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JP2005187526A - Mold release film and method for producing flexible film with the same - Google Patents

Mold release film and method for producing flexible film with the same Download PDF

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JP2005187526A
JP2005187526A JP2003427657A JP2003427657A JP2005187526A JP 2005187526 A JP2005187526 A JP 2005187526A JP 2003427657 A JP2003427657 A JP 2003427657A JP 2003427657 A JP2003427657 A JP 2003427657A JP 2005187526 A JP2005187526 A JP 2005187526A
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release film
layer
mold release
fpc
film
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Masataka Maeda
真孝 前田
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Sumitomo Bakelite Co Ltd
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Sumitomo Bakelite Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a mold release multi-layered film which maintains excellent characteristics such as mold release characteristic, shape followingness, uniform moldability and FPC finish appearance wrinkles, and has improved solder adhesiveness to circuits in post processes, not satisfied by conventional mold release films, and to provide a method for producing FPC with the same. <P>SOLUTION: This mold release film having a mold release layer comprising polymethylpentene, a polymethylpentene/α-olefin copolymer, or polybutylene terephthalate, and having TMA of 2-7% in 160 to 185°C. The method for producing FPC uses the same. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は、フレキシブルプリント配線板(以下、FPCという)の製造工程において用いられる離型フィルム及びそれを用いたFPCの製造方法に関するものである。   The present invention relates to a release film used in a manufacturing process of a flexible printed wiring board (hereinafter referred to as FPC) and a method of manufacturing an FPC using the release film.

FPCの製造工程においては、絶縁基材、例えば、ポリイミド樹脂フィルム表面に所定の回路を有するフレキシブル回路板上を、絶縁及び回路保護を目的として接着剤付き耐熱樹脂フィルムであるカバーレイ(以下、CLという)で被覆し、特許文献1のように離型フィルムを用いて、プレスラミネートすることが通常行われている。この製造工程においては、FPCと当板との離型性、FPCの凹凸に十分追従することによるCL端面からの接着剤フロー抑制及び導体部汚染防止、更にFPC全体にかかる圧力の均一化、即ち離型性、対形状追従性、FPC全体への均一な圧力による脱ボイド性(以下、成形性という)、FPCの仕上がり外観シワ、プレス時のフィルム端面シミ出し量が少ない他に、後工程での回路へのメッキ付き等に優れた離型フィルムが求められている。
特許第2659404号
In the FPC manufacturing process, a coverlay (hereinafter referred to as CL), which is a heat-resistant resin film with an adhesive, is formed on an insulating base material, for example, a flexible circuit board having a predetermined circuit on a polyimide resin film surface for the purpose of insulation and circuit protection. In general, press lamination is performed using a release film as in Patent Document 1. In this manufacturing process, releasability between the FPC and this plate, suppression of the adhesive flow from the CL end face by sufficiently following the unevenness of the FPC and prevention of contamination of the conductor part, and further uniformization of the pressure applied to the entire FPC, In addition to low mold releasability, anti-trackability, devoid of voids due to uniform pressure on the entire FPC (hereinafter referred to as moldability), FPC finished appearance wrinkles, and film end face wrinkles during pressing. There is a need for a release film that is excellent in plating on the circuit.
Japanese Patent No. 2659404

本発明は、離型性、対形状追従性、均一な成形性、FPC仕上がり外観シワに優れた特性を維持しながら、従来の離型フィルムでは満足でなかった後工程での回路へのメッキ付き性を向上させた離型フィルム及びそれを用いたFPCの製造方法を提供するものである。   In the present invention, while maintaining excellent properties such as releasability, shape conformability, uniform formability, and FPC finished appearance wrinkles, the circuit is plated in a later process that was not satisfactory with conventional release films. A release film having improved properties and a method for producing an FPC using the release film are provided.

本発明は、
(1)第1の熱可塑性樹脂で構成される第1の層を有する離型フィルムであって、前記第1の層の線膨張率が温度160〜185℃の領域に於いて、2〜7%であることを特徴とする離型フィルム、
(2)前記第1の層の少なくとも片面側に、さらに第2の層を有するものである(1)項記載の離型フィルム、
(3)前記第2の層は、前記第1の熱可塑性樹脂と異なる第2の熱可塑性樹脂で構成されるものである(2)項に記載の離型フィルム、
(4)前記第1の熱可塑性樹脂は、ポリメチルペンテン、ポリブチレンテレフタレート、ポリプロピレンを含むものである(1)項記載ないし(3)項記載のいずれかの離型フィルム、
(5)第2の熱可塑性樹脂の軟化点が50〜160℃で構成される(3)項記載の離型フィルム、
(6)フレキシブルプリント配線板の製造方法であって、(1)項記載ないし(4)項記載のいずれかの離型フィルムと、接着フィルムと、積層板とをこの順に積層することを特徴とするフレキシブルプリント配線板の製造方法、
である。
The present invention
(1) A release film having a first layer composed of a first thermoplastic resin, wherein the first layer has a linear expansion coefficient of 2 to 7 in a region where the temperature is 160 to 185 ° C. % Release film,
(2) The release film according to item (1), further comprising a second layer on at least one side of the first layer,
(3) The release film according to (2), wherein the second layer is composed of a second thermoplastic resin different from the first thermoplastic resin.
(4) The release film according to any one of (1) to (3), wherein the first thermoplastic resin includes polymethylpentene, polybutylene terephthalate, and polypropylene.
(5) The release film according to (3), wherein the second thermoplastic resin has a softening point of 50 to 160 ° C.
(6) A method for producing a flexible printed wiring board, wherein the release film according to any one of (1) to (4), an adhesive film, and a laminate are laminated in this order. Manufacturing method of flexible printed wiring board,
It is.

本発明は、離型性、対形状追従性、均一な成形性、FPCの外観仕上がりシワに優れた特性を維持しながら、従来の離型フィルムでは達成できなかった後工程での回路へのメッキ付き性を向上させた離型フィルム及びそれを用いたFPCの製造方法を提供するものである。   In the present invention, while maintaining the mold release property, the shape following property, the uniform moldability, and the excellent finish of the appearance finish of the FPC, the plating on the circuit in the post-process that could not be achieved by the conventional release film. A release film with improved adhesion and an FPC manufacturing method using the same are provided.

本発明の離型フィルムは、第一の熱可塑性樹脂で構成される第一の層(離型層と言う)の線膨張率(以下、TMAという)が、温度160〜185℃の領域に於いて、2〜7%である。2%未満または7%を超えるとプレス時の熱収縮の影響により、後工程での回路へのメッキ付き性が悪くなる。メッキ付き性とは、CL成形後に半田、ニッケル、金メッキするが、その時必要メッキ面積の90%以上にメッキがついているものを良品としている。   The release film of the present invention has a linear expansion coefficient (hereinafter referred to as TMA) of a first layer (referred to as a release layer) composed of a first thermoplastic resin in a temperature range of 160 to 185 ° C. 2-7%. If it is less than 2% or exceeds 7%, the ability to plate the circuit in the subsequent process is deteriorated due to the effect of thermal shrinkage during pressing. With regard to the plating property, solder, nickel, and gold are plated after CL molding. At that time, a product having 90% or more of the required plating area is regarded as a good product.

本発明の離型層に用いる樹脂は、ポリメチルペンテン又はポリメチルペンテンとαオレフィンとの共重合体、ポリエステル樹脂、ポリプロピレンである。ポリメチルペンテンとは、以下の式(1)で示されるものである。ポリメチルペンテンとαオレフィンとの共重合体の共重合の比率、αオレフィンの種類については特に限定しない。   The resin used for the release layer of the present invention is polymethylpentene or a copolymer of polymethylpentene and α-olefin, a polyester resin, and polypropylene. Polymethylpentene is represented by the following formula (1). There are no particular limitations on the copolymerization ratio of the copolymer of polymethylpentene and α-olefin and the type of α-olefin.

Figure 2005187526
Figure 2005187526

離型層の厚みは、10〜100μmである。好ましくは15〜50μmが望ましい。10μm未満だとプレスラミネート後に離型層に用いる樹脂が破れ、FPCと離型フィルムを分離する際に、FPC側に離型層に用いる樹脂が残ってしまう。100μmを越えると対形状追従性が悪くなりCLに付着している接着剤のフロー量が多くなる。   The thickness of the release layer is 10 to 100 μm. Preferably it is 15-50 micrometers. When the thickness is less than 10 μm, the resin used for the release layer is broken after press lamination, and when the FPC and the release film are separated, the resin used for the release layer remains on the FPC side. When the thickness exceeds 100 μm, the shape following ability is deteriorated, and the flow amount of the adhesive adhering to the CL increases.

本発明の第2層を構成する樹脂(クッション層と言う)に用いる樹脂は、軟化点が50〜160℃である。50℃未満だとプレス時に離型フィルムの端面より樹脂がシミ出してきて、プレス熱盤等に付着して、次工程への2次汚染の懸念がある。160℃を超えると成形性が悪く、FPCの細部にボイドが発生する。クッション層厚みは特に規定はしない。   The resin used for the resin constituting the second layer of the present invention (referred to as a cushion layer) has a softening point of 50 to 160 ° C. When the temperature is lower than 50 ° C., the resin begins to stain from the end face of the release film during pressing, adheres to the press hot platen, etc., and there is a concern of secondary contamination in the next process. If it exceeds 160 ° C., the moldability is poor and voids are generated in the details of the FPC. The cushion layer thickness is not particularly specified.

離型層とクッション層の間に接着樹脂を介しても差し支えはないが、接着樹脂を介さないほうがフィルム端面シミ出しは少なく好ましい。   Although there is no problem even if an adhesive resin is interposed between the release layer and the cushion layer, it is preferable that no adhesive resin is interposed between the film and the film to prevent the end face from appearing.

本発明に用いる離型フィルムの製法は、共押出ラミネート工法、押出ラミネート工法、ドライラミネート工法等のいずれの工法でもよい。 The method for producing the release film used in the present invention may be any method such as a coextrusion laminating method, an extrusion laminating method, or a dry laminating method.

本発明の離型フィルムをFPCの製造工程において、CLのプレスラミネートに用い、加圧積層する成形方法としては、例えば、熱盤の間に、離型フィルム、片面FPCの順に重ねた構成物を置き、所定の条件で加熱加圧後、後硬化をすればよい。本発明に用いる離型フィルムは、特に短時間成形方法(一般的にはHot−Hot用プレスと称されるプレス方法)に有効的である。   As a molding method in which the release film of the present invention is used for CL press lamination in the FPC manufacturing process and is pressure-laminated, for example, a structure in which a release film and a single-sided FPC are stacked in this order between hot plates are used. Then, after heating and pressing under predetermined conditions, post-curing may be performed. The release film used in the present invention is particularly effective for a short-time molding method (generally referred to as a hot-hot press).

以下に本発明を実施例によって、更に詳細に説明するが、本発明はこれらの実施例に限定されるものではない。以下に示す実施例及び比較例において使用した原材料の特性は、以下の通りである。
・ ポリメチルペンテンとαオレフィンとの共重合体(TPX):品番MX004〔融点240℃〕(三井化学(株)製)
・ ポリブチレンテレフタレート(PBT):品番5510S〔融点217℃〕(三菱エンジニアリングプラスチック(株)製)
・ エチレン−メチルアクリレート共重合体(EMMA):品番アクリフトWD105−1[軟化点75℃](住友化学工業(株)製)
・ エチレン−メチルアクリレート共重合体(EMMA):品番アクリフトWH102[軟化60℃](住友化学工業(株)製)
・ ポリプロピレン:ノーブレンFH1016[軟化点150℃](住友化学工業(株)製)
EXAMPLES The present invention will be described in more detail with reference to examples below, but the present invention is not limited to these examples. The characteristics of the raw materials used in the following examples and comparative examples are as follows.
-Copolymer of polymethylpentene and α-olefin (TPX): product number MX004 (melting point 240 ° C.) (manufactured by Mitsui Chemicals, Inc.)
-Polybutylene terephthalate (PBT): product number 5510S [melting point 217 ° C.] (manufactured by Mitsubishi Engineering Plastics)
-Ethylene-methyl acrylate copolymer (EMMA): Part number ACRIFT WD105-1 [Softening point 75 ° C] (manufactured by Sumitomo Chemical Co., Ltd.)
-Ethylene-methyl acrylate copolymer (EMMA): product number ACRIFTH WH102 [softening 60 ° C] (manufactured by Sumitomo Chemical Co., Ltd.)
Polypropylene: Nobrene FH1016 [softening point 150 ° C.] (manufactured by Sumitomo Chemical Co., Ltd.)

<実施例1〜5>
実施例1〜4では、3台の押出機のそれぞれに、離型層としてTPXまたはPBT、クッション層としてEMMAまたはPP、離型反対層にTPXまたはPBTを供給することにより三層ダイスで共押出し、表1に示した構成内容の離型フィルムを作成した。
実施例5では、1台の押出機にTPXを単層ダイスに供給することにより製膜し、表1に示した構成内容の単層の離型フィルムを作成した。
その離型フィルムのTMAは、セイコーインスルメンツ(株)製EXSTAR6000で測定した。測定の条件は、引張法、昇温5℃/分、荷重5g、常温〜220℃の条件である。表1は、160〜185℃におけるMD、TDのTMAの値を示す。
その離型フィルムとFPCとを1段型プレス機を用い、185℃、5MPaで2分加熱・加圧後、取り出して、以下の評価項目で評価した。評価結果を表1に示した。
<Examples 1-5>
In Examples 1 to 4, each of the three extruders was co-extruded with a three-layer die by supplying TPX or PBT as the release layer, EMMA or PP as the cushion layer, and TPX or PBT as the release layer opposite to the release layer. A release film having the composition shown in Table 1 was prepared.
In Example 5, the film was formed by supplying TPX to a single-layer die in one extruder, and a single-layer release film having the composition shown in Table 1 was produced.
The TMA of the release film was measured with EXSTAR6000 manufactured by Seiko Instruments Inc. The measurement conditions are a tension method, a temperature increase of 5 ° C./min, a load of 5 g, and a room temperature to 220 ° C. Table 1 shows the values of TMA of MD and TD at 160 to 185 ° C.
The release film and the FPC were taken out using a one-stage press machine, heated and pressurized at 185 ° C. and 5 MPa for 2 minutes, and then evaluated according to the following evaluation items. The evaluation results are shown in Table 1.

<比較例1〜4>
3台の押出機のそれぞれに、離型層としてTPX、クッション層としてEMMAまたはPP、離型反対層にTPXを供給することにより三層ダイスで共押出し、表2に示した構成内容の離型フィルムを作成した。
その離型フィルムとFPCとを1段型プレス機を用い、185℃、5MPaで2分加熱・加圧後、取り出して、以下の評価項目で評価した。評価結果を表2に示した。
その離型フィルムのTMAは、セイコーインスルメンツ(株)製EXSTAR6000で測定した。測定の条件は、引張法、昇温5℃/分、荷重5g、常温〜220℃の条件で測定した。
尚、評価はJPCA規格(デザインガイドマニュアル・片面及び両面フレキシブルプリント配線板・JPCA―DG02)に準拠し、以下のような項目と基準で行った。
<Comparative Examples 1-4>
Each of the three extruders was co-extruded with a three-layer die by supplying TPX as a release layer, EMMA or PP as a cushion layer, and TPX as a release layer, and having the composition shown in Table 2 A film was created.
The release film and the FPC were taken out using a one-stage press machine, heated and pressurized at 185 ° C. and 5 MPa for 2 minutes, and then evaluated according to the following evaluation items. The evaluation results are shown in Table 2.
The TMA of the release film was measured with EXSTAR6000 manufactured by Seiko Instruments Inc. The measurement conditions were the tension method, temperature rise of 5 ° C./min, load of 5 g, and normal temperature to 220 ° C.
The evaluation was made according to the JPCA standard (design guide manual, single-sided and double-sided flexible printed wiring board, JPCA-DG02) and the following items and standards.

成形性(7.5.3.3項の気泡による)
○:ボイド発生率 2.0%未満
×:ボイド発生率 2.0%以上
CL接着剤のフロー量(7.5.3.6項のカバーレイの接着剤の流れ及びカバーコートのにじみによる)
○:フロー量 150μm未満
×:フロー量 150μm以上
仕上がり外観シワ(7.5.7.2項しわによる)
○:シワ発生率 2.0%未満
×:シワ発生率 2.0%以上
離型層樹脂の破れ(7.5.7.1項表面の付着物による)
○:破れ発生率 2.0%未満
×:破れ発生率 2.0%以上
メッキ付き性(必要メッキ面積の90%以上にメッキが付いているものを良品:7.5.4項めっきの外観による)
○:良品が98%以上
×:良品が98%未満
Formability (due to air bubbles in 7.5.3.3)
○: Void generation rate less than 2.0% ×: Void generation rate 2.0% or more CL adhesive flow amount (due to coverlay adhesive flow and cover coat bleeding in 7.5.3.6)
○: Flow amount less than 150 μm ×: Flow amount 150 μm or more Finished appearance wrinkle
○: Wrinkle generation rate less than 2.0% ×: Wrinkle generation rate 2.0% or more Releasing of release layer resin (due to 7.5.7.1 surface deposits)
○: Breakage rate less than 2.0% ×: Breakage rate 2.0% or more Plating property (A product with 90% or more of the necessary plating area is plated: Appearance of 7.5.4 plating) by)
○: Good product is 98% or more ×: Good product is less than 98%

Figure 2005187526
Figure 2005187526

Figure 2005187526
Figure 2005187526

本発明は、離型性、対形状追従性、均一な成形性、FPC仕上がり外観シワに優れた特性を維持しながら、従来の離型多層フィルムでは満足でなかった 後工程での回路へのメッキ付き性を向上させた離型フィルム及びそれを用いたFPCの製造方法を提供するものである。   The present invention is not satisfactory with the conventional release multilayer film while maintaining excellent properties such as releasability, conformability to shape, uniform formability, and FPC finished appearance wrinkles. A release film with improved adhesion and an FPC manufacturing method using the same are provided.

Claims (6)

第1の熱可塑性樹脂で構成される第1の層を有する離型フィルムであって、前記第1の層の線膨張率が温度160〜185℃の領域に於いて、2〜7%であることを特徴とする離型フィルム。   A release film having a first layer composed of a first thermoplastic resin, wherein the linear expansion coefficient of the first layer is 2 to 7% in a temperature range of 160 to 185 ° C. A release film characterized by that. 前記第1の層の少なくとも片面側に、さらに第2の層を有するものである請求項1に記載の離型フィルム。   The release film according to claim 1, further comprising a second layer on at least one side of the first layer. 前記第2の層は、前記第1の熱可塑性樹脂と異なる第2の熱可塑性樹脂で構成されるものである請求項2に記載の離型フィルム。   3. The release film according to claim 2, wherein the second layer is composed of a second thermoplastic resin different from the first thermoplastic resin. 前記第1の熱可塑性樹脂は、ポリメチルペンテン、ポリブチレンテレフテレートを含むものである請求項1ないし3のいずれかに記載の離型フィルム。   The release film according to any one of claims 1 to 3, wherein the first thermoplastic resin contains polymethylpentene and polybutylene terephthalate. 第2の熱可塑性樹脂の軟化点が50〜160℃で構成される請求項3に記載の離型フィルム。   The release film according to claim 3, wherein the second thermoplastic resin has a softening point of 50 to 160 ° C. 5. フレキシブルプリント配線板の製造方法であって、請求項1ないし4のいずれかに記載の離型フィルムと、接着フィルムと、積層板とをこの順に積層することを特徴とするフレキシブルプリント配線板の製造方法。
A method for producing a flexible printed wiring board, wherein the release film according to any one of claims 1 to 4, an adhesive film, and a laminated board are laminated in this order. Method.
JP2003427657A 2003-12-24 2003-12-24 Mold release film and method for producing flexible film with the same Pending JP2005187526A (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012135935A (en) * 2010-12-27 2012-07-19 Sumitomo Bakelite Co Ltd Mold release film
JP2012210762A (en) * 2011-03-31 2012-11-01 Sumitomo Bakelite Co Ltd Mold release film
JPWO2022034834A1 (en) * 2020-08-12 2022-02-17

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012135935A (en) * 2010-12-27 2012-07-19 Sumitomo Bakelite Co Ltd Mold release film
JP2012210762A (en) * 2011-03-31 2012-11-01 Sumitomo Bakelite Co Ltd Mold release film
JPWO2022034834A1 (en) * 2020-08-12 2022-02-17
WO2022034834A1 (en) * 2020-08-12 2022-02-17 住友ベークライト株式会社 Mold release film and method for manufacturing molded product
JP7283639B2 (en) 2020-08-12 2023-05-30 住友ベークライト株式会社 Method for manufacturing release film and molded product

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