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JP2002142585A - Method for cultivating plant - Google Patents

Method for cultivating plant

Info

Publication number
JP2002142585A
JP2002142585A JP2000344615A JP2000344615A JP2002142585A JP 2002142585 A JP2002142585 A JP 2002142585A JP 2000344615 A JP2000344615 A JP 2000344615A JP 2000344615 A JP2000344615 A JP 2000344615A JP 2002142585 A JP2002142585 A JP 2002142585A
Authority
JP
Japan
Prior art keywords
plant
panels
plants
panel
klx
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000344615A
Other languages
Japanese (ja)
Inventor
Shigeru Sato
滋 佐藤
Tomomi Kazama
智美 風間
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kewpie Corp
Original Assignee
QP Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by QP Corp filed Critical QP Corp
Priority to JP2000344615A priority Critical patent/JP2002142585A/en
Publication of JP2002142585A publication Critical patent/JP2002142585A/en
Pending legal-status Critical Current

Links

Classifications

    • Y02P60/216

Landscapes

  • Cultivation Of Plants (AREA)
  • Hydroponics (AREA)
  • Cultivation Receptacles Or Flower-Pots, Or Pots For Seedlings (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a method for cultivating plants by which the occurrence of tip burn is eliminated and vegetables can be raised as those having excellent quality without lowering the growth rate of the vegetables when hydroponics of the leaf vegetables are carried out in a hermetically closed room. SOLUTION: Plural chevron-shaped panels 3 prepared by joining the tops of two panels 3 and 3 and having many holes for protruding roots of the plants 2 to the lower parts of the panels 3 and 3 and supporting the plants 2 are installed side by side in the hermetically closed room 1 provided with an air conditioning means capable of regulating temperature and humidity to prescribed values and illuminators 6 for irradiating the plants 2 with light at 15-30 klx illuminance and a culture solution, etc. are fed from the lower part of the chevron-shaped panels 3 to the roots of the plants 2 supported with the chevron- shaped panels 3. Air is made to flow in the longitudinal direction of spaces among the mutual adjacent chevron-shaped panels 3 at 0.8-1.4 m/s velocity.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、植物栽培方法に係
り、詳しくは環境を制御した密閉室内でサラダ菜やリー
フレタス、春菊等の葉物野菜を育成栽培するに際して、
野菜の葉先が黒ずみ栄養成分が抜け落ちるチップバーン
(縁腐れ)現象の発生を抑止して水耕栽培できる植物栽
培方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a plant cultivation method, and more particularly, to growing and cultivating leafy vegetables such as salad vegetables, leaf lettuce and spring chrysanthemum in a closed room where the environment is controlled.
The present invention relates to a plant cultivation method capable of hydroponics by suppressing the occurrence of a chip burn phenomenon in which a vegetable tip darkens and nutrient components fall off.

【0002】[0002]

【従来の技術】従来技術にかかる水耕栽培装置として
は、例えば、特公平5−65129号公報に開示されて
いるものがある。これは、図3に示すように、栽培室1
内に植物2の根をパネルの下方へ突出させて該植物2を
支持する多数の孔を有する山形パネル3を複数列配設
し、栽培室1の側壁1aに設けた吸気孔10から外気を
取り入れ栽培室1内を循環させるとともに植物に照明器
具から光を照射し、その根に養液を噴霧して植物を育成
するものである。
2. Description of the Related Art An example of a hydroponic cultivation apparatus according to the prior art is disclosed in Japanese Patent Publication No. 5-65129. This is, as shown in FIG.
The roots of the plant 2 protrude below the panel, and a plurality of rows of mountain-shaped panels 3 having a large number of holes for supporting the plant 2 are arranged therein. It circulates through the intake cultivation room 1 and irradiates the plants with light from a lighting device, and sprays a nutrient solution on the roots to grow the plants.

【0003】[0003]

【発明が解決しようとする課題】上述したような従来の
水耕栽培方法においては、外気を利用したり、一定条件
の空気を供給して葉物野菜を高度集約的に生産し、その
成長速度を速める結果、植物の生理障害(カルシウム欠
乏症)の一つであるチップバーン(縁腐れ)現象が生じ
やすく、またその他の品質も安定しないという問題があ
る。そこでこの問題発生を回避するために、成長速度を
下げることで植物組織内のカルシウム不足を解消し、チ
ップバーン発生時期を遅らせることも可能であるが、こ
の方法では環境を制御した密閉室内で葉物野菜を短期間
で栽培するというせっかくの長所を生かすことができな
い。
In the conventional hydroponic cultivation method as described above, leaf vegetables are highly intensively produced by utilizing the outside air or by supplying air under certain conditions, and the growth rate thereof is increased. As a result, there is a problem that a chip burn (edge rot) phenomenon, which is one of the physiological disorders (calcium deficiency) of plants, tends to occur, and other qualities are not stable. Therefore, in order to avoid this problem, it is possible to eliminate the calcium deficiency in the plant tissue by lowering the growth rate and delay the chip burn time.However, in this method, the leaves are grown in a closed room where the environment is controlled. It is not possible to take advantage of the great advantage of growing vegetable vegetables in a short period of time.

【0004】本発明は、このような事情に鑑み植物生育
環境要因としての空気の温度、湿度、炭酸ガスの供給量
及び光の1日あたりの照射量を総合的に制御して、成長
速度を速めた状態を保ちつつチップバーンの発生を抑止
して、かつ品質上も優れた野菜を水耕栽培できる植物栽
培方法を提供することを目的とする。
In view of such circumstances, the present invention comprehensively controls the temperature, humidity, supply amount of carbon dioxide gas, and irradiation amount of light per day as plant growth environment factors to control the growth rate. An object of the present invention is to provide a plant cultivation method capable of suppressing the occurrence of chip burn while maintaining a quick state, and hydroponically cultivating vegetables having excellent quality.

【0005】[0005]

【課題を解決するための手段】すなわち、前記目的を達
成する本発明の植物栽培方法の構成は、温度と湿度を所
定値に調整する空調手段と、植物に照度15klx〜3
0klxの光を照射する照明器具とを備えた密閉室内
に、植物の根を下方に突出させて該植物を支持する多数
の孔を有するパネルを設置し、該パネルの下方よりパネ
ルに支持した植物の根へ養液等を供給するとともに、該
密閉室内の空気を0.8m〜1.4m/秒の速度で流動
せしめることを特徴とする。また、温度と湿度を所定値
に調整する空調手段と、植物に照度15klx〜30k
lxの光を照射する照明器具とを備えた密閉室内に、2
枚のパネルの上端部を合わせてなり植物の根をパネルの
下方に突出させて該植物を支持する多数の孔を有する山
形パネルを複数列並設し、該山形パネルの下方よりパネ
ルに支持した植物の根へ養液等を供給するとともに前記
山形パネルの隣接するもの同士の空間の長手方向に沿っ
て空気を0.8m〜1.4m/秒の速度で流動せしめる
ことを特徴とする。
That is, the plant cultivation method of the present invention which achieves the above object comprises an air conditioner for adjusting the temperature and humidity to predetermined values, and an illuminance of 15 klx to 3 km for the plants.
A panel having a large number of holes for supporting the plant by projecting the roots of the plant downward in a closed room provided with a lighting device for irradiating 0 klx light, and the plant supported by the panel from below the panel The method is characterized in that a nutrient solution or the like is supplied to the roots of the plant and air in the closed chamber is caused to flow at a speed of 0.8 m to 1.4 m / sec. An air conditioner for adjusting the temperature and humidity to predetermined values, and an illuminance of 15 klx to 30 k for the plants.
in a sealed room equipped with a lighting device for irradiating 1x light.
A plurality of rows of angled panels having a large number of holes for supporting the plants were arranged side by side by aligning the upper ends of the panels and projecting the roots of the plants below the panels, and the panels were supported by the panels from below the angled panels. A nutrient solution or the like is supplied to the roots of the plant, and air is caused to flow at a speed of 0.8 m to 1.4 m / sec along the longitudinal direction of the space between adjacent ones of the chevron panels.

【0006】このような構成にすることによって、チッ
プバーンの発生する野菜の株数を全体の5%以下に抑え
ることができるとともに収穫後の野菜の水みずしさを長
時間保持できる品質の優れたものとして育成できる。そ
の際、1日当りの光の照射量を20klxで16時間程
とするとともに温度は20〜25℃、相対湿度70%程
に調整した空気を約1m/秒の速度で流動させると、チ
ップバーンの発生は完全になくなり、また風の影響で葉
同士の擦れ合いにより生じる葉表面の傷も殆どなくすこ
とができる。さらに収穫後も長時間水みずしさを保持で
きるものとなり、品質上も一段と優れた野菜として収穫
できるのでよい。
[0006] By adopting such a structure, the number of vegetable lines which cause chip burn can be suppressed to 5% or less of the whole, and excellent quality which can maintain the freshness of vegetables after harvesting for a long time. Can be bred as At that time, when the irradiation amount of light per day is set at 20 klx for about 16 hours, and the air adjusted to a temperature of 20 to 25 ° C. and a relative humidity of about 70% is caused to flow at a speed of about 1 m / sec, chip burn The occurrence is completely eliminated, and scars on the leaf surface caused by rubbing of the leaves under the influence of wind can be almost eliminated. Furthermore, after harvesting, the freshness can be maintained for a long time, and the vegetables can be harvested as a more excellent vegetable in terms of quality.

【0007】[0007]

【発明の実施の形態】以下、本発明植物栽培方法をこれ
に用いる栽培施設の一実施形態の図面に基づいて説明す
る。図1及び図2は本発明植物栽培方法に係る水耕栽培
施設の一例を示す説明図であり、図3は従来の水耕栽培
施設の説明図である。図1と図2に示すように、栽培室
1内には2枚のパネルの上端部を合わせてなり植物2の
根をパネルの下方へ突出させて植物2を支持する多数の
孔を有する山形パネル3が複数列配列され、その両端は
側壁1aと連結されている。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, an embodiment of a cultivation facility using the plant cultivation method of the present invention will be described with reference to the drawings. 1 and 2 are explanatory diagrams showing an example of a hydroponic cultivation facility according to the plant cultivation method of the present invention, and FIG. 3 is an explanatory diagram of a conventional hydroponic cultivation facility. As shown in FIG. 1 and FIG. 2, in the cultivation room 1, a mountain shape having a large number of holes for supporting the plant 2 by combining the upper ends of two panels and projecting the root of the plant 2 below the panel. The panels 3 are arranged in a plurality of rows, and both ends are connected to the side wall 1a.

【0008】隣接する山形パネル3,3間の中央部天井
には排気ダクト5がそれぞれ取り付けられており、排気
ダクト5の下側に照明器具6が山形パネル3の列方向に
略等間隔に配設されている。ここで、山形パネル3の材
質としては発泡スチロール、ステンレス、強化プラスチ
ック、セラミックスなどを用いればよく、栽培効率及び
照射効率の両面からみて、その傾斜角は水平面に対して
40〜70度、好ましくは60度とするのがよい。
An exhaust duct 5 is attached to the central ceiling between the adjacent chevron panels 3, 3, and lighting fixtures 6 are arranged below the exhaust duct 5 at substantially equal intervals in the row direction of the chevron panels 3. Has been established. Here, the material of the chevron panel 3 may be styrofoam, stainless steel, reinforced plastic, ceramics, or the like, and its inclination angle is 40 to 70 degrees with respect to a horizontal plane, preferably 60, from both the cultivation efficiency and irradiation efficiency. It should be a degree.

【0009】一方、上記照明器具6はナトリウムラン
プ、水銀ランプなどのランプ6aとカバー6bとからな
り、ランプ6aとカバー6bとの間に排気ダクト5に連
通する排気口7が形成されている。ここで、カバー6b
はランプ6aの照射熱の拡散を防止するためのものであ
るので、透明なものを用いてもよい。また、排気ダクト
5は栽培室1外のダクト8に連通しており、ダクト8は
温度、湿度及び炭酸ガス等を制御できる空調設備12を
介して栽培室1の側壁1aに設けられた空気の吹込口1
0に連結してある。このような構造の空調手段により、
常に温度と湿度及び炭酸ガスを調整された空気を栽培室
1に循環できるようにしてある。この際、吹込口10は
図示するように山形パネル3の列毎に複数配設しておく
と、栽培室1内へ調節された空気が均等に配分され、植
付場所による植物生育上のバラツキがなくなるのでよ
い。そして、栽培室1内に吹込口10から供給された空
気は側壁1aに設置された送風ファン4によって所定の
速度で隣接する山形パネル3,3の空間を流動し排気口
7へ送られ繰り返し空調設備12を介して栽培室1内を
循環される。
On the other hand, the luminaire 6 includes a lamp 6a such as a sodium lamp or a mercury lamp and a cover 6b, and an exhaust port 7 communicating with the exhaust duct 5 is formed between the lamp 6a and the cover 6b. Here, the cover 6b
Is for preventing the diffusion of the irradiation heat of the lamp 6a, so that a transparent one may be used. In addition, the exhaust duct 5 communicates with a duct 8 outside the cultivation room 1, and the duct 8 communicates with the air provided on the side wall 1 a of the cultivation room 1 via an air conditioner 12 capable of controlling temperature, humidity, carbon dioxide, and the like. Inlet 1
Connected to 0. With the air conditioning means of such a structure,
The air whose temperature, humidity and carbon dioxide have been adjusted can always be circulated to the cultivation room 1. At this time, if a plurality of blowing ports 10 are provided for each row of the chevron panels 3 as shown in the figure, the regulated air is evenly distributed into the cultivation room 1 and the variation in plant growth depending on the planting place. Is good because it is gone. The air supplied from the air inlet 10 into the cultivation room 1 flows through the space of the adjacent chevron panels 3 and 3 at a predetermined speed by the blower fan 4 installed on the side wall 1a and is sent to the outlet 7 to be repeatedly air-conditioned. It is circulated in the cultivation room 1 via the equipment 12.

【0010】他方、山形パネル3の下方には、植物2の
根へ養液等を供給する養液噴霧機構11が配設されてい
る。この、養液噴霧機構11は外部に設けた図示しない
養液貯蔵タンクや養液圧送用ポンプと塩ビ製パイプで連
結されている。このような養液噴霧機構11としては、
山形パネル3の列方向に亘って配設される固定式のも
の、あるいは列方向に移動しながら養液を噴霧する移動
式のもの等が採用できる。
On the other hand, a nutrient solution spray mechanism 11 for supplying nutrient solution and the like to the roots of the plant 2 is provided below the chevron panel 3. The nutrient solution spray mechanism 11 is connected to a nutrient solution storage tank (not shown) or a nutrient solution pump for pumping by a PVC pipe. As such a nutrient solution spraying mechanism 11,
A fixed type that is arranged in the row direction of the chevron panel 3 or a mobile type that sprays a nutrient solution while moving in the row direction can be adopted.

【0011】次に、本発明のかかる上記栽培施設を用い
て、その照度、温度、湿度等の条件を通常値に定め、栽
培室1内での風速のみを変化させてサラダ菜を栽培した
場合に生ずるチップバーンの発生状態を比較した試験結
果を示す。即ち、栽培条件は照度20klxで16時間
/日とし、温度を密閉室内の植物栽培に普通に用いられ
るものである20〜25℃、相対湿度を約70%、炭酸
ガス濃度を1500ppm程に調節した空気を栽培室1
内に供給する。そして、この栽培室1内に供給された空
気を送風ファン4の羽根の回転数を制御することによ
り、パネル3間の空気の流動速度(風速)を変えて、植
物を栽培し、サラダ菜の生育後のチップバーンの発生と
その他の品質測定項目をチェックしそれぞれ比較した。
これらの結果は、次の表1に示す。
Next, using the above-mentioned cultivation facility of the present invention, conditions such as illuminance, temperature, humidity, etc. are set to normal values, and only the wind speed in the cultivation room 1 is changed to grow salad vegetables. The test result which compared the generation state of the generated chip burn is shown. That is, the cultivation conditions were illuminance of 20 klx, 16 hours / day, the temperature was adjusted to 20 to 25 ° C., which was commonly used for plant cultivation in a closed room, the relative humidity was adjusted to about 70%, and the carbon dioxide concentration was adjusted to about 1500 ppm. Cultivation room 1
Supply within. The air supplied into the cultivation room 1 is controlled by controlling the number of rotations of the blades of the blower fan 4 to change the flow speed (wind speed) of the air between the panels 3 to cultivate plants and grow salad vegetables. The occurrence of later chip burn and other quality measurement items were checked and compared.
The results are shown in Table 1 below.

【0012】[0012]

【表1】 [Table 1]

【0013】表1に示すように、前記栽培条件の下に風
速を1m/秒程に維持してサラダ菜を育成した場合、チ
ップバーンの発生は全くなくなり、加えて葉傷の発生も
なくなり、収穫後の水みずしさを長時間保つことができ
るサラダ菜が得られるという結果を得た。また、この際
風速を1.4m/秒より早くすると、チップバーンの発
生は抑止されるが生育中の葉傷の発生が5%以上に増加
し、商品価値(品質)が失われるので、避けたほうがよ
いことが理解される。また、風速を0.8m/秒以下に
すると、チップバーンの発生が株数全体の5%以上とな
り、商品価値を決める総合評価が下がるので望ましくな
いこと等が理解できる。尚、本発明植物栽培方法におけ
る風速とは、植物の葉(本実施例ではサラダ菜の葉)の
表面から約50mm離れた位置における空気の流動速度
又はその測定値をいう。また、本発明植物栽培方法にお
ける照度は、パネルの表面における測定値である。
[0013] As shown in Table 1, when the salad greens were grown under the above cultivation conditions while maintaining the wind speed at about 1 m / sec, no chip burn occurred, no leaf damage was caused, and no harvest was caused. The result was that a salad vegetable that could keep the freshness of water for a long time was obtained. If the wind speed is higher than 1.4 m / s at this time, the occurrence of chip burn is suppressed, but the occurrence of leaf scars during growth increases to 5% or more, and the commercial value (quality) is lost. It is understood that it is better. Further, when the wind speed is set to 0.8 m / sec or less, the occurrence of chip burn becomes 5% or more of the total number of shares, and the overall evaluation for determining the commercial value is lowered. In addition, the wind speed in the plant cultivation method of the present invention refers to the flow velocity of air at a position about 50 mm away from the surface of a leaf of a plant (leaves of salad in this embodiment) or a measured value thereof. The illuminance in the plant cultivation method of the present invention is a measured value on the surface of the panel.

【0014】[0014]

【発明の効果】以上、実施例とともに具体的に説明した
ように、本発明植物栽培方法によれば、密閉室内での通
常の植物成長速度を緩めることなく、チップバーンの発
生を抑止した野菜を得ることができる。また、その際葉
傷の発生がなく長時間水みずしさを保つことができる品
質良好な成長野菜として収穫できるので、商品価値が高
いものとして市場に供することができる。
As described above in detail with the embodiments, according to the plant cultivation method of the present invention, it is possible to produce vegetables that suppress the occurrence of chip burn without slowing the normal plant growth rate in a closed room. Obtainable. In addition, since it can be harvested as a high-quality growing vegetable that can maintain the freshness for a long time without causing leaf scars at that time, it can be marketed as having high commercial value.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に使用する水耕栽培施設の一実施例を示
す斜視説明図。
FIG. 1 is a perspective explanatory view showing one embodiment of a hydroponic cultivation facility used in the present invention.

【図2】本発明に使用する水耕栽培施設の一実施例の要
部の説明図。
FIG. 2 is an explanatory view of a main part of one embodiment of a hydroponic cultivation facility used in the present invention.

【図3】従来の密閉室内水耕栽培施設の一例を示す説明
図。
FIG. 3 is an explanatory view showing an example of a conventional closed indoor hydroponic cultivation facility.

【符号の説明】[Explanation of symbols]

1 植物栽培室 1a 側壁 2 植物 3 山形パネル 4 送風ファン 5 排気ダクト 6 照明器具 6a ランプ 6b カバー 7 排気口 8 ダクト 9 空気循環用補助ファン 9´ 排気ファン 10 吹込口 10´ 外気の吸気孔 11 養液噴霧機構 12 空調設備 DESCRIPTION OF SYMBOLS 1 Plant cultivation room 1a Side wall 2 Plant 3 Yamagata panel 4 Ventilation fan 5 Exhaust duct 6 Lighting fixture 6a Lamp 6b Cover 7 Exhaust port 8 Duct 9 Auxiliary fan for air circulation 9 'Exhaust fan 10 Inlet 10' External air intake 11 Nutrition Liquid spraying mechanism 12 Air conditioning equipment

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 2B022 AA01 AB11 BA21 BA22 BB02 DA01 DA17 DA19 DA20 2B027 ND01 ND15 UB03 UB10 UB21 UB24 UB26 UB30 2B314 MA09 MA38 MA39 MA40 MA42 NA18 NA31 NC02 NC44 PB20 PB49 PD57 PD58 PD59 PD63 PD66  ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 2B022 AA01 AB11 BA21 BA22 BB02 DA01 DA17 DA19 DA20 2B027 ND01 ND15 UB03 UB10 UB21 UB24 UB26 UB30 2B314 MA09 MA38 MA39 MA40 MA42 NA18 NA31 NC02 NC44 PB20 PB49 PD57 PD66 PD59

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 温度と湿度を所定値に調整する空調手段
と、植物に照度15klx〜30klxの光を照射する
照明器具とを備えた密閉室内に、植物の根を下方に突出
させて該植物を支持する多数の孔を有するパネルを設置
し、該パネルの下方よりパネルに支持した植物の根へ養
液等を供給するとともに、該密閉室内の空気を0.8m
〜1.4m/秒の速度で流動せしめることを特徴とする
植物栽培方法。
1. A method in which a root of a plant is projected downward into a closed room provided with an air conditioner for adjusting temperature and humidity to predetermined values and a lighting fixture for irradiating the plant with light having an illuminance of 15 klx to 30 klx. A panel having a large number of holes for supporting the plant is provided, a nutrient solution and the like are supplied from below the panel to the roots of the plant supported by the panel, and the air in the closed chamber is 0.8 m.
A plant cultivation method characterized by fluidizing at a speed of ~ 1.4 m / sec.
【請求項2】 温度と湿度を所定値に調整する空調手段
と、植物に照度15klx〜30klxの光を照射する
照明器具とを備えた密閉室内に、2枚のパネルの上端部
を合わせてなり植物の根をパネルの下方に突出させて該
植物を支持する多数の孔を有する山形パネルを複数列並
設し、該山形パネルの下方よりパネルに支持した植物の
根へ養液等を供給するとともに前記山形パネルの隣接す
るもの同士の空間の長手方向に沿って空気を0.8m〜
1.4m/秒の速度で流動せしめることを特徴とする植
物栽培方法。
2. The upper ends of two panels are fitted in a closed room provided with an air conditioner for adjusting the temperature and humidity to predetermined values and a lighting device for irradiating plants with light having an illuminance of 15 klx to 30 klx. A plurality of rows of mountain-shaped panels having a large number of holes for supporting the plant by projecting the roots of the plant below the panel are arranged in parallel, and nutrients and the like are supplied from below the mountain-shaped panel to the roots of the plants supported by the panel. Along with the longitudinal direction of the space between adjacent ones of the chevron panels,
A plant cultivation method characterized by flowing at a speed of 1.4 m / sec.
【請求項3】 1日当りの光の照射量を20klxで1
6時間程とするとともに温度20〜25℃、相対湿度7
0%程に調整した空気を1m/秒の速度で流動せしめる
請求項1または2記載の植物栽培方法。
3. The amount of light irradiation per day is 1 at 20 klx.
6 hours, temperature 20-25 ° C, relative humidity 7
3. The plant cultivation method according to claim 1, wherein the air adjusted to about 0% is caused to flow at a speed of 1 m / sec.
JP2000344615A 2000-11-13 2000-11-13 Method for cultivating plant Pending JP2002142585A (en)

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Cited By (7)

* Cited by examiner, † Cited by third party
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JP2010088425A (en) * 2008-09-11 2010-04-22 Japan Greenfarm Co Ltd Plant cultivation system, and plant cultivation plant
JP2010115158A (en) * 2008-11-13 2010-05-27 Univ Of Tsukuba Plant cultivation device, and method for producing objective protein in genetically altered tomato
WO2014162848A1 (en) 2013-04-03 2014-10-09 不二精工株式会社 Air emission device for growing plants
WO2016059752A1 (en) * 2014-10-14 2016-04-21 パナソニックIpマネジメント株式会社 Solution cultivation method for low potassium vegetable, low potassium vegetable and cultivation device
CN106386229A (en) * 2016-09-07 2017-02-15 深圳职业技术学院 Mini-type flowerpot capable of detecting light intensity and preparation method thereof
WO2019148862A1 (en) * 2018-01-30 2019-08-08 京东方科技集团股份有限公司 Plant cultivation device, and plant cultivation method
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JP2000209970A (en) * 1999-01-26 2000-08-02 Shin Meiwa Ind Co Ltd Three-dimensional hydroponics facility

Patent Citations (2)

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Publication number Priority date Publication date Assignee Title
JPH0356354U (en) * 1989-10-09 1991-05-30
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JP2010088425A (en) * 2008-09-11 2010-04-22 Japan Greenfarm Co Ltd Plant cultivation system, and plant cultivation plant
JP2010115158A (en) * 2008-11-13 2010-05-27 Univ Of Tsukuba Plant cultivation device, and method for producing objective protein in genetically altered tomato
WO2014162848A1 (en) 2013-04-03 2014-10-09 不二精工株式会社 Air emission device for growing plants
US9894844B2 (en) 2013-04-03 2018-02-20 Fuji Seiko Co., Ltd. Air emission device for growing plants
WO2016059752A1 (en) * 2014-10-14 2016-04-21 パナソニックIpマネジメント株式会社 Solution cultivation method for low potassium vegetable, low potassium vegetable and cultivation device
JP6011902B2 (en) * 2014-10-14 2016-10-25 パナソニックIpマネジメント株式会社 Hydroponic cultivation method for low potassium vegetables
JP2016214261A (en) * 2014-10-14 2016-12-22 パナソニックIpマネジメント株式会社 Nutrient liquid cultivation method of low potassium vegetable, low potassium vegetable and cultivation device
US10785926B2 (en) 2014-10-14 2020-09-29 Panasonic Intellectual Property Management Co., Ltd. Solution cultivation method for low potassium vegetable, low potassium vegetable and cultivation device
CN106386229A (en) * 2016-09-07 2017-02-15 深圳职业技术学院 Mini-type flowerpot capable of detecting light intensity and preparation method thereof
JP2020513240A (en) * 2016-12-14 2020-05-14 ムアンチャート マンカエーMuanchart,Mankaew Air control and air source equipment for crop cultivation
WO2019148862A1 (en) * 2018-01-30 2019-08-08 京东方科技集团股份有限公司 Plant cultivation device, and plant cultivation method
US11337376B2 (en) 2018-01-30 2022-05-24 Boe Optical Science And Technology Co., Ltd. Plant cultivation device and plant cultivation method

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