JP2008058973A - Optical filter member having functions of preventing electromagnetic waves and of filtering light for plasma display - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an optical filter member having the functions of preventing electromagnetic waves and filtering light for a plasma display (PDP), which is manufactured at a significantly low cost with high productivity and has high strength, high light transmissivity, superior light-filtering effects, when used for preventing electromagnetic waves and filtering light, and a long service life. <P>SOLUTION: The optical filter member comprises a transparent resin substrate and is manufactured by depositing a film on one side of the transparent resin substrate by a continuous magnetron sputtering method, to obtain a vapor-deposited layer having the functions of preventing electromagnetic waves and filtering light, sticking/superimposing a plastic film layer for hindering the oxidation and corrosion of the vapor-deposited layer to/on the vapor-deposited layer and sticking/superimposing a metal thin film, which is abutted against the vapor-deposited layer and is served as the extraction electrode, to/on the vapor-deposited layer. The vapor-deposited layer has a layered structure of 13 layers or 17 layers obtained, by repeatedly depositing a film system constituted of TiO<SB>2</SB>/AZOY, ITO/Ag/AZOY or ITO/TiO<SB>2</SB>. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to an optical filter member in a display device, and more particularly to an optical filter member having an electromagnetic wave prevention and optical filtering function in a plasma display (PDP).

  The anti-reflection, anti-electromagnetic wave and optical filtering functions of the current PDP optical filter members are made by sticking a plastic film with an anti-reflective coating layer on the outer surface of a piece of glass and preventing electromagnetic waves formed by two layers of plastic. And a film having an optical filtering function is formed on the other surface. One of the layers forms a metal conductive mesh on the film by a photolithography method or a wire mesh screen method, and forms an electromagnetic wave prevention function. This layer is formed by coating a pigment film on a film having a metal wire or a metal mesh, or a method of laminating an infrared light attenuating plastic film. Form. As for the method of laminating, various functional films have high requirements for the laminating process and the superimposing process in each layer film, and it is difficult to mechanize and continuously produce, so the cost is high and the yield is low. Productivity is low and light transmittance is low.

Patent Document 1 discloses laminating and laminating various antireflection (AR) films, near infrared (NIR) shield films, and electromagnetic interference (EMI) shield films on a transparent substrate, and this functional film. Is an important film required for an optical filter member, which is vapor-deposited on a plastic substrate or a plastic film, respectively, and laminated and laminated one layer at a time on a transparent substrate according to the function needs. It is formed by laminating a binder layer placed between two glass layers and at least one resin layer.
Chinese Patent Publication No. CN1509490 “Plasma Display Optical Filter”

  As described above, the molding manufacturing method in which the respective layers are deposited and laminated is not substantially improved from the above method, and similarly, the productivity is low, the yield is low, and the cost is high. Multilayer laminates, in particular, have a significant drop in yield due to residual volatiles in the solvent that may have air bubbles and binder between the laminates.

Patent Document 2 discloses a solution to the problem of preventing oxidation or erosion of a silver film layer in an EMI shield film in an electromagnetic interference (EMI) shield film which is an important functional film most required for an optical filter. In this prior art document, the erosion is referred to as aggregation of silver atoms in the silver film layer, and the expression of erosion is defined as a “white spot” generated in the silver thin film layer. In this prior art document, the silver thin film layer, which is an important thin film layer for preventing electromagnetic interference, is protected on the transparent high refractive index thin film necessary for antireflection, that is, the outermost layer of the three silver thin film layers. This protective layer is composed of a polymer adhesive material and inorganic fine particles.
Chinese Patent Application No. 200410069275.7 “Laminated body and optical filter for display using the laminated body”

  The inorganic fine particles employ metal oxides, and are preferably silicon dioxide, tin oxide, zinc oxide, indium oxide, diantimony trioxide, aluminum oxide, zirconium oxide, etc., and a composite oxide of antimony oxide and tin oxide, antimony oxide, A composite oxide of zinc oxide is particularly suitable.

  The adhesive and inorganic fine particles are dissolved using a solvent or solution to dissolve the adhesive, and the inorganic fine particles are dispersed, and applied to the film layer composed of the silver thin film layer and the antireflective high refractive index thin film layer using a coating method. In practice, the high refractive index thin film layer is applied and finally a protective layer is formed. In this prior art document, it is said that it has a remarkable and tremendous suppressive action on the formation of “white spots”.

  Thin film layers that combine metal oxides and binders formed by applying this type of solvent or solution bring environmental protection problems and contamination during the production process, and control the thickness of the film and the transmittance of visible light. It is difficult and the product acceptance rate cannot be inspected on the production line, cannot be controlled, the acceptance rate is low, and the fastness of the film layer is insufficient. When the surface resistivity is measured at the protective layer surface, which is the outermost surface of the membrane layer, the polymer resin is combined, so the surface resistivity is higher than that without this protective layer, and the EMI shield The function is degraded. Although the so-called “white spot” problem is solved for the three-layer silver film layer structure, the EMI shielding ability of the three-layer silver is reduced.

This prior art document describes a control method for suppressing the erosion of the silver thin film layer or reducing the “white spot”, but the transparent high refractive index thin film of the outermost surface layer adopting the three silver structure thin film layers. since only paint the protective layer to layer, the effect on EMI shielding film is insufficient, can not only be 2 [Omega / cm ² to well surface resistivity reached, household appliances 1.5 [Omega / cm ² No less than standard can be achieved. In this prior art document, the metal oxide thin film is divided between the silver thin film layer of each layer and the transparent high refractive index thin film layer into three layers (four layers in the case of a four-layer silver thin film layer structure). There is no method or proposal to report or propose to increase the number of layers, and a metal oxide thin film such as ITO (indium tin oxide) or AZOY (aluminum zinc oxide) in three or four layers by continuous magnetron sputtering. Is formed, and the remaining ITO or AZOY / Ag / TiO ₂ thin film is organically bonded to improve the visible light transmittance, improve the oxidation prevention and erosion prevention ability of the deposited layer, and improve the EMI shielding ability. At the same time, there are no reports and presentations that block the near-infrared, far-infrared, and ultraviolet rays and generate an optical filtering function.

Patent Document 3 discloses a display optical filter. This type of optical filter has a transparent conductive layer (D) laminated on one side or both sides of a polymer thin film (B), and the transparent conductive layer is transparent to a high refractive index. The combination (Dt) / (DM) of the thin film layer (Dt) and the metal thin film layer (DM) is used as a repeating unit, and the high refractive index transparent thin film layer (Dt) is formed thereon after repeating the lamination 2-4 times. It is also disclosed that at least one layer in the high refractive index transparent thin film layer (Dt) is formed of an oxide mainly composed of at least one of indium, tin, and zinc. . It also discloses that at least one of the plurality of metal thin film layers (MD) is formed of silver or a silver alloy. A method of providing a single antireflection film layer on the side of the polymer thin film (B) close to the air, that is, the viewing surface is also disclosed.
Although the transparent conductive layer (D) is disclosed to have a surface resistance of 0.01 to 30 Ω / □, in practice, the disclosed multilayer Dt / DM thin film is repeated 2 to 4 times. Even if it is a seven-layer film, the surface resistance is all 2.2Ω / □ or more, most of which is 5Ω / □ or more only by forming a transparent conductive thin film by the vapor deposition lamination method. It does not reach the standard of less than 1.5Ω / □ and cannot actually be used. Even though it could be used based on the method disclosed in the prior art document, in fact, this so-called transparent conductive layer (D) was etched and overlaid as disclosed in the above-mentioned several patents. An EMI interference wave shield mesh formed by a copper plate or wire mesh screen method is adopted, and this mesh does not have a function of simultaneously absorbing or blocking ultraviolet rays, near infrared rays, and far infrared rays. The method disclosed in this patent is used only for polymer thin films that are bonded to the fluorescent display tube of a display.
Chinese Patent Application No. 08044419.0

In this prior art document, silver is the main film layer, a TiO ₂ film layer with a high refractive index is laminated thereon, and a single transparent metal oxide film layer is dedicated between the silver layer and TiO _2. Laminate and stabilize using the antioxidant ability of this metal oxide itself, increase the protection against the silver layer, and at the same time make the film of this layer a nano-level thin film and take advantage of the special absorption ability against infrared, the silver layer It is not disclosed or shown to jointly improve the ability to absorb or block ultraviolet, near infrared, and far infrared after combining the TiO ₂ film layer with the TiO ₂ film layer. In this prior art document, a five-layer structure of metal oxide film layer / TiO ₂ is symmetrically laminated on both sides based on a silver layer, and 3-4 sets of repetitions are skillfully formed by this five-layer structure. It is also disclosed that a 13-layer or 17-layer film structure is formed, and finally a surface resistance of 1.5Ω / □ or less and an optical filtering function for ultraviolet rays and near infrared rays are realized by the 13-layer and 17-layer films. Not.

  The object of the present invention is to overcome the above-mentioned problems of the prior art, adopt a method of vapor deposition by a magnetron sputtering method that can be continuous over a large area, greatly reduce cost, high productivity, strength It is an object of the present invention to provide an optical filter member having high electromagnetic wave prevention and light filtering functions, high light transmittance, excellent electromagnetic wave prevention and light filtering effects, long life.

The optical filter member of the present invention includes a transparent resin substrate, and a continuous magnetron sputtering method is used to oxidize or erode the vapor deposition layer having an electromagnetic wave prevention and optical filtering function on one side of the transparent resin substrate, and the vapor deposition layer and the superimposed vapor deposition layer. A plastic film layer that prevents the film and a metal thin film that is in contact with the vapor deposition layer to serve as an extraction electrode, and the vapor deposition layer is composed of 3 or 4 sets of TiO ₂ / AZOY / Ag / AZOY / TiO ₂ or TiO ₂ / ITO A 13-layer or 17-layer structure formed by repeating a film system corresponding to / Ag / AZOY / TiO ₂ or TiO ₂ / ITO / Ag / ITO / TiO ₂ or TiO ₂ / AZOY / Ag / ITO / TiO ₂ Of these, AZOY is an oxide film layer composed of a mixed material of zinc oxide and aluminum oxide. And, ITO is a film layer formed of indium oxide material obtained by adding tin, structures for forming a film layer of the transparent resin substrate 13 layer, the film layer of the first layer and TiO _2, the second layer The film layer is AZOY or ITO, the third film layer is Ag, the fourth film layer is AZOY or ITO, the fifth film layer is TiO _2, and the sixth film layer is AZOY or ITO. The film layer of the seventh layer is Ag, the film layer of the eighth layer is AZOY or ITO, the film layer of the ninth layer is TiO ₂ , the film layer of the tenth layer is AZOY or ITO, The structure in which the film layer of the first layer is Ag, the film layer of the 12th layer is AZOY or ITO, the film layer of the 13th layer is TiO _2, and the film layer of the 17th film layer is formed on the transparent resin substrate, The first film layer is TiO ₂ and the second film layer is AZOY or ITO. The film layer of the third layer is Ag, the film layer of the fourth layer is AZOY or ITO, the film layer of the fifth layer is TiO ₂ , the film layer of the sixth layer is AZOY or ITO, the membrane layer and Ag, the film layer of the eighth layer and AZOY or ITO, the film layer of the ninth layer and TiO _2, the film layer of the 10 layers and AZOY or ITO, the film layer of the 11th layer and Ag The film layer of the twelfth layer is AZOY or ITO, the film layer of the thirteenth layer is TiO ₂ , the film layer of the fourteenth layer is AZOY or ITO, the film layer of the fifteenth layer is Ag, and the film layer of the sixteenth layer The film layer is AZOY or ITO, and the 17th film layer is TiO ₂ .

Here, as the plastic film layer, a plastic film having a light transmittance of more than 85%, extremely more than 90%, which can prevent oxidation or erosion of the deposited layer, can be adopted. Not only can it prevent and delay the erosion and performance decay of interference (EMI) shield deposition layer, it is also an excellent optical filter and at the same time a protective screen for PDP display, especially using continuous magnetron sputtering method. One ITO or AZOY metal oxide layer is formed between the vapor deposition layer and the TiO ₂ vapor deposition layer, and the ability to prevent oxidation and erosion is added to the Ag vapor deposition layer, thereby solving the so-called “white spot” problem. . Three or four sets of deposited films of this layer do not reduce the light transmittance requirement of the entire optical filter, but conversely contributes to the surface resistivity of the deposited film ≦ 1.5 Ω / cm ² . In addition, the productivity is high, the deposition film process is unified and convenient, and the cost is low.

The thicknesses of the respective film layers in the 13-layer or 17-layer deposited layer are ₁₀ to 150 nm (nanometers) of TiO ₂ and 1 of AZOY or ITO in order from the substrate toward the outermost layer. 0.0-30 nm (nanometer), Ag 5-30 nm (nanometer), AZOY or ITO 1.0-30 nm (nanometer), TiO ₂ 10-200 nm (nanometer), AZOY or ITO 1. 0-30 nm (nanometer), Ag 5-30 nm (nanometer), AZOY or ITO 1.0-30 nm (nanometer), TiO ₂ 10-200 nm (nanometer), AZOY or ITO 1.0 -30 nm (nanometer), Ag 5-30 nm (nanometer), AZOY or ITO 1.0-30 n (Nm), a TiO ₂ 10 to 200 nm (nanometers), AZOY or ITO to 1.0～30Nm (nm), Ag and 5 to 30 nm (nanometers), the AZOY or ITO 1.0～30Nm ( Nanometers) and TiO ₂ in a thickness range of 10 to 150 nm (nanometers).

  The metal thin film covers the periphery of the transparent resin substrate and is laminated with a vapor-deposited layer via a conductive adhesive on the metal thin film, or is used as a metal conductive binder, and the transparent resin substrate is printed and cured. Cover the surroundings, and stack with the deposited layer. Not only can the metal thin film be brought into contact with the EMI shield deposition layer, but it can also be U-shaped to cover the periphery of the substrate, or can be attached only to the periphery of the EMI shield deposition surface, and the metal thin film can be used as the extraction electrode The electromagnetic wave shielded and blocked by the EMI shield deposition layer can be transmitted to the display and directly grounded. The metal thin film can be formed by printing after using a conductive metal binder, followed by curing, and has higher automation efficiency and reduced cost compared to the method of laminating and superimposing using a metal thin film. And the seal against the adhesion and EMI vapor deposition layer is more robust.

  The plastic film layer that prevents oxidation or erosion of the vapor deposition layer and the vapor deposition layer is laminated and laminated with the vapor deposition layer via a binder layer. The plastic film layer can be laminated and laminated with the vapor deposition layer via the binder layer, and the plastic film itself can be laminated as a binder layer with another substrate if necessary, and can be integrated with the laminated optical filter member. It is possible to make the display thinner by integrating it with the display.

  The plastic film layer is a biaxially stretched polyester film or a polycarbonate film or a polyvinyl butyral film, and a blue pigment is added to a binder to adjust the 596 nm (nanometer) yellow characteristic light emitted from the display to attenuate, purple, At least one of red and black pigments is added to adjust the color temperature and light transmittance of the display. The plastic film layer may be a biaxially stretched polyester film (BOPET), and may be a polycarbonate film (PC film), a polyvinyl butyral film (PVB), or a polyester film (PET film). Add a blue pigment to the binder to adjust and attenuate the 596nm yellow feature light, make the red more vivid, display with other pigments added such as purple and / or red and / or black pigment It is also possible to adjust the color temperature and the visible light transmittance. If necessary, an ultraviolet absorber and an antioxidant can be added to the binder to increase the ability to prevent deterioration.

An antireflection functional film layer (AR film layer) is formed on the plastic film layer, and the antireflection functional film layer is composed of at least _two layers of SiO ₂ and Nb ₂ O ₂ or TiO ₂ . It can also be composed of four layers of SiO ₂ / Nb ₂ O _2, TiO ₂ / SiO ₂ / Nb ₂ O ₂ or TiO ₂ , and a plastic film with an AR film is bonded to the surface of the EMI shield vapor deposition film. Visible light transmitted by the filter member can have high transmittance, and the luminance of the display can be improved. It is also possible to form a vapor deposition layer with electromagnetic wave prevention and optical filtering functions, and attach a plastic film on which an AR film is formed to make it a viewing surface. In addition to providing a high quality, it is possible to prevent reflection of ambient light and improve viewing quality.

The other surface of the transparent resin substrate has an antireflection functional film layer formed by continuous magnetron sputtering, and the antireflection functional film layer is composed of at least _two layers of SiO ₂ and Nb ₂ O ₂ or TiO _2. The As described above, it can also be composed of four layers, of which SiO ₂ / Nb ₂ O ₂ (or TiO ₂ ) is manufactured by the counter target medium frequency reactive magnetron sputtering method, and the performance of the manufactured AR film is Taking a four-layer film as an example, the reflectance in the visible light range that can be known in the reflection curve is <0.5%, and the reflectance after being stacked on both sides is also less than 3%. More importantly, the AR film surface is directed directly at the person, the reflection of the substrate surface to the surrounding environment is reduced, the image quality is improved, and the serious problems caused by the reflection of the viewing surface of many current PDP displays are solved. Be able to.

The optical filter member uses as a binder a plastic film layer that prevents oxidation or erosion of the vapor deposition layer superposed on the vapor deposition layer of the transparent resin substrate, and at least a pigment that adjusts the color temperature of the display and the display are emitted therein. A blue pigment that attenuates yellow characteristic light of 596 nm (nanometers) is added, and the transparent resin substrate and another substrate are bonded to form an optical filter member integrally. When a plastic film layer is used as a binder layer, an optical filter member having more functions can be obtained by bonding a transparent resin substrate having an EMI shielding function and an optical filtering function to another transparent resin substrate and a plastic substrate. Convenient to.
In particular, a rollable plastic film having an EMI shield film and an optical filtering function film formed by using a continuous magnetron sputtering winding vapor deposition machine has higher vapor deposition efficiency and lower cost. If a plastic film to be superimposed on a vapor deposition layer on a removable vapor deposition film is used as a binder, it is convenient to bond various glass substrates to form an optical filter having more functions.

  The optical filter member includes a plastic film layer that prevents oxidation or erosion of the vapor deposition layer overlapped with the vapor deposition layer, and a pigment that adjusts the color temperature and an ultraviolet absorber are added using the plastic film layer as a binder. In addition, it is directly bonded and integrated with the plasma display to reduce the thickness of the display and further improve the viewing quality with a wide viewing angle on the side.

The surface resistivity of the vapor-deposited layer is set to ≦ 1.5Ω / cm ² (the same as that displayed in units of Ω / □).

  The transparent resin substrate of the optical filter member employs a substrate that can be wound of polymethyl methacrylate (PMMA), polyester (PET), or polycarbonate (PC) material, and the optical filter substrate can be rolled up. The weight of the display can be reduced and it is convenient to overlap with other substrates. Since the wind-up deposition machine can be a continuous magnetron sputtering deposition, the cost of the optical filter product can be further reduced by further improving the reliability and efficiency of the deposition process.

  When the optical filter member is measured on the viewing surface of the display, the light transmittance at a visible light of 380 to 780 nm is more than 30% and less than 75%, and the light transmission at an infrared ray of 850 nm. The rate is less than 18%, and the transmittance at 950 nm is less than 10%.

  When the optical filter member is measured on the other surface of the optical filter member that does not have the antireflection functional film layer of the transparent resin substrate, the reflectance at visible light of 380 to 780 nm is less than 6%.

  When an antireflection functional film layer is formed on the other surface of the transparent resin substrate, the reflectance at a visible light of 380 to 780 nm is less than 4% when the optical filter member is measured on this surface.

  The base layer of the Ag layer of the present invention is an ITO film or an AZOY film layer, and what covers the surface of the Ag layer is also an ITO film or an AZOY film layer. Since the ITO film layer or the AZOY film layer of the present invention is easier to control in the vapor deposition process, the present invention is easy to control the process, the yield is high, the optical index is stable, and the light transmittance is better. The film layer can be made thicker, and the protection against the Ag layer and the oxygen barrier ability are higher. More importantly, both sides of the Ag layer are ITO and / or AZOY, i.e. symmetrical film layers, this optical filter member can be assembled with both sides of the PDP display, EMI shield and UV, near infrared and It has a far infrared filter function. In addition, if the film thickness is designed symmetrically and the equipment can perform a four-layer deposition process using only Ag during deposition, a repeated film layer structure of 3Ag or 4Ag can be conveniently used by repeated deposition. It can be obtained, it is convenient for vapor deposition, and capital investment can be saved.

  An optical filter member of the present invention comprises a vapor-deposited glass or transparent resin substrate on which an EMI shield vapor deposition layer is formed, a plastic film that prevents oxidation and erosion of the vapor deposition layer, and a metal thin film having an extraction electrode that contacts the EMI vapor deposition layer. This is the most basic optical filter member of the PDP display. By forming an AR film on the bonded plastic film, the visible light transmittance of the optical filter member is increased, the reflectance of the visible light to the viewer is lowered, and the surface with the film attached is viewed. It can also be used by assembling on the side of the person.

A thin substrate that can be rolled up with an EMI shield film is used, and a plastic layer (or changed to a binder layer) that blocks the EMI deposition layer on top of it and prevents its oxidation or erosion is pasted to another substrate. At the same time, it can be an optical filter with a more comprehensive function and safety protection function, or it can be directly bonded to and integrated with the PDP display to reduce the weight of the display and reduce the thickness of the PDP. .
An AR film can also be formed on the other side of the EMI shield vapor deposition film of the substrate to prevent reflection to the viewer, particularly reflection of light to the screen of the environment, and improve viewing image quality. . This vapor deposition layer solves the problems of EMI shielding and filtering of ultraviolet rays, near infrared rays, and far infrared rays, which could not be solved without overlapping conventional multilayer functional films, and has high productivity, low cost, and long life. Is longer and the performance is more complete.
The optical filter member of the present invention has high productivity, high strength, high light transmittance, excellent effects of electromagnetic wave prevention and optical filtering, and a long life.

FIG. 1 is an explanatory diagram illustrating the first embodiment.
As shown in the figure, the transparent resin substrate 1 is a 2 mm thick polymethyl methacrylate (PMMA) plastic substrate, washed with deionized water, and then put into a continuous magnetron sputtering deposition production line as shown in FIG. Three-layer film system (which can also be a four-silver film system), that is, a 13-layer film composed of a repeating structure of TiO ₂ / ITO or AZOY / Ag / ITO or AZOY / TiO ₂ (adjacent TiO of adjacent structural layers) _Two layers are superposed) to form a deposition film (that is, EMI shield deposition film) 2 for preventing electromagnetic waves and filtering light. Among them, TiO ₂ is formed by facing target medium frequency reactive magnetron sputtering, and Ag and ITO or AZOY are formed. Manufactured by planar DC magnetron sputtering.

AZOY is an oxide film layer composed of a mixed material of zinc oxide and aluminum oxide. A target material composed of this ZnO and Al ₂ O ₃ material is manufactured by GfE Metallund Material GmbH of Germany. This is a known target material. ZnO and Al ₂ O ₃ account for 99.95% of the material, have similar performance as compared to the ITO film layer, and have higher light transmittance at similar thickness. When DC pulse magnetron sputtering is used, it is convenient for controlling the conditions of the thin film laminating process, and the material cost can be saved by 3/4 compared with ITO, and has excellent application value.
3-layer _TiO 2 / ITO or AZOY / Ag / ITO or AZOY / TiO ₂ repeating structure film layer (i.e., 3 silver) to Adding a _TiO 2 / ITO or AZOY / Ag / ITO or AZOY / TiO ₂ membrane layer When a 4-layer superposition structure (ie, 4 silver) is formed and finally 17 layers are formed, various performance indexes are further guaranteed, and in particular, the surface resistivity is ≦ 1.5Ω / cm ² to ≦ 1.3Ω / cm ² or less. I was able to lower it.

The performance of the manufactured EMI shielding film layer is as shown in FIG. 3, the visible light transmittance exceeds 75%, rapidly decreases in the near-infrared range, and the neon of the display emits at 596 nanometers. In the range of yellow characteristic light, the blue pigment was added, so that absorption occurred and the light transmittance became the lowest value, and the light transmittance was only about 30%. The surface resistance R was 1.3 ± 0.02 Ω / cm ² , and the ability to prevent electromagnetic waves became stronger as the surface resistance decreased.

A plastic film 4 made of a biaxially stretched polyester film (BOPET), which has a light transmittance exceeding 85% and prevents oxidation and erosion of the vapor deposition layer, is pasted on the surface of the EMI shield vapor deposition layer 2 through the acrylic ester binder layer 3. Combined. After attaching the plastic film layer and adding the blue pigment and the pigment for adjusting the color temperature, it was possible to satisfy the indicator that the light transmittance was more than 30% and less than 75%.
A conductive adhesive 7 is used to form a metal thin film (foil piece) 5 that is in contact with the EMI shield vapor deposition layer and serves as an extraction electrode at a location having a width of about 10 mm along the periphery of the substrate surface on which the EMI shield film layer is formed. Pasted together.

Based on whether or not the EMI film of the optical filter member faces the PDP display 10, the metal thin film (foil piece) 5 is not only in contact with the EMI shield vapor deposition film but also has a U shape along the edge of the substrate. Or can be attached only around the surface of the EMI shield deposition layer.
When the optical filter member is covered with a U shape along the edge of the substrate and used only for the electromagnetic wave prevention and optical filtering functions, both sides of the optical filter member are convenient to be attached to the PDP display side. An antireflection function (AR) film layer 6 was formed on each of the other surfaces of the plastic film and the substrate by a counter target medium frequency reactive magnetron sputtering method.

The structure of the antireflection functional film layer is as shown in FIG. 4 and is a four-layer structure made of SiO ₂ / Nb ₂ O ₂ or TiO ₂ .

As for the performance of the manufactured AR film layer, the reflection curve is as shown in FIG. 5, the reflectivity in the visible light range is R <0.5%, and the reflectivity after overlapping the surfaces of the two layers is also 3%. Was less than. In this example, the film layer formed by using a continuous magnetron sputtering method having a repeating structure of three or four layers of TiO ₂ / ITO, AZOY / Ag / ITO, or AZOY / TiO ₂ has a robust film layer. Yes, it has high visible light transmittance, meets the electromagnetic wave prevention standards of home appliances, has a surface resistivity of less than 1.5Ω / cm ² , high manufacturability, high yield, low cost, Since an anti-reflective deposition layer is added to the surface, the image quality is improved, and more importantly, the life of the EMI shield deposition layer is improved.

  The parameters of the film thickness of this example, that is, the 13-layer or 17-layer EMI shield film were as shown in the table below.

FIG. 6 is a structural diagram of the second embodiment.
The second embodiment is basically the same as the first embodiment, and the difference is that the AR film layer is not provided in the plastic film layer of the EMI shield vapor deposition layer.

FIG. 7 is a structural diagram of the third embodiment.
The third embodiment is basically the same as the first embodiment, and the difference is that there is no AR film layer on the other surface of the substrate. When this surface without the AR surface was measured, the reflectance was less than 5%, and in the case of a 4-silver structure, the reflectance was less than 4%, and the use requirement of the optical filter member could be satisfied. Both light transmittance and reflectance are average values of visible light. This optical filter member can be used and attached with the surface on which the plastic film is stuck facing the viewer side. In that case, the reflectance of the viewing surface was less than 3%, and the requirement that the light transmittance was more than 30% and less than 75% could be satisfied.

FIG. 8 is a schematic structural view of the fourth embodiment.
The fourth embodiment is basically the same as the first embodiment, and the difference is that there is no AR film layer on the plastic film layer or on the other surface of the substrate. This optical filter member is attached by using the surface on which the AR plastic film is not attached facing the viewer side, and the light transmittance of visible light is more than 30% and less than 75%, and the reflectance is less than 6%. (In the case of a 4-silver structure, the reflectance is less than 5%). Both light transmittance and reflectance are average values of visible light.

FIG. 9 is a schematic structural view of the fifth embodiment.
As shown in the figure, the transparent resin substrate 1 on which the EMI shield vapor deposition film is formed is bonded and integrated with the PDP display using the acrylate binder 3 and the BOPET plastic film 8 on which the AR film 6 is formed is used as the substrate. The thickness of the display was reduced by attaching to the viewing surface of 1. Even when the plastic film on the PDP display side of the above embodiment was changed to a binder, there was a function of preventing oxidation and erosion of the EMI shield film. In the case where the reflectance requirement is 6% or less, in this embodiment, the plastic film 8 on which the AR film is formed does not need to be attached to the viewing surface, and the cost can be further saved.

FIG. 10 is a schematic structural view of the fifth embodiment.
As shown in the figure, an acrylic ester binder that can be photocured on a thin BOPET substrate 1 on which the EMI shield film layer 2 is formed and the AR film layer 6 is formed on the other surface by using a winding vapor deposition machine. 3 was used to attach the EMI vapor-deposited layer 2 to a glass substrate (or polymethacrylate PMMA plate) 9 and superimpose together to form an optical filter. The rollable BOPET flex substrate on which the EMI shielding film obtained by this method is formed has a high winding vapor deposition rate, which further reduces the cost of the optical filter that is continuously produced and bonded. It can be used and bonded to different plates, and both sides of the optical filter can be attached to the viewer side if necessary.

  Each of the above-described embodiments is a further description of the contents of the present invention. However, the scope of the present invention is not limited to the above-described embodiments, and the prior art is within the scope of the present invention. The design can be changed as appropriate with the aid of the method.

Structural schematic according to the present invention Schematic diagram of the three-layer repetitive structure of the electromagnetic wave prevention deposition layer Graph of shielding and filtering of electromagnetic wave and near infrared ray, far infrared ray, ultraviolet ray and visible light transmittance Schematic structure of antireflection film Graph of reflectance (R%) of antireflection film (AR film) Structural schematic diagram of another embodiment Schematic structure without anti-reflection function on one side Schematic structure without antireflection function on the other side Schematic structure with AR film bonded to the viewing surface of the substrate Schematic structure using glass substrate

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Transparent resin substrate 2 EMI shield vapor deposition film 3 Acrylate ester binder layer 4 Plastic film 5 Metal thin film 6 Antireflection function (AR) film layer 7 Conductive adhesive 8 BOPET plastic film 9 Glass substrate 10 PDP display

Claims (14)

Including a transparent resin substrate, by a continuous magnetron sputtering method, a vapor deposition layer having an electromagnetic wave prevention and light filtering function on one side of a glass substrate, a plastic film layer that prevents oxidation or erosion of the vapor deposition layer and the vapor deposition layer, and vapor deposition A metal thin film is formed as a lead electrode in contact with the layer,
The deposited layer is 3 sets or 4 sets of TiO ₂ / AZOY / Ag / AZOY / TiO ₂ or TiO ₂ / ITO / Ag / AZOY / TiO ₂ or TiO ₂ / ITO / Ag / ITO / TiO ₂ or TiO ₂ / AZOY / A 13-layer or 17-layer structure formed by repeating a film system corresponding to Ag / ITO / TiO ₂ ,
Among them, AZOY is an oxide film layer composed of a mixed material of zinc oxide and aluminum oxide, ITO is a film layer composed of an indium oxide material added with tin,
The 13-layer film structure is formed on the transparent resin substrate. The first-layer film layer is TiO ₂ , the second-layer film layer is AZOY or ITO, the third-layer film layer is Ag, the film layer of 4-layer and AZOY or ITO, the film layer of the fifth layer and TiO _2, the film layer of the sixth layer and AZOY or ITO, the film layer of the seventh layer and Ag, the film layer of the eighth layer was a AZOY or ITO, the film layer of the ninth layer and TiO _2, the film layer of the 10 layers and AZOY or ITO, the film layer of the 11th layer and Ag, the film layer of the 12 layers and AZOY or ITO The film layer of the 13th layer is TiO ₂ ,
The structure in which the film layer of 17 layers is formed on the transparent resin substrate is such that the first film layer is TiO ₂ , the second film layer is AZOY or ITO, and the third film layer is Ag. The fourth layer is AZOY or ITO, the fifth layer is TiO ₂ , the sixth layer is AZOY or ITO, the seventh layer is Ag, and the eighth layer The 9th film layer is TiO ₂ , the 10th film layer is AZOY or ITO, the 11th film layer is Ag, and the 12th film layer is AZOY. or the ITO, the film layer of the 13 layers and TiO _2, a layer of the 14th layer and AZOY or ITO, the film layer of the 15th layer and Ag, the film layer of the 16 layers and AZOY or ITO, first electrodeposition of a plasma display that the film layer of the 17 layers, characterized in that the TiO ₂ Optical filter element having a wave prevention and optical filtering. The thickness of each film layer in the vapor deposition layer having a 13-layer or 17-layer structure is as follows:
In order from the substrate toward the outermost layer, TiO ₂ is 10 to 150 nm, AZOY or ITO is 1.0 to 30 nm, Ag is 5 to 30 nm, AZOY or ITO is 1.0 to 30 nm, and TiO _{2 is 10} to 200 nm. AZOY or ITO 1.0-30 nm, Ag 5-30 nm, AZOY or ITO 1.0-30 nm, TiO ₂ 10-200 nm, AZOY or ITO 1.0-30 nm, Ag 5-30 nm, AZOY or ITO is 1.0 to 30 nm, TiO _{2 is 10} to 200 nm, AZOY or ITO is 1.0 to 30 nm, Ag is 5 to 30 nm, AZOY or ITO is 1.0 to 30 nm, and TiO ₂ is 10 to 150 nm. The light having an electromagnetic wave prevention and light filtering function of the plasma display according to claim 1 The filter member. Metal thin film
Cover the periphery of the transparent resin substrate and cover the periphery of the transparent resin substrate through printing and curing, either by laminating and overlapping with the vapor deposition layer via a conductive adhesive on the metal thin film, or as a metal conductive binder The optical filter member having an electromagnetic wave prevention and optical filtering function of the plasma display according to claim 1, which is formed by laminating and laminating the layers. The plastic film layer that prevents oxidation or erosion of the deposited layer and the superimposed deposited layer is
The optical filter member having an electromagnetic wave prevention and optical filtering function of the plasma display according to claim 1, wherein the vapor deposition layer is laminated and overlapped via a binder layer. Plastic film layer
A biaxially stretched polyester film or polycarbonate film is added, and a blue pigment is added to the binder to adjust and attenuate the 596 nm yellow characteristic light emitted from the display, and at least one of purple, red, and black pigments is added to the display. The optical filter member having an electromagnetic wave prevention and light filtering function of the plasma display according to claim 1, wherein the color temperature and the light transmittance are adjusted. The antireflection functional film layer is formed on the plastic film layer, and the antireflection functional film layer is composed of at least _two layers of SiO ₂ and Nb ₂ O ₂ or TiO ₂ . An optical filter member having an electromagnetic wave prevention and optical filtering function of a plasma display. An antireflection functional film layer formed on the other surface of the transparent resin substrate by a continuous magnetron sputtering method, and the antireflection functional film layer is composed of at least _two layers of SiO ₂ and Nb ₂ O ₂ or TiO ₂ Item 7. The optical filter member having the electromagnetic wave prevention and light filtering functions of the plasma display according to Items 1 to 6. A plastic film layer that prevents oxidation or erosion of the vapor deposition layer superimposed on the vapor deposition layer of the transparent resin substrate is used as a binder layer, and at least a pigment that adjusts the color temperature and light transmittance of the display, and a 596 nm emission from the display. The optical filter member having an electromagnetic wave prevention and light filtering function of the plasma display according to claim 1, wherein a blue pigment that attenuates yellow characteristic light is added. The optical filter member is
Through a plastic film layer that prevents oxidation or erosion of the vapor deposition layer superimposed on the vapor deposition layer, this plastic layer is used as a binder layer, a pigment that adjusts color temperature and light transmittance, and an ultraviolet absorber are added, and a plasma display 9. An optical filter member having an electromagnetic wave prevention and optical filtering function of a plasma display according to claim 1, which is directly bonded and integrated with the plasma display. 10. The optical filter member having an electromagnetic wave prevention and optical filtering function of a plasma display according to claim 1, wherein the deposited layer has a surface resistivity of 1.5 [Omega] / cm < ² > or less. The transparent resin substrate of the optical filter member
11. The optical filter member having an electromagnetic wave prevention and optical filtering function for a plasma display according to claim 1, wherein the substrate is a rollable substrate of polymethylmethacrylate or polycarbonate material and has a thickness of 0.3 mm. When the viewing surface of the display is measured, the optical filter member has a visible light transmittance of 380 to 780 nm of more than 30% and less than 75%, an infrared transmittance of 850 nm is less than 18%, and 950 nm The optical filter member having an electromagnetic wave prevention and light filtering function of a plasma display according to claim 1, wherein the transmittance is less than 10%. The plasma according to any one of claims 1 to 12, wherein an optical filter is measured on the other surface of the transparent resin substrate on which the antireflection functional film layer is formed, and a reflectance of visible light of 380 to 780 nm of the optical filter member is less than 6%. An optical filter member having an electromagnetic wave prevention and optical filtering function of a display. The antireflection functional film layer is formed on the other surface of the transparent resin substrate, and when the optical filter member is measured on the surface, the reflectance of visible light of 380 to 780 nm is less than 4%. An optical filter member having an electromagnetic wave prevention and optical filtering function of a plasma display.

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