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JP2006329494A - High frequency heating device - Google Patents

High frequency heating device Download PDF

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Publication number
JP2006329494A
JP2006329494A JP2005152107A JP2005152107A JP2006329494A JP 2006329494 A JP2006329494 A JP 2006329494A JP 2005152107 A JP2005152107 A JP 2005152107A JP 2005152107 A JP2005152107 A JP 2005152107A JP 2006329494 A JP2006329494 A JP 2006329494A
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Prior art keywords
evaporating dish
heating
heating chamber
cleaning
steam
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JP2005152107A
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Japanese (ja)
Inventor
Takahiko Yamazaki
孝彦 山崎
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Panasonic Holdings Corp
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Matsushita Electric Industrial Co Ltd
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Priority to JP2005152107A priority Critical patent/JP2006329494A/en
Priority to PCT/JP2006/309708 priority patent/WO2006126421A1/en
Publication of JP2006329494A publication Critical patent/JP2006329494A/en
Pending legal-status Critical Current

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    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24HEATING; RANGES; VENTILATING
    • F24CDOMESTIC STOVES OR RANGES ; DETAILS OF DOMESTIC STOVES OR RANGES, OF GENERAL APPLICATION
    • F24C14/00Stoves or ranges having self-cleaning provisions, e.g. continuous catalytic cleaning or electrostatic cleaning
    • F24C14/005Stoves or ranges having self-cleaning provisions, e.g. continuous catalytic cleaning or electrostatic cleaning using a cleaning liquid
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B6/00Heating by electric, magnetic or electromagnetic fields
    • H05B6/64Heating using microwaves
    • H05B6/6402Aspects relating to the microwave cavity
    • H05B6/6405Self-cleaning cavity
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B6/00Heating by electric, magnetic or electromagnetic fields
    • H05B6/64Heating using microwaves
    • H05B6/647Aspects related to microwave heating combined with other heating techniques
    • H05B6/6473Aspects related to microwave heating combined with other heating techniques combined with convection heating
    • H05B6/6479Aspects related to microwave heating combined with other heating techniques combined with convection heating using steam

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Combustion & Propulsion (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Electric Ovens (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To use steam used for heating an object to be heated for cleaning the interior of a heating chamber, and to easily carry out cleaning work. <P>SOLUTION: Cleaning is carried out at an evaporating dish cleaning mode and a heating chamber cleaning mode in response to a signal inputted by a control part. By carrying out the specified cleaning mode, the contamined interior of the heating chamber 11 can be cleaned extremely easily without carrying out complicated work by maintaining a temperature of an evaporating dish 35 high, and since the temperature of the evaporating dish 35 can be lowered by supplying water by a pump 55 at the completion of cleaning, the cleaning work can be safely carried out. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、被加熱物を収容する加熱室内に高周波を出力する高周波発生手段と、加熱室内に蒸気を供給する蒸気供給部とを備え、高周波と蒸気との少なくともいずれかを加熱室に供給して被加熱物を加熱処理する蒸気発生機能付き高周波加熱装置に関する。   The present invention includes high-frequency generating means for outputting a high frequency in a heating chamber that houses an object to be heated, and a steam supply unit that supplies steam to the heating chamber, and supplies at least one of the high frequency and the steam to the heating chamber. The present invention relates to a high-frequency heating apparatus with a steam generation function that heats an object to be heated.

高周波により被加熱物を加熱処理する高周波加熱装置には、高周波加熱のみの単機能型やオーブン機能の付加された複合機能型等があるが、これらの高周波加熱装置においては、被加熱物を収容して加熱処理する加熱室に、被加熱物の汁やカス等が加熱処理時に付着することがあり、これをそのまま放置していると、こびり付きや焦げが発生して加熱室内が汚れることになる。このような付着した汚れは、加熱室内を衛生的に維持する上で問題となるばかりか、高周波加熱時に発煙等が発生する要因ともなる。このため、加熱室内をこまめに清掃したり、加熱装置自身に設けられた高温焼き切り機能により、加熱室内の汚れを除去するようにしていたが、近年では、更に、加熱室内に加熱蒸気を供給する蒸気供給機構を追加して、蒸気による加熱室内の清掃ができる機能が付いた蒸気発生機能付き高周波加熱装置が提案されている(例えば、特許文献1参照)。
特開2004−69175号公報
High-frequency heating devices that heat the object to be heated with high frequency include a single-function type that only has high-frequency heating and a composite function type that has an oven function added. These high-frequency heating devices contain the object to be heated. In the heating chamber, the juice or debris of the object to be heated may adhere to the heating chamber, and if left untreated, sticking or scorching will occur and the heating chamber will become dirty. . Such attached dirt not only causes a problem in maintaining the heating chamber in a sanitary manner, but also causes smoke and the like during high-frequency heating. For this reason, the heating chamber is frequently cleaned or the dirt in the heating chamber is removed by a high-temperature burn-out function provided in the heating device itself. However, in recent years, heating steam is further supplied into the heating chamber. There has been proposed a high-frequency heating device with a steam generation function that has a function of adding a steam supply mechanism and capable of cleaning the heating chamber with steam (see, for example, Patent Document 1).
JP 2004-69175 A

しかしながら、前記従来の蒸気発生機能付き高周波加熱装置での加熱室内の清掃機能は、蒸気を発生させる蒸発皿部にの残ったお湯の温度をお手入れする際に手で触れても火傷しないようにする為に、蒸気を発生させるのは最初だけで後は通電をやめ、冷めるまでに時間がかかっていた、また、放置することでせっかく加熱室内に結露していた蒸気が乾燥してしまい蒸気による効果が得られないということもあり、清掃時における使い勝手は良いものではなかった。   However, the cleaning function in the heating chamber of the conventional high-frequency heating apparatus with a steam generating function prevents burns even if it is touched by hand when cleaning the temperature of hot water remaining in the evaporating dish that generates steam. Therefore, steam was generated only at the beginning, and after that, it took time to cool down and cool down. Since the effect was not obtained, the usability at the time of cleaning was not good.

また、蒸発皿の清掃時に使用される洗浄液(クエン酸等)は温度の高い方が洗浄効果が増すがこれもまた蒸気を発生させるのは最初だけで後は通電をやめているので、温度が低くなり洗浄液の効果があまり得られていなかった。   The cleaning solution (citric acid, etc.) used for cleaning the evaporating dish has a higher cleaning effect when the temperature is higher, but this is also the first time that steam is generated and the power is turned off later, so the temperature is low. The effect of the cleaning liquid was not obtained so much.

本発明は、前記従来の課題を解決するもので、被加熱物の加熱用に用いる蒸気を加熱室内の清掃用に用いると共に、この清掃作業を簡単に効率良く行うことのできる高周波加熱装置を提供することを目的としている。   The present invention solves the above-described conventional problems, and provides a high-frequency heating device that can use steam used for heating an object to be heated for cleaning the heating chamber and can perform this cleaning operation easily and efficiently. The purpose is to do.

前記従来の課題を解決するために、本発明に係る高周波加熱装置は、被加熱物を収容する加熱室内に高周波を出力する高周波発生手段と、前記加熱室内に加熱蒸気を供給する蒸気供給部とを備え、高周波と加熱蒸気との少なくともいずれかを前記加熱室に供給して前記被加熱物を加熱処理する蒸気発生機能付き高周波加熱装置であって、前記蒸気供給部は、装置本体に着脱可能に装備される貯水タンクと、前記加熱室内に装備される蒸発皿と、この蒸発皿を加熱して前記蒸発皿上の水を蒸発させる蒸発皿加熱手段とを備え、前記蒸気供給部により前記加熱室内に蒸気を自動供給して加熱室内の汚れを清掃する加熱室清掃モード、及び前記蒸発皿に洗浄液を注入し前記蒸発皿加熱手段により加熱することで前記蒸発皿の汚れを清掃する蒸発皿清掃モードを備えた制御部と、前記制御部に対して前記いずれかの清掃モードを実行させるための信号入力手段とを具備したことを特徴とする。   In order to solve the above-described conventional problems, a high-frequency heating device according to the present invention includes a high-frequency generating unit that outputs a high frequency into a heating chamber that houses an object to be heated, and a steam supply unit that supplies heating steam into the heating chamber. A high-frequency heating apparatus with a steam generation function for supplying heat to the heating chamber by supplying at least one of high-frequency and heating steam to the heating chamber, wherein the steam supply unit is detachable from the apparatus main body A water storage tank equipped in the heating chamber, an evaporating dish equipped in the heating chamber, and evaporating dish heating means for heating the evaporating dish and evaporating water on the evaporating dish, and the heating by the steam supply unit A heating chamber cleaning mode in which steam is automatically supplied into the heating chamber to clean dirt in the heating chamber, and an evaporating dish cleaner that injects cleaning liquid into the evaporating dish and heats it by the evaporating dish heating means to clean the evaporating dish. A controller having a mode, characterized by comprising a signal input means for executing the cleaning mode of the one with respect to the control unit.

この高周波加熱装置によれば、加熱室清掃モードを実行させる信号が入力されると、制御部が加熱室内に蒸気を自動供給して加熱室内の汚れを清掃するため、煩雑な作業を行うことなく、汚れが付着した加熱室内を極めて容易に清掃でき、清潔な状態にすることができる。   According to this high-frequency heating device, when a signal for executing the heating chamber cleaning mode is input, the control unit automatically supplies steam into the heating chamber to clean dirt in the heating chamber, so that no complicated work is performed. It is possible to clean the inside of the heating chamber with dirt very easily and to keep it clean.

本発明の高周波加熱装置によれば、信号入力手段を介して制御部に入力される信号に基づいて、指定された清掃モードを実行することにより、煩雑な作業を行うことなく、汚れが付着した加熱室内を蒸発皿の温度を高く維持することにより極めて容易に清掃することができ、終了時にはポンプにより水を供給することで水受皿の温度を下げることができるので安全に清掃作業を行うことができる。   According to the high-frequency heating device of the present invention, dirt is attached without performing complicated work by executing the designated cleaning mode based on a signal input to the control unit via the signal input means. The heating chamber can be cleaned very easily by keeping the temperature of the evaporating dish high. At the end of the heating chamber, the temperature of the water receiving dish can be lowered by supplying water with a pump. it can.

第1の発明は、被加熱物を収容する加熱室内に高周波を出力する高周波発生手段と、前記加熱室内に加熱蒸気を供給する蒸気供給部とを備え、高周波と加熱蒸気との少なくともいずれかを前記加熱室に供給して前記被加熱物を加熱処理する蒸気発生機能付き高周波加熱装置であって、前記蒸気供給部は、装置本体に着脱可能に装備される貯水タンクと、前記加熱室内に装備される蒸発皿と、この蒸発皿を加熱して前記蒸発皿上の水を蒸発させる蒸発皿加熱手段とを備え、前記蒸気供給部により前記加熱室内に蒸気を自動供給して加熱室内の汚れを清掃する加熱室清掃モード、及び前記蒸発皿に洗浄液を注入し前記蒸発皿加熱手段により加熱することで前記蒸発皿の汚れを清掃する蒸発皿清掃モードを備えた制御部と、前記制御部に対して前記いずれかの清掃モードを実行させるための信号入力手段とを具備したことを特徴とする。   1st invention is equipped with the high frequency generation means which outputs a high frequency in the heating chamber which accommodates to-be-heated material, and the vapor | steam supply part which supplies heating vapor | steam in the said heating chamber, At least any one of a high frequency and heating vapor | steam A high-frequency heating apparatus with a steam generation function for supplying heat to the heating chamber and heat-treating the object to be heated, wherein the steam supply section is equipped with a water storage tank that is detachably mounted on the apparatus main body, and the heating chamber. And an evaporating dish heating means for evaporating water on the evaporating dish by heating the evaporating dish, and automatically supplying steam into the heating chamber by the steam supply unit to remove dirt in the heating chamber. A control unit having a heating chamber cleaning mode for cleaning, and an evaporating dish cleaning mode for cleaning dirt from the evaporating dish by injecting a cleaning liquid into the evaporating dish and heating the evaporating dish by heating means; Said Characterized by comprising a signal input means for executing the cleaning mode of Zureka.

この高周波加熱装置によれば、加熱室清掃モードを実行させる信号が入力されると、制御部が加熱室内に蒸気を自動供給して加熱室内の汚れを清掃するため、煩雑な作業を行うことなく、汚れが付着した加熱室内を極めて容易に清掃でき、清潔な状態にすることができる。   According to this high-frequency heating device, when a signal for executing the heating chamber cleaning mode is input, the control unit automatically supplies steam into the heating chamber to clean dirt in the heating chamber, so that no complicated work is performed. It is possible to clean the inside of the heating chamber with dirt very easily and to keep it clean.

第2の発明は、前記加熱室清掃モードが、前記蒸気供給部の蒸発皿に供給された水を蒸発皿加熱手段により加熱し、前記加熱室内に蒸気を充満させて前記加熱室を画成する面に結露させることで清掃を行い、加熱室清掃モードが終了する前に前期貯水タンクから強制的に水を前記蒸発皿に供給し前記蒸発皿内の水を冷却することを特徴とする。   In the second aspect of the invention, the heating chamber cleaning mode defines the heating chamber by heating the water supplied to the evaporating dish of the steam supply unit by evaporating dish heating means and filling the heating chamber with steam. Cleaning is performed by causing condensation on the surface, and before the heating chamber cleaning mode ends, water is forcibly supplied from the water storage tank in the previous period to cool the water in the evaporating dish.

この高周波加熱装置によれば、加熱室清掃モードを実行させる信号が入力されると、加熱室の内面は常に蒸気によって結露させて、加熱室の内面に付着した汚れを浮き上がらせることができ、加熱室清掃モード終了時には、蒸発皿の水の温度も手で触れても大丈夫な温度に冷やされて極めて容易に加熱室の内面を清掃して清潔な状態にすることができる。   According to this high-frequency heating device, when a signal for executing the heating chamber cleaning mode is input, the inner surface of the heating chamber is always condensed by steam, and dirt attached to the inner surface of the heating chamber can be lifted, At the end of the room cleaning mode, the temperature of the water in the evaporating dish can be cooled to a temperature that can be touched by hand, and the inner surface of the heating chamber can be cleaned very easily to a clean state.

第3の発明は、前記蒸発皿清掃モードが、前記蒸気供給部の蒸発皿に供給された水と洗浄液とを蒸発皿加熱手段により所定温度に加熱した後、沸騰しない温度で加熱を維持し、蒸発皿清掃モードが終了する前に前期貯水タンクから強制的に水を前記蒸発皿に供給し前記蒸発皿内の水を冷却することを特徴とする。   In the third invention, the evaporating dish cleaning mode maintains the heating at a temperature that does not boil after heating the water and the cleaning liquid supplied to the evaporating dish of the steam supply unit to a predetermined temperature by the evaporating dish heating means, Before the evaporating dish cleaning mode ends, water is forcibly supplied from the water storage tank in the previous period to the evaporating dish to cool the water in the evaporating dish.

この高周波加熱装置によれば、蒸発皿清掃モードを実行させる信号が入力されると、蒸発皿に水と洗浄液が所定温度を維持して加熱することにより、蒸発皿に付着したカルシウムやマグネシウム等を確実かつ容易に除去することができる。また、蒸発皿清掃モード終了時には、蒸発皿の水の温度も手で触れても大丈夫な温度に冷やされているので極めて容易に水受皿の内面を清掃して清潔な状態にすることができる。   According to this high-frequency heating device, when a signal for executing the evaporating dish cleaning mode is input, water and cleaning liquid are heated and maintained at a predetermined temperature in the evaporating dish, so that calcium, magnesium, etc. adhering to the evaporating dish are removed. It can be removed reliably and easily. Further, at the end of the evaporating dish cleaning mode, the temperature of the water in the evaporating dish is cooled to a temperature that can be touched by hand, so that the inner surface of the water receiving dish can be cleaned very easily to a clean state.

第4の発明は、前記洗浄液として、クエン酸溶液を用いることを特徴とする。   A fourth invention is characterized in that a citric acid solution is used as the cleaning liquid.

この高周波加熱装置によれば、クエン酸を溶解したクエン酸溶液を洗浄液として用い、このクエン酸溶液を蒸発皿に入れた状態で所定温度を維持して加熱することにより、蒸発皿表面の付着物を食品衛生上安全に除去することができる。   According to this high-frequency heating device, a citric acid solution in which citric acid is dissolved is used as a cleaning solution, and the citric acid solution is heated in a state where the citric acid solution is placed in the evaporating dish while maintaining a predetermined temperature. Can be safely removed for food hygiene.

以下、本発明の実施の形態について、図面を参照しながら説明する。なお、この実施の形態によって本発明が限定されるものではない。   Hereinafter, embodiments of the present invention will be described with reference to the drawings. Note that the present invention is not limited to the embodiments.

(実施の形態1)
図1は本発明に係る高周波加熱装置の開閉扉を開けた状態を示す正面図、図2はこの装置に用いられる蒸気発生部の蒸発皿を示す斜視図、図3は蒸気発生部の蒸発皿加熱ヒータと反射板を示す斜視図、図4は蒸気発生部の断面図である。
(Embodiment 1)
FIG. 1 is a front view showing a state in which an opening / closing door of a high-frequency heating device according to the present invention is opened, FIG. 2 is a perspective view showing an evaporating dish of a steam generating unit used in this apparatus, and FIG. FIG. 4 is a cross-sectional view of the steam generating unit.

まず最初に、本発明に係る高周波加熱装置100の基本構成について説明する。   First, the basic configuration of the high-frequency heating device 100 according to the present invention will be described.

この蒸気発生機能付きの高周波加熱装置100は、被加熱物を収容する加熱室11に、高周波(マイクロ波)と蒸気との少なくともいずれかを供給して被加熱物を加熱処理する加熱調理器であって、高周波を発生する高周波発生部としてのマグネトロン13と、加熱室11内で蒸気を発生する蒸気供給部15と、加熱室11内の空気を撹拌・循環させる循環ファン17と、加熱室11内を循環する空気を加熱する室内気加熱ヒータとしてのコンベクションヒータ19と、加熱室11の壁面に設けた検出用孔を通じて加熱室11内の温度を検出する赤外線センサ20と、蒸発皿15へ水を供給するための水タンク43とを備えている。   The high-frequency heating device 100 with a steam generation function is a heating cooker that supplies a high-frequency (microwave) and steam to the heating chamber 11 that houses the object to be heated to heat the object to be heated. There are a magnetron 13 as a high-frequency generator for generating a high frequency, a steam supply unit 15 for generating steam in the heating chamber 11, a circulation fan 17 for stirring and circulating the air in the heating chamber 11, and the heating chamber 11. A convection heater 19 as a room air heater for heating the air circulating inside, an infrared sensor 20 for detecting the temperature in the heating chamber 11 through a detection hole provided in the wall surface of the heating chamber 11, and water to the evaporating dish 15 And a water tank 43 for supplying water.

加熱室11は、前面開放の箱形の高周波加熱装置本体10内部に形成されており、高周波加熱装置本体10の前面に、加熱室11の被加熱物取出口を開閉する透光窓21a付きの開閉扉21が設けられている。開閉扉21は、下端が高周波加熱装置本体10の下縁にヒンジ結合されることで開閉可能となっている。加熱室11と高周波加熱装置本体10との壁面間には所定の断熱空間が確保されており、必要に応じてその空間には断熱材が装填されている。加熱室11の背後の空間は、循環ファン17及びその駆動モータ23(図9参照)を収容した循環ファン室25となっており、加熱室11の後面の壁が、加熱室11と循環ファン室25とを画成する仕切板27となっている。仕切板27には、加熱室11側から循環ファン室25側への吸気を行う吸気用通風孔29と、循環ファン室25側から加熱室11側への送風を行う送風用通風孔31とが形成エリアを区別して設けられている。各通風孔29,31は、多数のパンチ孔として形成されている。   The heating chamber 11 is formed inside a box-shaped high-frequency heating device body 10 that is open on the front surface, and has a translucent window 21 a that opens and closes a heated object outlet of the heating chamber 11 on the front surface of the high-frequency heating device body 10. An opening / closing door 21 is provided. The open / close door 21 can be opened and closed by a lower end hinged to the lower edge of the high-frequency heating apparatus body 10. A predetermined heat insulation space is secured between the wall surfaces of the heating chamber 11 and the high-frequency heating device main body 10, and a heat insulating material is loaded in the space as necessary. The space behind the heating chamber 11 is a circulation fan chamber 25 that houses the circulation fan 17 and its drive motor 23 (see FIG. 9), and the rear wall of the heating chamber 11 is the heating chamber 11 and the circulation fan chamber. 25 is a partition plate 27 that defines 25. The partition plate 27 has an intake vent hole 29 for sucking air from the heating chamber 11 side to the circulation fan chamber 25 side, and an air vent hole 31 for blowing air from the circulation fan chamber 25 side to the heating chamber 11 side. Different formation areas are provided. Each ventilation hole 29 and 31 is formed as many punch holes.

循環ファン17は、矩形の仕切板27の中央部を回転中心として配置されており、循環ファン室25内には、この循環ファン17を取り囲むようにして矩形環状のコンベクションヒータ19が設けられている。そして、仕切板27に形成された吸気用通風孔29は循環ファン17の前面に配置され、送風用通風孔31は矩形環状のコンベクションヒータ19に沿って配置されている。循環ファン17を回すと、風は循環ファン17の前面側から駆動モータ23のある後面側に流れるように設定されているので、加熱室11内の空気が、吸気用通風孔29を通して循環ファン17の中心部に吸い込まれ、循環ファン室25内のコンベクションヒータ19を通過して、送風用通風孔31から加熱室11内に送り出される。従って、この流れにより、加熱室11内の空気が、撹拌されつつ循環ファン室25を経由して循環されるようになっている。   The circulation fan 17 is arranged with the central portion of the rectangular partition plate 27 as the center of rotation, and a rectangular annular convection heater 19 is provided in the circulation fan chamber 25 so as to surround the circulation fan 17. . The intake vent holes 29 formed in the partition plate 27 are disposed in front of the circulation fan 17, and the blower vent holes 31 are disposed along the rectangular annular convection heater 19. When the circulation fan 17 is turned, the wind is set so as to flow from the front side of the circulation fan 17 to the rear side of the drive motor 23, so that the air in the heating chamber 11 passes through the intake vent hole 29. Is passed through the convection heater 19 in the circulation fan chamber 25 and sent out from the ventilation holes 31 into the heating chamber 11. Therefore, by this flow, the air in the heating chamber 11 is circulated through the circulation fan chamber 25 while being stirred.

マグネトロン13は、例えば加熱室11の下側の空間に配置されており、マグネトロン13より発生した高周波を受ける位置にはスタラー羽根33が設けられている。そして、スタラー羽根33を回転駆動することにより、スタラー羽根33に照射されたマグネトロン13からの高周波を加熱室11内に撹拌しながら供給するようになっている。なお、マグネトロン13やスタラー羽根33は、加熱室11の底部に限らず、加熱室11の上面や側面側に設けることもできる。また、高周波加熱方式としては、ターンテーブル式であってもよい。   The magnetron 13 is disposed, for example, in a space below the heating chamber 11, and a stirrer blade 33 is provided at a position for receiving a high frequency generated from the magnetron 13. By rotating the stirrer blade 33, the high frequency from the magnetron 13 irradiated to the stirrer blade 33 is supplied into the heating chamber 11 with stirring. Note that the magnetron 13 and the stirrer blade 33 are not limited to the bottom of the heating chamber 11, but can be provided on the upper surface or the side of the heating chamber 11. Further, the high frequency heating method may be a turntable method.

蒸気供給部15は、図2に示すように加熱により蒸気を発生する水溜凹所35aを有した蒸発皿35と、蒸発皿35の下側に配設され、図3及び図4に示すように蒸発皿35を加熱する蒸発皿加熱ヒータ37と、該ヒータの輻射熱を蒸発皿35に向けて反射する断面略U字形の反射板39とから構成されている。蒸発皿35は、例えばステンレス製の細長板状のもので、加熱室11の被加熱物取出口とは反対側の奥側底面に長手方向を仕切板27に沿わせた向きで配設され、赤外線センサ20の温度検出走査による検出範囲の実質的外部に設けている。なお、蒸発皿加熱ヒータ37としては、ガラス管ヒータ、シーズヒータ、プレートヒータ等が利用できる。   The steam supply unit 15 is disposed on the lower side of the evaporating dish 35 having a water reservoir recess 35a for generating steam by heating, as shown in FIG. 2, and as shown in FIGS. It comprises an evaporating dish heater 37 that heats the evaporating dish 35 and a reflecting plate 39 having a substantially U-shaped cross section that reflects the radiant heat of the heater toward the evaporating dish 35. The evaporating dish 35 is, for example, an elongated plate made of stainless steel, and is disposed on the back bottom surface of the heating chamber 11 opposite to the heated object outlet, with the longitudinal direction along the partition plate 27, The infrared sensor 20 is provided substantially outside the detection range by temperature detection scanning. As the evaporating dish heater 37, a glass tube heater, a sheathed heater, a plate heater, or the like can be used.

ここで、図5に高周波加熱装置の側面に水タンクを収容する様子を表す説明図、図6に高周波加熱装置の側面図を示した。図5に示すように、高周波加熱装置本体10の側壁10aには水タンク用蓋41が開閉自在に設けられており、側壁10aの内部空間10bには、蒸気発生部15に水を供給するための水タンク43が脱着自在に収納されている。図6を併せて参照すると、水タンク43は薄型の矩形状で上部が開口した本体45と、本体45の開口に脱着自在に取り付けられる蓋47とを有している。蓋47には取水管取付け部49が設けられ、取水管取付け部49の下方には蓋47を貫通して本体45の底面45a付近まで延びる取水管51が設けられている。なお、取水管取付け部49の後方(図5における水タンク挿入方向先方)には、接続管53が突設されている。   Here, FIG. 5 is an explanatory view showing a state in which the water tank is housed on the side surface of the high-frequency heating device, and FIG. 6 shows a side view of the high-frequency heating device. As shown in FIG. 5, a water tank lid 41 is provided on the side wall 10a of the high-frequency heating device body 10 so as to be freely opened and closed. In order to supply water to the steam generator 15 in the internal space 10b of the side wall 10a. The water tank 43 is detachably stored. Referring also to FIG. 6, the water tank 43 includes a thin main body 45 having a rectangular shape and an upper opening, and a lid 47 detachably attached to the opening of the main body 45. The lid 47 is provided with a water intake pipe mounting portion 49, and a water intake pipe 51 that extends through the lid 47 to the vicinity of the bottom surface 45 a of the main body 45 is provided below the water intake pipe mounting portion 49. Note that a connecting pipe 53 protrudes behind the intake pipe mounting portion 49 (in the direction in which the water tank is inserted in FIG. 5).

また、図6に示すように、高周波加熱装置本体10の側壁10aの内部空間10bには、一定量の水を間欠的に吐出するポンプ55が設けられており、このポンプ55に取水側配管55aと供給側配管55bが接続されている。取水側配管55aのポンプ55側とは反対側の先端は、水タンク43が高周波加熱装置本体10内に収納された際に、水タンク43の接続管53の端部が脱着自在に接続されるジョイント部56に繋がっている。一方、供給側配管55bは、配管57を介して蒸気発生部15の蒸発皿35に接続されている。側壁10aの内部空間10bにおける、水タンク43の取水管取付け部49の上方位置には、水タンク43の脱着を検出するための水タンク脱着検出部59が設けられており、水タンク43が収納されているか否かを検出する。   As shown in FIG. 6, a pump 55 that intermittently discharges a constant amount of water is provided in the internal space 10 b of the side wall 10 a of the high-frequency heating device main body 10. And the supply side pipe 55b are connected. The end of the water intake side pipe 55a opposite to the pump 55 side is detachably connected to the end of the connection pipe 53 of the water tank 43 when the water tank 43 is accommodated in the high-frequency heating device main body 10. It is connected to the joint part 56. On the other hand, the supply side pipe 55 b is connected to the evaporating dish 35 of the steam generating unit 15 through the pipe 57. In the internal space 10b of the side wall 10a, a water tank attachment / detachment detection portion 59 for detecting the attachment / detachment of the water tank 43 is provided above the intake pipe attachment portion 49 of the water tank 43, and the water tank 43 is accommodated. It is detected whether it is done.

図7に高周波加熱装置100の開閉扉の一部を示すように、高周波加熱装置100の前面側の開閉扉21下方には、入力操作部61及び表示部63が設けられている。入力操作部61には、加熱調理の開始を指示するスタートスイッチ65、清掃を行う清掃スイッチ81、設定ダイアル82(信号入力手段)等が設けられている。また、表示部63には、報知手段としての表示パネル75等が設けられている。また、図示はしないが、音声や警告音を発する機能があってもよい。   As shown in a part of the opening / closing door of the high-frequency heating device 100 in FIG. 7, an input operation unit 61 and a display unit 63 are provided below the opening / closing door 21 on the front side of the high-frequency heating device 100. The input operation unit 61 is provided with a start switch 65 that instructs the start of cooking, a cleaning switch 81 that performs cleaning, a setting dial 82 (signal input means), and the like. Further, the display unit 63 is provided with a display panel 75 or the like as notification means. Further, although not shown, there may be a function of emitting a sound or a warning sound.

清掃スイッチ81は、このスイッチを押下することにより、各種モードの清掃運転を行うことができるようになっている。また、表示パネル75の両側部には、設定ダイアル82が設けられており、この設定ダイアル82を回すことにより、各種の設定を選択することができるようになっている。   The cleaning switch 81 can perform cleaning operations in various modes by pressing this switch. In addition, setting dials 82 are provided on both sides of the display panel 75, and various settings can be selected by turning the setting dial 82.

ここで、清掃モードとしては、蒸発皿清掃モード、加熱室清掃モード、脱臭モードがあり、清掃スイッチ81を押下した後に、設定ダイアル82を回すことにより、これら各種の清掃モードを任意に選択できるようになっている。そして、この設定ダイアル82によってモードを選択した状態で、スタートスイッチ65を押下することにより、高周波加熱装置100が、選択した清掃モードを実行するようになっている。   Here, as the cleaning mode, there are an evaporating dish cleaning mode, a heating chamber cleaning mode, and a deodorizing mode. After pressing the cleaning switch 81, the setting dial 82 is turned so that these various cleaning modes can be arbitrarily selected. It has become. Then, when the mode is selected by the setting dial 82, when the start switch 65 is pressed, the high frequency heating device 100 executes the selected cleaning mode.

図8は、清掃モードの制御系を示す制御ブロック図である。この制御系では、入力操作部61からの入力信号が入力される制御部83を有しており、この制御部83には、蒸発皿加熱ヒータ37、循環ファン17を回転させる駆動モータ23、蒸発皿へ水を供給するポンプ55をそれぞれ接続して、制御部83によって統括制御するようになっている。また、この制御部83は、蒸発皿35の温度を検知するサーミスタ等の温度センサ84を接続しており、この温度センサ84からの検知信号を入力することで、蒸発皿加熱ヒータ37等のフィードバック制御が行われる。そして、制御部83は入力操作部61からの入力信号及び温度センサ84からの検知信号に基づいて、蒸発皿加熱ヒータ37、駆動モータ23、ポンプ55を所定のシーケンスに基づいて制御する。   FIG. 8 is a control block diagram illustrating a control system in the cleaning mode. The control system includes a control unit 83 to which an input signal from the input operation unit 61 is input. The control unit 83 includes an evaporating dish heater 37, a drive motor 23 that rotates the circulation fan 17, and evaporation. Pumps 55 for supplying water to the dishes are connected to each other, and are controlled by the control unit 83. Further, the control unit 83 is connected to a temperature sensor 84 such as a thermistor for detecting the temperature of the evaporating dish 35, and by inputting a detection signal from the temperature sensor 84, feedback from the evaporating dish heater 37, etc. Control is performed. The control unit 83 controls the evaporating dish heater 37, the drive motor 23, and the pump 55 based on a predetermined sequence based on the input signal from the input operation unit 61 and the detection signal from the temperature sensor 84.

以上説明した構成の高周波加熱装置100による基本加熱動作の一例として、蒸気加熱時の動作を説明する。   As an example of the basic heating operation by the high-frequency heating device 100 having the above-described configuration, an operation during steam heating will be described.

高周波加熱モード、蒸気加熱モード、オーブン加熱モード等の各種加熱モードのうち、蒸気加熱モードを選択してスタートスイッチ65を押下すると、図9に本高周波加熱装置100の動作説明図を示すように、蒸発皿加熱ヒータ37がONにされることで、水タンク43からポンプ55によって供給される蒸発皿35内の水が加熱され、蒸気Sが発生する。蒸発皿35から上昇する蒸気Sは、仕切板27の略中央部に設けた吸気用通風孔29から循環ファン17の中心部に吸引され、循環ファン室25を経由して、仕切板27の周部に設けた送風用通風孔31から、加熱室11内へ向けて吹き出される。   When a steam heating mode is selected from various heating modes such as a high-frequency heating mode, a steam heating mode, and an oven heating mode and the start switch 65 is pressed, as shown in FIG. When the evaporating dish heater 37 is turned on, water in the evaporating dish 35 supplied from the water tank 43 by the pump 55 is heated, and steam S is generated. The steam S rising from the evaporating dish 35 is sucked into the central portion of the circulation fan 17 from the intake vent hole 29 provided in the substantially central portion of the partition plate 27, and passes through the circulation fan chamber 25 to surround the partition plate 27. It blows out toward the inside of the heating chamber 11 from the ventilation hole 31 for ventilation provided in the part.

吹き出された蒸気は、加熱室11内において撹拌されて、再度、仕切板27の略中央部の吸気用通風孔29から循環ファン室25側に吸引される。これにより加熱室11内と循環ファン室25に循環経路が形成される。なお、仕切板27の循環ファン17の配置位置下方には送風用通風孔31を設けずに、発生した蒸気を吸気用通風孔29に導かれるようにしている。従って、図中白抜き矢印で示すように、蒸気が加熱室11を循環し、被加熱物Mに効率よく蒸気が吹き付けられる。   The blown-out steam is stirred in the heating chamber 11 and again sucked into the circulation fan chamber 25 side from the intake vent hole 29 at the substantially central portion of the partition plate 27. Thereby, a circulation path is formed in the heating chamber 11 and the circulation fan chamber 25. The generated steam is guided to the intake vent hole 29 without providing the ventilation vent hole 31 below the position where the circulation fan 17 is disposed on the partition plate 27. Therefore, as shown by the white arrow in the figure, the steam circulates through the heating chamber 11, and the steam is efficiently sprayed on the object to be heated M.

この際、室内気加熱ヒータ19によって、加熱室11内の蒸気を加熱できるので、加熱室11内を循環する蒸気の温度を高温に設定することもできる。従って、いわゆる過熱蒸気が得られて、被加熱物Mの表面に焦げ目を付けた加熱調理も可能となる。   At this time, since the steam in the heating chamber 11 can be heated by the room air heater 19, the temperature of the steam circulating in the heating chamber 11 can be set to a high temperature. Therefore, so-called superheated steam is obtained, and heating cooking with a burnt surface on the surface of the article to be heated M is also possible.

また、高周波加熱を行う場合は、マグネトロン13をONにし、スタラー羽根33を回転することで、高周波を加熱室11内に撹拌しながら供給する。本高周波加熱装置100では、蒸気と高周波とを組み合わせた高周波加熱処理を行うことができる。   When performing high frequency heating, the magnetron 13 is turned on and the stirrer blade 33 is rotated to supply high frequency into the heating chamber 11 while stirring. In the high-frequency heating apparatus 100, high-frequency heat treatment combining steam and high-frequency can be performed.

以上が通常の蒸気加熱を含む加熱処理の手順である。次に、本発明の特徴部分である加熱室内清掃機能について以下に説明する。   The above is the heat treatment procedure including normal steam heating. Next, the heating chamber cleaning function, which is a feature of the present invention, will be described below.

入力操作部61によって清掃モードが選択・実行された場合の高周波加熱装置100の作用を図10に示すフローチャート図に沿って説明する。   The operation of the high-frequency heating device 100 when the cleaning mode is selected and executed by the input operation unit 61 will be described with reference to the flowchart shown in FIG.

入力操作部61の清掃スイッチ81を押下すると(ステップ1、以下S1と称する)、入力操作部61から制御部83へ入力信号を送信して制御部83が清掃モードの選択待機状態となる(S2)。そして、この状態で設定ダイアル82を回すことにより、蒸発皿清掃モード、加熱室清掃モード、或いは脱臭モードを選択する。いずれかの清掃モードを選択してスタートスイッチ65を押下すると、選択された清掃モードによる運転が開始される(S3、S4)。   When the cleaning switch 81 of the input operation unit 61 is pressed (step 1, hereinafter referred to as S1), an input signal is transmitted from the input operation unit 61 to the control unit 83, and the control unit 83 enters a cleaning mode selection standby state (S2). ). Then, the evaporating dish cleaning mode, the heating chamber cleaning mode, or the deodorizing mode is selected by turning the setting dial 82 in this state. When one of the cleaning modes is selected and the start switch 65 is pressed, operation in the selected cleaning mode is started (S3, S4).

ここで、各清掃モードについて図11及び図12に示すフローチャート図に沿って説明する。   Here, each cleaning mode will be described with reference to the flowcharts shown in FIGS. 11 and 12.

(蒸発皿清掃モード)
まず、蒸発皿35内に、クエン酸を水に溶解した洗浄液を注入する(S11)。この状態で、蒸発皿清掃モードを選択してスタートスイッチ65を押下すると、蒸発皿加熱ヒータ37によって蒸発皿35が加熱され、蒸発皿35内の洗浄液が約30秒程度で約100℃に加熱される(S12)。そして、蒸発皿加熱ヒータ37は、洗浄液の温度を約80〜95℃の状態を維持するように断続的に作動される(S13)。この間水タンク43からポンプ55により一定間隔(蒸発皿35内の洗浄液がなくならないように)で水が送られる(S14)。約80〜95℃の状態を維持する時間が所定時間(例えば約20分間)経過したら(S15)。その後、50℃まで温度を下げる(S16)、終了1分前になると(S17)(例えば加熱開始から約29分)水タンク43からポンプ55によって蒸発皿35内に水を供給させ拭き取りが可能な40℃程度にまでに温度を下げる(S18)。
(Evaporation dish cleaning mode)
First, a cleaning solution in which citric acid is dissolved in water is poured into the evaporating dish 35 (S11). In this state, when the evaporating dish cleaning mode is selected and the start switch 65 is pressed, the evaporating dish 35 is heated by the evaporating dish heater 37, and the cleaning liquid in the evaporating dish 35 is heated to about 100 ° C. in about 30 seconds. (S12). The evaporating dish heater 37 is operated intermittently so as to maintain the temperature of the cleaning liquid at about 80 to 95 ° C. (S13). During this time, water is sent from the water tank 43 by a pump 55 at a constant interval (so that the cleaning liquid in the evaporating dish 35 is not lost) (S14). When a predetermined time (for example, about 20 minutes) elapses to maintain the state of about 80 to 95 ° C. (S15). Thereafter, the temperature is lowered to 50 ° C. (S16), and 1 minute before the end (S17) (for example, about 29 minutes from the start of heating), water can be supplied from the water tank 43 into the evaporating dish 35 by the pump 55, and can be wiped off. The temperature is lowered to about 40 ° C. (S18).

所定時間(例えば加熱開始から約30分)経過したら(S19)、清掃処理の終了を報知するため、音声や警報音等とともに表示パネル75に清掃終了の旨を表示する(S20)。以上の清掃終了を確認したら、開閉扉21を開き、蒸発皿35を布等により拭き取る(S21)。   When a predetermined time (for example, about 30 minutes from the start of heating) has passed (S19), in order to notify the end of the cleaning process, a message indicating the end of cleaning is displayed on the display panel 75 together with a sound, an alarm sound, or the like (S20). After confirming the completion of the above cleaning, the door 21 is opened and the evaporating dish 35 is wiped off with a cloth or the like (S21).

このような蒸発皿清掃モードを行うことにより、蒸発皿35に付着したカルシウムやマグネシウム等の付着物がクエン酸により分解され、確実かつ容易に除去できる。   By performing such an evaporating dish cleaning mode, deposits such as calcium and magnesium adhering to the evaporating dish 35 are decomposed by citric acid and can be reliably and easily removed.

なお、洗浄液としては食品衛生上安全でカルシウムやマグネシウム等の分解に効果の高いクエン酸を好適に用いているが、これに限らず、クエン酸溶液に界面活性剤等を添加して、油成分の汚れに対しても洗浄性を高めるようにしてもよく、また、他の洗浄液を用いてもよい。   Note that citric acid that is safe for food hygiene and highly effective in decomposing calcium, magnesium, etc. is suitably used as the cleaning liquid, but is not limited to this, and a surfactant or the like is added to the citric acid solution to obtain an oil component. It is also possible to improve the cleaning performance against dirt, and other cleaning liquids may be used.

(加熱室清掃モード)
加熱室清掃モードを選択してスタートスイッチ65を押下すると、水タンク43からポンプ55によって蒸発皿35内に水が間欠的に供給される(S31)。そして、蒸発皿加熱ヒータ37は、蒸発皿35内の水の温度を約100℃の状態を維持するように断続的に作動され蒸気が発生する(S32)。さらに、循環ファン17の駆動モータ23を断続的に駆動する(S33)。このときの駆動モータ23の駆動は、例えば30秒に2秒程度駆動するような断続運転とする。これにより、前述の図9に示す循環風が得られ、発生した蒸気が加熱室11内の上方に滞留して偏ることなく分散され、加熱室11の内面全体に蒸気が結露した状態となる。この間水タンク43からポンプ55により一定間隔(蒸発皿35内の水がなくならないように)で水が送られる(S34)。
(Heating chamber cleaning mode)
When the heating chamber cleaning mode is selected and the start switch 65 is pressed, water is intermittently supplied from the water tank 43 into the evaporating dish 35 by the pump 55 (S31). The evaporating dish heater 37 is intermittently operated so as to maintain the temperature of the water in the evaporating dish 35 at about 100 ° C. to generate steam (S32). Further, the drive motor 23 of the circulation fan 17 is intermittently driven (S33). At this time, the drive motor 23 is driven intermittently, for example, for about 2 seconds per 30 seconds. As a result, the circulating air shown in FIG. 9 is obtained, and the generated steam stays in the heating chamber 11 and is distributed without being biased, so that the steam is condensed on the entire inner surface of the heating chamber 11. During this time, water is sent from the water tank 43 by the pump 55 at regular intervals (so that the water in the evaporating dish 35 does not disappear) (S34).

そして、約3〜5分の所定時間の経過後(S35)、ポンプ55及び駆動モータ23をOFFにし(S36)、蒸発皿加熱ヒータ37は、水の温度を約50℃の状態を維持するように断続的に作動される(S37)。終了1分前になると(S38)(例えば加熱開始から約29分)水タンク43からポンプ55によって蒸発皿35内に水を供給させ拭き取りが可能な40℃程度にまでに温度を下げる(S39)。   Then, after the elapse of a predetermined time of about 3 to 5 minutes (S35), the pump 55 and the drive motor 23 are turned off (S36), and the evaporating dish heater 37 maintains the temperature of the water at about 50 ° C. (S37). One minute before the end (S38) (for example, about 29 minutes from the start of heating), the temperature is lowered to about 40 ° C. where water can be supplied from the water tank 43 into the evaporating dish 35 by the pump 55 and can be wiped off (S39). .

所定時間(例えば加熱開始から約30分)経過したら(S40)、清掃処理の終了を報知するため、音声や警報音等とともに表示パネル75に清掃終了の旨を表示する(S41)。以上の清掃終了を確認したら、開閉扉21を開き、蒸発皿35を布等により拭き取る(S42)。   When a predetermined time (for example, about 30 minutes from the start of heating) has elapsed (S40), in order to notify the end of the cleaning process, a message indicating the end of cleaning is displayed on the display panel 75 together with a sound, an alarm sound, or the like (S41). After confirming the completion of the above cleaning, the door 21 is opened and the evaporating dish 35 is wiped off with a cloth or the like (S42).

このような加熱室清掃モードを行うことにより、加熱室11の内面にこびり付いた被加熱物Mからの飛散物等の汚れが加熱室11の内面から浮き上がる。この加熱室内面との密着度が低下した状態で、付着している汚れを拭き取ることで、汚れが一気に除去できるようになる。   By performing such a heating chamber cleaning mode, dirt such as scattered matter from the heated object M sticking to the inner surface of the heating chamber 11 rises from the inner surface of the heating chamber 11. The dirt can be removed all at once by wiping off the attached dirt in a state where the degree of adhesion with the inner surface of the heating chamber is lowered.

このように、上記構造の高周波加熱装置100によれば、制御部83が入力操作部61に入力された信号に基づいて、蒸気発生部15、給水用のポンプ55、循環ファン17等を制御して所望の清掃モードを実行することにより、加熱室11の内面や蒸発皿35の清掃を簡単な操作により行うことができ、煩雑な作業を行うことなく、汚れが付着した加熱室11の内面や蒸発皿35を極めて容易に清掃でき、清潔な状態にできる。   Thus, according to the high-frequency heating device 100 having the above structure, the control unit 83 controls the steam generation unit 15, the water supply pump 55, the circulation fan 17, and the like based on the signal input to the input operation unit 61. By executing a desired cleaning mode, the inner surface of the heating chamber 11 and the evaporating dish 35 can be cleaned by a simple operation, and without performing complicated work, The evaporating dish 35 can be cleaned very easily and can be kept clean.

即ち、蒸発皿清掃モードでは、蒸発皿35にクエン酸溶液からなる洗浄液を注入して、所定温度(約80〜95℃)に加熱することにより、蒸発皿35に付着したカルシウムやマグネシウム等の汚れが分解される。これにより、蒸発皿35を拭き取るだけで、確実かつ容易に付着物を除去することができる。また、加熱室清掃モードでは、加熱室11の内面を蒸気によって結露させ、その結露を維持させるように蒸発皿加熱ヒータ37を通電させることにより、加熱室11の内面に付着した汚れを簡単に浮き上がらせることができ、汚れの拭き取りを容易にし、これにより、加熱室11の内面を清潔な状態にすることができる。   That is, in the evaporating dish cleaning mode, a cleaning liquid made of a citric acid solution is poured into the evaporating dish 35 and heated to a predetermined temperature (about 80 to 95 ° C.), whereby dirt such as calcium and magnesium adhering to the evaporating dish 35 is obtained. Is disassembled. Thereby, the deposits can be reliably and easily removed simply by wiping the evaporating dish 35. Further, in the heating chamber cleaning mode, the inner surface of the heating chamber 11 is condensed with steam, and the evaporating dish heater 37 is energized so as to maintain the condensation, so that dirt attached to the inner surface of the heating chamber 11 can be easily lifted. This makes it easy to wipe off the dirt, thereby making the inner surface of the heating chamber 11 clean.

また、各清掃モードでは、スタートスイッチ65を押下した後は高周波加熱装置100側で自動的に清掃を行うため、操作者は常に高周波加熱装置100を監視する必要はなく、清掃終了が報知されるまで、何ら拘束を受けることがない。また、清掃終了後は、通常では取れにくかった汚れが、極めて簡単に除去できる状態になっており、力をかけずに軽く拭き取るだけで十分に汚れを払拭でき、良好な洗浄効果を簡単に得ることができる。   In each cleaning mode, after the start switch 65 is pressed, the high-frequency heating apparatus 100 automatically performs cleaning, so that the operator does not always have to monitor the high-frequency heating apparatus 100 and is notified of the end of cleaning. Until then, no restraint. In addition, after cleaning is finished, dirt that was usually difficult to remove is in a state that can be removed very easily, and it can be sufficiently wiped off by lightly wiping without applying force, easily obtaining a good cleaning effect be able to.

なお、本発明に係る高周波加熱装置は、前述した各実施形態に限定されるものでなく、発明の主旨を逸脱しない範囲で適宜な変形、改良等が可能である。   The high-frequency heating device according to the present invention is not limited to the above-described embodiments, and appropriate modifications and improvements can be made without departing from the spirit of the invention.

以上のように、本発明にかかる高周波加熱装置によれば、信号入力手段を介して制御部に入力される信号に基づいて、指定された清掃モードを実行することにより、煩雑な作業を行うことなく、汚れが付着した加熱室内を蒸発皿の温度を高く維持することにより極めて容易に清掃することができ、終了時にはポンプにより水を供給することで水受皿の温度を下げることができるので安全に清掃作業を行うことができるので、加熱手段として高周波を利用する以外の調理器の清掃方法に適用できる。   As described above, according to the high-frequency heating device of the present invention, a complicated operation is performed by executing the designated cleaning mode based on the signal input to the control unit via the signal input means. In addition, it is very easy to clean the inside of the heating chamber where dirt is attached by keeping the temperature of the evaporating dish high, and at the end, the temperature of the water receiving dish can be lowered by supplying water with a pump. Since the cleaning operation can be performed, the present invention can be applied to a cooking device cleaning method other than using a high frequency as a heating means.

本発明に係る高周波加熱装置の開閉扉を開けた状態を示す正面図The front view which shows the state which opened the opening / closing door of the high frequency heating apparatus which concerns on this invention 図1の高周波加熱装置に用いられる蒸気発生部の蒸発皿を示す斜視図The perspective view which shows the evaporating dish of the steam generation part used for the high frequency heating apparatus of FIG. 蒸気発生部の蒸発皿加熱ヒータと反射板を示す斜視図The perspective view which shows the evaporating dish heater of a steam generation part, and a reflecting plate 蒸気発生部の断面図Cross section of steam generator 高周波加熱装置の側面に水タンクを収容する様子を表す説明図Explanatory drawing showing a mode that a water tank is stored in the side of a high frequency heating device 高周波加熱装置の側面図Side view of high-frequency heating device 高周波加熱装置の入力操作部及び表示部が設けられた開閉扉の正面図Front view of open / close door provided with input operation unit and display unit of high-frequency heating device 高周波加熱装置の制御ブロック図Control block diagram of the high-frequency heating device 高周波加熱装置の動作説明図Operation explanatory diagram of high-frequency heating device 高周波加熱装置の清掃モードを説明するフローチャートFlowchart explaining cleaning mode of high-frequency heating device 高周波加熱装置の蒸発皿清掃モードを説明するフローチャートFlowchart explaining evaporating dish cleaning mode of high-frequency heating device 高周波加熱装置の加熱室清掃モードを説明するフローチャートFlowchart explaining heating chamber cleaning mode of high-frequency heating device

符号の説明Explanation of symbols

11 加熱室
13 マグネトロン(高周波発生部)
15 蒸気発生部
35 蒸発皿
37 蒸発皿加熱ヒータ(蒸発皿加熱手段)
43 水タンク
57 配管(給水管路)
55 ポンプ
83 制御部
100 高周波加熱装置
M 被加熱物
11 Heating chamber 13 Magnetron (High frequency generator)
15 Steam generating part 35 Evaporating dish 37 Evaporating dish heater (evaporating dish heating means)
43 Water tank 57 Piping (water supply line)
55 Pump 83 Control unit 100 High-frequency heating device M Object to be heated

Claims (4)

被加熱物を収容する加熱室内に高周波を出力する高周波発生手段と、前記加熱室内に加熱蒸気を供給する蒸気供給部とを備え、高周波と加熱蒸気との少なくともいずれかを前記加熱室に供給して前記被加熱物を加熱処理する蒸気発生機能付き高周波加熱装置であって、
前記蒸気供給部は、装置本体に着脱可能に装備される水タンクと、前記加熱室内に装備される蒸発皿と、この蒸発皿を加熱して前記蒸発皿上の水を蒸発させる蒸発皿加熱手段とを備え、前記蒸気供給部により前記加熱室内に蒸気を自動供給して加熱室内の汚れを清掃する加熱室清掃モード、及び前記蒸発皿に洗浄液を注入し前記蒸発皿加熱手段により加熱することで前記蒸発皿の汚れを清掃する蒸発皿清掃モードを備えた制御部と、前記制御部に対して前記いずれかの清掃モードを実行させるための信号入力手段とを具備したことを特徴とする高周波加熱装置。
A high-frequency generating means for outputting a high frequency into a heating chamber that accommodates an object to be heated, and a steam supply unit that supplies heating steam into the heating chamber, and at least one of the high frequency and the heating steam is supplied to the heating chamber. A high-frequency heating device with a steam generating function for heating the object to be heated,
The steam supply unit includes a water tank that is detachably attached to the apparatus main body, an evaporating dish that is provided in the heating chamber, and an evaporating dish heating unit that evaporates water on the evaporating dish by heating the evaporating dish. A heating chamber cleaning mode in which steam is automatically supplied into the heating chamber by the steam supply unit to clean dirt in the heating chamber, and a cleaning liquid is injected into the evaporating dish and heated by the evaporating dish heating means. A high frequency heating comprising: a control unit having an evaporating dish cleaning mode for cleaning dirt on the evaporating dish; and a signal input means for causing the control unit to execute any one of the cleaning modes. apparatus.
前記加熱室清掃モードが、前記蒸気供給部の蒸発皿に供給された水を蒸発皿加熱手段により加熱し、前記加熱室内に蒸気を充満させて前記加熱室を画成する面に結露させることで清掃を行い、加熱室清掃モードが終了する前に前期貯水タンクから強制的に水を前記蒸発皿に供給し前記蒸発皿内の水を冷却することを特徴とする請求項1記載の高周波加熱装置。 In the heating chamber cleaning mode, water supplied to the evaporating dish of the steam supply unit is heated by evaporating dish heating means, and the heating chamber is filled with steam to condense on the surface defining the heating chamber. 2. The high frequency heating apparatus according to claim 1, wherein cleaning is performed and water in the evaporating dish is forcibly supplied from the water storage tank in the previous period to cool the water in the evaporating dish before the heating chamber cleaning mode ends. . 前記蒸発皿清掃モードが、前記蒸気供給部の蒸発皿に供給された水と洗浄液とを蒸発皿加熱手段により所定温度に加熱した後、沸騰しない温度で加熱を維持し、蒸発皿清掃モードが終了する前に前期貯水タンクから強制的に水を前記蒸発皿に供給し前記蒸発皿内の水を冷却することを特徴とする請求項1記載の高周波加熱装置。 In the evaporating dish cleaning mode, after the water and the cleaning liquid supplied to the evaporating dish of the steam supply unit are heated to a predetermined temperature by the evaporating dish heating means, the heating is maintained at a temperature that does not boil, and the evaporating dish cleaning mode ends. 2. The high frequency heating apparatus according to claim 1, wherein water is forcibly supplied to the evaporating dish from the water storage tank in the previous period to cool the water in the evaporating dish. 前記洗浄液として、クエン酸溶液を用いることを特徴とする請求項3記載の高周波加熱装置。 4. The high frequency heating apparatus according to claim 3, wherein a citric acid solution is used as the cleaning liquid.
JP2005152107A 2005-05-25 2005-05-25 High frequency heating device Pending JP2006329494A (en)

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