JP2001133419A - X-ray elemental analyzer - Google Patents
X-ray elemental analyzerInfo
- Publication number
- JP2001133419A JP2001133419A JP31185399A JP31185399A JP2001133419A JP 2001133419 A JP2001133419 A JP 2001133419A JP 31185399 A JP31185399 A JP 31185399A JP 31185399 A JP31185399 A JP 31185399A JP 2001133419 A JP2001133419 A JP 2001133419A
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- Prior art keywords
- measurement
- accuracy
- ray
- calculated
- expected
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- Analysing Materials By The Use Of Radiation (AREA)
Abstract
Description
【0001】この発明は、入力設定された期待精度の分
析測定が自動的に行われるようにしたX線元素分析装置
に関する。[0001] The present invention relates to an X-ray elemental analyzer in which an analytical measurement of an expected accuracy set and inputted is automatically performed.
【0002】[0002]
【従来の技術】一般に、蛍光X線分析装置などのX線元
素分析装置を用いて試料の分析測定を行う場合、試料表
面からのX線の発生はランダムであり、計数系で発生す
る雑音による揺らぎなどにより、X線のスペクトルには
統計変動が本質的に存在する。2. Description of the Related Art Generally, when a sample is analyzed and measured using an X-ray elemental analyzer such as a fluorescent X-ray analyzer, the generation of X-rays from the sample surface is random, and is caused by noise generated in a counting system. Due to fluctuations and the like, statistical fluctuations exist in the X-ray spectrum.
【0003】X線測定値の統計誤差(相対標準誤差)
は、1回の計数値がnの場合、1/n 1/2 とされてい
る。つまり計数値nが増大するに従って相対誤差は減少
することを示している。計数値nを増すには、長時間測
定するか、測定を繰り返してその結果を組み合わせるか
のいずれかの方法がとられる。[0003] Statistical error of X-ray measurement values (relative standard error)
Is 1 / n when one count value is n 1/2It is said that
You. In other words, the relative error decreases as the count value n increases
It indicates that you want to. To increase the count value n, measure for a long time.
Or repeat the measurement and combine the results
Either of the methods is adopted.
【0004】従来、X線元素分析装置のオペレータは、
通常、装置に備えられている計数率計又は不感時間をみ
てX線励起源の発生強度を調整し(自動設定される装置
も増えてきている)、更にスペクトルの試し測定結果か
ら経験によって自分の必要とする元素の統計変動値を推
測し、必要な測定時間を設定して本測定を行うようにし
ている。そして、定量結果には、そのデータの信頼性を
示す統計変動から計算される誤差範囲が打ち出されるよ
うにした装置もある。Conventionally, operators of X-ray elemental analyzers have
Usually, the intensity of the X-ray excitation source is adjusted by looking at the count rate meter or dead time provided in the apparatus (automatically set devices are increasing). This measurement is performed by estimating the statistical fluctuation value of the required element and setting the required measurement time. In addition, there is an apparatus in which an error range calculated from the statistical fluctuation indicating the reliability of the data is set in the quantitative result.
【0005】[0005]
【発明が解決しようとする課題】ところで、近年、X線
分析装置は品質管理などの現場で使われるようになって
きており、それに伴い、分析に対する高度の知識を要求
されることなしに、高精度の測定結果が得られることが
求められている。分析の初心者が陥りやすいミスとし
て、前述の統計変動による揺らぎの概念が欠落している
ために、測定結果を誤って判断してしまうことがある。
特に、打ち出し測定結果に有効数字の概念がなく、計算
された結果をそのまま打ち出す装置が多いことが、混乱
の一因ともなっている。また、打ち出し測定結果に誤差
範囲が記録されても、それが期待値と異なる場合は再測
定しなければならないという問題点があった。In recent years, X-ray analyzers have been used in the field of quality control and the like, and accordingly, high-level knowledge of analysis has been required without requiring high-level knowledge of analysis. It is required that an accuracy measurement result be obtained. As a mistake that a novice in analysis tends to make, the measurement result may be erroneously determined due to the lack of the aforementioned concept of fluctuation due to statistical fluctuation.
In particular, the fact that there is no concept of significant figures in the launch measurement results and there are many devices that launch the calculated results as they are is one cause of confusion. Further, even if the error range is recorded in the launch measurement result, if the error range is different from the expected value, there is a problem that the measurement must be performed again.
【0006】本発明は、従来のX線元素分析装置におけ
る上記問題点を解消するためになされたもので、分析の
専門家でなくても測定値の信頼性についての知見を得る
ことができると共に、要求精度の分析測定を自動的に行
うことが可能なX線元素分析装置を提供することを目的
とする。SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems in the conventional X-ray elemental analyzer, and it is possible to obtain knowledge on the reliability of measured values without requiring a specialist in analysis. Another object of the present invention is to provide an X-ray elemental analyzer capable of automatically performing analytical measurement with required accuracy.
【0007】[0007]
【課題を解決するための手段】上記問題点を解決するた
め、本発明は、一次線の照射された試料より放出される
X線を検出して試料表面の分析測定を行うX線元素分析
装置において、本測定を開始する前の短時間の予備測定
により得られた測定スペクトルに対して所定の関心領域
を設定する手段と、設定された関心領域の測定スペクト
ルに関する統計誤差を算出する手段と、算出された統計
誤差に基づき入力設定されている測定時間に対する予想
精度を算出し表示する手段と、入力設定されている期待
精度を得るのに必要な測定時間を、前記予想精度に基づ
き算出し設定する手段とを備えていることを特徴とする
ものである。SUMMARY OF THE INVENTION In order to solve the above-mentioned problems, the present invention provides an X-ray elemental analyzer for detecting X-rays emitted from a sample irradiated with a primary beam and performing analytical measurement of the sample surface. In, means for setting a predetermined region of interest for a measurement spectrum obtained by a short preliminary measurement before starting the main measurement, and means for calculating a statistical error related to the measurement spectrum of the set region of interest, Means for calculating and displaying the expected accuracy with respect to the measurement time that is set based on the calculated statistical error, and calculating and setting the measurement time required to obtain the expected accuracy that is set based on the expected accuracy. And means for performing the following.
【0008】このように予め入力設定されている測定時
間に対する予想精度を算出し表示する手段を備えている
ので、分析の専門家でなくても測定値の信頼性について
の知見を得ることができ、また予想精度に基づき予め入
力設定されている期待精度を得るのに必要な測定時間を
算出して設定する手段を備えているので、要求精度の分
析測定を容易に実行することができる。As described above, since the apparatus is provided with a means for calculating and displaying the expected accuracy with respect to the measurement time set in advance, it is possible to obtain knowledge on the reliability of the measured value even if it is not an analysis expert. In addition, since there is provided a means for calculating and setting a measurement time required to obtain the expected accuracy previously set based on the expected accuracy, it is possible to easily perform the analytical measurement of the required accuracy.
【0009】[0009]
【発明の実施の形態】次に、実施の形態について説明す
る。図1は、本発明に係るX線元素分析装置の実施の形
態を示す概略ブロック構成図で、本発明を蛍光X線分析
装置に適用したものを示している。図1において、1は
X線管球からなるX線源、2はX線源1から出射され試
料3に照射される一次X線、4は試料3から発生する蛍
光X線、5は蛍光X線を検出するX線検出器(EDS検
出器)、6はシステムプロセッサを含むX線計数装置、
7はパーソナルコンピュータで入力操作部7−1や表示
部7−2を備えている。そして、X線計数装置6は検出
器5で検出された蛍光X線光子のエネルギーに比例する
電気信号から、横軸をエネルギーとするスペクトラムを
得るために増幅、フィルタによるS/Nの改善、AD変
換等を行う。入力操作部7−1では、測定スペクトル上
への関心領域(ROI)、期待精度、測定時間などを入
力設定できるようになっており、従来の元素分析装置の
持つ定性定量分析機能に加えて、特定領域の測定スペク
トルに対する統計誤差の算出機能、入力設定された測定
時間に対する予想精度を算出する機能、並びに入力設定
された期待精度に対する測定時間を算出する機能等を備
えている。Next, an embodiment will be described. FIG. 1 is a schematic block diagram showing an embodiment of an X-ray elemental analyzer according to the present invention, in which the present invention is applied to a fluorescent X-ray analyzer. In FIG. 1, 1 is an X-ray source composed of an X-ray tube, 2 is a primary X-ray emitted from the X-ray source 1 and irradiated on a sample 3, 4 is a fluorescent X-ray generated from the sample 3, and 5 is a fluorescent X-ray. An X-ray detector (EDS detector) for detecting X-rays; 6 an X-ray counter including a system processor;
Reference numeral 7 denotes a personal computer having an input operation unit 7-1 and a display unit 7-2. The X-ray counter 6 amplifies the electric signal proportional to the energy of the fluorescent X-ray photons detected by the detector 5 in order to obtain a spectrum whose energy is on the horizontal axis, improves the S / N by a filter, and adjusts the AD. Performs conversion and the like. The input operation unit 7-1 can input and set a region of interest (ROI) on a measurement spectrum, expected accuracy, measurement time, and the like. In addition to the qualitative and quantitative analysis functions of the conventional elemental analyzer, It has a function of calculating a statistical error with respect to a measurement spectrum in a specific region, a function of calculating an expected accuracy with respect to an input and set measurement time, a function of calculating a measurement time with respect to an input and set expected accuracy, and the like.
【0010】次に、このように構成されているX線元素
分析装置の動作を図2に示すフローチャートに基づいて
説明する。オペレータが本装置を用いて分析測定を開始
する際には、目的の元素スペクトルの定量分析精度に対
して所望の期待値をもっているが、本装置は、その期待
値に対してどの程度の計測時間を設定したらよいかの判
断情報を示すと共に、予め設定される期待精度に対応す
る計測時間を自動的に設定して分析を行うようになって
いる。Next, the operation of the X-ray elemental analyzer configured as described above will be described with reference to the flowchart shown in FIG. When an operator starts an analytical measurement using the present apparatus, the operator has a desired expected value for the quantitative analysis accuracy of the target elemental spectrum. Is determined, and the measurement is automatically performed for the measurement time corresponding to the expected accuracy set in advance, and the analysis is performed.
【0011】すなわち、使用する測定モードを選択する
と、まず、予め入力操作部7−1から入力設定された時
間、例えば10秒程度の短時間の予備測定を行い、計測エ
ネルギースペクトルを表示部7−2に表示する(ステッ
プS1)。オペレータは周期律表による元素指定やカー
ソルによるスペクトルピーク指定により、エネルギース
ペクトル上に所定の関心領域を入力操作部7−1より入
力設定すると共に、分析精度の期待値又は測定時間を入
力設定する(ステップS2)。次いで、設定された関心
領域の計測スペクトル強度(計数積算値n)から統計変
動による誤差(1/n1/2 )を算出する(ステップS
3)。そして、算出された統計誤差に基づき、予め入力
設定されている測定時間に対する予想精度を算出し表示
部7−2に表示し、オペレータに計測時間に対する判断
情報を提供する。That is, when the measurement mode to be used is selected, first, a preliminary measurement is performed for a short period of time, for example, about 10 seconds, which is previously set from the input operation unit 7-1, and the measured energy spectrum is displayed on the display unit 7-. 2 (step S1). The operator inputs and sets a predetermined region of interest on the energy spectrum from the input operation unit 7-1 by specifying an element according to the periodic table and specifying a spectrum peak using the cursor, and inputs and sets an expected value of the analysis accuracy or a measurement time ( Step S2). Next, an error (1 / n 1/2 ) due to statistical fluctuation is calculated from the set measured spectrum intensity (count integrated value n) of the region of interest (step S).
3). Then, based on the calculated statistical error, the prediction accuracy with respect to the previously set measurement time is calculated and displayed on the display unit 7-2, and the operator is provided with the judgment information on the measurement time.
【0012】オペレータが予想精度に対して期待精度値
を入力すると、前記算出された予想精度に基づいて、入
力設定された期待精度を得るのに必要な測定時間を算出
し設定する(ステップS4)。なお、算出された測定時
間を表示しオペレータに確認を求め、オペレータが装置
において算出された測定時間を承認せず、別途の測定時
間を入力した場合は、その別途入力された測定時間に対
する予想精度を算出し表示する。装置において算出され
た測定時間の設定値がオペレータによって承認される
と、その設定された測定時間測定を行い(ステップS
5)、通常の手順で定性分析と定量分析を行う(ステッ
プS6,S7)。これにより、所望の期待精度で自動的
に所定領域の分析測定を行うことができる。When the operator inputs an expected accuracy value with respect to the expected accuracy, a measurement time required for obtaining the input and set expected accuracy is calculated and set based on the calculated expected accuracy (step S4). . In addition, the calculated measurement time is displayed and the operator is asked for confirmation. If the operator does not approve the calculated measurement time and inputs another measurement time, the expected accuracy of the separately input measurement time is considered. Is calculated and displayed. When the set value of the measurement time calculated in the apparatus is approved by the operator, the set measurement time is measured (Step S).
5) A qualitative analysis and a quantitative analysis are performed in a normal procedure (steps S6 and S7). This makes it possible to automatically perform analysis and measurement of a predetermined area with desired expected accuracy.
【0013】表1に10秒の予備測定の後に、 600秒の予
想測定時間を入力した場合に予想されるスペクトル強度
と精度(誤差%)を算出した例を示す。Table 1 shows an example of calculating the expected spectrum intensity and accuracy (error%) when a predicted measurement time of 600 seconds is input after a preliminary measurement of 10 seconds.
【0014】[0014]
【表1】 元 素 スペクトル強度 予想精度 14Si 670 3.9 15P 25 20.0 16S 730 3.7 23V 14512 0.8 24Cr 118873 0.3 25Mn 19506 0.7 26Fe 2575039 0.1 28Ni 3089 1.8 29Cu 8 35.4 42Mo 5858 1.3 74W 59220 0.4[Table 1] Element spectral intensity expected accuracy 14Si 670 3.9 15P 25 20.0 16S 730 3.7 23V 14512 0.8 24Cr 118873 0.3 25Mn 19506 0.7 26Fe 2575039 0.1 28Ni 3089 1.8 29Cu 8 35.4 42Mo 5858 1.3 74W 59220 0.4
【0015】この表1から、例えばSi については、 6
00秒の測定時間では統計変動から予想される誤差 3.9%
の精度で分析測定が行われることがわかり、一方、誤差
1%の精度で測定を行う場合には、測定時間は9000秒程
度必要とされることがわかる。From Table 1, for example, for Si, 6
3.9% error expected from statistical fluctuations with a measurement time of 00 seconds
It can be seen that the analytical measurement is performed with an accuracy of 1. On the other hand, when the measurement is performed with an accuracy of 1%, it is understood that the measurement time is required about 9000 seconds.
【0016】[0016]
【発明の効果】以上実施の形態に基づいて説明したよう
に、本発明よれば、予め入力設定されている測定時間に
対する予想精度を算出し表示する手段を備えているの
で、分析の専門家でなくても測定値の信頼性についての
知見を得ることができ、また予想精度に基づき予め入力
設定されている期待精度を得るのに必要な測定時間を算
出して設定する手段を備えているので、要求精度の分析
測定を容易に自動的に実行することができる。As described above with reference to the embodiments, according to the present invention, there is provided means for calculating and displaying the expected accuracy with respect to the measurement time set in advance, so that an analysis expert Since it is possible to obtain knowledge about the reliability of the measured value without the need, and there is provided a means for calculating and setting the measurement time required to obtain the expected accuracy that is input and set in advance based on the expected accuracy. In addition, it is possible to easily and automatically perform an analysis measurement of required accuracy.
【図面の簡単な説明】[Brief description of the drawings]
【図1】本発明に係るX線元素分析装置の実施の形態を
示す概略ブロック構成図である。FIG. 1 is a schematic block diagram showing an embodiment of an X-ray elemental analyzer according to the present invention.
【図2】図1に示した実施の形態の動作を説明するため
のフローチャートである。FIG. 2 is a flowchart for explaining the operation of the embodiment shown in FIG. 1;
1 X線源 2 一次X線 3 試料 4 蛍光X線 5 X線検出器 6 X線計数装置 7 パーソナルコンピュータ 7−1 入力操作部 7−2 表示部 Reference Signs List 1 X-ray source 2 Primary X-ray 3 Sample 4 Fluorescent X-ray 5 X-ray detector 6 X-ray counter 7 Personal computer 7-1 Input operation unit 7-2 Display unit
───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 2G001 AA01 BA04 CA01 EA03 FA25 GA01 GA03 JA11 JA20 NA07 NA08 NA10 NA11 NA13 NA15 NA17 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 2G001 AA01 BA04 CA01 EA03 FA25 GA01 GA03 JA11 JA20 NA07 NA08 NA10 NA11 NA13 NA15 NA17
Claims (1)
X線を検出して試料表面の分析測定を行うX線元素分析
装置において、本測定を開始する前の短時間の予備測定
により得られた測定スペクトルに対して所定の関心領域
を設定する手段と、設定された関心領域の測定スペクト
ルに関する統計誤差を算出する手段と、算出された統計
誤差に基づき入力設定されている測定時間に対する予想
精度を算出し表示する手段と、入力設定されている期待
精度を得るのに必要な測定時間を、前記予想精度に基づ
き算出し設定する手段とを備えていることを特徴とする
X線元素分析装置。1. An X-ray elemental analyzer for detecting and analyzing the surface of a sample by detecting X-rays emitted from the sample irradiated with a primary beam, which is obtained by a short preliminary measurement before starting the main measurement. Means for setting a predetermined region of interest with respect to the measured spectrum obtained, means for calculating a statistical error relating to the measured spectrum of the set region of interest, and estimation of a measurement time input based on the calculated statistical error. X-ray elemental analysis comprising: means for calculating and displaying the accuracy; and means for calculating and setting the measurement time required to obtain the expected accuracy set and input based on the expected accuracy. apparatus.
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JP3907890B2 JP3907890B2 (en) | 2007-04-18 |
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Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7289598B2 (en) | 2004-11-02 | 2007-10-30 | Sii Nano Technology Inc. | X-ray fluorescent analysis apparatus |
JP2008002951A (en) * | 2006-06-22 | 2008-01-10 | Sii Nanotechnology Inc | Energy dispersive radiation detection system and target element content measurement method |
JP2015520855A (en) * | 2012-05-22 | 2015-07-23 | クロメック リミテッドKromek Limited | Radiation detection apparatus and radiation detection method |
JP2020085565A (en) * | 2018-11-20 | 2020-06-04 | 日本電子株式会社 | Surface analysis device method and surface analysis device |
WO2020202644A1 (en) * | 2019-03-29 | 2020-10-08 | 株式会社リガク | X-ray fluorescence analyzer |
CN112461879A (en) * | 2020-11-26 | 2021-03-09 | 佛山格捷锐信息技术有限公司 | Method and device for operating spectrum analyzer, spectrum analyzer and storage medium |
US11609192B2 (en) | 2019-12-19 | 2023-03-21 | Rigaku Corporation | Energy dispersive x-ray fluorescent spectrometer, evaluation method, and evaluation program |
-
1999
- 1999-11-02 JP JP31185399A patent/JP3907890B2/en not_active Expired - Fee Related
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7289598B2 (en) | 2004-11-02 | 2007-10-30 | Sii Nano Technology Inc. | X-ray fluorescent analysis apparatus |
JP2008002951A (en) * | 2006-06-22 | 2008-01-10 | Sii Nanotechnology Inc | Energy dispersive radiation detection system and target element content measurement method |
JP2015520855A (en) * | 2012-05-22 | 2015-07-23 | クロメック リミテッドKromek Limited | Radiation detection apparatus and radiation detection method |
JP2020085565A (en) * | 2018-11-20 | 2020-06-04 | 日本電子株式会社 | Surface analysis device method and surface analysis device |
JP7126928B2 (en) | 2018-11-20 | 2022-08-29 | 日本電子株式会社 | Surface analysis device and surface analysis method |
WO2020202644A1 (en) * | 2019-03-29 | 2020-10-08 | 株式会社リガク | X-ray fluorescence analyzer |
JP2020165757A (en) * | 2019-03-29 | 2020-10-08 | 株式会社リガク | Fluorescence x-ray analyzer |
CN113692533A (en) * | 2019-03-29 | 2021-11-23 | 株式会社理学 | Fluorescent X-ray analyzer |
US11402343B2 (en) | 2019-03-29 | 2022-08-02 | Rigaku Corporation | X-ray fluorescence spectrometer |
US11609192B2 (en) | 2019-12-19 | 2023-03-21 | Rigaku Corporation | Energy dispersive x-ray fluorescent spectrometer, evaluation method, and evaluation program |
CN112461879A (en) * | 2020-11-26 | 2021-03-09 | 佛山格捷锐信息技术有限公司 | Method and device for operating spectrum analyzer, spectrum analyzer and storage medium |
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