JP2006153475A5

JP2006153475A5 -

Info

Publication number: JP2006153475A5
Application number: JP2004340250A
Authority: JP
Filing date: 2004-11-25
Publication date: 2007-12-20
Anticipated expiration: 2024-11-25

Description

（請求項１）
支持体上に輝尽性蛍光体層を有する放射線画像変換パネルにおいて、少なくとも１層の該輝尽性蛍光体層が気相法（気相堆積法ともいう）により５０μｍ〜２０ｍｍの膜厚を有するように形成され、該蛍光体層上にポリウレア保護膜が蒸着プロセスで形成されており、該蛍光体層上保護膜の屈折率が１．２〜２．０であることを特徴とする放射線画像変換パネル。 (Claim 1)
In a radiation image conversion panel having a photostimulable phosphor layer on a support, at least one photostimulable phosphor layer has a thickness of 50 μm to 20 mm by a vapor phase method (also referred to as a vapor deposition method). The polyurea protective film is formed on the phosphor layer by a vapor deposition process, and the refractive index of the phosphor layer protective film is 1.2 to 2.0. Conversion panel.

（請求項４）
支持体上に輝尽性蛍光体層を有する放射線画像変換パネルの製造方法おいて、少なくとも１層の輝尽性蛍光体層が気相法により５０μｍ〜２０ｍｍの膜厚を有するように形成され、該蛍光体層上に屈折率が１．２〜２．０である保護膜が蒸着プロセスで形成されており、更に、該保護膜を形成後、プレート加熱処理して保護膜表面をレベリング調整することを特徴とする放射線画像変換パネルの製造方法。
(Claim 4)
In the method for producing a radiation image conversion panel having a photostimulable phosphor layer on a support, at least one photostimulable phosphor layer is formed to have a film thickness of 50 μm to 20 mm by a vapor phase method, A protective film having a refractive index of 1.2 to 2.0 is formed on the phosphor layer by an evaporation process. Further, after forming the protective film, the surface of the protective film is adjusted by heating the plate. A method of manufacturing a radiation image conversion panel.

Claims

In a radiation image conversion panel having a photostimulable phosphor layer on a support, at least one photostimulable phosphor layer has a thickness of 50 μm to 20 mm by a vapor phase method (also referred to as a vapor deposition method). The polyurea protective film is formed on the phosphor layer by a vapor deposition process, and the refractive index of the phosphor layer protective film is 1.2 to 2.0. Conversion panel.

The radiation image conversion panel according to claim 1, wherein the photostimulable phosphor is a compound represented by the following general formula (1).
General formula (1)
M ¹ X · aM ² X ′ ₂ · bM ³ X ″ ₃ : eA
Wherein, M ¹ is at least one alkali metal atom selected Li, Na, K, from Rb and Cs, of at least 1 M ² is selected Li other than M ^1, Na, K, from Rb and Cs M ³ is at least one trivalent selected from Y, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb and Lu X, X 'and X "are at least one halogen atom selected from F, Cl, Br and I, and A is Eu, Tb, In, Cs, Ce, Tm, Dy, Pr , Ho, Nd, Yb, Er, Gd, Lu, Sm, Y, and at least one rare earth element selected from the group consisting of a, b, and e, where 0 ≦ a <0.5, 0 ≦ b <0.5, 0 <e ≦ 0.2 It is.]

The radiation according to claim 1 or 2, wherein a protective film having a refractive index of 1.5 to 1.7 is formed, and the thickness of the protective film is 1 to 20 µm. Image conversion panel.

In the method for producing a radiation image conversion panel having a photostimulable phosphor layer on a support, at least one photostimulable phosphor layer is formed to have a film thickness of 50 μm to 20 mm by a vapor phase method, A protective film having a refractive index of 1.2 to 2.0 is formed on the phosphor layer by an evaporation process. Further, after forming the protective film, the surface of the protective film is adjusted by heating the plate. A method of manufacturing a radiation image conversion panel.