JP2001281400A - Electron beam irradiation device - Google Patents
Electron beam irradiation deviceInfo
- Publication number
- JP2001281400A JP2001281400A JP2000095302A JP2000095302A JP2001281400A JP 2001281400 A JP2001281400 A JP 2001281400A JP 2000095302 A JP2000095302 A JP 2000095302A JP 2000095302 A JP2000095302 A JP 2000095302A JP 2001281400 A JP2001281400 A JP 2001281400A
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- Prior art keywords
- electron beam
- irradiation
- windows
- irradiated
- cylindrical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Processes Of Treating Macromolecular Substances (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は加速電圧が比較的小
さい非走査型の電子線照射装置に関し、特に電線等の表
面に被覆した放射線硬化樹脂を硬化、架橋させるのに最
適な電子線照射装置の改良に関するBACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a non-scanning electron beam irradiator having a relatively small accelerating voltage, and more particularly to an electron beam irradiator most suitable for curing and crosslinking a radiation curable resin coated on the surface of an electric wire or the like. About improvement of
【0002】[0002]
【従来の技術】一般に、加速電圧が500KV以下の自
己遮蔽型の電子線照射装置として、図4及び図5に示す
ような装置が使用されている。図4はコンベアタイプの
電子線照射装置であり、搬送装置のトレイ上に被照射物
を載置して電子線照射により処理する。図5はウェブタ
イプの電子線照射装置であり、搬送装置によりシート状
の被照射物を連続して搬送し電子線照射により処理す
る。2. Description of the Related Art Generally, a device as shown in FIGS. 4 and 5 is used as a self-shielding type electron beam irradiation device having an acceleration voltage of 500 KV or less. FIG. 4 shows a conveyor type electron beam irradiation apparatus, in which an object to be irradiated is placed on a tray of a transfer apparatus and processed by electron beam irradiation. FIG. 5 shows a web-type electron beam irradiation device, in which a sheet-shaped object to be irradiated is continuously conveyed by a conveying device and processed by electron beam irradiation.
【0003】各図において、21,31は電子線発生部
であり、タングステンフィラメントを保持するターミナ
ルと、ターミナルで発生した電子線を真空空間で加速す
る加速管とよりなる。22,32は加速管に高電圧を供
給する高電圧発生部であり、23,33は被照射物に電
子線を照射する照射空間を有する照射室であり、大気あ
るいは窒素等の気体雰囲気として構成されている。2
4,34は照射窓部であり、チタン箔等の金属箔からな
る窓箔と、窓箔を冷却すると共に支持する窓箔構造体よ
りなる。窓箔は加速管内の真空雰囲気と照射室内の気体
雰囲気とを仕切るものであり、また、窓箔を介して照射
室内に電子線を取り出すものである。In each of the figures, reference numerals 21 and 31 denote electron beam generators, each of which comprises a terminal for holding a tungsten filament and an accelerating tube for accelerating an electron beam generated in the terminal in a vacuum space. Reference numerals 22 and 32 denote high voltage generators for supplying a high voltage to the accelerating tube. Reference numerals 23 and 33 denote irradiation chambers having irradiation spaces for irradiating the irradiation object with electron beams, which are formed as air or a gas atmosphere such as nitrogen. Have been. 2
Reference numerals 4 and 34 denote irradiation windows, each of which includes a window foil made of a metal foil such as a titanium foil and a window foil structure for cooling and supporting the window foil. The window foil separates a vacuum atmosphere in the accelerating tube from a gas atmosphere in the irradiation chamber, and extracts an electron beam into the irradiation chamber through the window foil.
【0004】前記電子線発生部、高電圧発生部および照
射室の周囲には電子線照射時に発生するX線が外部に漏
洩しないように鉛遮蔽が施されている。25はコンベア
等の搬送装置であり、トレイ上に立体的な被照射物26
を載置して、照射室内を搬送し、照射空間で電子線が照
射されて処理を行なう。35は搬送ロール等からなる搬
送装置であり、ロール等を介して連続的なシート状の被
照射物36を照射室内に搬送し、照射空間で電子線が照
射されて処理を行なう。なお、前記照射室には連続的あ
るいは間欠的に被照射物を処理するために一端に被照射
物の搬入口が、他端に搬出口が設けてある。Around the electron beam generating section, the high voltage generating section and the irradiation chamber, a lead shield is provided so that X-rays generated during electron beam irradiation do not leak outside. Reference numeral 25 denotes a transport device such as a conveyor, which is a three-dimensional object 26 on a tray.
Is placed and transported in the irradiation room, where the electron beam is irradiated in the irradiation space to perform processing. Reference numeral 35 denotes a transfer device including a transfer roll or the like, which transfers a continuous sheet-like object to be irradiated 36 into the irradiation chamber via a roll or the like, and performs processing by being irradiated with an electron beam in an irradiation space. The irradiation chamber is provided at one end with a carry-in port and at the other end with a carry-out port for processing the object to be irradiated continuously or intermittently.
【0005】[0005]
【発明が解決しようとする課題】ところで、加速電圧が
500KV以下の電子線照射装置により発生する低エネ
ルギー電子線は浸透力が小さいため、被照射物の被照射
面しか硬化、架橋することができない。このため、この
種の電子線照射装置では、照射室内の照射空間において
被照射物が通過する際、被照射面の裏面側は電子線が照
射されず、硬化等の処理が行なわれないという問題があ
る。そこで、被照射物の処理を行なうために、再度、照
射空間を通過させる必要があり、被照射物を反転させた
りしている。また、電子線照射装置を2基配置して、被
照射物を両面から照射して硬化、架橋等の処理を行なっ
ている。The low-energy electron beam generated by an electron beam irradiator having an accelerating voltage of 500 KV or less has a small penetrating power, so that only the irradiated surface of the irradiated object can be cured and cross-linked. . For this reason, in this type of electron beam irradiation apparatus, when an object to be irradiated passes in the irradiation space in the irradiation room, the back side of the irradiation surface is not irradiated with the electron beam, and a process such as curing is not performed. There is. Therefore, it is necessary to pass through the irradiation space again in order to perform processing of the irradiation target, and the irradiation target is inverted. In addition, two electron beam irradiators are arranged, and the object to be irradiated is irradiated from both sides to perform treatments such as curing and crosslinking.
【0006】しかし、前記電子線照射装置は被照射物の
全面を硬化、架橋等の処理を行なうために、被照射物を
反転させるための装置、設備が必要となり、作業性が悪
く、コスト高となる欠点がある。また、電子線照射装置
を2基以上配置する必要があり、設備が大掛かりとな
り、設置スペースやコストが大幅に増大するという欠点
がある。更に、いずれの方法でも電線あるいは光ファイ
バー等の線状で、長尺状の被照射物の表面に被覆した放
射線硬化樹脂を硬化、架橋させて処理を行なうことは困
難である。However, the above-mentioned electron beam irradiating apparatus requires a device and equipment for inverting the irradiating object in order to cure and crosslink the entire surface of the irradiating object. There is a disadvantage. Further, it is necessary to arrange two or more electron beam irradiation devices, and the equipment becomes large-sized, and there is a disadvantage that the installation space and cost are greatly increased. Furthermore, it is difficult to cure and cross-link a radiation-curable resin coated on the surface of a long object to be irradiated with a wire such as an electric wire or an optical fiber by any of the methods.
【0007】本発明は、上記事情に基づきなされたもの
であり、電子線発生部と被照射物の搬送部兼ねる照射室
とを一体として電子線照射装置を構成し、かつ発生した
電子線を照射室内に取り出す照射窓を所定間隔で複数配
置することにより、立体物等の被照射物、特に線状、棒
状の長尺物の表面を効率よくかつ連続的に硬化、架橋処
理することができる電子線照射装置を提供することを目
的とする。The present invention has been made based on the above circumstances, and constitutes an electron beam irradiation apparatus integrally with an electron beam generation section and an irradiation chamber which also serves as a transfer section for an object to be irradiated, and irradiates the generated electron beam. By arranging a plurality of irradiation windows at a predetermined interval to be taken out into a room, it is possible to efficiently and continuously cure and cross-link the surface of an object to be irradiated such as a three-dimensional object, particularly a linear or rod-shaped long object. It is an object to provide a line irradiation device.
【0008】[0008]
【課題を解決するための手段】前記課題を解決するため
に本発明に係る電子線照射装置は、電子線を発生して加
速する略円筒状の電子線発生部と、電子線発生部の電子
を加速する高電圧発生部と、被照射物に電子線を照射す
る照射空間を有する略円筒状の照射室とを備え、前記電
子線発生部の中央部に前記照射室をその円筒状の管軸が
一致するように同心円上に配置することを特徴とする。
また、前記円筒状電子線発生部の中心部に電子線源より
発生した電子線を大気中に取り出すための複数の照射窓
を設け、かつ前記照射窓は電子線発生部の断面円周上に
所定角度を有し、各照射窓が対向しないように相互にず
らして配置してなる。さらに、前記円筒状電子線発生部
の中心部に略120度の等間隔を有し、3つの照射窓を
形成してなり、前記電子線発生部に前記複数の照射窓と
対向して複数の電子線源を配置してなり、前記円筒状の
照射室内に連続する立体物を搬送し、複数の照射窓から
取り出される電子線によりその立体物の全周が照射され
ることを特徴とする。さらに又、前記円筒状の照射室内
に液体又は気体を連続して流通し、前記複数の照射窓か
ら取り出される電子線により、液体又は気体が照射され
ることを特徴とする。In order to solve the above-mentioned problems, an electron beam irradiation apparatus according to the present invention comprises a substantially cylindrical electron beam generating section for generating and accelerating an electron beam, and an electron beam of the electron beam generating section. A high-voltage generator for accelerating the irradiation, and a substantially cylindrical irradiation chamber having an irradiation space for irradiating the irradiation object with an electron beam, and the irradiation chamber is provided at a central portion of the electron beam generator. It is characterized by being arranged on concentric circles so that the axes coincide.
Further, a plurality of irradiation windows for taking out an electron beam generated from an electron beam source into the atmosphere are provided at a central portion of the cylindrical electron beam generation unit, and the irradiation window is provided on a cross-sectional circumference of the electron beam generation unit. They have a predetermined angle and are arranged so as to be shifted from each other so that the irradiation windows do not face each other. Furthermore, three irradiation windows are formed at equal intervals of approximately 120 degrees in the center of the cylindrical electron beam generation unit, and a plurality of irradiation windows are formed on the electron beam generation unit in opposition to the plurality of irradiation windows. An electron beam source is arranged, a continuous three-dimensional object is transported into the cylindrical irradiation chamber, and the entire circumference of the three-dimensional object is irradiated by electron beams extracted from a plurality of irradiation windows. Furthermore, a liquid or a gas is continuously circulated in the cylindrical irradiation chamber, and the liquid or the gas is irradiated by an electron beam taken out from the plurality of irradiation windows.
【0009】[0009]
【発明の実施の形態】以下、本発明に係る電子線照射装
置の一実施例を図面に基づき説明する。図1は本発明の
要部である電子線発生部を示す概略斜視図、図2は同じ
く要部の概略側面図、図3は同じく要部の概略正面図で
ある。図中1は略円筒状の電子線発生部であり、略円筒
状の加速管11の内部中央に略円筒状のターミナル12
の管軸が一致するように同心円上に配置して収納し、該
ターミナル内にガン構造体を介して電子線源としてのタ
ングステンフィラメント13を支持している。また、タ
ーミナルの外周の後記する複数の照射窓に対応する開口
部には熱電子をコントロールするグリッド(図示しな
い)が設けられている。さらに、略円筒状の照射室2が
前記電子線発生部1の加速管11及びターミナル12の
内部に各々の管軸が一致するように同心円上に配置して
収納されており、電子線発生部1と照射室2とは三重管
構造となっている。なお、照射室は被照射物に電子線を
照射するための照射空間を有し、かつ被照射物の搬送路
を兼ねている。DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the electron beam irradiation apparatus according to the present invention will be described below with reference to the drawings. FIG. 1 is a schematic perspective view showing an electron beam generating unit which is a main part of the present invention, FIG. 2 is a schematic side view of the same main part, and FIG. 3 is a schematic front view of the same main part. In the figure, reference numeral 1 denotes a substantially cylindrical electron beam generating unit.
Are housed in concentric circles so that their tube axes coincide, and a tungsten filament 13 as an electron beam source is supported in the terminal via a gun structure. A grid (not shown) for controlling thermoelectrons is provided in openings corresponding to a plurality of irradiation windows described later on the outer periphery of the terminal. Further, the irradiation chamber 2 having a substantially cylindrical shape is accommodated in the accelerating tube 11 and the terminal 12 of the electron beam generating unit 1 so as to be arranged concentrically so that their respective tube axes coincide with each other. 1 and the irradiation chamber 2 have a triple tube structure. Note that the irradiation chamber has an irradiation space for irradiating the irradiation object with an electron beam, and also serves as a transport path of the irradiation object.
【0010】3はターミナル12で発生した電子を加速
するために高電圧を供給する高電圧発生部の導入部を示
す。また、前記電子線発生部、高電圧発生部及び照射室
には電子線照射時に発生するX線が装置の外部に漏洩し
ないように鉛遮蔽が施されている。Reference numeral 3 denotes an introduction part of a high voltage generator for supplying a high voltage for accelerating electrons generated at the terminal 12. Further, the electron beam generating section, the high voltage generating section, and the irradiation chamber are provided with a lead shield so that X-rays generated during electron beam irradiation do not leak to the outside of the apparatus.
【0011】照射室2の照射空間2aに対応する円筒体
(照射室自体)の外面には複数の照射窓15が配置され
ており、前記加速管11の開口部グリッドに対応する位
置に取付けられている。照射窓15は長方形状の窓枠構
造体を介してチタン箔が支持されており、加速管内の真
空雰囲気と照射室内の気体雰囲気とを仕切るものであ
り、チタン箔を介して照射空間に電子線を取り出すよう
になっている。又、照射窓15は円筒体の外面に3個配
置されているが、各照射窓は円筒体の断面形状が円とな
る外周上に所定角度、例えば、相互に120度の角度を
有して(離間して)3個配置され、各照射窓は対向しな
いようにずらして配置されている。このように配置する
ことにより、照射室兼搬送路を通過する線状の被照射物
の全周(360度)に電子線照射が可能となる。A plurality of irradiation windows 15 are arranged on the outer surface of a cylindrical body (irradiation chamber itself) corresponding to the irradiation space 2a of the irradiation chamber 2, and are mounted at positions corresponding to the opening grid of the acceleration tube 11. ing. The irradiation window 15 is supported by a titanium foil via a rectangular window frame structure, and separates a vacuum atmosphere in the acceleration tube from a gas atmosphere in the irradiation chamber. To take out. Although three irradiation windows 15 are arranged on the outer surface of the cylindrical body, each irradiation window has a predetermined angle on the outer circumference where the cross-sectional shape of the cylindrical body is circular, for example, has an angle of 120 degrees with each other. Three (separated) irradiation windows are arranged so as not to be opposed to each other. With this arrangement, it is possible to irradiate the entire circumference (360 degrees) of the linear irradiation object passing through the irradiation chamber and the conveyance path with the electron beam.
【0012】前記照射室2は被照射物の搬送路を兼ねて
おり、連続的あるいは間欠的に処理するために、一端に
被照射物の搬入口16が、他端に搬出口17が設けられ
ている。そして、照射室に搬入された被照射物は照射窓
15の照射空間2aを通過する際に、低エネルギー電子
線が全方向から照射される。これにより、被照射物の外
周面は一回の照射により、硬化あるいは架橋等の処理が
行なわれる。The irradiation chamber 2 also serves as a transfer path for the object to be irradiated, and is provided with a carry-in port 16 for the object to be irradiated at one end and a carry-out port 17 at the other end for continuous or intermittent processing. ing. Then, when the irradiation object carried into the irradiation room passes through the irradiation space 2a of the irradiation window 15, a low-energy electron beam is irradiated from all directions. As a result, the outer peripheral surface of the irradiation object is subjected to a treatment such as curing or crosslinking by one irradiation.
【0013】ここで、図示する一実施例の電子線発生部
及び照射室の設計寸法について説明する。加速管11は
全長800mm,外径580mmであり、ターミナル1
2は全長450mm,外径380mmであり、照射室2
は全長850mm,外径60mmである。又、照射室の
中央部には縦10mm,横200mmの長方形の照射窓
15が取り付けられている。なお、本実施例の電子線照
射装置は加速電圧180KV,ビーム電流50mA,3
0,000KGy×m/分等の設計仕様よりなる。Here, the design dimensions of the electron beam generator and the irradiation chamber of one embodiment shown in the drawings will be described. The accelerating tube 11 has a total length of 800 mm and an outer diameter of 580 mm.
2 has a total length of 450 mm and an outer diameter of 380 mm.
Has a total length of 850 mm and an outer diameter of 60 mm. Further, a rectangular irradiation window 15 having a length of 10 mm and a width of 200 mm is attached to the center of the irradiation chamber. The electron beam irradiation apparatus according to the present embodiment has an acceleration voltage of 180 KV, a beam current of 50 mA,
It consists of design specifications such as 0,000 KGy × m / min.
【0014】前記実施例では、照射室の円筒体に照射窓
を略120度離間して3個取付ける場合について説明し
たが、例えば所定角度離間して相互に対向しないように
4個以上取付けてもよい。また、2方向の場合でも被照
射物の形状、寸法によっては外周を全面照射できる可能
性もある。In the above-described embodiment, the case where three irradiation windows are attached to the cylindrical body of the irradiation chamber at an interval of about 120 degrees has been described. However, for example, four or more attachment windows may be attached at a predetermined angle so as not to face each other. Good. In addition, even in the case of two directions, there is a possibility that the entire periphery can be irradiated depending on the shape and size of the irradiation object.
【0015】本発明に係る電子線照射装置は、線状ある
いは棒状の小径の電線、光ファイバー等の外面被覆の硬
化、架橋処理として最適であるが、液体あるいは気体の
改質、改変処理としても利用可能である。この場合、照
射室兼搬送路に液体等を流通させるために、防水あるい
は気密構造とするように工夫する必要がある。いずれに
しても、被照射物は直径50mm以内の立体物や液体あ
るいは気体等に電子線を照射することが可能となる。The electron beam irradiating apparatus according to the present invention is most suitable for curing or cross-linking the outer surface coating of a small wire or rod-shaped electric wire or optical fiber, but is also used for reforming or modifying liquid or gas. It is possible. In this case, it is necessary to devise a waterproof or airtight structure in order to distribute the liquid or the like through the irradiation chamber and the transport path. In any case, the irradiation target can irradiate a three-dimensional object, a liquid, a gas, or the like with a diameter of 50 mm or less with an electron beam.
【0016】[0016]
【発明の効果】以上のように本発明に係る電子線照射装
置は、電子線発生部と照射室兼搬送路を三重管構造と
し、被照射物の全周にわたって電子線照射が可能なよう
に複数の照射窓を配置することにより、連続的あるいは
間欠的に搬送される被照射物の外周面の全てを処理する
ことができる。これにより、効率的、経済的に被照射物
の表面を硬化あるいは架橋することができる等の利点が
ある。特に電線類の電子線照射装置として、コンパクト
で高効率及び経済性が高い等の利点があり、その利用価
値は極めて大きい。As described above, the electron beam irradiation apparatus according to the present invention has a triple tube structure of the electron beam generating section and the irradiation chamber / transport path so that the electron beam can be irradiated all around the object to be irradiated. By arranging a plurality of irradiation windows, it is possible to process all of the outer peripheral surface of the irradiation object that is continuously or intermittently conveyed. This has the advantage that the surface of the object to be irradiated can be cured or cross-linked efficiently and economically. In particular, as an electron beam irradiation device for electric wires, there are advantages such as compactness, high efficiency and high economic efficiency, and the utility value thereof is extremely large.
【図1】本発明に係る電子線照射装置の一実施例の要部
を示す概略斜視図である。FIG. 1 is a schematic perspective view showing a main part of an embodiment of an electron beam irradiation apparatus according to the present invention.
【図2】同じく要部の概略側面図である。FIG. 2 is a schematic side view of a main part of the same.
【図3】同じく要部の概略正面図である。FIG. 3 is a schematic front view of the main part.
【図4】従来の電子線照射装置を示す要部断面図であ
る。FIG. 4 is a sectional view of a main part showing a conventional electron beam irradiation apparatus.
【図5】従来の他の電子線照射装置を示す要部断面図で
ある。FIG. 5 is a sectional view of a main part showing another conventional electron beam irradiation apparatus.
1 電子線発生部 2 照射室 2a 照射空間 3 高電圧発生部 11 加速管 12 ターミナル 13 電子線源 15 照射窓 16 搬入口 17 搬送口 DESCRIPTION OF SYMBOLS 1 Electron beam generation part 2 Irradiation room 2a Irradiation space 3 High voltage generation part 11 Accelerator tube 12 Terminal 13 Electron beam source 15 Irradiation window 16 Carry-in port 17 Transfer port
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) G21K 5/00 G21K 5/00 R 5/10 5/10 L F // H01B 13/14 H01B 13/14 A C08L 101:00 C08L 101:00 ──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) G21K 5/00 G21K 5/00 R 5/10 5/10 LF // H01B 13/14 H01B 13/14 A C08L 101: 00 C08L 101: 00
Claims (6)
線発生部と、電子線発生部の電子を加速する高電圧発生
部と、被照射物に電子線を照射する照射空間を有する略
円筒状の照射室とを備え、前記電子線発生部の中央部に
前記照射室をその円筒状の管軸が一致するように同心円
上に配置することを特徴とする電子線照射装置。An electron beam generating section for generating and accelerating an electron beam, a high voltage generating section for accelerating electrons of the electron beam generating section, and an irradiation space for irradiating an object with an electron beam. An electron beam irradiating apparatus, comprising: a substantially cylindrical irradiation chamber having the irradiation chamber, wherein the irradiation chamber is arranged concentrically at the center of the electron beam generating section such that the cylindrical tube axis thereof coincides.
源より発生した電子線を大気中に取り出すための複数の
照射窓を設け、かつ前記照射窓は電子線発生部の断面円
周上に所定角度を有し、各照射窓が対向しないように相
互にずらして配置してなる請求項1項記載の電子線照射
装置。2. A plurality of irradiation windows for taking out an electron beam generated from an electron beam source into the atmosphere at a central portion of the cylindrical electron beam generation unit, and the irradiation window is formed in a circular cross section of the electron beam generation unit. 2. The electron beam irradiation apparatus according to claim 1, wherein the electron beam irradiation apparatus has a predetermined angle on the circumference and is shifted from each other so that the irradiation windows do not face each other.
0度の等間隔を有し、3つの照射窓を形成してなる請求
項1又は2項記載の電子線照射装置。3. A central part of the cylindrical electron beam generating part having approximately 12
3. The electron beam irradiation device according to claim 1, wherein three irradiation windows are formed at equal intervals of 0 degrees.
向して複数の電子線源を配置してなる請求項1乃至3項
記載の電子線照射装置。4. An electron beam irradiation apparatus according to claim 1, wherein a plurality of electron beam sources are arranged in said electron beam generating section so as to face said plurality of irradiation windows.
搬送し、前記複数の照射窓から取り出される電子線によ
り、その立体物の全周が照射されることを特徴とする請
求項1乃至4項記載の電子線照射装置。5. A continuous three-dimensional object is transported into the cylindrical irradiation chamber, and the entire circumference of the three-dimensional object is irradiated by electron beams taken out from the plurality of irradiation windows. An electron beam irradiation apparatus according to any one of claims 1 to 4.
続して流通し、前記複数の照射窓から取り出される電子
線により、液体又は気体が照射されることを特徴とする
請求項1乃至4項記載の電子線照射装置。6. A liquid or a gas is continuously circulated in the cylindrical irradiation chamber, and the liquid or the gas is irradiated by an electron beam taken out from the plurality of irradiation windows. An electron beam irradiation apparatus according to claim 4.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000095302A JP2001281400A (en) | 2000-03-29 | 2000-03-29 | Electron beam irradiation device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000095302A JP2001281400A (en) | 2000-03-29 | 2000-03-29 | Electron beam irradiation device |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2001281400A true JP2001281400A (en) | 2001-10-10 |
Family
ID=18610223
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000095302A Pending JP2001281400A (en) | 2000-03-29 | 2000-03-29 | Electron beam irradiation device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2001281400A (en) |
-
2000
- 2000-03-29 JP JP2000095302A patent/JP2001281400A/en active Pending
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