[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

JP2001308148A - Apparatus and method for alignment - Google Patents

Apparatus and method for alignment

Info

Publication number
JP2001308148A
JP2001308148A JP2000125223A JP2000125223A JP2001308148A JP 2001308148 A JP2001308148 A JP 2001308148A JP 2000125223 A JP2000125223 A JP 2000125223A JP 2000125223 A JP2000125223 A JP 2000125223A JP 2001308148 A JP2001308148 A JP 2001308148A
Authority
JP
Japan
Prior art keywords
camera
target mark
observation
calibration
movable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000125223A
Other languages
Japanese (ja)
Other versions
JP3569820B2 (en
Inventor
Shigekazu Minami
繁和 南
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shibuya Corp
Original Assignee
Shibuya Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shibuya Kogyo Co Ltd filed Critical Shibuya Kogyo Co Ltd
Priority to JP2000125223A priority Critical patent/JP3569820B2/en
Publication of JP2001308148A publication Critical patent/JP2001308148A/en
Application granted granted Critical
Publication of JP3569820B2 publication Critical patent/JP3569820B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies
    • H01L24/75Apparatus for connecting with bump connectors or layer connectors

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Supply And Installment Of Electrical Components (AREA)
  • Wire Bonding (AREA)
  • Die Bonding (AREA)

Abstract

PROBLEM TO BE SOLVED: To carry out a correct alignment of upper and lower cameras of an upper and lower simultaneous observation camera by calculating a quantity of relative deviation between the upper and lower cameras. SOLUTION: (1) A calibration camera is installed on the same supporter as setting a tool. (2) A target mark is installed below the calibration camera. (3) The upper and lower simultaneous observation camera is installed below a movable target mark. (4) A target mark is installed on a table below the upper and lower simultaneous observation camera. (5) The movable target mark and the target mark on the table are recognized by the calibration camera. (6) The movable target mark is recognized by the upper camera of the upper and lower simultaneous observation camera. (7) The target mark on the table is recognized by the lower camera of the upper and lower simultaneous observation camera. (8) A quantity of relative deviation between the upper and lower cameras is calculated to align the upper and lower cameras with each other.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、半導体チップや半
田ボール等の電子部品を基板等に搭載する装置における
電子部品と基板等の位置合わせ装置及び位置合わせ方法
に関するもので、主としてデバイスボンダー等高速半導
体製造装置において搭載精度維持のため採用される電子
部品と基板等の位置合わせのためのキャリブレーション
機構及びキャリブレーション方法に特色を有するもので
ある。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an alignment device and an alignment method for an electronic component and a substrate in an apparatus for mounting an electronic component such as a semiconductor chip or a solder ball on a substrate or the like. The present invention has a special feature in a calibration mechanism and a calibration method for aligning an electronic component, a substrate, and the like, which are employed for maintaining mounting accuracy in a semiconductor manufacturing apparatus.

【0002】[0002]

【従来の技術】従来、たとえばフリップチップボンディ
ング装置での位置合わせ方法は、基板の配線パターンや
認識マークを第1の観察カメラで読みとり、別設の第2
の観察カメラで半導体チップの配線パターンや認識マー
クを読みとり、画像処理を行い、演算結果に基づき半導
体チップ、基板を移動させ位置合わせを行うというもの
であった。
2. Description of the Related Art Conventionally, a positioning method using, for example, a flip chip bonding apparatus is based on reading a wiring pattern or a recognition mark of a substrate with a first observation camera, and reading a wiring pattern or a recognition mark on a separate second camera.
Read the wiring pattern and the recognition mark of the semiconductor chip with the observation camera, perform image processing, and move and align the semiconductor chip and the substrate based on the calculation result.

【0003】しかし、この方法は観察カメラ取付部材の
熱膨張、移動手段として用いられるボールねじの熱膨張
等の温度変化やその他の条件変化により観察カメラの相
対的位置関係が変化し、正確な位置合わせができず、観
察カメラ等位置合わせに必要な要素に関して位置関係の
ズレを検出し、補正する必要があった。
However, in this method, the relative positional relationship of the observation camera changes due to temperature changes such as thermal expansion of the mounting member for the observation camera, thermal expansion of the ball screw used as the moving means, and other conditions, and the accurate position is changed. It was not possible to perform the alignment, and it was necessary to detect and correct the positional relationship between elements such as an observation camera necessary for the alignment.

【0004】また、電子部品搭載装置における生産性向
上の要請から、位置合わせのための第1及び第2のカメ
ラを同時観察カメラで行う方法が存在するが、この同時
観察カメラを採用した場合のキャリブレーション方法に
問題があった。
Further, there is a method in which the first and second cameras for alignment are performed by a simultaneous observation camera in response to a demand for improvement in productivity of the electronic component mounting apparatus. There was a problem with the calibration method.

【0005】[0005]

【発明が解決しようとする課題】本発明は、電子部品搭
載装置の位置合わせ装置において、上下同時観察カメラ
を採用して生産性を向上させると共に、上下同時観察カ
メラの上方側観察部及び下方側観察部の相対的ズレ量を
算出し、補正した正確な位置合わせを高速に行いうる位
置合わせ装置及び位置合わせ方法を提供することを目的
とする。
SUMMARY OF THE INVENTION The present invention relates to a positioning device for an electronic component mounting apparatus, which employs a simultaneous upper and lower observation camera to improve productivity, and also provides an upper observation section and a lower side of the upper and lower simultaneous observation camera. It is an object of the present invention to provide a positioning apparatus and a positioning method that can calculate a relative displacement amount of an observation unit and perform accurate corrected positioning at high speed.

【0006】[0006]

【課題を解決するための手段】本発明は、上記課題を解
決するために以下の手段を採用する。第1に、基板等に
電子部品を搭載する装置を電子部品を保持するツールと
基板等を載置するテーブルとを相対移動可能に設置し、
相互に位置合わせを行って搭載するものとする。
The present invention employs the following means to solve the above-mentioned problems. First, a device for mounting electronic components on a substrate or the like is installed such that a tool for holding the electronic components and a table for mounting the substrate or the like are relatively movable.
It shall be mounted after mutual alignment.

【0007】第2に、ツールと同一の支持体に支持され
たキャリブレーションカメラを設ける。第3に、キャリ
ブレーションカメラの下方に設置されキャリブレーショ
ンカメラと相対的に移動可能とされたターゲットマーク
を設ける。第4に、移動可能なターゲットマークの下方
に設置され移動可能なターゲットマークと相対的に移動
可能とされた上下同時観察カメラを設ける。第5に、上
下同時観察カメラの下方のテーブル上に形成されたター
ゲットマークを設ける。
[0007] Second, a calibration camera supported on the same support as the tool is provided. Third, a target mark is provided below the calibration camera and is movable relative to the calibration camera. Fourth, a simultaneous upper and lower observation camera is provided below the movable target mark and is movable relative to the movable target mark. Fifth, a target mark formed on a table below the upper and lower simultaneous observation camera is provided.

【0008】第6に、キャリブレーションカメラで移動
可能なターゲットマークとテーブル上のターゲットマー
クを認識する。第7に、上下同時観察カメラの上方側観
察部で移動可能なターゲットマークを認識する。第8
に、上下同時観察カメラの下方側観察部でテーブル上の
ターゲットマークを認識する。第9に、各認識結果を基
に上下同時観察カメラの上方側観察部と下方側観察部と
の相対的位置ズレを算出して、位置合わせを行う。
Sixth, a target mark movable on the calibration camera and a target mark on the table are recognized. Seventh, the movable target mark is recognized by the upper observation unit of the upper and lower simultaneous observation camera. 8th
Next, the target mark on the table is recognized by the lower observation unit of the upper and lower simultaneous observation camera. Ninth, the relative position deviation between the upper observation unit and the lower observation unit of the upper and lower simultaneous observation camera is calculated based on each recognition result, and alignment is performed.

【0009】[0009]

【発明の実施の形態】以下、図面に従って、実施例と共
に本発明の実施の形態について説明する。図1は、本発
明が利用されるボンディング装置の一実施例を示す概略
斜視図であり、図2は位置合わせ装置の動きを示す要部
説明図である。
Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a schematic perspective view showing an embodiment of a bonding apparatus to which the present invention is applied, and FIG. 2 is an explanatory view of a main part showing the movement of a positioning apparatus.

【0010】ボンディング装置は、図1の上方部に位置
するボンディング部と、図1の下方部に位置するボンデ
ィングステージ部と、ボンディング部下方に位置させら
れる移動ターゲット3と図1の左方部に位置する上下同
時観察カメラ4を有するものである。
The bonding apparatus includes a bonding section located at an upper part of FIG. 1, a bonding stage located at a lower part of FIG. 1, a moving target 3 located at a lower part of the bonding part, and a left part of FIG. It has a simultaneous upper and lower observation camera 4.

【0011】ボンディング部は、ボンディングツール1
1、キャリブレーションカメラ2、及び両者をZ軸方向
(上下方向)へ移動させるZ軸駆動装置1を有する。ボ
ンディングツール11は、電子部品を保持するツールに
相応するものであり、本実施例では半導体チップを吸着
し、移動して基板に半導体チップをボンディングする部
材である。
[0011] The bonding portion is a bonding tool 1
1, a calibration camera 2, and a Z-axis driving device 1 for moving both in the Z-axis direction (vertical direction). The bonding tool 11 corresponds to a tool for holding electronic components. In this embodiment, the bonding tool 11 is a member that sucks a semiconductor chip, moves the semiconductor chip, and bonds the semiconductor chip to a substrate.

【0012】ボンディングツール11とキャリブレーシ
ョンカメラ2は、共に同一の支持体12に、両者のZ軸
(上下方向の軸)の平行を維持して固着されており、ボ
ンディングツール11の移動とキャリブレーションカメ
ラ2の移動は同期したものとなる。
The bonding tool 11 and the calibration camera 2 are both fixed to the same support 12 while maintaining their Z-axis (vertical axis) in parallel. The movement of the camera 2 is synchronized.

【0013】Z軸駆動装置1は、ボンディングツール1
1のZ軸方向への移動を主たる目的とする。
The Z-axis driving device 1 includes a bonding tool 1
The main purpose is to move the first in the Z-axis direction.

【0014】ボンディングステージ部は、基板を載置す
るテーブルとなるXYステージ7とXYステージ7をY
軸方向(図1中、略前後方向)及びX軸方向(図1中、
略左右方向)に移動させるY軸駆動装置72及びX軸駆
動装置73を有する。両駆動装置72,73の駆動源に
はモータが用いられている。
The bonding stage includes an XY stage 7 serving as a table on which a substrate is
The axial direction (substantially the front-back direction in FIG. 1) and the X-axis direction (in FIG. 1,
It has a Y-axis driving device 72 and an X-axis driving device 73 that move in the (horizontal direction). A motor is used as a drive source for both drive units 72 and 73.

【0015】XYステージ7にはターゲットマーク71
が設けられている。従ってXYステージ7の移動とター
ゲットマーク71の移動は同期している。尚、実施例で
のターゲットマーク71は、簡単なものの一例として図
2に示すような十字図形を用いている。
The XY stage 7 has a target mark 71
Is provided. Therefore, the movement of the XY stage 7 and the movement of the target mark 71 are synchronized. In addition, as the target mark 71 in the embodiment, a cross figure as shown in FIG. 2 is used as a simple example.

【0016】本発明では、ツール(本実施例ではボンデ
ィングツール11)とテーブル(本実施例ではXYステ
ージ7)とは相対的移動可能であればよいとされている
が、本実施例ではボンディングツール11は、Z軸(上
下方向)のみの移動であり、XYステージ7はX軸及び
Y軸の平面方向のみの移動とされている。
In the present invention, it is sufficient that the tool (the bonding tool 11 in the present embodiment) and the table (the XY stage 7 in the present embodiment) can be relatively moved. Reference numeral 11 denotes movement only in the Z-axis (vertical direction), and the XY stage 7 moves only in the X-axis and Y-axis plane directions.

【0017】移動ターゲット3は、進入機構32のロッ
ド33の先端に取り付けた表示板にターゲットマーク3
1を設けたものである。移動ターゲット3のターゲット
マーク31は、表裏面同位置に設けられている。尚、タ
ーゲットマーク31の表示部分が透明であれば表裏に設
ける必要はなく、いずれか一方のみでよい。XYステー
ジ7のターゲットマーク71と同じ十字図形を用いてい
る。尚、進入機構32にはエアーシリンダが用いられて
いる。
The moving target 3 has a target mark 3 on a display plate attached to the tip of the rod 33 of the approach mechanism 32.
1 is provided. The target mark 31 of the moving target 3 is provided at the same position on the front and back surfaces. If the display portion of the target mark 31 is transparent, it is not necessary to provide the target mark 31 on the front and back, and only one of them is sufficient. The same cross figure as the target mark 71 of the XY stage 7 is used. Note that an air cylinder is used for the entry mechanism 32.

【0018】移動ターゲット3は、ボンディング部とX
Yステージ7の間で、キャリブレーションカメラ2の下
方に進退自在に設置されている。キャリブレーションカ
メラ2と移動ターゲット3のターゲットマーク31の移
動関係は、実施例によればキャリブレーションカメラ2
がZ軸移動で、ターゲットマーク31が、Y軸移動(前
後方向の移動)である。勿論、ターゲットマーク31
は、X軸移動(左右方向移動)であってもよい。
The moving target 3 has a bonding portion and X
Between the Y-stages 7, it is installed below the calibration camera 2 so as to be able to move forward and backward. According to the embodiment, the movement relationship between the calibration camera 2 and the target mark 31 of the moving target 3 is determined according to the embodiment.
Is the Z-axis movement, and the target mark 31 is the Y-axis movement (movement in the front-back direction). Of course, the target mark 31
May be X-axis movement (lateral movement).

【0019】上下同時観察カメラ4は、進入機構42の
ロッド43先端に取り付けたボディの上面に上方側観察
部となる上カメラ5、下面に下方側観察部となる下カメ
ラ6を設けたものである。尚、上下同時観察カメラ4
は、2つのミラーを用い、2つのミラーで1つのカメラ
へ導くものや、2つのCCDカメラの裏面を向かい合わ
せて配置したもの等が考えられる。
The upper / lower simultaneous observation camera 4 is provided with an upper camera 5 serving as an upper observation section on the upper surface of a body attached to the tip of the rod 43 of the approach mechanism 42, and a lower camera 6 serving as a lower observation section on the lower surface. is there. In addition, upper and lower simultaneous observation camera 4
For example, a camera using two mirrors and leading two cameras to one camera, or a camera having two CCD cameras arranged with their back surfaces facing each other can be considered.

【0020】上下同時観察カメラ4は、移動ターゲット
3のターゲットマーク31の下方位置に設置され、進入
機構42よりX軸方向に移動可能とされている。進入機
構42は、実施例ではモータを駆動源としている。尚、
進入方向もX軸方向に限定さない。
The upper / lower simultaneous observation camera 4 is installed at a position below the target mark 31 of the moving target 3 and is movable in the X-axis direction by an approach mechanism 42. The approach mechanism 42 uses a motor as a drive source in the embodiment. still,
The approach direction is not limited to the X-axis direction.

【0021】本発明は、上下同時観察カメラ4とキャリ
ブレーションカメラ2、移動ターゲット3のターゲット
マーク31、XYステージ7上のターゲットマーク71
を用いて上下同時観察カメラ4の上カメラ5、下カメラ
6のキャリブレーションを実施する。以下、図3乃至図
5に従って、キャリブレーション方法について説明す
る。
In the present invention, the upper and lower simultaneous observation camera 4, the calibration camera 2, the target mark 31 of the moving target 3, the target mark 71 on the XY stage 7
The upper camera 5 and the lower camera 6 of the upper and lower simultaneous observation camera 4 are calibrated by using. Hereinafter, the calibration method will be described with reference to FIGS.

【0022】まず、Y軸駆動装置72及びX軸駆動装置
73の動作によりXYステージ7がキャリブレーション
位置への移動を開始する。キャリブレーション位置と
は、図3乃至図5において垂直な一点鎖線で示される位
置を言うが、具体的には移動ターゲット3のターゲット
マーク31により決定される位置のことである。この移
動は、本来、第2過程での動作であるが、XYステージ
7がキャリブレーション位置まで移動するには、時間が
かかるので第1過程より先に移動を開始させておくので
ある。
First, the operation of the Y-axis driving device 72 and the X-axis driving device 73 causes the XY stage 7 to start moving to the calibration position. The calibration position refers to a position indicated by a vertical dashed line in FIGS. 3 to 5, and specifically refers to a position determined by the target mark 31 of the moving target 3. This movement is originally an operation in the second process, but it takes time for the XY stage 7 to move to the calibration position, so the movement is started before the first process.

【0023】第1過程は、Z軸のズレ量の確認過程であ
る。Z軸駆動機構1によりキャリブレーションカメラ2
が移動ターゲット3のターゲットマーク31の観察高さ
へ移動する。他方、退避位置にあったターゲットマーク
31がキャリブレーション位置へ移動する。図3がその
状態を示す概略斜視図である。
The first step is a step of checking the amount of deviation of the Z axis. Calibration camera 2 by Z axis drive mechanism 1
Moves to the observation height of the target mark 31 of the moving target 3. On the other hand, the target mark 31 at the retreat position moves to the calibration position. FIG. 3 is a schematic perspective view showing the state.

【0024】その後、キャリブレーションカメラ2がタ
ーゲットマーク31の画像取り込みを行いZ軸のターゲ
ットマーク31に対するズレ量x1(X軸方向のズレ
量)とy1(Y軸方向のズレ量)を確認する。Z軸のズ
レ量は、確認対象から言えばキャリブレーションカメラ
2のズレ量を意味するが、同時にボンディングツール1
1のズレ量でもある。確認作業終了後、ターゲットマー
ク31は退避位置へ移動する。
Thereafter, the calibration camera 2 captures an image of the target mark 31 and confirms a displacement x1 (displacement in the X-axis direction) and y1 (displacement in the Y-axis direction) with respect to the Z-axis target mark 31. The Z-axis shift amount means the shift amount of the calibration camera 2 from the viewpoint of confirmation, but at the same time, the bonding tool 1
It is also a shift amount of 1. After the confirmation work, the target mark 31 moves to the retreat position.

【0025】第2過程は、XYステージ7のズレ量の確
認過程である。キャリブレーションカメラ2とXYステ
ージ7上のターゲットマーク71にてXYステージ7の
ズレを確認するのである。
The second step is a step of confirming the amount of displacement of the XY stage 7. The deviation of the XY stage 7 is confirmed by the calibration camera 2 and the target mark 71 on the XY stage 7.

【0026】まず、先に移動を開始しているXYステー
ジ7がキャリブレーション位置に到着した後、キャリブ
レーションカメラ2がXYステージ7上のターゲットマ
ーク71の観察高さへ移動する。図4は、この状態を示
す概略斜視図である。そこで、キャリブレーションカメ
ラ2がXYステージ7上のターゲットマーク71の画像
取り込みを行い、Z軸、すなわちキャリブレーションカ
メラ2のXYステージ7上のターゲットマーク71に対
するズレ量x2(X軸方向のズレ量)とy2(Y軸方向
のズレ量)を確認する。これがXYステージ7のズレ量
となり、該ズレ量x2とy2は、第1過程でのZ軸ズレ
量x1(X軸方向のズレ量)とy1(Y軸方向のズレ
量)を考慮したものとなる。
First, after the XY stage 7 that has started moving reaches the calibration position, the calibration camera 2 moves to the observation height of the target mark 71 on the XY stage 7. FIG. 4 is a schematic perspective view showing this state. Then, the calibration camera 2 captures an image of the target mark 71 on the XY stage 7, and the displacement amount x2 of the calibration camera 2 with respect to the target mark 71 on the XY stage 7 (the displacement amount in the X-axis direction). And y2 (the amount of deviation in the Y-axis direction) are confirmed. This is the shift amount of the XY stage 7. The shift amounts x2 and y2 are determined in consideration of the Z-axis shift amount x1 (the shift amount in the X-axis direction) and y1 (the shift amount in the Y-axis direction) in the first process. Become.

【0027】第3過程は、上下同時観察カメラ4におけ
る上カメラ5のズレ量の確認過程である。上カメラ5と
移動ターゲット3のターゲットマーク31にて上カメラ
5のズレ量を確認する。まず、ターゲットマーク31が
キャリブレーション位置へ移動する。同時に上下同時観
察カメラ4が観察位置へ移動する。図5がこの状態を示
す概略斜視図である。ここで上カメラ5がターゲットマ
ーク31の下面側の画像を取り込み、上カメラ5のター
ゲットマーク31に対するズレ量x3(X軸方向のズレ
量)とy3(Y軸方向のズレ量)を確認する。
The third step is a step of confirming the amount of displacement of the upper camera 5 in the upper and lower simultaneous observation camera 4. The amount of deviation between the upper camera 5 and the target mark 31 of the moving target 3 is confirmed. First, the target mark 31 moves to the calibration position. At the same time, the upper and lower simultaneous observation camera 4 moves to the observation position. FIG. 5 is a schematic perspective view showing this state. Here, the upper camera 5 captures the image on the lower surface side of the target mark 31, and confirms the displacement amount x3 (the displacement amount in the X-axis direction) and the displacement amount y3 (the displacement amount in the Y-axis direction) of the upper camera 5 with respect to the target mark 31.

【0028】第4過程は、上下同時観察カメラ4の下カ
メラ6のズレ量の確認過程である。下カメラ6とXYス
テージ7上のターゲットマーク71にて下カメラ6のズ
レ量を確認する。すなわち第3過程と同じ位置で、下カ
メラ6がXYステージ7上のターゲットマーク71の画
像を取り込み、下カメラ6のXYステージ7上のターゲ
ットマーク71に対するズレ量x4(X軸方向のズレ
量)とy4(Y軸方向のズレ量)を確認する。
The fourth step is a step of checking the amount of displacement of the lower camera 6 of the upper and lower simultaneous observation camera 4. The amount of displacement between the lower camera 6 and the target mark 71 on the XY stage 7 is confirmed. That is, the lower camera 6 captures the image of the target mark 71 on the XY stage 7 at the same position as in the third step, and the lower camera 6 is displaced x4 from the target mark 71 on the XY stage 7 (displacement in the X-axis direction). And y4 (the amount of displacement in the Y-axis direction) are checked.

【0029】その後、ターゲットマーク31は退避位置
へ移動し、上下同時観察カメラ4も退避位置へ移動す
る。
Thereafter, the target mark 31 moves to the retreat position, and the upper and lower simultaneous observation camera 4 also moves to the retreat position.

【0030】上記のズレ量の確認の結果x1〜x4(X
軸方向のズレ量)とy1〜y4(Y軸方向のズレ量)に
てターゲットマーク31を基準として上下同時観察カメ
ラの上カメラ5と下カメラ6の相対的ズレ量を算出する
ことが可能となり、このズレ量をもとに半導体チップと
基板との位置合わせを補正することができるのである。
As a result of confirming the above-mentioned deviation amount, x1 to x4 (X
The relative displacement between the upper camera 5 and the lower camera 6 can be calculated based on the target mark 31 based on the displacement in the axial direction) and y1 to y4 (the displacement in the Y-axis direction). Thus, the alignment between the semiconductor chip and the substrate can be corrected based on the deviation amount.

【0031】[0031]

【発明の効果】本発明は、如上のように構成されるため
電子部品搭載装置の位置合わせ装置において、上下同時
観察カメラを採用して生産性を向上させることができる
と共に、上下同時観察カメラの上方側観察部及び下方側
観察部の相対的ズレ量を算出し、補正することができる
ので、正確な位置合わせを高速に行いうる位置合わせ装
置及び位置合わせ方法となった。
Since the present invention is configured as described above, in a positioning device for an electronic component mounting apparatus, the productivity can be improved by employing a simultaneous upper and lower observation camera, and the position of the upper and lower simultaneous observation camera can be improved. Since the amount of relative displacement between the upper observation unit and the lower observation unit can be calculated and corrected, an alignment apparatus and an alignment method capable of performing accurate alignment at high speed are provided.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明が利用されるボンディング装置の概略斜
視図
FIG. 1 is a schematic perspective view of a bonding apparatus to which the present invention is applied.

【図2】位置合わせ装置の動きを示す要部説明図FIG. 2 is an explanatory view of a main part showing the movement of a positioning device.

【図3】Z軸のズレ量確認時を示す概略斜視図FIG. 3 is a schematic perspective view showing a state in which a shift amount of the Z axis is confirmed.

【図4】XYステージのズレ量確認時を示す概略斜視図FIG. 4 is a schematic perspective view showing a time when a shift amount of the XY stage is confirmed.

【図5】上下同時観察カメラのズレ量確認時を示す概略
斜視図
FIG. 5 is a schematic perspective view showing a state in which the amount of displacement of the upper and lower simultaneous observation camera is confirmed.

【符号の説明】[Explanation of symbols]

1........Z軸駆動装置 2........キャリブレーションカメラ 3........移動ターゲット 4........上下同時観察カメラ 5........上カメラ 6........下カメラ 7........XYステージ 11.......ボンディングツール 12.......支持体 31,71....ターゲットマーク 32,42....進入機構 33,43....ロッド 72.......Y軸駆動装置 73.......X軸駆動装置 1. . . . . . . . 1. Z-axis drive device . . . . . . . Calibration camera 3. . . . . . . . Moving target . . . . . . . 4. Simultaneous top and bottom observation camera . . . . . . . Upper camera 6. . . . . . . . Lower camera 7. . . . . . . . XY stage 11. . . . . . . Bonding tool 12. . . . . . . Supports 31, 71. . . . Target mark 32, 42. . . . Approach mechanism 33, 43. . . . Rod 72. . . . . . . Y-axis driving device 73. . . . . . . X-axis drive

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】電子部品を保持するツールと基板等を載置
するテーブルとを相対移動可能に設置し、相互に位置合
わせを行って基板等に電子部品を搭載する装置におい
て、ツールと同一の支持体に支持されたキャリブレーシ
ョンカメラと、キャリブレーションカメラの下方に設置
されキャリブレーションカメラと相対的に移動可能とさ
れたターゲットマークと、移動可能なターゲットマーク
の下方に設置され移動可能なターゲットマークと相対的
に移動可能とされた上下同時観察カメラと、上下同時観
察カメラの下方のテーブル上に形成されたターゲットマ
ークとを設け、キャリブレーションカメラで移動可能な
ターゲットマークとテーブル上のターゲットマークを認
識し、上下同時観察カメラの上方側観察部で移動可能な
ターゲットマークを認識し、上下同時観察カメラの下方
側観察部でテーブル上のターゲットマークを認識し、各
認識結果を基に上下同時観察カメラの上方側観察部と下
方側観察部との相対的位置ズレを算出して、位置合わせ
を行うことを特徴とする位置合わせ装置。
An apparatus for mounting an electronic component on a substrate or the like by positioning a tool for holding an electronic component and a table on which a substrate or the like is mounted so as to be able to move relative to each other. A calibration camera supported by the support, a target mark installed below the calibration camera and movable relative to the calibration camera, and a movable target mark installed below the movable target mark And the upper and lower simultaneous observation camera which is relatively movable, and the target mark formed on the table below the upper and lower simultaneous observation camera are provided, and the target mark movable by the calibration camera and the target mark on the table are provided. Recognizes and moves the target mark that can be moved by the upper observation part of the upper and lower simultaneous observation camera. And recognizes the target mark on the table by the lower observation part of the upper and lower simultaneous observation camera, and calculates the relative position shift between the upper observation part and the lower observation part of the upper and lower simultaneous observation camera based on each recognition result. And a positioning device.
【請求項2】電子部品を保持するツールと基板等を載置
するテーブルとを相対移動可能に設置し、相互に位置合
わせを行って基板等に電子部品を搭載する装置におい
て、ツールと同一の支持体に支持されたキャリブレーシ
ョンカメラとキャリブレーションカメラの下方にキャリ
ブレーションカメラと相対的に移動可能なターゲットマ
ークとを設け、キャリブレーションカメラと該ターゲッ
トマークにてキャリブレーションカメラのXY方向のズ
レを確認し、移動可能なターゲットマークの下方に移動
可能なターゲットマークと相対的に移動可能な上下同時
観察カメラと上下同時観察カメラの下方のテーブル上に
ターゲットマークとを設け、キャリブレーションカメラ
とテーブル上のターゲットマークにてテーブルのズレを
確認し、上下同時観察カメラと移動可能なターゲットマ
ークにて上下同時観察カメラの上方側観察部のズレを確
認し、上下同時観察カメラとテーブル上のターゲットマ
ークにて上下同時観察カメラの下方側観察部のズレを確
認し、各ズレ量確認の結果により上下同時観察カメラの
上方側観察部と下方側観察部の相対的ズレ量を算出し、
位置合わせをすることを特徴とする位置合わせ方法。
2. An apparatus for mounting an electronic component on a substrate or the like by positioning a tool for holding an electronic component and a table on which a substrate or the like is mounted so as to be movable relative to each other, and mounting the electronic component on the substrate or the like. A calibration camera supported by a support and a target mark movable relative to the calibration camera below the calibration camera are provided, and the displacement of the calibration camera in the XY direction is determined by the calibration camera and the target mark. Check and set the target mark movable below the movable target mark, the upper and lower simultaneous observation camera that can move relatively, and the target mark on the table below the upper and lower simultaneous observation camera. Check the table deviation with the target mark of Check the displacement of the upper observation part of the upper and lower simultaneous observation camera with the camera and the movable target mark, and check the deviation of the lower observation part of the upper and lower simultaneous observation camera with the upper and lower simultaneous observation camera and the target mark on the table. Based on the result of each shift amount confirmation, calculate the relative shift amount of the upper observation unit and the lower observation unit of the upper and lower simultaneous observation camera,
A positioning method characterized by performing positioning.
JP2000125223A 2000-04-26 2000-04-26 Alignment device and alignment method Expired - Fee Related JP3569820B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000125223A JP3569820B2 (en) 2000-04-26 2000-04-26 Alignment device and alignment method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000125223A JP3569820B2 (en) 2000-04-26 2000-04-26 Alignment device and alignment method

Publications (2)

Publication Number Publication Date
JP2001308148A true JP2001308148A (en) 2001-11-02
JP3569820B2 JP3569820B2 (en) 2004-09-29

Family

ID=18635208

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000125223A Expired - Fee Related JP3569820B2 (en) 2000-04-26 2000-04-26 Alignment device and alignment method

Country Status (1)

Country Link
JP (1) JP3569820B2 (en)

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008218463A (en) * 2007-02-28 2008-09-18 Toray Eng Co Ltd Mounting method and device
CN100461996C (en) * 2002-11-13 2009-02-11 富士机械制造株式会社 Correcting method and apparatus for electronic components mounting apparatus
JP2009283682A (en) * 2008-05-22 2009-12-03 Juki Corp Surface mounting apparatus
JP2010153562A (en) * 2008-12-25 2010-07-08 Shibuya Kogyo Co Ltd Bonding device
KR100994493B1 (en) 2008-04-25 2010-11-15 엘아이지에이디피 주식회사 Apparatus for detecting a align mark and method for align using the same
JP2012069731A (en) * 2010-09-24 2012-04-05 Hitachi High-Tech Instruments Co Ltd Die bonder and manufacturing method of semiconductor
KR101541332B1 (en) 2014-04-07 2015-08-03 (주)글로벌텍 Apparatus for mounting PCB on JIG
WO2015119274A1 (en) * 2014-02-10 2015-08-13 株式会社新川 Mounting device and offset amount correction method therefor
JPWO2015190471A1 (en) * 2014-06-10 2017-04-20 株式会社新川 Method for estimating landing point position of bonding apparatus and bonding tool
WO2017108390A1 (en) * 2015-12-23 2017-06-29 Muehlbauer GmbH & Co. KG Apparatus and method for positioning and transmitting electronic components
KR20180002250A (en) * 2016-06-29 2018-01-08 서울엔지니어링(주) Align Optical Measurement Device of Transfer Printer
CN108986167A (en) * 2017-06-05 2018-12-11 梭特科技股份有限公司 It sets the bearing calibration of brilliant equipment and sets brilliant equipment using this method
JP6447706B1 (en) * 2017-12-20 2019-01-09 オムロン株式会社 Calibration data generation apparatus, calibration data generation method, calibration system, and control program
KR20190120738A (en) * 2017-02-13 2019-10-24 시바우라 메카트로닉스 가부시끼가이샤 Device for mounting electric component and method for manufacturing a display member
CN112945092A (en) * 2021-01-27 2021-06-11 深圳市卓兴半导体科技有限公司 Template positioning method and system of multi-station equipment

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWM594806U (en) * 2018-09-11 2020-05-01 新加坡商Pyxis Cf有限公司 Apparatus for semiconductor device bonding and mechanism for aligning a plurality of semiconductor devices

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05347326A (en) * 1992-06-15 1993-12-27 Sony Corp Method of setting capillary in wire bonding device
JPH06236904A (en) * 1993-02-08 1994-08-23 Toray Eng Co Ltd Method of correcting parameter of work positioning stage device
JPH077028A (en) * 1993-06-16 1995-01-10 Shibuya Kogyo Co Ltd Semiconductor alignment method
JPH07297241A (en) * 1994-04-19 1995-11-10 Tokyo Electron Ltd Probe method
JPH098104A (en) * 1995-06-21 1997-01-10 Toray Eng Co Ltd Calibrating method in chip bonding device
JPH11177300A (en) * 1997-12-13 1999-07-02 Tdk Corp Method and equipment for mounting electronic component
JPH11176883A (en) * 1997-12-16 1999-07-02 Matsushita Electric Ind Co Ltd Device and method for thermocompression bonding of electronic component having bumps

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05347326A (en) * 1992-06-15 1993-12-27 Sony Corp Method of setting capillary in wire bonding device
JPH06236904A (en) * 1993-02-08 1994-08-23 Toray Eng Co Ltd Method of correcting parameter of work positioning stage device
JPH077028A (en) * 1993-06-16 1995-01-10 Shibuya Kogyo Co Ltd Semiconductor alignment method
JPH07297241A (en) * 1994-04-19 1995-11-10 Tokyo Electron Ltd Probe method
JPH098104A (en) * 1995-06-21 1997-01-10 Toray Eng Co Ltd Calibrating method in chip bonding device
JPH11177300A (en) * 1997-12-13 1999-07-02 Tdk Corp Method and equipment for mounting electronic component
JPH11176883A (en) * 1997-12-16 1999-07-02 Matsushita Electric Ind Co Ltd Device and method for thermocompression bonding of electronic component having bumps

Cited By (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100461996C (en) * 2002-11-13 2009-02-11 富士机械制造株式会社 Correcting method and apparatus for electronic components mounting apparatus
JP2008218463A (en) * 2007-02-28 2008-09-18 Toray Eng Co Ltd Mounting method and device
KR100994493B1 (en) 2008-04-25 2010-11-15 엘아이지에이디피 주식회사 Apparatus for detecting a align mark and method for align using the same
JP2009283682A (en) * 2008-05-22 2009-12-03 Juki Corp Surface mounting apparatus
JP2010153562A (en) * 2008-12-25 2010-07-08 Shibuya Kogyo Co Ltd Bonding device
JP2012069731A (en) * 2010-09-24 2012-04-05 Hitachi High-Tech Instruments Co Ltd Die bonder and manufacturing method of semiconductor
US10068872B2 (en) 2014-02-10 2018-09-04 Shinkawa Ltd. Mounting apparatus and method of correcting offset amount of the same
WO2015119274A1 (en) * 2014-02-10 2015-08-13 株式会社新川 Mounting device and offset amount correction method therefor
JPWO2015119274A1 (en) * 2014-02-10 2017-03-30 株式会社新川 Mounting apparatus and offset amount correction method thereof
KR101541332B1 (en) 2014-04-07 2015-08-03 (주)글로벌텍 Apparatus for mounting PCB on JIG
JPWO2015190471A1 (en) * 2014-06-10 2017-04-20 株式会社新川 Method for estimating landing point position of bonding apparatus and bonding tool
WO2017108390A1 (en) * 2015-12-23 2017-06-29 Muehlbauer GmbH & Co. KG Apparatus and method for positioning and transmitting electronic components
KR20180002250A (en) * 2016-06-29 2018-01-08 서울엔지니어링(주) Align Optical Measurement Device of Transfer Printer
KR101935291B1 (en) * 2016-06-29 2019-01-04 서울엔지니어링(주) Align Optical Measurement Device of Transfer Printer
KR20190120738A (en) * 2017-02-13 2019-10-24 시바우라 메카트로닉스 가부시끼가이샤 Device for mounting electric component and method for manufacturing a display member
KR102194570B1 (en) 2017-02-13 2020-12-23 시바우라 메카트로닉스 가부시끼가이샤 Device for mounting electric component and method for manufacturing a display member
CN108986167A (en) * 2017-06-05 2018-12-11 梭特科技股份有限公司 It sets the bearing calibration of brilliant equipment and sets brilliant equipment using this method
JP6447706B1 (en) * 2017-12-20 2019-01-09 オムロン株式会社 Calibration data generation apparatus, calibration data generation method, calibration system, and control program
JP2019109200A (en) * 2017-12-20 2019-07-04 オムロン株式会社 Data generation device for calibration, data generation method for calibration, calibration system, and control program
CN112945092A (en) * 2021-01-27 2021-06-11 深圳市卓兴半导体科技有限公司 Template positioning method and system of multi-station equipment

Also Published As

Publication number Publication date
JP3569820B2 (en) 2004-09-29

Similar Documents

Publication Publication Date Title
JP3569820B2 (en) Alignment device and alignment method
JP5344145B2 (en) Method for aligning electronic component and substrate in bonding apparatus
JP4128540B2 (en) Bonding equipment
JP5174583B2 (en) Control method of electronic component mounting apparatus
KR102362976B1 (en) Apparatus and method for positioning a first object relative to a second object
JP6681241B2 (en) Electronic component mounting apparatus and electronic component manufacturing method
JPH077028A (en) Semiconductor alignment method
JP3276537B2 (en) Chip bonding apparatus and calibration method therefor
JP5986741B2 (en) Component mounting method, apparatus, and program
JP2011071225A (en) Alignment device
JP4710432B2 (en) Component mounting apparatus and component mounting method
JP5365618B2 (en) Position adjustment apparatus and position adjustment method
JP2004146776A (en) Machine and method for mounting flip-chip
JP5391007B2 (en) Electronic component mounting apparatus and mounting method
JP2004128384A (en) Component mounting apparatus and component mounting method
EP0989601B1 (en) Method of and apparatus for bonding component
KR100696211B1 (en) Bonding apparatus
JP4264403B2 (en) Bonding equipment
JP2003152031A (en) Apparatus and method for bonding electronic component
JP2844409B2 (en) Semiconductor positioning method
JP5181383B2 (en) Bonding equipment
JP3399334B2 (en) Thermocompression bonding apparatus and thermocompression bonding method for electronic components with bumps
JP4517533B2 (en) Component mounting method and component mounting apparatus
JP4394822B2 (en) Component mounting equipment
JP2757127B2 (en) Method and apparatus for correcting bonding position of wire bonder

Legal Events

Date Code Title Description
A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20040204

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20040518

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20040608

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

Ref document number: 3569820

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090702

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100702

Year of fee payment: 6

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100702

Year of fee payment: 6

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110702

Year of fee payment: 7

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120702

Year of fee payment: 8

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130702

Year of fee payment: 9

LAPS Cancellation because of no payment of annual fees