JP2002263998A - Polisher and method of polishing - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a polisher, whose polishing pad bonded to an elastic base material is hardly peeled off, capable of preventing deficient polishing, and a method of polishing with the polisher. SOLUTION: The polishing pad 3 is bonded to the surface of the elastic base material 2 via a strong adhesive layer 4. A water groove 5 with 0.1-5 mm width is formed on the polishing pad 3, and the polishing pad 3 is comprised of polygonal pads 31. The movable range 6 of a polished object 8 is covered by the polishing pad 3.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a polisher and a polishing method, and more particularly to a polisher and a polishing method suitable for smoothing or mirroring a curved surface of a lens or the like.

[0002]

2. Description of the Related Art Conventionally, as disclosed in Japanese Patent Application Laid-Open No. 47-14776, a method of manufacturing a plastic spectacle lens has been disclosed in Japanese Unexamined Patent Publication No. 47-14776. This is performed by polishing the spectacle lens of. This semi-finished lens is fixed to a holder for polishing using a low melting point alloy generally called an alloy, and the eyeball-side (concave side) surface of the semi-finished lens fixed to the holder is attached to the wearer's eye. After roughing into a spherical or toric surface shape according to the prescription, sanding and mirror polishing similar to lapping are performed to precisely finish the optical surface of the lens.

In sanding and polishing, a hard polishing dish having a curved surface shape made of aluminum, hardened plastic, urethane foam or the like is used. In addition, different types of polishing pads are attached to the surface of a hard polishing plate according to the purpose of processing, and sanding and polishing are performed. Specifically, the purpose of sanding is to smooth the rough-cut surface until a certain surface roughness is reached, and to shaving the shape error generated at the time of rough cutting to match the shape of the hard polishing dish. . The processing has a particle size of 10
A polishing pad for sanding called a fining pad holding abrasive grains of about 20 μm of silicon dioxide, aluminum oxide, silicon carbide or the like on its surface is attached to the surface of the polishing dish, and the polishing is performed while applying water. . Although it depends on the above-mentioned rough cutting state, it is usual that the work is divided into two or more times until a surface roughness of 10 μm or less is finally obtained at Rmax.

[0004] The purpose of the subsequent mirror polishing is to further smooth the sanded surface to a desired optical surface. In the polishing process, a polishing pad made of non-woven fabric is attached to the polishing plate used for sanding or the same shape of the polishing plate, and a slurry in which abrasive grains are dispersed in the processing liquid is supplied. It is done while.

FIG. 4 shows a mirror polishing method using a polishing plate. FIG. 4A is a schematic side view showing a state in which the lens concave surface is polished using the polishing plate, and FIG. 4B is a top view of the polishing plate as viewed from above. As shown in FIG. 4B, a petal-shaped polishing pad 100 is attached to the surface of the dome-shaped polishing plate 110 using an adhesive provided on the back surface thereof. Many polishing pads 100 commercially available for polishing plastic spectacle lenses have a petal shape in which a circular pad is provided with a radial cutout 101 so as to conform to the curved surface shape of a dome-shaped polishing dish 110. As shown in FIG. 5, a commercially available polishing pad 100 is a nonwoven fabric 10.
3 has a structure in which a weakly-adhesive adhesive layer 105 is provided via a primer layer 104 on one surface side. Polishing pad 100 is polished to polishing dish 11 by weakly tacky adhesive layer 105.
Paste to 0. The polishing pad 100 is slightly smaller than the diameter of the polishing plate 110, and the polishing pad 100 is
Almost 10 surfaces are covered. Then, as shown in FIG. 4A, the convex surface of the lens 8 as the object to be polished is fixed to the object-to-be-polished mounting portion 10 via a bonding material 9 such as a low melting point alloy,
The polishing plate 110 is pressed against the concave surface of the lens 8, and the polishing plate 1
Polishing is performed while applying rotation to the lens 10 and applying rotation and swing to the lens 8 via the workpiece mounting portion 10.

However, in recent years, a surface such as an axisymmetric aspherical surface, an aspherical astigmatic surface, a progressive surface, and a surface on which a toric surface and a progressive surface are combined in accordance with the prescription of a wearer has recently been provided on the eyeball-side surface of the spectacle lens. High value-added lenses having shapes are also being produced. These so-called free-form surfaces cannot be continuously rubbed over the entire surface of a rigid polishing plate having a convex surface having the same shape as the concave surface of the lens.

For this reason, the polishing plate 110 shown in FIG. 4 is changed to a curved elastic base material, and an elastic polisher in which the petal-shaped polishing pad 100 shown in FIG. 4 is attached to the elastic base material is used. By pressing the elastic polisher against the concave surface of the lens and rubbing with the slurry interposed,
Mirror finish. Since the elastic base material can be rubbed while deforming following the concave shape,
Polishing of a free-form surface can be performed. Japanese Patent Laid-Open No. 8-2 discloses a method of performing polishing in accordance with such a work shape.
No. 06952 can be exemplified.

When such an elastic polisher is used, as shown in FIG. 6, the size of the elastic substrate 2 is considerably larger than that of the polishing pad 100 having substantially the same diameter as the lens 8. The reason is that the polishing speed of the elastic polisher is lower than that of the hard polishing plate, and therefore, it is necessary to increase the peripheral speed to increase the polishing speed. Therefore, the outer diameter of the polishing pad 100 is considerably smaller than that of the elastic substrate 2, and in order to cover the movement range 6 of the object 8 to be polished, the polishing pad 100
As shown in FIG. 6, the elastic substrate 2 is attached eccentrically from the center.

[0009]

However, a polishing method using an elastic polisher in which a conventionally used polishing pad 100 for polishing a commercially available plastic spectacle lens is adhered to the surface of the elastic substrate 2 is as follows. There is such a problem.

The polishing pad 100 is generally of a so-called disposable type, which is replaced every time one work is processed. In addition, since it is assumed that it is used by sticking it to a hard polishing dish, the adhesive strength is reduced in consideration of workability at the time of peeling. In other words, it is sufficient that the adhesive has enough adhesive strength to withstand at least one polishing process. Accordingly, when this type of polishing pad 100 is attached to the elastic substrate 2, the following problem occurs due to the low adhesive strength.

First, as shown in FIG. 6, when the lens 8 and the elastic substrate 2 are polished while being relatively moved while pressing the elastic substrate 2 with the polishing pressure on the lens 8, the elastic substrate 2 The lens 8 is pressed and deformed at the peripheral edge thereof, and the sharp peripheral edge of the lens 8 easily gets into the notch 101 or the edge of the petal-shaped polishing pad 100. Therefore, the peripheral edge of the lens 8 easily enters between the polishing pad 100 and the elastic base material 2, and the polishing pad 100 is peeled off. Further, the polishing pad 100 is often peeled off due to the low adhesive force because the adhesive pad cannot follow the shape deformation of the elastic substrate 2.

When the polishing pad 100 is peeled off even at a part, the polishing pad at the peeled part folds over, which causes a scratch on the polished surface of the optical component, and in most cases, the desired appearance quality cannot be obtained. Poor polishing results. Therefore, it is difficult to stably perform the polishing process in such a state where the polishing durability is low.

Further, in order to regenerate the polishing pad partially peeled off from the elastic substrate during the polishing process, there is a problem that it is necessary to re-adhere the two with an adhesive.

The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a polisher in which a polishing pad adhered to an elastic base material is hardly peeled off during polishing and does not cause defective polishing.

Another object of the present invention is to provide a polishing method using a polisher which does not easily cause a polishing pad adhered to an elastic substrate to peel off during polishing and does not cause poor polishing.

[0016]

Means for Solving the Problems As a result of intensive studies to achieve the above object, the present inventor has found that a polishing pad is strongly adhesively bonded with or without a primer layer and a weakly adhesive layer. It has been found that by using an agent to adhere to an elastic substrate, it is possible to effectively prevent peeling or the like of the polishing pad due to the lens periphery.

In the conventional petal-shaped polishing pad, the width of the notch is large, and the notch without the polishing pad is
It has been found that since the rigidity is relatively low as compared with the portion where the polishing pad is present, the periphery of the lens easily enters during the polishing process, and the polishing pad comes off. The notch portion is necessary for polishing as a water passage groove having a function of discharging polishing waste, supplying a polishing liquid, and the like. It has been found that by setting the width to 5 mm, it is possible to effectively prevent entry of the periphery of the lens and prevent peeling of the polishing pad.

A polishing pad having a narrow water passage groove can be obtained by arranging a pad so as to fill a wide cutout. Further, by using a polygonal pad, it is possible to make the pad a polishing pad that covers the surface of the elastic base material while reducing the gap (water passage groove) between the curved elastic base material and the pad.

Further, it has been found that it is preferable that a region where the polishing pad is provided on the surface of the elastic base material covers at least a range in which the object to be polished slides when the object to be polished is polished. Accordingly, there is no edge into which the peripheral edge of the lens enters, and the effect of preventing peeling is further enhanced.

When the elastic base material has a curved shape, the followability to a polished surface having a curved shape can be improved. Furthermore, it has been found that by configuring the elastic sheet, it is possible to follow a polished surface having various shapes by controlling the internal pressure.

As a polishing method, a method in which a polishing pad provided on the surface of the elastic substrate is pressed against the surface to be polished can be adopted. It has also been found that by using an elastic sheet as the elastic base material, it is possible to follow objects to be polished having various shapes by controlling the internal pressure.

Accordingly, the first aspect of the present invention provides a polisher characterized in that a polishing pad is adhered to the surface of an elastic substrate via a highly adhesive adhesive layer.

According to a second aspect of the present invention, in the polisher of the first aspect, a primer layer and / or a weakly-adhesive adhesive layer is interposed between the strongly-adhesive adhesive layer and the polishing pad. A polisher is provided.

According to a third aspect of the present invention, in the polisher according to the first or second aspect, the polishing pad has a width of 0.1 to 0.1.
Provided is a polisher characterized by being provided with a 5 mm water passage groove.

According to a fourth aspect of the present invention, in the polisher of the third aspect, the water passage groove is formed between a notch provided in the polishing pad and a pad arranged in the notch. Provide a polisher characterized by having

According to a fifth aspect of the present invention, in the polisher of the third aspect, the polishing pad comprises a plurality of polygonal pads, and the water passage groove is formed between the polygonal pads. Provide a polisher characterized by having

According to a sixth aspect of the present invention, in the polisher according to any one of the first to fifth aspects, the polishing pad covers at least a range in which the object to be polished slides when polishing the object to be polished. A polisher provided on the elastic substrate is provided.

According to a seventh aspect of the present invention, there is provided the polisher according to any one of the first to sixth aspects, wherein the strongly adhesive adhesive is a double-sided adhesive tape.

According to an eighth aspect of the present invention, there is provided the polisher according to any one of the first to seventh aspects, wherein the elastic substrate has a curved shape.

According to a ninth aspect of the present invention, there is provided the polisher according to any one of the first to eighth aspects, wherein the elastic substrate is formed of an elastic sheet.

According to a tenth aspect of the present invention, a polishing pad provided on the surface of the polisher according to any one of the first to ninth aspects is pressed against a surface to be polished of the object to be polished. A polishing method is provided.

According to an eleventh aspect of the present invention, there is provided the polishing method as set forth in the tenth aspect, wherein the polishing is performed while applying tension to the dome-shaped elastic base material constituted by the elastic sheet with a pressure fluid. provide.

[0033]

DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, embodiments of the polisher and the polishing method of the present invention will be described, but the present invention is not limited to the following embodiments.

The object to be polished by the polisher and the polishing method of the present invention is not limited as long as it has a preferably concave surface to be polished which requires smoothing or mirror polishing. For example, in addition to optical lenses represented by camera lenses, telescope lenses, microscope lenses, stepper condenser lenses, spectacle lenses, etc., glass molds for casting and polymerizing plastic lenses, cover glasses for portable devices, etc. Optical components. In the following, a description will be given using a plastic spectacle lens as a representative.

The concave surface of the plastic spectacle lens (the eyeball side,
The inner surface has a shape such as a spherical surface, a rotationally symmetric aspheric surface, a toric surface, a progressive surface, or a curved surface obtained by combining these. On one convex surface, a spherical surface, a rotationally symmetric aspherical surface, a progressive surface, or the like is formed. In most cases, the convex surface is formed by transfer of a mold in a cast polymerization method. The shape of the concave surface is often formed by grinding by numerical control or the like. After the grinding, it is necessary to mirror-polish the desired optical surface.

FIGS. 1A and 1B show the structure of an embodiment of the polisher of the present invention. FIG. 1A is a sectional view, and FIG. 1B is a top view.

The polisher 1 has a structure in which a polishing pad 3 is adhered to an outer surface of an elastic substrate 2 via a highly adhesive adhesive layer 4.

As shown in FIG. 1A, the elastic substrate 2
It has a dome-shaped portion 21 formed of an elastic sheet and formed in a dome shape, and an outwardly projecting ring-shaped flange portion 22 provided integrally with the periphery of the dome-shaped portion 21. Although not shown in FIG. 1, when a commercially available polishing pad is used, the primer layer 104 and / or the weakly-adhesive adhesive layer shown in FIG. 105 intervenes. The polishing pad 3 is formed so as to cover the surface of the elastic base material 2 with a plurality of regular hexagonal pads 31 of the same size brought close to each other. The gap between the pads 31 is the water passage groove 5 where no pad is formed, and the pad 31 is attached so as to have a predetermined width. The water passage groove 5 functions as a passage for supplying abrasive grains and water and discharging polishing waste. Water passage groove 5 of this polishing pad 3
Has a structure in which the water passage groove 5 communicates from the vicinity of the center to the edge. The area where the polishing pad 3 is formed on the elastic substrate 2 covers the movement range area 6 of the object to be polished, which is indicated by dots.

The elastic substrate used in the polisher 1 of the present invention preferably has a curved surface conforming to the shape of the surface to be polished. For example, when polishing the concave surface of the spectacle lens, the spectacle lens is shaped to have a dome-shaped portion 21 as shown in FIG. As shown in FIG. 1A, the dome-shaped portion 21 may be formed by forming an elastic sheet into a dome shape and maintaining the dome shape by the internal pressure of the pressure fluid. Alternatively, an elastic material formed in a dome-shaped block, or a dome-shaped elastic sheet having a hollow portion filled with another elastic material may be used. The thickness of the elastic sheet is 0.1-10m
m, particularly preferably in the range of 0.2 to 5 mm.
It is preferred that the material has a hardness (type A durometer) of 10 to 100 and a Young's modulus of 10 ² to 10 ³ N · cm ⁻² . The material of the elastic sheet or elastic material is natural rubber, nitrile rubber, chloroprene rubber, styrene-butadiene rubber (SBR), acrylonitrile-butadiene rubber (NB
R), rubbers such as silicone rubber and fluorine rubber, thermoplastic resins such as polyethylene and nylon, and thermoplastic resin elastomers such as styrene and urethane.

The diameter of the elastic substrate 2 is desirably 1.1 to 10 times, preferably 1.5 to 5 times the diameter of the lens to be polished. By making the diameter of the elastic substrate larger than that of the object to be polished, the peripheral speed can be increased to improve the polishing speed, and the shape following property of the elastic substrate can be improved.

Examples of the polishing pad 3 include a sheet made of a porous material such as polyurethane, a cloth made of felt or nonwoven fabric, and a sheet made of synthetic resin with short fibers planted. A generally commercially available polishing pad 100 for a hard polishing dish is, as shown in FIG.
Has a structure in which a primer layer 104 and a weakly adhesive layer 105 are further laminated on one surface side. Polisher 1 of the present invention
Then, such a commercially available polishing pad 100 may be used. In this case, a polishing pad made of the nonwoven fabric 103 having only the primer layer 104 or only the weakly adhesive layer 105 may be used. Note that the primer layer 104
May be called a binder layer.

The polishing pad may have any shape as long as it can be attached to the dome-shaped portion 21. For example, as the polisher 1b shown in FIG. 2A, a petal-shaped polishing pad 3b in which a notch 32 is radially provided on a circular pad is used. This petal-shaped polishing pad 3
“b” conforms to the shape of the dome-shaped portion 21, and when attached to the dome-shaped portion 21, the water passage groove 5 having a substantially constant width is radially formed. The area where the polishing pad 3b is formed on the elastic substrate 2 covers the movement range area 6 of the object to be polished, which is indicated by dots. The width of the water passage groove 5 of the petal-shaped polishing pad 3b is relatively wide, and even if the strongly adhesive adhesive layer 4 is used, there is a possibility that the elastic base material 2 may be peeled off at the periphery of the lens when deformed. .

For this reason, the width of the water passage groove 5 provided in the polishing pad 3 adhered on the elastic substrate 2 is 0.1 to 5 m.
m, preferably about 0.2 to 3 mm. By narrowing the width of the water passage groove 5 in this manner, the function of the water passage groove 5 is ensured, and there is no possibility that the water passage groove 5 is peeled off by the peripheral edge of the lens. I can do it. Since the water passage grooves 5 function as the above passages, it is desirable that the water passage grooves 5 communicate with each other from the end to the center of the polishing pad 3.

In order to narrow the water passage groove of the polishing pad adhered on the curved surface, a polishing pad 3c used for the polisher 1c shown in FIG. 2B can be exemplified. The polishing pad 3c has a structure in which an elongated pad 33 is provided so as to fill the cutout 32 in the wide cutout 32 of the petal-type pad 3b shown in FIG. The water passage groove 5 is formed as a gap between the notch 32 provided in the polishing pad 3c and the elongated pad 33 arranged in the notch 32.

A polygonal pad such as a triangle, a quadrangle, a pentagon, a hexagon, or the like is used, and one or a combination of two or more of these polygons is combined and arranged so that their sides are close to each other. By forming the pad on the pad, the water passage groove can be narrowed. The polygonal pad can be manufactured, for example, by cutting and cutting a pad supplied in a roll shape. As shown in FIG. 1B, a plurality of regular hexagonal pads 31 of the same size may be formed so that the sides thereof are brought close to each other and the polishing pad 3 is formed so as to cover the surface of the elastic base material 2. it can. It is also effective to combine a pentagon and a hexagon as in a soccer ball.

It is preferable that the region where the polishing pad 3 is provided on the surface of the elastic substrate 2 covers at least a range 6 in which the object to be polished slides when the object to be polished is polished. For example, the polishing pad 3 is provided on the elastic substrate 2 so that the polished surface of the polished object does not protrude from the polishing pad 3 even when the polished object is swung. Thus, there is no room for the peripheral edge of the lens to turn over the edge of the polishing pad 3, and the effect of preventing peeling is further enhanced.

The highly adhesive adhesive layer 4 used in the polisher 1 of the present invention has, for example, an adhesive strength of JIS Z 0237.
Is 180 g / 25 mm or more, preferably 1200 g / 25 mm or more, and most preferably 1500 g / 25 mm or more.
By using an adhesive having a high adhesive strength, the adhesive force between the polishing pad 3 and the elastic substrate 2 is increased, and the polishing pad 3 is hardly peeled off.

By sticking the pad to the elastic base material 2 using such a highly tacky adhesive layer 4, a petal-shaped polishing pad 100 having a relatively wide notch 101 as shown in FIG. Can be satisfactorily used even if is adhered to a part of the movement range region 6 of the object to be polished.

Since the adhesive used for the conventional hard polishing pad is presumed to be used after pasting it on a hard polishing plate, the adhesive strength is reduced in consideration of workability at the time of peeling and adhesive residue. It is weakly adhesive, similar to a removable type. The adhesive strength has a 180 degree peel strength according to JIS Z 0237 of about 750 to 880 g / 25 mm.

The adhesive layer 4 is preferably a double-sided adhesive tape in consideration of adhesiveness and workability. Examples of the base material of the double-sided adhesive tape include nonwoven fabric, Japanese paper, polyethylene foam, polypropylene film, and polyester film. The type of adhesive is not limited as long as it has the above-mentioned adhesive strength,
For example, a rubber-based adhesive such as a natural rubber-based, SBR-based, or recycled rubber-based adhesive, or an acrylic-based adhesive can be used. Other examples include a thermosetting type epoxy resin adhesive and an instant adhesive.

Next, using the polisher 1 shown in FIG.
FIG. 3 shows a method of polishing a concave surface of an eyeglass lens as an object to be polished.
This will be described with reference to FIG.

The polisher 1 is mounted on a mounting jig 7 and used as a polishing tool. The mounting jig 7 holds the polisher 1, forms the inner surface side of the polisher 1 in a sealed space, and functions as a flow path for introducing a pressure fluid into the polisher 1. Further, it has a function of mounting and fixing it to a polishing device (not shown).

The mounting jig 7 has a mounting jig body 71 and a ring-shaped pressing member 72. The mounting jig body 71
A cylindrical tubular portion 711, and a flange-shaped polisher coaxial with the tubular portion 711 that extends in a direction orthogonal to the axis of the tubular portion 711 provided integrally with the outer periphery of the upper end of the tubular portion 711. And an attachment portion 712. The holding member 72 has a flat lower surface and a ring shape having substantially the same outer circumference as the outer circumference of the polisher mounting portion 712. At the lower end of the cylindrical portion 711,
A tapered mounting portion 713 for mounting and fixing the polishing device is provided to protrude outward.

To fix the polisher 1 to the mounting jig 7,
The flange portion 22 of the polisher 1 is placed on the polisher mounting portion 712, and the holding member 72 is moved to the flange portion 2 of the polisher 1.
After being placed on the polisher 2, the holding member 72 and the polisher mounting portion 712 are fixed with bolts or the like (not shown), and the flange portion 22 of the polisher 1 is fixed to the polisher mounting portion 712 and the pressing member 7.
2 and fix it. As a result, a dome-shaped sealed space 23 is formed between the inner surface of the dome-shaped portion 21 and the upper surface of the polisher mounting portion 712, and the sealed space 23 is
It communicates with the outside through the space 11.

A workpiece mounting portion 10 mounted and fixed to a chuck of a polishing apparatus is bonded to the convex surface of the workpiece 8 via a bonding material 9 such as a low melting point metal or wax. The chuck of the polishing apparatus not shown is driven to rotate,
The object to be polished 8 rotates at a predetermined rotation speed. Further, for example, air pressure is applied to the chuck, and the workpiece 8 is polished to the polisher 1.
Against a predetermined polishing pressure. Further, the chuck of the polishing apparatus that supports the object to be polished 8 performs a swinging motion in which the rotation axis of the object to be polished 8 reciprocates between the vicinity of the apex of the dome-shaped portion 21 and the end side.

At the time of polishing, as shown in FIG. 3, the polisher 1 is mounted on a turntable of a polishing device (not shown) via a mounting jig 7 and a fluid such as water or compressed air of a predetermined pressure is applied to the dome-shaped portion. 21 to the sealed space 23 between the inner surface of the polisher 21 and the polisher mounting portion 712 to maintain the sealed space 23 at a predetermined pressure.
The dome-shaped portion 21 is provided with tension. In addition, the attachment jig 7 is rotated with the central axis of the cylindrical portion 711 as a rotation axis. The elastic polisher 1 is pressed against the elastic polisher 1 at a predetermined polishing pressure while being rotated at a predetermined rotation speed while being rotated at a predetermined rotation speed while giving tension to the elastic polisher 1 at an internal pressure of a predetermined pressure, A swinging motion is given to the object 8 to be polished,
Polishing is performed while a slurry 13 containing an abrasive is supplied to the surface of the elastic polisher 1 from the nozzle 12.

According to such a polishing method, the polishing pad 3 is adhered to the elastic base material 2 via the highly adhesive adhesive layer 4, and the width of the water passage groove 5 provided in the polishing pad 3 is narrow. Moreover, since the polishing pad 3 covers the movement range region 6 of the object 8 to be polished, it is possible to effectively prevent the peripheral edge of the lens 8 from biting between the polishing pad 3 and the elastic substrate 2. Therefore, it is difficult for the polishing pad 3 to peel off from the elastic substrate 2, and it is possible to suppress the occurrence of poor polishing due to the peeling, and to perform polishing with a high yield.

(Examples) As an example, a plastic spectacle lens will be described below. The convex side is optically finished with a molding die and the concave side is cut into a desired curved shape, and then polished using the polisher of the present invention. The case of processing and mirroring will be described.

First, a desired semi-finished lens is formed through a plastic spectacle lens forming step as in the prior art. Next, the formed semi-finished lens is affixed to a block jig (joining material) 9, and then, in a shape creation step, the concave surface of the semi-finished lens is cut into a shape that satisfies a customer's prescription. In this embodiment, the radius of curvature is 1 by cutting.
A semi-finished lens (hereinafter, referred to as a work 8) formed on a spherical surface of 09.09 mm was attached to a polishing device (not shown). The polishing apparatus has a polishing pad made of a nonwoven fabric having a primer layer and a weakly adhesive layer,
A polisher 1 configured to be supported via a highly adhesive adhesive layer 4 is attached to the surface of an elastic base material 2 made of an elastic sheet. The polishing pad is a polishing pad 3c shown in FIG. 2 (b), and the polishing pad 3c is present in the entire area 6 where the workpiece 8 comes into contact with the sliding motion during polishing.

As the polishing pad 3c, a non-woven type polishing pad manufactured by 3M Co., Ltd., trade name: Blue Pad, and as the strong adhesive layer, double-sided adhesive manufactured by Sekisui Chemical Co., Ltd. Tape / Model # 595 (base material is Japanese paper, with acrylic adhesive layer, adhesive strength is 1000g /
25 mm) as the elastic substrate 2.
Hollow shape cut out part of a sphere of 0 mm, thickness 3 mm,
Nitrile rubber having a JIS A hardness (type A durometer) of 60 was used.

As shown in FIG. 3, the shape was controlled by supplying compressed air of 0.6 kgf / cm ² to the inside of the elastic substrate 2. Also, a working fluid 13 in which abrasive grains are dispersed
Was supplied between the workpiece 8 and the polisher 1 by a working fluid supply means (not shown). 1.2μ center particle size as abrasive
m of Al ₂ O ₃ was used.

Under these conditions, the work 8 is set to 10 rpm
The elastic polisher 1 was rotated at 300 rpm and relatively oscillated by a motion mechanism (not shown), and polished for about 8 minutes by applying a polishing pressure of 15 kgf by a pressing means (not shown).

Under the same conditions, ten workpieces 8 were polished, but the peripheral part of the workpiece 8 did not enter between the polishing pad 3c and the elastic polisher 1, that is, the polishing was performed without the polishing pad 2c peeling off. Was completed, and the desired optical surface could be obtained for all 10 optical disks.

[0064]

According to the polisher of the present invention, the polishing pad adhered to the elastic substrate is hardly peeled off during polishing, and the polishing can be performed at a high yield without causing polishing failure due to the peeling of the polishing pad.

According to the polishing method of the present invention, since the polishing pad adhered to the elastic substrate is hardly peeled off during the polishing, the polishing is performed at a high yield without causing polishing failure due to the peeling of the polishing pad. be able to.

[Brief description of the drawings]

FIG. 1 shows an embodiment of the polisher of the present invention.
(A) is a sectional view, and (b) is a top view.

FIG. 2A is a top view showing one embodiment of the polisher of the present invention, and FIG. 2B is a top view showing another embodiment.

FIG. 3 is a cross-sectional view illustrating a method for polishing a concave surface of a lens using one embodiment of the polisher of the present invention.

FIG. 4A is a schematic side view showing a state in which the lens concave surface is polished using a hard polishing plate, and FIG. 4B is a top view of the polishing plate viewed from above.

FIG. 5 is a sectional view showing the structure of a commercially available polishing pad.

FIG. 6 is a top view showing a state in which a commercially available polishing pad is attached to an elastic substrate.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1, 1b, 1c Polisher 2 Elastic base material 21 Domed part 22 Flange part 3, 3b, 3c Polishing pad 31 Pad 4 Strong adhesive 5 Water passage groove 6 Area to be polished object movement range 7 Polisher mounting jig 8 Polished object (lens) 9 Bonding material 10 Polished object mounting part

Claims (11)

[Claims] 1. A polisher characterized in that a polishing pad is adhered to a surface of an elastic substrate via a strongly tacky adhesive layer. 2. The polisher according to claim 1, wherein a primer layer and / or a weakly-adhesive adhesive layer is interposed between the strongly-adhesive adhesive layer and the polishing pad. 3. The polisher according to claim 1, wherein said polishing pad is provided with a water passage groove having a width of 0.1 to 5 mm. 4. The polisher according to claim 3, wherein the water passage groove is formed between a notch provided in the polishing pad and a pad arranged in the notch. Polisher. 5. The polisher according to claim 3, wherein the polishing pad is composed of a plurality of polygonal pads, and the water passage groove is formed between the polygonal pads. Polisher. 6. The polisher according to claim 1, wherein the polishing pad covers at least a range in which the object to be polished slides when the object to be polished is polished. A polisher characterized by being provided. 7. The polisher according to claim 1, wherein the highly adhesive adhesive is a double-sided adhesive tape. 8. The polisher according to claim 1, wherein the elastic substrate has a curved shape. 9. The polisher according to claim 1, wherein the elastic substrate is formed of an elastic sheet. 10. A polishing method, wherein a polishing pad provided on the surface of the polisher according to claim 1 is pressed against a surface to be polished of the object to be polished. 11. The polishing method according to claim 10, wherein the polishing is performed while applying tension to the dome-shaped elastic base material made of the elastic sheet with a pressure fluid.