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JP2001089870A - Solid plating material - Google Patents

Solid plating material

Info

Publication number
JP2001089870A
JP2001089870A JP26578699A JP26578699A JP2001089870A JP 2001089870 A JP2001089870 A JP 2001089870A JP 26578699 A JP26578699 A JP 26578699A JP 26578699 A JP26578699 A JP 26578699A JP 2001089870 A JP2001089870 A JP 2001089870A
Authority
JP
Japan
Prior art keywords
particles
solid plating
coating film
processed
plating material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP26578699A
Other languages
Japanese (ja)
Inventor
Wataru Hisada
渡 久田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sintobrator Ltd
Original Assignee
Sintobrator Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sintobrator Ltd filed Critical Sintobrator Ltd
Priority to JP26578699A priority Critical patent/JP2001089870A/en
Publication of JP2001089870A publication Critical patent/JP2001089870A/en
Withdrawn legal-status Critical Current

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  • Other Surface Treatments For Metallic Materials (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain a solid plating material used for depositing a low electric resistance film on a metallic surface, reducing the contact resistance and reducing the loss of the micro-electric current at the time of energizing. SOLUTION: With particles having the particle size of 30 to 300 μm as neuclei, the surfaces are deposited with a coating film composed of a metallic material having hardness lower than that of the material of the above particles and electric resistance value lower than that of the material of an object to be treated.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、一般的に使用され
る金、銀、銅などの電極金属材料以外の安価な金属材料
を固体プレーティング法によって金、銀、銅などと同等
の電気性能が付与された電極金属材料に加工するための
固体プレーティング材に関する。
BACKGROUND OF THE INVENTION The present invention relates to an inexpensive metal material other than commonly used electrode metal materials, such as gold, silver, and copper, which has an electrical performance equivalent to that of gold, silver, copper, etc. by a solid plating method. The present invention relates to a solid plating material for processing into an electrode metal material to which is added.

【0002】[0002]

【従来の技術】機械部品等の金属製品に耐食性、防錆性
を付与するため、被処理品表面に亜鉛や亜鉛合金などの
軟質金属よりなる防錆用メッキ材料を被処理品に当て付
けて被処理品をメッキするメカニカルプレーティング法
は、例えば特公昭59−25032号公報や特開昭61
−38870号公報などにより公知であるが、このメカ
ニカルプレーティング法はプレーティングする金属が亜
鉛、銅、アルミニウムあるいはこれらの合金粒子を他の
粒子と混合して投射している。また、鉄を核としてその
周囲に亜鉛や亜鉛合金を複覆した固体プレーティング材
も、特開昭56−45372号公報により開示されてい
るが、これらはいずれも金属製品に耐食性、防錆性を付
与するこめのものに過ぎない。
2. Description of the Related Art In order to impart corrosion resistance and rust resistance to metal products such as mechanical parts, a plating material for rust prevention made of a soft metal such as zinc or a zinc alloy is applied to the surface of the article to be treated. A mechanical plating method for plating an article to be processed is described in, for example, Japanese Patent Publication No.
As disclosed in JP-A-38870, the mechanical plating method involves projecting a metal to be plated by mixing particles of zinc, copper, aluminum or an alloy thereof with other particles. Japanese Patent Application Laid-Open No. 56-45372 discloses a solid plating material comprising iron as a core and a double coating of zinc or a zinc alloy around the core. It is just a thing to give.

【0003】このように従来の防錆目的の固体プレーテ
ィング材では電極金属材料以外の安価な金属材料を固体
プレーティング法によって金、銀、銅などと同等の電気
性能が付与された電極金属材料に加工することはできな
い。また、従来のメカニカルプレーティング法での防錆
目的は、大気中で湿気や水分に対する防錆であって、酸
化雰囲気中のように特殊な腐食環境下やこれらの環境下
で電気を通電した場合を想定していないため、加工に使
用した鉄系粒子の微小な残留微粉が腐食を促進させ、し
かも、亜鉛などプレーティング材料自身の耐食性にも問
題があるため長時間の防錆は不可能であった。このた
め、電極の電気特性を向上させるために被処理品である
電極材料表面へ低電気抵抗値金属を形成するには電気メ
ッキが一般的であり、電気メッキは湿式であるため工程
が多くコストがかかり、簡便で安価な方法が求められて
いた。
As described above, in the conventional solid plating material for the purpose of rust prevention, an inexpensive metal material other than the electrode metal material is replaced by an electrode metal material provided with the same electrical performance as gold, silver, copper, etc. by the solid plating method. Cannot be processed. The purpose of rust prevention by the conventional mechanical plating method is to prevent rust against moisture and moisture in the atmosphere, and when electricity is supplied in a special corrosive environment such as in an oxidizing atmosphere or in such an environment. Therefore, it is impossible to prevent rust for a long time because the fine residual fine particles of iron-based particles used in the processing promote corrosion, and there is also a problem with the corrosion resistance of the plating material itself such as zinc. there were. For this reason, in order to improve the electrical characteristics of the electrode, electroplating is generally used to form a low electrical resistance metal on the surface of the electrode material to be processed, and the electroplating is a wet process, which involves many steps and costs. However, a simple and inexpensive method has been demanded.

【0004】[0004]

【発明が解決しようとする課題】本発明が解決しようと
するは上記したような事情に鑑みてなされたもので、耐
食性に優れているうえに低電気抵抗層を一度に安価に形
成することができる固体プレーティング材を提供するこ
とを目的とするものである。
SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned circumstances, and it is possible to form a low electric resistance layer at a time at a low cost while having excellent corrosion resistance. It is an object of the present invention to provide a solid plating material that can be used.

【0005】[0005]

【課題を解決するための手段】上記ような課題を解決し
た本発明に係る固体プレーティング材は、粒子径が30
〜300μm の粒子を核としてその表面に前記粒子の材
料よりも低硬度で且つ被処理品材料より電気抵抗値が低
い金属材料よりなるコーティング膜を形成してあること
を特徴とするものを基本構成とする。そして、このよう
な固体プレーティング材において、核となる粒子として
真比重が2〜15で、粒子硬度が400〜2000 Hv
のものを用いたものを請求項2に係る発明とし、これら
の発明におけるコーティング膜を形成している金属とし
て、単一もしくはその合金を用いたものを請求項3に係
る発明とし、また、前記した各発明におけるコーティン
グ膜を形成するための金属として、金、銀、銅、Niから
選ばれた1種もしくは2種以上を用いたもののを請求項
4に係る発明とし、さらに、前記した各発明において、
核となる粒子として超硬合金を用いたものを請求項5に
係る発明とする。
The solid plating material according to the present invention which has solved the above problems has a particle diameter of 30%.
A basic structure wherein a coating film made of a metal material having hardness of lower than that of the material of the particle and lower electric resistance value of the material to be processed is formed on the surface of the particle having a particle size of ~ 300 µm as a core. And In such a solid plating material, true specific gravity is 2 to 15 as core particles, and particle hardness is 400 to 2000 Hv.
The invention using claim 2 is defined as the invention according to claim 2, and those using a single or an alloy thereof as the metal forming the coating film in these inventions are considered as the invention according to claim 3, and The invention according to claim 4, wherein one or two or more kinds selected from gold, silver, copper, and Ni are used as the metal for forming the coating film in each of the inventions described above. At
The invention using a cemented carbide as the core particles is defined as the invention according to claim 5.

【0006】このように構成されたものは、空気圧を利
用して被処理品に向け投射すれば、核となる粒子が被処
理品より高硬度であるため、被処理品表面に適切な表面
荒れ(アンカーパターン生成効果)が起こり、このアン
カー部に起因して機械的塑性変形が生じ(一部の引っか
き効果)、核となる粒子の表面に形成してある前記粒子
の材料よりも低硬度で且つ被処理品材料より電気抵抗値
が低い金属材料よりなるコーティング膜が被処理品に転
写されると同時に圧延され、被処理品の表面には均一で
強固な被処理品材料より電気抵抗値が低い材料よりなる
金属表面層が得られることとなる。また、この固体プレ
ーティング材を投射処理するための空気圧によって、ア
ルミニウム等の被処理品の表面に生成されて接触抵抗値
を上げている酸化皮膜が除去されながら被処理品の表面
に金属表面層が形成されるため、接触抵抗値が著しく低
下し電気的性能が向上した電極金属材料に加工できるこ
ととなる。
[0006] In the case of the above-mentioned structure, when the particles are projected toward the object to be processed by using air pressure, the core particles are harder than the object to be processed, so that the surface of the object to be processed has an appropriate surface roughness. (Anchor pattern generation effect) occurs, and mechanical plastic deformation occurs due to the anchor portion (partial scratching effect), and has a lower hardness than the material of the particles formed on the surface of the core particles. In addition, a coating film made of a metal material having a lower electric resistance value than the material to be processed is transferred and rolled at the same time as the material to be processed. A metal surface layer made of a low material will be obtained. In addition, a metal surface layer is formed on the surface of the object to be processed while removing an oxide film generated on the surface of the object to be processed such as aluminum by the air pressure for projecting the solid plating material and increasing the contact resistance value. Is formed, the contact resistance value is remarkably reduced, and the electrode metal material having improved electrical performance can be processed.

【0007】また、粒子全体を金、銀または銅などの単
一材料よりなる固体プレーティング材では、粒子硬度が
被処理品より低いため、前記したようなアンカーパター
ン効果が得られず、このため、均一で強固な金属表面層
が得られないうえに、金、銀のような貴金属は高価で不
経済的で所期の目的を達成できないが、本発明では、核
として安価で入手容易な粒子硬度が400〜2000 H
v 程度のガラスや鋼、超硬合金などのような被処理品材
料より高硬度の粒子を用いたことにより、耐食性に優れ
ている低電気抵抗層を一度に安価に形成することができ
ることとなる。
Further, in the case of a solid plating material composed entirely of a single material such as gold, silver or copper, the hardness of the particles is lower than that of the article to be processed, so that the anchor pattern effect as described above cannot be obtained. In addition, a uniform and strong metal surface layer cannot be obtained, and noble metals such as gold and silver are expensive, uneconomical and cannot achieve their intended purpose. Hardness is 400-2000H
v By using particles of higher hardness than the material to be processed, such as glass, steel, cemented carbide, etc., a low electric resistance layer with excellent corrosion resistance can be formed at once at a low cost. .

【0008】本発明において核となる粒子の硬度は、コ
ーティング膜である被処理品材料より電気抵抗値が低い
金属材料よりも高硬度であればよいので、400〜20
00Hvの範囲とするのが普通であり、このため、核とな
る粒子としては、ガラスビーズ、鋼、超硬合金、ハイス
等が適しており、特に、ランニングコストを考えた場合
は超硬合金が最適である。
In the present invention, the hardness of the core particles may be 400 to 20 as long as the hardness is higher than that of a metal material having an electric resistance lower than that of the material to be processed which is a coating film.
Usually, the range of 00Hv is used. For this reason, glass beads, steel, cemented carbide, high-speed steel, etc. are suitable as the core particles. Optimal.

【0009】また、本発明における核となる粒子の粒子
径を30〜300μm としたのは、30μm 以下では粒
子硬度を被処理品より高くしても前記したようなアンカ
ーパターン効果が得られず、このため、均一で強固な金
属表面層が得られないからであり、一方、300μm を
超える大きな粒子を使うと、被処理品の表面粗さが大き
くなって低接触抵抗値が要求される電極には適さないた
めである。なお、粒子の形状は粒子へのコーティンク
性、被処理品への転写性から最も好適なの球状である
が、円筒形、多面体形、グリット形など実質約な大きさ
がこの範囲ならば問題はない。なお、本発明における粒
子の真比重を2〜15としたのは、前記したような粒子
の真比重が前記した数値内のものであるからであるが、
ランニングコスト、転写性から最も最適な真比重は11
〜15である。
Further, the reason why the particle diameter of the core particles in the present invention is 30 to 300 μm is that the anchor pattern effect as described above cannot be obtained even if the particle hardness is higher than that of the article to be processed when the particle diameter is 30 μm or less. For this reason, a uniform and strong metal surface layer cannot be obtained. On the other hand, if large particles exceeding 300 μm are used, the surface roughness of the article to be treated becomes large and an electrode that requires a low contact resistance value is required. Is not suitable. The shape of the particles is spherical, which is the most suitable from the viewpoint of the coating property to the particles and the transfer property to the article to be processed, but there is no problem if the substantially approximate size such as cylindrical, polyhedral, or grit is in this range. . The true specific gravity of the particles in the present invention is set to 2 to 15, because the true specific gravity of the particles as described above is within the above numerical value,
The most suitable true specific gravity is 11 from running cost and transferability.
~ 15.

【0010】さらに、本発明においてコーティング膜を
形成する金属としては、低電気抵抗値を有する金属であ
ればよいので金、銀、銅、Niが使用可能であるが、特
に、耐酸化性、延性、電気抵抗性ともに良好な金、耐酸
化性、電気抵抗性が良好で延性も比較的よい銀が最も適
している。
Further, in the present invention, gold, silver, copper, and Ni can be used as the metal forming the coating film as long as the metal has a low electric resistance. Gold, which has good electric resistance, and silver, which has good oxidation resistance, good electric resistance and relatively good ductility, are most suitable.

【0011】[0011]

【発明の実施の形態】次に、本発明の好ましい実施の形
態を3つの実施例により説明する。
Next, a preferred embodiment of the present invention will be described with reference to three examples.

【実施例1】電気抵抗値が低いコーティング膜を形成す
る材料として金を、固体プレーティング材の核となる粒
子として粒子径が100μm の超硬合金よりなる球状の
粒子を用い、この超硬合金よりなる球状の粒子にこの粒
子材料よりも低硬度で且つ被処理品材料より電気抵抗値
が低い金属材料である金をメッキしてコーティング膜を
形成し、本発明に係る固体プレーティング材を得た。こ
の固体プレーティング材を直径30mm、厚さ4mmのJIS
SS400材よりなる鏡面研摩した被処理材に対して0.
2MPa の空気圧力にて投射処理を実施して電極金属材料
を得た。このようにして得られた電極金属材料の表面に
は均一な金のコーティング膜が均一に形成されており、
この接触抵抗を測定したところ、未処理の場合の約1/
3であった。また、これを希塩酸中に浸漬したところ、
核となる粒子が超硬合金であったため酸化や腐食はなく
無変化であり、耐食性に優れているうえに低電気抵抗層
を有したものであることが確認された。また、被処理材
に対する投射処理時において、前記した固体プレーティ
ング材では核となる粒子の真比重が14.8と重く、硬
度が1400Hvの超硬合金であったため、前記した0.
2MPa 程度の低投射圧でも十分なアンカーパターン効果
が得られ、このため、被処理品の表面には均一で強固な
被処理品材料より電気抵抗値が低い材料よりなる金属表
面層が得られるた。
Example 1 Gold was used as a material for forming a coating film having a low electric resistance value, and spherical particles made of a cemented carbide having a particle diameter of 100 μm were used as particles serving as nuclei of a solid plating material. Spherical particles made of gold, which is a metal material having a lower hardness than the particle material and a lower electric resistance value than the material to be processed, are plated to form a coating film, and a solid plating material according to the present invention is obtained. Was. This solid plating material is JIS of 30mm in diameter and 4mm in thickness.
0.1% for the mirror-polished workpiece consisting of SS400.
The projection process was performed at an air pressure of 2 MPa to obtain an electrode metal material. A uniform gold coating film is uniformly formed on the surface of the electrode metal material thus obtained,
When this contact resistance was measured, it was found to be about 1 /
It was 3. When immersed in dilute hydrochloric acid,
Since the core particles were a cemented carbide, there was no change without oxidation or corrosion, and it was confirmed that the particles had excellent corrosion resistance and a low electric resistance layer. In addition, at the time of the projection processing on the material to be processed, the solid plating material described above was a cemented carbide having a core of 14.8 Hv with a true specific gravity of particles as heavy as 14.8.
Even at a low projection pressure of about 2 MPa, a sufficient anchor pattern effect can be obtained, so that a metal surface layer made of a material having a lower electric resistance than a uniform and strong material to be processed can be obtained on the surface of the workpiece. .

【0012】[0012]

【実施例2】電気抵抗値が低いコーティング膜を形成す
る材料として銀を、固体プレーティング材の核となる粒
子として超硬合金よりなる100μm の粒子を用い、こ
の粒子に前記銀を直接メッキして本発明にかかる固体プ
レーティング材を得た。この固体プレーティング材を直
径30mm、厚さ4mmのJ1S AlO8O 材よりなる鏡面研摩し
た被処理材に対して、0.2MPa の空気圧力にて投射処
理を実施して電極金属材料を得た。このようにして得ら
れた電極金属材料の表面には均一な銀のコーティング膜
が均一に形成されており、この接触抵抗を測定したとこ
ろ、未処理の約1/7であった。また、これを希塩酸中
に浸せきしたところ、実施例1の場合と同様、酸化や腐
食はなく無変化であり、耐食性に優れているうえに低電
気抵抗層を有したものであることが確認された。
Example 2 Silver was used as a material for forming a coating film having a low electric resistance value, and 100 μm particles made of cemented carbide were used as particles serving as nuclei of a solid plating material. Thus, a solid plating material according to the present invention was obtained. This solid plating material was subjected to a projection process at an air pressure of 0.2 MPa to a mirror-polished workpiece made of a J1S AlO8O material having a diameter of 30 mm and a thickness of 4 mm to obtain an electrode metal material. A uniform silver coating film was uniformly formed on the surface of the electrode metal material thus obtained, and the contact resistance was measured to be about 1/7 that of the untreated one. Further, when this was immersed in dilute hydrochloric acid, it was confirmed that, as in the case of Example 1, there was no change in oxidation or corrosion, and that it had excellent corrosion resistance and a low electric resistance layer. Was.

【0013】[0013]

【実施例3】電気抵抗値が低いコーティング膜を形成す
る材料として金を、固体プレーティング材の核となる粒
子として250 μm のガラスビーズを用い、このガラスビ
ーズに前記を無電解メッキして本発明にかかる固体プレ
ーティング材を得た。この固体プレーティング材を直径
30mm、厚さ4mmのJIS SS400材よりなる鏡面研摩し
た被処理材に対してMPa の空気圧力にて投射処理を実施
して電極金属材料を得た。このようにして得られた電極
金属材料の表面には均一な金のコーティング膜が均一に
形成されており、前記実施例1と同等な効果があること
が確認された。
Example 3 Gold was used as a material for forming a coating film having a low electric resistance value, and glass beads of 250 μm were used as particles serving as nuclei of a solid plating material. A solid plating material according to the invention was obtained. This solid plating material was subjected to a projection process at an air pressure of MPa on a mirror-polished material of JIS SS400 having a diameter of 30 mm and a thickness of 4 mm to obtain an electrode metal material. A uniform gold coating film was uniformly formed on the surface of the electrode metal material thus obtained, and it was confirmed that the same effect as in Example 1 was obtained.

【0014】なお、実施例ではコーティング材を電気メ
ッキにて付加したが、この様な方法に限らずコーティン
グ層形成には真空蒸着、イオンプレーティングなど物理
的蒸着、ピラズマCVD、光CVD など化学的蒸着、また
機械的作用によってこれらの金属の層を形成させてもよ
い。また、前記した実施例で用いた被処理材とコーティ
ング膜を形成する材料の電気抵抗値の関係は、SS40
0>A1080>Au>C1100≧Cu>Agであ
り、核となる粒子の揖耗関係は、超硬合金<鋼<ガラス
ビーズである。
In the embodiment, the coating material is added by electroplating. However, the present invention is not limited to such a method, and the coating layer may be formed by physical vapor deposition such as vacuum vapor deposition or ion plating, or by chemical vapor deposition such as pyrazma CVD or optical CVD. These metal layers may be formed by vapor deposition or mechanical action. Further, the relationship between the electric resistance value of the material to be processed and the material forming the coating film used in the above-described embodiment is SS40.
0>A1080>Au> C1100 ≧ Cu> Ag, and the abrasion relationship of core particles is as follows: cemented carbide <steel <glass beads.

【0015】なお、前記実施例ではいずれも核となる粒
子の表面のコーティング膜を電気メッキにて形成してい
るが、電気メッキの外にも真空蒸着、イオンプレーティ
ングのような物理的蒸着法であっても、プラズマCV
D、光CVDのような化学的蒸着法でも、或いは機械的
作用によって形成するようにしてもよい。
In each of the above embodiments, the coating film on the surface of the core particles is formed by electroplating. In addition to electroplating, a physical vapor deposition method such as vacuum deposition or ion plating is used. Even if the plasma CV
D, It may be formed by a chemical vapor deposition method such as photo CVD or by a mechanical action.

【0016】以下に、本発明の実験結果を表1に示す。Table 1 shows the experimental results of the present invention.

【表1】 [Table 1]

【0017】なお、表1における評価方法は、下記のよ
うにして行った。 1、付着性は、コーティング材が被処理品の表面に付着
した程度を観察し、付着性が良いものを良好、少し付着
するものを良、形成されないものを不良とした。 2、接触抵抗は、被処理品の素材時の接触抵抗値を1と
して夫々の値が低下した場合を低下、同程度を同、増加
した場合とした相対評価を行った。 3、耐食性は、希塩酸中に浸漬し、被処理品の素材時の
状態と比較して表面からの水素発生状態の相対評価を行
った。また、表中において、核となる粒子に用いる材料
の欄A1〜A9は、表2に示す条件のものを用いた。
The evaluation method in Table 1 was performed as follows. 1. Regarding the adhesion, the degree of adhesion of the coating material to the surface of the article to be treated was observed, and those having good adhesion were evaluated as good, those slightly adhering as good, and those not formed as poor. 2. With respect to the contact resistance, relative evaluation was made assuming that the contact resistance at the time of the material of the article to be treated was 1 and that the case where each value was reduced was reduced, and the case where the value was the same was the same and the case where it was increased. 3. The corrosion resistance was immersed in dilute hydrochloric acid, and the relative evaluation of the state of hydrogen generation from the surface was performed as compared with the state of the material of the article to be treated. In the table, columns A1 to A9 of the materials used for the particles serving as nuclei used the conditions shown in Table 2.

【0018】[0018]

【表2】 [Table 2]

【0019】[0019]

【発明の効果】本発明は以上の説明から明らかなよう
に、粒子径が30〜300μm の粒子を核としてその表
面に前記粒子の材料よりも低硬度で且つ被処理品材料よ
り電気抵抗値が低い金属材料よりなるコーティング膜を
形成してあるので、安価な金属材料を固体プレーティン
グ法によって金、銀、銅などと同等の耐食性および低電
気抵抗層を有する電極金属材料に加工して、微弱電流が
流れる電極材に適した材質に変化させることができる利
点がある。
As is apparent from the above description, the present invention is based on particles having a particle diameter of 30 to 300 μm, and has a surface having a lower hardness than the material of the particles and an electric resistance value higher than that of the material to be treated. Because a coating film made of a low metal material is formed, an inexpensive metal material is processed by a solid plating method into an electrode metal material having the same corrosion resistance and low electric resistance layer as gold, silver, copper, etc. There is an advantage that the material can be changed to a material suitable for an electrode material through which a current flows.

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 粒子径が30〜300μm の粒子を核と
してその表面に前記粒子の材料よりも低硬度で且つ被処
理品材料より電気抵抗値が低い金属材料よりなるコーテ
ィング膜を形成してあることを特徴とする固体プレーテ
ィング材。
1. A coating film composed of a metal material having a particle diameter of 30 to 300 μm as a nucleus and having a lower hardness than the material of the particle and a lower electric resistance value than a material to be processed is formed on the surface thereof. A solid plating material, characterized in that:
【請求項2】 粒子硬度が400〜2000 Hv で、粒
子の真比重が2〜15であることを特徴とする請求項1
に記載の固体プレーティング材。
2. The particle has a hardness of 400 to 2000 Hv and a true specific gravity of the particle of 2 to 15.
3. The solid plating material according to item 1.
【請求項3】 コーティング膜を形成する金属が、単一
もしくはその合金であることを特徴とする請求項1また
は2に記載の固体プレーティング材。
3. The solid plating material according to claim 1, wherein the metal forming the coating film is a single metal or an alloy thereof.
【請求項4】 コーティング膜を形成する金属が、金、
銀、銅、Niのうちの1種もしくは2種以上であることを
特徴とする請求項1〜3のいずれかに記載の固体プレー
ティング材。
4. The method according to claim 1, wherein the metal forming the coating film is gold,
The solid plating material according to any one of claims 1 to 3, wherein the material is at least one of silver, copper, and Ni.
【請求項5】 核となる粒子が超硬合金であることを特
徴とする請求項1〜4のいずれかに記載の固体プレーテ
ィング材。
5. The solid plating material according to claim 1, wherein the core particles are a cemented carbide.
JP26578699A 1999-09-20 1999-09-20 Solid plating material Withdrawn JP2001089870A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26578699A JP2001089870A (en) 1999-09-20 1999-09-20 Solid plating material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26578699A JP2001089870A (en) 1999-09-20 1999-09-20 Solid plating material

Publications (1)

Publication Number Publication Date
JP2001089870A true JP2001089870A (en) 2001-04-03

Family

ID=17422034

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP2001089870A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE112004002179B4 (en) * 2003-11-12 2008-09-18 Sintobrator, Ltd., Nagoya A method for producing a solid plating material
US7807281B2 (en) 2005-06-22 2010-10-05 Nippon Steel Corporation Stainless steel, titanium, or titanium alloy solid polymer fuel cell separator and its method of production and method of evaluation of warp and twist of separator
JP2013022718A (en) * 2011-07-26 2013-02-04 Osg Corp Tool surface modifying method

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE112004002179B4 (en) * 2003-11-12 2008-09-18 Sintobrator, Ltd., Nagoya A method for producing a solid plating material
US7807281B2 (en) 2005-06-22 2010-10-05 Nippon Steel Corporation Stainless steel, titanium, or titanium alloy solid polymer fuel cell separator and its method of production and method of evaluation of warp and twist of separator
US8304141B2 (en) 2005-06-22 2012-11-06 Sintokogio Ltd. Stainless steel, titanium, or titanium alloy solid polymer fuel cell separator and its method of production and method of evaluation of warp and twist of separator
JP2013022718A (en) * 2011-07-26 2013-02-04 Osg Corp Tool surface modifying method

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