JP2003251290A - Cleaning device and substrate processor provided with the same - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To suppress the waste of a processing solvent at cleaning and to shorten a cleaning time by enabling an independent cleaning device to clean piping components for a processing solvent pipe without discharging the processing solvent in a processing part. <P>SOLUTION: A housing 3 is provided with a processing solvent circulating tank 7 and a pump 11, a processing solvent collection tank 19 for collecting the processing solvent, and bending pipes 21 and 23 for continuously connecting the processing solvent circulating tank 7 to the processing solvent pipe with the piping components sandwiched. The bending pipes 21 and 23 are continuously connected to the processing solvent pipe, and the piping components are cleaned while circulation from the processing solvent pipe to the processing part is interrupted. As a result, the piping components can be cleaned with cleaning liquid without discharging the processing solvent in the processing part and the processing solvent can be prevented from spattering. Then, work is performed safely and the loss of the processing solvent can be suppressed so that the cleaning time can be shortened. <P>COPYRIGHT: (C)2003,JPO

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning apparatus for piping parts in a substrate processing apparatus for subjecting a semiconductor wafer or a glass substrate for a liquid crystal display device (hereinafter, simply referred to as a substrate) to a predetermined process, and a substrate including the same. The present invention relates to a processing apparatus, and more particularly to a technique for cleaning piping components of a processing liquid pipe in a substrate processing apparatus that supplies a processing liquid from a processing liquid pipe to a processing unit.

[0002]

2. Description of the Related Art Conventionally, as a substrate processing apparatus of this type, a processing tank in which a substrate is accommodated by connecting an end portion of a processing liquid pipe provided with piping components such as a pump, a temperature controller and a filter to a bottom portion of the processing tank. In addition, the substrate may be processed by supplying the processing liquid from the processing liquid pipe.

In order to clean the piping components in such a substrate processing apparatus, the first method is to remove the piping components and then clean only the piping components, and the cleaning liquid is supplied to the processing liquid pipe to pipe together the processing liquid pipe. There is a second method of cleaning the parts.

[0004]

However, in the case of such a conventional example, there are the following problems. That is, in the first method of the related art, it is necessary to discharge the processing liquid in the processing liquid pipe before removing the pipe parts, which is disadvantageous in terms of cost and may cause scattering of the processing liquid. There is a great risk. Further, since it is necessary to clean the pipe parts after removing them, it takes a long time to clean the pipe parts. Furthermore, in order to process the next substrate after cleaning, it is necessary to supply the cleaning liquid again to the processing liquid pipe to adjust the temperature, which is disadvantageous in terms of cost.
There is a problem that it takes a long time.

Further, in the second conventional method, it is necessary to discharge the processing liquid before supplying the cleaning liquid, which is disadvantageous in terms of cost. Furthermore, in order to process the next substrate after cleaning, it is necessary to discharge the cleaning liquid from the processing liquid pipe and then supply the cleaning liquid again to adjust the temperature.
It has many problems that are disadvantageous in terms of cost and take a long time.

The present invention has been made in view of the above circumstances, and it is possible to clean the piping parts of the processing liquid pipe by an independent cleaning device without discharging the processing liquid in the processing section. An object of the present invention is to provide a cleaning apparatus capable of suppressing the waste of processing liquid during cleaning and shortening the cleaning time, and a substrate processing apparatus including the cleaning apparatus.

[0007]

The present invention has the following constitution in order to achieve such an object. That is, the invention according to claim 1 is a cleaning device for cleaning a piping component provided in a processing liquid pipe for supplying a processing liquid to a processing portion of a substrate processing apparatus, wherein the upstream side and the downstream side sandwich the piping component. Two connecting pipes that are connected to the processing liquid pipe, and a state in which the flow of the processing liquid from the processing liquid pipe to the processing unit is shut off, through one connecting pipe of the two connecting pipes. Cleaning liquid supply means for supplying a cleaning liquid to the processing liquid pipe, and a state in which the flow of the processing liquid from the processing liquid pipe to the processing unit is cut off, through the other connecting pipe of the two connecting pipes. It is characterized by comprising: a cleaning liquid recovery means for recovering the cleaning liquid from the processing liquid pipe; and a housing for accommodating the cleaning liquid supply means and the cleaning liquid recovery means.

(Operation / Effect) The cleaning liquid is supplied from the cleaning liquid supply means housed in the housing in a state where the connecting pipe is connected to the processing liquid pipe so as to block the flow from the processing liquid pipe to the processing tank. The cleaning liquid is collected by the collecting means. As a result, the pipe parts can be cleaned with the cleaning liquid without discharging the processing liquid in the processing section, so that the dispersion of the processing liquid can be prevented. Therefore, the work can be performed safely, the loss of the processing liquid can be suppressed, and the cleaning time can be shortened.
Further, if the casing can be transported, the cleaning device can be shared by a plurality of substrate processing devices, and the burden of providing utilities for cleaning liquid supply and drainage can be reduced.

The invention described in claim 2 is the same as claim 1.
In the cleaning apparatus according to claim 1, the cleaning liquid supply means, a cleaning liquid circulation tank for storing a cleaning liquid, a pressure feeding means for pressure-fed the cleaning liquid in the cleaning liquid circulation tank to the one connecting pipe, and a cleaning liquid passing through the pipe parts. A return pipe for recovering to the cleaning liquid circulation tank via the other connecting pipe, the cleaning liquid recovery means, a branch pipe branched from the return pipe, and a cleaning liquid recovery tank for recovering the cleaning liquid from the branch pipe. And a switching valve for switching the cleaning liquid in the return pipe to one of the cleaning liquid circulation tank side and the cleaning liquid recovery tank side.

(Operation / Effect) At the time of cleaning, the cleaning liquid in the cleaning liquid circulation tank is supplied to the processing liquid pipe through one of the connecting pipes by the pumping means to clean the pipe parts, and the cleaning liquid returned through the return pipe. Is circulated in the cleaning liquid circulation tank through the other connecting pipe to perform cleaning. After cleaning for a certain period of time, switch the switching valve to the cleaning liquid recovery tank side,
By collecting the cleaning liquid returned through the return pipe in the cleaning liquid recovery tank, it is used for cleaning and the cleaning liquid containing dirt is recovered.

The invention described in claim 3 is the same as claim 1.
Alternatively, in the cleaning apparatus according to the second aspect, the cleaning liquid circulation tank is plural, and the cleaning liquid is stored according to the processing liquid used in the processing unit.

(Function / Effect) Since there is a cleaning liquid suitable for the treatment liquid, for example, an organic solvent (IPA, etc.)
It is preferable to use, for example, pure water or the like as a cleaning liquid depending on the processing liquid. If you have multiple cleaning liquid circulation tanks,
Various cleaning liquids can be stored in each, and the cleaning liquids can be switched and supplied according to the processing liquid.

Further, the invention according to claim 4 has a piping component and shuts off the processing liquid pipe for supplying the processing liquid to the processing part and the flow of the processing liquid from the processing liquid pipe to the processing part. A flow cutoff means, two connection pipes connected in communication with the processing liquid pipe, and a flow cutoff means for cutting the flow of the processing liquid from the processing liquid pipe to the processing unit. In the state where the flow of the processing liquid from the processing liquid pipe to the processing unit is blocked by the cleaning liquid supply unit for supplying the cleaning liquid to the processing liquid pipe via one of the connection pipes and the flow blocking unit, A cleaning liquid recovery means for recovering the cleaning liquid from the treatment liquid pipe via the other one of the one connection pipe, and a cleaning device having a housing for accommodating the cleaning liquid supply means and the cleaning liquid recovery means. It is characterized in that there.

(Operation / Effect) By providing the cleaning apparatus according to claim 1 in the substrate processing apparatus, the pipe parts can be cleaned with the cleaning solution without discharging the processing solution in the processing tank. Scattering can be prevented. Therefore, the work can be performed safely, the loss of the processing liquid can be suppressed, and the cleaning time can be shortened. Further, it is possible to reduce the burden of providing a utility for supplying the cleaning liquid and a utility for discharging the cleaning liquid.

Further, preferably, the flow shut-off means is provided in each of the processing liquid pipes on the upstream side and the downstream side so as to be sandwiched between the pipe parts (the invention according to claim 5), thereby narrowing down the pipe parts to be cleaned. It is possible to clean a plurality of piping parts by sandwiching a plurality of piping parts (invention according to claim 6).

[0016]

BEST MODE FOR CARRYING OUT THE INVENTION An embodiment of the present invention will be described below with reference to the drawings. <Cleaning Device> FIGS. 1 and 2 relate to an embodiment of the present invention. FIG. 1 is a vertical sectional view showing a schematic configuration of a cleaning device according to the embodiment, and FIG. 2 is an external perspective view thereof.

The cleaning apparatus 1 is an apparatus having a function of cleaning the piping components of the processing liquid piping in the substrate processing apparatus having the processing tank serving as the processing section. The piping parts are, for example,
Filter, heater, pump, thermometer, thermometer, flow meter,
It is a part attached to the processing liquid pipe such as the pipe itself.

The cleaning apparatus 1 has a size and weight that can be easily transported by an operator such as a substrate processing apparatus.
The size of the housing 3 is, for example, about "Ito-can". A handle 5 is attached to the top of the housing 3 for easy carrying.

Inside, a cleaning liquid circulation tank 7, a supply pipe 9, a pump 11, a return pipe 13 and a three-way valve 15 are provided.
And a branch pipe 17 and a cleaning liquid recovery tank 19. Further, on the lower right side surface of the housing 3 in FIG. 1,
A bent pipe 21 that communicates with the supply pipe 9 is attached, and a bent pipe 23 that communicates with the return pipe 13 is attached to the upper right side surface. A connecting portion 2 that can be connected to a valve portion provided in a processing liquid pipe of the substrate processing apparatus is attached to these tip portions.
5, 27 are attached.

The cleaning liquid is stored in the cleaning liquid circulation tank 7, and the cleaning liquid is supplied to the bent pipe 21 through the supply pipe 9 by the operation of the pump 11 serving as the pressure feeding means. When the three-way valve 15 is in the "normal position", the bent pipe 21
The cleaning liquid supplied from the pipe and passed through the piping parts is bent pipe 2
3 to return to the cleaning liquid circulation tank 7 via the return pipe 13. The operating power source of the pump 11 can be obtained by using a built-in battery (not shown) or connecting to an outlet through an AC cable (not shown). In addition, by adopting a hand-operated type instead of the electric pump 11,
It can also be made lighter.

When the three-way valve 15 is in the "recovery position", the cleaning liquid supplied from the bent pipe 21 and passed through the pipe parts passes through the bent pipe 23, the return pipe 13, and the branch pipe 17 to collect the cleaning liquid. It is collected in the tank 19. The collected cleaning liquid is discharged from a drain (not shown) of the cleaning liquid recovery tank 19 or taken out together with the cleaning liquid recovery tank 19 from the housing 3 and discharged.

The cleaning liquid circulation tank 7 and the supply pipe 9
The pump 11 corresponds to the cleaning liquid supply means in the present invention, and the three-way valve 15, the branch pipe 17, and the cleaning liquid recovery tank 19 correspond to the cleaning liquid recovery means in the present invention.
Further, the bent pipes 21 and 23 and the connecting portions 25 and 27 correspond to the connecting pipe in the present invention.

Next, a cleaning process by the cleaning device 1 having the above-mentioned structure will be described. The cleaning liquid recovery tank 19
Is empty, and the cleaning liquid circulation tank 7 stores a required amount of cleaning liquid.

First, the cleaning apparatus 1 is carried to the vicinity of the substrate processing apparatus to be cleaned. Next, the connecting parts 25 and 27 at the tip ends of the bent pipes 21 and 23 are connected so as to sandwich the pipe part to be cleaned. Then, the pump 11 is operated with the three-way valve 15 in the “normal position”. As a result, the cleaning liquid in the cleaning liquid circulation tank 7 is pumped, and after cleaning the pipe parts, returns to the cleaning liquid circulation tank 7 again.
This is performed for a predetermined time to wash the piping parts. After that, the three-way valve 15 is switched to the “collection position”, and the cleaning liquid used for cleaning is passed through the branch pipe 17 and the cleaning liquid recovery tank 1
Collect at 9.

In this way, the cleaning liquid circulation tank 7 provided in the portable housing 3, the supply pipe 9, and the pump 11 supply the cleaning liquid, and the three-way valve 15, the branch pipe 17, and the cleaning liquid recovery tank 19 are provided. By collecting the cleaning liquid with, the pipe parts can be cleaned with the cleaning liquid, and the scattering of the processing liquid can be prevented. Therefore, while working safely,
The loss of the processing liquid can be suppressed and the cleaning can be shortened. Further, since the cleaning device 1 is configured to be portable, the cleaning device 1 can be shared by a plurality of substrate processing devices, and the burden of providing utilities for cleaning liquid supply and drainage and the like can be reduced. it can.

<Modification> FIG. 3 is a vertical cross-sectional view showing a schematic structure of a modification of the cleaning apparatus 1 described above. The same components as those of the above-described embodiment device are designated by the same reference numerals, and detailed description thereof will be omitted.

The cleaning device 1A is provided with two cleaning liquid circulation tanks 7A and 7B.
Is different from. Therefore, in the supply pipe 9, a three-way valve 29 for switching between the two cleaning liquid supply tanks 7A and 7B,
Supply pipes 9A and 9B are provided. Further, the return pipe 13 is provided with a three-way valve 31 for switching the cleaning liquid circulation tanks 7A, 7B and return pipes 13, 13A, 13B.

The above-mentioned three-way valves 29 and 31 are interlocked in the switching operation, and the cleaning liquid circulation tanks 7A and 7A on one side must be used.
Only B is used. Three-way valve 31
Can be switched between the "normal position 1" and the "normal position 2", and the former is connected to the cleaning liquid circulation tank 7A and the latter is connected to the cleaning liquid circulation tank 7B. Therefore, in conjunction with the operation of the three-way valve 31, the three-way valve 29 is interlocked and switched so as to select the same tank.

In this way, a plurality of cleaning liquid circulation tanks 7
By providing A and 7B, various cleaning liquids can be stored in each, and the cleaning liquids can be switched and supplied according to the processing liquid used by the substrate processing apparatus. Therefore, the cleaning process can be efficiently performed.

The present invention is not limited to the above embodiment, but can be modified as follows.

(1) If the portable housing 3 is portable, various embodiments can be adopted in terms of shape and size. For example,
It also includes a form in which even a person who cannot directly carry the object can be placed on a cart or the like and moved.

(2) In the cleaning device 1A having a plurality of cleaning liquid circulation tanks, a dedicated bent pipe may be provided in each tank.

(3) Instead of the handle 5, the portable housing 1
A wheel may be provided on the lower surface of the above to form a portable type.

(4) The connecting pipe is the bent pipe 2 described above.
The structure is not limited to the bending structure such as 1 and 23, and fixed type piping may be adopted. Moreover, you may use the multi-joint type piping which connected the fixed type piping with the pipe joint.

<Substrate Processing Apparatus> Next, a substrate processing apparatus equipped with the above-described cleaning apparatus will be described with reference to FIG. Note that FIG. 4 is a block diagram showing a schematic configuration of a substrate processing apparatus including a cleaning device.

The substrate processing apparatus 51 includes the above-described cleaning apparatus 1 (or cleaning apparatus 1A), a holding arm 53, a processing tank 55 as a processing unit, and a processing liquid pipe 57. The holding arm 53 holds a plurality of substrates W to be processed, and can move up and down between the upper part of the processing bath 55 and the immersion position shown in FIG. At the bottom of the processing tank 55,
An injection pipe 59 for injecting the processing liquid is provided. Further, a collection tank 60 for collecting and discharging the overflowed processing liquid is provided around the upper part thereof. The treatment liquid pipe 57 is connected to the injection pipe 59.

The processing liquid pipe 57 is provided with a filter 61 corresponding to the pipe parts in the present invention, a heater 63 having a temperature adjusting function, and a pump 65. Filter 61
Is for removing particles and the like in the treatment liquid, and the heater 63 is for adjusting the temperature of the treatment liquid to a predetermined temperature. Further, the pump 65 circulates and circulates the processing liquid supplied to the processing bath 55 from a processing liquid supply source (not shown) between the recovery bath 60 and the processing bath 55.

Further, the processing liquid pipe 57 is provided with four three-way valves 67 to 70 so as to sandwich the filter 61, the heater 63, and the pump 65, respectively. The three-way valves 67 to 70 correspond to the flow cutoff means in the present invention. The remaining portions of the three-way valves 67 to 70 that are not directly connected to the processing liquid pipe 57 are connecting portions 71 to 74.

For example, the connecting portion 72 is for supplying the cleaning liquid, and the connecting portion 71 is for discharging the liquid. The bent pipe 2 of the cleaning device 1 (or the cleaning device 1A) is connected to the connecting portions 71 and 72.
3, 21 are connected respectively.

Next, the operation of the substrate processing apparatus configured as described above during cleaning will be described. It is assumed that the pump 65 is stopped in advance and the holding arm 53 is also raised above the processing tank 55 and is retracted.

The filter cleaning bent pipe 21 is connected to the connecting portion 72 of the three-way valve 68, and the bending pipe 23 is connected to the connecting portion 71 of the three-way valve 67. Then, by operating both three-way valves 67, 68, the connecting portion 7
Switch to the 1,73 side. As a result, the residual liquid in the filter 61 and the circulating pressure are discharged through the three-way valve 67, and the filter 61 is cleaned by the cleaning liquid supplied from the cleaning device 1 through the three-way valve 68. If necessary, the filter 61 is replaced with a new one after the cleaning process for a predetermined time. Then, after switching the both three-way valves 67 and 68 to the original state, the processing liquid is circulated to process the substrate W.

The heater cleaning bent pipe 21 is connected to the connecting portion 73 of the three-way valve 69, and the connecting pipe 23 is connected to the connecting portion 72 of the three-way valve 68. Since the procedure after that is the same as the cleaning process of the filter 61, the description is omitted.

The pump cleaning bent pipe 21 is connected to the connecting portion 74 of the three-way valve 70, and the other bent pipe 23 is connected to the connecting portion 73 of the three-way valve 69. Since the subsequent steps are the same as the above-described cleaning processing of the filter 61, description thereof will be omitted.

According to this embodiment, the processing bath 55 and the processing liquid pipe 57 are shut off by any of the three-way valves 67 to 70, so that a large amount of the processing liquid stored in the processing bath 55 is discharged. Without filter 61, heater 63, pump 6
5 can be washed. Therefore, the loss of the processing liquid can be suppressed, and the cleaning can be immediately started. In addition, a pair of three-way valves (67 and 68, 68 and 69, 69 and 7) are provided at close positions sandwiching the filter 61, the heater 63, and the pump 65.
By providing 0), waste of the processing liquid in the processing liquid pipe 57 can be suppressed, and the amount of the processing liquid to be wasted can be further suppressed.

<Modification> FIG. 5 is a diagram showing a schematic configuration of a modification of the substrate processing apparatus. The same components as those in the above-described embodiment are designated by the same reference numerals, and detailed description thereof is omitted.

In the above embodiment, the filter 61, the heater 63, and the pump 65 are each provided with a three-way valve. However, in the substrate processing apparatus 51A according to the present embodiment, these piping components are sandwiched together. Are provided with three-way valves 67, 70. Therefore, when cleaning, the filter 61, the heater 63, and the pump 65 are all cleaned at the same time.

Thus, the filter 61 and the heater 63 are
And three-way valves 67 and 70 are provided with the pump 65 interposed therebetween, and the bent pipe 21 of the cleaning device 1 (1A) is connected to the connecting portion 7 of the three-way valve 70.
4 and connecting the bent pipe 23 to the connecting portion 73 of the three-way valve 67 makes it possible to clean all the pipe components in a single treatment.

The substrate processing apparatus described above is used in the processing tank 55.
The processing liquid pipe 57 is connected in communication with the recovery tank 60 and the processing liquid is circulated. However, the processing liquid supplied from the processing liquid pipe 57 and overflowing from the processing tank 55 to the recovery tank 60 does not circulate. It may be of a type that is discharged.

[0049]

As is apparent from the above description, according to the cleaning apparatus of the present invention, the cleaning liquid is supplied from the cleaning liquid supply means housed in the housing, and the cleaning liquid is recovered by the cleaning liquid recovery means. The piping components can be washed with the washing liquid without discharging the treating liquid in the treating section, and the scattering of the treating liquid can be prevented. Therefore, the work can be performed safely, the loss of the processing liquid can be suppressed, and the cleaning time can be shortened.

[Brief description of drawings]

FIG. 1 is a vertical sectional view showing a schematic configuration of a cleaning apparatus according to an embodiment.

FIG. 2 is an external perspective view of the cleaning device of FIG.

FIG. 3 is a vertical sectional view showing a schematic configuration of a modified example.

FIG. 4 is a block diagram showing a schematic configuration of a substrate processing apparatus including a cleaning device.

FIG. 5 is a block diagram showing a schematic configuration of a modified example.

[Explanation of symbols]

1, 1A ... Washing device 3 ... Housing 5 ... Handles 7, 7A, 7B ... Washing liquid circulation tank (washing liquid supply means) 9 ... Supply pipe (washing liquid supply means) 11 ... Pump (washing liquid supply means) 13 ... Return pipe 15 ... Three-way valve (washing liquid collecting means) 17 ... Branch pipe (washing liquid collecting means) 19 ... Washing liquid collecting tank (washing liquid collecting means) 21, 23 ... Bending pipe (connecting pipe) 25, 27 ... Connecting portion (connecting pipe) W ... Substrate 51 ... Substrate processing device 53 ... Holding arm 55 ... Processing tank (processing unit) 57 ... Processing liquid pipe 59 ... Injection pipe 60 ... Recovery tank 61 ... Filter 63 ... Heater 65 ... Pumps 67 to 70 ... Three-way valve (flow cutoff means) 71-74 ... Connection part

─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. ⁷ Identification code FI theme code (reference) H01L 21/304 B08B 9/02 ZF term (reference) 2H088 FA21 FA30 HA01 MA20 2H090 HC18 JB02 JC19 3B116 AA13 AB53 BB62 BB90 CD22 3B201 AA13 AB53 BB62 BB90 BB92 CD22

Claims (7)

[Claims] 1. A cleaning device for cleaning a piping component provided in a processing liquid pipe for supplying a processing liquid to a processing part of a substrate processing apparatus, wherein the upstream and downstream processing liquid pipes sandwich the piping component. Two connecting pipes connected in communication with each other, and in a state where the flow of the processing liquid from the processing liquid pipe to the processing section is blocked, a cleaning liquid is supplied to the processing liquid pipe via one of the two connecting pipes. And a cleaning liquid supply means for supplying the cleaning liquid from the processing liquid pipe via the other connecting pipe of the two connecting pipes in a state where the flow of the processing liquid from the processing liquid pipe to the processing unit is blocked. A cleaning apparatus, comprising: a cleaning liquid recovery unit for recovering the cleaning liquid; and a housing that houses the cleaning liquid supply unit and the cleaning liquid recovery unit. 2. The cleaning apparatus according to claim 1, wherein the cleaning liquid supply unit includes a cleaning liquid circulation tank that stores the cleaning liquid, and a pressure feeding unit that pressurizes the cleaning liquid in the cleaning liquid circulation tank to the one connection pipe. A return pipe that collects the cleaning liquid that has passed through the piping component into the cleaning liquid circulation tank via the other connecting pipe, and the cleaning liquid recovery means includes a branch pipe branched from the return pipe, and a branch pipe from the branch pipe. A cleaning device comprising: a cleaning liquid recovery tank for recovering the cleaning liquid; and a switching valve for switching the cleaning liquid in the return pipe to one of the cleaning liquid circulation tank side and the cleaning liquid recovery tank side. 3. The cleaning device according to claim 1, wherein the cleaning liquid circulation tank is plural, and the cleaning liquid is stored according to the processing liquid used in the processing section. . 4. A processing liquid pipe having piping parts for supplying a processing liquid to a processing part, a flow blocking means for blocking the flow of the processing liquid from the processing liquid pipe to the processing part, and the processing liquid pipe. The two connection pipes connected to each other, the flow blocking means cutting off the flow of the processing liquid from the processing liquid pipe to the processing unit, through one of the two connection pipes. A cleaning liquid supply unit for supplying a cleaning liquid to the processing liquid pipe, and a connection pipe of the other of the two connection pipes in a state where the flow of the processing liquid from the processing liquid pipe to the processing unit is blocked by the flow blocking unit. A cleaning liquid recovery means for recovering a cleaning liquid from the processing liquid pipe via the cleaning liquid supply means, and a cleaning device having a casing for accommodating the cleaning liquid supply means and the cleaning liquid recovery means. Processing equipment. 5. The substrate processing apparatus according to claim 4, wherein the flow shut-off means is provided in the processing liquid pipe on the upstream side and the downstream side with each piping component interposed therebetween. apparatus. 6. The substrate processing apparatus according to claim 4, wherein the flow cutoff unit is provided in the processing liquid pipe with a plurality of piping components interposed therebetween. 7. The substrate processing apparatus according to claim 4, wherein the cleaning liquid circulation tank is plural and stores a cleaning liquid according to a processing liquid used in the processing section. Substrate processing equipment.