JP2005055553A - Mirror, mirror with temperature adjustment mechanism, and exposure apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To make the whole of the mirror light in weight and compact while securing the rigidity of the mirror, and to suppress the holding deformation and thermal distortion of the mirror. <P>SOLUTION: An effective region 12A to which light is applied during mirror use time and a non-effective region 12B to which light is not applied during the mirror use time are disposed on the reflective surface 12 of the mirror 11. The minimum value TB of substrate thickness on the non-effective region 12B part is smaller than the minimum value TA of substrate thickness on the effective region 12A part. Further, beams 15a-15c are formed on the surface (back surface) of the opposite side to the reflective surface 12 so as to connect part of the effective region 12A from the holding parts 16a-16c to an optical barrel of the mirror. According to the mirror 11, the whole of the mirror is made lightweight and also the distortion of the mirror is suppressed while securing the rigidity in the effective region 12A. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a mirror used in an optical system of an exposure apparatus and the like, and a mirror with a temperature adjustment mechanism. Furthermore, it is related with the exposure apparatus provided with such a mirror.
[0002]
[Background]
In recent lithography techniques, it is desired to further improve the resolution of a projection optical system limited by the diffraction limit of light as the device pattern becomes finer. Therefore, as one of the next-generation exposure technologies, a lithography technology using X-rays having a wavelength of several nm to several tens of nm (for example, about 13 nm) called soft X-rays or EUV light (Extreme Ultra Violet light: extreme ultraviolet light). Development is underway.
[0003]
This technique is expected as a technique capable of obtaining a resolution of 70 nm or less, which cannot be realized by optical lithography using ultraviolet light having a wavelength of about 190 nm, which is an extension of light exposure. Since this EUV light is absorbed by almost all substances, a reflective projection lens system is used in an optical system of an EUVL exposure apparatus, unlike an optical stepper using a transmission projection lens system.
[0004]
FIG. 7 is a view showing a typical example of a concave reflection mirror used in the projection optical system of the EUVL exposure apparatus. (A) is a schematic side view, and (B) is a plan view.
The reflection mirror 100 shown in FIG. 7 is held in a projection optical system lens barrel (not shown) via three holding portions 103, 104, and 105 on the side surface. The reflection mirror 100 is formed from low thermal expansion glass or the like. The reflection surface 101 of the reflection mirror 100 is provided with an effective area 101A that is irradiated with EUV light when the mirror is used, and an ineffective area 101B that is not irradiated with EUV light when the mirror is used. In this reflection mirror 100, the effective area 101A is provided on the mirror center side, and the non-effective area 101B is provided outside the effective area 101A.
[0005]
In the reflecting mirror 100, the shape accuracy of the reflecting surface 101 may deteriorate as the holding force of the holding units 103 to 105 is applied. Therefore, in order to reduce the deterioration of the shape accuracy as much as possible, the outer shape of the mirror 100 is increased or the thickness is increased to increase the rigidity of the mirror itself. Further, since the deformation of the mirror 100 appears prominently at the place where the holding force of the holding parts 103 to 105 is applied, the holding parts 103 to 105 are provided on the side surface of the mirror 100. That is, by increasing the outer shape of the mirror 100 to widen the non-effective area 101B and providing the holding portions 103 to 105 on the side surfaces of the mirror 100, the distance between the effective area 101A of the mirror 100 and the holding portions 103 to 105 is increased. In addition, the influence of deformation in the holding portions 103 to 105 is prevented from being transmitted to the effective area 101 </ b> A of the reflecting surface 101 as much as possible.
[0006]
Incidentally, the reflecting surface 101 of the reflecting mirror 100 is coated with a Mo / Si multilayer film (one example) for improving the reflectance of EUV light. However, at present, even if the reflective surface 101 is coated with a multilayer film, a reflectance of nearly 100% cannot be obtained (for example, a reflectance of about 65%), and a part of the energy of the EUV light 100 (the remaining about 35%) is It is absorbed by the mirror 100 itself. Then, the temperature of the mirror 100 rises due to the amount of heat absorbed at that time, causing thermal deformation, and the shape accuracy of the reflecting surface 101 may deteriorate (thermal deformation). Therefore, a cooling mechanism is provided on the back surface or side surface of the mirror 100 to suppress the temperature rise of the mirror 100.
[0007]
[Problems to be solved by the invention]
As described above, increasing the outer shape and the plate thickness of the mirror 100 is effective in increasing the rigidity, but has the disadvantage that the weight of the entire mirror 100 increases. On the other hand, if the mirror 100 is thinned in order to reduce the weight of the mirror 100, the rigidity of the mirror 100 is lowered. When the rigidity of the mirror 100 is lowered, there is a problem that the mirror 100 is easily deformed due to heat absorption when the mirror 100 is irradiated with EUV light.
[0008]
Alternatively, since glass mirrors have low thermal conductivity, even if the cooling mechanism cools the side and back of the mirror, the temperature rise of the reflecting surface directly irradiated with EUV light cannot be sufficiently suppressed, and cooling efficiency is improved. There is also a problem that it is difficult to raise. In particular, when the outer shape and the plate thickness of the mirror are increased, the distance between the mirror side surface / back surface (cooling surface) and the mirror reflecting surface (temperature rise surface) becomes longer, resulting in a problem that cooling efficiency is further deteriorated. . If the cooling efficiency of the mirror is low and thermal deformation is likely to occur, there is a problem that the wavefront aberration of the projection optical system is deteriorated.
[0009]
The present invention has been made in view of such a problem, and it is possible to reduce the weight and size of the entire mirror while ensuring the rigidity of the mirror, or to suppress the holding deformation and thermal deformation of the mirror. An object of the present invention is to provide a mirror having Furthermore, it aims at providing the exposure apparatus provided with such a mirror.
[0010]
[Means for Solving the Problems]
In order to solve the above-mentioned problems, the mirror of the present invention is a mirror having a substrate and a reflection surface formed on one surface thereof, and the reflection surface has an effective area irradiated with light when the mirror is used, and A non-effective area that is not irradiated with light when the mirror is used is provided, and the minimum value of the substrate thickness in the non-effective area part is smaller than the minimum value of the substrate thickness in the effective area part. In the outer peripheral area of the mirror, a portion for holding the mirror in the optical barrel is provided, and on the surface (back surface) opposite to the reflecting surface of the substrate, the effective area extends from the holding portion. A beam is formed so as to connect the portions.
[0011]
According to this mirror, since the minimum value of the substrate thickness in the non-effective area portion is configured to be thinner than the minimum value of the substrate thickness in the effective area portion, the rigidity of the effective area of the mirror is configured. It is possible to reduce the weight of the entire mirror while securing the above. Nevertheless, since the thickness of the mirror increases at the beam portion connecting the holding portion and the effective area portion, the deformation of the mirror can be suppressed.
The beam is preferably formed so that its center line passes near the center of gravity of the effective area of the mirror. By doing so, there is an advantage that the holding deformation of the mirror can be easily suppressed.
[0012]
The mirror with a temperature adjusting mechanism of the present invention is a mirror having a substrate and a reflecting surface formed on one surface thereof, and the reflecting surface has an effective area irradiated with light when the mirror is used, and the mirror is used. Sometimes there is an ineffective area that is not irradiated with light,
The minimum value of the thickness of the substrate in the portion of the ineffective area is configured to be thinner than the minimum value of the thickness of the substrate in the portion of the effective area. And a temperature adjusting mechanism is provided on the back surface and side surface of the substrate in the effective area portion.
[0013]
According to this mirror with a temperature adjustment mechanism, the minimum value of the substrate thickness in the non-effective region portion is thinner than the minimum value of the substrate thickness in the effective region portion (that is, the non-effective region). Therefore, the distance between the back surface on which the temperature adjustment mechanism is provided and the reflecting surface is short in the non-effective region portion. In addition, when a step is formed on the back surface of the effective area, the side surface of the step can be cooled. Therefore, the mirror cooling efficiency by the temperature adjustment mechanism can be improved. Alternatively, since a part of the temperature adjustment mechanism can be arranged in a space generated by reducing the thickness of the portion of the ineffective area, there is an advantage that the entire mirror can be made compact.
[0014]
In the mirror with a temperature adjustment mechanism of the present invention, the temperature of the effective area of the reflecting surface is T1, the temperature of the side surface of the substrate in the effective area is T2, and the temperature of the back surface of the substrate in the effective area is T3. Then
T1 ≧ T3> T2
The temperature adjusting mechanism can be operated so that
In this case, a temperature distribution can be generated in the mirror so that the isotherm is nearly parallel to the mirror axis (the thickness direction of the substrate). As a result, since the temperature distribution in the mirror thickness direction becomes small, deformation of the form in which the mirror opens in the thickness direction can be suppressed (details will be described later with reference to FIG. 5). In addition, since the deformation caused by the temperature gradient in the radial direction of the mirror only expands in the lateral direction, the influence on the error of the mirror surface shape is relatively small. In this way, since the thermal deformation of the mirror can be suppressed, deterioration of the wavefront aberration of the optical system can be suppressed.
[0015]
In the mirror with a temperature adjusting mechanism of the present invention, the temperature adjusting mechanism forms a temperature distribution in the substrate of the effective area portion in which an isothermal line extends in the substrate thickness direction and a temperature gradient is generated in a direction perpendicular thereto. Can be.
According to such a temperature distribution, the deformation of the mirror can be further suppressed, so that the deterioration of the wavefront aberration of the optical system can be further suppressed.
[0016]
In the mirror with a temperature adjustment mechanism of the present invention, the temperature adjustment mechanism has a plurality of radiation plates arranged in the vicinity of the back surface and side surface of the substrate in the effective area portion, and these radiation plates can be individually controlled. It is also preferable that
In this case, temperature control according to the details of the mirror is possible.
[0017]
The exposure apparatus of the present invention comprises an optical barrel and a mirror fixed to the outer surface of the barrel, and the mirror is the mirror according to claim 1 or any one of claims 2 to 5. It consists of a mirror with the temperature control mechanism of 1 description.
In addition, the energy beam used for the optical system in the present invention is not particularly limited.
[0018]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, it demonstrates, referring drawings.
FIG. 1 is a diagram showing a concave mirror according to an embodiment of the present invention. (A) is a schematic side view, (B) is a back view.
FIG. 2 is a view showing a mirror (rotational asymmetric type) according to another embodiment of the present invention. (A) is a top view, (B) is a schematic side view, and (C) is a back view.
FIG. 3 is a view showing a mirror with a temperature adjustment mechanism (rotational asymmetric type) according to another embodiment of the present invention. (A) is side surface sectional drawing, (B) is a back view.
FIG. 4 is a schematic diagram showing a configuration of a six-projection system of an EUVL exposure apparatus using a mirror with a temperature adjusting mechanism according to the present invention.
[0019]
The main body (substrate) of the mirror 1 shown in FIG. 1 is made of low thermal expansion glass and includes a concave reflecting surface 2. The reflecting surface 2 of the mirror 1 is provided with an effective area 2A that is irradiated with EUV light when the mirror is used, and an ineffective area 2B that is not irradiated with EUV light when the mirror is used. In this mirror 1, the effective area 2A is provided on the mirror center side, and the non-effective area 2B is provided outside the effective area. The reflective surface 2 is coated with a Mo / Si multilayer film for improving the reflectance of EUV light.
[0020]
On the back side of the mirror 1 (the side opposite to the reflecting surface 2), a cylindrical protrusion 3 is integrally formed at a location corresponding to the effective area 2A. The mirror 1 is configured such that the minimum value TB of the substrate in the non-effective region 2B is thinner than the minimum value TA of the substrate in the effective region 2A (FIG. 1). A)).
Between the back side 2 'of the ineffective area 2B of the mirror 1 and the side surface 3' of the protrusion 3, beams 5a to 5c are formed so as to project radially from the side surface 3 'to the outer periphery of the mirror 1 in this example. . Holding portions 6a to 6c are formed on the side surfaces of the mirror 1 at the tips of the beams 5a to 5c. These holding portions 6a to 6c are used when holding the mirror 1 in the optical barrel of the exposure apparatus.
[0021]
The mirror 11 shown in FIG. 2 is also made of low thermal expansion glass. This mirror 11 is a rotationally asymmetric mirror, and has a notch portion 11a formed in a part of the side surface, and the effective area 12A of the reflecting surface 12 is decentered with respect to the aspherical axis. Very different from mirror 1. The protrusion 13 on the back surface side of the mirror 11 has a shape having a cross section corresponding to the eccentric shape of the effective region 12A (see FIG. 2C).
[0022]
As shown in FIG. 2B, the minimum thickness of the effective area 12A of the mirror 11 is set to TA = 45 mm, and the minimum thickness of the non-effective area 12B is set to TB = 15 mm. The mirror 11 is also provided with three beams 15a to 15c as described above. The thickness TC of each beam 15a-15c is 15 mm, respectively. As shown in FIG. 2C, the center line of each beam 15 a to 15 c is set so as to pass through the center of gravity C of the effective area 12 </ b> A of the reflecting surface 12. By doing so, it becomes easy to suppress the holding deformation of the mirror 11 that occurs in the vicinity of the holding portions 16a to 16c on the side surface of the mirror 11.
[0023]
The mirror with a temperature adjusting mechanism shown in FIG. 3 has a plurality of radiation plates 28S (side surfaces) and 28B (back surface) divided in the vicinity of the side surface and the back surface of the protrusion 13 in the mirror 11 described above with reference to FIG. Side) is arranged. Each of the radiation plates 28S and 28B is made of a quartz plate having a thickness of about 3 mm and a high radiation rate. The radiation plates 28S and 28B are individually connected to temperature adjusting members 29S and 29B such as a liquid cooling jacket, a heat pipe, and a Peltier element, and can be individually controlled in temperature. These radiation plates 28S and 28B, a liquid cooling jacket, and the like constitute a temperature adjustment mechanism.
A specific example of temperature control using this temperature adjustment mechanism will be described in detail later with reference to FIGS.
[0024]
FIG. 4 schematically shows the internal configuration of the projection optical system barrel 40 of the EUVL exposure apparatus using the mirror according to the present invention.
A total of six mirrors M1 to M6 are arranged in the projection optical system column 40 shown in FIG. The respective mirrors are, in order from the upstream side, a first mirror M1 (concave spherical mirror), a second mirror M2 (convex spherical mirror), a third mirror M3 (rotational asymmetric concave mirror), and a fourth mirror M4 (rotational asymmetric concave mirror). , A fifth mirror M5 (rotationally asymmetric convex mirror) and a sixth mirror M6 (rotationally asymmetric concave mirror). Each of the mirrors M1 to M6 is provided with a temperature adjustment mechanism C1S to C6S (side surface side) and C1B to C6B (back surface side) composed of a radiation plate (+ liquid cooling jacket or the like) as described above with reference to FIG. It has been.
[0025]
A reticle (pattern original plate) R is disposed on the upstream side of the projection optical system barrel 40, and a wafer (sensitive substrate) W is disposed on the downstream side. The reticle R is irradiated with EUV light e from an illumination optical system (not shown). The EUV light e is reflected by the pattern surface of the reticle R, enters the projection optical system barrel 40, is reflected by the reflecting surfaces of the mirrors M1 to M6, and is then guided to the upper surface of the wafer W.
Although only the projection optical system barrel 40 has been described in the present embodiment, the same can be done in the illumination optical system barrel.
[0026]
Next, an example of temperature control of the mirror according to the present invention will be described.
FIG. 5 is an explanatory diagram for explaining an example of temperature control of the mirror with a temperature adjusting mechanism according to the present invention. (A) is sectional drawing of the mirror with the temperature control mechanism which concerns on this invention, (B) and (C) are the graphs (vertical axis: temperature, horizontal axis: distance) which show the relationship between the temperature and distance of a mirror. (D) is a figure which shows typically the deformation | transformation form of a mirror.
FIG. 6 is an explanatory diagram for explaining a temperature control example of the current mirror with the temperature adjusting mechanism. (A) is a cross-sectional view of a mirror with a current temperature adjustment mechanism, (B) and (C) are graphs (vertical axis: temperature, horizontal axis: distance) showing the relationship between mirror temperature and distance, (D) is a figure which shows typically the deformation | transformation form of a mirror.
Note that the X direction and the Y direction in the following description refer to the arrow directions shown in FIG. 5 (A) or FIG. 6 (A).
[0027]
As described above with reference to FIGS. 1 to 3, the mirror 51 according to the present invention shown in FIG. 5A has a protrusion 53 integrally formed at a position corresponding to the effective area 52 </ b> A on the back side. The minimum value of the substrate thickness in the non-effective area 52B is smaller than the minimum value TA of the substrate in the effective area 52A. In the vicinity of the side surface and the back surface of the protrusion 53, temperature adjusting mechanisms 58S and 58B of a radiation plate (+ liquid cooling jacket or the like) are arranged. There is a slight gap between the protrusion 53 and the temperature adjustment mechanisms 58S and 58B. Due to this gap, no force is applied to the protrusion 53 from the temperature cooling mechanisms 58S, 58B.
[0028]
In this mirror 51, the temperature of the effective area 52A of the reflection surface is T1, the temperature of the side surface of the projection 53 is T2, and the temperature of the back surface of the projection 53 is T3. The temperature T1 of the effective area 52A of the reflecting surface rises with the incidence of light. On the other hand, the temperature T2 on the side surface of the protrusion 53 and the temperature T3 on the back surface of the protrusion 53 can be individually controlled by the temperature adjustment mechanisms 58S and 58B. Therefore, each of these temperatures T1, T2, T3 is
T1 ≧ T3> T2
Each temperature adjustment mechanism 58S, 58B is operated so as to satisfy. For example, the temperature adjustment mechanism 58B on the back surface of the protrusion 53 is heated so that the temperature T3 on the back surface of the protrusion 53 is close to the temperature T1 of the effective area 52A of the reflection surface, and the temperature adjustment of the side surface of the protrusion 53 is performed. The mechanism T2 is cooled so that the temperature T2 on the side surface of the protrusion 53 is lower than the temperature T3 on the back surface of the protrusion 53.
[0029]
When such temperature control is performed, a temperature distribution is generated in the mirror 51 so that the isotherm (indicated by the dotted line in the figure) is parallel to the mirror axis (indicated by the alternate long and short dash line: the thickness direction of the substrate). Can do. As a result, since the temperature distribution in the mirror thickness direction (Y direction) becomes small, the amount of deformation in the Y direction hardly changes as shown in FIG. On the other hand, in the mirror radial direction (X direction), deformation occurs due to the temperature gradient shown in FIG. 5B, but this is only expansion in the X direction. Therefore, the mirror 51 only undergoes thermal deformation in the form shown by the two-dotted line in FIG. 5D (form that simply increases in the radial direction), and suppresses deformation in the form in which the mirror 51 opens in the thickness direction. it can.
[0030]
On the other hand, the current mirror 61 shown in FIG. 6A has a configuration in which the thickness of the mirror main body is not set and the temperature adjustment mechanisms 68S and 68B are simply arranged on the side surface and the back surface, respectively. In such a configuration, even if the temperature adjustment mechanisms 68S and 68B are operated to cool the side surfaces and the back surface of the mirror 61, the temperature rise in the effective region 62A cannot be sufficiently suppressed, and it is difficult to increase the cooling efficiency. Therefore, inside the mirror 61, a temperature distribution is generated in which the reflecting surface side is hot and the side surfaces and the back surface are cold, spreading in an arc shape on the mirror axis (thickness direction of the substrate) (see FIG. 6A). . As a result, deformation accompanying the temperature gradient shown in FIG. 6C occurs in the mirror thickness direction (Y direction), and accompanying the temperature gradient shown in FIG. 6B in the mirror radial direction (X direction). Deformation occurs. Therefore, the mirror 61 is deformed so as to open in the thickness direction as shown in FIG.
[0031]
As described with reference to FIG. 5, the mirrors M1 to M6 in the projection optical system barrel 40 of FIG.
T1 ≧ T3> T2
The temperature adjustment mechanisms C1S to C6S and C1B to C6B are operated so as to satisfy the relationship. Specifically, for example, for the first mirror M1, the temperature of the temperature adjustment mechanism C1B on the back surface side is set to be about 5 degrees higher than the temperature T3, and the temperature of the temperature adjustment mechanism C1S on the side surface side is about 8 degrees than the temperature T2. When set low, the temperature rise of the reflecting surface of the first mirror M1 during exposure could be suppressed to about 0.5 degrees at the maximum.
[0032]
Further, the temperature adjustment mechanisms C1B to C6B are operated so that the temperature T3 is substantially the same as the temperature T1, and the temperature difference between the mirror front and back is maintained to be approximately 0, and the temperature T2 is decreased by about 0.3 degree. If the temperature adjusting mechanisms C1S to C6S are operated so that the average temperature rise inside the mirror is about 0 degrees, the deterioration of the wavefront aberration caused by the thermal deformation of the mirror can be minimized. did it.
[0033]
【The invention's effect】
As is apparent from the above description, according to the present invention, the mirror has advantages such as being able to reduce the weight and size of the entire mirror while ensuring the rigidity of the mirror, or to suppress holding deformation and thermal deformation of the mirror. In addition, a mirror with a temperature adjusting mechanism can be provided.
[Brief description of the drawings]
FIG. 1 is a diagram showing a concave mirror according to an embodiment of the present invention. (A) is a schematic side view, (B) is a back view.
FIG. 2 is a view showing a mirror (rotationally asymmetric type) according to another embodiment of the present invention. (A) is a top view, (B) is a schematic side view, and (C) is a back view.
FIG. 3 is a view showing a mirror with a temperature adjustment mechanism (rotational asymmetric type) according to another embodiment of the present invention. (A) is side surface sectional drawing, (B) is a back view.
FIG. 4 is a schematic diagram showing a configuration of a six-projection system of an EUVL exposure apparatus using a mirror with a temperature adjustment mechanism according to the present invention.
FIG. 5 is an explanatory diagram for explaining a temperature control example of a mirror with a temperature adjustment mechanism according to the present invention. (A) is sectional drawing of the mirror with the temperature control mechanism which concerns on this invention, (B) and (C) are the graphs (vertical axis: temperature, horizontal axis: distance) which show the relationship between the temperature and distance of a mirror. (D) is a figure which shows typically the deformation | transformation form of a mirror.
FIG. 6 is an explanatory diagram for explaining an example of temperature control of a current mirror with a temperature adjustment mechanism. (A) is a cross-sectional view of a mirror with a current temperature adjustment mechanism, (B) and (C) are graphs (vertical axis: temperature, horizontal axis: distance) showing the relationship between mirror temperature and distance, (D) is a figure which shows typically the deformation | transformation form of a mirror.
FIG. 7 is a view showing a typical example of a concave reflection mirror used in a projection optical system of an EUVL exposure apparatus. (A) is a schematic side view, and (B) is a plan view.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Mirror 2 Reflective surface 2A Effective area 2B Ineffective area 3 Protrusion 5a-5c Beam 6a-6c Holding part 11 Mirror 12 Reflecting surface 12A Effective area 12B Ineffective area 13 Protrusion 15a-15c Beam 16a-16c Holding part 28S, 28B Radiation plates 29S, 29B Temperature adjustment member 40 Projection optical system barrel M1-M6 Mirrors C1S-C6S, C1B-C6B Temperature adjustment mechanism R Reticle (pattern original) W Wafer (sensitive substrate)

Claims (6)

A mirror having a substrate and a reflective surface formed on one surface thereof,
The reflective surface is provided with an effective area that is irradiated with light when the mirror is used, and an ineffective area that is not irradiated with light when the mirror is used,
The minimum value of the substrate thickness of the portion of the ineffective area is configured to be thinner than the minimum value of the thickness of the substrate of the portion of the effective area,
In the outer peripheral area of the mirror, a portion for holding the mirror in the optical barrel is provided,
A mirror, wherein a beam is formed on a surface (back surface) opposite to the reflecting surface of the substrate so as to connect the portion of the effective area from the holding portion. A mirror having a substrate and a reflective surface formed on one surface thereof,
The reflective surface is provided with an effective area that is irradiated with light when the mirror is used, and an ineffective area that is not irradiated with light when the mirror is used,
The minimum value of the substrate thickness of the portion of the ineffective area is configured to be thinner than the minimum value of the thickness of the substrate of the portion of the effective area,
In the outer peripheral area of the mirror, a portion for holding the mirror in the optical barrel is provided,
A mirror with a temperature adjustment mechanism, wherein a temperature adjustment mechanism is provided on a back surface and a side surface of the substrate in the effective area portion. When the temperature of the effective area of the reflecting surface is T1, the temperature of the side surface of the substrate in the effective area portion is T2, and the temperature of the back surface of the substrate in the effective area portion is T3,
T1 ≧ T3> T2
The mirror with a temperature adjusting mechanism according to claim 2, wherein the temperature adjusting mechanism is operated so that The temperature adjustment mechanism forms a temperature distribution in the substrate in the effective area portion so that an isothermal line extends in the substrate thickness direction and a temperature gradient is generated in a direction perpendicular thereto. Mirror with temperature adjustment mechanism described. The temperature adjustment mechanism has a plurality of radiation plates arranged near the back surface and side surface of the substrate in the effective area portion, and these radiation plates can be individually controlled. A mirror with a temperature adjusting mechanism according to any one of claims 2 to 4. An optical column;
A mirror fixed to the outer surface of the barrel;
Comprising
An exposure apparatus comprising the mirror according to claim 1 or the mirror with a temperature adjusting mechanism according to any one of claims 2 to 5.

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