JP2003090902A - Antireflection imparting film and antireflection processing method using the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To perform an antireflection processing using a finely ruggedness, so that can decrease reflection of light and can improve visibility of display, with high productivity and at a low cost. SOLUTION: The antireflection imparting film 10 produced by forming a specified fine ruggedness 2A on the surface E of a release base film 1 is used to impart the pattern to a base material 3 to obtain a desired antireflective article 20. The finely rugged pattern 2A is formed in such a manner that the period PMAX of the lowest position in the recesses is equal to or smaller than the minimum wavelength λMIN of the visible light wavelength region in vacuum and that the cross-sectional area rate of the release film material part in the horizontal cross section continuously and gradually decreases from the lowest position of the recesses to the highest position of the projections in the ruggedness. The antireflection processing is carried out, for example, by attaching this film in an injection molding die, bringing a resin in a fluidized state by heating and fusing into contact with the imparting face of the film, and solidifying the resin.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an antireflection shaped film for imparting an antireflection function to various articles used in, for example, a liquid crystal display section of a mobile phone, and an antireflection processing method using the film. .

[0002]

2. Description of the Related Art Currently, liquid crystal display (LCD)
The widespread use of various devices, such as mobile phones, that use the above as a display unit is remarkable. When such a display unit is provided, various contrivances are often made to make the display more reliable and highly functional. For example, in a mobile phone or the like, in order to protect its display unit from water, dust, external force, etc., a display panel such as an LCD is not exposed, and a window member such as a transparent plastic plate is provided outside to protect it. In many cases (see Japanese Patent Laid-Open No. 7-66859, etc.).

[0003]

However, if a window material or the like is provided in front of the display material in order to protect the display panel or the like, outside light is reflected on both front and back surfaces of the window material, and the visibility of the display is deteriorated. There was a problem. In addition, in mobile phones, etc. where low power consumption of the display panel is an important factor, in addition to the reduction in visibility of the display, part of light from the display panel is returned to the display panel side due to reflection of the window material. Therefore, there is a problem in that the light utilization efficiency of the display panel is reduced, and accordingly unnecessary power is consumed.

Therefore, for various articles requiring antireflection, for example, an antireflection layer composed of a single layer or a multilayer film of a low refractive index layer and a high refractive index layer by a technique such as vapor deposition, sputtering, or coating. (Japanese Patent Laid-Open No. 2001-127)
852 etc.) has been proposed. However, since the antireflection layer formed by vapor deposition, sputtering or the like needs to form a thin film whose refractive index is controlled by one or multiple batch processes, there is a problem in product stability, non-defective rate, etc. Since it is batch production, productivity is low. Further, taking the above-mentioned window material as an example, since a molded product is once produced by injection molding and then an antireflection layer is formed on this molded product by vapor deposition or the like, the production is also performed in two steps. Was low. Therefore, there is also a problem that the antireflection processing has a high production cost. Alternatively, as an antireflection treatment, there is a method of reducing light reflection by a satin treatment,
This method has a problem in that it is impossible to improve the light utilization efficiency in terms of diffusing the light.

Therefore, in order to solve these problems in the prior art, the Applicant of the present invention provides the surface reflectance with extremely fine irregularities disclosed in JP-A-50-70040. I tried to apply the technology to reduce the noise. However, the technique disclosed in the same publication is applied to an optical component such as a lens whose surface reflection should be reduced by coating a photoresist or the like on the surface, exposing, developing, etc. Since it is a method of directly making fine irregularities on the substrate, the work efficiency is poor, and the productivity (mass productivity) necessary for industrial production can be obtained for mass-produced products such as window materials for mobile phones described above. Absent. For this reason, the applicant of the present invention first prepares fine irregularities on a glass base material to be an original plate (mother plate), and then nickel electroforming used in a production line of a compact disc or the like from the mother plate. Using the method, a metal (shaped mold) master plate is made, and the master plate is mounted in the mold of the injection molding machine, and the transparent resin is injection-molded to produce a transparent window material. At the same time as injection molding, we succeeded in producing fine irregularities having a desired antireflection property on the back surface of the window material (Japanese Patent Application No. 2001-185965).
Issue: Not yet published at the time of filing this patent). According to this method, there is no need to additionally perform antireflection processing after the window material is manufactured,
The molding and the antireflection processing can be performed in one step, and the method has the productivity that enables mass production.

However, considering further improvement in productivity,
The following issues remained that should be resolved. That is, it is a part of the mold itself because the mold is incorporated as a nest into the mold, and it is necessary to replace the mold if the surface of the mold is damaged during work. During that time, there was a problem that the production was stopped and the die replacement took time. Therefore, continuous productivity is not always good. In addition, there is a problem in that it costs a lot of money and time to manufacture a replacement mold.

That is, the object of the present invention is to reduce the useless reflection of light, improve the visibility of the display, and, at the same time, perform the antireflection processing by the fine concavity and convexity which can improve the utilization efficiency of the light of the display light, which is suitable for the continuous production. It is an object of the present invention to provide an antireflection shaped film having good productivity and low cost, and an antireflection processing method using the film.

[0008]

Therefore, in order to solve the above-mentioned problems, the antireflection shaping film according to the present invention has an antireflection fine unevenness formed on the shaping surface of a releasable substrate film. The antireflection shaped film, wherein the fine irregularities have a minimum wavelength in vacuum of a wavelength band of visible light of λ
_MIN , where P _MAX is the period of the most concave portion of the fine concavo-convex, and P _MAX ≤ λ _MIN , and it is assumed that the fine concavo-convex is cut along a plane orthogonal to the concavo-convex direction. The cross-sectional area occupation ratio of the material portion of the release-releasing substrate film in the cross section of the concave and convex is such that it continuously and gradually decreases from the most concave portion to the most convex portion of the fine concave and convex. did.

By using the antireflection shaped film having such a constitution, by using the shaped film to form fine irregularities on the surface of the article, an antireflection article having a desired antireflection function is obtained. To be Moreover, the antireflection function improves the visibility of the display and improves the utilization efficiency of the display light. In addition, since it is a film-shaped shaping mold called a shaping film, it is practically possible to use a new shaping mold (film) for each article, or to use "disposable (cut)" practically. Even if the shaping surface of the (film) is scratched, it can be repaired only by exchanging the film, and the troublesome work of replacing or modifying the block-shaped shaping mold such as a nest is unnecessary. Therefore, even if a molding die is placed in the injection molding die by injection molding and anti-reflection processing is performed on the surface of the article simultaneously with molding of the article, productivity deterioration due to troublesome mold replacement due to scratches on the molding die occurs. Without, productivity is improved. In addition, in the form of shaped film, since it can be used in a continuous strip shape, it can be reused easily, so a new shaped film (surface) for each article
Can be easily supplied. Therefore, antireflection processing can be performed at low cost with good productivity (mass productivity).

In the antireflection processing method of the present invention, the antireflection shaped film of the present invention is used, and a resin in a fluid state is brought into contact with the shaped surface of the film, and then the resin is solidified,
After that, the antireflection shaping film was peeled from the solidified resin so that the resin surface was provided with an antireflection function due to fine irregularities.

By adopting such an antireflection processing method,
An antireflection article having a desired antireflection function on the surface of an article made of a resin can be easily obtained. Moreover, the antireflection function improves the visibility of the display and improves the utilization efficiency of the display light. Further, since a film-shaped mold is used as the shaping mold, the antireflection processing can be carried out with good productivity (mass productivity) and at low cost, as described in the working effect of the antireflection shaping film. Incidentally, in order to bring the resin in a fluid state into contact with the shaping surface, for example, an injection molding method, a casting method and the like can be mentioned. Further, the productivity is good and the cost is low in that the shape development (molding) of the antireflection article by the solidification of the resin in the fluidized state and the antireflection processing are simultaneously completed in one step.

[0012]

BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below.

[Outline] First, FIG. 1A is a cross-sectional view illustrating one embodiment of the antireflection shaping film 10 of the present invention. As shown in the figure, the antireflection shaping film 10 of the present invention
Is a shaped film having a constitution in which the fine unevenness 2A peculiar to the present invention, which will be described in detail, is formed on one surface of the releasable substrate film 1. The fine irregularities 2A are different from conventionally known antireflection treatments or antiglare treatments in which light is scattered (diffuse reflection) by utilizing a matte surface (matte) formed by irregularities having a size of a light wavelength or more, The unevenness has a size smaller than the wavelength of visible light and has a shape peculiar to the present invention. In the description of the present invention,
Except when referring to the fine irregularities including those on the antireflection shaping film and those on the substrate, those on the antireflection shaping film are fine irregularities 2A, which are shaped on the substrate. Those which are formed into the reverse concavo-convex shape are used as the fine concavo-convex 2 by distinguishing them according to the reference numerals.

FIG. 1B shows the surface of the substrate 3 in which the anti-reflective shaping film 10 of the present invention as shown in FIG. It is sectional drawing which shows notionally an example of the antireflection article 20 shape | molded at. In order to shape the fine irregularities 2 on the surface of the base material 3, preferably, as the antireflection processing method of the present invention, for example, in the state where the antireflection shaping film is inserted into an injection molding die, resin is applied. Obtained by injection molding.

[Fine Concavo-convex] The reason why the desired fine concavo-convex 2 formed on the surface of the substrate 3 has the anti-reflective effect by the fine concavo-convex 2A of the antireflection shaping film 10 is that This is because it is possible to change a sudden and discontinuous change in the refractive index between the material and the outside (air) into a continuous and gradual change in the refractive index. It is a phenomenon that light reflection is caused by a discontinuous and abrupt refractive index change at the material interface, so by making the refractive index change on the article surface spatially and continuously,
The light reflection on the surface of the article is reduced. The base material 3 of the antireflection article 20 is normally transparent and transmits light,
Even if it is opaque, the antireflection effect of reducing the surface reflection can be obtained.

Hereinafter, the reason why the fine unevenness 2 formed on the base material 3 has an antireflection effect by shaping the fine unevenness 2A of the antireflection shaping film is as follows. See in detail.

2 to 4 are conceptual views for conceptually explaining the refractive index distribution obtained by the fine irregularities 2 formed on the surface of the antireflection article. First, FIG.
Regarding the transparent base material 3 constituting the antireflection article 20 having the surface formed on the surface, the base material 3 occupies the space of the portion of Z ≦ 0, and the surface of the base material, that is, Z = 0. A state in which a large number of fine unevennesses 2 having the unevenness direction in the Z-axis direction are arranged on the XY plane is shown.

The present invention also provides an antireflection shaping film 1
The fine concave / convex 2A on 0, the period of the most concave is P
When the _MAX, the P _MAX is the a at the minimum wavelength in a vacuum wavelength band of visible light it is not more than lambda _MIN is the substrate 3 surface formed by the shaping of the fine irregularities 2A fine Since the unevenness 2 has an inverted uneven shape, the period of the finest unevenness 2 at the most convex portion 2t is P _{MAX as} shown in FIG.
This is because P _MAX is such that the minimum wavelength in vacuum in the wavelength band of visible light is λ _MIN or less. Since the fine irregularities 2A have such a shape, for the light reaching the surface on which the fine irregularities 2 having the shape are formed,
Even if the refractive index of the medium (base material and air) has a spatial distribution, since it is a distribution with a size below the wavelength of interest, that distribution does not directly act on light, and that is Acts as averaged. Therefore, the reflection of light can be prevented by making the distribution such that the averaged refractive index (effective refractive index) continuously changes as the light advances.

In the present invention, the period P _MAX in the most concave portion (in the fine unevenness 2A) (that is, the most convex portion 2t in the fine unevenness 2 shown in FIG. 2) is Even in the configuration in which the distance is the maximum distance among the most concave portions of the adjacent fine irregularities 2A and the individual fine irregularities 2A are regularly arranged and have periodicity (the distance between the adjacent fine irregularities 2A is the same). Although it is good, a configuration without periodicity (distances between adjacent fine irregularities 2A are not uniform) may be used.

In FIG. 2, the Z-axis is taken as the orthogonal coordinate system in the direction normal to the envelope surface of the substrate 3, and the X-axis and the Y-axis are taken in the plane orthogonal to it. Then, now, light enters the base material from the front surface side, travels inside the base material, and is traveling in the vicinity of the surface of the base material in the negative direction of the Z axis,
Just assume that the Z-axis coordinate is at z.

Then, for the light at Z = z, the refractive index of the medium is such that the base material forms specific fine irregularities 2,
Strictly speaking, in Z = z, it appears as having a distribution f (x, y, z) in the XY plane (transverse section: horizontal section) orthogonal to the Z axis. That is, in the XY plane, the cross-sectional portion of the base material 3 has a refractive index n _b (about 1.5), and the other portion, specifically, the portion of the air a has a refractive index n _a (= 1. 0) (see FIG. 3). However, in reality, for light, refraction on a spatial scale smaller than that wavelength (if the wavelength of the light to be anti-reflection has a distribution, consider the minimum wavelength λ _MIN of the wavelength band). As a result of the refractive index distribution acting as an average, the effective refractive index of the averaged result has the refractive index distribution f (x, y, z) in the XY plane in the XY plane. And integrated,

[0022]

[Equation 1]

It becomes As a result, the distribution of the effective refractive index (n _ef ) becomes a function n _ef (z) of only z (see FIG. 4).

Therefore, if the cross-sectional area of the convex portion of the base material in the fine unevenness 2 is continuously increased toward the concave portion, the base material portion (in the XY plane) is formed. Since the area ratio with the air portion continuously changes in the Z-axis direction, the effective refractive index n _ef (z) is a continuous function with respect to z.

On the other hand, consider a case where light enters from a medium having a refractive index n _{0 to} a medium having a refractive index n ₁ . Now, for the sake of simplicity, consider an incident angle θ = 0 ° (normal incidence). However, the incident angle is an angle with respect to the normal line of the incident surface. In this case, the reflectance R at the medium interface does not depend on the polarized light and the incident angle, and becomes the following [Formula 2].

[0026]

[Equation 2]

Therefore, the fact that the change of the (effective) refractive index in the Z direction is a continuous function means that the refractive index at Z = z, two points separated by a minute distance Δz in the Z direction (the traveling direction of light). Is n ₀ and the refractive index at Z = z + Δz is n ₁ ,

If Δz → 0, then n ₁ → n ₀

And (from the definition of the continuous function), therefore
From [Equation 2],

R → 0

It becomes

Here, to be more precise, the wavelength of light in the object is λ, the wavelength in vacuum is n, and the refractive index of the object is n.
Then λ / n, which is generally smaller than λ to some extent. However, since the refractive index when the object is air is n≈1, it may be considered that λ / n≈λ. However, since the materials used for the base material such as glass and acrylic resin usually have a refractive index of about 1.5, the wavelength (λ / n _b ) in the base material having the refractive index n _b is
It becomes about 0.7λ. Considering this point, the fine unevenness 2
In the part of, the part on the air side (the concave part of the fine unevenness 2)
If you look at

P _MAX ≦ λ _MIN

When the condition (1) is satisfied, the effect of reducing the reflectance by averaging the refractive index can be expected. However,

Λ _MIN / n _b ≤P _MAX ≤λ _MIN

If it is, the portion of the base material 3 (fine unevenness 2
Concerning the contribution of the convex portion), the effect of reducing the reflectance by averaging the refractive index cannot be expected at least completely. However, it still has an antireflection effect as a whole due to the contribution in the air portion. And

P _MAX ≤λ _MIN / n _b

When the condition (1) is also satisfied, the condition that the period P _MAX is smaller than the shortest wavelength is completely satisfied in both the air part and the base material part, so that the antireflection effect by averaging the refractive index is further improved. Be complete. Specifically, if λ _MIN is the lower limit of the visible light wavelength band of 380 nm and n _b is 1.5, then λ _MIN / n _b is 250 nm, that is, P _MAX is 250.
It may be set to nm or less.

Next, the shape of the fine unevenness 2 which is the shape after shaping is within a cross section (horizontal cross section) on the assumption that the fine unevenness 2 is cut along a plane (XY plane) orthogonal to the direction of the unevenness. The cross-sectional area occupation ratio of the material portion of the base material in the
The shape is such that it continuously and gradually increases from the most convex portion (top) to the most concave portion (valley bottom). Particularly preferably, the shape is such that the most convex portion converges completely to 0, and the most concave portion completely converges to 1. Specifically, for example, the shapes as shown in FIGS. 5B and 5C can be cited.
However, as shown in FIG. 5 (D) or FIG. 5 (E), if the shape is such that the most convex portion is asymptotically close to 0, or that the most concave portion is asymptotically close to 1. A certain effect can be obtained. The shape of the fine irregularities 2 may be any shape as long as these conditions are satisfied.

Therefore, as the shape of the fine unevenness 2A on the antireflection shaping film for forming such fine unevenness 2 by shaping, the fine unevenness 2A is a surface (XY plane) orthogonal to the uneven direction. The cross-sectional area occupation ratio of the material portion of the releasable substrate film in the cross section (horizontal cross section) assuming that the fine concave and convex portions 2A are continuously cut from the most concave portion to the most convex portion is assumed. Any shape may be used as long as it gradually decreases and approaches at least 1 at the most concave portion or near 0 at the most convex portion. In particular, it is preferable that the most convex portion completely converges to 0,
In addition, it is a shape having a sectional area occupation rate that converges completely to 1 in the most concave portion.

For this purpose, the shape of the fine unevenness 2A on the antireflection shaping film is changed to the shape of the fine unevenness 2 which is the shape after shaping.
In view of the shape of, the peaks of the fine irregularities 2 may have at least a part of the side surface thereof having an oblique slope.
As shown in FIG. 5 (C) described below, the fine unevenness 2 may have a shape in which a vertical surface is provided along with a slope.

For example, the vertical cross-sectional shape of each fine unevenness 2 is a wavy shape only by a curve such as a sine wave as shown in FIG. 5A (see also FIG. 2), FIG. 5B and FIG. 5C. ), Such as the shape of a straight line such as a triangle, or the trapezoidal shape in which the most convex portion of the triangle as shown in FIG. 5D forms a flat surface, or the shape between the adjacent triangles as shown in FIG. 5E. For example, the recess has a flat surface. However, FIG. 5 (D) and FIG. 5 (E)
As described above, in the shape having the flat surface at the most convex portion or the most concave portion, the larger the area ratio of the flat surface at the most convex portion or the most concave portion is, the larger the change in effective refractive index becomes. It will be continuous. In that respect, the performance is inferior. However, even in this case, the effective refractive index can be continuously changed from the most convex portion to the most concave portion of the fine unevenness 2. Therefore, in terms of antireflection performance, the smaller the area ratio of the flat surface of the most convex portion or the most concave portion, the better.

Of course, in order to shape the shapes of the fine unevenness 2, the shape of the fine unevenness 2A on the antireflection shaping film may be a shape which is the reverse uneven shape.

In order to make the effective refractive index n _ef (z) continuously change from n _a to n _b as a function of the Z direction from the air to the substrate, At the most convex portion, the cross-sectional area occupation ratio of the base material converges to 0, and the cross-sectional area at the most concave portion has a shape as shown in FIG. 5 (B) or FIG. 5 (C). The shape in which the occupancy rate continuously converges to 1 is most preferable.

Next, regarding the fine unevenness 2 to be formed by shaping, the horizontal cross-sectional shape of each fine unevenness 2 is a circle (for example, FIG. 2), an ellipse, a triangle, a quadrangle, a rectangle, a hexagon, and others. It is arbitrary such as a polygon. The horizontal cross-sectional shape does not have to be the same from the most convex part to the most concave part of the fine unevenness 2. Therefore, the three-dimensional shape of the fine unevenness 2 is, for example, when the horizontal cross-sectional shape is circular and the vertical cross-sectional shape is an equilateral triangle, the three-dimensional shape of the fine unevenness 2 is conical, and when the horizontal cross-sectional shape is circular and the vertical cross-sectional shape is triangular. The three-dimensional shape of the fine unevenness 2 is an oblique cone, the three-dimensional shape of the fine unevenness 2 when the horizontal cross-sectional shape is triangular and the vertical cross-sectional shape is an equilateral triangle is a triangular pyramid, the horizontal cross-sectional shape is quadrangular, and the vertical cross-sectional shape is triangular. In this case, the three-dimensional shape of the fine unevenness 2 is a quadrangular pyramid.

The arrangement of the fine irregularities 2 in the horizontal plane is not limited to the two-dimensional arrangement shown in FIG.
Like the linear groove-shaped fine unevenness 2 illustrated in the perspective view of FIG.
A one-dimensional arrangement may be used, and both can be effective. However, in the case of the one-dimensional arrangement, anisotropy occurs in which the direction in which the antireflection effect is obtained and the direction in which the antireflection effect is not obtained occur depending on the relationship with the amplitude direction of the light wave. Therefore, the perspective view of FIG.
The two-dimensional arrangement as illustrated in the plan views of (B) and (C) is preferable because it has no directivity.

The three-dimensional shapes of the individual fine concavities and convexities 2 may all be the same, but they may not all be the same. Further, when the individual fine irregularities 2 are two-dimensionally arranged, the periods may be all the same in the individual fine irregularities 2, or may not be the same.

The height H of the fine irregularities 2 is determined according to (the effect of reducing) the desired reflectance and the maximum wavelength of the visible light band incident on the surface of the base material. For example, JP-A-50-70
In the case of designing on the basis of the reflectance, the height of fine irregularities, and the relationship with the light wavelength described in JP-A No. 040 (particularly FIG. 3), for example, the reflectance in the visible light band is 2% (untreated). If the goal is to reduce it to less than half of glass), the minimum height H _MIN is 0.2λ _MAX or more, that is,

H _MIN ≧ 0.2λ _MAX

If the aim is to reduce the reflectance in the visible light band to 0.5% or less,

H _MIN ≧ 0.4λ _MAX

It is preferable that Here, λ
_MAX is the maximum wavelength in vacuum in the visible light wavelength band. The height H of the fine irregularities 2 decreases as the height H increases from zero, but when reaching a height that satisfies the above inequality condition, a significant effect can be obtained. Specifically, for example, the maximum wavelength of the emission spectrum is λ
If a fluorescent lamp with _MAX = 640 nm is used, H _MIN ≥
0.2λ _MAX = 128 nm. That is, H _MIN should be 128 nm or more. Also, if we consider a sun ray with the maximum wavelength of the spectrum λ _MAX = 780 nm,
H _MIN ≧ 0.2λ _MAX = 156 nm, that is, H _MIN may be 156 nm or more. The minimum in the relationship between the height H _MIN and the period P _MAX, the ratio of the minimum height H _MIN / period P _MAX, and about 1 / 2-4 / 1.

Here, the fine unevenness 2 which is the shape after shaping
To give an example of its concrete shape and size, the shape is an aggregate of two-dimensionally regularly arranged conical shapes whose vertical cross section is sinusoidal and whose horizontal cross section is circular. The period P _MAX is 50 to 350 nm, and the minimum height H _MIN is 1.5 times the period P _MAX .

[Method of forming fine irregularities 2A of antireflection shaping film] The method of forming the aforementioned fine irregularities 2A on the releasable substrate film 1 as the antireflection shaping film 10 is not particularly limited. However, in consideration of industrial productivity and cost, first, an original plate with fine irregularities (mother plate) is prepared, and then this original plate (master plate) is prepared directly or through a multi-step duplication process. It is preferable to form the desired fine irregularities 2A on the releasable substrate film by using.

The production of the original plate is a step of first forming an uneven shape to be the fine unevenness 2A, and as a manufacturing method thereof, a fine processing technique in the semiconductor field or the like can be diverted.
However, in the case of a semiconductor, since the side surface of the uneven shape is usually a vertical surface and it is not particularly necessary to form a slope as in the present invention, in the present invention, fine processing is performed so that a slope can be formed.

As the fine processing technique as described above, an electron beam drawing method can be used. In this method, first, a resist layer is formed on a glass substrate, and then the resist layer is exposed by an electron beam drawing method, developed, and patterned to form a resist pattern layer. After that, the glass substrate is corroded by a dry etching method or the like using the resist pattern layer as an etching mask to form fine irregularities on the glass substrate. At this time, side surfaces are etched during etching to form slopes. Further, the resist pattern layer itself may be directly used as a corrosion mask at the time of corroding the glass substrate, but in order to form a deep uneven shape having a slope, it is preferable to provide a metal layer of chromium or the like on the glass substrate. After that, a resist film is formed to obtain a resist pattern layer,
It is preferable that the metal pattern layer formed by using the resist pattern layer is used as a corrosion mask.

When forming a pattern on the resist film, a laser drawing method can be used in addition to the electron beam drawing method. In the laser drawing method, a laser interference method used for producing holograms, diffraction gratings, etc. can be used. The diffraction grating has a one-dimensional arrangement, but a two-dimensional arrangement is also possible by changing the angle and performing multiple exposure. However, in the laser interferometry, the resulting fine irregularities are usually arranged regularly, but in the electron beam drawing method, predetermined drawing pattern information is stored in advance in the storage device as digital data and the drawing pattern information is used. , ON / OFF of scanning electron beam,
Or modulates the strength. Therefore, in addition to regular arrangement, irregular arrangement is also possible. In addition, since the laser drawing method and the electron beam drawing method have their respective advantages and disadvantages, design specifications,
Appropriate methods and conditions may be appropriately selected in consideration of the purpose and productivity.

Next, as a method for producing this plate (master plate) from the above original plate (mother plate), a known method, for example,
The mother plate is plated with a metal such as nickel, and the plating layer is peeled off to produce a metal master plate (electroforming method). Alternatively, this master plate may be plated once again, and a mold duplicated again may be used as the master plate. At this time, the plate is a plate-shaped nickel electroformed plate obtained directly or from the original plate through a multi-step duplication process, and a cylindrical plate formed by sticking it onto the surface of a metal cylinder made of hollow cylindrical iron or the like. By doing so, the continuous strip-shaped antireflection shaping film can be easily manufactured.

Then, by using the plate obtained as described above, fine irregularities 2A can be formed on the surface of the releasable substrate film to produce a desired antireflection shaped film. The method for producing the antireflection shaped film is not particularly limited, but is described in detail below, such as a method of resin-curing on a cylindrical original plate (molding plate cylinder) (hereinafter referred to as "molding plate cylinder method"), etc. Is suitable in terms of mass productivity and shape reproducibility, and other known duplication methods such as 2P method (Photo Poly).
Mer method), hot embossing method, etc. In addition, the molding plate cylinder method is a method of using a cylindrical mold as a shaping mold.
This is a method called P method. Further, in the 2P method, a composition obtained by adding a volatile solvent to a photopolymer may be appropriately used if necessary. In the case of the hot embossing method, it is preferable to use an antireflection shaping film that is not heated during shaping, or to use a resin having heat resistance that can withstand the heating.

In the molding plate cylinder method, as shown in FIG. 7, in order to form the releasable substrate film 1 by forming the fine irregularities 2A on the material film 4, a liquid ionizing radiation curable resin (as a photopolymer) ( Uncured product) is filled in at least the concave portion of the molding plate cylinder (also referred to as a roll intaglio or shaping plate) 50, and the material film is brought into contact with the resin, and the resin is formed between the material film and the molding plate cylinder. By irradiating ionizing radiation in a state of being held between them to cure the resin into fine irregularities, the fine irregularities 2A are formed on the material film 4. As a result, the antireflection shaping film 10 of the present invention is produced as the releasable substrate film 1 in which the fine irregularities 2A are formed on the surface of the material film 4. However, in FIG. 7, for convenience of illustration, the dimensions of the fine concavo-convex 2A are shown in a greatly enlarged manner than they actually are. Incidentally, the method of forming irregularities by such a molding plate cylinder method is described in JP-A-57-87318, JP-B-57-22755, and JP-B-63-50.
No. 066, JP-A No. 7-32476, etc., and a method of faithfully shaping the concavo-convex shape of the molding plate cylinder into a material film as a cured product (fine concavo-convex) of an ionizing radiation curable resin. Is. This method basically comprises the following steps (see FIG. 7).

(1) A cylinder-shaped molding plate cylinder 50 is prepared, which has a concavo-convex shape (the same shape as the fine concavo-convex 2) 40 having the same concavo-convex shape as the target fine concavo-convex 2A and the reverse concavo-convex shape 40. Is rotated around the axis 60. (2) The continuous strip material film 4 is supplied at the same speed as the peripheral speed of the molding plate cylinder 50. (3) The material film 4 and the molding plate cylinder 50 are superposed and adhered to each other with an uncured liquid composition 70 of an ionizing radiation curable resin interposed therebetween, and the liquid composition is at least the molding plate cylinder. Make sure that the recess is completely filled. (4) In that state, the ionizing radiation 81 is irradiated from the ionizing radiation irradiation device 80 to crosslink and cure the liquid composition. (5) After that, the material film 4 is peeled and removed from the molding plate cylinder together with the fine concavities and convexities 2A made of a cured product of an ionizing radiation curable resin that is adhered to the material film 4 and has the concavo-convex shape 40 on the molding plate cylinder. To do. As a result, the releasable base film 1 is obtained with the structure in which the fine irregularities 2A are adhered to the material film 4. The releasable substrate film 1 itself is the antireflection shaping film 10.

In the above method, as the molding plate cylinder 50, basically the same material, the same structure and the same manufacturing method as the known intaglio, gravure and embossing plates may be used. As a material for the molding plate cylinder, a metal such as iron or copper is usually used. However, when irradiating ultraviolet rays or visible light from the inside of the molding plate cylinder, a transparent material such as glass or quartz is used. Rotational drive around the axis of the molding plate cylinder may be performed by using the same mechanism and method as those of an ordinary transfer gravure printing machine, rotary embossing machine, or the like. In order to adhere the material film to the molding plate cylinder, a pressure roller 9 made of rubber or metal is used.
Press 0 to crimp. Further, when the material film is peeled from the molding plate cylinder, it is pressed and peeled by a peeling roller 100 made of rubber or metal. The material film is a continuous strip. Such a material film is unwound from an unwinding roll (supplying roll), and after forming the fine irregularities 2A, it is wound up by a winding roll (paper discharge roll).

The following methods (1) to (3) can be adopted as modes in which the material film and the molding plate cylinder are superposed and adhered to each other with the uncured liquid composition of the ionizing radiation curable resin interposed therebetween. (1) First, a liquid composition is applied onto a material film, and then the applied surface is directed to the surface of a molding plate cylinder,
The material film is overlaid on the forming plate cylinder. (2) As shown in FIG. 7, first, the liquid composition 70 is applied onto the molding plate cylinder 50 by using a coating liquid supply device 200 such as a T die, and then the material film 4 is superposed on the coating surface on the molding plate cylinder. .
(3) First, the liquid composition is applied onto each of the molding plate cylinder and the material film, and then the material film and the molding plate cylinder are overlapped so that their coated surfaces face each other.

There are the following (A) and (B) as modes of irradiating the uncured liquid composition between the molding plate cylinder and the material film with ionizing radiation. (A) As shown in FIG. 7, a material film transparent to ionizing radiation is selected (for example, a polyethylene terephthalate film is selected for ultraviolet rays), and irradiation is performed from the material film side. (B) A molding plate cylinder that is transparent to ionizing radiation is selected (for example, a quartz molding plate cylinder is selected for ultraviolet rays), and irradiation is performed from inside the molding plate cylinder.

The material of the material film 4 is typically a resin sheet which can be irradiated with ionizing radiation in the mode (A). That is, as the material of the material film,
(A) Thermoplastic resin polyester resin such as polyethylene terephthalate (PET), polybutylene terephthalate (PBT), polyethylene naphthalate (PEN),
Polyethylene, polypropylene, polymethylpentene,
Polyolefin resin such as olefin thermoplastic elastomer, polyvinyl chloride, polycarbonate, polystyrene, ABS resin, acrylic resin, polyether sulfone (PES), polyether ether ketone (PEE)
K) and other resin sheets, (b) thin paper, fine paper, coated paper and other paper, and (c) aluminum, iron, copper, and other metal foils. Note that the above (b) and (c) are possible only in the case of ultraviolet irradiation from the inside of a transparent molding plate cylinder or highly penetrating radiation such as an electron beam. Also, the thickness of the material film is usually 2
The thing of about 0-200 micrometers is used. In addition, as the material film, heat is usually applied during the shaping by the antireflection shaping film, which is usually performed by the injection molding method or the like. Therefore, assuming such a case, a material having heat resistance is preferable.
Among the materials listed above, those having excellent heat resistance include, for example, PET, PEN, PE as the resin material.
There are S, PEEK, etc., and metals are also excellent,
A resin is preferable because it can be irradiated with ionizing radiation from the side of the material film and is easy to use.

As the ionizing radiation curable resin, a prepolymer having a polymerizable unsaturated bond such as a (meth) acryloyl group or a (meth) acryloyloxy group in the molecule, or a cationically polymerizable functional group such as an epoxy group, A composition in which only one kind or two or more kinds of monomers or polymers are appropriately mixed is used. Alternatively, a composition comprising a polyene / thiol-based prepolymer obtained by combining polyene and polythiol can also be used. A liquid composition is used when it is not cured.

Examples of the prepolymer having a polymerizable unsaturated bond in the molecule include unsaturated polyesters such as condensates of unsaturated dicarboxylic acids and polyhydric alcohols, polyester (meth) acrylates, urethane (meth) acrylates. , (Epoxy (meth) acrylate, melamine (meth) acrylate, silicone (meth) acrylate and the like (here, (meth) acrylate is used in the meaning of acrylate or methacrylate. The same applies below. Examples of the monomer having a polymerizable unsaturated bond in the molecule include styrene-based monomers such as styrene and α-methylstyrene, methyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, and (meth) acrylic. Acid methoxyethyl, butoxyethyl (meth) acrylate monofunctional (meth) acrylates, ethylene glycol di (meth) acrylate, propylene glycol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate Polyfunctional (meth) s such as diethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol hexa (meth) acrylate Acrylic acid esters, (meth) acrylic acid-2
(N, N-diethylamino) ethyl, (meth) acrylic acid-2- (N, N-dimethylamino) ethyl, (meth)
Substituted amino alcohol esters of unsaturated acids such as acrylate (2- (N, N-dibenzylamino) ethyl), unsaturated carboxylic acid amides such as (meth) acrylamide, and the like can be given.

As the prepolymer having a cationically polymerizable functional group in the molecule, bisphenol type epoxy resin, novolac type epoxy resin, aliphatic type epoxy resin, epoxy resin such as alicyclic type epoxy resin, aliphatic type Examples thereof include vinyl ether resins such as vinyl ether, aromatic vinyl ether, urethane vinyl ether, and ester vinyl ether, cyclic ether resins, and prepolymers such as spiro compounds.

The polyene / thiol-based prepolymer may be a polythiol compound having two or more mercapto groups in the molecule, such as trimethylolpropane trithioglycolate, trimethylolpropane trithiopropylate, pentaerythritol tetral. For example, thioglycol. On the other hand, examples of the polyene include those obtained by adding allyl alcohol to both ends of polyurethane made of diol and diisocyanate.

As the ionizing radiation curable resin, one kind or a mixture of two or more kinds of the above compounds may be used, if necessary, and the above prepolymer or oligomer may be added in order to impart ordinary coating suitability to the resin composition. Is preferably 5% by mass or more and the monomer and / or polythiol is 95% by mass or less. Further, in order to adjust the physical properties such as flexibility, surface hardness, and releasability of the cured product, the following ionizing radiation non-curable resin is used in addition to the ionizing radiation curable resin.
About 0% by mass can be mixed and used. As the ionizing radiation non-curable resin, a thermoplastic resin such as urethane resin, cellulose resin, polyester resin, acrylic resin, butyral resin, polyvinyl chloride or polyvinyl acetate can be used.

Further, in order to improve the releasability, wax or the like may be used as the non-ionizing radiation non-curable resin in addition to the resin such as silicone resin and polyolefin resin. The releasability is adjusted by using one kind or two or more kinds of these.

When curing with ultraviolet rays, a photopolymerization initiator is added to the ionizing radiation curable resin. Examples of the compound having a radical-polymerizable unsaturated bond in the molecule include acetophenones, benzophenones, Michler benzoyl benzoate, α-amyloxime ester, tetramethylmeuram monosulfide and thioxanthones. For compounds having a cationically polymerizable functional group in the molecule, aromatic diazonium salts, aromatic sulfonium salts, aromatic iodonium salts, metallocene compounds,
Examples thereof include benzoin sulfonate and diallyl iodosyl salt. Further, if necessary, as a photosensitizer, n-
Butylamine, triethylamine, tri-n-butylphosphine and the like can be mixed and used.

Various known methods such as roll coating, curtain flow coating, and T die coating (FIG. 7) are used for coating the uncured liquid composition of the above ionizing radiation-curable resin on the molding plate cylinder or the material film. And so on. In particular, in the case of coating on the molding plate cylinder, it is also possible to immerse the rotating molding plate cylinder in the liquid composition in the ink pan (so-called dipping).

Here, the ionizing radiation means an electromagnetic wave or a charged particle beam having energy capable of polymerizing and cross-linking molecules, and includes ultraviolet rays, visible rays, X rays, electron rays, α rays and the like. However, ultraviolet rays or electron beams are usually used. Ultra-high pressure mercury lamp, high pressure mercury lamp,
Light sources such as a low pressure mercury lamp, a carbon arc lamp, a black light lamp, and a metal halide lamp are used. As the electron beam source, various electron beam accelerators such as Cockcroft-Walton type, Van de Graft type, resonance transformer type, insulating core transformer type, linear type, dynamitron type, high frequency type, etc. are used, preferably 100 to 1000 keV. Is 10
The one that radiates electrons having an energy of 0 to 300 keV is used.

As shown in FIG. 8, the antireflection shaping film 10 produced by the molding plate cylinder method as described above has the releasable base film 1 on the material film 4 with fine irregularities on the surface. The shaping layer 5 having 2A is laminated as a cured product of an ionizing radiation curable resin to form a two-layer structure. The shape-imparting layer 5 may be one in which the individual irregularities of the fine irregularities 2A are separated and independent and the material film 4 is exposed in the concave portions, or one in which the individual irregularities are continuous (FIG. 8 is drawn in this way). both are fine. Thus, the releasable substrate film 1 may have a multi-layer structure other than a single layer. As an example of the releasable substrate film having a single-layer structure, there is one obtained by forming fine irregularities 2A on a thermoplastic resin film by a hot embossing method [FIG.
(See (A)].

The molding plate cylinder method described above is a method in which the shaping layer 5 can be formed on the continuous strip-shaped material film 4 as a cured product of an ionizing radiation-curable resin. The releasable substrate film 1 having the shape-imparting layer 5 having the irregularities 2A may be produced by another method. For example, a resin other than the ionizing radiation curable resin, that is, a resin other than the photopolymer may be used. For example, a thermosetting resin such as urethane resin, melamine resin, or epoxy resin, or a thermoplastic resin having heat resistance capable of withstanding heat during shaping may be used as the shaping layer. In this case, as the material film, those listed by the molding plate cylinder method can be used.
However, since ionizing radiation curable resin is used for the shaping layer 5 because heat resistance is easily obtained and curing is instantaneously completed in a short time, a molding plate cylinder and a cylindrical molding die are used. By adopting, the resin can be cured continuously, resulting in excellent productivity.
It is also preferable in terms of good shape reproducibility.

The antireflection shaped film of the present invention is
Although it may be in the form of a sheet, a continuous strip is preferred from the viewpoint of productivity because the antireflection shaped film can be easily continuously supplied when the antireflection shaped film is used. Moreover, the continuous strip-shaped antireflection shaped film can be easily produced by the above-mentioned forming plate cylinder method.

When it is necessary to improve the releasability of the shaping surface E of the film at the time of shaping using the antireflection shaping film, the shaping layer 5 or a resin-based releasable substrate. Film 1
A known release agent such as silicone resin or wax may be added to the above.

In the antireflection shaping film of the present invention, the releasable substrate film, the shaping layer, or the like may be transparent or opaque. Further, when the antireflection shaping film of the present invention is used to perform antireflection processing on an article, the shaping method for the article is not particularly limited. However, the antireflection processing method of the present invention described below is preferable in terms of good productivity.

[Anti-Reflection Processing Method] The anti-reflection processing method of the present invention uses the anti-reflection shaping film 10 as described above as a shaping die to form fine irregularities 2A thereof as conceptually described with reference to FIG. After the resin 30 in a fluid state is brought into contact with the shape-imparting surface of the resin [FIG. 9 (A)], the resin is solidified [FIG.
(B)] After that, the antireflection shaping film 10 is peeled off from the solidified resin to form fine irregularities 2 having a shape opposite to that of the fine irregularities 2A on the solidified resin surface. Figure 9
(C)] is a method of imparting an antireflection function by the fine irregularities 2. As a result, the antireflection article 20 having the fine irregularities 2 formed on the surface of the base material 3 as illustrated in FIG.
Will be obtained with high productivity.

In the antireflection processing method of the present invention, a so-called injection molding method can be typically used as a method for bringing the resin in a fluid state into contact with the shaping surface of the antireflection shaping film. A casting method (dry-wet film forming method) or the like can also be used. However, the injection molding method is superior to the casting method in that, for example, a window material of a mobile phone and an antireflection article can be produced in arbitrary shapes. However, when it is desired to obtain a film (or sheet) in the form of an antireflection article, the casting method is more suitable than the injection molding method.

The injection molding method is a resin molding method in which the resin is made to be in a fluid state by heating and softening so as to make the resin in a fluid state, and the resin is injected into an injection mold to be filled and solidified. In the case of this method, By using the antireflection shaped film as a continuous strip rather than a sheet, it is possible to continuously supply and discharge a new antireflection shaped film into the injection mold for each shot of injection molding. , It will be easy to do. Regarding such a method of supplying / discharging the continuous strip film to / from the injection molding die, the technology disclosed in, for example, JP-A-6-315950 can be used in the technical field of decorating resin molded products.

On the other hand, in the case of the casting method, an antireflection shaped film is arranged on the surface of an endless casting belt, and the shaped film is preferably made endless, and the surface is a shaped surface. A film (or sheet) antireflection article is produced by casting a resin in a fluidized state by solution casting and forming a film.

Alternatively, by a melt extrusion method of extruding a resin in a fluidized state by heating and melting from a T-die or the like to form a film,
Wrap the anti-reflection shaping film around the cooling roller,
If a film is formed, it can be shaped simultaneously with the resin film formation. Alternatively, without winding the antireflection shaping film around the cooling roller, while guiding the continuous strip antireflection shaping film to the cooling roller, the resin is cooled and solidified on the antireflection shaping film, and then the antireflection shaping film is applied. By peeling the shaped film,
It can also be shaped simultaneously with the film formation.

It is also possible to leave the anti-reflection shaping film as a protective film without peeling off the antireflection shaping film immediately after the resin in the fluidized state is solidified. The remaining antireflection shaping film is peeled off at an appropriate time immediately before using the antireflection article.

[Antireflection Article] The antireflection article 20 obtained by utilizing the present invention has, as illustrated in the sectional view of FIG.
However, various materials can be appropriately used for the base material 3 depending on the application. The shape of the antireflection article 20 may be a film (or sheet), a plate, a three-dimensional shape, or the like.
This can also be of various shapes depending on the application. The base material 3 is usually transparent, but opaque material is not excluded. Further, the antireflection article has at least fine irregularities 2 on the surface of the base material, and has a multi-layered base material 3
Or a structure having other components, etc., depending on the application.

The material of the base material 3 is typically a thermoplastic resin, for example, methyl poly (meth) acrylate, ethyl poly (meth) acrylate, methyl (meth) acrylate- (meth) acrylate. Acrylic resin such as butyl acrylate copolymer [however, (meth) acrylic means acrylic or methacrylic. ], Polycarbonate resin, polypropylene, polymethylpentene, cyclic olefin polymer (typically, norbornene resin, etc., but for example, product name "Zeonor" manufactured by Nippon Zeon Co., Ltd., "Arton" manufactured by JSR Co., Ltd. , Etc.) and other polyolefin resins, polyethylene terephthalate,
Examples thereof include thermoplastic polyester resins such as polyethylene naphthalate, polyamide resins, polystyrene, acrylonitrile-styrene copolymers, polyether sulfones, polysulfones, cellulosic resins, vinyl chloride resins, polyether ether ketones and polyurethanes.

If the sol-gel method is used for shaping,
Inorganic materials such as glass are also possible. The sol-gel method, as disclosed in JP-A-6-64907, applies a composition containing a metal alkoxide or the like and polyethylene glycol or the like as a thickener, and embosses it while the sol is soft. This is a method of forming irregularities and then performing final drying and heat treatment to form fine irregularities as an inorganic coating film. The antireflection shaping film may be used for embossing.

[Use of the Invention] The antireflection article obtained by the present invention has a shape of a film (or sheet),
The plate, the three-dimensional shape and the like are arbitrary, and the use is not particularly limited. However, since the fine unevenness 2 to be shaped is extremely fine, in order to protect against dirt and scratches, the fine unevenness is not exposed on the outer surface, and is provided on the inner surface or provided inside the device. Suitable applications are suitable. In addition,
Applications to which the present invention can be applied are not limited to the applications exemplified below.

For example, it is a window material for the display section in various devices such as mobile phones. In these display units, a resin window material such as a plate or a molded product is arranged in front of a display panel such as an LCD. Since the antireflection article as the window material is exposed on the outside, it is preferable that the fine unevenness peculiar to the present invention is not provided in terms of resistance to scratches and dirt, and the fine unevenness is provided on the inner rear surface side. . In addition to the display panel such as an LCD, the display unit may display by a mechanical means such as a mechanical analog meter typified by a timepiece, or a window material of these. The window material has a flat plate shape, but there are also those having protrusions and the like in the periphery from the viewpoint of assembly and design, and such a complicated shape is not processed by the antireflection processing method of the present invention by injection molding or the like In particular, it is particularly preferable in that antireflection processing can be performed at the same time when the base material is molded.

As the device having the windowed display section as described above, in addition to a mobile phone and a clock, a personal computer, a PDA such as an electronic notebook, a personal digital assistant, a calculator, or C
Various portable music players such as D player, DVD player, MD player, and semiconductor memory type music player,
Alternatively, there are electronic devices such as a video tape recorder, an IC recorder, a video camera, a digital camera, and a label printer, or electric appliances such as an electric rice cooker, an electronic pot, and a washing machine.

In the case of a film (or sheet) or plate-shaped antireflection article, transparent base materials such as transparent electrode films and transparent plates used for transparent touch panels and the like can be mentioned. The transparent touch panel is for adding an input function to the display unit, but since it is assembled as a separate part from the display panel such as LCD and CRT in the product assembly, a gap remains between the display panel and the transparent touch panel, and light reflection does not occur. Occurs. Therefore, light reflection can be prevented by using a transparent base material forming the back surface side of the transparent touch panel as an antireflection article having the back surface provided with fine irregularities peculiar to the present invention.

The transparent touch panel is, for example, a PDA such as an electronic notebook or a personal digital assistant (device), or
Car navigation system, POS (point-of-sale information management) terminal, portable order input terminal, ATM (cash automatic teller machine), facsimile, fixed telephone terminal, mobile phone, digital camera, video camera, personal computer, display for personal computer, Electronic devices such as television receivers, television monitor displays, ticket vending machines, measuring instruments, calculators, electronic musical instruments, copiers, ECR (cash register), or electric appliances such as washing machines and microwave ovens. Used for.

[0094]

The present invention will be described in more detail with reference to the following examples.

Example 1 An operation of forming a resist layer of a photosensitive resin on a glass substrate by a spin coating method and exposing an argon ion laser from two directions at an incident angle of 50 ° by a laser interference exposure apparatus was performed. 90 of glass substrate
It was rotated twice and performed twice. Then, it was developed with a developing solution to form a resist pattern layer.

Then, the glass substrate was corroded by a dry etching method to prepare an original plate (mother plate) made of the glass substrate on which desired fine irregularities were formed. A nickel-plated plate was produced on this mother plate by an electroplating method. Then, the nickel-plated plate separated from the mother plate was wrapped around the surface of the hollow cylindrical plate cylinder (cylinder) made of iron and stuck to it to prepare a cylindrical main plate (master plate) to be a molding plate cylinder.

Then, using the apparatus as shown in FIG. 7, the above-mentioned plate was used as a molding plate cylinder 50, a transparent biaxially stretched polyethylene terephthalate film having a continuous band shape and a thickness of 38 μm was used as the material film 4, and the shaping layer 5 was used. As the ionizing radiation curable resin to be, urethane acrylate prepolymer,
A target antireflection shaping film 10 was produced using a composition containing dipentaerythritol hexaacrylate and a benzophenone photopolymerization initiator. The composition of the ionizing radiation-curable resin was cured by being irradiated with ultraviolet rays while existing between the molding plate cylinder and the material film, and then peeled off from the molding plate cylinder together with the material film. As a result, as shown in the cross section of FIG. 8, a continuous strip anti-reflection shaping film 10 composed of the releasable substrate film 1 in which the shaping layer 5 having the fine irregularities 2A on the surface is laminated on the material film 4. was gotten.

Example 2 Using the antireflection shaping film 10 obtained above, the antireflection processing was performed on the back surface of the window material made of the transparent resin plate at the same time as the molding. The continuous strip-shaped antireflection shaping film 10 has its shaping surface facing the fixed platen side (injection nozzle side), and is unwound one shot at a time from a delivery roll installed above the movable platen of the injection molding machine, It was configured to be wound by a winding roll installed below the movable plate through the injection molds in the mold open state. And
The antireflection shaped film was sandwiched between male and female molds and clamped, and a transparent acrylic resin in a fluidized state by heating and melting was injected into the injection mold. The injection conditions were a resin temperature of 260 ° C., a mold temperature of 95 ° C., an injection pressure of 150 MPa, an injection time of 0.75 s, and a pressure holding time of 2 s. After the resin was cooled and solidified, a molded article was taken out as an antireflection article. The molded product was a transparent plate having a thickness of 1.5 mm, and it became an antireflection article 20 in which desired fine irregularities 2 were formed on one side which was the back side thereof (see FIG. 1 (B)).

[0099] fine irregularities 2 of the antireflective article, by observation of an atomic force microscope, the height H _{MI N} is 200 nm, the period P _MAX is 300 nm, in a square lattice pattern to such a shape many aspect of FIG. 2 The fine irregularities were regularly arranged.

Then, the transmittance and reflectance of the above antireflection article were measured. As a result, the transmittance was 95% and the reflectance was 0.5%. In addition, in the case of a simple transparent plate which is not processed with antireflection processing without providing fine irregularities, the transmittance is 9
The reflectance was 1% and the reflectance was 4%, and the antireflection effect was recognized.
It was also confirmed that the antireflection light did not diffuse, and the transmittance was improved accordingly.

[0101]

(1) According to the antireflection shaping film of the present invention, an antireflection article having an antireflection function is obtained by shaping fine irregularities on the article surface. Moreover, the antireflection function improves the visibility of the display and
The utilization efficiency of the display light can be increased. Also, since it is a film-shaped shaping mold called a shaping film and is significantly cheaper than a mold, it is recommended to use a new shaping mold (film) for each article, or to use "disposable (cut)". Since it is practically possible, even if the shaping surface of the shaping die (film) is scratched, it can be repaired only by exchanging the film, and it is troublesome to replace or modify the block shaped shaping die such as nesting. Unnecessary work. Therefore, even if a molding die is placed in the injection molding die by injection molding and anti-reflection processing is performed on the surface of the article at the same time as the molding of the article, productivity deterioration due to troublesome mold replacement due to scratches on the molding die occurs. Without, productivity is improved. In addition, in the form of shaped film, since it can be used in a continuous strip shape, it can be reused easily, so a new shaped film (surface) for each article
Can be easily supplied. Therefore, antireflection processing can be performed at low cost with good productivity (mass productivity).

(2) According to the antireflection processing method of the present invention, an antireflection article having an antireflection function provided on the surface of an article made of resin can be easily obtained. Moreover, the antireflection function improves the visibility of the display and improves the utilization efficiency of the display light. In addition, since a film-shaped mold called an antireflection shaped film is used as the shaping mold, the antireflection processing is performed with good productivity (mass productivity) and at low cost, as described in the action and effect of the antireflection shaped film. it can. Incidentally, in order to bring the resin in a fluid state into contact with the shaping surface, for example, an injection molding method, a casting method and the like can be mentioned. Further, the productivity is good and the cost is low in that the shape development (molding) of the antireflection article by the solidification of the resin in the fluidized state and the antireflection processing are simultaneously completed in one step.

[Brief description of drawings]

FIG. 1 is a sectional view showing an embodiment of an antireflection shaping film of the present invention.

FIG. 2 is a diagram (1) for conceptually explaining the distribution of the effective refractive index obtained by the shaped fine irregularities 2.

FIG. 3 is a diagram (part 2) for conceptually explaining the distribution of the effective refractive index obtained by the shaped fine irregularities 2.

FIG. 4 is a diagram (part 3) for conceptually explaining the distribution of the effective refractive index obtained by the shaped fine irregularities 2.

FIG. 5 is a cross-sectional view illustrating some (vertical) cross-sectional shapes of the shaped fine irregularities 2;

FIG. 6 is a cross-sectional view illustrating some arrangements of the shaped fine irregularities 2 in a horizontal plane.

FIG. 7 is an explanatory view conceptually showing a method for producing the fine irregularities 2A by the molding plate cylinder method.

FIG. 8 is a cross-sectional view illustrating another embodiment (multilayer structure) of the antireflection shaping film of the present invention.

FIG. 9 is an explanatory view conceptually showing the antireflection processing method of the present invention.

[Explanation of symbols]

1 Releasable substrate film 2A Fine irregularities 2 (on the shaping film before shaping) Fine irregularities 2t (on the substrate after shaping) The most convex portions 3 (of the fine irregularities 2) Substrate 4 Material film 5 shaping layer 10 antireflection shaping film 20 antireflection article 30 resin 40 uneven shape 50 molding plate cylinder 60 shaft core 70 liquid composition 80 ionizing radiation irradiation device 81 ionizing radiation 90 pressure bonding roller 100 peeling roller 200 coating liquid supply device E Fukatachimen n the refractive index n _a refractive index (air) n _b refractive index (substrate) n ₀ the refractive index n ₁ the refractive index n _ef (Z) effective refractive index H _MIN (minute irregularities 2) minimum height P _MAX Period R Reflectance λ _MIN Minimum wavelength λ _MAX Maximum wavelength

Front page continuation (51) Int.Cl. ⁷ Identification code FI theme code (reference) // B29L 7:00 G02B 1/10 A F term (reference) 2H042 BA04 BA05 BA15 BA20 2H091 FA31X FA37X FC14 FC17 LA12 2K009 AA12 BB24 DD15 4F205 AG05 AH73 AP11 GA01 GC02 GD02 GE27 GN01 GN04 GN29 4F209 AG01 AG05 PA08 PB02 PC05 PN20

Claims (2)

[Claims] 1. An antireflection shaping film comprising a release-molding base material film, on the shaping surface of which fine irregularities for antireflection are formed, wherein the fine irregularities are in a vacuum in a wavelength band of visible light. the at minimum wavelength lambda _MIN in the in period on the outermost recess of the fine unevenness P _MAX
And P _MAX ≤ λ _MIN , and the material part of the releasable substrate film in the cross section when it is assumed that the fine unevenness is cut by a plane orthogonal to the uneven direction. The antireflection shaped film, wherein the cross-sectional area occupancy is such a concavo-convex pattern that it gradually and gradually decreases from the most concave part of the fine concavity and convexity to the most convex part. 2. A resin obtained by bringing a resin in a fluid state into contact with the shaping surface of the antireflection shaping film according to claim 1 and then solidifying the resin, and thereafter, solidifying the antireflection shaping film. An antireflection processing method for imparting an antireflection function to the resin surface by peeling from the resin surface.