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JP2005171316A - Raw material powder for sintered compact target for forming optical recording medium protective film, method of producing sintered compact target using the powder, and sintered compact target - Google Patents

Raw material powder for sintered compact target for forming optical recording medium protective film, method of producing sintered compact target using the powder, and sintered compact target Download PDF

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JP2005171316A
JP2005171316A JP2003413010A JP2003413010A JP2005171316A JP 2005171316 A JP2005171316 A JP 2005171316A JP 2003413010 A JP2003413010 A JP 2003413010A JP 2003413010 A JP2003413010 A JP 2003413010A JP 2005171316 A JP2005171316 A JP 2005171316A
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powder
sintered compact
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raw material
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Shuhin Cho
守斌 張
Yusuke Watarai
祐介 渡会
Takanori Shirai
孝典 白井
Terushi Mishima
昭史 三島
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Mitsubishi Materials Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide raw material powder for a sintered compact target in which ZnS powder and SiO<SB>2</SB>powder are uniformly mixed without unevenness of density, to provide a method of producing a target where productive efficiency is improved, and further, a sintered compact target having a uniform structure, free of the unevenness of density, and having high relative density can be obtained, and to provide the target. <P>SOLUTION: The raw material powder for a sintered compact target for forming a optical recording medium protective film is obtained by improving raw material powder having a composition composed of SiO<SB>2</SB>powder with a mean particle diameter of 0.0005 to 10 μm by 10 to 30 mol%, and the balance ZnS powder with a mean particle diameter of 1 to 20 μm, and in which the SiO<SB>2</SB>powder is dispersed into the ZnS matrix, and is characterized in that it contains straight chain alkylcarboxylic acid by 0.1 to 5 wt.% to the mixture. Further, the raw material powder is charged inside a hot press die, and is hot-pressed at 700 to 1,200°C under 20 to 40 MPa in a vacuum or in a gaseous Ar atmosphere, thus the sintered compact target is produced. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は、レーザーを用いて情報の記録及び消去を行う相変化型光ディスクなどの保護膜を形成するための硫化亜鉛(ZnS)−二酸化ケイ素(SiO2)焼結体からなる光記録媒体保護膜形成用焼結体ターゲットの原料粉末及び該粉末を用いた焼結体ターゲットの製造方法、並びに焼結体ターゲットに関するものである。 The present invention relates to an optical recording medium protective film comprising a zinc sulfide (ZnS) -silicon dioxide (SiO 2 ) sintered body for forming a protective film such as a phase change optical disk for recording and erasing information using a laser. The present invention relates to a raw material powder of a forming sintered body target, a method for producing a sintered body target using the powder, and a sintered body target.

レーザーを用いて情報の記録及び消去を行う相変化型光ディスクなどの保護膜としてZnSにSiO2を分散混合させたZnS−SiO2膜が用いられている。このZnS−SiO2膜を形成するためのスパッタリングターゲットとして、純度99.999重量%以上の高純度ZnSと純度99.999重量%以上の高純度SiO2との均質混成固結体からなり、90%以上の相対密度を有しているスパッタリングターゲットが提案されている(例えば、特許文献1参照。)。この特許文献1に示されるターゲットによって成膜速度の向上や安定な成膜特性を得ることができるほか、生産性の向上を図ることができ工業上有用な効果を有する。 A ZnS-SiO 2 film in which SiO 2 is dispersed and mixed in ZnS is used as a protective film for a phase change optical disk or the like that records and erases information using a laser. As a sputtering target for forming this ZnS—SiO 2 film, it consists of a homogeneous hybrid solidified body of high-purity ZnS having a purity of 99.999% by weight or more and high-purity SiO 2 having a purity of 99.999% by weight or more, A sputtering target having a relative density of at least% has been proposed (see, for example, Patent Document 1). In addition to improving the film formation rate and stable film formation characteristics with the target shown in Patent Document 1, it is possible to improve productivity and have industrially useful effects.

しかし上記従来のターゲットは原料粉末に粒径の大きいSiO2を用いて作製された焼結体で構成されていたため、スパッタリング中にターゲットのスパッタ面の表面に存在するSiO2の粗粒に電荷が集中し易いため、異常放電等が生じ易く、その結果パーティクルが発生するという問題があった。
このような問題点を解決する方策として、ZnS及びSiO2を主成分とする焼結体からなるスパッタリングターゲットにおいて、焼結体中のSiO2の粒径が30μm以下であるスパッタリングターゲットが提案されている(例えば、特許文献2参照。)。この特許文献2に示されるターゲットによってスパッタリング時における異常放電が生じにくく、パーティクルの発生を防ぐことができ、安定なスパッタリングを行うことが可能となる。
However, since the above-mentioned conventional target is composed of a sintered body made of raw material powder using SiO 2 having a large particle size, charges are generated on the coarse particles of SiO 2 existing on the surface of the sputtering surface of the target during sputtering. Since it is easy to concentrate, there is a problem that abnormal discharge or the like is likely to occur, and as a result, particles are generated.
As a measure for solving such problems, a sputtering target composed of a sintered body mainly composed of ZnS and SiO 2 has been proposed in which the particle size of SiO 2 in the sintered body is 30 μm or less. (For example, refer to Patent Document 2). The target disclosed in Patent Document 2 hardly causes abnormal discharge during sputtering, can prevent generation of particles, and enables stable sputtering.

一方、本出願人は、高出力スパッタリングを行っても割れが発生しにくい光記録保護膜形成用スパッタリングターゲットとして、ZnS素地中に、平均粒径が10〜30μmの範囲にあり、かつ比表面積値が0.5〜5.0m2/gの範囲にあるSiO2粒が均一分散している組織を有するスパッタリングターゲットを提案した(例えば、特許文献3参照。)。この特許文献3に示されるターゲットにより高出力スパッタリングを行っても割れが発生し難いので従来よりも効率よく相変化型光ディスクなどの保護膜を形成することができ、従って光ディスクの生産効率の向上及びコスト削減を行うことができる。
また、本出願人は、広い面積にわたって均一な膜厚を有する光記録保護膜を形成できるターゲットとして、SiO2:10〜30mol%を含有し、残りがZnSからなる組成を有する焼結体からなるスパッタリングターゲットにおいて、ZnSはα型結晶とβ型結晶の相比(α/β)が0≦α/β<0.0005の範囲内にあるスパッタリングターゲットを提案した(例えば、特許文献4参照。)。この特許文献4に示されるターゲットでは、高出力スパッタリングを行っても広い範囲にわたって均一な膜厚の光記録保護膜が得られる。
特開平6−65725号公報(請求項1、段落[0021]) 特開平11−350119号公報(請求項1、段落[0030]) 特開平11−350121号公報(請求項1、段落[0015]) 特開2000−297362号公報(請求項1、段落[0018])
On the other hand, the present applicant, as a sputtering target for forming an optical recording protective film that hardly generates cracks even when performing high-power sputtering, has an average particle diameter in the range of 10 to 30 μm and a specific surface area value in a ZnS substrate. Has proposed a sputtering target having a structure in which SiO 2 grains in a range of 0.5 to 5.0 m 2 / g are uniformly dispersed (see, for example, Patent Document 3). Even if high power sputtering is performed with the target shown in Patent Document 3, it is difficult to generate cracks, so that a protective film such as a phase-change optical disk can be formed more efficiently than in the prior art. Cost reduction can be performed.
Further, the applicant, as a target capable of forming an optical recording protective film having a uniform thickness over a large area, SiO 2: containing 10 to 30 mol%, a sintered body having a composition balance being ZnS As a sputtering target, ZnS has proposed a sputtering target in which the phase ratio (α / β) of α-type crystal and β-type crystal is in the range of 0 ≦ α / β <0.0005 (see, for example, Patent Document 4). . With the target shown in Patent Document 4, an optical recording protective film having a uniform film thickness can be obtained over a wide range even when high-power sputtering is performed.
JP-A-6-65725 (Claim 1, paragraph [0021]) JP 11-350119 A (Claim 1, paragraph [0030]) JP 11-350121 A (Claim 1, paragraph [0015]) JP 2000-297362 A (Claim 1, paragraph [0018])

しかし、上記特許文献1〜4にそれぞれ示されるターゲットでは、ターゲット製造前に作製される混合粉末のZnS粉末の流動性が悪く、混合粉末の均一性が十分に得られていなかった。この均一性が十分に得られていない混合粉末は、ホットプレス型内への均一な充填が困難であり、焼成後の焼結体ターゲットに密度のムラが生じ、相対密度も低くなる傾向があった。   However, in each of the targets shown in Patent Documents 1 to 4, the flowability of the mixed powder ZnS powder produced before target production was poor, and the uniformity of the mixed powder was not sufficiently obtained. If the mixed powder does not have sufficient uniformity, it is difficult to uniformly fill the hot press mold, and the sintered compact target after firing tends to have uneven density and low relative density. It was.

本発明の目的は、ZnS粉末及びSiO2粉末が密度のムラなく均一に混合した、光記録媒体保護膜形成用焼結体ターゲットの原料粉末を提供することにある。
本発明の別の目的は、生産効率が向上するとともに、組織が均一で密度のムラがなく、相対密度が高い焼結体ターゲットが得られる、焼結体ターゲットの製造方法、並びに焼結体ターゲットを提供することにある。
An object of the present invention is to provide a raw material powder for a sintered body target for forming an optical recording medium protective film, in which ZnS powder and SiO 2 powder are uniformly mixed without unevenness in density.
Another object of the present invention is to provide a sintered body target manufacturing method and a sintered body target in which a production target is improved and a sintered body target having a uniform structure, no density unevenness, and a high relative density is obtained. Is to provide.

請求項1に係る発明は、平均粒径が0.0005〜10μmのSiO2粉末を10〜30モル%含有し、残りが平均粒径1〜20μmのZnS粉末からなる組成を有し、ZnS母体中にSiO2粉末が分散している光記録媒体保護膜形成用焼結体ターゲットの原料粉末の改良である。
その特徴ある構成は、混合物に対して直鎖アルキルカルボン酸を0.1重量%〜5重量%含有するところにある。
請求項1に係る原料粉末では、直鎖アルキルカルボン酸を0.1重量%〜5重量%含有させることにより、ZnS粉末及びSiO2粉末の流動性がそれぞれ向上するため、ZnS粉末及びSiO2粉末は密度のムラなく均一に混合する。
The invention according to claim 1 has a composition comprising 10 to 30 mol% of SiO 2 powder having an average particle diameter of 0.0005 to 10 μm, and the remainder comprising ZnS powder having an average particle diameter of 1 to 20 μm, This is an improvement of a raw material powder for a sintered body target for forming an optical recording medium protective film in which SiO 2 powder is dispersed.
The characteristic structure exists in the place which contains 0.1 to 5 weight% of linear alkylcarboxylic acid with respect to a mixture.
In the raw material powder according to claim 1, by containing 0.1% to 5% by weight of linear alkyl carboxylic acids, the fluidity of the ZnS powder and SiO 2 powder is improved, respectively, ZnS powder and SiO 2 powder Mix uniformly without uneven density.

請求項2に係る発明は、請求項1に係る発明であって、直鎖アルキルカルボン酸がステアリン酸又はステアリン酸亜鉛の少なくとも1種を含む原料粉末である。
請求項3に係る発明は、請求項1に係る発明であって、直鎖アルキルカルボン酸がZnS粉末表面又はSiO2粉末表面のいずれか一方又はその双方に付着されてなる原料粉末である。
請求項3に係る原料粉末では、直鎖アルキルカルボン酸がZnS粉末表面又はSiO2粉末表面のいずれか一方又はその双方に付着されることで原料粉末中のZnS粉末及びSiO2粉末の流動性がそれぞれ向上する。
The invention according to claim 2 is the invention according to claim 1, wherein the linear alkylcarboxylic acid is a raw material powder containing at least one of stearic acid or zinc stearate.
The invention according to claim 3 is the invention according to claim 1, and is a raw material powder in which a linear alkylcarboxylic acid is attached to either or both of the ZnS powder surface and the SiO 2 powder surface.
In the raw material powder according to claim 3, the flowability of the ZnS powder and the SiO 2 powder in the raw material powder is obtained by adhering the linear alkylcarboxylic acid to either or both of the ZnS powder surface and the SiO 2 powder surface. Each improves.

請求項4に係る発明は、請求項1ないし3いずれか1項に記載の原料粉末をホットプレス型内に充填し、真空又はArガス雰囲気中、700〜1200℃の温度で20〜40MPaの圧力でホットプレスすることにより光記録媒体保護膜形成用焼結体ターゲットを製造する方法である。
請求項4に係る方法では、焼結体ターゲットを製造する際に、流動性が向上した原料粉末を用いることでホットプレス型内への充填密度が高まるとともに、ホットプレス型内への充填も容易となるため、ターゲットのホットプレス工程における生産効率が向上する。また、流動性が向上した原料粉末を用いることで組織が均一で密度のムラがなく、相対密度が高い焼結体ターゲットが得られる。
The invention according to claim 4 is a method in which the raw material powder according to any one of claims 1 to 3 is filled in a hot press mold and a pressure of 20 to 40 MPa at a temperature of 700 to 1200 ° C. in a vacuum or an Ar gas atmosphere. Is a method of manufacturing a sintered compact target for forming an optical recording medium protective film by hot pressing.
In the method according to claim 4, when the sintered compact target is manufactured, the filling density in the hot press mold is increased by using the raw material powder having improved fluidity, and the hot press mold is easily filled. Therefore, the production efficiency in the target hot pressing process is improved. Moreover, by using the raw material powder having improved fluidity, a sintered compact target having a uniform structure, no density unevenness, and a high relative density can be obtained.

請求項5に係る発明は、請求項4記載の方法により得られた光記録媒体保護膜形成用焼結体ターゲットである。
請求項5に係る焼結体ターゲットでは、流動性が向上した原料粉末を用いているため、組織が均一で密度のムラがなく、相対密度が高い。
The invention according to claim 5 is a sintered compact target for forming an optical recording medium protective film obtained by the method according to claim 4.
In the sintered compact target according to the fifth aspect, since the raw material powder with improved fluidity is used, the structure is uniform, the density is not uneven, and the relative density is high.

請求項6に係る発明は、請求項5記載の焼結体ターゲットを用いて形成した光記録媒体保護膜である。
請求項7に係る発明は、請求項6記載の保護膜を有する光記録媒体である。
The invention according to claim 6 is an optical recording medium protective film formed using the sintered compact target according to claim 5.
The invention according to claim 7 is an optical recording medium having the protective film according to claim 6.

本発明の光記録媒体保護膜形成用焼結体ターゲットの原料粉末では、直鎖アルキルカルボン酸を0.1重量%〜5重量%含有させることにより、ZnS粉末及びSiO2粉末の流動性がそれぞれ向上するため、ZnS粉末及びSiO2粉末は密度のムラなく均一に混合する。また、本発明の焼結体ターゲットの製造方法、並びに焼結体ターゲットでは、焼結体ターゲットを製造する際に、流動性が向上した原料粉末を用いることでホットプレス型内への充填密度が高まるとともに、ホットプレス型内への充填も容易となるため、ターゲットのホットプレス工程における生産効率が向上する。また、流動性が向上した原料粉末を用いることで組織が均一で密度のムラがなく、相対密度が高い焼結体ターゲットが得られる。相対密度が高いため、大型の焼結体ターゲットを成形しても抗折強度が高く、更に高出力スパッタリングを行ってもスパッタ割れが発生しないので効率良く相変化型光ディスクなどの保護膜を形成することができる。 In the raw material powder of the sintered body target for forming an optical recording medium protective film of the present invention, the flowability of the ZnS powder and the SiO 2 powder is increased by containing 0.1 wt% to 5 wt% of the linear alkylcarboxylic acid. In order to improve, the ZnS powder and the SiO 2 powder are mixed uniformly without uneven density. Moreover, in the manufacturing method of the sintered compact target of this invention, and a sintered compact target, when manufacturing a sintered compact target, the filling density in a hot press type | mold is used by using the raw material powder which improved fluidity | liquidity. As it increases, filling into the hot press mold becomes easy, so that the production efficiency in the hot press process of the target is improved. Moreover, by using the raw material powder having improved fluidity, a sintered compact target having a uniform structure, no density unevenness, and a high relative density can be obtained. Since the relative density is high, the bending strength is high even when a large sintered compact target is molded, and even when high-power sputtering is performed, spatter cracks do not occur, so a protective film such as a phase change optical disk is efficiently formed. be able to.

次に本発明を実施するための最良の形態を説明する。
本発明の光記録媒体保護膜形成用焼結体ターゲットを製造するための原料粉末は、平均粒径が0.0005〜10μmのSiO2粉末を10〜30モル%含有し、残りが平均粒径1〜20μmのZnS粉末からなる組成を有し、ZnS母体中にSiO2粉末が分散している原料粉末である。その特徴ある構成は、混合物に対して直鎖アルキルカルボン酸を0.1重量%〜5重量%含有するところにある。
この原料粉末では、直鎖アルキルカルボン酸を0.1重量%〜5重量%含有させることにより、ZnS粉末及びSiO2粉末の流動性がそれぞれ向上するため、ZnS粉末及びSiO2粉末は密度のムラなく均一に混合する。直鎖アルキルカルボン酸の含有量を0.1重量%〜5重量%に規定したのは、含有量が0.1重量%未満では、十分な流動性が得られないためであり、含有量が5重量%を越えた原料粉末を用いた焼結体ターゲットは、直鎖アルキルカルボン酸由来の不純物が大量に残存し、相対密度、抗折強度がともに低下する不具合を生じるためである。好ましい含有量は0.2重量%〜1重量%である。直鎖アルキルカルボン酸としては、ステアリン酸又はステアリン酸亜鉛の少なくとも1種を含むものが好適である。直鎖アルキルカルボン酸がZnS粉末表面又はSiO2粉末表面のいずれか一方又はその双方に付着されることで原料粉末中のZnS粉末及びSiO2粉末の流動性がそれぞれ向上する。
Next, the best mode for carrying out the present invention will be described.
The raw material powder for producing the sintered body target for forming an optical recording medium protective film of the present invention contains 10 to 30 mol% of SiO 2 powder having an average particle diameter of 0.0005 to 10 μm, and the rest is the average particle diameter. It is a raw material powder having a composition comprising 1 to 20 μm of ZnS powder, in which SiO 2 powder is dispersed in the ZnS matrix. The characteristic structure exists in the place which contains 0.1 to 5 weight% of linear alkylcarboxylic acid with respect to a mixture.
This raw material powder, by containing 0.1% to 5% by weight of linear alkyl carboxylic acids, the fluidity of the ZnS powder and SiO 2 powder is improved, respectively, ZnS powder and SiO 2 powder density unevenness of Mix evenly. The reason why the content of the linear alkylcarboxylic acid is defined as 0.1% by weight to 5% by weight is that sufficient fluidity cannot be obtained when the content is less than 0.1% by weight. This is because the sintered compact target using the raw material powder exceeding 5% by weight has a large amount of impurities derived from the linear alkyl carboxylic acid and causes a problem that both the relative density and the bending strength are lowered. The preferred content is 0.2% to 1% by weight. As linear alkylcarboxylic acid, what contains at least 1 sort (s) of a stearic acid or a zinc stearate is suitable. The flowability of the ZnS powder and the SiO 2 powder in the raw material powder is improved by attaching the linear alkylcarboxylic acid to either or both of the ZnS powder surface and the SiO 2 powder surface.

SiO2粉末の平均粒径は0.0005〜10μmの範囲内に規定される。SiO2粉末を平均粒径0.0005〜10μmに規定したのは、平均粒径が0.0005μm未満の粉末を製造するのは難しいためであり、平均粒径が10μmを越えたSiO2粉末を用いたターゲットをスパッタリングすると、スパッタリング中にターゲットのスパッタ面の表面に存在するSiO2の粗粒に電荷が集中し易くなり、異常放電等が生じ易く、その結果パーティクルが発生するためである。SiO2粉末の好ましい平均粒径は0.01〜5μmである。ZnS粉末の平均粒径は1〜20μmの範囲内に規定される。ZnS粉末を平均粒径1〜20μmに規定したのは、平均粒径が1μm未満では、焼成したターゲットの相対密度が低くなる不具合を生じるためであり、平均粒径が20μmを越えると、SiO2とZnSの均一分散が難しく、焼成したターゲットのSiO2相が大きい不具合を生じるためである。ZnS粉末の好ましい平均粒径は2〜10μmである。ZnS粉末及びSiO2粉末ともに、その純度は99.999重量%以上を有する。好ましい組成は、SiO2粉末を15〜25モル%含有し、残りがZnSであり、特にSiO2粉末を20モル%含有し、残りがZnSからなる組成を有することが好適である。 The average particle size of the SiO 2 powder is defined within a range of 0.0005 to 10 μm. The defining the SiO 2 powder to the average particle diameter 0.0005~10μm have an average particle diameter is because it is difficult to produce a powder of less than 0.0005, the SiO 2 powder having an average particle diameter exceeds 10μm This is because, when the target used is sputtered, electric charges tend to concentrate on the coarse SiO 2 particles existing on the surface of the target sputtering surface during sputtering, and abnormal discharge or the like is likely to occur, resulting in generation of particles. A preferable average particle diameter of the SiO 2 powder is 0.01 to 5 μm. The average particle size of the ZnS powder is defined within a range of 1 to 20 μm. The reason why the ZnS powder is defined to have an average particle size of 1 to 20 μm is that if the average particle size is less than 1 μm, the relative density of the fired target is reduced, and if the average particle size exceeds 20 μm, SiO 2 This is because it is difficult to uniformly disperse ZnS and ZnS, and the SiO 2 phase of the fired target causes a large defect. The preferable average particle diameter of the ZnS powder is 2 to 10 μm. Both the ZnS powder and the SiO 2 powder have a purity of 99.999% by weight or more. A preferred composition contains 15 to 25 mol% of SiO 2 powder and the remainder is ZnS, and particularly preferably contains 20 mol% of SiO 2 powder and the remainder is composed of ZnS.

次に、光記録媒体保護膜形成用焼結体ターゲットを製造する方法を説明する。
先ず、市販されている純度が99.999重量%以上のZnS粉末を用意する。この市販ZnS粉末をArガス雰囲気中、300〜700℃の温度で熱処理を0.5〜12時間施して市販ZnS粉末に多く含まれるH2S等の不純物ガスを除去し、平均粒径1〜20μmの焼結体ターゲット用ZnS粉末を作製する。また、平均粒径が0.0005〜10μmのSiO2粉末と、ステアリン酸又はステアリン酸亜鉛の少なくとも1種を含む直鎖アルキルカルボン酸をそれぞれ用意する。次いで、SiO2粉末とZnS粉末と直鎖アルキルカルボン酸の組成比が10〜30モル%:89.5〜65モル%:0.5〜5モル%となるように混合し、この混合粉末をφ2mmのアルミナボールとともにポリポットの中に入れ、0.5〜3時間乾式混合して焼結体ターゲット用原料粉末を作製する。この乾式混合により、直鎖アルキルカルボン酸がZnS粉末表面又はSiO2粉末表面のいずれか一方又はその双方に付着され、原料粉末中のZnS粉末及びSiO2粉末の流動性がそれぞれ向上する。その結果、ZnS粉末及びSiO2粉末は密度のムラなく均一に混合する。作製した原料粉末は黒鉛製のホットプレス型内に充填する。次に、原料粉末を充填したホットプレス型をArガス雰囲気中、700〜1200℃の温度で20〜40MPaの圧力で1〜20時間保持することにより原料粉末をホットプレスし、続いて冷却速度60〜180℃/時間で冷却することにより、ホットプレス体を作製する。850〜1150℃の温度で25〜35MPaの圧力で2〜8時間保持することにより混合粉末をホットプレスし、続いて冷却速度120〜180℃/時間で冷却することが好ましい。得られたホットプレス体を所定の直径、所定の厚さに機械加工することで焼結体ターゲットが得られる。上記方法により、焼結体ターゲットを製造する際に、流動性が向上した原料粉末を用いることでホットプレス型内への充填密度が高まるとともに、ホットプレス型内への充填も容易となるため、ターゲットのホットプレス工程における生産効率が向上する。また、流動性が向上した原料粉末を用いることで組織が均一で密度のムラがなく、相対密度が高い焼結体ターゲットが得られる。
Next, a method for producing a sintered compact target for forming an optical recording medium protective film will be described.
First, a commercially available ZnS powder having a purity of 99.999% by weight or more is prepared. This commercially available ZnS powder is subjected to a heat treatment in an Ar gas atmosphere at a temperature of 300 to 700 ° C. for 0.5 to 12 hours to remove impurity gases such as H 2 S that are contained in the commercially available ZnS powder, A ZnS powder for a sintered compact target of 20 μm is prepared. The average particle diameter of the SiO 2 powder 0.0005~10Myuemu, prepared respectively a straight-chain alkyl carboxylic acids containing at least one stearic acid or zinc stearate. Next, the SiO 2 powder, the ZnS powder, and the linear alkylcarboxylic acid are mixed so that the composition ratio is 10 to 30 mol%: 89.5 to 65 mol%: 0.5 to 5 mol%. Put together with φ2 mm alumina balls in a polypot and dry mix for 0.5 to 3 hours to produce a sintered target powder. By this dry mixing, the linear alkylcarboxylic acid is attached to either or both of the ZnS powder surface and the SiO 2 powder surface, and the fluidity of the ZnS powder and the SiO 2 powder in the raw material powder is improved. As a result, the ZnS powder and the SiO 2 powder are uniformly mixed without density unevenness. The produced raw material powder is filled in a graphite hot press mold. Next, the raw powder is hot pressed by holding a hot press mold filled with the raw material powder in an Ar gas atmosphere at a temperature of 700 to 1200 ° C. and a pressure of 20 to 40 MPa for 1 to 20 hours, followed by a cooling rate of 60 A hot press body is produced by cooling at ~ 180 ° C / hour. It is preferable to hot-press the mixed powder by holding it at a temperature of 850 to 1150 ° C. and a pressure of 25 to 35 MPa for 2 to 8 hours, followed by cooling at a cooling rate of 120 to 180 ° C./hour. A sintered compact target is obtained by machining the obtained hot press body to a predetermined diameter and a predetermined thickness. When the sintered compact target is manufactured by the above method, the filling density into the hot press mold is increased by using the raw material powder having improved fluidity, and the filling into the hot press mold is facilitated. Production efficiency in the target hot pressing process is improved. Moreover, by using the raw material powder having improved fluidity, a sintered compact target having a uniform structure, no density unevenness, and a high relative density can be obtained.

次に本発明の実施例を比較例とともに詳しく説明する。
<実施例1>
先ず、市販されている純度が99.999重量%以上のZnS粉末を用意した。この市販ZnS粉末をArガス雰囲気中、650℃の温度で熱処理を1時間施して市販ZnS粉末に多く含まれるH2S等の不純物ガスを除去し、焼結体ターゲット用ZnS粉末を作製した。作製した焼結体ターゲット用ZnS粉末の平均粒径は約8μmであった。次いで、平均粒径1.0μm、純度が99.999重量%のSiO2粉末を用意した。また、直鎖アルキルカルボン酸として、粉末状ステアリン酸(関東化学社製;特級)を用意した。
次に、ZnS粉末と第1SiO2粒子と、直鎖アルキルカルボン酸の組成比を80:19:1となるように混合し、この混合粉末をφ2mmのアルミナボールとともにポリポットの中に入れ、1時間乾式混合して焼結体ターゲット用原料粉末を作製した。作製した原料粉末は黒鉛製のホットプレス型内に充填した。次に、原料粉末を充填したホットプレス型をArガス雰囲気中において圧力24.5MPa(250kgf/cm2)、1000℃の温度で2時間保持することにより原料粉末をホットプレスし、続いて冷却速度120℃/時間で冷却することにより、ホットプレス体を作製した。得られたホットプレス体は直径200mm、厚さ5mmの寸法に機械加工して円盤状の焼結体ターゲットを作製した。
Next, examples of the present invention will be described in detail together with comparative examples.
<Example 1>
First, a commercially available ZnS powder having a purity of 99.999% by weight or more was prepared. This commercially available ZnS powder was heat-treated in an Ar gas atmosphere at a temperature of 650 ° C. for 1 hour to remove impurity gases such as H 2 S contained in the commercially available ZnS powder in a large amount, thereby producing a ZnS powder for a sintered compact target. The average particle size of the produced ZnS powder for a sintered compact target was about 8 μm. Next, SiO 2 powder having an average particle size of 1.0 μm and a purity of 99.999% by weight was prepared. Moreover, powdered stearic acid (manufactured by Kanto Chemical Co., Inc .; special grade) was prepared as a linear alkylcarboxylic acid.
Next, the composition ratio of the ZnS powder, the first SiO 2 particles, and the linear alkyl carboxylic acid is mixed at 80: 19: 1, and this mixed powder is put into a polypot together with φ2 mm alumina balls for 1 hour. Dry mixing was performed to prepare a raw material powder for a sintered compact target. The produced raw material powder was filled in a hot press die made of graphite. Next, the raw powder is hot-pressed by holding a hot press mold filled with the raw powder in an Ar gas atmosphere at a pressure of 24.5 MPa (250 kgf / cm 2 ) and a temperature of 1000 ° C. for 2 hours, followed by a cooling rate. A hot press body was produced by cooling at 120 ° C./hour. The obtained hot press body was machined into dimensions of 200 mm in diameter and 5 mm in thickness to produce a disk-shaped sintered body target.

<実施例2>
実施例1で使用した焼結体ターゲット用ZnS粉末、SiO2粉末及び粉末状ステアリン酸をそれぞれ用意した。先ず、ZnS粉末とステアリン酸の組成比を80:1となるように混合し、この混合粉末をφ2mmのアルミナボールとともにポリポットの中に入れ、1時間乾式混合した。1時間後にサンプリングしてSEM観察を行ったところ、ステアリン酸がZnS粉末表面にコーティングしていることを確認した。続いて、ポリポットにZnS粉末とSiO2粉末とステアリン酸の組成比が80:19:1となるようにSiO2粉末を入れて20分間乾式混合し、焼結体ターゲット用原料粉末を作製した。作製した原料粉末を用いて実施例1と同様にして焼結体ターゲットを作製した。
<実施例3>
実施例1で使用した焼結体ターゲット用ZnS粉末、SiO2粉末及び粉末状ステアリン酸をそれぞれ用意した。先ず、SiO2粉末とステアリン酸の組成比を19:1となるように混合し、この混合粉末をφ2mmのアルミナボールとともにポリポットの中に入れ、1時間乾式混合した。1時間後にサンプリングしてSEM観察を行ったところ、ステアリン酸がSiO2粉末表面にコーティングしていることを確認した。続いて、ポリポットにZnS粉末とSiO2粉末とステアリン酸の組成比が80:19:1となるようにZnS粉末を入れて20分間乾式混合し、焼結体ターゲット用原料粉末を作製した。作製した原料粉末を用いて実施例1と同様にして焼結体ターゲットを作製した。
<Example 2>
A ZnS powder for a sintered body target, an SiO 2 powder and powdered stearic acid used in Example 1 were prepared. First, the composition ratio of ZnS powder and stearic acid was mixed to be 80: 1, and this mixed powder was put in a polypot together with alumina balls having a diameter of 2 mm and dry-mixed for 1 hour. After 1 hour sampling and SEM observation, it was confirmed that stearic acid was coated on the ZnS powder surface. Subsequently, the SiO 2 powder was put in a polypot so that the composition ratio of ZnS powder, SiO 2 powder, and stearic acid was 80: 19: 1, and was dry-mixed for 20 minutes to produce a raw material powder for a sintered compact target. A sintered compact target was produced in the same manner as in Example 1 using the produced raw material powder.
<Example 3>
A ZnS powder for a sintered body target, an SiO 2 powder and powdered stearic acid used in Example 1 were prepared. First, the composition ratio of SiO 2 powder and stearic acid was mixed so as to be 19: 1, and this mixed powder was put into a polypot together with alumina balls of φ2 mm and dry-mixed for 1 hour. After 1 hour of sampling and SEM observation, it was confirmed that stearic acid was coated on the SiO 2 powder surface. Subsequently, the ZnS powder was put in a polypot so that the composition ratio of ZnS powder, SiO 2 powder and stearic acid was 80: 19: 1 and dry-mixed for 20 minutes to produce a sintered body target raw material powder. A sintered compact target was produced in the same manner as in Example 1 using the produced raw material powder.

<実施例4>
ZnS粉末とSiO2粉末とステアリン酸の組成比を82:14:4とした以外は実施例1と同様にして焼結体ターゲットを作製した。
<実施例5>
ZnS粉末とSiO2粉末とステアリン酸の組成比を75:24.5:0.5とした以外は実施例1と同様にして焼結体ターゲットを作製した。
<実施例6>
平均粒径4μmのZnS粉末と平均粒径2.0μmのSiO2粉末をそれぞれ用い、ZnS粉末とSiO2粉末とステアリン酸の組成比を80:18.5:1.5とした以外は実施例1と同様にして焼結体ターゲットを作製した。
<実施例7>
直鎖アルキルカルボン酸としてステアリン酸亜鉛を用いた以外は実施例1と同様にして焼結体ターゲットを作製した。
<実施例8>
直鎖アルキルカルボン酸としてステアリン酸亜鉛を用い、ZnS粉末とSiO2粉末とステアリン酸亜鉛の組成比を82:14:4とした以外は実施例1と同様にして焼結体ターゲットを作製した。
<Example 4>
A sintered compact target was produced in the same manner as in Example 1 except that the composition ratio of ZnS powder, SiO 2 powder and stearic acid was 82: 14: 4.
<Example 5>
A sintered compact target was produced in the same manner as in Example 1 except that the composition ratio of ZnS powder, SiO 2 powder and stearic acid was 75: 24.5: 0.5.
<Example 6>
Example except that ZnS powder having an average particle size of 4 μm and SiO 2 powder having an average particle size of 2.0 μm were used, respectively, and the composition ratio of ZnS powder, SiO 2 powder and stearic acid was 80: 18.5: 1.5. In the same manner as in Example 1, a sintered compact target was produced.
<Example 7>
A sintered compact target was produced in the same manner as in Example 1 except that zinc stearate was used as the linear alkylcarboxylic acid.
<Example 8>
A sintered compact target was prepared in the same manner as in Example 1 except that zinc stearate was used as the linear alkylcarboxylic acid and the composition ratio of ZnS powder, SiO 2 powder and zinc stearate was 82: 14: 4.

<比較例1>
直鎖アルキルカルボン酸を用いず、ZnS粉末とSiO2粉末の組成比を80:20とした以外は実施例1と同様にして焼結体ターゲットを作製した。
<比較例2>
ZnS粉末とSiO2粉末とステアリン酸の組成比を75:15:10とした以外は実施例1と同様にして焼結体ターゲットを作製した。
<比較例3>
平均粒径4μmのZnS粉末と平均粒径2.0μmのSiO2粉末をそれぞれ用い、ZnS粉末とSiO2粉末とステアリン酸の組成比を80:19.95:0.05とした以外は実施例1と同様にして焼結体ターゲットを作製した。
<比較例4>
直鎖アルキルカルボン酸としてステアリン酸亜鉛を用い、ZnS粉末とSiO2粉末とステアリン酸亜鉛の組成比を75:15:10とした以外は実施例1と同様にして焼結体ターゲットを作製した。
<Comparative Example 1>
A sintered body target was produced in the same manner as in Example 1 except that the linear alkylcarboxylic acid was not used and the composition ratio of the ZnS powder and the SiO 2 powder was 80:20.
<Comparative example 2>
A sintered compact target was produced in the same manner as in Example 1 except that the composition ratio of ZnS powder, SiO 2 powder and stearic acid was 75:15:10.
<Comparative Example 3>
Example except that ZnS powder having an average particle size of 4 μm and SiO 2 powder having an average particle size of 2.0 μm were used, respectively, and the composition ratio of ZnS powder, SiO 2 powder and stearic acid was 80: 19.95: 0.05. In the same manner as in Example 1, a sintered compact target was produced.
<Comparative example 4>
A sintered compact target was prepared in the same manner as in Example 1 except that zinc stearate was used as the linear alkylcarboxylic acid and the composition ratio of ZnS powder, SiO 2 powder and zinc stearate was 75:15:10.

Figure 2005171316
Figure 2005171316

<比較試験1>
先ず、上記実施例1〜8及び比較例1〜4でそれぞれ作製した焼結体ターゲット用原料粉末の安息角を測定した。次いで、実施例1〜8及び比較例1〜4の焼結体ターゲットを各100枚づつ焼成し、焼成直後のターゲットの割れや明らかな密度や色のむらを目視で判断し、このような不良箇所を有するターゲットの数を焼成不良率としてカウントした。次に、実施例1〜8及び比較例1〜4の焼結体ターゲットにおける抗折強度及び相対密度を測定した。次に、実施例1〜8及び比較例1〜4のの焼結体ターゲットをそれぞれモリブデン製の冷却用バッキングプレートに純度99.999重量%のイリジウムろう材によりはんだ付けし、これを高周波マグネトロンスパッタリング装置にセットし、スパッタガスAr、スパッタガス圧力0.665Pa(5×10-3Torr)、スパッタ電力13.56MHzの高周波電力1500kW(約8.5W/cm2)、スパッタ時間5分間でスパッタリングを行い、厚さ100nmのSiO2膜が積層したSi基板上に保護膜を成膜した。実施例1〜8の焼結体ターゲットは良好なスパッタ特性が得られた。これに対して、比較例1〜4の焼結体ターゲットはスパッタリング時に放出したガスによってスパッタ雰囲気が悪化し、成膜が不安定となり、良好な再現性が得られなかった。次に、上記スパッタリング条件でスパッタリングを連続して行い、ターゲットにスパッタ割れが発生したか否かを目視にて観察した。実施例1〜8及び比較例1〜4の焼結体ターゲットにおける安息角、焼成不良率、相対密度、抗折強度及びスパッタ割れの有無を表2にそれぞれ示す。
<Comparison test 1>
First, the angle of repose of the raw material powder for sintered compact target produced in Examples 1 to 8 and Comparative Examples 1 to 4 was measured. Subsequently, 100 sintered bodies of Examples 1 to 8 and Comparative Examples 1 to 4 were fired one by one, and the cracks and obvious density and color unevenness of the target immediately after firing were judged visually, and such a defective portion The number of targets having a count was counted as the firing failure rate. Next, the bending strength and relative density in the sintered compact targets of Examples 1 to 8 and Comparative Examples 1 to 4 were measured. Next, the sintered compact targets of Examples 1 to 8 and Comparative Examples 1 to 4 were each soldered to a molybdenum cooling backing plate with an iridium brazing material having a purity of 99.999% by weight, and this was subjected to high frequency magnetron sputtering. Sputtering gas Ar, sputtering gas pressure 0.665 Pa (5 × 10 −3 Torr), sputtering power 13.56 MHz high frequency power 1500 kW (about 8.5 W / cm 2 ), sputtering time 5 minutes Then, a protective film was formed on a Si substrate on which a 100 nm thick SiO 2 film was laminated. Good sputtering characteristics were obtained for the sintered compact targets of Examples 1 to 8. On the other hand, in the sintered compact targets of Comparative Examples 1 to 4, the sputtering atmosphere was deteriorated by the gas released during sputtering, the film formation became unstable, and good reproducibility was not obtained. Next, sputtering was continuously performed under the above sputtering conditions, and it was visually observed whether sputter cracks occurred in the target. Table 2 shows the angle of repose, firing failure rate, relative density, bending strength, and presence / absence of spatter cracks in the sintered compact targets of Examples 1 to 8 and Comparative Examples 1 to 4, respectively.

Figure 2005171316
Figure 2005171316

表2より明らかなように、比較例1及び3のターゲットでは相対強度が91%に留まっており、スパッタ割れも生じていた。これはターゲットの製造におけるホットプレス型内への充填が不十分だったことが考えられる。また、比較例2及び4のターゲットでは相対密度、抗折強度がともに低く、スパッタ割れも生じていた。これに対して実施例1〜8のターゲットでは、相対密度及び抗折強度がそれぞれ高く、焼成不良率が低く、また高出力の高周波マグネトロンスパッタを行ってもスパッタ割れが発生しないことが判った。
As is clear from Table 2, the relative strengths of the targets of Comparative Examples 1 and 3 remained at 91%, and spatter cracks were also generated. This is probably because the hot press mold was not sufficiently filled in the production of the target. Further, in the targets of Comparative Examples 2 and 4, both the relative density and the bending strength were low, and spatter cracks were also generated. On the other hand, in the targets of Examples 1 to 8, it was found that the relative density and bending strength were high, the firing failure rate was low, and spatter cracking did not occur even when high-power high-frequency magnetron sputtering was performed.

Claims (7)

平均粒径が0.0005〜10μmのSiO2粉末を10〜30モル%含有し、残りが平均粒径1〜20μmのZnS粉末からなる組成を有し、前記ZnS母体中にSiO2粉末が分散している光記録媒体保護膜形成用焼結体ターゲットの原料粉末であって、
前記混合物に対して直鎖アルキルカルボン酸を0.1重量%〜5重量%含有することを特徴とする光記録媒体保護膜形成用焼結体ターゲットの原料粉末。
Average particle diameter contained 10 to 30 mol% of SiO 2 powder 0.0005~10Myuemu, has a composition balance being ZnS powder having an average particle diameter of 1 to 20 [mu] m, SiO 2 powder is dispersed in the ZnS matrix It is a raw material powder of a sintered body target for forming an optical recording medium protective film,
A raw material powder for a sintered body target for forming a protective film for an optical recording medium, wherein the linear alkylcarboxylic acid is contained in an amount of 0.1 to 5% by weight based on the mixture.
直鎖アルキルカルボン酸がステアリン酸又はステアリン酸亜鉛の少なくとも1種を含む請求項1記載の原料粉末。   The raw material powder according to claim 1, wherein the linear alkylcarboxylic acid contains at least one of stearic acid and zinc stearate. 直鎖アルキルカルボン酸がZnS粉末表面又はSiO2粉末表面のいずれか一方又はその双方に付着されてなる請求項1記載の原料粉末。 The raw material powder according to claim 1, wherein the linear alkylcarboxylic acid is attached to either or both of the ZnS powder surface and the SiO 2 powder surface. 請求項1ないし3いずれか1項に記載の原料粉末をホットプレス型内に充填し、真空又はArガス雰囲気中、700〜1200℃の温度で20〜40MPaの圧力でホットプレスすることにより光記録媒体保護膜形成用焼結体ターゲットを製造する方法。   Optical recording by filling the raw material powder according to any one of claims 1 to 3 in a hot press mold and hot pressing at a temperature of 700 to 1200 ° C and a pressure of 20 to 40 MPa in a vacuum or an Ar gas atmosphere. A method for producing a sintered compact target for forming a medium protective film. 請求項4記載の方法により得られた光記録媒体保護膜形成用焼結体ターゲット。   The sintered compact target for optical recording medium protective film formation obtained by the method of Claim 4. 請求項5記載の焼結体ターゲットを用いて形成した光記録媒体保護膜。   An optical recording medium protective film formed using the sintered compact target according to claim 5. 請求項6記載の保護膜を有する光記録媒体。
An optical recording medium having the protective film according to claim 6.
JP2003413010A 2003-12-11 2003-12-11 Raw material powder for sintered compact target for forming optical recording medium protective film, method of producing sintered compact target using the powder, and sintered compact target Withdrawn JP2005171316A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102013105794A1 (en) 2012-06-12 2013-12-12 Sachtleben Chemie Gmbh Process for the preparation of ZnS particles with a coating of metal oxide containing cobalt, the products thus obtained and their use

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102013105794A1 (en) 2012-06-12 2013-12-12 Sachtleben Chemie Gmbh Process for the preparation of ZnS particles with a coating of metal oxide containing cobalt, the products thus obtained and their use
WO2013185753A1 (en) 2012-06-12 2013-12-19 Sachtleben Chemie Gmbh Method for the production of zns particles having a metal oxide coating and a cobalt content, products obtained thereby, and use of said products
US9163130B2 (en) 2012-06-12 2015-10-20 Sachtleben Chemie Gmbh Method for the production of ZnS particles having a metal oxide coating and a cobalt content, products obtained thereby, and use of said products

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