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JP2006233256A - Mask clamp-moving mechanism, and film deposition apparatus - Google Patents

Mask clamp-moving mechanism, and film deposition apparatus Download PDF

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Publication number
JP2006233256A
JP2006233256A JP2005047812A JP2005047812A JP2006233256A JP 2006233256 A JP2006233256 A JP 2006233256A JP 2005047812 A JP2005047812 A JP 2005047812A JP 2005047812 A JP2005047812 A JP 2005047812A JP 2006233256 A JP2006233256 A JP 2006233256A
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Japan
Prior art keywords
mask
expansion
clamp
contraction means
chuck
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JP2005047812A
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Japanese (ja)
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JP4609754B2 (en
Inventor
Tatsuya Kataoka
達哉 片岡
Kenji Nagao
兼次 長尾
Kenichi Saito
謙一 斉藤
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NIPPON BIITEC KK
Mitsui Engineering and Shipbuilding Co Ltd
Choshu Industry Co Ltd
Original Assignee
NIPPON BIITEC KK
Mitsui Engineering and Shipbuilding Co Ltd
Choshu Industry Co Ltd
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Application filed by NIPPON BIITEC KK, Mitsui Engineering and Shipbuilding Co Ltd, Choshu Industry Co Ltd filed Critical NIPPON BIITEC KK
Priority to JP2005047812A priority Critical patent/JP4609754B2/en
Priority to PCT/JP2006/303188 priority patent/WO2006090746A1/en
Priority to KR1020077016159A priority patent/KR100947572B1/en
Priority to CN2006800015547A priority patent/CN101090993B/en
Priority to TW095105912A priority patent/TW200641549A/en
Publication of JP2006233256A publication Critical patent/JP2006233256A/en
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Publication of JP4609754B2 publication Critical patent/JP4609754B2/en
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • C23C14/042Coating on selected surface areas, e.g. using masks using masks
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12Organic material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50Substrate holders

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a mask clamp-moving mechanism to divide the movement of a mask clamp into a plurality of portions, and a film deposition apparatus having the mechanism. <P>SOLUTION: In a moving mechanism of a mask clamp 20 in a film deposition apparatus for manufacturing an organic EL element, the moving mechanism of the mask clamp 20 comprises a chuck 16 which is arranged facing an evaporation source 14 of an organic material 12 while a substrate overlaps a mask 34, the mask clamp 20 which has a tip part 20a in a hook shape, and retains the mask 34 overlapping the chuck 16 by the tip part 20a, and an expansion means 22 to move a substrate clamp 18. In the expansion means 22, a first expansion means 24 is arranged on an apparatus body 11, a first rod to perform the expansion/contraction is connected to a plate member 23, a second expansion means 26 is arranged on the plate member 23, and a second rod to perform the expansion/contraction is connected to or brought into contact with a base end of the substrate clamp 18. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明はマスククランプの移動機構および成膜装置に係り、特に有機EL素子を製造する成膜装置に用いられるマスククランプの移動機構に関する。   The present invention relates to a mask clamp moving mechanism and a film forming apparatus, and more particularly to a mask clamp moving mechanism used in a film forming apparatus for manufacturing an organic EL element.

有機EL(Electroluminescent)素子を製造する成膜装置には、例えば真空蒸着装置が用いられる。図8は真空蒸着装置上部の説明図である。真空蒸着装置1には、底部に有機材料の蒸発源(不図示)が設けられており、この蒸発源に対面する装置の上部にチャック2が設けられている。チャック2は、ガラス基板3を平面に維持する平板であり、装置本体の外部に設けられた回転機構により回転可能となっている。そしてチャック2の周囲には、マスクを保持するマスククランプ4が昇降可能に設けられている。なおマスクには、ガラス基板3表面に有機EL素子のパターン(画素)を形成するための開口パターンが形成されている。   For example, a vacuum deposition apparatus is used as a film forming apparatus for manufacturing an organic EL (Electroluminescent) element. FIG. 8 is an explanatory view of the upper part of the vacuum deposition apparatus. The vacuum evaporation apparatus 1 is provided with an evaporation source (not shown) of an organic material at the bottom, and a chuck 2 is provided at the upper part of the apparatus facing the evaporation source. The chuck 2 is a flat plate that keeps the glass substrate 3 flat, and can be rotated by a rotation mechanism provided outside the apparatus main body. A mask clamp 4 for holding the mask is provided around the chuck 2 so as to be movable up and down. The mask has an opening pattern for forming an organic EL element pattern (pixel) on the surface of the glass substrate 3.

マスククランプ4は、その上端部が装置本体の外部に突き出ており、その上端に接続部材5が配設されている。また接続部材5の下方には、シリンダ6が設けられており、一方が装置本体の上部に接続され、他方が板部材7に接続されている。この板部材7は、接続部材5と接触可能に設けられている。そしてシリンダ6の伸縮動作による板部材7の上下移動に伴って、接続部材5が上下移動し、マスククランプ4が上下に移動する。   The mask clamp 4 has an upper end protruding outside the apparatus main body, and a connection member 5 is disposed at the upper end. A cylinder 6 is provided below the connection member 5, one of which is connected to the upper part of the apparatus main body and the other is connected to the plate member 7. The plate member 7 is provided so as to be in contact with the connection member 5. As the plate member 7 moves up and down due to the expansion and contraction of the cylinder 6, the connection member 5 moves up and down, and the mask clamp 4 moves up and down.

なおシリンダの伸縮動作により、マスククランプを上下に移動させることについて開示された文献は不知である。   In addition, the literature disclosed about moving a mask clamp up and down by the expansion-contraction operation | movement of a cylinder is unknown.

マスククランプの上下移動する範囲は、上限がガラス基板に接触する位置であり、下限が基板搬送機構と接触することのない位置になっている。この基板搬送機構は、ガラス基板を真空蒸着装置の外部から内部に挿入して基板クランプ上に載せるとともに、パターンが成膜されたガラス基板を装置の外部へ取り出すものである。したがってマスククランプと前記基板搬送機構とが接触しないために、マスククランプを上下に移動させるシリンダのストロークは、大きいものが必要であった。   The upper and lower range of the mask clamp is a position where the upper limit is in contact with the glass substrate, and the lower limit is a position where the lower limit is not in contact with the substrate transport mechanism. This substrate transport mechanism inserts a glass substrate from the outside of the vacuum deposition apparatus and places it on the substrate clamp, and takes out the glass substrate on which the pattern is formed to the outside of the apparatus. Accordingly, since the mask clamp and the substrate transport mechanism do not come into contact with each other, the cylinder stroke for moving the mask clamp up and down needs to be large.

ところで、ガラス基板が装置内に挿入されてチャックに装着固定された後には、ガラス基板の所定位置に有機EL素子のパターンを形成するために、マスクとガラス基板との位置合わせが行われる。この位置合わせは、アライメントアームに載せられたマスクとガラス基板とが接触しない距離、すなわち距離が少しでも空いていればよいので、僅かな距離をおいて行われている。   By the way, after the glass substrate is inserted into the apparatus and mounted and fixed on the chuck, the mask and the glass substrate are aligned in order to form a pattern of the organic EL element at a predetermined position of the glass substrate. This alignment is performed at a slight distance because it is sufficient that the mask placed on the alignment arm and the glass substrate do not contact each other, that is, the distance may be as small as possible.

この位置合わせのときには、マスクを固定するマスククランプは、ストロークの調整できないエアシリンダを用いているから、2段動作ができないので移動範囲の最下限に位置することとなり、位置合わせ終了後に上昇を開始するとマスクをガラス基板上に固定するまで長い距離を移動することになる。したがって長い距離を移動するためには多くの時間が必要になるので、製造スピードが遅くなり、製造効率が低くなっていた。   At the time of this alignment, the mask clamp that fixes the mask uses an air cylinder that cannot adjust the stroke. Then, a long distance is moved until the mask is fixed on the glass substrate. Therefore, since it takes a lot of time to move a long distance, the manufacturing speed is slow and the manufacturing efficiency is low.

またガラス基板は、ガラス基板上に成膜される有機薄膜の厚さを基板面内で均一にするために、水平方向に回転される。したがってガラス基板を回転させるために、チャックやマスク、マスクホルダー等を回転させなければならないので、回転機構を真空蒸着装置の上部に配設しなければならない。しかし真空蒸着装置には、装置に設けられた各機構を駆動させるための配線等が複雑に接続されているので、回転機構の軸上においてマスククランプを複数段階に分割して昇降させる機構を設けることは困難とされていた。   Further, the glass substrate is rotated in the horizontal direction in order to make the thickness of the organic thin film formed on the glass substrate uniform within the substrate surface. Therefore, in order to rotate the glass substrate, the chuck, the mask, the mask holder, and the like must be rotated. Therefore, the rotating mechanism must be disposed on the upper part of the vacuum deposition apparatus. However, since the vacuum vapor deposition apparatus is complicatedly connected with wiring for driving each mechanism provided in the apparatus, a mechanism for dividing the mask clamp in multiple stages on the axis of the rotation mechanism is provided. It was considered difficult.

本発明は、マスククランプの移動量を複数に分割するマスククランプの移動機構を提供することを目的とする。
また本発明は、マスククランプの移動機構を備えた成膜装置を提供することを目的とする。
An object of this invention is to provide the moving mechanism of the mask clamp which divides | segments the moving amount | distance of a mask clamp into plurality.
Another object of the present invention is to provide a film forming apparatus having a mask clamp moving mechanism.

上記目的を達成するために、本発明に係るマスククランプの移動機構は、有機EL素子を製造するための成膜装置におけるマスククランプの移動機構であって、有機材料の蒸発源に対向して配設され、基板とマスクとが重ね合わされるチャックと、前記チャックに重ね合わされた前記マスクを保持するマスククランプと、基板クランプを移動させる伸縮手段とを備え、前記伸縮手段は、第1伸縮手段を装置本体に配設するとともに、伸縮動作をなす第1ロッドを板部材に接続し、第2伸縮手段を前記板部材に配設するとともに、伸縮動作をなす第2ロッドを前記基板クランプの基端部に接続または接触させてなる、ことを特徴としている。
この場合、前記伸縮手段は、エアシリンダ、油圧シリンダまたはアクチュエータとすることができる。
In order to achieve the above object, a mask clamp moving mechanism according to the present invention is a mask clamp moving mechanism in a film forming apparatus for manufacturing an organic EL element, and is arranged to face an evaporation source of an organic material. A chuck on which the substrate and the mask are overlaid, a mask clamp for holding the mask overlaid on the chuck, and an expansion / contraction means for moving the substrate clamp, wherein the expansion / contraction means includes the first expansion / contraction means. A first rod that performs expansion / contraction operation is connected to the plate member, a second expansion / contraction means is disposed on the plate member, and a second rod that performs expansion / contraction operation is connected to the base end of the substrate clamp. It is characterized by being connected or in contact with the part.
In this case, the expansion / contraction means can be an air cylinder, a hydraulic cylinder or an actuator.

また本発明に係る成膜装置は、有機EL素子を製造するための成膜装置であって、有機材料の供給源に対向して基板を保持するチャックを配設し、前記有機EL素子のパターンが形成されたマスクの保持手段となるマスククランプを前記チャックの側縁に沿って上下移動可能に配設し、前記マスククランプの基端部の下部に伸縮手段を重ねて配設し、前記チャック、前記マスククランプおよび前記伸縮手段を水平方向に回転させる回転機構を前記装置本体に設けた、ことを特徴としている。   The film forming apparatus according to the present invention is a film forming apparatus for manufacturing an organic EL element, and is provided with a chuck for holding a substrate facing an organic material supply source, and the pattern of the organic EL element. A mask clamp serving as a holding means for the mask formed on the chuck is disposed so as to be vertically movable along a side edge of the chuck, and an expansion / contraction means is disposed under the base end portion of the mask clamp, The apparatus main body is provided with a rotation mechanism for rotating the mask clamp and the expansion / contraction means in the horizontal direction.

また重ねて配設された前記伸縮手段は、一端を前記装置本体に接続し、第1ロッドを板部材に接続した第1伸縮手段と、前記板部材に配設され、第2ロッドを前記接続部材に接続または接触した第2伸縮手段と、を備えたことを特徴としている。   In addition, the extending and retracting means arranged in an overlapped manner is connected to the first main expanding and contracting means in which one end is connected to the apparatus body and the first rod is connected to the plate member, and the second rod is connected to the plate member. And a second expansion / contraction means connected to or in contact with the member.

マスククランプの移動機構は、伸縮手段が伸縮すると、これに接続または接触されている接続部材が上下に移動する。すなわち第1伸縮手段および第2伸縮手段の少なくとも1つを伸縮動作させると、この動作に伴ってマスククランプも上下に移動する。したがって各伸縮手段の伸縮動作を独立に制御すると、マスククランプの移動量を2段階に分割することができる。   In the movement mechanism of the mask clamp, when the expansion / contraction means expands / contracts, the connecting member connected to or in contact with the expansion / contraction means moves up and down. That is, when at least one of the first expansion / contraction means and the second expansion / contraction means is expanded / contracted, the mask clamp is also moved up and down in accordance with this operation. Therefore, if the expansion / contraction operation of each expansion / contraction means is controlled independently, the movement amount of the mask clamp can be divided into two stages.

また伸縮手段の伸縮動作は、エアシリンダ、油圧シリンダまたはアクチュエータに設けられたシリンダロッドを伸縮させることにより行うことができる。
そして有機EL素子の製造時において、マスクと基板との位置決め中に第2伸縮手段を縮めた状態で第1伸縮手段を伸ばし、前記位置決め終了後に第1伸縮手段および第2伸縮手段を伸ばすと、位置決め終了後のマスククランプの移動量が短くなるので、有機EL素子の製造時間を短縮できる。
The expansion / contraction operation of the expansion / contraction means can be performed by extending / contracting a cylinder rod provided in the air cylinder, hydraulic cylinder or actuator.
Then, during the manufacture of the organic EL element, the first expansion / contraction means is extended while the second expansion / contraction means is contracted during the positioning of the mask and the substrate, and after the positioning is completed, the first expansion / contraction means and the second expansion / contraction means are extended, Since the amount of movement of the mask clamp after completion of positioning is shortened, the manufacturing time of the organic EL element can be shortened.

以下に、本発明に係るマスククランプの移動機構および成膜装置の最良の実施形態について説明する。なお以下では、成膜装置として真空蒸着装置を用いた形態について説明する。図1は真空蒸着装置の説明図である。図2はマスククランプの概略平面図である。真空蒸着装置10は、装置本体11の底部に有機材料12の蒸発源14(昇華源)を備えるとともに、装置本体11の上部にチャック16、基板クランプ18、マスククランプ20、伸縮手段22およびマスククランプ28等を備えた構成である。   The best mode of the mask clamp moving mechanism and film forming apparatus according to the present invention will be described below. In the following, an embodiment using a vacuum vapor deposition apparatus as a film forming apparatus will be described. FIG. 1 is an explanatory diagram of a vacuum deposition apparatus. FIG. 2 is a schematic plan view of the mask clamp. The vacuum evaporation apparatus 10 includes an evaporation source 14 (sublimation source) of the organic material 12 at the bottom of the apparatus main body 11, and a chuck 16, a substrate clamp 18, a mask clamp 20, an expansion / contraction means 22, and a mask clamp at the top of the apparatus main body 11. It is the structure provided with 28 grade | etc.,.

具体的には、有機材料12の蒸発源14は、有機材料12が入れられるるつぼ14aを備えており、るつぼ14aの外面に有機材料12を加熱・蒸発(昇華)させるヒーター14bが設けられている。また装置本体11の内側上部に設けられたチャック16は、るつぼ14aに対面して配設されており、水平方向に沿って配置された平板である。そしてチャック16は、装置本体11の外側上部に設けられた回転機構30によって水平回転可能となっている。   Specifically, the evaporation source 14 of the organic material 12 includes a crucible 14a in which the organic material 12 is placed, and a heater 14b that heats and evaporates (sublimates) the organic material 12 is provided on the outer surface of the crucible 14a. . Further, the chuck 16 provided on the inner upper side of the apparatus main body 11 is a flat plate arranged in the horizontal direction so as to face the crucible 14a. The chuck 16 can be horizontally rotated by a rotation mechanism 30 provided on the outer upper portion of the apparatus main body 11.

基板クランプ18は、装置本体11の上部から下方に向かって延び、下方の先端部18cがチャック16側(真空蒸着装置10の中央側)に向けて折り曲げられた鉤型であり、チャック16の側縁に沿って複数個が配設されている。この基板クランプ18は、その先端部18c(折曲げ部)でガラス基板32の縁部を支えるために、各先端部18cが同じ高さ(同一面内)になるように設定されている。また基板クランプ18は、装置本体11の外側上部に設けられた昇降機構(不図示)によって、各先端部18cが同一面内にある状態を維持しつつ昇降可能になっている。そして基板クランプ18が上昇することによって、ガラス基板32をチャック16に接触させて、平面状に装着保持させることが可能になっている。   The substrate clamp 18 extends downward from the upper part of the apparatus main body 11, and has a vertical shape in which a lower end 18 c is bent toward the chuck 16 side (center side of the vacuum deposition apparatus 10). A plurality are arranged along the edge. The substrate clamp 18 is set so that the tip portions 18c have the same height (in the same plane) in order to support the edge portion of the glass substrate 32 at the tip portion 18c (bending portion). The substrate clamp 18 can be moved up and down by an elevating mechanism (not shown) provided on the outer upper portion of the apparatus main body 11 while maintaining the state in which the tip portions 18c are in the same plane. When the substrate clamp 18 is raised, the glass substrate 32 can be brought into contact with the chuck 16 and mounted and held in a flat shape.

マスククランプ20は、装置本体11の上部から下方に向かって延び、下方の先端部20aがチャック16側(真空蒸着装置10の中央側)に向けて折り曲げられた鉤型であり、チャック16や基板クランプ18の側縁に沿って複数個が配設されている。このマスククランプ20は、下方の先端部20a(折曲げ部)でマスク34の縁部を支えるために、下方の各先端部20aが同じ高さ(同一面内)になるように設定されている。なおマスク34は、有機EL素子の各画素に対応する開口パターンが複数設けられたマスクフィルム34aと、マスクフィルム34aの周縁部を保持する枠型のマスクフレーム34bとを備えている。   The mask clamp 20 is a saddle type that extends downward from the upper part of the apparatus main body 11 and has a lower tip 20a bent toward the chuck 16 (center side of the vacuum deposition apparatus 10). A plurality are arranged along the side edge of the clamp 18. The mask clamp 20 is set so that the lower tip portions 20a have the same height (in the same plane) in order to support the edge portion of the mask 34 with the lower tip portion 20a (folded portion). . The mask 34 includes a mask film 34a provided with a plurality of opening patterns corresponding to each pixel of the organic EL element, and a frame-shaped mask frame 34b that holds the peripheral edge of the mask film 34a.

またマスククランプ20の上方の先端部20bは、装置本体11の外部に突設されており、上方の各先端部20bには接続部材20cが配設されている。そして上方の先端部20bと接続部材20cとが、マスククランプ20の基端部となる。この接続部材20cを上下移動させることによって、接続部材20cに接続されている各マスククランプ20が上下移動される。これによりマスククランプ20の下方に設けられた各先端部20aが同一面内にある状態を維持しつつ昇降可能になっている。   Further, the upper end portion 20b above the mask clamp 20 protrudes outside the apparatus main body 11, and a connecting member 20c is disposed at each upper end portion 20b. The upper tip 20b and the connecting member 20c are the base end of the mask clamp 20. By moving the connecting member 20c up and down, each mask clamp 20 connected to the connecting member 20c is moved up and down. As a result, it is possible to move up and down while maintaining the state in which the tip portions 20a provided below the mask clamp 20 are in the same plane.

さらに接続部材20cの下方には、接続部材20cを昇降させる伸縮手段22が設けられている。すなわち接続部材20cと伸縮手段22とは、対向して配置されている。この伸縮手段22は、第1伸縮手段24および第2伸縮手段26を備えており、第1伸縮手段24および第2伸縮手段26は、例えばエアシリンダや油圧シリンダ、アクチュエータ等であればよい。なおエアシリンダを用いると、メンテナンスが容易である。第1伸縮手段24は、一端が装置本体11の上部に接続されており、他端24aが板部材23に接続されている。より具体的には、複数の第1伸縮手段24(シリンダ本体)がチャック16の回転方向に沿って装置本体11の外側上部に配設されており、各他端24a(第1ロッド)を板部材23で接続した構成である。そして第1伸縮手段24の伸縮動作に伴って、板部材23が上下に移動される。   Further, below the connection member 20c, an expansion / contraction means 22 for moving the connection member 20c up and down is provided. That is, the connecting member 20c and the expansion / contraction means 22 are disposed to face each other. The expansion / contraction means 22 includes a first expansion / contraction means 24 and a second expansion / contraction means 26. The first expansion / contraction means 24 and the second expansion / contraction means 26 may be, for example, an air cylinder, a hydraulic cylinder, an actuator, or the like. When an air cylinder is used, maintenance is easy. One end of the first expansion / contraction means 24 is connected to the upper part of the apparatus main body 11, and the other end 24 a is connected to the plate member 23. More specifically, a plurality of first expansion / contraction means 24 (cylinder main body) are arranged on the outer upper part of the apparatus main body 11 along the rotation direction of the chuck 16, and each other end 24 a (first rod) is connected to the plate. In this configuration, the members 23 are connected. The plate member 23 is moved up and down in accordance with the expansion / contraction operation of the first expansion / contraction means 24.

この板部材23には、第2伸縮手段26が配設されており、他端26aが接続部材20cに接続または接触している。より具体的には、複数の第2伸縮手段26(シリンダ本体)は、板部材23の下側に配設されており、他端26a(第2ロッド)が板部材23に設けられた孔部(不図示)を介して上方に延びており、その先端部が接続部材20cに接続または接触している。そして第2伸縮手段26および第1伸縮手段24の少なくとも一方の伸縮動作に伴って、接続部材20cが上下に移動される。   The plate member 23 is provided with second expansion / contraction means 26, and the other end 26a is connected to or in contact with the connection member 20c. More specifically, the plurality of second expansion / contraction means 26 (cylinder main body) is disposed below the plate member 23, and the other end 26 a (second rod) is a hole provided in the plate member 23. It extends upward via (not shown), and its tip is connected to or in contact with the connecting member 20c. The connection member 20c is moved up and down in accordance with at least one of the second expansion / contraction means 26 and the first expansion / contraction means 24.

そして基板クランプ18、マスククランプ20および伸縮手段22は、装置本体11の外側上部に設けられた回転機構30によって、チャック16とともに回転することが可能になっている。   The substrate clamp 18, the mask clamp 20, and the expansion / contraction means 22 can be rotated together with the chuck 16 by a rotation mechanism 30 provided on the outer upper part of the apparatus main body 11.

マスククランプ28は、チャック16と蒸発源14との間において、チャック16に対面するよう配設されており、その構成はマスク34の縁部(マスクフレーム34b)に対応して前記マスク34の側方から延設された延設部28aと、この延設部28aの先端部に設けられた嵌合ピン28bとを有するものである。より具体的には、延設部28aは、マスク34の縁部を支えるものであり、チャック16の側縁に沿ってマスククランプ20を挟み込む位置に配設され、且つ鉤型に形成されたマスククランプ20の先端部に沿ってマスク34の外側からマスク34の縁部まで延ばされている。この延設部28aの先端部には、マスク34の嵌合穴34cと嵌め合わされる嵌合ピン28bが設けられている。なお実施形態によっては、延設部28aの先端部に嵌合穴が設けられ、マスク34に嵌合ピンが設けられた形態であってもよい。また一方のマスククランプ20を両側から挟み込むように配設された各延設部28aの基端部はそれぞれ接続されている。なお図2に示す形態では、延設部28aは、マスク34の各角部を支えるようにマスク34の外側から延設されている。そしてマスククランプ28は、真空蒸着装置10に対する基準位置にあるので、嵌合穴34cと嵌合ピン28bとが嵌め合うようにマスク34をマスククランプ28上に載せると、マスク34は真空蒸着装置10に対して位置決めされる。   The mask clamp 28 is disposed between the chuck 16 and the evaporation source 14 so as to face the chuck 16, and the configuration thereof corresponds to the edge of the mask 34 (mask frame 34 b), and is on the side of the mask 34. It has the extended part 28a extended from the direction, and the fitting pin 28b provided in the front-end | tip part of this extended part 28a. More specifically, the extending portion 28a supports the edge of the mask 34, is disposed at a position where the mask clamp 20 is sandwiched along the side edge of the chuck 16, and is formed in a bowl shape. It extends from the outside of the mask 34 to the edge of the mask 34 along the tip of the clamp 20. A fitting pin 28b that fits into the fitting hole 34c of the mask 34 is provided at the tip of the extended portion 28a. In some embodiments, a fitting hole may be provided at the tip of the extended portion 28a, and a fitting pin may be provided on the mask 34. Further, the base end portions of the extending portions 28a arranged so as to sandwich one mask clamp 20 from both sides are connected to each other. In the form shown in FIG. 2, the extending portion 28 a extends from the outside of the mask 34 so as to support each corner portion of the mask 34. Since the mask clamp 28 is at the reference position with respect to the vacuum deposition apparatus 10, when the mask 34 is placed on the mask clamp 28 so that the fitting hole 34c and the fitting pin 28b are fitted, the mask 34 is placed in the vacuum deposition apparatus 10. Is positioned with respect to.

次に、マスククランプ20の移動機構の動作および真空蒸着装置10の動作について説明する。なお以下では、チャック16、基板クランプ18、マスククランプ20およびマスククランプ28を装置上部機構という場合がある。図3は装置上部機構が基準位置にあるときの説明図である。図4はガラス基板とマスクとを位置合わせしているときの、装置上部機構の説明図である。図5はガラス基板とマスクとを位置合わせした後の、装置上部機構の説明図である。   Next, the operation of the moving mechanism of the mask clamp 20 and the operation of the vacuum deposition apparatus 10 will be described. Hereinafter, the chuck 16, the substrate clamp 18, the mask clamp 20, and the mask clamp 28 may be referred to as an apparatus upper mechanism. FIG. 3 is an explanatory diagram when the apparatus upper mechanism is at the reference position. FIG. 4 is an explanatory diagram of the upper mechanism of the apparatus when the glass substrate and the mask are aligned. FIG. 5 is an explanatory diagram of the upper mechanism of the apparatus after aligning the glass substrate and the mask.

マスククランプ28上には、予めマスク34が配設されている。このときマスククランプ28は真空蒸着装置10に対する基準位置にあるので、嵌合ピン28bと嵌合穴34cとが嵌め合うようにマスク34が載せられると、マスク34は真空蒸着装置10に対して位置決めされる。そしてガラス基板32は、前記基板搬送機構によって装置本体11の内部に入れられ、チャック16とマスク34との間に挿入される。そしてガラス基板32は、前記基板搬送機構の下降動作とともに下方へ移動されて、基板クランプ18上に載せられる(S100)。   A mask 34 is disposed on the mask clamp 28 in advance. At this time, since the mask clamp 28 is at the reference position with respect to the vacuum deposition apparatus 10, when the mask 34 is placed so that the fitting pin 28 b and the fitting hole 34 c are fitted, the mask 34 is positioned with respect to the vacuum deposition apparatus 10. Is done. The glass substrate 32 is placed inside the apparatus main body 11 by the substrate transport mechanism and is inserted between the chuck 16 and the mask 34. Then, the glass substrate 32 is moved downward together with the lowering operation of the substrate transport mechanism and placed on the substrate clamp 18 (S100).

この後、マスククランプ28を上昇させることによりマスク34を上方に移動させ、マスク34上にガラス基板32を載せる(S110)。そしてマスククランプ28は、ガラス基板32がチャック16の底面(チャック面)に接触するまで上昇され続ける(S120)。なおガラス基板32は、マスク34上に載せられるとマスク34に沿って水平になり、この水平状態を維持しつつチャック16に当接される。   Thereafter, the mask clamp 28 is raised to move the mask 34 upward, and the glass substrate 32 is placed on the mask 34 (S110). The mask clamp 28 continues to be raised until the glass substrate 32 comes into contact with the bottom surface (chuck surface) of the chuck 16 (S120). When the glass substrate 32 is placed on the mask 34, the glass substrate 32 becomes horizontal along the mask 34 and is brought into contact with the chuck 16 while maintaining this horizontal state.

この後、基板クランプ18をガラス基板32に接触するまで上昇させる(S130)。これによりガラス基板32は、基板クランプ18により水平状態を維持しつつチャック16に装着保持される。そしてマスククランプ28を下降させて、マスク34を下方に移動させる(S140,図3参照)。なおS100〜S140のステップの間は、第1伸縮手段24および第2伸縮手段26は縮められているので、マスククランプ20の下方の先端部20aがマスク34や前記基板搬送機構と接触することはない。   Thereafter, the substrate clamp 18 is raised until it contacts the glass substrate 32 (S130). Thereby, the glass substrate 32 is mounted and held on the chuck 16 while maintaining the horizontal state by the substrate clamp 18. Then, the mask clamp 28 is lowered to move the mask 34 downward (S140, see FIG. 3). In addition, since the 1st expansion-contraction means 24 and the 2nd expansion-contraction means 26 are contracted during the step of S100-S140, the front-end | tip part 20a below the mask clamp 20 does not contact with the mask 34 or the said board | substrate conveyance mechanism. Absent.

この後、ガラス基板32に設けられたアライメントマークと、マスク34に設けられたアライメントマークとを用いて、ガラス基板32とマスク34との位置合わせが行われる(S150)。図6はガラス基板とマスクとの位置合わせの説明図である。そして図6(A)はカメラ、ガラス基板およびマスクの配置を説明する図である。また図6(B)はカメラで撮像された画像であって、位置ズレが生じている場合を示す図である。さらに図6(C)はカメラで撮像された画像であって、位置が合っている場合を示す図である。   Thereafter, the alignment between the glass substrate 32 and the mask 34 is performed using the alignment mark provided on the glass substrate 32 and the alignment mark provided on the mask 34 (S150). FIG. 6 is an explanatory diagram of alignment between the glass substrate and the mask. FIG. 6A illustrates the arrangement of the camera, the glass substrate, and the mask. FIG. 6B is an image captured by a camera and shows a case where a positional deviation has occurred. Further, FIG. 6C is an image taken by a camera and shows a case where the positions are correct.

具体的には、ガラス基板32には、少なくとも2箇所にアライメントマーク42が設けられている。ガラス基板32に設けられたアライメントマーク42は、例えばガラス基板32の対角する角部に設けられ、ガラス基板32に有機EL素子の電極膜を形成するのと同時に、この電極と同じ材料で形成されればよい。そしてガラス基板32に設けられるアライメントマーク42の形状は、例えば丸や点若しくは十字形等であればよい。   Specifically, the glass substrate 32 is provided with alignment marks 42 in at least two places. The alignment mark 42 provided on the glass substrate 32 is provided at, for example, the corners of the glass substrate 32 that are opposite to each other. It only has to be done. The shape of the alignment mark 42 provided on the glass substrate 32 may be, for example, a circle, a dot, or a cross.

またマスク34に設けられたアライメントマーク44は、ガラス基板32に設けられたアライメントマーク42に対応した位置に設けられればよく、その形状は点や丸若しくは十字形等であればよい。なおガラス基板32のアライメントマーク42を丸とした場合は、マスク34のアライメントマーク44を点にすればよく、ガラス基板32のアライメントマーク42を点とした場合は、マスク34のアライメントマーク44を大きさの異なる丸若しくは異なる形状にすればよい。   The alignment mark 44 provided on the mask 34 may be provided at a position corresponding to the alignment mark 42 provided on the glass substrate 32. The shape may be a dot, a circle, a cross, or the like. If the alignment mark 42 on the glass substrate 32 is round, the alignment mark 44 on the mask 34 may be used as a dot. If the alignment mark 42 on the glass substrate 32 is used as a dot, the alignment mark 44 on the mask 34 is enlarged. What is necessary is just to make it a different circle or a different shape.

さらに真空蒸着装置10には、ガラス基板32に設けられたアライメントマーク42と、マスク34に設けられたアライメントマーク44とを撮像するカメラ40を設けておけばよい(図6(A)参照)。   Furthermore, the vacuum deposition apparatus 10 may be provided with a camera 40 that images the alignment mark 42 provided on the glass substrate 32 and the alignment mark 44 provided on the mask 34 (see FIG. 6A).

そしてカメラ40で撮像された画像を確認しつつ、アライメントマーク42(44)の円の中に、アライメントマーク44(42)の点が入るようにマスク34(マスククランプ28)のX(縦),Y(横),θ(回転)方向を調整すれば、ガラス基板32とマスク34との位置合わせが終了する(図6(B),(C)参照)。なおガラス基板32とマスク34との位置合わせ時は、マスク34が真空蒸着装置10に対して位置決めされているので、マスク34のアライメントマーク44が確実にカメラ40の視野内に入る。   Then, while confirming the image captured by the camera 40, X (vertical) of the mask 34 (mask clamp 28), so that the point of the alignment mark 44 (42) enters the circle of the alignment mark 42 (44). When the Y (horizontal) and θ (rotation) directions are adjusted, the alignment between the glass substrate 32 and the mask 34 is completed (see FIGS. 6B and 6C). When aligning the glass substrate 32 and the mask 34, the mask 34 is positioned with respect to the vacuum deposition apparatus 10, so that the alignment mark 44 of the mask 34 surely enters the field of view of the camera 40.

このようなマスク34とガラス基板32との位置決めが行われている間に第1伸縮手段24を伸ばして、マスククランプ20を上昇させる(S160,図4参照)。これによりマスククランプ20の下方の先端部が上昇する。そして第1伸縮手段24を伸ばしたときの下方の先端部は、位置決め動作が行われているマスク34よりも下方にある。   While the mask 34 and the glass substrate 32 are positioned as described above, the first expansion / contraction means 24 is extended to raise the mask clamp 20 (see S160, FIG. 4). As a result, the lower end of the mask clamp 20 is raised. The lower tip when the first expansion / contraction means 24 is extended is below the mask 34 on which the positioning operation is performed.

そしてS150およびS160のステップが終了すると、第2伸縮手段26を伸ばしてマスククランプ20を上昇させる(S170,図5参照)。具体的には、マスククランプ20の下方の先端部20aを上昇させると、マスク34がマスククランプ28からマスククランプ20に載せ換えられ、さらに下方の先端部20aを上昇させ続けると、マスク34がガラス基板32に被せられる。そしてマスク34がガラス基板32に被せられると、下方の先端部20aの上昇、すなわち第2伸縮手段26の伸びが止まる。なお第2伸縮手段26を伸ばしたときの下方の先端部20aの動作上限位置は、マスク34をガラス基板32に被せたときのチャック16面からマスク34下面までの距離よりも少し(少なくとも数mm)上方に位置させればよい。   When the steps of S150 and S160 are completed, the second extension means 26 is extended to raise the mask clamp 20 (S170, see FIG. 5). Specifically, when the lower tip 20a of the mask clamp 20 is raised, the mask 34 is transferred from the mask clamp 28 to the mask clamp 20, and when the lower tip 20a is further raised, the mask 34 is made of glass. The substrate 32 is covered. Then, when the mask 34 is placed on the glass substrate 32, the lower tip 20a rises, that is, the second expansion means 26 stops. Note that the upper limit position of the lower tip 20a when the second expansion / contraction means 26 is extended is slightly smaller than the distance from the chuck 16 surface to the lower surface of the mask 34 when the mask 34 is placed on the glass substrate 32 (at least several mm). Suffice to be positioned above.

この後、回転機構30の動作によってガラス基板32やマスク34を回転させるとともに、ヒーター14bによって有機材料12を加熱・蒸発させて、ガラス基板32上に有機EL素子のパターンを形成する(S180)。   Thereafter, the glass substrate 32 and the mask 34 are rotated by the operation of the rotating mechanism 30, and the organic material 12 is heated and evaporated by the heater 14b to form an organic EL element pattern on the glass substrate 32 (S180).

この後、第1伸縮手段24および第2伸縮手段26を縮めて、マスククランプ20を下降させる(S190)。このときマスク34は、マスククランプ20の下降とともに下方へ移動されるが、マスククランプ20からチャック16の下方にあるマスククランプ28へ移動の途中で載せかえられる。また基板クランプ18も下降して、ガラス基板32を下方へ移動させる(S200)。この後、装置本体11に前記基板搬送装置が入り、ガラス基板32を回収する(S210)。このような動作により有機EL素子が製造される。   Thereafter, the first expansion / contraction means 24 and the second expansion / contraction means 26 are contracted, and the mask clamp 20 is lowered (S190). At this time, the mask 34 is moved downward with the lowering of the mask clamp 20, but is replaced in the course of movement from the mask clamp 20 to the mask clamp 28 below the chuck 16. Further, the substrate clamp 18 is also lowered to move the glass substrate 32 downward (S200). Thereafter, the substrate transfer device enters the apparatus main body 11, and the glass substrate 32 is collected (S210). An organic EL element is manufactured by such an operation.

このようなマスククランプ20の移動機構および真空蒸着装置10によれば、マスククランプ20を上下に移動させる伸縮手段22として第1伸縮手段24および第2伸縮手段26を設けたので、それぞれを独立に伸縮させることにより、マスククランプ20は2段階の上下移動が可能になる。すなわちマスククランプ20の移動量を2段階に分割することができる。したがって、マスク34とガラス基板32との位置合わせ中にマスククランプ20を1段階上昇させて、マスク34とマスククランプ20の下方の先端部との距離を僅かにあけておき、位置合わせ終了後にマスククランプ20をもう1段上昇させてマスク34をガラス基板32に被せると、位置合わせ終了後のマスククランプ20の移動距離を短くすることができる。よってマスク34とガラス基板32との位置合わせと、マスククランプ20の上昇とが同時に行われるので、有機EL素子の製造時間を短縮することができ、製造スピードを向上させることができる。そして有機EL素子の製造効率を向上させることができる。   According to the moving mechanism of the mask clamp 20 and the vacuum deposition apparatus 10 as described above, the first expansion / contraction means 24 and the second expansion / contraction means 26 are provided as the expansion / contraction means 22 for moving the mask clamp 20 up and down. By extending and contracting, the mask clamp 20 can move up and down in two stages. That is, the movement amount of the mask clamp 20 can be divided into two stages. Therefore, the mask clamp 20 is raised by one step during the alignment between the mask 34 and the glass substrate 32, and the distance between the mask 34 and the lower end of the mask clamp 20 is kept slightly, and the mask is moved after the alignment is completed. If the clamp 20 is raised one more stage and the mask 34 is placed on the glass substrate 32, the movement distance of the mask clamp 20 after the alignment is completed can be shortened. Therefore, since the alignment of the mask 34 and the glass substrate 32 and the raising of the mask clamp 20 are simultaneously performed, the manufacturing time of the organic EL element can be shortened and the manufacturing speed can be improved. And the manufacturing efficiency of an organic EL element can be improved.

また伸縮手段22は、第1伸縮手段24の他端24aに板部材23を接続し、この板部材23に第2伸縮手段26を配設した構成なので、装置本体11に設けられた各機構(前記装置上部機構)等を駆動させるための配線等と干渉することがない。したがって第1伸縮手段24および第2伸縮手段26によって、回転機構30の軸上においてマスククランプ20を2段階に分割して昇降させることができる。   The expansion / contraction means 22 has a configuration in which a plate member 23 is connected to the other end 24 a of the first expansion / contraction means 24, and the second expansion / contraction means 26 is disposed on the plate member 23, so that each mechanism ( There is no interference with the wiring for driving the device upper mechanism. Accordingly, the mask clamp 20 can be lifted and lowered in two stages on the axis of the rotation mechanism 30 by the first expansion / contraction means 24 and the second expansion / contraction means 26.

なおマスククランプ20は、ガラス基板32の挿入や回収、マスク34の交換のときには第1伸縮手段24および第2伸縮手段26を縮めておいて最下点まで下げられていればよく、これ以外のときには第1伸縮手段24を伸ばした状態で第2伸縮手段26を伸縮させて上下に移動されればよい。   The mask clamp 20 may be lowered to the lowest point by contracting the first expansion / contraction means 24 and the second expansion / contraction means 26 when the glass substrate 32 is inserted and recovered, or the mask 34 is replaced. In some cases, the second expansion / contraction means 26 may be expanded / contracted and moved up and down with the first expansion / contraction means 24 extended.

また本実施形態では、板部材23を介して第1伸縮手段24および第2伸縮手段26を上下に接続した構成であるが、他の実施形態として第2伸縮手段26の他端26aにさらに板部材を接続して、この板部材に第3伸縮手段を配設し、第3伸縮手段の他端を接続部材20cに接続または接触させた構成にしてもよい。すなわち板部材を介して第1伸縮手段、第2伸縮手段および第3伸縮手段を上下に接続し、マスククランプ20を3段階に分割して昇降させることもできる。さらに板部材を介して伸縮手段を複数上下に接続する構成を繰り返せば、マスククランプ20を複数段階に分割して昇降させることができる。   In the present embodiment, the first expansion / contraction means 24 and the second expansion / contraction means 26 are connected to each other up and down via the plate member 23. However, as another embodiment, a plate is further added to the other end 26a of the second expansion / contraction means 26. A member may be connected, a third expansion / contraction means may be disposed on the plate member, and the other end of the third expansion / contraction means may be connected to or contacted with the connection member 20c. That is, the first extension means, the second extension means, and the third extension means can be connected to each other through the plate member, and the mask clamp 20 can be moved up and down in three stages. Furthermore, if the structure which connects a plurality of expansion-contraction means up and down via a plate member is repeated, the mask clamp 20 can be divided | segmented into several steps and can be raised / lowered.

また本実施形態では、ガラス基板とマスクとの位置合わせを行うカメラが2つ設けられた形態であるが、これに限定されることはない。すなわちカメラは、図7(A)に示すように3個設けることもでき、図7(B)に示すように4個設けることもできる。   In the present embodiment, two cameras for aligning the glass substrate and the mask are provided. However, the present invention is not limited to this. That is, three cameras can be provided as shown in FIG. 7A, and four cameras can be provided as shown in FIG. 7B.

また本実施形態では、マスクの移動機構が真空蒸着装置10に用いられている形成を説明したが、マスクの移動機構は真空蒸着装置10に用いられるばかりでなく、スパッタ装置や気相成長装置等の他の成膜装置に用いられることもできる。また基板は、ガラス基板32に限定されることはなく、ガラス以外の材料からなる基板であってもよい。   In the present embodiment, the formation of the mask moving mechanism used in the vacuum deposition apparatus 10 has been described. However, the mask moving mechanism is not only used in the vacuum deposition apparatus 10, but also a sputtering apparatus, a vapor phase growth apparatus, or the like. It can also be used for other film forming apparatuses. The substrate is not limited to the glass substrate 32 and may be a substrate made of a material other than glass.

真空蒸着装置の説明図である。It is explanatory drawing of a vacuum evaporation system. マスククランプの概略平面図である。It is a schematic plan view of a mask clamp. 装置上部機構が基準位置にあるときの説明図である。It is explanatory drawing when an apparatus upper part mechanism exists in a reference position. ガラス基板とマスクとを位置合わせしているときの、装置上部機構の説明図である。It is explanatory drawing of an apparatus upper part mechanism when aligning a glass substrate and a mask. ガラス基板とマスクとを位置合わせした後の、装置上部機構の説明図である。It is explanatory drawing of an apparatus upper part mechanism after aligning a glass substrate and a mask. ガラス基板とマスクとの位置合わせの説明図である。It is explanatory drawing of position alignment with a glass substrate and a mask. カメラの配設位置を説明する図である。It is a figure explaining the arrangement | positioning position of a camera. 真空蒸着装置上部の説明図である。It is explanatory drawing of a vacuum evaporation apparatus upper part.

符号の説明Explanation of symbols

10………真空蒸着装置、11………装置本体、16………チャック、18………基板クランプ、20………マスククランプ、20c………接続部材、22………伸縮手段、23………板部材、24………第1伸縮手段、26………第2伸縮手段、28………マスククランプ、32………ガラス基板、34………マスク、40………カメラ。 DESCRIPTION OF SYMBOLS 10 ......... Vacuum vapor deposition apparatus, 11 ......... System unit, 16 ......... Chuck, 18 ......... Substrate clamp, 20 ......... Mask clamp, 20c ......... Connecting member, 22 ...... Expandable means, 23 ..... Plate member, 24 ..... First telescopic means, 26 .... Second telescopic means, 28 ..... Mask clamp, 32 .... Glass substrate, 34 ..... Mask, 40 .... Camera.

Claims (4)

有機EL素子を製造するための成膜装置におけるマスククランプの移動機構であって、
有機材料の蒸発源に対向して配設され、基板とマスクとが重ね合わされるチャックと、
前記チャックに重ね合わされた前記マスクを保持するマスククランプと、
基板クランプを移動させる伸縮手段とを備え、
前記伸縮手段は、第1伸縮手段を装置本体に配設するとともに、伸縮動作をなす第1ロッドを板部材に接続し、第2伸縮手段を前記板部材に配設するとともに、伸縮動作をなす第2ロッドを前記基板クランプの基端部に接続または接触させてなる、
ことを特徴とするマスククランプの移動機構。
A moving mechanism of a mask clamp in a film forming apparatus for manufacturing an organic EL element,
A chuck disposed opposite to the evaporation source of the organic material, and the substrate and the mask are overlaid;
A mask clamp for holding the mask superimposed on the chuck;
A telescopic means for moving the substrate clamp,
The expansion / contraction means arranges the first expansion / contraction means on the apparatus main body, connects the first rod that performs expansion / contraction operation to the plate member, and arranges the second expansion / contraction means on the plate member and performs expansion / contraction operation. A second rod is connected or brought into contact with the base end of the substrate clamp;
A mechanism for moving the mask clamp.
前記伸縮手段は、エアシリンダ、油圧シリンダまたはアクチュエータであることを特徴とする請求項1に記載のマスククランプの移動機構。   2. The mask clamp moving mechanism according to claim 1, wherein the expansion / contraction means is an air cylinder, a hydraulic cylinder, or an actuator. 有機EL素子を製造するための成膜装置であって、
有機材料の供給源に対向して基板を保持するチャックを配設し、
前記有機EL素子のパターンが形成されたマスクの保持手段となるマスククランプを前記チャックの側縁に沿って上下移動可能に配設し、
前記マスククランプの基端部の下部に伸縮手段を重ねて配設し、
前記チャック、前記マスククランプおよび前記伸縮手段を水平方向に回転させる回転機構を前記装置本体に設けた、
ことを特徴とする成膜装置。
A film forming apparatus for manufacturing an organic EL element,
A chuck for holding the substrate is disposed opposite the organic material supply source,
A mask clamp serving as a holding means for the mask on which the pattern of the organic EL element is formed is disposed so as to be vertically movable along the side edge of the chuck,
Extending and disposing expansion / contraction means on the lower part of the base end of the mask clamp,
A rotation mechanism that rotates the chuck, the mask clamp, and the expansion / contraction means in a horizontal direction is provided in the apparatus body.
A film forming apparatus.
重ねて配設された前記伸縮手段は、
一端を前記装置本体に接続し、第1ロッドを板部材に接続した第1伸縮手段と、
前記板部材に配設され、第2ロッドを前記接続部材に接続または接触した第2伸縮手段と、
を備えたことを特徴とする請求項3に記載の成膜装置。
The expansion and contraction means arranged in an overlapping manner,
A first extending / contracting means having one end connected to the apparatus body and a first rod connected to the plate member;
A second expansion / contraction means disposed on the plate member and connecting or contacting the second rod to the connection member;
The film forming apparatus according to claim 3, further comprising:
JP2005047812A 2005-02-23 2005-02-23 Mask clamp moving mechanism and film forming apparatus Expired - Fee Related JP4609754B2 (en)

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KR1020077016159A KR100947572B1 (en) 2005-02-23 2006-02-22 Mask clamp moving mechanism and film forming apparatus
CN2006800015547A CN101090993B (en) 2005-02-23 2006-02-22 Mask clamp moving mechanism and film forming apparatus
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