JP2005191275A - Dry etching processing apparatus and processing method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a dry etching processing apparatus and a processing method capable of sharply facilitating the removal of any residue produced by an etching processing, and of making optimum the surface state of a substance to be processed after the etching processing. <P>SOLUTION: A plasma etching processing apparatus 1 comprises a nozzle head 10 for implementing an etching processing by spraying etching gas 4 to the surface of a silicon substrate 2 to be processed, and a cleaning head 20 for cleaning the silicon substrate 2 to remove residues such as ammonium silicofluoride and ammonium fluoride or the like formed by a reaction between a silicon compound produced by the etching processing and etching gas. For the cleaning of the silicon by the cleaning head 20, it is preferable to complete it within a predetermined time after the etching processing. The silicon substrate 2 is conveyed with conveying means 6 for the etching processing and the cleaning processing for the entire surface of the silicon substrate. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

  The present invention relates to a dry etching processing apparatus and a processing method for removing a thin film such as an insulating film, a semiconductor film, a metal thin film, and a resist formed on a surface of a silicon substrate and the like, and in particular, efficiently removes residues generated by the dry etching process. The present invention relates to a dry etching processing apparatus and a processing method that can be well removed and can optimize the surface of an object.

  Conventionally, as a dry etching treatment method of this type, a dry etching method of a silicon nitride film described in Patent Document 1 is a method of dry etching a silicon nitride film on a substrate with an activated gas species, and fluorine as a gas species. It has a composition in which hydrogen gas is added to a mixed gas of a gas containing oxygen and oxygen gas.

Further, the dry etching method described in Patent Document 2 generates a stable reactive gas from a halogen-based gas by generating a discharge in an inert and stable halogen-based gas at atmospheric pressure or in the vicinity thereof. And a process of transporting the reactive gas to a separated position, and a process of etching the object to be processed using the reactive gas at the separated position.
JP-A-10-261616 (paragraph [0005]) JP 2000-58508 A (paragraph [0010])

By the way, the dry etching method of the said structure is not described at all about the process of the residue generated at the time of etching. For example, when a silicon nitride film (SiNx) is etched under atmospheric pressure, an etching gas such as CF ₄ or CHF ₃ is combined with decomposed fluorine under the influence of moisture in the atmosphere to generate HF. When this comes into contact with SiNx, the reaction shown in the following formula (1) occurs,
Si ₃ N ₄ + 16HFa2 ((NH ₄ ) ₂ SiF ₆ ) + SiF ₄ (1)
SiNx or crystalline ammonium silicofluoride or ammonium fluoride is generated and deposited. When these substances are deposited and solidified, there is a possibility that the quality of the manufactured semiconductor substrate or the like is greatly deteriorated.

  The present invention has been made in view of such problems, and the object of the present invention is to provide a dry etching processing apparatus and processing capable of efficiently removing residues such as ammonium silicofluoride generated during etching processing. It is to provide a method. It is another object of the present invention to provide a dry etching processing apparatus and a processing method capable of improving the quality of etching processing by efficiently removing residues.

In order to achieve the above object, the present inventors have made various studies, and residues such as ammonium silicofluoride generated when silicon nitride is etched by this kind of dry etching process are very water-soluble. And found that it can be removed efficiently. That is, a dry etching processing apparatus according to the present invention includes a processing head that performs etching by blowing an etching gas onto the surface of a processing object, and a cleaning unit that cleans the processing object to remove residues generated by the etching process. Is provided. When a thin film such as a silicon nitride film formed on the surface of the object to be processed is etched, residues such as ammonium silicofluoride and ammonium fluoride formed by the reaction of this silicon compound with the etching gas are generated. However, since the residue is crystalline and highly water-soluble, the etching apparatus of the present invention includes a cleaning unit that cleans and removes the residue.

  The plasma etching method according to the present invention includes a step of performing an etching process by spraying an etching gas on the surface of the object to be processed, and a step of cleaning the object to be removed to remove a residue generated by the etching process. . When the residue is a silicon compound, the residue such as ammonium silicofluoride or ammonium fluoride formed by the reaction between the silicon compound and the etching gas is removed by washing with water or a solvent. The etching gas is preferably converted into plasma through a discharge space where glow discharge is performed.

  The dry etching processing apparatus and processing method of the present invention configured as described above includes crystals such as ammonium silicofluoride generated by etching a thin film such as a silicon compound film formed on the surface of an object to be processed such as a silicon substrate. Since the residue is removed by washing with water, alcohol, solvent or the like, the residue can be removed very easily, and the surface state of the substrate after the etching process can be optimized. In addition, the quality of dry etching can be improved. As a result, subsequent processes such as film formation can be performed smoothly.

  Moreover, as a preferable specific aspect of the plasma etching method according to the present invention, the step of cleaning the object to be processed is completed within a predetermined time after the step of etching. Specifically, the washing step is preferably performed immediately after the etching treatment step. For example, when the residue is ammonium silicofluoride or the like, the residue can be easily obtained if the washing is completed within 5 to 6 hours. It is possible to remove objects. By comprising in this way, the residue which generate | occur | produced at the etching process can be removed efficiently before solidifying, and the quality of an etching process can be improved.

  Furthermore, as another aspect of the plasma etching processing method according to the present invention, a discharge space is formed by applying a voltage such as a high frequency to the opposing electrode, and an etching gas is supplied to the discharge space to supply the surface of the object to be processed. The step of etching the silicon compound film formed on the substrate under the pressure near atmospheric pressure and the step of cleaning the object to remove the residue generated by the etching process, the cleaning process is an etching process. It is characterized by being completed within a predetermined time from the process. It is preferable that the opposing electrode has at least one electrode-facing surface covered with a solid dielectric, and generates a glow discharge in the discharge space to allow the etching gas to pass therethrough and to perform the treatment with the plasma-excited etching gas. .

  In the dry etching method configured as described above, the etching gas is activated by plasma formation, and is blown from the outlet of the discharge space to the surface of the silicon substrate, which is the object to be processed. However, since this residue is washed with water or the like and the removal is completed within a predetermined time, an efficient etching process can be performed, and the surface state of the object to be processed can be optimized. During the etching process, the object to be processed may be installed outside the discharge space (between the electrodes) or may be installed in the discharge space.

  According to the present invention, residues such as ammonium silicofluoride generated when an etching gas is blown onto the surface of an object to be processed are washed away using the water solubility of the residue. Removal and disposal can be performed efficiently. For this reason, the etching process can be performed quickly, the quality of the etching process can be improved, and the subsequent process can be performed smoothly. By using a processing gas that is made plasma by flowing an etching gas into a discharge space where glow discharge is performed, the efficiency of the etching process can be increased.

Hereinafter, an embodiment of a dry etching processing apparatus and a processing method according to the present invention will be described in detail with reference to the drawings. FIG. 1 is a schematic configuration diagram of a plasma etching processing apparatus (hereinafter referred to as an etching processing apparatus) used in the dry etching processing method according to the present embodiment, and FIG. 2 is a schematic perspective view illustrating a main configuration of FIG.

  The etching processing apparatus 1 will be described with reference to FIGS. The etching processing apparatus 1 includes a nozzle head 10 as a processing head for spraying a plasma etching gas on a silicon substrate 2 which is an object to be etched, and the nozzle head receives an etching gas 4 from a gas supply source 3. A discharge processing unit 11 is provided. The etching processing apparatus 1 of this embodiment is an apparatus that removes a silicon nitride film, which is a silicon compound, as a thin film formed on the surface of a silicon substrate 2 by dry etching.

  In addition, the etching processing apparatus 1 includes a transport table 5 for mounting and fixing the silicon substrate 2 and a transport means 6 for transporting the transport table 5, and is fixed to the transport table 5 transported below the nozzle head 10. The silicon substrate 2 is configured to be etched below the discharge processing unit 11. The etching processing apparatus 1 includes two opposing electrode members 12 and 13 in the discharge processing unit 11, and supplies, for example, a pulsed high-frequency voltage from the power source 7 to one of them, and the other is grounded to the GND 8. With this configuration, a plasma etching gas is sprayed onto the silicon substrate 2 to move the transfer table 5 and dry etching processing of the entire width of the silicon substrate 2 is performed.

  The two electrode members 12, 13 facing each other in the discharge processing section 11 have a long shape or a long rod shape, and are arranged in parallel along a direction orthogonal to the transport direction A of the silicon substrate 2. The two electrode members are opposed to each other with a center gap 14 having a predetermined width. The width of the center gap 14 is preferably about 1 to 3 mm. When a voltage is applied to each electrode member, the center gap 14 becomes a discharge space. An etching gas is supplied into the discharge space and activated. Each of the electrode members 12 and 13 is composed of a single metal such as copper or aluminum, an alloy such as stainless steel or brass, an intermetallic compound, or the like.

  The electrode members 12 and 13 have at least an electrode facing surface covered with a solid dielectric coating layer (not shown), and the thickness of the coating layer is preferably about 0.01 to 4 mm. As a solid dielectric, in addition to alumina, for example, plastics such as polytetrafluoroethylene and polyethylene terephthalate, metal oxides such as glass, silicon dioxide, zirconium dioxide, and titanium dioxide, double oxides such as barium titanate, and the like Various types such as a multilayered structure can be used. In order to perform a stable glow discharge at the center gap 14, the outer peripheral surface of the electrode member may be covered with a plate-like material such as ceramics or resin, a sheet-like material, or a film-like material. Although not shown, it is preferable to round the corner of the electrode member on the center gap side.

  The power source 7 applies a pulsed voltage to the two electrode members 12 and 13 in the discharge processing unit 11, applies a pulsed voltage to one electrode member, and grounds the other electrode member facing each other. A discharge is generated in the central gap 14 between the electrodes. The pulse voltage preferably has, for example, a rise time and a fall time of 10 μs or less, an electric field strength of 10 to 100 kV / cm, and a frequency of 0.5 kHz or more.

  The voltage applied to the electrode members 12 and 13 is not limited to the pulse voltage, and may be a continuous wave voltage. As the pulse voltage waveform, an appropriate waveform such as a square wave type, a modulation type, or a combination of the above waveforms can be used in addition to the impulse type. Further, the voltage waveform may be a so-called one-wave waveform in which a voltage is applied to either the positive or negative polarity side, in addition to the voltage application repeating positive and negative. A bipolar waveform may also be used. Of course, an AC waveform that is a general sine wave may be used.

  The conveying means 6 is for moving a conveying table 5 by a mechanical linear motion mechanism, an air cylinder, a hydraulic cylinder or the like to convey an object to be processed such as a silicon substrate 2 below the nozzle head 10, and is constant. The etching process can be performed uniformly by transporting the silicon substrate 2 at a transport speed of 1 mm. Although the transport means 6 is configured to transport the object to be processed, it can also be configured to transport the nozzle head 10 that fixes the object to be processed and blows the etching gas. In addition to the above-described configuration, the conveying means may be constituted by other conveying means such as a belt conveyor or a roller conveyor that conveys an object to be processed by a plurality of rollers.

  The etching processing apparatus 1 further includes a cleaning unit 20 that cleans and removes residues generated by the dry etching process. The cleaning head 20 which is a cleaning unit has a width larger than the width of the silicon substrate 2 and is arranged adjacent to the nozzle head 10 in parallel. A cleaning liquid 22 such as water or alcohol is introduced from the cleaning liquid supply source 21 and sprayed uniformly from the cleaning nozzle 23 toward the silicon substrate 2 to melt and remove a crystalline residue such as ammonium silicofluoride. As the cleaning liquid 22, water can be simply used, and alcohol, an organic solvent, or the like can be used. In the example shown in FIG. 2, the cleaning liquid 22 is continuously sprayed in a spot manner (22a). However, it is preferable that the cleaning liquid 22 be sprayed linearly from a continuous slit because uniform cleaning can be performed. In addition to blowing out the cleaning liquid in a line, the cleaning liquid may be blown out in a plane. The transport means 6 has a long stroke so that the silicon substrate 2 can be transported below the cleaning head 20.

  The residue generated when the silicon nitride film is etched is basically ammonium fluoride or ammonium silicofluoride produced by the reaction of the above formula (1), and the cleaning head 20 cleans the silicon substrate 2. These residues are removed by melting with the cleaning liquid 22 and discarded. In the cleaning process, the entire surface can be cleaned by moving the silicon substrate 2 on the transport table 5 with respect to the cleaning head 20. It should be noted that the cleaning nozzle 23 for injecting the cleaning liquid to the nozzle head 10 for etching is installed in a parallel state, and the nozzle head and the cleaning nozzle are separated by a separate conveying means, not limited to the configuration in which cleaning is performed after the etching process. You may comprise so that it may convey.

The etching processing apparatus 1 performs an etching process under a pressure near atmospheric pressure. The pressure near atmospheric pressure is a pressure of 100 to 800 Torr (about 1.333 × 10 ^{4 to} 10.664 × 10 ⁴ Pa), and is actually easy to adjust the pressure and used for the discharge plasma treatment. A pressure of 700 to 780 Torr (about 9.331 × 10 ^{4 to} 10.9797 × 10 ⁴ Pa), which makes the apparatus simple, is preferable. The etching gas 4 is activated by glow discharge and removes an unnecessary thin film on the surface of the silicon substrate 2 by an etching process.

The operation of the etching processing apparatus 1 of the present embodiment configured as described above will be described below. First, a process of etching a silicon nitride film as a thin film formed on the silicon substrate 2 will be described. A pulsed high-frequency voltage is applied from the power source 7 to the electrode members 12 and 13 of the discharge processing unit 11 and is discharged in the opposed central gap 14 to form a discharge space. An etching gas 4 is supplied into the discharge space from the gas supply source 3 to form a plasma etching gas 4a and sprayed on the surface of the silicon substrate 2. The supplied etching gas 4 is preferably a fluorine gas, specifically a gas such as CF ₄ or CHF ₃ . Of course, another gas such as O ₂ may be added. The etching process is usually performed at room temperature and pressure, but may be performed in a high temperature environment, for example.

When the plasma processing etching gas 4a is sprayed under atmospheric pressure to perform the etching process, the etching gas such as CF ₄ and CHF ₃ is combined with the decomposed fluorine under the influence of moisture in the atmosphere to generate HF. When this comes into contact with silicon nitride, a residue such as crystalline ammonium silicofluoride or ammonium fluoride is generated and deposited on the silicon substrate 2. These residues are crystals of about 10 to 20 μm, and if left as they are, they are solidified and adhered to the silicon substrate 2 and are difficult to remove.

  In the present invention, the residue such as ammonium silicofluoride produced during the etching process is highly water-soluble, so that the silicon substrate 2 is washed with the cleaning liquid 22 blown from the cleaning head 20 to obtain the residue. Is removed by melting. That is, the silicon substrate 2 that has been subjected to the etching process by spraying the plasma-ized etching gas 4a onto the silicon substrate is transported by the transport means 6 to the position of the cleaning nozzle 23 together with the transport base 5, and from the cleaning nozzle 23 to the cleaning liquid 22 Is sprayed onto the surface of the silicon substrate 2. Residues deposited on the surface of the silicon substrate 2 are small crystals, which are easily melted by the cleaning liquid 22 and removed from the surface of the silicon substrate 2. The waste liquid of the cleaning liquid is discharged from a drain not shown. The cleaning liquid 22 is supplied in a line shape in a direction perpendicular to the transport direction B, and the entire surface can be cleaned by transporting the silicon substrate 2 by the transport means 6. The conveyance direction A in the etching process and the conveyance direction B in the cleaning process are not necessarily coincident.

  In this embodiment, the process of cleaning the silicon substrate 2 immediately after the etching process is continuously performed. However, since residues such as ammonium silicofluoride do not solidify for a predetermined time, within this time, in other words, residues If the washing is completed before solidifying or fixing, the residue can be easily removed. For example, the silicon substrate 2 that has been subjected to the etching process may be temporarily stocked and sent to the cleaning process in a state where a predetermined number of substrates are obtained. As described above, the etching process and the cleaning process may be separated, and the cleaning of the silicon substrate 2 may be completed within a predetermined time.

  According to the experiment, when the residue is ammonium silicofluoride or ammonium fluoride, even if the silicon substrate 2 is cleaned after about 6 hours after the etching process, most of the residue is washed with water to clean the substrate surface. It was found that it can be removed from. As a result, the quality of the silicon substrate surface after the etching process can be improved, and other processes in the post process can be performed with a high yield. And the quality of a semiconductor element etc. can be improved. Note that the time for completing the cleaning step is appropriately set depending on the residue generated in the etching process.

  Although one embodiment of the present invention has been described in detail above, the present invention is not limited to the above-described embodiment, and various modifications can be made without departing from the spirit of the present invention described in the claims. Design changes can be made. For example, instead of the nozzle used in the cleaning process, a wide range may be cleaned with a shower or the like. It may be cleaned by spraying the cleaning liquid intermittently or in pulses. Although the example of ammonium silicofluoride etc. was shown as a residue produced | generated by an etching process, it is not restricted to this. The cleaning liquid may be any liquid that melts the residue obtained by the etching process, and can be appropriately selected according to the residue.

  Further, although the plasma type nozzle head is shown as the nozzle head for performing the etching process, a processing head for performing other etching processes that do not discharge, for example, gas phase etching or ion beam etching may be used. Although the substrate as the object to be processed is transported with respect to the nozzle head, it is of course possible to move the nozzle head in the opposite direction. In this case, it is also necessary to move the cleaning head. Furthermore, as an etching process, an example of a remote type processing head that blows a processing gas through a discharge space onto an object to be processed has been shown. However, a direct type head that disposes an object to be processed in the discharge space and sprays a processing gas is used. An apparatus having a processing head may be used.

  As an application example of the plasma etching processing method of the present invention, it can be applied to general atmospheric pressure plasma processing in semiconductor manufacturing processes, LCD manufacturing processes, and the like. The substrate to be processed is not limited to silicon and may be any material.

The schematic block diagram of the etching processing apparatus used for the plasma etching processing method which concerns on this invention. The perspective view which shows the principal part structure of FIG.

Explanation of symbols

  1: Plasma etching processing apparatus, 2: Silicon substrate (object to be processed), 4: Etching gas, 4a: Etching gas for plasma, 5: Transfer table, 6: Transfer means, 7: Power supply, 8: GND, 10: Nozzle Head (processing head), 11: discharge processing section, 12, 13: electrode member, 14: center gap (discharge space), 20: cleaning head (cleaning section), 22: cleaning liquid, 23: cleaning nozzle

Claims (4)

  A dry etching process comprising: a processing head for performing an etching process by spraying an etching gas on a surface of an object to be processed; and a cleaning unit for cleaning the object to be processed to remove residues generated by the etching process. apparatus.   A dry etching method comprising: a step of performing an etching process by spraying an etching gas on a surface of an object to be processed; and a step of cleaning the object to be processed to remove a residue generated by the etching process.   3. The dry etching method according to claim 2, wherein the step of cleaning the object to be processed is completed within a predetermined time after the step of etching.   A voltage is applied to the opposing electrodes to form a discharge space, and an etching gas is supplied to the discharge space and sprayed onto the silicon compound film formed on the surface of the object to be etched to perform etching under a pressure near atmospheric pressure. And a step of cleaning the object to be removed in order to remove residues generated by the etching process, and the cleaning process is completed within a predetermined time from the etching process step. Method.

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