JP2002018276A - Atmospheric pressure plasma treatment apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To achieve the miniaturization of the whole of an apparatus, the expansion of adaptability to various materials to be treated, easiness to incorporate a production process in an in-line and the marked enhancement of hydrophilizing treatment velocity and treatment capacity. SOLUTION: A discharge gap 15 comprising a fine gap and a mixed reaction gas ejection passage 16 are formed between a solid strip sheet-like high voltage electrode 1 and a ground electrode 3 arranged in opposed relation thereto through insulating plates 2, 2, and mixed reaction gas is introduced into the discharge gap 15 and the mixed reaction gas ejection passage 16 under the atmospheric pressure or pressure near to the atmospheric pressure, and high-frequency voltage is applied across both electrodes 1, 3 to generate glow discharge plasma to form a gas stream containing chemically active exciting species and this gas stream is blown against and applied to the surface of the material to be treated from a blowoff port 17, and an auxiliary electrode 21 capable of applying a bias voltage is arranged at a place opposed to the blowoff port 17.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an atmospheric pressure plasma processing apparatus, and more particularly, to polyethylene, polypropylene and PTFE (polytetrafluoroethylene).
When applying a paint to a water-repellent resin such as, or when printing with a water-based ink, the surface is modified to be hydrophilic,
When performing surface treatments such as imparting wettability to the plastic surface by oxygen plasma treatment, hydrophilizing hydrophobic surfaces such as glass, ceramics, metals, and semiconductors, and cleaning organic substances attached to the surface. The present invention relates to a plasma processing apparatus used in the present invention.

[0002]

2. Description of the Related Art As a plasma processing apparatus used for surface treatment such as surface modification and organic substance washing as described above, an inert gas such as helium or hydrogen and a reactive gas such as oxygen or a fluorocarbon-based fluorine-containing compound gas are used. Is introduced into and passed through a discharge part formed between the high-voltage electrode and the ground electrode at atmospheric pressure or near atmospheric pressure (weakly decompressed or weakly pressurized), and high-frequency waves are passed through both electrodes. Glow discharge plasma is generated in the discharge part by applying a voltage, and a gas flow containing a chemically active excited species generated by the plasma is blown toward the surface of the object to be processed to perform a predetermined surface treatment. As an atmospheric pressure plasma processing apparatus configured as described above, the present applicant has disclosed, for example, Japanese Patent No. 293485.
No. 2 and Japanese Patent No. 2979308 have already been proposed.

[0003] The plasma processing apparatus proposed by the present applicant is capable of performing surface treatment under atmospheric pressure, and a processing apparatus using a low-pressure glow discharge plasma which has been employed before that, for example, a vacuum chamber. A low-pressure glow discharge plasma is generated by applying a high-frequency voltage to both electrodes by introducing a discharge reaction gas such as oxygen into a discharge portion between a high-voltage electrode and a ground electrode arranged in opposition to each other,
A vacuum system is formed as compared with a plasma processing apparatus that is configured to process the surface of an object to be processed installed and held on a ground electrode with a gas containing a chemically active excited species generated by the plasma. Since the apparatus and equipment for performing the processing are not required, the size and cost of the entire apparatus can be reduced, and the object to be processed does not need to be installed on the electrode. It has advantages that it can be easily adapted, can be applied to surface treatment of various kinds of objects to be processed, and can be easily incorporated into an in-line production process to improve productivity.

[0004]

However, in the atmospheric pressure plasma processing apparatus proposed by the present applicant, a gas flow containing a chemically active excited species generated by a glow discharge plasma generated in a discharge portion is generated. It only blows out toward the surface of the workpiece, and the high-frequency voltage applied to both electrodes has no power loss due to abnormal discharge such as spark or arc discharge, and glow discharge under atmospheric pressure. Since it is necessary to set a value that ensures and stabilizes the generation of plasma, the processing speed and processing performance are naturally limited, and there is room for improvement in this respect.

The present invention has been made in view of the above circumstances, and by adding a simpler configuration to the already proposed apparatus, the overall apparatus can be reduced in size and applied to a wide variety of workpieces. It is an object of the present invention to provide an atmospheric pressure plasma processing apparatus capable of remarkably improving the processing speed and the processing performance while securing the advantages of enhancing the performance and facilitating the incorporation of the production process into the in-line.

[0006]

In order to achieve the above object, an atmospheric pressure plasma processing apparatus according to the present invention comprises a plate-like high voltage electrode and a ground electrode opposed to the high voltage electrode with an insulator interposed therebetween. A discharge gap consisting of minute gaps and a mixed reactant gas ejection part are formed, and a reaction containing an inert gas containing at least helium or hydrogen and an oxygen or fluorocarbon-based fluorine-containing compound gas is provided on the ground electrode side. A supply path for a mixed reaction gas with a reactive gas is formed, and the mixed reaction gas is introduced from the mixed reaction gas supply path toward the discharge gap and the mixed reaction gas ejection section at or near atmospheric pressure. At the same time, a high frequency voltage is applied to both electrodes to generate a glow discharge plasma in a discharge gap, thereby being generated by the discharge plasma. An atmospheric pressure plasma processing apparatus configured to blow and irradiate a gas flow containing a chemically active excited species from an outlet of the mixed reaction gas outlet to the surface of the object to be processed; An auxiliary electrode is arranged at a position facing the air outlet of the above, and a DC or high frequency bias voltage can be applied to the auxiliary electrode.

According to the present invention having the above-described structure, an electrode having a function of supplying a mixed reaction gas and a function of ejecting a gas flow is provided by a simple assembling means in which a plate-like high-voltage electrode and a ground electrode are opposed to each other with an insulator interposed therebetween. It is possible to configure a part, compared to the processing equipment using low-pressure glow discharge plasma, to reduce the size of the entire equipment, expand the applicability to a wide variety of workpieces such as area, thickness, shape, and incorporate the production process inline Easiness can be achieved.

[0008] In addition, an auxiliary electrode disposed at a position opposite to the outlet of the mixed reaction gas outlet for blowing a gas flow containing a chemically active excited species generated by the discharge plasma toward the surface of the workpiece. By applying a DC or high frequency bias voltage to the electrodes, the high frequency voltage applied to both electrodes is set to a relatively low value with no power loss due to abnormal discharge such as spark or arc discharge, while reducing power consumption as much as possible. In addition, it is possible to reliably and stabilize the generation of the glow discharge plasma under the atmospheric pressure, and to increase the activity to achieve a predetermined improvement in the processing speed and processing performance. Therefore, by adjusting the bias voltage while keeping the processing speed constant, it is also possible to appropriately control the processing performance and the processing range (thickness) according to the object to be processed. In the case of a porous film, it is possible to process up to the inner layer by adjusting the bias voltage.

The means for forming the discharge gap and the mixed reactant gas jetting part in the atmospheric pressure plasma processing apparatus operating as described above may be a high-pressure electrode formed in a solid strip plate shape. At one end in the short side direction of
The short sides of a pair of ground electrodes, which are arranged on both sides in the thickness direction of the high-voltage electrode and opposed to each other with an insulator interposed therebetween, are formed on both sides in the thickness direction of the high voltage electrode. 4. A means formed between the one end side in the side direction and the inclined surfaces formed so as to respectively oppose the inclined surfaces on both sides of the approximately isosceles triangular portion of the high voltage electrode, or as described in claim 3. A high-voltage electrode in the form of a plate and a ground electrode having the same shape as the plate and having a large number of gas flow blowing holes are opposed to each other by sandwiching an insulator between the peripheral portions of the two electrodes. Any of the means for forming an image may be used.

In the case where the means according to the second aspect is employed as the means for forming the discharge gap and the mixed reaction gas ejection portion, the gas flows blown from both side outlets of the mixed reaction gas ejection portion are caused to collide with each other. An uninterrupted straight gas flow can be applied uniformly to the entire surface of the object to be processed, and together with the application of the bias voltage, the predetermined surface processing can be performed appropriately uniformly and very efficiently. be able to.

[0011] In particular, in the atmospheric pressure plasma generator adopting the structure of claim 2, as described in claim 4, the whole surface including the inclined surfaces on both sides of the substantially isosceles triangular portion of the strip-shaped high-voltage electrode and a pair thereof. By covering at least one of the entire surface including the inclined surface of the ground electrode with an insulator, power loss due to abnormal discharge such as spark or arc discharge in the discharge gap is sufficiently suppressed, and even when a low high-frequency voltage is applied. Glow discharge plasma can be generated reliably and stably, and while maintaining the long-term durability of the device, especially the electrode,
It is possible to achieve predetermined processing speed and processing performance improvement.

In the case where the means according to the third aspect is employed as a means for forming the discharge gap and the mixed reactant gas jetting portion, the plasma is generated stably over the entire flat and wide discharge gap, and the discharge gap is formed. Blows out a gas stream containing almost homogeneous neutral excited species from a wide range of
By applying and adjusting the bias voltage in that wide range,
Predetermined treatments such as surface modification can be efficiently performed with high quality.

Further, in the atmospheric pressure plasma processing apparatus having the above-mentioned structure, a cooling water circulation passage is formed in each of the high-voltage electrode, the ground electrode and the auxiliary electrode for a long time. It is possible to continuously and efficiently execute a predetermined surface treatment by preventing overheating of each electrode during the surface treatment.

[0014]

Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a side view showing a first embodiment of a plasma processing apparatus according to the present invention, FIG. 2 is a bottom view thereof, FIG. 3 is a vertical sectional front view taken along line AA of FIG. 1, and FIG. 3 is an enlarged view of a main part of FIG.

An atmospheric pressure plasma processing apparatus 20 according to the first embodiment basically includes a high-voltage electrode 1 formed in a solid band shape and a thickness direction of the high-voltage electrode 1 (x-x in FIG. 3).
The high-voltage electrode 1 is disposed on both sides of the high-voltage electrode 1 in the x direction) by sandwiching band-shaped insulating plates 2 and 2 such as a tetrafluoride resin plate.
A pair of front and back strip-shaped ground electrodes 3 and 3 which are electrically isolated from each other and grounded, and a short side direction of the high voltage electrode 1, the ground electrodes 3 and 3 and the insulating plates 2 and 2 (FIG. And FIG.
High-voltage electrode 1 and ground electrode 3 at one end in the z-z direction).
And a cover casing 4 made of aluminum or the like formed in a square U shape so as to surround the whole except for discharge gaps 15 and 15 and mixed reactant gas ejection passages 16 and 16 to be described later formed between the cover casing 4 and the above. Mixed reaction gas ejection passage 16,
The auxiliary electrode 21 is provided at a position facing the air outlet 17 formed downstream of the auxiliary electrode 16 and a DC power supply 22 for applying a DC bias voltage to the auxiliary electrode 21.

The short side direction of the high voltage electrode 1 (z-z in FIG. 3)
Direction), as shown in FIG. 3 and FIG.
The sides 1a, 1a are formed in an approximately isosceles triangular shape having an inclined surface that gradually approaches as they approach the tip, and the tip is formed in an arcuate curved surface 1b. The inclined surfaces 1a, 1a on both sides and the curved end surface 1b of the substantially isosceles triangular portion 1A are covered with an insulator 9 formed by ceramic coating.

On the other hand, as shown in FIG. 5, inside the solids of the pair of grounding electrodes 3 and 3, the direction of the long side of the electrode (yy in FIG. 5)
The inert gas containing helium gas or hydrogen and the reactive gas containing oxygen or a fluorocarbon-based fluorinated compound gas are formed by drilling the entire length of the hole (in the direction) and press-fitting and fixing the plug 5 to both ends of the hole (see FIG. 6). Reaction gas supply passages 6, 6 for supplying a reaction gas mixed with a gas under atmospheric pressure are formed along the long side direction of the electrode, and a solid internal portion above the reaction gas supply passages 6, 6 is formed. In the figure, a hole is formed over the entire length in the long side direction of the electrode, and plugs 7 are inserted into both ends of the hole.
The cooling water circulation passages 8, 8 are formed in parallel with the reaction gas supply passages 6, 6 by press-fitting (see FIG. 6). A cooling water circulation passage 18 is formed in the solid inside of the high voltage electrode 1 in the same manner as the cooling water circulation passage 8 of the ground electrode 3, and an auxiliary electrode 21 is formed.
A cooling water circulation passage 23 is also formed in the inside.

Further, one end 3A of the pair of ground electrodes 3, 3 in the short side direction (z-z direction) is
As shown in FIG. 3, FIG. 4, and FIG. 6, inclined surfaces 3a, 3a are formed in parallel with and opposed to the inclined surfaces 1a, 1a on both sides of the substantially isosceles triangular portion 1A of the high-voltage electrode 1. Of these inclined surfaces 3a, 3a, a cut is provided in a portion excluding the base end and both ends in the long side direction, and the cut inclined surface portions 3a ', 3a' and the high-voltage electrode 1 are roughly cut. Discharge gaps 15, 15 and mixed reaction gas ejection passages 16, 16 are formed between the inclined surfaces 1a, 1a of the isosceles triangular portion 1A, respectively.
A blow-out port 17 is formed on the downstream side of the workpiece 16 toward the surface of the workpiece, and the cut slope portion 3a is formed.
', 3a', the entire area of the inclined surfaces 3a, 3a,
The entire surfaces of both side surfaces 3b, 3b and tip outer surfaces 3c, 3c are also covered with an insulator 9 'formed of ceramic coating similarly to the high voltage electrode 1.

The intersection angle θ between the two inclined surfaces 1a, 1a of the approximately isosceles triangular portion 1A at one end in the short side direction of the high voltage electrode 1 is determined by the discharge gaps 15, 15 on both sides and the ejection passage 1
The gas flows ejected through the nozzles 6 and 16 form the outlet 17.
It is set at an angle at which it collides and merges at a downstream position in the ejection direction (the direction of the arrow w in FIG. 4).

Further, one ends of the ground electrodes 3 and 3 are connected to the reaction gas supply passage 6 at equal intervals in the long side direction of the electrodes, respectively, inside the one ends 3A and 3A in the short side direction. A plurality of mixed reaction gas blowout holes 10..., 10... Having the other ends open to the inclined surface portions 3 a ′, 3 a ′ are formed, and the slopes 1 a of the high-voltage electrode 1 are formed from these blowout holes 10. , 1a and the two-sided discharge gaps 15, formed between the inclined surface portions 3a ', 3a' of the pair of ground electrodes 3, 3,
By introducing and passing the mixed reaction gas through the discharge gaps 15 and the jet passages 16 and 16 and applying a high-frequency voltage to the high-voltage electrode 1, chemically generated gas is generated along with the generation of glow discharge plasma in the discharge gaps 15 and 15. A gas flow containing an active excited species (hereinafter also referred to as a plasma flare) is ejected linearly from the outlet 17 to the surface of the workpiece through the both-side ejection passages 16, 16.

Next, the usage and operation of the atmospheric pressure plasma processing apparatus 20 according to the first embodiment configured as described above will be described. As shown in FIG. 7, an atmospheric pressure plasma processing apparatus 20 is placed above a transfer path intermediate position of a conveyor 14 capable of continuously transferring a resin sheet material 13 such as PTFE, which is an example of an object to be processed, placed in a horizontal position. It is installed and fixed in a transverse state. Then, while the resin sheet material 13 is horizontally conveyed by the conveyor 14, the mixed reaction gas is supplied to the reaction gas supply passages 6, 6 under the atmospheric pressure or a pressure close to the atmospheric pressure (weakly decompressed or weakly pressurized). A high-frequency voltage is applied to the high-voltage electrode 1 while the mixed reaction gas is introduced into the discharge gaps 15 formed between the high-voltage electrode 1 and the ground electrodes 3 and 3 through the plurality of gas blowing holes 10. (10 KHz to 500 MHz) and a DC bias voltage (0 V to -100 V) applied to the auxiliary electrode 21 via the DC power supply 22 at the same time, so that the high frequency voltage is changed to a power loss due to abnormal discharge such as spark or arc discharge. It is possible to reliably and stably generate glow discharge plasma with high reaction activity under atmospheric pressure while setting it at a relatively low value. .

The plasma flare containing chemically active excited species such as ions and radicals generated by the glow discharge plasma having high activity generated as described above is directed to the outlet 17 through the both-side ejection passages 16 and 16. After flowing, the blow-off port 17 is ejected linearly toward the surface of the resin sheet material 13, and the ejected plasma flares collide with each other on the surface of the resin sheet material 13 and are joined without interruption. Since the linear plasma flare is uniformly applied to the entire surface of the resin sheet material 13, the surface of the resin sheet material 13 can be hydrophilized at a high speed.

[0023]

EXPERIMENTAL EXAMPLES The present invention will be described in more detail below based on experimental examples conducted by the present inventors. Using an atmospheric pressure plasma processing apparatus 20 having a configuration as shown in FIGS.
Under the plasma processing conditions shown in Table 1, PET, PP,
NOB which does not apply a bias voltage without an auxiliary electrode as a comparative example on the surface of three kinds of polyimide resin sheet materials
The IAS was subjected to a hydrophilization treatment at a bias applied voltage of 0 V (ground or floating) and a bias applied voltage of −100 V, and the water droplet contact angle (°) after each treatment was measured. Tables 2 to 4 and FIGS. The result shown in FIG. 10 was obtained. In addition, CA-X150 type manufactured by Kyowa Interface Science Co., Ltd. was used for measuring the water droplet contact angle.

[0024]

[Table 1]

[0025]

[Table 2]

[0026]

[Table 3]

[0027]

[Table 4]

In Tables 2 to 4, the measured contact angles are shown in the upper and lower three rows. The uppermost row shows the minimum value, the lowermost row shows the maximum value, and the middle row shows the average value. It is unavoidable that the measured values slightly vary due to slight deviations in the measurement and differences in the measurement operation by the operator.

As is clear from Tables 2 to 4 and FIGS. 8 to 10, even if the target is a resin sheet material of any of PET, PP, and polyimide, the comparative example has the same irradiation time. The contact angle is smaller at a bias applied voltage of 0 V (ground or floating) than in the case of NO BIAS, and the contact angle is smaller at a bias applied voltage of −100 V than at a bias applied voltage of 0 V. It was confirmed that the processing speed and hydrophilic performance could be improved. From this, when the processing speed is constant, the processing performance and the processing range (thickness) can be appropriately controlled by adjusting the bias application voltage according to the type of the processing object. It was also found that when the object to be treated is a nonwoven fabric or a porous film, it is possible to treat the inner layer by adjusting the bias voltage.

FIGS. 11 to 13 are a vertical sectional front view and a half-cross sectional bottom view showing an atmospheric pressure plasma processing apparatus according to a second embodiment of the present invention. The atmospheric pressure plasma processing apparatus 30 according to the second embodiment is shown in FIGS. Is a high-voltage electrode 1 formed in a circular flat plate shape, and a circular flat plate shape having the same shape as the high-pressure electrode 1 and a large number of gas flow blowout holes 24 (the blowout holes 17 in the first embodiment).
13) and a thin disk-shaped insulator 25 and an annular insulating ring 26 as shown in FIG.
, A discharge gap 15 consisting of a minute gap and a mixed reaction gas ejection passage 16 are formed between the electrodes 1 and 3, and the outer periphery of the high-voltage electrode 1 and the outer periphery of the annular insulating ring member 26 are formed. The entirety of the cylindrical insulator 27 and the annular insulator 28 that is in contact with the back side of the high-voltage electrode 1 is covered with an aluminum cover casing 29 (corresponding to the cover casing 4 of the first embodiment). A circular auxiliary electrode 21 to which a bias voltage can be applied by a DC voltage 22 is disposed at a position facing a number of gas flow outlets 24.

In the atmospheric pressure plasma processing apparatus 30 of the second embodiment, one end is opened on the surface on the side different from the side where the discharge gap 15 is formed, and the other end is formed on the annular insulating ring body 26. A reaction gas supply passage 32 (corresponding to the reaction gas supply passage 6 in the first embodiment) that is opened and connected to the mixed reaction gas ejection passage 16 via the annular groove 31 is formed inside the solid inside of the high-pressure electrode 1. At the same time, a water cooling jacket 33 having a cooling water circulation passage is incorporated in a solid portion other than the reaction gas supply passage 32.

On the other hand, as illustrated in FIGS. 14 and 15, cooling water flows into the auxiliary electrode 21 from the outer peripheral side toward the inner peripheral side through a partition wall 34 so as to draw a semicircular arc. After that, a cooling water circulation passage 35 (corresponding to the passage 23 of the first embodiment) is formed to flow and discharge in a semicircular arc from the inner peripheral side to the outer peripheral side.

As shown in FIG. 12, electrodes are provided at a plurality of locations on the annular insulating ring body 26 at equal intervals in the circumferential direction, from the annular groove 31 toward the mixed reaction gas ejection passage 16. 30 to 6 in the radial direction passing through the center of 1, 3
Plural slit-shaped gas supply holes 3 having an inclination angle θ of 0 °
4 are formed, and the mixed reactant gas is ejected from the plurality of slit-shaped gas supply holes 34 into the mixed reactant gas outlet passage 16 so as to be formed in the discharge gap 15 and the mixed reactant gas outlet passage 16 as shown by an arrow b. The swirling flow is formed.

In the atmospheric pressure plasma processing apparatus 30 according to the second embodiment, the mixed reactant gas supplied to the reactant gas supply passage 32 passes through the plurality of slit-shaped gas supply holes 34 and the discharge gap 15 and the mixed reactant gas ejection passage 16.
As a result, a swirling flow as shown by an arrow b is formed, and the residence time of the swirling flow is long, so that substantially the same gas distribution and pressure distribution can be obtained over the entire discharge gap 15. Under such conditions, a high-frequency voltage is applied to the high-voltage electrode 1 and a DC power supply 22
By applying a DC bias voltage (0V to -100V) through the, the high-frequency voltage is set to a relatively low value without power loss due to abnormal discharge such as spark or arc discharge, and the discharge gap 15 It is possible to reliably and stably generate a glow discharge plasma that is uniform and has high reaction activity over the entire region, and includes ions, electrons, and chemically active neutral excited species that are excited and decomposed by the glow discharge plasma. The reactive gas flow is supplied to a number of outlets 2
By irradiating the surface of the resin sheet 13 from 4, it is possible to perform the hydrophilic treatment on the surface of the resin sheet 13 at a high speed, as in the first embodiment.

In the atmospheric pressure plasma processing apparatus 30 according to the second embodiment, the plurality of slit-shaped gas supply holes 34 are inclined at an angle of 30 to 60 ° with respect to the radial direction passing through the centers of the electrodes 1 and 3. Is formed so as to have an angle θ, whereby a swirling flow is formed in the mixed reaction gas ejected into the mixed reaction gas ejection passage 16, so that the residence time is ensured long and almost all over the discharge gap 15. Although the same gas distribution and pressure distribution are obtained, a plurality of slit-shaped gas supply holes 34 may be formed radially toward the centers of the electrodes 1 and 3.

In each of the above embodiments, the auxiliary electrode 21
Although a DC voltage is used as a bias voltage to be applied to the power supply, an AC or a high-frequency voltage may be applied.

[0037]

As described above, according to the present invention, the function of supplying the mixed reaction gas and the function of jetting out the gas flow can be achieved by a simple assembling means in which the plate-shaped high-voltage electrode and the ground electrode are arranged to face each other with the insulator interposed therebetween. It is possible to configure the electrode part with the, and compared with the processing equipment using low-pressure glow discharge plasma, the whole equipment is remarkably smaller and lighter and the cost is lower, and it is applicable to a wide variety of workpieces such as area, thickness, and shape. It is possible to enhance the performance and facilitate the incorporation of the production process into the in-line.

In addition, an auxiliary electrode disposed at a position opposite to the outlet of the mixed reaction gas outlet for blowing a gas flow containing a chemically active excited species generated by the discharge plasma toward the surface of the workpiece. By applying a DC or high-frequency bias voltage to the high-voltage electrode and the ground electrode for plasma generation, the high-frequency voltage applied to the high-voltage electrode and the ground electrode is set to a relatively low value that does not cause power loss due to abnormal discharge such as spark or arc discharge. While reducing power consumption as much as possible, it is possible to reliably and stabilize the generation of glow discharge plasma under atmospheric pressure, and to increase the reaction activity to achieve a predetermined processing speed and an improvement in processing performance. . Therefore, when the processing speed is constant, the processing performance and the processing range (thickness) can be appropriately controlled in accordance with the processing target by adjusting the bias voltage. In the case of a nonwoven fabric or a porous film, there is an effect that the inner layer can be treated by adjusting the bias voltage.

In addition to the above-mentioned effects, by adopting the configuration as set forth in claim 2, in addition to the above-mentioned effects, the gas flows blown from the both-side outlets of the mixed-reaction-gas blowing section collide with each other to form a continuous straight line. Can be applied uniformly over the entire surface of the object to be processed, and in combination with the application of the bias voltage, the predetermined surface treatment can be performed appropriately uniformly and very efficiently. By adopting the configuration of the fourth aspect, it is possible to achieve a predetermined improvement in processing speed and processing performance while maintaining long-term durability of the electrode.

[Brief description of the drawings]

FIG. 1 is a side view of an atmospheric pressure plasma processing apparatus according to a first embodiment of the present invention.

FIG. 2 is a bottom view of FIG.

FIG. 3 is a vertical sectional front view taken along line AA of FIG. 1;

FIG. 4 is an enlarged view of a main part of FIG. 3;

FIG. 5 is a longitudinal sectional side view taken along line BB of FIG. 2;

FIG. 6 is an enlarged perspective view of a main part of a ground electrode in the atmospheric pressure plasma processing apparatus according to the first embodiment.

FIG. 7 is a schematic perspective view showing a usage mode of the atmospheric pressure plasma processing apparatus.

FIG. 8 is a graph showing a result (a relationship between irradiation time and contact angle) when PET is used as an object to be processed in an experimental example using the atmospheric pressure plasma processing apparatus according to the first embodiment.

FIG. 9 is a graph showing the results (relationship between irradiation time and contact angle) when PP is used as an object to be processed in the experimental example.

FIG. 10 is a graph showing the results (relationship between irradiation time and contact angle) in the case of using polyimide as an object to be processed in the experimental example.

FIG. 11 is a vertical sectional front view of an atmospheric pressure plasma processing apparatus according to a second embodiment of the present invention.

FIG. 12 is a half-cross sectional bottom view of FIG. 11;

FIG. 13 is an enlarged longitudinal sectional front view of a main part of FIG. 11;

FIG. 14 is an enlarged plan view illustrating an example of an auxiliary electrode in an atmospheric pressure plasma processing apparatus according to a second embodiment.

FIG. 15 is a vertical sectional front view taken along line CC of FIG. 14;

[Explanation of symbols]

 REFERENCE SIGNS LIST 1 high voltage electrode 1A approximately isosceles triangular portion 1a inclined surface 2 insulating plate 3 ground electrode 3a inclined surface 6,32 reaction gas supply passage 8,18,23,35 cooling water circulation passage 9,9 'insulator 13 resin sheet material 15 Discharge gap 16 Mixed reaction gas ejection passage 17 Outlet 21 Auxiliary electrode 22 DC power supply 24 Gas flow outlet (corresponding to outlet)

──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. ⁷ Identification symbol FI Theme coat ゛ (Reference) H05H 1/24 H05H 1/24 // C08L 101: 00 C08L 101: 00 (72) Inventor Yasuya Ishikura Osaka 3-8-13 Minamikagaya, Suminoe-ku, Osaka F-term in Pearl Industries Co., Ltd. 3B116 AA02 AA46 AB14 BB24 BB88 4F073 AA01 BA06 BA07 BA08 BA16 CA01 CA07 4G075 AA24 BA05 BA10 BC10 CA03 CA15 CA25 CA47 CA62 CA63 DA02 EB31EB EC21 ED11 FA20 FC15

Claims (5)

[Claims] A discharge gap comprising a minute gap and a mixed reaction gas ejection portion are formed between a plate-shaped high-voltage electrode and a ground electrode opposed to the high-voltage electrode with an insulator interposed therebetween. A supply passage for a mixed reaction gas of an inert gas containing at least helium or hydrogen and a reactive gas containing oxygen or a fluorocarbon-based fluorine-containing compound gas is formed on the electrode side. By introducing the mixed reaction gas under the atmospheric pressure or near the atmospheric pressure toward the discharge gap and the mixed reaction gas ejection portion, and applying a high frequency voltage to both electrodes to generate a glow discharge plasma in the discharge gap, The gas flow containing the chemically active excited species generated by the discharge plasma is passed through the outlet of the mixed reactant gas outlet to discharge the target object. In an atmospheric pressure plasma processing apparatus configured to blow and irradiate a surface, an auxiliary electrode is disposed at a position facing the outlet of the mixed reaction gas outlet, and a DC or high frequency bias voltage is applied to the auxiliary electrode. An atmospheric pressure plasma processing apparatus characterized in that it can be configured. 2. The discharge gap and the mixed reactant gas ejection portion are formed at one end in the short side direction of a high-voltage electrode formed in a solid band plate shape so as to gradually approach the tip portion. The two inclined surfaces of the substantially isosceles triangular portion and the two ends of the high voltage electrode at one end in the short side direction of a pair of ground electrodes opposed to each other with an insulator on both sides in the thickness direction of the high voltage electrode. The atmospheric pressure plasma processing apparatus according to claim 1, wherein the atmospheric pressure plasma processing apparatus is formed between inclined surfaces formed opposite to the inclined surfaces on both sides of the equilateral triangular portion. 3. The discharge gap and the mixed reactant gas ejection part are formed by a flat plate-shaped high-voltage electrode and a grounded electrode having the same shape as the plate-shaped electrode and having a large number of gas flow blowing holes on the entire surface thereof. 2. The atmospheric pressure plasma processing apparatus according to claim 1, wherein the apparatus is disposed between both electrodes by being opposed to each other with an insulator interposed therebetween. 4. An insulator covering at least one of the entire surface including the inclined surfaces on both sides of the substantially isosceles triangular portion of the strip-shaped high voltage electrode and the entire surface including the inclined surfaces of the pair of ground electrodes. Item 3. An atmospheric pressure plasma processing apparatus according to item 2. 5. The atmospheric pressure plasma processing apparatus according to claim 1, wherein a cooling water circulation passage is formed inside each of the high voltage electrode, the ground electrode, and the auxiliary electrode.