JP2004209345A - Photocatalyst composition and photocatalyst body formed from the same - Google Patents
Photocatalyst composition and photocatalyst body formed from the same Download PDFInfo
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- JP2004209345A JP2004209345A JP2002380210A JP2002380210A JP2004209345A JP 2004209345 A JP2004209345 A JP 2004209345A JP 2002380210 A JP2002380210 A JP 2002380210A JP 2002380210 A JP2002380210 A JP 2002380210A JP 2004209345 A JP2004209345 A JP 2004209345A
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- photocatalyst
- formula
- modified
- carbon atoms
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- 239000011941 photocatalyst Substances 0.000 title claims abstract description 346
- 239000000203 mixture Substances 0.000 title claims abstract description 66
- 150000001875 compounds Chemical class 0.000 claims abstract description 89
- 239000002245 particle Substances 0.000 claims abstract description 86
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 83
- -1 mono-oxy Chemical group 0.000 claims abstract description 49
- 230000001699 photocatalysis Effects 0.000 claims abstract description 36
- 239000002131 composite material Substances 0.000 claims abstract description 24
- 239000000463 material Substances 0.000 claims abstract description 20
- RWRIWBAIICGTTQ-UHFFFAOYSA-N difluoromethane Chemical compound FCF RWRIWBAIICGTTQ-UHFFFAOYSA-N 0.000 claims abstract description 8
- 150000003377 silicon compounds Chemical class 0.000 claims description 70
- 239000000758 substrate Substances 0.000 claims description 53
- 125000004432 carbon atom Chemical group C* 0.000 claims description 49
- 150000003839 salts Chemical class 0.000 claims description 29
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 25
- 230000001235 sensitizing effect Effects 0.000 claims description 24
- 239000003607 modifier Substances 0.000 claims description 23
- 230000003595 spectral effect Effects 0.000 claims description 19
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 18
- 125000003277 amino group Chemical group 0.000 claims description 17
- 230000004048 modification Effects 0.000 claims description 15
- 238000012986 modification Methods 0.000 claims description 15
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 15
- 125000004018 acid anhydride group Chemical group 0.000 claims description 12
- 125000000217 alkyl group Chemical group 0.000 claims description 12
- 125000004122 cyclic group Chemical group 0.000 claims description 12
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 claims description 11
- 125000003342 alkenyl group Chemical group 0.000 claims description 11
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 11
- 238000009826 distribution Methods 0.000 claims description 11
- 125000003700 epoxy group Chemical group 0.000 claims description 10
- 125000003709 fluoroalkyl group Chemical group 0.000 claims description 10
- 125000003545 alkoxy group Chemical group 0.000 claims description 9
- 150000005676 cyclic carbonates Chemical group 0.000 claims description 9
- 125000004185 ester group Chemical group 0.000 claims description 9
- OAKJQQAXSVQMHS-UHFFFAOYSA-N hydrazine group Chemical group NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims description 9
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 claims description 9
- 125000000468 ketone group Chemical group 0.000 claims description 9
- 125000000962 organic group Chemical group 0.000 claims description 9
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical group OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 8
- ZBKFYXZXZJPWNQ-UHFFFAOYSA-N isothiocyanate group Chemical group [N-]=C=S ZBKFYXZXZJPWNQ-UHFFFAOYSA-N 0.000 claims description 8
- 229910052710 silicon Inorganic materials 0.000 claims description 8
- 125000003396 thiol group Chemical group [H]S* 0.000 claims description 8
- 125000000542 sulfonic acid group Chemical group 0.000 claims description 7
- 230000001678 irradiating effect Effects 0.000 claims description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 55
- 230000006866 deterioration Effects 0.000 abstract description 11
- 230000002209 hydrophobic effect Effects 0.000 abstract description 10
- 150000007530 organic bases Chemical class 0.000 abstract description 8
- 239000003795 chemical substances by application Substances 0.000 abstract description 4
- 230000001747 exhibiting effect Effects 0.000 abstract description 4
- 238000009736 wetting Methods 0.000 abstract 1
- 239000010408 film Substances 0.000 description 81
- 238000000034 method Methods 0.000 description 69
- 229920005989 resin Polymers 0.000 description 40
- 239000011347 resin Substances 0.000 description 40
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 36
- 239000000243 solution Substances 0.000 description 34
- 238000012360 testing method Methods 0.000 description 34
- 239000000975 dye Substances 0.000 description 32
- 238000000576 coating method Methods 0.000 description 30
- 239000000126 substance Substances 0.000 description 28
- 238000006243 chemical reaction Methods 0.000 description 24
- 239000011248 coating agent Substances 0.000 description 22
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 21
- 229920001296 polysiloxane Polymers 0.000 description 19
- 239000000835 fiber Substances 0.000 description 18
- 239000011230 binding agent Substances 0.000 description 17
- CREMABGTGYGIQB-UHFFFAOYSA-N carbon carbon Chemical compound C.C CREMABGTGYGIQB-UHFFFAOYSA-N 0.000 description 16
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 16
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 16
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 15
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 14
- 239000003054 catalyst Substances 0.000 description 14
- 125000000524 functional group Chemical group 0.000 description 14
- 239000003960 organic solvent Substances 0.000 description 14
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 13
- 238000000465 moulding Methods 0.000 description 13
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 12
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 12
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 12
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 12
- 239000003981 vehicle Substances 0.000 description 12
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 11
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 11
- 239000002253 acid Substances 0.000 description 11
- 239000007864 aqueous solution Substances 0.000 description 11
- 238000003756 stirring Methods 0.000 description 11
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 10
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 10
- 230000009471 action Effects 0.000 description 10
- 239000006185 dispersion Substances 0.000 description 10
- 238000005516 engineering process Methods 0.000 description 10
- 235000019441 ethanol Nutrition 0.000 description 10
- 238000011156 evaluation Methods 0.000 description 10
- 239000011164 primary particle Substances 0.000 description 10
- 239000002904 solvent Substances 0.000 description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 9
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 8
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 8
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 8
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 8
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 8
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 8
- 238000000354 decomposition reaction Methods 0.000 description 8
- 230000000694 effects Effects 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 8
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 8
- 238000010521 absorption reaction Methods 0.000 description 7
- 239000002585 base Substances 0.000 description 7
- 239000002612 dispersion medium Substances 0.000 description 7
- 238000006459 hydrosilylation reaction Methods 0.000 description 7
- 230000003100 immobilizing effect Effects 0.000 description 7
- 238000002156 mixing Methods 0.000 description 7
- 229910052697 platinum Inorganic materials 0.000 description 7
- 239000011163 secondary particle Substances 0.000 description 7
- 239000010936 titanium Substances 0.000 description 7
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 7
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 7
- 229920000178 Acrylic resin Polymers 0.000 description 6
- 239000004925 Acrylic resin Substances 0.000 description 6
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 6
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 6
- 230000003373 anti-fouling effect Effects 0.000 description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- 230000014759 maintenance of location Effects 0.000 description 6
- 229920000642 polymer Polymers 0.000 description 6
- 238000010992 reflux Methods 0.000 description 6
- 229920002050 silicone resin Polymers 0.000 description 6
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 5
- 229910003089 Ti–OH Inorganic materials 0.000 description 5
- XQAXGZLFSSPBMK-UHFFFAOYSA-M [7-(dimethylamino)phenothiazin-3-ylidene]-dimethylazanium;chloride;trihydrate Chemical compound O.O.O.[Cl-].C1=CC(=[N+](C)C)C=C2SC3=CC(N(C)C)=CC=C3N=C21 XQAXGZLFSSPBMK-UHFFFAOYSA-M 0.000 description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 239000005357 flat glass Substances 0.000 description 5
- 229910052731 fluorine Inorganic materials 0.000 description 5
- 239000011737 fluorine Substances 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 5
- 229960000907 methylthioninium chloride Drugs 0.000 description 5
- 239000008188 pellet Substances 0.000 description 5
- 230000002265 prevention Effects 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 238000009987 spinning Methods 0.000 description 5
- 239000004094 surface-active agent Substances 0.000 description 5
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 4
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 4
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 4
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 4
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 4
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 4
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 4
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 4
- 238000004220 aggregation Methods 0.000 description 4
- 230000002776 aggregation Effects 0.000 description 4
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 4
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 4
- 150000001408 amides Chemical class 0.000 description 4
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000011109 contamination Methods 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 4
- 150000002148 esters Chemical class 0.000 description 4
- 150000002170 ethers Chemical class 0.000 description 4
- 150000002366 halogen compounds Chemical class 0.000 description 4
- 238000002329 infrared spectrum Methods 0.000 description 4
- 150000002576 ketones Chemical class 0.000 description 4
- 239000003973 paint Substances 0.000 description 4
- CLSUSRZJUQMOHH-UHFFFAOYSA-L platinum dichloride Chemical compound Cl[Pt]Cl CLSUSRZJUQMOHH-UHFFFAOYSA-L 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 230000009257 reactivity Effects 0.000 description 4
- 150000004756 silanes Chemical class 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- 229920003002 synthetic resin Polymers 0.000 description 4
- 239000000057 synthetic resin Substances 0.000 description 4
- 229910052719 titanium Inorganic materials 0.000 description 4
- 229920001567 vinyl ester resin Polymers 0.000 description 4
- 239000008096 xylene Substances 0.000 description 4
- KNDQHSIWLOJIGP-UHFFFAOYSA-N 826-62-0 Chemical compound C1C2C3C(=O)OC(=O)C3C1C=C2 KNDQHSIWLOJIGP-UHFFFAOYSA-N 0.000 description 3
- YXDMEWZJQPYVEC-UHFFFAOYSA-N ClC=1C(C=CC=1)([Pt]C1C=CC=C1)Cl Chemical compound ClC=1C(C=CC=1)([Pt]C1C=CC=C1)Cl YXDMEWZJQPYVEC-UHFFFAOYSA-N 0.000 description 3
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 150000001336 alkenes Chemical class 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 239000004566 building material Substances 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 230000008034 disappearance Effects 0.000 description 3
- 230000007613 environmental effect Effects 0.000 description 3
- 230000005284 excitation Effects 0.000 description 3
- 239000010419 fine particle Substances 0.000 description 3
- 238000010304 firing Methods 0.000 description 3
- 238000005227 gel permeation chromatography Methods 0.000 description 3
- 150000002430 hydrocarbons Chemical group 0.000 description 3
- 230000001771 impaired effect Effects 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 230000007774 longterm Effects 0.000 description 3
- 239000002609 medium Substances 0.000 description 3
- 239000000025 natural resin Substances 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 229910052762 osmium Inorganic materials 0.000 description 3
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 3
- 229910052763 palladium Inorganic materials 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 238000000746 purification Methods 0.000 description 3
- 229910052703 rhodium Inorganic materials 0.000 description 3
- 239000010948 rhodium Substances 0.000 description 3
- 229910052707 ruthenium Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 150000003440 styrenes Chemical class 0.000 description 3
- 229920005992 thermoplastic resin Polymers 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 229910052718 tin Inorganic materials 0.000 description 3
- 239000011135 tin Substances 0.000 description 3
- 239000004408 titanium dioxide Substances 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- 239000002759 woven fabric Substances 0.000 description 3
- KWEKXPWNFQBJAY-UHFFFAOYSA-N (dimethyl-$l^{3}-silanyl)oxy-dimethylsilicon Chemical compound C[Si](C)O[Si](C)C KWEKXPWNFQBJAY-UHFFFAOYSA-N 0.000 description 2
- ATVJXMYDOSMEPO-UHFFFAOYSA-N 3-prop-2-enoxyprop-1-ene Chemical compound C=CCOCC=C ATVJXMYDOSMEPO-UHFFFAOYSA-N 0.000 description 2
- VVJKKWFAADXIJK-UHFFFAOYSA-N Allylamine Chemical compound NCC=C VVJKKWFAADXIJK-UHFFFAOYSA-N 0.000 description 2
- CGBFEZOPOFSTTA-UHFFFAOYSA-L Cl[Pt](C1C=CC=C1)(C1C=CC=C1)Cl Chemical compound Cl[Pt](C1C=CC=C1)(C1C=CC=C1)Cl CGBFEZOPOFSTTA-UHFFFAOYSA-L 0.000 description 2
- JNJVARQLPFPYNT-UHFFFAOYSA-H Cl[Pt](Cl)(Cl)(Cl)(Cl)Cl.N Chemical compound Cl[Pt](Cl)(Cl)(Cl)(Cl)Cl.N JNJVARQLPFPYNT-UHFFFAOYSA-H 0.000 description 2
- 229920000742 Cotton Polymers 0.000 description 2
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 238000005411 Van der Waals force Methods 0.000 description 2
- 238000000862 absorption spectrum Methods 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- YKIOKAURTKXMSB-UHFFFAOYSA-N adams's catalyst Chemical compound O=[Pt]=O YKIOKAURTKXMSB-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 2
- ZOJBYZNEUISWFT-UHFFFAOYSA-N allyl isothiocyanate Chemical compound C=CCN=C=S ZOJBYZNEUISWFT-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 230000000844 anti-bacterial effect Effects 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- WMWLMWRWZQELOS-UHFFFAOYSA-N bismuth(iii) oxide Chemical compound O=[Bi]O[Bi]=O WMWLMWRWZQELOS-UHFFFAOYSA-N 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- VPUGDVKSAQVFFS-UHFFFAOYSA-N coronene Chemical compound C1=C(C2=C34)C=CC3=CC=C(C=C3)C4=C4C3=CC=C(C=C3)C4=C2C3=C1 VPUGDVKSAQVFFS-UHFFFAOYSA-N 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 239000002781 deodorant agent Substances 0.000 description 2
- XUKFPAQLGOOCNJ-UHFFFAOYSA-N dimethyl(trimethylsilyloxy)silicon Chemical compound C[Si](C)O[Si](C)(C)C XUKFPAQLGOOCNJ-UHFFFAOYSA-N 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 150000002191 fatty alcohols Chemical class 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 229910052741 iridium Inorganic materials 0.000 description 2
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 2
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- DZVCFNFOPIZQKX-LTHRDKTGSA-M merocyanine Chemical compound [Na+].O=C1N(CCCC)C(=O)N(CCCC)C(=O)C1=C\C=C\C=C/1N(CCCS([O-])(=O)=O)C2=CC=CC=C2O\1 DZVCFNFOPIZQKX-LTHRDKTGSA-M 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- SWGZAKPJNWCPRY-UHFFFAOYSA-N methyl-bis(trimethylsilyloxy)silicon Chemical compound C[Si](C)(C)O[Si](C)O[Si](C)(C)C SWGZAKPJNWCPRY-UHFFFAOYSA-N 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229910052758 niobium Inorganic materials 0.000 description 2
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Chemical compound O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 239000002736 nonionic surfactant Substances 0.000 description 2
- 239000004745 nonwoven fabric Substances 0.000 description 2
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 2
- 238000006864 oxidative decomposition reaction Methods 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 2
- 125000002081 peroxide group Chemical group 0.000 description 2
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 2
- PKELYQZIUROQSI-UHFFFAOYSA-N phosphane;platinum Chemical compound P.[Pt] PKELYQZIUROQSI-UHFFFAOYSA-N 0.000 description 2
- 235000011007 phosphoric acid Nutrition 0.000 description 2
- 238000007146 photocatalysis Methods 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 150000003058 platinum compounds Chemical class 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 150000004032 porphyrins Chemical class 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000005871 repellent Substances 0.000 description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 2
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 125000004469 siloxy group Chemical group [SiH3]O* 0.000 description 2
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- LLZRNZOLAXHGLL-UHFFFAOYSA-J titanic acid Chemical compound O[Ti](O)(O)O LLZRNZOLAXHGLL-UHFFFAOYSA-J 0.000 description 2
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- 230000035897 transcription Effects 0.000 description 2
- AQRLNPVMDITEJU-UHFFFAOYSA-N triethylsilane Chemical compound CC[SiH](CC)CC AQRLNPVMDITEJU-UHFFFAOYSA-N 0.000 description 2
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 2
- 229910052720 vanadium Inorganic materials 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 description 1
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 1
- YOBOXHGSEJBUPB-MTOQALJVSA-N (z)-4-hydroxypent-3-en-2-one;zirconium Chemical compound [Zr].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O YOBOXHGSEJBUPB-MTOQALJVSA-N 0.000 description 1
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 1
- YJTKZCDBKVTVBY-UHFFFAOYSA-N 1,3-Diphenylbenzene Chemical group C1=CC=CC=C1C1=CC=CC(C=2C=CC=CC=2)=C1 YJTKZCDBKVTVBY-UHFFFAOYSA-N 0.000 description 1
- RWNUSVWFHDHRCJ-UHFFFAOYSA-N 1-butoxypropan-2-ol Chemical compound CCCCOCC(C)O RWNUSVWFHDHRCJ-UHFFFAOYSA-N 0.000 description 1
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- 229940054273 1-propoxy-2-propanol Drugs 0.000 description 1
- FENFUOGYJVOCRY-UHFFFAOYSA-N 1-propoxypropan-2-ol Chemical compound CCCOCC(C)O FENFUOGYJVOCRY-UHFFFAOYSA-N 0.000 description 1
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- FMVOPJLFZGSYOS-UHFFFAOYSA-N 2-[2-(2-ethoxypropoxy)propoxy]propan-1-ol Chemical compound CCOC(C)COC(C)COC(C)CO FMVOPJLFZGSYOS-UHFFFAOYSA-N 0.000 description 1
- LCZVSXRMYJUNFX-UHFFFAOYSA-N 2-[2-(2-hydroxypropoxy)propoxy]propan-1-ol Chemical compound CC(O)COC(C)COC(C)CO LCZVSXRMYJUNFX-UHFFFAOYSA-N 0.000 description 1
- IQUPABOKLQSFBK-UHFFFAOYSA-N 2-nitrophenol Chemical compound OC1=CC=CC=C1[N+]([O-])=O IQUPABOKLQSFBK-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- GCYHRYNSUGLLMA-UHFFFAOYSA-N 2-prop-2-enoxyethanol Chemical compound OCCOCC=C GCYHRYNSUGLLMA-UHFFFAOYSA-N 0.000 description 1
- NKAMGQZDVMQEJL-UHFFFAOYSA-N 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodec-1-ene Chemical group FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C=C NKAMGQZDVMQEJL-UHFFFAOYSA-N 0.000 description 1
- QCAHUFWKIQLBNB-UHFFFAOYSA-N 3-(3-methoxypropoxy)propan-1-ol Chemical compound COCCCOCCCO QCAHUFWKIQLBNB-UHFFFAOYSA-N 0.000 description 1
- WADSJYLPJPTMLN-UHFFFAOYSA-N 3-(cycloundecen-1-yl)-1,2-diazacycloundec-2-ene Chemical compound C1CCCCCCCCC=C1C1=NNCCCCCCCC1 WADSJYLPJPTMLN-UHFFFAOYSA-N 0.000 description 1
- XBIUWALDKXACEA-UHFFFAOYSA-N 3-[bis(2,4-dioxopentan-3-yl)alumanyl]pentane-2,4-dione Chemical compound CC(=O)C(C(C)=O)[Al](C(C(C)=O)C(C)=O)C(C(C)=O)C(C)=O XBIUWALDKXACEA-UHFFFAOYSA-N 0.000 description 1
- FASUFOTUSHAIHG-UHFFFAOYSA-N 3-methoxyprop-1-ene Chemical compound COCC=C FASUFOTUSHAIHG-UHFFFAOYSA-N 0.000 description 1
- 125000006201 3-phenylpropyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- WUMMIJWEUDHZCL-UHFFFAOYSA-N 3-prop-2-enyloxolane-2,5-dione Chemical compound C=CCC1CC(=O)OC1=O WUMMIJWEUDHZCL-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- RNDVGJZUHCKENF-UHFFFAOYSA-N 5-hexen-2-one Chemical compound CC(=O)CCC=C RNDVGJZUHCKENF-UHFFFAOYSA-N 0.000 description 1
- KHLRJDNGHBXOSV-UHFFFAOYSA-N 5-trimethoxysilylpentane-1,3-diamine Chemical compound CO[Si](OC)(OC)CCC(N)CCN KHLRJDNGHBXOSV-UHFFFAOYSA-N 0.000 description 1
- JAPCXGFREZPNHK-UHFFFAOYSA-N 9-phenyl-9h-xanthene Chemical group C12=CC=CC=C2OC2=CC=CC=C2C1C1=CC=CC=C1 JAPCXGFREZPNHK-UHFFFAOYSA-N 0.000 description 1
- 229910002915 BiVO4 Inorganic materials 0.000 description 1
- ROFVEXUMMXZLPA-UHFFFAOYSA-N Bipyridyl Chemical class N1=CC=CC=C1C1=CC=CC=N1 ROFVEXUMMXZLPA-UHFFFAOYSA-N 0.000 description 1
- GFTSBQGETHTIFT-UHFFFAOYSA-N CCCC[SiH](O[Si](C)(C)C)O[Si](C)(C)C Chemical compound CCCC[SiH](O[Si](C)(C)C)O[Si](C)(C)C GFTSBQGETHTIFT-UHFFFAOYSA-N 0.000 description 1
- GDLCKUMQIRKBLD-UHFFFAOYSA-N C[Si](C)(C)O[SiH](O[Si](C)(C)C)C1CCCCC1 Chemical compound C[Si](C)(C)O[SiH](O[Si](C)(C)C)C1CCCCC1 GDLCKUMQIRKBLD-UHFFFAOYSA-N 0.000 description 1
- 244000025254 Cannabis sativa Species 0.000 description 1
- 235000012766 Cannabis sativa ssp. sativa var. sativa Nutrition 0.000 description 1
- 235000012765 Cannabis sativa ssp. sativa var. spontanea Nutrition 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000004641 Diallyl-phthalate Substances 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- 241001050985 Disco Species 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 229910005540 GaP Inorganic materials 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 244000043261 Hevea brasiliensis Species 0.000 description 1
- 238000004566 IR spectroscopy Methods 0.000 description 1
- 229910003048 LaTaON2 Inorganic materials 0.000 description 1
- 239000004594 Masterbatch (MB) Substances 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- 229920001407 Modal (textile) Polymers 0.000 description 1
- OKIZCWYLBDKLSU-UHFFFAOYSA-M N,N,N-Trimethylmethanaminium chloride Chemical compound [Cl-].C[N+](C)(C)C OKIZCWYLBDKLSU-UHFFFAOYSA-M 0.000 description 1
- KDFGDPLUSXZGGS-UHFFFAOYSA-N N.N.N.N.N Chemical compound N.N.N.N.N KDFGDPLUSXZGGS-UHFFFAOYSA-N 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 239000002033 PVDF binder Substances 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 229930182556 Polyacetal Natural products 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- 101100422634 Postia placenta (strain ATCC 44394 / Madison 698-R) STS-02 gene Proteins 0.000 description 1
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical group CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 1
- 229920000297 Rayon Polymers 0.000 description 1
- 239000012327 Ruthenium complex Substances 0.000 description 1
- 241001074085 Scophthalmus aquosus Species 0.000 description 1
- 229910007271 Si2O3 Inorganic materials 0.000 description 1
- 229910020388 SiO1/2 Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 1
- 229910002370 SrTiO3 Inorganic materials 0.000 description 1
- 229920002472 Starch Polymers 0.000 description 1
- 239000002174 Styrene-butadiene Substances 0.000 description 1
- ULUAUXLGCMPNKK-UHFFFAOYSA-N Sulfobutanedioic acid Chemical class OC(=O)CC(C(O)=O)S(O)(=O)=O ULUAUXLGCMPNKK-UHFFFAOYSA-N 0.000 description 1
- 229910003071 TaON Inorganic materials 0.000 description 1
- 229910003074 TiCl4 Inorganic materials 0.000 description 1
- 229910010252 TiO3 Inorganic materials 0.000 description 1
- 229910003079 TiO5 Inorganic materials 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- QPFYNOGVFGQCTI-UHFFFAOYSA-N [F].CCOC(N)=O Chemical compound [F].CCOC(N)=O QPFYNOGVFGQCTI-UHFFFAOYSA-N 0.000 description 1
- JGVLSEHAGQIPID-UHFFFAOYSA-H [K].Cl[Pt](Cl)(Cl)(Cl)(Cl)Cl Chemical compound [K].Cl[Pt](Cl)(Cl)(Cl)(Cl)Cl JGVLSEHAGQIPID-UHFFFAOYSA-H 0.000 description 1
- ILBWBNOBGCYGSU-UHFFFAOYSA-N [[(dimethyl-$l^{3}-silanyl)oxy-dimethylsilyl]oxy-dimethylsilyl]oxy-dimethylsilicon Chemical compound C[Si](C)O[Si](C)(C)O[Si](C)(C)O[Si](C)C ILBWBNOBGCYGSU-UHFFFAOYSA-N 0.000 description 1
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 1
- PUKBMLHOISUHSO-UHFFFAOYSA-N [dimethyl(prop-2-enyl)silyl]oxy-dimethylsilicon Chemical compound C[Si](C)O[Si](C)(C)CC=C PUKBMLHOISUHSO-UHFFFAOYSA-N 0.000 description 1
- FOLNDEOXOGUWTR-UHFFFAOYSA-N [ethyl(trimethylsilyloxy)silyl]oxy-trimethylsilane Chemical compound C[Si](C)(C)O[SiH](CC)O[Si](C)(C)C FOLNDEOXOGUWTR-UHFFFAOYSA-N 0.000 description 1
- QRRISIFTWDHMBG-UHFFFAOYSA-N [hexyl(trimethylsilyloxy)silyl]oxy-trimethylsilane Chemical compound CCCCCC[SiH](O[Si](C)(C)C)O[Si](C)(C)C QRRISIFTWDHMBG-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 229920006221 acetate fiber Polymers 0.000 description 1
- 125000002339 acetoacetyl group Chemical group O=C([*])C([H])([H])C(=O)C([H])([H])[H] 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 125000002015 acyclic group Chemical group 0.000 description 1
- 125000004423 acyloxy group Chemical group 0.000 description 1
- 229910001854 alkali hydroxide Inorganic materials 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 125000005370 alkoxysilyl group Chemical group 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- HXBPYFMVGFDZFT-UHFFFAOYSA-N allyl isocyanate Chemical compound C=CCN=C=O HXBPYFMVGFDZFT-UHFFFAOYSA-N 0.000 description 1
- 235000016720 allyl isothiocyanate Nutrition 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- ZRGUXTGDSGGHLR-UHFFFAOYSA-K aluminum;triperchlorate Chemical compound [Al+3].[O-]Cl(=O)(=O)=O.[O-]Cl(=O)(=O)=O.[O-]Cl(=O)(=O)=O ZRGUXTGDSGGHLR-UHFFFAOYSA-K 0.000 description 1
- 125000002344 aminooxy group Chemical group [H]N([H])O[*] 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 229910000410 antimony oxide Inorganic materials 0.000 description 1
- 239000003125 aqueous solvent Substances 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- GOOXRYWLNNXLFL-UHFFFAOYSA-H azane oxygen(2-) ruthenium(3+) ruthenium(4+) hexachloride Chemical compound N.N.N.N.N.N.N.N.N.N.N.N.N.N.[O--].[O--].[Cl-].[Cl-].[Cl-].[Cl-].[Cl-].[Cl-].[Ru+3].[Ru+3].[Ru+4] GOOXRYWLNNXLFL-UHFFFAOYSA-H 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- 150000007514 bases Chemical class 0.000 description 1
- UWAXDPWQPGZNIO-UHFFFAOYSA-N benzylsilane Chemical compound [SiH3]CC1=CC=CC=C1 UWAXDPWQPGZNIO-UHFFFAOYSA-N 0.000 description 1
- CKCXTIHXWNZKNT-UHFFFAOYSA-N bis(diethylsilyloxy)-diethylsilane Chemical compound CC[SiH](CC)O[Si](CC)(CC)O[SiH](CC)CC CKCXTIHXWNZKNT-UHFFFAOYSA-N 0.000 description 1
- RKKFSKYHMHUHAV-UHFFFAOYSA-N bis(diphenylsilyloxy)-diphenylsilane Chemical compound C=1C=CC=CC=1[SiH](C=1C=CC=CC=1)O[Si](C=1C=CC=CC=1)(C=1C=CC=CC=1)O[SiH](C=1C=CC=CC=1)C1=CC=CC=C1 RKKFSKYHMHUHAV-UHFFFAOYSA-N 0.000 description 1
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 1
- YQPSTPIKAKGYPW-UHFFFAOYSA-N bis(triethylsilyloxy)silyloxy-triethylsilane Chemical compound CC[Si](CC)(CC)O[SiH](O[Si](CC)(CC)CC)O[Si](CC)(CC)CC YQPSTPIKAKGYPW-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- MTAZNLWOLGHBHU-UHFFFAOYSA-N butadiene-styrene rubber Chemical compound C=CC=C.C=CC1=CC=CC=C1 MTAZNLWOLGHBHU-UHFFFAOYSA-N 0.000 description 1
- YHWCPXVTRSHPNY-UHFFFAOYSA-N butan-1-olate;titanium(4+) Chemical compound [Ti+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] YHWCPXVTRSHPNY-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052980 cadmium sulfide Inorganic materials 0.000 description 1
- 239000001506 calcium phosphate Substances 0.000 description 1
- 229910000389 calcium phosphate Inorganic materials 0.000 description 1
- 235000011010 calcium phosphates Nutrition 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000011088 calibration curve Methods 0.000 description 1
- 235000009120 camo Nutrition 0.000 description 1
- 239000005018 casein Substances 0.000 description 1
- BECPQYXYKAMYBN-UHFFFAOYSA-N casein, tech. Chemical compound NCCCCC(C(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(CC(C)C)N=C(O)C(CCC(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(C(C)O)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(COP(O)(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(N)CC1=CC=CC=C1 BECPQYXYKAMYBN-UHFFFAOYSA-N 0.000 description 1
- 235000021240 caseins Nutrition 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000004359 castor oil Substances 0.000 description 1
- 235000019438 castor oil Nutrition 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 239000012461 cellulose resin Substances 0.000 description 1
- 239000004568 cement Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- 235000005607 chanvre indien Nutrition 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 1
- PAJFATIYVLZNFC-UHFFFAOYSA-N chloromethyl(dimethyl)silicon Chemical compound C[Si](C)CCl PAJFATIYVLZNFC-UHFFFAOYSA-N 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- FJDJVBXSSLDNJB-LNTINUHCSA-N cobalt;(z)-4-hydroxypent-3-en-2-one Chemical compound [Co].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O FJDJVBXSSLDNJB-LNTINUHCSA-N 0.000 description 1
- 239000004567 concrete Substances 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 238000010411 cooking Methods 0.000 description 1
- 150000004696 coordination complex Chemical class 0.000 description 1
- BERDEBHAJNAUOM-UHFFFAOYSA-N copper(I) oxide Inorganic materials [Cu]O[Cu] BERDEBHAJNAUOM-UHFFFAOYSA-N 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- KRFJLUBVMFXRPN-UHFFFAOYSA-N cuprous oxide Chemical compound [O-2].[Cu+].[Cu+] KRFJLUBVMFXRPN-UHFFFAOYSA-N 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- JFDSHJDHYXKJFG-UHFFFAOYSA-N cyclohexyl(dimethyl)silicon Chemical compound C[Si](C)C1CCCCC1 JFDSHJDHYXKJFG-UHFFFAOYSA-N 0.000 description 1
- TZKUEMHGRFBQIX-UHFFFAOYSA-N cyclohexylmethylsilane Chemical compound [SiH3]CC1CCCCC1 TZKUEMHGRFBQIX-UHFFFAOYSA-N 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 238000010908 decantation Methods 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 230000036425 denaturation Effects 0.000 description 1
- 238000004925 denaturation Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- AYOHIQLKSOJJQH-UHFFFAOYSA-N dibutyltin Chemical compound CCCC[Sn]CCCC AYOHIQLKSOJJQH-UHFFFAOYSA-N 0.000 description 1
- 239000012975 dibutyltin dilaurate Substances 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- JQZUMFHYRULBEN-UHFFFAOYSA-N diethyl(methyl)silicon Chemical compound CC[Si](C)CC JQZUMFHYRULBEN-UHFFFAOYSA-N 0.000 description 1
- UCXUKTLCVSGCNR-UHFFFAOYSA-N diethylsilane Chemical compound CC[SiH2]CC UCXUKTLCVSGCNR-UHFFFAOYSA-N 0.000 description 1
- FWWXAYLKTUFFET-UHFFFAOYSA-N diethylsilyloxy-[diethylsilyloxy(diethyl)silyl]oxy-diethylsilane Chemical compound CC[SiH](CC)O[Si](CC)(CC)O[Si](CC)(CC)O[SiH](CC)CC FWWXAYLKTUFFET-UHFFFAOYSA-N 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 1
- UKLILSBJGWHJEB-UHFFFAOYSA-N dimethyl(oct-7-enyl)silane Chemical compound C[SiH](C)CCCCCCC=C UKLILSBJGWHJEB-UHFFFAOYSA-N 0.000 description 1
- LFGMBVOAGOMKBY-UHFFFAOYSA-N dimethyl(octadecyl)silicon Chemical compound CCCCCCCCCCCCCCCCCC[Si](C)C LFGMBVOAGOMKBY-UHFFFAOYSA-N 0.000 description 1
- OIKHZBFJHONJJB-UHFFFAOYSA-N dimethyl(phenyl)silicon Chemical compound C[Si](C)C1=CC=CC=C1 OIKHZBFJHONJJB-UHFFFAOYSA-N 0.000 description 1
- ZBMGMUODZNQAQI-UHFFFAOYSA-N dimethyl(prop-2-enyl)silicon Chemical compound C[Si](C)CC=C ZBMGMUODZNQAQI-UHFFFAOYSA-N 0.000 description 1
- UBHZUDXTHNMNLD-UHFFFAOYSA-N dimethylsilane Chemical compound C[SiH2]C UBHZUDXTHNMNLD-UHFFFAOYSA-N 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- VDCSGNNYCFPWFK-UHFFFAOYSA-N diphenylsilane Chemical compound C=1C=CC=CC=1[SiH2]C1=CC=CC=C1 VDCSGNNYCFPWFK-UHFFFAOYSA-N 0.000 description 1
- SCTQCPWFWDWNTC-UHFFFAOYSA-N diphenylsilyloxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[SiH](C=1C=CC=CC=1)O[SiH](C=1C=CC=CC=1)C1=CC=CC=C1 SCTQCPWFWDWNTC-UHFFFAOYSA-N 0.000 description 1
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 239000004815 dispersion polymer Substances 0.000 description 1
- WEIWBVGUSBRKNW-UHFFFAOYSA-N ditert-butyl(methyl)silicon Chemical compound CC(C)(C)[Si](C)C(C)(C)C WEIWBVGUSBRKNW-UHFFFAOYSA-N 0.000 description 1
- JTGAUXSVQKWNHO-UHFFFAOYSA-N ditert-butylsilicon Chemical compound CC(C)(C)[Si]C(C)(C)C JTGAUXSVQKWNHO-UHFFFAOYSA-N 0.000 description 1
- GVGUFUZHNYFZLC-UHFFFAOYSA-N dodecyl benzenesulfonate;sodium Chemical compound [Na].CCCCCCCCCCCCOS(=O)(=O)C1=CC=CC=C1 GVGUFUZHNYFZLC-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 210000004177 elastic tissue Anatomy 0.000 description 1
- 238000002848 electrochemical method Methods 0.000 description 1
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 150000002169 ethanolamines Chemical class 0.000 description 1
- IYNRVIKPUTZSOR-HWKANZROSA-N ethenyl (e)-but-2-enoate Chemical compound C\C=C\C(=O)OC=C IYNRVIKPUTZSOR-HWKANZROSA-N 0.000 description 1
- ZANNOFHADGWOLI-UHFFFAOYSA-N ethyl 2-hydroxyacetate Chemical compound CCOC(=O)CO ZANNOFHADGWOLI-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- KJISMKWTHPWHFV-UHFFFAOYSA-N ethyl(dimethyl)silicon Chemical compound CC[Si](C)C KJISMKWTHPWHFV-UHFFFAOYSA-N 0.000 description 1
- 230000005281 excited state Effects 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000005562 fading Methods 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- ZEMPKEQAKRGZGQ-XOQCFJPHSA-N glycerol triricinoleate Natural products CCCCCC[C@@H](O)CC=CCCCCCCCC(=O)OC[C@@H](COC(=O)CCCCCCCC=CC[C@@H](O)CCCCCC)OC(=O)CCCCCCCC=CC[C@H](O)CCCCCC ZEMPKEQAKRGZGQ-XOQCFJPHSA-N 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 238000007646 gravure printing Methods 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 239000011487 hemp Substances 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000008131 herbal destillate Substances 0.000 description 1
- 150000004687 hexahydrates Chemical class 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 238000010335 hydrothermal treatment Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical compound ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 239000012784 inorganic fiber Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- LZKLAOYSENRNKR-LNTINUHCSA-N iron;(z)-4-oxoniumylidenepent-2-en-2-olate Chemical compound [Fe].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O LZKLAOYSENRNKR-LNTINUHCSA-N 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 150000002540 isothiocyanates Chemical class 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000003446 ligand Substances 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000002074 melt spinning Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910000000 metal hydroxide Inorganic materials 0.000 description 1
- 150000004692 metal hydroxides Chemical class 0.000 description 1
- 239000000113 methacrylic resin Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- OKHRRIGNGQFVEE-UHFFFAOYSA-N methyl(diphenyl)silicon Chemical compound C=1C=CC=CC=1[Si](C)C1=CC=CC=C1 OKHRRIGNGQFVEE-UHFFFAOYSA-N 0.000 description 1
- XFEZTGKWMAMMFL-UHFFFAOYSA-N methyl(octadecyl)silane Chemical compound CCCCCCCCCCCCCCCCCC[SiH2]C XFEZTGKWMAMMFL-UHFFFAOYSA-N 0.000 description 1
- RMZSTOAGUSEJFY-UHFFFAOYSA-N methyl-[methyl(phenyl)silyl]oxy-phenylsilane Chemical compound C=1C=CC=CC=1[SiH](C)O[SiH](C)C1=CC=CC=C1 RMZSTOAGUSEJFY-UHFFFAOYSA-N 0.000 description 1
- BBNGGBWASUKYAG-UHFFFAOYSA-N methyl-[methyl-[methyl(phenyl)silyl]oxy-phenylsilyl]oxy-[methyl(phenyl)silyl]oxy-phenylsilane Chemical compound C[SiH](O[Si](C)(O[Si](C)(O[SiH](C)c1ccccc1)c1ccccc1)c1ccccc1)c1ccccc1 BBNGGBWASUKYAG-UHFFFAOYSA-N 0.000 description 1
- UIUXUFNYAYAMOE-UHFFFAOYSA-N methylsilane Chemical compound [SiH3]C UIUXUFNYAYAMOE-UHFFFAOYSA-N 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 229910003465 moissanite Inorganic materials 0.000 description 1
- 238000004219 molecular orbital method Methods 0.000 description 1
- 229910052961 molybdenite Inorganic materials 0.000 description 1
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
- 229910052982 molybdenum disulfide Inorganic materials 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 229920003052 natural elastomer Polymers 0.000 description 1
- 229920005615 natural polymer Polymers 0.000 description 1
- 229920001194 natural rubber Polymers 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N nickel(II) oxide Inorganic materials [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 150000001282 organosilanes Chemical group 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000033116 oxidation-reduction process Effects 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 125000003544 oxime group Chemical group 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 1
- HBEQXAKJSGXAIQ-UHFFFAOYSA-N oxopalladium Chemical compound [Pd]=O HBEQXAKJSGXAIQ-UHFFFAOYSA-N 0.000 description 1
- DCKVFVYPWDKYDN-UHFFFAOYSA-L oxygen(2-);titanium(4+);sulfate Chemical compound [O-2].[Ti+4].[O-]S([O-])(=O)=O DCKVFVYPWDKYDN-UHFFFAOYSA-L 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 150000002941 palladium compounds Chemical class 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 125000002467 phosphate group Chemical group [H]OP(=O)(O[H])O[*] 0.000 description 1
- 150000003016 phosphoric acids Chemical class 0.000 description 1
- 238000007540 photo-reduction reaction Methods 0.000 description 1
- 238000013033 photocatalytic degradation reaction Methods 0.000 description 1
- 230000001443 photoexcitation Effects 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 239000001007 phthalocyanine dye Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- HRGDZIGMBDGFTC-UHFFFAOYSA-N platinum(2+) Chemical compound [Pt+2] HRGDZIGMBDGFTC-UHFFFAOYSA-N 0.000 description 1
- NFOHLBHARAZXFQ-UHFFFAOYSA-L platinum(2+);dihydroxide Chemical compound O[Pt]O NFOHLBHARAZXFQ-UHFFFAOYSA-L 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 229920001495 poly(sodium acrylate) polymer Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920001470 polyketone Polymers 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920006380 polyphenylene oxide Polymers 0.000 description 1
- 229920012287 polyphenylene sulfone Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 229920006306 polyurethane fiber Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000003755 preservative agent Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- HJBYJZCUFFYSGA-UHFFFAOYSA-N prop-2-enoyl fluoride Chemical compound FC(=O)C=C HJBYJZCUFFYSGA-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 235000018102 proteins Nutrition 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 102000004169 proteins and genes Human genes 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 229910001404 rare earth metal oxide Inorganic materials 0.000 description 1
- 239000002964 rayon Substances 0.000 description 1
- 238000006722 reduction reaction Methods 0.000 description 1
- 239000012779 reinforcing material Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000000518 rheometry Methods 0.000 description 1
- 238000005464 sample preparation method Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 229920005573 silicon-containing polymer Polymers 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 229940080264 sodium dodecylbenzenesulfonate Drugs 0.000 description 1
- NNMHYFLPFNGQFZ-UHFFFAOYSA-M sodium polyacrylate Chemical compound [Na+].[O-]C(=O)C=C NNMHYFLPFNGQFZ-UHFFFAOYSA-M 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000008107 starch Substances 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000011115 styrene butadiene Substances 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 235000011044 succinic acid Nutrition 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- 239000012209 synthetic fiber Substances 0.000 description 1
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 1
- ILMRJRBKQSSXGY-UHFFFAOYSA-N tert-butyl(dimethyl)silicon Chemical compound C[Si](C)C(C)(C)C ILMRJRBKQSSXGY-UHFFFAOYSA-N 0.000 description 1
- UTADZBVVSYSYTG-UHFFFAOYSA-N tert-butyl(methyl)silane Chemical compound C[SiH2]C(C)(C)C UTADZBVVSYSYTG-UHFFFAOYSA-N 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 150000003606 tin compounds Chemical class 0.000 description 1
- 150000003608 titanium Chemical class 0.000 description 1
- 150000003609 titanium compounds Chemical class 0.000 description 1
- 229910000348 titanium sulfate Inorganic materials 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 239000002341 toxic gas Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- QORWJWZARLRLPR-UHFFFAOYSA-H tricalcium bis(phosphate) Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O QORWJWZARLRLPR-UHFFFAOYSA-H 0.000 description 1
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 1
- DHMBAQQIVDNJQY-UHFFFAOYSA-N triethyl-[ethyl(triethylsilyloxy)silyl]oxysilane Chemical compound CC[Si](CC)(CC)O[SiH](CC)O[Si](CC)(CC)CC DHMBAQQIVDNJQY-UHFFFAOYSA-N 0.000 description 1
- 125000000725 trifluoropropyl group Chemical group [H]C([H])(*)C([H])([H])C(F)(F)F 0.000 description 1
- ISPSHPOFLYFIRR-UHFFFAOYSA-N trihexylsilicon Chemical compound CCCCCC[Si](CCCCCC)CCCCCC ISPSHPOFLYFIRR-UHFFFAOYSA-N 0.000 description 1
- IXSPLXSQNNZJJU-UHFFFAOYSA-N trimethyl(silyloxy)silane Chemical compound C[Si](C)(C)O[SiH3] IXSPLXSQNNZJJU-UHFFFAOYSA-N 0.000 description 1
- MVDKZIOZIWKNCP-UHFFFAOYSA-N trimethyl-[phenyl(trimethylsilyloxy)silyl]oxysilane Chemical compound C[Si](C)(C)O[SiH](O[Si](C)(C)C)C1=CC=CC=C1 MVDKZIOZIWKNCP-UHFFFAOYSA-N 0.000 description 1
- YBSONWFCMKTZDG-UHFFFAOYSA-N trimethyl-[propan-2-yl(trimethylsilyloxy)silyl]oxysilane Chemical compound CC(C)[SiH](O[Si](C)(C)C)O[Si](C)(C)C YBSONWFCMKTZDG-UHFFFAOYSA-N 0.000 description 1
- PMFSLPPNQCIHBT-UHFFFAOYSA-N trimethyl-[propyl(trimethylsilyloxy)silyl]oxysilane Chemical compound CCC[SiH](O[Si](C)(C)C)O[Si](C)(C)C PMFSLPPNQCIHBT-UHFFFAOYSA-N 0.000 description 1
- PQDJYEQOELDLCP-UHFFFAOYSA-N trimethylsilane Chemical compound C[SiH](C)C PQDJYEQOELDLCP-UHFFFAOYSA-N 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- MMYRBBZVCDXGHG-UHFFFAOYSA-N tripropylsilicon Chemical compound CCC[Si](CCC)CCC MMYRBBZVCDXGHG-UHFFFAOYSA-N 0.000 description 1
- XAASNKQYFKTYTR-UHFFFAOYSA-N tris(trimethylsilyloxy)silicon Chemical compound C[Si](C)(C)O[Si](O[Si](C)(C)C)O[Si](C)(C)C XAASNKQYFKTYTR-UHFFFAOYSA-N 0.000 description 1
- ZQTYRTSKQFQYPQ-UHFFFAOYSA-N trisiloxane Chemical compound [SiH3]O[SiH2]O[SiH3] ZQTYRTSKQFQYPQ-UHFFFAOYSA-N 0.000 description 1
- ZNOKGRXACCSDPY-UHFFFAOYSA-N tungsten(VI) oxide Inorganic materials O=[W](=O)=O ZNOKGRXACCSDPY-UHFFFAOYSA-N 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 235000021269 warm food Nutrition 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
- 230000002087 whitening effect Effects 0.000 description 1
- 210000002268 wool Anatomy 0.000 description 1
- 239000001018 xanthene dye Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
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Abstract
Description
【0001】
【発明の属する技術分野】
本発明は、光エネルギーによって物質の分解作用や表面の親水化作用を示すことから、環境浄化や防汚、防曇等の分野へ応用が知られている酸化チタンに代表される光触媒の部材表面への固定化技術に関する。
【0002】
【従来の技術】
ある種の物質に、その物質の伝導帯と価電子帯との間のエネルギーギャップ(バンドギャップ)よりも大きなエネルギーを持つ光、即ちその物質のバンドギャップに対応する光よりも波長の短い光(励起光)を照射すると、光エネルギーによって価電子帯中の電子の励起(光励起)が起こり、伝導帯に電子が、価電子帯に正孔が生成する。このとき、伝導帯に生成した電子の還元力および/または価電子帯に生成した正孔の酸化力を利用して、種々の化学反応を行うことができる。
【0003】
即ち、上記のような物質は、励起光照射下において触媒のように用いることができる。そのため、上記のような物質は光触媒と呼ばれており、その最も代表的な例として酸化チタンが知られている。
この光触媒によって促進される化学反応の例としては、種々の有機物の酸化分解反応を挙げることができる。従って、この光触媒を種々の基材の表面に固定化させれば、基材の表面に付着した種々の有機物を、光エネルギーを利用して酸化分解することができることになる。
【0004】
一方、ある種の光触媒に光を照射すると、その光触媒の表面の親水性が高まることが知られている。従って、この光触媒を種々の基材の表面に固定化させれば、光の照射によりその基材の表面の親水性を高めることができるようになる。
近年、上記のような光触媒の特性を、環境浄化、種々の基材の表面への汚れの付着防止や曇りの防止を始めとする、種々の分野に応用するための研究が盛んになってきている。この場合、光触媒を種々の基材の表面に固定化するための方法が非常に重要な役割を担う。
【0005】
光触媒を固定化する方法については、これまでに種々の提案がなされている。
例えば、特開昭60−044053号公報では、光触媒をスパッタリング法により基材の表面に薄膜状にして固定化する方法が開示されている。
それらの方法のうち特に有用な方法の1つとして、光触媒を含む組成物によって基材の表面をコーティングし、光触媒を含む皮膜を形成させることにより、光触媒を基材の表面に固定する方法が注目されている。
【0006】
この方法によって光触媒の固定化を行う場合、
(1)光触媒の活性を損なうことなく、光触媒を基材の表面に強固に固定化できること、および
(2)形成される皮膜およびその皮膜によって被覆された基材が、光触媒の作用で劣化しない耐久性を有することが要求される。
さらに、固定化する基材の適応範囲を広げるための好ましい条件として、
(3)穏和な固定化条件(室温〜150℃程度)で、硬度や耐薬品性等に優れた皮膜を形成することが要求される。
【0007】
コーティングによって光触媒を固定化する方法については、これまでに種々の提案がなされている。
例えば、特開昭60−118236号公報では、光触媒の前駆体、例えば有機チタネートを含有するゾルを基材の表面に塗布した後、焼成によって光触媒の前駆体をゲル化させ、光触媒に変換すると共に、生成した光触媒を基材の表面に固定化する方法が提案されている。しかしこの方法は、光触媒の微粒子状結晶を基材の表面で生成させる工程を含んでおり、この工程には高温での焼成が必要である。そのため、基材の表面積が広い場合には光触媒の固定化が困難になるという欠点がある。
【0008】
特開平6−278241号公報では、光触媒含有ゾルを使用する(従って光触媒の微粒子状結晶の生成過程を必要としない)方法として、水中に解膠させた酸化チタンゾルを用いて基材の表面をコーティングする方法が提案されている。しかし、酸化チタンゾルは穏和な条件下では成膜性がないため、この方法においても高温度での焼成が必要である。その上、生成する被膜は脆く容易に破壊され、光触媒が基材の表面から脱落してしまうため、光触媒が基材の表面で効果を示すようにすることができなくなるという欠点があった。
【0009】
また、特開平9−221324号公報、特開平9−262481号公報、特開平10−53437号公報および特開2000−280397号公報では、光触媒の作用によって分解されにくい過酸化チタンと酸化チタンを混合し、基材の表面をコーティングする方法が提案されている。しかしこれらの方法では、光触媒を固定化する基材として、プラスチック成形体、フィルム、有機塗膜等の有機基材を用いた場合、該有機基材は光触媒作用により酸化分解し、有機基材と光触媒含有皮膜との間の界面劣化を生じ、長期にわたる耐久性を維持できないという欠点を有している。また、上述した光触媒による劣化を防止する目的で、さらに光触媒含有皮膜と有機基材との間に過酸化チタンを有機基材保護層として介在させる方法も提案されているが、この方法では塗装工程が煩雑で作業性が悪く、生産ロス増加やコスト高になってしまう上、均質な皮膜を得るのが非常に困難であり、有機基材の劣化を完全に防止するのが難しいという欠点がある。
【0010】
上述した従来技術の種々の欠点を克服するための方法として、我々は、表面エネルギーの低いシリコーン化合物で光触媒粒子の表面を変性した変性光触媒と、それより表面エネルギーの高いバインダーからなる光触媒組成物を提案した(WO00−30747号パンフレット)。該光触媒組成物は、光触媒粒子の濃度が有機基材と接する界面近傍では小さく、皮膜表面近傍では大きく分布するような表面方向に異方分布した皮膜を形成するため、光触媒作用による有機基材との界面劣化が無く、光触媒活性が大きい光触媒皮膜を形成する。しかし、この方法においても、表面エネルギーの高いバインダーとして光触媒分解が比較的おこりにくいシリコーンアクリル樹脂を用いた場合においてさえ、長期間の光触媒作用によるバインダー自体の劣化は完全には防止できず、長期の耐久性に優れた光触媒固定化部材を得ることが困難であるという技術課題を有している。
【0011】
また、特開2001−64583号公報では、光触媒粒子とシリコーンアクリル樹脂と水系溶媒を必須成分とする傾斜塗膜を形成する光触媒含有塗料組成物を提案している。この場合、傾斜塗膜は、シリコーンアクリル樹脂中の疎水性部位であるアクリル樹脂成分が、親水性(表面エネルギーの高い)光触媒粒子と基材との間に割り込む様に配向することによって得られるため、光触媒に分解されやすいアクリル樹脂が必須となり、結果として皮膜自体の耐久性は非常に悪いものとなる。
【0012】
上述した傾斜塗膜を提供する従来技術の欠点を克服するための方法として、さらに我々は、表面エネルギーの低いシリコーン化合物で光触媒粒子の表面を変性した変性光触媒と、表面エネルギーの高い無機バインダーであるフェニルシリコーンからなる光触媒組成物を提案した(特開2002−273233号公報)。しかし、該光触媒組成物からは、期待通り耐久性の良い光触媒含有被膜を形成することが可能であるが、穏和な固定化条件(室温〜150℃程度)で硬度や耐薬品性等に優れた皮膜を形成することが容易ではなかった。
すなわち、コーティングによって光触媒を基材の表面に固定化する方法において、煩雑な工程を必要とせずに上記(1)、(2)のみでなく、(3)の条件までを全て満足するものは未だ知られていない。
【0013】
【特許文献1】
特開昭60−044053号公報
【特許文献2】
特開昭60−118236号公報
【特許文献3】
特開平6−278241号公報
【特許文献4】
特開平9−221324号公報
【特許文献5】
特開平9−262481号公報
【特許文献6】
特開平10−53437号公報
【特許文献7】
特開2000−280397号公報
【特許文献8】
WO00−30747号パンフレット
【特許文献9】
特開2001−64583号公報
【特許文献10】
特開2002−273233号公報
【0014】
【発明が解決しようとする課題】
本発明の課題は、煩雑な工程を必要とせずに上記(1)、(2)、及び(3)の条件を全て満足する光触媒の固定化技術提供することである。具体的には、有機基材と光触媒皮膜との間の界面劣化や光触媒皮膜中のバインダーの劣化を生じることが無く、硬度等と柔軟性(耐屈曲性、耐衝撃性)のバランスに優れ、光照射により長期にわたり、その表面が水の濡れ性(親水性、疎水性)の制御能及び/又は光触媒活性を発現する耐久性に優れた機能性複合体を煩雑な工程を必要とせずに得ることができる光触媒組成物を提供することである。
【0015】
【課題を解決するための手段】
本発明者らは上記課題を解決すべく鋭意検討した結果、本発明に到達した。
すなわち、本発明は以下の通りである。
1.変性光触媒粒子(A)と過酸化チタン(B)を含有する光触媒組成物であって、該変性光触媒粒子(A)は、光触媒粒子(a)を、式(1)で表されるトリオルガノシラン単位、式(2)で表されるモノオキシジオルガノシラン単位、式(3)で表されるジオキシオルガノシラン単位、及びフッ化メチレン(―CF2−)単位よりなる群から選ばれる少なくとも1種の構造単位を有する化合物類よりなる群から選ばれる少なくとも1種の変性剤化合物(b)を用いて変性処理することによって得られることを特徴とする光触媒組成物。
R3Si− (1)
(式中、Rは各々独立に直鎖状または分岐状の炭素数1〜30個のアルキル基、炭素数5〜20のシクロアルキル基、直鎖状または分岐状の炭素数1〜30個のフルオロアルキル基、直鎖状または分岐状の炭素数2〜30個のアルケニル基、フェニル基、炭素数1〜20のアルコキシ基、又は水酸基を表す。)
−(R2SiO)− (2)
(式中、Rは式(1)で定義した通りである。)
【0016】
【化2】
【0017】
(式中、Rは式(1)で定義した通りである。)
2.該変性光触媒(A)の数平均粒子径が400nm以下であることを特徴とする発明1に記載の光触媒組成物。
【0018】
3.該変性剤化合物(b)が、式(4)で表されるSi−H基含有ケイ素化合物(b1)であることを特徴とする発明1または2に記載の光触媒組成物。
HxRyQzSiO(4−x−y−z)/2 (4)
(式中、Rは各々独立に直鎖状または分岐状の炭素数1〜30個のアルキル基、炭素数5〜20のシクロアルキル基、直鎖状または分岐状の炭素数1〜30個のフルオロアルキル基、直鎖状または分岐状の炭素数2〜30個のアルケニル基、フェニル基、炭素数1〜20のアルコキシ基、又は水酸基を表す。
また、式中Qは、下記(あ)〜(う)からなる群より選ばれる少なくとも1つの機能性付与基を含有する基である。
(あ)カルボキシル基あるいはその塩、リン酸基あるいはその塩、スルホン酸基あるいはその塩、アミノ基あるいはその塩、ポリオキシアルキレン基からなる群から選ばれた少なくとも1つの親水性基。
(い)エポキシ基、アクリロイル基、メタアクリロイル基、(環状)酸無水物基、ケト基、カルボキシル基、ヒドラジン残基、イソシアネート基、イソチオシアネート基、水酸基、アミノ基、環状カーボネート基、チオール基、エステル基からなる群から選ばれた少なくとも1つの反応性基。
(う)少なくとも1つの分光増感基。
また、0<x<4、0<y<4、0≦z<4、及び(x+y+z)≦4である。)
【0019】
4.発明1〜3のいずれかに記載の光触媒組成物から形成されてなる光触媒体。
5.該変性光触媒(A)のバンドギャップエネルギーよりも高いエネルギーの光を照射することにより光触媒活性及び/又は親水性を示すことを特徴とする発明4に記載の光触媒体。
6.該変性光触媒(A)のバンドギャップエネルギーよりも高いエネルギーの光を照射することにより、該変性光触媒(A)を構成する光触媒粒子(a)の近傍に存在する珪素原子に結合した有機基の少なくとも一部が水酸基及び/又はシロキサン結合に置換されてなることを特徴とする発明4または5に記載の光触媒体。
7.皮膜であることを特徴とする発明4〜6のいずれかに記載の光触媒体。
8.発明4〜7のいずれかに記載の光触媒体が基材上に形成されてなる機能性複合体。
9.該光触媒体が変性光触媒(A)の分布について異方性を有し、該変性光触媒(A)の濃度が、該光触媒体の基材に接する面より他方の露出面の方が高いことを特徴とする発明8に記載の機能性複合体。
【0020】
【発明の実施の形態】
以下、本発明を詳細に説明する。
本発明の光触媒組成物は、変性光触媒粒子(A)と過酸化チタン(B)を含有することを特徴とする。本発明の光触媒組成物からは硬度、耐薬品性、耐候性等に優れた、長期にわたり光触媒活性及び/又は親水性を発現することが可能な光触媒体を形成することができる。
【0021】
本発明において光触媒活性とは、光照射によって酸化、還元反応を起こすことを言う。これらの光触媒活性は、例えば材料表面の光照射時における色素等の有機物の分解性を測定することにより判定することができる。光触媒活性を有する表面は、優れた汚染有機物質の分解活性や耐汚染性を発現する。
また、本発明において親水性とは、好ましくは20℃での水の接触角が60゜以下である場合を言うが、特に水の接触角が20゜以下の親水性を有する表面は、降雨等の水による自己浄化能(セルフクリーニング)による耐汚染性を発現するので好ましい。さらに優れた耐汚染性発現や防曇性発現の点からは表面の水の接触角は10゜以下であることが好ましく、更に好ましくは5゜以下である。
【0022】
本発明の変性光触媒(A)は、光触媒粒子(a)を、後述する少なくとも1種の変性剤化合物(b)を用いて変性処理することによって得られる。
本発明において変性とは、後述する少なくとも1種の変性剤化合物(b)を、光触媒粒子(a)の表面に固定化することを意味する。上記の変性剤化合物の光触媒粒子の表面への固定化は、ファン・デル・ワールス力(物理吸着)または化学結合によるものと考えられる。特に、化学結合を利用した変性は、変性剤化合物と光触媒との相互作用が強く、変性剤化合物が光触媒粒子の表面に強固に固定化されるので好ましい。
【0023】
本発明において使用可能な光触媒粒子(a)の例としては、例えばTiO2、ZnO、SrTiO3、CdS、GaP、InP、GaAs、BaTiO3、BaTiO4、BaTi4O9、K2NbO3、Nb2O5、Fe2O3、Ta2O5、K3Ta3Si2O3、WO3、SnO2、Bi2O3、BiVO4、NiO、Cu2O、SiC、MoS2、InPb、RuO2、CeO2、Ta3N5等、さらにはTi、Nb、Ta、Vから選ばれた少なくとも1種の元素を有する層状酸化物(例えば特開昭62−74452号公報、特開平2−172535号公報、特開平7−24329号公報、特開平8−89799号公報、特開平8−89800号公報、特開平8−89804号公報、特開平8−198061号公報、特開平9−248465号公報、特開平10−99694号公報、特開平10−244165号公報等参照)や、窒素ドープ酸化チタン(例えば特開平13−278625号公報、特開平13−278627号公報、特開平13−335321号公報、特開平14−029750号公報、特開平13−207082号公報等参照)や、酸素欠陥型の酸化チタン(例えば特開平13−212457号公報参照)の如き、可視光応答型酸化チタン光触媒も好適に使用することができる。また、TaON、LaTiO2N、CaNbO2N、LaTaON2、CaTaO2N等のオキシナイトライド化合物やSm2Ti2S2O7等のオキシサルファイド化合物は可視光による光触媒活性が大きく、好適に使用することができる。
【0024】
更に、これらの光触媒粒子に、Pt、Rh、Ru、Nb、Cu、Sn、Ni、Feなどの金属及び/又はこれらの酸化物を添加あるいは固定化したものや、多孔質リン酸カルシウム等で被覆された光触媒(例えば特開平10−244166号公報参照)等を使用することもできる。
上記光触媒粒子(a)の結晶粒子径(1次粒子径)は1〜400nmであることが好ましく、より好ましくは1〜50nmの光触媒が好適に選択される。
これらの光触媒粒子(a)のうち、酸化チタンは無毒であり、化学的安定性にも優れると共に、光照射により、酸化チタン自体の親水性が非常に高まるため好ましい。
該酸化チタンとしては、アナターゼ型、ルチル型、ブルッカイト型のうち、いずれの結晶形を使用してもよい。また、可視光応答性である上記窒素ドープ酸化チタンや酸素欠陥型の酸化チタンも、該酸化チタンとして好適に使用できる。
【0025】
本発明においては、用いる光触媒の性状が、変性光触媒(A)の分散安定性、成膜性、及び種々の機能の発現にとって重要な因子となる。本発明に使用される光触媒粒子(a)としては、1次粒子と2次粒子との混合物(1次粒子、2次粒子何れかのみでも良い)の数平均分散粒子径が400nm以下の光触媒粒子が変性後の光触媒の表面特性を有効に利用できるために望ましい。特に数平均分散粒子径が100nm以下の光触媒粒子を使用した場合、生成する変性光触媒(A)と後述するバインダー成分(B)からなる光触媒組成物からは透明性に優れた皮膜を得ることができるため非常に好ましい。より好ましくは80nm以下3nm以上、さらに好ましくは50nm以下3nm以上の光触媒粒子が好適に選択される。
【0026】
これらの光触媒粒子(a)としては、以下の理由から、光触媒粉体ではなく光触媒ゾルを使用することが好ましい。一般に微細な粒子からなる粉体は、単結晶粒子(一次粒子)が強力に凝集した二次粒子を形成するため、無駄にする表面特性が多いが、一次粒子にまで分散させるのは非常に困難である。これに対して、光触媒ゾルの場合、光触媒粒子は溶解せずに一次粒子に近い形で存在しているため表面特性を有効に利用でき、それから生成する変性光触媒は分散安定性、成膜性等に優れるばかりか、種々の機能を有効に発現するので好ましく使用することができる。ここで、本発明に用いる光触媒ゾルとは、光触媒粒子が水及び/又は有機溶媒中に0.01〜70質量%、好ましくは0.1〜50質量%で一次粒子及び/または二次粒子として分散されたものである。
【0027】
ここで、上記光触媒ゾルに使用される上記有機溶媒としては、例えばエチレングリコール、ブチルセロソルブ、n−プロパノール、イソプロパノール、n−ブタノール、エタノール、メタノール等のアルコール類、トルエンやキシレン等の芳香族炭化水素類、ヘキサン、シクロヘキサン、ヘプタン等の脂肪族炭化水素類、酢酸エチル、酢酸n−ブチル等のエステル類、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン類、テトラヒドロフラン、ジオキサン等のエーテル類、ジメチルアセトアミド、ジメチルホルムアミド等のアミド類、クロロホルム、塩化メチレン、四塩化炭素等のハロゲン化合物類、ジメチルスルホキシド、ニトロベンゼン等、さらにはこれらの2種以上の混合物が挙げられる。
【0028】
該光触媒ゾルとして酸化チタンのゾルを例にとると、例えば実質的に水を分散媒とし、その中に酸化チタン粒子が解膠された酸化チタンヒドロゾル等を挙げることができる。(ここで、実質的に水を分散媒とするとは、分散媒中に水が80質量%程度以上含有されていることを意味する。)かかるゾルの調整は公知であり、容易に製造できる(例えば特開昭63−17221号公報、特開平7−819号公報、特開平9−165218号公報、特開平11−43327号公報等参照)。例えば、硫酸チタンや四塩化チタンの水溶液を加熱加水分解して生成したメタチタン酸をアンモニア水で中和し、析出した含水酸化チタンを濾別、洗浄、脱水させると酸化チタン粒子の凝集物が得られる。この凝集物を、硝酸、塩酸、又はアンモニア等の作用の下に解膠させ水熱処理等を行うことにより酸化チタンヒドロゾルが得られる。また、酸化チタンヒドロゾルとしては、酸化チタン粒子を酸やアルカリの作用の下で解膠させたものや、酸やアルカリを使用せず、必要に応じてポリアクリル酸ソーダなどの分散安定剤を使用し、強力なせん断力の下で水中に分散させたゾルも用いることができる。さらに、pHが中性付近の水溶液中においても分散安定性に優れる、粒子表面がペルオキソ基で修飾されたアナターゼ型酸化チタンゾルも例えば特開平10−67516号公報で提案された方法によって容易に得ることができる。
【0029】
上述した酸化チタンヒドロゾルはチタニアゾルとして市販もされている。(例えば、石原産業株式会社製「STS−02」、田中転写株式会社製「TO−240」等)
上記酸化チタンヒドロゾル中の酸化チタンは好ましくは50質量%以下、好ましくは30質量%以下である。さらに好ましくは30質量%以下0.1質量%以上である。
このようなヒドロゾルの粘度(20℃)は比較的低い。本発明においては、ヒドロゾルの粘度は、0.5mPa・s〜2000mPa・s程度の範囲にあるのが好ましい。より好ましくは1mPa・s〜1000mPa・s、さらに好ましくは1mPa・s〜500mPa・sである。
【0030】
また、例えば酸化セリウムゾル(例えば特開平8−59235号公報参照)やTi、Nb、Ta、Vよりなる群から選ばれた少なくとも1種の元素を有する層状酸化物のゾル(例えば特開平9−25123号公報、特開平9−67124号公報、特開平9−227122号公報、特開平9−227123号公報、特開平10−259023号公報等参照)等、様々な光触媒ゾルの製造方法についても酸化チタンゾルと同様に知られている。
【0031】
また、実質的に有機溶媒を分散媒とし、その中に光触媒粒子が分散された光触媒オルガノゾルは、例えば上記光触媒ヒドロゾルをポリエチレングリコール類の如き相間移動活性を有する化合物(異なる第1の相と第2相との界面に第3の相を形成し、第1の相、第2の相、第3の相を相互に溶解及び/又は可溶化する化合物)で処理し有機溶媒で希釈したり(例えば特開平10−167727号公報)、ドデシルベンゼンスルホン酸ナトリウム等の陰イオン界面活性剤で水に不溶性の有機溶剤中に分散移行させてゾルを調整する方法(例えば特開昭58−29863号公報)やブチルセロソルブ等の水より高沸点のアルコール類を上記光触媒ヒドロゾルに添加した後、水を(減圧)蒸留等によって除去する方法等により得ることができる。また、実質的に有機溶媒を分散媒とし、その中に酸化チタン粒子が分散された酸化チタンオルガノゾルは市販されている(例えば、テイカ株式会社製「TKS−251」)。ここで、実質的に有機溶媒を分散媒とするとは、分散媒中に有機溶媒が80質量%程度以上含有されていることを意味する。
【0032】
本発明のバインダー成分に用いる過酸化チタン(B)は、通常、水系(水溶液やゾル)として取り扱われるため、上記光触媒ゾルとしては光触媒ヒドロゾルが好ましく用いられる。
本発明において、変性光触媒(A)を得るのに用いられる少なくとも1種の変性剤化合物(b)は、式(1)で表されるトリオルガノシラン単位、式(2)で表されるモノオキシジオルガノシラン単位、式(3)で表されるジオキシオルガノシラン単位、及びフッ化メチレン(―CF2−)単位よりなる群から選ばれる少なくとも1種の構造単位を有する化合物類よりなる群から選ばれる。
R3Si− (1)
(式中、Rは各々独立に直鎖状または分岐状の炭素数1〜30個のアルキル基、炭素数5〜20のシクロアルキル基、直鎖状または分岐状の炭素数1〜30個のフルオロアルキル基、直鎖状または分岐状の炭素数2〜30個のアルケニル基、フェニル基、炭素数1〜20のアルコキシ基、又は水酸基を表す)
−(R2SiO)− (2)
(式中、Rは式(1)で定義した通りである。)
【0033】
【化3】
【0034】
(式中、Rは式(1)で定義した通りである。)
上述した構造単位を有する変性剤化合物(b)で光触媒粒子表面が変性処理された変性光触媒(A)は、その粒子表面の表面エネルギーが非常に小さくなる。
本発明において、光触媒粒子(a)の変性剤化合物(b)による変性処理は、水及び/又は有機溶媒の存在、あるいは非存在下において、前述した光触媒粒子(a)と、同じく前述した変性剤化合物(b)を好ましくは質量比(a)/(b)=1/99〜99.9/0.1、より好ましくは(A)/(b)=10/90〜99/1の割合で混合し、好ましくは0〜200℃、より好ましくは10〜80℃にて加熱したり、(減圧)蒸留等により該混合物の溶媒組成を変化させる等の操作をすることにより得ることができる。
【0035】
ここで上記変性処理を行う場合、使用できる有機溶媒としては、例えばトルエンやキシレン等の芳香族炭化水素類、ヘキサン、シクロヘキサン、ヘプタン等の脂肪族炭化水素類、酢酸エチル、酢酸n−ブチル等のエステル類、エチレングリコール、ブチルセロソルブ、イソプロパノール、n−ブタノール、エタノール、メタノール等のアルコール類、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン類、テトラヒドロフラン、ジオキサン等のエーテル類、ジメチルアセトアミド、ジメチルホルムアミド等のアミド類、クロロホルム、塩化メチレン、四塩化炭素等のハロゲン化合物類、ジメチルスルホキシド、ニトロベンゼン等やこれらの2種以上の混合物が挙げられる。
【0036】
本発明の変性光触媒(A)を得るのに使用される上記変性剤化合物(b)としては、例えばSi−H基、加水分解性シリル基(アルコキシシリル基、ヒドロキシシリル基、ハロゲン化シリル基、アセトキシシリル基、アミノキシシリル基等)、エポキシ基、アセトアセチル基、チオール基、酸無水物基等の光触媒粒子(a)と反応性を有する、ケイ素化合物、フルオロアルキル化合物、フルオロオレフィン重合体等を挙げることができる。
【0037】
また、上記変性剤化合物(b)の他の例としては、例えば光触媒粒子(a)とファン・デル・ワールス力、クーロン力等により相互作用する構造、例えばポリオキシアルキレン基等を有する、ケイ素化合物、フルオロアルキル化合物、フルオロオレフィン重合体等を挙げることができる。
本発明において、上記変性剤化合物(b)として、組成式(4)で表されるSi−H基含有ケイ素化合物(b1)を用いると、非常に効率よく光触媒粒子表面を変性することができるため好ましい。
HxRyQzSiO(4−x−y−z)/2 (4)
(式中、Rは各々独立に直鎖状または分岐状の炭素数1〜30個のアルキル基、炭素数5〜20のシクロアルキル基、直鎖状または分岐状の炭素数1〜30個のフルオロアルキル基、直鎖状または分岐状の炭素数2〜30個のアルケニル基、フェニル基、炭素数1〜20のアルコキシ基、又は水酸基を表す。
【0038】
また、式中Qは、又は下記(あ)〜(う)からなる群より選ばれる少なくとも1つの機能性付与基を含有する基である。
(あ)カルボキシル基あるいはその塩、リン酸基あるいはその塩、スルホン酸基あるいはその塩、アミノ基あるいはその塩、ポリオキシアルキレン基からなる群から選ばれた少なくとも1つの親水性基。
(い)エポキシ基、アクリロイル基、メタアクリロイル基、(環状)酸無水物基(本願において環状酸無水物基と非環状酸無水物基をまとめて表す)、ケト基、カルボキシル基、ヒドラジン残基、イソシアネート基、イソチオシアネート基、水酸基、アミノ基、環状カーボネート基、チオール基、エステル基からなる群から選ばれた少なくとも1つの反応性基。
(う)少なくとも1つの分光増感基。
また、0<x<4、0<y<4、0≦z<4、及び(x+y+z)≦4である。)
【0039】
本発明において、光触媒粒子(a)の上記組成式(4)で表されるSi−H基含有ケイ素化合物(b1)による変性処理は、水及び/又は有機溶媒の存在、あるいは非存在下において、光触媒粒子(a)と該Si−H基含有ケイ素化合物(b1)を好ましくは質量比(a)/(b1)=1/99〜99.9/0.1、より好ましくは(a)/(b1)=10/90〜99/1の割合で、好ましくは0〜200℃にて混合することにより実施できる。この変性の操作により混合液からは水素ガスが発生すると共に、光触媒粒子(a)として光触媒ゾルを用いた場合、その平均分散粒子径の増加が観察される。また、例えば光触媒粒子(a)として酸化チタンを用いた場合、上記変性の操作により、Ti−OH基の減少がIRスペクトルにおける3630〜3640cm−1の吸収の減少として観測される。
【0040】
これらのことより、変性剤化合物(b)として上記式(4)で表されるSi−H基含有ケイ素化合物(b1)を選択した場合は、本発明の変性光触媒(A)は、Si−H基含有ケイ素化合物(b1)と光触媒粒子(a)との単なる混合物ではなく、両者の間には化学反応に伴う何らかの相互作用を生じていることが予測できるため非常に好ましい。実際、この様にして得られた変性光触媒(A)は、溶媒に対する分散安定性や化学的安定性、耐久性等等において非常に優れたものとなる。
【0041】
本発明において、光触媒粒子(a)の上記式(4)で表されるSi−H基含有ケイ素化合物(b1)による変性処理は、Si−H基に対する脱水素縮合触媒を使用して好ましくは0〜150℃で実施することもできる。
この場合、あらかじめ光還元法等の方法で脱水素縮合触媒を光触媒粒子(a)に固定し、上記Si−H基含有ケイ素化合物(b1)で変性処理しても良いし、脱水素縮合触媒の存在下に上記Si−H基含有化合物ケイ素(b1)で光触媒粒子(a)を変性処理しても良い。
ここでSi−H基に対する脱水素縮合触媒とは、Si−H基と光触媒表面に存在する水酸基(酸化チタンの場合はTi−OH基)やチオール基、アミノ基、カルボキシル基等の活性水素基、さらには水等との脱水素縮合反応を加速する物質を意味し、該脱水素縮合触媒を使用することにより温和な条件で光触媒粒子表面を変性することが可能となる。
【0042】
該脱水素縮合触媒としては、例えば白金族触媒、すなわちルテニウム、ロジウム、パラジウム、オスミウム、イリジウム、白金の単体及びその化合物や、銀、鉄、銅、コバルト、ニッケル、錫等の単体及びその化合物が挙げられる。これらの中で白金族触媒が好ましく、白金の単体及びその化合物が特に好ましい。
ここで、上記白金の化合物としては、例えば塩化白金(II)、テトラクロロ白金酸(II)、塩化白金(IV)、ヘキサクロロ白金酸(IV)、ヘキサクロロ白金(IV)アンモニウム、ヘキサクロロ白金(IV)カリウム、水酸化白金(II)、二酸化白金(IV)、ジクロロ−ジシクロペンタジエニル−白金(II)、白金−ビニルシロキサン錯体、白金−ホスフィン錯体、白金−オレフィン錯体等を使用することができる。
【0043】
本発明の上記式(4)で表されるSi−H基含有ケイ素化合物において、Si−H基は光触媒を穏和な条件で選択性良く変性するために好ましい官能基である。これに対し、加水分解性基は、同様に光触媒の変性に利用することもできるが、副反応を抑制し、得られる変性光触媒の安定性を向上するためには、その含有量は少ない方が好ましい。
即ち、本発明で好適に利用できるSi−H基含有ケイ素化合物(b1)としては、例えば式(5)で表されるSi−H基含有ケイ素化合物を挙げることができる。
HxR’yQzSiO(4−x−y−z)/2 (5)
(式中、R’は各々独立に直鎖状または分岐状の炭素数1〜30個のアルキル基、炭素数5〜20のシクロアルキル基、直鎖状または分岐状の炭素数1〜30個のフルオロアルキル基、直鎖状または分岐状の炭素数2〜30個のアルケニル基、フェニル基を表す。
【0044】
また、式中Qは、又は下記(あ)〜(う)からなる群より選ばれる少なくとも1つの機能性付与基を含有する基である。
(あ)カルボキシル基あるいはその塩、リン酸基あるいはその塩、スルホン酸基あるいはその塩、アミノ基あるいはその塩、ポリオキシアルキレン基からなる群から選ばれた少なくとも1つの親水性基。
(い)エポキシ基、アクリロイル基、メタアクリロイル基、(環状)酸無水物基、ケト基、カルボキシル基、ヒドラジン残基、イソシアネート基、イソチオシアネート基、水酸基、アミノ基、環状カーボネート基、チオール基、エステル基からなる群から選ばれた少なくとも1つの反応性基。
(う)少なくとも1つの分光増感基。
また、0<x<4、0<y<4、0≦z<4、及び(x+y+z)≦4である。)
【0045】
また、本発明に好適に使用できる上記一般式(4)で表されるSi−H基含有ケイ素化合物(b1)としては、例えば式(6)や式(7)で表されるモノSi−H基含有化合物、式(8)で表される両末端Si−H基含有化合物、式(9)で表されるHシリコーン化合物よりなる群から選ばれる少なくとも1種のSi−H基含有ケイ素化合物を挙げることができる。
【0046】
【化4】
【0047】
(式中、R1は各々独立して直鎖状または分岐状の炭素数が1〜30個のアルキル基、炭素数5〜20のシクロアルキル基、直鎖状または分岐状の炭素数が1〜30個のフルオロアルキル基、炭素数2〜30のアルケニル基、フェニル基、炭素数1〜20のアルコキシ基、水酸基、もしくは式(10)で表されるシロキシ基から選ばれた1種以上からなる基を表す。
−O−(R2 2SiO)n−SiR2 3 ・・・(10)
(式中、R2はそれぞれ独立に直鎖状または分岐状の炭素数が1〜30個のアルキル基、炭素数5〜20のシクロアルキル基、炭素数2〜30のアルケニル基、フェニル基から選ばれた1種以上からなる基を表す。また、nは整数であり、0≦n≦1000である。))
H−(R1 2SiO)m−SiR1 2−Q ・・・(7)
(式中、R1は式(6)で定義した通りである。Qは、下記(あ)〜(う)からなる群より選ばれる少なくとも1つの機能性付与基を含有する基である。
【0048】
(あ)カルボキシル基あるいはその塩、リン酸基あるいはその塩、スルホン酸基あるいはその塩、アミノ基あるいはその塩、ポリオキシアルキレン基からなる群から選ばれた少なくとも1つの親水性基。
(い)エポキシ基、アクリロイル基、メタアクリロイル基、(環状)酸無水物基、ケト基、カルボキシル基、ヒドラジン残基、イソシアネート基、イソチオシアネート基、水酸基、アミノ基、環状カーボネート基、チオール基、エステル基からなる群から選ばれた少なくとも1つの反応性基。
(う)少なくとも1つの分光増感基。
mは整数であり、0≦m≦1000である。)
H−(R1 2SiO)m−SiR1 2−H ・・・(8)
(式中、R1は式(6)で定義した通りである。mは整数であり、0≦m≦1000である。)
(R1HSiO)p(R1 2SiO)q(R1QSiO)r(R1 3SiO1/2)s・・・(9)
(式中、R1は式(6)で定義した通りであり、Qは式(7)で定義した通りである。pは1以上の整数であり、q及びrは0又は1以上の整数であり、(p+q+r)≦10000であり、そしてsは0又は2である。但し、(p+q+r)が2以上の整数であり且つs=0の場合、該Hシリコーン化合物は環状シリコーン化合物であり、s=2の場合、該Hシリコーン化合物は鎖状シリコーン化合物である。)
【0049】
本発明において、上記式(6)で表されるモノSi−H基含有化合物の具体例としては、例えばビス(トリメチルシロキシ)メチルシラン、ビス(トリメチルシロキシ)エチルシラン、ビス(トリメチルシロキシ)n−プロピルシラン、ビス(トリメチルシロキシ)i−プロピルシラン、ビス(トリメチルシロキシ)n−ブチルシラン、ビス(トリメチルシロキシ)n−ヘキシルシラン、ビス(トリメチルシロキシ)シクロヘキシルシラン、ビス(トリメチルシロキシ)フェニルシラン、ビス(トリエチルシロキシ)メチルシラン、ビス(トリエチルシロキシ)エチルシラン、トリス(トリメチルシロキシ)シラン、トリス(トリエチルシロキシ)シラン、ペンタメチルジシロキサン、1,1,1,3,3,5,5−ヘプタメチルトリシロキサン、1,1,1,3,3,5,5,6,6−ノナメチルテトラシロキサン、トリメチルシラン、エチルジメチルシラン、メチルジエチルシラン、トリエチルシラン、フェニルジメチルシラン、ジフェニルメチルシラン、シクロヘキシルジメチルシラン、t−ブチルジメチルシラン、ジ−t−ブチルメチルシラン、n−オクタデシルジメチルシラン、トリ−n−プロピルシラン、トリ−i−プロピルシラン、トリ−i−ブチルシラン、トリ−n−ヘキシルシラン、トリフェニルシラン、アリルジメチルシラン、1−アリル−1,1,3,3−テトラメチルジシロキサン、クロロメチルジメチルシラン、7−オクテニルジメチルシラン等を挙げることができる。
【0050】
これらのモノSi−H基含有化合物の中で、光触媒の変性処理時におけるSi−H基の反応性(脱水素縮合反応)の良さや表面エネルギーの低さから、ビス(トリメチルシロキシ)メチルシラン、トリス(トリメチルシロキシ)シラン、ペンタメチルジシロキサン等の分子中にシロキシ基を有するものが好ましい。
【0051】
本発明において、上記式(8)で表される両末端Si−H基含有化合物の具体例としては、例えば1,1,3,3−テトラメチルジシロキサン、1,1,3,3,5,5−ヘキサメチルトリシロキサン、1,1,3,3,5,5,7,7−オクタメチルテトラシロキサン等の数平均分子量50000以下のH末端ポリジメチルシロキサン類や、1,1,3,3−テトラエチルジシロキサン、1,1,3,3,5,5−ヘキサエチルトリシロキサン、1,1,3,3,5,5,7,7−オクタエチルテトラシロキサン等の数平均分子量50000以下のH末端ポリジエチルシロキサン類や、1,1,3,3−テトラフェニルジシロキサン、1,1,3,3,5,5−ヘキサフェニルトリシロキサン、1,1,3,3,5,5,7,7−オクタフェニルテトラシロキサン等の数平均分子量50000以下のH末端ポリジフェニルシロキサン類や、1,3−ジフェニル−1,3−ジメチル−ジシロキサン、1,3,5−トリメチル−1,3,5−トリフェニル−トリシロキサン、1,3,5,7−テトラメチル−1,3,5,7−テトラフェニル−テトラシロキサン等の数平均分子量50000以下のH末端ポリフェニルメチルシロキサン類や、ジメチルシラン、エチルメチルシラン、ジエチルシラン、フェニルメチルシラン、ジフェニルシラン、シクロヘキシルメチルシラン、t−ブチルメチルシラン、ジ−t−ブチルシラン、n−オクタデシルメチルシラン、アリルメチルシラン等を例示することができる。
【0052】
本発明に用いる上記式(8)で表される両末端Si−H基含有化合物としては、光触媒の変性処理時における分散安定性(光触媒粒子の凝集の防止)の点より、数平均分子量が、好ましくは10000以下、より好ましくは2000以下、さらに好ましくは1000以下の両末端Si−H基含有化合物が好適に使用できる。
本発明に用いることができる上記式(9)で表されるHシリコーン化合物としては、光触媒の変性処理時における分散安定性(光触媒粒子の凝集の防止)の点より、数平均分子量が、好ましくは10000以下、より好ましくは5000以下、さらに好ましくは2000以下のHシリコーン化合物が好適に使用できる。
【0053】
また、上記一般式(4)で表されるSi−H基含有ケイ素化合物(b1)として、機能性付与基含有基(Q)を有するもの(式(7)、式(9)であってrが1以上の正数のもの等)を選択すると、本発明で得られる変性光触媒(A)に種々の機能を付与できるため好ましい。
ここで機能性付与基含有基(Q)は下式(11)で表される基であることが好ましい。
−Z−(W)a ・・・(11)
(式中、Zは分子量14〜50,000のa価の有機基を表し、Wは上記式(4)中の機能性付与基(あ)〜(う)からなる群から選ばれる少なくとも1つであり、aは1〜20の整数である。)
【0054】
例えば機能性付与基含有基(Q)として、カルボキシル基あるいはその塩を含む1価の基、リン酸基あるいはその塩を含む1価の基、スルホン酸基あるいはその塩を含む1価の基、アミノ基あるいはその塩を含む1価の基、ポリオキシアルキレン基からなる群から選ばれた少なくとも1つの親水性基[式(4)中の(あ)]を有するものを選択すると、得られる変性光触媒(A)の水に対する分散安定性が非常に良好なものとなる。この様な親水性基を有する変性剤(b1)で変性処理されてなる変性光触媒(A)と過酸化チタン(B)を含有する本発明の光触媒組成物の貯蔵安定性は非常に優れたものとなり好ましい。
【0055】
また、例えば機能性付与基含有基(Q)として、エポキシ基、アクリロイル基、メタアクリロイル基、(環状)酸無水物基、ケト基、カルボキシル基、ヒドラジン残基、イソシアネート基、イソチオシアネート基、水酸基、アミノ基、環状カーボネート基、チオール基、エステル基からなる群から選ばれた少なくとも1つの反応性基[式(4)中の(い)]を含有する基を選択すると本発明の変性光触媒(A)は架橋性を有し、本発明の光触媒組成物から形成される光触媒体の硬度や耐薬品性が向上するため好ましい。
【0056】
また、例えば機能性付与基含有基(Q)として、分光増感基を有するものを選択すると、本発明の変性光触媒(A)は、紫外線領域だけでなく、可視光領域及び/又は赤外光領域の光の照射によっても触媒活性や光電変換機能を発現することができる。
ここで、分光増感基とは、可視光領域及び/又は赤外光領域に吸収を持つ種々の金属錯体や有機色素(即ち、増感色素)に由来する基を意味する。
【0057】
増感色素としては、例えばキサンテン系色素、オキソノール系色素、シアニン系色素、メロシアニン系色素、ローダシアニン系色素、スチリル系色素、ヘミシアニン系色素、メロシアニン系色素、フタロシアニン系色素(金属錯体を含む)、ポルフィリン系色素(金属錯体を含む)、トリフェニルメタン系色素、ペリレン系色素、コロネン系色素、アゾ系色素、ニトロフェノール系色素、さらには例えば特開平1−220380号公報や特許出願公表平5−504023号公報に記載のルテニウム、オスミウム、鉄、亜鉛の錯体や、他にルテニウムレッド等の金属錯体を挙げることができる。
【0058】
これらの増感色素の中で、400nm以上の波長領域で吸収を持ち、かつ最低空軌道のエネルギー準位(励起状態の酸化還元電位)が光触媒の伝導帯のエネルギー準位より高いという特徴を有するものが好ましい。このような増感色素の特徴は、赤外・可視・紫外領域における光の吸収スペクトルの測定、電気化学的方法による酸化還元電位の測定(例えばT.Tani, Photogr. Sci. Eng., 14, 72 (1970); R.W.Berriman et al., ibid., 17. 235 (1973); P.B.Gilman Jr., ibid., 18, 475 (1974)等)、分子軌道法を用いたエネルギー準位の算定(例えばT.Tani etal., Photogr. Sci. Eng., 11, 129 (1967); D.M.Sturmer et al., ibid., 17.146 (1973); ibid., 18, 49 (1974); R.G.Selby et al., J. Opt. Soc. Am., 33, 1 (1970)等)、更には光触媒と分光増感色素によって作成したGratzel型湿式太陽電池の光照射による起電力の有無や効率等によって確認することができる。
上記の特徴を有する増感色素の例としては、9−フェニルキサンテン骨格を有する化合物、2,2−ビピリジン誘導体を配位子として含むルテニウム錯体、ペリレン骨格を有する化合物、フタロシアニン系金属錯体、ポルフィリン系金属錯体等を挙げることができる。
【0059】
本発明において、上述した機能性付与基含有基(Q)を有するSi−H基含有ケイ素化合物を得る方法としては、
(Q−1):下記一般式(12)で表されるSi−H基含有化合物と、機能性付与基[式(4)中の(あ)〜(う)]を有する炭素−炭素不飽和結合化合物をヒドロシリル化反応させる方法。
(Q−2):下記一般式(12)で表されるSi−H基含有ケイ素化合物と、反応性基[式(4)中の(い)]を有する炭素−炭素不飽和結合化合物をヒドロシリル化反応させて反応性基を有するSi−H基含有ケイ素化合物を得た後、該反応性基と反応性を有する機能性付与基含有化合物を反応させる方法が挙げられる。
H(x+z)RySiO(4−x−y−z)/2 (12)
(式中、Rは各々独立に直鎖状または分岐状の炭素数1〜30個のアルキル基、炭素数5〜20のシクロアルキル基、直鎖状または分岐状の炭素数1〜30個のフルオロアルキル基、直鎖状または分岐状の炭素数2〜30のアルケニル基、フェニル基、炭素数1〜20のアルコキシ基、水酸基を表す。
【0060】
また、0<(x+z)<4、0<y<4、及び(x+y+z)≦4である。)まず、機能性付与基(Q)を有するSi−H基含有ケイ素化合物を得る方法として、上述した(Q−1)の方法[以下(Q−1)−方法]について説明する。(Q−1)−方法において、上記式(12)で表されるSi−H基含有ケイ素化合物に、機能性付与基として親水性基を導入するのに用いる炭素−炭素不飽和結合化合物としては、カルボキシル基あるいはその塩、リン酸基あるいはその塩、スルホン酸基あるいはその塩、アミノ基あるいはその塩、ポリオキシアルキレン基、(環状)酸無水物からなる群から選ばれた少なくとも1つの親水性基を有するオレフィン類、アリルエーテル類、ビニルエーテル類、ビニルエステル類、(メタ)アクリル酸エステル類、スチレン誘導体等が挙げられる。
【0061】
上記親水性基を有する炭素−炭素不飽和結合化合物の好ましい具体例として、例えば式(13)で表されるポリオキシエチレン基含有アリルエーテルや、さらには5−ノルボルネン−2,3−ジカルボン酸無水物、アリルコハク酸無水物等を挙げることができる。
CH2=CHCH2O(CH2CH2O)bR3 (13)
(式中、bは1〜1000の整数を表す。R3は、水素原子或いは直鎖状または分岐状の炭素数が1〜30個のアルキル基を表す。)
また、上記式(12)で表されるSi−H基含有ケイ素化合物に反応性基を導入するのに用いる炭素−炭素不飽和結合化合物としては、エポキシ基、(メタ)アクリロイル基、(環状)酸無水物基、ケト基、カルボキシル基、ヒドラジン残基、イソシアネート基、イソチオシアネート基、水酸基、アミノ基、環状カーボネート基、エステル基からなる群から選ばれた少なくとも1種の反応性基を有するオレフィン類、アリルエーテル類、アリルエステル類、ビニルエーテル類、ビニルエステル類、(メタ)アクリル酸エステル類、スチレン誘導体等が挙げられる。
【0062】
上記反応性基を有する炭素−炭素不飽和結合化合物の好ましい具体例として、例えばアリルグリシジルエーテル、(メタ)アクリル酸グリシジル、(メタ)アクリル酸アリル、ジアリルエーテル、ジアリルフタレート、(メタ)アクリル酸ビニル、クロトン酸ビニル、エチレングリコールジ(メタ)アクリル酸エステル、無水マレイン酸、5−ノルボルネン−2,3−ジカルボン酸無水物、5−ヘキセン−2−オン、アリルイソシアネート、アリルアルコール、エチレングリコールモノアリルエーテル、アリルアミン、アリルイソチオシアネート、アリルセミカルバジド、(メタ)アクリル酸ヒドラジド、4−アリルオキシメチル−2−オキソ−1,3−ジオキソラン等を挙げることができる。
【0063】
また、上記式(12)で表されるSi−H基含有ケイ素化合物に分光増感基を導入するのに用いる炭素−炭素不飽和結合化合物としては、前述した分光増感色素を有するオレフィン類、アリルエーテル類、アリルエステル類、ビニルエーテル類、ビニルエステル類、(メタ)アクリル酸エステル類、スチレン誘導体等が挙げられる。これらは、例えば前述した反応性基を有する炭素−炭素不飽和結合化合物と、該反応性基と反応性を有する分光増感色素との反応によって容易に得ることができる。
【0064】
例えば、反応性基を有する炭素−炭素不飽和結合化合物の反応性基がエポキシ基、(環状)酸無水物基、イソシアネート基、イソチオシアネート基、環状カーボネート基、エステル基、ケト基、(メタ)アクリロイル基の場合は、アミノ基、カルボキシル基、水酸基、ヒドラジン残基、(メタ)アクリロイル基からなる群から選ばれた少なくとも1つの官能基を有する分光増感色素であり、逆に反応性基を有する炭素−炭素不飽和結合化合物の反応性基がアミノ基、カルボキシル基、水酸基、ヒドラジン残基、(メタ)アクリロイル基の場合は、エポキシ基、(環状)酸無水物基、イソシアネート基、イソチオシアネート基、環状カーボネート基、エステル基、ケト基、(メタ)アクリロイル基からなる群から選ばれた少なくとも1つの官能基を有する分光増感色素が挙げられる。
【0065】
上記反応性基を有する炭素−炭素不飽和結合化合物とそれに反応性を有する分光増感色素との反応は、各々の反応性基の種類に応じた反応温度、反応圧力、溶媒等の反応条件を選択して実施できる。その際、分光増感色素の安定性の点から、反応温度としては300℃以下が好ましく、150℃以下0℃以上がさらに好ましい。
(Q−1)−方法において、上記炭素−炭素不飽和結合化合物と上記式(12)で表されるSi−H基含有ケイ素化合物とのヒドロシリル化反応は、好ましくは触媒の存在下、有機溶媒の存在下あるいは非存在下において0〜200℃で炭素−炭素不飽和結合化合物(E)と式(14)で表されるSi−H基含有ケイ素化合物(b1’)を、質量比(E)/(b1’)=0.01以上、より好ましくは(E)/(b1’)=0.01〜2、さらに好ましくは(E)/(b1’)=0.01〜1で接触させることにより行うことができる。
【0066】
上記ヒドロシリル化反応の触媒としては、白金族触媒、すなわちルテニウム、ロジウム、パラジウム、オスミウム、イリジウム、白金の化合物が適しているが、特に白金の化合物とパラジウムの化合物が好適である。白金の化合物としては、例えば塩化白金(II)、テトラクロロ白金酸(II)、塩化白金(IV)、ヘキサクロロ白金酸(IV)、ヘキサクロロ白金(IV)アンモニウム、ヘキサクロロ白金(IV)カリウム、水酸化白金(II)、二酸化白金(IV)、ジクロロ−ジシクロペンタジエニル−白金(II)、白金−ビニルシロキサン錯体、白金−ホスフィン錯体、白金−オレフィン錯体や白金の単体、アルミナやシリカや活性炭に固体白金を担持させたものが挙げられる。パラジウムの化合物としては、例えば塩化パラジウム(II)、塩化テトラアンミンパラジウム(II)酸アンモニウム、酸化パラジウム(II)等が挙げられる。
【0067】
また、ヒドロシリル化反応に使用できる有機溶媒としては、例えばトルエンやキシレン等の芳香族炭化水素類、ヘキサン、シクロヘキサン、ヘプタン等の脂肪族炭化水素類、酢酸エチル、酢酸n−ブチル等のエステル類、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン類、テトラヒドロフラン、ジオキサン等のエーテル類、ジメチルアセトアミド、ジメチルホルムアミド等のアミド類、クロロホルム、塩化メチレン、四塩化炭素等のハロゲン化合物類、ジメチルスルホキシド、ニトロベンゼン等やこれらの2種以上の混合物が挙げられる。
【0068】
次に、機能性付与基を有するSi−H基含有ケイ素化合物を得る方法として、上述した(Q−2)の方法[以下(Q−2)−方法]について説明する。
(Q−2)−方法において使用される反応性基を有する炭素−炭素不飽和結合化合物としては、(Q−1)−方法において述べたものを挙げることができる。また、上述した式(14)で表されるSi−H基含有ケイ素化合物と該反応性基を有する炭素−炭素不飽和結合化合物とのヒドロシリル化反応は、(Q−1)−方法で述べたヒドロシリル化反応と同じ条件で実施することができる。
【0069】
(Q−2)−方法によると、上記ヒドロシリル化反応によって反応性基を有するSi−H基含有ケイ素化合物を得ることができる。この反応性基を有するSi−H基含有ケイ素化合物とそれに反応性を有する機能性付与基含有化合物との反応は、各々の反応性基の種類に応じた反応温度、反応圧力、溶媒等の反応条件を選択して実施できる。その際、Si−H基の安定性の点から、反応温度としては300℃以下が好ましく、150℃以下0℃以上がさらに好ましい。
【0070】
また、本発明の変性光触媒(A)の好ましい形態は、変性光触媒の一次粒子と二次粒子との混合物の数平均分散粒子径が400nm以下、さらに好ましくは1nm以上100nm以下、特に好ましくは5nm以上80nm以下である。ゾルの状態であることが好ましい。
また、特に数平均分散粒子径が100nm以下の変性光触媒ゾルを本発明の光触媒組成物に用いると、それから形成される光触媒体において、該変性光触媒粒子の濃度が光触媒体の内部、あるいは光触媒体が基材と接する界面近傍では小さく、光触媒体の露出面である表層部の表面近傍では大きく分布するような表面方向に異方分布した光触媒体を形成するのに有利となり、光触媒活性が大きい光触媒体を形成するため非常に好ましい。この様な変性光触媒ゾルは、上記変性剤化合物(b)で変性処理をする光触媒粒子(a)として前述した光触媒ゾルを用いることにより得ることができる。
なお、従来、二酸化チタンなどで単に粒径として表示されている数値は、多くの場合一次粒子径(結晶子径)であり、凝集による二次粒子径を考慮した数値ではない。
【0071】
また、特に数平均分散粒子径が100nm以下の変性光触媒ゾルを本発明の光触媒組成物に用いると、変性光触媒粒子の濃度が光触媒体の内部、あるいは光触媒体が基材と接する界面近傍では小さく、光触媒体の露出面である表層部の表面近傍では大きく分布するような表面方向に異方分布した光触媒体を形成するのに有利となり、光触媒活性が大きい光触媒体を形成するため非常に好ましい。この様な変性光触媒ゾルは、上記変性剤化合物(b)で変性処理をする光触媒として前述した光触媒ゾルを用いることにより得ることができる。
なお、従来、二酸化チタンなどで単に粒径として表示されている数値は、多くの場合一次粒子径(結晶子径)であり、凝集による二次粒子径を考慮した数値ではない。
本発明の光触媒組成物は、上述した変性光触媒(A)と過酸化チタン(B)を含有することを特徴とし、その質量比(A)/(B)は0.1/99.9〜95/5であることが好ましく、(A)/(B)が1/99〜50/50で含むことがより好ましい。
【0072】
本発明で用いられる過酸化チタン(B)は、ペルオクソチタン酸またはペルオキシチタン酸とも言われるもので、過酸化チタン基(Ti−O−O−H)を有する化合物をいい、例えば、その構造はH4TiO5、Ti(OOH)(OH)3又はTiO3・2H2O等で示される。上記過酸化チタン基の存在は、例えば赤外分光において900cm−1近傍に現れるTiに結合した過酸化基のピークとして、その存在を確認することができる。しかし、乾燥塗膜の過酸化基は、安定な物質ではなく、乾燥後徐々に自然消失し、さらに光や熱により積極的に除去することもできる。
【0073】
本発明において、上記過酸化チタン(B)は公知の方法によって調製することが可能であり、例えば、四塩化チタンを出発原料とする方法(例えば特開平9−71418号公報)、水素化チタンを原料とする方法(例えば特開昭62−252302号公報)、チタンアルコキシドを原料とする方法(例えば特開昭62−252319号公報)及び有機チタネートを原料とする方法(例えば「建築設備と配管工事」1998年、6月号、P.6)等が挙げられる。例えば、上記四塩化チタンを出発原料とする方法(例えば特開平9−71418号公報)では、四塩化チタン水溶液をアンモニア水で加水分解し、水酸化チタンを含むスラリーを生成し、これを洗浄した後、過酸化水素を加えることにより過酸化チタン水溶液を得ることができる。また、過酸化チタンは、黄色、黄褐色又は赤褐色の透明粘性水溶液(ゾル溶液)として市販されているものも使用できる。市販品としては、例えば「PTA−85」、「PTA−170」(いずれも田中転写(株)製)や「TKC−301」(テイカ(株)製)が挙げられる。
【0074】
また、本発明に用いる過酸化チタン(B)としては、粘稠性アモルファス型過酸化チタン(例えば特開平10−53437号公報)を好適に用いることもできる。該粘稠性アモルファス型過酸化チタンは、黄色透明で粘性を有し、常温ではアモルファスの状態で未だアナターゼ型酸化チタンには結晶化しておらず、その密着・付着性は、撥水性を有する基体をはじめとしてあらゆる材種の基体において極めて優れている。また、成膜性が高く、均一でフラットな薄膜を容易に作成することができ、かつ、乾燥被膜は水に溶けないという性質を有している。
【0075】
上記「粘稠性アモルファス型過酸化チタン」は、その製造過程において、四塩化チタンTiCl4のようなチタン塩水溶液と、アンモニア水ないし水酸化ナトリウムのような水酸化アルカリとの反応時のpHを酸性領域、望ましくはpH2〜6の範囲内で変えることにより、また、濃度を0.2〜0.6質量%の範囲内で変えることにより、種々の粘性を有するものが得られ、その粘性に応じて種々の用途が考えられるが、均一な膜厚の薄膜を形成するという目的からは、均質な半ゼリー状程度の粘性を有するものが望ましい。
【0076】
本発明のバインダー成分として用いる上記過酸化チタン(B)は、基材表面に強固でクラックや剥離が生じにくく、耐久性に優れた皮膜を形成することができることが知られている。また、該過酸化チタン(B)と本発明の変性光触媒(A)とからなる光触媒組成物は、光触媒含有量が少ない場合においてさえ、光触媒活性や親水化能力等に優れた光触媒体を形成することができるため、該光触媒体はバインダーとして作用する過酸化チタンの上記優れた特性が十分に発揮することができる。
【0077】
また、本発明の光触媒組成物に用いるバインダー成分には、必要に応じて樹脂(F)を、上記過酸化チタン(B)に対し、好ましくは質量比(B)/(F)=0.1/99.9〜100/0、より好ましくは(B)/(F)=10/90〜100/0で含むものを選択して使用することもできる。
上記樹脂(F)としては、全ての合成樹脂及び天然樹脂が使用可能である。また、その形態については、無溶媒の状態(ペレット、粉体、液体等)であっても溶媒に溶解あるいは分散した形態であっても良く、特に制限はない。
【0078】
上記合成樹脂としては、熱可塑性樹脂と硬化性樹脂(熱硬化性樹脂、光硬化性樹脂、湿気硬化性樹脂等)の使用が可能であり、例えばアクリル樹脂、メタクリル樹脂、フッ素樹脂、アルキド樹脂、アミノアルキド樹脂、ビニル樹脂、ポリエステル樹脂、スチレン−ブタジエン樹脂、ポリオレフィン樹脂、ポリスチレン樹脂、ポリケトン樹脂、ポリアミド樹脂、ポリカーボネート樹脂、ポリアセタール樹脂、ポリエーテルエーテルケトン樹脂、ポリフェニレンオキシド樹脂、ポリスルフォン樹脂、ポリフェニレンスルホン樹脂ポリエーテル樹脂、ポリ塩化ビニル樹脂、ポリ塩化ビニリデン樹脂、尿素樹脂、フェノール樹脂、メラミン樹脂、エポキシ樹脂、ウレタン樹脂、シリコン−アクリル樹脂、シリコーン樹脂等を挙げることができる。
【0079】
また、上記天然高分子としては、ニトロセルロース等のセルロース系樹脂、天然ゴム等のイソプレン系樹脂、カゼイン等のタンパク質系樹脂やでんぷん等を挙げることができる。
本発明に使用できる上記樹脂(F)としては、例えば水ガラス等の無機系化合物やシリコーン系樹脂及びフッ素系樹脂等の様な、光触媒の酸化分解作用に対し難分解性である難分解性成分(F1)を好ましく選択することができる。
上記フッ素系樹脂としては、例えばPTFEやポリフッ化ビニリデン、さらにはフッ素含有量1〜80質量%のアクリル−フッ素樹脂、エポキシ−フッ素樹脂、ウレタン−フッ素樹脂やフルオロオレフィンと炭素−炭素不飽和化合物(ビニルエーテル類、ビニルエステル類、アリル化合物、(メタ)アクリル酸エステル類等)との共重合体等が挙げられる。これらのフッ素系樹脂は、単独でも、2種以上を同時に用いることもできる。また、その形態としては水に分散、あるいは溶解したものが好ましく選択される。
【0080】
また、上記シリコーン系樹脂としては、例えば一般式(14)、(15)、(16)及び(17)で表されるシロキサン結合の少なくとも1種の構造を含むシリコーンや、該構造を重合体分子鎖の末端及び/又は側鎖に有する重合体を挙げることができる。
【0081】
【化5】
【0082】
−(R4 2SiO)− ・・・(15)
【0083】
【化6】
【0084】
(式中、R4は同じか又は異なり、水素原子又は炭素数1〜30である一価の有機基を表す。)
【0085】
【化7】
【0086】
上述した構造を含むシリコーンは、例えば一般式R4SiX3(式中、R4は水素原子又は炭素数1〜30の一価の有機基を表す。各Xは、各々独立に水素原子、水酸基、炭素数1〜20のアルコキシ基、炭素数1〜20のアシロキシ基、アミノキシ基、炭素数1〜20のオキシム基、ハロゲン原子からなる群より選ばれる一つの反応性基を表す。以下同様。)で表される3官能シラン誘導体及び/又は一般式R4 2SiX2で表される2官能シラン誘導体及び/又は一般式SiX4で表される4官能シラン誘導体や、それらを部分的に加水分解・縮重合させ、必要により一般式R4 3SiXで表される1官能シラン誘導体及び/又はアルコール類によって末端停止させることにより調製できる。この様にして得られるシラン誘導体モノマーの部分縮合物のポリスチレン換算重量平均分子量は、好ましくは100〜100,000、より好ましくは400〜50,000である。
【0087】
上述した1〜3官能のシラン誘導体中、R4は水素原子又は炭素数1〜30の一価の有機基であれば 特に限定はされないが、同一または異種の置換もしくは非置換で炭素数1〜8の1価の炭化水素基が好適であり、たとえば、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、ヘキシル基、ペプチル基、オクチル基等のアルキル基;シクロペンチル基、シクロヘキシル基等のシクロアルキル基;2−フェニルエチル基、2−フェニルプロピル基、3−フェニルプロピル基等のアラ ルキル基;フェニル基、トリル基等のアリール基;ビニル基、アリル基等のアルケニル基;クロロメチル基、γ−クロロプロピル基、3,3,3−トリフルオロプロピル基等のハロゲン置換炭化水素基;γ−アクリロキシプロピル基、γ−メタクリロキシプロピル基、γ−グリシドキシプロピル基、3,4−エポキシシクロヘキシルエチル基、γ−メルカプトプロピル基等の置換炭化水素基等を例示することができる。また、その形態としては水に分散、あるいは溶解したものが好ましく選択される。
【0088】
また、本発明のバインダー成分として過酸化チタン(B)と共に上記シリコーン系樹脂を含むものを用いる場合は、該シリコーン系樹脂の硬化触媒を含有しても良い。該硬化触媒としては、例えば水酸化ナトリウム、水酸化カリウム、ナトリウムメチラート、酢酸ナトリウム、テトラメチルアンモニウムクロライド、テトラメチルアンモニウムヒドロキシドのごとき塩基性化合物類;トリブチルアミン、ジアザビシクロウンデセン、エチレンジアミン、ジエチレントリアミン、エタノールアミン類、γ−アミノプロピルトリメトキシシラン、γ−(2−アミノエチル)−アミノプロピルトリメトキシシランのごときアミン化合物;テトライソプロピルチタネート、テトラブチルチタネートのようなチタン化合物;アルミニウムトリイソプロポキシド、アルミニウムアセチルアセトナート、過塩素酸アルミニウム、塩化アルミニウムのようなアルミニウム化合物;錫アセチルアセトナート、ジブチル錫オクチレート、ジブチル錫ジラウレートのような錫化合物;コバルトオクチレート、コバルトアセチルアセトナート、ジルコニウムアセチルアセトナート、鉄アセチルアセトナートのごとき含金属化合物類;リン酸、硝酸、フタル酸、p−トルエンスルホン酸、トリクロル酢酸のごとき酸性化合物類などが挙げられる。
【0089】
また、本発明の光触媒組成物には、それから形成される光触媒体の硬度や耐擦傷性、親水性を向上させる目的でシリカ、アルミナ、酸化アンチモン、希土類酸化物等の金属酸化物微粒子を粉末あるいはゾルの状態で添加しても良い。
本発明の光触媒組成物は、無溶媒の状態(液体、固体)であっても溶媒に溶解あるいは分散した状態であっても良く、特に制限はないが、コーティング剤として用いる場合は、溶媒に対し溶解あるいは分散した状態が好ましい。この際、該光触媒組成物中の変性光触媒(A)と過酸化チタン(B)を含有するバインダー成分の総量は、好ましくは0.01〜95質量%、より好ましくは0.1〜70質量%である。
【0090】
本発明の光触媒組成物に用いる溶媒としては、例えば水やエチレングリコール、ブチルセロソルブ、イソプロパノール、n−ブタノール、エタノール、メタノール等のアルコール類、トルエンやキシレン等の芳香族炭化水素類、ヘキサン、シクロヘキサン、ヘプタン等の脂肪族炭化水素類、酢酸エチル、酢酸n−ブチル等のエステル類、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン類、テトラヒドロフラン、ジオキサン等のエーテル類、ジメチルアセトアミド、ジメチルホルムアミド等のアミド類、クロロホルム、塩化メチレン、四塩化炭素等のハロゲン化合物類、ジメチルスルホキシド、ニトロベンゼン等が挙げられる。これらの溶媒は、単独で又は組み合わせて用いられる。
【0091】
また、本発明の光触媒組成物には、基材への濡れ性を良好にし、密着性や塗工性を向上させる目的で、界面活性剤を添加するのが好ましい。添加できる界面活性剤としては、例えば、高級脂肪酸、樹脂酸、酸性脂肪アルコール、硫酸エステル、高級アルキルスルフォン酸、スルフォン酸アルキルアリル、スルフォン化ひまし油、スルフォこはく酸エステル、アルケニルコハク酸等の塩に代表されるアニオン性界面活性剤、あるいはエチレンオキサイドと長鎖脂肪アルコールまたはフェノール類、リン酸類との公知の反応生成物に代表されるノニオン性界面活性剤、4級アンモニウム塩等を含有するカチオン性界面活性剤、(部分鹸化)ポリビニルアルコール等の高分子分散安定剤、シリコーンポリマー鎖にエチレングリコール鎖、もしくはプロピレングリコール鎖がブロックポリマー型、側鎖変性型、または末端変性型で結合したものに代表されるシリコーン界面活性剤、パーフルオロアルキルポリオキシエチレンエタノール、パーフルオロアルキルアルコキシレート、フッ素化アルキルエステル等のフッ素系界面活性剤等やそれらの併用が挙げられる。
【0092】
また、本発明における光触媒組成物には、レベリング剤として、例えばジアセトンアルコール、エチレングリコールモノメチルエーテル、エチレングリコールモノブチルエーテル、4−ヒドロキシ−4−メチル−2−ペンタノン、ジプロピレングリコール、トリプロピレングリコール、1−エトキシ−2−プロパノール、1−ブトキシ−2−プロパノール、プロピレングリコールモノメチルエーテル、1−プロポキシ−2−プロパノール、ジプロピレングリコールモノメチルエーテル、ジプロピレングコリールモノエチルエーテル、トリプロピレングリコールモノエチルエーテル、アセチレンアルコール等を添加することもできる。
【0093】
さらに、本発明の光触媒組成物には、必要により通常、塗料や成型用樹脂に添加配合される成分、例えば、顔料、硬化触媒、架橋剤、充填剤、分散剤、光安定剤、湿潤剤、増粘剤、レオロジーコントロール剤、消泡剤、可塑剤、成膜助剤、防錆剤、染料、防腐剤等がそれぞれの目的に応じて選択、組み合わせて配合することができる。
【0094】
本発明の変性光触媒(A)は、光触媒粒子表面が表面エネルギーの非常に小さい構造を有する変性剤化合物(b)で変性処理されているため、該変性光触媒(A)と過酸化チタン(B)を含有する本発明の光触媒組成物は、変性光触媒(A)の分布について自己傾斜性を有することが可能となる。ここで自己傾斜性とは、光触媒組成物から光触媒体を形成する際、その形成過程において変性光触媒(A)が、光触媒体が接する界面の性状(特に親水/疎水性)に対応して、変性光触媒(A)の濃度勾配を有する構造を自律的に形成することを意味する。
【0095】
この場合、接した面に性状(親水/疎水性)の差があれば、その差に対応して濃度勾配が生じ、また、当該光触媒体の内部と該界面の間で濃度勾配が生じる。
この際、本発明における光触媒組成物から形成される光触媒体中における変性光触媒(A)の濃度は、光触媒体内部や光触媒体が基材と接する面から他方の露出面に向かって徐々に高くなっても良いし、単に光触媒体内部や光触媒体が基材に接する面での光触媒濃度が低く、他方の露出面における光触媒濃度が高く、その間の変化が不連続であっても良い。
【0096】
本発明の光触媒組成物において、変性光触媒(A)の自己傾斜性が非常に高い場合(即ち、光触媒体中の変性光触媒(A)含有量(濃度)100に対し、光触媒体の露出面と接する表面近傍の相対濃度が好ましくは150以上、より好ましくは200以上である場合)、該光触媒組成物において変性光触媒(A)と過酸化チタン(B)を含有するバインダー成分(B’)の質量比は、好ましくは(A)/(B’)=0.1/99.9〜40/60、より好ましくは(A)/(B’)=0.1/99.9〜30/70という変性光触媒(A)の含有量が非常に少ない範囲においてさえ形成される光触媒体は、光照射による十分な親水化能力(超親水化能力:20℃における水の接触角が10゜以下)や優れた光触媒活性を有する。また、この様に光触媒含有量が少ない光触媒体はバインダー成分本来の物性を発現するため、強度や柔軟性(耐屈曲性、耐衝撃性)等に優れたものとなる。
【0097】
本発明において光触媒体は本発明の光触媒組成物から形成したものである。
本発明の光触媒体は、皮膜状または成形体の様態であることが好ましい。
本発明における光触媒体を皮膜状とする場合は、例えば上記光触媒組成物を基材に塗布し、乾燥した後、所望により好ましくは20℃〜500℃、より好ましくは40℃〜250℃の熱処理や紫外線照射等を行い、基材上に皮膜を形成することにより得ることができる。上記塗布方法としては、例えばスプレー吹き付け法、フローコーティング法、ロールコート法、刷毛塗り法、ディップコーティング法、スピンコーティング法、スクリーン印刷法、キャスティング法、グラビア印刷法、フレキソ印刷法等が挙げられる。
この際、本発明の光触媒組成物から形成される皮膜の膜厚は、好ましくは0.1〜200μm、より好ましくは0.5〜20μm、さらに好ましくは1.5〜10μmである。
【0098】
なお、本明細書では、皮膜という表現を使用しているが、必ずしも連続膜である必要はなく、不連続膜、島状分散膜等の態様であっても構わない。
この様にして得られた基材上に本発明の光触媒体である皮膜を有する機能性複合体は、光照射により疎水性あるいは親水性及び/又は光触媒活性、さらには光電変換機能を発現することが可能である。即ち、本発明の別の態様においては、本発明の光触媒組成物から形成される光触媒体として、成形体や、基材上に皮膜を有する機能性複合体が提供される。
【0099】
本発明の機能性複合体を得るのに用いられる基材としては、特に限定はされなく、例えば本発明で開示した用途に使用される基材は全て用いることができる。
本発明の機能性複合体を得るのに用いられる基材としては、例えば合成樹脂、天然樹脂等の有機基材や、金属、セラミックス、ガラス、石、セメント、コンクリート等の無機基材や、それらの組み合わせ等を挙げることができる。また、合成樹脂、天然樹脂等を原料とする塗料で表面がコートされた基材も含まれる。
【0100】
本発明の機能性複合体においては、光触媒で分解する有機基材を用いた場合でも、耐久性は非常に優れたものとなる。すなわち、本発明の光触媒組成物は、耐久性の問題から従来用いることができなかった有機基材に対しても、耐久性の優れた機能性複合体を提供することができる。
本発明の機能性複合体の製造方法は、基材上に本発明の光触媒体を形成する場合に限定されない。基材と本発明の光触媒組成物を同時に成形、たとえば、一体成形、してもよい。また、本発明の光触媒組成物を成形後、基材の成形を行ってもよい。また、本発明の光触媒組成物と基材を個別に成形後、接着、融着等により機能性複合体としてもよい。上記方法で、本来の基材と接しない状態で成形する場合は別の基材を用いても良い。この場合の基材は固体に限定されず、本発明の効果を損なわない範囲で、液体、気体でも良い。
【0101】
本発明の成形体または機能性複合体は、必要により、樹脂成形に用いる方法により、フィルム、シート、ブロック、ペレットさらに複雑な形状の成形体とすることができる。成形にあたり、本発明の効果を損なわない範囲で、他の樹脂と併用する事も可能である。
上記成形や上記併用のための混合を、本発明の成形体または機能性複合体や他の樹脂を粉体あるいは予めペレットとして行うことができる。一部に液状成分を含んでも良い。また、混合後の樹脂を下記方法でペレットに成形し、さらに成形に供する方法も可能である。ペレットは本発明の成形体または機能性複合体を他の樹脂中に高濃度に含有した所謂マスターバッチとすることもできる。
【0102】
本発明のための成形方法は、押出し成形法、射出成形法、プレス成形法等が可能である。また、熱可塑性樹脂を併用する等、樹脂の選定によってはカレンダー成形法も可能である。また、天然繊維を含む有機繊維、ガラス等の無機繊維(及びこれらの織物を含む)などを補強材に用いて本発明の成形体または機能性複合体、及びこれらと他の樹脂混合物を含浸し、積層成形する事も可能である。
本発明の成形体または機能性複合体は繊維状とすることもできる。繊維状に加工するにためには、本発明の効果を阻害しない範囲で通常の紡糸方法が使用できる。当該紡糸方法としては溶融紡糸、溶液紡糸が用いられる。紡糸に当って、前述の他の樹脂とともに用いて繊維状に加工する事もできる。例えば、通常の樹脂(熱可塑性樹脂が成形上は好ましい)、たとえばポリエステル、ナイロン等に本発明の成形体または機能性複合体をブレンドしたり、あるいは本発明の成形体または機能性複合体とこれら樹脂を複合紡糸(鞘芯、サイドバイサイド型等)してもよい。
【0103】
繊維は、長繊維でも短繊維でもよく、長さ方向に均一なものや太細のあるものでもよく、断面形状においても丸型、三角、L型、T型、Y型、W型、八葉型、偏平、ドッグボーン型等の多角形型、多葉型、中空型や不定形なものでもよい。
繊維状とした本発明の成形体または機能性複合体は織物や不織布(短繊維又は長繊維)として用いる事もできる。
又、使用できる繊維の形態は、糸条、糸条の集合体であるチーズ状、織物、編物、不織布等が挙げられ、他の樹脂の繊維と混用されていても良い。糸条の形態としては、原糸、仮撚糸(延伸仮撚糸を含む)、先撚仮撚糸、空気噴射加工糸、リング紡績糸、オープンエンド紡績糸等の紡績糸、マルチフィラメント原糸(極細糸を含む)、混繊糸等が挙げられる。又、混用する繊維としては、ポリエステル系繊維、ポリアミド系繊維、ポリアクリル系繊維、ポリビニル系繊維、ポリプロピレン系繊維、ポリウレタン系等の弾性繊維(酸化マグネシウ ム、酸化亜鉛に代表される金属酸化物、金属水酸化物等の塩素水劣化防止剤を添加したものを含む)等の合成繊維や、綿、麻、ウール、絹等の天然繊維やキュプラ、レーヨン、ポリノジック等のセルロース系繊維やアセテート系繊維がある。
上記繊維状に加工した本願発明の成形体または機能性複合体は抗菌、防汚、防臭、有毒ガス分解を目的として衣料用、ガス、液体のフィルター用に用いることができる。
【0104】
本発明の光触媒体、あるいは光触媒体が基材に固定化された上記の機能性複合体は、それに含まれる変性光触媒(A)のバンドギャップエネルギーよりも高いエネルギーの光(該変性光触媒(A)が分光増感色素を有する場合は、該分光増感色素の吸収光を含む光)を照射することにより疎水性あるいは親水性及び/又は光触媒活性、さらには光電変換機能を示す。
【0105】
この際、変性光触媒(A)が、上述した式(1)で表されるトリオルガノシラン単位、式(2)で表されるモノオキシジオルガノシラン単位、式(3)で表されるジオキシオルガノシラン単位よりなる群から選ばれる少なくとも1種の構造単位を有する化合物類よりなる群から選ばれる少なくとも1種の変性剤化合物で変性処理されたものである場合、励起光照射により該変性光触媒(A)を構成する光触媒粒子(a)の近傍に存在する該変性剤化合物の珪素原子に結合した有機基(R)の少なくとも一部(好ましくは該変性剤化合物に含まれる珪素原子に結合した有機基(R)の1mol%以上)は、光触媒の分解作用により水酸基に置換される。その結果、本発明の光触媒体表面の親水性が高まると共に、生成した水酸基同士が脱水縮合反応してシロキサン結合が生成した場合には、該光触媒体の硬度が非常に高くなる。この様な状態は、本発明の様態において好ましい。
【0106】
また、バインダー成分として過酸化チタン(B)の他に上述したシリコーン系樹脂を含有するものを用いたときも同様に、励起光照射により光触媒粒子(a)の近傍に存在するシリコーンの珪素原子に結合した有機基の少なくとも一部は、光触媒の分解作用により水酸基に置換され、本発明の光触媒体表面の親水性が高まると共に、生成した水酸基同士の脱水縮合反応が進行しシロキサン結合が生成した場合には、該光触媒体の硬度が非常に高くなる。この様な状態は、本発明の様態において好ましい。
【0107】
本発明において、変性光触媒(A)のバンドギャップエネルギーよりも高いエネルギーの光(該変性光触媒(A)が分光増感色素を有する場合は、該分光増感色素の吸収光を含む光)の光源としては、太陽光や室内照明灯等の一般住宅環境下で得られる光の他、ブラックライト、キセノンランプ、水銀灯等の光が利用できる。
本発明によって提供される上記成形体又は機能性複合体であって、有機物分解等の光触媒活性を有するものは、抗菌、防汚、防臭、NOx分解等の様々な機能を発現し、大気、水等の環境浄化等の用途に使用することができる。
本発明によって提供される上記光触媒体又は機能性複合体であって、光照射により20℃における水との接触角が60゜以下(好ましくは10゜以下)となった親水性のもの(親水性膜、及び該親水性膜で被覆された基材等)は、鏡やガラスの曇りを防止する防曇技術、さらには建築外装等に対する防汚技術や帯電防止技術等への応用が可能である。
【0108】
本発明の光触媒体又は機能性複合体の防汚技術分野への応用例としては、例えば建材、建物外装、建物内装、窓枠、窓ガラス、構造部材、住宅等建築設備、特に便器、浴槽、洗面台、照明器具、照明カバー、台所用品、食器、食器洗浄器、食器乾燥器、流し、調理レンジ、キッチンフード、換気扇等、また、乗物の外装および塗装、用途によってはその内装にも使用でき、車両用照明灯のカバー、窓ガラス、計器、表示盤等透明性が要求される部材での使用に効果があり、また、機械装置や物品の外装、防塵カバーおよび塗装、表示機器、そのカバー、交通標識、各種表示装置、広告塔等の表示物、道路用、鉄道用等の遮音壁、橋梁、ガードレールの外装および塗装、トンネル内装および塗装、碍子、太陽電池カバー、太陽熱温水器集熱カバー等外部で使用される電子、電気機器の外装部、特に透明部材、ビニールハウス、温室等の外装、特に透明部材、また、室内にあっても汚染のおそれのある環境、たとえば医療用や体育用の施設、装置等の用途を挙げることができる。
【0109】
本発明の光触媒体又は機能性複合体の防曇技術分野への応用例としては、例えば鏡(車両用後方確認ミラー、浴室用鏡、洗面所用鏡、歯科用鏡、道路鏡等)、レンズ(眼鏡レンズ、光学レンズ、照明用レンズ、半導体用レンズ、複写機用レンズ、車両用後方確認カメラレンズ等)、プリズム、建物や環視塔の窓ガラス、乗物の窓ガラス(自動車、鉄道車両、航空機、船舶、潜水艇、雪上車、ロープウェイのゴンドラ、遊園地のゴンドラ、宇宙船等)、乗物の風防ガラス(自動車、オートバイ、鉄道車両、航空機、船舶、潜水艇、雪上車、スノーモービル、ロープウェイのゴンドラ、遊園地のゴンドラ、宇宙船等)、防護用ゴーグル、スポーツ用ゴーグル、防護用マスクのシールド、スポーツ用マスクのシールド、ヘルメットのシールド、冷凍食品陳列ケースのガラス、保温食品の陳列ケースのガラス、計測機器のカバー、車両用後方確認カメラレンズのカバー、レーザー歯科治療器等の集束レンズ、車間距離センサー等のレーザー光検知用センサーのカバー、赤外線センサーのカバー、カメラ用フィルター等の用途を挙げることができる。
【0110】
本発明の光触媒体又は機能性複合体の帯電防止技術分野への応用例としては、例えばブラウン管、磁気記録メディア、光記録メディア、光磁気記録メディア、オーディオテープ、ビデオテープ、アナログレコード、家庭用電気製品のハウジングや部品や外装および塗装、OA機器製品のハウジングや部品や外装および塗装、建材、建物外装、建物内装、窓枠、窓ガラス、構造部材、乗物の外装および塗装、機械装置や物品の外装、防塵カバーおよび塗装等の用途を挙げることができる。
【0111】
本発明によって提供される上記光触媒体又は機能性複合体であって、光照射により20℃における水との接触角が70゜以上(好ましくは90゜以上)となった疎水性のもの(疎水性の成形体や疎水性膜、及び該疎水性膜で被覆された基材等)は、防滴性や水切れ性の付与、水系汚れの付着防止や流水洗浄性を利用した防汚技術、さらには着氷雪防止技術等への応用が可能であり、窓ガラス、風防ガラス、鏡、レンズ、ゴーグル、カバー、碍子、建材、建物外装、建物内装、構造部材、乗物の外装及び塗装、機械装置や物品の外装、各種表示装置、照明装置、住宅設備、食器、台所用品、家庭用電気製品、屋根材、アンテナ、送電線、氷雪滑走具等の用途に使用することができる。
【0112】
本発明によって提供される上記光触媒体又は機能性複合体であって光電変換機能を有するものは、太陽エネルギーの電力変換等の機能を発現することが可能であり、(湿式)太陽電池等に用いる光半導体電極等の用途に使用することができる。
また、本発明によって提供される、光照射によって水との濡れ性が変化(疎水性から親水性への変化、あるいは親水性から疎水性への変化)する部材は、オフセット印刷用原版等への応用に対し非常に有用である。
【0113】
【実施例】
以下の実施例、参考例及び比較例により本発明を具体的に説明するが、これらは本発明の範囲を限定するものではない。
実施例、参考例及び比較例中において、各種の物性は下記の方法で測定した。1.粒径分布及び数平均粒子径
試料中の光触媒含有量が1〜20質量%となるよう適宜溶媒を加えて希釈し、湿式粒度分析計(日機装製マイクロトラックUPA−9230)を用いて測定した。
【0114】
2.重量平均分子量
ポリスチレン標品を用いて作成した検量線を用い、ゲルパーミエーションクロマトグラフィー(GPC)によって求めた。
GPCの条件は以下の通りである。
・装置:東ソー製HLC−8020 LC−3A型クロマトグラフ
・カラム:TSKgel G1000HXL、TSKgel G2000HXLおよびTSKgel G4000HXL(いずれも東ソー製)を直列に接続して用いた。
・データ処理装置:島津製作所製CR−4A型データ処理装置
・移動相:テトラヒドロフラン(フェニル基含有シリコーンの分析に使用)
クロロホルム(フェニル基を含有しないシリコーンの分析に使用)
・流速:1.0ml/min.
・サンプル調製法
移動相に使用する溶媒で希釈(濃度は0.5〜2重量%の範囲で適宜調節した)して分析に供した。
【0115】
3.赤外線吸収スペクトル
日本分光製FT/IR−5300型赤外分光計を用いて測定した。
4.29Si核磁気共鳴の測定
日本電子製JNM−LA400を用いて測定した。
5.皮膜硬度
JIS−K5400に準じ、鉛筆硬度(皮膜のすり傷)として求めた。
6.紫外線照射後の皮膜硬度
皮膜表面に、東芝ライテック製FL20S BLB型ブラックライトの光を7日間照射後、上記の方法(5)にて測定した。
なおこのとき、日本国トプコン製UVR−2型紫外線強度計{受光部として、日本国トプコン製UD−36型受光部(波長310〜400nmの光に対応)を使用}を用いて測定した紫外線強度が1mW/cm2となるよう調整した。
【0116】
7.皮膜表面に対する水の接触角
皮膜の表面に脱イオン水の滴を乗せ、20℃で1分間放置した後、協和界面科学製CA−X150型接触角計を用いて測定した。
皮膜に対する水の接触角が小さいほど、皮膜表面は親水性が高い。
8.紫外線照射前後の、皮膜表面の親水性(疎水性)の変化
皮膜の表面に、上記6の方法で紫外線を7日間照射した後、上記7の方法にて水の接触角を測定した。
【0117】
9.皮膜の光触媒活性
皮膜表面にメチレンブルーの5質量%エタノール溶液を塗布した後、上記6の方法にて紫外線を5日間照射した。
その後、光触媒の作用によるメチレンブルーの分解の程度(皮膜表面の退色の程度に基づき、目視で評価)に基づき、光触媒の活性を以下の3段階で評価した。
◎:メチレンブルーが完全に分解。
△:メチレンブルーの青色がわずかに残る。
×:メチレンブルーの分解はほとんど観測されず。
10.皮膜の耐候性(光沢保持率)
スガ試験器製DPWL−5R型デューパネル光コントロールウェザーメーターを使用して曝露試験(照射:60℃4時間、暗黒・湿潤:40℃4時間)を行った。曝露500時間後の60°−60°鏡面反射率を最終的な光沢値として測定し、これを初期光沢値で割り、この値を光沢保持率として算出した。
【0118】
11.光触媒の傾斜構造の評価
試料をDISCOエンジニアリングサービス製DAD321型ダイシングソーで粗切断した後、FIB(Focused Ion Beam)加工を行い、TEMによる塗膜断面の観察を実施した。
FIB加工条件は以下の通りである。
使用機器:日立製FB2000型
加工条件:加速電圧(30kV)
イオン源:Ga
また、TEM観察の条件は以下の通りである。
・装置:日立製HF2000型
・加速電圧:200kV
また、変性光触媒酸化チタンの存在場所は、変性剤に含有されるSi元素のEDX分析により解析した。
【0119】
12.耐薬品性
皮膜表面を、アセトンを浸した綿棒で20回こすり、皮膜表面の外観(目視で評価)に基づき、耐薬品性を以下の3段階で評価した。
◎:変化無し。
△:わずかに白化。
×:皮膜が破壊。
13.耐汚染性
試験板を一般道路(トラック通行量500〜1000台/日程度)に面したフェンスに3ケ月間張りつけた後、試験板表面を水洗し、汚染の度合いを目視にて評価した。
【0120】
[参考例2]
変性光触媒ヒドロゾル(A−1)の合成。
還流冷却器、温度計および撹拌装置を取りつけた反応器に、ジオキサン50gと、HMS−301−100GM(メチルハイドロジェンシロキサン−ジメチルシロキサンコポリマーの商品名(チッソ製)、Si−H基含量4.52mmol/g、重量平均分子量5400)50gを入れ、撹拌下80℃に昇温した。これにユニオックスPKA−5118[ポリオキシエチレンアリルメチルエーテルの商品名(日本油脂社製)、重量平均分子量800]25gと塩化白金(IV)酸六水和物の5重量%イソプロパノール溶液0.53gをジオキサン62.5gに溶解した溶液を80℃にて攪拌下約1時間かけて添加し、さらに80℃にて2時間攪拌を続けた後室温にまで冷却することにより、Si−H基含有ケイ素化合物(1)を含む溶液を得た。
【0121】
得られたSi−H基含有ケイ素化合物(1)を含む溶液4gに水100gを加えると、わずかに白濁した分散液となった。
また、得られたSi−H基含有ケイ素化合物(1)を含む溶液2.23gにブチルセロソルブ8gを添加・混合した後、1N水酸化ナトリウム水溶液8mlを添加すると、水素ガスが発生し、その体積は21℃において45.2mlであった。この水素ガス生成量から求めた、Si−H基含有ケイ素化合物(1)を含む溶液1g当りのSi−H基含量は0.825mmol/g(HMS−301−100GM 1g当たりに換算したSi−H基含量は約3.1mmol/g)であった。
【0122】
続いて、還流冷却器、温度計および撹拌装置を取りつけた反応器にタイノックA6[アナターゼ型酸化チタンゾルの商品名(多木化学製)、アンモニア解膠型、TiO2濃度6質量%、平均結晶子径10nm(カタログ記載値)]400gを入れ、これに合成したSi−H基含有ケイ素化合物(1)を含む溶液10.3gを室温30℃にて攪拌下約30分かけて添加し、さらに30℃にて10時間撹拌を続けることにより、非常に分散性の良好な変性光触媒ヒドロゾル(A−1)を得た。この時、Si−H基含有ケイ素化合物(1)の反応に伴い生成した水素ガス量は16℃において80mlであった。また、得られた変性酸化チタンヒドロゾルをKBr板上にコーティングしIRスペクトルを測定したところ、Ti−OH基の吸収(3630〜3640cm−1)の消失が観測された。
【0123】
また、図1、図2にそれぞれ変性処理前のタイノックA6及び得られた変性光触媒ヒドロゾル(A−1)の粒径分布を示す。得られた変性光触媒ヒドロゾル(A−1)の粒径分布は単一分散(数平均粒子径は13nm)であり、さらに変性処理前のタイノックA6の単一分散(数平均粒子径は10nm)の粒径分布が大きな粒径側に平行移動していることが分かる。
【0124】
[参考例2]
変性光触媒ヒドロゾル(A−2)の合成。
還流冷却器、温度計および撹拌装置を取りつけた反応器に、メチルエチルケトン50gと、HMS−301−100GM(参考例1と同じ)50gを入れ、撹拌下60℃に昇温した。これにジクロロ−ジシクロペンタジエニル−白金(II)の0.25%ジオキサン溶液1.6gを添加した後、ユニオックスPKA−5118(参考例1と同じ)25gをメチルエチルケトン25gに溶解した溶液を60℃にて攪拌下約30分かけて添加し、さらに60℃にて30分攪拌を続けた。これにパーフルオロオクチルエチレン10gとジクロロ−ジシクロペンタジエニル−白金(II)の0.25%ジオキサン溶液1.1gをメチルエチルケトン10gに溶解した溶液を60℃にて約1時間かけて添加し、さらに60℃にて8時間攪拌を続けた後室温にまで冷却することによりフルオロアルキル基を有するSi−H基含有ケイ素化合物(2)を含む溶液を得た。
【0125】
得られたSi−H基含有ケイ素化合物(2)を含む溶液4gに水100gを加えると、わずかに白濁した分散液となった。
また、得られたSi−H基含有ケイ素化合物(2)を含む溶液1.09gにブチルセロソルブ8gを添加・混合した後、1N水酸化ナトリウム水溶液8mlを添加すると、水素ガスが発生し、その体積は17℃において25.5mlであった。この水素ガス生成量から求めた、Si−H基含有ケイ素化合物(2)を含む溶液1g当りのSi−H基含量は0.96mmol/g(HMS−301−100GM 1g当たりに換算したSi−H基含量は約3.31mmol/g)であった。
【0126】
続いて、還流冷却器、温度計および撹拌装置を取りつけた反応器にタイノックA6(参考例1と同じ)300gを入れ、これに合成したSi−H基含有ケイ素化合物(2)を含む溶液15.5gを室温30℃にて攪拌下約30分かけて添加し、さらに30℃にて10時間撹拌を続けることにより、非常に分散性の良好な変性光触媒ヒドロゾル(A−2)を得た。この時、Si−H基含有ケイ素化合物(3)の反応に伴い生成した水素ガス量は16℃において140mlであった。
また、得られた変性酸化チタンヒドロゾルをKBr板上にコーティングしIRスペクトルを測定したところ、Ti−OH基の吸収(3630〜3640cm−1)の消失が観測された。
また、得られた変性光触媒ヒドロゾル(A−2)の粒径分布は単一分散(数平均粒子径は20nm)であった。
【0127】
[参考例3]
変性光触媒ヒドロゾル(A−3)の合成。
還流冷却器、温度計および撹拌装置を取りつけた反応器に、ジオキサン200gと、LS−7040[1,1,3,3−テトラメチルジシロキサンの商品名(信越化学工業製)]200gを入れ、撹拌下80℃に昇温した。これに、5−ノルボルネン−2,3−ジカルボン酸無水物20g及びジクロロ−ジシクロペンタジエニル−白金(II)の0.25質量%ジオキサン溶液10gをジオキサン70gに溶解した溶液を撹拌下80℃にて約30分かけて添加し、さらに80℃にて3時間攪拌を続けた後室温にまで冷却することにより、反応性基として環状酸無水物を有するSi−H基含有ケイ素化合物を含む溶液を得た。
【0128】
得られた反応性基を有するSi−H基含有ケイ素化合物を含む溶液0.488gに、ブチルセロソルブ8gを添加・混合した後、1N水酸化ナトリウム水溶液8mlを添加すると、水素ガスが発生し、その体積は25℃において68.0mlであった。この水素ガス生成量から求めた、反応性基を有するSi−H基含有ケイ素化合物を含む溶液1g当りのSi−H基含量は5.53mmol/gであった。
続いて、撹拌装置を取りつけた反応器に、上記反応性基を有するSi−H基含有ケイ素化合物を含む溶液125gを入れ、これにトリエチルアミン3gと水0.54gを添加し、10℃にて3時間撹拌を続けることにより親水性基としてカルボキシル基を有し、水に対する分散性が良好なSi−H基含有ケイ素化合物(3)を含む溶液を得た。
【0129】
還流冷却器、温度計および撹拌装置を有する反応器にTKS−203[酸化チタンヒドロゾルの商品名(テイカ製)、中性、TiO2濃度22質量%、平均結晶子径6nm(カタログ値)のもの]10.9g及び水29.1gを入れた後、合成したSi−H基含有ケイ素化合物(3)を含む溶液3gを40℃にて約5分かけて添加し、さらに40℃で12時間撹拌を続けることにより、非常に分散性の良好な変性光触媒ヒドロゾル(A−3)を得た。この時、反応に伴い生成した水素ガス量は23℃において252mlであった。
【0130】
また、得られた変性光触媒ヒドロゾル(A−3)をKBr板上にコーティングしIRスペクトルを測定したところ、Ti−OH基の吸収(3630〜3640cm−1)の消失が観測された。
また、得られた変性光触媒ヒドロゾル(A−3)の粒径分布は単一分散(数平均粒子径は19nm)であった。
【0131】
[参考例4]
過酸化チタン水溶液(B−1)の合成。
四塩化チタ ン(TiCl4 )60質量%水溶液10gに、2.5 質量%アンモニア水を約100g加えpH6〜7に中和させ、淡青味白色の水酸化チタン(Ti(OH)4)の沈殿物を得た。この沈殿物をデカンテーションを繰り返すことにより洗浄後、ウェット固形分40gにイオン交換水1.8kgを加えスラリーとし、これに30質量%過酸化水素水200gを添加することにより、黄色透明の過酸化チタン水溶液が得られた。これをエバポレーターで濃縮することにより、1.6質量%(酸化チタン換算)の過酸化チタン水溶液(B−1)を得た。
【0132】
[実施例1]
参考例4で合成した過酸化チタン水溶液(B−1)100gにNS−210[ポリエチレングリコール系アルキルフェノール型のノニオン性界面活性剤(日本油脂製)]の8質量%水溶液5gを添加し、これに参考例1で合成した変性光触媒ヒドロゾル(A−1)3.1gを室温にて撹拌下において添加して光触媒組成物(C−1)を得た。
50mm×60mmに裁断した厚さ1mmのアルミ板(JIS,H,4000(A1050P))にマイティラック白{アクリルウレタン樹脂塗料(2液混合型)の商品名(日本ペイント製)}をスプレー塗布し、室温にて3日間乾燥した。得られたアクリルウレタン塗装を行ったアルミ板に上記光触媒組成物(C−1)を膜厚が1〜2μmとなるようにスプレー塗布した後、室温で1時間乾燥し、80℃で30分加熱する事により、光触媒含有皮膜を有する試験板(D−1)を得た。
【0133】
得られた光触媒含有皮膜を有する試験板(D−1)の鉛筆硬度はHであり、水との接触角は95゜であった。また、耐薬品性も良好(◎)であった。
得られた光触媒含有皮膜を有する試験板(D−1)の紫外線(ブラックライト)照射後の鉛筆硬度は4Hであり、水の接触角は0゜であった。さらに光触媒活性評価の結果も非常に良好(◎)であった。
さらに、デューパネル光コントロールウェザーメーターによる曝露試験(1000時間後)による光沢保持率は89%であり、良好な耐候性を示した。
【0134】
また、得られた試験板(D−1)の耐汚染性評価の結果は、試験板表面に全く汚れは見受けられず、非常に良好な耐汚染性を示した。
得られた光触媒含有皮膜を有する試験板(D−1)の皮膜断面をTEMによる観察を行った結果、基材であるアクリルウレタン皮膜との界面には変性光触媒は存在せず、光触媒含有皮膜表面は全て変性光触媒で覆われていることが観察された。
【0135】
[実施例2]
参考例1で合成した変性光触媒ヒドロゾル(A−1)3.1gの代わりに参考例2で合成した変性光触媒ヒドロゾル(A−2)3.3gを用いる以外は実施例1と同様の操作を行って光触媒含有皮膜を有する試験板(D−2)を得た。
得られた光触媒含有皮膜を有する試験板(D−2)の鉛筆硬度はHBであり、水との接触角は122゜であった。また、耐薬品性も非常に良好(◎)であった。
得られた光触媒含有皮膜を有する試験板(D−2)の紫外線(ブラックライト)照射後の鉛筆硬度は4Hであり、水の接触角は0゜であった。さらに光触媒活性評価の結果も非常に良好(◎)であった。
【0136】
さらに、デューパネル光コントロールウェザーメーターによる曝露試験(1000時間後)による光沢保持率は92%であり、非常に良好な耐候性を示した。
また、得られた試験板(D−2)の耐汚染性評価の結果は、試験板表面に全く汚れは見受けられず、非常に良好な耐汚染性を示した。
得られた光触媒含有皮膜を有する試験板(D−2)の皮膜断面をTEMによる観察を行った結果、基材であるアクリルウレタン皮膜との界面には変性光触媒は存在せず、光触媒含有皮膜表面は全て変性光触媒で覆われていることが観察された。
【0137】
[実施例3]
参考例1で合成した変性光触媒ヒドロゾル(A−1)3.1gの代わりに参考例3で合成した変性光触媒ヒドロゾル(A−3)3.4gを用いる以外は実施例1と同様の操作を行って光触媒含有皮膜を有する試験板(D−3)を得た。
得られた光触媒含有皮膜を有する試験板(D−3)の鉛筆硬度はFであり、水との接触角は106゜であった。また、耐薬品性も非常に良好(◎)であった。得られた光触媒含有皮膜を有する試験板(D−3)の紫外線(ブラックライト)照射後の鉛筆硬度は3Hであり、水の接触角は0゜であった。さらに光触媒活性評価の結果も非常に良好(◎)であった。
【0138】
さらに、デューパネル光コントロールウェザーメーターによる曝露試験(1000時間後)による光沢保持率は86%であり、非常に良好な耐候性を示した。
また、得られた試験板(D−2)の耐汚染性評価の結果は、試験板表面に全く汚れは見受けられず、非常に良好な耐汚染性を示した。
得られた光触媒含有皮膜を有する試験板(D−2)の皮膜断面をTEMによる観察を行った結果、基材であるアクリルウレタン皮膜との界面には変性光触媒は存在せず、光触媒含有皮膜表面は全て変性光触媒で覆われていることが観察された。
【0139】
[比較例1]
参考例1で合成した変性光触媒ヒドロゾル(A−1)3.1gの代わりにタイノックA6(参考例1と同じ)3.0gを用いる以外は実施例1と同様の操作を行って光触媒含有皮膜(タイノックA6の含量は実施例1と同量)を有する試験板(D−4)を得た。
得られた光触媒含有皮膜を有する試験板(D−4)の鉛筆硬度は2Hであり、水との接触角は38゜であった。
また、得られた光触媒含有皮膜を有する試験板(D−4)の紫外線(ブラックライト)照射後の鉛筆硬度は3Hであり、水の接触角は28゜であった。さらに光触媒活性評価は悪い結果(×)であった。
また、得られた試験板(D−4)の耐汚染性評価の結果は、試験板表面には雨筋汚れが生じており、悪い結果であった。
【0140】
[比較例2]
参考例1で合成した変性光触媒ヒドロゾル(A−1)3.1gの代わりにタイノックA6(参考例1と同じ)17.8gを用いる以外は実施例1と同様の操作を行って光触媒含有皮膜(タイノックA6の含量は実施例1の4倍)を有する試験板(D−5)を得た。
得られた光触媒含有皮膜を有する試験板(D−5)の鉛筆硬度は2Hであり、水との接触角は18゜であった。
また、得られた光触媒含有皮膜を有する試験板(D−5)の紫外線(ブラックライト)照射後の鉛筆硬度は3Hであり、水の接触角は0゜であった。さらに光触媒活性評価の結果も非常に良好(◎)であった。
しかし、デューパネル光コントロールウェザーメーターによる200時間の曝露試験で、光沢保持率は10%以下となり、チョーキング現象が観察された。
【0141】
【発明の効果】
本発明の光触媒組成物は、有機基材との間の界面劣化や光触媒体中のバインダーの劣化を生じることが無く、光照射により長期にわたり、その表面が水の濡れ性(親水性、疎水性)の制御能及び/又は光触媒活性を発現する耐久性に優れた機能性複合体を煩雑な工程を必要とせずに提供することができる。
【図面の簡単な説明】
【図1】図1は、変性処理前のタイノックA6(市販の酸化チタンヒドロゾル)の粒径分布を、湿式粒度分析計を使用して測定した結果を示す図である。
【図2】図2は、参考例1で上記タイノックA6を変性処理して得られた変性光触媒ヒドロゾル(A−1)の粒径分布を、湿式粒度分析計を使用して測定した結果を示す図である。[0001]
TECHNICAL FIELD OF THE INVENTION
Since the present invention exhibits a decomposing action of a substance and a hydrophilizing action of a surface by light energy, the surface of a member of a photocatalyst represented by titanium oxide is known to be applied to fields such as environmental purification, antifouling, and antifogging. Related to immobilization technology.
[0002]
[Prior art]
Certain substances have light having energy larger than the energy gap (band gap) between the conduction band and the valence band of the substance, that is, light having a shorter wavelength than light corresponding to the band gap of the substance ( When the light is irradiated with excitation light, light energy excites electrons in the valence band (photoexcitation) to generate electrons in the conduction band and holes in the valence band. At this time, various chemical reactions can be performed by utilizing the reducing power of electrons generated in the conduction band and / or the oxidizing power of holes generated in the valence band.
[0003]
That is, the above substances can be used like a catalyst under excitation light irradiation. Therefore, the above-mentioned substances are called photocatalysts, and titanium oxide is known as the most typical example.
Examples of the chemical reaction promoted by the photocatalyst include oxidative decomposition reactions of various organic substances. Therefore, if this photocatalyst is immobilized on the surface of various substrates, various organic substances attached to the surface of the substrate can be oxidatively decomposed using light energy.
[0004]
On the other hand, it is known that irradiating a certain type of photocatalyst with light increases the hydrophilicity of the surface of the photocatalyst. Therefore, if the photocatalyst is immobilized on the surface of various substrates, it becomes possible to increase the hydrophilicity of the surface of the substrate by light irradiation.
In recent years, research for applying the characteristics of the above-described photocatalyst to various fields such as environmental purification, prevention of fouling of various substrates and prevention of fogging has been actively conducted. I have. In this case, a method for immobilizing the photocatalyst on the surface of various substrates plays a very important role.
[0005]
Various proposals have been made on a method for immobilizing a photocatalyst.
For example, Japanese Patent Application Laid-Open No. 60-044053 discloses a method in which a photocatalyst is fixed in a thin film form on a surface of a substrate by a sputtering method.
One of the particularly useful methods among these methods is to fix the photocatalyst on the surface of the substrate by coating the surface of the substrate with a composition containing the photocatalyst and forming a film containing the photocatalyst. Have been.
[0006]
When immobilizing the photocatalyst by this method,
(1) the photocatalyst can be firmly fixed to the surface of the substrate without impairing the activity of the photocatalyst; and
(2) It is required that the film to be formed and the substrate coated with the film have durability that does not deteriorate by the action of the photocatalyst.
Further, as preferable conditions for expanding the applicable range of the substrate to be immobilized,
(3) Under mild fixing conditions (room temperature to about 150 ° C.), it is required to form a film having excellent hardness and chemical resistance.
[0007]
Various proposals have been made on a method for immobilizing a photocatalyst by coating.
For example, in Japanese Patent Application Laid-Open No. 60-118236, after a precursor of a photocatalyst, for example, a sol containing an organic titanate is applied to the surface of a substrate, the precursor of the photocatalyst is gelled by firing and converted into a photocatalyst. There has been proposed a method of immobilizing the generated photocatalyst on the surface of a substrate. However, this method includes a step of forming fine crystals of the photocatalyst on the surface of the substrate, and this step requires firing at a high temperature. Therefore, when the surface area of the substrate is large, there is a disadvantage that it is difficult to fix the photocatalyst.
[0008]
Japanese Patent Application Laid-Open No. Hei 6-278241 discloses a method of using a sol containing a photocatalyst (therefore, it does not require a process for forming fine particles of a photocatalyst) by coating the surface of a substrate with a titanium oxide sol peptized in water. A way to do that has been proposed. However, since titanium oxide sol has no film-forming property under mild conditions, firing at a high temperature is also required in this method. In addition, the resulting coating is brittle and easily destroyed, and the photocatalyst falls off the surface of the substrate, so that the photocatalyst cannot be effective on the surface of the substrate.
[0009]
Also, in JP-A-9-221324, JP-A-9-262481, JP-A-10-53437 and JP-A-2000-280397, a mixture of titanium peroxide and titanium oxide which are hardly decomposed by the action of a photocatalyst is used. Then, a method of coating the surface of a substrate has been proposed. However, in these methods, when an organic substrate such as a plastic molded product, a film, and an organic coating film is used as a substrate for immobilizing the photocatalyst, the organic substrate is oxidatively decomposed by photocatalysis, and There is a disadvantage that interface deterioration between the film and the photocatalyst-containing film occurs, so that long-term durability cannot be maintained. Further, for the purpose of preventing the above-mentioned deterioration by the photocatalyst, a method of further interposing titanium peroxide as an organic base material protective layer between the photocatalyst-containing film and the organic base material has been proposed. However, there is a drawback that it is complicated, the workability is poor, the production loss increases and the cost increases, and it is very difficult to obtain a uniform film, and it is difficult to completely prevent the deterioration of the organic base material. .
[0010]
As a method for overcoming the above-mentioned various disadvantages of the prior art, we have developed a photocatalyst composition comprising a modified photocatalyst obtained by modifying the surface of photocatalyst particles with a silicone compound having a low surface energy and a binder having a higher surface energy. It was proposed (WO00-30747 pamphlet). The photocatalyst composition is such that the concentration of the photocatalyst particles is small near the interface in contact with the organic base material and forms a film that is anisotropically distributed in the surface direction such that it is largely distributed near the film surface. A photocatalytic film with high photocatalytic activity is formed without deterioration of the interface. However, even in this method, even when a silicone acrylic resin that is relatively unlikely to undergo photocatalytic degradation is used as a binder having a high surface energy, deterioration of the binder itself due to long-term photocatalysis cannot be completely prevented, and long-term There is a technical problem that it is difficult to obtain a photocatalyst fixing member having excellent durability.
[0011]
Japanese Patent Application Laid-Open No. 2001-64583 proposes a photocatalyst-containing coating composition that forms a gradient coating film containing photocatalyst particles, a silicone acrylic resin, and an aqueous solvent as essential components. In this case, the inclined coating film is obtained by orienting the acrylic resin component, which is a hydrophobic portion in the silicone acrylic resin, between the hydrophilic (high surface energy) photocatalyst particles and the substrate. In addition, an acrylic resin which is easily decomposed by a photocatalyst becomes essential, and as a result, the durability of the film itself becomes very poor.
[0012]
As a method for overcoming the drawbacks of the prior art of providing the above-mentioned gradient coating film, we further use a modified photocatalyst in which the surface of photocatalytic particles is modified with a silicone compound having a low surface energy and an inorganic binder having a high surface energy. A photocatalyst composition comprising phenyl silicone has been proposed (JP-A-2002-273233). However, from the photocatalyst composition, it is possible to form a photocatalyst-containing coating having good durability as expected, but it has excellent hardness and chemical resistance under mild fixing conditions (about room temperature to about 150 ° C.). It was not easy to form a film.
That is, in the method of immobilizing the photocatalyst on the surface of the base material by coating, a method that satisfies not only the above (1) and (2) but also all of the conditions (3) without requiring a complicated step is still required. unknown.
[0013]
[Patent Document 1]
JP-A-60-044053
[Patent Document 2]
JP-A-60-118236
[Patent Document 3]
JP-A-6-278241
[Patent Document 4]
JP-A-9-221324
[Patent Document 5]
JP-A-9-262481
[Patent Document 6]
JP-A-10-53437
[Patent Document 7]
JP 2000-280397 A
[Patent Document 8]
WO00-30747 pamphlet
[Patent Document 9]
JP 2001-64583 A
[Patent Document 10]
JP 2002-273233 A
[0014]
[Problems to be solved by the invention]
An object of the present invention is to provide a technique for fixing a photocatalyst which satisfies all of the above conditions (1), (2) and (3) without requiring complicated steps. Specifically, it does not cause deterioration of the interface between the organic base material and the photocatalyst film or the deterioration of the binder in the photocatalyst film, and has an excellent balance between hardness and the like and flexibility (bending resistance, impact resistance), By light irradiation, a functional complex having a surface with excellent controllability of water wettability (hydrophilicity, hydrophobicity) and / or photocatalytic activity can be obtained for a long time without a complicated process. To provide a photocatalyst composition that can be used.
[0015]
[Means for Solving the Problems]
The present inventors have intensively studied to solve the above-mentioned problems, and as a result, have reached the present invention.
That is, the present invention is as follows.
1. A photocatalyst composition containing modified photocatalyst particles (A) and titanium peroxide (B), wherein the modified photocatalyst particles (A) are obtained by converting a photocatalyst particle (a) into a triorganosilane represented by the formula (1). Unit, a monooxydiorganosilane unit represented by the formula (2), a dioxyorganosilane unit represented by the formula (3), and methylene fluoride (—CF2-) Characterized by being obtained by modifying with at least one modifier compound (b) selected from the group consisting of compounds having at least one structural unit selected from the group consisting of units. Photocatalyst composition.
R3Si- (1)
(Wherein, R is each independently a straight-chain or branched alkyl group having 1 to 30 carbon atoms, a cycloalkyl group having 5 to 20 carbon atoms, a straight-chain or branched Represents a fluoroalkyl group, a linear or branched alkenyl group having 2 to 30 carbon atoms, a phenyl group, an alkoxy group having 1 to 20 carbon atoms, or a hydroxyl group.)
− (R2SiO)-(2)
(In the formula, R is as defined in the formula (1).)
[0016]
Embedded image
[0017]
(In the formula, R is as defined in the formula (1).)
2. The photocatalyst composition according to Invention 1, wherein the number average particle diameter of the modified photocatalyst (A) is 400 nm or less.
[0018]
3. 3. The photocatalyst composition according to Invention 1 or 2, wherein the modifier compound (b) is a Si-H group-containing silicon compound (b1) represented by Formula (4).
HxRyQzSiO(4-xyz) / 2 (4)
(Wherein, R is each independently a straight-chain or branched alkyl group having 1 to 30 carbon atoms, a cycloalkyl group having 5 to 20 carbon atoms, a straight-chain or branched Represents a fluoroalkyl group, a linear or branched alkenyl group having 2 to 30 carbon atoms, a phenyl group, an alkoxy group having 1 to 20 carbon atoms, or a hydroxyl group.
In the formula, Q is a group containing at least one functionality-imparting group selected from the group consisting of (A) to (U) below.
(A) at least one hydrophilic group selected from the group consisting of a carboxyl group or a salt thereof, a phosphoric acid group or a salt thereof, a sulfonic acid group or a salt thereof, an amino group or a salt thereof, and a polyoxyalkylene group.
(I) epoxy group, acryloyl group, methacryloyl group, (cyclic) acid anhydride group, keto group, carboxyl group, hydrazine residue, isocyanate group, isothiocyanate group, hydroxyl group, amino group, cyclic carbonate group, thiol group, At least one reactive group selected from the group consisting of ester groups.
(U) at least one spectral sensitizing group;
Also, 0 <x <4, 0 <y <4, 0 ≦ z <4, and (x + y + z) ≦ 4. )
[0019]
4. A photocatalyst formed from the photocatalyst composition according to any one of Inventions 1 to 3.
5. The photocatalyst according to invention 4, which exhibits photocatalytic activity and / or hydrophilicity when irradiated with light having an energy higher than the band gap energy of the modified photocatalyst (A).
6. By irradiating light having an energy higher than the band gap energy of the modified photocatalyst (A), at least an organic group bonded to a silicon atom present near the photocatalyst particles (a) constituting the modified photocatalyst (A) is irradiated. The photocatalyst according to invention 4 or 5, wherein a part thereof is substituted with a hydroxyl group and / or a siloxane bond.
7. The photocatalyst according to any one of inventions 4 to 6, which is a film.
8. A functional composite comprising the photocatalyst according to any one of Inventions 4 to 7 formed on a substrate.
9. The photocatalyst has anisotropic distribution of the modified photocatalyst (A), and the concentration of the modified photocatalyst (A) is higher on the other exposed surface than on the surface of the photocatalyst that is in contact with the base material. The functional complex according to invention 8, wherein
[0020]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, the present invention will be described in detail.
The photocatalyst composition of the present invention contains modified photocatalyst particles (A) and titanium peroxide (B). From the photocatalyst composition of the present invention, it is possible to form a photocatalyst excellent in hardness, chemical resistance, weather resistance and the like and capable of exhibiting photocatalytic activity and / or hydrophilicity over a long period of time.
[0021]
In the present invention, the term "photocatalytic activity" means that an oxidation or reduction reaction is caused by light irradiation. These photocatalytic activities can be determined, for example, by measuring the decomposability of organic substances such as dyes when irradiating the material surface with light. The surface having photocatalytic activity exhibits excellent decomposition activity of contaminating organic substances and contamination resistance.
In the present invention, the term “hydrophilic” preferably refers to a case where the contact angle of water at 20 ° C. is 60 ° or less. It is preferable because it exhibits contamination resistance due to its self-cleaning ability (self-cleaning) with water. The contact angle of water on the surface is preferably 10 ° or less, and more preferably 5 ° or less, from the viewpoint of exhibiting more excellent stain resistance and antifogging property.
[0022]
The modified photocatalyst (A) of the present invention is obtained by modifying the photocatalyst particles (a) with at least one type of modifier compound (b) described below.
In the present invention, the term "modification" means that at least one type of modifier compound (b) described below is immobilized on the surface of the photocatalyst particles (a). It is considered that the above-mentioned modifier compound is immobilized on the surface of the photocatalyst particles by van der Waals force (physical adsorption) or chemical bonding. In particular, modification using a chemical bond is preferable because the interaction between the modifier compound and the photocatalyst is strong, and the modifier compound is firmly fixed to the surface of the photocatalyst particles.
[0023]
Examples of the photocatalyst particles (a) usable in the present invention include, for example, TiO.2, ZnO, SrTiO3, CdS, GaP, InP, GaAs, BaTiO3, BaTiO4, BaTi4O9, K2NbO3, Nb2O5, Fe2O3, Ta2O5, K3Ta3Si2O3, WO3, SnO2, Bi2O3, BiVO4, NiO, Cu2O, SiC, MoS2, InPb, RuO2, CeO2, Ta3N5And layered oxides having at least one element selected from Ti, Nb, Ta and V (for example, JP-A-62-74452, JP-A-2-172535, JP-A-7-24329). JP-A-8-89799, JP-A-8-89800, JP-A-8-89804, JP-A-8-198061, JP-A-9-248465, JP-A-10-99694, JP-A-10-244165, and nitrogen-doped titanium oxide (for example, JP-A-13-278625, JP-A-13-278627, JP-A-13-335321, JP-A-14-029750, JP-A No. 13-207082) and oxygen-deficient titanium oxide (for example, see JP-A-13-212457). Visual light responsive type titanium dioxide photocatalyst can also be suitably used. In addition, TaON, LaTiO2N, CaNbO2N, LaTaON2, CaTaO2Oxynitride compounds such as N and Sm2Ti2S2O7The oxysulfide compound such as has a large photocatalytic activity by visible light and can be suitably used.
[0024]
Furthermore, these photocatalyst particles were coated with a metal such as Pt, Rh, Ru, Nb, Cu, Sn, Ni, Fe and / or oxides thereof added or fixed, or coated with porous calcium phosphate or the like. A photocatalyst (for example, see JP-A-10-244166) can also be used.
The crystal particle diameter (primary particle diameter) of the photocatalyst particles (a) is preferably 1 to 400 nm, and more preferably a photocatalyst having a diameter of 1 to 50 nm is suitably selected.
Of these photocatalyst particles (a), titanium oxide is non-toxic, has excellent chemical stability, and is preferably irradiated with light, since the hydrophilicity of the titanium oxide itself is greatly increased.
As the titanium oxide, any crystal form among anatase type, rutile type and brookite type may be used. Also, the above-mentioned nitrogen-doped titanium oxide and oxygen-deficient titanium oxide which are responsive to visible light can be suitably used as the titanium oxide.
[0025]
In the present invention, the properties of the photocatalyst used are important factors for the dispersion stability of the modified photocatalyst (A), film formability, and expression of various functions. As the photocatalyst particles (a) used in the present invention, a photocatalyst particle having a number average dispersed particle diameter of a mixture of primary particles and secondary particles (only primary particles or secondary particles may be used) of 400 nm or less is used. Is desirable because the surface characteristics of the photocatalyst after modification can be used effectively. In particular, when photocatalyst particles having a number average dispersed particle diameter of 100 nm or less are used, a film having excellent transparency can be obtained from the resulting photocatalyst composition comprising the modified photocatalyst (A) and a binder component (B) described below. Very preferred for. More preferably, a photocatalyst particle having a size of 80 nm or less and 3 nm or more, further preferably 50 nm or less and 3 nm or more is suitably selected.
[0026]
As these photocatalyst particles (a), it is preferable to use a photocatalyst sol instead of a photocatalyst powder for the following reasons. In general, powder consisting of fine particles forms secondary particles in which single-crystal particles (primary particles) are strongly aggregated, so there are many wasted surface characteristics, but it is very difficult to disperse them into primary particles. It is. In contrast, in the case of a photocatalytic sol, the photocatalytic particles exist in a form close to the primary particles without dissolving, so that the surface characteristics can be effectively used. In addition to being excellent in the properties, various functions can be effectively exhibited, so that it can be preferably used. Here, the photocatalyst sol used in the present invention means that the photocatalyst particles are 0.01 to 70% by mass, preferably 0.1 to 50% by mass in water and / or an organic solvent as primary particles and / or secondary particles. It is distributed.
[0027]
Here, examples of the organic solvent used in the photocatalytic sol include alcohols such as ethylene glycol, butyl cellosolve, n-propanol, isopropanol, n-butanol, ethanol, and methanol; and aromatic hydrocarbons such as toluene and xylene. , Aliphatic hydrocarbons such as hexane, cyclohexane and heptane, esters such as ethyl acetate and n-butyl acetate, ketones such as acetone, methyl ethyl ketone and methyl isobutyl ketone, ethers such as tetrahydrofuran and dioxane, dimethylacetamide and dimethyl Examples include amides such as formamide, halogen compounds such as chloroform, methylene chloride, and carbon tetrachloride, dimethyl sulfoxide, nitrobenzene, and the like, and a mixture of two or more of these.
[0028]
Taking titanium oxide sol as an example of the photocatalyst sol, for example, titanium oxide hydrosol in which water is substantially used as a dispersion medium and titanium oxide particles are peptized therein can be used. (Here, “substantially using water as a dispersion medium” means that the dispersion medium contains about 80% by mass or more of water.) The preparation of such a sol is known and can be easily produced ( For example, see JP-A-63-17221, JP-A-7-819, JP-A-9-165218, JP-A-11-43327, and the like. For example, metatitanic acid produced by heating and hydrolyzing an aqueous solution of titanium sulfate or titanium tetrachloride is neutralized with aqueous ammonia, and the precipitated hydrous titanium oxide is filtered, washed, and dehydrated to obtain an aggregate of titanium oxide particles. Can be The aggregates are peptized under the action of nitric acid, hydrochloric acid, ammonia, or the like, and subjected to hydrothermal treatment or the like to obtain a titanium oxide hydrosol. In addition, as the titanium oxide hydrosol, one obtained by peptizing titanium oxide particles under the action of an acid or an alkali, or a dispersion stabilizer such as sodium polyacrylate as necessary without using an acid or an alkali, is used. Sols that are used and dispersed in water under strong shear can also be used. Furthermore, an anatase-type titanium oxide sol whose particle surface is modified with a peroxo group, which has excellent dispersion stability even in an aqueous solution having a pH around neutrality, can be easily obtained by the method proposed in, for example, JP-A-10-67516. Can be.
[0029]
The titanium oxide hydrosol described above is also commercially available as a titania sol. (For example, "STS-02" manufactured by Ishihara Sangyo Co., Ltd., "TO-240" manufactured by Tanaka Transcription Co., Ltd.)
The titanium oxide in the titanium oxide hydrosol is preferably at most 50% by mass, more preferably at most 30% by mass. More preferably, the content is 30% by mass or less and 0.1% by mass or more.
The viscosity (20 ° C.) of such hydrosols is relatively low. In the present invention, the viscosity of the hydrosol is preferably in the range of about 0.5 mPa · s to 2000 mPa · s. It is more preferably 1 mPa · s to 1000 mPa · s, and still more preferably 1 mPa · s to 500 mPa · s.
[0030]
Further, for example, a cerium oxide sol (for example, see JP-A-8-59235) or a layered oxide sol containing at least one element selected from the group consisting of Ti, Nb, Ta, and V (for example, JP-A-9-25123) JP-A-9-67124, JP-A-9-227122, JP-A-9-227123, JP-A-10-259023, and the like). Is known as well.
[0031]
Further, a photocatalyst organosol in which an organic solvent is substantially used as a dispersion medium and photocatalyst particles are dispersed therein is, for example, a compound having a phase transfer activity such as polyethylene glycol (eg, a different first phase and a second phase). A third phase is formed at the interface with the phase, and the first phase, the second phase, and the third phase are treated with a compound that dissolves and / or solubilizes each other and diluted with an organic solvent (for example, JP-A-10-167727), a method of preparing a sol by dispersing and transferring in an organic solvent insoluble in water with an anionic surfactant such as sodium dodecylbenzenesulfonate (for example, JP-A-58-29863). After adding an alcohol having a boiling point higher than that of water such as butylcellosolve or water to the photocatalyst hydrosol, the water can be removed by distillation (reduced pressure) or the like. A titanium oxide organosol in which an organic solvent is substantially used as a dispersion medium and titanium oxide particles are dispersed therein is commercially available (for example, “TKS-251” manufactured by Teica Corporation). Here, “substantially using an organic solvent as a dispersion medium” means that the dispersion medium contains about 80% by mass or more of an organic solvent.
[0032]
Since the titanium peroxide (B) used for the binder component of the present invention is usually handled as an aqueous system (aqueous solution or sol), a photocatalytic hydrosol is preferably used as the photocatalytic sol.
In the present invention, the at least one modifier compound (b) used to obtain the modified photocatalyst (A) is a triorganosilane unit represented by the formula (1) or a monooxy compound represented by the formula (2). A diorganosilane unit, a dioxyorganosilane unit represented by the formula (3), and methylene fluoride (—CF2-) Selected from the group consisting of compounds having at least one structural unit selected from the group consisting of units;
R3Si- (1)
(Wherein, R is each independently a straight-chain or branched alkyl group having 1 to 30 carbon atoms, a cycloalkyl group having 5 to 20 carbon atoms, a straight-chain or branched A fluoroalkyl group, a linear or branched alkenyl group having 2 to 30 carbon atoms, a phenyl group, an alkoxy group having 1 to 20 carbon atoms, or a hydroxyl group)
− (R2SiO)-(2)
(In the formula, R is as defined in the formula (1).)
[0033]
Embedded image
[0034]
(In the formula, R is as defined in the formula (1).)
In the modified photocatalyst (A) in which the surface of the photocatalyst particles is modified with the modifier compound (b) having the above-mentioned structural unit, the surface energy of the particle surface becomes very small.
In the present invention, the modification treatment of the photocatalyst particles (a) with the modifier compound (b) is carried out in the presence or absence of water and / or an organic solvent, in the presence or absence of water and / or an organic solvent. The compound (b) is preferably used in a mass ratio of (a) / (b) = 1/99 to 99.9 / 0.1, more preferably (A) / (b) = 10/90 to 99/1. It can be obtained by mixing, heating at preferably 0 to 200 ° C., more preferably 10 to 80 ° C., or changing the solvent composition of the mixture by (reduced pressure) distillation or the like.
[0035]
Here, in the case of performing the above-mentioned modification treatment, as the organic solvent that can be used, for example, aromatic hydrocarbons such as toluene and xylene, hexane, cyclohexane, aliphatic hydrocarbons such as heptane, ethyl acetate, n-butyl acetate and the like Esters, alcohols such as ethylene glycol, butyl cellosolve, isopropanol, n-butanol, ethanol and methanol; ketones such as acetone, methyl ethyl ketone and methyl isobutyl ketone; ethers such as tetrahydrofuran and dioxane; amides such as dimethylacetamide and dimethylformamide And halogen compounds such as chloroform, methylene chloride and carbon tetrachloride, dimethyl sulfoxide, nitrobenzene and the like, and a mixture of two or more thereof.
[0036]
Examples of the modifier compound (b) used to obtain the modified photocatalyst (A) of the present invention include a Si-H group, a hydrolyzable silyl group (alkoxysilyl group, hydroxysilyl group, halogenated silyl group, Acetoxysilyl group, aminoxysilyl group, etc.), epoxy group, acetoacetyl group, thiol group, acid anhydride group, etc., reactive with photocatalyst particles (a), silicon compound, fluoroalkyl compound, fluoroolefin polymer, etc. Can be mentioned.
[0037]
Other examples of the modifier compound (b) include, for example, a silicon compound having a structure that interacts with the photocatalyst particles (a) by van der Waals force, Coulomb force, or the like, for example, a polyoxyalkylene group or the like. , Fluoroalkyl compounds, fluoroolefin polymers and the like.
In the present invention, when the Si—H group-containing silicon compound (b1) represented by the composition formula (4) is used as the modifier compound (b), the surface of the photocatalyst particles can be modified very efficiently. preferable.
HxRyQzSiO(4-xyz) / 2 (4)
(Wherein, R is each independently a straight-chain or branched alkyl group having 1 to 30 carbon atoms, a cycloalkyl group having 5 to 20 carbon atoms, a straight-chain or branched Represents a fluoroalkyl group, a linear or branched alkenyl group having 2 to 30 carbon atoms, a phenyl group, an alkoxy group having 1 to 20 carbon atoms, or a hydroxyl group.
[0038]
In the formula, Q is a group containing at least one functional group that is selected from the group consisting of (A) to (U) below.
(A) at least one hydrophilic group selected from the group consisting of a carboxyl group or a salt thereof, a phosphoric acid group or a salt thereof, a sulfonic acid group or a salt thereof, an amino group or a salt thereof, and a polyoxyalkylene group.
(I) epoxy group, acryloyl group, methacryloyl group, (cyclic) acid anhydride group (in the present application, cyclic acid anhydride group and acyclic acid anhydride group are collectively represented), keto group, carboxyl group, hydrazine residue At least one reactive group selected from the group consisting of an isocyanate group, an isothiocyanate group, a hydroxyl group, an amino group, a cyclic carbonate group, a thiol group and an ester group.
(U) at least one spectral sensitizing group;
Also, 0 <x <4, 0 <y <4, 0 ≦ z <4, and (x + y + z) ≦ 4. )
[0039]
In the present invention, the modification treatment of the photocatalyst particles (a) with the Si—H group-containing silicon compound (b1) represented by the composition formula (4) is performed in the presence or absence of water and / or an organic solvent. The photocatalyst particles (a) and the Si-H group-containing silicon compound (b1) preferably have a mass ratio of (a) / (b1) = 1/99 to 99.9 / 0.1, more preferably (a) / ( b1) = 10/90 to 99/1, preferably by mixing at 0 to 200 ° C. By this modification operation, hydrogen gas is generated from the mixed solution, and when a photocatalyst sol is used as the photocatalyst particles (a), an increase in the average dispersed particle diameter is observed. Further, for example, when titanium oxide is used as the photocatalyst particles (a), a decrease in the Ti—OH group is caused by the above-described modification operation to be 3630 to 3640 cm in the IR spectrum.-1Is observed as a decrease in absorption.
[0040]
From these facts, when the Si—H group-containing silicon compound (b1) represented by the above formula (4) is selected as the modifier compound (b), the modified photocatalyst (A) of the present invention has a Si—H This is not a simple mixture of the group-containing silicon compound (b1) and the photocatalyst particles (a), but is very preferable because it is possible to predict that some interaction between the two is accompanied by a chemical reaction. In fact, the modified photocatalyst (A) obtained in this way has extremely excellent dispersion stability in a solvent, chemical stability, durability and the like.
[0041]
In the present invention, the modification treatment of the photocatalyst particles (a) with the Si—H group-containing silicon compound (b1) represented by the above formula (4) is preferably performed using a dehydrocondensation catalyst for the Si—H group. It can also be carried out at ~ 150 ° C.
In this case, the dehydrocondensation catalyst may be fixed to the photocatalyst particles (a) by a method such as a photoreduction method in advance, and may be modified with the Si—H group-containing silicon compound (b1). The photocatalyst particles (a) may be modified with the Si-H group-containing compound silicon (b1) in the presence.
Here, the dehydrocondensation catalyst for the Si-H group means a Si-H group and an active hydrogen group such as a hydroxyl group (Ti-OH group in the case of titanium oxide), a thiol group, an amino group, a carboxyl group, etc. present on the photocatalyst surface. And a substance that accelerates the dehydrocondensation reaction with water or the like. The use of the dehydrocondensation catalyst makes it possible to modify the surface of the photocatalyst particles under mild conditions.
[0042]
As the dehydrocondensation catalyst, for example, platinum group catalysts, that is, ruthenium, rhodium, palladium, osmium, iridium, a simple substance of platinum and its compound, and a simple substance of silver, iron, copper, cobalt, nickel, tin and the like and its compound. No. Of these, platinum group catalysts are preferred, and simple platinum and its compounds are particularly preferred.
Here, as the platinum compound, for example, platinum chloride (II), tetrachloroplatinic acid (II), platinum chloride (IV), hexachloroplatinic acid (IV), ammonium hexachloroplatinum (IV), hexachloroplatinum (IV) Potassium, platinum (II) hydroxide, platinum (IV) dioxide, dichloro-dicyclopentadienyl-platinum (II), platinum-vinylsiloxane complex, platinum-phosphine complex, platinum-olefin complex and the like can be used. .
[0043]
In the Si—H group-containing silicon compound represented by the above formula (4) of the present invention, the Si—H group is a preferable functional group for modifying the photocatalyst under mild conditions with good selectivity. On the other hand, the hydrolyzable group can be used for the modification of the photocatalyst in the same manner, but in order to suppress the side reaction and improve the stability of the resulting modified photocatalyst, the smaller the content, the better. preferable.
That is, as the Si—H group-containing silicon compound (b1) that can be suitably used in the present invention, for example, a Si—H group-containing silicon compound represented by the formula (5) can be mentioned.
HxR 'yQzSiO(4-xyz) / 2 (5)
(In the formula, R ′ is each independently a linear or branched alkyl group having 1 to 30 carbon atoms, a cycloalkyl group having 5 to 20 carbon atoms, a linear or branched carbon group having 1 to 30 carbon atoms. , A linear or branched alkenyl group having 2 to 30 carbon atoms, or a phenyl group.
[0044]
In the formula, Q is a group containing at least one functional group that is selected from the group consisting of (A) to (U) below.
(A) at least one hydrophilic group selected from the group consisting of a carboxyl group or a salt thereof, a phosphoric acid group or a salt thereof, a sulfonic acid group or a salt thereof, an amino group or a salt thereof, and a polyoxyalkylene group.
(I) epoxy group, acryloyl group, methacryloyl group, (cyclic) acid anhydride group, keto group, carboxyl group, hydrazine residue, isocyanate group, isothiocyanate group, hydroxyl group, amino group, cyclic carbonate group, thiol group, At least one reactive group selected from the group consisting of ester groups.
(U) at least one spectral sensitizing group;
Also, 0 <x <4, 0 <y <4, 0 ≦ z <4, and (x + y + z) ≦ 4. )
[0045]
Examples of the Si—H group-containing silicon compound (b1) represented by the general formula (4) that can be suitably used in the present invention include mono-Si—H represented by the formula (6) or (7). At least one Si-H group-containing silicon compound selected from the group consisting of a group-containing compound, a compound containing Si-H groups at both ends represented by the formula (8), and an H silicone compound represented by the formula (9). Can be mentioned.
[0046]
Embedded image
[0047]
(Where R1Are each independently a linear or branched alkyl group having 1 to 30 carbon atoms, a cycloalkyl group having 5 to 20 carbon atoms, a linear or branched fluoroalkyl having 1 to 30 carbon atoms. A alkenyl group having 2 to 30 carbon atoms, a phenyl group, an alkoxy group having 1 to 20 carbon atoms, a hydroxyl group, or a group consisting of at least one selected from siloxy groups represented by the formula (10).
-O- (R2 2SiO)n-SiR2 3 ... (10)
(Where R2Is independently at least one selected from a linear or branched alkyl group having 1 to 30 carbon atoms, a cycloalkyl group having 5 to 20 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, and a phenyl group Represents a group consisting of Further, n is an integer, and 0 ≦ n ≦ 1000. ))
H- (R1 2SiO)m-SiR1 2-Q (7)
(Where R1Is as defined in equation (6). Q is a group containing at least one functionality-imparting group selected from the group consisting of (A) to (U) below.
[0048]
(A) at least one hydrophilic group selected from the group consisting of a carboxyl group or a salt thereof, a phosphoric acid group or a salt thereof, a sulfonic acid group or a salt thereof, an amino group or a salt thereof, and a polyoxyalkylene group.
(I) epoxy group, acryloyl group, methacryloyl group, (cyclic) acid anhydride group, keto group, carboxyl group, hydrazine residue, isocyanate group, isothiocyanate group, hydroxyl group, amino group, cyclic carbonate group, thiol group, At least one reactive group selected from the group consisting of ester groups.
(U) at least one spectral sensitizing group;
m is an integer and 0 ≦ m ≦ 1000. )
H- (R1 2SiO)m-SiR1 2-H (8)
(Where R1Is as defined in equation (6). m is an integer and 0 ≦ m ≦ 1000. )
(R1HSiO)p(R1 2SiO)q(R1QSiO)r(R1 3SiO1/2)s... (9)
(Where R1Is as defined in equation (6), and Q is as defined in equation (7). p is an integer of 1 or more, q and r are 0 or an integer of 1 or more, (p + q + r) ≦ 10000, and s is 0 or 2. However, when (p + q + r) is an integer of 2 or more and s = 0, the H silicone compound is a cyclic silicone compound, and when s = 2, the H silicone compound is a chain silicone compound. )
[0049]
In the present invention, specific examples of the mono-Si-H group-containing compound represented by the above formula (6) include, for example, bis (trimethylsiloxy) methylsilane, bis (trimethylsiloxy) ethylsilane, bis (trimethylsiloxy) n-propylsilane , Bis (trimethylsiloxy) i-propylsilane, bis (trimethylsiloxy) n-butylsilane, bis (trimethylsiloxy) n-hexylsilane, bis (trimethylsiloxy) cyclohexylsilane, bis (trimethylsiloxy) phenylsilane, bis (triethylsiloxy) ) Methylsilane, bis (triethylsiloxy) ethylsilane, tris (trimethylsiloxy) silane, tris (triethylsiloxy) silane, pentamethyldisiloxane, 1,1,1,3,3,5,5-heptamethyltrisiloxy 1,1,1,3,3,5,5,6,6-nonamethyltetrasiloxane, trimethylsilane, ethyldimethylsilane, methyldiethylsilane, triethylsilane, phenyldimethylsilane, diphenylmethylsilane, cyclohexyldimethylsilane , T-butyldimethylsilane, di-t-butylmethylsilane, n-octadecyldimethylsilane, tri-n-propylsilane, tri-i-propylsilane, tri-i-butylsilane, tri-n-hexylsilane, triphenyl Examples thereof include silane, allyldimethylsilane, 1-allyl-1,1,3,3-tetramethyldisiloxane, chloromethyldimethylsilane, and 7-octenyldimethylsilane.
[0050]
Among these mono-Si-H group-containing compounds, bis (trimethylsiloxy) methylsilane, tris Those having a siloxy group in the molecule, such as (trimethylsiloxy) silane and pentamethyldisiloxane, are preferred.
[0051]
In the present invention, specific examples of the compound having a Si—H group at both ends represented by the above formula (8) include, for example, 1,1,3,3-tetramethyldisiloxane, 1,1,3,3,5 H-terminal polydimethylsiloxanes having a number average molecular weight of 50,000 or less, such as 1,5-hexamethyltrisiloxane and 1,1,3,3,5,5,7,7-octamethyltetrasiloxane; Number average molecular weight of 50,000 or less such as 3-tetraethyldisiloxane, 1,1,3,3,5,5-hexaethyltrisiloxane, 1,1,3,3,5,5,7,7-octaethyltetrasiloxane H-terminal polydiethylsiloxanes, 1,1,3,3-tetraphenyldisiloxane, 1,1,3,3,5,5-hexaphenyltrisiloxane, 1,1,3,3,5,5 , 7,7-octaf H-terminal polydiphenylsiloxanes having a number average molecular weight of 50,000 or less such as nyltetrasiloxane, 1,3-diphenyl-1,3-dimethyl-disiloxane, 1,3,5-trimethyl-1,3,5-triphenyl H-terminal polyphenylmethylsiloxanes having a number average molecular weight of 50,000 or less, such as trisiloxane, 1,3,5,7-tetramethyl-1,3,5,7-tetraphenyl-tetrasiloxane, dimethylsilane and ethylmethyl Examples thereof include silane, diethylsilane, phenylmethylsilane, diphenylsilane, cyclohexylmethylsilane, t-butylmethylsilane, di-t-butylsilane, n-octadecylmethylsilane, and allylmethylsilane.
[0052]
The compound having a Si—H group at both ends represented by the formula (8) used in the present invention has a number average molecular weight from the viewpoint of dispersion stability (prevention of aggregation of photocatalyst particles) during the modification treatment of the photocatalyst. Preferably, a compound containing a Si-H group at both ends is preferably 10,000 or less, more preferably 2,000 or less, and still more preferably 1,000 or less.
As the H silicone compound represented by the above formula (9) that can be used in the present invention, the number average molecular weight is preferably from the viewpoint of dispersion stability (prevention of aggregation of photocatalyst particles) at the time of photocatalytic modification treatment. H silicone compounds of 10,000 or less, more preferably 5000 or less, and even more preferably 2000 or less can be suitably used.
[0053]
Further, as the Si—H group-containing silicon compound (b1) represented by the general formula (4), a compound having a functional group-providing group-containing group (Q) (in the formulas (7) and (9), r Is preferably a positive number of 1 or more), because various functions can be imparted to the modified photocatalyst (A) obtained in the present invention.
Here, the functional group-providing group-containing group (Q) is preferably a group represented by the following formula (11).
-Z- (W)a ... (11)
(In the formula, Z represents an a-valent organic group having a molecular weight of 14 to 50,000, and W represents at least one selected from the group consisting of functional groups (A) to (U) in the above formula (4). And a is an integer of 1 to 20.)
[0054]
For example, as the functional group-containing group (Q), a monovalent group containing a carboxyl group or a salt thereof, a monovalent group containing a phosphate group or a salt thereof, a monovalent group containing a sulfonic acid group or a salt thereof, When a compound having at least one hydrophilic group [(a) in the formula (4)] selected from the group consisting of a monovalent group containing an amino group or a salt thereof and a polyoxyalkylene group is selected, the modified compound is obtained. The dispersion stability of the photocatalyst (A) in water becomes very good. The storage stability of the photocatalyst composition of the present invention containing the modified photocatalyst (A) modified with the modifier (b1) having such a hydrophilic group and the titanium peroxide (B) is extremely excellent. Is preferable.
[0055]
Examples of the functional group-containing group (Q) include an epoxy group, an acryloyl group, a methacryloyl group, a (cyclic) acid anhydride group, a keto group, a carboxyl group, a hydrazine residue, an isocyanate group, an isothiocyanate group, and a hydroxyl group. When a group containing at least one reactive group [(i) in the formula (4)] selected from the group consisting of an amino group, a cyclic carbonate group, a thiol group and an ester group is selected, the modified photocatalyst of the present invention ( A) is preferable because it has a crosslinking property and improves the hardness and chemical resistance of the photocatalyst formed from the photocatalyst composition of the present invention.
[0056]
Further, for example, when a group having a spectral sensitizing group is selected as the functional group-containing group (Q), the modified photocatalyst (A) of the present invention can be used not only in the ultraviolet region but also in the visible light region and / or the infrared light region. The catalytic activity and the photoelectric conversion function can also be exhibited by irradiating the region with light.
Here, the spectral sensitizing group means a group derived from various metal complexes or organic dyes (that is, sensitizing dyes) having absorption in a visible light region and / or an infrared light region.
[0057]
Examples of sensitizing dyes include xanthene dyes, oxonol dyes, cyanine dyes, merocyanine dyes, rhodocyanine dyes, styryl dyes, hemicyanine dyes, merocyanine dyes, phthalocyanine dyes (including metal complexes), Porphyrin-based dyes (including metal complexes), triphenylmethane-based dyes, perylene-based dyes, coronene-based dyes, azo-based dyes, nitrophenol-based dyes, and further, for example, JP-A-1-220380 and Patent Application Publication 5- The complex of ruthenium, osmium, iron, and zinc described in Japanese Patent No. 504023, and other metal complexes such as ruthenium red can be exemplified.
[0058]
Among these sensitizing dyes, they have absorption in the wavelength region of 400 nm or more, and have a feature that the energy level of the lowest unoccupied orbital (redox potential in the excited state) is higher than the energy level of the conduction band of the photocatalyst. Are preferred. Such sensitizing dyes are characterized by measuring light absorption spectra in the infrared, visible, and ultraviolet regions, and measuring oxidation-reduction potential by an electrochemical method (for example, T. Tani, Photogr. Sci. Eng., 14, 72 (1970); RW Berriman et al., Ibid., 17.235 (1973); PB Gilman Jr., ibid., 18, 475 (1974)), and the molecular orbital method. Calculation of energy levels (eg, T. Tani et al., Photogr. Sci. Eng., 11, 129 (1967); DM Sturmer et al., Ibid., 17.146 (1973); ibid., 18 , 49 (1974); RG Selby et al., Opt. Soc. Am., 33, 1 (1970), etc., and the presence or absence of electromotive force by light irradiation of a Gratzel-type wet solar cell prepared with a photocatalyst and a spectral sensitizing dye, efficiency, and the like. .
Examples of the sensitizing dye having the above characteristics include a compound having a 9-phenylxanthene skeleton, a ruthenium complex containing a 2,2-bipyridine derivative as a ligand, a compound having a perylene skeleton, a phthalocyanine-based metal complex, and a porphyrin-based Metal complexes and the like can be mentioned.
[0059]
In the present invention, as a method for obtaining the Si—H group-containing silicon compound having the above-described functional group-providing group-containing group (Q),
(Q-1): a carbon-carbon unsaturated compound having a Si-H group-containing compound represented by the following general formula (12) and a functional group ([A) to (U) in formula (4)). A method in which a binding compound is subjected to a hydrosilylation reaction.
(Q-2): A silicon-containing silicon compound represented by the following general formula (12) and a carbon-carbon unsaturated bond compound having a reactive group [(i) in the formula (4)] are hydrosilyl A method of reacting the reactive group with a functional group-containing compound having a reactivity after obtaining a Si-H group-containing silicon compound having a reactive group.
H(X + z)RySiO(4-xyz) / 2 (12)
(Wherein, R is each independently a straight-chain or branched alkyl group having 1 to 30 carbon atoms, a cycloalkyl group having 5 to 20 carbon atoms, a straight-chain or branched Represents a fluoroalkyl group, a linear or branched alkenyl group having 2 to 30 carbon atoms, a phenyl group, an alkoxy group having 1 to 20 carbon atoms, or a hydroxyl group.
[0060]
Further, 0 <(x + z) <4, 0 <y <4, and (x + y + z) ≦ 4. First, the method (Q-1) described above (hereinafter, (Q-1) -method) will be described as a method for obtaining a silicon compound having a Si—H group having a functional group (Q). In the (Q-1) -method, the carbon-carbon unsaturated bond compound used to introduce a hydrophilic group as a functional group into the Si—H group-containing silicon compound represented by the above formula (12) includes: At least one hydrophilic group selected from the group consisting of carboxyl groups or salts thereof, phosphoric acid groups or salts thereof, sulfonic acid groups or salts thereof, amino groups or salts thereof, polyoxyalkylene groups, and (cyclic) acid anhydrides Examples include olefins having a group, allyl ethers, vinyl ethers, vinyl esters, (meth) acrylates, and styrene derivatives.
[0061]
Preferable specific examples of the carbon-carbon unsaturated bond compound having a hydrophilic group include, for example, a polyoxyethylene group-containing allyl ether represented by the formula (13), and 5-norbornene-2,3-dicarboxylic anhydride. And allyl succinic anhydride.
CH2= CHCH2O (CH2CH2O)bR3 (13)
(In the formula, b represents an integer of 1 to 1000. R3Represents a hydrogen atom or a linear or branched alkyl group having 1 to 30 carbon atoms. )
Examples of the carbon-carbon unsaturated bond compound used to introduce a reactive group into the Si-H group-containing silicon compound represented by the above formula (12) include an epoxy group, a (meth) acryloyl group, and a (cyclic) compound. Olefin having at least one reactive group selected from the group consisting of acid anhydride groups, keto groups, carboxyl groups, hydrazine residues, isocyanate groups, isothiocyanate groups, hydroxyl groups, amino groups, cyclic carbonate groups, and ester groups , Allyl ethers, allyl esters, vinyl ethers, vinyl esters, (meth) acrylates, styrene derivatives and the like.
[0062]
Preferred specific examples of the carbon-carbon unsaturated bond compound having the reactive group include, for example, allyl glycidyl ether, glycidyl (meth) acrylate, allyl (meth) acrylate, diallyl ether, diallyl phthalate, vinyl (meth) acrylate , Vinyl crotonate, ethylene glycol di (meth) acrylate, maleic anhydride, 5-norbornene-2,3-dicarboxylic anhydride, 5-hexen-2-one, allyl isocyanate, allyl alcohol, ethylene glycol monoallyl Ether, allylamine, allyl isothiocyanate, allyl semicarbazide, (meth) acrylic acid hydrazide, 4-allyloxymethyl-2-oxo-1,3-dioxolane and the like can be mentioned.
[0063]
Examples of the carbon-carbon unsaturated bond compound used for introducing the spectral sensitizing group into the Si—H group-containing silicon compound represented by the formula (12) include olefins having the spectral sensitizing dye described above, Examples include allyl ethers, allyl esters, vinyl ethers, vinyl esters, (meth) acrylates, and styrene derivatives. These can be easily obtained, for example, by reacting the above-described carbon-carbon unsaturated bond compound having a reactive group with a spectral sensitizing dye having reactivity with the reactive group.
[0064]
For example, the reactive group of the carbon-carbon unsaturated bond compound having a reactive group is an epoxy group, (cyclic) acid anhydride group, isocyanate group, isothiocyanate group, cyclic carbonate group, ester group, keto group, (meth) The acryloyl group is a spectral sensitizing dye having at least one functional group selected from the group consisting of an amino group, a carboxyl group, a hydroxyl group, a hydrazine residue, and a (meth) acryloyl group. When the reactive group of the carbon-carbon unsaturated bond compound has an amino group, a carboxyl group, a hydroxyl group, a hydrazine residue, or a (meth) acryloyl group, an epoxy group, a (cyclic) acid anhydride group, an isocyanate group, or an isothiocyanate At least one functional group selected from the group consisting of a group, a cyclic carbonate group, an ester group, a keto group, and a (meth) acryloyl group Include the spectral sensitizing dye having a.
[0065]
The reaction between the carbon-carbon unsaturated bond compound having the reactive group and the spectral sensitizing dye having reactivity with the compound is performed under the reaction conditions such as a reaction temperature, a reaction pressure, and a solvent according to the type of each reactive group. Can be selected and implemented. At that time, from the viewpoint of the stability of the spectral sensitizing dye, the reaction temperature is preferably 300 ° C. or lower, more preferably 150 ° C. or lower and 0 ° C. or higher.
In the (Q-1) -method, the hydrosilylation reaction between the carbon-carbon unsaturated bond compound and the Si—H group-containing silicon compound represented by the formula (12) is preferably carried out in the presence of a catalyst in the presence of an organic solvent. The carbon-carbon unsaturated bond compound (E) and the Si—H group-containing silicon compound (b1 ′) represented by the formula (14) at 0 to 200 ° C. in the presence or absence of /(B1′)=0.01 or more, more preferably (E) / (b1 ′) = 0.01 to 2, more preferably (E) / (b1 ′) = 0.01 to 1 Can be performed.
[0066]
As the catalyst for the hydrosilylation reaction, a platinum group catalyst, that is, a compound of ruthenium, rhodium, palladium, osmium, iridium, and platinum is suitable, and a compound of platinum and a compound of palladium are particularly preferable. Examples of the platinum compound include platinum (II) chloride, tetrachloroplatinic acid (II), platinum chloride (IV), hexachloroplatinic acid (IV), ammonium hexachloroplatinum (IV), potassium hexachloroplatinum (IV), and hydroxide. Platinum (II), platinum dioxide (IV), dichloro-dicyclopentadienyl-platinum (II), platinum-vinylsiloxane complex, platinum-phosphine complex, platinum-olefin complex and platinum alone, alumina, silica and activated carbon What carried solid platinum is mentioned. Examples of the palladium compound include palladium (II) chloride, ammonium tetraammonium palladium (II) chloride, palladium (II) oxide and the like.
[0067]
Examples of the organic solvent that can be used for the hydrosilylation reaction include, for example, aromatic hydrocarbons such as toluene and xylene, hexane, cyclohexane, aliphatic hydrocarbons such as heptane, ethyl acetate, esters such as n-butyl acetate, Ketones such as acetone, methyl ethyl ketone and methyl isobutyl ketone, ethers such as tetrahydrofuran and dioxane, amides such as dimethylacetamide and dimethylformamide, halogen compounds such as chloroform, methylene chloride and carbon tetrachloride, dimethyl sulfoxide, nitrobenzene and the like A mixture of two or more of these may be mentioned.
[0068]
Next, as a method for obtaining a Si-H group-containing silicon compound having a functional group, a method (Q-2) described above (hereinafter, (Q-2) -method) will be described.
As the carbon-carbon unsaturated bond compound having a reactive group used in the (Q-2) -method, those described in the (Q-1) -method can be exemplified. Further, the hydrosilylation reaction between the Si-H group-containing silicon compound represented by the above formula (14) and the carbon-carbon unsaturated bond compound having the reactive group was described in (Q-1) -Method. It can be carried out under the same conditions as the hydrosilylation reaction.
[0069]
According to the (Q-2) -method, a Si-H group-containing silicon compound having a reactive group can be obtained by the hydrosilylation reaction. The reaction between the Si-H group-containing silicon compound having a reactive group and the functional group-providing group-containing compound having reactivity with the compound is performed by a reaction such as a reaction temperature, a reaction pressure, or a solvent depending on the type of each reactive group. It can be implemented by selecting conditions. At that time, from the viewpoint of the stability of the Si—H group, the reaction temperature is preferably 300 ° C. or lower, more preferably 150 ° C. or lower and 0 ° C. or higher.
[0070]
Further, a preferred embodiment of the modified photocatalyst (A) of the present invention has a number average dispersed particle diameter of a mixture of primary particles and secondary particles of the modified photocatalyst of 400 nm or less, more preferably 1 nm or more and 100 nm or less, particularly preferably 5 nm or more. It is 80 nm or less. It is preferably in a sol state.
In addition, when a modified photocatalyst sol having a number average dispersed particle diameter of 100 nm or less is used for the photocatalyst composition of the present invention, the concentration of the modified photocatalyst particles in the photocatalyst formed from the inside or the photocatalyst is reduced. It is advantageous to form a photocatalyst that is small in the vicinity of the interface in contact with the base material and is large in the vicinity of the surface of the surface layer, which is the exposed surface of the photocatalyst. Is very preferred. Such a modified photocatalytic sol can be obtained by using the above-described photocatalytic sol as the photocatalyst particles (a) to be modified with the modifier compound (b).
Conventionally, a numerical value simply indicated as a particle size in titanium dioxide or the like is a primary particle size (crystallite size) in many cases, and is not a numerical value in consideration of a secondary particle size due to aggregation.
[0071]
In particular, when a modified photocatalyst sol having a number average dispersed particle diameter of 100 nm or less is used for the photocatalyst composition of the present invention, the concentration of the modified photocatalyst particles is small inside the photocatalyst or near the interface where the photocatalyst contacts the substrate, It is advantageous to form a photocatalyst that is anisotropically distributed in the surface direction such that the photocatalyst is largely distributed near the surface of the surface layer, which is the exposed surface of the photocatalyst, and is very preferable because a photocatalyst having high photocatalytic activity is formed. Such a modified photocatalyst sol can be obtained by using the above-described photocatalyst sol as a photocatalyst to be modified with the modifier compound (b).
Conventionally, a numerical value simply indicated as a particle size in titanium dioxide or the like is a primary particle size (crystallite size) in many cases, and is not a numerical value in consideration of a secondary particle size due to aggregation.
The photocatalyst composition of the present invention is characterized by containing the above-mentioned modified photocatalyst (A) and titanium peroxide (B), and the mass ratio (A) / (B) is 0.1 / 99.9 to 95. / 5 is preferable, and (A) / (B) is more preferably included in a range of 1/99 to 50/50.
[0072]
Titanium peroxide (B) used in the present invention is also referred to as peroxotitanic acid or peroxytitanic acid, and refers to a compound having a titanium peroxide group (Ti—O—O—H). Is H4TiO5, Ti (OOH) (OH)3Or TiO3・ 2H2It is indicated by O or the like. The presence of the titanium peroxide group is, for example, 900 cm in infrared spectroscopy.-1Its presence can be confirmed as a peak of a peroxide group bonded to Ti that appears in the vicinity. However, the peroxide group of the dried coating film is not a stable substance, and gradually disappears spontaneously after drying, and can be positively removed by light or heat.
[0073]
In the present invention, the titanium peroxide (B) can be prepared by a known method. For example, a method using titanium tetrachloride as a starting material (for example, JP-A-9-71418), A method using a raw material (for example, Japanese Patent Application Laid-Open No. 62-252302), a method using a titanium alkoxide as a raw material (for example, Japanese Patent Application Laid-Open No. 62-252319), and a method using an organic titanate (for example, “Building equipment and piping work”). 1998, June, p. 6). For example, in the method using titanium tetrachloride as a starting material (for example, JP-A-9-71418), a titanium tetrachloride aqueous solution is hydrolyzed with aqueous ammonia to form a slurry containing titanium hydroxide, which is washed. Thereafter, an aqueous solution of titanium peroxide can be obtained by adding hydrogen peroxide. As the titanium peroxide, those commercially available as a yellow, yellow-brown or red-brown transparent viscous aqueous solution (sol solution) can also be used. Examples of commercially available products include “PTA-85” and “PTA-170” (both manufactured by Tanaka Transcription Co., Ltd.) and “TKC-301” (manufactured by Teika Co., Ltd.).
[0074]
In addition, as the titanium peroxide (B) used in the present invention, viscous amorphous titanium peroxide (for example, JP-A-10-53437) can be preferably used. The viscous amorphous titanium peroxide is transparent and yellow and viscous, has not been crystallized in an anatase type titanium oxide yet in an amorphous state at normal temperature, and has a water-repellent substrate And all types of base materials. In addition, the film has a high film-forming property, a uniform and flat thin film can be easily formed, and the dried film has a property of being insoluble in water.
[0075]
The above-mentioned "viscous amorphous titanium peroxide" is manufactured by using titanium tetrachloride TiCl4By changing the pH during the reaction between an aqueous solution of a titanium salt such as the above and an aqueous ammonia or an alkali hydroxide such as sodium hydroxide in an acidic region, preferably in the range of pH 2 to 6, to increase the concentration to 0.2. By changing the amount within the range of 0.6% by mass, a material having various viscosities can be obtained, and various uses can be considered depending on the viscosity. However, from the purpose of forming a thin film having a uniform film thickness, It is desirable to have a uniform semi-jelly-like viscosity.
[0076]
It is known that the above-mentioned titanium peroxide (B) used as a binder component of the present invention is strong on the surface of a substrate, hardly causes cracks and peeling, and can form a film having excellent durability. Further, the photocatalyst composition comprising the titanium peroxide (B) and the modified photocatalyst (A) of the present invention forms a photocatalyst excellent in photocatalytic activity, hydrophilizing ability, etc. even when the photocatalyst content is small. Therefore, the photocatalyst can sufficiently exhibit the above excellent properties of titanium peroxide acting as a binder.
[0077]
The binder component used in the photocatalyst composition of the present invention may optionally contain a resin (F) with respect to the titanium peroxide (B), preferably in a mass ratio of (B) / (F) = 0.1. /99.9 to 100/0, more preferably (B) / (F) = 10/90 to 100/0.
As the resin (F), all synthetic resins and natural resins can be used. The form may be in a solvent-free state (pellet, powder, liquid, or the like) or may be dissolved or dispersed in a solvent, and is not particularly limited.
[0078]
As the synthetic resin, a thermoplastic resin and a curable resin (a thermosetting resin, a photocurable resin, a moisture-curable resin, and the like) can be used. For example, an acrylic resin, a methacrylic resin, a fluororesin, an alkyd resin, Aminoalkyd resin, vinyl resin, polyester resin, styrene-butadiene resin, polyolefin resin, polystyrene resin, polyketone resin, polyamide resin, polycarbonate resin, polyacetal resin, polyetheretherketone resin, polyphenylene oxide resin, polysulfone resin, polyphenylenesulfone resin Examples thereof include a polyether resin, a polyvinyl chloride resin, a polyvinylidene chloride resin, a urea resin, a phenol resin, a melamine resin, an epoxy resin, a urethane resin, a silicone-acryl resin, and a silicone resin.
[0079]
Examples of the natural polymer include cellulose resins such as nitrocellulose, isoprene resins such as natural rubber, protein resins such as casein, and starch.
Examples of the resin (F) that can be used in the present invention include a hardly decomposable component that is hardly decomposable against the oxidative decomposition action of a photocatalyst, such as an inorganic compound such as water glass, a silicone resin and a fluorine resin. (F1) can be preferably selected.
Examples of the fluorine-based resin include PTFE and polyvinylidene fluoride, and further, an acryl-fluorine resin, an epoxy-fluorine resin, an urethane-fluorine resin or a fluoroolefin having a fluorine content of 1 to 80% by mass and a fluoroolefin and a carbon-carbon unsaturated compound ( Copolymers with vinyl ethers, vinyl esters, allyl compounds, (meth) acrylates, and the like. These fluororesins can be used alone or in combination of two or more. In addition, as the form, a form dispersed or dissolved in water is preferably selected.
[0080]
Examples of the silicone resin include a silicone containing at least one structure of a siloxane bond represented by general formulas (14), (15), (16), and (17), and a polymer molecule having the structure. Examples of the polymer include a polymer having a chain terminal and / or a side chain.
[0081]
Embedded image
[0082]
− (R4 2SiO)-... (15)
[0083]
Embedded image
[0084]
(Where R4Represents the same or different and represents a hydrogen atom or a monovalent organic group having 1 to 30 carbon atoms. )
[0085]
Embedded image
[0086]
The silicone having the above-described structure is, for example, represented by the general formula R4Six3(Where R4Represents a hydrogen atom or a monovalent organic group having 1 to 30 carbon atoms. Each X is independently selected from the group consisting of a hydrogen atom, a hydroxyl group, an alkoxy group having 1 to 20 carbon atoms, an acyloxy group having 1 to 20 carbon atoms, an aminoxy group, an oxime group having 1 to 20 carbon atoms, and a halogen atom. Represents one reactive group. The same applies hereinafter. And / or a trifunctional silane derivative represented by the general formula R4 2Six2And / or a general formula SiX4Or a partially hydrolyzed / condensed polymerized compound represented by the general formula R4 3It can be prepared by terminating the terminal with a monofunctional silane derivative represented by SiX and / or an alcohol. The polystyrene equivalent weight average molecular weight of the partial condensate of the silane derivative monomer thus obtained is preferably 100 to 100,000, more preferably 400 to 50,000.
[0087]
In the above-mentioned 1-3 functional silane derivatives, R4Is not particularly limited as long as it is a hydrogen atom or a monovalent organic group having 1 to 30 carbon atoms, and is preferably the same or different substituted or unsubstituted monovalent hydrocarbon group having 1 to 8 carbon atoms, For example, an alkyl group such as a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group; a cycloalkyl group such as a cyclopentyl group or a cyclohexyl group; a 2-phenylethyl group or a 2-phenylpropyl group Aralkyl groups such as phenyl group and 3-phenylpropyl group; aryl groups such as phenyl group and tolyl group; alkenyl groups such as vinyl group and allyl group; chloromethyl group, γ-chloropropyl group, 3,3,3- A halogen-substituted hydrocarbon group such as a trifluoropropyl group; a γ-acryloxypropyl group, a γ-methacryloxypropyl group, a γ-glycidoxypropyl group; , It can be exemplified 4-epoxycyclohexyl ethyl group, .gamma.-mercaptopropyl-substituted hydrocarbon group such group. In addition, as the form, a form dispersed or dissolved in water is preferably selected.
[0088]
When a binder containing the above-mentioned silicone resin together with titanium peroxide (B) is used as the binder component of the present invention, a curing catalyst for the silicone resin may be contained. Examples of the curing catalyst include basic compounds such as sodium hydroxide, potassium hydroxide, sodium methylate, sodium acetate, tetramethylammonium chloride, and tetramethylammonium hydroxide; tributylamine, diazabicycloundecene, ethylenediamine, and the like. Amine compounds such as diethylenetriamine, ethanolamines, γ-aminopropyltrimethoxysilane, γ- (2-aminoethyl) -aminopropyltrimethoxysilane; titanium compounds such as tetraisopropyl titanate and tetrabutyl titanate; aluminum triisopropoxy Aluminum compounds such as aluminum chloride, aluminum acetylacetonate, aluminum perchlorate and aluminum chloride; tin acetylacetonate, dibutyltin octylate And tin compounds such as dibutyltin dilaurate; metal-containing compounds such as cobalt octylate, cobalt acetylacetonate, zirconium acetylacetonate, and iron acetylacetonate; phosphoric acid, nitric acid, phthalic acid, p-toluenesulfonic acid, Examples include acidic compounds such as trichloroacetic acid.
[0089]
Further, in the photocatalyst composition of the present invention, for the purpose of improving the hardness, abrasion resistance, and hydrophilicity of the photocatalyst formed therefrom, silica, alumina, antimony oxide, metal oxide fine particles such as rare earth oxides are powdered or It may be added in a sol state.
The photocatalyst composition of the present invention may be in a solvent-free state (liquid or solid) or in a state of being dissolved or dispersed in a solvent, and is not particularly limited. A dissolved or dispersed state is preferred. At this time, the total amount of the binder component containing the modified photocatalyst (A) and the titanium peroxide (B) in the photocatalyst composition is preferably 0.01 to 95% by mass, more preferably 0.1 to 70% by mass. It is.
[0090]
Examples of the solvent used in the photocatalyst composition of the present invention include water, alcohols such as ethylene glycol, butyl cellosolve, isopropanol, n-butanol, ethanol and methanol, aromatic hydrocarbons such as toluene and xylene, hexane, cyclohexane and heptane. Aliphatic hydrocarbons such as, ethyl acetate, esters such as n-butyl acetate, acetone, methyl ethyl ketone, ketones such as methyl isobutyl ketone, tetrahydrofuran, ethers such as dioxane, dimethylacetamide, amides such as dimethylformamide, Examples include halogen compounds such as chloroform, methylene chloride, and carbon tetrachloride, dimethyl sulfoxide, nitrobenzene, and the like. These solvents are used alone or in combination.
[0091]
In addition, it is preferable to add a surfactant to the photocatalyst composition of the present invention for the purpose of improving the wettability to the substrate and improving the adhesion and coating properties. Surfactants that can be added include, for example, salts of higher fatty acids, resin acids, acidic fatty alcohols, sulfates, higher alkyl sulfonic acids, alkyl allyl sulfonates, sulfonated castor oil, sulfosuccinates, and alkenyl succinic acids. Surfactants, or nonionic surfactants typified by known reaction products of ethylene oxide with long-chain fatty alcohols or phenols and phosphoric acids, and cationic interfaces containing quaternary ammonium salts and the like Activators, (partially saponified) polymer dispersion stabilizers such as polyvinyl alcohol, and those in which an ethylene glycol chain or a propylene glycol chain is bonded to a silicone polymer chain in a block polymer type, side chain-modified type, or terminal-modified type. Silicone surfactant, perfour B polyoxyethylene ethanols, perfluoroalkyl alkoxylates, include fluorine-based surfactants and their combination, such as fluorinated alkyl esters.
[0092]
Further, in the photocatalyst composition of the present invention, as a leveling agent, for example, diacetone alcohol, ethylene glycol monomethyl ether, ethylene glycol monobutyl ether, 4-hydroxy-4-methyl-2-pentanone, dipropylene glycol, tripropylene glycol, 1-ethoxy-2-propanol, 1-butoxy-2-propanol, propylene glycol monomethyl ether, 1-propoxy-2-propanol, dipropylene glycol monomethyl ether, dipropylene glycolyl monoethyl ether, tripropylene glycol monoethyl ether, Acetylene alcohol or the like can be added.
[0093]
Further, the photocatalyst composition of the present invention, if necessary, usually added and blended in paints and molding resins, for example, pigments, curing catalysts, crosslinking agents, fillers, dispersants, light stabilizers, wetting agents, Thickeners, rheology control agents, defoamers, plasticizers, film-forming auxiliaries, rust inhibitors, dyes, preservatives and the like can be selected and combined according to the respective purposes.
[0094]
In the modified photocatalyst (A) of the present invention, the surface of the photocatalyst particles is modified with the modifier compound (b) having a structure having a very small surface energy, so that the modified photocatalyst (A) and the titanium peroxide (B) The photocatalyst composition of the present invention containing the compound (A) can have a self-gradient distribution of the modified photocatalyst (A). Here, the term “self-gradient” means that when a photocatalyst is formed from a photocatalyst composition, the modified photocatalyst (A) is modified in accordance with the properties (particularly hydrophilic / hydrophobic) of the interface where the photocatalyst comes into contact during the formation process. This means that a structure having a concentration gradient of the photocatalyst (A) is autonomously formed.
[0095]
In this case, if there is a difference in properties (hydrophilic / hydrophobic) between the contact surfaces, a concentration gradient is generated corresponding to the difference, and a concentration gradient is generated between the inside of the photocatalyst and the interface.
At this time, the concentration of the modified photocatalyst (A) in the photocatalyst formed from the photocatalyst composition of the present invention gradually increases from the inside of the photocatalyst or the surface where the photocatalyst contacts the substrate to the other exposed surface. Alternatively, the photocatalyst concentration may be low inside the photocatalyst or at the surface where the photocatalyst contacts the substrate, and the photocatalyst concentration at the other exposed surface may be high, and the change during the photocatalyst may be discontinuous.
[0096]
In the photocatalyst composition of the present invention, when the modified photocatalyst (A) has a very high self-gradient (that is, the modified photocatalyst (A) content (concentration) of 100 in the photocatalyst contacts the exposed surface of the photocatalyst. When the relative concentration near the surface is preferably 150 or more, more preferably 200 or more), the mass ratio of the modified photocatalyst (A) and the binder component (B ') containing titanium peroxide (B) in the photocatalyst composition. Is preferably modified such that (A) / (B ′) = 0.1 / 99.9-40 / 60, and more preferably (A) / (B ′) = 0.1 / 99.9-30 / 70. The photocatalyst formed even in the range where the content of the photocatalyst (A) is very small has a sufficient hydrophilization ability by light irradiation (superhydrophilization ability: a contact angle of water at 20 ° C. of 10 ° or less) or excellent. Has photocatalytic activity. In addition, since the photocatalyst having a low photocatalyst content expresses the intrinsic physical properties of the binder component, the photocatalyst has excellent strength, flexibility (bending resistance, impact resistance), and the like.
[0097]
In the present invention, the photocatalyst is formed from the photocatalyst composition of the present invention.
The photocatalyst of the present invention is preferably in the form of a film or a molded article.
When the photocatalyst in the present invention is formed into a film, for example, the above photocatalyst composition is applied to a substrate and dried, and then, if desired, preferably heat-treated at 20 ° C to 500 ° C, more preferably 40 ° C to 250 ° C. It can be obtained by irradiating ultraviolet rays or the like to form a film on the substrate. Examples of the application method include a spraying method, a flow coating method, a roll coating method, a brush coating method, a dip coating method, a spin coating method, a screen printing method, a casting method, a gravure printing method, and a flexographic printing method.
At this time, the thickness of the film formed from the photocatalyst composition of the present invention is preferably 0.1 to 200 μm, more preferably 0.5 to 20 μm, and further preferably 1.5 to 10 μm.
[0098]
In this specification, the expression “coating” is used, but the coating is not necessarily a continuous film, and may be a discontinuous film, an island-shaped dispersion film, or the like.
The functional composite having a film as the photocatalyst of the present invention on the substrate obtained in this way, exhibits hydrophobic or hydrophilic properties and / or photocatalytic activity by light irradiation, and further exhibits a photoelectric conversion function. Is possible. That is, in another aspect of the present invention, as a photocatalyst formed from the photocatalyst composition of the present invention, a molded article or a functional composite having a film on a substrate is provided.
[0099]
The substrate used to obtain the functional composite of the present invention is not particularly limited, and for example, all substrates used for the applications disclosed in the present invention can be used.
As the substrate used to obtain the functional composite of the present invention, for example, an organic substrate such as a synthetic resin or a natural resin, a metal, ceramics, glass, stone, cement, an inorganic substrate such as concrete, and the like. And the like. Further, a base material whose surface is coated with a paint made of a synthetic resin, a natural resin, or the like is also included.
[0100]
The durability of the functional composite of the present invention is extremely excellent even when an organic substrate that decomposes with a photocatalyst is used. That is, the photocatalyst composition of the present invention can provide a functional composite having excellent durability even on an organic base material that could not be used conventionally because of the problem of durability.
The method for producing the functional composite of the present invention is not limited to the case where the photocatalyst of the present invention is formed on a substrate. The substrate and the photocatalyst composition of the present invention may be simultaneously molded, for example, integrally molded. Further, after molding the photocatalyst composition of the present invention, the substrate may be molded. Further, after the photocatalyst composition of the present invention and the substrate are individually molded, a functional composite may be formed by adhesion, fusion, or the like. In the above-mentioned method, when molding in a state where it does not contact the original substrate, another substrate may be used. The substrate in this case is not limited to a solid, and may be a liquid or a gas as long as the effects of the present invention are not impaired.
[0101]
The molded article or the functional composite of the present invention can be formed into a film, a sheet, a block, a pellet, or a molded article having a more complicated shape, if necessary, depending on the method used for resin molding. Upon molding, other resins can be used in combination as long as the effects of the present invention are not impaired.
The above-mentioned molding and the mixing for the above combined use can be performed by molding the molded article or the functional composite of the present invention or another resin into powder or pellets in advance. A liquid component may be partially contained. Further, a method in which the resin after mixing is formed into a pellet by the following method, and further subjected to the molding is also possible. The pellets may be a so-called master batch in which the molded article or the functional composite of the present invention is contained in another resin at a high concentration.
[0102]
The molding method for the present invention can be an extrusion molding method, an injection molding method, a press molding method, or the like. A calendar molding method is also possible depending on the selection of the resin, such as using a thermoplastic resin in combination. In addition, the molded article or the functional composite of the present invention and other resin mixtures are impregnated with organic fibers including natural fibers, inorganic fibers such as glass (including woven fabrics thereof), and the like as reinforcing materials. It is also possible to carry out lamination molding.
The molded article or the functional composite of the present invention may be in a fibrous form. For processing into a fibrous state, a usual spinning method can be used as long as the effect of the present invention is not impaired. As the spinning method, melt spinning and solution spinning are used. In spinning, it can be processed into a fibrous form by using it together with the other resin described above. For example, the molded article or the functional composite of the present invention may be blended with an ordinary resin (a thermoplastic resin is preferable in terms of molding), for example, polyester, nylon, or the like, or the molded article or the functional composite of the present invention may be mixed with these. The resin may be subjected to composite spinning (sheath core, side-by-side type, etc.).
[0103]
The fibers may be long fibers or short fibers, and may be uniform or thick in the length direction, and may be round, triangular, L-shaped, L-shaped, T-shaped, Y-shaped, W-shaped, or Yachiha in cross-sectional shape. It may be a polygonal type such as a mold, a flat, a dogbone type, a multi-leaf type, a hollow type, or an irregular shape.
The fibrous molded article or functional composite of the present invention can also be used as a woven or nonwoven fabric (short fiber or long fiber).
Examples of the form of the fiber that can be used include yarns, cheese-like aggregates of yarns, woven fabrics, knitted fabrics, and nonwoven fabrics, and may be mixed with fibers of other resins. The form of the yarn includes a spun yarn such as a raw yarn, a false twisted yarn (including drawn false twisted yarn), a pretwisted false twisted yarn, an air jet processed yarn, a ring spun yarn, an open-end spun yarn, and a multifilament raw yarn (ultrafine yarn). And mixed fiber yarns. The fibers to be mixed include elastic fibers such as polyester fibers, polyamide fibers, polyacrylic fibers, polyvinyl fibers, polypropylene fibers, and polyurethane fibers (metal oxides represented by magnesium oxide, zinc oxide, and the like). Synthetic fibers such as those containing a chlorine hydroxide deterioration inhibitor such as metal hydroxide), natural fibers such as cotton, hemp, wool, and silk; cellulosic fibers such as cupra, rayon, and polynosic; and acetate fibers. There is.
The molded article or the functional composite of the present invention processed into a fibrous form can be used for clothing, gas and liquid filters for antibacterial, antifouling, deodorant, and toxic gas decomposition purposes.
[0104]
The photocatalyst of the present invention, or the above-described functional composite having the photocatalyst immobilized on a substrate, has a light having an energy higher than the band gap energy of the modified photocatalyst (A) contained therein (the modified photocatalyst (A) When the compound has a spectral sensitizing dye, it exhibits hydrophobicity or hydrophilicity and / or photocatalytic activity by irradiation with light containing light absorbed by the spectral sensitizing dye, and further exhibits a photoelectric conversion function.
[0105]
At this time, the modified photocatalyst (A) is composed of a triorganosilane unit represented by the above formula (1), a monooxydiorganosilane unit represented by the formula (2), and a dioxysilane unit represented by the formula (3). When modified with at least one modifier compound selected from the group consisting of compounds having at least one structural unit selected from the group consisting of organosilane units, the modified photocatalyst ( At least a part of the organic group (R) bonded to the silicon atom of the modifier compound present in the vicinity of the photocatalyst particles (a) constituting A) (preferably, the organic group bonded to the silicon atom contained in the modifier compound) 1 mol% or more of the group (R)) is substituted with a hydroxyl group by the decomposition action of the photocatalyst. As a result, the hydrophilicity of the surface of the photocatalyst of the present invention is enhanced, and when the generated hydroxyl groups are dehydrated and condensed to form a siloxane bond, the hardness of the photocatalyst becomes extremely high. Such a state is preferable in the embodiment of the present invention.
[0106]
Similarly, when a material containing the above-mentioned silicone resin in addition to titanium peroxide (B) is used as a binder component, the silicon atom of the silicone present in the vicinity of the photocatalyst particles (a) is irradiated by excitation light. At least a part of the bonded organic group is replaced with a hydroxyl group by the decomposition action of the photocatalyst, the hydrophilicity of the photocatalyst body surface of the present invention is increased, and a dehydration condensation reaction between the generated hydroxyl groups proceeds to form a siloxane bond. In this case, the hardness of the photocatalyst becomes very high. Such a state is preferable in the embodiment of the present invention.
[0107]
In the present invention, a light source of light having an energy higher than the band gap energy of the modified photocatalyst (A) (or light containing absorption light of the spectral sensitizing dye when the modified photocatalyst (A) has a spectral sensitizing dye). As the light source, in addition to light obtained in a general residential environment such as sunlight and indoor lighting, light such as a black light, a xenon lamp, and a mercury lamp can be used.
The molded article or the functional composite provided by the present invention, which has photocatalytic activity such as decomposition of organic substances, exhibits various functions such as antibacterial, antifouling, deodorant, and NOx decomposition, and can be used in the atmosphere and water. It can be used for applications such as environmental purification.
The photocatalyst or the functional complex provided by the present invention, wherein the photocatalyst or the functional complex has a contact angle with water at 20 ° C. of 60 ° or less (preferably 10 ° or less) by light irradiation (hydrophilicity). Film and a substrate coated with the hydrophilic film) can be applied to antifogging technology for preventing fogging of mirrors and glass, and further to antifouling technology and antistatic technology for building exteriors and the like. .
[0108]
Examples of application of the photocatalyst or functional complex of the present invention to the antifouling technology field include, for example, building materials, building exteriors, building interiors, window frames, window glasses, structural members, building equipment such as houses, especially toilets, bathtubs, Can be used for wash basins, lighting fixtures, lighting covers, kitchen utensils, tableware, dishwashers, dish dryers, sinks, cooking ranges, kitchen hoods, ventilation fans, etc., as well as exterior and coating of vehicles, and depending on the application, the interior of the vehicle. It is effective for use in members that require transparency, such as covers for vehicle lighting, window glasses, instruments, display panels, etc., as well as exterior equipment for machinery and articles, dust-proof covers and coatings, display equipment, and their covers. , Traffic signs, various display devices, display objects such as advertising towers, sound insulation walls for roads, railways, etc., exterior and coating of bridges and guardrails, interior and coating of tunnels, insulators, solar cell covers, solar water heater heat collection covers Exterior parts of electronic and electrical equipment used outside, especially exterior members such as transparent members, greenhouses and greenhouses, especially transparent members, and environments where there is a risk of contamination even indoors, such as medical and physical education Applications such as facilities and devices.
[0109]
Examples of applications of the photocatalyst or functional complex of the present invention to the field of anti-fogging technology include mirrors (rear mirrors for vehicles, mirrors for bathrooms, mirrors for toilets, dental mirrors, road mirrors, etc.), lenses ( Eyeglass lenses, optical lenses, illumination lenses, semiconductor lenses, copier lenses, rear view camera lenses for vehicles, etc.), prisms, window glasses for buildings and ring towers, window glasses for vehicles (automobiles, railway cars, aircraft, Ships, submersibles, snowmobiles, ropeway gondola, amusement park gondola, spaceships, etc., vehicle windshields (automobiles, motorcycles, railcars, aircraft, ships, submarines, snowmobiles, snowmobiles, ropeway gondola) , Amusement park gondola, spaceship, etc.), protective goggles, sports goggles, protective mask shield, sports mask shield, helmet shield, frozen Product display case glass, warm food display case glass, measuring instrument cover, vehicle rear view camera lens cover, focusing lens for laser dental treatment equipment, etc., laser light detection sensor cover such as inter-vehicle distance sensor, Uses such as a cover of an infrared sensor and a filter for a camera can be given.
[0110]
Examples of application of the photocatalyst or the functional composite of the present invention to the antistatic technology field include a cathode ray tube, a magnetic recording medium, an optical recording medium, a magneto-optical recording medium, an audio tape, a video tape, an analog record, and home electric appliances. Housing, parts and exteriors and coatings for products, housing and parts and exteriors and coatings for OA equipment products, building materials, building exteriors, building interiors, window frames, windowpanes, structural members, vehicle exteriors and coatings, machinery and articles Uses such as exteriors, dustproof covers, and coatings can be mentioned.
[0111]
The photocatalyst or the functional complex provided by the present invention, wherein the photocatalyst or the functional complex has a contact angle with water at 20 ° C. of 70 ° or more (preferably 90 ° or more) by light irradiation (hydrophobic property). Molded articles and hydrophobic membranes, and substrates coated with the hydrophobic membranes) are provided with drip-proof properties and water-repellent properties, anti-fouling technology utilizing adhesion of water-based dirt and washing properties with running water, and It can be applied to icing and snow prevention technology, etc., window glass, windshield, mirror, lens, goggle, cover, insulator, building material, building exterior, building interior, structural member, vehicle exterior and painting, machinery and equipment It can be used for applications such as exterior, various display devices, lighting devices, household equipment, tableware, kitchenware, household electrical appliances, roofing materials, antennas, power lines, ice and snow skiing equipment, and the like.
[0112]
The photocatalyst or functional complex provided by the present invention and having a photoelectric conversion function can exhibit functions such as power conversion of solar energy, and is used for (wet) solar cells and the like. It can be used for applications such as optical semiconductor electrodes.
Further, the member provided by the present invention, whose wettability with water changes (changes from hydrophobic to hydrophilic or changes from hydrophilic to hydrophobic) by light irradiation, can be applied to an original plate for offset printing or the like. Very useful for applications.
[0113]
【Example】
The present invention will be specifically described with reference to the following examples, reference examples, and comparative examples, but these do not limit the scope of the present invention.
In Examples, Reference Examples and Comparative Examples, various physical properties were measured by the following methods. 1. Particle size distribution and number average particle size
The sample was appropriately diluted by adding a solvent so that the photocatalyst content in the sample was 1 to 20% by mass, and measured using a wet particle size analyzer (Microtrack UPA-9230 manufactured by Nikkiso Co., Ltd.).
[0114]
2. Weight average molecular weight
It was determined by gel permeation chromatography (GPC) using a calibration curve prepared using a polystyrene standard.
The GPC conditions are as follows.
-Equipment: Tosoh HLC-8020 LC-3A type chromatograph
・ Column: TSKgel G1000HXL, TSKgel G2000HXLAnd TSKgel G4000HXL(All manufactured by Tosoh Corporation) were used in series.
・ Data processor: Shimadzu CR-4A type data processor
・ Mobile phase: Tetrahydrofuran (used for analysis of phenyl group-containing silicone)
Chloroform (used for analysis of silicone containing no phenyl group)
-Flow rate: 1.0 ml / min.
・ Sample preparation method
The solution was diluted with the solvent used for the mobile phase (the concentration was appropriately adjusted in the range of 0.5 to 2% by weight), and then subjected to analysis.
[0115]
3. Infrared absorption spectrum
It measured using the JASCO FT / IR-5300 type infrared spectrometer.
4.29Measurement of Si nuclear magnetic resonance
It measured using JEOL JNM-LA400.
5. Film hardness
According to JIS-K5400, it was determined as pencil hardness (scratch of the film).
6. Film hardness after UV irradiation
The surface of the film was irradiated with the light of FL20S BLB type black light manufactured by Toshiba Lighting & Technology Corp. for 7 days, and then measured by the above method (5).
At this time, the UV intensity measured using a UVR-2 type UV intensity meter manufactured by Topcon of Japan (using a UD-36 type light receiving unit manufactured by Topcon of Japan (corresponding to light having a wavelength of 310 to 400 nm) as a light receiving unit). Is 1mW / cm2It was adjusted to become.
[0116]
7. Water contact angle with film surface
Drops of deionized water were placed on the surface of the coating, left at 20 ° C. for 1 minute, and measured using a Kyowa Interface Science CA-X150 contact angle meter.
The smaller the contact angle of water with the film, the higher the hydrophilicity of the film surface.
8. Change in hydrophilicity (hydrophobicity) of the film surface before and after UV irradiation
The surface of the film was irradiated with ultraviolet rays for 7 days by the above method 6, and then the contact angle of water was measured by the above method 7.
[0117]
9. Photocatalytic activity of the coating
After applying a 5% by mass ethanol solution of methylene blue to the surface of the film, the film was irradiated with ultraviolet rays for 5 days by the above method 6.
Then, based on the degree of decomposition of methylene blue by the action of the photocatalyst (evaluated visually based on the degree of fading of the film surface), the activity of the photocatalyst was evaluated in the following three stages.
A: Methylene blue was completely decomposed.
Δ: Methylene blue blue slightly remained.
X: Decomposition of methylene blue was hardly observed.
10. Weather resistance of film (gloss retention)
An exposure test (irradiation: 60 ° C. for 4 hours, dark / wet: 40 ° C. for 4 hours) was performed using a DPWL-5R type due panel light control weather meter manufactured by Suga Test Instruments. The 60 ° -60 ° specular reflectance after 500 hours of exposure was measured as the final gloss value, divided by the initial gloss value, and this value was calculated as the gloss retention.
[0118]
11. Evaluation of graded structure of photocatalyst
After the sample was roughly cut with a DAD321 dicing saw manufactured by DISCO Engineering Service, FIB (Focused Ion Beam) processing was performed, and the cross section of the coating film was observed by TEM.
FIB processing conditions are as follows.
Equipment used: Hitachi FB2000
Processing conditions: acceleration voltage (30 kV)
Ion source: Ga
The conditions for TEM observation are as follows.
・ Equipment: Hitachi HF2000
・ Acceleration voltage: 200 kV
The location of the modified photocatalytic titanium oxide was analyzed by EDX analysis of the Si element contained in the modifying agent.
[0119]
12. chemical resistance
The film surface was rubbed 20 times with a cotton swab soaked in acetone, and the chemical resistance was evaluated on the following three scales based on the appearance of the film surface (evaluated visually).
A: No change.
Δ: slight whitening.
×: The film was broken.
13. Stain resistance
After attaching the test plate to a fence facing a general road (traffic volume of trucks: about 500 to 1000 vehicles / day) for three months, the surface of the test plate was washed with water and the degree of contamination was visually evaluated.
[0120]
[Reference Example 2]
Synthesis of modified photocatalyst hydrosol (A-1).
In a reactor equipped with a reflux condenser, a thermometer and a stirrer, 50 g of dioxane, HMS-301-100GM (trade name of methylhydrogensiloxane-dimethylsiloxane copolymer (manufactured by Chisso), Si-H group content 4.52 mmol) / G, weight average molecular weight 5400) and heated to 80 ° C. with stirring. 25 g of UNIOX PKA-5118 [trade name of polyoxyethylene allyl methyl ether (manufactured by NOF Corporation, weight average molecular weight: 800)] and 0.53 g of a 5% by weight solution of chloroplatinic acid (IV) hexahydrate in isopropanol Was dissolved in 62.5 g of dioxane at 80 ° C. with stirring for about 1 hour, and the mixture was further stirred at 80 ° C. for 2 hours and then cooled to room temperature to obtain a Si—H group-containing silicon. A solution containing the compound (1) was obtained.
[0121]
When 100 g of water was added to 4 g of the obtained solution containing the Si-H group-containing silicon compound (1), a slightly cloudy dispersion was obtained.
Further, after adding and mixing 8 g of butyl cellosolve to 2.23 g of the obtained solution containing the Si-H group-containing silicon compound (1), 8 ml of a 1N aqueous sodium hydroxide solution was added to generate hydrogen gas. It was 45.2 ml at 21 ° C. The Si-H group content per 1 g of the solution containing the Si-H group-containing silicon compound (1), determined from the amount of hydrogen gas generated, was 0.825 mmol / g (Si-H converted to 1 g of HMS-301-100 GM). The group content was about 3.1 mmol / g).
[0122]
Subsequently, a reaction vessel equipped with a reflux condenser, a thermometer and a stirrer was charged with Tynok A6 [trade name of anatase-type titanium oxide sol (manufactured by Taki Kagaku), ammonia peptizer, TiO2Concentration of 6% by mass, average crystallite diameter of 10 nm (value described in the catalog)], and 10.3 g of the solution containing the synthesized Si—H group-containing silicon compound (1) was stirred at room temperature at 30 ° C. for about 30 minutes. It was added over a period of minutes, and stirring was further continued at 30 ° C. for 10 hours to obtain a modified photocatalyst hydrosol (A-1) having very good dispersibility. At this time, the amount of hydrogen gas generated by the reaction of the Si-H group-containing silicon compound (1) was 80 ml at 16 ° C. When the obtained modified titanium oxide hydrosol was coated on a KBr plate and the IR spectrum was measured, the absorption of Ti-OH group (3630-3640 cm) was measured.-1) Disappearance was observed.
[0123]
1 and 2 show the particle size distributions of Tynoc A6 before the modification treatment and the resulting modified photocatalyst hydrosol (A-1), respectively. The particle size distribution of the resulting modified photocatalyst hydrosol (A-1) is monodisperse (number average particle size is 13 nm), and furthermore is monodispersion (number average particle size is 10 nm) of Tynok A6 before the modification treatment. It can be seen that the particle size distribution moves in parallel to the larger particle size side.
[0124]
[Reference Example 2]
Synthesis of modified photocatalyst hydrosol (A-2).
A reactor equipped with a reflux condenser, a thermometer and a stirrer was charged with 50 g of methyl ethyl ketone and 50 g of HMS-301-100GM (the same as in Reference Example 1), and the temperature was raised to 60 ° C. with stirring. After adding 1.6 g of a 0.25% dioxane solution of dichloro-dicyclopentadienyl-platinum (II) to this, a solution obtained by dissolving 25 g of UNIOX PKA-5118 (same as Reference Example 1) in 25 g of methyl ethyl ketone was added. The mixture was added at 60 ° C. with stirring over about 30 minutes, and the stirring was further continued at 60 ° C. for 30 minutes. A solution prepared by dissolving 10 g of perfluorooctylethylene and 1.1 g of a 0.25% dioxane solution of dichloro-dicyclopentadienyl-platinum (II) in 10 g of methyl ethyl ketone was added thereto at 60 ° C. for about 1 hour, The solution was further stirred at 60 ° C. for 8 hours and then cooled to room temperature to obtain a solution containing a Si—H group-containing silicon compound (2) having a fluoroalkyl group.
[0125]
When 100 g of water was added to 4 g of the obtained solution containing the Si-H group-containing silicon compound (2), a slightly cloudy dispersion was obtained.
After adding and mixing 8 g of butyl cellosolve to 1.09 g of the obtained solution containing the Si-H group-containing silicon compound (2), 8 ml of a 1N aqueous sodium hydroxide solution was added to generate hydrogen gas. It was 25.5 ml at 17 ° C. The Si—H group content per 1 g of the solution containing the Si—H group-containing silicon compound (2), determined from the amount of hydrogen gas generated, was 0.96 mmol / g (Si—H converted to 1 g of HMS-301-100 GM). The group content was about 3.31 mmol / g).
[0126]
Subsequently, 300 g of TYNOC A6 (same as in Reference Example 1) was placed in a reactor equipped with a reflux condenser, a thermometer, and a stirrer, and a solution containing the synthesized Si—H group-containing silicon compound (2) was added thereto. 5 g was added under stirring at room temperature of 30 ° C. over about 30 minutes, and further stirring was continued at 30 ° C. for 10 hours to obtain a modified photocatalyst hydrosol (A-2) having very good dispersibility. At this time, the amount of hydrogen gas generated by the reaction of the Si-H group-containing silicon compound (3) was 140 ml at 16 ° C.
When the obtained modified titanium oxide hydrosol was coated on a KBr plate and the IR spectrum was measured, the absorption of Ti-OH group (3630-3640 cm) was measured.-1) Disappearance was observed.
The particle size distribution of the resulting modified photocatalyst hydrosol (A-2) was monodisperse (the number average particle size was 20 nm).
[0127]
[Reference Example 3]
Synthesis of modified photocatalyst hydrosol (A-3).
In a reactor equipped with a reflux condenser, a thermometer and a stirrer, 200 g of dioxane and 200 g of LS-7040 [trade name of 1,1,3,3-tetramethyldisiloxane (manufactured by Shin-Etsu Chemical Co., Ltd.)] were placed. The temperature was raised to 80 ° C. with stirring. A solution prepared by dissolving 20 g of 5-norbornene-2,3-dicarboxylic anhydride and 10 g of a 0.25 mass% dioxane solution of dichloro-dicyclopentadienyl-platinum (II) in 70 g of dioxane was stirred at 80 ° C. Over about 30 minutes, and further stirred at 80 ° C. for 3 hours, and then cooled to room temperature to obtain a solution containing a Si—H group-containing silicon compound having a cyclic acid anhydride as a reactive group. Got.
[0128]
After adding and mixing 8 g of butyl cellosolve to 0.488 g of the obtained solution containing the Si-H group-containing silicon compound having a reactive group, 8 ml of a 1N aqueous sodium hydroxide solution was added to generate hydrogen gas, and the volume of hydrogen gas was increased. Was 68.0 ml at 25 ° C. The Si—H group content per 1 g of the solution containing the Si—H group-containing silicon compound having a reactive group, determined from the hydrogen gas generation amount, was 5.53 mmol / g.
Subsequently, 125 g of a solution containing the Si—H group-containing silicon compound having a reactive group was placed in a reactor equipped with a stirrer, and 3 g of triethylamine and 0.54 g of water were added thereto. By continuing stirring for a period of time, a solution containing a Si-H group-containing silicon compound (3) having a carboxyl group as a hydrophilic group and having good dispersibility in water was obtained.
[0129]
In a reactor having a reflux condenser, a thermometer and a stirrer, TKS-203 [trade name of titanium oxide hydrosol (manufactured by Teica), neutral, TiO2 concentration of 22% by mass, average crystallite diameter of 6 nm (catalog value)] 10.9 g and 29.1 g of water, 3 g of a solution containing the synthesized Si—H group-containing silicon compound (3) is added at 40 ° C. over about 5 minutes, and further stirred at 40 ° C. for 12 hours. Was continued to obtain a modified photocatalyst hydrosol (A-3) having very good dispersibility. At this time, the amount of hydrogen gas generated by the reaction was 252 ml at 23 ° C.
[0130]
Moreover, when the obtained modified photocatalyst hydrosol (A-3) was coated on a KBr plate and the IR spectrum was measured, the absorption of Ti-OH group (3630-3640 cm) was observed.-1) Disappearance was observed.
The particle size distribution of the resulting modified photocatalyst hydrosol (A-3) was monodisperse (the number average particle size was 19 nm).
[0131]
[Reference Example 4]
Synthesis of aqueous titanium peroxide solution (B-1).
About 100 g of 2.5 mass% aqueous ammonia was added to 10 g of a 60 mass% aqueous solution of titanium tetrachloride (TiCl4) to neutralize the solution to pH 6 to 7, and pale blue white titanium hydroxide (Ti (OH)4) Was obtained. After washing the precipitate by repeating decantation, 1.8 kg of ion-exchanged water was added to 40 g of the wet solid content to form a slurry, and 200 g of a 30% by mass hydrogen peroxide solution was added thereto to obtain a yellow transparent peroxide. An aqueous titanium solution was obtained. This was concentrated by an evaporator to obtain a 1.6% by mass (in terms of titanium oxide) aqueous solution of titanium peroxide (B-1).
[0132]
[Example 1]
To 100 g of the titanium peroxide aqueous solution (B-1) synthesized in Reference Example 4, 5 g of an 8% by mass aqueous solution of NS-210 [polyethylene glycol-based alkylphenol-type nonionic surfactant (manufactured by NOF Corporation)] was added. 3.1 g of the modified photocatalyst hydrosol (A-1) synthesized in Reference Example 1 was added under stirring at room temperature to obtain a photocatalyst composition (C-1).
Spray-coated aluminum plate (JIS, H, 4000 (A1050P)) having a thickness of 1 mm cut into 50 mm x 60 mm with Mighty Lac white (brand name of acrylic urethane resin paint (two-liquid mixed type) (Nippon Paint)). And dried at room temperature for 3 days. The above-mentioned photocatalyst composition (C-1) is spray-coated on the obtained acrylic urethane-coated aluminum plate so as to have a film thickness of 1 to 2 μm, dried at room temperature for 1 hour, and heated at 80 ° C. for 30 minutes. As a result, a test plate (D-1) having a photocatalyst-containing film was obtained.
[0133]
The test plate (D-1) having the obtained photocatalyst-containing film had a pencil hardness of H and a contact angle with water of 95 °. The chemical resistance was also good (().
The test plate (D-1) having the obtained photocatalyst-containing coating had a pencil hardness of 4H after irradiation with ultraviolet light (black light) and a contact angle of water of 0 °. Further, the result of the evaluation of the photocatalytic activity was also very good (◎).
Further, the gloss retention by an exposure test (after 1000 hours) using a Dupanel light control weather meter was 89%, indicating good weather resistance.
[0134]
In addition, as a result of the evaluation of the stain resistance of the obtained test plate (D-1), no stain was observed on the surface of the test plate, and very good stain resistance was shown.
As a result of observing the cross section of the obtained test plate (D-1) having the photocatalyst-containing film by TEM, no modified photocatalyst was present at the interface with the acrylic urethane film as the base material, and the surface of the photocatalyst-containing film was observed. Were all covered with the modified photocatalyst.
[0135]
[Example 2]
The same operation as in Example 1 was performed except that 3.3 g of the modified photocatalyst hydrosol (A-2) synthesized in Reference Example 2 was used instead of 3.1 g of the modified photocatalyst hydrosol (A-1) synthesized in Reference Example 1. Thus, a test plate (D-2) having a photocatalyst-containing film was obtained.
The test plate (D-2) having the obtained photocatalyst-containing film had a pencil hardness of HB and a contact angle with water of 122 °. The chemical resistance was also very good (().
The pencil hardness of the test plate (D-2) having the photocatalyst-containing film obtained after irradiation with ultraviolet light (black light) was 4H, and the contact angle of water was 0 °. Further, the result of the evaluation of the photocatalytic activity was also very good (◎).
[0136]
Further, the gloss retention by an exposure test (after 1000 hours) using a Dupanel light control weather meter was 92%, showing very good weather resistance.
In addition, as a result of the evaluation of the stain resistance of the obtained test plate (D-2), no stain was observed on the surface of the test plate, and very good stain resistance was shown.
As a result of TEM observation of the cross section of the test plate (D-2) having the obtained photocatalyst-containing film, no modified photocatalyst was present at the interface with the acrylic urethane film as the base material, and the surface of the photocatalyst-containing film was observed. Were all covered with the modified photocatalyst.
[0137]
[Example 3]
The same operation as in Example 1 was performed except that 3.4 g of the modified photocatalyst hydrosol (A-3) synthesized in Reference Example 3 was used instead of 3.1 g of the modified photocatalyst hydrosol (A-1) synthesized in Reference Example 1. Thus, a test plate (D-3) having a photocatalyst-containing film was obtained.
The test plate (D-3) having the obtained photocatalyst-containing film had a pencil hardness of F and a contact angle with water of 106 °. The chemical resistance was also very good ((). The pencil (D-3) of the test plate (D-3) having the obtained photocatalyst-containing film after irradiation with ultraviolet light (black light) had a pencil hardness of 3H and a contact angle of water of 0 °. Further, the result of the evaluation of the photocatalytic activity was also very good (◎).
[0138]
Further, the gloss retention by an exposure test (after 1000 hours) using a Dupanel light control weather meter was 86%, indicating very good weather resistance.
In addition, as a result of the evaluation of the stain resistance of the obtained test plate (D-2), no stain was observed on the surface of the test plate, and very good stain resistance was shown.
As a result of TEM observation of the cross section of the test plate (D-2) having the obtained photocatalyst-containing film, no modified photocatalyst was present at the interface with the acrylic urethane film as the substrate, and the surface of the photocatalyst-containing film was observed. Were all covered with the modified photocatalyst.
[0139]
[Comparative Example 1]
A photocatalyst-containing film was prepared by performing the same operation as in Example 1 except that 3.0 g of Tynoc A6 (same as in Reference Example 1) was used instead of 3.1 g of the modified photocatalyst hydrosol (A-1) synthesized in Reference Example 1. A test plate (D-4) having the content of Tynoc A6 (the same amount as in Example 1) was obtained.
The test plate (D-4) having the obtained photocatalyst-containing film had a pencil hardness of 2H and a contact angle with water of 38 °.
Moreover, the pencil hardness of the test plate (D-4) having the obtained photocatalyst-containing film after irradiation with ultraviolet light (black light) was 3H, and the contact angle of water was 28 °. Furthermore, the evaluation of the photocatalytic activity was a poor result (x).
In addition, the result of the evaluation of the stain resistance of the obtained test plate (D-4) was bad because rain streak stains occurred on the test plate surface.
[0140]
[Comparative Example 2]
The same operation as in Example 1 was performed except that 17.8 g of Tynoc A6 (same as in Reference Example 1) was used instead of 3.1 g of the modified photocatalyst hydrosol (A-1) synthesized in Reference Example 1, and the photocatalyst-containing film ( A test plate (D-5) having the content of Tynoc A6 (4 times that of Example 1) was obtained.
The test plate (D-5) having the obtained photocatalyst-containing film had a pencil hardness of 2H and a contact angle with water of 18 °.
Moreover, the pencil hardness of the test plate (D-5) having the obtained photocatalyst-containing film after irradiation with ultraviolet light (black light) was 3H, and the contact angle of water was 0 °. Further, the result of the evaluation of the photocatalytic activity was also very good (◎).
However, in a 200-hour exposure test using a Dupanel light control weather meter, the gloss retention was 10% or less, and a choking phenomenon was observed.
[0141]
【The invention's effect】
The photocatalyst composition of the present invention does not cause deterioration of the interface between the organic base material and the binder in the photocatalyst, and the surface of the photocatalyst is wetted with water (hydrophilicity, hydrophobicity) for a long time by light irradiation. And d) a functional complex exhibiting excellent controllability and / or photocatalytic activity and excellent durability can be provided without requiring complicated steps.
[Brief description of the drawings]
FIG. 1 is a diagram showing the results of measuring the particle size distribution of Tynoc A6 (a commercially available titanium oxide hydrosol) before a denaturation treatment using a wet particle size analyzer.
FIG. 2 shows the result of measuring the particle size distribution of a modified photocatalyst hydrosol (A-1) obtained by modifying the above-mentioned tynoc A6 in Reference Example 1 using a wet particle size analyzer. FIG.
Claims (9)
R3Si− (1)
(式中、Rは各々独立に直鎖状または分岐状の炭素数1〜30個のアルキル基、炭素数5〜20のシクロアルキル基、直鎖状または分岐状の炭素数1〜30個のフルオロアルキル基、直鎖状または分岐状の炭素数2〜30個のアルケニル基、フェニル基、炭素数1〜20のアルコキシ基、又は水酸基を表す。)
−(R2SiO)− (2)
(式中、Rは式(1)で定義した通りである。)
R 3 Si- (1)
(In the formula, R is each independently a linear or branched alkyl group having 1 to 30 carbon atoms, a cycloalkyl group having 5 to 20 carbon atoms, a linear or branched carbon group having 1 to 30 carbon atoms. Represents a fluoroalkyl group, a linear or branched alkenyl group having 2 to 30 carbon atoms, a phenyl group, an alkoxy group having 1 to 20 carbon atoms, or a hydroxyl group.)
— (R 2 SiO) — (2)
(In the formula, R is as defined in the formula (1).)
HxRyQzSiO(4−x−y−z)/2 (4)
(式中、Rは各々独立に直鎖状または分岐状の炭素数1〜30個のアルキル基、炭素数5〜20のシクロアルキル基、直鎖状または分岐状の炭素数1〜30個のフルオロアルキル基、直鎖状または分岐状の炭素数2〜30個のアルケニル基、フェニル基、炭素数1〜20のアルコキシ基、又は水酸基を表す。
また、式中Qは、下記(あ)〜(う)からなる群より選ばれる少なくとも1つの機能性付与基を含有する基である。
(あ)カルボキシル基あるいはその塩、リン酸基あるいはその塩、スルホン酸基あるいはその塩、アミノ基あるいはその塩、ポリオキシアルキレン基からなる群から選ばれた少なくとも1つの親水性基。
(い)エポキシ基、アクリロイル基、メタアクリロイル基、(環状)酸無水物基、ケト基、カルボキシル基、ヒドラジン残基、イソシアネート基、イソチオシアネート基、水酸基、アミノ基、環状カーボネート基、チオール基、エステル基からなる群から選ばれた少なくとも1つの反応性基。
(う)少なくとも1つの分光増感基。
また、0<x<4、0<y<4、0≦z<4、及び(x+y+z)≦4である。)The photocatalyst composition according to claim 1, wherein the modifier compound (b) is a Si—H group-containing silicon compound (b1) represented by the formula (4).
H x R y Q z SiO ( 4-x-y-z) / 2 (4)
(Wherein, R is each independently a straight-chain or branched alkyl group having 1 to 30 carbon atoms, a cycloalkyl group having 5 to 20 carbon atoms, a straight-chain or branched Represents a fluoroalkyl group, a linear or branched alkenyl group having 2 to 30 carbon atoms, a phenyl group, an alkoxy group having 1 to 20 carbon atoms, or a hydroxyl group.
In the formula, Q is a group containing at least one functionality-imparting group selected from the group consisting of the following (A) to (U).
(A) at least one hydrophilic group selected from the group consisting of a carboxyl group or a salt thereof, a phosphoric acid group or a salt thereof, a sulfonic acid group or a salt thereof, an amino group or a salt thereof, and a polyoxyalkylene group.
(I) epoxy group, acryloyl group, methacryloyl group, (cyclic) acid anhydride group, keto group, carboxyl group, hydrazine residue, isocyanate group, isothiocyanate group, hydroxyl group, amino group, cyclic carbonate group, thiol group, At least one reactive group selected from the group consisting of ester groups.
(U) at least one spectral sensitizing group;
Also, 0 <x <4, 0 <y <4, 0 ≦ z <4, and (x + y + z) ≦ 4. )
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JPWO2014017575A1 (en) * | 2012-07-26 | 2016-07-11 | 株式会社サクラクレパス | Photocatalyst coating liquid, method for producing the same, and photocatalyst |
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US20150306271A1 (en) * | 2009-06-03 | 2015-10-29 | Triatomic Environmental, Inc. | Adsorptive photo-catalytic oxidation air purification device |
JPWO2014017575A1 (en) * | 2012-07-26 | 2016-07-11 | 株式会社サクラクレパス | Photocatalyst coating liquid, method for producing the same, and photocatalyst |
KR20170094329A (en) * | 2015-02-11 | 2017-08-17 | 얼라이드 바이오사이언스, 인크. | Anti-microbial coating and method to form same |
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CN118454655A (en) * | 2024-05-08 | 2024-08-09 | 东莞理工学院 | Functional wood for separating heavy metal-containing oil-water pollutants |
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