JP2001341077A - Thin blade and method of manufacturing the same - Google Patents
Thin blade and method of manufacturing the sameInfo
- Publication number
- JP2001341077A JP2001341077A JP2000164847A JP2000164847A JP2001341077A JP 2001341077 A JP2001341077 A JP 2001341077A JP 2000164847 A JP2000164847 A JP 2000164847A JP 2000164847 A JP2000164847 A JP 2000164847A JP 2001341077 A JP2001341077 A JP 2001341077A
- Authority
- JP
- Japan
- Prior art keywords
- metal foil
- soft metal
- thin blade
- superabrasive
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 16
- 239000011888 foil Substances 0.000 claims abstract description 43
- 229910052751 metal Inorganic materials 0.000 claims abstract description 38
- 239000002184 metal Substances 0.000 claims abstract description 38
- 230000002093 peripheral effect Effects 0.000 claims abstract description 5
- 238000000034 method Methods 0.000 claims description 30
- 229910052782 aluminium Inorganic materials 0.000 claims description 10
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 10
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 5
- 238000004070 electrodeposition Methods 0.000 claims description 5
- 239000011889 copper foil Substances 0.000 claims description 4
- 239000006061 abrasive grain Substances 0.000 abstract description 30
- 239000010410 layer Substances 0.000 description 27
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 12
- 238000005323 electroforming Methods 0.000 description 10
- 239000002245 particle Substances 0.000 description 9
- 238000007747 plating Methods 0.000 description 9
- 229910052759 nickel Inorganic materials 0.000 description 6
- 239000002356 single layer Substances 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 238000005520 cutting process Methods 0.000 description 3
- 239000010432 diamond Substances 0.000 description 3
- 229910003460 diamond Inorganic materials 0.000 description 3
- 238000009713 electroplating Methods 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- 239000003082 abrasive agent Substances 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 229910021645 metal ion Inorganic materials 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 229910001453 nickel ion Inorganic materials 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Landscapes
- Polishing Bodies And Polishing Tools (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、薄刃ブレード及び
その製造方法に関する。さらに詳しくは、本発明は、砥
粒突出量が両側面で均一であり、かつ砥粒の自生作用が
阻害されることがなく、切れ味に優れ、しかも粗い砥粒
も使用できる薄刃ブレード、及びこのものを簡単な工程
で効率よく製造する方法に関するものである。The present invention relates to a thin blade and a method for manufacturing the same. More specifically, the present invention provides a thin blade blade in which the protrusion amount of the abrasive grains is uniform on both sides, and the autogenous action of the abrasive grains is not hindered, the sharpness is excellent, and coarse abrasive grains can be used. The present invention relates to a method for efficiently manufacturing a product by a simple process.
【０００２】[0002]
【従来の技術】従来、シリコンウエーハやフェライトな
どの電子材料、あるいはセラミックス、水晶、ガラスな
どの硬脆材料の切断加工や溝入れ加工を高精度に行うた
めに、電鋳薄刃ブレードが用いられている。この電鋳薄
刃ブレードは、耐摩耗性に優れ、寿命が長く、しかも極
めて薄い刃厚も可能であるなどの特徴を有しているが、
その反面、レジンボンド薄刃ブレードやメタルボンド薄
刃ブレードと比較して、砥粒の自生作用が起きにくく、
切れ味に劣るという欠点を有している。上記電鋳薄刃ブ
レードの製造方法としては、一般に、アルミニウム又は
ステンレス鋼などの導電性金属からなる基板上に、電鋳
法により超砥粒層を設けたのち、該基板を剥離若しくは
機械加工、あるいは溶解などの方法で除去することによ
り、薄刃ブレードを作製する方法が用いられている。し
かしながら、このような製造方法においては、例えば
（１）厚み方向にメッキによって超砥粒層を成長させる
ために、刃厚の厚いものは製作に時間がかかる、（２）
メッキによる超砥粒層の成長側と基板側とで砥粒の突出
量が異なる、（３）刃厚はラップ加工で制御するため、
＃３２５よりも粗い砥粒ではラップ加工が困難であり、
粗い砥粒を使用しにくい、などの問題があった。また、
基板側を化学的又は電気化学的に溶解して砥粒を突出さ
せる方法（特開昭６２−２１８０６７号公報）、基板側
に、再度電鋳法により、砥粒の一部が突出した超砥粒層
を設ける方法（特開昭６３−１１２８１号公報）などが
提案されている。しかしながら、これらの方法は、いず
れも工程が煩雑であって、コストが高くつくのを免れな
いという欠点を有している。2. Description of the Related Art Conventionally, electroformed thin blades have been used for cutting or grooving electronic materials such as silicon wafers and ferrites, or hard and brittle materials such as ceramics, quartz and glass with high precision. I have. This electroformed thin blade is excellent in wear resistance, has a long life, and has features such as extremely thin blade thickness.
On the other hand, compared to resin-bonded thin blades and metal-bonded thin blades, the abrasive grains are less likely to self-generate,
It has the disadvantage of poor sharpness. As a method of manufacturing the electroformed thin blade, generally, on a substrate made of a conductive metal such as aluminum or stainless steel, after providing a superabrasive layer by electroforming, the substrate is peeled or machined, or A method of manufacturing a thin blade by removing it by a method such as melting is used. However, in such a manufacturing method, for example, (1) a super-abrasive layer is grown by plating in the thickness direction, so that a thicker blade takes a longer time to manufacture.
The protruding amount of abrasive grains differs between the growth side of the superabrasive grain layer by plating and the substrate side. (3) Since the blade thickness is controlled by lapping,
Lapping is difficult with abrasive grains coarser than # 325,
There were problems such as difficulty in using coarse abrasive grains. Also,
A method in which abrasive grains are projected by dissolving the substrate side chemically or electrochemically (Japanese Patent Application Laid-Open No. 62-218067). A super-abrasive in which a part of the abrasive grains is projected again on the substrate side by electroforming. A method of providing a grain layer (Japanese Patent Application Laid-Open No. 63-11281) has been proposed. However, these methods have the disadvantage that the steps are complicated and the cost is inevitably high.
【０００３】[0003]
【発明が解決しようとする課題】本発明は、このような
事情のもとで、砥粒突出量が両側面で均一であり、かつ
砥粒の自生作用が阻害されることがなく、切れ味に優
れ、しかも粗い砥粒も使用できる薄刃ブレード、及びこ
のものを簡単な工程で効率よく製造する方法を提供する
ことを目的としてなされたものである。SUMMARY OF THE INVENTION Under such circumstances, the present invention provides a method for sharpening the abrasive grains in which the protrusion amount of the abrasive grains is uniform on both sides and the autogenous action of the abrasive grains is not hindered. An object of the present invention is to provide a thin blade which is excellent and can use coarse abrasive grains, and a method for efficiently manufacturing the blade with a simple process.
【０００４】[0004]
【課題を解決するための手段】本発明者らは、前記の優
れた機能を有する薄刃ブレードを開発すべく鋭意研究を
重ねた結果、アルミニウム箔や銅箔などの軟質金属箔の
両面に、電着により超砥粒層を設けてなる薄刃ブレード
が、その目的に適合し得ること、そして、このものは特
定の方法により、極めて簡単な工程で、効率よく製造し
得ることを見出し、この知見に基づいて本発明を完成す
るに至った。すなわち、本発明は、（１）軟質金属箔
と、その両面に電着により設けられた超砥粒層とからな
る薄刃ブレード、（２）軟質金属箔がアルミニウム箔又
は銅箔である第１項記載の薄刃ブレード、及び（３）円
筒状治具の端面に軟質金属箔を固定し、外周方向に展張
した状態でこの軟質金属箔の両面に超砥粒を電着して超
砥粒層を設け、次いで該円筒状治具から、両面に超砥粒
層を有する軟質金属箔を取り外したのち、所望の寸法に
仕上げることを特徴とする薄刃ブレードの製造方法、を
提供するものである。Means for Solving the Problems The inventors of the present invention have conducted intensive studies to develop a thin blade having the above-mentioned excellent functions, and as a result, have been able to apply a soft metal foil such as an aluminum foil or a copper foil to both surfaces thereof. It has been found that a thin blade blade provided with a superabrasive layer by adhesion can meet its purpose, and that it can be efficiently manufactured by a specific method in a very simple process. Based on this, the present invention has been completed. That is, the present invention provides (1) a thin blade comprising a soft metal foil and a superabrasive layer provided by electrodeposition on both surfaces thereof, and (2) the soft metal foil is an aluminum foil or a copper foil. (3) A soft metal foil is fixed to the end face of the cylindrical jig, and superabrasive grains are electrodeposited on both sides of the soft metal foil in a state where the soft metal foil is stretched in the outer peripheral direction to form a superabrasive grain layer. The present invention provides a method for manufacturing a thin blade, comprising: removing a soft metal foil having a superabrasive layer on both sides from the cylindrical jig;
【０００５】[0005]
【発明の実施の形態】本発明の薄刃ブレードは、軟質金
属箔と、その両面に電着により設けられた超砥粒層とか
ら構成されたものであって、上記軟質金属箔の材料とし
ては、導電性を有する軟質金属が用いられ、特に得られ
る薄刃ブレードにおける砥粒の自生作用を阻害しないよ
うな摩耗しやすい金属材料が好適である。このような軟
質金属箔としては、例えばアルミニウム箔及び銅箔など
を好ましく挙げることができる。これらの中で、市販の
アルミホイルは入手が容易で、かつ安価であるので、特
に好適である。上記軟質金属箔の厚みについては、特に
制限はなく、製作するブレードの厚み及び砥粒の粒度に
応じて適宜選択することができるが、一般には３〜１０
０μｍ、好ましくは５〜２０μｍの範囲で選ばれる。本
発明においては、このような軟質金属箔の両面に電着に
より超砥粒層が設けられるが、該超砥粒としては、従来
薄刃ブレードに使用されているダイヤモンド砥粒及びｃ
ＢＮ（立方晶窒化ホウ素）砥粒などを挙げることができ
る。これらの超砥粒は単独で用いてもよいし、２種以上
を混合して用いてもよい。この超砥粒の粒度については
特に制限はなく、用途に応じて適宜選定することができ
るが、本発明の薄刃ブレードにおいては、従来の電鋳法
による薄刃ブレードに比べて、粗い粒度も使用し得るの
で、例えばＪＩＳ Ｂ ４１３０に規定する粒度＃８０／
１００のような粗い粒径を有する砥粒を用いることがで
きるし、また小さい粒径については平均粒径が１０μｍ
以下のものや、あるいは平均粒径が１μｍ以下のいわゆ
るサブミクロンの粒径であっても特に制限はなく用いる
ことができる。本発明においては、前述の軟質金属箔の
両面に、上記超砥粒を電着して超砥粒層を設けることに
より、薄刃ブレードが得られる。該超砥粒層は一般の電
気メッキ法により単層に形成してもよいし、電鋳法によ
り多層状に形成してもよい。該軟質金属箔の両面に設け
られる超砥粒層の厚みは、製作する薄刃ブレードの厚
み、及び使用する軟質金属箔の厚みや超砥粒の粒度に応
じて適宜選択されるが、一般に薄刃ブレードの全体の厚
みが２０〜５００μｍ、好ましくは５０〜１００μｍの
範囲になるように選ばれる。BEST MODE FOR CARRYING OUT THE INVENTION A thin blade according to the present invention comprises a soft metal foil and a superabrasive layer provided on both surfaces thereof by electrodeposition. A soft metal having conductivity is used, and particularly, a metal material which is easily worn so as not to inhibit the autogenous action of the abrasive grains in the obtained thin blade is suitable. As such a soft metal foil, for example, an aluminum foil and a copper foil can be preferably mentioned. Among them, commercially available aluminum foil is particularly preferable because it is easily available and inexpensive. The thickness of the soft metal foil is not particularly limited and may be appropriately selected depending on the thickness of the blade to be manufactured and the grain size of the abrasive grains.
0 μm, preferably in the range of 5 to 20 μm. In the present invention, a superabrasive layer is provided on both surfaces of such a soft metal foil by electrodeposition. Examples of the superabrasive include diamond abrasives conventionally used in thin blades and c.
BN (cubic boron nitride) abrasives and the like can be mentioned. These superabrasive grains may be used alone or in combination of two or more. The particle size of the superabrasive grains is not particularly limited and can be appropriately selected depending on the application.However, in the thin blade of the present invention, a coarser particle size is used as compared with a thin blade obtained by a conventional electroforming method. Therefore, for example, a particle size # 80 / specified in JIS B 4130
Abrasive grains having a coarse grain size such as 100 can be used, and the average grain size is 10 μm for small grain sizes.
There is no particular limitation to the following particles or so-called submicron particles having an average particle diameter of 1 μm or less. In the present invention, a thin blade is obtained by electrodepositing the superabrasive particles on both surfaces of the above-mentioned soft metal foil to provide a superabrasive layer. The superabrasive layer may be formed into a single layer by a general electroplating method, or may be formed into a multilayer by an electroforming method. The thickness of the superabrasive layer provided on both sides of the soft metal foil is appropriately selected depending on the thickness of the thin blade to be manufactured, and the thickness of the soft metal foil and the particle size of the superabrasive to be used. Is selected so that the overall thickness of the film is in the range of 20 to 500 μm, preferably 50 to 100 μm.
【０００６】本発明の薄刃ブレードは、超砥粒層の間に
軟質金属箔が介在されており、該軟質金属箔は、使用時
に切粉などで容易に摩耗するため、砥粒の自生作用を阻
害することがない。本発明の薄刃ブレードの製造方法と
しては、前記性状を有する薄刃ブレードが得られる方法
であればよく、特に制限はないが、以下に示す本発明の
方法を用いることにより、簡単な工程で、効率よく所望
の薄刃ブレードを製造することができる。図１は、本発
明の薄刃ブレードの製造方法を説明するための１例の断
面図であって、本発明の方法においては、まず、円筒状
治具１の端面に、軟質金属箔２を外周方向に展張した状
態で、固定用リング３によって固定する。次いで、軟質
金属箔２の両面に、超砥粒を電着して超砥粒層を設け
る。次に、円筒状治具１から、両面に超砥粒層を有する
軟質金属箔２を取り外したのち、所望の寸法に仕上げる
ことにより、目的とする薄刃ブレードが得られる。この
際、仕上げについては、一般に機械的又は電気的加工に
より、外径及び内径を所定の寸法に仕上げ、リング状の
薄刃ブレードとされる。上記の超砥粒を電着して、超砥
粒層を設ける方法としては、前述したように、（１）一
般の電気メッキ法により、単層の超砥粒層を形成させる
方法、及び（２）電鋳法により、多層状の超砥粒層を形
成させる方法を用いることができる。まず、前記（１）
の一般の電気メッキ法について説明する。この方法にお
いては、通常、まず軟質金属箔の両面に、ニッケルメッ
キなどを施して、下地メッキ層を形成させる。次いで、
軟質金属箔に陰極を接続し、メッキ液に陽極を接続して
メッキを行い、超砥粒を固着して単層の超砥粒層を形成
させる。メッキする金属は、砥粒を固定することができ
るものであれば特に制限はなく、例えば、ニッケル、ク
ロムなどを使用することができるが、ニッケルを特に好
適に使用することができる。次に、前記（２）の電鋳法
について説明する。この方法においては、銅、クロム、
ニッケルなどの金属イオンを含み、かつ超砥粒を分散し
た電鋳浴中において、該軟質金属箔に陰極を接続すると
共に、電鋳浴液に陽極を接続して通電することにより、
軟質金属箔の両面に超砥粒と金属の電着を行い、所定の
厚さまで砥粒層を成長させて、多層状の超砥粒層を形成
させる。電鋳浴液中の金属イオンとしては、硬度などの
点から、ニッケルイオンが好ましい。なお、超砥粒層の
厚さは電鋳時間によって調整される。このような本発明
の方法によれば、極めて簡単な工程で、砥粒突出量が両
側面で均一である薄刃ブレードを、効率よく製造するこ
とができる。図２は、本発明の薄刃ブレードにおける超
砥粒層の異なる例の断面図であり、（ａ）は、軟質金属
箔２の両面に、超砥粒４が単層に電着された状態を示
し、一方（ｂ）は、軟質金属箔２の両面に、超砥粒５が
多層状に電着された状態を示す。In the thin blade of the present invention, a soft metal foil is interposed between the superabrasive layers, and the soft metal foil is easily worn by chips or the like at the time of use. Does not inhibit. The method for producing the thin blade of the present invention is not particularly limited as long as it is a method capable of obtaining a thin blade having the above-mentioned properties, and is not particularly limited. A desired thin blade can be manufactured well. FIG. 1 is a cross-sectional view of an example for explaining a method of manufacturing a thin blade according to the present invention. In the method of the present invention, first, a soft metal foil 2 is attached to an end face of a cylindrical jig 1. In the state of being stretched in the direction, it is fixed by the fixing ring 3. Next, superabrasive grains are electrodeposited on both surfaces of the soft metal foil 2 to provide a superabrasive layer. Next, after removing the soft metal foil 2 having the superabrasive grain layers on both surfaces from the cylindrical jig 1, the desired thin blade is obtained by finishing to a desired size. At this time, the outer diameter and the inner diameter are generally finished to predetermined dimensions by mechanical or electrical processing to obtain a ring-shaped thin blade. As described above, as a method of electrodepositing the above-mentioned superabrasive grains to provide a superabrasive layer, (1) a method of forming a single-layer superabrasive layer by a general electroplating method, and ( 2) A method of forming a multilayer superabrasive layer by electroforming can be used. First, (1)
The general electroplating method will be described. In this method, usually, nickel plating or the like is applied to both surfaces of the soft metal foil to form a base plating layer. Then
A cathode is connected to the soft metal foil, an anode is connected to the plating solution, and plating is performed, and superabrasive grains are fixed to form a single layer of superabrasive grains. The metal to be plated is not particularly limited as long as it can fix the abrasive grains. For example, nickel, chromium, or the like can be used, and nickel can be particularly preferably used. Next, the electroforming method (2) will be described. In this method, copper, chromium,
In an electroforming bath containing metal ions such as nickel, and in which super-abrasive grains are dispersed, by connecting a cathode to the soft metal foil and connecting an anode to the electroforming bath liquid to conduct electricity,
Electrodeposition of superabrasive grains and metal is performed on both sides of the soft metal foil, and an abrasive layer is grown to a predetermined thickness to form a multilayer superabrasive layer. As the metal ions in the electroforming bath solution, nickel ions are preferred from the viewpoint of hardness and the like. The thickness of the superabrasive layer is adjusted by the electroforming time. According to such a method of the present invention, it is possible to efficiently manufacture a thin blade in which the amount of protruding abrasive grains is uniform on both side surfaces by extremely simple steps. FIG. 2 is a cross-sectional view of a different example of the superabrasive layer in the thin blade of the present invention. FIG. 2A shows a state where the superabrasive 4 is electrodeposited in a single layer on both surfaces of the soft metal foil 2. 1B shows a state in which superabrasive grains 5 are electrodeposited on both surfaces of the soft metal foil 2 in a multilayer shape.
【０００７】[0007]
【実施例】次に、本発明を実施例により、さらに詳細に
説明するが、本発明は、この例によってなんら限定され
るものではない。 実施例１ 寸法が１００Ｄ−０.０６Ｔ−４０Ｈの薄刃ブレードを
製作した。内径１０２mmの円筒状治具の端面に、厚み５
μｍのアルミニウム箔を外周方向に展張し、固定リング
で固定した（図１参照）。該アルミニウム箔の両面に、
ニッケルメッキにより、厚み約３μｍの下地メッキ層を
形成したのち、粒度１２／２５μｍのダイヤモンド砥粒
をニッケルメッキにより単層に固定し、全体の厚みを６
０μｍとした。次に、両面に超砥粒層が設けられたアル
ミニウム箔を、治具から取り外し、ワイヤー放電加工に
より、内径４０mm、外径１００mmに仕上げ、寸法が１０
０Ｄ−０.０６Ｔ−４０Ｈの薄刃ブレードを得た。この
ようにして得られた薄刃ブレードをスライサーに装着
し、下記の条件で単結晶シリコンの切断を行った。 スライサー：不二越社製マイクロジェネレーターＳＭＧ
２０ 加工条件：回転速度１０,０００min-1（周速度３,１４
０ｍ／min） 切込み：１０mm 送り：１０mm／min この結果、切れ味、切断精度ともに良好であった。 実施例２ 実施例１において、アルミニウム箔として厚み１５μｍ
のものを、ダイヤモンド砥粒として粒度１０／２０μｍ
のものを用いた以外は、実施例１と同様にして、寸法が
１００Ｄ−０.０６Ｔ−４０Ｈの薄刃ブレードを製作
し、性能を評価した。その結果、切れ味、切断精度とも
に良好であった。Next, the present invention will be described in more detail with reference to examples, but the present invention is not limited to these examples. Example 1 A thin blade having dimensions of 100D-0.06T-40H was manufactured. The end face of a cylindrical jig with an inner diameter of 102 mm
A μm aluminum foil was stretched in the outer peripheral direction and fixed with a fixing ring (see FIG. 1). On both sides of the aluminum foil,
After a base plating layer having a thickness of about 3 μm is formed by nickel plating, diamond abrasive grains having a particle size of 12/25 μm are fixed to a single layer by nickel plating, and the total thickness is reduced to 6 μm.
It was set to 0 μm. Next, the aluminum foil provided with the superabrasive layer on both sides was removed from the jig, and finished by wire electric discharge machining to an inner diameter of 40 mm and an outer diameter of 100 mm.
A thin blade of 0D-0.06T-40H was obtained. The thin blade thus obtained was mounted on a slicer, and the single crystal silicon was cut under the following conditions. Slicer: Micro generator SMG manufactured by Fujikoshi
20 Processing conditions: Rotation speed 10,000 min -1 (peripheral speed 3,14
0 m / min) Depth of cut: 10 mm Feed: 10 mm / min As a result, both sharpness and cutting accuracy were good. Example 2 In Example 1, a 15 μm thick aluminum foil was used.
Is 10/20 μm as diamond abrasive grains
A thin blade having a size of 100D-0.06T-40H was manufactured in the same manner as in Example 1 except that the blade was used, and the performance was evaluated. As a result, both sharpness and cutting accuracy were good.
【０００８】[0008]
【発明の効果】本発明の薄刃ブレードは、砥粒突出量が
両側面で均一であり、かつ砥粒の自生作用が阻害される
ことがなく、切れ味に優れ、しかも粗い砥粒も使用でき
るなどの優れた特徴を有している。また、本発明の方法
によれば、上記薄刃ブレードを、極めて簡単な工程で効
率よく製造することができる。According to the thin blade of the present invention, the protrusion amount of the abrasive grains is uniform on both sides, the self-producing action of the abrasive grains is not hindered, the sharpness is excellent, and coarse abrasive grains can be used. It has excellent features. Further, according to the method of the present invention, the above-described thin blade can be efficiently manufactured by an extremely simple process.
【図１】図１は、本発明の製造方法を説明するための一
例の断面図である。FIG. 1 is a cross-sectional view of an example for explaining a manufacturing method of the present invention.
【図２】図２は、本発明の薄刃ブレードにおける超砥粒
層の異なる例の断面図である。FIG. 2 is a cross-sectional view of a different example of the superabrasive layer in the thin blade of the present invention.
１ 円筒状治具 ２ 軟質金属箔 ３ 固定用リング ４ 超砥粒 ５ 超砥粒 Reference Signs List 1 cylindrical jig 2 soft metal foil 3 fixing ring 4 super abrasive 5 super abrasive
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 ＦＩ テーマコート゛(参考） Ｂ２４Ｄ 3/34 Ｂ２４Ｄ 3/34 Ａ ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI theme coat ゛ (Reference) B24D 3/34 B24D 3/34 A
Claims (3)
られた超砥粒層とからなる薄刃ブレード。1. A thin blade comprising a soft metal foil and a superabrasive layer provided on both surfaces by electrodeposition.
る請求項１記載の薄刃ブレード。2. The thin blade according to claim 1, wherein the soft metal foil is an aluminum foil or a copper foil.
外周方向に展張した状態でこの軟質金属箔の両面に超砥
粒を電着して超砥粒層を設け、次いで該円筒状治具か
ら、両面に超砥粒層を有する軟質金属箔を取り外したの
ち、所望の寸法に仕上げることを特徴とする薄刃ブレー
ドの製造方法。3. A soft metal foil is fixed to an end face of a cylindrical jig,
The superabrasive grains are electrodeposited on both sides of the soft metal foil in a state of being extended in the outer peripheral direction to provide a superabrasive layer, and then the soft jig having the superabrasive layers on both sides is removed from the cylindrical jig. Thereafter, a method for manufacturing a thin blade, which is finished to a desired size.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000164847A JP4494590B2 (en) | 2000-06-01 | 2000-06-01 | Thin blade blade manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000164847A JP4494590B2 (en) | 2000-06-01 | 2000-06-01 | Thin blade blade manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2001341077A true JP2001341077A (en) | 2001-12-11 |
| JP4494590B2 JP4494590B2 (en) | 2010-06-30 |
Family
ID=18668414
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000164847A Expired - Fee Related JP4494590B2 (en) | 2000-06-01 | 2000-06-01 | Thin blade blade manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4494590B2 (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61265276A (en) * | 1985-05-20 | 1986-11-25 | Goei Seisakusho:Kk | Diamond sheet for cutting and polishing and its manufacturin method |
| JPH0253568A (en) * | 1988-08-18 | 1990-02-22 | Canon Inc | Extremely thin cutting blade |
| JPH10230463A (en) * | 1997-02-20 | 1998-09-02 | Tsuboman:Kk | Polishing sheet and manufacturing method thereof |
-
2000
- 2000-06-01 JP JP2000164847A patent/JP4494590B2/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61265276A (en) * | 1985-05-20 | 1986-11-25 | Goei Seisakusho:Kk | Diamond sheet for cutting and polishing and its manufacturin method |
| JPH0253568A (en) * | 1988-08-18 | 1990-02-22 | Canon Inc | Extremely thin cutting blade |
| JPH10230463A (en) * | 1997-02-20 | 1998-09-02 | Tsuboman:Kk | Polishing sheet and manufacturing method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| JP4494590B2 (en) | 2010-06-30 |
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