JP2008224971A - Image display device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an image display device that can maintain high transparency and hard coat property and satisfies ESD resistance. <P>SOLUTION: The image display device includes a display unit body mounted in a metal frame, and the display unit body is provided with a transparent conductive hard coat base body having a carbon nanotube deposited layer and a cured resin layer on the carbon nanotube deposited layer on the transparent base material, where the thickness of the carbon nanotube deposited layer is ≤10 nm, the total thickness of the carbon nanotube deposited layer and cured resin layer is ≥1.5 μm, and at least a flank of the transparent conductive hard coat base body is coupled to the metal frame directly or using a conductive material. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to an image display device using a transparent conductive hard coat substrate in which carbon nanotubes are used on one side of a transparent substrate and a cured resin layer is applied. As an image display device, application to a CRT (Cathode-ray tube), a liquid crystal display device (LCD), a plasma display (PDP), an EL display (ELD), and the like is particularly suitable.

  One of the various image display devices is the LCD. With technological innovations related to LCDs with higher viewing angles, higher definition, faster response, and color reproducibility, applications that use LCDs can change from notebook computers and monitors to televisions. It is changing to. The basic structure of the LCD is to provide a gap at a fixed interval between the flat glass having two transparent electrodes by a spacer, injecting and sealing a liquid crystal material, and then to the flat glass. This is achieved by attaching polarizing plates to the front and back surfaces. Conventionally, the TN mode has been the mainstream of the liquid crystal mode, but the VA mode and the IPS mode have become mainstream as the size and the high viewing angle progress. These high-performance liquid crystal modes are very sensitive to static electricity, and the driving of the liquid crystal is disturbed by static electricity, causing white spots and circuit breakdown. In particular, in the IPS mode, the ITO treatment is applied to the glass substrate in order to avoid the problem of static electricity, but this treatment is very expensive and causes an increase in cost. Therefore, studies for imparting conductivity to the polarizing plate itself are currently being conducted.

  A transparent conductive hard coat substrate obtained by conducting a conductive treatment on a transparent substrate is usually formed by either a dry method or a wet method. In the dry method, the conductive layer is formed by PVD and CVD using a conductive metal oxide such as indium tin oxide (ITO), antimony tin oxide (ATO), and aluminum-doped zinc oxide (FTO). In the wet method, a conductive coating composition is prepared using a conductive powder such as the above mixed oxide and a binder, and the substrate is coated with the composition to form a conductive layer. In the dry method, a conductive substrate having both excellent transparency and excellent conductivity can be obtained. However, the dry method requires a complicated apparatus having a decompression system, and the productivity is low. On the other hand, the wet method uses a relatively simple apparatus, has high productivity, and can be easily applied to a continuous or large substrate. The conductive powder used in the wet method is a very fine powder having an average primary particle size of 0.5 μm or less so as not to interfere with the transparency of the obtained transparent conductive hard coat substrate. In order to maintain transparency, the conductive powder has an average primary particle size of less than half the shortest wavelength of visible light (0.2 μm) in order not to absorb visible light and to scatter visible light in a controlled manner. What you have is used.

  Organic polymers and plastics are known as conductive materials. Development of these materials began in the late 1970s. As a result of these, conductive materials mainly composed of polymers such as polyaniline, polythiophene, polypyrrole, and polyacetylene have been obtained. These conductive organic polymers are used by a wet method. Although the conductive organic polymer can form a conductive layer having a sufficient conductive performance with a single layer, it does not have a hard coat property. Although a hard coat property can be secured by coating a hard coat layer on a conductive layer formed of a conductive organic polymer, in such an embodiment, the conductivity cannot be secured, and the conductivity and the hard coat property are Shows the trade-off relationship.

  As a method for obtaining a conductive hard coat substrate having both conductivity and hard coat properties, after coating ATO-containing ink on a transparent substrate, a method of further coating an antiglare layer containing gold-nickel coated resin beads Has been proposed (Patent Document 1). However, in this method, although conductivity and hard coat property can be realized, there is a problem that haze is generated due to a difference in refractive index between the gold-nickel coat resin beads and the hard coat resin, and the transmittance is also lowered.

  Further, as a method for producing a transparent conductive hard coat substrate, a method is described in which a binder resin is infiltrated into a carbon nanotube having a three-dimensional network structure on a transparent substrate (Patent Document 2). In this method, as a method for obtaining conductivity from the surface side, a dispersion of carbon nanotubes is applied with a thickness of 1 μm to form three-dimensional network carbon nanotubes, However, it is difficult to obtain hard coat properties because the coating thickness of the binder resin is thin. In addition, a method is described in which a carbon nanotube dispersion is applied to a thickness of 1 μm, a resin of 25 μm is applied thereon, and a self-supporting film is obtained by peeling from the substrate. In this method, conductivity can be obtained on the peeled surface, but conductivity cannot be obtained from the resin side surface of the coating film. Can not.

In addition, as an evaluation method for showing resistance against static electricity, an ESD (Electronic Discharge) test is currently performed, and a polarizing plate having a conductive performance that can withstand the test is required. To withstand the ESD test, it must be grounded. As a method of attaching the earth to the polarizing plate, a method of arranging a transparent conductive film on the outermost surface of the polarizing plate and attaching the earth from the outermost surface has been proposed (Patent Documents 3 to 7). According to such a configuration, although the earth can be easily attached from the outermost surface of the polarizing plate and can exhibit sufficient ESD resistance, on the other hand, the basic requirements of the surface of the polarizing plate such as hardness and appearance are essential. It will impede performance. In order to ensure the hardness of the outermost surface of the polarizing plate, the transparent conductive hard coat substrate can be used. As described above, the transparent conductive hard coat having transparency and hard coat properties and satisfying the conductivity can be used. No substrate has been obtained.
Japanese Patent No. 3507719 Patent No. 3665969 JP-A-5-188388 JP-A-5-203945 Japanese Patent Laid-Open No. 6-18931 JP 62-204228 A Japanese Utility Model Publication No. 61-31346

  An object of this invention is to provide the image display apparatus which can maintain high transparency and hard-coat property, and can satisfy ESD tolerance.

  As a result of intensive studies to solve the above-mentioned problems, the present inventors have found the following image display device and have reached the present invention.

That is, the present invention is an image display device having a display unit body mounted in a metal frame,
The display unit main body is provided with a transparent conductive hard coat substrate having a carbon nanotube deposition layer and a cured resin layer on the carbon nanotube deposition layer on a transparent substrate,
The transparent conductive hard coat substrate is
The thickness of the carbon nanotube deposition layer is 10 nm or less,
The total thickness of the carbon nanotube deposition layer and the cured resin layer is 1.5 μm or more,
The present invention relates to an image display device characterized in that at least a side surface of a transparent conductive hard coat substrate is connected to a metal frame directly or by a conductive material.

  In the image display device, the carbon nanotubes are preferably single-walled carbon nanotubes.

  In the image display device, the total thickness of the carbon nanotube deposition layer and the cured resin layer is preferably 1.5 μm or more and 30 μm or less.

  In the image display device, the outer surface structure of the cured resin layer may be a fine uneven structure.

  In the image display device, the transparent conductive hard coat substrate may be one in which at least one antireflection layer is provided on the cured resin layer.

  In the image display device, as the transparent conductive hard coat substrate, a polarizing plate in which the transparent substrate side is laminated on at least one surface of a polarizer can be used provided in the display unit body.

  The transparent conductive hard coat substrate used in the display unit body mounted on the image display device of the present invention has a carbon nanotube deposition layer having a thickness of 10 nm or less formed on a transparent substrate, and is two-dimensionally in the in-plane direction. In particular, a network of carbon nanotubes is formed to ensure in-plane conduction. The carbon nanotube deposition layer has a thickness of 10 nm or less and can maintain high transparency. In addition, a hardened resin layer having a total thickness of 1.5 μm or more including the thickness of the carbon nanotube deposition layer is formed on the carbon nanotube deposition layer, thereby ensuring a hard coat property. Thus, the transparent conductive hard coat substrate of the present invention can ensure conduction in the in-plane direction, and is excellent in conductivity.

  Further, since the carbon nanotube is fibrous, a part of the carbon nanotube is exposed or protruded from the side surface (cut surface) of the transparent conductive hard coat substrate. ESD resistance can be satisfied by attaching a ground from the side.

  That is, the transparent conductive hard coat substrate of the present invention is provided on the surface of the display unit body, and the side surface of the transparent conductive hard coat substrate is connected to the metal frame directly or by a conductive material, thereby Static electricity in the entire surface of the substrate can be removed by grounding while ensuring the hardness and appearance of the display device.

  An embodiment of a transparent conductive hard coat substrate and a polarizing plate using the same used in the image display device of the present invention will be described in detail.

  As shown in FIG. 1, the transparent conductive hard coat substrate F of the present invention has a carbon nanotube deposition layer 2 and a cured resin layer 3 on one side of a transparent substrate 1. As shown in FIG. 2, a polarizing plate P is formed using the transparent conductive hard coat substrate F as a transparent protective film by bonding the transparent conductive hard coat substrate F to the polarizer 4 on the transparent substrate 1 side. can do. A transparent protective film 5 can be bonded to the other surface of the polarizer 4.

  The transparent substrate is not particularly limited as long as it has an excellent visible light transmittance (preferably a light transmittance of 90% or more) and excellent transparency (preferably a haze value of 1% or less). Specifically, for example, polyester resins such as polyethylene terephthalate and polyethylene naphthalate, cellulose resins such as diacetyl cellulose and triacetyl cellulose, acrylic resins such as polymethyl methacrylate, polystyrene, acrylonitrile / styrene copolymer, styrene Examples thereof include resins, styrene resins such as acrylonitrile / styrene resins, acrylonitrile / butadiene / styrene resins, acrylonitrile / ethylene / styrene resins, styrene / maleimide copolymers, styrene / maleic anhydride copolymers, and polycarbonate resins. In addition, cycloolefin resin, norbornene resin, polyolefin resin such as polyethylene, polypropylene, ethylene / propylene copolymer, vinyl chloride resin, amide resin such as nylon and aromatic polyamide, aromatic polyimide, polyimide amide, etc. Imide resins, sulfone resins, polyether sulfone resins, polyether ether ketone resins, polyphenylene sulfide resins, vinyl alcohol resins, vinylidene chloride resins, vinyl butyral resins, arylate resins, polyoxymethylene resins Examples of the resin that forms the transparent substrate include a polymer film made of a resin, an epoxy resin, or a blend of the resins. In addition to the above, examples of the transparent substrate include a glass substrate. As the transparent substrate, those having a small optical birefringence are particularly preferably used.

  Moreover, the polymer film described in JP-A-2001-343529 (WO01 / 37007), for example, (A) a thermoplastic resin having a substituted and / or unsubstituted imide group in the side chain, and (B) a substitution in the side chain And / or a resin composition containing a thermoplastic resin having unsubstituted phenyl and a nitrile group. A specific example is a film of a resin composition containing an alternating copolymer composed of isobutylene and N-methylmaleimide and an acrylonitrile / styrene copolymer. As the film, a film made of a mixed extruded product of the resin composition or the like can be used.

  Further, the transparent base material is preferably not colored as much as possible when the transparent conductive hard coat substrate is applied as a transparent protective film of a polarizer. Therefore, Rth = [(nx + ny) / 2−nz] · d (where nx and ny are the main refractive index in the plane of the film, nz is the refractive index in the film thickness direction, and d is the film thickness). A base film having a retardation value in the film thickness direction of −90 nm to +75 nm is preferably used. The thickness direction retardation value (Rth) is more preferably −80 nm to +60 nm, and particularly preferably −70 nm to +45 nm.

  When the transparent conductive hard coat substrate of the present invention is used as a transparent protective film for a polarizing plate, the transparent substrate is preferably triacetyl cellulose, polycarbonate, acrylic polymer, polyolefin having a cyclic or norbornene structure, and the like. is there.

  Moreover, the below-mentioned polarizer itself can be used for a transparent base material. With such a configuration, a transparent protective layer made of triacetyl cellulose or the like is not required on one side of the polarizer, and the structure of the polarizing plate can be simplified, so that the number of manufacturing steps can be reduced and the production efficiency can be improved. Further, the polarizing plate can be further thinned. When the transparent substrate is a polarizer, the cured resin layer in the transparent conductive hard coat substrate serves as a conventional transparent protective layer. Further, the transparent conductive hard coat substrate also serves as a cover plate attached to the liquid crystal cell surface.

  The thickness of the transparent substrate can be determined as appropriate, but generally it is preferably about 10 to 500 μm from the viewpoints of workability such as strength and handleability, and thin layer properties. 20-300 micrometers is especially preferable, and 30-200 micrometers is more preferable. Further, the refractive index of the transparent substrate is not particularly limited, but is usually about 1.30 to 1.80, and particularly preferably 1.40 to 1.70.

  The carbon nanotube deposition layer provided on the transparent substrate is percolated in the in-plane direction. Such a carbon nanotube deposition layer is obtained by applying a dispersion containing carbon nanotubes and a solvent to a transparent substrate and further performing a drying treatment.

  The carbon nanotubes to be used can be used as appropriate, such as multiwall (MW), double wall (DW), and single wall (SW), but those with fewer layers have less light absorption and higher transmittance. Can do. From this point, carbon nanotubes to be used are preferably DW and SW, and more preferably SW.

  Moreover, about the carbon nanotube to be used, you may use what was surface-treated. Although there is no restriction | limiting in particular about the kind of surface treatment, The thing using a covalent bond (For example, modification | denaturation by a carboxyl group etc.), the thing using a non-covalent bond, etc. can be used suitably.

  The aspect ratio of the carbon nanotube is not particularly limited. However, if the aspect ratio is large, the carbon nanotubes tend to aggregate, making it difficult to disperse in the dispersion liquid, and ensuring diffusibility to the cured resin layer. The aspect ratio of the carbon nanotube is preferably 50 to 5000, more preferably 100 to 3000. The diameter of the carbon nanotube is preferably 5 nm or less, more preferably 2 nm or less from the viewpoint of transmittance.

  The thickness of the carbon nanotube deposition layer is controlled to 10 nm or less. When the thickness exceeds 10 nm, it is not preferable in terms of transparency. The thickness of the carbon nanotube deposition layer is preferably 8 nm or less, and more preferably 5 nm or less. At least one carbon nanotube deposition layer is laminated. The thickness of the carbon nanotube deposition layer can be controlled by adjusting the concentration of carbon nanotube dispersion and the coating amount.

  The solvent for dispersing the carbon nanotubes is not particularly limited as long as the carbon nanotubes can be well dispersed. Preferably, it is a solvent that does not dissolve the substrate, and can be appropriately selected depending on the substrate. Examples of the solvent include dimethylformamide, water, isopropyl alcohol, methyl isobutyl ketone, ethanol, methanol, methyl ethyl ketone, toluene and the like. The concentration of the carbon nanotube in the carbon nanotube dispersion is not particularly limited, but is usually about 0.001 to 0.3% by weight, preferably 0.003 to 0.15% by weight. The carbon nanotube dispersion may contain a surfactant in the solvent for the purpose of promoting dispersibility. The surfactant is not particularly limited, and anionic, nonionic, cationic and zwitterionic ones can be appropriately used. The surfactant is usually about 0.01 to 1% by weight, preferably 0.05 to 0.5% by weight, in the carbon nanotube dispersion.

  The method for preparing the carbon nanotube dispersion liquid (carbon nanotube dispersion method) is not particularly limited, but is not particularly limited as long as the carbon nanotubes can be well dispersed, such as an ultrasonic dispersion device and a homogenizer. The dispersion time is preferably 1 minute to 5 hours, more preferably 10 minutes to 4 hours, and more preferably 30 minutes to 3 hours when an ultrasonic dispersion apparatus is used.

  In order to form the carbon nanotube deposition layer of the present invention, a carbon nanotube dispersion is applied onto a transparent substrate and dried. As a method for coating the carbon nanotube dispersion liquid on the transparent substrate, a known coating method such as fountain coating, die coating, spin coating, spray coating, gravure coating, roll coating, and bar coating can be used.

  As described above, the thickness of the carbon nanotube deposition layer is controlled by controlling the concentration and the coating amount of the carbon nanotube dispersion, and along with this, the aperture ratio of the carbon nanotube deposition layer (in the plane of the carbon nanotube deposition layer, The ratio of the area occupied by the carbon nanotubes) is preferably controlled to be 50% or more. The aperture ratio of the carbon nanotube deposition layer can be adjusted by adjusting the concentration of the carbon nanotube dispersion and the coating thickness. The aperture ratio of the carbon nanotube deposition layer is preferably 50% or more from the viewpoint of transparency. The aperture ratio is preferably 60% or more, and more preferably 70% or more. On the other hand, from the viewpoint of ensuring conductivity, the aperture ratio is preferably 90% or less, and more preferably 80% or less. In order to maintain percolation at a higher aperture ratio, it is effective to use carbon nanotubes having a large aspect ratio.

Further, the surface resistance value of the carbon nanotube deposition layer is preferably 1.0 × 10 ⁹ Ω / □ or less, more preferably 1.0 × 10 ⁸ Ω / □ or less, and further 1.0. × 10 ⁷ Ω / □ or less is preferable.

  As the material for forming the cured resin layer, a material that is cured by heat or radiation is used. Such a material can impart hard coat properties. Examples of the material include a thermosetting resin, an ultraviolet curable resin, and a radiation curable resin such as an electron beam curable resin. Among these, as described above, in particular, an ultraviolet curable resin capable of efficiently forming a cured resin layer by a simple processing operation by a curing treatment by ultraviolet irradiation is preferable. Examples of these curable resins include polyesters, acrylics, urethanes, amides, silicones, epoxies, melamines, and the like, and these monomers, oligomers, polymers, and the like are included. Radiation curable resins, particularly UV curable resins are particularly preferred because of their high processing speed and low heat damage to the transparent substrate. Examples of the ultraviolet curable resin preferably used include those having an ultraviolet polymerizable functional group, particularly those containing an acrylic monomer or oligomer component having 2 or more, particularly 3 to 6 functional groups. In addition, a photopolymerization initiator is blended in the ultraviolet curable resin.

  Examples of the photopolymerization initiator include 2,2-dimethoxy-2-phenylacetophenone, acetophenone, benzophenone, xanthone, 3-methylacetophenone, 4-chlorobenzophenone, 4,4′-dimethoxybenzophenone, benzoinpropyl ether, benzyldimethyl ketal. N, N, N ′, N′-tetramethyl-4,4′-diaminobenzophenone, 1- (4-isopropylphenyl) -2-hydroxy-2-methylpropan-1-one, and other thioxanthates. Can be used. The compounding quantity of a photoinitiator is 0.5-5 weight part with respect to 100 weight part of formation materials of a cured resin layer.

  The cured resin layer is formed so that the total thickness of the carbon nanotube deposition layer and the cured resin layer is 1.5 μm or more. The thickness is preferably 2 μm or more, more preferably 5 μm or more, and further preferably 20 μm or more. When the total thickness is less than 1.5 μm, hard coat properties cannot be secured. The total thickness is preferably 30 μm or less from the viewpoint of surface resistance.

  The cured resin layer is formed by dissolving the material for forming the cured resin layer in a solvent and applying the solution as a solution on the carbon nanotube deposition layer, drying the solvent, and then performing a curing process.

  The solvent is not particularly limited, but preferably has a boiling point of 50 to 160 ° C. More preferably, the boiling point is 80 to 130 ° C. The solvent can be used singly or in combination of two or more. When two or more solvents are mixed and used, it is preferable that at least one solvent satisfies the boiling point. When the boiling point of the dilution solvent used for the material for forming the cured resin layer is too high, the amount of residual solvent increases. Examples of the solvent include methyl isobutyl ketone, cyclopentanone, ethyl acetate, butyl acetate, and methyl ethyl ketone. The concentration of the solution is usually such that the solid content concentration of the material for forming the cured resin layer is about 20 to 80% by weight, preferably 30 to 70% by weight, in view of the uniformity of the thickness of the cured resin layer. preferable.

  The surface of the cured resin layer can be provided with an antiglare property by forming a fine uneven structure. The method for forming the fine concavo-convex structure on the surface is not particularly limited, and an appropriate method can be adopted. For example, a method of forming a fine concavo-convex structure by roughening the surface of a hard coat layer provided on a transparent substrate by an appropriate method such as sand blasting, embossing roll, chemical etching or the like. Furthermore, a method of imparting a fine concavo-convex structure by dispersing an inorganic or organic spherical or amorphous filler in the resin for forming a cured resin layer can be used. These fine concavo-convex structure forming methods may be formed as a layer in which two or more methods are combined to combine the fine concavo-convex structure surfaces in different states. Examples of inorganic or organic spherical or amorphous fillers include crosslinked or uncrosslinked organic fine particles composed of various polymers such as PMMA (polymethyl methacrylate), polyurethane, polystyrene, melamine resin, glass, silica, alumina, and oxidation. Examples thereof include conductive inorganic particles such as calcium, titania, zirconia, cadmium oxide, antimony oxide, or a composite thereof. The average particle system of the filler is preferably 0.5 to 12 μm, more preferably 1 to 10 μm. The amount of the filler used is preferably 1 to 50 parts by weight with respect to 100 parts by weight of the resin.

  Various leveling agents can be added to the material for forming the cured resin layer. As the leveling agent, a fluorine-based or silicone-based leveling agent can be used as appropriate, and a silicone-based leveling agent is more preferable. Examples of the silicone leveling agent include polydimethylsiloxane, polyether-modified polydimethylsiloxane, and polymethylalkylsiloxane. Of these silicone leveling agents, reactive silicones are particularly preferred. By adding reactive silicone, slipperiness is imparted to the surface and scratch resistance is maintained. Further, when a layer containing a siloxane component is used as the low refractive index layer, the adhesiveness is improved by using a reactive silicone having a hydroxyl group.

  The blending amount of the leveling agent is preferably 5 parts by weight or less, and more preferably in the range of 0.01 to 5 parts by weight with respect to 100 parts by weight of all resin components of the cured resin layer forming material.

  As necessary, pigments, fillers, dispersants, plasticizers, UV absorbers, surfactants, antioxidants, thixotropic agents, etc. are used as the material for forming the cured resin layer, as long as the performance is not impaired. can do. These may be used alone or in combination of two or more.

  In order to form the cured resin layer, a material for forming the cured resin layer is coated on the carbon nanotube deposition layer, and then dried and cured. As a method of coating the transparent composition on the transparent substrate, a known coating method such as fountain coating, die coating, spin coating, spray coating, gravure coating, roll coating, bar coating or the like can be used.

As an energy ray source used for the radiation curing (particularly, ultraviolet curing), for example, a high-pressure mercury lamp, a halogen lamp, a xenon lamp, a nitrogen laser, an electron beam accelerator, a radioactive element, or the like is used. The irradiation amount of the energy ray source is preferably 50 to 5000 mJ / cm ² as an integrated exposure amount at an ultraviolet wavelength of 365 nm. When the irradiation amount is less than 50 mJ / cm ² , curing becomes insufficient, and thus the hardness of the hard coat layer decreases. Moreover, when it exceeds 5000 mJ / cm < ² >, a hard-coat layer will color and transparency will fall.

  An antireflection layer can be provided on the cured resin layer. When light strikes an object, it repeats phenomena such as reflection at the interface, absorption inside, and scattering, and passes through the back of the object. When an antiglare hard coat film is attached to an image display device, one of the factors that lower the image visibility is the reflection of light at the interface between air and the antiglare hard coat layer. As a method to reduce the surface reflection, a thin film with strictly controlled thickness and refractive index is laminated on the surface of the antiglare hard coat layer, and the reversed phases of incident light and reflected light using the light interference effect cancel each other. The antireflection function is expressed by combining them.

  In the design of the antireflection layer based on the light interference effect, in order to improve the interference effect, it is necessary to increase the refractive index difference between the antireflection layer and the cured resin layer. In general, in a multilayer antireflection layer in which 2 to 5 optical thin films (thin films whose thickness and refractive index are strictly controlled) are laminated on a base material, a plurality of components having different refractive indices are formed in a predetermined thickness. By forming, the degree of freedom in optical design of the antireflection layer is increased, the antireflection effect is further improved, and the spectral reflection characteristics can be made flat in the visible light region. Since the thickness accuracy of each layer of the optical thin film is required, each layer is generally formed by a dry method such as vacuum deposition, sputtering, or CVD.

  As the antireflection layer, titanium oxide, zirconium oxide, silicon oxide, magnesium fluoride, or the like is used. In order to express the antireflection function more greatly, it is preferable to use a laminate of a titanium oxide layer and a silicon oxide layer. In the laminate, a titanium oxide layer having a high refractive index (refractive index: about 1.8) is formed on the cured resin layer, and a silicon oxide layer having a low refractive index (refractive index: about 1.) is formed on the titanium oxide layer. A two-layer laminate in which 45) is formed, and a four-layer laminate in which a titanium oxide layer and a silicon oxide layer are formed in this order on the two-layer laminate are preferable. By providing such an antireflection layer of a two-layer laminate or a four-layer laminate, reflection in the visible light wavelength region (380 to 780 nm) can be reduced uniformly.

  It is also possible to exhibit an antireflection effect by laminating a single-layer optical thin film on the cured resin layer. Even in the design of a single antireflection layer, it is necessary to increase the difference in refractive index between the antireflection layer and the cured resin layer in order to maximize the antireflection function. When the thickness of the antireflection layer is d, the refractive index is n, and the wavelength of incident light is λ, the relational expression nd = λ / 4 is established between the thickness of the antireflection layer and its refractive index. When the refractive index of the antireflection layer is smaller than the refractive index of the substrate, the reflectance is minimized under the condition that the relational expression is satisfied. For example, when the refractive index of the antireflection layer is 1.45, the thickness of the antireflection layer that minimizes the reflectance is 95 nm with respect to incident light having a wavelength of 550 nm in visible light.

  The wavelength region of visible light that exhibits the antireflection function is 380 to 780 nm, and the wavelength region with particularly high visibility is in the range of 450 to 650 nm, and the design that minimizes the reflectance of 550 nm, which is the central wavelength, is designed. It is usually done.

  When designing an antireflection film with a single layer, the thickness accuracy is not as strict as the thickness accuracy of a multilayer antireflection film, and within a range of ± 10% of the design thickness, that is, when the design wavelength is 95 nm, 86 nm to 105 nm. If it is in the range, it can be used without problems. For this reason, generally, wet coating methods such as phanten coating, die coating, spin coating, spray coating, gravure coating, roll coating, and bar coating are used to form a single-layer antireflection film. Yes.

  For the purpose of reducing the refractive index, hollow spherical silicon oxide ultrafine particles can be added to the antireflection film. Hollow spherical silicon oxide ultrafine particles are silicon oxide ultrafine particles having an average particle diameter of 5 nm to 300 nm, and the ultrafine particles are hollow spheres in which cavities are formed inside the outer shell having pores. The cavity contains the solvent and / or gas at the time of preparation of the fine particles. It is preferable that a precursor material for forming the cavity remains in the cavity. The thickness of the outer shell is preferably in the range of 1 nm to 50 nm and in the range of 1/50 to 1/5 of the average particle diameter. The outer shell is preferably composed of a plurality of coating layers. It is preferable that the pores are closed and the cavity is sealed by the outer shell. In the antireflection layer, the porosity or cavity is maintained, and the refractive index of the antireflection layer can be reduced, so that it can be preferably used. As a method for producing such hollow and spherical silicon oxide ultrafine particles, for example, the method for producing silica-based fine particles disclosed in JP-A-2000-233611 is suitably employed.

  An inorganic sol can be added to the low refractive index layer (antireflection layer) in order to improve the film strength. The inorganic sol is not particularly limited, and examples thereof include silica, alumina, magnesium fluoride, and the like, and silica sol is particularly preferable. The addition amount of the inorganic sol can be appropriately set within the range of 80 to 100 parts by weight with respect to 100 parts by weight of the total solid content of the low refractive index forming material. The particle size of the inorganic sol is preferably in the range of 2 to 50 nm, more preferably in the range of 5 to 30 nm.

  Since the antireflection layer is frequently attached to the outermost surface of the image display device, the antireflection layer is susceptible to contamination from the external environment. In particular, contaminants such as fingerprints, hand stains, sweat and hair styling are likely to adhere to the skin, and the surface reflectance changes due to the attachment, and the contents appear to float white, making the display content unclear. Contamination becomes more conspicuous than in the case of a transparent plate or the like. In such a case, a fluorine group-containing silane compound, a fluorine group-containing organic compound, or the like can be laminated on the antireflection layer in order to provide a function related to adhesion prevention and easy removal of contaminants. .

  By performing various surface treatments on the transparent substrate or the cured resin layer coated on the transparent substrate, the transparent substrate and the cured resin layer (hard coat layer), the transparent substrate and the polarizer or the cured resin layer, The adhesion of the antireflection layer can be improved. As the surface treatment, low-pressure plasma treatment, ultraviolet irradiation treatment, corona treatment, flame treatment, acid or alkali treatment can be used. Further, the alkali saponification treatment that is preferably used as the surface treatment when triacetyl cellulose is used as the transparent substrate will be described more specifically. It is preferable to carry out a cycle in which the cellulose ester film surface is immersed in an alkaline solution, then washed with water and dried. Examples of the alkaline solution include a potassium hydroxide solution and a sodium hydroxide solution, and the specified concentration of hydroxide ions is preferably 0.1N to 3.0N, and more preferably 0.5N to 2.0N. preferable. The alkaline solution temperature is preferably in the range of 25 ° C to 90 ° C, more preferably 40 ° C to 70 ° C. Then, the water washing process and the drying process are performed and the triacetyl cellulose which performed the surface treatment can be obtained.

  The transparent conductive hard coat substrate of the present invention can be laminated with a polarizer or a polarizing plate using an adhesive, a pressure-sensitive adhesive, or the like to obtain a polarizing plate having the function of the present invention. The polarizing plates are usually disposed on both sides of the liquid crystal cell. Usually, the polarizing plates are arranged so that the absorption axes of the two polarizing plates are substantially orthogonal to each other. In general, a polarizing plate having a transparent protective film on one side or both sides of a polarizer is generally used. When providing a transparent protective film on both surfaces of a polarizer, the same material may be sufficient as the transparent protective film of front and back, and a different material may be sufficient as it.

  The polarizer is not particularly limited, and various types can be used. For example, dichroic substances such as iodine and dichroic dyes are adsorbed on hydrophilic polymer films such as polyvinyl alcohol films, partially formalized polyvinyl alcohol films, and ethylene / vinyl acetate copolymer partially saponified films. And polyene-based oriented films such as a uniaxially stretched product, a polyvinyl alcohol dehydrated product and a polyvinyl chloride dehydrochlorinated product. Among these, a polarizer comprising a polyvinyl alcohol film and a dichroic substance such as iodine is particularly preferable because of its high polarization dichroic ratio. The thickness of these polarizers is not particularly limited, but is generally about 5 to 80 μm.

  A polarizer obtained by dyeing a polyvinyl alcohol film with iodine and uniaxially stretching it can be produced, for example, by dyeing polyvinyl alcohol in an aqueous solution of iodine and stretching it 3 to 7 times the original length. If necessary, it can be immersed in an aqueous solution such as potassium iodide which may contain boric acid, zinc sulfate, zinc chloride and the like. Further, if necessary, the polyvinyl alcohol film may be immersed in water and washed before dyeing.

  In addition to washing the polyvinyl alcohol film surface and anti-blocking agent by washing the polyvinyl alcohol film with water, it also has the effect of preventing unevenness such as uneven dyeing by swelling the polyvinyl alcohol film. is there. Stretching may be performed after dyeing with iodine, or may be performed while dyeing, or may be performed with dyeing after iodine. The film can be stretched in an aqueous solution of boric acid or potassium iodide or in a water bath.

  As described above, the application to the transparent conductive hard coat substrate of the present invention to the polarizer can be applied to one side of the polarizer, and the transparent conductive hard coat substrate of the present invention using the polarizer itself as a transparent substrate. Can be formed. In addition to these embodiments, the transparent conductive hard coat substrate of the present invention can be applied to a transparent protective film of a polarizing plate provided with a transparent protective film on both sides of the polarizer.

  As the transparent protective film, those having excellent transparency, mechanical strength, thermal stability, moisture shielding property, retardation value stability and the like are preferable. As a material which forms the said transparent protective film, what was illustrated to the transparent base material can be used, for example. The transparent protective film can also be formed as a cured layer of thermosetting or ultraviolet curable resin such as acrylic, urethane, acrylurethane, epoxy, or silicone.

  As the transparent protective film, a cellulose resin such as triacetyl cellulose and a norbornene resin are preferably used from the viewpoints of polarization characteristics and durability. Specific examples include the product name “Fujitac” manufactured by Fuji Photo Film Co., Ltd., the product name “Zeonor” manufactured by ZEON Corporation, and the product name “ARTON” manufactured by JSR Corporation.

  The thickness of the transparent protective film can be appropriately determined, but is generally about 1 to 500 μm from the viewpoints of workability such as strength and handleability, and thin layer properties. More preferably, it is 5-200 micrometers. Especially preferably, it is 10-150 micrometers. If it is said range, a polarizer will be protected mechanically, and even if it exposes to high temperature and high humidity, a polarizer will not shrink | contract and it can maintain the stable optical characteristic.

  As the transparent protective film, since the retardation value in the film plane and the retardation value in the thickness direction may affect the viewing angle characteristics of the liquid crystal display device, the one having an optimized retardation value may be used. preferable. However, the transparent protective film for which optimization of the retardation value is desired is a transparent protective film laminated on the surface of the polarizer on the side close to the liquid crystal cell, and is laminated on the surface of the polarizer on the side far from the liquid crystal cell. This is not the case because the transparent protective film does not change the optical characteristics of the liquid crystal display device.

  As the retardation value of the transparent protective film laminated on the surface of the polarizer near the liquid crystal cell, the retardation value (Re) in the film plane is preferably 0 to 5 nm. More preferably, it is 0-3 nm. More preferably, it is 0-1 nm. The retardation value (Rth) in the thickness direction is preferably 0 to 15 nm. More preferably, it is 0-12 nm. More preferably, it is 0-10 nm. Especially preferably, it is 0-5 nm. Most preferably, it is 0-3 nm.

  The method of laminating the transparent protective film with the polarizer is not particularly limited. For example, an adhesive made of an acrylic polymer or a vinyl alcohol polymer, or vinyl alcohol such as boric acid, borax, glutaraldehyde, melamine, or oxalic acid. It can be carried out through an adhesive or the like comprising at least a water-soluble crosslinking agent of a polymer. As a result, it is difficult to peel off due to the influence of humidity and heat, and the light transmittance and the degree of polarization can be improved. As the adhesive, a polyvinyl alcohol-based adhesive is preferably used from the viewpoint of excellent adhesiveness with polyvir alcohol, which is a raw material of a polarizer.

  The polymer film containing the norbornene-based resin is used as a transparent protective film, and as a pressure-sensitive adhesive when laminated with a polarizer, it has excellent transparency, low birefringence, etc., and exhibits sufficient adhesive strength when used as a thin layer. What can be done is preferred. As such an adhesive, for example, an adhesive for dry lamination in which a polyurethane resin solution and a polyisocyanate resin solution are mixed, a styrene butadiene rubber adhesive, an epoxy two-component curable adhesive, for example, an epoxy resin and a polythiol Can be used, and those composed of two liquids of epoxy resin and polyamide can be used. Solvent type adhesives and epoxy type two liquid curable adhesives are particularly preferable, and transparent ones are preferable. Some adhesives can improve the adhesive force by using an appropriate adhesive primer, and when such an adhesive is used, it is preferable to use an adhesive primer.

  The adhesive primer is not particularly limited as long as it is a layer capable of improving adhesiveness.For example, in the same molecule, a reactive functional group such as amino group, vinyl group, epoxy group, mercapto group, chloro group and the like. Silane coupling agent having hydrolyzable alkoxysilyl group, titanate coupling agent having hydrolyzable hydrophilic group containing titanium and organic functional group in the same molecule, and aluminum in the same molecule So-called coupling agents such as aluminate coupling agents having hydrolyzable hydrophilic groups and organic functional groups, and organic reactions such as epoxy resins, isocyanate resins, urethane resins, and ester urethane resins A resin having a functional group can be used. Especially, it is preferable that it is a layer containing a silane coupling agent from a viewpoint that it is easy to handle industrially.

  The polarizing plate is preferably provided with an adhesive layer or a pressure-sensitive adhesive layer on both sides or one side in order to facilitate lamination to the liquid crystal cell.

  The adhesive or pressure-sensitive adhesive is not particularly limited. For example, acrylic polymer, silicone polymer, polyester, polyurethane, polyamide, polyvinyl ether, vinyl acetate / vinyl chloride copolymer, modified polyolefin, epoxy-based, fluorine-based, natural rubber, synthetic rubber and other rubber-based polymers Can be appropriately selected and used. In particular, an acrylic pressure-sensitive adhesive is preferably used in that it is excellent in optical transparency, exhibits appropriate wettability, cohesiveness, and adhesive pressure-sensitive adhesive properties, and is excellent in weather resistance and heat resistance.

  The image display device of the present invention is applied to various image display devices in which a display unit body is mounted in a metal frame. Examples of the image display device include a CRT, a liquid crystal display device, a plasma display, an EL display, and the like, and the transparent conductive hard coat substrate or the polarizing plate is applied to the display unit body of each image display device. The transparent conductive hard coat substrate is usually provided on the surface of the display unit body, and is disposed so that the transparent base material side is the display unit body side and the cured resin layer side is the viewing side.

  For example, when the image display device is a liquid crystal display device, a polarizing plate using a transparent conductive hard coat substrate is applied to the viewing side of the liquid crystal cell. As the liquid crystal cell, an arbitrary type such as a TN type, STN type, π type, IPS type, VA type, or the like can be used. The liquid crystal display device can be formed according to the conventional method. A liquid crystal display device is generally formed by assembling components such as a liquid crystal cell, a polarizing plate or an optical film, and an illumination system as necessary, and incorporating a drive circuit.

  In a liquid crystal display device, a polarizing plate using a transparent conductive hard coat substrate is disposed on the viewing side of the liquid crystal cell, but a polarizing plate is usually disposed on the opposite side of the liquid crystal cell. Moreover, the said polarizing plate can be used with another optical member. Although there is no limitation in particular as said other optical member, For example, the reflection-type polarizing plate or semi-transmissive polarizing plate by which a reflecting plate or a semi-transmissive reflecting plate is laminated | stacked on an elliptically polarizing plate or a circularly-polarizing plate further. Can be mentioned. Further, a reflective elliptical polarizing plate, a semi-transmissive elliptical polarizing plate, or the like, which is a combination of the above-described reflective polarizing plate or transflective polarizing plate and a retardation plate, may be used. Further, when the transparent conductive hard coat substrate or polarizing plate of the present invention is used for a transmissive or transflective liquid crystal display device, a commercially available brightness enhancement film (a polarized light separation film having a polarization selective layer, for example, Sumitomo 3M). When used in combination with D-BEF manufactured by Co., Ltd., a display device with even higher display characteristics can be obtained. When providing polarizing plates on both sides, they may be the same or different.

  The transparent conductive hard coat substrate or the polarizing plate can be formed by sequentially laminating sequentially in the manufacturing process of the liquid crystal display device, but it is better to previously laminate the quality stability, laminating workability, etc. It is preferable because the manufacturing efficiency of a liquid crystal display device and the like can be improved.

  A backlight or a reflector is used in the illumination system of the liquid crystal display device. Further, when forming a liquid crystal display device, for example, a single layer or a suitable part such as a diffusing plate, an antiglare layer, an antireflection film, a protective plate, a prism array, a lens array sheet, a light diffusing plate, a backlight, etc. Two or more layers can be arranged.

  In the image display device of the present invention, a display unit main body is mounted in a metal frame. The display unit main body is provided with the transparent conductive hard coat substrate. Further, at least the side surface of the transparent conductive hard coat substrate and the metal frame are connected directly or by a conductive material. Examples of the material for the metal frame include stainless steel.

  FIG. 3 shows a case where the image display device is a liquid crystal display device. FIG. 3 shows a part of the liquid crystal display device. In FIG. 3, a liquid crystal cell LC is mounted in a metal frame (metal bezel) M. A polarizing plate P having the transparent conductive hard coat substrate F is provided on the viewing side of the liquid crystal cell. The transparent conductive hard coat substrate F is disposed so that the cured resin layer 3 side is the surface side. On the opposite side of the liquid crystal cell LC provided with the transparent conductive hard coat substrate F, a normal polarizing plate P ′ is disposed.

  Further, at least the side surface of the transparent conductive hard coat substrate F is connected to the metal frame F directly or by the conductive material C. In FIG. 3, the conductive material C is in contact with all the side surfaces of the polarizing plate P, but the conductive material C may be in contact only with the side surfaces of the transparent conductive hard coat substrate F in the polarizing plate P. Further, the conductive material C is in contact with the inner surface of the flange portion of the metal frame F and connected to the metal frame M, but the contact portion with the metal frame is not particularly limited. Moreover, as shown in FIG. 3, the edge of the surface of the transparent conductive hard coat base F and the metal frame F can be connected by the conductive material C so as not to impair the appearance from the viewing side.

  As shown in FIG. 3, the metal film F and the transparent conductive hard coat base F are connected by the conductive material C, so that the ground can be easily attached to the image display device (liquid crystal display device). Resistance can be imparted.

  As a conductive material used for connection between the metal film and the transparent conductive hard coat substrate, for example, a conductive tape can be used. The conductive tape is not particularly limited, but a combination of a metal foil and a conductive pressure-sensitive adhesive is preferable from the viewpoint of stably contacting both and having high conductivity. The metal foil is not particularly limited, and can be appropriately selected and used such as a copper foil type and an aluminum foil type. Examples of the conductive adhesive include those in which an ionic compound such as a metal filler or a quaternary ammonium salt is mixed in the adhesive. Further, there is no particular limitation on the method of installing the conductive tape, but in order to stably contact the metal frame and the side surface of the transparent conductive hard coat substrate or the polarizing plate, as shown in FIG. Or it is preferable to affix so that the edge of a polarizing plate may be covered.

  Next, examples and comparative examples of the present invention will be shown. However, these examples do not limit the scope of the present invention. In addition, the physical property and evaluation regarding the transparent conductive hard coat base | substrate (polarizing plate) of this invention and a liquid crystal display device were performed with the following method. These results are shown in Table 1.

(Surface resistance value of carbon nanotube deposition layer)
Measured with Hiresta MCP-HT450 manufactured by Dia Instruments.

(Opening ratio of carbon nanotube deposition layer)
The calculation method of the open efficiency of the carbon nanotube deposition layer was calculated by subtracting the percentage (%) of the area occupied by the carbon nanotubes in the plane of the carbon nanotube deposition layer from 100%. For the calculation, the carbon nanotube dispersion liquid of each example was coated on a polyethylene terephthalate film, dried, and the carbon nanotube deposition layer was formed. From the SEM image, the carbon nanotube area ratio per unit area was estimated. Thus, the aperture ratio was calculated. The measurement was performed 5 times and the average value was taken. The SEM image at the time of carrying out using the dispersion liquid corresponding to Example 2 is shown. In Example 2, the average value of the proportion of the area occupied by the carbon nanotubes was 22.5%. Therefore, the aperture ratio is 77.5%.

(ESD test)
A voltage of 5 kV was applied to the liquid crystal display device near the center of the upper polarizing plate using an ESD gun, and the presence or absence of light leakage from the backlight was determined by visual evaluation based on the following criteria.
○: Light loss is recovered immediately.
Δ: Light is totally lost.
X: Light is locally lost in the vicinity of the applied charge.

(Decrease in transmittance)
The transmittance of the transparent base material alone and the transparent base material on which the carbon nanotube deposition layer was formed were measured with a haze meter HM-150 manufactured by Murakami Color Research Laboratory Co., Ltd., and the measured transmittance From these differences, a decrease in transmittance due to the formation of the carbon nanotube deposition layer was determined.

(Pencil hardness)
Using a pencil hardness meter (manufactured by Yasuda Seiki Seisakusho) based on JIS K5400, measurement was performed at a load of 500 g and an angle of 60 °. When the pencil hardness is H or higher, it can be determined that the hard coat property is satisfied.

(Abrasion resistance)
Steel wool # 1000 was uniformly attached to a smooth cross section of a cylinder with a diameter of 25 mm, and the sample surface was reciprocated 30 times at a speed of about 100 mm per second with a load of 1.5 kg.
○: No scratch at all.
Δ: Although there are fine scratches, the visibility is not affected.
X: There are obvious scratches and the visibility is impaired.

Example 1
(Formation of carbon nanotube deposition layer)
By mixing 0.1 part by weight of SW carbon nanotubes (modified with Aldrich 652490 carboxyl group) with 100 parts by weight of dimethylformamide (DMF) and treating with sonicator (Fischer, ultrasonic dispersion device) for 3 hours, A dispersion of carbon nanotubes was prepared. The dispersion is applied onto a polarizing plate (manufactured by Nitto Denko Corporation, SEG1224DU) using a spin coater (1000 rpm × 100 s), and the solvent is removed by drying at 100 ° C. for 2 minutes. Carbon nanotubes having a thickness of 10 nm or less were deposited. The surface resistance value of the carbon nanotube deposition layer was 2.88 × 10 ⁷ Ω / □.

(Formation of cured resin layer)
100 parts by weight of UNIDEC 17-806 (urethane acrylic resin, manufactured by Dainippon Ink & Chemicals, Inc., 80 parts by weight of solid content and 20 parts by weight of butyl acetate (boiling point 126 ° C.)), Irgacure 184 (photopolymerization initiator, Ciba A cured resin layer forming material solution was prepared by mixing 2.4 parts by weight of Specialty Chemicals) and 100 parts by weight of methyl isobutyl ketone (boiling point 116.2 ° C.). This solution was applied onto the carbon nanotube deposition layer using a spin coater (2000 rpm × 20 s), dried at 100 ° C. for 2 minutes, and then cured by UV irradiation to obtain a carbon nanotube deposition layer and a cured resin layer. A cured resin layer was formed so as to have a total thickness of 2 μm, and a polarizing plate on which a transparent conductive hard coat substrate was laminated was obtained. Table 1 shows the surface resistance value, transmittance reduction, pencil hardness, and scratch resistance of the obtained transparent conductive hard coat substrate on the cured resin layer side.

(Production of liquid crystal display device)
The polarizing plate on which the transparent conductive hard coat substrate was laminated was disposed on the viewing side (upper side) of the liquid crystal display device shown in FIG. The polarizing plate was bonded so that the cured resin layer side of the transparent conductive hard coat substrate was the outermost surface. As the liquid crystal cell, an IPS mode liquid crystal cell (manufactured by IPS-α, W32L-H90) was used. On the lower side of the liquid crystal cell, an untreated polarizing plate (manufactured by Nitto Denko Corporation, SEG1224DU) was bonded to crossed Nicols. The liquid crystal display part (liquid crystal panel) thus obtained was placed on the backlight. As shown in FIG. 3, a conductive tape (manufactured by 3M, AL-25DC) is applied so as to cover the side and edge of the upper polarizing plate, and then the metal frame is brought into contact with the conductive tape. To prepare a liquid crystal display device. An ESD test was performed on the obtained liquid crystal display device. The results are shown in Table 1.

Example 2
In Example 1, a transparent conductive hard coat substrate was laminated in the same manner as in Example 1 except that the cured resin layer was formed so that the total thickness of the carbon nanotube deposition layer and the cured resin layer was 10 μm. A polarizing plate was obtained. Further, a liquid crystal display device was produced in the same manner as in Example 1 using the polarizing plate. The above evaluation was performed on these. The results are shown in Table 1.

Example 3
In Example 1, a transparent conductive hard coat substrate was laminated in the same manner as in Example 1 except that the cured resin layer was formed so that the total thickness of the carbon nanotube deposition layer and the cured resin layer was 25 μm. A polarizing plate was obtained. Further, a liquid crystal display device was produced in the same manner as in Example 1 using the polarizing plate. The above evaluation was performed on these. The results are shown in Table 1.

Comparative Example 1
In the same manner as in Example 1 except that the carbon nanotube deposition layer was not formed in Example 1 and the cured resin layer was formed so that the thickness of the cured resin layer was 2 μm, the hard coat substrate The polarizing plate which laminated | stacked was obtained. Further, a liquid crystal display device was produced in the same manner as in Example 1 using the polarizing plate. The above evaluation was performed on these. The results are shown in Table 1.

Comparative Example 2
In Example 1, a transparent conductive hard coat substrate was laminated in the same manner as in Example 1 except that the cured resin layer was formed so that the total thickness of the carbon nanotube deposition layer and the cured resin layer was 1 μm. A polarizing plate was obtained. Further, a liquid crystal display device was produced in the same manner as in Example 1 using the polarizing plate. The above evaluation was performed on these. The results are shown in Table 1.

Comparative Example 3
In the same manner as in Example 1, except that the carbon nanotube deposition layer was not formed and the cured resin layer was formed so that the thickness of the cured resin layer was 2 μm, a hard coat substrate was obtained. The polarizing plate which laminated | stacked was obtained. Next, after applying Sumisefine ND-HP-4 (made by Sumitomo Osaka Cement Co., Ltd., conductive material consisting of 90% ATO and 10% polysiloxane) on the cured resin layer of the polarizing plate using wire bar # 5 Baked at 120 ° C. for 3 minutes to deposit a conductive layer having a thickness of 100 nm to obtain a polarizing plate on which a transparent conductive hard coat substrate was laminated. The surface resistance value of the conductive layer was 1.28 × 10 ¹¹ Ω / □. Further, a liquid crystal display device was produced in the same manner as in Example 1 using the polarizing plate. The above evaluation was performed on these. The results are shown in Table 1.

Comparative Example 4
In Example 1, instead of forming the carbon nanotube deposition layer on the polarizing plate, 10 parts by weight of Denatron P521-AC (manufactured by Nagase Chemtech Co., Ltd., conductive polymer), 18 parts by weight of water, 72 parts by weight of isopropyl alcohol After applying the coating liquid obtained by mixing to the polarizing plate using wire bar # 14, the solvent was removed by drying at 120 ° C. for 3 minutes to form a conductive polymer layer having a thickness of 71 nm. Deposited. The surface resistance value of the conductive polymer layer was 5.85 × 10 ⁸ Ω / □. Next, in the same manner as in Example 1, a cured resin layer was formed so that the total thickness of the conductive polymer layer and the cured resin layer was 2 μm, and a polarizing plate on which a transparent conductive hard coat substrate was laminated was obtained. Further, a liquid crystal display device was produced in the same manner as in Example 1 using the polarizing plate. The above evaluation was performed on these. The results are shown in Table 1.

  In Table 1, SWCNT-COOH (Aldrich): SW carbon nanotubes (modified with Aldrich 652490 carboxyl group, diameter 5 nm, aspect ratio: 100 to 1000); acrylic HC: Unidec 17-806 (urethane acrylic resin, Dainippon Ink & Chemicals, Inc.) Co., Ltd., solid content 80 parts by weight and butyl acetate (boiling point 126 ° C.) 20 parts by weight).

It is sectional drawing which shows an example of the transparent conductive hard-coat base | substrate used for the image display apparatus of this invention. It is sectional drawing which shows an example of the polarizing plate using the transparent conductive hard-coat base | substrate used for the image display apparatus of this invention. It is sectional drawing which shows an example of a part of structure of the image display apparatus (liquid crystal display device) of this invention.

Explanation of symbols

1: Transparent base material 2: Carbon nanotube deposition layer 3: Cured resin layer 4: Polarizer 5: Transparent protective film F: Transparent conductive hard coat substrate P: Polarizing plate having transparent conductive hard coat substrate M: Metal frame LC : Liquid crystal cell (display unit)
C: Conductive material

Claims (6)

An image display device having a display unit body mounted in a metal frame,
The display unit main body is provided with a transparent conductive hard coat substrate having a carbon nanotube deposition layer and a cured resin layer on the carbon nanotube deposition layer on a transparent substrate,
The transparent conductive hard coat substrate is
The thickness of the carbon nanotube deposition layer is 10 nm or less,
The total thickness of the carbon nanotube deposition layer and the cured resin layer is 1.5 μm or more,
An image display device, wherein at least a side surface of a transparent conductive hard coat substrate is connected to a metal frame directly or by a conductive material.   The image display apparatus according to claim 1, wherein the carbon nanotube is a single-walled carbon nanotube.   3. The image display device according to claim 1, wherein the total thickness of the carbon nanotube deposition layer and the cured resin layer is 1.5 μm or more and 30 μm or less.   The image display device according to claim 1, wherein the outer surface structure of the cured resin layer is a fine uneven structure.   The image display device according to claim 1, wherein the transparent conductive hard coat substrate is provided with at least one antireflection layer on the cured resin layer.   The image according to any one of claims 1 to 5, wherein the transparent conductive hard coat substrate is provided on the display unit main body as a polarizing plate in which the transparent substrate side is laminated on at least one surface of a polarizer. Display device.

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