層封止膜の構成材料)
上記下部および上部多層封止膜を構成する無機層としては、酸化ケイ素(SiO2)、窒化ケイ素(SiN)、酸窒化ケイ素(SiON)、酸化アルミニウム(Al2O3)などの材料が好適に用いられる。この無機膜の形成方法としては、スパッタ法、プラズマCVD法などの公知の薄膜形成方法を用いることができる。なお、本発明に用いられる多層封止膜においては、無機膜からなる層を無機層という。
(Constituent material of lower and upper multilayer sealing films)
As the inorganic layer constituting the lower and upper multilayer sealing films, materials such as silicon oxide (SiO 2 ), silicon nitride (SiN), silicon oxynitride (SiON), and aluminum oxide (Al 2 O 3 ) are preferably used. Used. As a method for forming the inorganic film, a known thin film forming method such as a sputtering method or a plasma CVD method can be used. In addition, in the multilayer sealing film used for this invention, the layer which consists of inorganic films is called an inorganic layer.
一方、下部および上部多層封止膜を構成する有機層としては、主に、上記無機層材料との密着性の良好な(メタ)アクリル基を有する有機モノマー、すなわち(メタ)アクリル系化合物を重合してなるアクリル重合体が好適に用いられる。なお、本発明に用いられる多層封止膜においては、有機膜からなる層を有機層という。 On the other hand, as the organic layer constituting the lower and upper multilayer sealing films, mainly, an organic monomer having a (meth) acryl group having good adhesion with the inorganic layer material, that is, a (meth) acrylic compound is polymerized. The acrylic polymer formed is preferably used. In the multilayer sealing film used in the present invention, a layer made of an organic film is referred to as an organic layer.
前記(メタ)アクリル系化合物は、溶液塗布法、スプレー塗布法などの公知の塗膜形成方法により塗膜とし、この塗膜に、光エネルギー(電子線、プラズマ線、紫外線などの化学線)を照射するか、熱エネルギーを印加することにより、重合させて、アクリル重合体とする。この時、本発明では、少なくとも一つの有機層に対して、前記半硬化手段あるいは疎液面上への塗膜形成手段によって、有機層の完全硬化と同時にその片面に立体構造を形成する。 The (meth) acrylic compound is formed into a coating film by a known coating film forming method such as a solution coating method or a spray coating method, and light energy (chemical rays such as electron beam, plasma beam, ultraviolet ray) is applied to the coating film. It polymerizes by irradiating or applying thermal energy to obtain an acrylic polymer. At this time, in the present invention, a solid structure is formed on one side of the organic layer simultaneously with the complete curing of the organic layer by the semi-curing means or the coating film forming means on the lyophobic surface for at least one organic layer.
前記(メタ)アクリル系化合物としては、特に限定されるものではなく、分子内に(メタ)アクリル基を1個以上含む化合物であればよい。(メタ)アクリル基が1個の時は、無機層とより高い密着性を得ることができる。2,3個の時は架橋密度が高くなり、有機層の膜強度がより高いものとなる。 The (meth) acrylic compound is not particularly limited as long as it is a compound containing one or more (meth) acrylic groups in the molecule. When there is one (meth) acryl group, higher adhesion to the inorganic layer can be obtained. When the number is two or three, the crosslink density is high, and the film strength of the organic layer is higher.
前記(メタ)アクリル系化合物としては、例えば、2−ヒドロキシエチル(メタ)アクリレート、2−ヒドロキシプロピル(メタ)アクリレート、2−ヒドロキシブチル(メタ)アクリレート等の水酸基を有する化合物、ジメチルアミノエチル(メタ)アクリレート、ジエチルアミノエチル(メタ)アクリレート等のアミノ基を有する化合物、(メタ)アクリル酸、2−(メタ)アクリロイソオキシエチルコハク酸、2−(メタ)アクリロイルオキシエチルヘキサヒドロフタル酸等のカルボキシル基を有する化合物、グリシジル(メタ)アクリレート、テトラヒドロフルフリル(メタ)アクリレート、シクロヘキシル(メタ)アクリレート、フェノキシエチル(メタ)アクリレート、イソボニル(メタ)アクリレート等の環状骨格を有する(メタ)アクリレート、イソアミル(メタ)アクリレート、ラウリル(メタ)アクリレート、ステアリル(メタ)アクリレート、ブトキシエチル(メタ)アクリレート、エトキシジエチレングリコール(メタ)アクリレート、メトキシトリエチレングリコール(メタ)アクリレート、メトキシジプロピレングリコール(メタ)アクリレート等のアクリル単官能化合物や、ジエチレングリコールジ(メタ)アクリレート、1,4−ブタンジオールジ(メタ)アクリレート、1,6−ヘキサンジオール(メタ)アクリレート、1,9−ノナンジオールジ(メタ)アクリレート、トリエチレンジ(メタ)アクリレート、PEG#200ジ(メタ)アクリレート、PEG#400ジ(メタ)アクリレート、PEG#600ジ(メタ)アクリレート、ネオペンチルジ(メタ)アクリレート、ジメチロルトリシクロデカンジ(メタ)アクリレート等のアクリル2官能化合物、2官能エポキシ(メタ)アクリレート等、2官能ウレタン(メタ)アクリレート等の2官能(メタ)アクリル化合物等が挙げられる。また、3個以上の(メタ)アクリル酸を有する化合物としては、ジペンタエリスリトールヘキサ(メタ)アクリレート、ペンタエリスリトールトリ(メタ)アクリレート、ペンタエリスリトールテトラ(メタ)アクリレート、トリメチロールプロパントリアクリレート、トリメチロールプロパンテトラアクリレート等のアクリル多官能モノマーや、(メタ)アクリル多官能エポキシアクリレート、(メタ)アクリル多官能ウレタンアクリレート等などを用いることができる。 Examples of the (meth) acrylic compound include compounds having a hydroxyl group such as 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, and 2-hydroxybutyl (meth) acrylate, dimethylaminoethyl (meth) ) Acrylates, compounds having amino groups such as diethylaminoethyl (meth) acrylate, (meth) acrylic acid, 2- (meth) acryloisooxyethyl succinic acid, 2- (meth) acryloyloxyethyl hexahydrophthalic acid, etc. It has a cyclic skeleton such as a compound having a carboxyl group, glycidyl (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, cyclohexyl (meth) acrylate, phenoxyethyl (meth) acrylate, isobornyl (meth) acrylate ( Acrylate), isoamyl (meth) acrylate, lauryl (meth) acrylate, stearyl (meth) acrylate, butoxyethyl (meth) acrylate, ethoxydiethylene glycol (meth) acrylate, methoxytriethylene glycol (meth) acrylate, methoxydipropylene glycol ( Acrylic monofunctional compounds such as (meth) acrylate, diethylene glycol di (meth) acrylate, 1,4-butanediol di (meth) acrylate, 1,6-hexanediol (meth) acrylate, 1,9-nonanediol di (meth) ) Acrylate, triethylene di (meth) acrylate, PEG # 200 di (meth) acrylate, PEG # 400 di (meth) acrylate, PEG # 600 di (meth) acrylate, neo Bifunctional (meth) acrylic compounds such as bifunctional urethane (meth) acrylates, such as bifunctional epoxy (meth) acrylates, bifunctional acrylic (meth) acrylates, etc., such as ntil di (meth) acrylate and dimethylol tricyclodecane di (meth) acrylate Can be mentioned. Examples of the compound having three or more (meth) acrylic acids include dipentaerythritol hexa (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, trimethylolpropane triacrylate, and trimethylol. An acrylic polyfunctional monomer such as propanetetraacrylate, (meth) acryl polyfunctional epoxy acrylate, (meth) acryl polyfunctional urethane acrylate, and the like can be used.
(屈折率調整層に用いる粒子状化合物)
屈折率調整層は、先に述べたように、上記多層封止層を構成している有機層を形成するときにその材料モノマーに粒子状化合物を均一に添加することにより、形成してもよい。その時は、多層封止層の有機層を屈折率調整層として併用することになる。あるいは、屈折率調整層を多層封止層を構成している各層間に新たに介装してもよい。その場合も前記有機層を形成する場合と同様にして、屈折率調整層を新たに形成する。
(Particulate compound used for refractive index adjustment layer)
As described above, the refractive index adjustment layer may be formed by uniformly adding a particulate compound to the material monomer when forming the organic layer constituting the multilayer sealing layer. . In that case, the organic layer of a multilayer sealing layer is used together as a refractive index adjustment layer. Alternatively, a refractive index adjustment layer may be newly interposed between the layers constituting the multilayer sealing layer. In this case, a refractive index adjustment layer is newly formed in the same manner as in the case of forming the organic layer.
前記屈折率調整層に用いる粒子状化合物としては、有機物粒子でもよいし、無機物粒子でもよいし、それらの混合物でもよい。これら粒子状化合物としては、屈折率調整層の母材とする前記有機化合物の屈折率に対して、大きい屈折率を持つものでもよいし、小さい屈折率を持つものでもよい。それは、目的とする屈折率の制御度合いにより適宜選択することになる。母材と粒子状化合物の屈折率の組み合わせとしては、屈折率の大きな無機材料と屈折率の小さな有機材料との組み合わせや、屈折率の大きな有機材料と屈折率の小さな有機材料の組み合わせや、または、それらの材料の数種類を混合したものなどが挙げられる。ここでの屈折率の差としては、光の散乱が有効に生じるようにする、という観点から、0.05以上の差があることが好ましく、0.1以上の差があることがより好ましい。 The particulate compound used for the refractive index adjusting layer may be organic particles, inorganic particles, or a mixture thereof. These particulate compounds may have a large refractive index or a small refractive index relative to the refractive index of the organic compound used as a base material of the refractive index adjusting layer. It is appropriately selected depending on the target degree of control of the refractive index. As a combination of the refractive index of the base material and the particulate compound, a combination of an inorganic material having a high refractive index and an organic material having a low refractive index, a combination of an organic material having a high refractive index and an organic material having a low refractive index, or , And a mixture of several types of these materials. The difference in refractive index here is preferably a difference of 0.05 or more, more preferably a difference of 0.1 or more, from the viewpoint of effectively causing light scattering.
また、粒子状化合物のサイズとしては、光の均一散乱を有効に誘起する、という観点から、光の波長と同程度のサイズであることが好ましく、0.05μm〜1μm、より好ましくは、0.1μm〜0.8μmである。 The size of the particulate compound is preferably about the same as the wavelength of light, from the viewpoint of effectively inducing uniform light scattering, and is preferably 0.05 μm to 1 μm, more preferably 0.00. 1 μm to 0.8 μm.
ここで、粒径が小さい粒子状化合物としては、例えば、酸化チタン、酸化アルミニウムなどの金属酸化物、金属複合酸化物微粒子、有機チタン化合物を始めとする高屈折率微粒子や、アクリル酸エステル、メタクリル酸エステル、およびスチレンを中心としてモノマーを重合して得られた球状中空微粒子、多孔性微粒子、コア・シェル構造などの多層構造微粒子、フッ素樹脂微粒子や中空ガラス微粒子のような低屈折率微粒子材料を用いることができる。 Here, examples of the particulate compound having a small particle diameter include metal oxides such as titanium oxide and aluminum oxide, metal composite oxide fine particles, high refractive index fine particles such as organic titanium compounds, acrylic acid esters, and methacrylic esters. Low refractive index fine particle materials such as spherical hollow fine particles, porous fine particles, multi-layered fine particles such as core / shell structures, fluororesin fine particles and hollow glass fine particles obtained by polymerizing monomers mainly with acid esters and styrene Can be used.
前記粒子状化合物の添加量は、先の述べたように、0.01質量%〜50質量%の範囲内で調整されるが、屈折率調整層の機械的強度を保持し、微粒子同士の凝集を防ぐという観点から、その添加量は、20質量%以下とすることが好ましく、10質量%以下とすることがより好ましい。 As described above, the addition amount of the particulate compound is adjusted within the range of 0.01% by mass to 50% by mass, but retains the mechanical strength of the refractive index adjustment layer and aggregates fine particles. From the viewpoint of preventing, the amount added is preferably 20% by mass or less, and more preferably 10% by mass or less.
(その他の添加剤)
前述のように屈折率調整層(有機層)は、粒状化合物を添加することにより機械的強度が低下する傾向となるので、層の強度および隣接層への密着性を向上させるために、DPHA(ジベンタエリスリトールヘキサアクリレート:6官能アクリレート)などの多官能アクリレート、それらのフッ素置換体、多官能エポキシ化合物、シランカップリング剤などの添加剤を使用してもよい。
(Other additives)
As described above, the refractive index adjusting layer (organic layer) tends to decrease the mechanical strength by adding the particulate compound. Therefore, in order to improve the strength of the layer and the adhesion to the adjacent layer, DPHA ( Additives such as polyfunctional acrylates such as dipentaerythritol hexaacrylate: hexafunctional acrylate), fluorine-substituted products thereof, polyfunctional epoxy compounds, and silane coupling agents may be used.
本発明に用いられる封止膜は、密着性向上層を有していてもよい。密着性向上層は、密着性を高める材料が含まれており、かかる密着性を高める材料としては、架橋高分子化合物、シランカップリング剤を挙げることができる。 The sealing film used in the present invention may have an adhesion improving layer. The adhesion improving layer includes a material that enhances the adhesion, and examples of the material that enhances the adhesion include a crosslinked polymer compound and a silane coupling agent.
前記架橋高分子化合物としては、熱エネルギーあるいは光エネルギーの印加、および熱重合開始剤または光重合開始剤の作用により重合可能な置換基を有するモノマー化合物(重合性化合物)を架橋高分子化したものが挙げられる。重合可能な置換基(架橋基と記す場合もある)とは、重合反応を起こすことにより2分子以上の分子間で結合を形成し、化合物を生成することができる置換基を表す。かかる架橋基としては、例えば、ビニル基、アセチレン基、ブテニル基、アクリル基、アクリレート基、アクリルアミド基、メタクリル基、メタクリレート基、メタクリルアミド基、ビニルエーテル基、ビニルアミノ基、シラノール基、小員環(例えば、シクロプロピル基、シクロブチル基、エポキシ基、オキセタン基、ジケテン基、エピスルフィド基等)を有する基、ラクトン基、ラクタム基、またはシロキサン誘導体を含有する基等がある。 The cross-linked polymer compound is obtained by cross-linking a monomer compound (polymerizable compound) having a polymerizable substituent by application of heat energy or light energy and the action of a thermal polymerization initiator or photopolymerization initiator. Is mentioned. A polymerizable substituent (sometimes referred to as a crosslinking group) refers to a substituent that can form a compound by forming a bond between two or more molecules by causing a polymerization reaction. Examples of such a crosslinking group include a vinyl group, an acetylene group, a butenyl group, an acrylic group, an acrylate group, an acrylamide group, a methacryl group, a methacrylate group, a methacrylamide group, a vinyl ether group, a vinylamino group, a silanol group, and a small ring ( For example, a group having a cyclopropyl group, a cyclobutyl group, an epoxy group, an oxetane group, a diketene group, an episulfide group, or the like, a lactone group, a lactam group, or a group containing a siloxane derivative.
また、上記の基の他に、エステル結合やアミド結合を形成可能な基の組み合わせなども利用できる。例えば、エステル基とアミノ基、エステル基とヒドロキシル基などの組み合わせである。 In addition to the above groups, combinations of groups capable of forming an ester bond or an amide bond can also be used. For example, a combination of an ester group and an amino group, an ester group and a hydroxyl group, or the like.
また、シランカップリング剤のような界面に物理的吸着性を示す材料も挙げられる。 Moreover, the material which shows physical adsorptivity to an interface like a silane coupling agent is also mentioned.
上記材料の中でも、とりわけ、(メタ)アクリレート基を有するモノマーが好ましい。(メタ)アクリレート基を有する単官能モノマーの具体例としては、2−エチルヘキシルカルビトールアクリレート、2−ヒドロキシエチルアクリレートなどが挙げられる。また、(メタ)アクリレート基を有する2官能モノマーの具体例としては、1,6−ヘキサンジオールジ(メタ)アクリレート、エチレングリコールジ(メタ)アクリレート、ネオペンチルグリコールジ(メタ)アクリレート、トリエチレングリコールジ(メタ)アクリレート、3−メチルペンタンジオールジ(メタ)アクリレートなどが挙げられる。その他の(メタ)アクリレート基を有する多官能モノマーの具体例としては、トリメチロールプロパントリ(メタ)アクリレート、ペンタエリスリトールトリ(メタ)アクリレート、ペンタエリスリトールテトラ(メタ)アクリレート、ジペンタエリスリトールペンタ(メタ)アクリレート、ジペンタエリスリトールヘキサ(メタ)アクリレート、トリスペンタエリスリトールオクタ(メタ)アクリレート、等が挙げられる。中でも、2官能以上、好ましくは、5官能以上、さらに好ましくは8官能以上の多官能モノマーが硬化性、密着性に優れ、好ましく用いられる。なお、ここでいう「官能の数」は上述の「架橋基の数」を意味する。すなわち、多官能モノマーの官能基とは、そのモノマーが有する架橋基のことを意味する。 Among the above materials, a monomer having a (meth) acrylate group is particularly preferable. Specific examples of the monofunctional monomer having a (meth) acrylate group include 2-ethylhexyl carbitol acrylate and 2-hydroxyethyl acrylate. Specific examples of the bifunctional monomer having a (meth) acrylate group include 1,6-hexanediol di (meth) acrylate, ethylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, and triethylene glycol. Examples include di (meth) acrylate and 3-methylpentanediol di (meth) acrylate. Specific examples of other polyfunctional monomers having a (meth) acrylate group include trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, and dipentaerythritol penta (meth). Examples thereof include acrylate, dipentaerythritol hexa (meth) acrylate, and trispentaerythritol octa (meth) acrylate. Among them, a polyfunctional monomer having two or more functions, preferably five or more functions, and more preferably eight or more functions is excellent in curability and adhesion, and is preferably used. Here, the “number of functionalities” means the “number of crosslinking groups” described above. That is, the functional group of the polyfunctional monomer means a crosslinking group that the monomer has.
なお、上記重合に用いられる架橋剤については、例えば、フォトポリマーハンドブック(工業調査会刊、1989年)の第17〜56頁に記載されている。 In addition, about the crosslinking agent used for the said superposition | polymerization, it describes in the 17th-56th pages of a photopolymer handbook (Industry Research Society publication, 1989), for example.
また、上述の材料がフッ素原子を有している場合には、撥水効果も作用して封止膜のバリア性を向上させることができる。 Moreover, when the above-mentioned material has a fluorine atom, the water repellent effect also acts and the barrier property of the sealing film can be improved.
上記構成の本発明に係る発光素子および発光素子の製造方法は、発光素子が有機EL素子である場合に特に有用である。かかる有機EL素子においても、上記に詳述した多層封止膜の構成は同様である。したがって、本発明を好適に適用できる有機EL素子における基板、発光層などの他の主要構成を以下に詳述する。 The light emitting device and the method for manufacturing the light emitting device according to the present invention having the above-described configuration are particularly useful when the light emitting device is an organic EL device. Also in such an organic EL element, the configuration of the multilayer sealing film described in detail above is the same. Therefore, other main components such as a substrate and a light emitting layer in the organic EL element to which the present invention can be suitably applied will be described in detail below.
(基板)
有機EL素子に用いる基板は、電極を形成し、有機物の層を形成する際に変化しないものであればよく、例えば、ガラス、プラスチック、高分子フィルム、シリコン基板、これらを積層したものなどが用いられる。
(substrate)
The substrate used for the organic EL element may be any substrate that does not change when the electrode is formed and the organic layer is formed. For example, glass, plastic, polymer film, silicon substrate, or a laminate of these is used. It is done.
(電極および発光層)
有機EL素子の基本的構造としては、少なくとも陰極が光透過性を有する透明又は半透明である一対の陽極(第1電極)及び陰極(第2電極)からなる電極間に、少なくとも1つの発光層を有する。前記発光層には低分子及び/又は高分子の有機発光材料が用いられる。
(Electrode and light emitting layer)
As a basic structure of the organic EL element, at least one light emitting layer is provided between an electrode composed of a pair of an anode (first electrode) and a cathode (second electrode) in which at least the cathode is transparent or translucent with light transmission. Have For the light emitting layer, a low molecular weight and / or high molecular weight organic light emitting material is used.
有機EL素子において、発光層周辺の構成要素としては、陰極、陽極、発光層以外の層として、陰極と発光層との間に設けるもの、陽極と発光層との間に設けるものが挙げられる。陰極と発光層の間に設けるものとしては、電子注入層、電子輸送層、正孔ブロック層等が挙げられる。 In the organic EL element, examples of components around the light emitting layer include those provided between the cathode and the light emitting layer and those provided between the anode and the light emitting layer as layers other than the cathode, the anode, and the light emitting layer. Examples of the material provided between the cathode and the light emitting layer include an electron injection layer, an electron transport layer, and a hole blocking layer.
上記電子注入層は、陰極からの電子注入効率を改善する機能を有する層であり、上記電子輸送層は、電子注入層又は陰極により近い電子輸送層からの電子注入を改善する機能を有する層である。また、電子注入層若しくは電子輸送層が正孔の輸送を堰き止める機能を有する場合には、これらの層を正孔ブロック層と称することがある。正孔の輸送を堰き止める機能を有することは、例えば、ホール電流のみを流す素子を作製し、その電流値の減少で堰き止める効果を確認することが可能である。 The electron injection layer is a layer having a function of improving electron injection efficiency from the cathode, and the electron transport layer is a layer having a function of improving electron injection from the electron injection layer or the electron transport layer closer to the cathode. is there. When the electron injection layer or the electron transport layer has a function of blocking hole transport, these layers may be referred to as a hole blocking layer. Having the function of blocking hole transport makes it possible, for example, to produce an element that allows only hole current to flow, and confirm the blocking effect by reducing the current value.
陽極と発光層との間に設けるものとしては、正孔注入層・正孔輸送層、電子ブロック層等が挙げられる。 Examples of what is provided between the anode and the light emitting layer include a hole injection layer, a hole transport layer, and an electron block layer.
正孔注入層は、陰極からの正孔注入効率を改善する機能を有する層であり、正孔輸送層とは、正孔注入層又は陽極により近い正孔輸送層からの正孔注入を改善する機能を有する層である。また、正孔注入層、又は正孔輸送層が電子の輸送を堰き止める機能を有する場合には、これらの層を電子ブロック層と称することがある。電子の輸送を堰き止める機能を有することは、例えば、電子電流のみを流す素子を作製し、その電流値の減少で堰き止める効果を確認することが可能である。 The hole injection layer is a layer having a function of improving the hole injection efficiency from the cathode, and the hole transport layer improves the hole injection from the hole injection layer or the hole transport layer closer to the anode. This is a functional layer. When the hole injection layer or the hole transport layer has a function of blocking electron transport, these layers may be referred to as an electron block layer. Having the function of blocking electron transport makes it possible, for example, to manufacture an element that allows only electron current to flow, and confirm the blocking effect by reducing the current value.
上記のような発光層周辺の種々組み合わせ構成としては、陽極と発光層との間に正孔輸送層を設けた構成、陰極と発光層との間に電子輸送層を設けた構成、陰極と発光層との間に電子輸送層を設け、かつ陽極と発光層との間に正孔輸送層を設けた構成等が挙げられる。例えば、具体的には、以下のa)〜d)の構造が例示される。
a)陽極/発光層/陰極
b)陽極/正孔輸送層/発光層/陰極
c)陽極/発光層/電子輸送層/陰極
d)陽極/正孔輸送層/発光層/電子輸送層/陰極
(ここで、/は各層が隣接して積層されていることを示す。以下同じ。)
Various combinations around the light emitting layer as described above include a structure in which a hole transport layer is provided between the anode and the light emitting layer, a structure in which an electron transport layer is provided between the cathode and the light emitting layer, and a cathode and light emission. Examples include a configuration in which an electron transport layer is provided between the layers and a hole transport layer is provided between the anode and the light emitting layer. For example, the following structures a) to d) are specifically exemplified.
a) Anode / light emitting layer / cathode b) Anode / hole transport layer / light emitting layer / cathode c) Anode / light emitting layer / electron transport layer / cathode d) Anode / hole transport layer / light emitting layer / electron transport layer / cathode (Here, / indicates that each layer is laminated adjacently. The same shall apply hereinafter.)
ここで、先述したように、発光層とは発光する機能を有する層であり、正孔輸送層とは正孔を輸送する機能を有する層であり、電子輸送層とは電子を輸送する機能を有する層である。なお、電子輸送層と正孔輸送層を総称して電荷輸送層と呼ぶ。発光層、正孔輸送層、電子輸送層は、それぞれ独立に2層以上用いてもよい。また、電極に隣接して設けた電荷輸送層のうち、電極からの電荷注入効率を改善する機能を有し、素子の駆動電圧を下げる効果を有するものは、特に電荷注入層(正孔注入層、電子注入層)と一般に呼ばれることがある。 Here, as described above, the light emitting layer is a layer having a function of emitting light, the hole transporting layer is a layer having a function of transporting holes, and the electron transporting layer has a function of transporting electrons. It is a layer which has. The electron transport layer and the hole transport layer are collectively referred to as a charge transport layer. Two or more light emitting layers, hole transport layers, and electron transport layers may be used independently. Further, among the charge transport layers provided adjacent to the electrodes, those having a function of improving the charge injection efficiency from the electrodes and having the effect of lowering the driving voltage of the element are particularly charge injection layers (hole injection layers). , An electron injection layer).
さらに、電極との密着性向上や電極からの電荷注入の改善のために、電極に隣接して前記の電荷注入層又は膜厚2nm以下の絶縁層を設けてもよく、また、界面の密着性向上や混合の防止等のために電荷輸送層や発光層の界面に薄いバッファー層を挿入してもよい。積層する層の順番や数、及び各層の厚さについては、発光効率や素子寿命を勘案して適宜用いることができる。 Furthermore, in order to improve the adhesion with the electrode or the improvement of charge injection from the electrode, the charge injection layer or the insulating layer having a thickness of 2 nm or less may be provided adjacent to the electrode, and the adhesion at the interface may be increased. In order to improve or prevent mixing, a thin buffer layer may be inserted at the interface between the charge transport layer and the light emitting layer. The order and number of layers to be laminated, and the thickness of each layer can be appropriately used in consideration of light emission efficiency and element lifetime.
また、電荷注入層(電子注入層、正孔注入層)を設けた有機EL素子としては、陰極に隣接して電荷注入層を設けた有機EL素子、陽極に隣接して電荷注入層を設けた有機EL素子が挙げられる。例えば、具体的には、以下のe)〜p)の構造が挙げられる。
e)陽極/電荷注入層/発光層/陰極
f)陽極/発光層/電荷注入層/陰極
g)陽極/電荷注入層/発光層/電荷注入層/陰極
h)陽極/電荷注入層/正孔輸送層/発光層/陰極
i)陽極/正孔輸送層/発光層/電荷注入層/陰極
j)陽極/電荷注入層/正孔輸送層/発光層/電荷注入層/陰極
k)陽極/電荷注入層/発光層/電荷輸送層/陰極
l)陽極/発光層/電子輸送層/電荷注入層/陰極
m)陽極/電荷注入層/発光層/電子輸送層/電荷注入層/陰極
n)陽極/電荷注入層/正孔輸送層/発光層/電荷輸送層/陰極
o)陽極/正孔輸送層/発光層/電子輸送層/電荷注入層/陰極
p)陽極/電荷注入層/正孔輸送層/発光層/電子輸送層/電荷注入層/陰極
Moreover, as an organic EL element provided with a charge injection layer (electron injection layer, hole injection layer), an organic EL element provided with a charge injection layer adjacent to the cathode, and a charge injection layer provided adjacent to the anode. An organic EL element is mentioned. For example, the following structures e) to p) are specifically mentioned.
e) Anode / charge injection layer / light emitting layer / cathode f) Anode / light emitting layer / charge injection layer / cathode g) Anode / charge injection layer / light emitting layer / charge injection layer / cathode h) Anode / charge injection layer / hole Transport layer / light emitting layer / cathode i) anode / hole transport layer / light emitting layer / charge injection layer / cathode j) anode / charge injection layer / hole transport layer / light emitting layer / charge injection layer / cathode k) anode / charge Injection layer / light emitting layer / charge transport layer / cathode l) anode / light emitting layer / electron transport layer / charge injection layer / cathode m) anode / charge injection layer / light emitting layer / electron transport layer / charge injection layer / cathode n) anode / Charge injection layer / hole transport layer / light emitting layer / charge transport layer / cathode o) anode / hole transport layer / light emitting layer / electron transport layer / charge injection layer / cathode p) anode / charge injection layer / hole transport Layer / light emitting layer / electron transport layer / charge injection layer / cathode
(陽極)
上記陽極には、たとえば透明電極または半透明電極として、電気伝導度の高い金属酸化物、金属硫化物や金属の薄膜を用いることができ、透過率が高いものが好適に利用でき、用いる有機層により適宜、選択して用いる。具体的には、酸化インジウム、酸化亜鉛、酸化スズ、およびそれらの複合体であるインジウム・スズ・オキサイド(ITO)、インジウム・亜鉛・オキサイド等からなる導電性ガラスを用いて作製された膜(NESAなど)や、金、白金、銀、銅等が用いられ、ITO、インジウム・亜鉛・オキサイド、酸化スズが好ましい。作製方法としては、真空蒸着法、スパッタリング法、イオンプレーティング法、メッキ法等が挙げられる。また、該陽極として、ポリアニリンもしくはその誘導体、ポリチオフェンもしくはその誘導体などの有機の透明導電膜を用いてもよい。
(anode)
For the anode, for example, as a transparent electrode or a semitransparent electrode, a metal oxide, metal sulfide or metal thin film with high electrical conductivity can be used, and a high transmittance can be suitably used. Are appropriately selected and used. Specifically, indium oxide, zinc oxide, tin oxide, and a composite film made of conductive glass made of indium / tin / oxide (ITO), indium / zinc / oxide, etc. (NESA) Etc.), gold, platinum, silver, copper and the like are used, and ITO, indium / zinc / oxide, and tin oxide are preferable. Examples of the production method include a vacuum deposition method, a sputtering method, an ion plating method, a plating method, and the like. Further, an organic transparent conductive film such as polyaniline or a derivative thereof, polythiophene or a derivative thereof may be used as the anode.
陽極の膜厚は、光の透過性と電気伝導度とを考慮して、適宜選択することができるが、例えば10nm〜10μmであり、好ましくは20nm〜1μmであり、さらに好ましくは50nm〜500nmである。 The film thickness of the anode can be appropriately selected in consideration of light transmittance and electrical conductivity, and is, for example, 10 nm to 10 μm, preferably 20 nm to 1 μm, more preferably 50 nm to 500 nm. is there.
(正孔注入層)
正孔注入層は、上述のように、陽極と正孔輸送層との間、または陽極と発光層との間に設けることができる。正孔注入層を形成する材料としては、フェニルアミン系、スターバースト型アミン系、フタロシアニン系、酸化バナジウム、酸化モリブデン、酸化ルテニウム、酸化アルミニウム等の酸化物、アモルファスカーボン、ポリアニリン、ポリチオフェン誘導体等が挙げられる。
(Hole injection layer)
As described above, the hole injection layer can be provided between the anode and the hole transport layer or between the anode and the light emitting layer. Materials for forming the hole injection layer include phenylamine, starburst amine, phthalocyanine, vanadium oxide, molybdenum oxide, ruthenium oxide, aluminum oxide and other oxides, amorphous carbon, polyaniline, polythiophene derivatives, etc. It is done.
(正孔輸送層)
正孔輸送層を構成する材料としては、ポリビニルカルバゾール若しくはその誘導体、ポリシラン若しくはその誘導体、側鎖若しくは主鎖に芳香族アミンを有するポリシロキサン誘導体、ピラゾリン誘導体、アリールアミン誘導体、スチルベン誘導体、トリフェニルジアミン誘導体、ポリアニリン若しくはその誘導体、ポリチオフェン若しくはその誘導体、ポリアリールアミン若しくはその誘導体、ポリピロール若しくはその誘導体、ポリ(p−フェニレンビニレン)若しくはその誘導体、又はポリ(2,5−チエニレンビニレン)若しくはその誘導体などが例示される。
(Hole transport layer)
Materials constituting the hole transport layer include polyvinyl carbazole or derivatives thereof, polysilane or derivatives thereof, polysiloxane derivatives having aromatic amines in the side chain or main chain, pyrazoline derivatives, arylamine derivatives, stilbene derivatives, triphenyldiamine. Derivatives, polyaniline or derivatives thereof, polythiophene or derivatives thereof, polyarylamine or derivatives thereof, polypyrrole or derivatives thereof, poly (p-phenylene vinylene) or derivatives thereof, or poly (2,5-thienylene vinylene) or derivatives thereof, etc. Is exemplified.
これらの中で、正孔輸送層に用いる正孔輸送材料として、ポリビニルカルバゾール若しくはその誘導体、ポリシラン若しくはその誘導体、側鎖若しくは主鎖に芳香族アミン化合物基を有するポリシロキサン誘導体、ポリアニリン若しくはその誘導体、ポリチオフェン若しくはその誘導体、ポリアリールアミン若しくはその誘導体、ポリ(p−フェニレンビニレン)若しくはその誘導体、又はポリ(2,5−チエニレンビニレン)若しくはその誘導体等の高分子正孔輸送材料が好ましく、さらに好ましくはポリビニルカルバゾール若しくはその誘導体、ポリシラン若しくはその誘導体、側鎖若しくは主鎖に芳香族アミンを有するポリシロキサン誘導体である。低分子の正孔輸送材料の場合には、高分子バインダーに分散させて用いることが好ましい。 Among these, as a hole transport material used for the hole transport layer, polyvinyl carbazole or a derivative thereof, polysilane or a derivative thereof, a polysiloxane derivative having an aromatic amine compound group in a side chain or a main chain, polyaniline or a derivative thereof, Polymeric hole transport materials such as polythiophene or derivatives thereof, polyarylamine or derivatives thereof, poly (p-phenylene vinylene) or derivatives thereof, or poly (2,5-thienylene vinylene) or derivatives thereof are preferred, and more preferred Is polyvinyl carbazole or a derivative thereof, polysilane or a derivative thereof, and a polysiloxane derivative having an aromatic amine in a side chain or a main chain. In the case of a low-molecular hole transport material, it is preferably used by being dispersed in a polymer binder.
(発光層)
発光層は、本発明においては有機発光層であり、通常、主として蛍光またはりん光を発光する有機物(低分子化合物および高分子化合物)を有する。なお、さらにドーパント材料を含んでいてもよい。本発明において用いることができる発光層を形成する材料としては、例えば、以下のものが挙げられる。
(Light emitting layer)
In the present invention, the light emitting layer is an organic light emitting layer, and usually has organic substances (low molecular compounds and high molecular compounds) that mainly emit fluorescence or phosphorescence. Further, a dopant material may be further included. Examples of the material for forming the light emitting layer that can be used in the present invention include the following.
(発光層形成材料1:色素系材料)
色素系材料としては、例えば、シクロペンダミン誘導体、テトラフェニルブタジエン誘導体化合物、トリフェニルアミン誘導体、オキサジアゾール誘導体、ピラゾロキノリン誘導体、ジスチリルベンゼン誘導体、ジスチリルアリーレン誘導体、ピロール誘導体、チオフェン環化合物、ピリジン環化合物、ペリノン誘導体、ペリレン誘導体、オリゴチオフェン誘導体、トリフマニルアミン誘導体、オキサジアゾールダイマー、ピラゾリンダイマーなどが挙げられる。
(Light-emitting layer forming material 1: dye-based material)
Examples of dye-based materials include cyclopentamine derivatives, tetraphenylbutadiene derivative compounds, triphenylamine derivatives, oxadiazole derivatives, pyrazoloquinoline derivatives, distyrylbenzene derivatives, distyrylarylene derivatives, pyrrole derivatives, thiophene ring compounds. Pyridine ring compounds, perinone derivatives, perylene derivatives, oligothiophene derivatives, trifumanylamine derivatives, oxadiazole dimers, pyrazoline dimers, and the like.
(発光層形成材料2:金属錯体系材料)
金属錯体系材料としては、例えば、イリジウム錯体、白金錯体等の三重項励起状態からの発光を有する金属錯体、アルミキノリノール錯体、ベンゾキノリノールベリリウム錯体、ベンゾオキサゾリル亜鉛錯体、ベンゾチアゾール亜鉛錯体、アゾメチル亜鉛錯体、ポルフィリン亜鉛錯体、ユーロピウム錯体など、中心金属に、Al、Zn、BeなどまたはTb、Eu、Dyなどの希土類金属を有し、配位子にオキサジアゾール、チアジアゾール、フェニルピリジン、フェニルベンゾイミダゾール、キノリン構造などを有する金属錯体などを挙げることができる。
(Light emitting layer forming material 2: metal complex material)
Examples of the metal complex material include metal complexes that emit light from triplet excited states such as iridium complexes and platinum complexes, aluminum quinolinol complexes, benzoquinolinol beryllium complexes, benzoxazolyl zinc complexes, benzothiazole zinc complexes, azomethyls. Zinc complex, porphyrin zinc complex, europium complex, etc., which has Al, Zn, Be or the like as the central metal or rare earth metal such as Tb, Eu, or Dy, and the ligand is oxadiazole, thiadiazole, phenylpyridine, phenylbenzo Examples thereof include metal complexes having an imidazole or quinoline structure.
(発光層形成材料3:高分子系材料)
高分子系材料としては、ポリパラフェニレンビニレン誘導体、ポリチオフェン誘導体、ポリパラフェニレン誘導体、ポリシラン誘導体、ポリアセチレン誘導体、ポリフルオレン誘導体、ポリビニルカルバゾール誘導体、上記色素体や金属錯体系発光材料を高分子化したものなどが挙げられる。
(Light-emitting layer forming material 3: polymer material)
Polymeric materials include polyparaphenylene vinylene derivatives, polythiophene derivatives, polyparaphenylene derivatives, polysilane derivatives, polyacetylene derivatives, polyfluorene derivatives, polyvinylcarbazole derivatives, and polymerized chromophores and metal complex light emitting materials. Etc.
上記発光層形成材料のうち青色に発光する材料としては、ジスチリルアリーレン誘導体、オキサジアゾール誘導体、およびそれらの重合体、ポリビニルカルバゾール誘導体、ポリパラフェニレン誘導体、ポリフルオレン誘導体などを挙げることができる。なかでも高分子材料のポリビニルカルバゾール誘導体、ポリパラフェニレン誘導体やポリフルオレン誘導体などが好ましい。 Examples of the material that emits blue light among the light emitting layer forming materials include distyrylarylene derivatives, oxadiazole derivatives, and polymers thereof, polyvinylcarbazole derivatives, polyparaphenylene derivatives, and polyfluorene derivatives. Of these, polymer materials such as polyvinyl carbazole derivatives, polyparaphenylene derivatives, and polyfluorene derivatives are preferred.
また、上記発光層形成材料のうち緑色に発光する材料としては、キナクリドン誘導体、クマリン誘導体、およびそれらの重合体、ポリパラフェニレンビニレン誘導体、ポリフルオレン誘導体などを挙げることができる。なかでも高分子材料のポリパラフェニレンビニレン誘導体、ポリフルオレン誘導体などが好ましい。 Examples of the light emitting layer forming material that emits green light include quinacridone derivatives, coumarin derivatives, polymers thereof, polyparaphenylene vinylene derivatives, and polyfluorene derivatives. Of these, polymer materials such as polyparaphenylene vinylene derivatives and polyfluorene derivatives are preferred.
また、上記発光層形成材料のうち赤色に発光する材料としては、クマリン誘導体、チオフェン環化合物、およびそれらの重合体、ポリパラフェニレンビニレン誘導体、ポリチオフェン誘導体、ポリフルオレン誘導体などを挙げることができる。なかでも高分子材料のポリパラフェニレンビニレン誘導体、ポリチオフェン誘導体、ポリフルオレン誘導体などが好ましい。 Examples of the material that emits red light among the light emitting layer forming materials include coumarin derivatives, thiophene ring compounds, and polymers thereof, polyparaphenylene vinylene derivatives, polythiophene derivatives, and polyfluorene derivatives. Among these, polymer materials such as polyparaphenylene vinylene derivatives, polythiophene derivatives, and polyfluorene derivatives are preferable.
(発光層形成材料4:ドーパント材料)
発光層中に発光効率の向上や発光波長を変化させるなどの目的で、ドーパントを添加することができる。このようなドーパントとしては、例えば、ペリレン誘導体、クマリン誘導体、ルブレン誘導体、キナクリドン誘導体、スクアリウム誘導体、ポルフィリン誘導体、スチリル系色素、テトラセン誘導体、ピラゾロン誘導体、デカシクレン、フェノキサゾンなどを挙げることができる。
(Light-emitting layer forming material 4: dopant material)
A dopant can be added to the light emitting layer for the purpose of improving the light emission efficiency and changing the light emission wavelength. Examples of such dopants include perylene derivatives, coumarin derivatives, rubrene derivatives, quinacridone derivatives, squalium derivatives, porphyrin derivatives, styryl dyes, tetracene derivatives, pyrazolone derivatives, decacyclene, phenoxazone, and the like.
(電子輸送層)
電子輸送層を形成する材料としては、公知のものが使用でき、オキサジアゾール誘導体、アントラキノジメタン若しくはその誘導体、ベンゾキノン若しくはその誘導体、ナフトキノン若しくはその誘導体、アントラキノン若しくはその誘導体、テトラシアノアンスラキノジメタン若しくはその誘導体、フルオレノン誘導体、ジフェニルジシアノエチレン若しくはその誘導体、ジフェノキノン誘導体、又は8−ヒドロキシキノリン若しくはその誘導体の金属錯体、ポリキノリン若しくはその誘導体、ポリキノキサリン若しくはその誘導体、ポリフルオレン若しくはその誘導体等が例示される。
(Electron transport layer)
As the material for forming the electron transport layer, known materials can be used, such as oxadiazole derivatives, anthraquinodimethane or derivatives thereof, benzoquinone or derivatives thereof, naphthoquinone or derivatives thereof, anthraquinones or derivatives thereof, tetracyanoanthraquinodi. Examples include methane or derivatives thereof, fluorenone derivatives, diphenyldicyanoethylene or derivatives thereof, diphenoquinone derivatives, or metal complexes of 8-hydroxyquinoline or derivatives thereof, polyquinoline or derivatives thereof, polyquinoxaline or derivatives thereof, polyfluorene or derivatives thereof, and the like. The
これらのうち、オキサジアゾール誘導体、ベンゾキノン若しくはその誘導体、アントラキノン若しくはその誘導体、又は8−ヒドロキシキノリン若しくはその誘導体の金属錯体、ポリキノリン若しくはその誘導体、ポリキノキサリン若しくはその誘導体、ポリフルオレン若しくはその誘導体が好ましく、2−(4−ビフェニリル)−5−(4−t−ブチルフェニル)−1,3,4−オキサジアゾール、ベンゾキノン、アントラキノン、トリス(8−キノリノール)アルミニウム、ポリキノリンがさらに好ましい。 Of these, oxadiazole derivatives, benzoquinone or derivatives thereof, anthraquinones or derivatives thereof, or metal complexes of 8-hydroxyquinoline or derivatives thereof, polyquinoline or derivatives thereof, polyquinoxaline or derivatives thereof, polyfluorene or derivatives thereof are preferred, 2- (4-biphenylyl) -5- (4-t-butylphenyl) -1,3,4-oxadiazole, benzoquinone, anthraquinone, tris (8-quinolinol) aluminum, and polyquinoline are more preferable.
(電子注入層)
電子注入層は、先に述べたように、電子輸送層と陰極との間、または発光層と陰極との間に設けられる。電子注入層としては、発光層の種類に応じて、Ca層の単層構造からなる電子注入層、または、Caを除いた周期律表IA族とIIA族の金属であり且つ仕事関数が1.5〜3.0eVの金属およびその金属の酸化物、ハロゲン化物および炭酸化物の何れか1種または2種以上で形成された層とCa層との積層構造からなる電子注入層を設けることができる。仕事関数が1.5〜3.0eVの、周期律表IA族の金属またはその酸化物、ハロゲン化物、炭酸化物の例としては、リチウム、フッ化リチウム、酸化ナトリウム、酸化リチウム、炭酸リチウム等が挙げられる。また、仕事関数が1.5〜3.0eVの、Caを除いた周期律表IIA族の金属またはその酸化物、ハロゲン化物、炭酸化物の例としては、ストロンチウム、酸化マグネシウム、フッ化マグネシウム、フッ化ストロンチウム、フッ化バリウム、酸化ストロンチウム、炭酸マグネシウム等が挙げられる。
(Electron injection layer)
As described above, the electron injection layer is provided between the electron transport layer and the cathode, or between the light emitting layer and the cathode. Depending on the type of the light emitting layer, the electron injection layer is an electron injection layer having a single layer structure of Ca layer, or a metal of group IA and IIA of the periodic table excluding Ca and having a work function of 1. It is possible to provide an electron injection layer having a laminated structure of a Ca layer and a layer formed of one or more of 5-3.0 eV metal and oxides, halides and carbonates of the metal. . Examples of metals of Group IA of the periodic table having a work function of 1.5 to 3.0 eV or oxides, halides, and carbonates thereof include lithium, lithium fluoride, sodium oxide, lithium oxide, lithium carbonate, and the like. Can be mentioned. Examples of metals of Group IIA of the periodic table excluding Ca having a work function of 1.5 to 3.0 eV or oxides, halides and carbonates thereof include strontium, magnesium oxide, magnesium fluoride, fluorine Strontium fluoride, barium fluoride, strontium oxide, magnesium carbonate and the like.
(陰極)
陰極には、透明電極、または、半透明電極として、金属、グラファイトまたはグラファイト層間化合物、ZnO(亜鉛オキサイド)等の無機半導体、ITO(インジウム・スズ・オキサイド)やIZO(インジウム・亜鉛・オキサイド)などの導電性透明電極、酸化ストロンチウム、酸化バリウム等の金属酸化物などが挙げられる。金属としては、例えば、リチウム、ナトリウム、カリウム、ルビジウム、セシウム等のアルカリ金属;ベリリウム、マグネシウム、カルシウム、ストロンチウム、バリウム等のアルカリ土類金属、金、銀、白金、銅、マンガン、チタン、コバルト、ニッケル、タングステン等の遷移金属;錫、アルミニウム、スカンジウム、バナジウム、亜鉛、イットリウム、インジウム、セリウム、サマリウム、ユーロピウム、テルビウム、イッテルビウム;およびそれらのうち2つ以上の合金等があげられる。合金の例としては、マグネシウム−銀合金、マグネシウム−インジウム合金、マグネシウム−アルミニウム合金、インジウム−銀合金、リチウム−アルミニウム合金、リチウム−マグネシウム合金、リチウム−インジウム合金、カルシウム−アルミニウム合金などが挙げられる。また、陰極を2層以上の積層構造としてもよい。この例としては、上記の金属、金属酸化物、フッ化物、これらの合金と、アルミニウム、銀、クロム等の金属との積層構造などが挙げられる。
(cathode)
For the cathode, as transparent or semi-transparent electrode, metal, graphite or graphite intercalation compound, inorganic semiconductor such as ZnO (zinc oxide), ITO (indium tin oxide), IZO (indium zinc zinc oxide), etc. And conductive oxides such as strontium oxide and barium oxide. Examples of the metal include alkali metals such as lithium, sodium, potassium, rubidium and cesium; alkaline earth metals such as beryllium, magnesium, calcium, strontium and barium, gold, silver, platinum, copper, manganese, titanium, cobalt, Transition metals such as nickel and tungsten; tin, aluminum, scandium, vanadium, zinc, yttrium, indium, cerium, samarium, europium, terbium, ytterbium; and alloys of two or more thereof. Examples of the alloy include magnesium-silver alloy, magnesium-indium alloy, magnesium-aluminum alloy, indium-silver alloy, lithium-aluminum alloy, lithium-magnesium alloy, lithium-indium alloy, calcium-aluminum alloy, and the like. The cathode may have a laminated structure of two or more layers. Examples of this include a laminated structure of the above metals, metal oxides, fluorides, alloys thereof, and metals such as aluminum, silver, and chromium.
以下に本発明の実施例を説明する。以下に示す実施例は、本発明を説明するための好適な例示であり、なんら本発明を限定するものではない。 Examples of the present invention will be described below. The following examples are preferred examples for explaining the present invention, and do not limit the present invention.
なお、以下の実施例は、発光素子が有機EL素子である場合の例示である。この有機EL素子において、先に説明したように、電極要素として、最も簡易には、陽極、陰極のみから構成され、これらが発光層の両面に積層されて発光部が形成される場合もあれば、陽極、陰極に加えて、その他の電極要素である正孔注入層、正孔輸送層、電子輸送層、電子注入層を様々に組み合わせて、それらを発光層上に積層して発光部が形成される場合がある。以下の実施例では、発光層の両側に形成される電極要素については、簡易に記載しているが、どのような構成の電極要素が発光層に積層された場合でも同様に適用できることは明らかである。すなわち、発光層に様々な組み合わせの電極要素が積層された後、その上に多層封止膜が積層される。本発明において、発光層が多層封止膜によって封止されるとは、前述の構成を意味している。 In addition, a following example is an illustration in case a light emitting element is an organic EL element. In this organic EL element, as described above, the electrode element is most simply composed of only an anode and a cathode, and these may be laminated on both sides of the light emitting layer to form a light emitting part. In addition to the anode and cathode, other electrode elements such as hole injection layer, hole transport layer, electron transport layer, and electron injection layer are combined in various ways and stacked on the light emitting layer to form a light emitting part. May be. In the following examples, the electrode elements formed on both sides of the light emitting layer are simply described, but it is obvious that the present invention can be similarly applied to any configuration of electrode elements stacked on the light emitting layer. is there. That is, after various combinations of electrode elements are laminated on the light emitting layer, a multilayer sealing film is laminated thereon. In the present invention, the light emitting layer is sealed with the multilayer sealing film means the above-described configuration.
(実施例1)
(有機EL素子の作製方法)
スパッタ法にて成膜された約150nmの膜厚のITOがパターニングされたガラス基板を、有機溶媒、アルカリ洗剤、超純水で洗浄し、乾かした基板に、UV−O3装置(テクノビジョン株式会社製、商品名「モデル312 UV−O3 クリーニングシステム」)にてUV−O3処理(親液化処理)を行う。
Example 1
(Method for producing organic EL element)
A glass substrate on which ITO with a thickness of about 150 nm formed by sputtering is patterned is washed with an organic solvent, an alkaline detergent, and ultrapure water, and then dried on a UV-O 3 apparatus (Technovision Co., Ltd.). The UV-O 3 treatment (lyophilic treatment) is performed using a product name “Model 312 UV-O 3 Cleaning System” manufactured by the company.
基板のITO面側にポリ(3,4)エチレンジオキシチオフェン/ポリスチレンスルフォン酸(HCスタルクビーテック社製、商品名「Bytron P TP AI 4083」)の懸濁液を0.5μm径のフィルターで濾過して、懸濁液をスピンコートにより、70nmの厚みで成膜して、大気中においてホットプレート上で200℃で10分間乾燥する。 A suspension of poly (3,4) ethylenedioxythiophene / polystyrene sulfonic acid (trade name “Bytron P TP AI 4083” manufactured by HC Starck B-Tech Co., Ltd.) is filtered through a 0.5 μm filter on the ITO side of the substrate. Then, the suspension is formed into a film with a thickness of 70 nm by spin coating, and dried on the hot plate at 200 ° C. for 10 minutes in the air.
次いで、これにキシレンとアニソールを1:1に混合した溶媒を用いて高分子有機発光材料(サイメイション社製、商品名「ルメーションGP1300」)の1.5質量%の溶液を作製する。この溶液を先に「Bytron P」を成膜した基板上にスピンコートを用い、80nmの膜厚に成膜する。 Next, a 1.5% by mass solution of a polymer organic light-emitting material (trade name “Lumation GP1300” manufactured by Cymation Co., Ltd.) is prepared using a solvent in which xylene and anisole are mixed 1: 1. This solution is deposited to a thickness of 80 nm on a substrate on which “Bytron P” has been deposited, using spin coating.
取り出し電極部分や封止エリア部分の発光層を除去し、真空チャンバーに導入し、加熱室に移する(以後、真空中あるいは窒素中でプロセスを行い、プロセス中の素子が大気にさらされることはない。)。次に、真空中(真空度は1×10−4Pa以下)温度約100℃で60分間加熱する。 The light emitting layer in the extraction electrode part and the sealing area part is removed, introduced into a vacuum chamber, and transferred to a heating chamber (hereinafter, the process in vacuum or nitrogen is performed, and the element in the process is exposed to the atmosphere. Absent.). Next, heating is performed at a temperature of about 100 ° C. for 60 minutes in a vacuum (degree of vacuum is 1 × 10 −4 Pa or less).
その後、蒸着チャンバーに基板を移し、陰極マスクとアライメントし、発光部および取り出し電極部に陰極が成膜されるように蒸着する。陰極は、抵抗加熱法にてBa金属を加熱し、蒸着速度約2Å/sec、膜厚50Åにて、蒸着、電子ビーム蒸着法を用いて、Alを蒸着速度約2Å/sec、膜厚1500Åにて蒸着する。 Thereafter, the substrate is transferred to the vapor deposition chamber, aligned with the cathode mask, and vapor deposited so that the cathode is formed on the light emitting portion and the extraction electrode portion. For the cathode, Ba metal is heated by resistance heating, the deposition rate is about 2 mm / sec, and the film thickness is 50 mm. Vapor deposition.
(有機/無機封止膜の形成)
素子作成後、蒸着室から大気には暴露せず、膜封止装置(米国VITEX社製、商品名「Guardian200」)に基板を移す。基板にマスクをアライメントし、セットする。次いで、無機成膜室に基板を移し、スパッタ法にて第1の無機層である酸化アルミニウムの成膜を行う。純度5NのAl金属ターゲットを用いて、アルゴンガスと酸素ガスを導入し、酸化アルミニウムの膜を基板に成膜する。約60nmの厚みで透明で平坦な酸化アルミニウム膜が得られる。
(Formation of organic / inorganic sealing film)
After the device is created, the substrate is transferred to a film sealing device (trade name “Guardian 200” manufactured by VITEX, USA) without being exposed to the atmosphere from the vapor deposition chamber. Align and set the mask on the substrate. Next, the substrate is moved to the inorganic film formation chamber, and aluminum oxide which is the first inorganic layer is formed by sputtering. Argon gas and oxygen gas are introduced using an Al metal target having a purity of 5N, and an aluminum oxide film is formed on the substrate. A transparent and flat aluminum oxide film having a thickness of about 60 nm is obtained.
第1の無機層成膜後、無機層用マスクを取り外し、有機層用マスクに交換し、有機成膜室に移す。有機モノマー材料(VITEX社製、商品名「Vitex Barix Resin System monomer material(Vitex701)」)に、屈折率調整材料として、平均粒径0.25μmの酸化チタン微粒子(石原産業社製、商品名「CR−50」)3質量%添加したものを気化器に導入し、有機モノマーを気化させ、スリットノズルから前記屈折率調整材料が混在している有機モノマー材料の蒸気を噴き出させ、ノズル上を基板が一定の速度で通過することで均一な厚みになるように、モノマーを基板に付着させる。次に、モノマーが付着した基板にUV光を照射してモノマーを架橋し硬化させ、第1の有機層が形成する。得られた膜は透明で平坦な膜であり、膜厚は約1.3μmとなる。 After forming the first inorganic layer, the inorganic layer mask is removed, replaced with an organic layer mask, and transferred to the organic film forming chamber. Titanium oxide fine particles (Ishihara Sangyo Co., Ltd., product name “CR”) having an average particle size of 0.25 μm as an organic monomer material (made by VITEX, trade name “Vitex Barix Resin System monomer material (Vitex 701)”). -50 ") 3% by mass added is introduced into the vaporizer, the organic monomer is vaporized, the vapor of the organic monomer material mixed with the refractive index adjusting material is ejected from the slit nozzle, and the substrate is placed on the nozzle The monomer is attached to the substrate so that the film has a uniform thickness by passing at a constant speed. Next, the substrate to which the monomer is attached is irradiated with UV light to crosslink and cure the monomer, thereby forming a first organic layer. The obtained film is a transparent and flat film, and the film thickness is about 1.3 μm.
第1の有機層を形成後、無機成膜室に基板を移し、アルゴンと酸素を導入し、スパッタ法にて第2の無機層である酸化アルミニウムの成膜を行う。約40nmの厚みの透明で平坦な酸化アルミニウム膜を成膜する。約40nmの厚みの透明で平坦な酸化アルミニウム膜が成膜される。第2の無機層成膜後、第1の有機層と同様にして第2の有機層を成膜し、第2の有機層成膜後、第2の無機層と同様にして第3の無機層を形成する。同様に第3の有機層、第4の無機層を形成し、多層封止膜を得る。 After forming the first organic layer, the substrate is moved to the inorganic film formation chamber, and argon and oxygen are introduced, and the second inorganic layer, aluminum oxide, is formed by sputtering. A transparent and flat aluminum oxide film having a thickness of about 40 nm is formed. A transparent and flat aluminum oxide film having a thickness of about 40 nm is formed. After the second inorganic layer is formed, the second organic layer is formed in the same manner as the first organic layer, and after the second organic layer is formed, the third inorganic layer is formed in the same manner as the second inorganic layer. Form a layer. Similarly, a third organic layer and a fourth inorganic layer are formed to obtain a multilayer sealing film.
なお、上記実施例の多層封止膜の構成において、第1の無機層と第2の無機層とが、それぞれ本発明で定義の第1の膜と第2の膜に相当する。同様に、第2の無機層と第3の無機層との関係も、それぞれ本発明で定義の第1の膜と第2の膜に相当し、さらに、第3の無機層と第4の無機層との関係も、それぞれ本発明で定義の第1の膜と第2の膜に相当する。そして、それぞれの無機層の間に屈折率調整層(第1の有機層、第2の有機層、そして第3の有機層)が形成される。 In the configuration of the multilayer sealing film of the above embodiment, the first inorganic layer and the second inorganic layer correspond to the first film and the second film defined in the present invention, respectively. Similarly, the relationship between the second inorganic layer and the third inorganic layer also corresponds to the first film and the second film defined in the present invention, respectively, and further, the third inorganic layer and the fourth inorganic layer The relationship with the layers also corresponds to the first film and the second film defined in the present invention, respectively. Then, a refractive index adjusting layer (a first organic layer, a second organic layer, and a third organic layer) is formed between the respective inorganic layers.
(比較例1)
上記実施例1において有機層を形成する有機モノマー材料に屈折率調整材料(酸化チタン微粒子)を添加しなかったこと以外、上記実施例1と同様にして、有機EL素子を得る。
(Comparative Example 1)
An organic EL element is obtained in the same manner as in Example 1 except that the refractive index adjusting material (titanium oxide fine particles) is not added to the organic monomer material forming the organic layer in Example 1.
(光取り出し効率向上試験)
上記実施例1、比較例1で作製した有機EL素子を積分球(オプテル社製、商品名「有機EL発光特性評価装置」)内に導入し、1mA/cm2の同一電流密度での全光束を比較することにより、比較例の有機EL素子よりも実施例の有機EL素子の光取り出し効率が向上していることが確認できる。
(Light extraction efficiency improvement test)
The organic EL element produced in Example 1 and Comparative Example 1 was introduced into an integrating sphere (trade name “Organic EL Luminescence Characteristic Evaluation Device” manufactured by Optel), and the total luminous flux at the same current density of 1 mA / cm 2. By comparing these, it can be confirmed that the light extraction efficiency of the organic EL element of the example is improved as compared with the organic EL element of the comparative example.
以上のように、本発明にかかる発光素子は、少なくとも一つの有機層を有する多層封止膜によって発光部の光取り出し側が封止されてなる発光素子において、前記多層封止膜の積層中に該多層封止膜の屈折率を調整する少なくとも一つの屈折率調整層を含むことを特徴とする。そして、本発明にかかる発光素子の製造方法は、少なくとも一つの有機層を有する多層封止膜によって発光部の光取り出し側が封止されてなる発光素子の製造方法であって、前記多層封止膜の積層中に該多層封止膜の屈折率を調整する少なくとも一つの屈折率調整層を形成することを特徴とする。 As described above, the light-emitting device according to the present invention is a light-emitting device in which the light extraction side of the light-emitting portion is sealed with a multilayer sealing film having at least one organic layer. It includes at least one refractive index adjusting layer for adjusting the refractive index of the multilayer sealing film. A method for manufacturing a light emitting device according to the present invention is a method for manufacturing a light emitting device in which a light extraction side of a light emitting part is sealed with a multilayer sealing film having at least one organic layer, the multilayer sealing film At least one refractive index adjusting layer for adjusting the refractive index of the multilayer sealing film is formed during the lamination of the multilayer sealing film.
本発明にかかる発光素子は、正面からは透明だが、斜めから見ると、不透明になって、発光素子の正面輝度が向上する。この発光素子における屈折率調整層の形成は、本発明の製造方法により、通常の封止膜形成工程中に行うことができるので、プロセスが簡便であり、光取り出し効率に優れた発光素子を容易に製造することができる。 The light emitting device according to the present invention is transparent from the front, but becomes opaque when viewed from an oblique direction, and the front luminance of the light emitting device is improved. The formation of the refractive index adjusting layer in the light emitting device can be performed during the normal sealing film forming process by the manufacturing method of the present invention, and thus the process is simple and the light emitting device excellent in light extraction efficiency can be easily obtained. Can be manufactured.
このように、本発明に係る発光素子およびその製造方法によれば、発光素子の占有スペースを増大させずに、かつ安価に、光取り出し効率を向上させた発光素子を提供することができる。かかる特徴を有する本発明は、特に有機EL素子における光取り出し効率の向上に適している。 As described above, according to the light emitting device and the method for manufacturing the same according to the present invention, it is possible to provide a light emitting device with improved light extraction efficiency at a low cost without increasing the space occupied by the light emitting device. The present invention having such characteristics is particularly suitable for improving light extraction efficiency in an organic EL element.
Claims (24)
前記多層封止膜の積層中に該多層封止膜の屈折率を調整する少なくとも一つの屈折率調整層を含むことを特徴とする発光素子。 In the light emitting device in which the light extraction side of the light emitting part is sealed by the multilayer sealing film having at least one organic layer,
A light emitting device comprising at least one refractive index adjusting layer for adjusting a refractive index of the multilayer sealing film in the stack of the multilayer sealing films.
前記多層封止膜の積層中に該多層封止膜の屈折率を調整する少なくとも一つの屈折率調整層を形成することを特徴とする発光素子の製造方法。 A method for manufacturing a light emitting device, wherein a light extraction side of a light emitting part is sealed with a multilayer sealing film having at least one organic layer,
A method for manufacturing a light-emitting element, comprising forming at least one refractive index adjusting layer for adjusting a refractive index of the multilayer sealing film during the stacking of the multilayer sealing films.
Priority Applications (3)
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PCT/JP2008/063294 WO2009017028A1 (en) | 2007-07-31 | 2008-07-24 | Light emitting element and method for manufacturing the same |
TW097129061A TW200915910A (en) | 2007-07-31 | 2008-07-31 | Light emitting device and fabricating method thereof |
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KR20130076401A (en) * | 2011-12-28 | 2013-07-08 | 삼성디스플레이 주식회사 | Organic light emitting display apparatus and the method for manufacturing the same |
KR101562922B1 (en) | 2013-10-07 | 2015-10-23 | 한국과학기술원 | Method for manufacturing encapsulation film and electronic device including encapsulation film manucactured thereby |
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TWI456805B (en) * | 2012-01-17 | 2014-10-11 | Univ Nat Central | Led lens |
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JP2006173092A (en) * | 2004-11-16 | 2006-06-29 | Kyocera Corp | Light emitting device |
JP2006164808A (en) * | 2004-12-09 | 2006-06-22 | Hitachi Ltd | Light emitting element, lighting system and display device having it |
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KR101562922B1 (en) | 2013-10-07 | 2015-10-23 | 한국과학기술원 | Method for manufacturing encapsulation film and electronic device including encapsulation film manucactured thereby |
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TW200915910A (en) | 2009-04-01 |
WO2009017028A1 (en) | 2009-02-05 |
JP5570092B2 (en) | 2014-08-13 |
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