JP2006016525A - Epoxy resin molding material for sealing and electronic component device - Google Patents
Epoxy resin molding material for sealing and electronic component device Download PDFInfo
- Publication number
- JP2006016525A JP2006016525A JP2004196663A JP2004196663A JP2006016525A JP 2006016525 A JP2006016525 A JP 2006016525A JP 2004196663 A JP2004196663 A JP 2004196663A JP 2004196663 A JP2004196663 A JP 2004196663A JP 2006016525 A JP2006016525 A JP 2006016525A
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- molding material
- sealing
- resin molding
- general formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 96
- 239000003822 epoxy resin Substances 0.000 title claims abstract description 94
- 239000012778 molding material Substances 0.000 title claims abstract description 70
- 238000007789 sealing Methods 0.000 title claims abstract description 61
- 229910052698 phosphorus Inorganic materials 0.000 claims abstract description 23
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims abstract description 22
- 239000011574 phosphorus Substances 0.000 claims abstract description 22
- 150000001875 compounds Chemical class 0.000 claims abstract description 18
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 17
- 239000011256 inorganic filler Substances 0.000 claims abstract description 12
- 229910003475 inorganic filler Inorganic materials 0.000 claims abstract description 12
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 claims abstract description 11
- NXPPAOGUKPJVDI-UHFFFAOYSA-N naphthalene-1,2-diol Chemical compound C1=CC=CC2=C(O)C(O)=CC=C21 NXPPAOGUKPJVDI-UHFFFAOYSA-N 0.000 claims abstract description 10
- 238000006266 etherification reaction Methods 0.000 claims abstract description 9
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 claims abstract description 9
- 239000000539 dimer Substances 0.000 claims abstract description 8
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 8
- 125000001624 naphthyl group Chemical group 0.000 claims abstract description 5
- 125000001183 hydrocarbyl group Chemical group 0.000 claims abstract 2
- 239000003063 flame retardant Substances 0.000 claims description 15
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 claims description 13
- 229910052787 antimony Inorganic materials 0.000 claims description 7
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 7
- 229910052736 halogen Inorganic materials 0.000 claims description 7
- 150000002367 halogens Chemical class 0.000 claims description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 5
- 238000000465 moulding Methods 0.000 abstract description 6
- 239000004215 Carbon black (E152) Substances 0.000 abstract 1
- 229930195733 hydrocarbon Natural products 0.000 abstract 1
- 229920005989 resin Polymers 0.000 description 26
- 239000011347 resin Substances 0.000 description 26
- 238000000034 method Methods 0.000 description 16
- 230000000052 comparative effect Effects 0.000 description 15
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 14
- -1 bromo compound Chemical class 0.000 description 14
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 10
- 230000000694 effects Effects 0.000 description 9
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 8
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 8
- 239000004593 Epoxy Substances 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- 239000004305 biphenyl Substances 0.000 description 7
- 235000010290 biphenyl Nutrition 0.000 description 7
- 239000005011 phenolic resin Substances 0.000 description 7
- 239000000047 product Substances 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 7
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 6
- 230000009477 glass transition Effects 0.000 description 6
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 6
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 6
- 230000002411 adverse Effects 0.000 description 5
- 239000005350 fused silica glass Substances 0.000 description 5
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 4
- 150000001450 anions Chemical class 0.000 description 4
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 4
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 238000004898 kneading Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 229910000000 metal hydroxide Inorganic materials 0.000 description 4
- 150000004692 metal hydroxides Chemical class 0.000 description 4
- 229920003986 novolac Polymers 0.000 description 4
- SMQUZDBALVYZAC-UHFFFAOYSA-N salicylaldehyde Chemical compound OC1=CC=CC=C1C=O SMQUZDBALVYZAC-UHFFFAOYSA-N 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 3
- 238000007259 addition reaction Methods 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000007795 chemical reaction product Substances 0.000 description 3
- 238000009833 condensation Methods 0.000 description 3
- 239000007822 coupling agent Substances 0.000 description 3
- 150000002430 hydrocarbons Chemical group 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- UTOPWMOLSKOLTQ-UHFFFAOYSA-N octacosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCCCCCCCCCC(O)=O UTOPWMOLSKOLTQ-UHFFFAOYSA-N 0.000 description 3
- 150000002903 organophosphorus compounds Chemical class 0.000 description 3
- 229920001568 phenolic resin Polymers 0.000 description 3
- 150000002989 phenols Chemical class 0.000 description 3
- 238000011417 postcuring Methods 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- FRASJONUBLZVQX-UHFFFAOYSA-N 1,4-naphthoquinone Chemical compound C1=CC=C2C(=O)C=CC(=O)C2=C1 FRASJONUBLZVQX-UHFFFAOYSA-N 0.000 description 2
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 2
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical compound NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- TYOXIFXYEIILLY-UHFFFAOYSA-N 5-methyl-2-phenyl-1h-imidazole Chemical compound N1C(C)=CN=C1C1=CC=CC=C1 TYOXIFXYEIILLY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- LTPBRCUWZOMYOC-UHFFFAOYSA-N Beryllium oxide Chemical compound O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical group C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical group CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- KFSLWBXXFJQRDL-UHFFFAOYSA-N Peracetic acid Chemical compound CC(=O)OO KFSLWBXXFJQRDL-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 125000003172 aldehyde group Chemical group 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- RWZYAGGXGHYGMB-UHFFFAOYSA-N anthranilic acid Chemical compound NC1=CC=CC=C1C(O)=O RWZYAGGXGHYGMB-UHFFFAOYSA-N 0.000 description 2
- 150000001463 antimony compounds Chemical class 0.000 description 2
- 229910000410 antimony oxide Inorganic materials 0.000 description 2
- LJCFOYOSGPHIOO-UHFFFAOYSA-N antimony pentoxide Chemical compound O=[Sb](=O)O[Sb](=O)=O LJCFOYOSGPHIOO-UHFFFAOYSA-N 0.000 description 2
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- 229910052797 bismuth Inorganic materials 0.000 description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 2
- 125000001246 bromo group Chemical group Br* 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 239000006229 carbon black Substances 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- 229910002026 crystalline silica Inorganic materials 0.000 description 2
- GDVKFRBCXAPAQJ-UHFFFAOYSA-A dialuminum;hexamagnesium;carbonate;hexadecahydroxide Chemical compound [OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Al+3].[Al+3].[O-]C([O-])=O GDVKFRBCXAPAQJ-UHFFFAOYSA-A 0.000 description 2
- 235000014113 dietary fatty acids Nutrition 0.000 description 2
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical class C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 2
- 239000000194 fatty acid Substances 0.000 description 2
- 229930195729 fatty acid Natural products 0.000 description 2
- LNTHITQWFMADLM-UHFFFAOYSA-N gallic acid Chemical compound OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 description 2
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- 239000012535 impurity Substances 0.000 description 2
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 2
- 239000004850 liquid epoxy resins (LERs) Substances 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
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- 239000003960 organic solvent Substances 0.000 description 2
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- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 2
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- 239000004033 plastic Substances 0.000 description 2
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- 229920000573 polyethylene Polymers 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
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- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
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- 229910000077 silane Inorganic materials 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000001721 transfer moulding Methods 0.000 description 2
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 2
- UIXPTCZPFCVOQF-UHFFFAOYSA-N ubiquinone-0 Chemical compound COC1=C(OC)C(=O)C(C)=CC1=O UIXPTCZPFCVOQF-UHFFFAOYSA-N 0.000 description 2
- 239000001993 wax Substances 0.000 description 2
- 229910052845 zircon Inorganic materials 0.000 description 2
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 2
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
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- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
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- 229940005561 1,4-benzoquinone Drugs 0.000 description 1
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- BLBVJHVRECUXKP-UHFFFAOYSA-N 2,3-dimethoxy-1,4-dimethylbenzene Chemical group COC1=C(C)C=CC(C)=C1OC BLBVJHVRECUXKP-UHFFFAOYSA-N 0.000 description 1
- AIACLXROWHONEE-UHFFFAOYSA-N 2,3-dimethylcyclohexa-2,5-diene-1,4-dione Chemical compound CC1=C(C)C(=O)C=CC1=O AIACLXROWHONEE-UHFFFAOYSA-N 0.000 description 1
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- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 1
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- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 1
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- 125000002723 alicyclic group Chemical group 0.000 description 1
- 239000004844 aliphatic epoxy resin Substances 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 150000001343 alkyl silanes Chemical class 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229940058905 antimony compound for treatment of leishmaniasis and trypanosomiasis Drugs 0.000 description 1
- 229910000411 antimony tetroxide Inorganic materials 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- LLEMOWNGBBNAJR-UHFFFAOYSA-N biphenyl-2-ol Chemical compound OC1=CC=CC=C1C1=CC=CC=C1 LLEMOWNGBBNAJR-UHFFFAOYSA-N 0.000 description 1
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N butyric aldehyde Natural products CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000000378 calcium silicate Substances 0.000 description 1
- 229910052918 calcium silicate Inorganic materials 0.000 description 1
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- CRGRWBQSZSQVIE-UHFFFAOYSA-N diazomethylbenzene Chemical compound [N-]=[N+]=CC1=CC=CC=C1 CRGRWBQSZSQVIE-UHFFFAOYSA-N 0.000 description 1
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- GPAYUJZHTULNBE-UHFFFAOYSA-N diphenylphosphine Chemical compound C=1C=CC=CC=1PC1=CC=CC=C1 GPAYUJZHTULNBE-UHFFFAOYSA-N 0.000 description 1
- NJLLQSBAHIKGKF-UHFFFAOYSA-N dipotassium dioxido(oxo)titanium Chemical compound [K+].[K+].[O-][Ti]([O-])=O NJLLQSBAHIKGKF-UHFFFAOYSA-N 0.000 description 1
- 239000012990 dithiocarbamate Substances 0.000 description 1
- 150000004659 dithiocarbamates Chemical class 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 229940074391 gallic acid Drugs 0.000 description 1
- 235000004515 gallic acid Nutrition 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 230000026030 halogenation Effects 0.000 description 1
- 238000005658 halogenation reaction Methods 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- UJNZOIKQAUQOCN-UHFFFAOYSA-N methyl(diphenyl)phosphane Chemical compound C=1C=CC=CC=1P(C)C1=CC=CC=C1 UJNZOIKQAUQOCN-UHFFFAOYSA-N 0.000 description 1
- 239000004206 montan acid ester Substances 0.000 description 1
- 235000013872 montan acid ester Nutrition 0.000 description 1
- 229910052863 mullite Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 239000012860 organic pigment Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- AFEQENGXSMURHA-UHFFFAOYSA-N oxiran-2-ylmethanamine Chemical compound NCC1CO1 AFEQENGXSMURHA-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 235000011837 pasties Nutrition 0.000 description 1
- 150000004965 peroxy acids Chemical class 0.000 description 1
- XPPWLXNXHSNMKC-UHFFFAOYSA-N phenylboron Chemical compound [B]C1=CC=CC=C1 XPPWLXNXHSNMKC-UHFFFAOYSA-N 0.000 description 1
- RPGWZZNNEUHDAQ-UHFFFAOYSA-N phenylphosphine Chemical compound PC1=CC=CC=C1 RPGWZZNNEUHDAQ-UHFFFAOYSA-N 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- 125000004437 phosphorous atom Chemical group 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 150000007519 polyprotic acids Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- IYMSIPPWHNIMGE-UHFFFAOYSA-N silylurea Chemical compound NC(=O)N[SiH3] IYMSIPPWHNIMGE-UHFFFAOYSA-N 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical compound C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 1
- 235000021286 stilbenes Nutrition 0.000 description 1
- TXDNPSYEJHXKMK-UHFFFAOYSA-N sulfanylsilane Chemical compound S[SiH3] TXDNPSYEJHXKMK-UHFFFAOYSA-N 0.000 description 1
- MJZMLBVNMBLKQY-UHFFFAOYSA-N sulfonylphosphane Chemical compound O=S(=O)=P MJZMLBVNMBLKQY-UHFFFAOYSA-N 0.000 description 1
- 150000003505 terpenes Chemical class 0.000 description 1
- 235000007586 terpenes Nutrition 0.000 description 1
- 150000003536 tetrazoles Chemical class 0.000 description 1
- 150000004867 thiadiazoles Chemical class 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 150000003609 titanium compounds Chemical class 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- WXAZIUYTQHYBFW-UHFFFAOYSA-N tris(4-methylphenyl)phosphane Chemical compound C1=CC(C)=CC=C1P(C=1C=CC(C)=CC=1)C1=CC=C(C)C=C1 WXAZIUYTQHYBFW-UHFFFAOYSA-N 0.000 description 1
- UKRDPEFKFJNXQM-UHFFFAOYSA-N vinylsilane Chemical compound [SiH3]C=C UKRDPEFKFJNXQM-UHFFFAOYSA-N 0.000 description 1
- 150000003739 xylenols Chemical class 0.000 description 1
- XOOUIPVCVHRTMJ-UHFFFAOYSA-L zinc stearate Chemical class [Zn+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O XOOUIPVCVHRTMJ-UHFFFAOYSA-L 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- 150000003755 zirconium compounds Chemical class 0.000 description 1
Landscapes
- Epoxy Resins (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
Description
本発明は、封止用エポキシ樹脂成形材料、及びこの封止用エポキシ樹脂成形材料で封止した素子を備えた電子部品装置に関する。 The present invention relates to an epoxy resin molding material for sealing, and an electronic component device including an element sealed with the epoxy resin molding material for sealing.
従来から、トランジスタ、IC、LSI等の電子部品装置の素子封止の分野では生産性、コスト等の面から樹脂封止が主流となり、エポキシ樹脂成形材料が広く用いられている。この理由としては、エポキシ樹脂が電気特性、耐湿性、耐熱性、機械特性、インサート品との接着性などの諸特性にバランスがとれているためである。 Conventionally, in the field of element sealing of electronic component devices such as transistors, ICs, and LSIs, resin sealing has been the mainstream in terms of productivity, cost, etc., and epoxy resin molding materials have been widely used. This is because epoxy resins are balanced in various properties such as electrical properties, moisture resistance, heat resistance, mechanical properties, and adhesiveness with inserts.
近年は、自動車分野においても電子機器化が進んでいる。自動車用途の電子機器には、耐熱性、耐冷熱サイクル性等において、パーソナルコンピュータ、家電等のいわゆる民生用途より、一段と厳しい信頼性が求められることが多い。
電子機器の耐熱性を高める一般的な手法としては、パッケージのガラス転移点を高める手法が挙げられ、耐冷熱サイクル性を高める手法としては、半導体内部部材と封止用エポキシ樹脂成形材料の熱膨張係数を近づける等の手法が挙げられる。
封止用エポキシ樹脂成形材料には、従来よりデカブロムをはじめとするハロゲン化樹脂やアンチモン化合物が難燃剤として用いられていたが、近年、環境保護の観点からこれらの化合物に量規制の動きがあり、ノンハロゲン化(ノンブロム化)及びノンアンチモン化の要求が出てきている。また、プラスチック封止ICの高温放置特性にブロム化合物が悪影響を及ぼすことが知られており、この観点からもブロム化樹脂量の低減が望まれている。
ブロム化樹脂や酸化アンチモンを用いずに難燃化を達成する手法の一つとしては、有機リン系化合物を添加する方法(例えば特許文献1参照。)、金属水酸化物を方法(例えば特許文献2参照。)等の提案がなされているが、それぞれガラス転移点の低下を招く、成形性に悪影響を及ぼす等の問題を解決できていない。
In recent years, electronic devices are also being developed in the automobile field. Electronic devices for automobiles are often required to be more reliable in terms of heat resistance and cold cycle resistance than so-called consumer applications such as personal computers and home appliances.
General techniques for increasing the heat resistance of electronic equipment include a technique for increasing the glass transition point of the package, and techniques for improving the thermal cycle resistance include thermal expansion of the semiconductor internal member and the epoxy resin molding material for sealing. A technique such as bringing the coefficients closer is mentioned.
In epoxy resin molding materials for sealing, halogenated resins such as decabromo and antimony compounds have been used as flame retardants in the past, but in recent years there has been a movement to regulate the amount of these compounds from the viewpoint of environmental protection. There is a demand for non-halogenation (non-bromo) and non-antimony. In addition, it is known that a bromo compound has an adverse effect on the high temperature storage characteristics of a plastic encapsulated IC. From this viewpoint, reduction of the amount of bromo resin is desired.
As one of the methods for achieving flame retardancy without using brominated resin or antimony oxide, a method of adding an organic phosphorus compound (for example, see Patent Document 1), a method of using a metal hydroxide (for example, Patent Document) However, it has not been able to solve problems such as a decrease in glass transition point and an adverse effect on formability.
ブロム化樹脂や酸化アンチモンを用いない封止用エポキシ樹脂成形材料において、耐冷熱サイクル性を高める為に封止用エポキシ樹脂成形材料の線膨張係数と半導体内部部材とのそれを近づけようとすると、特に銅リードフレームを使用したパッケージでの難燃性確保が困難となる。一方、難燃性確保の為に有機リン系化合物、金属水酸化物等の難燃剤を用いると、ガラス転移点の低下を招く、成形性に悪影響を及ぼす等の問題を抱える。金属水酸化物を用いた封止用エポキシ樹脂成形材料の成形性改善に対しては、特許文献3等の報告があるが、その効果は必ずしも充分ではない。
本発明はかかる状況に鑑みなされたもので、ハロゲン化樹脂やアンチモン化合物を用いることなく良好な難燃性を実現し、流動性や硬化性等の成形性、耐熱性や耐冷熱サイクル性等の信頼性にも優れる封止用エポキシ樹脂成形材料、及びこれにより封止した素子を備えた電子部品装置を提供しようとするものである。 The present invention has been made in view of such circumstances, and realizes good flame retardancy without using a halogenated resin or an antimony compound, such as moldability such as fluidity and curability, heat resistance and cold cycle resistance. An object of the present invention is to provide an epoxy resin molding material for sealing excellent in reliability, and an electronic component device including an element sealed thereby.
本発明者らは上記の課題を解決するために鋭意検討を重ねた結果、封止用エポキシ樹脂成形材料に、特定の構造を有するエポキシ樹脂、特定の構造を有する硬化剤、及び特定の構造を有する硬化促進剤を特定量用いることにより上記の目的を達成しうることを見い出し、本発明を完成するに至った。
すなわち、本発明は
(1)(A)ヒドロキシナフタレン及びジヒドロキシナフタレンの少なくともいずれかの2量体をグリシジルエーテル化して得られるエポキシ樹脂を含むエポキシ樹脂、(B)下記一般式(I)で表される化合物を含む硬化剤、(C)リン系硬化促進剤、及び(D)無機充填剤を含有し、(C)成分のリン含有率が成形材料全体の200〜500ppmである封止用エポキシ樹脂成形材料、
(2)ハロゲン系難燃剤及びアンチモン系難燃剤の含有量がいずれも成形材料全体の0.1重量%以下である前記(1)に記載の封止用エポキシ樹脂成形材料。
(3)ハロゲン系難燃剤及びアンチモン系難燃剤を含まない前記(2)に記載の封止用エポキシ樹脂成形材料、
(4)(D)無機充填剤量が成形材料全体の70重量%以上88重量%以下である前記(1)〜(3)のいずれかに記載の封止用エポキシ樹脂成形材料、
(5)前記(1)〜(4)のいずれかに記載の封止用エポキシ樹脂成形材料により封止された素子を備えた電子部品装置、
に関する。
As a result of intensive studies to solve the above problems, the present inventors have determined that an epoxy resin molding material for sealing has an epoxy resin having a specific structure, a curing agent having a specific structure, and a specific structure. It has been found that the above-mentioned object can be achieved by using a specific amount of the curing accelerator having the present invention, and the present invention has been completed.
That is, the present invention is (1) (A) an epoxy resin containing an epoxy resin obtained by glycidyl etherification of at least one dimer of hydroxynaphthalene and dihydroxynaphthalene, (B) represented by the following general formula (I) (C) a phosphorus-based curing accelerator, and (D) an inorganic filler, and the phosphorus content of the component (C) is 200 to 500 ppm of the entire molding material. Molding material,
(2) The epoxy resin molding material for sealing according to the above (1), wherein the content of the halogen flame retardant and the antimony flame retardant is 0.1% by weight or less of the whole molding material.
(3) The epoxy resin molding material for sealing according to the above (2), which does not contain a halogen flame retardant and an antimony flame retardant,
(4) (D) The epoxy resin molding material for sealing according to any one of (1) to (3), wherein the amount of the inorganic filler is 70% by weight or more and 88% by weight or less of the entire molding material,
(5) An electronic component device including an element sealed with the sealing epoxy resin molding material according to any one of (1) to (4),
About.
本発明になる封止用エポキシ樹脂成形材料は、流動性や硬化性等の成形性、難燃性、耐熱性、耐冷熱サイクル性等の信頼性等に優れ、この封止用エポキシ樹脂成形材料を用いてIC、LSI等の電子部品を封止すれば、成形性や信頼性に優れた電子部品装置を得ることができ、その工業的価値は大である。 The epoxy resin molding material for sealing according to the present invention is excellent in moldability such as fluidity and curability, flame retardancy, heat resistance, reliability such as thermal cycle resistance, etc., and this epoxy resin molding material for sealing Is used to seal electronic components such as ICs and LSIs, an electronic component device excellent in moldability and reliability can be obtained, and its industrial value is great.
本発明では、高いガラス転移点と高い難燃性の両立を実現する為に、(A)エポキシ樹脂として、ヒドロキシナフタレン及びジヒドロキシナフタレンの少なくともいずれかの2量体をグリシジルエーテル化して得られるエポキシ樹脂を単独又は二種以上併用して含むことが必要である。高いガラス転移点を実現する為には、ヒドロキシナフタレン及びジヒドロキシナフタレンの2量体をグリシジルエーテル化して得られる3官能のエポキシ樹脂を用いることが好ましく、ジヒドロキシナフタレンの2量体をグリシジルエーテル化して得られる4官能のエポキシ樹脂を用いることがより好ましく、これらの混合物を用いても良い。ジヒドロキシナフタレンの2量体をグリシジルエーテル化して得られるエポキシ樹脂を主成分とするエポキシ樹脂としては、市販品としてHP−4701(大日本インキ化学工業株式会社製商品名)等が入手可能である。 In the present invention, an epoxy resin obtained by glycidyl etherification of at least one dimer of hydroxynaphthalene and dihydroxynaphthalene as (A) an epoxy resin in order to realize both a high glass transition point and high flame retardancy. It is necessary to contain singly or in combination of two or more. In order to realize a high glass transition point, it is preferable to use a trifunctional epoxy resin obtained by glycidyl etherification of a dimer of hydroxynaphthalene and dihydroxynaphthalene, and obtained by glycidyl etherification of a dihydroxynaphthalene dimer. It is more preferable to use a tetrafunctional epoxy resin, and a mixture thereof may be used. As an epoxy resin mainly composed of an epoxy resin obtained by glycidyl etherification of a dihydroxynaphthalene dimer, HP-4701 (trade name, manufactured by Dainippon Ink & Chemicals, Inc.) is available.
本発明の効果を充分得る為には、前記2量体をグリシジルエーテル化して得られるエポキシ樹脂を(A)成分全体の40重量%以上とすることが好ましく、50重量%以上とすることがより好ましく、60重量%以上とすることが特に好ましい。40重量%未満だと、高いガラス転移点と高い難燃性の両立が困難となる傾向がある。
本発明では、(A)成分として、前記2量体をグリシジルエーテル化して得られるエポキシ樹脂の他に封止用エポキシ樹脂成形材料に一般に使用されているエポキシ樹脂を特に制限なく併用することが可能である。併用可能な樹脂として、例えばフェノールノボラック型エポキシ樹脂、オルソクレゾールノボラック型エポキシ樹脂をはじめとするフェノール、クレゾール、キシレノール、レゾルシン、カテコール、ビスフェノールA、ビスフェノールF等のフェノール類及び/又はα−ナフトール、β−ナフトール、ジヒドロキシナフタレン等のナフトール類とホルムアルデヒド、アセトアルデヒド、プロピオンアルデヒド、ベンズアルデヒド、サリチルアルデヒド等のアルデヒド基を有する化合物とを酸性触媒下で縮合又は共縮合させて得られるノボラック樹脂をエポキシ化したもの、ビスフェノールA、ビスフェノールF、ビスフェノールS、ビスフェノールA/D等のジグリシジルエーテル、アルキル置換又は非置換のビフェノールのジグリシジルエーテルであるビフェニル型エポキシ樹脂、フェノール類及び/又はナフトール類とジメトキシパラキシレン又はビス(メトキシメチル)ビフェニルから合成されるフェノール・アラルキル樹脂やナフトールアラルキル樹脂、ビフェニル・アラルキル樹脂等のエポキシ化物、スチルベン型エポキシ樹脂、ハイドロキノン型エポキシ樹脂、フタル酸、ダイマー酸等の多塩基酸とエピクロルヒドリンの反応により得られるグリシジルエステル型エポキシ樹脂、ジアミノジフェニルメタン、イソシアヌル酸等のポリアミンとエピクロルヒドリンの反応により得られるグリシジルアミン型エポキシ樹脂、ジシクロペンタジエンとフェノ−ール類の共縮合樹脂のエポキシ化物であるジシクロペンタジエン型エポキシ樹脂、トリフェノールメタン型エポキシ樹脂、トリメチロールプロパン型エポキシ樹脂、テルペン変性エポキシ樹脂、オレフィン結合を過酢酸等の過酸で酸化して得られる線状脂肪族エポキシ樹脂、脂環族エポキシ樹脂、及びこれらのエポキシ樹脂をシリコーン、アクリロニトリル、ブタジエン、イソプレン系ゴム、ポリアミド系樹脂等により変性したエポキシ樹脂などが挙げられる。
In order to sufficiently obtain the effects of the present invention, the epoxy resin obtained by glycidyl etherification of the dimer is preferably 40% by weight or more of the total component (A), more preferably 50% by weight or more. It is preferably 60% by weight or more. If it is less than 40% by weight, it tends to be difficult to achieve both a high glass transition point and high flame retardancy.
In the present invention, as the component (A), in addition to an epoxy resin obtained by glycidyl etherification of the dimer, an epoxy resin generally used for an epoxy resin molding material for sealing can be used in combination without any particular limitation. It is. Examples of resins that can be used in combination include phenol novolac type epoxy resins, orthocresol novolac type epoxy resins, and other phenols such as phenol, cresol, xylenol, resorcin, catechol, bisphenol A, bisphenol F, and / or α-naphthol, β An epoxidized novolak resin obtained by condensation or cocondensation of naphthols such as naphthol and dihydroxynaphthalene and a compound having an aldehyde group such as formaldehyde, acetaldehyde, propionaldehyde, benzaldehyde, and salicylaldehyde under an acidic catalyst; Diglycidyl ethers such as bisphenol A, bisphenol F, bisphenol S, bisphenol A / D, and diglycidyl ethers of alkyl-substituted or unsubstituted biphenols Biphenyl type epoxy resin, which is ether, epoxidized products such as phenol aralkyl resin, naphthol aralkyl resin, biphenyl aralkyl resin, stilbene type synthesized from phenol and / or naphthol and dimethoxyparaxylene or bis (methoxymethyl) biphenyl Epoxy resin, hydroquinone type epoxy resin, glycidyl ester type epoxy resin obtained by reaction of polybasic acid such as phthalic acid and dimer acid and epichlorohydrin, diaminodiphenylmethane, isocyanuric acid etc. and glycidyl amine type epoxy obtained by reaction of epichlorohydrin Resin, dicyclopentadiene type epoxy resin and triphenolmethane type epoxy which are epoxidized products of co-condensation resin of dicyclopentadiene and phenols Fat, trimethylolpropane type epoxy resin, terpene modified epoxy resin, linear aliphatic epoxy resin obtained by oxidizing olefin bond with peracid such as peracetic acid, alicyclic epoxy resin, and these epoxy resins as silicone, Examples thereof include epoxy resins modified with acrylonitrile, butadiene, isoprene-based rubber, polyamide-based resin, and the like.
本発明の(B)硬化剤には、特に難燃性の点から、下記一般式(I)で表される化合物を単独又は二種以上併用して含むことが必要である。
上記一般式(I)で表される化合物としては、一般式(II)で表されるフェノール・アラルキル樹脂、一般式(III)で表されるビフェニル・アラルキル樹脂、一般式(IV)、一般式(V)で表されるナフトール・アラルキル樹脂等を挙げることができ、難燃性の点からは一般式(III)で表されるビフェニル・アラルキル樹脂を単独又は併用して用いることが好ましく、(B)成分全体の40重量%以上とすることがより好ましく、50重量%以上とすることが特に好ましい。
Examples of the compound represented by the general formula (I) include a phenol / aralkyl resin represented by the general formula (II), a biphenyl / aralkyl resin represented by the general formula (III), a general formula (IV), and a general formula The naphthol aralkyl resin represented by (V) can be mentioned, and from the viewpoint of flame retardancy, it is preferable to use the biphenyl aralkyl resin represented by the general formula (III) alone or in combination. It is more preferable to set it as 40 weight% or more of the whole B) component, and it is especially preferable to set it as 50 weight% or more.
上記一般式(II)で示されるフェノール・アラルキル樹脂としては、市販品として三井化学株式会社製商品名XLCが挙げられ、上記一般式(III)で示されるビフェニル・アラルキル樹脂としては、市販品として明和化成株式会社製商品名MEH−7851が挙げられる。又、上記一般式(IV)で示されるナフトール・アラルキル樹脂としては、市販品として新日鐵化学株式会社製商品名SN−170が挙げられ、上記一般式(V)で示されるナフトール・アラルキル樹脂としては、市販品として新日鐵化学株式会社製商品名SN−475が挙げられる。また、上記一般式(II)〜(V)で示される化合物中の、ベンゼン環及びナフタレン環上の水素原子のいずれかを炭化水素基で置換した化合物も一般式(I)で表される化合物に含まれる。 As a phenol aralkyl resin represented by the above general formula (II), a trade name XLC manufactured by Mitsui Chemicals, Inc. may be mentioned as a commercially available product. As a biphenyl aralkyl resin represented by the above general formula (III), Meiwa Kasei Co., Ltd. product name MEH-7851 is mentioned. Moreover, as a naphthol aralkyl resin shown by the said general formula (IV), Nippon Steel Chemical Co., Ltd. brand name SN-170 is mentioned as a commercial item, The naphthol aralkyl resin shown by the said general formula (V) is mentioned. As a commercial item, Nippon Steel Chemical Co., Ltd. product name SN-475 is mentioned. In addition, in the compounds represented by the general formulas (II) to (V), a compound in which any one of the hydrogen atoms on the benzene ring and the naphthalene ring is substituted with a hydrocarbon group is also represented by the general formula (I). include.
本発明では、(B)成分として、一般式(I)で表される硬化剤の他に、封止用エポキシ樹脂成形材料に一般に使用されている硬化剤を特に制限なく併用することができる。併用可能な硬化剤として、例えばフェノール、クレゾール、レゾルシン、カテコール、ビスフェノールA、ビスフェノールF、フェニルフェノール、アミノフェノール等のフェノール類及び/又はα−ナフトール、β−ナフトール、ジヒドロキシナフタレン等のナフトール類とホルムアルデヒド、ベンズアルデヒド、サリチルアルデヒド等のアルデヒド基を有する化合物とを酸性触媒下で縮合又は共縮合させて得られるノボラック型フェノール樹脂、ジシクロペンタジエン型フェノール樹脂、テルペン変性フェノール樹脂、トリフェノールメタン型フェノール樹脂等が挙げられる。 In the present invention, as the component (B), in addition to the curing agent represented by the general formula (I), a curing agent generally used for an epoxy resin molding material for sealing can be used in combination without any particular limitation. Examples of curing agents that can be used in combination include phenols such as phenol, cresol, resorcin, catechol, bisphenol A, bisphenol F, phenylphenol, aminophenol, and / or naphthols such as α-naphthol, β-naphthol, dihydroxynaphthalene, and formaldehyde. , Novolak-type phenolic resin, dicyclopentadiene-type phenolic resin, terpene-modified phenolic resin, triphenolmethane-type phenolic resin, etc. obtained by condensation or cocondensation with compounds having an aldehyde group such as benzaldehyde, salicylaldehyde, etc. under an acidic catalyst Is mentioned.
(A)成分のエポキシ樹脂と(B)成分の硬化剤との当量比、すなわち、エポキシ樹脂中のエポキシ基数/硬化剤中の水酸基数の比は、特に制限はないが、それぞれの未反応分を少なく抑えるために0.5〜2の範囲に設定されることが好ましく、0.6〜1.5がより好ましい。成形性や信頼性に優れる封止用エポキシ樹脂成形材料を得るためには0.8〜1.2の範囲に設定されることがさらに好ましい。 The equivalent ratio of the (A) component epoxy resin and the (B) component curing agent, that is, the ratio of the number of epoxy groups in the epoxy resin / the number of hydroxyl groups in the curing agent is not particularly limited. Is preferably set in the range of 0.5 to 2, more preferably 0.6 to 1.5. In order to obtain an epoxy resin molding material for sealing which is excellent in moldability and reliability, it is more preferable to set in the range of 0.8 to 1.2.
本発明の(C)リン系硬化促進剤成分は硬化促進剤として働くものであり、成形性、信頼性、難燃性の点から、リン系硬化促進剤を用いることが必要である。本発明では、封止用エポキシ樹脂成形材料に一般に用いられるリン系硬化促進剤を特に制限なく用いることが可能で、ここでリン系硬化促進剤とは、分子内に、アルキル基、フェニル基、及びフェニル基の水素原子の一部又は全部をアルキル基又はアルコキシ基で置換したフェニル基誘導体の、少なくともいずれかと直接結合するリン原子を有する化合物を指し、これらに無水マレイン酸、キノン化合物、ジアゾフェニルメタン、フェノール樹脂等のπ結合をもつ化合物やテトラフェニルボロン塩及びその誘導体等を付加してなる分子内分極を有する化合物をも含む。例えば、トリブチルホスフィン、メチルジフェニルホスフィン、トリフェニルホスフィン、トリス(4−メチルフェニル)ホスフィン、ジフェニルホスフィン、フェニルホスフィン等の有機ホスフィン、及びこれらの有機ホスフィンに無水マレイン酸、1,4−ベンゾキノン、2,5−トルキノン、1,4−ナフトキノン、2,3−ジメチルベンゾキノン、2,6−ジメチルベンゾキノン、2,3−ジメトキシ−5−メチル−1,4−ベンゾキノン、2,3−ジメトキシ−1,4−ベンゾキノン、フェニル−1,4−ベンゾキノン等のキノン化合物、ジアゾフェニルメタン、フェノール樹脂等のπ結合をもつ化合物を付加してなる分子内分極を有する化合物等の有機リン化合物、テトラフェニルホスホニウムテトラフェニルボレート、トリフェニルホスフィンテトラフェニルボレート等の有機リン化合物などが挙げられる。
本発明ではまた、流動性や硬化性等の成形性と難燃性とのバランスの点から、硬化促進剤中のリンの含有率を成形材料全体の200〜500ppmとすることが必要である。リンの含有率が200ppm未満だと硬化性や難燃性に、500ppmを超えると流動性に、それぞれ悪影響を与える可能性がある。なお、ここでリンの含有率とは、下記式(1)により求められる値である。
(リン含有率)=(30.975/M)×(w/W)×106(ppm) …(式1)
(式(1)において、M:リン系硬化促進剤の分子量、w:リン系硬化促進剤量、W:成形材料の総重量)
リン系硬化促進剤は、1種の化合物を単独で用いても良いし、2種以上の化合物を併用して用いても構わない。2種以上の化合物を併用して用いる場合には、硬化促進剤中のリン含有率の合計量を上記範囲とすることが必要である。
The phosphorus-based curing accelerator component (C) of the present invention functions as a curing accelerator, and it is necessary to use a phosphorus-based curing accelerator from the viewpoint of moldability, reliability, and flame retardancy. In the present invention, it is possible to use a phosphorus-based curing accelerator generally used in an epoxy resin molding material for sealing without particular limitation, and the phosphorus-based curing accelerator is an alkyl group, a phenyl group, And a compound having a phosphorus atom directly bonded to at least one of phenyl group derivatives in which part or all of the hydrogen atoms of the phenyl group are substituted with an alkyl group or an alkoxy group. These include maleic anhydride, quinone compounds, diazophenyl. Also included are compounds having an intramolecular polarization formed by adding a compound having a π bond, such as methane and phenol resin, and a tetraphenylboron salt and derivatives thereof. For example, organic phosphines such as tributylphosphine, methyldiphenylphosphine, triphenylphosphine, tris (4-methylphenyl) phosphine, diphenylphosphine, and phenylphosphine, and maleic anhydride, 1,4-benzoquinone, 2, 5-toluquinone, 1,4-naphthoquinone, 2,3-dimethylbenzoquinone, 2,6-dimethylbenzoquinone, 2,3-dimethoxy-5-methyl-1,4-benzoquinone, 2,3-dimethoxy-1,4- Organophosphorus compounds such as compounds having intramolecular polarization formed by adding a quinone compound such as benzoquinone and phenyl-1,4-benzoquinone, diazophenylmethane, and a compound having a π bond such as a phenol resin, tetraphenylphosphonium tetraphenylborate The trough And organic phosphorus compounds such as sulfonyl phosphine tetraphenyl borate and the like.
In the present invention, it is necessary that the content of phosphorus in the curing accelerator is 200 to 500 ppm of the entire molding material from the viewpoint of balance between moldability such as fluidity and curability and flame retardancy. If the phosphorus content is less than 200 ppm, the curability and flame retardancy may be adversely affected, and if it exceeds 500 ppm, the fluidity may be adversely affected. In addition, the content rate of phosphorus here is a value calculated | required by following formula (1).
(Phosphorus content) = (30.975 / M) × (w / W) × 10 6 (ppm) (Formula 1)
(In formula (1), M: molecular weight of phosphorus-based curing accelerator, w: amount of phosphorus-based curing accelerator, W: total weight of molding material)
As the phosphorus curing accelerator, one kind of compound may be used alone, or two or more kinds of compounds may be used in combination. When using 2 or more types of compounds together, it is necessary to make the total amount of phosphorus content in a hardening accelerator into the said range.
本発明では、上記(C)リン系硬化促進剤の他に、封止用エポキシ樹脂成形材料に一般的に用いられる1,8−ジアザ−ビシクロ(5,4,0)ウンデセン−7、1,5−ジアザ−ビシクロ(4,3,0)ノネン、5,6−ジブチルアミノ−1,8−ジアザ−ビシクロ(5,4,0)ウンデセン−7等のシクロアミジン化合物等のアミン系硬化促進剤や、2−メチルイミダゾール、2−フェニルイミダゾール、2−フェニル−4−メチルイミダゾール等のイミダゾール系硬化促進剤、2−エチル−4−メチルイミダゾールテトラフェニルボレート、N−メチルモルホリンテトラフェニルボレート等のテトラフェニルボロン系硬化促進剤等を、その効果を損なわない範囲で併用することができる。 In the present invention, in addition to the (C) phosphorus-based curing accelerator, 1,8-diaza-bicyclo (5,4,0) undecene-7, 1, Amine-based curing accelerators such as cycloamidine compounds such as 5-diaza-bicyclo (4,3,0) nonene and 5,6-dibutylamino-1,8-diaza-bicyclo (5,4,0) undecene-7 And imidazole curing accelerators such as 2-methylimidazole, 2-phenylimidazole and 2-phenyl-4-methylimidazole, tetra such as 2-ethyl-4-methylimidazole tetraphenylborate and N-methylmorpholine tetraphenylborate A phenylboron curing accelerator or the like can be used in combination as long as the effect is not impaired.
(C)成分の配合量は、上記したように、硬化促進剤中のリン含有率が200〜500ppmとなるように設定されることが必要である。リン系硬化促進剤以外の硬化促進剤を併用する場合には、特に信頼性の点から、該硬化促進剤をリン系硬化促進剤の50重量%以下とすることが好ましい。 (C) As mentioned above, the compounding quantity of a component needs to be set so that the phosphorus content rate in a hardening accelerator may be 200-500 ppm. When a curing accelerator other than the phosphorus curing accelerator is used in combination, the curing accelerator is preferably 50% by weight or less of the phosphorus curing accelerator, particularly from the viewpoint of reliability.
本発明では又、吸湿性、線膨張係数低減、熱伝導性向上及び強度向上等の為に、(D)無機充填剤を配合することが必要である。無機充填剤としては、例えば、溶融シリカ、結晶シリカ、アルミナ、ジルコン、珪酸カルシウム、炭酸カルシウム、チタン酸カリウム、炭化珪素、窒化珪素、窒化アルミ、窒化ホウ素、ベリリア、ジルコニア、ジルコン、フォステライト、ステアタイト、スピネル、ムライト、チタニア等の粉体、又はこれらを球形化したビーズ、ガラス繊維などが挙げられ、これらは単独で用いても2種以上を併用して用いてもよい。流動性、線膨張係数低減の観点からは、結晶シリカ、溶融シリカを用いることが好ましく、溶融シリカを用いることがより好ましく、球状溶融シリカを用いることが特に好ましい。さらに、本発明の効果を失わない範囲で、難燃効果のある水酸化アルミニウム、水酸化マグネシウム等の金属水酸化物系無機充填剤を添加してもよい。
無機充填剤の配合量は、特に銅リードフレームパッケージでの耐冷熱サイクル性の点から、成形材料全体の70〜88重量%とすることが好ましく、75〜85重量%とすることが特に好ましい。(D)成分が70重量%未満でも88重量%を超えても、ともに封止用エポキシ樹脂成形材料とリードフレームとの線膨張係数のミスマッチが顕著となり、耐冷熱サイクル性に不利となる。
In the present invention, it is also necessary to blend (D) an inorganic filler for hygroscopicity, reduction of linear expansion coefficient, improvement of thermal conductivity and improvement of strength. Examples of the inorganic filler include fused silica, crystalline silica, alumina, zircon, calcium silicate, calcium carbonate, potassium titanate, silicon carbide, silicon nitride, aluminum nitride, boron nitride, beryllia, zirconia, zircon, fosterite, steer. Examples thereof include powders such as tight, spinel, mullite, and titania, or beads formed by spheroidizing these, and glass fibers. These may be used alone or in combination of two or more. From the viewpoint of reducing fluidity and linear expansion coefficient, it is preferable to use crystalline silica or fused silica, more preferably fused silica, and particularly preferably spherical fused silica. Furthermore, you may add metal hydroxide type inorganic fillers, such as aluminum hydroxide and magnesium hydroxide which have a flame-retardant effect, in the range which does not lose the effect of this invention.
The blending amount of the inorganic filler is preferably 70 to 88% by weight, particularly preferably 75 to 85% by weight based on the whole molding material, particularly from the viewpoint of cold heat cycle resistance in the copper lead frame package. Even if the component (D) is less than 70% by weight or more than 88% by weight, mismatch in the linear expansion coefficient between the epoxy resin molding material for sealing and the lead frame becomes remarkable, which is disadvantageous for the thermal cycle resistance.
本発明では、(A)〜(D)成分以外にも、成形時の金型からの円滑な離型性を確保する為に、ステアリン酸、モンタン酸等の高級脂肪酸系ワックス、ステアリン酸エステル、モンタン酸エステル等の高級脂肪酸エステル系ワックス、ポリエチレンをはじめとするポリオレフィン等、封止用エポキシ樹脂成形材料に用いられる従来公知の離型剤を単独、又は併用して用いることができる。 In the present invention, in addition to the components (A) to (D), in order to ensure smooth releasability from the mold during molding, higher fatty acid waxes such as stearic acid and montanic acid, stearates, Conventionally known release agents used for molding epoxy resin molding materials such as higher fatty acid ester waxes such as montanic acid esters, polyolefins including polyethylene, etc. can be used alone or in combination.
本発明の封止用エポキシ樹脂成形材料には、IC等の半導体素子の耐湿性、高温放置特性を向上させる観点から陰イオン交換体を添加することもできる。陰イオン交換体としては特に制限はなく、従来公知のものを用いることができるが、例えば、ハイドロタルサイトや、ビスマス、ジルコニウム、チタン、スズ、マグネシウム、アルミニウムから選ばれる元素の含水酸化物等が挙げられ、これらを単独で又は2種以上を組み合わせて用いることができる。中でも、下記一般式(VI)で示されるハイドロタルサイト及びビスマスの含水酸化物が好ましい。
(化7)
Mg1−XAlX(OH)2(CO3)X/2・mH2O ……(VI)
(0<X≦0.5、mは正の整数)
陰イオン交換体の配合量は、ハロゲンイオン等のイオン性不純物を捕捉できる十分な量であれば特に制限はないが、(A)成分のエポキシ樹脂に対して0.1〜30重量%が好ましく、1〜10重量%がより好ましく、2〜5重量%がさらに好ましい。配合量が0.1重量%未満ではイオン性不純物の捕捉が不十分になる傾向があり、30重量%を超えた場合それ以下に比べて効果に大差がないため経済的に不利である。
An anion exchanger can be added to the sealing epoxy resin molding material of the present invention from the viewpoint of improving the moisture resistance and high temperature storage characteristics of a semiconductor element such as an IC. The anion exchanger is not particularly limited, and conventionally known anion exchangers can be used. Examples thereof include hydrotalcite and hydrated oxides of elements selected from bismuth, zirconium, titanium, tin, magnesium, and aluminum. These may be used alone or in combination of two or more. Among these, hydrotalcite and bismuth hydrous oxide represented by the following general formula (VI) are preferable.
(Chemical formula 7)
Mg 1-X Al X (OH) 2 (CO 3 ) X / 2 · mH 2 O (VI)
(0 <X ≦ 0.5, m is a positive integer)
The amount of the anion exchanger is not particularly limited as long as it is sufficient to capture ionic impurities such as halogen ions, but is preferably 0.1 to 30% by weight with respect to the epoxy resin of component (A). 1-10 weight% is more preferable, and 2-5 weight% is further more preferable. If the blending amount is less than 0.1% by weight, trapping of ionic impurities tends to be insufficient, and if it exceeds 30% by weight, there is no significant difference in the effect compared to the amount less than that, which is economically disadvantageous.
本発明の封止用エポキシ樹脂成形材料には、樹脂成分と無機充填剤との接着性を高めるために、必要に応じて、エポキシシラン、メルカプトシラン、アミノシラン、アルキルシラン、ウレイドシラン、ビニルシラン等の各種シラン系化合物、チタン系化合物、アルミニウムキレート類、アルミニウム/ジルコニウム系化合物等の公知のカップリング剤を添加することができる。これらは単独で用いても、2種以上を併用して用いても構わない。
上記カップリング剤の配合量は、無機充填剤に対して0.05〜5重量%であることが好ましく、0.1〜2.5重量%がより好ましい。0.05重量%未満では耐湿性が低下する傾向があり、5重量%を超えるとパッケージの成形性が低下する傾向がある。
In the epoxy resin molding material for sealing of the present invention, epoxy silane, mercapto silane, amino silane, alkyl silane, ureido silane, vinyl silane, etc. are used as necessary to enhance the adhesion between the resin component and the inorganic filler. Various known coupling agents such as various silane compounds, titanium compounds, aluminum chelates, and aluminum / zirconium compounds can be added. These may be used alone or in combination of two or more.
The amount of the coupling agent is preferably 0.05 to 5% by weight, more preferably 0.1 to 2.5% by weight, based on the inorganic filler. If it is less than 0.05% by weight, the moisture resistance tends to decrease, and if it exceeds 5% by weight, the moldability of the package tends to decrease.
本発明の成形材料においては、臭素化エポキシ樹脂等のハロゲン系難燃剤の含有量と、三酸化アンチモン、四酸化アンチモン、五酸化アンチモン等のアンチモン系難燃剤の含有量とは、いずれも成形材料全体の0.1重量%以下であることが好ましい。ハロゲン系難燃剤及びアンチモン系難燃剤のいずれも含まないことがより好ましい。
さらに、本発明の封止用エポキシ樹脂成形材料には、本発明の効果を損なわない範囲で、カーボンブラック、有機染料、有機顔料、酸化チタン、鉛丹、ベンガラ等の着色剤、イミダゾール、トリアゾール、テトラゾール、トリアジン等及びこれらの誘導体、アントラニル酸、没食子酸、マロン酸、リンゴ酸、マレイン酸、アミノフェノール、キノリン等及びこれらの誘導体、脂肪族酸アミド化合物、ジチオカルバミン酸塩、チアジアゾール誘導体等の接着促進剤などを必要に応じて配合することができる。
In the molding material of the present invention, the content of halogen flame retardant such as brominated epoxy resin and the content of antimony flame retardant such as antimony trioxide, antimony tetroxide, and antimony pentoxide are both molding materials. The total content is preferably 0.1% by weight or less. More preferably, neither halogen-based flame retardant nor antimony-based flame retardant is included.
Furthermore, in the epoxy resin molding material for sealing of the present invention, the colorant such as carbon black, organic dye, organic pigment, titanium oxide, red lead, bengara, imidazole, triazole, as long as the effects of the present invention are not impaired. Adhesion promotion of tetrazole, triazine, etc. and their derivatives, anthranilic acid, gallic acid, malonic acid, malic acid, maleic acid, aminophenol, quinoline, etc. and their derivatives, aliphatic acid amide compounds, dithiocarbamates, thiadiazole derivatives, etc. An agent etc. can be mix | blended as needed.
本発明の封止用エポキシ樹脂成形材料は、各種原材料を均一に分散混合できるのであれば、いかなる手法を用いても調製できるが、一般的な手法として、所定の配合量の原材料をミキサー等によって十分混合した後、ミキシングロール、ニーダ、押出機等によって溶融混練した後、冷却、粉砕する方法を挙げることができる。成形条件に合うような寸法及び重量でタブレット化すると使いやすい。
また、本発明の封止用エポキシ樹脂成形材料は、各種有機溶剤に溶かして液状封止用エポキシ樹脂成形材料として使用することもでき、この液状封止用エポキシ樹脂成形材料を板又はフィルム上に薄く塗布し、樹脂の硬化反応が余り進まないような条件で有機溶剤を飛散させることによって得られるシートあるいはフィルム状の封止用エポキシ樹脂成形材料として使用することもできる。
The epoxy resin molding material for sealing of the present invention can be prepared by any method as long as various raw materials can be uniformly dispersed and mixed. However, as a general method, a raw material having a predetermined blending amount is mixed with a mixer or the like. A method of sufficiently cooling and pulverizing after mixing and melting and kneading with a mixing roll, a kneader, an extruder or the like can be mentioned. It is easy to use if it is tableted with dimensions and weight that match the molding conditions.
Moreover, the epoxy resin molding material for sealing of the present invention can be dissolved in various organic solvents and used as a liquid epoxy resin molding material for liquid sealing. This liquid epoxy resin molding material for liquid sealing can be used on a plate or a film. It can also be used as an epoxy resin molding material for sealing in the form of a sheet or film obtained by coating thinly and scattering the organic solvent under conditions that do not allow the resin curing reaction to proceed so much.
本発明で得られる封止用エポキシ樹脂成形材料により素子を封止して得られる電子部品装置としては、リードフレーム、配線済みのテープキャリア、配線板、ガラス、シリコンウエハ等の支持部材に、半導体チップ、トランジスタ、ダイオード、サイリスタ等の能動素子、コンデンサ、抵抗体、コイル等の受動素子等の素子を搭載し、必要な部分を本発明の封止用エポキシ樹脂成形材料で封止した、電子部品装置などが挙げられる。このような電子部品装置としては、例えば、リードフレーム上に半導体素子を固定し、ボンディングパッド等の素子の端子部とリード部をワイヤボンディングやバンプで接続した後、本発明の封止用エポキシ樹脂成形材料を用いてトランスファ成形などにより封止してなる、DIP(Dual Inline Package)、PLCC(Plastic Leaded Chip Carrier)、QFP(Quad Flat Package)、SOP(Small Outline Package)、SOJ(Small Outline J-lead package)、TSOP(Thin Small Outline Package)、TQFP(Thin Quad Flat Package)等の一般的な樹脂封止型IC、テープキャリアにバンプで接続した半導体チップを、本発明の封止用エポキシ樹脂成形材料で封止したTCP(Tape Carrier Package)、配線板やガラス上に形成した配線に、ワイヤボンディング、フリップチップボンディング、はんだ等で接続した半導体チップ、トランジスタ、ダイオード、サイリスタ等の能動素子及び/又はコンデンサ、抵抗体、コイル等の受動素子を、本発明の封止用エポキシ樹脂成形材料で封止したCOB(Chip On Board)モジュール、ハイブリッドIC、マルチチップモジュール、配線板接続用の端子を形成した有機基板に素子を搭載し、バンプまたはワイヤボンディングにより素子と有機基板に形成された配線を接続した後、本発明の封止用エポキシ樹脂成形材料で素子を封止したBGA(Ball Grid Array)、CSP(Chip Size Package)などが挙げられる。また、プリント回路板にも本発明の封止用エポキシ樹脂成形材料は有効に使用できる。 As an electronic component device obtained by sealing an element with the sealing epoxy resin molding material obtained in the present invention, a lead frame, a wired tape carrier, a wiring board, glass, a silicon wafer, a support member such as a semiconductor Electronic components equipped with active elements such as chips, transistors, diodes, and thyristors, and passive elements such as capacitors, resistors, and coils, and encapsulated with the epoxy resin molding material for sealing of the present invention. Examples thereof include devices. As such an electronic component device, for example, a semiconductor element is fixed on a lead frame, and a terminal portion and a lead portion of an element such as a bonding pad are connected by wire bonding or bump, and then the epoxy resin for sealing of the present invention is used. DIP (Dual Inline Package), PLCC (Plastic Leaded Chip Carrier), QFP (Quad Flat Package), SOP (Small Outline Package), SOJ (Small Outline J-) General resin-encapsulated ICs such as lead package (TSP), TSOP (Thin Small Outline Package), and TQFP (Thin Quad Flat Package), and semiconductor chips connected to the tape carrier by bumps are molded with epoxy resin for sealing. TCP (Tape Carrier Package) sealed with materials, wire bonding, flip chip bonding to wiring formed on wiring boards and glass COB (Chip On) in which active elements such as semiconductor chips, transistors, diodes, thyristors and / or passive elements such as capacitors, resistors, coils, etc., which are connected by solder or the like, are sealed with the sealing epoxy resin molding material of the present invention. Board) module, hybrid IC, multi-chip module, an element mounted on an organic substrate on which a wiring board connection terminal is formed, and after connecting the element and the wiring formed on the organic substrate by bump or wire bonding, Examples thereof include BGA (Ball Grid Array) and CSP (Chip Size Package) in which the element is sealed with a sealing epoxy resin molding material. Moreover, the epoxy resin molding material for sealing of the present invention can also be used effectively for printed circuit boards.
本発明の封止用エポキシ樹脂成形材料を用いて素子を封止する方法としては、低圧トランスファ成形法が最も一般的であるが、インジェクション成形法、圧縮成形法等を用いてもよい。封止用エポキシ樹脂成形材料が常温で液状又はペースト状の場合は、ディスペンス方式、注型方式、印刷方式等が挙げられる。
また、素子を直接樹脂封止する一般的な封止方法ばかりではなく、素子に直接電子部品封止用エポキシ樹脂成形材料が接触しない形態である中空パッケージの方式もあり、中空パッケージ用の封止用エポキシ樹脂成形材料としても好適に使用できる。
As a method for sealing an element using the epoxy resin molding material for sealing of the present invention, a low-pressure transfer molding method is the most common, but an injection molding method, a compression molding method, or the like may be used. When the sealing epoxy resin molding material is liquid or pasty at normal temperature, a dispensing method, a casting method, a printing method, and the like can be given.
Also, not only a general sealing method for directly sealing an element with a resin, but also a hollow package system in which an epoxy resin molding material for sealing an electronic component is not in direct contact with the element, sealing for a hollow package Also suitable for use as an epoxy resin molding material.
(実施例1〜6、及び比較例1〜11)
(A)成分のエポキシ樹脂として、ジヒドロキシナフタレン2量体のエポキシ化物を主成分とするエポキシ樹脂(エポキシ樹脂1、エポキシ当量168、軟化点70℃、大日本インキ化学工業株式会社製商品名HP−4701)、
(A)成分の比較エポキシ樹脂としてエポキシ当量196、融点106℃のビフェニル型エポキシ樹脂(比較エポキシ樹脂1、ジャパンエポキシレジン株式会社製商品名エピコートYX−4000H)、
エポキシ当量170、軟化点60℃のトリフェノールメタン型エポキシ樹脂(比較エポキシ樹脂2、ジャパンエポキシレジン株式会社製商品名エピコート1032H60)を用意した。
(B)成分の硬化剤として水酸基当量200、軟化点65℃のビフェニル・アラルキル型フェノール樹脂(硬化剤1、明和化成株式会社製商品名MEH-7851)、
水酸基当量185、軟化点67℃のβ−ナフトール・アラルキル樹脂(硬化剤2、新日鐵化学株式会社製商品名SN−170L)、
(B)成分の比較硬化剤として水酸基当量103、軟化点83℃のトリフェニルメタン型フェノール樹脂(比較硬化剤1、明和化成株式会社製商品名MEH−7500)を用意した。
(C)成分としてトリフェニルホスフィン(硬化促進剤1)、
トリフェニルホスフィンとp−ベンゾキノンとの付加反応物(硬化促進剤2)、
トリブチルホスフィンとp−ベンゾキノンとの付加反応物(硬化促進剤3)、
(C)成分の比較硬化促進剤として1,8−ジアザ−ビシクロ(5,4,0)ウンデセン−7とフェノールノボラックの付加反応物(比較硬化促進剤1)、
2−フェニル−4−メチルイミダゾール(比較硬化促進剤2)を用意した。
(D)無機充填剤として平均粒径17.5μm、比表面積3.8m2/gの球状溶融シリカ、離型剤として酸化型ポリエチレン、カップリング剤としてγ−グリシドキシプロピルトリメトキシシラン(エポキシシラン)、着色剤としてカーボンブラック(三菱化学株式会社製商品名MA−100)を用意した。
これらを、それぞれ表1及び表2に示す重量部で配合し、混練温度80℃、混練時間10分の条件でロール混練を行い、実施例及び比較例の封止用エポキシ樹脂成形材料を作製した。
(Examples 1-6 and Comparative Examples 1-11)
As the epoxy resin of component (A), an epoxy resin (epoxy resin 1, epoxy equivalent 168, softening point 70 ° C., trade name HP-manufactured by Dainippon Ink & Chemicals, Inc.) having an epoxidized product of dihydroxynaphthalene dimer as a main component 4701),
As a comparative epoxy resin of component (A), an epoxy equivalent of 196, a biphenyl type epoxy resin having a melting point of 106 ° C. (Comparative epoxy resin 1, trade name Epicoat YX-4000H manufactured by Japan Epoxy Resin Co., Ltd.),
A triphenolmethane type epoxy resin having an epoxy equivalent of 170 and a softening point of 60 ° C. (Comparative Epoxy Resin 2, trade name Epicoat 1032H60 manufactured by Japan Epoxy Resin Co., Ltd.) was prepared.
(B) Biphenyl aralkyl type phenol resin having a hydroxyl equivalent of 200 and a softening point of 65 ° C. as a curing agent for the component (curing agent 1, trade name MEH-7851 manufactured by Meiwa Kasei Co., Ltd.),
Β-naphthol aralkyl resin having a hydroxyl group equivalent of 185 and a softening point of 67 ° C. (curing agent 2, trade name SN-170L manufactured by Nippon Steel Chemical Co., Ltd.),
As a comparative curing agent for component (B), a triphenylmethane type phenol resin (comparative curing agent 1, Meiwa Kasei Co., Ltd., trade name MEH-7500) having a hydroxyl group equivalent of 103 and a softening point of 83 ° C. was prepared.
(C) component triphenylphosphine (curing accelerator 1),
Addition reaction product of triphenylphosphine and p-benzoquinone (curing accelerator 2),
Addition reaction product of tributylphosphine and p-benzoquinone (curing accelerator 3),
(C) 1,8-diaza-bicyclo (5,4,0) undecene-7 and phenol novolac addition reaction product (comparative curing accelerator 1) as a comparative curing accelerator of component (C)
2-Phenyl-4-methylimidazole (Comparative curing accelerator 2) was prepared.
(D) Spherical fused silica having an average particle diameter of 17.5 μm and a specific surface area of 3.8 m 2 / g as an inorganic filler, oxidized polyethylene as a release agent, and γ-glycidoxypropyltrimethoxysilane (epoxy as a coupling agent) Silane) and carbon black (trade name MA-100 manufactured by Mitsubishi Chemical Corporation) were prepared as a colorant.
These were blended in parts by weight shown in Table 1 and Table 2, respectively, and roll kneading was carried out under conditions of a kneading temperature of 80 ° C. and a kneading time of 10 minutes to produce epoxy resin molding materials for sealing of Examples and Comparative Examples. .
作製した実施例及び比較例の封止用エポキシ樹脂成形材料を、次の各試験により評価した。評価結果を表3及び表4に示す。
なお、封止用エポキシ樹脂成形材料の成形は、トランスファ成形機により、金型温度180℃、成形圧力6.9MPa、硬化時間90秒の条件で行った。また、後硬化は175℃で6時間行った。
(1)スパイラルフロー(流動性の指標)
EMMI−1−66に順じてスパイラルフロー測定用金型を用いて、封止用エポキシ樹脂成形材料を上記条件で成形し、流動距離(cm)を求めた。
(2)熱時硬度
中央部に直径30mm、深さ4mmのカル部分を持った三富金属株式会社製バリ金型を用いて、封止用エポキシ樹脂成形材料を上記条件で直径30mm×厚さ4mmの円板に成形し、成形後直ちに、すなわちトランスファプレスの下型が開き始めてから5秒後に金型を取リ出し、その直後に、成形品(金型中央部のカル部分)のショアD硬度を測定した。
(3)燃焼性
後硬化後の試験片(試験片厚み1/8inch)を用いて、94UL規格に従い、燃焼性の判定を行った。
(4)耐熱性
SOP-28p(42Alloy リードフレーム)にTEG-ML1020チップ(Line/Space=20μm/20μm領域2ヶ所:1.90×4.20mm、Line/Space=10μm/10μm領域2ヶ所:1.90×4.20mm)を搭載し、リードフレームとチップとをφ20μmの金線により接続した。その後、作製した成形材料による封止を行い、後硬化後、195℃環境中に1000時間放置した。
各成形材料による作製パッケージN=10のうち、放置後の電気導通の有無を測定し、計4配線のうち、1配線でも導通不具合のあるパッケージをNGパッケージとしてカウントした。
(5)耐冷熱サイクル性
QFP1420×2.0mmt(EFTEC-64Tリードフレーム/フラットアイランド)にシリコンチップ(8×10mm/窒化珪素保護膜)を搭載した。ダイボンド材には日立化成工業(株)製EN-4065Dを用いた。ダイボンド材の硬化条件は210℃/2分とした。成形材料による封止を行い、後硬化後、パッケージを液体窒素(−196℃)とシリコーンオイル(150℃)とに各2分間ずつ交互に浸す形での冷熱サイクル試験を行った。50サイクル後のパッケージを株式会社日立製作所製SATを用いて観察し、チップ剥離、リードフレーム剥離、パッケージクラックの有無を判定した。各成形材料による作製パッケージN=10のうち、剥離やクラック等の不具合の発生したパッケージをNGパッケージとしてカウントした。
The produced epoxy resin molding materials for sealing of Examples and Comparative Examples were evaluated by the following tests. The evaluation results are shown in Tables 3 and 4.
The epoxy resin molding material for sealing was molded by a transfer molding machine under conditions of a mold temperature of 180 ° C., a molding pressure of 6.9 MPa, and a curing time of 90 seconds. Further, post-curing was performed at 175 ° C. for 6 hours.
(1) Spiral flow (fluidity index)
The sealing epoxy resin molding material was molded under the above conditions using a spiral flow measurement mold in accordance with EMMI-1-66, and the flow distance (cm) was determined.
(2) Hardness when heated Using a varis mold made by Mitomi Metal Co., Ltd. having a cull part with a diameter of 30 mm and a depth of 4 mm in the center, the epoxy resin molding material for sealing is 30 mm in diameter and thickness under the above conditions. After forming into a 4 mm disk, immediately after molding, that is, 5 seconds after the lower mold of the transfer press starts to open, the mold is taken out, and immediately after that, the shore D of the molded product (the cull portion at the center of the mold) Hardness was measured.
(3) Flammability Using the post-cured test piece (test piece thickness 1/8 inch), the flammability was determined according to the 94UL standard.
(4) Heat resistance SOP-28p (42Alloy lead frame) with TEG-ML1020 chip (Line / Space = 20 μm / 20 μm area 2 locations: 1.90 × 4.20 mm, Line / Space = 10 μm / 10 μm area 2 locations: 1 .90 × 4.20 mm), and the lead frame and the chip were connected by a gold wire of φ20 μm. Then, sealing with the produced molding material was performed, and after post-curing, it was left in an environment of 195 ° C. for 1000 hours.
Of the manufactured packages N = 10 made of each molding material, the presence or absence of electrical continuity after being left was measured, and among the total of 4 wirings, the package having continuity failure even in one wiring was counted as an NG package.
(5) Cold and heat cycle resistance A silicon chip (8 × 10 mm / silicon nitride protective film) was mounted on QFP1420 × 2.0 mmt (EFTEC-64T lead frame / flat island). EN-4065D manufactured by Hitachi Chemical Co., Ltd. was used as the die bond material. The curing condition of the die bond material was 210 ° C./2 minutes. Sealing with a molding material was carried out, and after post-curing, a cooling cycle test was conducted in which the package was alternately immersed in liquid nitrogen (-196 ° C.) and silicone oil (150 ° C.) for 2 minutes each. The package after 50 cycles was observed using SAT manufactured by Hitachi, Ltd., and the presence or absence of chip peeling, lead frame peeling, or package cracking was determined. Of the production packages N = 10 made of each molding material, the packages with defects such as peeling and cracking were counted as NG packages.
本発明における(A)成分、又は(B)成分が規定から外れる比較例1〜5はいずれも難燃性に劣り、比較例4、5は耐冷熱サイクル性にも劣る。本発明における(C)成分を含まない比較例9〜11は、硬化性、難燃性、耐熱性、耐冷熱サイクル性のいずれか又は複数の項目に劣る。また、本発明における(C)成分を含んでいても、その添加量が規定より外れる比較例6〜8は、流動性(スパイラルフロー)又は難燃性に劣る。
これに対し、本発明における(A)〜(D)成分をすべて含有し、(C)成分の添加量が適正な実施例1〜6は、流動性や硬化性等の成形性、難燃性、耐熱性や耐冷熱サイクル性のいずれにも優れることがわかる。
In Comparative Examples 1 to 5 in which the component (A) or the component (B) in the present invention is not specified, the flame retardancy is inferior, and the comparative examples 4 and 5 are also inferior in the thermal cycle resistance. Comparative Examples 9 to 11 that do not contain the component (C) in the present invention are inferior to any one or a plurality of items of curability, flame retardancy, heat resistance, and cold and heat cycle resistance. Moreover, even if it contains (C) component in this invention, the comparative examples 6-8 from which the addition amount remove | deviates from prescription | regulation are inferior to fluidity | liquidity (spiral flow) or a flame retardance.
On the other hand, Examples 1-6 which contain all (A)-(D) component in this invention, and the addition amount of (C) component is appropriate are moldability, such as fluidity | liquidity and sclerosis | hardenability, and a flame retardance. It can be seen that both heat resistance and heat cycle resistance are excellent.
Claims (5)
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JP2009227947A (en) * | 2008-03-25 | 2009-10-08 | Mitsubishi Electric Corp | Thermal-conductive resin composition, thermal conductive resin, and power module |
WO2016029452A1 (en) * | 2014-08-29 | 2016-03-03 | Blue Cube Ip Llc | Naphthalene based epoxy for halogen-free and flame retardant compositions |
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Publication number | Priority date | Publication date | Assignee | Title |
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JP2009227947A (en) * | 2008-03-25 | 2009-10-08 | Mitsubishi Electric Corp | Thermal-conductive resin composition, thermal conductive resin, and power module |
WO2016029452A1 (en) * | 2014-08-29 | 2016-03-03 | Blue Cube Ip Llc | Naphthalene based epoxy for halogen-free and flame retardant compositions |
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