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JP2008159199A - Transfer tool, manufacturing method of glass substrate for recording medium, glass substrate for recording medium and recording medium - Google Patents

Transfer tool, manufacturing method of glass substrate for recording medium, glass substrate for recording medium and recording medium Download PDF

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Publication number
JP2008159199A
JP2008159199A JP2006348961A JP2006348961A JP2008159199A JP 2008159199 A JP2008159199 A JP 2008159199A JP 2006348961 A JP2006348961 A JP 2006348961A JP 2006348961 A JP2006348961 A JP 2006348961A JP 2008159199 A JP2008159199 A JP 2008159199A
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Prior art keywords
glass substrate
recording medium
chemical strengthening
transfer
transfer jig
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Japanese (ja)
Inventor
Futoshi Ishida
太 石田
Kenichi Sasaki
賢一 佐々木
Hiroaki Sawada
浩明 澤田
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Konica Minolta Opto Inc
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Konica Minolta Opto Inc
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Priority to JP2006348961A priority Critical patent/JP2008159199A/en
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  • Magnetic Record Carriers (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a transfer tool by which a glass substrate for a recording medium can be stably transferred and the glass substrate is not damaged, to provide a manufacturing method of the glass substrate for the recording medium using the transfer tool and to provide the glass substrate for the recording medium and the recording medium. <P>SOLUTION: In the transfer tool 5 transferring the glass substrate having an opening part in the center part thereof, the transfer tool 5 has a bar-shaped transfer part 50 and a grip part 51 and the opening part is supported by two supporting parts P1 and P2 of recessed parts of the transfer part 50. The transfer tool is characterized in that the transfer part 50 has a bar-shaped core material 502 and a pair of plate materials 501 with recessed parts fixed and held to side surfaces of the core material, the bar-shaped core material 502 is made of metal and the pair of plate materials 501 are made of resin. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は、移載用治具、該移載用治具を用いた記録媒体用ガラス基板の製造方法、記録媒体用ガラス基板及び記録媒体関する。   The present invention relates to a transfer jig, a method for manufacturing a glass substrate for a recording medium using the transfer jig, a glass substrate for a recording medium, and a recording medium.

従来、記録媒体用基板としては、デスクトップ用コンピュータやサーバなどの据え置き型の情報機器にはアルミニウム合金が使用され、ノート型コンピュータやモバイル型コンピュータなどの携帯型の情報機器にはガラス基板が一般に使用されていた。アルミニウム合金は変形しやすく、また硬さが不十分であるため研磨後の基板表面の平滑性が十分とは言えなかった。さらに、記録用ヘッドが機械的に磁気ディスクに接触する際、磁性膜が基板から剥離しやすいという問題もあった。そこで、変形が少なく、平滑性が良好で、かつ機械的強度の大きいガラス基板が、携帯型のみならず据え置き型の情報機器やその他のテレビ等の家庭用機器にも今後広く使用されていくものと予測されている。   Conventionally, as a recording medium substrate, aluminum alloys are used for stationary information devices such as desktop computers and servers, and glass substrates are generally used for portable information devices such as notebook computers and mobile computers. It had been. Since the aluminum alloy is easily deformed and has insufficient hardness, the smoothness of the substrate surface after polishing cannot be said to be sufficient. Further, when the recording head mechanically contacts the magnetic disk, there is a problem that the magnetic film is easily peeled off from the substrate. Therefore, glass substrates with little deformation, good smoothness, and high mechanical strength will be widely used not only for portable devices but also for home-use devices such as stationary information devices and other televisions in the future. It is predicted.

記録媒体用ガラス基板の機械的強度を向上させるために、化学強化処理が従来から広く行われている。この化学強化処理は、化学強化処理槽内に貯留された化学強化液中にガラス基板を浸漬し、ガラス基板表面のアルカリ金属イオンを、そのアルカリ金属イオンよりも大きなイオン径のアルカリ金属イオンと置換することにより圧縮歪みを発生させ、機械的強度を向上させるものである。   In order to improve the mechanical strength of the glass substrate for recording media, chemical strengthening treatment has been widely performed. In this chemical strengthening treatment, a glass substrate is immersed in a chemical strengthening solution stored in a chemical strengthening treatment tank, and alkali metal ions on the surface of the glass substrate are replaced with alkali metal ions having an ion diameter larger than the alkali metal ions. Thus, compressive strain is generated and mechanical strength is improved.

このガラス基板を化学強化する際には、例えば、次のような方法が用いられる。複数のガラス基板を保持した保持部材を予め300℃に加熱し、400℃の化学強化処理液の入った化学強化処理槽に約3時間浸漬する。この後、ガラス基板を保持した保持部材を化学強化処理液から取りだし、20℃の水槽に浸漬して急冷し約10分間維持することでガラス基板表面の化学強化を行うことができる。   When chemically strengthening the glass substrate, for example, the following method is used. A holding member holding a plurality of glass substrates is heated to 300 ° C. in advance and immersed in a chemical strengthening treatment tank containing a chemical strengthening treatment liquid at 400 ° C. for about 3 hours. Thereafter, the glass substrate surface can be chemically strengthened by taking out the holding member holding the glass substrate from the chemical strengthening treatment liquid, immersing it in a 20 ° C. water bath, rapidly cooling it, and maintaining it for about 10 minutes.

このため、化学強化処理を行うまでは、プラスチックなどの軽く可搬性のよい保持部材(以後、プロセスカセットと呼ぶ。)を用いて、製造工程間を移送しているが、化学強化処理を行うための保持部材は、高温の化学強化処理槽に浸漬しても大丈夫な金属で構成されたものが一般的に用いられる。たとえば、特許文献1に記載されているものが知られている。   For this reason, until the chemical strengthening process is performed, a light and portable holding member (hereinafter referred to as a process cassette) such as plastic is used to transfer between manufacturing processes. The holding member is generally made of a metal that can be immersed in a high-temperature chemical strengthening treatment tank. For example, what is described in Patent Document 1 is known.

この保持部材30は、図1に示すように3つの穴が形成された板状の側板36に、ソロバン玉状の複数の突部を有する3本の軸状体32が固定されたものである。これらの軸状体32に形成される突部の間には、谷底部が形成され、これらの谷底部はガラス基板31の外周部を支持することができる。そして、これらの軸状体32はガラス基板31の外周部の3箇所を支持することによってガラス基板31の側面が軸状体32の軸線方向と直交するように複数のガラス基板31を保持できるようになっている。   As shown in FIG. 1, the holding member 30 has a plate-like side plate 36 in which three holes are formed, and three shaft-like bodies 32 having a plurality of abacus bead-like projections fixed thereto. . Valley portions are formed between the protrusions formed on these shafts 32, and these valley portions can support the outer peripheral portion of the glass substrate 31. And these shaft-shaped bodies 32 can hold | maintain the several glass substrate 31 so that the side surface of the glass substrate 31 may orthogonally cross the axial direction of the shaft-shaped body 32 by supporting three places of the outer peripheral part of the glass substrate 31. It has become.

このために化学強化処理工程前まで用いられているプラスチック製のプロセスカセット上のガラス基板31を化学強化処理工程用の保持部材30に移載する必要がある。この移載用治具として、従来、図2に示すようなソロバン玉状の複数の突起を有する軸40に握り部41を取り付けた移載治具4をガラス基板31の開口部に差し込んで、持ち上げ、移載していた。また、化学処理工程後は、化学処理工程用の保持部材30から前記移載治具を用いて、可搬性のよいプラスチック製のプロセスカセットに移載し、搬送するようにしている。
特開平7−176045号公報
For this reason, it is necessary to transfer the glass substrate 31 on the plastic process cassette used before the chemical strengthening process to the holding member 30 for the chemical strengthening process. As this transfer jig, conventionally, a transfer jig 4 having a grip portion 41 attached to a shaft 40 having a plurality of Soroban ball-shaped projections as shown in FIG. 2 is inserted into the opening of the glass substrate 31, It was lifted and transferred. In addition, after the chemical treatment step, the transfer jig is used to transfer and carry the chemical treatment step holding member 30 to a plastic process cassette having good portability.
JP-A-7-176045

しかし、図2に示すような従来の移載治具4では、支持点Pが断面からみて1点しかなく、軸40を中心としてガラス基板31が振れやすく、移載動作をゆっくりと慎重に行わないとガラス基板31を保持部材30などに当ててしまい、傷を付けることがあった。   However, in the conventional transfer jig 4 as shown in FIG. 2, there is only one support point P when viewed from the cross section, and the glass substrate 31 is likely to swing around the shaft 40, and the transfer operation is performed slowly and carefully. Otherwise, the glass substrate 31 may be applied to the holding member 30 or the like and may be damaged.

従って、本発明が解決しようとする技術課題は、ガラス基板を安定して移載ができ、ガラス基板に傷を付けない移載用治具、該移載用治具を用いた記録媒体用ガラス基板の製造方法、記録媒体用ガラス基板及び記録媒体を提供することである。   Therefore, the technical problem to be solved by the present invention is that a glass substrate can be stably transferred, a transfer jig that does not damage the glass substrate, and a glass for a recording medium using the transfer jig It is providing the manufacturing method of a board | substrate, the glass substrate for recording media, and a recording medium.

上記の課題を解決するために、本発明は以下の特徴を有するものである。   In order to solve the above problems, the present invention has the following features.

1.
中央に開口部を有するガラス基板を移載する移載用治具において、
前記移載用治具が、凹部を有する棒状の移載部と、握り部とを有し、
前記凹部の2カ所で前記ガラス基板の開口部を支持する支持部を有することを特徴とする移載用治具。
1.
In a transfer jig for transferring a glass substrate having an opening in the center,
The transfer jig has a rod-shaped transfer part having a recess, and a grip part,
A transfer jig having support portions for supporting openings of the glass substrate at two locations of the recess.

2.
前記移載部は、棒状の芯材と、該芯材の側面に固着保持する凹部を有する一対の板材とを有することを特徴とする1に記載の移載用治具。
2.
2. The transfer jig according to 1, wherein the transfer portion includes a rod-shaped core member and a pair of plate members having a concave portion fixedly held on a side surface of the core member.

3.
前記棒状の芯材が金属であり、前記一対の板材が樹脂からなることを特徴とする2に記載の移載用治具。
3.
3. The transfer jig according to 2, wherein the rod-shaped core member is a metal, and the pair of plate members are made of resin.

4.
ガラス基板を化学強化液に浸漬し化学強化を行う工程を有する記録媒体用ガラス基板の製造方法において、1乃至3の何れか1項の移載用治具を用いることを特徴とする記録媒体用ガラス基板の製造方法。
4).
In the manufacturing method of the glass substrate for recording media which has the process of immersing a glass substrate in a chemical strengthening liquid, and performing a chemical strengthening, the jig | tool for transfer of any one of 1 thru | or 3 is used for recording media characterized by the above-mentioned. A method for producing a glass substrate.

5.
4に記載の記録媒体用ガラス基板の製造方法を用いて製造されることを特徴とする記録媒体用ガラス基板。
5.
A glass substrate for a recording medium, which is produced using the method for producing a glass substrate for a recording medium according to 4.

6.
5に記載の記録媒体用ガラス基板の表面に磁性膜を有することを特徴とする記録媒体。
6).
6. A recording medium comprising a magnetic film on the surface of the glass substrate for recording medium according to 5.

本発明によれば、中央に開口部を有するガラス基板の前記開口部を移載用治具の移載部の凹部2カ所で支持する支持部を有する構成としたので、ガラス基板を安定して移載することができ、ガラス基板に傷を付けない移載用治具、該移載用治具を用いた傷のない記録媒体用ガラス基板の製造方法、記録媒体用ガラス基板及び記録媒体を提供することができる。   According to the present invention, since the opening portion of the glass substrate having the opening portion in the center is configured to have the support portion that supports the two recess portions of the transfer portion of the transfer jig, the glass substrate can be stably provided. A transfer jig that can be transferred and does not damage the glass substrate, a method for manufacturing a glass substrate for a recording medium without using the transfer jig, a glass substrate for a recording medium, and a recording medium Can be provided.

本発明を図示の実施の形態に基づいて説明するが、本発明は該実施の形態に限らない。   Although the present invention will be described based on the illustrated embodiment, the present invention is not limited to the embodiment.

図3に本発明に係る移載用治具の一実施形態を示す。移載用治具5は、棒状の芯材502の側面に凹部を有する一対の板材501を固着保持した移載部50と、芯材502の端部に取り付けられた握り部51等で構成される。   FIG. 3 shows an embodiment of the transfer jig according to the present invention. The transfer jig 5 includes a transfer portion 50 that holds and holds a pair of plate members 501 having recesses on the side surfaces of a rod-shaped core member 502, a grip portion 51 that is attached to an end portion of the core member 502, and the like. The

この移載用治具5は、ガラス基板製造工程において、複数枚のガラス基板31を同時に保持し移動させるプロセスカセットと、複数枚のガラス基板を同時に化学強化処理するための化学強化処理工程で用いる保持部材30との間で、ガラス基板を移載するために用いる治具で、移載時にガラス基板同士が接触して傷ついたり、割れたりすることがないように、安定した状態で移載できるものである。   This transfer jig 5 is used in a process cassette for simultaneously holding and moving a plurality of glass substrates 31 in a glass substrate manufacturing process, and in a chemical strengthening treatment process for simultaneously chemically strengthening a plurality of glass substrates. A jig used to transfer the glass substrate to and from the holding member 30, and can be transferred in a stable state so that the glass substrates do not come in contact with each other at the time of transfer and are not damaged or broken. Is.

図4(a)、(b)にガラス基板31を複数枚保持できるプラスチックでできたプロセスカセット6の上面図(a)と正面図(b)を示す。プロセスカセット6は、ガラス基板製造工程において、溶融したガラスをプレス成形した後、このプロセスカセットに載置して各工程を移動し、ガラス基板31を化学強化する化学強化工程前の洗浄工程まで用いられる。洗浄工程を終えた後は、ガラス基板31を図3に示す化学強化用保持部材30に移載して、化学強化処理を行う。   4A and 4B are a top view (a) and a front view (b) of the process cassette 6 made of plastic capable of holding a plurality of glass substrates 31. FIG. The process cassette 6 is used until the cleaning step before the chemical strengthening step for chemically strengthening the glass substrate 31 after the molten glass is press-molded in the glass substrate manufacturing step and then placed on the process cassette to move each step. It is done. After finishing the cleaning process, the glass substrate 31 is transferred to the chemical strengthening holding member 30 shown in FIG.

この時、プロセスカセット6から保持部材30にガラス基板31を移載するのに図3に示す移載用治具5を用いる。プロセスカセット6に載置されたガラス基板31の中央に開けられた開口部に移載用治具5を挿入し、移載用治具5に設けられた凹部でガラス基板31を支持し、プロセスカセット6の上部に引き上げて取り出し、その状態で化学強化用保持部材30に移載する。移載用治具5の凹部に支持されたガラス基板31は、ガラス基板31の中央部に開けられた開口部の2カ所の支持部(図3(b)のP1、P2)で一対の板材501と接触することで、がたつきや支持された点を中心とした振れ等を起こすことなく安定して移載することができる。なお、図3(b)において、凹部を形成する一対の板材501のP1とP2の間隔は、移載するガラス基板31に開けられた内径D2の1/4〜3/4の値であることが好ましい。この範囲にすることで、ガラス基板31の開口に移載用冶具5を容易に挿入することができ、かつ、ガラス基板31をより安定して支持し、移載することができる。この範囲より小さいと不安定になりやすく、この範囲より大きいと挿入しにくくなる。   At this time, the transfer jig 5 shown in FIG. 3 is used to transfer the glass substrate 31 from the process cassette 6 to the holding member 30. The transfer jig 5 is inserted into an opening opened in the center of the glass substrate 31 placed on the process cassette 6, and the glass substrate 31 is supported by a recess provided in the transfer jig 5. The cassette 6 is pulled up and taken out, and transferred to the chemical strengthening holding member 30 in this state. The glass substrate 31 supported by the concave portion of the transfer jig 5 is a pair of plate members at two support portions (P1 and P2 in FIG. 3B) of the opening portion opened in the central portion of the glass substrate 31. By contacting 501, it is possible to transfer stably without causing rattling or swinging around a supported point. In addition, in FIG.3 (b), the space | interval of P1 and P2 of a pair of board | plate material 501 which forms a recessed part is a value of 1/4-3/4 of the internal diameter D2 opened in the glass substrate 31 to be transferred. Is preferred. By setting this range, the transfer jig 5 can be easily inserted into the opening of the glass substrate 31, and the glass substrate 31 can be more stably supported and transferred. If it is smaller than this range, it tends to be unstable, and if it is larger than this range, it becomes difficult to insert.

図3の凹部は、V字状の溝で、底面部が平坦な形状の例を示しているが、平坦でなくV字状やR状であっても良く、移載用治具5の棒状の移載部50の両側部の2カ所で支持する構成であればよい。平坦な場合は、2カ所の支持部で線接触し、V字状又はR状では、左右の側部のそれぞれの2点で接触して支持する。このように移載部50の両側部2カ所で支持することで、ガラス基板が移載時に振れることがなく、安定して移載することができる。   3 is an example of a V-shaped groove with a flat bottom surface, but may be V-shaped or R-shaped instead of flat, and may be a rod-shaped transfer jig 5. What is necessary is just the structure supported by the two places of the both sides of the transfer part 50 of this. In the case of a flat surface, line contact is made at two support portions, and in the case of V-shape or R-shape, contact is made at two points on each of the left and right side portions. Thus, by supporting at two places on both sides of the transfer part 50, the glass substrate can be stably transferred without shaking during the transfer.

また、棒状の芯材502と、凹部を有する一対の板材501とは、一体の部材で構成されたものであっても良い。芯材502と板材501に分けることにより、芯材502を金属などの丈夫な材料で構成し、板材501をガラス基板31を傷つけない樹脂材料で構成することができる。また、図5に示すように芯材502の周囲に樹脂でできた外周部材503を被覆して、溝504を形成したものでも良い。溝504は、V字状やR状(円弧状)でも良く、さらには平坦状でも良い。   Further, the rod-shaped core member 502 and the pair of plate members 501 having the recesses may be configured as an integral member. By separating the core material 502 and the plate material 501, the core material 502 can be made of a strong material such as metal, and the plate material 501 can be made of a resin material that does not damage the glass substrate 31. Further, as shown in FIG. 5, the core member 502 may be covered with an outer peripheral member 503 made of resin to form a groove 504. The groove 504 may be V-shaped or R-shaped (arc-shaped), and may be flat.

次にガラス基板の製造工程にそって、本発明に係る移載用治具5の使用例について具体的に示す。   Next, along with the manufacturing process of a glass substrate, the usage example of the transfer jig 5 according to the present invention will be specifically described.

(製造工程)
記録媒体用ガラス基板の製造方法について説明する。図6に、記録媒体用ガラス基板の製造工程の例をフロー図で示す。まず、ガラス素材を溶融し(ガラス溶融工程)、溶融ガラスを下型に流し込み、上型によってプレス成形して円盤状のガラス基板前駆体を得る(プレス成形工程)。なお、円盤状のガラス基板前駆体は、プレス成形によらず、例えばダウンドロー法やフロート法で形成したシートガラスを研削砥石で切り出して作製してもよい。
(Manufacturing process)
The manufacturing method of the glass substrate for recording media is demonstrated. FIG. 6 is a flowchart showing an example of the manufacturing process of the recording medium glass substrate. First, a glass material is melted (glass melting process), molten glass is poured into a lower mold, and press molding is performed with an upper mold to obtain a disk-shaped glass substrate precursor (press molding process). Note that the disk-shaped glass substrate precursor may be produced by cutting a sheet glass formed by, for example, a downdraw method or a float method with a grinding stone, without using press molding.

プレス成形されたガラス基板前駆体は、コアドリル等で中心部に開口部が開けられてガラス基板31となる(コアリング工程)。そして、次にガラス基板31の両表面が研磨加工され、ガラス基板の全体形状、すなわちガラス基板の平行度、平坦度および厚みが予備調整される(第1ラッピング工程)。   The press-molded glass substrate precursor is opened at the center with a core drill or the like to become the glass substrate 31 (coring step). Then, both surfaces of the glass substrate 31 are polished, and the overall shape of the glass substrate, that is, the parallelism, flatness and thickness of the glass substrate are preliminarily adjusted (first lapping step).

この第1ラッピング工程を終えたガラス基板31は、図4に示すプロセスカセット6に1枚ずつセットされ、基板表面が傷つかないように保持された状態で次の化学強化工程で用いられる保持部材30に移載するまでの間、各工程間を移動する。   The glass substrates 31 that have finished the first lapping step are set one by one in the process cassette 6 shown in FIG. 4 and are used in the next chemical strengthening step while being held so that the substrate surface is not damaged. Move between each process until it is transferred.

第1のラッピング工程後、ガラス基板31の外周端面および内周端面が研削され面取りされて、ガラス基板31の外径寸法および真円度、孔の内径寸法、並びにガラス基板31と孔との同心度が微調整される(内・外径加工工程)。微調整された後、次の工程としてガラス基板31の内周端面が研磨されて微細なキズ等が除去される(内周端面加工工程)。   After the first lapping step, the outer peripheral end surface and the inner peripheral end surface of the glass substrate 31 are ground and chamfered, and the outer diameter size and roundness of the glass substrate 31, the inner diameter size of the hole, and the concentricity between the glass substrate 31 and the hole. The degree is finely adjusted (inner / outer diameter machining process). After the fine adjustment, as the next step, the inner peripheral end surface of the glass substrate 31 is polished to remove fine scratches and the like (inner peripheral end surface processing step).

次に、ガラス基板31の両表面が再び研磨加工されて、ガラス基板31の平行度、平坦度および厚みが微調整される(第2ラッピング工程)。そして、ガラス基板31の外周端面が研磨されて微細なキズ等が除去される(外周端面加工工程)。   Next, both surfaces of the glass substrate 31 are polished again, and the parallelism, flatness, and thickness of the glass substrate 31 are finely adjusted (second lapping step). And the outer peripheral end surface of the glass substrate 31 is grind | polished and a fine crack etc. are removed (outer peripheral end surface processing process).

次に、ガラス基板31が洗浄された(洗浄工程)後、プロセスカセット6に載置されているガラス基板31を図1に示す保持部材30に移載する。この移載時に、本発明に係る移載用治具5をプロセスカセット6に保持されているガラス基板の中央の開口部に挿入し、移載用治具5の凹部にガラス基板31を支持して、プロセスカセット6の上部方向に引き上げて取り出す。次に、この移載用治具5に支持したガラス基板31を化学強化処理用の保持部材30の凹部に対応する位置に持っていき、移載を行う。   Next, after the glass substrate 31 is cleaned (cleaning step), the glass substrate 31 placed on the process cassette 6 is transferred to the holding member 30 shown in FIG. At the time of the transfer, the transfer jig 5 according to the present invention is inserted into the central opening of the glass substrate held by the process cassette 6, and the glass substrate 31 is supported in the recess of the transfer jig 5. Then, the process cassette 6 is pulled up and taken out. Next, the glass substrate 31 supported by the transfer jig 5 is brought to a position corresponding to the concave portion of the holding member 30 for chemical strengthening treatment, and transfer is performed.

このように本発明に係る移載用治具5を用いることにより、移載時のガラス基板31の振れがなく、安定した状態で移載できるので、ガラス基板31に傷を付けることがない。また、作業効率もあがる。   As described above, by using the transfer jig 5 according to the present invention, the glass substrate 31 is not shaken during the transfer and can be transferred in a stable state, so that the glass substrate 31 is not damaged. Also, work efficiency is improved.

化学強化処理用の保持部材30にガラス基板31を移載した後、化学強化液にガラス基板31を浸漬してガラス基板31に化学強化層を形成する(化学強化工程)。この後、再度、移載用治具5を用いて、プロセスカセット6に移載し、後の工程間の移動用のカセットととして用いる。   After the glass substrate 31 is transferred to the holding member 30 for chemical strengthening treatment, the glass substrate 31 is immersed in a chemical strengthening solution to form a chemical strengthening layer on the glass substrate 31 (chemical strengthening step). Thereafter, the transfer jig 5 is used again to transfer to the process cassette 6 to be used as a transfer cassette between subsequent processes.

次の工程として、ガラス基板31の表面を精密に仕上げる研磨加工を行う(ポリッシング工程)。そして洗浄(洗浄工程)及び検査(検査工程)が行われ、製品としての記録媒体用ガラス基板31が完成する。   As the next step, a polishing process for precisely finishing the surface of the glass substrate 31 is performed (polishing step). Then, cleaning (cleaning process) and inspection (inspection process) are performed, and the recording medium glass substrate 31 as a product is completed.

化学強化工程の前後で、ガラス基板31をプロセスカセット6から化学強化処理用の保持部材30に移載する理由は、化学強化工程で保持部材30が高温にさらされるためである。   The reason why the glass substrate 31 is transferred from the process cassette 6 to the chemical strengthening holding member 30 before and after the chemical strengthening step is that the holding member 30 is exposed to a high temperature in the chemical strengthening step.

化学強化工程の内容を図7のフロー図に示す。洗浄されたガラス基板31は、予め加熱された(予熱工程)後、化学強化液に浸漬される(化学強化液浸漬工程)。化学強化液から取り出されたガラス基板31は、水にて洗浄され(水浸漬工程)、乾燥(乾燥工程)される。   The contents of the chemical strengthening process are shown in the flowchart of FIG. The cleaned glass substrate 31 is preheated (preheating step) and then immersed in a chemical strengthening solution (chemical strengthening solution soaking step). The glass substrate 31 taken out from the chemical strengthening solution is washed with water (water immersion process) and dried (drying process).

化学強化工程において、一連の予熱工程から乾燥工程までの各工程を実際に行う場合、例えば、以下のようにする。まず、複数枚のガラス基板31を保持した保持部材30を準備し、ガラス基板31を保持部材30とともに順次、予熱炉に投入し、化学強化液槽に浸漬し、洗浄槽に浸漬し、乾燥炉に投入することで、化学強化の一連の処理をすることができる。化学強化工程でガラス基板31及びこれを保持する保持部材30に加わる温度は、ガラス基板材料、化学強化液等により異なるが、例えば、おおよそ以下となる。予熱工程での予熱炉においては200℃から600℃、化学強化液浸漬工程での化学化学強化液槽においては280℃から660℃、水浸漬工程での洗浄槽においては35℃から100℃、乾燥炉においては100℃から150℃である。また、各工程の間では、保持部材30を上記の各炉また槽の間で室温下の空気中を移動させる必要がある。従って、ガラス基板及び保持部材30は、上記の例から室温と600℃程度といった急激な大きな温度差に晒されることになる。   In the chemical strengthening process, when each process from the series of preheating process to drying process is actually performed, for example, the following process is performed. First, a holding member 30 holding a plurality of glass substrates 31 is prepared, the glass substrates 31 together with the holding member 30 are sequentially put into a preheating furnace, immersed in a chemical strengthening liquid tank, immersed in a cleaning tank, and a drying furnace. It is possible to perform a series of chemical strengthening processes. The temperature applied to the glass substrate 31 and the holding member 30 that holds the glass substrate 31 in the chemical strengthening step varies depending on the glass substrate material, the chemical strengthening solution, and the like, but is approximately the following, for example. 200 ° C to 600 ° C in the preheating furnace in the preheating step, 280 ° C to 660 ° C in the chemical chemical strengthening solution bath in the chemical strengthening solution immersion step, 35 ° C to 100 ° C in the cleaning bath in the water soaking step, and drying In a furnace, it is 100 to 150 ° C. Moreover, between each process, it is necessary to move the holding member 30 in the air at room temperature between the furnaces or tanks. Therefore, the glass substrate and the holding member 30 are exposed to a large temperature difference such as room temperature and about 600 ° C. from the above example.

上記のような大きな温度差に晒される保持部材30は、プロセスカセットに用いられる樹脂できた、軽量で可搬性の良い材料を用いることができず、高温に耐える金属や、セラミック材料がおもに用いられるため、化学強化工程以外で、このような保持部材30を用いると重く、作業効率が悪くなる。このため、可搬性の良いプロセスカセット6と耐熱性の良い保持部材30との間を移載する必要がある。   The holding member 30 exposed to a large temperature difference as described above cannot be made of a light and portable material made of resin used for a process cassette, and is mainly made of a metal or ceramic material that can withstand high temperatures. For this reason, if such a holding member 30 is used in a process other than the chemical strengthening process, it is heavy and the working efficiency is deteriorated. For this reason, it is necessary to transfer between the process cassette 6 with good portability and the holding member 30 with good heat resistance.

移載用治具5の材料としては、特に限定はしないが、芯材502には、機械的強度の強い金属を用い、ガラス基板と接触する支持部分については、樹脂を用いるのが、ガラス基板に傷を付けない点から好ましい。例えば、芯材としては、鉄、アルミ、SUS等を用いることができ、板材又は外周部材としては、ポリカーボネート、アクリル、ポリエステル、ポリアセタールなどの樹脂材料を用いることができる。   The material of the transfer jig 5 is not particularly limited, but a metal having a high mechanical strength is used for the core material 502, and a resin is used for the support portion that contacts the glass substrate. It is preferable from the point of not scratching. For example, iron, aluminum, SUS, or the like can be used as the core material, and a resin material such as polycarbonate, acrylic, polyester, or polyacetal can be used as the plate material or the outer peripheral member.

(化学強化液浸漬工程)
化学強化液浸漬工程は、化学強化剤を溶融した化学強化液にガラス基板を浸漬させて、ガラス基板表層のアルカリ金属イオンを化学強化液のアルカリ金属イオンにイオン交換する。
(Chemical strengthening liquid immersion process)
In the chemical strengthening solution immersion step, the glass substrate is immersed in a chemical strengthening solution in which the chemical strengthening agent is melted, and the alkali metal ions on the surface of the glass substrate are ion-exchanged with the alkali metal ions of the chemical strengthening solution.

化学強化剤としては従来公知のものを使用でき、例えば、硝酸カリウム(KNO3)、硝酸ナトリウム(NaNO3)、炭酸カリウム(K2CO3)などが挙げられ、これらを単独又は2種以上混合して使用する。 As the chemical strengthening agent, conventionally known ones can be used, and examples thereof include potassium nitrate (KNO 3 ), sodium nitrate (NaNO 3 ), potassium carbonate (K 2 CO 3 ) and the like. These can be used alone or in combination of two or more. To use.

化学強化剤は化学強化処理槽に所定量投入し、加熱することによって溶融して化学強化液となる。化学強化液の加熱温度は、イオン交換の速度やガラス基板のガラス転移温度Tgなどの点から280℃〜660℃の範囲が好ましく、より好ましくは300℃〜450℃の範囲である。この高温側(上限値)がガラス転移温度Tgより低い300℃〜450℃の範囲とすることで、イオン交換の反応速度が遅すぎることなく、また、ガラス基板の形状に影響が生じない。   The chemical strengthening agent is charged into a chemical strengthening treatment tank in a predetermined amount and heated to melt and become a chemical strengthening liquid. The heating temperature of the chemical strengthening solution is preferably in the range of 280 ° C. to 660 ° C., more preferably in the range of 300 ° C. to 450 ° C., from the viewpoint of the rate of ion exchange and the glass transition temperature Tg of the glass substrate. By setting this high temperature side (upper limit) to a range of 300 ° C. to 450 ° C. lower than the glass transition temperature Tg, the reaction rate of ion exchange is not too slow, and the shape of the glass substrate is not affected.

ガラス基板を化学強化液に浸漬する時間は0.1時間〜数十時間の範囲が好ましい。また、本例に示しているように、ガラス基板を化学強化液に浸漬する前に、予め加熱しておくことが好ましい。予めガラス基板を加熱すると、化学強化液に浸漬した際に化学強化液の温度が低下し過ぎることがなく、化学強化を効率的に行うことができる。   The time for immersing the glass substrate in the chemical strengthening solution is preferably in the range of 0.1 hour to several tens of hours. Moreover, as shown in this example, it is preferable to preheat the glass substrate before immersing it in the chemical strengthening solution. When the glass substrate is heated in advance, the temperature of the chemical strengthening solution does not decrease excessively when immersed in the chemical strengthening solution, and chemical strengthening can be performed efficiently.

化学強化層の厚みとしては、ガラス基板の強度向上とポリッシング工程の時間の短縮との兼ね合いから、5μm〜15μm程度の範囲が好ましい。   The thickness of the chemically strengthened layer is preferably in the range of about 5 μm to 15 μm in view of improving the strength of the glass substrate and shortening the time of the polishing process.

(水浸漬工程)
ガラス基板を化学強化液に浸漬した後、連続してガラス基板の表面の化学強化液をムラなく除去するために水に浸漬する。ガラス基板の全体を水に浸漬することで化学強化液がガラス基板上に部分的に存在することが無く、部分的に化学強化が進むことがなくなる。このため、化学強化にムラがないため、ガラス基板に一様な強度を持たせることができる。
(Water immersion process)
After immersing the glass substrate in the chemical strengthening solution, the glass substrate is continuously immersed in water in order to remove the chemical strengthening solution on the surface of the glass substrate evenly. By immersing the entire glass substrate in water, the chemical strengthening liquid does not partially exist on the glass substrate, and chemical strengthening does not proceed partially. For this reason, since there is no unevenness in chemical strengthening, the glass substrate can have a uniform strength.

化学強化液や化学強化液を成す塩の結晶物は、浸漬する水の温度を高くするほどより短時間で効率よくガラス基板の表面から除去することができる。こうした水の温度は、大気圧下で、35℃から100℃が好ましい。また、ガラス基板を水に浸漬する時間は、1秒以上が好ましい。1秒未満であると、ガラス基板上の化学強化液を十分に除去できないため化学強化液がガラス基板上に残り、強化ムラが生じる。水に浸漬する時間の上限は、特に制限はなく、生産性を考慮して適宜決めればよい。   The chemical strengthening liquid or the crystalline substance of the salt forming the chemical strengthening liquid can be efficiently removed from the surface of the glass substrate in a shorter time as the temperature of the immersion water is increased. The temperature of such water is preferably 35 ° C. to 100 ° C. under atmospheric pressure. The time for immersing the glass substrate in water is preferably 1 second or longer. If it is less than 1 second, the chemical strengthening solution on the glass substrate cannot be sufficiently removed, so that the chemical strengthening solution remains on the glass substrate and unevenness of strengthening occurs. The upper limit of the time for immersing in water is not particularly limited, and may be appropriately determined in consideration of productivity.

また、水の温度と化学強化液との温度差により水浸漬工程においてガラス基板のひび、割れが発生しないように温度差を緩和するために、化学強化液浸漬工程と水浸漬工程との間でガラス基板を冷却する冷却工程を設けてもよい。   In addition, in order to reduce the temperature difference so that the glass substrate does not crack or crack in the water immersion process due to the temperature difference between the water temperature and the chemical strengthening liquid, between the chemical strengthening liquid immersion process and the water immersion process. A cooling step for cooling the glass substrate may be provided.

(ガラス基板)
化学強化されるガラス基板としては特に限定はないが、二酸化ケイ素、酸化ナトリウム、酸化カルシウムを主成分としたソーダライムガラス;二酸化ケイ素、酸化アルミニウム、R2O(R=K、Na、Li)を主成分としたアルミノシリケートガラス;ボロシリケートガラス;酸化リチウム−二酸化ケイ素系ガラス;酸化リチウム−酸化アルミニウム−二酸化ケイ素系ガラス;R’O−酸化アルミニウム−二酸化ケイ素系ガラス(R’=Mg、Ca、Sr又はBa)を使用することができ、これらガラス材料に酸化ジルコニウムや酸化チタン等を添加したものであってもよい。
(Glass substrate)
The glass substrate to be chemically strengthened is not particularly limited, but soda lime glass mainly composed of silicon dioxide, sodium oxide, calcium oxide; silicon dioxide, aluminum oxide, R2O (R = K, Na, Li) as main components. Aluminosilicate glass; borosilicate glass; lithium oxide-silicon dioxide glass; lithium oxide-aluminum oxide-silicon dioxide glass; R'O-aluminum oxide-silicon dioxide glass (R '= Mg, Ca, Sr or Ba) can be used, and these glass materials may be added with zirconium oxide, titanium oxide or the like.

またガラス基板の大きさに限定はなく2.5インチ,1.8インチ、1インチ、0.85インチあるいはそれ以下の小径ディスクにも本発明の方法を適用することができ、またその厚さが2mmや1mm、0.63mm、あるいはそれ以下といった薄型のものにも適用することができる。   The size of the glass substrate is not limited, and the method of the present invention can be applied to a small-diameter disk of 2.5 inches, 1.8 inches, 1 inch, 0.85 inches or less, and the thickness thereof. Can be applied to a thin type such as 2 mm, 1 mm, 0.63 mm, or less.

化学強化工程に提供されるガラス基板において、主表面および端面部分の粗さに特に限定はないが、ガラス基板の主表面の表面粗度は、Rmax(最大高さ)が10nm以下、Ra(中心線平均粗さ)が1.0nm以下であるのが好ましい。また端面の表面粗度は、Rmaxが0.01μm〜1μmの範囲、Raが0.001μm〜0.8μmの範囲であるのが好ましい。表面研磨されたガラス基板を化学強化すると、強化層を均一に形成することができるようになる。   In the glass substrate provided for the chemical strengthening step, the roughness of the main surface and the end face portion is not particularly limited, but the surface roughness of the main surface of the glass substrate is Rmax (maximum height) of 10 nm or less, Ra (center) The line average roughness) is preferably 1.0 nm or less. The surface roughness of the end face is preferably in the range of Rmax from 0.01 μm to 1 μm and Ra in the range of 0.001 μm to 0.8 μm. When the surface-polished glass substrate is chemically strengthened, the reinforcing layer can be formed uniformly.

(記録媒体)
次に、これまで説明した記録媒体用ガラス基板を用いた記録媒体について説明する。この記録媒体用ガラス基板を用いると、耐久性および高記録密度が実現される。以下、図面に基づき記録媒体について説明する。
(recoding media)
Next, a recording medium using the recording medium glass substrate described so far will be described. When this recording medium glass substrate is used, durability and high recording density are realized. Hereinafter, a recording medium will be described with reference to the drawings.

図8は磁気ディスクの斜視図である。この磁気ディスクDIは、円形の記録媒体用ガラス基板1の表面に磁性膜2が直接形成されている。磁性膜2の形成方法としては従来公知の方法を用いることができ、例えば磁性粒子を分散させた熱硬化性樹脂を基板上にスピンコートして形成する方法や、スパッタリング、無電解めっきにより形成する方法が挙げられる。スピンコート法での膜厚は約0.3μm〜1.2μm程度、スパッタリング法での膜厚は0.04μm〜0.08μm程度、無電解めっき法での膜厚は0.05μm〜0.1μm程度であり、薄膜化および高密度化の観点からはスパッタリング法および無電解めっき法による膜形成が好ましい。   FIG. 8 is a perspective view of the magnetic disk. In this magnetic disk DI, a magnetic film 2 is directly formed on the surface of a circular recording medium glass substrate 1. As a method for forming the magnetic film 2, a conventionally known method can be used. For example, a method in which a thermosetting resin in which magnetic particles are dispersed is spin-coated on a substrate, or a method by sputtering or electroless plating is used. A method is mentioned. The film thickness by spin coating is about 0.3 μm to 1.2 μm, the film thickness by sputtering is about 0.04 μm to 0.08 μm, and the film thickness by electroless plating is 0.05 μm to 0.1 μm. From the viewpoint of thinning and densification, film formation by sputtering and electroless plating is preferable.

磁性膜に用いる磁性材料としては、特に限定はなく従来公知のものが使用できるが、高い保持力を得るために結晶異方性の高いCoを基本とし、残留磁束密度を調整する目的でNiやCrを加えたCo系合金などが好適である。具体的には、Coを主成分とするCoPt、CoCr、CoNi、CoNiCr、CoCrTa、CoPtCr、CoNiPtや、CoNiCrPt、CoNiCrTa、CoCrPtTa、CoCrPtB、CoCrPtSiOなどが挙げられる。磁性膜は、非磁性膜(例えば、Cr、CrMo、CrVなど)で分割しノイズの低減を図った多層構成(例えば、CoPtCr/CrMo/CoPtCr、CoCrPtTa/CrMo/CoCrPtTaなど)としてもよい。上記の磁性材料の他、フェライト系、鉄−希土類系や、SiO2、BNなどからなる非磁性膜中にFe、Co、FeCo、CoNiPt等の磁性粒子が分散された構造のグラニュラーなどであってもよい。また、磁性膜は、内面型および垂直型のいずれの記録形式であってもよい。   The magnetic material used for the magnetic film is not particularly limited, and a conventionally known material can be used. However, in order to obtain a high coercive force, Ni having a high crystal anisotropy is basically used, and Ni or A Co-based alloy to which Cr is added is suitable. Specific examples include CoPt, CoCr, CoNi, CoNiCr, CoCrTa, CoPtCr, and CoNiPt containing Co as a main component, CoNiCrPt, CoNiCrTa, CoCrPtTa, CoCrPtB, and CoCrPtSiO. The magnetic film may have a multilayer structure (for example, CoPtCr / CrMo / CoPtCr, CoCrPtTa / CrMo / CoCrPtTa) that is divided by a nonmagnetic film (for example, Cr, CrMo, CrV, etc.) to reduce noise. In addition to the magnetic materials described above, ferrite, iron-rare earth, and granular materials having a structure in which magnetic particles such as Fe, Co, FeCo, CoNiPt are dispersed in a nonmagnetic film made of SiO2, BN, etc. Good. Further, the magnetic film may be either an inner surface type or a vertical type recording format.

また、磁気ヘッドの滑りをよくするために磁性膜の表面に潤滑剤を薄くコーティングしてもよい。潤滑剤としては、例えば液体潤滑剤であるパーフロロポリエーテル(PFPE)をフレオン系などの溶媒で希釈したものが挙げられる。   In addition, a lubricant may be thinly coated on the surface of the magnetic film in order to improve the sliding of the magnetic head. Examples of the lubricant include those obtained by diluting perfluoropolyether (PFPE), which is a liquid lubricant, with a freon-based solvent.

さらに必要により下地層や保護層を設けてもよい。磁気ディスクにおける下地層は磁性膜に応じて選択される。下地層の材料としては、例えば、Cr、Mo、Ta、Ti、W、V、B、Al、Niなどの非磁性金属から選ばれる少なくとも一種以上の材料が挙げられる。Coを主成分とする磁性膜の場合には、磁気特性向上等の観点からCr単体やCr合金であることが好ましい。また、下地層は単層とは限らず、同一又は異種の層を積層した複数層構造としても構わない。例えば、Cr/Cr、Cr/CrMo、Cr/CrV、NiAl/Cr、NiAl/CrMo、NiAl/CrV等の多層下地層としてもよい。   Furthermore, you may provide a base layer and a protective layer as needed. The underlayer in the magnetic disk is selected according to the magnetic film. Examples of the material for the underlayer include at least one material selected from nonmagnetic metals such as Cr, Mo, Ta, Ti, W, V, B, Al, and Ni. In the case of a magnetic film containing Co as a main component, Cr alone or a Cr alloy is preferable from the viewpoint of improving magnetic characteristics. Further, the underlayer is not limited to a single layer, and may have a multi-layer structure in which the same or different layers are stacked. For example, a multilayer underlayer such as Cr / Cr, Cr / CrMo, Cr / CrV, NiAl / Cr, NiAl / CrMo, or NiAl / CrV may be used.

磁性膜の摩耗や腐食を防止する保護層としては、例えば、Cr層、Cr合金層、カーボン層、水素化カーボン層、ジルコニア層、シリカ層などが挙げられる。これらの保護層は、下地層、磁性膜など共にインライン型スパッタ装置で連続して形成できる。また、これらの保護層は、単層としてもよく、あるいは、同一又は異種の層からなる多層構成としてもよい。なお、上記保護層上に、あるいは上記保護層に替えて、他の保護層を形成してもよい。例えば、上記保護層に替えて、Cr層の上にテトラアルコキシシランをアルコール系の溶媒で希釈した中に、コロイダルシリカ微粒子を分散して塗布し、さらに焼成して二酸化ケイ素(SiO2)層を形成してもよい。   Examples of the protective layer that prevents wear and corrosion of the magnetic film include a Cr layer, a Cr alloy layer, a carbon layer, a hydrogenated carbon layer, a zirconia layer, and a silica layer. These protective layers can be formed continuously with an in-line type sputtering apparatus, such as an underlayer and a magnetic film. In addition, these protective layers may be a single layer, or may have a multilayer structure including the same or different layers. Note that another protective layer may be formed on the protective layer or instead of the protective layer. For example, in place of the protective layer, colloidal silica fine particles are dispersed and applied to a Cr layer diluted with an alcohol solvent, and then fired to form a silicon dioxide (SiO2) layer. May be.

以上、記録媒体の一実施態様として磁気ディスクについて説明したが、記録媒体はこれに限定されるものではなく、光磁気ディスクや光ディスクなどにも本発明のガラス基板を用いることができる。   The magnetic disk has been described above as one embodiment of the recording medium. However, the recording medium is not limited to this, and the glass substrate of the present invention can be used for a magneto-optical disk, an optical disk, and the like.

化学強化工程に用いる保持部材を示す模式図である。It is a schematic diagram which shows the holding member used for a chemical strengthening process. 従来のガラス基板の移載用治具を示す模式図である。It is a schematic diagram which shows the jig | tool for the transfer of the conventional glass substrate. 本発明に係る移載用治具の一実施形態を示す模式図である。It is a mimetic diagram showing one embodiment of a transfer jig concerning the present invention. ガラス基板の製造工程で用いるプロセスカセットを示す模式図である。It is a schematic diagram which shows the process cassette used at the manufacturing process of a glass substrate. 本発明に係る移載用治具の別の実施形態を示す模式図である。It is a schematic diagram which shows another embodiment of the jig | tool for transfer which concerns on this invention. 記録媒体用ガラス基板の製造工程の例を示すフロー図である。It is a flowchart which shows the example of the manufacturing process of the glass substrate for recording media. 図1における化学強化処理工程の内容を示すフロー図である。It is a flowchart which shows the content of the chemical strengthening process process in FIG. 磁気ディスクの部分断面を含む斜視図である。It is a perspective view containing the partial cross section of a magnetic disc.

符号の説明Explanation of symbols

1 記録媒体用ガラス基板
2 磁性膜
30 保持部材
31 ガラス基板
32 軸上体
36 側板
4、5 移載治具
41、51 握り部
40 軸
501 板材
502 芯材
503 外周部材
6 プロセスカセット
P1、P2 支持部
DESCRIPTION OF SYMBOLS 1 Glass substrate for recording media 2 Magnetic film 30 Holding member 31 Glass substrate 32 Shaft upper body 36 Side plate 4, 5 Transfer jig 41, 51 Grip part 40 Shaft 501 Plate material 502 Core material 503 Outer peripheral member 6 Process cassette P1, P2 support Part

Claims (6)

中央に開口部を有するガラス基板を移載する移載用治具において、
前記移載用治具が、凹部を有する棒状の移載部と、握り部とを有し、
前記凹部の2カ所で前記ガラス基板の開口部を支持する支持部を有することを特徴とする移載用治具。
In a transfer jig for transferring a glass substrate having an opening in the center,
The transfer jig has a rod-shaped transfer part having a recess, and a grip part,
A transfer jig having support portions for supporting openings of the glass substrate at two locations of the recess.
前記移載部は、棒状の芯材と、該芯材の側面に固着保持する凹部を有する一対の板材とを有することを特徴とする請求項1に記載の移載用治具。 The said transfer part has a rod-shaped core material and a pair of board | plate material which has a recessed part fixedly hold | maintained to the side surface of this core material, The transfer jig of Claim 1 characterized by the above-mentioned. 前記棒状の芯材が金属であり、前記一対の板材が樹脂からなることを特徴とする請求項2に記載の移載用治具。 The transfer jig according to claim 2, wherein the rod-shaped core member is a metal, and the pair of plate members is made of a resin. ガラス基板を化学強化液に浸漬し化学強化を行う工程を有する記録媒体用ガラス基板の製造方法において、請求項1乃至3の何れか1項の移載用治具を用いることを特徴とする記録媒体用ガラス基板の製造方法。 4. A method for manufacturing a glass substrate for a recording medium comprising a step of immersing a glass substrate in a chemical strengthening solution and performing chemical strengthening, wherein the transfer jig according to any one of claims 1 to 3 is used. A method for producing a glass substrate for a medium. 請求項4に記載の記録媒体用ガラス基板の製造方法を用いて製造されることを特徴とする記録媒体用ガラス基板。 A glass substrate for a recording medium, which is produced using the method for producing a glass substrate for a recording medium according to claim 4. 請求項5に記載の記録媒体用ガラス基板の表面に磁性膜を有することを特徴とする記録媒体。 A recording medium comprising a magnetic film on a surface of the glass substrate for a recording medium according to claim 5.
JP2006348961A 2006-12-26 2006-12-26 Transfer tool, manufacturing method of glass substrate for recording medium, glass substrate for recording medium and recording medium Pending JP2008159199A (en)

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