JP2007002101A - Cleanser - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a cleanser which exhibits a high cleansing effect in a small amount as a cleanser for cleansing pigment dispersion type photo-sensitive resin compositions for forming black matrix patterns and color filters. <P>SOLUTION: This cleanser for removing the pigment dispersion type photo-sensitive resin compositions has an aromatic compound including alkylbenzenes. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a cleaning agent for cleaning and removing a photosensitive resin composition.

Photolithographic techniques are used in the manufacture of semiconductor elements and liquid crystal display elements, and for these, positive or negative photosensitive resin compositions are used.
The photosensitive resin composition is applied in the form of a coating solution on a substrate such as a semiconductor substrate or a glass substrate, and is appropriately dried to form a coating, selectively exposed to this, and then developed. Thus, a patterned photosensitive resin film is formed.

  As a method for applying the photosensitive resin composition to the substrate, a rotary coating method is generally used, but particularly in the field of liquid crystal display element manufacturing, which is becoming increasingly large, a coating means such as a coat-and-spin method or a non-spin method. Has been proposed.

  In the coating step, the nozzle for discharging the photosensitive resin composition, the inner wall of the coating apparatus, the peripheral edge of the substrate, the back surface of the substrate, and other piping systems are contaminated with the photosensitive resin composition, and therefore, a cleaning process is performed periodically or as needed. There is a need.

  In particular, a pigment-dispersed photosensitive resin composition for forming a pigment-dispersed material, for example, a color filter or a black matrix pattern, is difficult to remove by washing, and it is required to realize a washing-removing solution having excellent detergency. It was.

Note that there are Patent Document 1, Patent Document 2, Patent Document 3, and Patent Document 4 as documents related to the present invention.
JP-A-7-74136 JP-A-10-204497 Japanese Patent Laid-Open No. 11-174691 JP 2000-44994 A JP 2004-167476 A JP 2000-288488 A

  Conventional cleaning liquids for pigment-dispersed resists have problems in cleaning properties, particularly when cleaning pigment-dispersed negative resist compositions containing carbon, and further improvements in cleaning performance have been demanded. In addition, carbon may settle in the cleaning liquid after cleaning, and it has been desired to develop a cleaning liquid that does not cause carbon aggregation and sedimentation.

  In view of the above problems, the present invention provides a cleaning agent that exhibits a high cleaning effect in a small amount for cleaning a pigment-dispersed photosensitive resin composition for forming a black matrix pattern or a color filter.

The cleaning agent for removing the pigment-dispersed photosensitive resin composition according to the present invention has an aromatic compound containing alkylbenzene.
In addition, the above alkylbenzene contains at least propylbenzene, ethylmethylbenzene, and trimethylbenzene.

Further, the proportion of the propylbenzene contained in the alkylbenzene is indicated by an area area of 30% or more in gas chromatography measurement.
Moreover, the ratio of the trimethylbenzene contained in the alkylbenzene is indicated by an area area of 40% or less in gas chromatography measurement.

Moreover, the said cleaning agent contains the said alkylbenzene in the range of 10-30 mass%.
Further, the aromatic compound is one or more selected from dimethylbenzene, indane, cumene, ethylmethylbenzene, (1-methyl) propylbenzene, (2-methyl) propylbenzene, diethylbenzene, and ethyldimethylbenzene. Are mixed.

In addition, the photosensitive resin composition is a negative type.
In addition, the cleaning agent further includes a silicon-based surfactant.
In addition, the cleaning agent removes the photosensitive resin composition attached to at least one of a slit nozzle, a priming roller, or a slit nozzle cleaning device of a coating apparatus that applies the photosensitive resin composition. Features.

  By using the cleaning agent according to the present invention, a cleaning effect equivalent to or higher than that of the conventional product can be obtained with a small amount of cleaning agent. In addition, the cleaning agent according to the present invention is excellent in terms of work efficiency because it has a low environmental load and is less likely to cause aggregation and sedimentation of the pigment.

  Further, as the number of carbon atoms of the alkyl group, the larger the number of carbon atoms, the smaller the amount of the compound added (that is, the addition efficiency is better). Therefore, by using the cleaning agent according to the present invention, a cleaning effect equivalent to or higher than that of conventional products can be obtained with a small amount of an aromatic compound added.

Hereinafter, the present invention will be described in more detail.
In the present invention, a cleaning agent for removing a pigment-dispersed photosensitive resin composition and having an aromatic compound containing alkylbenzene is prepared. This alkylbenzene contains at least propylbenzene, ethylmethylbenzene, and trimethylbenzene.

  This cleaning agent contains alkylbenzene in the range of 10 to 30% by mass. Specific examples of the alkylbenzene include a commercially available petroleum fraction (trade name: Solvesso 100, manufactured by Exxon Chemical Co., Ltd.).

  The total content of propylbenzene, ethylmethylbenzene, and trimethylbenzene in the alkylbenzene is in a range having an area of 50% or more, preferably 50 to 80% in gas chromatography analysis. Below that, it is difficult to characterize the constituents as petroleum fractions, so they are described as features.

  The proportion of propylbenzene contained in the alkylbenzene is indicated by an area of 30% or more in gas chromatography measurement. The proportion of trimethylbenzene contained in the alkylbenzene is indicated by an area area of 40% or less in gas chromatography measurement.

  The aromatic compound contained in the cleaning agent is further selected from dimethylbenzene, indane, cumene, ethylmethylbenzene, (1-methyl) propylbenzene, (2-methyl) propylbenzene, diethylbenzene, and ethyldimethylbenzene. One or more types are mixed.

  When propylbenzene in the alkylbenzene is a main component, not only the cleaning property but also the merit excellent in the drying property of the substrate after cleaning is obtained. If the trimethylbenzene in the alkylbenzene is 40% or less, there is a merit that the environmental load can be reduced by reducing trimethylbenzene which is considered harmful to the ecosystem.

  The content of alkylbenzene in the cleaning liquid is preferably about 5 to 30% by weight, particularly preferably within the range of 10 to 25% by weight. By using alkylbenzene within this range, it is possible to wash and remove the pigment component, polymer component, low molecular weight organic compound component and the like in a balanced manner. In addition, it is possible to suppress the precipitation phenomenon of carbon and other pigment components in the cleaning liquid after cleaning.

  The cleaning liquid of the present invention is preferably a mixed system of alkylbenzene and other solvent. By mixing and using the cleaning agent of the present invention with other solvents, it becomes easy to control properties such as detergency and quick drying, and it is possible to perform optimal composition control according to the type of pigment dispersion type. .

  As a solvent component other than alkylbenzene, a good solvent such as a polymer component constituting a pigment dispersion resist or a low molecular weight organic compound is preferable. For example, a solvent for a pigment dispersion resist to be cleaned is selected from the preferable solvents. can do. In particular, 1-methoxy-2-acetoxypropane (that is, propylene glycol monomethyl ether acetate, PGMEA), 1-methoxy-2-propanol (that is, propylene glycol monomethyl ether, PGMEA), and the like can be selected.

  The solvent contained in the cleaning agent may be composed of only one type, but in order to satisfy various characteristics such as cleaning properties, drying properties, and prevention of sedimentation of the washed pigment, a plurality of types of solvents are used. The mixed solvent used is preferable because a balanced cleaning solution can be easily designed.

  For example, solvents include 1-methoxy-2-acetoxypropane, 1-methoxy-2-propanol, cyclohexanone, 1- (3-methoxy) butyl acetate, methoxypropyl acetate, ethyl 3-ethoxypropionate, ethyl acetate, acetic acid Butyl, propyl acetate, pentyl acetate, hexyl acetate, heptyl acetate, octyl acetate, ethyl lactate, butyl lactate, pentyl lactate, hexyl lactate, hexyl lactate, octyl lactate, acetone, 4-methyl-2-pentanone, 2-butanone, 2 -Heptanone, methanol, ethanol, propanol, butanol, pentanol, hexanol, heptanol, octanol, hexane, heptane, octane, nonane, decane, diethyl ether, cyclohexane, cyclohexanol, dioxane, Kisetan, phenol, cresol, or a mixture of one or more selected from xylenol.

  Further, as the photosensitive resin composition, a pigment dispersion type is used, and for example, a black pigment (carbon black) for forming a black matrix pattern system can be used. According to the cleaning agent of the present invention, aggregation of pigment particles such as carbon dispersed in the photosensitive resin composition cleaned and removed by the cleaning agent is suppressed, and the pigment is efficiently dispersed in the cleaning and removal solvent. Is done. That is, if the dispersibility of the pigment in the cleaning agent is poor, the pigment particles once cleaned and removed tend to aggregate and settle on the surface to be cleaned, but this can be prevented and the cleaning residue can be eliminated.

  In addition, when cleaning the tip of the discharge nozzle of the coating apparatus for applying the photosensitive resin composition, if the cleaning liquid remains attached to the nozzle or the like, the nozzle can be used to discharge the photosensitive resin composition again after cleaning. The cleaning liquid adhering to the resin dissolves in the photosensitive resin composition, and changes the composition of the photosensitive resin composition.

  Changing the composition of the photosensitive resin composition in this manner may lead to deterioration of characteristics such as applicability of the photosensitive resin composition, and may cause, for example, coating unevenness. In particular, when a surfactant is blended in the photosensitive resin composition, the concentration of the surfactant decreases due to contact with the cleaning agent, and as a result, coating unevenness tends to occur.

  Therefore, by using the cleaning agent of the present invention that is also excellent in drying property (fast drying property), it is possible to suppress the dissolution of the cleaning liquid into the photosensitive resin composition. In particular, when propylene glycol monoalkyl ether is contained, it is effective for improving the drying property.

  Further, according to the cleaning agent containing a surfactant, even if the cleaning liquid remaining in the photosensitive resin composition is dissolved, it is possible to suppress a decrease in the surfactant concentration in the photosensitive resin composition, and to prevent uneven coating. Can be prevented.

  The photosensitive resin composition is not limited to carbon black, and red (R), blue (B), and green (G) color filter forming photosensitive resin compositions may be used. In particular, when cleaning the photosensitive resin composition for forming a green (G) color filter, it is preferable to add a silicon-based surfactant (for example, Additol XL 121 (manufactured by Solusia)) to the cleaning agent. .

  There is no particular limitation on the photosensitive resin composition to be removed by the cleaning agent according to the present invention, and positive type, negative type, chemical amplification type, non-chemical amplification conventionally used for semiconductors, liquid crystals, color filters, etc. Any photosensitive resin composition of the mold can be targeted. The photosensitive resin composition basically contains a photosensitive component such as a resin component and a photopolymerization initiator as essential components, in addition to a monomer component, a surfactant, an acid component, a nitrogen-containing organic compound, a pigment, a solvent, and the like. May be contained.

  The photosensitive resin composition in which the cleaning agent according to the present invention exhibits a cleaning effect is a photosensitive resin composition in which a pigment is dispersed, and more preferably red (R), green (G), blue (B ) Color filter forming photosensitive resin composition and black matrix pattern forming photosensitive resin composition.

  Examples of the resin component include one or more selected from monomers having a carboxy group such as acrylic acid and methacrylic acid, methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, 2-hydroxyethyl acrylate, 2 -Hydroxyethyl methacrylate, 2-hydroxypropyl methacrylate, N-butyl acrylate, N-butyl methacrylate, isobutyl acrylate, isobutyl methacrylate, benzyl acrylate, benzyl methacrylate, phenoxy acrylate, phenoxy methacrylate, isobornyl acrylate, isobornyl methacrylate, glycidyl Copolymer with at least one selected from methacrylate, styrene, acrylamide, acrylonitrile, etc., phenol novolac type epoxy Resins such as attalylate polymer, phenol novolac type epoxy methacrylate polymer, cresol novolac type epoxy acrylate polymer, cresol nopolac type epoxy methacrylate polymer, bisphenol A type epoxy acrylate polymer, bisphenol S type epoxy acrylate polymer Can be mentioned.

  Examples of the photopolymerization initiator include 1-hydroxycyclohexyl phenyl ketone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, 1- [4- (2-hydroxyquinethoxy) phenyl] -2 -Hydroxy-2-methyl-1-propan-1-one, 1- (4-isopropylphenyl) -2-hydroxy-2-methylpropan-1-one, 1- (4-dodecylphenyl) -2-hydroxy- 2-methylpropan-1-one, 2,2-dimethoxy-1,2-diphenylethane-1-one, bis (4-dimethylaminophenyl) ketone, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butan-1-one, 2,4,6-trimethylbenzoyldiphenylphosphine oxide, 4- Benzoyl-4'-methyldimethylsulfide, 4-dimethylaminobenzoic acid, methyl 4-dimethylaminobenzoate, 4-dimethylamino Ethyl benzoate, butyl 4-dimethylaminobenzoate, 4-dimethylamino-2-ethylhexyl benzoate, 4-dimethylamino-2-isoamylbenzoate, benzyl-β-methoxyethyl acetal, benzyldimethyl ketal, 1-phenyl- 1,2-propanedione-2- (o-ethoxycarbonyl) oxime, methyl o-benzoylbenzoate, 2,4-diethylthioxanthone, 2-tarolothioxanthone, 2,4-dimethylthioxanthone, 1-chloro-4- Propoxythioxanthone, thioxanthene, 2-chlorothioxanthene, 2,4-diethylthioxanthene, 2-methylthioxanthene, 2-isopropylthioxanthene, 2-ethylanthraquinone, octamethylanthraquinone, 1,2-benzanthraquinone, 2,3 -Diphenylanthraquinone, azobis (isoptilo) nitrile, benzoyl peroxide, Menperoxide, 2-mercaptobenzimidazole, 2-mercaptobenzoxazole, 2-mercaptobenzothiazole, 2- (o-chlorophenyl) -4,5-di (m-methoxyphenyl) -imidazolyl dimer, benzophenone, 2- Chlorobenzophenone, p, p'-bis (dimethylamino) benzophenone, 4,4'-bis (diethylamino) benzophenone, 4,4'-dichlorobenzophenone, 3.3-dimethyl-4-methoxybenzophenone, benzyl, benzoin, benzoin Methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzoin butyl ether, acetophenone, 2,2-diethoxyacetophenone, p-dimethylacetophenone, p-dimethylaminopropiophenone, dichloroacetophenone, trichloroacetophene Non, p-tert-butylacetophenone, p-dimethylaminoacetophenone, p-tert-butyltrichloroacetophenone, p-tert-butyldichloroacetophenone, α, α-dichloro-4-phenoxyacetophenone, thioxanthone, 2-methylthioxanthone, 2 -Inoprovir thioxanthone, dibenzosuberone, pentyl-4-dimethylaminobenzoate, 9-phenylacridine, 1,7-bis- (9-acridinyl) heptane, 1,5-bis- (9-acridinyl) pentane, 1,3-bis (9-acridinyl) propane, p-methoxytriazine, 2,4,6-tris (trichloromethyl) -s-triazine, 2-methyl-4,6-bis (trichloromethyl) -s-triazine 2- [2- (5-methylfuran-2-yl) ethenyl] -4,6-bis (trichloromethyl) -s-triazine, 2- [2- (furan-2-yl) ethenyl] -4, 6-bis (trichloromethyl) -s-triazine, 2- [2- (4- Diethylamino-2-methylphenyl) ethenyl] -4,6-bis (trichloromethyl) -s-triazine, 2- [2- (3,4-dimethoxyphenyl) ethenyl] -4,6-bis (trichloromethyl)- s-triazine, 2- (4-methoxyphenyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4-ethoxystyryl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4-n-butoxyphenyl) -4,6-bis (trichloromethyl) -s-triazine, 2,4-bis (trichloromethyl) -6- (3-bromo-4-methoxy) phenyl-s- Triazine, 2,4-bis (trichloromethyl) -6- (2-bromo-4-methoxy) phenyl-s-triazine, 2,4-bis (trichloromethyl) -6- (3-bromo-4-methoxy) And styrylphenyl-s-triazine and 2,4-bis (trichloromethyl) -6- (2-bromo-4-methoxy) styrylphenyl-s-triazine.

Examples of the pigment include
CIPigment Yellow 11,24,31,53,83,99,108,109,139,150,151,154,167,180,185,193;
CIPigment Orange 36,38,43;
CIPigment Red 105,122,149,150,155,171,175,176,177,209,224,254,264;
CIPigment Violet 19,23,32,39;
CIPigment Blue 1,2,15: 1,15: 2,15: 3,16,22,60,66;
CIPigment Green 7,36,37;
CIPigment Brown 25,28;
CIPigment Black 1,7;
And carbon black.

  Many proposals have been made on such photosensitive resin compositions for forming color filters or black matrix patterns. For example, JP 2004-69754 A, JP 11-231523 A, The photosensitive materials described in JP-A-84125, JP-A-10-221843, JP-A-9-269410, JP-A-10-90516 and the like are preferably used.

  The cleaning agent is, for example, the photosensitive resin applied to at least one of a nozzle, a priming roller (rotating roller), or a nozzle cleaning device of a coating device that applies a photosensitive resin composition to a semiconductor substrate or the like. It can be used to remove the composition.

  In addition, since the azeotropic point of the cleaning agent varies by adjusting the composition of the cleaning agent, the dryness is adjusted by mixing in consideration of the high boiling point or low boiling point compound when selecting the aromatic compound or solvent. You can also.

  Examples of the present invention will be described below, but the scope of the present invention is not limited to these examples. In the following examples, an aromatic hydrocarbon solvesso 100 was used. The components of Solvesso 100 are shown in Table 1.

Table 1 shows the area area ratio (%) of each component obtained by analyzing Solvesso 100 by gas chromatography measurement.

[Example 1]
A cleaning solution was prepared at a weight ratio of Solvesso 100: PGMEA: PGME = 20: 60: 20.
The following cleaning test was performed using this cleaning agent. First, 1 ml of CFPR BK-5005SL (Tokyo Ohka Photoresist) was passed through a polyethylene tube, and this resist was adhered in the tube. The same PE tube was passed using 1 ml of the cleaning solution prepared in Example 1. This operation was repeated until the transparency of the PE tube was recovered. When the transparency of the PE tube was recovered at 1 ml × 8 times = 8 ml, this was regarded as the end point of washing.

[Example 2]
First, toluene was added to Solvesso 100 to prepare an alkylbenzene solution in which the total proportion of propylbenzene, ethylmethylbenzene and trimethylbenzene was reduced to 30%. And the cleaning agent was prepared by the weight ratio of the said solution of alkylbenzene: PGMEA: PGME = 20: 60: 20.
When the washing test was carried out in the same manner as in Example 1, this washing agent required 1 ml × 9 times = 9 ml at the end of washing.

[Example 3]
A cleaning agent was prepared at a weight ratio of propylbenzene: PGMEA: PGME = 20: 60: 20.
When the washing test was carried out in the same manner as in Example 1, the washing agent required 1 ml × 8 times = 8 ml at the end of washing.

[Example 4]
A cleaning agent was prepared in a weight ratio of Solvesso 100: butyl acetate: methyl amyl ketone = 20: 60: 20.
When the washing test was carried out in the same manner as in Example 1, this washing agent required 1 ml × 10 times = 10 ml at the end of washing.

[Example 5]
A detergent was prepared at a weight ratio of Solvesso 100: PGMEA: PGME = 50: 37.4: 12.5.
When the washing test was conducted in the same manner as in Example 1, the washing agent required 1 ml × 20 times = 20 ml at the end of washing.

[Example 6]
A cleaning agent was prepared at a weight ratio of toluene: PGMEA: PGME = 20: 60: 20.
When the washing test was carried out in the same manner as in Example 1, the washing agent required 1 ml × 20 times = 20 ml at the end of washing.

[Comparative Example 1]
A cleaning agent was prepared at a weight ratio of Solvesso 100: PGMEA: PGME = 0 (in this Comparative Example 1, Solvesso 100 was not added): 75: 25.
When the washing test was conducted in the same manner as in Example 1, 1 ml × 30 times = 30 ml of this detergent was required at the end of washing.

The results of Examples 1 to 6 and Comparative Example 1 are shown in Table 2.

  As is clear from the above results, the cleaning agents of Examples 1 to 6 were able to exhibit the cleaning effect in an amount smaller than that of any of Comparative Example 1. Moreover, since Solvesso 100 is boiling point 152-171 degreeC, it is excellent in quick-drying property.

[Usage]
Below, the usage method with the apparatus (for example, patent document 5, patent document 6) which apply | coats and wash | cleans the photosensitive resin composition to substrate materials, such as a semiconductor, is shown as an example of the usage method of the cleaning agent concerning this invention. .

  FIG. 1 is an example of an apparatus for applying and cleaning a photosensitive resin composition to a substrate material such as a semiconductor. The apparatus shown in FIG. 1 includes a slit nozzle 1, a priming roller (rotating roller) 2, a cleaning tank 3, a slit nozzle cleaning apparatus 5, a cleaning agent supply tank 7, a coating liquid supply tank 9, and pipes 4, 6, 8, and 10. Is done.

  The cleaning agent supply tank 7 is filled with the cleaning agent according to the present invention, and is supplied to the slit nozzle 1 through the pipe 8. The coating liquid supply tank 9 is filled with a coating liquid (for example, a pigment-dispersed photosensitive resin composition for forming a color filter or a black matrix pattern), and is supplied to the slit nozzle 1 through the pipe 10.

  The slit nozzle 1 has an elongated shape, and moves in the lateral direction within, for example, a horizontal plane. A plurality of holes for ejecting the coating solution supplied from the coating solution supply tank 9 and the cleaning agent supplied from the cleaning agent supply tank 7 are provided on the lower surface of the slit nozzle. Below the slit nozzle 1, for example, a semiconductor substrate or a liquid crystal panel substrate (hereinafter referred to as a substrate 11) is installed. The slit nozzle 1 ejects a coating liquid onto one surface of the substrate 11 while moving. .

  A cylindrical priming roller 2 is installed in the cleaning tank 3. The cleaning tank 3 is supplied with the cleaning agent according to the present invention from the pipe 4. By adjusting the supply amount, the cleaning tank 3 is always filled with a predetermined amount of cleaning agent. The priming roller 2 is for adjusting the ejection condition of the coating liquid ejected from the slit nozzle 1 immediately before coating. That is, the slit nozzle 1 approaches from the upper direction of the priming roller 2, and excess coating liquid can be drawn out from the slit nozzle 1 and attached to the surface of the priming roller 2 to be removed.

Moreover, the priming roller 2 can clean the coating liquid applied to the surface of the priming roller 2 by contacting the cleaning agent in the cleaning tank 3 while rotating.
The slit nozzle cleaning device 5 cleans the coating liquid adhering to the slit nozzle 1 after application, or prevents the coating liquid adhering to the slit nozzle 1 from drying and adhering when the application is stopped. It is for keeping you waiting. The slit nozzle cleaning device (for example, Patent Document 6) is provided with a slit nozzle standby portion (not shown in detail) that supports the slit nozzle in order to keep the slit nozzle 1 on standby. A nozzle dip cleaning section (not shown in detail) is provided in the center of the slit nozzle standby section for cleaning the tip end of the slit nozzle and preventing drying. The slit nozzle cleaning device 5 is supplied with a cleaning agent according to the present invention from a pipe 6.

  Conventionally, the types of cleaning agents supplied to the slit nozzle 1, the cleaning tank 3, and the slit nozzle cleaning device 5 are different depending on the takt time of each device (for example, drying property, cohesiveness, cleaning property, etc.). It was. For example, with respect to the slit nozzle 1 and the cleaning tank 3, there has been a demand for a cleaning agent that has high quick-drying properties, does not aggregate, and has high cleaning ability. In addition, for example, the slit nozzle cleaning device 5 is required to have a quick drying property and a non-aggregating cleaning agent. In particular, the slit nozzle cleaning device 5 is not aggregated and has a high surface so as not to penetrate into the coating liquid in the slit nozzle and cause aggregation. Tension was sought.

  The cleaning agent according to the present invention has a high quick-drying property, does not agglomerate, has a high cleaning power, and a high surface tension, and can meet all the conventional demands. Therefore, only one type of cleaning agent according to the present invention can be applied to all of the slit nozzle 1, the cleaning tank 3, and the slit nozzle cleaning device 5.

  In addition, a predetermined amount of a silicon-based surfactant (for example, Additol XL 121 (manufactured by Solusia)) is added to the cleaning agent according to the present invention (for example, Additol XL 121 is added to each cleaning agent prepared in Examples 1 to 6). Even if a pigment-dispersed photosensitive resin composition that forms a color filter (particularly G (green)) is used in the coating solution, the cleaning agent according to the present invention can be applied.

It is a figure which shows an example of the apparatus which apply | coats and wash | cleans the photosensitive resin composition to board | substrate materials, such as a semiconductor.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Slit nozzle 2 Priming roller 3 Cleaning tank 5 Slit nozzle cleaning apparatus 7 Cleaning agent supply tank 9 Coating liquid supply tank 4, 6, 8, 10 Piping 11 Board | substrate

Claims (9)

  A cleaning agent for removing a pigment-dispersed photosensitive resin composition, comprising an aromatic compound containing an alkylbenzene.   The cleaning agent according to claim 1, wherein the alkylbenzene contains at least propylbenzene, ethylmethylbenzene, and trimethylbenzene.   The cleaning agent according to claim 2, wherein the proportion of the propylbenzene contained in the alkylbenzene is indicated by an area of 30% or more in gas chromatography measurement.   The cleaning agent according to claim 3, wherein the ratio of the trimethylbenzene contained in the alkylbenzene is indicated by an area of 40% or less in gas chromatography measurement.   The said cleaning agent contains the said alkylbenzene in the range of 10-30 mass%, The cleaning agent of any one of Claims 1-4 characterized by the above-mentioned.   The aromatic compound is further mixed with at least one selected from dimethylbenzene, indane, cumene, ethylmethylbenzene, (1-methyl) propylbenzene, (2-methyl) propylbenzene, diethylbenzene, and ethyldimethylbenzene. The cleaning agent according to claim 2, wherein   The cleaning agent according to claim 1, wherein the photosensitive resin composition is a negative type.   The cleaning agent according to any one of claims 1 to 6, wherein the cleaning agent further contains a silicon-based surfactant. The cleaning agent removes the photosensitive resin composition adhering to at least one of a slit nozzle, a priming roller, or a slit nozzle cleaning device of a coating apparatus that applies the photosensitive resin composition. The cleaning agent according to any one of claims 1 to 8.

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