[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

JP2003142731A - Light emitting diode element and device thereof - Google Patents

Light emitting diode element and device thereof

Info

Publication number
JP2003142731A
JP2003142731A JP2001333727A JP2001333727A JP2003142731A JP 2003142731 A JP2003142731 A JP 2003142731A JP 2001333727 A JP2001333727 A JP 2001333727A JP 2001333727 A JP2001333727 A JP 2001333727A JP 2003142731 A JP2003142731 A JP 2003142731A
Authority
JP
Japan
Prior art keywords
film
light emitting
emitting diode
diode element
laminated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001333727A
Other languages
Japanese (ja)
Inventor
Toshiyuki Nishikawa
俊幸 西川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP2001333727A priority Critical patent/JP2003142731A/en
Publication of JP2003142731A publication Critical patent/JP2003142731A/en
Pending legal-status Critical Current

Links

Landscapes

  • Led Device Packages (AREA)
  • Led Devices (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a light emitting diode element wherein generation ratio of chip peeling is reduced, and to provide its mount method. SOLUTION: The device has a light emitting diode element body 120 wherein a clad layer, a light emitting layer and a clad layer are formed one by one on a GaAs substrate 121, a bonding side electrode 130 formed on the clad layer of an upper side of the body, and a mount side electrode 110 formed in a lower side of the light emitting diode element body 120. The mount side electrode consists of an Au deposit film 111, a first metallic film 112 laminated on the deposit film, a second metallic film 115 laminated on the first metallic film, an Au film 113 laminated on the second metallic film, and an AuSn film 114 laminated on the Au film. The second metallic film has a melting point higher than that of the AuSn film.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、発光ダイオード素
子に関し、特に、発光ダイオード素子の合金接合によるマ
ウントに適した電極構造を有する発光ダイオード素子お
よびそのマウント方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a light emitting diode element, and more particularly to a light emitting diode element having an electrode structure suitable for mounting the light emitting diode element by alloy bonding and a mounting method thereof.

【0002】[0002]

【従来の技術】図2は従来の発光ダイオード素子の構造
を示す断面図で、Cuフレーム上に合金接合によりマウ
ントされた状態を示すものである。
2. Description of the Related Art FIG. 2 is a cross-sectional view showing a structure of a conventional light emitting diode element, showing a state of being mounted on a Cu frame by alloy bonding.

【0003】同図に示すように、発光ダイオード素子本
体220は、N型GaAs基板221にN型InGaA
lPクラッド層222、P型InGaAlP発光層22
3、P型InGaAlPクラッド層224が順次積層形
成されている。この発光ダイオード素子本体220上面
に設けられるボンディング側電極230は、前記P型I
nGaAlPクラッド層224の表面に、蒸着などによ
りAuBe膜231、Au膜232、Mo膜233、A
u膜234を順次積層形成して前記P型InGaAlP
クラッド層224との間にオーミックコンタクトが得ら
れる。
As shown in FIG. 1, the light emitting diode element body 220 includes an N type GaAs substrate 221 and an N type InGaA.
1P clad layer 222, P-type InGaAlP light emitting layer 22
3. A P-type InGaAlP clad layer 224 is sequentially laminated. The bonding side electrode 230 provided on the upper surface of the light emitting diode element body 220 is the P-type I
On the surface of the nGaAlP clad layer 224, an AuBe film 231, an Au film 232, a Mo film 233, A is formed by vapor deposition or the like.
The p-type InGaAlP is formed by sequentially stacking the u films 234.
An ohmic contact is obtained with the clad layer 224.

【0004】一方、発光ダイオード素子本体220下面
に設けられるマウント側の電極は、発光ダイオード素子
本体220のN型GaAs基板221とオーミックコン
タクトを得るために純Auに不純物としてGeを添加し
たAuGe膜211を推積する。次いでSn拡散防止用
金属膜として例えばMo膜とこのMo膜の保護用として
純Au膜を形成後、熱処理行いオーミックアロイ層21
2を形成する。その後、AuSn膜剥離防止の純Au膜
213を蒸着形成し、最表面には金属フレーム240と
合金化接続をするためのAuSn膜214を形成してい
る。金属フレーム240は表面がAgメッキされたCu
板により構成されている。
On the other hand, the mount side electrode provided on the lower surface of the light emitting diode element body 220 is an AuGe film 211 in which pure Au is doped with Ge as an impurity in order to obtain ohmic contact with the N-type GaAs substrate 221 of the light emitting diode element body 220. Build up. Then, for example, a Mo film and a pure Au film for protecting the Mo film are formed as a metal film for preventing Sn diffusion, and heat treatment is performed to form the ohmic alloy layer 21.
Form 2. After that, a pure Au film 213 for preventing the peeling of the AuSn film is formed by vapor deposition, and an AuSn film 214 for forming an alloyed connection with the metal frame 240 is formed on the outermost surface. The metal frame 240 is made of Cu whose surface is plated with Ag.
It is composed of plates.

【0005】[0005]

【発明が解決しようとする課題】このような従来の発光
ダイオード素子本体220を金属フレーム240に接触
させ、加熱処理して合金接合によりマウントを行うが、こ
のようにしてマウントされた発光ダイオード素子本体2
20が金属フレーム240から剥離する、いわゆるチッ
ブ剥離が多発するという問題があった。従来の製造工程
においては、このようなチップ剥離不良率は、2〜3%に
も達ししていた。
The conventional light emitting diode element body 220 is brought into contact with the metal frame 240, heat-treated and mounted by alloy bonding. The light emitting diode element body thus mounted is mounted. Two
There is a problem in that so-called chip peeling frequently occurs when 20 peels from the metal frame 240. In the conventional manufacturing process, such a chip peeling defect rate has reached 2-3%.

【0006】したがって本発明は、上記問題点に鑑み、
発光ダイオード素子のマウント後における剥離現象を防
止した発光ダイオード素子及びそのマウント方法を提供
することを目的とするものである。
Therefore, the present invention has been made in view of the above problems.
It is an object of the present invention to provide a light emitting diode element which prevents a peeling phenomenon after mounting the light emitting diode element and a mounting method thereof.

【0007】[0007]

【課題を解決するための手段】上記目的を達成するため
にチッブ剥離が発生する原因を究明した結果、マウント
側の電極210を構成するAuSn膜214中のSnが
加熱処理により隣接する純Au膜213内に拡散して、
純Au膜213全体をAuSn膜に変質して溶融させる
ため、純Au膜213に反対側で隣接するMo膜との界
面の密着性が低下し、これが剥離現象を引き起こすこと
を見出した。そこで本発明は、純Au膜213とMo膜
との間にAuSn膜214より高融点の第二の金属膜を
介在することにより、合金接合の際の加熱処理工程にお
いて、AuSn膜214からAu膜213内にSnが拡
散して変質しても第一の金属膜であるMo膜との密着性
に影響を及ぼさないようにすることにより、上記問題を
解決するものである。
As a result of investigating the cause of chip separation in order to achieve the above object, as a result of heat treatment, Sn in the AuSn film 214 forming the electrode 210 on the mount side is adjacent to the pure Au film. Diffused into 213,
It has been found that since the entire pure Au film 213 is transformed into an AuSn film and melted, the adhesion at the interface with the Mo film adjacent to the pure Au film 213 on the opposite side is reduced, which causes a peeling phenomenon. Therefore, according to the present invention, by interposing the second metal film having a higher melting point than the AuSn film 214 between the pure Au film 213 and the Mo film, the AuSn film 214 to the Au film are removed from the AuSn film 214 in the heat treatment step at the time of alloy joining. The above problem is solved by preventing the adhesion to the Mo film, which is the first metal film, from being affected even if Sn diffuses and changes in quality in 213.

【0008】すなわち、本発明の発光ダイオード素子
は、GaAs基板上にクラッド層、発光層及びクラッド
層が順次形成された発光ダイオード素子本体と、この本
体上面の前記クラッド層上に形成されたボンディング側
電極と、前記発光ダイオード素子本体下面に形成された
マウント側電極とを備え、このマウント側電極は、前記
GaAs基板とオーミックコンタクトするためのAu系
推積膜と、この推積膜に積層された第一の金属膜と、こ
の第一の金属膜に積層された第二の金属膜と、この第二
の金属膜に積層されたAu膜と、このAu膜に積層され
たAuSn膜とからなり、前記第二の金属膜は前記Au
Sn膜より高い融点を有することを特徴とするものであ
る。
That is, the light emitting diode device of the present invention comprises a light emitting diode device body in which a clad layer, a light emitting layer and a clad layer are sequentially formed on a GaAs substrate, and a bonding side formed on the clad layer on the upper surface of the body. An electrode and a mount-side electrode formed on the lower surface of the light-emitting diode element body are provided, and the mount-side electrode is laminated with an Au-based deposit film for making ohmic contact with the GaAs substrate. The first metal film, the second metal film laminated on the first metal film, the Au film laminated on the second metal film, and the AuSn film laminated on the Au film. , The second metal film is the Au
It is characterized by having a melting point higher than that of the Sn film.

【0009】また、本発明の発光ダイオード素子におい
ては、前記不純物拡散防止金属膜はMoであり、前記高
融点金属膜はAuGe合金膜であることを特徴とするも
のである。
Further, in the light emitting diode element of the present invention, the impurity diffusion preventing metal film is Mo and the refractory metal film is an AuGe alloy film.

【0010】また、本発明の発光ダイオード装置は、上
記電極構造の発光ダイオード素子と、前記発光ダイオー
ド素子の前記マウント側電極が合金接合されている金属
フレームとを具備してなるものである。
Further, the light emitting diode device of the present invention comprises a light emitting diode element having the above electrode structure and a metal frame to which the mount side electrode of the light emitting diode element is alloyed.

【0011】さらに、本発明の発光ダイオード装置にあ
っては、前記金属フレームは、表面がAgメッキされた
CuまたはFeフレームであることを特徴とするもので
ある。
Further, the light emitting diode device of the present invention is characterized in that the metal frame is a Cu or Fe frame whose surface is Ag-plated.

【0012】[0012]

【発明の実施の形態】以下、本発明の実施形態について
図1を用いて説明する。同図はフレームにマウントされ
たInAlGaP赤色発光ダイオードの断面である。発
光ダイオード素子本体120は、従来の素子本体と同様
に、N型GaAs基板121上に、N型InGaAlPク
ラッド層122、P型InGaAlP発光層123、P
型InGaAlPクラッド層124が順次積層形成され
る。発光ダイオード素子本体120上面にはボンディン
グ側のP面電極130が、従来と同様に形成される。す
なわち、P型InGaAlPクラッド層124の表面
に、蒸着などによりAuBe膜131、純Au膜13
2、Mo膜133、純Au膜134を順次形成、熱処理
してボンディング可能な面を有するオーミックコンタク
ト電極が形成される。
DETAILED DESCRIPTION OF THE INVENTION An embodiment of the present invention will be described below with reference to FIG. The figure shows a cross section of an InAlGaP red light emitting diode mounted on a frame. The light emitting diode element body 120 is similar to the conventional element body in that the N type InGaAlP clad layer 122, the P type InGaAlP light emitting layer 123, and P are formed on the N type GaAs substrate 121.
A type InGaAlP cladding layer 124 is sequentially laminated. A P-side electrode 130 on the bonding side is formed on the upper surface of the light emitting diode element body 120 as in the conventional case. That is, the AuBe film 131 and the pure Au film 13 are formed on the surface of the P-type InGaAlP cladding layer 124 by vapor deposition or the like.
2, Mo film 133 and pure Au film 134 are sequentially formed and heat-treated to form an ohmic contact electrode having a bondable surface.

【0013】次に、AgメッキされたCuまたはFeフ
レーム140にマウントされるマウント側のN面電極1
10は、図1に示すように、真空蒸着法にてN型GaA
s基板121表面にオーミックコンタクト用電極として
AuGe膜111を2000Å形成し、さらにSn拡散
防止用金属膜としてMo膜112を1500Å、次いで
電極密着性向上を図るAuGe膜115を2000Å、
さらに電極表面保護用のAu膜113を3000Åそれ
ぞれ順次形成し、熱処理を行ってGaAs基板121と
AuGe膜111との界面にオーミックコンタクト層を
形成する。
Next, the mount side N-face electrode 1 mounted on the Ag-plated Cu or Fe frame 140.
As shown in FIG. 1, 10 is an N-type GaA formed by a vacuum evaporation method.
On the surface of the s substrate 121, an AuGe film 111 of 2000 Å is formed as an electrode for ohmic contact, a Mo film 112 of 1500 Å is formed as a metal film for preventing Sn diffusion, and then an AuGe film 115 of 2000 Å for improving electrode adhesion is formed.
Further, 3000 Å of Au film 113 for protecting the electrode surface is sequentially formed, and heat treatment is performed to form an ohmic contact layer at the interface between the GaAs substrate 121 and the AuGe film 111.

【0014】その後、再度、真空蒸着法により、Au膜
1000ÅとAuSn膜114を10000Å順次推積
して、マウント側N面電極110が形成される。次に、
前述のように形成した発光ダイオード素子をマウント側
N面電極110のAuSn膜114がCuまたはFeフ
レーム140のAgメッキ面に接触した状態で加熱処理
して、合金化するマウント工程を終えて、発光ダイオー
ド装置が完成する。
Then, again, the Au film 1000Å and the AuSn film 114 are sequentially deposited by 10000Å by the vacuum evaporation method to form the mount side N-face electrode 110. next,
The light emitting diode element formed as described above is heat-treated in a state where the AuSn film 114 of the mount-side N-face electrode 110 is in contact with the Ag-plated surface of the Cu or Fe frame 140, and the mounting step for alloying is completed to emit light. The diode device is completed.

【0015】以上、説明したように、本発明によれば、
熱処理で生じるAuSn膜214からのSnの拡散によ
るAu膜113の変質によるMo膜112との界面での
密着性に対する影響を、Mo膜112とAu膜113の
間に介在させた融点の高いaAuGe膜115により防
止し、これによってチップ剥離の発生を防止することが
できた。またチップ剥離強度の測定でも、従来の電極構
造では平均80gであったが、本発明による構造の電極
では、150g以上となり、密着強度を約2倍向上でき
た。
As described above, according to the present invention,
The influence of the deterioration of the Au film 113 due to the diffusion of Sn from the AuSn film 214 caused by the heat treatment on the adhesion at the interface with the Mo film 112 has an effect on the aAuGe film having a high melting point interposed between the Mo film 112 and the Au film 113. It was possible to prevent the chip separation from occurring by 115. Further, in the measurement of the chip peel strength, the average was 80 g in the conventional electrode structure, but it was 150 g or more in the electrode having the structure according to the present invention, and the adhesion strength could be improved about twice.

【0016】[0016]

【発明の効果】本発明の電極構造を採用した発光ダイオ
ードの製造では、チップ剥離不良発生率が0.2%程度
に減少し、従来の電極構造での不良発生率の約1/10
以下に改善された。
In the manufacture of the light emitting diode using the electrode structure of the present invention, the chip peeling defect occurrence rate is reduced to about 0.2%, which is about 1/10 of the defect occurrence rate in the conventional electrode structure.
It has been improved as follows.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施形態の発光ダイオードと電極の構
造を示す断面図。
FIG. 1 is a sectional view showing a structure of a light emitting diode and an electrode according to an embodiment of the present invention.

【図2】従来の発光ダイオードとその電極の構造を示す
断面図。
FIG. 2 is a sectional view showing a structure of a conventional light emitting diode and its electrode.

【符号の説明】[Explanation of symbols]

110・・・マウント側N面電極、 111・・・AuGe膜、 112・・・第一の金属膜(Mo膜)、 113・・・Au膜、 114・・・AuSn膜、 115・・・第二の金属膜(AuGe膜)、 120・・・発光ダイオード素子本体 121・・・N型GaAs基板、 122・・・N型InGaAlPクラッド層、 123・・・P型InGaAlp発光層、 124・・・P型InGaAlPクラッド層、 130・・・ボンディング側P面電極、 140・・・Agメッキされた金属(CuまたはFe)
フレーム。
110 ... N-side electrode on mount side, 111 ... AuGe film, 112 ... First metal film (Mo film), 113 ... Au film, 114 ... AuSn film, 115 ... Second metal film (AuGe film), 120 ... Light emitting diode element body 121 ... N-type GaAs substrate, 122 ... N-type InGaAlP clad layer, 123 ... P-type InGaAlp light-emitting layer, 124 ... P-type InGaAlP clad layer, 130 ... P-side electrode on bonding side, 140 ... Ag-plated metal (Cu or Fe)
flame.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 GaAs基板上にクラッド層、発光層及
びクラッド層が順次形成された発光ダイオード素子本体
と、この本体上面の前記クラッド層上に形成されたボン
ディング側電極と、前記発光ダイオード素子本体下面に
形成されたマウント側電極とを備え、このマウント側電
極はAu系推積膜と、この推積膜に積層された第一の金
属膜と、この第一の金属膜に積層された第二の金属膜
と、この第二の金属膜に積層されたAu膜と、このAu
膜に積層されたAuSn膜とからなり、前記第二の金属
膜は前記AuSn膜より高い融点を有することを特徴と
する発光ダイオード素子。
1. A light emitting diode element body in which a clad layer, a light emitting layer and a clad layer are sequentially formed on a GaAs substrate, a bonding side electrode formed on the clad layer on the upper surface of the body, and the light emitting diode element body. A mount-side electrode formed on the lower surface is provided, and the mount-side electrode includes an Au-based deposition film, a first metal film laminated on the deposition film, and a first metal film laminated on the first metal film. The second metal film, the Au film laminated on the second metal film, and the Au film.
A light-emitting diode device comprising an AuSn film laminated on the film, wherein the second metal film has a higher melting point than the AuSn film.
【請求項2】 前記第一の金属膜はMoであり、前記第
二の金属膜はAuGe合金膜であることを特徴とする請
求項1記載の発光ダイオード素子。
2. The light emitting diode device according to claim 1, wherein the first metal film is Mo and the second metal film is an AuGe alloy film.
【請求項3】 請求項1に記載の発光ダイオード素子
と、前記発光ダイオード素子の前記マウント側電極が合
金接合されている金属フレームと、を具備する発光ダイ
オード装置。
3. A light emitting diode device comprising the light emitting diode element according to claim 1 and a metal frame to which the mount side electrode of the light emitting diode element is alloyed.
【請求項4】 前記金属フレームは、表面がAgメッキ
されたCuまたはFeフレームであることを特徴とする
請求項3記載の発光ダイオード装置。
4. The light emitting diode device according to claim 3, wherein the metal frame is a Cu or Fe frame whose surface is Ag-plated.
JP2001333727A 2001-10-31 2001-10-31 Light emitting diode element and device thereof Pending JP2003142731A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001333727A JP2003142731A (en) 2001-10-31 2001-10-31 Light emitting diode element and device thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001333727A JP2003142731A (en) 2001-10-31 2001-10-31 Light emitting diode element and device thereof

Publications (1)

Publication Number Publication Date
JP2003142731A true JP2003142731A (en) 2003-05-16

Family

ID=19148947

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001333727A Pending JP2003142731A (en) 2001-10-31 2001-10-31 Light emitting diode element and device thereof

Country Status (1)

Country Link
JP (1) JP2003142731A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006080408A1 (en) * 2005-01-31 2006-08-03 Shin-Etsu Handotai Co., Ltd. Light-emitting element and method for manufacturing light-emitting element
JP2010186808A (en) * 2009-02-10 2010-08-26 Showa Denko Kk Light-emitting diode and light-emitting diode lamp
KR20190092516A (en) * 2016-12-09 2019-08-07 루미리즈 홀딩 비.브이. How to Make an LED Carrier Assembly
CN111211202A (en) * 2020-03-04 2020-05-29 厦门乾照半导体科技有限公司 Modified gold-tin electrode, LED chip and preparation method thereof

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006080408A1 (en) * 2005-01-31 2006-08-03 Shin-Etsu Handotai Co., Ltd. Light-emitting element and method for manufacturing light-emitting element
JP2006210829A (en) * 2005-01-31 2006-08-10 Shin Etsu Handotai Co Ltd Light-emitting element and method for manufacturing the same
US7829910B2 (en) 2005-01-31 2010-11-09 Shin-Etsu Handotai Co., Ltd. Light emitting device and method of fabricating light emitting device
JP4617902B2 (en) * 2005-01-31 2011-01-26 信越半導体株式会社 Light emitting device and method for manufacturing light emitting device
KR101192229B1 (en) 2005-01-31 2012-10-17 신에쯔 한도타이 가부시키가이샤 Light emitting element and method for manufacturing light emitting element
JP2010186808A (en) * 2009-02-10 2010-08-26 Showa Denko Kk Light-emitting diode and light-emitting diode lamp
KR20190092516A (en) * 2016-12-09 2019-08-07 루미리즈 홀딩 비.브이. How to Make an LED Carrier Assembly
JP2020501370A (en) * 2016-12-09 2020-01-16 ルミレッズ ホールディング ベーフェー Method of manufacturing an LED carrier assembly
KR102465038B1 (en) * 2016-12-09 2022-11-09 루미리즈 홀딩 비.브이. How to manufacture an LED carrier assembly
JP7224285B2 (en) 2016-12-09 2023-02-17 ルミレッズ ホールディング ベーフェー Method for manufacturing LED carrier assembly
CN111211202A (en) * 2020-03-04 2020-05-29 厦门乾照半导体科技有限公司 Modified gold-tin electrode, LED chip and preparation method thereof

Similar Documents

Publication Publication Date Title
JP4183299B2 (en) Gallium nitride compound semiconductor light emitting device
JP5045336B2 (en) Semiconductor light emitting device
JP3912044B2 (en) Method for manufacturing group III nitride compound semiconductor light emitting device
JP3739951B2 (en) Semiconductor light emitting device and manufacturing method thereof
US6946312B2 (en) Semiconductor light emitting device and its manufacture
WO2006082687A1 (en) GaN LIGHT EMITTING DIODE AND LIGHT EMITTING DEVICE
TWI274429B (en) Semiconductor light-emitting device and manufacturing method thereof
JP2005123489A (en) Nitride semiconductor light emitting element and its manufacturing method
US6946372B2 (en) Method of manufacturing gallium nitride based semiconductor light emitting device
JP2006269912A (en) Light emitting device and manufacturing method thereof
JP3154364B2 (en) Electrode of n-type gallium nitride-based compound semiconductor layer and method of forming the same
JPH10190055A (en) Semiconductor light emitting element
JP5287837B2 (en) Gallium nitride compound semiconductor light emitting device and negative electrode thereof
JP3881473B2 (en) Manufacturing method of semiconductor light emitting device
US6653215B1 (en) Contact to n-GaN with Au termination
JPH1187772A (en) Electrode for semiconductor light emitting element
JP2003142731A (en) Light emitting diode element and device thereof
JP2005340860A (en) Semiconductor light-emitting element
US8000364B2 (en) Nitride semiconductor light emitting device and method of manufacturing the same
JP2004319672A (en) Light emitting diode
JPH08306643A (en) Electrode and light emitting element for iii-v group compound semiconductor
JP3239350B2 (en) Electrode of n-type nitride semiconductor layer
JPH10308533A (en) Galium-nitride-based compound semiconductor light emitting element, its manufacture and light emitting element
JP3427732B2 (en) Method for manufacturing nitride semiconductor device
TWI414076B (en) Manufacturing method of light-emitting element and light-emitting element