JP2003302543A - Opto-electric circuit and opto-electric wiring board - Google Patents
Opto-electric circuit and opto-electric wiring boardInfo
- Publication number
- JP2003302543A JP2003302543A JP2002108092A JP2002108092A JP2003302543A JP 2003302543 A JP2003302543 A JP 2003302543A JP 2002108092 A JP2002108092 A JP 2002108092A JP 2002108092 A JP2002108092 A JP 2002108092A JP 2003302543 A JP2003302543 A JP 2003302543A
- Authority
- JP
- Japan
- Prior art keywords
- optical
- light
- signal
- electric
- optical signal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Parts Printed On Printed Circuit Boards (AREA)
- Structure Of Printed Boards (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- Optical Integrated Circuits (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、光によって情報を
伝送する回路およびその配線基板に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a circuit for transmitting information by light and its wiring board.
【0002】[0002]
【従来技術】近年、電子回路基板は、小型、高性能化を
実現するために、片面だけに回路を形成した片面板から
両面に回路を形成した両面板に、さらに回路を積層した
多層回路基板へと変化してきており、現在では多層化の
進んだ基板が多く採用されている。2. Description of the Related Art In recent years, electronic circuit boards are multi-layer circuit boards in which circuits are laminated on a double-sided board having circuits formed on both sides from a single-sided board having circuits formed on only one side thereof in order to realize miniaturization and high performance. The number of substrates with advanced multi-layers is now widely used.
【0003】以下、多層基板の製造について説明する。
まず、多層基板の製造工程では、ガラスクロスにエポキ
シを含浸し乾燥させたプリプレグと呼ばれる基板材料の
両面に銅箔を張付け、この銅箔の上にドライフィルムを
ラミネートし、感光、現像、銅箔のエッチング、ドライ
フィルム除去の工程を経て両面板を形成する。次に、こ
の両面板とプリプレグを交互に積層し、加熱・プレスに
よって一体化する。その後、所望の位置に穴を加工した
うえで、穴の内面にメッキを施し、各層間の導通を確保
する。この回路基板の穴は、普通ドリルやパンチングマ
シンにより1穴づつ形成されるが、コストダウンのため
にレーザにより高速穴加工することもある。The manufacture of the multilayer substrate will be described below.
First of all, in the manufacturing process of a multi-layer substrate, copper foil is attached to both sides of a substrate material called prepreg which is made by impregnating glass cloth with epoxy and dried, and a dry film is laminated on this copper foil, followed by exposure, development and copper foil. The double-sided plate is formed through the steps of etching and dry film removal. Next, the double-sided plate and the prepreg are alternately laminated and integrated by heating and pressing. After that, a hole is formed at a desired position, and then the inner surface of the hole is plated to ensure electrical continuity between the layers. The holes of this circuit board are usually formed one by one by a drill or a punching machine, but high-speed holes may be processed by a laser for cost reduction.
【0004】そして、レーザ穴加工においては、レーザ
の波長、出力、パルス幅などの条件設定が必要となる。
そのため、エポキシ樹脂等に強化材等のガラス繊維やア
ラミド繊維等を複合させたFRP基板等の穴加工では、
前記副成分に対応する加工性を加工面において確保する
ために、出力、パルス幅などを変えて条件の調整を行
い、これにより歩留まりを向上させている。In the laser drilling, it is necessary to set conditions such as laser wavelength, output and pulse width.
Therefore, in drilling holes such as FRP substrates that are made by compounding glass fibers such as reinforcing materials and aramid fibers with epoxy resin,
In order to secure the workability corresponding to the sub-component on the machined surface, the output, pulse width, etc. are changed to adjust the conditions, thereby improving the yield.
【0005】また、穴加工したビアホールやスルーホー
ルにペーストを押圧して充填する工程では、スキージと
呼ばれる充填ヘッドを用いた印刷工法が用いられる。こ
の印刷工法においては、スキージの硬度、角度、印圧、
充填動作の速度など極めて多くの条件設定が必要であ
り、わずかな設定の差が品質に影響を与えるため、製造
現場での経験をもとにそれらの調整を行い、ペースト充
填工程での歩留まり、品質を向上させている。また、ペ
ーストの充填工程においては、スキージに対する工夫が
なされており、平スキージ、剣スキージ、印刷面との接
触部が曲面となっているスキージなどスキージの形状に
工夫がなされているだけでなく、スキージにヒータを内
蔵し、一定温度に加熱してペーストの粘度を低下させて
充填性を向上させている。さらに、ペーストは稼働時間
に比例してその粘度が上昇することから、一定時間毎に
ペーストを入れ換えたり有機溶剤を加え、ペーストの粘
度の安定化を図っている。その他、穴加工されたビアホ
ールやスルーホールヘのペーストの充填量をコントロー
ルするために、穴の上端位置(基板表面)までペースト
を充填することで充填量の安定化を図っている。Further, in the step of pressing and filling the paste into the via holes or through holes which have been machined, a printing method using a filling head called a squeegee is used. In this printing method, squeegee hardness, angle, printing pressure,
Since it is necessary to set extremely many conditions such as the speed of the filling operation, and a slight difference in settings affects the quality, adjustments are made based on experience at the manufacturing site, and the yield in the paste filling process, Improving quality. In addition, in the paste filling process, squeegees have been devised, and not only squeegees such as a flat squeegee, a sword squeegee, and a squeegee with a curved contact portion with the printing surface have been devised. A heater is built into the squeegee and heated to a constant temperature to reduce the viscosity of the paste and improve the filling property. Further, since the viscosity of the paste increases in proportion to the operating time, the pastes are replaced at regular intervals or an organic solvent is added to stabilize the viscosity of the paste. In addition, in order to control the filling amount of the paste into the via hole and the through hole that have been processed with holes, the filling amount is stabilized by filling the paste up to the upper end position (substrate surface) of the hole.
【0006】さらに、ビアホールやスルーホールに導体
をメッキする方法においては、最表面だけは配線形成を
施さず、両面板とプリプレグを交互に積層し、加熱・プ
レスによって一体化させる。さらに所望の位置に穴加工
し、最表面の銅箔を利用して電気的に穴の内面にメッキ
を施す。その後、スルーホール部分にエッチング液が侵
入しないように穴埋めを施し、然る後に表面にドライフ
ィルムをラミネートし、露光、現像、エッチング、ドラ
イフィルム除去の工程を経て完成に至る。Further, in the method of plating a conductor in a via hole or a through hole, wiring is not formed only on the outermost surface, but double-sided plates and prepregs are alternately laminated and integrated by heating / pressing. Further, a hole is formed at a desired position, and the inner surface of the hole is electrically plated by using the outermost copper foil. After that, holes are filled in so that the etching solution does not enter the through holes, and after that, a dry film is laminated on the surface, and the steps of exposure, development, etching, and dry film removal are completed until the completion.
【0007】以下に図5と図6を参照しながら上述した
従来の回路基板の製造方法の具体例について説明する。A specific example of the above-described conventional method for manufacturing a circuit board will be described below with reference to FIGS.
【0008】図5(a)は従来の積層回路基板の製造方
法を模式的に示す。この図において、50は両面板、5
1は両面板50の両面に形成された配線、52はプリプ
レグ、53は銅箔、54はプレス装置によって加熱・プ
レスされる部分(面)であり、製造工程上、両面板50
の両側にそれぞれプリプレグ52、銅箔53が配置さ
れ、これら両面板50等が加熱・プレス部分54で所定
の温度、圧力で所定時間加熱・プレスされ、両面板5
0、プリプレグ52、銅箔53が一体化される。FIG. 5A schematically shows a conventional method for manufacturing a laminated circuit board. In this figure, 50 is a double-sided plate, 5
1 is wiring formed on both sides of the double-sided plate 50, 52 is prepreg, 53 is copper foil, and 54 is a part (face) that is heated and pressed by a press machine.
A prepreg 52 and a copper foil 53 are arranged on both sides of the double-sided plate 5 and the double-sided plate 50 and the like are heated and pressed by a heating / pressing portion 54 at a predetermined temperature and a predetermined time for a predetermined time.
0, the prepreg 52, and the copper foil 53 are integrated.
【0009】図5(b)は、積層回路基板に穴を形成す
る方法を模式的に示しており、55はドリル、56はド
リル55によって形成された穴である。この工程では、
銅箔53の上方からドリル55が回転しながら降下し、
ドリル55の先端にある先切れ刃により銅箔53から順
次穴をあけて貫通穴を形成する。FIG. 5B schematically shows a method of forming a hole in the laminated circuit board, where 55 is a drill and 56 is a hole formed by the drill 55. In this process,
The drill 55 descends from above the copper foil 53 while rotating,
A through hole is sequentially formed from the copper foil 53 by a cutting edge at the tip of the drill 55 to form a through hole.
【0010】図6(a)、(b)は、従来のペースト充
填工程を模式的に示しており、61はマスク、62はマ
スク61を支持する基材、63,64はマスク61上を
接触しながら移動するスキージ、65はペースト、66
はステージである。この充填工程において、ステージ6
6の上に接触して基材62が配置される。基材62の上
方にはわずかの空間をあけてマスク61が配置され、マ
スク61の上にペースト65が供給できる構造となって
いる。マスク61の上方にスキージ63,64が配置さ
れ、スキージ63,64は上下方向および印刷方向に移
動できるようになっている。FIGS. 6 (a) and 6 (b) schematically show a conventional paste filling process. 61 is a mask, 62 is a base material for supporting the mask 61, and 63 and 64 are on the mask 61. While moving squeegee, 65 is paste, 66
Is the stage. In this filling process, the stage 6
The base material 62 is placed in contact with the top surface of the base material 6. A mask 61 is arranged above the base material 62 with a slight space left therebetween, and the paste 65 can be supplied onto the mask 61. Squeegees 63 and 64 are arranged above the mask 61, and the squeegees 63 and 64 are movable in the vertical direction and the printing direction.
【0011】この充填作業では、まずステージ66上の
所定の位置に基材62を配置する。次に、基材62に形
成されている貫通穴の位置とマスク61に形成されてい
る穴位置を合わせ、基材62上にマスク61をセットす
る。次に、マスク61上にペースト65を供給し、スキ
ージ63,64を降下させ、基材62に所定の圧力をか
けた状態で保持する。さらにスキージ63,64を印刷
方向に移動させ、ペースト65をマスク61上で移動さ
せることで印刷を行い、基材62の穴加工されている貫
通穴にペースト65を押圧して充填する。In this filling operation, first, the base material 62 is placed at a predetermined position on the stage 66. Next, the position of the through hole formed in the base material 62 and the position of the hole formed in the mask 61 are aligned, and the mask 61 is set on the base material 62. Next, the paste 65 is supplied onto the mask 61, the squeegees 63 and 64 are lowered, and the substrate 62 is held in a state where a predetermined pressure is applied. Further, printing is performed by moving the squeegees 63 and 64 in the printing direction and moving the paste 65 on the mask 61, and the paste 65 is pressed into the through holes of the base material 62 to be filled.
【0012】[0012]
【発明が解決しようとする課題】ところで、電気信号に
代わって光を信号として伝達する方式を選択した場合、
所望の位置に光―電気変換素子を配置し、基板上へ光フ
ァイバを配置して信号の伝達を行うことになる。この場
合、情報伝送路中にLD、PD、光アンプ、光スイッチ
等の光情報通信回路が存在するため、情報伝送用配線の
ほかに、電気信号伝送用の金属配線が別途必要となる。
その結果、光配線に加えて金属配線を設けなければなら
なくなり、製造プロセスが複雑化するという課題を生じ
る。By the way, when a method of transmitting light as a signal instead of an electric signal is selected,
The optical-electrical conversion element is arranged at a desired position, and the optical fiber is arranged on the substrate to transmit the signal. In this case, an optical information communication circuit such as an LD, a PD, an optical amplifier, and an optical switch exists in the information transmission path, so that in addition to the information transmission wiring, a metal wiring for electric signal transmission is separately required.
As a result, metal wiring must be provided in addition to the optical wiring, which causes a problem that the manufacturing process becomes complicated.
【0013】また、光信号に加えてもう1つの信号伝送
する必要がある場合、例えば、光信号の行き先をルーテ
ィング情報によって切り替えなければならないとき、ル
ーティング情報等の信号用配線が別途必要になり、同様
の理由で製造プロセスが複雑化するという課題を生じ
る。When another signal needs to be transmitted in addition to the optical signal, for example, when the destination of the optical signal has to be switched according to the routing information, a signal wiring for the routing information or the like is required separately, For the same reason, there arises a problem that the manufacturing process becomes complicated.
【0014】さらに、光信号による情報伝送では、外乱
光が光配線に入射することによりノイズが発生するとい
う課題がある。さらにまた、表面層付近に電流が流れる
光配線が存在するため、光配線−表面間の絶縁抵抗を十
分高くしなければならないという課題を生じる。Further, in the information transmission by the optical signal, there is a problem that noise is generated by the disturbance light entering the optical wiring. Furthermore, since there is an optical wiring in which a current flows near the surface layer, there arises a problem that the insulation resistance between the optical wiring and the surface must be sufficiently high.
【0015】本発明は、電気−光変換手段、光―電気変
換手段の少なくともいずれか一方を有する回路におい
て、同一配線で光信号と電力又は光信号と電気信号を伝
送することにより、配線パターンを簡略化できると共
に、配線の種類を少なくすることで製造プロセスを簡略
化できる光・電気回路を提供するものである。また、本
発明は、外乱光によるノイズの低減することができ、光
配線−表面間の絶縁抵抗を十分高くできる光・電気配線
基板を提供するものである。According to the present invention, in a circuit having at least one of an electro-optical converting means and an opto-electric converting means, a wiring pattern is formed by transmitting an optical signal and power or an optical signal and an electrical signal through the same wiring. An optical / electrical circuit that can be simplified and the manufacturing process can be simplified by reducing the number of wirings. Further, the present invention provides an optical / electrical wiring board capable of reducing noise due to ambient light and having sufficiently high insulation resistance between the optical wiring and the surface.
【0016】[0016]
【課題を解決するための手段】このような目的を達成す
るために、光信号の伝送路を備えた回路において、前記
光信号の伝送路は、前記光信号に対する透光性と、導電
性とを有する材料で形成し、前記伝送路に光信号と電
力、又は光信号と電気信号とを同時に伝送させるもので
ある。なお、この材料は、ITO、ZnO、In
203、SnO2、ITO、AZO、ATO、FZO、
FIO、FTOの中から選択することができる。In order to achieve such an object, in a circuit provided with an optical signal transmission path, the optical signal transmission path is made transparent to the optical signal and conductive. It is formed of a material having the above, and transmits an optical signal and electric power or an optical signal and an electric signal at the same time through the transmission path. Note that this material is ITO, ZnO, In
2 0 3 , SnO 2 , ITO, AZO, ATO, FZO,
It can be selected from FIO and FTO.
【0017】また、本発明の光・電気配線基板は、上述
の光・電気回路を有する光・電気配線基板であって、前
記光信号と電力又は前記光信号と電気信号とを同時に伝
送するための前記伝送路が光導波路により形成され、前
記光導波路が絶縁物基板内に埋め込まれているものであ
る。The optical / electrical wiring board of the present invention is an optical / electrical wiring board having the above-mentioned optical / electrical circuit, and is for transmitting the optical signal and power or the optical signal and electric signal at the same time. The transmission line is formed by an optical waveguide, and the optical waveguide is embedded in an insulating substrate.
【0018】また、本発明の他の形態に係る光・電気配
線基板は、前記基板の材料に、前記光信号を伝送するた
めに用いる波長城の光を吸収もしくは反射する材料を用
いたものである。Further, an optical / electrical wiring board according to another embodiment of the present invention uses, as a material of the board, a material which absorbs or reflects light of a wavelength range used for transmitting the optical signal. is there.
【0019】[0019]
【発明の実施の形態】I.実施の形態1:図1は実施形
態1に係る光・電気回路を1示す。この光・電気回路1
は3つの発光素子2a、2b、2cを有する。これら3
つの発光素子2a、2b、2cは、それぞれ異なる波長
λ1、λ2、λ3の光を発するものが使用されている。
各発光素子2a、2b、2cは、電源3a、3b、3c
とスイッチ4a、4b、4cに接続されており、スイッ
チ4a、4b、4cをオン・オフすることで、発光素子
2a、2b、2cを個別に点灯・消灯できるようにして
ある。発光素子2a、2b、2cはまた、導光路5a、
5b、5cを介して光合成器6にそれぞれ接続されてお
り、発光素子2a、2b、2cから出射された光が対応
する導光路5a、5b、5cを通り光合成器6に集めら
れて合成されるようにしてある。DETAILED DESCRIPTION OF THE INVENTION First Embodiment FIG. 1 shows an optical / electrical circuit 1 according to the first embodiment. This optical / electric circuit 1
Has three light emitting elements 2a, 2b, 2c. These 3
As the two light emitting elements 2a, 2b, 2c, those which emit lights of different wavelengths λ1, λ2, λ3 are used.
Each of the light emitting elements 2a, 2b, 2c has a power source 3a, 3b, 3c.
Are connected to the switches 4a, 4b, 4c, and the light emitting elements 2a, 2b, 2c can be individually turned on / off by turning on / off the switches 4a, 4b, 4c. The light emitting elements 2a, 2b, 2c also include a light guide path 5a,
Lights emitted from the light emitting elements 2a, 2b, and 2c are respectively connected to the light combiner 6 via the light guide elements 5a, 5b, and 5c and are collected and combined in the light combiner 6. Is done.
【0020】回路基板7は、上述の光合成器6の他に、
3つのフォトダイオード8a、8b、8cと、光合成器
6から出射された光を第1のフォトダイオード8a、次
に第2のフォトダイオード8b、続いて第3のフォトダ
イオード8cへと伝送するチャンネル型導波路(伝送
路)9を支持している。第1のフォトダイオード8a
は、導波路9との接続部に第1の光フィルタ10aを備
えている。この第1の光フィルタ10aは、第1の波長
λ1の光だけを選択的に透過する機能を有する。同様
に、第2のフォトダイオード8bは、導波路9との接続
部に第2の光フィルタ10bを備えている。この第2の
光フィルタ10bは、第2の波長λ2の光だけを選択的
に透過する機能を有する。The circuit board 7 includes, in addition to the above-described photosynthesizer 6,
A channel type in which three photodiodes 8a, 8b, 8c and light emitted from the photo-combiner 6 are transmitted to the first photodiode 8a, then the second photodiode 8b, and then to the third photodiode 8c. The waveguide (transmission path) 9 is supported. First photodiode 8a
Is equipped with a first optical filter 10a at the connection with the waveguide 9. The first optical filter 10a has a function of selectively transmitting only the light of the first wavelength λ1. Similarly, the second photodiode 8b includes a second optical filter 10b at the connection portion with the waveguide 9. The second optical filter 10b has a function of selectively transmitting only the light of the second wavelength λ2.
【0021】ここで、前述した光・電気回路1のうち、
特に導波路9について図2を参照して詳細に説明する
と、この導波路9は、図2に示すように、回路基板7上
に、例えば周知のエッチング技術を用いて形成されてお
り、クラッド層11によって被覆されている。基板7
は、光・電気回路1で用いる波長城の光を透過しない材
料を用いるのが好ましい。導波路9を構成する材料は、
透光性だけでなく導電性を備えた材料が用いられてお
り、特に信号の伝送に用いる光の波長域において、配線
長に対して十分損失が小さい材料を用いることが好まし
い。例えば、透光性と導電性を備えた好適な材料とし
て、ITO、ZnO、In203、SnO2、ITO、
AZO、ATO、FZO、FIO、FTO等がある。ク
ラッド層11は、例えばSiO2で形成されている。Among the optical / electrical circuits 1 described above,
In particular, the waveguide 9 will be described in detail with reference to FIG. 2. The waveguide 9 is formed on the circuit board 7 by using, for example, a well-known etching technique as shown in FIG. It is covered by 11. Board 7
It is preferable to use a material that does not transmit the light of the wavelength used in the optical / electrical circuit 1. The material forming the waveguide 9 is
A material having not only translucency but also conductivity is used, and in particular, it is preferable to use a material having a sufficiently small loss with respect to the wiring length in the wavelength range of light used for signal transmission. For example, as a suitable material having translucency and conductivity, ITO, ZnO, In 2 O 3 , SnO 2 , ITO,
There are AZO, ATO, FZO, FIO, FTO and the like. The cladding layer 11 is made of, for example, SiO 2 .
【0022】図1に戻り、第1〜第3のフォトダイオー
ド8a、8b、8cは、それぞれ対応する電球点灯回路
12a,12b,12cに接続されている。電球点灯回
路12a,12b,12cは、それぞれ電球13a,1
3b,13cとこれに直列接続されたスイッチング用ト
ランジスタ14a,14b,14cを備えており、導電
性の導波路9を介して電源15に接続されている。第1
〜第3のフォトダイオード8a,8b,8cはまた、対
応する電球点灯回路12a,12b,12cに含まれる
トランジスタ14a,14b,14cのベースと電源1
5の間に接続されており、導波路9を介して波長λ1、
λ2、λ3の光が入射されたとき、対応するトランジス
タ14a,14b,14cのベースに所定の電流を印加
するように構成されている。Returning to FIG. 1, the first to third photodiodes 8a, 8b and 8c are connected to the corresponding light bulb lighting circuits 12a, 12b and 12c, respectively. The light bulb lighting circuits 12a, 12b, 12c respectively include the light bulbs 13a, 1
3b, 13c and switching transistors 14a, 14b, 14c serially connected thereto are provided, and are connected to a power supply 15 via a conductive waveguide 9. First
~ The third photodiodes 8a, 8b, 8c are also the bases of the transistors 14a, 14b, 14c and the power source 1 included in the corresponding light bulb lighting circuits 12a, 12b, 12c.
5 and is connected through the waveguide 9 to the wavelength λ1,
When light of λ2 and λ3 is incident, a predetermined current is applied to the bases of the corresponding transistors 14a, 14b, 14c.
【0023】このような構成を備えた光・電気回路にお
いて、3つの発光素子2a、2b、2cから出射された
光(波長λ1、λ2、λ3の光)は対応する導光路5
a,5b,5cを介して光合成器6に伝送され、そこで
合成される。合成された光は導波路9を介して第1〜第
3のフォトダイオード8a、8b、8cに向けて伝送さ
れ、その伝送過程で第1の波長λ1を有する光が第1の
フォトダイオード8aで検出され、第2の波長λ2を有
する光が第2のフォトダイオード8bで検出され、さら
に第3の波長λ3を有する光が第3のフォトダイオード
8cで検出される。そして、光を検出したフォトダイオ
ード8a,8b,8cは、対応する電球点灯回路12
a,12b,12cに含まれるトランジスタ14a,1
4b,14cをオンする。その結果、トランジスタ14
a,14b,14cを介して電球13a,13b,13
cに電流が流れ、電球13a,13b,13cが点灯す
る。In the optical / electrical circuit having such a structure, the light emitted from the three light emitting elements 2a, 2b, 2c (lights of wavelengths λ1, λ2, λ3) is corresponding to the light guide path 5.
It is transmitted to the optical combiner 6 via a, 5b, and 5c, and is combined there. The combined light is transmitted to the first to third photodiodes 8a, 8b, 8c through the waveguide 9, and the light having the first wavelength λ1 is transmitted by the first photodiode 8a in the transmission process. The detected light having the second wavelength λ2 is detected by the second photodiode 8b, and the light having the third wavelength λ3 is detected by the third photodiode 8c. Then, the photodiodes 8a, 8b, 8c that have detected the light are associated with the corresponding bulb lighting circuit 12
transistors 14a, 1 included in a, 12b, 12c
4b and 14c are turned on. As a result, the transistor 14
a, 14b, 14c through the light bulb 13a, 13b, 13
An electric current flows through c, and the light bulbs 13a, 13b, 13c are turned on.
【0024】このように、実施の形態1に係る光・電気
回路によれば、光を伝送する伝送路である導波路が、電
球、フォトダイオードに電力を伝送する伝送路として機
能する。したがって、電球点灯回路に対する電力供給も
導波路を介して行われるため、電力供給用の金属配線を
基板上に別途形成する必要がない。そのため、基板の製
造が著しく簡略化される。As described above, according to the optical / electrical circuit of the first embodiment, the waveguide, which is a transmission path for transmitting light, functions as a transmission path for transmitting electric power to the light bulb and the photodiode. Therefore, since the electric power is also supplied to the electric bulb lighting circuit through the waveguide, it is not necessary to separately form a metal wiring for supplying electric power on the substrate. Therefore, the manufacture of the substrate is significantly simplified.
【0025】II.実施の形態2:図3は実施形態2に
係る光・電気回路21を示す。この光・電気回路21は
一つの発光素子22を有する。この発光素子22は、電
源23とスイッチ24に接続されており、スイッチ24
をオン・オフすることで、発光素子22を点灯・消灯で
きるようにしてある。一方、回路基板25は、上述の発
光素子22の他に、2つのフォトダイオード26a,2
6bと、一端が発光素子22とフォトダイオード26
a,26bにそれぞれ接続された3つのチャンネル型導
波路(伝送路)27、28a、28bを支持している。
また、導波路27、28a、28bは、実施の形態1と
同様に形成することができるが、図4に示すように、基
板25中に埋め込まれ、外乱光が光導波路へ入射するの
を抑制するために周囲がクラッド層29で被覆されてい
る。なお、基板25、導波路、クラッド層を構成する材
料は実施の形態1と同一である。II. Second Embodiment: FIG. 3 shows an optical / electrical circuit 21 according to a second embodiment. The optical / electrical circuit 21 has one light emitting element 22. The light emitting element 22 is connected to a power source 23 and a switch 24, and the switch 24
By turning on and off, the light emitting element 22 can be turned on and off. On the other hand, the circuit board 25 includes two photodiodes 26 a, 2 in addition to the light emitting element 22 described above.
6b, the light emitting element 22 and the photodiode 26 at one end
It supports three channel type waveguides (transmission lines) 27, 28a and 28b which are respectively connected to a and 26b.
Further, the waveguides 27, 28a, 28b can be formed in the same manner as in the first embodiment, but as shown in FIG. 4, they are embedded in the substrate 25 to prevent disturbance light from entering the optical waveguide. To this end, the periphery is covered with the cladding layer 29. The materials forming the substrate 25, the waveguide, and the clad layer are the same as those in the first embodiment.
【0026】図3に戻り、基板25は可動ミラー式光路
切換装置30を備えており、この切換装置30に第1の
導波路27、第2及び第3の導波路(分岐路)28a、
28bの他端が接続されている。切換装置30はまた可
動ミラー31を備えており、この可動ミラー31は第1
の導波路27から送られた光を第2の導波路28aに案
内する第1の位置(実線位置)と、第1の導波路27か
ら送られた光を第3の導波路28bに案内する第2の位
置(点線位置)との間を移動できるようにしてある。こ
の可動ミラー31は、切換装置30に入力される信号に
応じて第1の位置と第2の位置との間を移動する。その
ため、切換装置30は、導電性の導波路27を介して、
電源32とスイッチ33に接続されており、図示するよ
うにスイッチ33がオフした状態で可動ミラー31が第
1の位置に設定され、スイッチ33をオンして切換装置
30に所定の電圧が印加されると可動ミラー31が第2
の位置に切換えられるようにしてある。Returning to FIG. 3, the substrate 25 is provided with a movable mirror type optical path switching device 30. The switching device 30 includes a first waveguide 27, second and third waveguides (branch paths) 28a,
The other end of 28b is connected. The switching device 30 also includes a movable mirror 31, which is the first mirror.
The first position (solid line position) for guiding the light sent from the second waveguide 27 to the second waveguide 28a, and the light sent from the first waveguide 27 to the third waveguide 28b. The second position (dotted line position) can be moved. The movable mirror 31 moves between the first position and the second position according to the signal input to the switching device 30. Therefore, the switching device 30 uses the conductive waveguide 27 to
It is connected to a power source 32 and a switch 33. As shown in the figure, the movable mirror 31 is set to the first position with the switch 33 turned off, and the switch 33 is turned on to apply a predetermined voltage to the switching device 30. Then the movable mirror 31 becomes the second
The position can be switched to.
【0027】フォトダイオード26a,26bは、それ
ぞれ対応する電球点灯回路34a,34bに接続されて
いる。各電球点灯回路34a,34bは、直列に接続さ
れた、電球35a,35bと、スイッチング用トランジ
スタ36a,36bと、電源37a,37bを備えてい
る。フォトダイオード26a,26bはまた、対応する
電球点灯回路34a,34bに含まれるトランジスタ3
6a,36bのベースと電源37a,37bの間に接続
されており、導波路28a,28bを介して光が入射さ
れたとき、対応するトランジスタ36a,36bのベー
スに所定の電流を印加するように構成されている。The photodiodes 26a and 26b are connected to the corresponding light bulb lighting circuits 34a and 34b, respectively. Each of the light bulb lighting circuits 34a and 34b includes light bulbs 35a and 35b, switching transistors 36a and 36b, and power supplies 37a and 37b connected in series. The photodiodes 26a and 26b also include the transistors 3 included in the corresponding light bulb lighting circuits 34a and 34b.
It is connected between the bases of 6a and 36b and the power sources 37a and 37b, and when light is incident through the waveguides 28a and 28b, a predetermined current is applied to the bases of the corresponding transistors 36a and 36b. It is configured.
【0028】このような構成を備えた光・電気回路にお
いて、発光素子22から出射された光は導波路27を介
して切換装置30に伝送される。いまスイッチ33がオ
フされて可動ミラー31が第1の位置にあるとき、導波
路27から出射した光は可動ミラー31に反射して第1
の導波路28aに伝送される。他方、スイッチ33がオ
ンされて可動ミラー31が第2の位置にあるとき、導波
路27から出射した光は可動ミラー31に反射して第2
の導波路28bに伝送される。導波路28a又は28b
から出射した光は、フォトダイオード26a又は26b
で検出される。光を検出したフォトダイオード26a又
は26bは、対応する電球点灯回路34a又は34bに
含まれるトランジスタ36a又は36bのベースに所定
の電流を印加する。その結果、トランジスタ36a又は
36bを介して電球35a又は35bに電流が流れ、電
球35a又は35bが点灯する。In the optical / electrical circuit having such a structure, the light emitted from the light emitting element 22 is transmitted to the switching device 30 via the waveguide 27. Now, when the switch 33 is turned off and the movable mirror 31 is in the first position, the light emitted from the waveguide 27 is reflected by the movable mirror 31 and is reflected by the first mirror.
Is transmitted to the waveguide 28a. On the other hand, when the switch 33 is turned on and the movable mirror 31 is in the second position, the light emitted from the waveguide 27 is reflected by the movable mirror 31 and is reflected by the second mirror.
Is transmitted to the waveguide 28b. Waveguide 28a or 28b
The light emitted from the photodiode 26a or 26b
Detected in. The photodiode 26a or 26b that has detected the light applies a predetermined current to the base of the transistor 36a or 36b included in the corresponding light bulb lighting circuit 34a or 34b. As a result, a current flows through the light bulb 35a or 35b via the transistor 36a or 36b, and the light bulb 35a or 35b is turned on.
【0029】このように、実施の形態2に係る光・電気
回路によれば、光を伝送する伝送路である導波路が、切
換装置に電気信号を伝送する伝送路として機能する。し
たがって、電気信号供給用の金属配線を基板上に別途形
成する必要がない。そのため、基板の製造が著しく簡略
化される。また、基板は、光信号伝送に用いる波長城の
光を透過しない材料で形成されているので、外乱光が光
導波路へ入射することによるノイズを低減できる。As described above, according to the optical / electrical circuit of the second embodiment, the waveguide, which is a transmission line for transmitting light, functions as a transmission line for transmitting an electric signal to the switching device. Therefore, it is not necessary to separately form a metal wiring for supplying an electric signal on the substrate. Therefore, the manufacture of the substrate is significantly simplified. In addition, since the substrate is formed of a material that does not transmit the light of the wavelength range used for optical signal transmission, it is possible to reduce noise caused by incident ambient light on the optical waveguide.
【0030】なお、本発明の光・電気回路及び光・電気
配線基板は以上の実施の形態に限るものでなく、光と電
気を伝送する配線を必要とする回路及び基板であれば等
しく適用できる。The optical / electrical circuit and the optical / electrical wiring board according to the present invention are not limited to the above-mentioned embodiments, and are equally applicable to circuits and boards which require wiring for transmitting light and electricity. .
【0031】[0031]
【発明の効果】以上説明したように、本発明は、透光性
を有する伝送路が導電性も有することから、この伝送路
を用いて光信号と電力又は電気信号とを同時に伝送する
ことができる。そのため、電力供給用配線を形成する必
要がなく、製造プロセスが簡略化される。また、光伝送
路を基板内に埋め込むことによって、光配線―表面間に
おける絶縁抵抗が十分高くすることができる。また、そ
の基板材料に光信号の伝送に用いる波長域の光を吸収も
しくは反射する材料を用いることにより、外乱光が光導
波路へ入射することによるノイズを低減できる。As described above, according to the present invention, since the transmission line having the light transmitting property also has the conductivity, it is possible to simultaneously transmit the optical signal and the electric power or the electric signal using this transmission line. it can. Therefore, it is not necessary to form the power supply wiring, and the manufacturing process is simplified. Further, by embedding the optical transmission line in the substrate, the insulation resistance between the optical wiring and the surface can be sufficiently increased. Further, by using a material that absorbs or reflects light in the wavelength range used for the transmission of an optical signal as the substrate material, it is possible to reduce noise caused by incident ambient light on the optical waveguide.
【図1】 本発明の実施の形態1に係る光・電気回路の
模式図。FIG. 1 is a schematic diagram of an optical / electrical circuit according to a first embodiment of the present invention.
【図2】 実施の形態1で用いた光導波路の断面構造を
示す模式図。FIG. 2 is a schematic diagram showing a cross-sectional structure of the optical waveguide used in the first embodiment.
【図3】 本発明の実施の形態2に係る光・電気回路の
模式図。FIG. 3 is a schematic diagram of an optical / electrical circuit according to a second embodiment of the present invention.
【図4】 実施の形態2で用いた光導波路の断面構造を
示す模式図。FIG. 4 is a schematic diagram showing a cross-sectional structure of the optical waveguide used in the second embodiment.
【図5】 従来の回路基板の製造方法を示す模式図。FIG. 5 is a schematic view showing a conventional method for manufacturing a circuit board.
【図6】 従来技術のペースト充填工程における回路基
板の製造方法および装置示す模式図。FIG. 6 is a schematic view showing a method and an apparatus for manufacturing a circuit board in a paste filling process of a conventional technique.
1:光・電気回路 2a,2b,2c:発光素子 7:回路基板 8a,8b,8c:フォトダイオード 9,27,28a,28b:導波路 10a,10b:光フィルタ 1: Optical / electrical circuit 2a, 2b, 2c: light emitting element 7: Circuit board 8a, 8b, 8c: Photodiodes 9, 27, 28a, 28b: Waveguide 10a, 10b: Optical filter
───────────────────────────────────────────────────── フロントページの続き (72)発明者 大熊 崇文 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 (72)発明者 山本 憲一 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 (72)発明者 東田 隆亮 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 (72)発明者 西原 宗和 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 Fターム(参考) 2H047 KA04 KA05 LA09 LA18 MA07 PA04 PA05 PA12 PA14 PA24 QA04 RA08 TA05 TA41 4E351 BB01 DD31 DD35 GG20 5E338 AA03 BB80 CC01 CC10 CD12 EE32 ─────────────────────────────────────────────────── ─── Continued front page (72) Inventor Takafumi Okuma 1006 Kadoma, Kadoma-shi, Osaka Matsushita Electric Sangyo Co., Ltd. (72) Inventor Kenichi Yamamoto 1006 Kadoma, Kadoma-shi, Osaka Matsushita Electric Sangyo Co., Ltd. (72) Inventor Takaaki Higashida 1006 Kadoma, Kadoma-shi, Osaka Matsushita Electric Sangyo Co., Ltd. (72) Inventor Munekazu Nishihara 1006 Kadoma, Kadoma-shi, Osaka Matsushita Electric Sangyo Co., Ltd. F term (reference) 2H047 KA04 KA05 LA09 LA18 MA07 PA04 PA05 PA12 PA14 PA24 QA04 RA08 TA05 TA41 4E351 BB01 DD31 DD35 GG20 5E338 AA03 BB80 CC01 CC10 CD12 EE32
Claims (7)
前記光信号の伝送路は、前記光信号に対する透光性と、
導電性とを有する材料で形成されていることを特徴とす
る光・電気回路。1. A circuit provided with an optical signal transmission line,
The transmission path of the optical signal has a translucency for the optical signal,
An optical / electrical circuit, which is formed of a material having electrical conductivity.
3、SnO2、ITO、AZO、ATO、FZO、FI
O、FTOから選択された少なくとも一つを含むことを
特徴とする請求項1に記載の光・電気回路。2. The material is ITO, ZnO, In 2 0
3 , SnO 2 , ITO, AZO, ATO, FZO, FI
The optical / electrical circuit according to claim 1, comprising at least one selected from O and FTO.
を特徴とする請求項1又は2のいずれか一に記載の光・
電気回路。3. The light according to claim 1, wherein electric power is transmitted through the transmission line.
electric circuit.
ことを特徴とする請求項1又は2のいずれか一に記載の
光・電気回路。4. The optical / electrical circuit according to claim 1, wherein an electric signal is transmitted through the transmission line.
光・電気配線基板であって、前記光信号と前記電力とを
同時に伝送するための前記伝送路が光導波路により形成
され、前記光導波路が絶縁物基板内に埋め込まれている
ことを特徴とする光・電気配線基板。5. An optical / electrical wiring board having the optical / electrical circuit according to claim 3, wherein the transmission path for simultaneously transmitting the optical signal and the electric power is formed by an optical waveguide, An optical / electrical wiring board, in which an optical waveguide is embedded in an insulating board.
光・電気配線基板であって、前記光信号と前記電気信号
とを同時に伝送するための前記伝送路が光導波路により
形成され、前記光導波路が絶縁物基板内に埋め込まれて
いることを特徴とする光・電気配線基板。6. An optical / electrical wiring board having the optical / electrical circuit according to claim 4, wherein the transmission path for simultaneously transmitting the optical signal and the electrical signal is formed by an optical waveguide, An optical / electrical wiring substrate, wherein the optical waveguide is embedded in an insulating substrate.
るために用いる波長城の光を吸収もしくは反射する材料
を用いることを特徴とする請求項5又は6のいずれか一
方に記載の光・電気配線基板。7. The light according to claim 5, wherein a material that absorbs or reflects light having a wavelength used for transmitting the optical signal is used as a material of the substrate. -Electrical wiring board.
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Citations (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54162688A (en) * | 1978-06-13 | 1979-12-24 | Matsushita Electric Ind Co Ltd | Forming method for oxide single crystal thin film |
JPS5567709A (en) * | 1978-11-14 | 1980-05-22 | Semiconductor Res Found | Conductive focusing type optical guide |
JPS61242069A (en) * | 1985-04-19 | 1986-10-28 | Nippon Telegr & Teleph Corp <Ntt> | Hybrid optical integrated circuit and manufacture thereof |
JPS627117U (en) * | 1985-06-28 | 1987-01-16 | ||
JPS62108412A (en) * | 1985-11-05 | 1987-05-19 | 三菱重工業株式会社 | Metal coated optical fiber cable |
JPH04172307A (en) * | 1990-11-05 | 1992-06-19 | Shinko Electric Ind Co Ltd | Composite wire path of photoelectric device |
JPH0566312A (en) * | 1991-07-04 | 1993-03-19 | Hitachi Cable Ltd | Photoelectric composite circuit module |
JPH05281429A (en) * | 1992-03-30 | 1993-10-29 | Sony Corp | Manufacture of printed circuit board containing photoconductor path |
JPH05307199A (en) * | 1992-04-28 | 1993-11-19 | Nippon Telegr & Teleph Corp <Ntt> | Waveguide type optical switch and its manufacture |
JPH063544A (en) * | 1992-06-23 | 1994-01-14 | Japan Steel Works Ltd:The | Production of optical waveguide |
JPH0627479A (en) * | 1991-06-17 | 1994-02-04 | Photon Dynamics Inc | Method and apparatus for automatic inspection and repair of simple matrix circuit panel |
JPH06123812A (en) * | 1992-10-12 | 1994-05-06 | Sharp Corp | Wiring for light signal and semiconductor device having this wiring |
JPH06308519A (en) * | 1993-04-20 | 1994-11-04 | Nippon Telegr & Teleph Corp <Ntt> | Flexible electrooptical hybrid wiring board |
JPH08185797A (en) * | 1994-12-27 | 1996-07-16 | Sumitomo Metal Mining Co Ltd | Transparent conductive film forming process liquid and manufacture of transparent conductive film using this process liquid |
JPH0961675A (en) * | 1995-08-23 | 1997-03-07 | Fujitsu Ltd | Optical interconnection cable and its manufacture |
US5659648A (en) * | 1995-09-29 | 1997-08-19 | Motorola, Inc. | Polyimide optical waveguide having electrical conductivity |
JPH09281529A (en) * | 1996-04-17 | 1997-10-31 | Fujikura Ltd | Space type optical deflection element |
JPH10282351A (en) * | 1997-04-11 | 1998-10-23 | Kyocera Corp | Optical waveguide, and optoelectronic mixed substrate |
JP2000028973A (en) * | 1998-07-13 | 2000-01-28 | Fuji Photo Film Co Ltd | Optical modulation element, exposure element, and display device |
JP2000215798A (en) * | 1999-01-25 | 2000-08-04 | Jsr Corp | Manufacture of transparent electrode and transfer film for transparent electrode |
WO2000078102A1 (en) * | 1999-06-10 | 2000-12-21 | Seiko Epson Corporation | Light-emitting device |
JP2001064870A (en) * | 1999-06-21 | 2001-03-13 | Sony Corp | Functional material and production thereof and functional structure body and photo-functional element |
JP2001072498A (en) * | 1999-07-08 | 2001-03-21 | Nippon Telegr & Teleph Corp <Ntt> | Oxide single crystal thin film and its processing |
JP2001217512A (en) * | 2000-02-02 | 2001-08-10 | Fujitsu Ltd | Wiring structure of circuit board |
JP2001264973A (en) * | 2000-03-22 | 2001-09-28 | Jsr Corp | Inorganic particle-containing photosensitive composition and sensitive film |
JP2002009307A (en) * | 2000-06-19 | 2002-01-11 | Matsushita Battery Industrial Co Ltd | Method for manufacturing solar battery |
JP2002502128A (en) * | 1998-02-02 | 2002-01-22 | ユニアックス コーポレイション | X-Y addressable electrical microswitch array and sensor matrix using the same |
JP2003139979A (en) * | 2001-11-07 | 2003-05-14 | Fuji Xerox Co Ltd | Photoelectric merging element |
-
2002
- 2002-04-10 JP JP2002108092A patent/JP4021234B2/en not_active Expired - Fee Related
Patent Citations (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54162688A (en) * | 1978-06-13 | 1979-12-24 | Matsushita Electric Ind Co Ltd | Forming method for oxide single crystal thin film |
JPS5567709A (en) * | 1978-11-14 | 1980-05-22 | Semiconductor Res Found | Conductive focusing type optical guide |
JPS61242069A (en) * | 1985-04-19 | 1986-10-28 | Nippon Telegr & Teleph Corp <Ntt> | Hybrid optical integrated circuit and manufacture thereof |
JPS627117U (en) * | 1985-06-28 | 1987-01-16 | ||
JPS62108412A (en) * | 1985-11-05 | 1987-05-19 | 三菱重工業株式会社 | Metal coated optical fiber cable |
JPH04172307A (en) * | 1990-11-05 | 1992-06-19 | Shinko Electric Ind Co Ltd | Composite wire path of photoelectric device |
JPH0627479A (en) * | 1991-06-17 | 1994-02-04 | Photon Dynamics Inc | Method and apparatus for automatic inspection and repair of simple matrix circuit panel |
JPH0566312A (en) * | 1991-07-04 | 1993-03-19 | Hitachi Cable Ltd | Photoelectric composite circuit module |
JPH05281429A (en) * | 1992-03-30 | 1993-10-29 | Sony Corp | Manufacture of printed circuit board containing photoconductor path |
JPH05307199A (en) * | 1992-04-28 | 1993-11-19 | Nippon Telegr & Teleph Corp <Ntt> | Waveguide type optical switch and its manufacture |
JPH063544A (en) * | 1992-06-23 | 1994-01-14 | Japan Steel Works Ltd:The | Production of optical waveguide |
JPH06123812A (en) * | 1992-10-12 | 1994-05-06 | Sharp Corp | Wiring for light signal and semiconductor device having this wiring |
JPH06308519A (en) * | 1993-04-20 | 1994-11-04 | Nippon Telegr & Teleph Corp <Ntt> | Flexible electrooptical hybrid wiring board |
JPH08185797A (en) * | 1994-12-27 | 1996-07-16 | Sumitomo Metal Mining Co Ltd | Transparent conductive film forming process liquid and manufacture of transparent conductive film using this process liquid |
JPH0961675A (en) * | 1995-08-23 | 1997-03-07 | Fujitsu Ltd | Optical interconnection cable and its manufacture |
US5659648A (en) * | 1995-09-29 | 1997-08-19 | Motorola, Inc. | Polyimide optical waveguide having electrical conductivity |
JPH09281529A (en) * | 1996-04-17 | 1997-10-31 | Fujikura Ltd | Space type optical deflection element |
JPH10282351A (en) * | 1997-04-11 | 1998-10-23 | Kyocera Corp | Optical waveguide, and optoelectronic mixed substrate |
JP2002502128A (en) * | 1998-02-02 | 2002-01-22 | ユニアックス コーポレイション | X-Y addressable electrical microswitch array and sensor matrix using the same |
JP2000028973A (en) * | 1998-07-13 | 2000-01-28 | Fuji Photo Film Co Ltd | Optical modulation element, exposure element, and display device |
JP2000215798A (en) * | 1999-01-25 | 2000-08-04 | Jsr Corp | Manufacture of transparent electrode and transfer film for transparent electrode |
WO2000078102A1 (en) * | 1999-06-10 | 2000-12-21 | Seiko Epson Corporation | Light-emitting device |
JP2001064870A (en) * | 1999-06-21 | 2001-03-13 | Sony Corp | Functional material and production thereof and functional structure body and photo-functional element |
JP2001072498A (en) * | 1999-07-08 | 2001-03-21 | Nippon Telegr & Teleph Corp <Ntt> | Oxide single crystal thin film and its processing |
JP2001217512A (en) * | 2000-02-02 | 2001-08-10 | Fujitsu Ltd | Wiring structure of circuit board |
JP2001264973A (en) * | 2000-03-22 | 2001-09-28 | Jsr Corp | Inorganic particle-containing photosensitive composition and sensitive film |
JP2002009307A (en) * | 2000-06-19 | 2002-01-11 | Matsushita Battery Industrial Co Ltd | Method for manufacturing solar battery |
JP2003139979A (en) * | 2001-11-07 | 2003-05-14 | Fuji Xerox Co Ltd | Photoelectric merging element |
Non-Patent Citations (3)
Title |
---|
J.P.CHATELON ET AL., SEMICONDUCTOR SCIENCE AND TECHNOLOGY, vol. Vol.14, No.7, p.642-647, JPN4006011250, July 1999 (1999-07-01), ISSN: 0000750505 * |
J.P.CHATELON ET AL., SEMICONDUCTOR SCIENCE AND TECHNOLOGY, vol. Vol.14, No.7, p.642-647, JPNX006057385, July 1999 (1999-07-01), ISSN: 0000794446 * |
J.P.CHATELON ET AL., SEMICONDUCTOR SCIENCE AND TECHNOLOGY, vol. Vol.14, No.7, p.642-647, JPNX007046173, July 1999 (1999-07-01), ISSN: 0000888379 * |
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