[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

JP2004103719A - Organic semiconductor element - Google Patents

Organic semiconductor element Download PDF

Info

Publication number
JP2004103719A
JP2004103719A JP2002261503A JP2002261503A JP2004103719A JP 2004103719 A JP2004103719 A JP 2004103719A JP 2002261503 A JP2002261503 A JP 2002261503A JP 2002261503 A JP2002261503 A JP 2002261503A JP 2004103719 A JP2004103719 A JP 2004103719A
Authority
JP
Japan
Prior art keywords
organic semiconductor
electrode
potential
voltage
semiconductor film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002261503A
Other languages
Japanese (ja)
Inventor
Masahiko Hirai
平井 匡彦
Hiroki Kisu
木須 浩樹
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2002261503A priority Critical patent/JP2004103719A/en
Publication of JP2004103719A publication Critical patent/JP2004103719A/en
Pending legal-status Critical Current

Links

Images

Landscapes

  • Thin Film Transistor (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide an organic semiconductor element in which the potential of an organic semiconductor film can be regulated and the variations in the threshold level can be prevented. <P>SOLUTION: Independently of the gate electrode, source electrode and drain electrode, the organic semiconductor element has an electrode for imparting the potential of an organic semiconductor film externally. <P>COPYRIGHT: (C)2004,JPO

Description

【0001】
【発明の属する技術分野】
本発明は有機半導体素子にかかわり、特に有機半導体材料を有する、有機半導体トランジスタ素子を有する有機半導体素子に関する。
【0002】
【従来の技術】
近年、有機物半導体材料を用いた、電子デバイスの開発が広く行なわれており、発光素子である有機EL(Electro−Luminescence)、有機TFT(Thin Film Transistor)、有機半導体レーザー等の開発が報告されている。中でも、有機半導体トランジスタの一種である、有機TFTは、ローコストでガラスやプラスチック基板上に集積回路を形成する技術として有望視されている。
【0003】
有機TFTの構造に関し、特開平08−228034号公報、特開平09−232589号公報、特開平10−270712号公報など、ソース、ドレイン電極とゲート絶縁膜、ゲート電極を有する素子が提案されている。
【0004】
またもともとTFTは、マトリックス表示装置などに用いられることが多く、ソース電位が一定に保たれる使い方が主流である。
【0005】
【発明が解決しようとする課題】
有機半導体を用いたTFTもソース電位を一定に保つように用いる場合は、安定に動作すると考えられる。一方有機半導体を有するロジック回路を構成する場合は、ロジック回路ゆえトランジスタをシリーズに接続する場合が多く、ソース電位、ドレイン電位ともダイナミックに変動する場合があり、この場合は、有機半導体の電位を見積もることが難しく、設計に支障をきたすことになることに本発明者は気づいた。また、アナログ回路でも、閾値電圧の変動があり例えばデファレンシャルアンプなどは、トランジスタのソース、ドレインの両方とも電源電圧または接地電圧に固定しないばかりでなく、閾値電圧の変動が大きな課題となることに本発明者は気づいた。
【0006】
本発明は、ソース電位、ドレイン電位ともダイナミックに変動するロジック回路などに有機半導体TFTを用いた場合、有機半導体の電位を見積もることが難しく、設計に支障をきたすといった課題を解決しようとするものである。したがって、本発明の目的は、有機半導体膜の電位を調整でき、閾値の変動を防止することができる有機半導体素子を提供することであり、例えばロジック回路などに適用できる有機半導体素子を提供することであり、さらには簡単な構造でかつ製造が容易な有機半導体素子、あるいは設計容易な有機半導体TFT(トランジスタ)素子を有する有機半導体素子を提供することにある。
【0007】
【課題を解決するための手段】
よって本発明はゲート電極と、ゲート絶縁膜と、ソース電極と、ドレイン電極と、有機半導体膜とを基板上に有する有機半導体素子において、前記有機半導体膜の電位を外部からあたえる電極を更に有することを特徴とする有機半導体素子を提供する。
【0008】
【発明の実施の形態】
以下、本発明の実施の形態について図面を参照して説明する。
【0009】
図1は本実施形態に係る有機半導体素子の一例である、有機半導体トランジスタ素子を基板上に有する有機半導体素子の構成を模式的に示す図である。
【0010】
符号1は基板、2はコンタクトさせるための配線であるコンタクト、3は裏面配線、4はゲート電極、5はゲート絶縁膜、6はドレイン電極、7はソース電極、8は有機半導体膜である有機半導体層、9は有機半導体膜の電位を外部からあたえる電極、10は表面保護膜である表面保護層、11は裏面保護膜である裏面保護層である。有機半導体膜の電位を外部から与える電極のことを便宜上以下ボディ電極と記す。
【0011】
基板1の裏面に、裏面配線3が配置され、裏面配線3と表面を結ぶコンタクト2が設けられ、さらにゲート電極4が配置される。基板は絶縁材料である。さらに、ゲート電極表面にゲート絶縁膜5が設けられ、その表面にソース電極7とドレイン電極6が互いに離間して配置される。それらが離間する間およびそれら電極の端部上に有機半導体層8が形成され、さらに有機半導体層8上に前記有機半導体層8の電位を外部からあたえるためのボディ電極9が形成されている。これらから本実施形態に係る有機半導体トランジスタ素子部は基板上に構成されているといってよい。本発明の有機半導体素子はこのような有機半導体膜を有する有機半導体トランジスタ素子のような素子を基板に有する素子である。
【0012】
また、本実施形態の有機半導体素子は更に基板の表面側に表面保護層10を有し、更に裏面側に裏面保護層11を有している。表面保護層10は基板表面側において有機半導体トランジスタ素子を覆うように設けられている。また裏面保護層11は裏面側において裏面配線3を覆うように設けられている。
【0013】
ボディ電極9により有機半導体層8に外部から電位を与えることができ、ゲート電極との電位差を調整することができる。
【0014】
その結果閾値変動を防ぐこともできる。
【0015】
このボディ電極9は、ゲート電極と対向する位置に設けることがより好ましい。有機半導体トランジスタ素子のON、OFF動作は、ゲート電極とこれに対向した有機半導体の電位差により決定されることから、有機半導体膜の電位を外部からあたえる電極を、ゲート電極と対向する位置に設けることより、有機半導体層の電位をより安定に決定することができる。
【0016】
またボディ電極9に、ゲート電圧と異なる電圧を与え、ゲート電圧とボディ電極に与える電圧の組み合わせることにより、ドレイン電流を調整することができる。
【0017】
また有機半導体層8の電位を外部からあたえる電極に、駆動中常に接地電圧または電源電圧と異なる符号の電圧を与えてもよい。駆動中常に接地電圧または電源電圧と異なる符合の電圧を与えることでオン、オフを制御する動作、または常時オンとなる動作を実現することができる。
【0018】
これらの技術を用いて、前記有機半導体素子を使用したICカードまたはICタグを実現することができる。
【0019】
この有機半導体トランジスタ素子の製造方法を、各工程に沿った図2〜6を参照して説明する。なお、図2〜6は、有機半導体トランジスタ部分のみの断面図である。
【0020】
図2に示すように、まず、エポキシ樹脂からなる絶縁体基板1表面と裏面に、銅箔を張りフォトリソグラフィー工程により加工したゲート電極4と裏面配線3を形成する。次に、表面から炭酸ガスレーザ光を照射することによりコンタクト穴を開けた後、銅めっきにより穴を満たすことによってコンタクト2を形成する。
【0021】
次に、図3に示すように、アルミナからなるゲート絶縁膜5を形成する。
次に、図4に示すように、金からなるソース電極7、ドレイン電極6を金属マスクを通して、真空蒸着することにより形成した。
【0022】
次に、図5に示すように、ペンタセンからなる有機物半導体層8を、金属マスクを通して、真空蒸着により形成する。このとき、有機物半導体層の膜厚は20nmであった。
【0023】
さらに、図5に示すように、金からなるボディ電極8を金属マスクを通して、真空蒸着により形成した。
【0024】
さらに、図6に示すように、エポキシ樹脂からなる表面保護層10、裏面保護層11を形成して完成となる。
【0025】
比較のために、図7に示すようなボディ電極を持たない有機半導体トランジスタも作製した。
【0026】
試作した有機半導体トランジスタについて、ゲート電圧を0Vから−5Vの間で変動させたり、ドレイン電圧を0Vから−5Vの間で変動させる実験を行なった結果、ボディ電極の電圧を0Vを与え続けた有機半導体トランジスタではゲート閾値電圧が±0.2Vの変動で済んだのに対し、ボディ電極を持たない有機半導体トランジスタでは、±1V以上の変動を観測した。
【0027】
この試作された有機半導体トランジスタにおいて、有機半導体膜の電位を外部からあたえる電極(ボディ電極9)に一定の電圧を与えることにより、安定な駆動を実現することができた。
【0028】
また試作した素子のボディ電極9に2Vの電圧を与えることにより、常時ONのデプレッション型有機半導体トランジスタの駆動をさせることができた。
【0029】
【発明の効果】
本発明により、有機半導体膜の電位を外部からあたえる電極を更に有することにより、有機半導体膜におけるゲート電極との電位差を調整することができる有機半導体を提供することができる。またそのような有機半導体素子は有機半導体膜の閾値変動を防止することができる。
【図面の簡単な説明】
【図1】本実施形態に係る有機半導体素子を示す断面図である。
【図2】本実施形態に係る有機半導体トランジスタ素子の製造工程途中の有機半導体トランジスタ素子を示す要部断面図である。
【図3】本実施形態に係る有機半導体トランジスタ素子の製造工程途中の有機半導体トランジスタ素子を示す要部断面図である。
【図4】本実施形態に係る有機半導体トランジスタ素子の製造工程途中の有機半導体トランジスタ素子を示す要部断面図である。
【図5】
本実施形態に係る有機半導体トランジスタ素子の製造工程途中の有機半導体トランジスタ素子を示す要部断面図である。
【図6】本実施形態に係る有機半導体トランジスタ素子の製造工程途中の有機半導体トランジスタ素子を示す要部断面図である。
【図7】比較例に係る有機半導体トランジスタ素子断面図である。
【符号の説明】
1 基板
2 コンタクト
3 裏面配線
4 ゲート電極
5 ゲート絶縁膜
6 ドレイン電極
7 ソース電極
8 有機半導体層
9 ボディ電極
10 表面保護層
11 裏面保護層
[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to an organic semiconductor element, and more particularly to an organic semiconductor element having an organic semiconductor material and having an organic semiconductor transistor element.
[0002]
[Prior art]
2. Description of the Related Art In recent years, electronic devices using organic semiconductor materials have been widely developed, and development of organic EL (Electro-Luminescence), organic TFT (Thin Film Transistor), organic semiconductor laser, and the like, which are light emitting elements, has been reported. I have. Among them, an organic TFT, which is a kind of an organic semiconductor transistor, is regarded as a promising technology for forming an integrated circuit on a glass or plastic substrate at low cost.
[0003]
With respect to the structure of the organic TFT, Japanese Patent Application Laid-Open Nos. 08-228034, 09-232589, and 10-270712 disclose elements having a source and drain electrodes, a gate insulating film, and a gate electrode. .
[0004]
Originally, TFTs are often used for matrix display devices and the like, and are mainly used to maintain a constant source potential.
[0005]
[Problems to be solved by the invention]
It is considered that a TFT using an organic semiconductor operates stably when used to keep the source potential constant. On the other hand, when a logic circuit including an organic semiconductor is formed, transistors are often connected in series because of the logic circuit, and both the source potential and the drain potential may fluctuate dynamically. In this case, the potential of the organic semiconductor is estimated. The inventor has noticed that it is difficult to do so, and that this will hinder the design. Also, analog circuits have fluctuations in the threshold voltage. For example, in a differential amplifier, not only the source and drain of the transistor are not fixed to the power supply voltage or the ground voltage, but also fluctuations in the threshold voltage pose a serious problem. The inventor has noticed.
[0006]
The present invention is intended to solve the problem that, when an organic semiconductor TFT is used in a logic circuit or the like in which both the source potential and the drain potential dynamically fluctuate, it is difficult to estimate the potential of the organic semiconductor and hinder the design. is there. Therefore, an object of the present invention is to provide an organic semiconductor element capable of adjusting the potential of an organic semiconductor film and preventing a change in a threshold value, and for example, to provide an organic semiconductor element applicable to a logic circuit or the like. Another object of the present invention is to provide an organic semiconductor element having a simple structure and easy production, or an organic semiconductor TFT (transistor) element that is easy to design.
[0007]
[Means for Solving the Problems]
Therefore, the present invention provides an organic semiconductor element having a gate electrode, a gate insulating film, a source electrode, a drain electrode, and an organic semiconductor film on a substrate, further comprising an electrode for externally applying a potential of the organic semiconductor film. An organic semiconductor device is provided.
[0008]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, embodiments of the present invention will be described with reference to the drawings.
[0009]
FIG. 1 is a diagram schematically illustrating a configuration of an organic semiconductor element having an organic semiconductor transistor element on a substrate, which is an example of the organic semiconductor element according to the present embodiment.
[0010]
Reference numeral 1 denotes a substrate, 2 denotes a contact for contacting wiring, 3 denotes a back wiring, 4 denotes a gate electrode, 5 denotes a gate insulating film, 6 denotes a drain electrode, 7 denotes a source electrode, and 8 denotes an organic semiconductor film. A semiconductor layer, 9 is an electrode for externally applying the potential of the organic semiconductor film, 10 is a surface protection layer as a surface protection film, and 11 is a back surface protection layer as a back surface protection film. An electrode that applies the potential of the organic semiconductor film from the outside is hereinafter referred to as a body electrode for convenience.
[0011]
On the back surface of the substrate 1, a back wiring 3 is arranged, a contact 2 connecting the back wiring 3 and the front surface is provided, and a gate electrode 4 is further arranged. The substrate is an insulating material. Further, a gate insulating film 5 is provided on the surface of the gate electrode, and a source electrode 7 and a drain electrode 6 are arranged on the surface of the gate insulating film 5 so as to be separated from each other. An organic semiconductor layer 8 is formed while they are separated and on the ends of the electrodes, and a body electrode 9 for externally applying the potential of the organic semiconductor layer 8 is formed on the organic semiconductor layer 8. From these, it can be said that the organic semiconductor transistor element portion according to the present embodiment is configured on the substrate. The organic semiconductor element of the present invention is an element having an element such as an organic semiconductor transistor element having such an organic semiconductor film on a substrate.
[0012]
Further, the organic semiconductor element of the present embodiment further has a surface protection layer 10 on the front surface side of the substrate, and further has a back surface protection layer 11 on the back surface side. The surface protection layer 10 is provided on the substrate surface side so as to cover the organic semiconductor transistor element. The back surface protective layer 11 is provided so as to cover the back surface wiring 3 on the back surface side.
[0013]
A potential can be externally applied to the organic semiconductor layer 8 by the body electrode 9, and a potential difference from the gate electrode can be adjusted.
[0014]
As a result, it is possible to prevent the threshold from fluctuating.
[0015]
This body electrode 9 is more preferably provided at a position facing the gate electrode. Since the ON / OFF operation of the organic semiconductor transistor element is determined by the potential difference between the gate electrode and the organic semiconductor facing the gate electrode, an electrode for externally applying the potential of the organic semiconductor film is provided at a position facing the gate electrode. Thereby, the potential of the organic semiconductor layer can be determined more stably.
[0016]
By applying a voltage different from the gate voltage to the body electrode 9 and combining the gate voltage and the voltage applied to the body electrode, the drain current can be adjusted.
[0017]
Alternatively, a voltage having a sign different from the ground voltage or the power supply voltage may be constantly applied to the electrode that externally gives the potential of the organic semiconductor layer 8 during driving. By always applying a voltage having a sign different from the ground voltage or the power supply voltage during driving, an operation of controlling on / off or an operation of being always on can be realized.
[0018]
By using these techniques, an IC card or an IC tag using the organic semiconductor element can be realized.
[0019]
The method of manufacturing the organic semiconductor transistor device will be described with reference to FIGS. 2 to 6 are cross-sectional views of only the organic semiconductor transistor portion.
[0020]
As shown in FIG. 2, first, a gate electrode 4 and a back wiring 3 which are formed by applying a copper foil on a surface and a back surface of an insulating substrate 1 made of epoxy resin and processed by a photolithography process are formed. Next, a contact hole is formed by irradiating a carbon dioxide laser beam from the surface, and then the contact 2 is formed by filling the hole with copper plating.
[0021]
Next, as shown in FIG. 3, a gate insulating film 5 made of alumina is formed.
Next, as shown in FIG. 4, a source electrode 7 and a drain electrode 6 made of gold were formed by vacuum evaporation through a metal mask.
[0022]
Next, as shown in FIG. 5, an organic semiconductor layer 8 made of pentacene is formed by vacuum evaporation through a metal mask. At this time, the thickness of the organic semiconductor layer was 20 nm.
[0023]
Further, as shown in FIG. 5, a body electrode 8 made of gold was formed by vacuum evaporation through a metal mask.
[0024]
Further, as shown in FIG. 6, a front surface protection layer 10 and a back surface protection layer 11 made of epoxy resin are formed to complete the process.
[0025]
For comparison, an organic semiconductor transistor having no body electrode as shown in FIG. 7 was also manufactured.
[0026]
As a result of an experiment in which the gate voltage was varied between 0 V and −5 V and the drain voltage was varied between 0 V and −5 V, the organic semiconductor transistor that was continuously supplied with the body electrode voltage of 0 V was obtained. In the case of a semiconductor transistor, the change in gate threshold voltage was only ± 0.2 V, whereas in the case of an organic semiconductor transistor having no body electrode, a change of ± 1 V or more was observed.
[0027]
In this prototype organic semiconductor transistor, stable driving could be realized by applying a constant voltage to an electrode (body electrode 9) that externally supplies the potential of the organic semiconductor film.
[0028]
Further, by applying a voltage of 2 V to the body electrode 9 of the prototype device, the depletion type organic semiconductor transistor which is always ON can be driven.
[0029]
【The invention's effect】
According to the present invention, it is possible to provide an organic semiconductor in which a potential difference between a gate electrode and an organic semiconductor film can be adjusted by further including an electrode which externally gives a potential of the organic semiconductor film. In addition, such an organic semiconductor element can prevent a threshold change of the organic semiconductor film.
[Brief description of the drawings]
FIG. 1 is a sectional view showing an organic semiconductor device according to an embodiment.
FIG. 2 is a fragmentary cross-sectional view showing the organic semiconductor transistor element during the manufacturing process of the organic semiconductor transistor element according to the embodiment.
FIG. 3 is a fragmentary cross-sectional view showing the organic semiconductor transistor element in the course of manufacturing the organic semiconductor transistor element according to the embodiment.
FIG. 4 is a fragmentary cross-sectional view showing the organic semiconductor transistor element in the process of manufacturing the organic semiconductor transistor element according to the embodiment.
FIG. 5
FIG. 3 is a cross-sectional view of a main part showing the organic semiconductor transistor element in the course of manufacturing the organic semiconductor transistor element according to the embodiment.
FIG. 6 is a fragmentary cross-sectional view showing the organic semiconductor transistor element in the process of manufacturing the organic semiconductor transistor element according to the embodiment.
FIG. 7 is a cross-sectional view of an organic semiconductor transistor element according to a comparative example.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Substrate 2 Contact 3 Back wiring 4 Gate electrode 5 Gate insulating film 6 Drain electrode 7 Source electrode 8 Organic semiconductor layer 9 Body electrode 10 Surface protection layer 11 Back protection layer

Claims (5)

ゲート電極と、ゲート絶縁膜と、ソース電極と、ドレイン電極と、有機半導体膜とを基板上に有する有機半導体素子において、前記有機半導体膜の電位を外部からあたえる電極を更に有することを特徴とする有機半導体素子。An organic semiconductor element having a gate electrode, a gate insulating film, a source electrode, a drain electrode, and an organic semiconductor film on a substrate, further including an electrode for externally applying a potential of the organic semiconductor film. Organic semiconductor device. 前記有機半導体膜の電位を外部からあたえる電極は、前記ゲート電極と対向する位置に設けられていることを特徴とする請求項1に記載の有機半導体素子。2. The organic semiconductor device according to claim 1, wherein an electrode for externally applying a potential of the organic semiconductor film is provided at a position facing the gate electrode. 前記有機半導体膜の電位を外部からあたえる電極は、ゲート電圧と異なる電圧を前記有機半導体膜に与える電極であることを特徴とする請求項1に記載の有機半導体素子の駆動方法。The method of driving an organic semiconductor device according to claim 1, wherein the electrode that externally applies the potential of the organic semiconductor film is an electrode that applies a voltage different from a gate voltage to the organic semiconductor film. 前記有機半導体膜の電位を外部からあたえる電極は、駆動中常に接地電圧または電源電圧と異なる符合の電圧を前記有機半導体膜に与える電極であることを特徴とする請求項1に記載の有機半導体素子の駆動方法。2. The organic semiconductor element according to claim 1, wherein the electrode that externally supplies the potential of the organic semiconductor film is an electrode that constantly applies a voltage having a sign different from a ground voltage or a power supply voltage to the organic semiconductor film during driving. 3. Driving method. 請求項1に記載の前記有機半導体素子を有することを特徴とするICカードまたはICタグ。An IC card or an IC tag comprising the organic semiconductor element according to claim 1.
JP2002261503A 2002-09-06 2002-09-06 Organic semiconductor element Pending JP2004103719A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002261503A JP2004103719A (en) 2002-09-06 2002-09-06 Organic semiconductor element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002261503A JP2004103719A (en) 2002-09-06 2002-09-06 Organic semiconductor element

Publications (1)

Publication Number Publication Date
JP2004103719A true JP2004103719A (en) 2004-04-02

Family

ID=32261860

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002261503A Pending JP2004103719A (en) 2002-09-06 2002-09-06 Organic semiconductor element

Country Status (1)

Country Link
JP (1) JP2004103719A (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005122280A1 (en) * 2004-06-14 2005-12-22 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and communication system
JP2006100632A (en) * 2004-09-30 2006-04-13 Sanyo Electric Co Ltd Organic semiconductor device
KR100850890B1 (en) * 2007-02-13 2008-08-07 엘지전자 주식회사 Thin film transistor and method of manufacturing the same
JP2009198990A (en) * 2008-02-25 2009-09-03 Panasonic Corp Method for manufacturing thin film transistor array substrate and method for correcting threshold, method for correcting luminance of display device, thin film transistor array substrate, and display device
WO2009157284A1 (en) * 2008-06-24 2009-12-30 国立大学法人九州工業大学 Organic field effect transistor
WO2010095526A1 (en) * 2009-02-20 2010-08-26 国立大学法人東京大学 Method for controlling threshold voltage in organic field-effect transistor
WO2010095527A1 (en) * 2009-02-20 2010-08-26 国立大学法人東京大学 Method for producing organic semiconductor element
US8698142B2 (en) 2008-09-22 2014-04-15 Seiko Epson Corporation Organic semiconductor element, method of manufacturing organic semiconductor element, electronic device, electronic equipment and insulating layer forming composition
WO2015033881A1 (en) * 2013-09-04 2015-03-12 シャープ株式会社 Organic thin film transistor
JP2015188098A (en) * 2008-11-13 2015-10-29 株式会社半導体エネルギー研究所 semiconductor device

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9384439B2 (en) 2004-06-14 2016-07-05 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and communication system
US10411037B2 (en) 2004-06-14 2019-09-10 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and communication system
WO2005122280A1 (en) * 2004-06-14 2005-12-22 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and communication system
JP2006100632A (en) * 2004-09-30 2006-04-13 Sanyo Electric Co Ltd Organic semiconductor device
KR100850890B1 (en) * 2007-02-13 2008-08-07 엘지전자 주식회사 Thin film transistor and method of manufacturing the same
JP2009198990A (en) * 2008-02-25 2009-09-03 Panasonic Corp Method for manufacturing thin film transistor array substrate and method for correcting threshold, method for correcting luminance of display device, thin film transistor array substrate, and display device
WO2009157284A1 (en) * 2008-06-24 2009-12-30 国立大学法人九州工業大学 Organic field effect transistor
US8569746B2 (en) 2008-06-24 2013-10-29 Kyushu Institute Of Technology Organic field effect transistor
US8698142B2 (en) 2008-09-22 2014-04-15 Seiko Epson Corporation Organic semiconductor element, method of manufacturing organic semiconductor element, electronic device, electronic equipment and insulating layer forming composition
US9559212B2 (en) 2008-11-13 2017-01-31 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method for manufacturing the same
JP2015188098A (en) * 2008-11-13 2015-10-29 株式会社半導体エネルギー研究所 semiconductor device
WO2010095527A1 (en) * 2009-02-20 2010-08-26 国立大学法人東京大学 Method for producing organic semiconductor element
WO2010095526A1 (en) * 2009-02-20 2010-08-26 国立大学法人東京大学 Method for controlling threshold voltage in organic field-effect transistor
WO2015033881A1 (en) * 2013-09-04 2015-03-12 シャープ株式会社 Organic thin film transistor

Similar Documents

Publication Publication Date Title
Klauk et al. Pentacene organic thin-film transistors and ICs
EP1310997B1 (en) Light emitting device
JP4748986B2 (en) Method for manufacturing semiconductor device
JP3723507B2 (en) Driving circuit
US8039295B2 (en) Organic inverter including surface-treated layer and method of manufacturing the same
EP1587154A3 (en) Organic electro-luminescent display device and method of manufacturing the same
EP1367659A3 (en) Organic field effect transistor
TW200923884A (en) Thin film transistor circuit, light emitting display apparatus, and driving method thereof
EP2061086A3 (en) Thin film field effect transistor and display using the same
JP2003223138A5 (en)
TW200308111A (en) Display apparatus and its method of manufacture
WO2003016599A1 (en) Organic semiconductor element
EP2009695A3 (en) Thin film transistor method of fabricating the same organic light emitting diode display device including the same and method of fabricating the same
JP2004103719A (en) Organic semiconductor element
JP6608008B2 (en) Light emitting device
EP1659633A3 (en) Flat panel display and its method of fabrication
JP2003264063A (en) Display device
JP2007088491A (en) Semiconductor device and method for manufacturing semiconductor device
US20240096287A1 (en) Display apparatus
CN106024811A (en) Display substrate and manufacturing method thereof, and display device
TW200503300A (en) Field emission diode (FED)
JP2006120720A (en) Process for fabricating thin film device, active matrix substrate, electro-optical device, electronic apparatus
JP4149443B2 (en) Light emitting device
US20110180799A1 (en) Electronic device comprising static induction transistor and thin film transistor, method of manufacturing an electronic device and display panel
JP2003174170A (en) Display unit

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20050906

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20081027

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20081104

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20090317