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JP2006319314A - Circuit board and its manufacturing method - Google Patents

Circuit board and its manufacturing method Download PDF

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JP2006319314A
JP2006319314A JP2006050981A JP2006050981A JP2006319314A JP 2006319314 A JP2006319314 A JP 2006319314A JP 2006050981 A JP2006050981 A JP 2006050981A JP 2006050981 A JP2006050981 A JP 2006050981A JP 2006319314 A JP2006319314 A JP 2006319314A
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hole
circuit board
insulating substrate
opening
metal conductor
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Kenji Sugimoto
健治 杉本
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Kyocera Corp
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Kyocera Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a circuit board with a high conductive reliability which can suppress a production of a void on a metallic conductor formed from a top face to a bottom surface of an insulating substrate, a peeling of the metallic conductor from the insulating substrate, and a production of a crack on the insulating substrate. <P>SOLUTION: In a circuit board 1 constituted by filling a through-hole 2 formed in an insulating substrate 1 with a metallic conductor 5, while making an inner diameter of a center section in the depth direction of the through-hole 2 smaller than an inner diameter of an opening, an inclination of an inner wall side of the through-hole 2 to the depth direction is changed multiple times toward the opening from the center section of the through-hole 2. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、金属導体で充填されたスルーホールを有する回路基板およびその回路基板の製造方法に関する。   The present invention relates to a circuit board having a through hole filled with a metal conductor and a method for manufacturing the circuit board.

近年の電子部品の著しい小型化、高密度実装化に伴い、電子部品がマウントされる回路基板も高性能化が望まれている。その方法としては、パターン状の回路導体を微細化してサイズを縮小する方法、或いは、回路導体を3次元的に多層化する方法等が採用されている。   Along with the recent remarkable miniaturization and high-density mounting of electronic components, circuit boards on which electronic components are mounted are also required to have high performance. As the method, a method of reducing the size by miniaturizing a patterned circuit conductor, a method of multilayering the circuit conductor three-dimensionally, or the like is adopted.

回路導体を3次元的に多層化する方法としては、絶縁基板が金属導体によって上下面が電気的に接続された回路基板を複数積層する方法が採用され、各層間での所望の導通を確保することによって小型化、高集積化等に対応すべく回路設計が行われている。   As a method of multilayering circuit conductors three-dimensionally, a method of laminating a plurality of circuit boards in which the upper and lower surfaces are electrically connected by metal conductors is adopted, and desired conduction between each layer is ensured. As a result, circuit design has been performed to cope with downsizing, high integration, and the like.

このような3次元高密度配線を有する回路基板は、加工性が良好な樹脂製の基板を用いたプリント配線基板の分野では広く実用化されているが、絶縁特性や放熱特性に優れるセラミック基板(アルミナ質焼結体、窒化アルミニウム質焼結体、炭化ケイ素質焼結体等)においても需要が高まっている。このようなセラミック基板を用いた上記多層回路基板の製造方法に用いられる回路基板の製造方法としては、所謂コファイア法とポストファイア法が知られている。   A circuit board having such a three-dimensional high-density wiring is widely put into practical use in the field of printed wiring boards using a resin-made substrate having good workability, but a ceramic substrate having excellent insulation characteristics and heat dissipation characteristics ( There is also an increasing demand for alumina sintered bodies, aluminum nitride sintered bodies, silicon carbide sintered bodies, and the like. As a circuit board manufacturing method used in the multilayer circuit board manufacturing method using such a ceramic substrate, a so-called cofire method and a postfire method are known.

コファイア法とは、セラミックグリーンシート(以下、グリーンシートともいう)と呼ばれる焼結前のセラミック前駆体にスルーホールを穿孔した後にこのスルーホールに金属粉末を有機バインダー中に分散させたペースト状の物質(以下、金属ペーストともいう)を充填し、ついで脱脂,焼成する方法である。   The cofire method is a paste-like substance in which a through hole is drilled in a ceramic precursor before sintering called a ceramic green sheet (hereinafter also referred to as a green sheet), and then metal powder is dispersed in the organic binder in the through hole. (Hereinafter, also referred to as a metal paste), followed by degreasing and firing.

一方ポストファイア法とは、スルーホールが形成されたセラミック焼結体に金属ペーストを充填して再焼成する方法であり、汎用的な方法としては、グリーンシートを穿孔し、脱脂,焼成した後、セラミック焼結体に直接ドリルを用いて加工し、エッチング法や銅めっき法を用いて金属導体を形成する方法である。   On the other hand, the post-fire method is a method in which a ceramic paste with through holes formed is filled with a metal paste and refired. As a general-purpose method, after punching a green sheet, degreasing, and firing, In this method, a ceramic sintered body is directly processed using a drill, and a metal conductor is formed using an etching method or a copper plating method.

いずれの方法においても、絶縁基板前駆体又は絶縁基板に穿孔した後、上下面の導通のための金属導体を形成する方法である。   In any method, after drilling the insulating substrate precursor or the insulating substrate, metal conductors for conduction on the upper and lower surfaces are formed.

ポストファイア法においては、焼成後の絶縁基板にスルーホールを形成するため、スルーホールの寸法や、位置精度を高く形成できる反面、スルーホールにめっき法等で金属導体を充填した場合の絶縁基板と金属導体の接合信頼性や、スルーホール内にボイドが残留し、装置の長期信頼性を低下させる問題を発生させやすい傾向があった。   In the post-fire method, through holes are formed in the insulating substrate after firing, so that the through hole dimensions and positional accuracy can be formed with high accuracy, while the through hole is filled with a metal conductor by plating or the like and There was a tendency for the metal conductor bonding reliability and voids to remain in the through-holes to cause problems that deteriorate the long-term reliability of the device.

それらの問題の対策を行なったポストファイア法も検討されている。例えば、下記の特許文献1には、絶縁基板に最狭部を有するスルーホールを形成し、この最狭部に電流密度を集中させてめっき成長を促進し、この最狭部からスルーホールを閉塞してゆくことによって、ボイドが生じるのを防止するというものである。
特開2004−311919号公報
Post-fire methods that address these problems are also being considered. For example, in Patent Document 1 below, a through hole having a narrowest portion is formed in an insulating substrate, current density is concentrated on the narrowest portion to promote plating growth, and the through hole is blocked from the narrowest portion. This prevents the formation of voids.
JP 2004-311919 A

しかしながら、特許文献1に述べられているようなポストファイア法によれば、スルーホール中のボイドを発生させずに金属導体を形成することはできるものの、スルーホールの開口部の開口径が大きくなったり、スルーホールの形成密度を高めた場合、絶縁基板と金属導体の熱膨張係数の差によって、絶縁基板に加わる応力が大きくなるため、絶縁基板にクラックが発生したり、絶縁基板と金属導体とが剥離しやすくなる傾向があり、絶縁基板との接続信頼性が低下したり、基板の表面に搭載した電子部品で発生した熱を効果的に裏面に伝えることができないという問題点があった。   However, according to the post-fire method as described in Patent Document 1, although the metal conductor can be formed without generating voids in the through hole, the opening diameter of the through hole is increased. When the through-hole formation density is increased, the stress applied to the insulating substrate increases due to the difference in thermal expansion coefficient between the insulating substrate and the metal conductor. However, there is a problem that the reliability of connection with the insulating substrate is lowered, and heat generated by electronic components mounted on the surface of the substrate cannot be effectively transmitted to the back surface.

本発明は、かかる従来技術の問題点に鑑み完成されたものであり、その目的は、絶縁基板の上面から下面にかけて形成した金属導体にボイドが生じたり、金属導体と絶縁基板とが剥離したり、絶縁基板にクラックが生じたりするのを抑制することのできる導通信頼性の高い回路基板を提供することにある。   The present invention has been completed in view of the problems of the prior art, and its purpose is that voids are generated in the metal conductor formed from the upper surface to the lower surface of the insulating substrate, or the metal conductor and the insulating substrate are peeled off. An object of the present invention is to provide a circuit board with high conduction reliability capable of suppressing the occurrence of cracks in an insulating substrate.

本発明の回路基板は、絶縁基板に形成したスルーホールを金属導体で充填して成る回路基板において、前記スルーホールの深さ方向の中央部の内径を開口部の内径よりも小さくするとともに、前記スルーホールの中央部から開口部に向かって前記深さ方向に対する該スルーホールの内壁面の傾斜角度を複数回変化させたことを特徴とする。   The circuit board of the present invention is a circuit board formed by filling a through hole formed in an insulating substrate with a metal conductor, and the inner diameter of the central portion in the depth direction of the through hole is made smaller than the inner diameter of the opening. The inclination angle of the inner wall surface of the through hole with respect to the depth direction is changed a plurality of times from the center of the through hole toward the opening.

本発明の回路基板において、好ましくは、前記スルーホールの内径を前記スルーホールの中央部から開口部に向かうほど漸次大きくなるようにしたことを特徴とする。   In the circuit board according to the present invention, it is preferable that the inner diameter of the through hole is gradually increased from the central portion of the through hole toward the opening.

本発明の回路基板において、好ましくは、前記スルーホールの縦断面形状において前記開口部から中央部に向かう前記絶縁基板の内面を窪ませたことを特徴とする。   The circuit board according to the present invention is preferably characterized in that an inner surface of the insulating substrate is recessed from the opening toward the center in the longitudinal sectional shape of the through hole.

本発明の回路基板において、好ましくは、前記スルーホールの深さ方向の中央部に位置する前記絶縁基板の内面を内側に突出させて突出部を形成したことを特徴とする。   In the circuit board of the present invention, it is preferable that an inner surface of the insulating substrate located at a central portion in the depth direction of the through hole is protruded inward to form a protruding portion.

本発明の回路基板において、好ましくは、前記窪ませた絶縁基板の内面を凹曲面形状としたことを特徴とする。   In the circuit board according to the present invention, preferably, the inner surface of the recessed insulating substrate has a concave curved surface shape.

本発明の回路基板において、好ましくは、前記スルーホールにおける前記絶縁基板の内面にチタン,クロム,アルミニウム,モリブデン,タングステン,銅およびニッケル−クロム合金のうちの少なくとも1種から成る接合金属層を被着したことを特徴とする。   In the circuit board of the present invention, preferably, a bonding metal layer made of at least one of titanium, chromium, aluminum, molybdenum, tungsten, copper, and nickel-chromium alloy is deposited on the inner surface of the insulating substrate in the through hole. It is characterized by that.

本発明の回路基板において、好ましくは、前記金属導体は、銅,銀,およびチタンのうちの少なくとも1種から成ることを特徴とする。   In the circuit board of the present invention, preferably, the metal conductor is made of at least one of copper, silver, and titanium.

本発明の回路基板において、好ましくは、前記金属導体は、めっき法により形成されることを特徴とする。   In the circuit board of the present invention, preferably, the metal conductor is formed by a plating method.

本発明の回路基板は、絶縁基板に形成したスルーホールを金属導体で充填して成る回路基板において、前記スルーホールの深さ方向の中央部の内径を開口部の内径よりも小さくするとともに、前記スルーホールの中央部から開口部に向かって前記深さ方向に対する該スルーホールの内壁面の傾斜角度を連続的に変化させたことを特徴とする。   The circuit board of the present invention is a circuit board formed by filling a through hole formed in an insulating substrate with a metal conductor, and the inner diameter of the central portion in the depth direction of the through hole is made smaller than the inner diameter of the opening. The inclination angle of the inner wall surface of the through hole with respect to the depth direction is continuously changed from the center of the through hole toward the opening.

本発明の回路基板の製造方法は、絶縁基板の一方主面にブラスト法により砥粒が周辺部より中心部で多く噴出するようにして上側凹部を形成した後、前記絶縁基板の他方主面の前記上側凹部に対応する位置にブラスト法により砥粒が周辺部より中心部で多く噴出するようにして下側凹部を形成するとともに中央部を貫通されることにより、深さ方向の中央部の内径を開口部の内径よりも小さくするとともに縦断面形状において開口部から中央部に向かう前記絶縁基板の内面を窪ませたスルーホールを形成する工程を具備することを特徴とする。   In the method for manufacturing a circuit board according to the present invention, an upper recess is formed on one main surface of an insulating substrate by blasting so that abrasive grains are ejected more at the center than at the periphery, and then the other main surface of the insulating substrate is formed. An inner diameter of the central portion in the depth direction is formed by forming a lower concave portion so that abrasive grains are ejected more in the central portion than in the peripheral portion by a blast method at a position corresponding to the upper concave portion and penetrating the central portion. And forming a through hole in which the inner surface of the insulating substrate is recessed from the opening toward the center in the longitudinal sectional shape.

本発明の回路基板によれば、スルーホールの深さ方向の中央部の内径を開口部の内径よりも小さくするとともに、スルーホールの中央部から開口部に向かって上記深さ方向に対するスルーホールの内壁面の傾斜角度を複数回変化させたことから、金属導体の特に大きな上下方向の熱膨張を非常に良好に抑制できるので、金属導体と絶縁基板との間に剥離が発生したり、絶縁基板にクラックが生じるのを有効に防止した導通信頼性の高い回路基板を提供できる。   According to the circuit board of the present invention, the inner diameter of the center portion in the depth direction of the through hole is made smaller than the inner diameter of the opening portion, and the through hole with respect to the depth direction from the center portion of the through hole toward the opening portion is formed. Since the inclination angle of the inner wall surface is changed several times, the metal conductor can be suppressed very well in the vertical direction, so that peeling between the metal conductor and the insulating substrate may occur. It is possible to provide a circuit board with high conduction reliability that effectively prevents cracks from occurring.

また、金属導体の横方向の熱膨張によって金属導体と絶縁基板との界面付近に生じる応力を、平面視してより内側に位置するスルーホールの中央部と、より外側に位置するスルーホールの開口部付近とに分散できるので、各部位の応力が合わさって大きな応力となるのを有効に防止し、絶縁基板に生じる応力をきわめて小さくできる。   In addition, the stress generated in the vicinity of the interface between the metal conductor and the insulating substrate due to the thermal expansion in the lateral direction of the metal conductor, the central portion of the through hole located on the inner side in plan view, and the opening of the through hole located on the outer side Since it can be dispersed in the vicinity of the portion, it is possible to effectively prevent the stresses at the respective parts from being combined and become a large stress, and the stress generated in the insulating substrate can be extremely reduced.

さらに、スルーホールの内径を中央部から開口部に向かうほど大きくなるようにしたことから、金属導体と絶縁基板との熱膨張差による応力を分散させて応力が局所的に集中するのを有効に防止することができる。   Furthermore, since the inner diameter of the through hole is increased from the center toward the opening, it is effective to disperse the stress due to the difference in thermal expansion between the metal conductor and the insulating substrate and to concentrate the stress locally. Can be prevented.

さらにまた、スルーホールの中央部において、スルーホールの内壁面をなす絶縁基板の内面が金属導体に食い込んだ形状であるので、機械的衝撃下においても金属導体が脱落することがない高い接続信頼性を有する回路基板を提供することができる。   Furthermore, since the inner surface of the insulating substrate that forms the inner wall surface of the through hole is in the shape of the metal conductor at the center of the through hole, the metal conductor does not fall off even under mechanical impact. Can be provided.

本発明の回路基板によれば、スルーホールの突出部と開口との間における内面を凹曲面形状としたことから、金属導体の体積を大きくすることができ、より高い熱伝導性の回路基板を提供できる。   According to the circuit board of the present invention, since the inner surface between the projecting portion of the through hole and the opening has a concave curved surface shape, the volume of the metal conductor can be increased, and a circuit board with higher thermal conductivity can be obtained. Can be provided.

本発明の回路基板によれば、スルーホールにおける絶縁基板の内面にチタン,クロム,アルミニウム,モリブデン,タングステン,銅およびニッケル−クロム合金のうちの少なくとも1種から成る接合金属層を被着したことから、スルーホール内壁面と金属導体とを高い強度で密着させることができ、高信頼性の回路基板を得ることができる。   According to the circuit board of the present invention, the joining metal layer made of at least one of titanium, chromium, aluminum, molybdenum, tungsten, copper, and nickel-chromium alloy is deposited on the inner surface of the insulating substrate in the through hole. The inner wall surface of the through hole and the metal conductor can be brought into close contact with each other with high strength, and a highly reliable circuit board can be obtained.

本発明の回路基板によれば、金属導体は、銅,銀,およびチタンのうちの少なくとも1種から成ることから、絶縁基板の上面から下面にかけて導出された金属導体を熱伝導性および電気伝導性の良好な導体で形成できるので、電気抵抗が小さいとともに熱引き特性に優れた高信頼性の回路基板を得ることができる。   According to the circuit board of the present invention, since the metal conductor is made of at least one of copper, silver, and titanium, the metal conductor led out from the upper surface to the lower surface of the insulating substrate is used for the thermal conductivity and the electric conductivity. Therefore, it is possible to obtain a highly reliable circuit board having low electrical resistance and excellent heat-drawing characteristics.

本発明の回路基板によれば、金属導体は、めっき法により形成されることから、スルーホールの内径が小さい突出部の内側からめっきを良好に成長させ、スルーホールの深さ方向の中央部から上下の開口に順に金属導体を形成させることができるので、金属導体の内部や金属導体とスルーホール内面との間にボイドが生じるのを有効に防止することができる。   According to the circuit board of the present invention, since the metal conductor is formed by a plating method, the plating is favorably grown from the inside of the protruding portion having a small inner diameter of the through hole, and from the central portion in the depth direction of the through hole. Since metal conductors can be formed in order in the upper and lower openings, it is possible to effectively prevent voids from occurring inside the metal conductor and between the metal conductor and the inner surface of the through hole.

本発明の回路基板を図1に基づいて詳細に説明する。   The circuit board of the present invention will be described in detail with reference to FIG.

図1は本発明の回路基板の実施の形態の例を示す断面図を示し、図2は本発明の回路基板の実施の形態の他の例を示す断面図を示す。これらの図において1は絶縁基板、2はスルーホール、3は突出部、4は接合金属層、5は金属導体、6は配線導体層を示す。   FIG. 1 is a sectional view showing an example of an embodiment of a circuit board according to the present invention, and FIG. 2 is a sectional view showing another example of an embodiment of a circuit board according to the present invention. In these drawings, 1 is an insulating substrate, 2 is a through hole, 3 is a protruding portion, 4 is a bonding metal layer, 5 is a metal conductor, and 6 is a wiring conductor layer.

絶縁基板1は、酸化アルミニウム(アルミナ:Al)質焼結体,窒化アルミニウム(AlN)質焼結体等のセラミック絶縁材料等から成り、絶縁基板1が例えば酸化アルミニウム質焼結体から成る場合、先ずアルミナ(Al)やシリカ(SiO),カルシア(CaO),マグネシア(MgO)等の原料粉末に適当な有機溶剤,溶媒を添加混合して泥漿状と成し、これを従来周知のドクターブレード法やカレンダーロール法等によりシート状に成形してセラミックグリーンシート(以下、グリーンシートともいう)を得る。その後、グリーンシートを所定形状に打ち抜き加工するとともに必要に応じて複数枚積層し、これを約1600℃の温度で焼成することにより製作される。また、その後、必要に応じて絶縁基板1の主面に研磨加工を施す場合もある。 The insulating substrate 1 is made of a ceramic insulating material such as an aluminum oxide (alumina: Al 2 O 3 ) sintered body or an aluminum nitride (AlN) sintered body, and the insulating substrate 1 is made of, for example, an aluminum oxide sintered body. In order to form a slurry, first, an appropriate organic solvent or solvent is added to and mixed with raw material powders such as alumina (Al 2 O 3 ), silica (SiO 2 ), calcia (CaO), magnesia (MgO), etc. Is formed into a sheet by a conventionally known doctor blade method, calendar roll method or the like to obtain a ceramic green sheet (hereinafter also referred to as a green sheet). Thereafter, the green sheet is punched into a predetermined shape, and a plurality of sheets are laminated as necessary, and the green sheet is fired at a temperature of about 1600 ° C. Thereafter, the main surface of the insulating substrate 1 may be polished as necessary.

なお、絶縁基板1の材料として、特に酸化アルミニウム質焼結体や窒化アルミニウム質焼結体を用いた場合には、これらの材料の熱伝導率が40W/m・K以上と高いため、高放熱性という観点から、LD(レーザダイオード),LED(Light Emitting Diode),高速CPU(Central Processing Unit)等の発熱量の大きい各種半導体素子を搭載する回路基板に好適に使用することができる。   In particular, when an aluminum oxide sintered body or an aluminum nitride sintered body is used as the material of the insulating substrate 1, the thermal conductivity of these materials is as high as 40 W / m · K or higher, so that high heat dissipation. From the viewpoint of performance, it can be suitably used for a circuit board on which various semiconductor elements having a large calorific value such as LD (laser diode), LED (Light Emitting Diode), and high-speed CPU (Central Processing Unit) are mounted.

スルーホール2の内径は開口部から中央部に向けて漸次小さくなっている。また、スルーホール2の縦断面において、スルーホール2の内壁面をなす絶縁基板1の内面は、スルーホール2の開口部と中央部との間において窪んだ形状をしている。特に、図1に示された回路基板においては、スルーホール2の中央部において、絶縁基板1の内面がスルーホール2の内側に突出し、突出部3を形成している。ここで、スルーホール2の縦断面とは、スルーホール2をそのスルーホール2の軸方向に切断したときの断面をいう。これにより、金属導体5の特に大きな上下方向の熱膨張を突出部3で非常に良好に抑制できるので、金属導体5と絶縁基板1との間に剥離が発生したり、絶縁基板1にクラックが生じるのを有効に防止した導通信頼性の高い回路基板を提供できる。   The inner diameter of the through hole 2 gradually decreases from the opening toward the center. Further, in the longitudinal section of the through hole 2, the inner surface of the insulating substrate 1 that forms the inner wall surface of the through hole 2 has a recessed shape between the opening and the center of the through hole 2. In particular, in the circuit board shown in FIG. 1, the inner surface of the insulating substrate 1 protrudes to the inside of the through hole 2 at the center portion of the through hole 2 to form a protruding portion 3. Here, the vertical cross section of the through hole 2 refers to a cross section when the through hole 2 is cut in the axial direction of the through hole 2. As a result, particularly large thermal expansion in the vertical direction of the metal conductor 5 can be suppressed very well by the protrusion 3, so that peeling occurs between the metal conductor 5 and the insulating substrate 1 or cracks are generated in the insulating substrate 1. It is possible to provide a circuit board with high conduction reliability that is effectively prevented from occurring.

また、金属導体5の横方向の熱膨張によって金属導体5と絶縁基板1との界面付近に生じる応力を、平面視してより内側に位置する突出部3の先端付近と、より外側に位置する開口部付近とに分散できるので、各部位の応力が合わさって大きな応力となるのを有効に防止し、絶縁基板1に生じる応力をきわめて小さくできる。   Further, the stress generated in the vicinity of the interface between the metal conductor 5 and the insulating substrate 1 due to the thermal expansion in the lateral direction of the metal conductor 5 is located near the tip of the protruding portion 3 located on the inner side in plan view and on the outer side. Since it can be distributed in the vicinity of the opening, it is possible to effectively prevent the stresses of the respective parts from being combined and become a large stress, and the stress generated in the insulating substrate 1 can be extremely reduced.

さらに、スルーホール2の内径を突出部3から開口に向かうほど漸次大きくなるようにしたことから、金属導体5と絶縁基板1との熱膨張差による応力を分散させて応力が局所的に集中するのを有効に防止することができる。   Furthermore, since the inner diameter of the through hole 2 is gradually increased from the protruding portion 3 toward the opening, the stress due to the difference in thermal expansion between the metal conductor 5 and the insulating substrate 1 is dispersed to locally concentrate the stress. Can be effectively prevented.

さらにまた、突出部3が金属導体5に食い込んだ形状であるので、機械的衝撃下においても金属導体5が脱落することがない高い接続信頼性を有する回路基板を提供することができる。   Furthermore, since the protruding portion 3 has a shape that bites into the metal conductor 5, it is possible to provide a circuit board having a high connection reliability in which the metal conductor 5 does not fall off even under a mechanical impact.

スルーホール2は、例えば絶縁基板1の上下面の開口部となる部分にそれぞれ、従来周知のブラスト法により凹部を形成し、次にこの凹部の底面を同様にブラスト法によって貫通させる方法等により、穿孔を2段階に行うことでスルーホール2の深さ方向の中央部が内側に突出した突出部3を有するとともに、スルーホール2の内径が突出部3から開口に向かうほど漸次大きくなっている形状となる。ここで、スルーホールの深さ方向とは、スルーホールの軸方向に平行な方向をいう。   The through hole 2 is formed by, for example, forming a recess by a conventionally well-known blast method in each of the portions to be the openings on the upper and lower surfaces of the insulating substrate 1 and then penetrating the bottom surface of the recess by the blast method in the same manner. A shape in which the central portion in the depth direction of the through hole 2 has a protruding portion 3 protruding inward by performing drilling in two stages, and the inner diameter of the through hole 2 gradually increases from the protruding portion 3 toward the opening. It becomes. Here, the depth direction of the through hole refers to a direction parallel to the axial direction of the through hole.

スルーホール2は図1のように突出部3の付け根部に屈曲部を有するような形状でもよく、図2のように突出部3の先端からスルーホール2の開口にかけてスルーホール2の内壁面がなだらなに連続した形状でもよい。好ましくは、縦断面図において、突出部3の先端とスルーホール2の開口縁とを結ぶ直線よりもスルーホール2の内壁面が絶縁基板1の外周側に位置している、すなわち、突出部3の先端とスルーホール2の開口縁との間のスルーホール2の内壁面が窪んでいるのがよい。これにより、突出部3の上下面の接線と絶縁基板1の上下面とを平行に近づけることができ、金属導体5の上下方向に対して突出部3をほぼ直交させて金属導体5の上下方向の熱膨張をきわめて効果的に抑制することができる。   The through hole 2 may have a shape having a bent portion at the base of the protruding portion 3 as shown in FIG. 1, and the inner wall surface of the through hole 2 extends from the tip of the protruding portion 3 to the opening of the through hole 2 as shown in FIG. A gently continuous shape may be used. Preferably, in the longitudinal sectional view, the inner wall surface of the through hole 2 is located on the outer peripheral side of the insulating substrate 1 with respect to the straight line connecting the tip of the protruding portion 3 and the opening edge of the through hole 2, that is, the protruding portion 3. The inner wall surface of the through hole 2 between the front end of the through hole 2 and the opening edge of the through hole 2 is preferably recessed. Thereby, the tangent line of the upper and lower surfaces of the projecting portion 3 and the upper and lower surfaces of the insulating substrate 1 can be made parallel to each other, and the projecting portion 3 is made substantially orthogonal to the vertical direction of the metal conductor 5 Can be suppressed very effectively.

また、突出部3はスルーホール2の全周にわたって形成されていてもよく、部分的に形成されていてもよい。金属導体5の上下方向の熱膨張をより有効に抑制するという観点からは、スルーホール2の全周にわたって形成されているのがよい。   Moreover, the protrusion part 3 may be formed over the perimeter of the through hole 2, and may be formed partially. From the viewpoint of more effectively suppressing the thermal expansion in the vertical direction of the metal conductor 5, the metal conductor 5 is preferably formed over the entire circumference of the through hole 2.

突出部3の内側の穴径は20〜100μm以内とすることが好ましい。20μm未満の場合は、熱や電気の抵抗値が大きくなる傾向があり、100μmを超える場合は、絶縁基板1にクラックが発生しやすくなる傾向がある。   It is preferable that the hole diameter inside the protrusion part 3 shall be within 20-100 micrometers. When the thickness is less than 20 μm, the resistance value of heat and electricity tends to increase, and when it exceeds 100 μm, the insulating substrate 1 tends to be cracked.

好ましくは、スルーホール2の突出部3と開口との間における内面を凹曲面形状とするのがよい。これにより、金属導体5の体積を大きくすることができ、より高い熱伝導性の回路基板を提供できる。   Preferably, the inner surface between the projecting portion 3 of the through hole 2 and the opening has a concave curved surface shape. Thereby, the volume of the metal conductor 5 can be enlarged and a circuit board with higher thermal conductivity can be provided.

また、このような突出部3と開口との間におけるスルーホール2の内壁面を凹曲面形状とするためには、ブラストにより絶縁基板1の上下面に凹部を形成する際、ノズル形状を調節して、砥粒が周辺部より中心部で多少多めに噴出するようにすれば良い。具体的には、絶縁基板1の一方の上面にブラスト法により砥粒が周辺部より中心部で多く噴出するようにして上側凹部を形成した後、絶縁基板1の下面の上記上側凹部に対応する位置にブラスト法により砥粒が周辺部より中心部で多く噴出するようにして下側凹部を形成するとともに中央部を貫通すればよい。これは、LED素子搭載用基板等の高出力の素子搭載用回路基板に有効であり、特に高輝度を得るために高電流をかける必要のある一般照明用等のパワー系LED素子を搭載する回路基板に有効である。   Further, in order to make the inner wall surface of the through hole 2 between the protruding portion 3 and the opening have a concave curved surface shape, the nozzle shape is adjusted when the concave portions are formed on the upper and lower surfaces of the insulating substrate 1 by blasting. Thus, the abrasive grains may be ejected slightly more at the center than at the periphery. Specifically, an upper concave portion is formed on one upper surface of the insulating substrate 1 such that abrasive grains are ejected more in the center than in the peripheral portion by blasting, and then corresponds to the upper concave portion on the lower surface of the insulating substrate 1. A lower recess may be formed at a position so that abrasive grains are ejected more at the center than at the periphery by blasting, and the center may be penetrated. This is effective for a circuit board for mounting high-power elements such as a board for mounting LED elements, and particularly a circuit for mounting a power system LED element for general lighting or the like that needs to apply a high current to obtain high brightness. Effective for substrates.

なお、これまでは、スルーホール2の中央部に突出部3を形成した構成、および突出部3とスルーホール2の開口部との間におけるスルーホール2の内壁面を凹曲面形状にする構成を例に挙げて説明したが、スルーホール2の深さ方向の中央部の内径を開口部の内径よりも小さくするとともに、スルーホール2の中央部から開口部に向かって上記深さ方向に対するスルーホール2の内壁面の傾斜角度を複数回変化させた構成であれば、絶縁基板の上面から下面にかけて形成した金属導体にボイドが生じたり、金属導体と絶縁基板とが剥離したり、絶縁基板にクラックが生じたりするのを抑制することのできる導通信頼性の高い回路基板を実現することができる。   In addition, until now, the structure which formed the protrusion part 3 in the center part of the through-hole 2, and the structure which makes the inner wall surface of the through-hole 2 between the protrusion part 3 and the opening part of the through-hole 2 into a concave curved surface shape As described above by way of example, the inner diameter of the through hole 2 in the center in the depth direction is made smaller than the inner diameter of the opening, and the through hole in the depth direction from the center of the through hole 2 toward the opening If the inclination angle of the inner wall surface of 2 is changed a plurality of times, voids are generated in the metal conductor formed from the upper surface to the lower surface of the insulating substrate, the metal conductor and the insulating substrate are peeled off, or the insulating substrate is cracked. Thus, it is possible to realize a circuit board with high conduction reliability capable of suppressing the occurrence of the above.

ここで、スルーホール2の深さ方向に対するスルーホール2の内壁面の傾斜角度を複数回連続的に変化させた場合には、その変化させた領域において内壁面は曲面になる。例えば、図2に示されたスルーホール2の内壁面の形状は、上記傾斜角度がスルーホール2の中央部において最大、好ましくは90度になるように、スルーホール2の開口部から中央部に向けて上記傾斜角度を連続的に増大させた場合の形状である。   Here, when the inclination angle of the inner wall surface of the through hole 2 with respect to the depth direction of the through hole 2 is continuously changed a plurality of times, the inner wall surface becomes a curved surface in the changed region. For example, the shape of the inner wall surface of the through hole 2 shown in FIG. 2 is from the opening of the through hole 2 to the center so that the inclination angle is maximum at the center of the through hole 2, preferably 90 degrees. This is a shape when the inclination angle is continuously increased.

また、上記内壁面の傾斜角度を変化させた構成であれば、スルーホール2の内壁面を平坦にしたときよりも、機械的衝撃下における金属導体5の脱落を抑制することができるため、高い接続信頼性を有する回路基板を実現することができる。   Further, if the inclination angle of the inner wall surface is changed, dropout of the metal conductor 5 under a mechanical impact can be suppressed more than when the inner wall surface of the through hole 2 is flattened. A circuit board having connection reliability can be realized.

また、金属導体5は例えば、電解めっき法や無電解めっき法により、金属ペーストを埋め込むことにより、金属ペーストを埋め込んだ後に焼成することよりスルーホール2内に充填される。この場合、金属導体5は銅,銀,およびチタンのうちの少なくとも1種から成るのが良い。そのなかでも銅が最も良い、金属導体5を銅めっきによりスルーホール2内に充填することで、表裏面の電気抵抗が小さく、更には熱放散性の良い回路基板を得ることができる。   Further, the metal conductor 5 is filled in the through hole 2 by embedding the metal paste, for example, by embedding the metal paste by an electrolytic plating method or an electroless plating method. In this case, the metal conductor 5 may be made of at least one of copper, silver, and titanium. Of these, copper is the best, and the metal conductor 5 is filled in the through hole 2 by copper plating, whereby a circuit board with low electrical resistance on the front and back surfaces and excellent heat dissipation can be obtained.

好ましくは金属導体は、めっき法により形成されるのがよい。これにより、スルーホール2の内径が小さい突出部3の内側からめっきを良好に成長させ、スルーホール2の深さ方向の中央部から上下の開口に順に金属導体5を形成させることができるので、金属導体5の内部や金属導体5とスルーホール2内面との間にボイドが生じるのを有効に防止することができる。   Preferably, the metal conductor is formed by a plating method. Thereby, since plating can be favorably grown from the inside of the protruding portion 3 having a small inner diameter of the through hole 2 and the metal conductor 5 can be formed in order from the center in the depth direction of the through hole 2 to the upper and lower openings, It is possible to effectively prevent voids from being formed inside the metal conductor 5 or between the metal conductor 5 and the inner surface of the through hole 2.

また、好ましくは、スルーホール2内面にスパッタリング法や蒸着法などによりチタン,クロム,アルミニウム,モリブデン,タングステン,銅およびニッケル−クロム合金のうちの少なくとも1種から成る接合金属層2を被着させるのがよい。これにより、スルーホール内壁面と金属導体5とを高い強度で密着させることができ、高信頼性の回路基板を得ることができる。   Preferably, the bonding metal layer 2 made of at least one of titanium, chromium, aluminum, molybdenum, tungsten, copper and nickel-chromium alloy is deposited on the inner surface of the through hole 2 by sputtering or vapor deposition. Is good. Thereby, the inner wall surface of the through hole and the metal conductor 5 can be adhered with high strength, and a highly reliable circuit board can be obtained.

接続金属層4は、例えばチタンと銅を連続してスパッタリング法により順次成膜し、これらの金属によりスルーホール2内壁面に形成された接続金属層4は、金属導体5と絶縁基板1との密着金属として、および金属導体5をめっきにより充填する際の導通膜として用いられ、この場合、接続金属層4のチタンの厚みは0.05〜0.15μmが良い。これを下回る場合は絶縁基板1との密着性が低下しやすくなり、上回る場合は、接続金属層4であるチタン等が金属導体5中へ拡散し、導通抵抗にバラツキが発生しやすくなる。   The connection metal layer 4 is formed, for example, by successively depositing titanium and copper sequentially by sputtering, and the connection metal layer 4 formed on the inner wall surface of the through hole 2 by these metals is formed between the metal conductor 5 and the insulating substrate 1. It is used as a close contact metal and as a conductive film when the metal conductor 5 is filled by plating. In this case, the thickness of titanium of the connection metal layer 4 is preferably 0.05 to 0.15 μm. If the thickness is less than this, the adhesion to the insulating substrate 1 is likely to be lowered, and if it is greater, titanium or the like that is the connection metal layer 4 diffuses into the metal conductor 5 and the conduction resistance is likely to vary.

また、スルーホール2に金属導体5を埋め込んだ後、絶縁基板1の両主面を必要に応じて研磨し、前記絶縁基板1の上下面に従来周知の薄膜形成技術により配線導体層6を金属導体5と電気的に接続するように形成してもよい。これにより、絶縁基板1の上下面に電子部品を搭載するための電極を形成でき、電子部品との電気的な接続を良好にすることができる。   Further, after embedding the metal conductor 5 in the through hole 2, both the main surfaces of the insulating substrate 1 are polished if necessary, and the wiring conductor layer 6 is formed on the upper and lower surfaces of the insulating substrate 1 by a conventionally well-known thin film forming technique. You may form so that it may electrically connect with the conductor 5. FIG. Thereby, the electrode for mounting an electronic component can be formed in the upper and lower surfaces of the insulated substrate 1, and electrical connection with an electronic component can be made favorable.

なお、本発明は上記実施の形態に限定されるものではなく、本発明の要旨を逸脱しない範囲内で種々の変更を行うことは何等差し支えない。   Note that the present invention is not limited to the above-described embodiment, and various modifications may be made without departing from the scope of the present invention.

本発明の回路基板の実施の形態の一例を示す断面図である。It is sectional drawing which shows an example of embodiment of the circuit board of this invention. 本発明の回路基板の実施の形態の他の例を示す断面図である。It is sectional drawing which shows the other example of embodiment of the circuit board of this invention.

符号の説明Explanation of symbols

1 :絶縁基板
2 :スルーホール
3 :突出部
4 :接続金属層
5 :金属導体
1: Insulating substrate
2: Through hole 3: Projection 4: Connection metal layer 5: Metal conductor

Claims (10)

絶縁基板に形成したスルーホールを金属導体で充填して成る回路基板において、前記スルーホールの深さ方向の中央部の内径を開口部の内径よりも小さくするとともに、前記スルーホールの中央部から開口部に向かって前記深さ方向に対する該スルーホールの内壁面の傾斜角度を複数回変化させたことを特徴とする回路基板。 In a circuit board formed by filling a through hole formed in an insulating substrate with a metal conductor, the inner diameter of the central portion in the depth direction of the through hole is made smaller than the inner diameter of the opening, and the opening is opened from the central portion of the through hole. A circuit board, wherein the inclination angle of the inner wall surface of the through hole with respect to the depth direction is changed a plurality of times toward the portion. 前記スルーホールの内径を前記スルーホールの中央部から開口部に向かうほど漸次大きくなるようにしたことを特徴とする請求項1記載の回路基板。 The circuit board according to claim 1, wherein an inner diameter of the through hole is gradually increased from a central portion of the through hole toward an opening. 前記スルーホールの縦断面形状において前記開口部から中央部に向かう前記絶縁基板の内面を窪ませたことを特徴とする請求項1又は2記載の回路基板。 3. The circuit board according to claim 1, wherein an inner surface of the insulating substrate is recessed from the opening toward the center in the longitudinal sectional shape of the through hole. 前記スルーホールの深さ方向の中央部に位置する前記絶縁基板の内面を前記スルーホールの内側に突出させて突出部を形成したことを特徴とする請求項1乃至請求項3のいずれかに記載の回路基板。 4. The protruding portion is formed by projecting an inner surface of the insulating substrate located at a center portion in a depth direction of the through hole to the inside of the through hole. 5. Circuit board. 前記窪ませた絶縁基板の内面を凹曲面形状としたことを特徴とする請求項3または請求項4記載の回路基板。 5. The circuit board according to claim 3, wherein an inner surface of the recessed insulating substrate has a concave curved surface shape. 前記スルーホールにおける前記絶縁基板の内面にチタン,クロム,アルミニウム,モリブデン,タングステン,銅およびニッケル−クロム合金のうちの少なくとも1種から成る接合金属層を被着したことを特徴とする請求項1乃至請求項5のいずれかに記載の回路基板。 2. A bonding metal layer made of at least one of titanium, chromium, aluminum, molybdenum, tungsten, copper, and nickel-chromium alloy is deposited on the inner surface of the insulating substrate in the through hole. The circuit board according to claim 5. 前記金属導体は、銅,銀,およびチタンのうちの少なくとも1種から成ることを特徴とする請求項1乃至請求項6のいずれかに記載の回路基板。 The circuit board according to claim 1, wherein the metal conductor is made of at least one of copper, silver, and titanium. 前記金属導体は、めっき法により形成されることを特徴とする請求項1乃至請求項7のいずれかに記載の回路基板。 The circuit board according to claim 1, wherein the metal conductor is formed by a plating method. 絶縁基板に形成したスルーホールを金属導体で充填して成る回路基板において、前記スルーホールの深さ方向の中央部の内径を開口部の内径よりも小さくするとともに、前記スルーホールの中央部から開口部に向かって前記深さ方向に対する該スルーホールの内壁面の傾斜角度を連続的に変化させたことを特徴とする回路基板。 In a circuit board formed by filling a through hole formed in an insulating substrate with a metal conductor, the inner diameter of the central portion in the depth direction of the through hole is made smaller than the inner diameter of the opening, and the opening is opened from the central portion of the through hole. A circuit board, wherein the inclination angle of the inner wall surface of the through hole with respect to the depth direction is continuously changed toward the portion. 絶縁基板の一方主面にブラスト法により砥粒が周辺部より中心部で多く噴出するようにして上側凹部を形成した後、前記絶縁基板の他方主面の前記上側凹部に対応する位置にブラスト法により砥粒が周辺部より中心部で多く噴出するようにして下側凹部を形成するとともに中央部を貫通されることにより、深さ方向の中央部の内径を開口部の内径よりも小さくするとともに縦断面形状において開口部から中央部に向かう前記絶縁基板の内面を窪ませたスルーホールを形成する工程を具備することを特徴とする回路基板の製造方法。 After forming an upper concave portion on one main surface of the insulating substrate by blasting so that abrasive grains are ejected more in the center than on the peripheral portion, blasting is performed at a position corresponding to the upper concave portion on the other main surface of the insulating substrate. By forming a lower concave portion so that abrasive grains are ejected more in the central portion than in the peripheral portion and penetrating the central portion, the inner diameter of the central portion in the depth direction is made smaller than the inner diameter of the opening portion. A method of manufacturing a circuit board, comprising the step of forming a through hole in which the inner surface of the insulating substrate is recessed from the opening toward the center in the longitudinal sectional shape.
JP2006050981A 2005-04-13 2006-02-27 Circuit board and its manufacturing method Pending JP2006319314A (en)

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