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JP2002045753A - Application device - Google Patents

Application device

Info

Publication number
JP2002045753A
JP2002045753A JP2000231494A JP2000231494A JP2002045753A JP 2002045753 A JP2002045753 A JP 2002045753A JP 2000231494 A JP2000231494 A JP 2000231494A JP 2000231494 A JP2000231494 A JP 2000231494A JP 2002045753 A JP2002045753 A JP 2002045753A
Authority
JP
Japan
Prior art keywords
coating liquid
coating
tank
filter
circulation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000231494A
Other languages
Japanese (ja)
Inventor
Masashi Henmi
正史 逸見
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Document Solutions Inc
Original Assignee
Kyocera Mita Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Mita Corp filed Critical Kyocera Mita Corp
Priority to JP2000231494A priority Critical patent/JP2002045753A/en
Publication of JP2002045753A publication Critical patent/JP2002045753A/en
Pending legal-status Critical Current

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  • Coating Apparatus (AREA)
  • Photoreceptors In Electrophotography (AREA)

Abstract

PROBLEM TO BE SOLVED: To reduce the generation of bubbles in a coating liquid when the overflowing coating liquid is recovered or the coating liquid is supplied and minimize the migration of the generated bubbles into a post-process and thus enable a thin coating film which has no irregularities in the film formation with sufficient film thickness uniformity and homogeneity and is in the submicron order, to be applied to the outer surface of a cylindrical base, in an immersion application method. SOLUTION: In the application device which applies the coating liquid to the outer surface of the cylindrical base by immersing the cylindrical base in the coating liquid in such a state that the cylindrical shaft of the base is retained almost vertically and pulling the cylindrical base out of the coating liquid, a coating liquid circulation mechanism which comprises a coating tank in which the coating liquid is stored and the cylindrical base is immersed, a circulation tank which circulates the coating liquid into the coating tank and feeds the coating liquid into the lower part of the coating tank from the lower part of the circulation tank by means of a pressure feed pump and makes the coating liquid overflow from the upper edge part of the coating tank to send the coating liquid into the circulation tank is provided. In addition, a filter is arranged, facing the upstream side of the coating liquid flow, in piping which guides the overflowing coating liquid to the circulation tank. Besides, the filter is arranged in such a way that it blocks the upper part of the inside diameter of the piping.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は浸漬塗布法によりドラム
外周面に感光性物質を塗布して電子写真感光体ドラムを
製造する装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus for producing an electrophotographic photosensitive drum by applying a photosensitive substance to a drum outer peripheral surface by a dip coating method.

【0002】[0002]

【従来の技術】電子写真感光体ドラムは通常アルミニウ
ムなどからなる円筒状基体の外周面に有機感光材料を含
む塗布液を塗布して感光層を形成する。塗布方法として
は浸漬塗布法、スプレー塗布法、リングコート法などが
あるが、比較的均一な膜圧と塗膜を得ることができ、し
かも生産性の高い浸漬塗布法が一般に採用されている。
一般的な浸漬塗布法は塗布液の収容されている塗工タン
クに円筒状基体を浸漬させ、再び引き上げてその外周面
に塗布液を塗布するするものであるが、浸漬する際塗工
タンクの上縁部からオーバーフローする塗布液を回収し
循環タンクを経て再度塗工タンクに戻す循環式である。
2. Description of the Related Art In an electrophotographic photosensitive drum, a photosensitive layer is formed by applying a coating solution containing an organic photosensitive material to an outer peripheral surface of a cylindrical substrate usually made of aluminum or the like. As a coating method, there are a dip coating method, a spray coating method, a ring coating method and the like, and a dip coating method capable of obtaining a relatively uniform film pressure and a coating film and having high productivity is generally adopted.
In a general dip coating method, a cylindrical substrate is immersed in a coating tank containing a coating liquid, and then pulled up again to apply the coating liquid to its outer peripheral surface. This is a circulation type in which the coating liquid overflowing from the upper edge is collected and returned to the coating tank via the circulation tank.

【0003】従来の循環式浸漬塗布法の装置について簡
単に説明する。図2は、浸漬塗布法の従来の塗布装置の
一例を示す概念図である。図2において、1は塗布液3
が収容されており円筒状基体10が浸漬され引き上げら
れる塗工タンク、2は塗布液3が貯留され、塗工タンク
1に塗布液3を送液する循環タンクであり、塗布液3は
塗布液タンク2の下部と塗工タンク1の下部とを連結す
る配管4を通って圧送ポンプ6により塗工タンク1の下
部に送りこまれ、その上縁部からオーバーフローしてこ
れを受ける樋9を経て配管7を通って塗布液タンク2に
還流するように循環する。
[0003] A conventional apparatus of the circulation type dip coating method will be briefly described. FIG. 2 is a conceptual diagram illustrating an example of a conventional coating apparatus using a dip coating method. In FIG. 2, 1 is a coating liquid 3
Is a coating tank in which the cylindrical substrate 10 is immersed and pulled up, 2 is a circulation tank for storing the coating liquid 3 and sending the coating liquid 3 to the coating tank 1, and the coating liquid 3 is a coating liquid. It is sent to the lower part of the coating tank 1 by a pressure pump 6 through a pipe 4 connecting the lower part of the tank 2 and the lower part of the coating tank 1, and flows through a gutter 9 which overflows from its upper edge and receives it. 7 and circulates back to the coating liquid tank 2.

【0004】このような塗布装置を用いて、塗布液3を
循環させながら、塗工タンク1に、円筒内部に塗布液が
入り込まないような機構を付設された円筒状基体10を
その円筒軸をほぼ鉛直に保持して、円筒軸方向に浸漬
し、続いて所定の速度で引き上げることにより、円筒状
基体10の外表面に膜厚均一で均質な塗膜を形成する。
その場合、塗工タンク1に円筒状基体10を浸漬すると
きには基体の体積に相当する分量の塗布液が定常のオー
バーフロー量にプラスされてオーバーフローするので塗
布液面が上昇し、引き上げるときには塗布液面が下がる
という液面変動が生じる。このために、基体の塗布液面
に対する引き上げ速度が変化することになり、基体外表
面に塗布液が均一に塗布され得ないことになる。このよ
うな液面変動の影響をできるだけ少なくするために、塗
布液の循環量を調節し、基体を引き上げるときに途切れ
ることなく塗布液がオーバーフローしている状態を保ち
ながら塗布する方法が採られる。
Using such a coating apparatus, a cylindrical substrate 10 provided with a mechanism for preventing the coating liquid from entering the inside of the cylinder is placed in the coating tank 1 while the coating liquid 3 is circulated. By holding the tube almost vertically and immersing it in the direction of the cylinder axis, and then pulling it up at a predetermined speed, a uniform and uniform coating film is formed on the outer surface of the cylindrical substrate 10.
In this case, when the cylindrical substrate 10 is immersed in the coating tank 1, an amount of the coating liquid corresponding to the volume of the substrate is added to the steady overflow amount and overflows. , The liquid level changes. For this reason, the pulling speed of the substrate with respect to the coating liquid level changes, and the coating liquid cannot be uniformly applied to the outer surface of the substrate. In order to minimize the influence of such liquid level fluctuation, a method is adopted in which the amount of circulation of the coating liquid is adjusted, and the liquid is applied while the coating liquid overflows without interruption when lifting the substrate.

【0005】[0005]

【発明が解決しようとする課題】このような循環式塗布
装置において、オーバーフローした液を回収する方法と
しては循環タンクと塗工タンクの高低差を利用して塗工
液を回収する自由落下方式と、ポンプにて回収する方法
がある。
In such a circulation type coating apparatus, as a method for collecting the overflowed liquid, there is a free fall method in which the coating liquid is collected by utilizing the height difference between the circulation tank and the coating tank. , There is a method of collecting with a pump.

【0006】これらの回収方法においてそれぞれ以下の
ような問題点がある。すなわち、自由落下方式はポンプ
等の駆動が必要としない簡便な方法であるが、塗工タン
クと循環タンクの位置関係を考慮する必要がある。また
回収された塗布液が循環タンクに収容されるとき塗布液
面に落下することによる衝撃で泡が発生する。またポン
プにて回収する方法は塗工タンクと循環タンクの位置関
係を考慮する必要はないが、ポンプの種類や駆動方式に
よって送液時に泡の噛み込みが発生する。これらの泡が
塗布液に存在すると塗布された感光体ドラムの感光層に
付着して、不良品となり歩留低下の原因になる。とくに
円筒状基体を塗工タンクからの引き上げに際して、円筒
状基体が塗布液から離液するとき液面に泡が発生し、塗
布液のオバーフローとともに配管を通じて循環タンクに
移される。塗布液の粘度が高い場合は、この泡が消える
ことなく塗布装置内を循環し、泡が塗布液に存在すると
同様に塗布された感光体ドラムの感光層に付着して、不
良品となり歩留低下の原因になる。
[0006] Each of these recovery methods has the following problems. That is, the free fall method is a simple method that does not require driving of a pump or the like, but it is necessary to consider the positional relationship between the coating tank and the circulation tank. In addition, when the collected coating liquid is stored in the circulation tank, bubbles are generated due to an impact caused by falling on the coating liquid surface. Although it is not necessary to consider the positional relationship between the coating tank and the circulating tank when collecting with a pump, bubbles may be caught at the time of liquid feeding depending on the type of pump and the driving method. If these bubbles are present in the coating liquid, they adhere to the coated photosensitive layer of the photosensitive drum, resulting in defective products and a reduction in yield. In particular, when the cylindrical substrate is lifted from the coating tank, bubbles are generated on the liquid surface when the cylindrical substrate separates from the coating liquid, and are transferred to the circulation tank through a pipe together with the overflow of the coating liquid. When the viscosity of the coating liquid is high, the bubbles circulate in the coating device without disappearing, and if the bubbles are present in the coating liquid, they adhere to the photosensitive layer of the coated photosensitive drum in the same manner, resulting in a defective product and yield. May cause a drop.

【0007】[0007]

【課題を解決するための手段】上記の課題を解決するた
め、この発明によれば円筒状基体をその円筒軸をほぼ鉛
直に保持した状態で、塗布液に浸漬し、塗布液から外部
に引き上げることにより前記円筒状基体の外表面に塗布
液を塗布する塗布装置において、塗布液を収容しており
前記円筒状基体が浸漬される塗工タンクと、塗布液を塗
工タンクに循環させる循環タンクを有し、塗布液を循環
タンクの下部から圧送ポンプで塗工タンク下部に送り込
み,塗工タンク上縁部からオーバーフローさせて循環タ
ンクに送り込む塗布液循環機構を備えるとともにオーバ
ーフローした塗布液を循環タンクに導く配管にフィルタ
を塗布液の流れの上流側に向けて配置したことによって
達成される。さらに、フィルタの近傍にはエア抜き機構
が設けたことによって達成される。また、前記フィルタ
は配管の内径上部を塞ぐように配置されることによって
達成される。さらにフィルターの開口度は50乃至10
0μmであることによって達成される。
According to the present invention, in order to solve the above-mentioned problems, a cylindrical substrate is immersed in a coating solution with its cylindrical axis held substantially vertically, and pulled up from the coating solution to the outside. In a coating apparatus for coating a coating liquid on the outer surface of the cylindrical substrate, a coating tank containing the coating liquid and immersing the cylindrical substrate, and a circulation tank for circulating the coating liquid to the coating tank A coating liquid circulating mechanism that feeds the coating liquid from the lower part of the circulation tank to the lower part of the coating tank by a pressure pump, overflows from the upper edge of the coating tank, and sends the coating liquid to the circulation tank. This is achieved by arranging a filter on the pipe leading to the upstream of the flow of the coating liquid. Further, this is achieved by providing an air vent mechanism near the filter. In addition, the filter is achieved by disposing the filter so as to close an upper portion of the inner diameter of the pipe. Further, the opening degree of the filter is 50 to 10
This is achieved by being 0 μm.

【0008】[0008]

【発明の実施の形態】図面を用いてこの発明を説明す
る。図1はこの発明の塗布装置の一例の概念図で、1は
塗工タンク、2は循環タンクである。塗布液3は循環タ
ンク2の下部と塗工タンク1の下部とを連結する配管4
を通って圧送ポンプ6により塗工タンク1に送り込ま
れ、その上縁部からオーバーフローしてこれを受ける樋
9を経て配管7を通って循環タンク2に送り込まれるこ
とにより塗布装置内を循環する。配管7の途中にはオー
バーフローした塗布液3が樋9より循環タンク2への流
れの上流側に向かって傾斜したフィルタ8が設けられて
いる。フィルタ8の近傍にはエア抜き機構11が設けら
れている。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described with reference to the drawings. FIG. 1 is a conceptual diagram of an example of a coating apparatus according to the present invention, wherein 1 is a coating tank and 2 is a circulation tank. The coating liquid 3 is connected to a pipe 4 connecting the lower part of the circulation tank 2 and the lower part of the coating tank 1.
Is fed into the coating tank 1 by the pressure feed pump 6, overflows from the upper edge thereof, passes through the gutter 9 which receives the overflow, and is sent to the circulation tank 2 through the pipe 7 to circulate in the coating apparatus. In the middle of the pipe 7, there is provided a filter 8 which is inclined toward the upstream side of the flow of the overflowing coating liquid 3 from the gutter 9 to the circulation tank 2. An air release mechanism 11 is provided near the filter 8.

【0009】フィルタ8は図3に示すように配管7の上
部にはメッシュが設けられ少なくとも配管7内を矢印B
の方向に流れる塗布液3の液面下までメッシュが存在す
るようにする。また、フィルタ8の傾斜は図4に示すよ
うに配管の傾斜角度とも関係するが水平面に対して上部
が上側になるように設ける。
As shown in FIG. 3, the filter 8 is provided with a mesh at the top of the pipe 7 and at least an arrow B
Is made to exist below the surface of the coating liquid 3 flowing in the direction of. The filter 8 is inclined such that its upper part is located above the horizontal plane, though it is related to the inclination angle of the pipe as shown in FIG.

【0010】このような装置を用い、塗布液3を循環さ
せながら、円筒内部に塗布液が入り込まないような機構
を付設された円筒状基体10を図示はしてない昇降手段
により双方向矢印Aのように軸方向に鉛直に移動させ、
塗工タンク1に浸漬し引き上げることにより塗布を行
う。円筒状基体10を浸漬するときには塗工タンク1の
上縁部からオーバーフローする塗布液量は増大する。
Using such an apparatus, while circulating the coating liquid 3, the cylindrical substrate 10 provided with a mechanism for preventing the coating liquid from entering the inside of the cylinder is moved by a bidirectional arrow A by a lifting means (not shown). Move vertically in the axial direction like
The coating is performed by dipping in the coating tank 1 and lifting it up. When the cylindrical substrate 10 is immersed, the amount of the coating liquid overflowing from the upper edge of the coating tank 1 increases.

【0011】とくに円筒状基体10は引き上げられると
き、塗工タンク1内の塗布液面上に余分な塗布液が落下
して、その衝撃や液面の急激な変化になどにより泡が発
生し、オーバーフローした塗布液3の受け皿としての樋
9内に回収され配管7内を流れる。泡は一般的に密度が
小さく塗布液3の上層部に集中するので、配管7内を流
れる塗布液の表面を流れることになる。そこで配管7内
に設けたフィルタ8により泡が潰されたり、捕獲された
りして循環タンク2内への泡の移動は堰き止められる。
In particular, when the cylindrical substrate 10 is lifted, excess coating liquid drops on the coating liquid surface in the coating tank 1, and bubbles are generated due to the impact or a sudden change in the liquid level. The overflowed coating liquid 3 is collected in a gutter 9 as a receiving tray and flows through the pipe 7. Bubbles generally have a low density and concentrate in the upper layer of the coating liquid 3, and therefore flow on the surface of the coating liquid flowing in the pipe 7. Therefore, the bubbles are crushed or captured by the filter 8 provided in the pipe 7, and the movement of the bubbles into the circulation tank 2 is blocked.

【0012】フィルタ8の開口度は塗布液3の粘性や円
筒状基体10の引き上げ速度にも依存し、発生する泡の
大きさにもよるが一般的に塗布装置内にて発生する泡が
粒径が0.1〜2mm程度であるから50乃至100μ
mのメッシュであれば泡を捕捉できる。また、フィルタ
8は流れに逆行するように配置され、泡を塗布液流から
掬うようになっている。そしてフィルタ8はその上部が
液面と離れる方向に水平面より若干傾斜しているので掬
われた泡がフィルタ8の上部に移動するとともにフィル
タ8と配管7の壁面によって潰されるようになる。
The degree of opening of the filter 8 depends on the viscosity of the coating liquid 3 and the lifting speed of the cylindrical substrate 10, and depends on the size of the generated bubbles. 50-100μ because the diameter is about 0.1-2mm
With a mesh of m, bubbles can be captured. The filter 8 is arranged so as to go back to the flow, and scoops bubbles from the application liquid flow. Since the upper part of the filter 8 is slightly inclined from the horizontal plane in a direction away from the liquid surface, the scooped bubbles move to the upper part of the filter 8 and are crushed by the wall surfaces of the filter 8 and the pipe 7.

【0013】このフィルタ8の傾斜角度は配管7の傾斜
とも関係するが、配管7はもともとオーバーフローした
塗布液3を緩やかに循環タンク2に戻すため緩やかな傾
斜になっている。図4に示すように、フィルタ8と水平
面との角度をα、配管7と水平面との角度をβとしたと
き、オーバーフローした塗布液3が自然に緩やかに循環
タンク2に流れるための配管7の角度はβが5〜30度
であり、一方、泡を掬いフィルタ8に泡を捕捉するには
フィルタ8の角度はαが0〜30度るのが望ましく、流
れの上流側とフィルタ8のなす角度、即ち180−(α
+β)度がフィルタ8による泡の発生を抑えながら、泡
を旨く掬い取るには130〜175度程度であることが
望ましい。
Although the inclination angle of the filter 8 is related to the inclination of the pipe 7, the pipe 7 has a gentle inclination in order to return the overflowing coating liquid 3 to the circulation tank 2. As shown in FIG. 4, when the angle between the filter 8 and the horizontal plane is α and the angle between the pipe 7 and the horizontal plane is β, the pipe 7 for allowing the overflowing coating liquid 3 to flow naturally and gently into the circulation tank 2 is formed. The angle β is 5 to 30 degrees, while the angle of the filter 8 is desirably 0 to 30 degrees in order to scoop the bubbles and trap the bubbles in the filter 8. Angle, ie, 180- (α
+ Β) degree is desirably about 130 to 175 degrees in order to effectively scoop up the bubbles while suppressing the generation of bubbles by the filter 8.

【0014】さらにフィルタ8の近傍にはせき止められ
た泡を外部に排出するためのエア抜き機構が設けられて
いるので、泡が配管内に長くとどまることはない。
Further, an air bleeding mechanism for discharging the clogged foam to the outside is provided near the filter 8, so that the foam does not stay in the pipe for a long time.

【0015】[0015]

【発明の効果】この発明においては、円筒状基体をその
円筒軸をほぼ鉛直に保持した状態で、塗布液に浸漬し、
塗布液から外部に引き上げることにより前記円筒状基体
の外表面に塗布液を塗布する塗布装置において、塗布液
を収容しており前記円筒状基体が浸漬される塗工タンク
と、塗布液を塗工タンクに循環させる循環タンクを有
し、塗布液を循環タンクの下部から圧送ポンプで塗工タ
ンク下部に送り込み,塗工タンク上縁部からオーバーフ
ローさせて循環タンクに送り込む塗布液循環機構を備え
るとともにオーバーフローした塗布液を循環タンクに導
く配管にフィルタを塗布液の流れの上流側に向けて配置
したことを特徴とする。また前記フィルタは配管の内径
上部を塞ぐように配置されていることを特徴とする。前
記フィルタの開口度は50乃至100μmであることを
特徴とする。
According to the present invention, a cylindrical substrate is immersed in a coating solution while its cylindrical axis is held substantially vertically.
In a coating apparatus for applying a coating liquid to the outer surface of the cylindrical substrate by pulling up the coating liquid to the outside, a coating tank containing the coating liquid and immersing the cylindrical substrate, and coating the coating liquid It has a circulation tank that circulates through the tank, and has a coating liquid circulation mechanism that sends the coating liquid from the lower part of the circulation tank to the lower part of the coating tank with a pressure pump, overflows from the upper edge of the coating tank, and sends it to the circulation tank A filter is arranged in a pipe for guiding the coating liquid to the circulation tank toward an upstream side of the flow of the coating liquid. Further, the filter is arranged so as to close an upper portion of the inner diameter of the pipe. The filter has an aperture of 50 to 100 μm.

【0016】このような構成の塗布装置とすることによ
り、塗布液中の気泡の発生を少なくするとともに、また
発生した気泡の後工程への移動を少なくし、円筒状基体
の外表面に成膜むらがなく十分に膜厚均一で均質なサブ
ミクロンオーダーの薄膜を浸漬塗布することができるこ
とが可能となる。
With the coating apparatus having such a configuration, the generation of bubbles in the coating liquid is reduced, and the movement of the generated bubbles to a subsequent process is reduced, so that a film is formed on the outer surface of the cylindrical substrate. It is possible to dip-coat a submicron-order thin film having a uniform thickness and a uniform thickness without unevenness.

【図面の簡単な説明】[Brief description of the drawings]

【図1】この発明の塗布装置の一実施例の概念図FIG. 1 is a conceptual diagram of one embodiment of a coating apparatus of the present invention.

【図2】従来の塗布装置の一例の概念図FIG. 2 is a conceptual diagram of an example of a conventional coating apparatus.

【図3】配管とフィルタの関係を表す概念図FIG. 3 is a conceptual diagram showing a relationship between a pipe and a filter.

【図4】塗布液中の泡の捕捉状態を表す概念図FIG. 4 is a conceptual diagram showing a state of capturing bubbles in a coating solution.

【符号の説明】[Explanation of symbols]

1 塗工タンク 2 循環タンク 3 塗布液 4,7 配管 6 圧送ポンプ 8 フィルタ 9 樋 10 円筒状基体 11 エア抜き機構 DESCRIPTION OF SYMBOLS 1 Coating tank 2 Circulation tank 3 Coating liquid 4, 7 Piping 6 Pressure pump 8 Filter 9 Gutter 10 Cylindrical base 11 Air release mechanism

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 円筒状基体をその円筒軸をほぼ鉛直に保
持した状態で、塗布液に浸漬し、塗布液から外部に引き
上げることにより前記円筒状基体の外表面に塗布液を塗
布する塗布装置において、塗布液を収容しており前記円
筒状基体が浸漬される塗工タンクと、塗布液を塗工タン
クに循環させる循環タンクを有し、塗布液を循環タンク
の下部から圧送ポンプで塗工タンク下部に送り込み,塗
工タンク上縁部からオーバーフローさせて循環タンクに
送り込む塗布液循環機構を備えるとともにオーバーフロ
ーした塗布液を循環タンクに導く配管にフィルタを塗布
液の流れの上流側に向けて配置したことを特徴とする塗
布装置。
A coating apparatus for applying a coating liquid to an outer surface of a cylindrical substrate by immersing the cylindrical substrate in a coating liquid while keeping its cylindrical axis substantially vertical, and pulling the coating liquid out of the coating liquid. In the above, there is provided a coating tank containing the coating liquid and immersed in the cylindrical substrate, and a circulation tank for circulating the coating liquid to the coating tank, and coating the coating liquid from the lower part of the circulation tank by a pressure pump. Equipped with a coating liquid circulation mechanism that feeds into the lower part of the tank, overflows from the upper edge of the coating tank and sends it to the circulation tank, and arranges a filter on the pipe that guides the overflowing coating liquid to the circulation tank toward the upstream side of the flow of the coating liquid A coating device, characterized in that:
【請求項2】 前記フィルタは配管の内径上部を塞ぐよ
うに配置されていることを特徴とする請求項1記載の塗
布装置。
2. The coating apparatus according to claim 1, wherein the filter is disposed so as to close an upper portion of an inner diameter of the pipe.
【請求項3】 前記配管のフィルタを設けた近傍にはエ
ア抜き機構を設けたことを特徴とする特許請求項2記載
の塗布装置
3. The coating apparatus according to claim 2, wherein an air release mechanism is provided in the vicinity of the pipe where the filter is provided.
【請求項4】 前記フィルタの開口度は50乃至100
μmであることを特徴とする請求項1記載の塗布装置。
4. The filter has an aperture of 50 to 100.
2. The coating device according to claim 1, wherein the thickness is μm.
JP2000231494A 2000-07-31 2000-07-31 Application device Pending JP2002045753A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000231494A JP2002045753A (en) 2000-07-31 2000-07-31 Application device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000231494A JP2002045753A (en) 2000-07-31 2000-07-31 Application device

Publications (1)

Publication Number Publication Date
JP2002045753A true JP2002045753A (en) 2002-02-12

Family

ID=18724325

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000231494A Pending JP2002045753A (en) 2000-07-31 2000-07-31 Application device

Country Status (1)

Country Link
JP (1) JP2002045753A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8068723B2 (en) 2003-02-19 2011-11-29 Panasonic Corporation Recording medium, playback apparatus, recording method, program, and playback method
US8340507B2 (en) 2007-05-31 2012-12-25 Panasonic Corporation Recording medium, playback apparatus, recording method, program, and playback method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8068723B2 (en) 2003-02-19 2011-11-29 Panasonic Corporation Recording medium, playback apparatus, recording method, program, and playback method
US8200070B2 (en) 2003-02-19 2012-06-12 Panasonic Corporation Recording medium, playback apparatus, recording method, program, and playback method
US8340507B2 (en) 2007-05-31 2012-12-25 Panasonic Corporation Recording medium, playback apparatus, recording method, program, and playback method

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