JP2003303677A - Self-luminous element - Google Patents
Self-luminous elementInfo
- Publication number
- JP2003303677A JP2003303677A JP2002106999A JP2002106999A JP2003303677A JP 2003303677 A JP2003303677 A JP 2003303677A JP 2002106999 A JP2002106999 A JP 2002106999A JP 2002106999 A JP2002106999 A JP 2002106999A JP 2003303677 A JP2003303677 A JP 2003303677A
- Authority
- JP
- Japan
- Prior art keywords
- light
- self
- luminous element
- transparent substrate
- partition wall
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims abstract description 51
- 238000005192 partition Methods 0.000 claims abstract description 44
- 238000005401 electroluminescence Methods 0.000 claims description 20
- 239000012212 insulator Substances 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 27
- 239000011347 resin Substances 0.000 description 14
- 229920005989 resin Polymers 0.000 description 14
- 239000011521 glass Substances 0.000 description 9
- 238000000605 extraction Methods 0.000 description 6
- 239000010408 film Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000012463 white pigment Substances 0.000 description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000011159 matrix material Substances 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 3
- 229910019015 Mg-Ag Inorganic materials 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- CJDPJFRMHVXWPT-UHFFFAOYSA-N barium sulfide Chemical compound [S-2].[Ba+2] CJDPJFRMHVXWPT-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000001723 curing Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 239000005725 8-Hydroxyquinoline Substances 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- 238000003848 UV Light-Curing Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 125000000040 m-tolyl group Chemical group [H]C1=C([H])C(*)=C([H])C(=C1[H])C([H])([H])[H] 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 229960003540 oxyquinoline Drugs 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- MCJGNVYPOGVAJF-UHFFFAOYSA-N quinolin-8-ol Chemical compound C1=CN=C2C(O)=CC=CC2=C1 MCJGNVYPOGVAJF-UHFFFAOYSA-N 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
Landscapes
- Electroluminescent Light Sources (AREA)
- Transforming Electric Information Into Light Information (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、光取出し効率(出
光率)が高く、視認性を向上させたエレクトロルミネッ
センス(EL)素子やプラズマディスプレイ(PDP)
素子などの自発光素子に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electroluminescence (EL) element or a plasma display (PDP) which has a high light extraction efficiency (light emission rate) and improved visibility.
The present invention relates to a self-luminous element such as an element.
【0002】[0002]
【従来の技術】従来、EL素子やPDP素子などの自発
光型の素子において、その発光層から発生する光は指向
性があまりなく、それを支持する透明基板内に等方的に
均一に放出される。放出された光のうち、光取出し面
(出光面)に対して臨界角以上の光は、図6の符号11
に示すように、全反射を起こし、透明基板20内から外
部に光を取り出すことができない。スネルの屈折の法則
により屈折率nから空気中に出射される際の全反射の臨
界角は次式で表すことができる。
nsinθc=1 (1)2. Description of the Related Art Conventionally, in a self-luminous element such as an EL element or a PDP element, light emitted from its light emitting layer has little directivity and isotropically and uniformly emitted into a transparent substrate supporting it. To be done. Of the emitted light, light having a critical angle or more with respect to the light extraction surface (light output surface) is denoted by reference numeral 11 in FIG.
As shown in FIG. 5, total reflection occurs, and light cannot be extracted from the inside of the transparent substrate 20 to the outside. According to Snell's law of refraction, the critical angle of total reflection when emitted from the refractive index n into the air can be expressed by the following equation. n sin θ c = 1 (1)
【0003】図6の基板20の屈折率が一般のガラスや
透明樹脂の場合の光取出し効率ηは、凡そ20%でしか
なく、外部発光効率(出光率)を制限している最大の要
因となっている。特開平10−241856号公報に
は、ガラス基板表面を粗面にし、EL素子発光層から出
射した光を散乱させ、出光率を向上させる方法が開示さ
れているが、臨界角以下の光に対しては、上記粗面によ
る散乱により、散乱光が臨界角以上になる成分が発生
し、出光率にロスが生じる。The light extraction efficiency η when the substrate 20 shown in FIG. 6 is made of general glass or transparent resin has a light extraction efficiency η of only about 20%, which is the largest factor limiting the external light emission efficiency (light emission rate). Has become. Japanese Unexamined Patent Publication (Kokai) No. 10-241856 discloses a method in which the surface of a glass substrate is roughened to scatter light emitted from an EL element light-emitting layer to improve the light emission rate. As a result, due to the scattering by the rough surface, a component of the scattered light having a critical angle or more is generated, which causes a loss in the light output rate.
【0004】[0004]
【発明が解決しようとする課題】本発明は、EL素子や
PDP素子などの自発光型の素子の発光層から放出さ
れ、光取り出し面に対して臨界角以上の光を、透明基板
内で拡散反射させることによって、出光率が高く、視認
性を向上させたEL素子やPDP素子などの自発光素子
の提供を目的とする。SUMMARY OF THE INVENTION The present invention diffuses, within a transparent substrate, light emitted from a light-emitting layer of a self-luminous element such as an EL element or a PDP element and having a critical angle or more with respect to a light extraction surface. An object of the present invention is to provide a self-luminous element such as an EL element or a PDP element that has a high light emission rate and improved visibility by being reflected.
【0005】[0005]
【課題を解決するための手段】上記目的は以下の本発明
によって達成される。すなわち、本発明は、少なくとも
一方が透明または半透明である一対の陽極および陰極か
らなる電極間に少なくとも発光層を有し、その出光側
が、透明基板により支持された自発光素子において、上
記透明基板と外部との界面に対して前記発光層から臨界
角よりも大きな角度で出射した光を拡散反射させる隔壁
を前記透明基板内に設けたことを特徴とする自発光素子
を提供する。The above object can be achieved by the present invention described below. That is, the present invention is a self-luminous element having at least a light emitting layer between an electrode composed of a pair of an anode and a cathode, at least one of which is transparent or semitransparent, the light emitting side of which is a self-luminous element supported by a transparent substrate, wherein the transparent substrate There is provided a self-luminous element, characterized in that a partition for diffusing and reflecting light emitted from the light emitting layer at an angle larger than a critical angle with respect to an interface between the transparent substrate and the outside is provided in the transparent substrate.
【0006】[0006]
【発明の実施の形態】次に好ましい実施の形態を挙げて
本発明をさらに詳しく説明する。図1は、本発明の1実
施例を示す素子の概略断面図である。本発明の自発光素
子は、図1に示すように、透明陽極21および不透明ま
たは光反射性陰極23からなる電極間に少なくとも発光
層22を有し、その出光側が、透明基板20により支持
された自発光素子において、上記透明基板20と外部と
の界面に対して前記発光層22から臨界角よりも大きな
角度で出射した光を拡散反射させる隔壁30を前記透明
基板20内に設けたことを特徴としている。なお、上記
において陽極と陰極とが逆であって、陰極が透明で、陽
極が不透明または光反射性であってもよい。BEST MODE FOR CARRYING OUT THE INVENTION The present invention will be described in more detail with reference to the following preferred embodiments. FIG. 1 is a schematic sectional view of an element showing one embodiment of the present invention. As shown in FIG. 1, the self-luminous element of the present invention has at least a light emitting layer 22 between electrodes composed of a transparent anode 21 and an opaque or light reflecting cathode 23, and the light emitting side thereof is supported by a transparent substrate 20. In the self-luminous element, a partition wall 30 for diffusing and reflecting light emitted from the light emitting layer 22 at an angle larger than a critical angle with respect to the interface between the transparent substrate 20 and the outside is provided in the transparent substrate 20. I am trying. In the above, the anode and the cathode may be reversed, the cathode may be transparent, and the anode may be opaque or light reflective.
【0007】上記自発光素子を駆動させると、図2に示
すように透明陽極21から出射した光のうちで、臨界角
以上の角度成分の光11は隔壁に30によって反射さ
れ、透明基板20と空気との界面において臨界角未満の
角度の光12として透明基板20から出光する。このよ
うに光12を隔壁で反射させるために、隔壁表面に光散
乱性を持たせておくことが好ましい。When the self-luminous element is driven, as shown in FIG. 2, among the light emitted from the transparent anode 21, the light 11 having an angle component equal to or larger than the critical angle is reflected by the partition wall 30 and the transparent substrate 20. Light 12 is emitted from the transparent substrate 20 as light 12 having an angle less than the critical angle at the interface with air. In this way, in order to reflect the light 12 on the partition wall, it is preferable that the partition wall surface has a light scattering property.
【0008】隔壁30の高さhは、画素(隔壁)のピッ
チをdとしたとき次式(2)のようにすることにより、
出射光の臨界角以上の角度成分の光11を隔壁に入射さ
せ、角度変換を行うことができる。
例えば(2)式より、屈折率1.5の透明基板20にお
いてピッチ(d)を76μmとすると、隔壁の高さ
(h)は85μm以上が望ましい。hが高くなることに
より、出射光の正面方向への指向性を向上させることが
できる。hが(2)式を満たしていなくとも、出光率向
上の効果を期待することができることから、固定された
図柄、文字などを表示する比較的発光エリアの広い自発
光素子についても、発光エリア端に上記隔壁30を設け
ることにより出光率を向上させることができる。The height h of the partition wall 30 is set by the following equation (2), where the pitch of the pixels (partition wall) is d.
The angle conversion can be performed by causing the light 11 having an angle component equal to or more than the critical angle of the emitted light to enter the partition wall. For example, from the equation (2), when the pitch (d) is 76 μm in the transparent substrate 20 having a refractive index of 1.5, the height (h) of the partition wall is preferably 85 μm or more. By increasing h, the directivity of the emitted light in the front direction can be improved. Even if h does not satisfy the formula (2), the effect of improving the light emission rate can be expected. Therefore, even for a self-luminous element having a relatively wide light emitting area for displaying a fixed pattern, characters, etc. The light output rate can be improved by providing the partition wall 30.
【0009】上記本発明の自発光素子における隔壁30
は、白色系であることが好ましい。これより液晶ディス
プレイ用カラーフィルターの遮光膜に関する特開平11
−271755号公報に開示されているように、上記自
発光素子を白基調の背景色のときに使用すると、隔壁3
0の色により表示画像の視認性を劣化させることがな
い。上記隔壁30の材料として、白色で反射率の高い硫
化バリウム、酸化マグネシウム、酸化アルミニウム、酸
化チタンなどの金属酸化物や金属化合物などの粉末を押
し固めたものや、これらの粉末を樹脂に分散させたもの
などが使用できる。The partition wall 30 in the self-luminous element of the present invention.
Is preferably white. From this, a light-shielding film of a color filter for a liquid crystal display is disclosed in Japanese Patent Application Laid-Open No. HEI11
As disclosed in Japanese Patent Publication No. 2771755, when the self-luminous element is used for a white-based background color, the partition wall 3
The 0 color does not deteriorate the visibility of the displayed image. The material of the partition wall 30 is obtained by pressing powder of metal oxide or metal compound such as barium sulfide, magnesium oxide, aluminum oxide, titanium oxide, etc., which is white and has high reflectance, or these powders are dispersed in a resin. It can be used for things.
【0010】図3に示す実施の形態は、前記隔壁30
が、陽極21および発光層22を貫通して陰極23に達
している例である。この場合には、隔壁30を絶縁体と
することにより、隔壁30によって区画されるそれぞれ
の画素に、発光色の異なる発光層を設け、ドットマトリ
クス型のディスプレイとすることができる。そのために
は各画素間で電極21を電気的に隔離する必要がある。
そのために上記隔壁30が絶縁体であるこが必要であ
り、このような隔壁30を用いることによりドットマト
リクス型のディスプレイの製造工程の簡略化も可能であ
る。In the embodiment shown in FIG. 3, the partition wall 30 is used.
Is an example of penetrating the anode 21 and the light emitting layer 22 to reach the cathode 23. In this case, by using the partition wall 30 as an insulator, each pixel partitioned by the partition wall 30 can be provided with a light emitting layer having a different color of light emission to form a dot matrix type display. For that purpose, it is necessary to electrically isolate the electrode 21 between each pixel.
Therefore, the partition 30 needs to be an insulator, and by using such a partition 30, the manufacturing process of a dot matrix type display can be simplified.
【0011】図4は、図3のA−A矢視図であり、隔壁
30は平行したストライプ状に設けられていることを説
明している。このように隔壁30と発光層22とが透明
基板20の面方向に交互に配列したストライプ状であっ
てもよいし、図5に示すように隔壁30がドットマトリ
ックス状でもよい。隔壁30をドットマトリックス状に
して、各画素内にR、G、Bなどの如く発光色の異なる
発光層を設けることにより、フルカラー画像の表示が可
能である。FIG. 4 is a view taken along the line AA of FIG. 3, and illustrates that the partition walls 30 are provided in parallel stripes. As described above, the partition walls 30 and the light emitting layers 22 may have a stripe shape in which they are alternately arranged in the surface direction of the transparent substrate 20, or as shown in FIG. 5, the partition walls 30 may have a dot matrix shape. A full-color image can be displayed by forming the partition walls 30 in a dot matrix form and providing light emitting layers such as R, G, and B having different emission colors in each pixel.
【0012】上記本発明の自発光素子に用いる透明基板
20の材質としては、ガラスや、アクリル樹脂、ポリカ
ーボネート、ポリエステル、ポリスチレンなどの透明樹
脂が使用できる。図1に示す実施の形態の自発光素子を
形成する場合には、透明基板20がガラスである場合に
は、機械切削、フォトリソグラフィーによるエッチング
などで隔壁となる溝を形成することができる。また、透
明基板20が上記の如き透明樹脂のフィルム、シートま
たは板などの場合には、上記のガラス板の加工方法に加
えて、隔壁30と同一形状の凸部を有するプレス金型を
用いて隔壁30となる溝を連続的に形成することができ
る。加工の容易性および生産性の点からは透明樹脂を用
いることが好ましい。As the material of the transparent substrate 20 used for the self-luminous element of the present invention, glass or a transparent resin such as acrylic resin, polycarbonate, polyester, polystyrene or the like can be used. In the case of forming the self-luminous element of the embodiment shown in FIG. 1, when the transparent substrate 20 is glass, the groove serving as a partition can be formed by mechanical cutting, etching by photolithography or the like. When the transparent substrate 20 is a film, sheet, or plate of the transparent resin as described above, a press die having a protrusion having the same shape as the partition 30 is used in addition to the above-described glass plate processing method. The groove to be the partition 30 can be continuously formed. From the viewpoint of ease of processing and productivity, it is preferable to use a transparent resin.
【0013】上記の如く形成した溝中に、白色で反射率
の高い硫化バリウム、酸化マグネシウム、酸化アルミニ
ウム、酸化チタンなどの白色顔料を充填して隔壁30と
することができる。これらの白色顔料は、樹脂を含む溶
液中に分散させて、ブレードなどにより溝に充填しても
よいし、熱硬化性樹脂、紫外線または電子線硬化性樹脂
中に上記白色顔料を分散させたペーストをブレードなど
を用いて溝に充填し、樹脂を硬化させて隔壁とすること
もできる。さらに、上記充填後に、その面に上記の如き
何れかのクリヤー塗料を薄く塗布および硬化させて表面
平滑性を上げることも好ましい。The partition wall 30 can be formed by filling the groove formed as described above with a white pigment having a high reflectance such as barium sulfide, magnesium oxide, aluminum oxide and titanium oxide. These white pigments may be dispersed in a solution containing a resin and filled in a groove with a blade or the like, or a paste in which the white pigment is dispersed in a thermosetting resin, an ultraviolet ray or an electron beam curable resin. It is also possible to fill the groove with a blade or the like and cure the resin to form a partition wall. Furthermore, after the above-mentioned filling, it is also preferable to thinly coat and cure any one of the above-mentioned clear coatings on the surface to improve the surface smoothness.
【0014】次に上記透明基板20の図面上下方の面
に、陽極21、発光層22および陰極23および支持基
板24を積層することにより、図1に示す構造の本発明
の自発光素子が得られる。なお、この場合の支持基板2
4は必須ではないが、素子の耐久性などの点で設けた方
が好ましい。該支持基板24は厚みには特に制限がな
く、材質はガラス板や樹脂フィルムやシートである。ま
た、予め、支持基板24に陰極23、発光層22および
陽極21を積層してなる素子基板に、上記隔壁30を形
成した透明基板20を適当な接着剤で積層して本発明の
自発光素子とすることもできる。図2に示す自発光素子
は、前記のように発光層22から出射された光の透明基
板20からの出光率が向上している。Next, the anode 21, the light emitting layer 22, the cathode 23 and the supporting substrate 24 are laminated on the lower surface of the transparent substrate 20 in the drawing to obtain the self-luminous element of the present invention having the structure shown in FIG. To be The supporting substrate 2 in this case
No. 4 is not essential, but it is preferable to provide 4 in terms of durability of the device. The thickness of the support substrate 24 is not particularly limited, and the material thereof is a glass plate, a resin film or a sheet. The self-luminous element of the present invention is prepared by laminating the transparent substrate 20 on which the partition walls 30 are formed with an appropriate adhesive on an element substrate obtained by laminating the cathode 23, the light emitting layer 22 and the anode 21 on the supporting substrate 24 in advance. Can also be In the self-luminous element shown in FIG. 2, the light emission rate of the light emitted from the light emitting layer 22 from the transparent substrate 20 is improved as described above.
【0015】また、図3に示す実施形態の本発明の自発
光素子の場合には、支持基板24上に形成した陰極23
上に、前記の如き白色顔料などを感光性樹脂に分散させ
たペーストを塗工して感光層を形成し、該感光層をフォ
トリソグラフィー法によりパターニングして隔壁30を
形成することができる。隔壁の形成は、例えば、シルク
スクリーン印刷法によっても形成できる。なお、隔壁の
幅、高さ、間隔、その他の構成は図1に示す実施形態と
同様でよい。Further, in the case of the self-luminous element of the present invention of the embodiment shown in FIG. 3, the cathode 23 formed on the support substrate 24.
The partition wall 30 can be formed by applying a paste in which a white pigment as described above is dispersed in a photosensitive resin to form a photosensitive layer, and patterning the photosensitive layer by a photolithography method. The partition wall can also be formed by, for example, a silk screen printing method. The width, height, interval, and other configurations of the partition wall may be the same as those in the embodiment shown in FIG.
【0016】その後に隔壁30によって区画された領域
内に、発光層22および透明電極21を順に成膜し、そ
の上に熱硬化性樹脂、紫外線または電子線硬化性透明塗
料を塗布し、硬化させることにより透明基板20を形成
して本発明の自発光素子が得られる。なお、図3におい
て、隔壁を形成した後、隔壁間にガラスや上記の如き透
明樹脂を同様に充填した後、その表面にガラス板や樹脂
シート(フィルム)などを積層しても本発明の自発光素
子が得られる。この図3に示す自発光素子は、前記のよ
うに発光層22から出射された光の透明基板20からの
出光率が向上している。After that, a light emitting layer 22 and a transparent electrode 21 are sequentially formed in a region defined by the partition wall 30, and a thermosetting resin, an ultraviolet ray or electron beam curable transparent coating material is applied and cured thereon. As a result, the transparent substrate 20 is formed and the self-luminous element of the present invention is obtained. In FIG. 3, after the partition walls are formed, glass or the transparent resin as described above is similarly filled between the partition walls, and then a glass plate, a resin sheet (film), or the like is laminated on the surface of the partition walls. A light emitting device is obtained. In the self-luminous element shown in FIG. 3, the light emission rate of the light emitted from the light emitting layer 22 from the transparent substrate 20 is improved as described above.
【0017】本発明の自発光素子としては、EL素子や
PDP素子が挙げられるが、特にEL素子が有用であ
る。EL素子である1実施例を以下に説明する。図1を
参照して説明する。図1は、本発明の1例のEL表示装
置の一部拡大断面図を示す。透明基板20としてアクリ
ル基板(住友化学製、スミペックス、屈折率1.49)
を用い、この上に、光重合性のアクリルモノマーを所定
の厚みだけスリットコートした。本実施例では硬化後の
基板全厚みを0.5mmとした。次に隔壁30を設ける
ために、型押しを可能とする離型処理した金型を上記基
板に押し付け、アクリル基板側より紫外線を所定光量だ
け照射した。硬化完了後、金型を剥離することで、スト
ライプ状の溝を有する基板を得ることができた。ここで
基板の寸法を以下の通り設計して作製した。
基板総厚=0.5mm
溝の深さ=0.08mm
溝の幅=0.051mm
溝のピッチ=0.076mmExamples of the self-luminous element of the present invention include EL elements and PDP elements, and EL elements are particularly useful. An example of an EL element will be described below. This will be described with reference to FIG. FIG. 1 is a partially enlarged sectional view of an EL display device as an example of the present invention. Acrylic substrate as the transparent substrate 20 (Sumitex Chemical, Sumipex, refractive index 1.49)
Was used, and a photopolymerizable acrylic monomer was slit-coated on this by a predetermined thickness. In this example, the total thickness of the substrate after curing was 0.5 mm. Next, in order to provide the partition walls 30, a mold which has been subjected to mold release treatment was pressed against the substrate, and a predetermined amount of ultraviolet rays was irradiated from the acrylic substrate side. After the curing was completed, the mold was peeled off to obtain a substrate having stripe-shaped grooves. Here, the dimensions of the substrate were designed and manufactured as follows. Total thickness of substrate = 0.5 mm Groove depth = 0.08 mm Groove width = 0.051 mm Groove pitch = 0.076 mm
【0018】次に上記溝に、白色顔料粉末(酸化チタ
ン)を封入し、封入を確実にするために、アクリルモノ
マーを白色顔料を充填した溝内に滴下し、スピンコート
によって全表面に薄膜を形成し、後に紫外線により硬化
させた。この薄膜層形成には、これ以外にEL層の形成
プロセスを容易にする効果も持つ。Next, white pigment powder (titanium oxide) is enclosed in the groove, and in order to ensure the enclosure, an acrylic monomer is dropped into the groove filled with the white pigment, and a thin film is formed on the entire surface by spin coating. It was formed and subsequently cured by UV light. In addition to this, the thin film layer formation also has an effect of facilitating the EL layer formation process.
【0019】続いて上記基板20に、次のようにしてE
L層を形成した。ITO透明電極21をスパッタした。
発光層は、発光有機材料Alq3[tris(8-hydroxyquinol
ine)aluminium]と正孔注入層TPD[N,N'-diphenyl-N,
N'-bis(3-methyl-phenyl)-1,1-diphenyl-4,4'-diamine]
を積層した。透明陽極21としてはITOを、光反射性
陰極23としてMg−Ag合金を用いた。TPDとIT
Oが接する積層順とした。Then, on the substrate 20, E
The L layer was formed. The ITO transparent electrode 21 was sputtered.
The light emitting layer is made of a light emitting organic material Alq 3 [tris (8-hydroxyquinol
ine) aluminium] and hole injection layer TPD [N, N'-diphenyl-N,
N'-bis (3-methyl-phenyl) -1,1-diphenyl-4,4'-diamine]
Were laminated. ITO was used as the transparent anode 21, and Mg-Ag alloy was used as the light-reflective cathode 23. TPD and IT
The stacking order was such that O was in contact.
【0020】ITO21は150nmとし、高真空下で
予熱を十分に行った昇華精製装置で精製したTPDをタ
ングステンボードに装荷して抵抗加熱法で50nm成膜
した。そして、この上に昇華精製されたAlq3を石英
ボードに装荷して抵抗加熱法で30nm成膜した。最後
にMg−Ag合金(Mg:Ag=10:1)を厚さ15
0nmになるように蒸着し、さらにその上に保護層とし
てAgを200nmの厚みになるように蒸着し、最後に
別に用意したガラス板24とUV硬化シール材により封
止し、有機EL表示装置のパネル部を得た。このEL表
示装置にコントローラーと電源回路を接続して本発明の
EL表示装置を完成した。The ITO 21 was 150 nm thick, and TPD purified by a sublimation purifying apparatus sufficiently preheated under high vacuum was loaded on a tungsten board to form a 50 nm film by a resistance heating method. Then, sublimated and purified Alq 3 was loaded on the quartz board and a 30 nm film was formed by a resistance heating method. Finally, the thickness of the Mg-Ag alloy (Mg: Ag = 10: 1) is 15
It is vapor-deposited so as to have a thickness of 0 nm, Ag is vapor-deposited thereon as a protective layer so as to have a thickness of 200 nm, and finally, it is sealed with a separately prepared glass plate 24 and a UV-curing sealing material, and the The panel section was obtained. The EL display device of the present invention was completed by connecting a controller and a power supply circuit to this EL display device.
【0021】続いてこのEL表示装置の電源回路を動作
させ、点灯表示させ、輝度の向上を確認するため、輝度
測定装置(トプコンBM−7)を用いた。測定の結果、
同等で、屈折率層が単一な一般の基板に同等のEL層パ
ターンを形成した表示装置に比較して、EL発光の出光
率が約20%向上することが確認できた。これは、基板
20内に放射されたEL光は通常の基板ならば、垂直方
向から41.8度から臨界角を超えて全反射して取り出
せないのに対し、本発明では、隔壁30が形成されてい
るため、放射光はその分、臨界角が寝ることになり、そ
の分の放射光は全反射されずに出光させたためと考え
る。Subsequently, the power supply circuit of this EL display device was operated to light up the display, and a brightness measuring device (Topcon BM-7) was used in order to confirm the improvement in brightness. As a result of the measurement,
It has been confirmed that the light emission rate of EL emission is improved by about 20% as compared with a display device in which an equivalent EL layer pattern is formed on a general substrate having the same refractive index layer. This is because the EL light radiated in the substrate 20 cannot be extracted by being totally reflected from the vertical direction from 41.8 degrees beyond the critical angle in the case of a normal substrate, whereas in the present invention, the partition wall 30 is formed. Therefore, it is considered that the radiated light has a critical angle lying by that amount, and that radiated light is emitted without being totally reflected.
【0022】[0022]
【発明の効果】上記の如き本発明によれば、EL素子や
PDP素子などの自発光型の素子の発光層から放出さ
れ、光取り出し面に対して臨界角以上の光を、透明基板
内で拡散反射させることによって、出光率が高く、視認
性を向上させたEL素子やPDP素子などの自発光素子
を提供することができる。According to the present invention as described above, light emitted from a light emitting layer of a self-luminous element such as an EL element or a PDP element and having a critical angle or more with respect to a light extraction surface is transmitted within a transparent substrate. It is possible to provide a self-luminous element such as an EL element or a PDP element having a high light output rate and improved visibility by diffuse reflection.
【図1】 本発明の1例の自発光素子の断面図。FIG. 1 is a sectional view of a self-luminous element as an example of the present invention.
【図2】 図1の自発光素子の機能を説明する図。FIG. 2 is a diagram for explaining the function of the self-luminous element of FIG.
【図3】 本発明の他の例の自発光素子の機能を説明す
る図FIG. 3 is a diagram illustrating a function of a self-luminous element of another example of the present invention.
【図4】 隔壁配列の1例を説明する図。FIG. 4 is a diagram illustrating an example of a partition wall arrangement.
【図5】 隔壁配列の他の例を説明する図。FIG. 5 is a diagram illustrating another example of the partition wall arrangement.
【図6】 従来の自発光素子を説明する断面図。FIG. 6 is a sectional view illustrating a conventional self-luminous element.
10:透過光 11:全反射光 12:拡散反射光 20:透明基板 21:陽極 22:発光層 23:陰極 24:支持基板 30:隔壁 10: transmitted light 11: Totally reflected light 12: Diffuse reflected light 20: Transparent substrate 21: Anode 22: Light emitting layer 23: cathode 24: Support substrate 30: Partition wall
Claims (4)
る一対の陽極および陰極からなる電極間に少なくとも発
光層を有し、その出光側が、透明基板により支持された
自発光素子において、上記透明基板と外部との界面に対
して前記発光層から臨界角よりも大きな角度で出射した
光を拡散反射させる隔壁を前記透明基板内に設けたこと
を特徴とする自発光素子。1. A self-luminous element having at least a light emitting layer between an electrode composed of a pair of an anode and a cathode, at least one of which is transparent or semi-transparent, the light emitting side of which is supported by a transparent substrate. A self-luminous element, wherein a partition for diffusing and reflecting light emitted from the light emitting layer at an angle larger than a critical angle with respect to an interface with the outside is provided in the transparent substrate.
載の自発光素子。2. The self-luminous element according to claim 1, wherein the partition wall is white.
載の自発光素子。3. The self-luminous element according to claim 1, wherein the partition wall is an insulator.
求項1に記載の自発光素子。4. The self-luminous element according to claim 1, which is an electroluminescence element.
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