JP2007318823A - Linear motor, stage apparatus, exposure apparatus, and process for fabricating device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an easy-to-assemble linear motor excellent in liquid-proofing properties, and to provide a stage apparatus, an exposure apparatus, and the like, employing it. <P>SOLUTION: In the linear motor 1 comprising a coil unit 10 where a coil 13 and a refrigerant channel S are arranged in a can 12, and a magnet unit 50 movable relatively to a coil unit 10, the coil 13 is contained in a liquid-proof container 20 made of resin and arranged in a can 10. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to a linear motor, a stage apparatus, an exposure apparatus, and a device manufacturing method.

In an exposure apparatus used for manufacturing a semiconductor element, a liquid crystal display element, etc., driving of a reticle stage on which a mask (reticle etc.) is placed and a wafer stage on which a photosensitive substrate (wafer, glass plate, etc.) is placed As a device, a linear motor that can be driven in a non-contact manner is often used.
In this type of linear motor, the coil generates heat when energized, and the generated heat may be transmitted to the stage device to cause thermal deformation. There is also a possibility that air fluctuation is generated in the surrounding space, and the measurement accuracy of the light wave interferometer used for position measurement of the stage apparatus is lowered.

For this reason, a technique for absorbing heat generated from a coil by housing the coil in a cooling jacket and circulating a temperature adjusting medium (refrigerant) in the cooling jacket is known. In particular, in order to increase the output of a linear motor, a technique using pure water having a high heat capacity and low cost as a refrigerant is disclosed (Patent Document 1 and the like).
JP 2003-86486 A

When pure water is used as the refrigerant, the coil must be waterproof to ensure electrical insulation. As a method of making the coil waterproof, a technique of coating the coil with an epoxy resin or the like using a vacuum casting method or the like is known. In addition, a technique of coating with an organic film, an inorganic film, an oxide film, or the like is also known.
However, in the case of the vacuum casting method, a dedicated mold is required. In addition, since coatings such as epoxy resins have defects such as pores (pores), cracks, pinholes, etc., there is a problem that complete waterproofness cannot be expected and there is a risk of leakage. .
Furthermore, when assembling a linear motor, it is necessary to regularly align a plurality of coils coated with resin or the like using a positioning jig or the like. For this reason, there are problems such as increased assembly man-hours and manufacturing costs.

  The present invention has been made in view of the above-described circumstances, and an object of the present invention is to provide a linear motor that is excellent in liquid-proof properties and easy to assemble, a stage apparatus using the same, an exposure apparatus, and the like.

  In order to solve the above-described problems, the linear motor, the stage apparatus, the exposure apparatus, and the device manufacturing method according to the present invention employ the following means corresponding to the drawings shown in the embodiments. However, the reference numerals with parentheses attached to each element are merely examples of the element and do not limit each element.

The first invention includes a coil unit (10) in which a coil (13) and a refrigerant flow path (S) are disposed in a can (12), and a magnet unit (50) movable relative to the coil unit. In the linear motor (1) including the coil, the coil is accommodated in the liquid-proof container (20) formed of resin and disposed in the can.
According to the present invention, the coil unit can be assembled with a small number of man-hours by being excellent in liquid-proof property only by housing the coil in the liquid-proof container.

A second aspect of the invention relates to a stage apparatus (100) having a table (110) on which an object (W) can be moved and a linear motor (122, 123, 132, 133) for driving the table. The linear motor (1) according to the first invention is used as the motor.
According to the present invention, it is possible to realize a high-speed and high-precision movement of an object without adversely affecting the stage device thermally.

3rd invention has the mask stage (230) holding a mask (R), and the substrate stage (250) holding a board | substrate (W), The exposure apparatus which exposes the pattern formed in the mask to a board | substrate (200), the stage apparatus (100) according to the second invention is used for at least one of the mask stage and the substrate stage.
According to the present invention, the mask and the substrate can be moved at high speed, so that the throughput of the exposure process can be increased.

According to a fourth aspect of the present invention, in the device manufacturing method including the lithography step, the exposure apparatus (200) according to the third aspect is used in the lithography step.
According to the present invention, a high-performance device can be manufactured at a low cost by increasing the throughput of the exposure process.

According to the present invention, the following effects can be obtained.
Since a coil unit having excellent liquid-proof properties can be obtained, it is possible to use pure water with high cooling efficiency as a refrigerant. And by the improvement of cooling capacity, the high output of a linear motor can be implement | achieved easily.
In addition, the coil unit can be assembled with less man-hours. In addition, disassembly and reassembly during maintenance become easy. Therefore, a low-cost linear motor can be obtained.
By using such a linear motor in a stage apparatus and further in an exposure apparatus, it is possible to increase the accuracy of device manufacturing and increase the throughput.

Embodiments of a linear motor, a stage apparatus, an exposure apparatus, and a device manufacturing method according to the present invention will be described below with reference to the drawings.
FIG. 1 is a cross-sectional view of a linear motor 1 according to an embodiment of the present invention.
The linear motor 1 includes a coil unit 10 and a magnet unit 50.
The coil unit 10 includes a coil base 11 made of a non-magnetic metal or resin, and a can 12 made of a non-magnetic material and having a shape that opens one surface of a hollow rectangular parallelepiped. Then, the opening of the can 12 is fixed so as to be closed by the coil base 11.
Inside the can 12, a plate-shaped waterproof container 20 is disposed with its lower end (side surface 21 b) fixed to the coil base 11. The waterproof container 20 is disposed in parallel with the Y1 direction wall plates 12a and 12b and the X1 direction wall plates 12c and 12d of the can 12 at predetermined intervals. Moreover, it arrange | positions at predetermined intervals also from the wall board 12e of Z1 direction.
In the waterproof container 20, the coils 13a to 13c are arranged in a line at a predetermined interval in the X1 direction with a posture parallel to the X1Y1 plane with the longitudinal direction thereof in the Z1 direction. Is housed in.

The coil base 11 is provided with a refrigerant inlet 15 for allowing the pure water C to flow into the gap S inside the can 12 and a refrigerant outlet 16 for allowing the pure water C to flow out of the gap S. The refrigerant inlet 15 is disposed on the wall plate 12c side, while the refrigerant outlet 16 is disposed on the wall plate 12d side. And the piping (not shown) connected with the cooling mechanism 260 mentioned later is connected to the refrigerant | coolant inlet 15 and the refrigerant | coolant outlet 16, respectively.
With such a configuration, a flow path in which pure water C flows in a substantially U shape is formed inside the can 12. That is, when pure water C is introduced from the refrigerant inlet 15 into the gap S, the pure water C flows in the + Z1 direction, and gradually changes the flow direction to the + X1 direction, and accommodates the coils 13a to 13c. It flows along 20 surfaces. Further, the flow direction is changed to the −Z1 direction and flows out of the can 12 from the refrigerant outlet 16.

FIG. 2 is a perspective view showing the configuration of the waterproof container 20.
The waterproof container 20 is, for example, a container molded using a resin having high waterproof properties such as PFA, PTFE, PPS, PEEK, etc., and includes a container main body 21 that houses the coil 13 and an opening surface 21a of the container main body 21. And a lid 28 for closing the cover.
As shown in FIG. 2, the container main body 21 has a plurality of elliptical recesses 22 for accommodating the coils 13 on the opening surface 21 a side. The recess 22 has substantially the same shape as the outer edge shape of the coil 13, and the depth thereof is substantially the same as the thickness of the coil 13. That is, the coil 13 is accommodated in the recess 22 while being fitted with no gap. And the recessed part 22 is provided with two or more predetermined intervals in the X1 direction. Thereby, the plurality of coils 13a to 13c are arranged in the X1 direction.
A convex portion 23 having substantially the same shape as the inner edge shape of the coil 13 is provided in the central portion of the concave portion 22. The convex portion 23 is fitted with the inner edge of the coil 13 when the coil 13 is accommodated in the concave portion 22. The coil 13 may be a coreless coil, or may be a cored coil having an opening that fits the convex portion 23 at the center.
With such a configuration, the plurality of coils 13a to 13c are arranged in the X1 direction in the container body 21 without rattling. Moreover, you may adhere and fix the fitting part of the coil 13 and the recessed part 22 as needed.

And the flat cover 28 is covered with respect to the opening surface 21a of the container main body 21 which accommodated the several coils 13a-13c, and the contact part of the outer periphery (four sides) of the cover 28 and the container main body 21 is without gap. The waterproof container 20 is formed and configured by welding. As a welding method, an ultrasonic vibration welding method, a laser welding method, a hot air welding method, or the like can be used.
Instead of welding the container main body 21 and the lid 28, an O-ring is arranged at the contact portion between the outer periphery of the lid 28 and the container main body 21, and the container main body 21 and the lid 28 are screwed. You may make it ensure high waterproofness.

In the vicinity of the recess 22 in the waterproof container 20 (container main body 21), a step part is formed which is one step down from the opening surface 21a, and a relay terminal 24 is provided. The relay terminal 24 is a terminal provided for electrically connecting the conductive wire of the coil 13 by soldering or the like. The relay terminal 24 is provided corresponding to the coils 13a to 13c accommodated in the waterproof container 20. And the relay terminal 24 is electrically connected to the connector 25 for external connection arrange | positioned so that it may be exposed outside from the side surface 21b of the container main body 21. FIG.
With such a configuration, it is possible to supply power to the coils 13a to 13c accommodated in the waterproof container 20 while maintaining waterproofness. Note that the side surface 21b of the container body 21 where the external connection connector 25 is exposed is closely fixed to the coil base 11 (see FIG. 1), and pure water C enters the waterproof container 20 from the periphery of the external connection connector 25. Waterproof to prevent ingress.

The reason why the waterproof container 20 is provided with the relay terminal 24 for connecting the conducting wire of the coil 13 and the external connection connector 25 for connecting to the relay terminal 24 is to reduce the assembly man-hour of the coil unit 10 (linear motor 1). It is.
In the conventional method for assembling a coil unit, a plurality of resin-coated coils are aligned and arranged using a dedicated jig. Next, the conductive wire of each coil is connected to the power cable by soldering. And the procedure of carrying out resin coating of these several coils and the electric power cable containing a soldering part was passed.
On the other hand, in the waterproof container 20 according to the present embodiment, it is not necessary to perform the soldering operation of the conductive wire of the coil 13 in a state where the plurality of coils 13 are arranged and arranged. Since the relay terminal 24 is used, the soldering workability is high. There is no need to resin-coat the soldered part for waterproofing. In addition, since the external connection connector 25 is used, the power cable can be easily handled. Therefore, the number of assembling steps for the coil unit 10 can be reduced as compared with the prior art.
Furthermore, when the coil unit 10 is maintained and inspected, since the coil 13 is not resin-coated, there is an advantage that it can be easily disassembled and reassembled.

FIG. 3 is a perspective view of the magnet unit 50.
The magnet unit 50 includes a magnetic pole base 51 whose end face is U-shaped and extending in the X1 direction, a field magnet group 52 embedded in one of the inner walls of the magnetic pole base 51, and a field embedded in the other inner wall. And a magnet group 53.
The field magnet group 52 is configured such that a field magnet 52N having an exposed magnetic pole surface of N poles and a field magnet 52S having an exposed magnetic pole surface of S poles are alternately arranged in the stroke (X1) direction. The field magnet group 53 is configured by alternately arranging field magnets 53S having an exposed magnetic pole surface of S poles and field magnets 53N having an exposed magnetic pole surface of N poles in the stroke direction. Thereby, the field magnet 52N and the field magnet 53S are arranged so that the field magnet 52S and the field magnet 53N face each other with a gap therebetween, and the field magnet group 52 and the field magnet group are arranged. The direction of the magnetic field generated by 53 is alternately arranged.
The coil unit 10 and the magnet unit 50 are arranged so as to fit in the gap of the magnet unit 50 while separating the cans 12 of the coil unit 10 at a predetermined interval, and the coil unit 10 is energized to generate thrust. Occurs, and the coil unit 10 and the magnet unit 50 relatively move in the stroke (X1) direction.

As described above, since the coil 13 is accommodated in the waterproof container 20, the pure water C does not touch the coil 13 and cause electric leakage. Therefore, since the linear motor 1 can use pure water C having a large heat capacity as a refrigerant, heat generation of the coil 13 can be effectively suppressed.
Therefore, the temperature of the surface of the can 12 can be easily managed, and the influence of heat to the outside can be suppressed. Moreover, since heat generation is suppressed, the output can be easily improved by increasing the power supplied to the linear motor 1.
Further, since the coils 13 are arranged and arranged simply by accommodating the plurality of coils 13 in the waterproof container 20, the coil unit 10 can be assembled without using a special positioning jig. Furthermore, since the waterproof terminal 20 is provided with the relay terminal 24 and the external connection connector 25, it is possible to improve the efficiency of connecting the power cable to the coil unit 10.

Furthermore, when the coil is coated with an epoxy resin or the like as in the prior art, it took a considerable time to solidify the resin. However, in the linear motor 1, there is no such time, so the assembly time is greatly reduced. can do.
Moreover, since the waterproof container 20 can be formed with stable quality as compared with the case where the resin is coated, there is almost no risk of the pure water C entering due to the occurrence of defects.
Further, since the thickness of the waterproof container 20 can be reduced compared with the case of the resin coating, the heat of the coil 13 is easily transmitted, the cooling efficiency by the pure water C is improved, and the coil 13 is prevented from being burned out. be able to. Moreover, since the magnet unit 50 can be made to adjoin, the efficiency of the linear motor 1 improves. Further, it is possible to reduce the size of the coil unit 10 and thus the linear motor 1.

Furthermore, in the case of the vacuum casting method, it is necessary to prepare a mold for each motor. However, in the linear motor 1, since only one mold needs to be prepared, the manufacturing cost can be reduced. .
Further, in the case of resin coating, it has been a problem that water is immersed from the interface where the resin is interrupted, but such a problem is eliminated by using the waterproof container 20.
Further, by welding the container main body 21 and the lid 28 of the waterproof container 20 or fixing them using an O-ring, intrusion of gas in addition to liquid such as pure water C can be prevented.

Next, the stage apparatus 100 using the linear motor 1 mentioned above is demonstrated using FIG. FIG. 4 is a perspective view showing a configuration of the stage apparatus 100 according to the embodiment of the present invention.
The stage apparatus 100 includes an XY table 110 on which a wafer W is placed, an X direction driving unit 120 and a Y direction driving unit 130 that drive the XY table 110 in the XY plane, and a surface plate 101.

The X direction drive unit 120 includes an X guide 121 extending in the X direction on the surface plate 101, an X direction moving body 124 that moves on the surface plate 101 along the X guide 121, and an X direction moving body 124. The first X linear motor 122 and the second X linear motor 123 are moved in the X direction.
The X guide 121 extends in the X direction in the vicinity of the end surface of the surface plate 101 in the Y direction and serves as a reference in the X direction. The X direction moving body 124 includes a first Y guide transport body 125 disposed in the vicinity of the X guide 121 and a second Y disposed in parallel with an interval in the Y direction from the first Y guide transport body 125. The guide transport body 126 and the first and second Y guide transport bodies 125 and 126 are connected to each other, and the guide transport body 126 includes a Y guide 131 that extends in the Y direction and serves as a reference in the Y direction. It is supported so as to be movable in the X direction. The Y guide 131 is also a part of a Y-direction drive unit 130 described later.

The first X linear motor 122 includes a first X stator 122a and a first X mover 122b that moves along the first X stator 122a. It is extended in parallel with. The second X linear motor 123 includes a second X stator 123a and a second X mover 123b that moves along the second X stator 123a. The second X stator 123a is a second Y guide. It extends in parallel to the side of the transport body 126. Then, the first X mover 122b and the second X mover 123b are connected to the X-direction moving body 124 via connecting members 127 and 128, respectively.
With such a configuration, the X-direction moving body 124 moves in the X direction along the X guide 131 by driving the first and second X movers 122b and 123b.

The Y direction drive unit 130 includes first and second Y linear motors 132 and 133 that drive the XY table 110 in the Y direction, and a Y guide 131, and is installed on the X direction moving body 124.
The XY table 110 includes a top plate 111 and a bottom plate 112 arranged on the upper surface of the surface plate 101 so as to sandwich the Y guide 131 from above and below, and a pair of Y connecting the top plate 111 and the bottom plate 112 on both sides of the Y guide 131. The directional bearing bodies 113 and 114 are supported along the Y guide 131 so as to be movable in the Y direction.
The first Y linear motor 132 includes a first Y stator 132 a and a first Y mover 132 b that moves along the first Y stator 132 a. The first Y stator 132 a is an X of the Y guide 131. It extends in parallel to the + side of the direction. Similarly, the second Y linear motor 133 includes a second Y stator 133a and a second Y mover 133b (not shown) that moves along the second Y stator 133a. The child 133a extends in parallel to the negative X side of the Y guide 131.
The first and second Y movers 132b and 133b are fixed to the XY table 110 and driven, so that the XY table 110 moves in the Y direction along the Y guide 131.
The first X and second X linear motors 122 and 123 and the first Y and second Y linear motors 132 and 133 have substantially the same configuration as the linear motor 1 described above, and the magnet unit 50 is movable. The child and coil unit 10 are used as a stator.

The XY table 110 is provided with a Zθ drive unit (not shown) that can move the top plate 111 in the Z direction and rotate around the X, Y, and Z axes. A holding mechanism (not shown) for vacuum-sucking the wafer W is placed.
Further, an X coordinate moving mirror 115 is extended in the vicinity of the X direction end face of the top plate 111, and similarly, a Y coordinate moving mirror 116 is extended in the vicinity of the Y direction end face. Then, the X-coordinate measuring laser interferometer 105 and the Y-coordinate measuring laser interferometer 106 irradiate the length measuring laser to the X-coordinate moving mirror 115 and the Y-coordinate moving mirror 116, and the reflected light is irradiated to the X-coordinate measuring laser interferometer. The position in the X direction and the Y direction of the XY table 110 is always detected by the light receiving by the laser interferometer 105 and the Y coordinate measuring laser 106.

Next, an exposure apparatus 200 using the above-described stage apparatus 100 will be described with reference to FIG. FIG. 5 is a conceptual diagram of the exposure apparatus 200 according to the embodiment of the present invention.
The exposure apparatus 200 is a scanning exposure type exposure apparatus, and includes a laser unit 210, an illumination optical system 220 that irradiates laser light emitted from the laser unit 210 toward a reticle (mask) R on which a circuit pattern is formed, A reticle stage (mask stage) 230 that holds the reticle R and scans in a predetermined direction; a projection optical system 240 that projects a pattern image of the reticle R illuminated by the illumination optical system 220 onto a photosensitive wafer (substrate) W; A wafer stage (substrate stage) 250 that holds the wafer W and scans in two directions of the X and Y directions in the XY plane, a cooling mechanism 260 that cools each linear motor, a main control system 270 that controls these, etc. Is done.

  The laser unit 210 includes an exposure light source and a plurality of optical members (all not shown), and irradiates the illumination optical system 220 with laser light through a lens barrel (not shown) that transmits laser light. As the exposure light, for example, KrF excimer laser light, ArF excimer laser light, F2 excimer laser light, harmonics of a metal vapor laser or a YAG laser, or an ultraviolet bright line (g-line, i-line, etc.) of an ultra-high pressure mercury lamp Etc. are used.

  The illumination optical system 220 includes a plurality of optical members including a mirror 221, a fly-eye lens, and a field stop (all not shown). The laser light emitted from the laser unit 210 is reflected by the mirror 221 and is then emitted with a uniform illuminance distribution in a predetermined illumination region on the reticle R held on the reticle stage 230.

  The reticle stage 230 is provided with a reticle stage drive mechanism (not shown) composed of a linear motor that drives the mounted reticle R in the X direction, that is, in the scanning direction. The linear motor 1 described above is used for this linear motor. It is done. In addition, a movable mirror 232 that reflects laser light emitted from a laser interferometer 231 that is a position detection device is fixed to the reticle stage 230, and the position of the reticle stage 230 within the stage moving surface is always detected. . Then, the position information of reticle stage 230 detected by laser interferometer 231 is sent to main control system 270.

  The projection optical system 240 is composed of a plurality of projection lenses (not shown), and has a predetermined projection magnification β (β is, for example, 1/5). Then, when the illumination area of the reticle R is illuminated by the illumination optical system 220, a reduced image of the pattern image of the reticle R is formed on the exposure area on the wafer W via the projection optical system 240.

The wafer stage 250 moves the wafer W placed on the XY table 251 in the XY direction, and has substantially the same configuration as the stage apparatus 100 described above.
The length measurement laser is irradiated from the laser interferometer 253 to the reflecting mirror 252 provided on the XY table 251, and the X and Y positions of the XY table 251 are always detected. Then, the information is sent to the main control system 270.

  In addition, a cooling mechanism 260 for cooling each linear motor used for the wafer stage 250 and the reticle stage 230 is provided. A pipe for supplying and recovering pure water C from the cooling mechanism 260 to each linear motor is installed, and in response to an instruction from the main control system 270, the pure water C is caused to flow through a flow path provided in each linear motor to generate heat. The heat generated by each linear motor is recovered by performing heat exchange between the portion to be purified and pure water C.

  The main control system 270 comprehensively controls the exposure apparatus 200 based on various information from the laser interferometers 231 and 253 and the like and various parameters stored in the main control system 270 in advance. For example, the reticle stage driving mechanism is driven based on the position information of the reticle stage 230 to move the reticle stage 230 in the scanning direction, or the wafer stage 250 is moved in the XY direction based on the position information of the wafer stage 250. . In addition, the cooling mechanism 260 is controlled to supply and collect pure water C to each linear motor and cool it.

With the configuration as described above, the stage apparatus 100 (wafer stage 250) generates heat when the first X and second X linear motors 122 and 123 and the first Y and second Y linear motors 132 and 133 are driven. It can be effectively suppressed. That is, the linear motors 122, 123, 132, 133 are efficiently cooled by flowing pure water C having a large heat capacity from the cooling mechanism 260 toward the linear motors 122, 123, 132, 133 (linear motor 1). Can do. As a result, the heat generated by the linear motors 122, 123, 132, 133 causes thermal deformation of the stage apparatus 100, or the air interferometer 105 detects the relative position between the coil unit 10 and the magnet unit 50 due to air fluctuations due to the generated heat. 106, 231, and 253 are prevented from being adversely affected.
Accordingly, the stage apparatus 100 (wafer stage 250) can be positioned with high accuracy. Furthermore, even if the amount of power supplied to the coil 13 is increased as compared with the conventional case, the heat generation of the coil 13 is suppressed, so that the output of the linear motors 122, 123, 132, 133 can be improved.
In the exposure apparatus 200, the reticle R and the wafer W can be positioned at high speed and with high accuracy, so that a high-performance device can be manufactured with high throughput.

Next, a modified example of the waterproof container will be described. FIG. 6 is a perspective view showing a configuration of the waterproof container 30.
Similar to the waterproof container 20, the waterproof container 30 includes a container body 31 that houses the coil 13 and a lid 38 that closes the opening surface 31 a of the container body 31. Similarly to the waterproof container 20, the container body 31 is formed with a plurality of oval concave portions 32 having substantially the same shape as the outer edge shape of the coil 13 and convex portions 33 having substantially the same shape as the inner edge shape of the coil 13. ing.
In the waterproof container 30, a plurality of protrusions 36 are formed on the convex portion 33. The protrusion 36 is formed to protrude from the opening surface 31a. Similarly, a plurality of protrusions 37 are formed on the back surface of the waterproof container 20 (the back surface of the opening surface 31a).
On the other hand, a plurality of holes 39 are formed in the lid 38. The hole 39 is formed at a position corresponding to the protrusion 36 provided on the opening surface 31 a of the container body 31. That is, when the container main body 31 and the lid 38 are combined, the protrusion 36 of the container main body 31 and the hole 39 of the lid 38 are fitted together.
And the contact part of the outer periphery of the lid | cover 38 and the container main body 31 and the contact part of the processus | protrusion 36 and the hole 39 are each welded. As described above, in the waterproof container 30, since the welding process is performed at a portion other than the contact portion between the outer periphery of the lid 38 and the container body 31, the lid 38 and the container body 31 are firmly fixed.

When the waterproof container 30 is accommodated in the can 12, as shown in FIG. 6B, the plurality of protrusions 36 and 37 abut against the wall plates 12a and 12b of the can 12, and further the wall plates 12a and 12b. It is fixed by welding or screw fastening using an O-ring together. That is, the waterproof container 30 is supported by the can 12 through the protrusions 36 and 37.
When the linear motor 1 is driven to generate a thrust in the X1 direction, a reaction force in the X1 direction is applied to the waterproof container 30. Further, an attractive repulsive force in the Y1 direction is generated between the coil unit 10 and the magnet unit 50, and the force is applied to the waterproof container 30. For this reason, the waterproof container 30 needs to be firmly attached to the coil base 11.
Therefore, in the waterproof container 30, the waterproof container 30 is fixed to the coil base 11, and the protrusions 36 and 37 are fixed to the wall plates 12 a and 12 b of the can 12, so that the force applied to the waterproof container 30 is dispersedly supported. ing.

Next, another modified example of the waterproof container will be described.
FIG. 7 is a perspective view showing the configuration of the waterproof container 40. FIG. 8 is a perspective view showing a configuration of a magnet unit 50b used in combination with a coil unit having a waterproof container 40. FIG.
The waterproof container 40 includes a container main body 41 that houses the coil 13, and a lid 48 that closes the opening surface 41 a of the container main body 41. Further, the container body 41 has an oval first concave portion 42a having substantially the same shape as the outer edge shape of the first coil 13a that generates thrust in the X1 direction, and a convex shape having substantially the same shape as the inner edge shape of the first coil 13a. A plurality of portions 43a are formed. In addition to the five first recesses 42a aligned in the X1 direction, the waterproof container 40 accommodates two second coils 13b that are arranged on the + Z1 direction side of the first coil 13a and generate thrust in the Z1 direction. Two recesses 42b are formed.

Next, the magnet unit 50b shown in FIG. 8 will be described. In addition, about a common part with the magnet unit 50 shown in FIG. 3, a common code | symbol is attached | subjected and description is abbreviate | omitted.
Magnet unit 50 b further includes field magnet groups 54 and 55 in the −Z direction of field magnet groups 52 and 53 in addition to field magnet groups 52 and 53. The field magnet group 54 extends in the X1 direction and has an exposed magnet surface of N poles, and the exposed magnet surface that extends in the X1 direction and is arranged side by side with the field magnet group 54N has S poles. Field magnet group 54S. The field magnet group 55 includes a field magnet 55S arranged to face the field magnet group 54N, and a field magnet group 55N arranged to face the field magnet group 54S. The
Thus, in the magnet unit 50b, the field magnet group 52 and the field magnet group 53 form a first magnetic field, and the field magnet group 54 and the field magnet group 55 form a second magnetic field. Is done.

  The linear motor composed of the coil unit having the waterproof container 40 and the magnet unit 50b described above drives the five first coils 13a aligned in the X1 direction, and thereby generates a first magnetic field of the magnet unit 50b. The thrust in the X1 direction can be generated by the action. Further, by driving the two second coils 13b arranged on the Z1 direction side, a thrust in the Z1 direction can be generated by the action with the second magnetic field. That is, a biaxial linear motor that generates thrust in the X1 direction and the Z1 direction is configured by using the waterproof container 40 and the magnet unit 50b.

The operation procedure shown in the above-described embodiment, or various shapes and combinations of the constituent members are examples, and various changes can be made based on process conditions, design requirements, and the like without departing from the gist of the present invention.
For example, the present invention includes the following modifications.

  In the above-described embodiment, the case where pure water C is used as the coolant for cooling the coil 13 has been described. For example, you may use the antifreezing liquid which has a fluorine-type inert liquid, ethylene glycol, etc. as a main component. Moreover, you may use not only a liquid but a gas refrigerant.

  In addition to the case where both the concave portion and the convex portion are formed, only one of the concave portion or the convex portion may be formed in the waterproof container. The number of the concave portions and the convex portions in the waterproof container can be arbitrarily set. Further, for example, when 10 coils can be accommodated in the waterproof container, only 8 coils may be accommodated.

  In the above-described embodiment, the waterproof container is fixed to the flat coil base 11, but the present invention is not limited to this. For example, the coil base may be formed in a frame shape, and a waterproof container may be fixed therein. By closing both surfaces of the frame-shaped coil base with plate-like members, a can is formed and a refrigerant flow path is secured.

  In the stage apparatus 100 and the exposure apparatus 200 described above, the coil unit 10 of the linear motor 1 is used as a stator and the magnet unit 50 is used as a mover. However, the present invention is not limited to this, and the coil unit 10 is used as a mover. The magnet unit 50 may be used as a stator.

  Further, the linear motor 1 has been described with respect to a so-called cantilever type linear motor in which the cross section of the magnet unit in a plane perpendicular to the thrust direction is a U-shape. However, the present invention is not limited to this, and the cross section of the magnet unit is not limited thereto. It is also applicable to a so-called double-sided linear motor having a square shape. It can also be applied to a shaft type linear motor.

As the linear motor 1, either an air levitation type using an air bearing or a magnetic levitation type using a Lorentz force may be used.
Further, the table may be a type that moves along a guide, or may be a guideless type in which no guide is provided. Further, when a planar motor is used as the table driving device, either the magnet unit (permanent magnet) or the armature unit is connected to the stage, and the other of the magnet unit and the armature unit is connected to the moving surface side of the stage ( Base).

  Further, the reaction force generated by the movement of the wafer stage may be released mechanically to the floor (ground) using a frame member as described in JP-A-8-166475. The present invention can also be applied to an exposure apparatus having such a structure.

  The reaction force generated by the movement of the reticle stage may be mechanically released to the floor (ground) using a frame member as described in JP-A-8-330224. The present invention can also be applied to an exposure apparatus having such a structure.

The exposure apparatus 200 of the above embodiment can be applied to a scanning type exposure apparatus that exposes the pattern of the reticle R by synchronously moving the reticle R and the wafer W, and the reticle R and the wafer W are stationary. In this state, the pattern of the reticle R is exposed, and it can be applied to a step-and-repeat type exposure apparatus that sequentially moves the wafer W stepwise.
The exposure apparatus 200 may be an immersion type exposure apparatus that exposes the wafer W by disposing the liquid between the projection optical system 240 and the wafer W and solving the liquid.

  Further, the use of the exposure apparatus is not limited to the exposure apparatus for manufacturing a semiconductor device. For example, an exposure apparatus for liquid crystal that exposes a liquid crystal display element pattern on a square glass plate and a thin film magnetic head are manufactured. Therefore, it can be widely applied to an exposure apparatus.

The exposure apparatus 200 of the present embodiment is manufactured by assembling various subsystems including the constituent elements recited in the claims of the present application so as to maintain predetermined mechanical accuracy, electrical accuracy, and optical accuracy. Is done. In order to ensure these various accuracies, before and after assembly, various optical systems are adjusted to achieve optical accuracy, various mechanical systems are adjusted to achieve mechanical accuracy, and various electrical systems are Adjustments are made to achieve electrical accuracy.
The assembly process from the various subsystems to the exposure apparatus includes mechanical connection, electrical circuit wiring connection, pneumatic circuit piping connection, and the like between the various subsystems. Needless to say, there is an assembly process for each subsystem before the assembly process from the various subsystems to the exposure apparatus. When the assembly process of the various subsystems to the exposure apparatus is completed, comprehensive adjustment is performed to ensure various accuracies as the entire exposure apparatus.
The exposure apparatus is preferably manufactured in a clean room where the temperature, cleanliness, etc. are controlled.

  Then, as shown in FIG. 9, the semiconductor device includes a step 301 for designing the function / performance of the device, a step 302 for producing a mask (reticle) based on the design step, and a substrate (wafer, Step 303 for manufacturing a glass plate), substrate processing step 304 for exposing the pattern of the reticle R onto the wafer W by the exposure apparatus of the above-described embodiment, device assembly step (including dicing process, bonding process, and packaging process) 305, inspection It is manufactured through step 306 and the like.

It is sectional drawing of the linear motor which concerns on embodiment of this invention. It is a perspective view which shows the structure of a waterproof container. It is a perspective view of a magnet unit. It is a perspective view which shows the structure of the stage apparatus which concerns on embodiment of this invention. It is a conceptual diagram of the exposure apparatus which concerns on embodiment of this invention. It is a perspective view which shows the modification of a waterproof container. It is a perspective view which shows the other modification of a waterproof container. It is a perspective view which shows the modification of a magnet unit. It is a flowchart figure which shows an example of the manufacturing process of the microdevice which concerns on embodiment of this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Linear motor 10 ... Coil unit 12 ... Can 13 ... Coil 20, 30, 40 ... Waterproof container (liquid-proof container)
21, 31, 41 ... container main body 22, 32, 42 ... concave part 23, 33, 43 ... convex part 24 ... relay terminal 25 ... external connection connector 28, 38, 48 ... lid 50, 50 b ... magnet unit 100 ... stage device DESCRIPTION OF SYMBOLS 110 ... XY table 122,123,132,133 ... Linear motor 200 ... Exposure apparatus 230 ... Reticle stage (mask stage)
250 ... Wafer stage (substrate stage)
S: Air gap (refrigerant flow path)
C ... Pure water (refrigerant)
R ... reticle (mask)
W ... wafer (object, substrate)

Claims (9)

In a linear motor comprising a coil unit in which a coil and a refrigerant flow path are arranged in a can, and a magnet unit movable relative to the coil unit,
The linear motor according to claim 1, wherein the coil is accommodated in a liquid-proof container made of resin and disposed in the can.   2. The linear motor according to claim 1, wherein the liquid-proof container includes a concave portion that fits the coil and accommodates the coil.   The linear motor according to claim 2, wherein a plurality of the recesses are provided at predetermined intervals along a thrust generation direction of the linear motor.   The linear motor according to any one of claims 1 to 3, wherein the liquid-proof container includes a convex portion having the same shape as the inner edge shape of the coil.   The recess includes a first recess that houses a first coil that generates thrust in a first direction, and a second recess that houses a second coil that generates thrust in a second direction orthogonal to the first direction. The linear motor according to claim 2.   The liquid-proof container includes a relay terminal portion that is electrically connected to the coil, and an external connection connector that is electrically connected to the relay terminal portion. The linear motor according to any one of claims 1 to 5. In a stage apparatus having a table on which an object can be moved and a linear motor that drives the table,
A stage device using the linear motor according to claim 1 as the linear motor. In an exposure apparatus having a mask stage for holding a mask and a substrate stage for holding a substrate, and exposing the pattern formed on the mask to the substrate,
An exposure apparatus, wherein the stage apparatus according to claim 7 is used for at least one of the mask stage and the substrate stage. A device manufacturing method including a lithography process, wherein the exposure apparatus according to claim 8 is used in the lithography process.

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