JP2009075431A - Optical filter for display, and method for manufacturing the same - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an optical filter for display which is manufactured inexpensively with a high productivity as a whole, and to provide a method for inexpensively manufacturing the optical filter for display. <P>SOLUTION: On one surface of a transparent base material 21 of an electromagnetic wave shielding film, a metal mesh pattern 22 comprising a mesh pattern made of a thin film of an electroconductive metal and a plated layer laminated thereon is formed. An electrode frame 23 is formed around the metal mesh pattern 22 and a laminated film 31 comprising at least a UV absorbing layer 42 and a near IR absorbing layer 41 is laminated on the metal mesh pattern 22 in the electrode frame 23. Onto another surface of the transparent base material 21, a display side of a front glass plate 44 is stuck via an adhesive agent layer 43. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to an optical filter used for various displays such as CRT and PDP (plasma display) and a manufacturing method thereof, and in particular, an optical filter for display manufactured at a low cost by increasing productivity, and an inexpensive optical filter for display. The present invention relates to a manufacturing method.

  In recent years, in displays such as CRTs and PDPs (plasma displays), electromagnetic waves generated from the front of the display adversely affect the human body and malfunction of surrounding electronic devices has become a problem. Along with vividness, countermeasures against the influence of the display on the surroundings are becoming increasingly important.

In particular, in PDPs where demand is increasing as large thin displays, in addition to electromagnetic wave shielding films, near-infrared absorbing films for preventing misoperation of various remote control switches using the near-infrared wavelength region, UV light absorbing film used to prevent near-infrared absorbers used in the near infrared absorbing film from aging, neon light cut film for adjusting color tone in the visible light region, and external light reflected on the surface of the optical filter An antireflection film or the like for preventing intrusion is combined and configured according to a required function.
For example, Patent Document 1 discloses an optical filter for plasma display in which a metal mesh having electromagnetic wave shielding properties, a near-infrared absorber-containing adhesive layer having near-infrared absorption capability, an antireflection layer, and a neon light absorption layer are laminated. Is disclosed.

On the other hand, as PDPs and the like are widely used, there is a demand for products that are cheaper and maintain high quality, and there is a need for optical filters for displays that can be manufactured at low cost with increased productivity.
Conventionally, when a laminated film is produced by laminating a plurality of films, a so-called roll-to-roll is performed by laminating a plurality of types of functional films wound in a roll shape while rewinding them. It is used as one of the solutions which raise productivity to carry out using the continuous production method by a roll.

However, in the optical filter for display, it is necessary to take a ground (earth) from the electromagnetic wave shielding layer in order to exert the electromagnetic wave shielding function, and the entire surface of the electromagnetic wave shielding film is bonded to another functional film. I can't.
In a general optical filter for a PDP display, an electrode frame is arranged on the outer periphery of a mesh pattern of an electromagnetic wave shield, and a grounding (earth) conductor is connected and wired.
For this reason, it is necessary to expose the electrode frame portion without attaching it to another functional film, and various ideas have been made in this regard.

For example, Patent Document 2 discloses a light-transmitting film (functional film having a function of preventing reflection, etc.) in which an electromagnetic wave shielding film and a notch for providing an open portion at a portion corresponding to an electrode frame portion are formed. ) Are bonded by roll-to-roll.
A portion not covered with the light transmission film in the peripheral portion of the electromagnetic wave shielding film is covered with a conductive tape or a conductive resin to substitute for the electrode frame.

Further, in Patent Document 3, an electromagnetic wave shielding film and an optical filter film (functional film having functions such as antireflection) in which a portion facing the electrode frame portion is cut out, as in Patent Document 2, a roll A method of bonding by a to-roll is disclosed.
JP 2004-333743 A JP 2007-080930 A JP 2007-095915 A

In said patent document 2, it is supposed that an etching mesh and a conductive printing mesh can be used as an electromagnetic wave shielding film.
In Patent Document 3, as a method of forming a mesh of an electromagnetic shielding film, (1) a conductive ink printing mesh, (2) a conductive ink or a plating catalyst is applied, and then the mesh pattern is plated by a photolithography method. Etching of a deposited film formed by etching after forming a plating layer on a metal thin film formed by (3) a metal foil etching mesh, (4) sputtering, etc. A metal mesh by a known method such as a mesh can be used.

  However, as a method of forming a mesh pattern of an electromagnetic shielding film, an etching method uses only a small portion that becomes a thin line portion by etching, and it is a resource that dissolves and removes most other metals. It is a problem from the viewpoint of saving. In addition, there is a problem that the cost for treating the waste liquid generated by the etching method increases.

On the other hand, in the electromagnetic wave shielding film having a metal mesh pattern manufactured by various manufacturing methods, there are some defects (defects) scattered on the thin line of the formed metal mesh pattern and the transparent substrate. There is. The occurrence state and cause of the defect differ depending on the metal mesh pattern manufacturing method.
For example, in the case where the metal mesh pattern has a mesh pattern made of a conductive metal thin film and a plating layer electrolessly plated and / or electroplated thereon, in the plating process, dust in the plating tank, etc. If the foreign matter adheres to the fine line of the mesh pattern made of a conductive metal thin film, a part of the mesh pattern may be cut and a defective plating may occur. Or the foreign material defect by the foreign materials, such as the dust in a plating tank adhering on a transparent base material, and being scattered may arise. A foreign matter defect exceeding a certain size and quantity is regarded as a defect from the viewpoint of visibility (not visible) on a high-definition display.

In the manufactured optical filter for display, when a defective part (defect) exceeding the manufacturer's quality inspection standard exists in a part of the metal mesh pattern in the electrode frame which becomes the screen size of the display as a foreign object defect, for example. The optical filter for display is handled as a defective product and cannot be shipped.
Therefore, as in Patent Document 2 and Patent Document 3, in the case of a manufacturing method in which a continuous electromagnetic wave shielding film and a near-infrared absorbing film are bonded, there is a defect in the quality inspection in the manufacturing process of the prior electromagnetic wave shielding film. It has been found that a near-infrared absorbing film using an expensive near-infrared absorbing dye is also bonded to a metal mesh portion of a specific display screen, which has a defect that is eventually discarded. An optical filter will be manufactured.
For this reason, since the product yield does not decrease and the production efficiency does not increase, the display optical filter cannot be manufactured at a low cost.

  The present invention has been made in view of the above circumstances, and it is an object of the present invention to provide an optical filter for display that is highly productive and manufactured at low cost as a whole, and an inexpensive manufacturing method for the optical filter for display.

  In order to solve the above-mentioned problems, the present invention provides a mesh pattern made of a conductive metal thin film according to the screen size of a display and a plating layer on the transparent substrate of the electromagnetic shielding film. A metal mesh pattern is formed, an electrode frame is formed around the metal mesh pattern, and a laminate including at least an ultraviolet absorption layer and a near infrared absorption layer on the metal mesh pattern in the electrode frame Provided is an optical filter for display, in which a film is laminated, and the other surface of the transparent substrate is bonded to the display side of a front glass plate through an adhesive layer.

  Furthermore, on the viewing side of the front glass plate, one or more functional layers selected from the group consisting of a hard coat layer, an antistatic layer, an antireflection layer and an antifouling layer are laminated on one surface of the transparent substrate. And a functional film in which a pressure-sensitive adhesive layer is laminated on the other surface, and the functional film is bonded to the viewing side of the front glass plate via the pressure-sensitive adhesive layer on the other surface. It is preferable that

  The mesh pattern formed of the conductive metal thin film is obtained by either a negative development method in which developed silver develops in an exposed portion or a positive development method in which developed silver develops in an unexposed portion. It is preferable that the developed silver mesh pattern be generated.

  The mesh pattern made of the conductive metal thin film is a deposited film mesh pattern generated by metal deposition, a printed mesh pattern generated by printing a conductive paste ink, and a paste containing an electroless plating catalyst. It is preferable that any one of the printed mesh patterns generated in the above is selected.

  Moreover, this invention provides the display provided with the optical filter for displays in any one of the above-mentioned.

Moreover, this invention is a manufacturing method of the optical filter for displays using the electromagnetic wave shielding film of a roll body, Comprising: At least the following process (1), (2), (3), (4):
(1) On one surface of the transparent substrate, a plurality of mesh patterns made of a conductive metal thin film corresponding to the screen size of the display and a metal mesh pattern in which a plating layer is laminated thereon are arranged, An electrode frame is formed around the metal mesh pattern, an adhesive layer is laminated on the other surface of the transparent substrate, and inspection standards such as the presence or absence of foreign matter in the electrode frame and the presence or absence of a break in the metal mesh A step of producing a roll body of a long electromagnetic shielding film in which a location that has passed is identified,
(2) A step of cutting a long laminated film including at least an ultraviolet absorbing layer and a near infrared absorbing layer with an inner dimension of an electrode frame according to a screen size of a display to produce a single laminated film;
(3) Only when the long electromagnetic shield film supplied by rewinding from the roll body has passed inspection standards such as the presence or absence of foreign matter in the electrode frame and the presence or absence of disconnection of the metal mesh, the electrode frame A step of laminating the laminated film of the single wafer on the metal mesh pattern inside,
(4) After cutting the long electromagnetic shielding film after laminating the single-layer laminated film into the size of each display with the outer dimensions of the electrode frame, the front glass is interposed through the adhesive layer. The process of bonding to the display side of the board,
A method for producing an optical filter for display is provided.

Further, the following steps (5) and (6):
(5) One or more functional layers selected from the group consisting of a hard coat layer, an antistatic layer, an antireflection layer, and an antifouling layer on one surface of a long transparent base material that is a base material for the functional film And laminating the pressure-sensitive adhesive layer on the other surface, then cutting the dimensions according to the display screen size to produce a functional film,
(6) The step of bonding the functional film to the viewing side of the front glass plate through the adhesive layer on the other side,
It is preferable to contain.

  The mesh pattern formed of the conductive metal thin film is obtained by either a negative development method in which developed silver develops in an exposed portion or a positive development method in which developed silver develops in an unexposed portion. It is preferable that the developed silver mesh pattern be generated.

  The mesh pattern formed of the conductive metal thin film is obtained by either a negative development method in which developed silver develops in an exposed portion or a positive development method in which developed silver develops in an unexposed portion. It is preferable that the developed silver mesh pattern be generated.

  The mesh pattern made of the conductive metal thin film is a deposited film mesh pattern generated by metal deposition, a printed mesh pattern generated by printing a conductive paste ink, and a paste containing an electroless plating catalyst. It is preferable that any one of the printed mesh patterns generated in the above is selected.

  According to the present invention, as a method for forming a mesh pattern of an electromagnetic wave shielding film, a mesh pattern made of a conductive metal thin film and a plating layer electrolessly plated and / or electroplated thereon are formed. Compared to an etching method that dissolves and removes most of the metal other than the portion that becomes the thin line pattern of the foil, resources can be saved and the manufacturing can be performed at low cost.

  According to the present invention, in a long electromagnetic shielding film that is supplied by being rewound from a roll body, a specific display screen that has been found to be defective in quality inspection in the production process of the electromagnetic shielding film in advance. For metal mesh parts, it is possible to eliminate the need to attach a sheet of near-infrared absorbing film, so it is economical to save on a sheet of near-infrared absorbing film using an expensive near-infrared absorbing dye. Loss can be reduced.

  Therefore, according to the present invention, it is possible to provide an optical filter for display manufactured with high productivity as a whole at low cost, and an inexpensive manufacturing method of the optical filter for display.

The present invention will be described below with reference to the drawings based on the best mode.
FIG. 1 shows an electromagnetic wave shielding film unwound from a roll body used in the present invention, which is provided with a metal mesh pattern plated on a conductive thin film at a certain interval in the longitudinal direction of a transparent substrate. It is a fragmentary top view which shows an example of arrangement | positioning of an electrode frame and an electric power feeding layer.
FIG. 2 shows a process in which a single-wafer optical functional layer film is bonded to an electromagnetic wave shielding film that is rewound and supplied from a roll body, and then cut to the size of each display by cutting with the outer dimensions of the electrode frame. FIG.

FIG. 3 is a cross-sectional view showing an example of an optical filter for display according to the first embodiment of the present invention.
FIG. 4 is a plan view showing an example of an optical filter for display according to the first embodiment of the present invention.
FIG. 5 is a cross-sectional view showing an example of an optical filter for display according to a second embodiment of the present invention in which a functional film is further bonded.
FIG. 6 is a schematic configuration diagram illustrating an example of an electrolytic plating apparatus.
FIG. 7 is a schematic configuration diagram illustrating an example of an electroless plating apparatus.

  The display optical filter 35 according to the first embodiment shown in FIG. 3 and FIG. 4 has a mesh pattern made of a conductive metal thin film and a plating layer thereon on one surface of the transparent base material 21 of the electromagnetic wave shielding film. A laminated metal mesh pattern 22 is formed, and an electrode frame 23 is formed around the metal mesh pattern 22 and is used for grounding. A laminated film 31 including at least an ultraviolet absorbing layer 42 and a near infrared absorbing layer 41 is laminated on the metal mesh pattern 22 in the electrode frame 23, and an adhesive layer 43 is provided on the other surface of the transparent substrate 21. Is attached to the display side of the front glass plate 44 (the side indicated by the arrow D in FIG. 3).

  An optical filter for display 36 according to the second embodiment shown in FIG. 5 has a hard coat layer, an antistatic layer, and an antireflection layer on one surface of another transparent substrate 46 different from the transparent substrate 21 of the electromagnetic shielding film. One or more functional layers 47 selected from the group consisting of antifouling layers are laminated, and a functional film 48 in which an adhesive layer 45 is laminated on the other surface of the other transparent substrate 46, The adhesive layer 45 is bonded to the viewing side (the side indicated by the arrow E in FIG. 5) of the front glass plate 44 of the display optical filter 35 according to the first embodiment.

  On the metal mesh pattern 22 in the electrode frame 23, a thermosetting resin or an energy ray curable resin is applied and cured to form an adhesive resin layer 40, and then on the adhesive resin layer 40. It is preferable that the laminated film 31 including at least the ultraviolet absorption layer 42 and the near infrared absorption layer 41, which are cut in the inner dimension of the electrode frame 23 corresponding to the screen size of the display prepared in advance, is bonded.

  The metal mesh pattern 22 is formed by laminating a mesh pattern made of a conductive metal thin film and a plating layer made of electroless plating and / or an electrolytic plating layer thereon.

The mesh pattern made of a conductive metal thin film is preferably a developed silver mesh pattern generated by a photographic process.
The developed silver mesh pattern generated by the photographic method is generated by a negative developing method in which developed silver appears in the exposed portion, or by a positive developing method in which developed silver appears in the unexposed portion. Any of the generated ones may be used.

  In addition, the mesh pattern made of a thin film of conductive metal prints a deposited film mesh pattern generated by metal deposition, a printed mesh pattern generated by printing conductive paste ink, and a paste containing an electroless plating catalyst. It is preferable that any one of the printed mesh patterns generated in this way is selected.

  FIG. 1 shows an example of an electromagnetic wave shielding film that has been rewound from a roll body used in the present invention. On one surface of a long transparent substrate 21 that has been rewound from the roll body, the screen size of the display is shown. A metal mesh pattern 22 corresponding to the length of the transparent base material 21 is provided at regular intervals in the longitudinal direction of the transparent substrate 21, and the metal mesh pattern 22 includes a mesh pattern made of a conductive metal thin film and a plating layer laminated thereon. An electrode frame 23 made of a metal mesh or a metal thin film is disposed around the metal mesh pattern 22.

  The display optical filter 35 according to the present invention includes a long electromagnetic shielding film 20 shown in FIG. 1 and a single-layer laminated film 31 including at least an ultraviolet absorbing layer 42 and a near infrared absorbing layer 41. After bonding by the method as shown in FIG. 2, the obtained long bonded film 32 (long electromagnetic shielding film 20 after laminating the single-layer laminated film 31) is dimensioned outside the electrode frame 23. 3 and FIG. 4 to produce a single wafer laminated film 34 as shown in FIG. 3 and FIG. 4, and laminate it to the display side of the front glass plate 44 through the adhesive layer 43. .

  In addition, the method for manufacturing the optical filter for display 36 according to the present invention further includes a hard coat layer, an antistatic layer, an antireflection layer, an antireflection layer on one surface of a long transparent base material 46 that is a base material for the functional film. After laminating one or more functional layers 47 selected from the group consisting of dirty layers, and laminating the adhesive layer 45 on the other surface of the long transparent substrate, the dimensions according to the screen size of the display A sheet-like functional film 48 is produced by cutting, and this functional film 48 is bonded to the viewing side (the side indicated by arrow E in FIG. 5) of the front glass plate 44 through the adhesive layer 45. It is.

  Prior to the step of laminating the long electromagnetic shielding film 20 and the single-layer laminated film 31, a long laminated film including at least an ultraviolet absorbing layer and a near infrared absorbing layer is selected according to the screen size of the display. It is necessary to produce and place a single-wafer laminated film 31 by cutting with the inner dimensions of the electrode frame.

  In the method for producing an optical filter for display according to the present invention, at least the ultraviolet absorbing layer 42 and the near infrared ray are passed only to the locations that pass inspection standards such as the presence or absence of foreign matters in the electrode frame 23 and the presence or absence of disconnection of the metal mesh. By laminating the sheet laminated film 31 including the absorption layer 41, it is possible to omit the sheet laminating film 31 from being bonded to the portion having the defect of the electromagnetic wave shielding film. It is possible to reduce the economical loss by saving the single-layer laminated film used.

As shown in FIG. 1, the electromagnetic wave shielding film 20 rewound from the roll body is provided with a metal mesh pattern 22 corresponding to the screen size of the display to be manufactured at a certain interval in the longitudinal direction of the transparent substrate 21, In addition, an electrode frame 23 made of a metal mesh or a metal thin film is disposed around the metal mesh pattern 22. The line width of the electrode frame is about 5 to 20 mm, and is wider than, for example, the thin line width of a metal mesh pattern made of thin lines with a line width of about 10 to 100 μm.
Further, it is preferable that the continuous power supply layers 25 and 25 having a constant width continuous in the longitudinal direction of the transparent substrate 21 are provided in contact with both outer sides in the width direction of the electrode frame 23 provided around the metal mesh pattern 22. .

The metal mesh pattern 22 has an optimum bias angle (θ) according to the resolution of the display panel, and two opposing sides of the electrode frame 23 are parallel to the longitudinal direction of the transparent substrate. It is preferable to be formed.
As a result, the process of laminating the sheet laminated film 31 in the electrode frame 23 of the metal mesh pattern of the long laminated film and forming the long optical filter can be easily automated.

When electrolytic plating is applied to a mesh pattern made of a conductive metal thin film, the electromagnetic wave shielding film 20 unwound from the roll body is applied to at least one surface of a long transparent substrate 21 as shown in FIG. The metal mesh pattern 22 corresponding to the screen size of the display to be manufactured is provided at a certain interval in the longitudinal direction of the transparent substrate, and the metal mesh pattern 22 is made of a metal mesh or a metal thin film. It is preferable that the electrode frame 23 is provided, and the continuous power supply layers 25 and 25 having a constant width continuous in the longitudinal direction of the transparent substrate 21 are provided in contact with both outer sides in the width direction of the electrode frame 23.
Electrolytic plating is energized through the continuous power supply layers 25, 25. When only electroless plating is performed and electrolytic plating is not performed, the continuous power feeding layers 25 and 25 may not be provided.

  In order to prevent the moire phenomenon caused by the interference of the metal mesh pattern 22 with the black stripe pattern of the display, it is necessary to form the metal mesh pattern so that the optimum bias angle is obtained according to the resolution of the display panel.

In the present invention, as shown in FIG. 1, the metal mesh pattern 22 has an optimum bias angle (θ) according to the resolution of the display panel, and two opposing sides of the electrode frame 23 are It is preferably formed so as to be parallel to the longitudinal direction of the transparent substrate 21.
As a result, the step of producing a long optical functional film by laminating a laminated film including at least an ultraviolet absorbing layer and a near infrared absorbing layer in the electrode frame 23 of the metal mesh pattern of the long laminated film is facilitated. Can be automated.

Here, the metal mesh pattern 22 is a developed silver mesh pattern generated by a photographic process, a deposited film mesh pattern generated by metal deposition, a printed mesh pattern generated by printing a conductive paste ink, and electroless plating. A mesh pattern comprising a conductive metal thin film formed using any method selected from printed mesh patterns generated by printing a catalyst-containing paste, and the conductive metal thin film. It consists of a plating layer laminated on a mesh pattern.
The plating layer laminated on the mesh pattern made of the conductive metal thin film is preferably a plating layer obtained by electroless plating and / or electrolytic plating.

  In the present invention, in the electroplating apparatus 1 shown in FIG. 6, the raw roll body 2 is a roll sheet 3 in which a mesh pattern of a conductive metal thin film is provided on a long transparent substrate. Is. The roll sheet 3 fed out from the raw roll body 2 is transferred from left to right in the figure by transfer rolls 4, 4, 4,. First, the roll sheet 3 is passed through the water washing tank 5 and washed to remove unnecessary foreign matters and contaminants. If necessary, it is passed through an electroless plating tank (not shown) and electrolessly plated on a mesh pattern made of a conductive metal thin film, and then transferred to at least the electrolytic plating tank 6.

  In the present invention, in the electrolytic plating tank 6 shown in FIG. 6, electrolytic plating is performed between the feed rolls 7 and 7 serving as the cathode and the positive electrode plates 8 and 8 serving as the anode through the electrolytic plating solution 9. An electrolytic plating layer is deposited on the mesh pattern of the conductive metal thin film of the sheet 3 or on the electroless plating layer formed thereon. The temperature of the electrolytic plating solution 9 is controlled by a temperature regulator (not shown) so as to be a predetermined temperature. The power supply rolls 7 and 7 are provided at the entrance for the roll sheet 3 to enter and exit the electrolytic plating tank 6, and the electrolytic plating solution 9 leaks from the gap between the power supply rolls 7 and 7 of the electrolytic plating tank 6. Can fall.

For this reason, a receiving tank 10 for receiving the leaked electrolytic plating solution 9 is installed below the electrolytic plating tank 6, and the electrolytic plating solution 9 received in the receiving tank 10 passes through the circulation pump 11 and the filter 12 again. It is configured to recirculate to the electrolytic plating tank 6.
The roll sheet 3 exiting the electrolytic plating tank 6 is washed with an unnecessary electrolytic plating solution 9 in a water washing tank 13 and then drained and dried in a drier 14 and wound up again into a roll shape. 15 is obtained.

By the way, an electrode provided around the metal mesh pattern 22 in producing a raw roll body obtained by winding a roll sheet in which a conductive metal thin film mesh pattern is provided on a long transparent substrate. The continuous feeding layers 25 and 25 having a constant width that are provided in contact with both outer sides in the width direction of the frame 23 and that are continuous in the longitudinal direction of the transparent base material 21 are continuously continuous in the longitudinal direction of the transparent base material. Need to be provided.
For this reason, for example, a continuous exposure apparatus is used when producing an original roll body using a developed silver mesh pattern generated by a photographic process (not shown).

  As an example of a continuous exposure apparatus, a cylindrical drum made of a material that transmits light used for exposure in a photographic manufacturing method, an exposure mask portion provided on the outer peripheral wall of the cylindrical drum, and an exposure arranged inside the cylindrical drum And a light source for exposing a transparent substrate wound around the cylindrical drum by light emitted from the light source inside the cylindrical drum. In this continuous exposure apparatus, a light source cover having an opening that transmits light in a specific irradiation direction can be provided around the light source for exposure. The pattern for exposing the transparent substrate is determined by the pattern of the portion that transmits light in the exposure mask portion. The exposure mask portion is disposed on the cylindrical drum by, for example, being provided on the surface (inner surface or outer surface) of the outer peripheral wall of the cylindrical drum, or being inserted or sandwiched inside the outer peripheral wall.

(Electromagnetic wave shielding film with metal mesh pattern laminated)
After forming a mesh pattern made of a conductive metal thin film on one surface of a transparent substrate, it was wound up in a roll shape to produce an original roll body in which a mesh pattern of a conductive metal thin film was generated. The
Here, the conductive metal thin film mesh pattern is printed with a developed silver mesh pattern generated by a photographic process, a deposited film mesh pattern generated by metal deposition, and a conductive paste ink, as shown below. And a printed mesh pattern generated by printing a paste containing an electroless plating catalyst and a printed mesh pattern generated by printing.
Furthermore, a plating layer by electroless plating and / or electrolytic plating is applied on the mesh pattern of the conductive metal thin film, and an electromagnetic wave shielding film in which the metal mesh pattern is laminated is produced.

  As a method for producing a mesh pattern of a conductive metal thin film that can be used in the present invention, a developed silver mesh pattern generated by a photographic method, a deposited film mesh pattern generated by metal deposition, and a conductive paste ink are printed. The generated printed mesh pattern and the printed mesh pattern generated by printing a paste containing an electroless plating catalyst can be mentioned. The methods of electroless plating and electrolytic plating will be described in this order.

(Developed silver mesh pattern generated by photographic process)
A method for producing a developed silver mesh pattern generated by a photographic method that can be applied to the present invention is to form a fine-line mesh pattern with metallic silver developed by a photographic method.
Hereinafter, the raw roll body formed with the developed silver mesh pattern formed by the photographic process and the method for producing the raw roll body that is electrolytically plated on the developed silver mesh pattern to form a metal mesh pattern will be described.

  In the exposure development method based on this photographic manufacturing method, as described above, (a) developed silver appears in the exposed portion that is not covered with the exposure mask, that is, the developed silver appears in a shape opposite to the exposure mask. A so-called negative-type exposure development method, and (b) a so-called positive-type exposure development method in which developed silver appears in a portion that is covered with an exposure mask and not exposed, that is, developed silver appears in the same shape as the exposure mask. There are two ways. Either (a) a negative exposure / development method or (b) a positive exposure / development method can be applied to the present invention.

(Photo production method)
Hereinafter, a method for producing a developed silver mesh pattern by a positive exposure / development method (DTR method) will be described. In the case of the DTR method, it is preferable that a physical development nucleus layer is provided in advance on the transparent substrate surface. As the physical development nuclei, fine particles (having a particle size of about 1 to several tens of nm) made of heavy metals or sulfides thereof are used. Examples thereof include colloids such as gold and silver, metal sulfides obtained by mixing water-soluble salts such as palladium and zinc and sulfides, and the like. The fine particle layer of these physical development nuclei can be provided on the transparent substrate by a vacuum deposition method, a cathode sputtering method, a coating method or the like. From the viewpoint of production efficiency, a coating method is preferably used. The content of physical development nuclei in the physical development nuclei layer is suitably about 0.1 to 10 mg per square meter in solid content.

  The transparent substrate can be provided with an adhesive layer of a polymer latex layer such as vinylidene chloride or polyurethane, and an intermediate layer made of a hydrophilic binder such as gelatin can be provided between the adhesive layer and the physical development nucleus layer. it can.

  The physical development nucleus layer preferably contains a hydrophilic binder. The amount of the hydrophilic binder is preferably about 10 to 300% by mass with respect to the physical development nucleus. As the hydrophilic binder, gelatin, gum arabic, cellulose, albumin, casein, sodium alginate, various starches, polyvinyl alcohol, polyvinyl pyrrolidone, polyacrylamide, a copolymer of acrylamide and vinyl imidazole, and the like can be used. The physical development nucleus layer may also contain a hydrophilic binder crosslinking agent.

  The physical development nucleus layer and the intermediate layer can be applied by an application method such as dip coating, slide coating, curtain coating, bar coating, air knife coating, roll coating, gravure coating, spray coating, and the like. In the present invention, the physical development nucleus layer is preferably provided as a continuous and uniform layer by the above-described coating method.

  The supply of silver halide for depositing metallic silver on the physical development nucleus layer is performed by a method in which the physical development nucleus layer and the silver halide emulsion layer are integrally formed in this order on a transparent substrate, or another paper or plastic resin. There is a method of supplying a soluble silver complex salt from a silver halide emulsion layer provided on a substrate such as a film. From the viewpoint of cost and production efficiency, the former physical development nucleus layer and the silver halide emulsion layer are preferably provided integrally.

The silver halide emulsion can be produced according to a general method for producing a silver halide emulsion of a silver halide photographic light-sensitive material. The silver halide emulsion is usually prepared by mixing and ripening an aqueous silver nitrate solution, an aqueous halogen solution of sodium chloride or sodium bromide in the presence of gelatin.
The silver halide composition of the silver halide emulsion layer preferably contains 80 mol% or more of silver chloride, and more preferably 90 mol% or more is silver chloride. The conductivity of the physically developed silver formed by increasing the silver chloride content is improved.

  When producing an electromagnetic shielding material using a photosensitive material in which a silver halide emulsion layer is coated directly on the physical development nucleus layer or via an intermediate layer, an arbitrary fine line pattern such as a mesh pattern is used. After exposing the exposure mask and the photosensitive material in close contact, or by scanning and exposing a digital image of an arbitrary fine line pattern to the photosensitive material with various laser light output machines, in the presence of a soluble silver complex salt forming agent and a reducing agent. Silver complex diffusion transfer development (DTR development) occurs by processing in an alkaline solution, the silver halide in the unexposed area is dissolved to form a silver complex salt, which is reduced on the physical development nuclei, and metallic silver is precipitated to form a fine line. A physically developed silver thin film with a pattern can be obtained. The exposed portion is chemically developed in the silver halide emulsion layer to become blackened silver. After development, the silver halide emulsion layer and the intermediate layer, or the protective layer provided as necessary, are washed away with water, and a physically developed silver thin film having a fine line pattern is exposed on the surface.

  After DTR development, the silver halide emulsion layer or the like provided on the physical development nucleus layer may be removed by washing with water or transferring and peeling to a release paper or the like. There are two methods for removing the water washing: a method of removing hot water using a scrubbing roller or the like while jetting it with a nozzle or the like, and a method of removing hot water by jetting with a nozzle or the like.

  On the other hand, when the soluble silver complex salt is supplied from a silver halide emulsion layer provided on a substrate different from the transparent substrate on which the physical development nucleus layer is coated, the silver halide emulsion layer is exposed as described above. After that, a transparent substrate coated with a physical development nucleus layer and another photosensitive material coated with a silver halide emulsion layer are superposed in an alkaline solution in the presence of a soluble silver complexing agent and a reducing agent. After several tens of seconds to several minutes after taking out from the alkaline solution, the both are removed to obtain a physically developed silver thin film having a fine line pattern deposited on the physical development nuclei.

(Development method)
Next, a soluble silver complex salt forming agent, a reducing agent, and an alkali solution necessary for silver complex diffusion transfer development will be described. The soluble silver complex salt forming agent is a compound that dissolves silver halide to form a soluble silver complex salt, and the reducing agent is a compound that reduces this soluble silver complex salt to precipitate metallic silver on physical development nuclei. These actions are performed in an alkaline solution.

  Examples of the soluble silver complex forming agent used in the present invention include sodium thiosulfate, thiosulfate such as ammonium thiosulfate, thiocyanate such as sodium thiocyanate and ammonium thiocyanate, alkanolamine, sodium sulfite, and potassium bisulfite. Sulfites such as T. H. Examples include the compounds described in 474-475 (1977) of James The Theory of the Photographic Process 4th edition.

  As the reducing agent, a developing agent known in the field of photographic development can be used. For example, hydroquinone, catechol, pyrogallol, methylhydroquinone, polyhydroxybenzenes such as chlorohydroquinone, 1-phenyl-4,4-dimethyl-3-pyrazolidone, 1-phenyl-3-pyrazolidone, 1-phenyl-4-methyl- Examples include 3-pyrazolidones such as 4-hydroxymethyl-3-pyrazolidone, paramethylaminophenol, paraaminophenol, parahydroxyphenylglycine, paraphenylenediamine, and the like.

The above-mentioned soluble silver complex salt forming agent and reducing agent may be applied to the transparent substrate together with the physical development nucleus layer, added to the silver halide emulsion layer, or contained in the alkaline solution. It may be allowed to be contained, and may be further contained in a plurality of positions, but is preferably contained at least in the alkaline liquid.
The content of the soluble silver complex salt forming agent in the alkaline solution is suitably used in the range of 0.1 to 5 mol per liter of the developer, and the reducing agent is 0.05 to 1 per liter of the developer. It is suitable to use in the molar range.

  The pH of the alkaline solution is preferably 10 or more, and more preferably in the range of 11-14. Application of the alkaline solution for silver complex diffusion transfer development may be an immersion method or a coating method. The immersion method is, for example, transporting while immersing a transparent substrate provided with a physical development nucleus layer and a silver halide emulsion layer in an alkaline solution stored in a large amount in a tank. About 40 to 120 ml of alkali solution per square meter is applied on the silver halide emulsion layer.

(Exposure method)
The silver halide emulsion layer is sensitive to various light sources. As one method for producing an electromagnetic wave shielding material, for example, formation of physically developed silver having a fine line pattern such as a mesh shape can be mentioned. In this case, the silver halide emulsion layer is exposed in a fine line pattern. As an exposure method, a thin line pattern exposure mask and a silver halide emulsion layer are exposed in close contact, or scanning exposure is performed using various laser beams. There are ways to do this. The former contact exposure is possible even if the silver halide has relatively low photosensitivity, but in the case of scanning exposure using laser light, relatively high photosensitivity is required. Therefore, when the latter exposure method is used, the silver halide may be subjected to chemical sensitization or spectral sensitization with a sensitizing dye in order to increase the sensitivity of the silver halide.

  Chemical sensitization includes metal sensitization using a gold compound or silver compound, sulfur sensitization using a sulfur compound, or a combination thereof. Gold-sulfur sensitization using a gold compound and a sulfur compound in combination is preferable. In the above-described method of exposing with laser light, a laser beam having an oscillation wavelength of 450 nm or less, for example, a blue semiconductor laser (also referred to as a violet laser diode) having an oscillation wavelength of 400 to 430 nm is used. It can be handled even under a yellow fluorescent lamp.

(Exposure equipment)
As an exposure apparatus using the above exposure method, there are a single wafer processing type exposure apparatus using a single wafer type exposure mask (photomask) and a continuous exposure apparatus capable of forming a continuous pattern. A single wafer processing type exposure apparatus uses a single wafer type exposure mask (photomask) on which a predetermined mask pattern is formed, intermittently feeds a roll sheet to the exposure apparatus, and evacuates the inside of the apparatus for exposure. After the mask and the substrate are brought into close contact with each other and no gap is formed, exposure is performed with, for example, ultraviolet rays. In a single wafer processing type exposure apparatus, vacuum exhaust, exposure, and release to the atmosphere are intermittently performed, so that the processing speed is slow and a seamless continuous pattern cannot be obtained.

In contrast, in the present invention, a continuous exposure apparatus capable of continuously forming a pattern is used (not shown).
As an example of a continuous exposure apparatus, a cylindrical drum made of a material that transmits light used for exposure in a photographic manufacturing method, an exposure mask portion provided on the outer peripheral wall of the cylindrical drum, and an exposure arranged inside the cylindrical drum And a light source for exposing a transparent substrate wound around the cylindrical drum by light emitted from the light source inside the cylindrical drum. In this continuous exposure apparatus, a light source cover having an opening that transmits light in a specific irradiation direction can be provided around the light source for exposure. The pattern for exposing the transparent substrate is determined by the pattern of the portion that transmits light in the exposure mask portion. The exposure mask portion is disposed on the cylindrical drum by, for example, being provided on the surface (inner surface or outer surface) of the outer peripheral wall of the cylindrical drum, or being inserted or sandwiched inside the outer peripheral wall.

  In this continuous exposure apparatus, since the cylindrical drum rotates at the same speed as the transparent substrate to be continuously transferred, the transparent substrate is exposed while each part of the transparent substrate is exposed at the place wound around the cylindrical drum. It is possible to continue the exposure for the required time without shifting the pattern of the exposure mask portion with respect to the material (the pattern of the light transmitting portion and the light shielding portion).

(Method for forming electroless plating layer)
In order to form the electroless plating layer on the conductive metal thin film mesh pattern, the transparent substrate provided with the conductive metal thin film mesh pattern is continuously drawn out from the raw roll body, A plating layer is formed by electroless plating on a mesh pattern of a conductive metal thin film. In addition, after electroless plating, electrolytic plating may be further performed. The plated roll is taken up again to form a roll body of an electromagnetic wave shielding film, and is transferred to a process of forming an electrode frame corresponding to the screen size of the next display.

An electroless plating apparatus (see, for example, FIG. 7) is an apparatus that continuously performs electroless plating on a roll body on which a conductive mesh pattern is formed.
In the electroless plating apparatus 16 shown in FIG. 7, the raw fabric roll body 2 is obtained by winding a roll sheet 3 in which a conductive metal thin film mesh pattern is provided on a long transparent substrate into a roll shape. . The roll sheet 3 fed out from the raw roll body 2 is transferred from left to right in the figure by transfer rolls 4, 4, 4,. The roll sheet 3 is passed through the water cleaning tank 5 and cleaned, and after unnecessary foreign matters and contaminants are removed, the roll sheet 3 is transferred to the electroless plating tank 17 for performing an electroless plating process.

  In the electroless plating tank 17, electroless plating is performed through the electroless plating solution 18, and an electroless plating layer is deposited on the conductive mesh pattern on the surface of the roll sheet 3. The temperature of the electroless plating solution 18 is controlled by a temperature regulator (not shown) so as to be a predetermined temperature. The electroless plating solution 18 can leak and fall from a gap (slit) through which the roll sheet 3 of the electroless plating tank 17 is passed. Therefore, a receiving tank 10 that receives the leaked electroless plating solution 18 is installed below the electroless plating tank 17, and the electroless plating solution 18 received in the receiving tank 10 is supplied to the circulation pump 11 and the filter 12. Then, it is configured to be recirculated to the electroless plating tank 17 again.

  The roll sheet 3 exiting the electroless plating tank 17 is washed with an unnecessary electroless plating solution 18 in the water washing tank 13 and subsequently subjected to an electroplating process, or drained and dried in a drier 14, and again. It is wound up and becomes a roll body 15 of an electromagnetic wave shielding film.

(Method for forming electrolytic plating layer)
In order to form a plating layer on a conductive metal thin film mesh pattern or an electroless plated mesh pattern, a transparent base material provided with a conductive metal thin film mesh pattern is continuously formed from the raw roll body. After the feeding, a plating layer is formed on the mesh pattern of the conductive metal thin film by at least electrolytic plating. In addition, the plated roll is wound up again to form a roll body of an electromagnetic wave shielding film, and transferred to a step of forming an electrode frame corresponding to the screen size of the next display.

  An electroplating apparatus 1 shown in FIG. 6 is an apparatus that continuously performs electroplating on a roll body on which a conductive mesh pattern is formed. In the electroplating apparatus 1 shown in FIG. 6, the raw fabric roll body 2 is obtained by winding a roll sheet 3 having a conductive metal thin film mesh pattern provided on a long transparent substrate into a roll shape. The roll sheet 3 fed out from the raw roll body 2 is transferred from left to right in the figure by transfer rolls 4, 4, 4,. First, the roll sheet 3 is passed through the water washing tank 5 and washed to remove unnecessary foreign matters and contaminants. If necessary, it is passed through an electroless plating tank (not shown) and electrolessly plated on a mesh pattern made of a conductive metal thin film, and then transferred to at least the electrolytic plating tank 6.

  In the electrolytic plating tank 6, electrolytic plating is performed between the feed rolls 7, 7 serving as the cathode and the positive electrode plates 8, 8 serving as the anode through the electrolytic plating solution 9, and the conductive sheet thin film of the roll sheet 3 is formed. An electrolytic plating layer is deposited on the mesh pattern or on the electroless plating layer formed thereon. The temperature of the electrolytic plating solution 9 is controlled by a temperature regulator (not shown) so as to be a predetermined temperature. The power supply rolls 7 and 7 are provided at the entrance for the roll sheet 3 to enter and exit the electrolytic plating tank 6, and the electrolytic plating solution 9 leaks from the gap between the power supply rolls 7 and 7 of the electrolytic plating tank 6. Can fall. For this reason, a receiving tank 10 for receiving the leaked electrolytic plating solution 9 is installed below the electrolytic plating tank 6, and the electrolytic plating solution 9 received in the receiving tank 10 passes through the circulation pump 11 and the filter 12 again. It is configured to recirculate to the electrolytic plating tank 6.

  The roll sheet 3 exiting the electrolytic plating tank 6 is washed with an unnecessary electrolytic plating solution 9 in a water washing tank 13, then drained and dried in a drier 14, and wound up again to form a plated mesh pattern. The roll-shaped electromagnetic wave shielding material roll body 15 is obtained.

  If necessary, an electroless plating tank (not shown) is disposed between the water washing tank 5 and the electrolytic plating tank 6, and electroless plating is performed on the developed silver mesh pattern generated by exposure and development. Thereafter, it may be transferred to the electrolytic plating tank 6 to perform electrolytic plating. Thus, an electromagnetic wave shielding film with higher performance can be obtained by using both electroless plating and electrolytic plating in the plating step.

In the present invention, at the time of electrolytic plating in the electrolytic plating tank 6, a feed layer for electrolytic plating (hereinafter sometimes referred to as “continuous feed layer”) provided continuously in the longitudinal direction on the roll sheet 3. Then, power is supplied to the developed silver mesh pattern.
The continuous power supply layer is in contact with power supply rolls 7 and 7 that become cathodes before and after the place where the roll sheet 3 is introduced into the electrolytic plating tank 6. As a result, during electrolytic plating, an electrolytic current is supplied to the mesh pattern 22 through the continuous power supply layer 25 of FIG. 1, and electrolysis is applied on the developed silver mesh pattern and / or the electroless plating layer formed thereon. A plating layer is formed by plating.

  In the present invention, as shown in FIG. 6, the roll sheet 3 is continuously unwound from the exposed and developed raw roll 2 and transferred to the electroplating tank 6 by continuous feed of the transfer rolls 4, 4,. In order to continuously perform electroplating without interruption, a plurality of metal mesh patterns 22 corresponding to the screen size of the display are formed on one surface of the long transparent substrate 21, as in the roll sheet 20 shown in FIG. The electrode frame 23 is formed around the metal mesh pattern 22, and the continuous power supply layers 25 and 25 having a constant width continuous in the longitudinal direction of the transparent base material 21 are disposed on both outer sides in the width direction of the metal mesh pattern 22. Those provided in contact with each other are used.

  The continuous power supply layer 25 is in contact with the power supply rolls 7 and 7 that serve as a cathode before and after the portion where the roll sheet 3 is introduced into the electrolytic plating tank 6. Thus, during electrolytic plating, an electrolytic current is supplied to the mesh pattern 22 through the continuous power supply layer 25 and the electrode frame 23, and on the developed silver mesh pattern and / or the electroless plating layer formed thereon, A plating layer is formed by electrolytic plating.

  In FIG. 1, the mesh pattern 22 in the electromagnetic wave shielding film 20 is obtained by forming a plating layer on at least a developed silver mesh pattern of an original fabric by electrolytic plating. Although the width | variety of the continuous electric power feeding layer 25 is based also on the width | variety of the electric power feeding roll 7 currently used in FIG. 6, it is about 15-100 mm, More preferably, it is 15-80 mm, More preferably, it is 20-60 mm.

(Transparent substrate)
The transparent substrate 21 used in the present invention is preferably a transparent substrate having transparency in the visible region and generally having a total light transmittance of 90% or more. Especially, the resin film which has flexibility is used suitably at the point which is easy to handle. Specific examples of the transparent resin film used for the transparent substrate 21 include polyester resins such as polyethylene terephthalate (PET) and polyethylene naphthalate (PEN), acrylic resins, epoxy resins, fluorine resins, silicone resins, polycarbonate resins, Single-layer film having a thickness of 50 to 300 μm made of acetate resin, triacetate resin, polyarylate resin, polyvinyl chloride, polysulfone resin, polyether sulfone resin, polyimide resin, polyamide resin, polyolefin resin, cyclic polyolefin resin, or the like A composite film having a plurality of layers made of a resin is exemplified.

(Thin line mesh pattern)
As described above, there are fine line patterns in which, for example, fine lines having a line width of about 10 to 100 μm are provided in a grid pattern in the vertical and horizontal directions. If the narrow line width is reduced and the interval between the gratings is increased, the translucency increases. However, the conductivity decreases, and conversely, if the fine line width is increased to reduce the lattice spacing, the translucency is decreased and the conductivity is increased. The silver image formed by physical development of an arbitrary fine line pattern formed on the transparent substrate according to the present invention has a translucency with a total light transmittance of 50% or more and a conductivity with a surface resistivity of 10 ohms / □ or less simultaneously. It is difficult to satisfy. Specifically, the silver image by this physical development has a conductivity of a surface resistivity of 50 ohms / square or less, preferably 20 ohms / square or less, but a pattern with a fine line width of 50 μm or less, for example, a fine line width of 20 μm. When the total light transmittance is 50% or more, the surface resistivity becomes several hundred ohms / square to 1000 ohms / square or more.

However, the silver image by the physical development itself forms a silver image because the metallic silver particles forming the silver image obtained after the development processing are extremely small and the amount of the hydrophilic binder present in the silver image is extremely small. Since the silver image is formed in a state close to the close-packed state and the electroconductive property is obtained, the fine silver wire pattern can be obtained by plating with a metal such as copper or nickel, especially by electroplating. Is a transparent thin line pattern having a total light transmittance of 50% or more, preferably 60% or more, when the thickness is 0.5 to 15 μm and the line width is 10 to 50 μm. The conductivity of □ or less, preferably 7 ohm / □ or less can be maintained.
In order to improve the total light transmittance of the metal mesh, it is necessary to sufficiently increase the area of the light transmission portion between the fine lines with respect to the area of the region where the fine lines are provided. For this reason, it is preferable that the space | interval of a thin wire | line is 100-900 micrometers, More preferably, it is 150-700 micrometers.

  The thickness of the metal-plated fine line pattern can be arbitrarily changed according to desired characteristics, but is in the range of 0.5 to 15 μm, preferably 2 to 12 μm. Moreover, the electromagnetic shielding material produced by the above-mentioned method can obtain a shielding effect of 30 dB or more over a wide frequency band such as 30 MHz to 1,000 MHz.

  The thin line pattern of physically developed silver can be plated by either electroless plating, electrolytic plating, or a combination of the two. However, when preparing an electromagnetic shielding layer on a transparent substrate, From the viewpoint that a roll-like long web provided with a physical development nucleus layer and a silver halide emulsion layer can be subjected to at least a series of treatments such as exposure of a fine line pattern, development treatment and plating treatment. Is preferred.

  In the present invention, the metal plating method can be performed by a known method. For example, the electrolytic plating method is a conventionally known method such as copper, nickel, silver, gold, solder, or a multilayer or composite system of copper / nickel. For these, reference can be made to documents such as “Surface Treatment Technology Overview; Technical Data Center, Inc., December 21, 1987, first edition, pages 281 to 422”.

It is preferable to use copper and / or nickel for reasons such as easy plating, excellent electrical conductivity, plating on a thick film, and low cost. As an example of electrolytic plating, the transparent base material on which the above-described physically developed silver is formed is immersed in a bath mainly composed of copper sulfate, sulfuric acid and the like, and a current density of 1 to 20 amperes / percent at 10 to 40 ° C. Plating can be performed by energizing at dm ² .
The type of the electrolytic plating tank 6 to be used may be either a vertical type or a horizontal type, but the length of the electrolytic plating tank is set according to the transfer speed of the roll sheet 3 so as to ensure a predetermined plating residence time. decide.

  The electromagnetic wave shielding layer (metal mesh pattern) obtained by the above method has a total light transmittance of 50% or more and a surface resistivity of 10 when the mesh pattern has a thickness of 0.5 to 15 μm and a line width of 10 to 50 μm. It has excellent translucency and electrical conductivity of ohm / square or less, and can exhibit a shielding effect of 30 dB or more over a wide frequency band such as 30 MHz to 1,000 MHz.

(Deposited film mesh pattern generated by metal deposition)
Also in the production of a conductive metal thin film mesh pattern using a metal vapor-deposited film, the same transparent substrate and fine wire mesh pattern as those used in the above-described photographic method are used.
Here, in order to avoid a duplicate description, only items specific to the mesh pattern of the conductive metal thin film by the metal vapor deposition film will be described below.

As a vapor deposition method used in the present invention, a vacuum vapor deposition method, a sputtering method, an ion plating method, or the like can be used. However, the vacuum vapor deposition method is preferably used because of the ease of operation.
Electrolytic plating with a plating film thickness of 2 to 20 μm is processed on a vacuum deposition film with a deposition film thickness of 0.01 to 0.2 μm.
Copper or silver is preferably used as the type of metal to be deposited.
When the thickness of the deposited film is thicker than 0.2 μm, the processing time is significantly increased and the cost is increased.

In this invention, after forming a vapor deposition film on one surface of a transparent base material, an etching process is performed using a well-known photolithographic method, and the original fabric of the mesh pattern by a metal vapor deposition film is produced.
That is, a photoresist is applied on the metal vapor-deposited film layer, the mask film is exposed on the photoresist and exposed, the exposed portion is dissolved and removed with a developing solution, washed and dried, and then an etching solution is applied. Etching is performed. Further, the remaining photoresist is removed using an organic solvent, and a conductive metal thin film mesh pattern is formed by a metal vapor deposition film.
For the photoresist, water-soluble casein or the like can be used. As an etchant, ferric chloride, cupric chloride, or the like can be used.

  In the production of the mesh pattern of the conductive metal thin film by the metal vapor-deposited film, the transparent substrate and the fine wire mesh pattern were used in the same manner as the mesh pattern formation by the photographic method described above, and the thin film mesh pattern was formed. An original fabric roll body is produced, and further, an electroplated original fabric roll body is produced.

In the present invention, the type of plating metal used in the electrolytic plating method can be a conventionally known one such as copper, nickel, silver, gold, solder, or a multilayer or composite system of copper / nickel, but plating is easy, In addition, it is preferable to use copper or nickel for reasons such as excellent conductivity, plating on a thick film, and low cost.
The surface of the electrolytic plating of copper or nickel can be blackened using a nickel blackening solution to suppress the metallic luster of the plated surface and increase the image contrast of the display.

(Printed mesh pattern generated by printing conductive paste ink or paste containing electroless plating catalyst)
In the production of a mesh pattern of a conductive metal thin film by printing, a transparent base material and a fine line mesh pattern similar to the formation of the mesh pattern by the photographic method are used.
Here, in order to avoid redundant description, only items specific to the print mesh pattern will be described below.
The production of a mesh pattern of a conductive metal thin film by printing, which can be applied to the present invention, is performed, for example, by rotary intaglio offset printing. Printing using conductive paste ink produces a fine line mesh pattern.
In addition, in the case where the mesh pattern is printed by including the electroless plating catalyst core in the conductive paste ink, the electroless plating process is performed prior to the electrolytic plating process, and the electrolytic plating is performed thereon, Furthermore, it becomes a metal plated mesh pattern having excellent conductivity.

In the case of rotary intaglio offset printing, the paste ink supplied to the intaglio cylinder is transferred to a blanket made of silicon rubber, and the paste ink is transferred to a transparent substrate film passed between the blanket and the impression cylinder. A fine line mesh pattern provided continuously in a seamless manner in the longitudinal direction of the material is printed.
In addition, by setting the line width, depth, and pitch of the intaglio in a predetermined range, the mesh pattern line width, thickness, and pitch are adjusted, and the mesh pattern has excellent electromagnetic shielding properties, visibility, and light transmittance Can be obtained.

Since the conductive paste ink used in the present invention is subjected to electroless plating and / or electrolytic plating after the mesh pattern is printed and cured, the conductive paste ink is usually mixed with a resin component serving as a binder. A paste is used. When printing a mesh pattern with electroless plating catalyst cores contained in the conductive paste ink, the electroplating process can be easily performed prior to the electroplating process. become.
As said metal powder, metal powders, such as copper, silver, nickel, aluminum, are used, However, It is preferable to use the fine powder of copper or silver from the point of electroconductivity and a price.

Since the fine line width of the mesh pattern to be printed is preferably about 10 to 40 μm from the viewpoint of visibility, the particle diameter of the metal powder is preferably 0.01 to 2 μm.
For example, in a condition where the width of the printed thin line is as narrow as 10 to 20 μm and the thickness of the thin line is as thin as 2 to 10 μm, it is difficult to increase the conductivity if the particle diameter of the metal powder is larger than 2 μm. .
In order to eliminate the metallic luster of the printed thin-film mesh pattern to suppress reflection of external light and increase the image contrast of the display, it is preferable to incorporate a black pigment such as carbon black. The black pigment is preferably contained at 0.1 to 10% by weight in the conductive paste ink.

As the resin component used for the conductive paste ink, a thermoplastic resin such as a polyester resin, a (meth) acrylic resin, a polyethylene resin, a polystyrene resin, or a polyamide resin is preferably used. Moreover, thermosetting types, such as an epoxy resin, an amino resin, a polyimide resin, (meth) acrylic resin, may be sufficient.
In the conductive paste ink, a metal powder, a black pigment, and, if necessary, a catalyst core are mixed into these resin components, and then an organic solvent such as alcohol or ether is added to adjust the viscosity.

In the production of a mesh pattern of a conductive metal thin film by printing, a transparent base material, a fine wire mesh pattern similar to the mesh pattern formation by the photographic method described above is used, and an original fabric roll on which a thin film mesh pattern is formed A body is produced, and further, an electroplated raw roll body is produced.
In the present invention, the electrolytic plating method can be a conventionally known method such as copper, nickel, silver, gold, solder, or a multilayer or composite system of copper / nickel, but is easy to plate and excellent in conductivity, Further, it is preferable to use copper or nickel for reasons such as the ability to plate a thick film and low cost.

(Laminated film including ultraviolet absorption layer and near infrared absorption layer)
In the present invention, a method of laminating the laminated film 31 including at least the ultraviolet absorbing layer 42 and the near infrared absorbing layer 41 on the metal mesh pattern 22 of the electromagnetic wave shielding film 20 is a sheet cut by the inner dimension of the electrode frame 23. The laminated film 31 of leaves is laminated on the metal mesh pattern 22 in the electrode frame 23 of the electromagnetic wave shielding film 20 through the adhesive resin layer 40.

First, after laminating at least the ultraviolet absorption layer 42 and the near-infrared absorption layer 41 on one surface of a release film having a smooth surface, the laminated film 31 of a single wafer is cut by the inner dimension of the electrode frame 23. Make it.
Next, a thermosetting resin or an energy ray curable resin is applied to the electrode frame 23 corresponding to the screen size of the display formed on the metal mesh pattern 22 of the long electromagnetic shielding film 20 and cured. After the adhesive resin layer 40 is formed, at least the ultraviolet absorbing layer 42 is cut on the adhesive resin layer 40 by the inner dimension of the electrode frame 23 corresponding to the screen size of the display prepared in advance. And after peeling off the laminated film 31 containing the near-infrared absorption layer 41 from the said peeling film, the laminated film 31 is laminated | stacked by bonding through the said adhesive resin layer 40. FIG.

In the case where the long electromagnetic shielding film 20 and the single-layer laminated film 31 are bonded together, a specific display screen that has been found to have various defects in quality inspection in the manufacturing process of the electromagnetic shielding film in advance. For the metal mesh portion, the number of sheets of the laminated film 31 used is reduced by not attaching the laminated film 31 including the near infrared absorbing layer 41 using an expensive near infrared absorbing dye.
As a result, it is possible to avoid the production of the single-wafer laminated film 34 that has a defect and is eventually discarded, and an economical loss can be reduced.

  The material of the release film having a smooth surface used for supporting the laminated film 31 is not particularly limited. However, a flexible resin film is lightweight and is easily used because it is easy to handle. Examples of the resin film include polyester films such as polyethylene terephthalate (PET), polyolefin films such as polyethylene and polypropylene, polycarbonate films, and acrylic films.

Examples of the adhesive resin that can be used in the present invention include a thermosetting resin, an ultraviolet (UV) curable resin, a visible light curable resin, and an electron beam curable resin.
The transparent resin is not particularly limited as long as it is cured by the input energy. Examples of the energy to be input include heating and energy rays (ultraviolet rays, electron beams, and in some cases, visible rays).
In the case of energy ray curable resin, it is possible to complete the curing by performing a heat treatment as necessary after the energy ray irradiation. Of course, two or more types of energy beam irradiation may be combined.

Examples of the thermosetting resin include polyester resins, acrylic resins, epoxy resins, phenol resins, and modified resins thereof.
Resin compounds used for energy ray curable adhesive resins include monofunctional (meth) acrylate components such as alkyl acrylates and alkyl methacrylates; di-, tri- or poly (meth) acrylates of polyhydric alcohols and hydroxyalkyl (meth) acrylates Multifunctional (meth) acrylate components such as; acrylic acid, methacrylic acid, crotonic acid, itaconic acid, itaconic anhydride, maleic acid, maleic anhydride, fumaric acid, glycidyl (meth) acrylate, N-methylolacrylamide, etc. Group-containing monomer component; vinyl acetate, styrene, acrylic urethane oligomer and the like.

(Near-infrared absorbing layer)
In the present invention, the near infrared absorbing layer 41 is preferably formed by laminating a transparent resin layer in which a near infrared absorbing pigment is dispersed on an optical functional layer film.
Further, the near-infrared absorbing dye is composed of two types of long-wavelength absorbing dye and short-wavelength absorbing dye having absorption maximum values in different wavelength bands in the absorption wavelength band of 850 nm to 1100 nm. Is preferred.

  The long-wavelength near-infrared absorbing dye is one selected from diimonium salt compounds, and the short-wavelength near-infrared absorbing dye is a phthalocyanine compound, a cyanine compound, or a thiol nickel complex compound. It is preferable that it is 1 type, or 2 or more types of pigment | dyes selected from these.

As a function of the transparent resin layer in which the near-infrared absorbing pigment is dispersed, it is desirable to reduce the near-infrared transmittance in the wavelength region of 850 to 1100 nm to 15% or less, preferably 10% or less.
Specific examples of near-infrared absorbing dyes include immonium salt compounds, diimmonium salt compounds, aminium salt compounds, nitroso compounds and their metal complexes, cyanine compounds, squarylium compounds, thiol nickel complex compounds, aminothiol nickel compounds Complex salt compounds, phthalocyanine compounds, naphthalocyanine compounds, triarylmethane compounds, naphthoquinone compounds, anthraquinone compounds, amino compounds, carbon black, antimony oxide, tin oxide doped with indium oxide, Group 4 of the periodic table, Examples thereof include oxides, carbides or borides of metals belonging to Group 5 or Group 6.

The near-infrared absorbing dye is composed of two or more kinds of dyes, a long-wavelength near-infrared absorbing dye and a short-wavelength near-infrared absorbing dye, each having absorption ability in different wavelength bands in the absorption wavelength band of 850 nm to 1100 nm. It is preferable.
The long-wavelength near-infrared absorbing dye is one selected from diimonium salt compounds, and the short-wavelength near-infrared absorbing dye is a phthalocyanine compound, a cyanine compound, or a thiol nickel complex compound. It is preferable that it is 1 type, or 2 or more types of pigment | dyes selected from these.

The transparent resin layer in which the near infrared absorbing dye is dispersed can be formed by dispersing the near infrared absorbing dye in a binder made of a transparent resin.
The glass transition temperature (Tg) of the binder resin is preferably 80 to 160 ° C. As a result, the weather resistance of the binder resin itself is improved, the near infrared absorbing performance of the near infrared absorbing coating film is maintained, and the weather resistance and physical properties of the near infrared absorbing coating film itself are further improved. Become. Preferably, it is -50-130 degreeC, More preferably, it is 20-110 degreeC, More preferably, it is 40-100 degreeC.

  Examples of the binder resin include (meth) acrylic resin, (meth) acrylic urethane resin, polyvinyl chloride resin, polyvinylidene chloride resin, melamine resin, urethane resin, styrene resin, and alkyd resin. Modification of resins, phenolic resins, epoxy resins, polyester resins, (meth) acrylic silicone resins, alkylpolysiloxane resins, silicone resins, silicone alkyd resins, silicone urethane resins, silicone polyester resins, silicone acrylic resins, etc. Examples include fluororesins such as silicone resins, polyvinylidene fluoride, and fluoroolefin vinyl ether polymers. Thermoplastic resins may be used, and thermosetting resins, moisture curable resins, UV curable resins, electron beam curable resins, etc. Resin may be usedAlso, organic binder resins such as synthetic rubber such as ethylene-propylene copolymer rubber, polybutadiene rubber, styrene-butadiene rubber, acrylonitrile-butadiene rubber or natural rubber; silica sol, alkali silicate, silicon alkoxide and their (hydrolysis) Conventionally known binder resins such as inorganic binders such as condensates and phosphates may be mentioned. These may be used alone or in combination of two or more.

  Among these, (meth) acrylic resins, (meth) acrylic urethane resins, (meth) acrylic silicone resins, polyesters can be dried at a relatively low temperature to form a near-infrared absorbing coating film. It is preferably a fluorine-based resin such as a modified resin such as a vinyl resin, a silicone resin, a silicone alkyd resin, a silicone urethane resin, a silicone polyester resin, or a silicone acrylic resin, a polyvinylidene fluoride, or a fluoroolefin vinyl ether polymer. Note that acrylic resins and methacrylic resins are also referred to as acrylic resins.

  When forming the transparent resin layer in which the near-infrared absorbing pigment is dispersed, as a compound other than those described above, for example, one or more solvents, additives, and the like may be included. Such a solvent is not particularly limited, and examples thereof include aromatic solvents such as toluene and xylene; alcohol solvents such as iso-propyl alcohol, n-butyl alcohol, propylene glycol methyl ether, and dipropylene glycol methyl ether; Examples include ester solvents such as butyl acetate, ethyl acetate, and cellosolve acetate; ketone solvents such as acetone, methyl ethyl ketone, and methyl isobutyl ketone; and one or more organic solvents such as dimethylformamide.

In addition, as the additive, a conventionally known additive generally used in a resin composition for forming a film, a coating film, or the like can be used. For example, a leveling agent; inorganic fine particles such as colloidal silica and alumina sol; Antifoaming agent, anti-sagging agent, silane coupling agent, viscosity modifier, metal deactivator, peroxide decomposer, plasticizer, lubricant, rust preventive agent, organic and inorganic UV absorber, inorganic System heat ray absorbent, organic / inorganic flameproofing agent, antistatic agent and the like.
In order to improve the durability of the dye, a quencher or an antioxidant can be added.
Examples of such quenchers include metal complex materials, such as “MIR101” manufactured by Midori Chemical Co., “EST5” manufactured by Sumitomo Seika Co., Ltd., and the like.
Representative antioxidants include hindered amine compounds, hindered phenol compounds, phosphite compounds, and the like, and these can be used alone or in combination of two or more.

Examples of the method for applying the transparent resin layer in which the near-infrared absorbing dye is dispersed include immersion, spraying, brush coating, curtain flow coating, gravure coating, roll coating, spin coating, blade coating, bar coating, reverse coating, and die coating. , Spray coating, electrostatic coating and the like. In these cases, the organic solvent described above can be appropriately mixed and applied to the near-infrared absorbing resin composition.
The thickness of the near infrared absorber layer is not particularly limited as long as it is appropriately set depending on the intended use. For example, the thickness upon drying is 1 to 50 μm, preferably 1 to 20 μm.

(UV absorbing layer)
The ultraviolet absorbing layer is provided closer to the visual side than the near infrared absorbing layer in order to prevent the near infrared absorbing layer from being deteriorated by external light. If necessary, one or more ultraviolet absorbing layers can be provided at an appropriate position of the optical filter.
As a method for forming the ultraviolet absorbing layer, a method of mixing an ultraviolet absorber in a transparent substrate, a transparent resin layer, or an adhesive layer, a coating solution containing the ultraviolet absorber is directly or otherwise applied to the transparent substrate. The method of apply | coating through the layer of this is mentioned.

  As the ultraviolet absorber, both an organic ultraviolet absorber and an inorganic ultraviolet absorber can be used, but those having a wavelength at 50% transmittance of 350 to 420 nm are preferable, and 360 nm to 400 nm are more preferable. . An ultraviolet absorber having a wavelength of 50% transmittance and a wavelength lower than 350 nm is not preferable because the ultraviolet blocking ability is weak, and an ultraviolet absorber having a wavelength higher than 420 nm is strongly colored.

  Examples of organic ultraviolet absorbers include 2- (2′-hydroxy-5′-t-butylphenyl) benzotriazole and 2- (2′-hydroxy-3 ′, 5′-di-t-butylphenyl) benzotriazole. Benzotriazole compounds such as 2-hydroxy-4-methoxybenzophenone, 2-hydroxy-4-n-octyloxybenzophenone, etc., phenyl salicylate, 4-t-butylphenyl salicylate, 2, Hydroxybenzoate systems such as 5-t-butyl-4-hydroxybenzoic acid n-hexadecyl ester, 2,4-di-t-butylphenyl-3 ', 5'-di-t-butyl-4'-hydroxybenzoate Compounds and the like. Examples of inorganic ultraviolet absorbers include titanium oxide, zinc oxide, cerium oxide, iron oxide, and barium sulfate. These ultraviolet absorbers can be used alone or in combination of two or more.

(Adhesive layer)
The pressure-sensitive adhesive constituting the pressure-sensitive adhesive layer is not particularly limited as long as it is transparent in the visible region (that is, has sufficient transmittance). For example, a rubber-based pressure-sensitive adhesive, an acrylic pressure-sensitive adhesive, and a silicone-based pressure-sensitive adhesive Any of these may be used, but an acrylic adhesive is particularly preferable. Thereby, it is excellent in transparency and the weather resistance of an adhesive layer can be maintained favorable.
Examples of such an acrylic pressure-sensitive adhesive component include a low-Tg main monomer that provides tackiness, a high-Tg comonomer that provides adhesion and cohesion, and a functional group for improving crosslinking and adhesion. Those composed of a group-containing monomer (monoethylenically unsaturated monomer) and the like are used.

  Examples of the main monomer include alkyl acrylates such as ethyl acrylate, butyl acrylate, amyl acrylate, 2-ethylhexyl acrylate, octyl acrylate, cyclohexyl acrylate, benzyl acrylate, butyl methacrylate, and methacrylic acid. Examples thereof include methacrylic acid alkyl esters such as 2-ethylhexyl, cyclohexyl methacrylate and benzyl methacrylate, and these can be used alone or in combination of two or more.

  Examples of the comonomer include vinyl group-containing compounds such as methyl acrylate, methyl methacrylate, ethyl methacrylate, vinyl acetate, vinyl propionate, vinyl ether, styrene, acrylonitrile, and methacrylonitrile.

  Examples of functional group-containing monomers include carboxyl group-containing monomers such as acrylic acid, methacrylic acid, crotonic acid, maleic acid, fumaric acid, itaconic acid, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meta ) Acrylate, 4-hydroxybutyl (meth) acrylate, N-methylolacrylamide, hydroxyl group-containing monomers such as allyl alcohol, dimethylaminoethyl (meth) acrylate, diethylaminoethyl (meth) acrylate, dimethylaminopropyl (meth) ) Tertiary amino group-containing monomers such as acrylate, amide group-containing monomers such as acrylamide and methacrylamide, N-methyl (meth) acrylamide, N-ethyl (meth) acrylamide, N-methoxymethyl (meth) acrylamide N- ethoxymethyl (meth) acrylamide, N-t-butyl acrylamide, N- substituted amide group-containing monomers such as N- octyl acrylamide, an epoxy group-containing monomers such as glycidyl methacrylate.

By using such a material, it is excellent in adhesiveness, cohesiveness, and durability, and arbitrary quality and characteristics according to the application can be obtained by selecting the kind and combination of monomers.
The weight average molecular weight of the pressure-sensitive adhesive component is preferably 300,000 to 3,000,000, more preferably 500,000 to 2,000,000. If the molecular weight of the pressure-sensitive adhesive component is too small, the pressure-sensitive adhesive strength and cohesive strength of the pressure-sensitive adhesive will be poor, and sufficient blister resistance will not be obtained. Workability of sticking deteriorates.
Moreover, it is preferable that the glass transition point (Tg) of an adhesive component is -20 degrees C or less. When the glass transition point exceeds −20 ° C., the pressure-sensitive adhesive becomes hard depending on the use temperature, and the adhesiveness may not be maintained.

As the above-mentioned pressure-sensitive adhesive, either a crosslinked type or a non-crosslinked type can be used. In the case of the crosslinking type, examples include methods using various crosslinking agents such as epoxy compounds, isocyanate compounds, metal chelate compounds, metal alkoxides, metal salts, amine compounds, hydrazine compounds, aldehyde compounds, and the like. The functional group is appropriately selected.
The curable component contained in the pressure-sensitive adhesive layer is not particularly limited, and examples thereof include those having thermosetting properties such as epoxy resins, phenolic resins, melamine resins, and polyester resins, and those having energy ray curable properties. What has energy beam curability is preferable. As a result, the curable component can be cured at room temperature or low temperature in a very short time, and the handleability is excellent.

  Examples of such energy ray curable acrylic monomers and / or oligomers include hexanediol di (meth) acrylate, ethylene glycol di (meth) acrylate, propylene glycol di (meth) acrylate, and pentaerythritol tri (meth). Examples include acrylate, trimethylolpropane tri (meth) acrylate, dipentaerythritol hexa (meth) acrylate, urethane acrylate, epoxy acrylate, and polyester acrylate. These may be used alone or in combination.

Further, the acrylic monomer or oligomer preferably includes a reactive monomer or oligomer having an acryloyl group, and more preferably has two or more acryloyl groups. By including two or more acryloyl groups, the network structure is sufficiently formed, the cohesiveness of the pressure-sensitive adhesive is further improved, and a good pressure-sensitive adhesive layer is obtained.
0.05-50 weight part is preferable with respect to 100 weight part of said adhesive components, and, as for content of curable components, such as said energy-beam curable component, 0.1-20 weight part is more preferable. If the amount of the curable component is too small, the effect of suppressing foaming and swelling due to the generated gas may not be sufficiently obtained due to the cohesive force of the pressure-sensitive adhesive. On the other hand, when there is too much quantity of a sclerosing | hardenable component, there exists a possibility that an adhesive layer may become hard too much and adhesive force may fall.

When the curable component is blended with the pressure-sensitive adhesive component, those having good compatibility with the pressure-sensitive adhesive component are preferable. In addition, the curable component can be used as a copolymer with the main polymer of the pressure-sensitive adhesive component.
When the energy ray-curable component is cured by ultraviolet irradiation or the like, the pressure-sensitive adhesive layer is preferably light-transmitting, for example, substantially transparent or translucent (colorless or colored) is preferable. The pressure-sensitive adhesive layer can be easily cured.

Furthermore, various additives such as a tackifier, a softener (plasticizer), a filler, an anti-aging agent, a silane coupling agent, and the like can be added as other additives as necessary.
Examples of the tackifier include rosin and derivatives thereof, polyterpene, terpene phenol resin, coumarone-indene resin, petroleum resin, styrene resin, and xylene resin.

Examples of the softening agent include liquid polyether, glycol ester, liquid polyterpene, liquid polyacrylate, phthalic acid ester, trimellitic acid ester, and the like.
Examples of the method for forming the pressure-sensitive adhesive layer mainly composed of the pressure-sensitive adhesive component and the curable component include coating with a die or a comma coater. Examples of the coating method include a flow coater, a knife coater, a roll coater, and dipping. Although the thickness (dry film thickness) of an adhesive layer is not specifically limited, It is preferable to set it as about 5-100 micrometers, especially about 10-60 micrometers.

  As shown in FIG. 5, in the display optical filter 36 according to the second embodiment of the present invention, a mesh pattern made of a conductive metal thin film and its surface are formed on one surface of the transparent base material 21 of the electromagnetic wave shielding film. A metal mesh pattern 22 formed by laminating a plating layer is formed thereon, and an electrode frame 23 is formed around the metal mesh pattern 22. On the metal mesh pattern 22 in the electrode frame 23, In order, a laminated film 31 including at least an ultraviolet absorption layer 42 and a near-infrared absorption layer 41 is laminated, and a pressure-sensitive adhesive layer 43 is laminated on the other surface of the transparent substrate 21. It is bonded to the display side of the front glass plate 44 through an adhesive layer 43, and a hard coat layer and an antistatic material are formed on one surface of another transparent substrate 46. A function in which one or more functional layers 47 selected from the group consisting of a layer, an antireflection layer, and an antifouling layer are laminated, and an adhesive layer 45 is laminated on the other surface of the other transparent substrate 46 The adhesive film 48 is bonded to the viewing side of the front glass plate 44 through the pressure-sensitive adhesive layer 45.

  Select from the group consisting of a hard coat layer, an antistatic layer, an antireflection layer, and an antifouling layer on one side of the transparent substrate of the functional film that is bonded to the viewing side of the front glass plate via an adhesive layer One or more functional layers thus formed are laminated according to the required function.

(Hard coat layer)
Abrasion resistance and scratch resistance can be imparted by applying the resin composition for the hard coat layer directly or through another layer to the transparent base film by a known method.
The hard coat layer can be formed by applying, drying, and curing a liquid obtained by dissolving a hard coat agent in a solvent as necessary.
The hard coat agent is not particularly limited, and various known hard coat agents such as a thermosetting hard coat agent and an ultraviolet curable hard coat agent can be used.
As the thermosetting hard coat agent, for example, a silicone resin-based, acrylic resin-based, melamine resin-based hard coat agent, or the like can be used. Silicone resin hard coating agents are superior in hardness, weather resistance, and scratch resistance compared to conventional acrylic resin hard coating agents.

In addition, as ultraviolet curable hard coating agents, hard coating agents such as radically polymerizable hard coating agents such as unsaturated polyester resins and acrylic resins, and cationic polymerizable hard coating agents such as epoxy resins and vinyl ether resins are used. Can be used.
In the case of an ultraviolet curable hard coat agent, it is cured by irradiation with ultraviolet rays. For ultraviolet irradiation, a lamp such as a xenon lamp, a low-pressure mercury lamp, a medium-pressure mercury lamp, a high-pressure mercury lamp, an ultrahigh-pressure mercury lamp, a metal halide lamp, a carbon arc lamp, or a tungsten lamp can be used.
The hard coat layer may further contain various additives such as an antioxidant, an antistatic agent and a flame retardant as required. Various additives can be added and applied to the hard coat agent.
By setting the thickness of the hard coat layer to 0.05 to 5 μm, preferably about 0.5 to 3 μm, the antireflection film can be provided with wear resistance and scratch resistance.

(Antistatic layer)
An antistatic layer is formed on the surface or inside of the functional layer to prevent dust and dirt from adhering to the surface of the optical filter due to static electricity.
In order to completely prevent dust from adhering to the surface of the functional layer, the surface resistivity should be 1 × 10 ¹⁰ (Ω / □) or less, more preferably 1 × 10 ⁸ (Ω / □) or less. There is a need to.
In general, the antireflection layer, which is the outermost layer of the functional layer, can contain an antistatic agent so as to serve as the antistatic layer. Moreover, an antistatic agent can be apply | coated on a hard-coat layer and an antistatic layer can be formed. Alternatively, an antistatic agent may be added to the hard coat layer to provide an antistatic function and also serve as an antistatic layer.

Examples of the antistatic agent include fine metal oxide particles such as aluminum oxide, silicon dioxide, titanium dioxide, and zirconium oxide, fine particles of a conductive polymer, and a surfactant.
Examples of the surfactant include an anionic surfactant, a cationic surfactant, a nonionic surfactant, and an amphoteric surfactant.
A thin film of an antistatic layer can be formed by a method of directly applying a liquid containing these surfactants onto a resin film.
This antistatic layer can also be formed on the hard coat layer containing the conductive metal oxide fine particles.
As a method for applying the antistatic agent, a known method such as a gravure coater, a micro gravure coater, a die coater, a dip coater, or screen printing can be appropriately selected and used.

(Antireflection layer)
Here, the antireflection layer is for preventing reflection of visible light from the outside of the optical filter, and in the case of a single layer, a substance having a lower refractive index than a transparent substrate, for example, a polysiloxane structure A thin film made of fluorine-containing organic compound, MgF ₂ , SiO ₂ or the like is formed.
The film thickness of the antireflection layer is such that the optical film thickness d (nm) is set to d = λ / 4 (where λ is a design wavelength of 500 to 580 nm) to form a single antireflection layer.
In the case of multi-layers, a material having a higher refractive index than that of a transparent substrate, for example, a thin film such as titanium oxide, zirconium oxide or ITO, and a material having a lower refractive index than that of a transparent substrate, such as a thin film of silicon oxide Are stacked alternately.
The formation method of such a metal oxide thin film is not specifically limited, It can carry out using well-known methods, such as sputtering method, a vacuum evaporation method, and a wet coating method.

(Anti-fouling layer)
When coating an antifouling layer on the antireflection layer as the outermost layer, after applying a fluorine or silicone antifouling coating agent to the surface of the antireflection layer, the antifouling layer can be wiped off. Can be formed.
The antifouling layer protects the antireflection layer and enhances the antifouling performance.
As the antifouling coating agent, a fluorine resin or a silicone resin can be used. For example, in the case where the low refractive index layer of the antireflection layer was formed by SiO _2, the fluorosilicate water-repellent paints such as fluoroalkyl silane is preferably used.
The antifouling layer can be formed by applying an antifouling coating agent diluted with a solvent by screen printing, a micro gravure coater or the like.

The thickness of the antifouling layer must be set so as not to hinder the function of the antireflection layer, and is preferably 1 to 30 nm, more preferably 5 to 15 nm.
Further, as a method for imparting an antifouling function to the hard coat layer, a small amount of a hard coating agent in the hard coat layer, for example, a fluorine-based ultraviolet curing antifouling additive in an ultraviolet curing acrylic resin hard coating agent. By adding, in addition to the water repellency and oil repellency characteristic of fluorine as a surface functional material, an excellent antifouling property (prevention of fingerprint adhesion) can be imparted to the surface of the hard coat layer.

(Electromagnetic shielding film for display)
In the present invention, when an optical filter for display is manufactured using an electromagnetic wave shielding film of a roll body, the screen size of the display is set on one surface of the long transparent base material 21 that is rewound from the roll body and supplied. A metal mesh pattern 22 is provided in the longitudinal direction of the transparent base material 21 with a predetermined interval, and the metal mesh pattern 22 includes a mesh pattern made of a conductive metal thin film and electroless plating and / or electrolysis thereon. An electrode frame 23 made of a metal mesh or a metal thin film is disposed around the metal mesh pattern 22 (see FIG. 1).
The dimensions and arrangement pattern of the electrode frame 23 in the electromagnetic wave shielding film need to be changed according to the screen size of the display. Typical screen sizes of the display include 42 inches, 50 inches, 60 inches, and 65 inches.

In the electromagnetic wave shielding film for display, it is necessary to adjust the bias angle θ of the metal mesh pattern 22 with respect to the electrode frame 23 in order to minimize the moire generated by the interference between the black matrix pattern of the display and the metal mesh pattern of the electromagnetic wave shielding film. (See FIG. 1).
This is because the optimum value of the bias angle θ of the metal mesh pattern 22 with respect to the electrode frame 23 is determined according to the resolution of the display.

The following are typical examples of display resolution.
-VGA: 640 x 480 = 310,000 pixels-XGA: 1024 x 768 = 790,000 pixels-SXGA: 1280 x 1024 = 13.1 million pixels-HD: 1280 x 1080 = 1.38 million pixels-Full HD: 1920 x 1080 = 2.07 million Pixel

  The metal mesh pattern has an optimum bias angle corresponding to the resolution of the display panel, and two opposing sides of the arranged electrode frame are parallel to the longitudinal direction of the transparent substrate. It is necessary to be formed as follows.

  According to the present invention, as a method of forming a mesh pattern of an electromagnetic wave shielding film, a method of forming a plating layer on a mesh pattern made of a conductive metal thin film is used, so that resources can be saved and productivity as a whole can be reduced. It is possible to provide an optical filter for display that is manufactured at a low cost and a method for manufacturing an optical filter for display that is inexpensive.

An electromagnetic wave shielding film unwound from a roll body used in the present invention, a metal mesh pattern plated on a conductive thin film, an electrode frame provided at regular intervals in the longitudinal direction of a transparent substrate, and It is a fragmentary top view which shows an example of arrangement | positioning of an electric power feeding layer. The conceptual diagram which shows the process cut | disconnected by the external dimension of an electrode frame, and cut | judging to the size for every display after bonding the sheet | seat optical functional layer film to the electromagnetic wave shield film supplied by rewinding from a roll body It is. It is sectional drawing which shows an example of the optical filter for displays which concerns on the 1st form example of this invention. It is a top view which shows an example of the optical filter for displays which concerns on the 1st form example of this invention. Furthermore, it is sectional drawing which shows an example of the optical filter for a display which concerns on the 2nd form example of this invention formed by bonding a functional film. It is a schematic block diagram which shows an example of an electroplating apparatus. It is a schematic block diagram which shows an example of an electroless-plating apparatus.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Electrolytic plating apparatus, 2 ... Raw material roll body, 3 ... Roll sheet, 4 ... Transfer roll, 5 ... Water washing tank, 6 ... Electrolytic plating tank, 7 ... Feeding roll, 8 ... Positive electrode plate, 9 ... Electrolytic plating Liquid, 10 ... receiving tank, 11 ... circulating pump, 12 ... filter, 13 ... water washing tank, 14 ... dryer, 15 ... roll body of electromagnetic shielding film, 16 ... electroless plating apparatus, 17 ... electroless plating tank, DESCRIPTION OF SYMBOLS 18 ... Electroless plating liquid, 20 ... Electromagnetic wave shield film unwound from roll body, 21 ... Transparent base material of electromagnetic wave shield film, 22 ... Metal mesh pattern, 23 ... Electrode frame, 25 ... Continuous electric power feeding layer, 30 ... Electromagnetic wave shield A roll of film, 31 ... a laminated film of sheets, 32 ... a long laminated film, 33 ... a laminated film cut in the longitudinal direction, 34 ... a laminated sheet of sheets, 35, DESCRIPTION OF SYMBOLS 6 ... Optical filter for displays, 40 ... Adhesive resin layer, 41 ... Near-infrared absorption layer, 42 ... Ultraviolet absorption layer, 43 ... Adhesive layer, 44 ... Front glass plate, 45 ... Adhesive layer, 46 ... Functional film Transparent substrate (other transparent substrate), 47 ... functional layer, 48 ... functional film.

Claims (9)

  On one surface of the transparent substrate of the electromagnetic wave shielding film, a mesh pattern made of a conductive metal thin film corresponding to the screen size of the display and a metal mesh pattern formed by laminating a plating layer thereon are formed, and the metal An electrode frame is formed around the mesh pattern, and a laminated film including at least an ultraviolet absorption layer and a near infrared absorption layer is laminated on the metal mesh pattern in the electrode frame, and the other of the transparent base materials An optical filter for display, wherein the surface is bonded to the display side of the front glass plate through an adhesive layer.   Furthermore, on the viewing side of the front glass plate, one or more functional layers selected from the group consisting of a hard coat layer, an antistatic layer, an antireflection layer and an antifouling layer are laminated on one surface of the transparent substrate. And a functional film in which a pressure-sensitive adhesive layer is laminated on the other surface, and the functional film is bonded to the viewing side of the front glass plate via the pressure-sensitive adhesive layer on the other surface. The optical filter for display according to claim 1, wherein   The mesh pattern formed of the conductive metal thin film is obtained by either a negative development method in which developed silver develops in an exposed portion or a positive development method in which developed silver develops in an unexposed portion. 3. The optical filter for display according to claim 1, wherein the developed optical filter is a developed silver mesh pattern.   The mesh pattern made of the conductive metal thin film is a deposited film mesh pattern generated by metal deposition, a printed mesh pattern generated by printing a conductive paste ink, or a paste containing an electroless plating catalyst. The display optical filter according to claim 1, wherein the display optical filter is any one selected from print mesh patterns generated in the above manner.   A display comprising the display optical filter according to claim 1. A method for producing an optical filter for display using an electromagnetic wave shielding film of a roll body, wherein at least the following steps (1), (2), (3) and (4):
(1) On one surface of the transparent substrate, a plurality of mesh patterns made of a conductive metal thin film corresponding to the screen size of the display and a metal mesh pattern in which a plating layer is laminated thereon are arranged, An electrode frame is formed around the metal mesh pattern, an adhesive layer is laminated on the other surface of the transparent substrate, and inspection standards such as the presence or absence of foreign matter in the electrode frame and the presence or absence of a break in the metal mesh A step of producing a roll body of a long electromagnetic shielding film in which a location that has passed is identified,
(2) A step of cutting a long laminated film including at least an ultraviolet absorbing layer and a near infrared absorbing layer with an inner dimension of an electrode frame according to a screen size of a display to produce a single laminated film;
(3) The electrode frame only at a location that passes inspection criteria such as the presence or absence of foreign matter in the electrode frame and the presence or absence of disconnection of the metal mesh of the long electromagnetic shield film supplied by rewinding from the roll body. A step of laminating the laminated film of the single wafer on the metal mesh pattern inside,
(4) After cutting the long electromagnetic shielding film after laminating the single-layer laminated film into the size of each display with the outer dimensions of the electrode frame, the front glass is interposed through the adhesive layer. The process of bonding to the display side of the board,
A method for producing an optical filter for a display, comprising: Further, the following steps (5) and (6):
(5) One or more functional layers selected from the group consisting of a hard coat layer, an antistatic layer, an antireflection layer, and an antifouling layer on one surface of a long transparent base material that is a base material for the functional film And laminating the pressure-sensitive adhesive layer on the other surface, then cutting the dimensions according to the display screen size to produce a functional film,
(6) The step of bonding the functional film to the viewing side of the front glass plate through the adhesive layer on the other side,
The manufacturing method of the optical filter for displays of Claim 6 characterized by the above-mentioned.   The mesh pattern formed of the conductive metal thin film is obtained by either a negative development method in which developed silver develops in an exposed portion or a positive development method in which developed silver develops in an unexposed portion. 8. The method for producing an optical filter for display according to claim 6, wherein the developed silver mesh pattern is generated.   The mesh pattern made of the conductive metal thin film is a deposited film mesh pattern generated by metal deposition, a printed mesh pattern generated by printing a conductive paste ink, or a paste containing an electroless plating catalyst. The method for manufacturing an optical filter for display according to claim 6 or 7, wherein the method is selected from print mesh patterns generated in the above.

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